Polishing device for automobile part mold production

By introducing pretreatment, scraping and driving mechanisms into the polishing device, the problem of large-particle impurities in the polishing liquid flowing into the dresser is solved, the impurities are effectively intercepted and removed, the service life of the polishing device is extended and the polishing quality is improved.

CN120696908AInactive Publication Date: 2025-09-26CHENGDU PALIK TECH CO LTD

Patent Information

Application Number
CN202511107294.2
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-08-08
Publication Date
2025-09-26
Estimated Expiration
Not applicable · inactive patent

AI Technical Summary

Technical Problem

During the chemical mechanical polishing process, large-particle impurities in the polishing liquid easily flow to the bottom of the dresser, causing scratches on the object being polished and increasing the burden on the dresser. Existing technologies make it difficult to effectively intercept and remove these impurities.

Method used

A polishing device for automobile parts mold production is designed, which includes a pretreatment mechanism, a scraping mechanism and a driving mechanism. The pretreatment mechanism is used to intercept large-particle impurities in the polishing liquid, the scraping mechanism is used to scrape impurities attached to the filter, and the driving mechanism is used to drive the scraping mechanism to ensure the regeneration of the polishing liquid and reduce the processing pressure of the polishing mechanism.

Benefits of technology

Effectively intercept and remove large particle size impurities in the polishing liquid to prevent impurities from scratching the mold, extend the service life of the polishing pad and dresser, and improve polishing efficiency and quality.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN120696908A_ABST
    Figure CN120696908A_ABST
Patent Text Reader

Abstract

The invention discloses a polishing device for automobile part mold production, and relates to the technical field of chemical mechanical polishing, the polishing device comprises a case, a cavity penetrating through the upper end of the front face of the case, a case door is movably connected to the front face of the case and located on one side of the cavity through a hinge, and a polishing mechanism is installed in the cavity. A pretreatment mechanism, a scraping mechanism and a driving mechanism are arranged on the rear portion of the upper portion of the polishing mechanism, the pretreatment mechanism is used for intercepting and filtering polishing liquid obtained after polishing, large-particle-size impurities mixed in the polishing liquid due to polishing are removed, and the scraping mechanism is used for scraping the large-particle-size impurities attached to the pretreatment mechanism. Large-particle-size impurities in waste liquid can be filtered out, the large-particle-size impurities are prevented from flowing into the bottom of the trimmer, the treatment pressure of the trimmer is relieved, retention impurities and gelatinized slurry can be cleared away, and automobile part dies are prevented from being scratched by the residual impurities.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] The invention relates to the technical field of chemical mechanical polishing, in particular to a polishing device for producing automobile parts molds. Background Art

[0002] Chemical mechanical polishing (CMP) is a key precision surface treatment technology used to achieve global planarization of material surfaces. It utilizes both chemical etching and mechanical grinding to remove material from the substrate surface uniformly and with high precision. In the production of automotive parts molds, including some optical devices, the surface flatness requirements are extremely high, and CMP can meet these surface flatness requirements.

[0003] Patent document CN116061074A discloses a "chemical mechanical polisher, comprising a polishing head and a polishing cloth, wherein one or more trimming devices are fixed to the polishing head, wherein the trimming devices comprise a base, a clamping mechanism, and a brush head, wherein the base is fixed to the side of the polishing head, and the clamping mechanism is used to hold the front end of the brush head against the surface of the polishing cloth for rubbing when the polishing head and the polishing cloth cooperate to perform polishing. The chemical mechanical polisher of the present application can trim the polishing cloth while polishing, thereby preventing the polishing cloth from becoming enamelized during the polishing process, without sacrificing production capacity." Its dressing device has the same function as the dresser in the existing chemical mechanical polishing machine, which is to dress the surface of the polishing pad to prevent the surface of the polishing pad from being glazed. However, during the polishing process, impurities with particle sizes much larger than the polishing agent particle size in the polishing liquid will be generated. These impurities will flow to the bottom of the dresser as the polishing pad rotates, increasing the burden on the dresser. When the impurities return to the bottom of the polished object, the polished object will be scratched. Therefore, corresponding interception means are needed to intercept and filter the large-particle impurities formed after polishing to prevent large-particle impurities from flowing to the dresser and the bottom of the polished object. Summary of the Invention

[0004] The main purpose of the present invention is to provide a polishing device for automobile parts mold production, which can effectively solve the technical problems raised by the background technology.

[0005] To achieve the above object, the technical solution adopted by the present invention is:

[0006] A polishing device for the production of automobile parts molds, comprising a chassis, a cavity being provided through the upper end of the front side of the chassis, a door being movably connected to the front side of the chassis and located on one side of the cavity by a hinge, a polishing mechanism being installed inside the cavity, a pretreatment mechanism, a scraping mechanism and a driving mechanism being provided above and at the rear of the polishing mechanism, the pretreatment mechanism being used to intercept and filter the polishing liquid after polishing to remove large-particle impurities mixed in the polishing liquid due to polishing, the scraping mechanism being used to scrape off large-particle impurities attached to the pretreatment mechanism to avoid clogging of the pretreatment mechanism, and the driving mechanism being used to drive the scraping mechanism to operate.

