Low temperature liquid boronizing agent and boronizing process

Abstract

The invention relates to the field of metal surface treatment, in particular to a low-temperature liquid boronizing agent and a boronizing process. The low-temperature liquid boronizing agent comprises, by mass, 25%-45% of borax, 2%-4% of potassium fluoborate, 0.4%-0.6% of cerium chloride and the balance water. Compared with the prior art, the low-temperature liquid boronizing agent and the boronizing process have the beneficial effects that after co-penetration, workpiece deformation is smaller, phase change and internal stress are avoided, and application of the low-temperature liquid boronizing agent to a precision part is greatly promoted; a low-temperature co-penetration layer is thicker and about 70-80 [mu]m, and the application field is wide; the activity of boron atoms in the liquid boronizing agent is improved, the diffusion rate is increased, and the economy is good; and the cerium chloride for catalyzing penetration is added, and the boronizing temperature can be effectively lowered.

Description

technical field

[0001] The invention relates to the field of metal surface treatment, in particular to a low-temperature liquid boronizing agent and a boronizing process. Background technique

[0002] Metal materials play a vital role in human production and life. During the use of metal materials, due to wear, corrosion and oxidation loss, the amount of metal loss and waste is huge every year. In order to improve the wear resistance and Corrosion resistance, people have adopted a variety of surface modification techniques. The borides of many metals are compounds with high melting point, high hardness and strong corrosion resistance. The boronized layer obtained by boronizing not only has high hardness and good wear resistance, but also has good corrosion resistance and high temperature resistance, so people Boronizing is commonly used to improve the surface properties of metal materials.

[0003] At present, the common boronizing methods include solid boronizing, salt ba...

Examples

Embodiment 1

[0026] The low-temperature boronizing process steps of the present invention are as follows: (1) Weigh the components of the boronizing agent according to the proportion, mix them evenly, and set aside. The proportion of the boronizing agent is 35% of borax, 3% of potassium fluoroborate, and 0.5% of cerium chloride. %, the rest is deionized water, and the above percentages are mass percentages;

[0027] (2) Nano-processing the surface of the sample;

[0028] (3) Decontaminate the surface of the nano-sized sample;

[0029] (4) Put the boronizing agent and the treated sample into the infiltration tank, seal the infiltration tank, and the material of the infiltration tank is polytetrafluoroethylene;

[0030] (5) Put the seepage tank into the solenoid, heat it with alternating current, control the temperature at 280-320°C, keep it warm for 24 hours, and the pressure inside the seepage tank is 3MPa; cool to room temperature, and take out the sample.

example 2

[0032] The low-temperature boronizing process steps of the present invention are as follows: (1) Weigh the components of the boronizing agent according to the proportion, mix them evenly, and set aside. The proportion of the boronizing agent is 35% of borax, 2% of potassium fluoroborate, and 0.6% of cerium chloride %, the rest is deionized water, and the above percentages are mass percentages;

[0033] (2) Nano-processing the surface of the sample;

[0034] (3) Decontaminate the surface of the nano-sized sample;

[0035] (4) Put the boronizing agent and the treated sample into the infiltration tank, seal the infiltration tank, and the material of the infiltration tank is polytetrafluoroethylene;

[0036] (5) Put the seepage tank into the solenoid, heat it with alternating current, control the temperature at 280-320°C, keep it warm for 24 hours, and the pressure inside the seepage tank is 3MPa; cool to room temperature, and take out the sample.

Embodiment 3

[0038] The low-temperature boronizing process steps of the present invention are as follows: (1) Weigh the components of the boronizing agent according to the proportion, mix them evenly, and set aside. The proportion of the boronizing agent is 35% of borax, 2.5% of potassium fluoroborate, and 0.55% of cerium chloride %, the rest is deionized water, and the above percentages are mass percentages;

[0039] (2) Nano-processing the surface of the sample;

[0040] (3) Decontaminate the surface of the nano-sized sample;

[0041] (4) Put the boronizing agent and the treated sample into the infiltration tank, seal the infiltration tank, and the material of the infiltration tank is polytetrafluoroethylene;

[0042] (5) Put the seepage tank into the solenoid, heat it with alternating current, control the temperature at 280-320°C, keep it warm for 24 hours, and the pressure inside the seepage tank is 3MPa; cool to room temperature, and take out the sample.

technical field

[0001] The invention relates to the field of metal surface treatment, in particular to a low-temperature liquid boronizing agent and a boronizing process. Background technique

[0002] Metal materials play a vital role in human production and life. During the use of metal materials, due to wear, corrosion and oxidation loss, the amount of metal loss and waste is huge every year. In order to improve the wear resistance and Corrosion resistance, people have adopted a variety of surface modification techniques. The borides of many metals are compounds with high melting point, high hardness and strong corrosion resistance. The boronized layer obtained by boronizing not only has high hardness and good wear resistance, but also has good corrosion resistance and high temperature resistance, so people Boronizing is commonly used to improve the surface properties of metal materials.

[0003] At present, the common boronizing methods include solid boronizing, salt ba...

Examples

Embodiment 1

[0026] The low-temperature boronizing process steps of the present invention are as follows: (1) Weigh the components of the boronizing agent according to the proportion, mix them evenly, and set aside. The proportion of the boronizing agent is 35% of borax, 3% of potassium fluoroborate, and 0.5% of cerium chloride. %, the rest is deionized water, and the above percentages are mass percentages;

[0027] (2) Nano-processing the surface of the sample;

[0028] (3) Decontaminate the surface of the nano-sized sample;

[0029] (4) Put the boronizing agent and the treated sample into the infiltration tank, seal the infiltration tank, and the material of the infiltration tank is polytetrafluoroethylene;

[0030] (5) Put the seepage tank into the solenoid, heat it with alternating current, control the temperature at 280-320°C, keep it warm for 24 hours, and the pressure inside the seepage tank is 3MPa; cool to room temperature, and take out the sample.

example 2

[0032] The low-temperature boronizing process steps of the present invention are as follows: (1) Weigh the components of the boronizing agent according to the proportion, mix them evenly, and set aside. The proportion of the boronizing agent is 35% of borax, 2% of potassium fluoroborate, and 0.6% of cerium chloride %, the rest is deionized water, and the above percentages are mass percentages;

[0033] (2) Nano-processing the surface of the sample;

[0034] (3) Decontaminate the surface of the nano-sized sample;

[0035] (4) Put the boronizing agent and the treated sample into the infiltration tank, seal the infiltration tank, and the material of the infiltration tank is polytetrafluoroethylene;

[0036] (5) Put the seepage tank into the solenoid, heat it with alternating current, control the temperature at 280-320°C, keep it warm for 24 hours, and the pressure inside the seepage tank is 3MPa; cool to room temperature, and take out the sample.

Embodiment 3

[0038] The low-temperature boronizing process steps of the present invention are as follows: (1) Weigh the components of the boronizing agent according to the proportion, mix them evenly, and set aside. The proportion of the boronizing agent is 35% of borax, 2.5% of potassium fluoroborate, and 0.55% of cerium chloride %, the rest is deionized water, and the above percentages are mass percentages;

[0039] (2) Nano-processing the surface of the sample;

[0040] (3) Decontaminate the surface of the nano-sized sample;

[0041] (4) Put the boronizing agent and the treated sample into the infiltration tank, seal the infiltration tank, and the material of the infiltration tank is polytetrafluoroethylene;

[0042] (5) Put the seepage tank into the solenoid, heat it with alternating current, control the temperature at 280-320°C, keep it warm for 24 hours, and the pressure inside the seepage tank is 3MPa; cool to room temperature, and take out the sample.