Posture-adjustable and contact force sensing detection platform

Abstract

The utility model belongs to the technical field of precision detection equipment, and discloses a posture adjustable and contact force sensing detection platform, which comprises a base platform, a multi-axis displacement platform, a posture adjusting assembly and a contact detection assembly, the multi-axis displacement table is arranged on the base table and comprises an X-axis adjusting mechanism, a Y-axis adjusting mechanism and a Z-axis adjusting mechanism. The posture adjusting assembly comprises a base, an objective table and a first driving mechanism; the contact detection assembly is erected on the support and located above the objective table. The contact detection assembly comprises a probe seat, a supporting plate, a pressure sensor and a flexible hinge; the probe seat is connected with the supporting plate through the pressure sensor, and the supporting plate is connected with the support through the flexible hinge. According to the structural design, multi-axis displacement adjustment and alignment of the objective table and the probe seat can be conveniently and flexibly achieved, and then the alignment precision and stability between the probe and a tested piece on the objective table are effectively improved.

Description

Technical Field

[0001] The utility model relates to the technical field of precision detection equipment, in particular to a posture-adjustable and contact force sensing detection platform. Background Art

[0002] When performing precision inspection on workpieces, it is necessary to continuously adjust the posture of the workpiece with multiple degrees of freedom until it is aligned with the contact detection component above. In this process, it is also necessary to ensure that when the contact detection component contacts the workpiece, the force on the contact detection component is uniform and there is no rigid collision with the workpiece below. At the same time, it can be easily adjusted. In response to the above requirements, it is urgent to design an attitude-adjustable and contact force sensing detection platform. Utility Model Content

[0003] The purpose of the utility model is to provide a posture-adjustable and contact force sensing detection platform, which can not only realize multi-axis adjustment of the loading platform, but also make the force on the probe more uniform through the arrangement of pressure sensors and flexible hinges in the contact detection component, while also effectively improving the alignment accuracy between the probe and the workpiece to be measured.

[0004] To achieve this purpose, the utility model adopts the following technical solutions:

[0005] A posture adjustable and contact force sensing detection platform, comprising:

[0006] A base, provided with a support frame;

[0007] A multi-axis translation stage, arranged on the base, comprising an X-axis adjustment mechanism, a Y-axis adjustment mechanism matched with the X-axis adjustment mechanism, and a Z-axis adjustment mechanism matched with the Y-axis adjustment mechanism;

[0008] A posture adjustment component is arranged above the Z-axis adjustment mechanism, and the posture adjustment component includes a base matched with the Z-axis adjustment mechanism, a stage rotatably connected to the base, and a first driving mechanism for driving the stage to rotate around the Z-axis;

[0009] A contact detection assembly is mounted on the bracket and located above the stage; the contact detection assembly includes a probe seat, a support plate, a pressure sensor, and a flexible hinge; the probe seat is connected to the support plate through the pressure sensor, and the support plate is connected to the bracket through a flexible hinge.

[0010] Among them, a connecting piece is provided on a side wall of the worktable opposite to the first driving mechanism, and the connecting piece includes a first connecting piece and a second connecting piece, one end of which is respectively fastened to the side wall of the worktable, and the first connecting piece is provided with a notch for avoiding the second connecting piece, and the other ends of the first connecting piece and the second connecting piece are respectively fastened to the driving end of the first driving mechanism.

[0011] Among them, the first driving mechanism includes a first motor fastened to the base, a first screw rod connected to the driving end of the first motor, a driving block connected to the first screw rod, and a tension spring arranged between the driving block and the first motor; the other ends of the first connecting plate and the second connecting plate after cross-matching are respectively connected to the two ends of the driving block.

[0012] Wherein, the X-axis adjustment mechanism includes first guide rails horizontally spaced apart along the X-axis direction of the base, a first linear motor arranged between two of the first guide rails, and a motion platform connected to the first linear motor and the first guide rails.

