Water-based photoresist stripping liquid for display panel as well as preparation method and application of water-based photoresist stripping liquid

Abstract

The invention relates to a water-based photoresist stripping liquid for a display panel as well as a preparation method and application of the water-based photoresist stripping liquid. The water-based photoresist stripping liquid for the display panel comprises the following components in parts by weight, 0.1 to 0.5 part of a composite functional agent; 15 to 25 parts of organic amine; 10-20 parts of a polar solvent; 1-5 parts of a metal resist; and 30-50 parts of ultrapure water. An electron-rich water-soluble compound in the composite functional agent and an oxidation group of graphene oxide react through static electricity or hydrogen bonds to form a stable network structure, so that molecules are connected more tightly in a solution, the overall stability of the aqueous photoresist stripping liquid is better maintained, and the stripping efficiency of the aqueous photoresist stripping liquid is improved. The effects of reducing the volatilization of other components in the water-based photoresist stripping liquid and reducing the operation risk in the manufacturing process are achieved, and the service life of the water-based stripping liquid is prolonged.

Description

Technical Field

[0001] The invention belongs to the field of photoresist stripping liquid, and in particular relates to a water-based photoresist stripping liquid for a display panel, and a preparation method and application thereof. Background Art

[0002] Photoresist, also known as photoresist, is mainly composed of three components: photosensitive resin, sensitizer and solvent. After being exposed to light, the photosensitive resin can quickly undergo a photocuring reaction in the exposed area, causing significant changes in the physical properties of this material, especially solubility and affinity. Through processes such as exposure, development, etching, diffusion, ion implantation, and metal deposition, the required fine pattern is transferred from the mask to the processed substrate, and finally the photoresist in the exposed part is cleaned off with a degumming stripping solution, thus completing the entire pattern transfer process.

[0003] Existing stripping liquids mainly include water-based stripping liquids and organic stripping liquids. The main components of water-based stripping liquids include organic reagents and pure water. The proportion of pure water in different stripping liquids is different. During the reaction between water-based stripping liquids and photoresists, the general process temperature is 50-70°C. Pure water and organic matter will still have a large amount of volatility during use. The content of each component in the water-based stripping liquid will also change accordingly, affecting the stripping effect; at the same time, the organic vapor produced will also affect the safety of the operation. Summary of the invention

[0004] The technical problem solved by the present invention is that the overall stability of the currently used photoresist stripping solution is poor, the volatilization of organic solvents and ultrapure water in the water-based photoresist stripping solution is relatively serious, the operation risk in the process is relatively large, and the service life of the water-based stripping solution is affected.

[0005] In view of the technical problems existing in the prior art, the present invention designs an aqueous photoresist stripping solution for display panels and a preparation method and application thereof.

[0006] It should be noted that, in the present invention, unless otherwise specified, the specific meaning of "including" in relation to composition limitations and descriptions includes both open-ended "including", "comprising" and similar meanings, and closed-ended "consisting of..." and similar meanings.

[0007] In order to solve the above-mentioned technical problems, the present invention adopts the following solutions:

[0008] A water-based photoresist stripping solution for a display panel, characterized in that it comprises the following components in parts by weight:

[0009] Composite functional agent 0.1-0.5 parts;

[0010] 15-25 parts of organic amine;

[0011] 10-20 parts of polar solvent;

[0012] 1-5 parts of metal resist;

[0013] 30-50 parts of ultrapure water.

[0014] Furthermore, the composite functional agent is a mixture of graphene oxide and an electron-rich water-soluble compound.

[0015] Furthermore, the mass ratio of the graphene oxide to the electron-rich water-soluble compound is 1-5:1.

[0016] Furthermore, the electron-rich water-soluble compound is one or more of polyacrylamide, polyacrylic acid, polyvinyl pyrrolidone, polyvinyl alcohol, polymaleic anhydride, polyquaternary ammonium salt, polyethylene glycol, and polyethylene imine.

[0017] Furthermore, the organic amine is one or more of ethanolamine, N-methylethanolamine, diethanolamine, triethanolamine, isopropanolamine, 2-aminoethanolamine, ethyldiethanolamine, N,N-dimethylethanolamine, N,N-diethylethanolamine, N-(2-aminoethyl)ethanolamine, and diglycolamine.

[0018] Furthermore, the polar solvent is one or more of N-methylformamide, N-methylpyrrolidone, dimethyl sulfoxide, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, and diethylene glycol monobutyl ether.

[0019] Furthermore, the metal anti-corrosion agent is one or more of propylene glycol, diethylene glycol, catechol, 4-methylcatechol, 4-tert-butylcatechol, 1,2,4-triazole, 3-amino-1,2,4-triazole, 4-amino-1,2,4-triazole, benzotriazole, mercaptobenzothiazole, imidazole and phosphine carboxylic acid.