[0007] Specifically, the interception and filtration of the pretreatment mechanism facilitates partial regeneration of the polishing liquid, while reducing the processing pressure of the polishing mechanism, which is conducive to removing retained impurities and gelled slurry, and avoiding residual impurities from scratching automobile parts molds.

[0008] As a further solution of the present invention, the polishing mechanism includes a liquid carrying plate, a polishing platform is provided inside the liquid carrying plate, a polishing pad is installed on the top of the polishing platform, a liquid supply system is provided above the polishing pad, and a trimmer, a liquid supply system and a polishing head are provided in sequence in a counterclockwise direction above the polishing pad without interfering with each other.

[0009] Specifically, it is beneficial to the regeneration of the grooves on the top of the polishing pad, avoiding clogging of the grooves and affecting the flow of the polishing liquid. At the same time, a pretreatment mechanism is set up for pretreatment, interception and filtration, which reduces the working pressure of the dresser and is beneficial to extending the service life of the polishing pad and the dresser.

[0010] As a further solution of the present invention, the pretreatment mechanism is located between the polishing head and the dresser, and the pretreatment mechanism includes a carrying pipe rack fixedly connected to the inner wall of the cavity, an electric telescopic rod is installed inside the pipe body of the carrying pipe rack, a pressure sensor is fixedly connected to the bottom of the piston rod of the electric telescopic rod, a fan-shaped substrate is fixedly connected to the bottom of the pressure sensor, a number of arc-shaped ceramic filter plates are fixedly connected to the bottom of the substrate, and a notch is opened at the rear of the bottom of the ceramic filter plate.

[0011] Specifically, avoid excessive pressure applied by the electric telescopic rod, which may cause the ceramic filter to over-press the polishing pad and damage the polishing pad; avoid excessive pressure applied by the electric telescopic rod, which may cause a large gap between the ceramic filter and the polishing pad, causing large particles of impurities to pass through the gap and flow into the bottom of the trimmer in large quantities, causing a burden.

[0012] As a further solution of the present invention, the scraping mechanism is arranged on the outside of the ceramic filter plate, and the scraping mechanism includes two relatively arranged base rods, the bottom of the base rod is fixedly connected to a fixed shaft, the outside of the fixed shaft is rotatably connected to a guide wheel, the bottom of the fixed shaft is fixedly connected to a scraping strip, the inner side of the scraping strip is in contact with the surface of the ceramic filter plate, the inside of the scraping strip is fixedly connected to a magnetic strip, and the magnetic strips inside the two relatively arranged scraping strips attract each other.

[0013] Specifically, the scraping strips are always pressed against the surface of the ceramic filter plate by the mutual attraction between the magnetic strips, thereby preventing the scraping strips from loosening during the process of scraping impurities.

[0014] As a further solution of the present invention, the scraping mechanism also includes a connecting rod for connecting the two base rods, the connecting rod is sleeved with the base rod, and both ends of the connecting rod are fixedly connected to a buffer spring. A buffer spring groove is provided at one end of the base rod, and the buffer spring groove is used to accommodate the connecting rod and the buffer spring. The end of the buffer spring is fixedly connected to the groove wall of the buffer spring groove, and a buffer groove is provided at the other end of the base rod. A buffer rod is movably inserted into the interior of the buffer groove, and the base rods between the two adjacent scraping mechanisms are movably connected through the buffer rod.

[0015] As a further solution of the present invention, the scraping mechanism also includes an isolation arc plate located at the top end of the front and back sides of the ceramic filter plate. The isolation arc plate is fixed to the substrate. The distance between the isolation arc plate and the ceramic filter plate is equal to the diameter of the guide wheel. A semi-cylindrical chamfer is provided at one end of the isolation arc plate close to the polishing head. A spring is fixed at one end of the isolation arc plate away from the polishing head. The total length of the spring and the isolation arc plate is less than the length of the ceramic filter plate. The ends of the two spring plates are tangent to the front and back sides of the ceramic filter plate respectively.

[0016] Specifically, when the base rod rotates counterclockwise around the driving mechanism from the rear end of the ceramic filter plate, the guide wheel rolls along the spring plate to the isolation arc plate. At this time, the scraper bar is separated from the surface of the ceramic filter plate, preventing the scraper bar from resetting and pushing impurities attached to the surface of the ceramic filter plate toward the direction of the polishing head.

[0017] As a further solution of the present invention, the pretreatment mechanism also includes a guide groove opened inside the base plate, the top view of the guide groove is a quarter of a sector, the base rod is slidingly connected to the guide groove, and several groups of limiting arc grooves are opened at the bottom of the guide groove. The width of the limiting arc groove is greater than the diameter of the fixed shaft, and the guide wheel is rollingly connected to the ceramic filter.

[0018] Specifically, the fixed shaft is limited by the limiting arc groove, and the space required for the fixed shaft to move is provided, so that the scraping mechanism can operate stably.