[0013] Wherein, the Y-axis adjustment mechanism includes a second guide rail arranged on the motion platform and along the Y-axis direction of the base, and a second linear motor arranged between two second guide rails; the second guide rail and the second linear motor are connected to the Z-axis adjustment mechanism.

[0014] Among them, the Z-axis adjustment mechanism includes an upper support seat and a lower support seat arranged at intervals, a wedge-shaped seat arranged between the upper support seat and the lower support seat and slidingly matched with the upper support seat and the lower support seat, a Z-axis guide mechanism arranged between the upper support seat and the lower support seat, and a second drive mechanism for driving the upper support seat to adjust up and down along the Z-axis guide mechanism when the wedge-shaped seat moves back and forth.

[0015] The base is fastened to the upper support seat, the upper surface of the base is parallel to the table surface of the stage, and an axial hole matching the rotating axis of the stage is provided in the middle of the base.

[0016] Wherein, the second driving mechanism includes a second motor fastened to the lower support seat, a threaded sleeve buried in a side wall of the frame of the wedge-shaped seat, and a second threaded rod with two ends respectively matched with the second motor and the threaded sleeve.

[0017] Wherein, both the front and back surfaces of the wedge-shaped seat are slidably connected with the corresponding upper support seat and the lower support seat through a third guide rail.

[0018] Wherein, the Z-axis guiding mechanism includes a guide seat fastened to the lower support seat, and a fourth guide rail fastened to the guide seat along the Z-axis direction of the base, and the fourth guide rail is slidably connected to the upper support seat.

[0019] Beneficial effects of the utility model: The utility model provides a posture adjustable and contact force sensing detection platform, including a base, a multi-axis displacement platform, a posture adjustment component and a contact detection component, wherein the base is provided with a bracket; the multi-axis displacement platform is arranged on the base, including an X-axis adjustment mechanism, a Y-axis adjustment mechanism, and a Z-axis adjustment mechanism; the posture adjustment component is arranged above the Z-axis adjustment mechanism, including a base matched with the Z-axis adjustment mechanism, a stage rotatably connected to the base, and a first driving mechanism for driving the stage to rotate around the Z-axis; the contact detection component is arranged on the bracket and located above the stage; the contact detection component includes a probe seat, a support plate, a pressure sensor, and a flexible hinge; the probe seat is connected to the support plate through the pressure sensor, and the support plate is connected to the bracket through the flexible hinge. With this structural design, the multi-axis adjustment and alignment of the stage and the probe seat can be conveniently and flexibly realized, thereby effectively improving the alignment accuracy and stability between the probe and the workpiece to be measured. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is an axonometric diagram of a posture-adjustable and contact force sensing detection platform of the utility model.

[0021] Figure 2 yes Figure 1 Axonometric view of the probe holder after separation from the support plate.

[0022] Figure 3 yes Figure 1 Axonometric view of the center Z-axis adjustment mechanism.

[0023] Figure 4 yes Figure 1 Axonometric view of the mid-stance adjustment assembly.

[0024] Figure 5 yes Figure 4 Exploded view of the mid-stance adjustment assembly.

[0025] Figure 6 yes Figure 2 A partial enlarged view of point A in the middle. DETAILED DESCRIPTION

[0026] The present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are only used to explain the present invention, rather than to limit the present invention. It should also be noted that, for ease of description, only the parts related to the present invention, rather than all structures, are shown in the accompanying drawings.

[0027] In the description of the present invention, unless otherwise clearly specified and limited, the terms "connected", "connected", and "fixed" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0028] In the present utility model, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may include that the first and second features are in direct contact, or may include that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, a first feature being "above", "above" and "above" a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. A first feature being "below", "below" and "below" a second feature includes that the first feature is directly below and obliquely below the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0029] In the description of this embodiment, the terms "upper", "lower", "right", etc., are based on the directions or positions shown in the drawings, and are only for the convenience of description and simplified operation, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as a limitation of the present invention. In addition, the terms "first" and "second" are only used to distinguish in the description and have no special meaning.