[0020] The present invention also discloses a method for preparing the aqueous photoresist stripping solution for the display panel, which is characterized by comprising the following steps:

[0021] Step 1: Weigh each component in its respective amount;

[0022] Step 2: uniformly mix all components except the composite functional agent at room temperature, then add the composite functional agent, and stir until uniform and transparent, thereby obtaining the aqueous photoresist stripping solution for display panels.

[0023] The present invention also discloses a method for using the aqueous photoresist stripping solution for a display panel, which is characterized by comprising the following steps:

[0024] Step 1: heating the display panel with a water-based photoresist stripping solution to 50-70° C., and after the temperature stabilizes, placing the substrate in the stripping solution and continuously shaking to obtain a stripped substrate;

[0025] Step 2: Rinse the above-stripped substrate with ultrapure water at least twice to remove the residual stripping solution, and finally blow dry with nitrogen to obtain a substrate with the photoresist removed.

[0026] The invention also discloses a use of the aqueous photoresist stripping liquid for a display panel in removing the panel photoresist.

[0027] In the present invention, in order to further optimize the performance of the aqueous photoresist stripping solution for display panels, the various components thereof can be optimized: 0.1-0.4 parts of composite functional agent; 15-20 parts of organic amine; 10-18 parts of polar solvent; 1-3 parts of metal resist; 35-50 parts of ultrapure water.

[0028] In the present invention, the mass ratio of graphene oxide to the electron-rich water-soluble compound is preferably 2:1.

[0029] In the present invention, the organic amine is preferably one or more of ethanolamine, diethanolamine, and diglycolamine.

[0030] In the present invention, the polar solvent is preferably dimethyl sulfoxide and / or diethylene glycol monomethyl ether.

[0031] In the present invention, the metal anti-corrosion agent is preferably one or more of glycerol, catechol, and benzotriazole.

[0032] In the method for using the stripping solution of the present invention, in step 1, the stripping time is generally different for photoresists of different thicknesses, and is generally recommended to be about 1 minute.

[0033] In the present invention, in step 2, the ultrapure water washing time is about 1 minute.

[0034] In the present invention, the ultrapure water used is deionized water with a resistance of ≥18 MΩ.

[0035] The composite functional agent used in the present invention has the following advantages:

[0036] Graphene oxide is an oxidized form of graphene, which contains a variety of oxygen functional groups on its surface, such as carboxyl, hydroxyl and epoxy groups, which make it highly polar and able to form hydrogen bonds or electrostatic interactions with water and other chemicals, thereby improving its dispersibility and stability in solution and reducing the volatilization of polar solvents and organic amines.

[0037] At the same time, the mechanism of action of electron-rich water-soluble compounds:

[0038] Electron-rich water-soluble compounds have a high electron density and contain abundant electron donor groups, such as amino (-NH2), hydroxyl (-OH), etc.

[0039] Mechanism of action of composite functional agent:

[0040] The electron-rich compounds in the composite functional agent have a high reducibility or charge density, and can interact with the oxidized groups of graphene oxide GO through electrostatics or hydrogen bonds to form a stable network structure, making the molecules more tightly connected in the solution, less likely to change with temperature fluctuations, and better maintaining the overall stability of the aqueous stripping solution.

[0041] Therefore, the volatilization of polar solvents, organic amines and ultrapure water in the aqueous stripping solution can be reduced more effectively, thereby reducing the operational risks in the process.

[0042] At the same time, the stability of the water-based stripping fluid is enhanced, the original stripping effect is maintained, and the service life of the water-based stripping fluid is increased.

[0043] The present invention provides a water-based photoresist stripping solution for a display panel and a preparation method and application thereof, which have the following beneficial effects:

[0044] 1. The present invention adopts a combination of graphene oxide and an electron-rich water-soluble compound. The electron-rich water-soluble compound and the oxidized groups of graphene oxide act through electrostatic or hydrogen bonds to form a stable network structure, so that each molecule in the stripping solution is more tightly connected and not easily changed with temperature fluctuations, thereby better maintaining the overall stability of the aqueous photoresist stripping solution, achieving the effect of reducing the volatilization of polar solvents, organic amines and ultrapure water in the aqueous photoresist stripping solution, reducing the operational risks in the process, and extending the service life of the aqueous stripping solution.