[0019] As a further solution of the present invention, the driving mechanism includes a rotating shaft, and the rotating shaft is rotatably connected to the base plate, a cam rod is fixed to the bottom of the rotating shaft, and a plurality of cam teeth are equidistantly fixed to the outside of the polishing platform, the cam rod and the cam teeth cooperate with each other, a limiting sleeve is fixed to the inner wall of the liquid carrying plate, and the limiting sleeve is located at the bottom of the cam rod and rotatably connected to it, a transfer rod is fixed to the outside of the rotating shaft, and the transfer rod is telescopically connected to one of the base rods through a buffer rod.

[0020] As a further solution of the present invention, the driving mechanism also includes a baffle fixed to the outside of the rotating shaft, the baffle is located directly above the transfer rod, an annular spring is fixed to one side of the baffle, an annular spring groove is opened inside the base plate, the annular spring is located inside the annular spring groove, and the end of the annular spring is fixed to the base plate.

[0021] Specifically, when the cam teeth follow the rotation of the polishing platform and disengage from the cam rod, the pressure on the cam rod is removed. At this time, under the action of the restoring force of the annular spring, the rotating shaft reverses, driving the scraping mechanism to reset, thereby facilitating the cyclic operation of the scraping mechanism.

[0022] As a further solution of the present invention, the polishing mechanism also includes a main shaft fixedly connected to the center of the bottom of the polishing platform, a leak-proof ring is fixedly connected to the center of the top of the liquid carrying plate, and the leak-proof ring and the main shaft are rotatably connected through a bearing, a plurality of support rods are fixedly connected to the top of the liquid carrying plate and the outer ring of the leak-proof ring, the top of the support rod is rollingly connected with a ball, a ball groove is provided through the bottom surface of the polishing platform, the ball is rollingly connected to the ball groove, the bottom inner wall of the liquid carrying plate is tilted forward, and a drain pipe is fixedly connected to the front of the bottom plate body through the liquid carrying plate.

[0023] Specifically, the balls roll inside the ball groove and are supported by the support rod, which facilitates the support of the polishing platform and improves the stability of the polishing platform during rotation. At the same time, a leak-proof ring is provided to intercept the polishing liquid to prevent leakage of the polishing liquid.

[0024] The beneficial effects of the present invention are:

[0025] 1. The present invention provides a pre-treatment mechanism to intercept and filter the waste liquid after polishing the top surface of the polishing pad, filtering out large-particle impurities in the waste liquid, preventing large-particle impurities from flowing into the bottom of the dresser, reducing the processing pressure of the dresser, facilitating the removal of retained impurities and gelled slurry, and preventing residual impurities from scratching the automotive parts mold;

[0026] 2. The scraping mechanism is set to scrape off the impurities attached to the outer surface of the ceramic filter to prevent the impurities from clogging the filter holes of the ceramic filter, making it easier for the ceramic filter to be desorbed and reused;

[0027] 3. By setting a driving mechanism to drive the scraping mechanism to operate, it is convenient for the scraping mechanism to scrape impurities, convenient for the scraping mechanism to reset, and conducive to the cyclic operation of the scraping mechanism. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 This is a schematic diagram of the overall structure of a polishing device for automobile parts mold production according to the present invention;

[0029] Figure 2 This is a schematic diagram of the internal structure of a cavity in a polishing device for producing automotive parts molds according to the present invention;

[0030] Figure 3 This is a schematic structural diagram of a pre-treatment structure in a polishing device for automobile parts mold production according to the present invention;

[0031] Figure 4 This is a cross-sectional view of a substrate in a polishing device for producing automotive parts molds according to the present invention;

[0032] Figure 5 This is an enlarged partial cross-sectional view of a pretreatment mechanism in a polishing device for automobile parts mold production according to the present invention;

[0033] Figure 6 This is a cutaway and exploded view of a scraping mechanism in a polishing device for producing automotive parts molds according to the present invention;

[0034] Figure 7 This is a schematic diagram of the connection between a scraping mechanism and a ceramic filter in a polishing device for producing automotive parts molds according to the present invention;

[0035] Figure 8 This is a schematic diagram of the connection between the driving mechanism and the scraping mechanism in a polishing device for automobile parts mold production according to the present invention;

[0036] Figure 9 This is a top view of a cam rod and cam teeth in a polishing device for producing automotive parts molds according to the present invention;

[0037] Figure 10 This is an enlarged view of the connection between the drive mechanism and the base plate in a polishing device for automobile parts mold production according to the present invention;

[0038] Figure 11 The present invention is a partial cross-sectional view of a polishing mechanism in a polishing device for producing automobile parts molds.