[0030] Combination Figures 1 to 6 As shown, the posture adjustable and contact force sensing detection platform provided in this embodiment is explained by taking a wafer probe platform as an example. The posture adjustable and contact force sensing detection platform can conveniently and flexibly adjust the axes of the stage through the arrangement of a multi-axis translation stage 2, a posture adjustment component 3, and a contact detection component 4. At the same time, the arrangement of a pressure sensor and a flexible hinge in the contact detection component 4 can effectively improve the alignment accuracy and stability between the probe and the wafer.

[0031] Specifically, the above-mentioned posture adjustable and contact force sensing detection platform includes a base 1, a multi-axis displacement platform 2, a posture adjustment component 3, and a contact detection component 4, wherein a bracket 5 is arranged on the table top of the base 1. Preferably, the bracket 5 is arranged as a gantry, and the contact detection component 4 is installed on the crossbeam of the gantry. The posture adjustment component 3 and the multi-axis displacement platform 2 for adjusting the position of the posture adjustment component 3 are arranged below the contact detection component 4.

[0032] Furthermore, the multi-axis translation table 2 is installed on the upper surface of the base 1, and the multi-axis translation table 2 includes an X-axis adjustment mechanism 21, a Y-axis adjustment mechanism 22 matched with the X-axis adjustment mechanism 21, and a Z-axis adjustment mechanism 23 matched with the Y-axis adjustment mechanism 22; preferably, the X-axis adjustment mechanism 21 includes a first guide rail 211 horizontally spaced along the X-axis direction of the base, a first linear motor 212 arranged between the two first guide rails 211, and a motion platform 213 connected to the first linear motor 212 and the first guide rail 211; the Y-axis adjustment mechanism 22 includes a second guide rail 221 arranged on the motion platform 213 and along the Y-axis direction of the base, and a second linear motor 222 arranged between the two second guide rails 221; wherein, the second guide rail 221 and the second linear motor 222 are connected to the Z-axis adjustment mechanism 23. With this structural design, the posture adjustment component 3 arranged above the Z-axis adjustment mechanism 23 is driven by the first linear motor 212 and the second linear motor 222 to move along the X-axis and Y-axis directions of the base, thereby aligning the posture adjustment component 3 with the contact detection component 4 above.

[0033] Furthermore, in order to adjust the contact force between the wafer and the probe, the above-mentioned Z-axis adjustment mechanism 23 includes an upper support seat 231 and a lower support seat 232 arranged at intervals, a wedge seat 233 arranged between the upper support seat 231 and the lower support seat 232 and slidingly matched with the upper support seat 231 and the lower support seat 232, a Z-axis guiding mechanism 234 arranged between the upper support seat 231 and the lower support seat 232, and a second driving mechanism 235 for driving the upper support seat 231 to adjust up and down along the Z-axis guiding mechanism 234 when the wedge seat 233 moves back and forth; preferably, both the front and back sides of the wedge seat 233 are slidably connected to the corresponding upper support seat 231 and the lower support seat 232 through a third guide rail; the Z-axis guiding mechanism 234 includes a guide seat 2341 fastened to the lower support seat 232, and a fourth guide rail 2342 fastened to the guide seat 2341 along the Z-axis direction of the base, and the fourth guide rail 2342 is slidably connected to the upper support seat 231. Further preferably, in order to facilitate the installation of the second driving mechanism 235, the above-mentioned upper support seat 231 and the wedge-shaped seat 233 are both arranged in a frame shape. The second driving mechanism 235 arranged in the frame and fastened to the lower support seat 232 includes a second motor 2351 fastened to the lower support seat 232, a wire sleeve 2352 buried in one side wall of the frame of the wedge-shaped seat 233, and a second screw rod 2353 whose two ends respectively cooperate with the second motor 2351 and the wire sleeve 2352.

