Glass cabinet metal texture surface treatment method based on non-uniform exposure

Abstract

The application relates to a glass machine shell metal texture surface treatment method based on non-uniform exposure, which is used for metal texture surface treatment of a glass machine shell, and the method comprises the following steps: spin coating a photoresist on the surface of the glass machine shell, pre-baking, adopting a non-uniform light-shielding mask plate to perform deep ultraviolet light exposure on the photoresist, developing the photoresist, post-baking, performing reactive plasma dry etching, placing the glass machine shell into a surface treatment liquid tank for surface treatment, and taking out the glass machine shell.

Description

Technical Field

[0001] This invention relates to the field of new materials, and in particular to a method for treating the metallic texture of glass housings based on non-uniform exposure. Background Technology

[0002] With the widespread adoption of smart appliances, the control methods for home appliances and switch panels are gradually shifting from traditional mechanical buttons or knobs to touch switches. This trend has led to a significant increase in demand for integrated glass housings. Glass housings combine the functions of a touch-sensitive glass cover and an equipment casing, offering advantages such as rust resistance and ease of cleaning. However, the inherent smooth surface of glass results in drawbacks such as surface glare and difficulty in achieving a metallic texture. Several Chinese patents, including CN202010451864.0, have proposed surface treatment methods to achieve a metallic texture on glass housing surfaces. However, existing methods all involve etching the smooth, flat glass surface. Due to the uniformity of the surface, the surface roughness after etching remains limited, making it difficult to achieve a large surface roughness and thus failing to achieve a metallic texture similar to anodized metal surfaces. Therefore, it is necessary to provide a surface treatment method for glass housings that can achieve a larger surface roughness and a metallic texture. Summary of the Invention

[0003] To solve the above-mentioned technical problems, the technical solution of the present invention is: a method for treating the metallic textured surface of a glass housing based on non-uniform exposure, characterized in that the method includes: S101: Spin-coat a layer of photoresist onto the surface of the glass housing; S102: Pre-baking; S103: Deep ultraviolet light exposure of photoresist is performed using a mask with non-uniform light shielding; S104: Develop the photoresist; S105: Perform post-baking; S106: Perform reactive plasma dry etching; S107: The glass housing is placed in a surface treatment liquid tank for surface treatment; S108: Remove the glass housing.

[0004] The step of spin-coating a layer of photoresist on the surface of the glass housing further includes ensuring that the spin-coated photoresist is uniformly covered on the surface of the glass housing, and the thickness of the photoresist does not exceed 8 micrometers.

[0005] The pre-baking process also includes baking the glass housing with photoresist by first gradually increasing the temperature from room temperature to 65°C at a rate of 2°C / min, then holding it at 65°C for 1 minute, then increasing the temperature again to 95°C at a rate of 2°C / min, and holding it at 95°C for 5 minutes, then stopping the heating and cooling it to room temperature.

[0006] The method of using a non-uniform light-shielding mask to expose photoresist with deep ultraviolet light further includes: the non-uniform light-shielding mask includes a transparent substrate and light-shielding spots, the light-shielding spots are disposed on the lower surface of the transparent substrate, the non-uniform light-shielding mask is disposed above the photoresist, and a deep ultraviolet light source is disposed above the non-uniform light-shielding mask. The deep ultraviolet light emitted by the deep ultraviolet light source has a wavelength of 365 nanometers and an exposure energy density of 350~400 millijoules per square centimeter. The deep ultraviolet light emitted by the deep ultraviolet light source passes through the non-uniform light-shielding mask and irradiates the photoresist. The photoresist in the areas blocked by the light-shielding spots cannot be irradiated by the deep ultraviolet light, while the photoresist in the areas not blocked by the light-shielding spots will be irradiated by the deep ultraviolet light. The photoresist irradiated by the deep ultraviolet light will solidify.

[0007] The process of developing the photoresist also includes immersing the glass housing in a developing tank containing a developing solution. The uncured photoresist is dissolved by the developing solution, and the dissolved areas are exposed on the surface of the glass housing.

[0008] The post-baking process also includes gradually increasing the temperature from room temperature to 65°C at a rate of 2°C / min, holding at 65°C for 1 minute, increasing the temperature again to 95°C at a rate of 2°C / min, holding at 95°C for 3 minutes, then stopping the heating and cooling to room temperature.

[0009] The reactive plasma dry etching process further includes using sulfur hexafluoride as the etching gas to simultaneously etch the cured photoresist and the exposed glass housing surface area not covered by the photoresist until the cured photoresist is completely etched away. During this process, the exposed glass housing surface area not covered by the photoresist will form shallow etch pits due to the dry etching process.

[0010] The glass housing is placed in a surface treatment liquid tank for surface treatment, and the surface treatment liquid tank is filled with surface treatment liquid. The glass housing is immersed below the surface of the surface treatment liquid, and the surface treatment liquid forms etched pits of varying depths on the surface of the glass housing. The temperature of the surface treatment liquid is maintained at -15°C.