[0039] In the picture:

[0040] 1. Chassis; 2. Door; 3. Cavity;

[0041] 4. Polishing mechanism; 401. Liquid carrier plate; 402. Polishing platform; 403. Polishing pad; 404. Liquid supply system; 405. Dresser; 406. Polishing head; 407. Drain pipe; 408. Spindle; 409. Leak-proof collar; 410. Support rod; 411. Ball; 412. Ball groove;

[0042] 5. Pretreatment mechanism; 501. Pipe rack; 502. Electric telescopic rod; 503. Pressure sensor; 504. Base plate; 505. Ceramic filter; 506. Guide groove; 507. Arc limit groove;

[0043] 6. Scraping mechanism; 601. Base rod; 602. Connecting rod; 603. Buffer spring groove; 604. Buffer spring; 605. Buffer groove; 606. Buffer rod; 607. Fixed shaft; 608. Guide wheel; 609. Scraping strip; 610. Magnetic strip; 611. Isolation arc piece; 612. Spring piece;

[0044] 7. Driving mechanism; 701. Rotating shaft; 702. Cam rod; 703. Baffle; 704. Annular spring; 705. Transfer rod; 706. Annular spring groove; 707. Cam teeth; 708. Limit sleeve. DETAILED DESCRIPTION

[0045] In order to make the technical means, creative features, objectives and effects achieved by the present invention easier to understand, the present invention is further described below in conjunction with specific implementation methods.

[0046] like Figures 1-11 As shown, a polishing device for automobile parts mold production, please refer to Figure 1 and Figure 2 , including a chassis 1, a cavity 3 is opened through the front of the chassis 1 at the upper end, the front of the chassis 1 and on one side of the cavity 3 is connected to a box door 2 by a hinge, a polishing mechanism 4 is installed inside the cavity 3, and a pretreatment mechanism 5, a scraping mechanism 6 and a driving mechanism 7 are arranged above and behind the polishing mechanism 4. The pretreatment mechanism 5 is used to intercept and filter the polishing liquid after polishing, and remove large-particle impurities mixed in the polishing liquid due to polishing. The scraping mechanism 6 of the pretreatment mechanism 5 is used to scrape off large-particle impurities attached to the pretreatment mechanism 5 to avoid clogging of the pretreatment mechanism 5, and the driving mechanism 7 is used to drive the scraping mechanism 6 to operate.

[0047] Specifically, when polishing an automobile part mold, the automobile part mold is fixed in the polishing mechanism 4 for polishing treatment, and while polishing, the polishing liquid after polishing is intercepted and filtered by the pretreatment mechanism 5 to intercept large particle impurities formed in the polishing liquid after polishing. A part of the impurities follows the polishing liquid and flows toward the rear of the pretreatment mechanism 5, and the other part of the impurities adhere to the pretreatment mechanism 5. At the same time, the driving mechanism 7 drives the scraping mechanism 6 to rotate to scrape off the attached impurities to avoid impurities clogging the pretreatment mechanism 5. The interception and filtration of the pretreatment mechanism 5 facilitates the partial regeneration of the polishing liquid, and at the same time reduces the processing pressure of the polishing mechanism 4, which is conducive to removing retained impurities and gelled slurry, and avoids residual impurities scratching the automobile part mold.

[0048] Please refer to Figure 2 The polishing mechanism 4 includes a liquid carrying plate 401, a polishing platform 402 is arranged inside the liquid carrying plate 401, a polishing pad 403 is installed on the top of the polishing platform 402, a liquid supply system 404 is arranged above the polishing pad 403, and a dresser 405, a liquid supply system 404 and a polishing head 406 are arranged in a counterclockwise direction above the polishing pad 403 without interfering with each other.

[0049] Specifically, during the polishing process, the automobile parts mold is adsorbed on the bottom of the polishing head 406. When the polishing platform 402 drives the polishing pad 403 to rotate counterclockwise, the polishing head 406 rotates clockwise, and the liquid supply system 404 sprays the polishing liquid on the top of the polishing pad 403. The polishing head 406 moves downward to press the automobile parts mold on the top of the polishing pad 403 for polishing. After polishing, the polishing liquid moves to the pretreatment mechanism 5 with the rotation of the polishing pad 403 to be filtered, and then the top of the polishing pad 403 is trimmed by the dresser 405 to remove impurities in the groove at the top of the polishing pad 403 that were not successfully intercepted by the pretreatment mechanism 5, which is beneficial to the regeneration of the groove at the top of the polishing pad 403 and avoids clogging of the groove that affects the flow of the polishing liquid. At the same time, the pretreatment mechanism 5 is set to perform pretreatment interception and filtration, which reduces the working pressure of the dresser 405 and helps to extend the service life of the polishing pad 403 and the dresser 405.

[0050] Please refer to Figure 2 and Figure 3 The pretreatment mechanism 5 is located between the polishing head 406 and the dresser 405. The pretreatment mechanism 5 includes a carrying pipe rack 501 fixedly connected to the inner wall of the cavity 3. An electric telescopic rod 502 is installed inside the pipe body of the carrying pipe rack 501. The bottom of the piston rod of the electric telescopic rod 502 is fixedly connected to a pressure sensor 503. The bottom of the pressure sensor 503 is fixedly connected to a fan-shaped substrate 504. The bottom of the substrate 504 is fixedly connected to several arc-shaped ceramic filter discs 505, and a notch is opened at the rear of the bottom of the ceramic filter disc 505.