[0045] 2. The aqueous stripping solution provided by the present invention can completely remove the photoresist with substantially no residue, thereby improving the precision of the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0046] Figure 1 : This is a SEM image magnified 40000 times after the stripping solution of Example 1 of the present invention was continuously heated for 12 hours;

[0047] Figure 2 : This is a SEM image magnified 40000 times after the stripping solution of Example 1 of the present invention was continuously heated for 24 hours;

[0048] Figure 3 : This is a SEM image magnified 40000 times after the stripping solution of Comparative Example 1 of the present invention was continuously heated for 12 hours;

[0049] Figure 4: This is a SEM image magnified 40,000 times after the stripping solution of Comparative Example 1 of the present invention was continuously heated for 24 hours and then stripped. DETAILED DESCRIPTION

[0050] The present invention will be further described below in conjunction with specific embodiments and accompanying drawings:

[0051] Table 1 Example 1-Example 8

[0052]

[0053]

[0054] Comparative Examples 1-3

[0055] Comparative Examples 1-3 disclose a variety of water-based stripping solutions, the components and weight ratios of which are shown in Table 2, and the preparation methods thereof are the same as those of Example 1.

[0056] Table 2 Comparative Examples 1-3

[0057]

[0058]

[0059] The preparation method of the stripping solution of the present invention comprises the following steps:

[0060] The present embodiments 1-8 disclose a variety of aqueous photoresist stripping solutions, the components and weight ratios of which are shown in Table 1.

[0061] The preparation method of the aqueous photoresist stripping solution comprises the following steps:

[0062] Step 1: Weigh each component in its respective amount;

[0063] Step 2: Evenly mix the organic amine, polar solvent, metal resist and ultrapure water at room temperature, then add graphene oxide (GO) and electron-rich compound, and stir until uniform and transparent to obtain a water-based photoresist stripping solution.

[0064] How to use the peeling fluid:

[0065] Step 1: Heat the water-based photoresist stripping solution for the display panel to 60°C. After the temperature stabilizes, place the substrate in the stripping solution and continue to oscillate for 1 minute to obtain a stripped substrate;

[0066] Step 2: Rinse the above-stripped substrate with ultrapure water for at least two times for about 1 minute to remove the residual stripping solution, and finally blow dry with nitrogen to obtain a substrate with the photoresist removed.

[0067] About performance testing and description:

[0068] The following tests were performed on the aqueous stripping solutions of Examples 1-8 and Comparative Examples 1-3 respectively:

[0069] Among them, performance test method 1:

[0070] Step 1: Heat the stripping solution to 60°C. After the temperature stabilizes, place the substrate ( Mo / Al) was placed in the stripping solution and continuously shaken for 1 min;

[0071] Step 2: Rinse the stripped substrate with ultrapure water for at least two times (about 1 min) to remove the stripping solution residue, and finally dry it with nitrogen to obtain a substrate with the photoresist removed.

[0072] Finally, after the stripping solution was heated continuously for a certain period of time, the substrate was stripped for 1 min, washed with water, dried with nitrogen, split, and prepared for SEM inspection. The test results are shown in Figure 1-4 .

[0073] Performance test method 2:

[0074] The stripping solution was continuously heated at 60°C and the content of each component was tested every 8 hours. The test results are shown in Table 3.

[0075] Ultrapure water testing:

[0076] The detection instrument is a moisture detector; the detection method is the Karl Fischer volumetric method.

[0077] Organic amine and polar solvent detection:

[0078] The detection instrument is a gas chromatograph; the detector is a hydrogen flame ionization detector.

[0079] Metal resist inspection:

[0080] The detection instrument is a high performance liquid chromatograph; the detector is a UV detector with a detection wavelength of 270 nm.

[0081] Table 3 Test data

[0082]

[0083] Analysis of the test results:

[0084] Based on Table 3, it can be seen that after the water-based photoresist stripping solution for the display panel prepared in the embodiment of the present invention is continuously heated for 16 hours, the volatilization amount of each component is small, while the change amount of each component of the stripping solution of the comparative example is large.

[0085] Specifically:

[0086] In Comparative Example 1, since graphene oxide was not added, the ability of the electron-rich water-soluble compound to stabilize the stripping solution was limited, resulting in a significant decrease in the content of each component of the stripping solution after 16 hours.

[0087] In Comparative Example 2, since no electron-rich water-soluble compound is added, although graphene oxide has a good ability to stabilize the components of the stripping solution, the volatilization amount of each component is significantly increased compared with Example 1.

[0088] In Comparative Example 3, since no composite functional agent was added, the volatilization amount of each component of the stripping solution changed significantly.

[0089] Further comparison is made through the attached drawings in the specification:

[0090] Figure 1 This is a SEM image magnified 40,000 times after the stripping solution of Example 1 of the present invention was continuously heated for 12 hours; Figure 2 This is a SEM image magnified 40,000 times after the stripping solution of Example 1 of the present invention was continuously heated for 24 hours and then stripped.