[0011] The positions of the light-shielding spots are randomly distributed, and the material of the light-shielding spots is metallic chromium.

[0012] Before immersing the glass housing below the surface treatment liquid, the glass housing is first cooled to a temperature close to -15°C before being placed into the surface treatment liquid tank.

[0013] Compared with the prior art, the present invention has the following beneficial effects: by non-uniform exposure to achieve non-uniform distribution of photoresist on the surface of the glass housing, and then performing dry etching, the exposed areas of the glass housing surface not covered by photoresist will form shallow etching pits due to dry etching. During further surface treatment in the surface treatment liquid tank, the shallow etching pits will be further etched to form deeper pits, while the areas without shallow etching pits will form shallower pits. This results in the formation of non-uniformly distributed etching pits of varying depths on the surface of the glass housing, achieving a greater surface roughness and presenting a surface texture similar to that of metal anodizing. By using an exposure process, it is possible to achieve a stable and consistent roughness and metallic texture in mass production.

[0014] To make the above and other objects, features and advantages of the present invention more apparent and understandable, preferred embodiments are described below in detail with reference to the accompanying drawings. Attached Figure Description

[0015] Figure 1 This is a flowchart of a method for treating a metallic surface on a glass housing based on non-uniform exposure, according to an embodiment of the present invention. Detailed Implementation

[0016] To further illustrate the technical means and effects of the present invention in achieving its intended purpose, the following detailed description of the specific implementation methods, structures, features, and effects of the present invention, in conjunction with the accompanying drawings and preferred embodiments, is provided below.

[0017] Please refer to Figure 1 A method for achieving a metallic surface finish on a glass housing based on non-uniform exposure, characterized in that the method includes: S101: Spin-coat a layer of photoresist onto the surface of the glass housing; S102: Pre-baking; S103: Deep ultraviolet light exposure of photoresist is performed using a mask with non-uniform light shielding; S104: Develop the photoresist; S105: Perform post-baking; S106: Perform reactive plasma dry etching; S107: The glass housing is placed in a surface treatment liquid tank for surface treatment; S108: Remove the glass housing.

[0018] The step of spin-coating a layer of photoresist on the surface of the glass housing further includes ensuring that the spin-coated photoresist is uniformly covered on the surface of the glass housing, and the thickness of the photoresist does not exceed 8 micrometers.

[0019] The pre-baking process also includes baking the glass housing with photoresist by first gradually increasing the temperature from room temperature to 65°C at a rate of 2°C / min, then holding it at 65°C for 1 minute, then increasing the temperature again to 95°C at a rate of 2°C / min, and holding it at 95°C for 5 minutes, then stopping the heating and cooling it to room temperature.

[0020] The method of using a non-uniform light-shielding mask to expose photoresist with deep ultraviolet light further includes: the non-uniform light-shielding mask includes a transparent substrate and light-shielding spots, the light-shielding spots are disposed on the lower surface of the transparent substrate, the non-uniform light-shielding mask is disposed above the photoresist, and a deep ultraviolet light source is disposed above the non-uniform light-shielding mask. The deep ultraviolet light emitted by the deep ultraviolet light source has a wavelength of 365 nanometers and an exposure energy density of 350~400 millijoules per square centimeter. The deep ultraviolet light emitted by the deep ultraviolet light source passes through the non-uniform light-shielding mask and irradiates the photoresist. The photoresist in the areas blocked by the light-shielding spots cannot be irradiated by the deep ultraviolet light, while the photoresist in the areas not blocked by the light-shielding spots will be irradiated by the deep ultraviolet light. The photoresist irradiated by the deep ultraviolet light will solidify.

[0021] The process of developing the photoresist also includes immersing the glass housing in a developing tank containing a developing solution. The uncured photoresist is dissolved by the developing solution, and the dissolved areas are exposed on the surface of the glass housing.

[0022] The post-baking process also includes gradually increasing the temperature from room temperature to 65°C at a rate of 2°C / min, holding at 65°C for 1 minute, increasing the temperature again to 95°C at a rate of 2°C / min, holding at 95°C for 3 minutes, then stopping the heating and cooling to room temperature.

[0023] The reactive plasma dry etching process further includes using sulfur hexafluoride as the etching gas to simultaneously etch the cured photoresist and the exposed glass housing surface area not covered by the photoresist until the cured photoresist is completely etched away. During this process, the exposed glass housing surface area not covered by the photoresist will form shallow etch pits due to the dry etching process.

[0024] The glass housing is placed in a surface treatment liquid tank for surface treatment. The surface treatment liquid tank is filled with surface treatment liquid, the glass housing is immersed below the surface of the surface treatment liquid, the surface treatment liquid forms etched pits of varying depths on the surface of the glass housing, and the temperature of the surface treatment liquid is maintained at -15°C.