[0051] Specifically, when the polishing liquid after polishing is intercepted and filtered, the electric telescopic rod 502 is started to drive the pressure sensor 503, the substrate 504 and the ceramic filter 505 to descend synchronously, and the ceramic filter 505 is in a vertical posture and contacts the top surface of the polishing pad 403. As the polishing pad 403 rotates, most of the polishing liquid moves toward the direction of the pretreatment mechanism 5. After the polishing liquid moves to the position where the ceramic filter 505 is located, the polishing liquid is intercepted and filtered by the ceramic filter 505. After the large particle size impurities in the polishing liquid are intercepted by the ceramic filter 505, due to the rotation of the polishing pad 403, the polishing liquid continuously flows into the two adjacent ceramic In the channel between the filter plates 505, large-sized impurities follow a portion of the polishing liquid along the channel and flow to the rear, while the other portion of the polishing liquid passes through the ceramic filter plate 505 and flows to the position of the dresser 405. At the same time, the pressure is monitored in real time by the pressure sensor 503 to avoid excessive pressure applied by the electric telescopic rod 502, which causes the ceramic filter plate 505 to over-press the polishing pad 403 and damage the polishing pad 403, and to avoid excessive pressure applied by the electric telescopic rod 502, which causes a large gap between the ceramic filter plate 505 and the polishing pad 403, causing large particles of impurities to pass through the gap and flow into the bottom of the dresser 405 in large quantities, causing a burden.

[0052] Please refer to Figure 4 and Figure 6 The scraping mechanism 6 is arranged on the outside of the ceramic filter 505. The scraping mechanism 6 includes two relatively arranged base rods 601. The bottom of the base rod 601 is fixedly connected to a fixed shaft 607. The outside of the fixed shaft 607 is rotatably connected to a guide wheel 608. The bottom of the fixed shaft 607 is fixedly connected to a scraping bar 609. The inner side of the scraping bar 609 is in contact with the surface of the ceramic filter 505. The inside of the scraping bar 609 is fixedly connected to a magnetic strip 610, and the magnetic strips 610 inside the two relatively arranged scraping bars 609 attract each other.

[0053] Specifically, when the guide wheel 608 rolls on the surface of the ceramic filter 505, the scraper bar 609 moves along the surface of the ceramic filter 505 to scrape off impurities attached to the surface of the ceramic filter 505. At the same time, through the mutual attraction between the magnetic strips 610, the scraper bar 609 is always pressed against the surface of the ceramic filter 505, preventing the scraper bar 609 from loosening during the process of scraping impurities.

[0054] Please refer to Figure 6The scraping mechanism 6 also includes a connecting rod 602 for connecting the two base rods 601. The connecting rod 602 is sleeved with the base rod 601. Both ends of the connecting rod 602 are fixedly connected with a buffer spring 604. A buffer spring groove 603 is provided at one end of the base rod 601. The buffer spring groove 603 is used to accommodate the connecting rod 602 and the buffer spring 604. The end of the buffer spring 604 is fixedly connected to the groove wall of the buffer spring groove 603. A buffer groove 605 is provided at the other end of the base rod 601. A buffer rod 606 is movably inserted into the buffer groove 605. The base rods 601 between the two adjacent scraping mechanisms 6 are movably connected through the buffer rod 606.

[0055] Please refer to Figure 6 The scraping mechanism 6 also includes an isolation arc piece 611 located at the top of the front and back sides of the ceramic filter 505. The isolation arc piece 611 is fixedly connected to the substrate 504. The distance between the isolation arc piece 611 and the ceramic filter 505 is equal to the diameter of the guide wheel 608. A semi-cylindrical chamfer is provided at one end of the isolation arc piece 611 close to the polishing head 406. A spring piece 612 is fixedly connected to the end of the isolation arc piece 611 away from the polishing head 406. The total length of the spring piece 612 and the isolation arc piece 611 is less than the length of the ceramic filter 505. The ends of the two spring pieces 612 are tangent to the front and back sides of the ceramic filter 505 respectively, and the spring piece 612 is inclined toward the direction of the ceramic filter 505.

[0056] Specifically, when the base rod 601 rotates clockwise around the driving mechanism 7, the scraper 609 adheres to the surface of the ceramic filter 505 to scrape off the attached impurities. The scraped impurities follow the polishing liquid to flow toward the rear of the ceramic filter 505 and finally flow into the liquid carrier 401. After the scraper 609 moves to the position where the spring piece 612 is located, the guide wheel 608 pushes the spring piece 612 away and rolls to the rear of the spring piece 612. When the base rod 601 rotates counterclockwise around the driving mechanism 7 from the rear end of the ceramic filter 505, due to the inclined setting of the spring piece 612, the guide wheel 608 rolls along the outer surface of the spring piece 612 toward the outer side of the isolation arc piece 611. Since there is a certain gap between the isolation arc piece 611 and the ceramic filter 505, the scraper 609 09 can be detached from the surface of the ceramic filter 505 when resetting, so as to avoid the impurities attached to the surface of the ceramic filter 505 being pushed toward the direction of the polishing head 406 when the scraper 609 is reset, and in the process of resetting the scraper 609, the base rod 601 slides along the buffer rod 606, and the buffer spring 604 is stretched. When the guide wheel 608 rolls to the end of the isolation arc piece 611 and detaches, under the action of the elastic force of the buffer spring 604 and the magnetic force of the magnetic strip 610, the guide wheel 608 and the scraper 609 are re-attached to the surface of the ceramic filter 505, which is conducive to the recycling of the scraping mechanism 6, and when the guide wheel 608 rolls toward the isolation arc piece 611, it is guided by the semi-cylindrical chamfer at the end of the isolation arc piece 611 to avoid the guide wheel 608 from getting stuck.