[0091] from Figure 1 and Figure 2 It can be seen that after the stripping solution prepared in Example 1 of the present invention is continuously heated for 24 hours, there is still no obvious residue.

[0092] The SEM images of continuous heating for 12 h and 24 h using the stripping solution of Example 2-8 are basically the same, and no photoresist residue is found. Similarly, there is no obvious residue after continuous heating, which will not be listed here one by one.

[0093] Figure 3 4 is a SEM image of comparative example 1 of the present invention after stripping by continuous heating for 12 hours and magnified 40,000 times; 5 is a SEM image of comparative example 1 of the present invention after stripping by continuous heating for 24 hours and magnified 40,000 times.

[0094] and Figure 3 and Figure 4 It can be seen that the stripping solution in Comparative Example 1 has slight residue after continuous heating for 12 hours, and has more serious residue after continuous heating for 24 hours.

[0095] The composite functional agent used in the present invention comprises a combination of graphene oxide and an electron-rich water-soluble compound, wherein the electron-rich compound and the oxidized groups of graphene oxide interact with each other through electrostatic or hydrogen bonds to form a stable network structure, so that each molecule is more tightly connected in the solution and is not easily changed by temperature fluctuations, thereby better maintaining the overall stability of the aqueous photoresist stripping solution, achieving the effect of reducing the volatilization of the remaining components and reducing the operational risks in the manufacturing process, thereby extending the service life of the aqueous photoresist stripping solution.

[0096] The present invention is described exemplarily above in conjunction with the embodiments and drawings. It is obvious that the implementation of the present invention is not limited to the above-mentioned methods. As long as various improvements are made using the method concept and technical solution of the present invention, or the concept and technical solution of the present invention are directly applied to other occasions without improvement, they are all within the protection scope of the present invention.

Claims

1. A water-based photoresist stripping solution for a display panel, characterized in that: Calculated by weight, it includes the following components:

2. The aqueous photoresist stripping solution for display panel according to claim 1, characterized in that: The composite functional agent is a mixture of graphene oxide and an electron-rich water-soluble compound.

3. The aqueous photoresist stripping solution for display panel according to claim 2, characterized in that: The mass ratio of the graphene oxide to the electron-rich water-soluble compound is 1-5:

1.

4. The aqueous photoresist stripping solution for display panel according to claim 3, characterized in that: The electron-rich water-soluble compound is one or more of polyacrylamide, polyacrylic acid, polyvinyl pyrrolidone, polyvinyl alcohol, polymaleic anhydride, polyquaternary ammonium salt, polyethylene glycol and polyethylene imine.

5. The aqueous photoresist stripping solution for display panel according to claim 1, characterized in that: The organic amine is one or more of ethanolamine, N-methylethanolamine, diethanolamine, triethanolamine, isopropanolamine, 2-aminoethanolamine, ethyldiethanolamine, N,N-dimethylethanolamine, N,N-diethylethanolamine, N-(2-aminoethyl)ethanolamine, and diglycolamine.

6. The aqueous photoresist stripping solution for display panel according to claim 1, characterized in that: The polar solvent is one or more of N-methylformamide, N-methylpyrrolidone, dimethyl sulfoxide, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether.

7. The aqueous photoresist stripping solution for display panel according to claim 1, characterized in that: The metal anti-corrosion agent is one or more of glycerol, diethylene glycol, catechol, 4-methylcatechol, 4-tert-butylcatechol, 1,2,4-triazole, 3-amino-1,2,4-triazole, 4-amino-1,2,4-triazole, benzotriazole, mercaptobenzothiazole, imidazole and phosphine carboxylic acid.

8. A method for preparing an aqueous photoresist stripping solution for a display panel according to any one of claims 1 to 7, characterized in that The following steps are involved: Step 1: Weigh the respective amounts of each component; Step 2: uniformly mix all components except the composite functional agent at room temperature, then add the composite functional agent, and stir until uniform and transparent, thereby obtaining the aqueous photoresist stripping solution for the display panel.

9. A method for using the aqueous photoresist stripping solution for a display panel according to any one of claims 1 to 7, characterized in that The following steps are involved: Step 1: heating the display panel with a water-based photoresist stripping solution to 50-70° C., and after the temperature stabilizes, placing the substrate in the stripping solution and continuously shaking to obtain a stripped substrate; Step 2: Rinse the above-stripped substrate with ultrapure water at least twice to remove the stripping liquid residue, and finally blow dry with nitrogen to obtain a substrate with the photoresist removed.

10. Use of the aqueous photoresist stripping solution for display panels according to any one of claims 1 to 7 in removing photoresist from a panel.

Images