[0034] The Z-axis adjustment mechanism 23 adopting the above-mentioned structural design drives the second screw rod 2353 to rotate through the second motor 2351, thereby driving the wedge-shaped seat 233 to move relative to the upper support seat 231 and the lower support seat 232, and then driving the upper support seat 231 to slide along the fourth guide rail 2342 set in the Z-axis direction of the base, so as to adjust the contact force between the worktable set above the Z-axis adjustment mechanism 23 and the probe in the contact detection assembly 4, and at the same time, the adjustment of the worktable along the Z-axis direction of the base is also realized.

[0035] Furthermore, as a preference, the above-mentioned posture adjustment component 3 includes a base 31 matched with the Z-axis adjustment mechanism 23, a stage 32 rotatably connected to the base 31, and a first driving mechanism 33 for driving the stage 32 to rotate around the Z-axis; wherein the base 31 is fastened to the upper support seat 231, the upper surface of the base 31 is parallel to the table surface of the stage, and an axial hole matched with the rotation axis of the stage 32 is opened in the middle of the base 31; in order to realize the angle adjustment of the stage 32 around the Z-axis direction of the base, a connecting rod is provided on the side wall of the above-mentioned stage 32 opposite to the first driving mechanism 33 The connecting piece 321 preferably includes a first connecting piece 321a and a second connecting piece 321b, each of which has one end fastened to the side wall of the stage 32, and the other ends of the first connecting piece 321a and the second connecting piece 321b are fastened to the driving end of the first driving mechanism 33, respectively. The first connecting piece 321a is provided with a notch for avoiding the second connecting piece 321b, so that the first connecting piece 321a and the second connecting piece 321b are cross-matched and fastened to the first driving mechanism 33, respectively, so that the stage 32 is driven to rotate through the traction of the first driving mechanism 33.

[0036] More specifically, the first driving mechanism 33 includes a first motor 331 fastened to the base 31, a first screw rod 332 connected to the driving end of the first motor 331, a driving block 333 connected to the first screw rod 332, and a tension spring 334 arranged between the driving block 333 and the first motor 331; the other ends of the first connecting piece 321a and the second connecting piece 321b after cross-matching are respectively connected to the two ends of the driving block 333. The setting of the tension spring 334 can compensate the shaking between the driving block 333 and the first screw rod 332 through elastic force, thereby making the movement of the driving block 333 more stable. The first driving mechanism 33 designed with this structure drives the driving block 333 to move back and forth along the length direction of the first screw rod 332 through the screw rod under the driving action of the motor, and then the first connecting piece 321a and the second connecting piece 321b are pulled by the driving block 333, driving the stage 32 to rotate around the shaft hole on the base 31. In this way, the adjustment of the angle a of the stage 32 around the Z axis is satisfied.

[0037] Furthermore, while the multi-axis adjustment of the stage 32 is satisfied by the above structure, in order to make the force on the probe and the wafer on the stage 32 more uniform when in contact and to be able to adjust the contact force between the probe and the wafer adaptively, the contact detection assembly 4 includes a probe seat 41, a support plate 42, a pressure sensor 43, and a flexible hinge 44; during installation, the probe seat 41 is connected to the support plate 42 through the pressure sensor 43, and the support plate 42 is connected to the crossbeam of the bracket 5 through the flexible hinge 44. The pressure sensor 43 can be electrically connected to an external electric control device, which is electrically connected to the first motor 331 and the second motor 2351 in the multi-axis translation stage 2 and the translation stage assembly 3, so that the displacement of the multi-axis translation stage 2 and the translation stage assembly 3 is controlled by the external electric control device through the pressure value fed back by the pressure sensor 43, so that the force on the multiple probes when in contact with the wafer is more uniform; at the same time, the contact force between the probe and the wafer can be adaptively adjusted through the setting of the flexible hinge 44.

[0038] The technical principle of the present invention is described above in combination with specific embodiments. These descriptions are only for explaining the principle of the present invention and cannot be interpreted as limiting the protection scope of the present invention in any way. Based on the explanations here, technicians in this field can think of other specific implementation methods of the present invention without creative work, and these methods will fall within the protection scope of the present invention.