[0025] The positions of the light-shielding spots are randomly distributed, and the material of the light-shielding spots is metallic chromium.

[0026] Before immersing the glass housing below the surface treatment liquid, the glass housing is first cooled to a temperature close to -15°C before being placed into the surface treatment liquid tank.

[0027] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention in any way. Although the present invention has been disclosed above with reference to preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can make some modifications or alterations to the above-disclosed technical content to create equivalent embodiments without departing from the scope of the present invention. Any simple modifications, equivalent changes and alterations made to the above embodiments based on the technical essence of the present invention without departing from the scope of the present invention shall still fall within the scope of the present invention.

Claims

1. A method for treating the metallic textured surface of a glass housing based on non-uniform exposure, characterized in that, The method includes: S101: Spin-coat a layer of photoresist onto the surface of the glass housing; S102: Pre-baking; S103: Deep ultraviolet light exposure of photoresist is performed using a mask with non-uniform light shielding; S104: Develop the photoresist; S105: Perform post-baking; S106: Perform reactive plasma dry etching; S107: The glass housing is placed in a surface treatment liquid tank for surface treatment; S108: Remove the glass casing; The pre-baking process also includes, The glass housing with photoresist was baked by first gradually increasing the temperature from room temperature to 65°C at a rate of 2°C / min, then holding it at 65°C for 1 minute, then increasing the temperature again to 95°C at a rate of 2°C / min, and holding it at 95°C for 5 minutes. After that, the heating was stopped and the glass housing was cooled to room temperature. The method of using a non-uniformly shaded mask to expose the photoresist to deep ultraviolet light also includes, The non-uniform light-shielding mask includes a transparent substrate and light-shielding spots disposed on the lower surface of the transparent substrate. The non-uniform light-shielding mask is positioned above the photoresist, and a deep ultraviolet light source is positioned above the non-uniform light-shielding mask. The deep ultraviolet light source emits deep ultraviolet light with a wavelength of 365 nanometers and an exposure energy density of 350-400 millijoules per square centimeter. Deep ultraviolet light emitted from a deep ultraviolet light source passes through a non-uniformly shielded photomask and illuminates the photoresist. The photoresist in areas blocked by the shielding spots is not exposed to the deep ultraviolet light, while the photoresist in areas not blocked by the shielding spots is illuminated by the deep ultraviolet light. Photoresist exposed to deep ultraviolet light will cure.

2. The method for achieving a metallic surface finish on a glass housing based on non-uniform exposure according to claim 1, characterized in that, The process of spin-coating a layer of photoresist onto the surface of the glass housing also includes, Spin-coated photoresist is uniformly applied to the surface of the glass housing, with a thickness not exceeding 8 micrometers.

3. The method for achieving a metallic surface finish on a glass housing based on non-uniform exposure according to claim 1, characterized in that, The developing of the photoresist also includes, The glass housing is immersed in a developing tank containing a developing solution. The uncured photoresist is dissolved by the developing solution, and the dissolved areas of the photoresist are exposed on the surface of the glass housing.

4. The method for achieving a metallic surface finish on a glass housing based on non-uniform exposure according to claim 1, characterized in that, The post-baking process also includes, First, gradually increase the temperature from room temperature to 65°C at a heating rate of 2°C / min, then hold at 65°C for 1 minute, then increase the temperature again to 95°C at a heating rate of 2°C / min, and hold at 95°C for 3 minutes. Then stop heating and cool to room temperature.

5. The method for achieving a metallic surface finish on a glass housing based on non-uniform exposure according to claim 1, characterized in that, The reactive plasma dry etching process also includes, The reactive plasma etching process uses sulfur hexafluoride as the etching gas to simultaneously etch both the cured photoresist and the exposed glass housing surface areas not covered by the photoresist, until the cured photoresist is completely etched away. During this process, the exposed glass housing surface area, which is not covered by photoresist, will form shallow etching pits due to dry etching.

6. The method for achieving a metallic surface finish on a glass housing based on non-uniform exposure according to claim 1, characterized in that, The glass housing is placed in a surface treatment liquid tank for surface treatment, which also includes... A surface treatment liquid is placed in a surface treatment liquid tank. The glass housing is immersed below the surface of the surface treatment liquid, and the surface treatment liquid forms etched pits of varying depths on the surface of the glass housing. The surface treatment liquid is kept at a temperature of -15°C.

7. The method for achieving a metallic surface finish on a glass housing based on non-uniform exposure according to claim 4, characterized in that, The locations of the light-shielding spots are randomly distributed, and the material of the light-shielding spots is metallic chromium.

8. The method for achieving a metallic surface finish on a glass housing based on non-uniform exposure according to claim 6, characterized in that, Before immersing the glass housing below the surface treatment liquid, the glass housing is first cooled to -15°C before being placed into the surface treatment liquid tank.

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