[0057] Please refer to Figure 4 and Figure 5 The pretreatment mechanism 5 also includes a guide groove 506 opened inside the base plate 504. The top view of the guide groove 506 is a quarter of a sector. The base rod 601 is slidingly connected to the guide groove 506. A plurality of groups of limiting arc grooves 507 are opened at the bottom of the guide groove 506. The width of the limiting arc groove 507 is greater than the diameter of the fixed shaft 607. The guide wheel 608 is rollingly connected to the ceramic filter 505.

[0058] Specifically, during the operation of the scraping mechanism 6, the guide groove 506 provides the space required for the base rod 601 to rotate, and at the same time, the base rod 601 is limited by the guide groove 506, thereby improving the stability of the base rod 601 during movement. When the base rod 601 is telescopically moved, the fixed shaft 607 is limited by the limiting arc groove 507, and the space required for the fixed shaft 607 to move is provided, thereby facilitating the stable operation of the scraping mechanism 6.

[0059] Please refer to Figure 8 and Figure 9 The driving mechanism 7 includes a rotating shaft 701, and the rotating shaft 701 is rotatably connected to the base plate 504. A cam rod 702 is fixed to the bottom of the rotating shaft 701. A plurality of cam teeth 707 are equidistantly fixed to the outside of the polishing platform 402. The cam rod 702 and the cam teeth 707 cooperate with each other. A limiting sleeve 708 is fixed to the inner wall of the liquid carrying plate 401, and the limiting sleeve 708 is located at the bottom of the cam rod 702 and rotatably connected thereto. A transfer rod 705 is fixed to the outside of the rotating shaft 701, and the transfer rod 705 is telescopically connected to one of the base rods 601 through a buffer rod 606.

[0060] Please refer to Figure 10 The driving mechanism 7 also includes a baffle 703 fixed to the outside of the rotating shaft 701. The baffle 703 is located directly above the transfer rod 705. An annular spring 704 is fixed to one side of the baffle 703. An annular spring groove 706 is opened inside the base plate 504. The annular spring 704 is located inside the annular spring groove 706, and the end of the annular spring 704 is fixed to the base plate 504.

[0061] Specifically, when the polishing platform 402 rotates, the cam teeth 707 are driven to rotate synchronously. When the cam teeth 707 contact the cam rod 702, the cam teeth 707 move the cam rod 702, and then drive the rotating shaft 701 to rotate, and then drive the baffle 703 and the transfer rod 705 to rotate synchronously through the rotating shaft 701, thereby driving the scraping mechanism 6 to rotate to clean the ceramic filter 505. While the baffle 703 rotates, the annular spring 704 is compressed. When the cam teeth 707 follow the rotation of the polishing platform 402 and disengage from the cam rod 702, the pressure on the cam rod 702 is removed. At this time, under the action of the restoring force of the annular spring 704, the rotating shaft 701 reverses, driving the scraping mechanism 6 to reset, so as to facilitate the cyclic operation of the scraping mechanism 6.

[0062] Please refer to Figure 11 The polishing mechanism 4 also includes a main shaft 408 fixed to the center of the bottom of the polishing platform 402, a leak-proof ring 409 fixed to the center of the top of the liquid carrying plate 401, and the leak-proof ring 409 and the main shaft 408 are rotatably connected through a bearing, a plurality of support rods 410 are fixed to the top of the liquid carrying plate 401 and located on the outer ring of the leak-proof ring 409, and a ball 411 is rollingly connected to the top of the support rod 410, and a ball groove 412 is provided through the bottom surface of the polishing platform 402, and the ball 411 is rollingly connected to the ball groove 412, and the bottom inner wall of the liquid carrying plate 401 is tilted forward, and a drain pipe 407 is fixed to the front of the bottom plate body through the liquid carrying plate 401.

[0063] Specifically, the driving system inside the chassis 1 drives the main shaft 408 to rotate, thereby driving the polishing platform 402 to rotate. While the polishing platform 402 rotates, the ball 411 rolls inside the ball groove 412, and then the ball 411 is supported by the support rod 410, which facilitates the support of the polishing platform 402 and improves the stability of the polishing platform 402 during rotation. When the polishing liquid falls into the liquid loading tray 401, it flows along the inclined surface toward the position of the drain pipe 407, and is finally discharged through the drain pipe 407. At the same time, a leak-proof ring 409 is provided to intercept the polishing liquid to prevent leakage of the polishing liquid.