Claims

1. A posture adjustable and contact force sensing detection platform, characterized in that: include: A base, provided with a support frame; A multi-axis translation stage, arranged on the base, comprising an X-axis adjustment mechanism, a Y-axis adjustment mechanism matched with the X-axis adjustment mechanism, and a Z-axis adjustment mechanism matched with the Y-axis adjustment mechanism; A posture adjustment component is arranged above the Z-axis adjustment mechanism, and the posture adjustment component includes a base matched with the Z-axis adjustment mechanism, a stage rotatably connected to the base, and a first driving mechanism for driving the stage to rotate around the Z-axis; A contact detection assembly is mounted on the bracket and located above the stage; the contact detection assembly includes a probe seat, a support plate, a pressure sensor, and a flexible hinge; the probe seat is connected to the support plate through the pressure sensor, and the support plate is connected to the bracket through a flexible hinge.

2. The posture adjustable and contact force sensing detection platform according to claim 1, characterized in that: A connecting piece is provided on a side wall of the worktable opposite to the first driving mechanism, and the connecting piece includes a first connecting piece and a second connecting piece, each of which has one end fastened to the side wall of the worktable, and the first connecting piece has a notch for avoiding the second connecting piece, and the other ends of the first connecting piece and the second connecting piece are fastened to the driving end of the first driving mechanism respectively.

3. The posture adjustable and contact force sensing detection platform according to claim 2, characterized in that: The first driving mechanism includes a first motor fastened to the base, a first screw rod connected to the driving end of the first motor, a driving block connected to the first screw rod, and a tension spring arranged between the driving block and the first motor; the other ends of the first connecting plate and the second connecting plate after cross-matching are respectively connected to the two ends of the driving block.

4. The posture adjustable and contact force sensing detection platform according to claim 1, characterized in that: The X-axis adjustment mechanism includes first guide rails horizontally spaced apart along the X-axis direction of the base, a first linear motor disposed between two of the first guide rails, and a motion platform connected to the first linear motor and the first guide rails.

5. The posture adjustable and contact force sensing detection platform according to claim 4, characterized in that: The Y-axis adjustment mechanism includes a second guide rail arranged on the motion platform and along the Y-axis direction of the base, and a second linear motor arranged between two of the second guide rails; the second guide rail and the second linear motor are connected to the Z-axis adjustment mechanism.

6. The posture adjustable and contact force sensing detection platform according to claim 1, characterized in that: The Z-axis adjustment mechanism includes an upper support seat and a lower support seat arranged at intervals, a wedge-shaped seat arranged between the upper support seat and the lower support seat and slidingly matched with the upper support seat and the lower support seat, a Z-axis guide mechanism arranged between the upper support seat and the lower support seat, and a second drive mechanism for driving the upper support seat to adjust up and down along the Z-axis guide mechanism when the wedge-shaped seat moves back and forth.

7. The posture adjustable and contact force sensing detection platform according to claim 6, characterized in that: The base is fastened to the upper support seat, the upper surface of the base is parallel to the table surface of the stage, and an axis hole matching with the rotating axis of the stage is opened in the middle of the base.

8. The posture adjustable and contact force sensing detection platform according to claim 6, characterized in that: The second driving mechanism includes a second motor fastened to the lower support seat, a threaded sleeve buried in a side wall of the frame of the wedge-shaped seat, and a second threaded rod with two ends respectively matched with the second motor and the threaded sleeve.

9. The posture adjustable and contact force sensing detection platform according to claim 6, characterized in that: Both the front and back surfaces of the wedge-shaped seat are slidably connected with the corresponding upper support seat and the lower support seat through a third guide rail.

10. The posture adjustable and contact force sensing detection platform according to claim 6, characterized in that: The Z-axis guiding mechanism includes a guide seat fastened to the lower supporting seat, and a fourth guide rail fastened to the guide seat along the Z-axis direction of the base, and the fourth guide rail is slidably connected to the upper supporting seat.

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