Method for improving activity of forage grass seeds
A seed and forage technology, applied in the field of improving the vigor of forage seeds, can solve the problems of soil environment damage, etc., and achieve the effects of wide mutation spectrum, improved quality and yield, and good economic benefits
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- Publication Date
- 2021-09-28
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Abstract
Description
technical field
[0001] The invention relates to the technical field of forage planting, and more specifically relates to a method for improving the vigor of forage seeds. Background technique
[0002] There are many techniques for treating plant seeds with physical and chemical methods to improve seed vigor and achieve high yield. The traditional methods of treating seeds with chemical substances include plant growth regulator treatment, trace element fertilizer treatment and chemical agent treatment (Seed World, 2009.5, Seed treatment methods and applications, Li Guozhong, etc.), this method has been used in sterilization, disease prevention, Improving seed vigor and high yield has been widely used, but chemical treatment methods are likely to cause damage to the soil environment.
[0003] With the development of modern science and technology, the application of physical methods to treat crop seeds to make them high-yield and high-quality has been more and more used in agr...
Examples
Embodiment 1
[0022] The method for improving the vigor of forage seeds comprises the following steps:
[0023] (1) First, sieve the seeds of Elymus amansii in Tongde, then sort the seeds, remove the seeds with impurities, select the forage seeds with full particles and no damage by diseases and insect pests, and dry them to obtain dry seeds;
[0024] (2) Stick the dry seed embryo upwards on the plate with double-sided adhesive in a spiral outward rotation mode with the center of the plate as the center of the circle, put the plate with the dry seeds into the target chamber of the ion implanter for low-energy nitrogen ion beam implantation, And adopt the intermittent pulse implantation method to carry out the implantation of low-energy nitrogen ion beam with no thermal effect, and control the implantation dose of low-energy nitrogen to 5000×2.6×10 13 ions / cm 2 , the energy is 25keV, the size of the nitrogen ion beam is 12mA; the pulse dose of the intermittent pulse implantation method is 4...
Embodiment 2
[0026] The method for improving the vigor of forage seeds comprises the following steps:
[0027] (1) first sieve the seeds of Jinbei partial tassel goose viewing grass, then sort the seeds, remove the seeds with impurities, select full grains, no forage seeds of diseases and insect pests, and dry to obtain dry seeds;
[0028] (2) Stick the dry seed embryo upwards on the plate with double-sided adhesive in a spiral outward rotation mode with the center of the plate as the center of the circle, put the plate with the dry seeds into the target chamber of the ion implanter for low-energy nitrogen ion beam implantation, And adopt the intermittent pulse implantation method to carry out the implantation of low-energy nitrogen ion beam with no thermal effect, and control the implantation dose of low-energy nitrogen to 7000×2.6×10 13 ions / cm 2, the energy is 30keV, the nitrogen ion beam current size is 12mA; among them, the pulse dose of the intermittent pulse implantation method is ...
Embodiment 3
[0030] The method for improving the vigor of forage seeds comprises the following steps:
[0031] (1) first sieve the seeds of Jisheng No. 4 Leymus chinensis, then sort the seeds, remove the seeds with impurities, select the forage seeds with full particles and no damage by diseases and insect pests, and dry them to obtain dry seeds;
[0032] (2) Stick the dry seed embryo upwards on the plate with double-sided adhesive in a spiral outward rotation mode with the center of the plate as the center of the circle, put the plate with the dry seeds into the target chamber of the ion implanter for low-energy nitrogen ion beam implantation, And adopt the intermittent pulse implantation method to carry out the implantation of low-energy nitrogen ion beam with no thermal effect, and control the implantation dose of low-energy nitrogen to 8000×2.6×10 13 ions / cm 2 , the energy is 20-30keV, and the nitrogen ion beam current size is 15mA; among them, the pulse dose of the intermittent pulse...