[0064] How it works

[0065] When polishing the automobile parts mold, the automobile parts mold is fixed in the polishing mechanism 4 for polishing, and while polishing, the polishing liquid after polishing is intercepted and filtered by the pretreatment mechanism 5. During the interception and filtration, the electric telescopic rod 502 is started to drive the pressure sensor 503, the substrate 504 and the ceramic filter 505 to descend synchronously, and the ceramic filter 505 is pressed vertically on the top surface of the polishing pad 403. At the same time, the pressure is monitored in real time by the pressure sensor 503 to avoid excessive pressure applied by the electric telescopic rod 502, which may cause The ceramic filter 505 over-presses the polishing pad 403, causing damage to the polishing pad 403. To prevent the pressure applied by the electric telescopic rod 502 from being too small, a large gap is formed between the ceramic filter 505 and the polishing pad 403, causing large particles of impurities to pass through the gap and flow into the bottom of the dresser 405 in large quantities, causing a burden. During the interception and filtration process, some impurities follow the polishing liquid and flow toward the rear of the pre-treatment mechanism 5, while other impurities adhere to the pre-treatment mechanism 5. At the same time, the driving mechanism 7 drives the scraping mechanism 6 to rotate. When the base rod 601 revolves around the driving mechanism 7, the base rod 601 will move along the driving mechanism 7. When the driving mechanism 7 rotates clockwise, the scraper 609 adheres to the surface of the ceramic filter 505 and scrapes off the attached impurities to prevent the impurities from clogging the pretreatment mechanism 5. When the base rod 601 rotates counterclockwise, the guide wheel 608 rolls along the spring 612 to the isolation arc piece 611. At this time, the scraper 609 is separated from the surface of the ceramic filter 505 to prevent the scraper 609 from resetting and pushing the impurities attached to the surface of the ceramic filter 505 toward the direction of the polishing head 406. When the guide wheel 608 rolls to the end of the isolation arc piece 611 and is separated, the buffer spring 6 04 and the magnetic force of the magnetic strip 610, the guide wheel 608 and the scraper strip 609 are re-attached to the surface of the ceramic filter 505, which is beneficial to the recycling of the scraping mechanism 6. Through the interception and filtration of the pretreatment mechanism 5, it is convenient for the partial regeneration of the polishing liquid, and at the same time reduces the processing pressure of the polishing mechanism 4, which is beneficial to the removal of retained impurities and gelled slurry, and avoids residual impurities from scratching the automotive parts mold. During the polishing process, the waste liquid falls into the liquid loading tray 401, flows along the inclined surface toward the position of the drain pipe 407, and is finally discharged through the drain pipe 407.

[0066] The basic principles, main features, and advantages of the present invention are shown and described above. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The above embodiments and descriptions are merely illustrative of the principles of the present invention. Various changes and modifications may be made to the present invention without departing from the spirit and scope of the present invention. Such changes and modifications are intended to fall within the scope of the present invention. The scope of protection claimed in the present invention is defined by the appended claims and their equivalents.

Claims

1. A polishing device for automobile parts mold production, comprising a chassis (1), a cavity (3) extending through the front of the chassis (1) near the upper end, a door (2) movably connected to the front of the chassis (1) and located on one side of the cavity (3) via a hinge, and characterized in that: A polishing mechanism (4) is installed inside the cavity (3), and a pretreatment mechanism (5), a scraping mechanism (6) and a driving mechanism (7) are arranged above and behind the polishing mechanism (4). The pretreatment mechanism (5) is used to intercept and filter the polishing liquid after polishing to remove large-particle impurities mixed in the polishing liquid due to polishing. The scraping mechanism (6) is used to scrape off large-particle impurities attached to the pretreatment mechanism (5) to avoid clogging of the pretreatment mechanism (5). The driving mechanism (7) is used to drive the scraping mechanism (6) to operate.

2. A polishing device for automobile parts mold production according to claim 1, characterized in that: The polishing mechanism (4) comprises a liquid carrier plate (401), a polishing platform (402) is arranged inside the liquid carrier plate (401), a polishing pad (403) is installed on the top of the polishing platform (402), a liquid supply system (404) is arranged above the polishing pad (403), and a dresser (405), a liquid supply system (404) and a polishing head (406) are arranged in a counterclockwise direction above the polishing pad (403) without interfering with each other.

3. The polishing device for automobile parts mold production according to claim 2, characterized in that: The pretreatment mechanism (5) is located between the polishing head (406) and the trimmer (405), and comprises a carrying pipe rack (501) fixedly connected to the inner wall of the cavity (3); an electric telescopic rod (502) is installed inside the pipe body of the carrying pipe rack (501); a pressure sensor (503) is fixedly connected to the bottom of the piston rod of the electric telescopic rod (502); a fan-shaped base plate (504) is fixedly connected to the bottom of the pressure sensor (503); a plurality of arc-shaped ceramic filter discs (505) are fixedly connected to the bottom of the base plate (504), and a notch is provided at the rear of the bottom of the ceramic filter discs (505).

4. The polishing device for automobile parts mold production according to claim 3, characterized in that: The scraping mechanism (6) is arranged outside the ceramic filter (505), and comprises two relatively arranged base rods (601). The bottom of the base rod (601) is fixedly connected to a fixed shaft (607), the outside of the fixed shaft (607) is rotatably connected to a guide wheel (608), the bottom of the fixed shaft (607) is fixedly connected to a scraping strip (609), the inner side of the scraping strip (609) is in contact with the surface of the ceramic filter (505), the interior of the scraping strip (609) is fixedly connected to a magnetic strip (610), and the magnetic strips (610) inside the two relatively arranged scraping strips (609) attract each other.

5. The polishing device for automobile parts mold production according to claim 4, characterized in that: The scraping mechanism (6) further comprises a connecting rod (602) for connecting two base rods (601), the connecting rod (602) being sleeved with the base rod (601), a buffer spring (604) being fixedly connected to both ends of the connecting rod (602), a buffer spring groove (603) being provided through one end of the base rod (601), the buffer spring groove (603) being used to receive the connecting rod (602) and the buffer spring (604), the end of the buffer spring (604) being fixedly connected to the groove wall of the buffer spring groove (603), a buffer groove (605) being provided through the other end of the base rod (601), a buffer rod (606) being movably inserted into the interior of the buffer groove (605), and the base rods (601) between two adjacent scraping mechanisms (6) being movably connected via the buffer rod (606).

6. The polishing device for automobile parts mold production according to claim 5, characterized in that: The scraping mechanism (6) further comprises an isolation arc piece (611) located at the top end of the front and back sides of the ceramic filter (505); the isolation arc piece (611) is fixedly connected to the base plate (504); the distance between the isolation arc piece (611) and the ceramic filter (505) is equal to the diameter of the guide wheel (608); a semi-cylindrical chamfer is provided at one end of the isolation arc piece (611) close to the polishing head (406); a spring piece (612) is fixedly connected to one end of the isolation arc piece (611) away from the polishing head (406); the total length of the spring piece (612) and the isolation arc piece (611) is less than the length of the ceramic filter (505); and the ends of the two spring pieces (612) are tangent to the front and back sides of the ceramic filter (505), respectively.

7. A polishing device for automobile parts mold production according to claim 6, characterized in that: The pretreatment mechanism (5) further comprises a guide groove (506) provided inside the base plate (504), wherein the top view of the guide groove (506) is in the shape of a quarter of a sector, the base rod (601) is slidably connected to the guide groove (506), a plurality of groups of limiting arc grooves (507) are provided at the bottom of the guide groove (506), the width of the limiting arc grooves (507) being greater than the diameter of the fixed shaft (607), and the guide wheel (608) is rollingly connected to the ceramic filter plate (505).

8. The polishing device for automobile parts mold production according to claim 3, characterized in that: The driving mechanism (7) comprises a rotating shaft (701), and the rotating shaft (701) is rotatably connected to the base plate (504); a cam rod (702) is fixedly connected to the bottom of the rotating shaft (701); a plurality of cam teeth (707) are fixedly connected to the outside of the polishing platform (402) at equal intervals; the cam rod (702) and the cam teeth (707) cooperate with each other; a limiting sleeve (708) is fixedly connected to the inner wall of the liquid carrier plate (401), and the limiting sleeve (708) is located at the bottom of the cam rod (702) and is rotatably connected thereto; a transfer rod (705) is fixedly connected to the outside of the rotating shaft (701); and the transfer rod (705) is telescopically connected to one of the base rods (601) via a buffer rod (606).

9. The polishing device for automobile parts mold production according to claim 8, characterized in that: The driving mechanism (7) further comprises a baffle (703) fixedly connected to the outside of the rotating shaft (701), the baffle (703) being located directly above the transfer rod (705), an annular spring (704) being fixedly connected to one side of the baffle (703), an annular spring groove (706) being provided inside the base plate (504), the annular spring (704) being located inside the annular spring groove (706), and an end of the annular spring (704) being fixedly connected to the base plate (504).

10. The polishing device for automobile parts mold production according to claim 2, characterized in that: The polishing mechanism (4) further comprises a main shaft (408) fixedly connected to the center of the bottom of the polishing platform (402); a leak-proof collar (409) fixedly connected to the center of the top of the liquid carrier plate (401); and the leak-proof collar (409) and the main shaft (408) are rotatably connected via a bearing; a plurality of support rods (410) are fixedly connected to the top of the liquid carrier plate (401) and the outer ring of the leak-proof collar (409); a ball (411) is rollingly connected to the top of the support rod (410); a ball groove (412) is provided through the bottom surface of the polishing platform (402); the ball (411) is rollingly connected to the ball groove (412); the bottom inner wall of the liquid carrier plate (401) is tilted forward; and a drain pipe (407) is fixedly connected to the front of the bottom plate body through the liquid carrier plate (401).

Citation Information

Patent Citations

  • Chemical mechanical polishing machine

    CN116061074A

Cited By

  • Polishing equipment for automobile part mold production

    CN121625006A