Protective device, wafer transport container having at least one protective device, protective system and method having the protective device
By introducing a protective device of the positive mating unit and reset element into the wafer transport container, the unexpected opening problem during failure is solved, and the protection effect of high safety and low complexity is achieved, avoiding production interruptions and cost increase.
Patent Information
- Application Number
- CN201880090997.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2018-03-22
- Publication Date
- 2025-01-07
- Estimated Expiration
- 2038-03-22
AI Technical Summary
The existing wafer transport container protection device is difficult to effectively prevent accidental opening in the event of a failure, resulting in damage to the contents of the wafer transport container and damage to external components, and is likely to lead to production shutdowns and high costs in a highly automated production environment.
A protective device including a mating unit is designed, which ensures that the wafer transport container opening element remains in a closed position when the closing mechanism fails, and realizes mechanically drive-free through the chamber and pressure connection channel. Protect state and reduce complexity.
The high-level anti-malfunction performance, functional safety and operational safety of wafer transport containers are achieved, avoiding damage to contents and devices, and reducing production interruptions and maintenance costs.
Smart Images

Figure CN111819677B_ABST
Abstract
Description
Technical Field
[0001] The invention relates to a protective device according to the preamble of claim 1 , a wafer transport container having at least one protective device according to claim 18 , a protective system according to claim 21 and a method of using a protective device according to claim 23 . Background Art
[0002] Protective devices are known from the prior art.
[0003] In particular, the object of the invention is to provide a universal device with advantageous protective properties. This object is achieved according to the invention by the features of claims 1, 18, 21 and 23, while advantageous embodiments and further developments of the invention are obtained according to the dependent claims. Summary of the invention
[0004] The present invention proposes a protection device, in particular a protection device for a wafer transport container, having at least one positive-fit unit, which is configured to be at least used to protect a wafer transport container opening element of the wafer transport container, and the wafer transport container opening element is maintained in its closed position by a closing mechanism.
[0005] By implementing the protection device according to the invention, advantageous protection characteristics are achieved in particular, in particular with regard to fail-safe behavior. This advantageously allows achieving a high level of fault-proofing, functional safety and / or operational safety, in particular for the wafer transport container. Advantageously, unintentional opening of the wafer transport container, in particular damage to the contents of the wafer transport container, such as falling out, can be avoided, in particular in the event of a malfunction of the closing mechanism of the wafer transport container. This also advantageously allows avoiding damage to the wafer transport container, in particular to the wafer transport container opening element and / or external elements, which may be hit by falling parts. In addition, the degree of exposure of the contents of the wafer transport container to the ambient atmosphere surrounding the wafer transport container can be advantageously reduced, as a result of which particles contained in the ambient atmosphere can in particular be at least partially prevented from entering the interior of the wafer transport container. Advantageously, costs due to damage to the contents of the wafer transport container, damage to the wafer transport container itself and / or damage to external elements can be avoided. Particularly in highly automated wafer production environments, components lying loosely about and / or falling off without control will lead to production stoppages and, consequently, to significant costs due to damage and / or blockages of machines and / or transport paths, costs which can advantageously be avoided by implementing appropriate protection using protective devices.
[0006] A "protective device" is understood in particular to be a device configured to protect at least one closing mechanism, wherein the closing mechanism and the protective device are preferably implemented separately from each other. In particular, the protective device is configured to protect a wafer transport container, which has been closed by a closing mechanism, to prevent accidental and / or unintentional opening, especially in the event of a malfunction of the closing mechanism. In particular, the safety element of the protective device is engaged only in the event of a malfunction of the closing mechanism, in particular a complete malfunction. In particular, the closing mechanism and the protective device, in particular the positive fitting unit, use different functions and / or different physical forces, such as pressure and / or friction, to protect the wafer transport container opening element in the closed position. In particular, the protective device, in particular the positive fitting unit of the protective device, implements a redundant closing mechanism with respect to the closing mechanism. In particular, the protective device, in particular the positive fitting unit of the protective device, at least partially implements different redundancies with respect to the closing mechanism. In particular, the protective device, in particular the positive fitting unit of the protective device, is configured to protect the closing mechanism by means of passive redundancies and / or spare redundancies. Alternatively, the protective device, in particular the positive fitting unit of the protective device, can also be implemented at least partially as a uniform redundancy with respect to the closing mechanism. “Configuration” refers in particular to specific programming, design and / or provisioning. An object configured for a specific function should be understood in particular to mean that the object realizes and / or implements the specific function in at least one application state and / or operating state.
[0007] A "wafer transport container" refers in particular to a transport container having a closable inner space, wherein the inner space is configured to accommodate at least one wafer. In particular, the wafer transport container is configured at least for transporting wafers having a diameter of at least 200 mm, preferably at least 300 mm, and preferably at least 450 mm. In particular, the wafer transport container is configured at least for transporting at least one wafer, preferably at least three wafers, advantageously at least five wafers, particularly advantageously at least ten wafers, preferably at least twenty-five wafers and preferably not more than one hundred wafers. In particular, the wafer transport container is implemented to be portable. In particular, the wafer transport container is embodied to be vacuum-sealable. Preferably, the wafer transport container is a vacuum wafer transport container, which is particularly configured to generate and / or maintain a vacuum environment therein. In particular, the wafer transport container is configured to store wafers under a vacuum environment. A "vacuum environment" is in particular an atmospheric environment, which should be understood as an atmospheric environment having a pressure lower than 300 hPa, preferably lower than 1 hPa, preferably lower than 10 -3 hPa and preferably below 10 -6 hPa. In particular, the wafer transport container has a high level of sealing in a vacuum environment, wherein in particular the leakage rate of the wafer transport container is less than 10 -4 mbar*l / s, preferably less than 10 -5 mbar*l / s, advantageously less than 10 -6mbar*l / s, particularly advantageously less than 10 -7 mbar*l / s, preferably less than 10 -8 mbar*l / s and preferably less than 10 -9 mbar*l / s. Alternatively, the wafer transport container may be configured to store and / or hold wafers in a standard atmosphere and / or a specific combination of atmospheric environments such as a nitrogen atmosphere. The closing mechanism is particularly implemented as a vacuum closing mechanism. In particular, in a properly closed state, the wafer transport container opening element is maintained in a closed position by atmospheric pressure. In a properly closed state, the pressure inside the wafer transport container is less than the pressure outside the wafer transport container, so the closing force of the wafer transport container depends on the pressure difference between the inside of the wafer transport container and the external atmospheric environment. Alternatively, the closing mechanism may also be embodied as a mechanical closing mechanism and / or a magnetic closing mechanism. "Closed position" refers in particular to the positioning area of the wafer transport container opening element, in particular the position of the wafer transport container opening element, wherein the wafer transport container opening element at least substantially closes the interior of the wafer transport container, preferably completely closed, in particular by positioning the wafer transport container opening element near the opening of the substrate of the wafer transport container and / or by directly adjacent the wafer transport container opening element to the opening of the substrate. The wafer transport container opening element is embodied in particular as a lid, which is embodied in particular in a manner that is completely detachable from the base body of the wafer transport container and / or removable therefrom. Alternatively, the wafer transport container opening element can be embodied as a cover plate and / or a sliding element. Preferably, the wafer transport container opening element forms the bottom plate of the wafer transport container. It is conceivable that the wafer transport container comprises more than one wafer transport container opening element, wherein preferably all closing mechanisms of the wafer transport container opening elements are protected by a protective device.
[0008] A "positive-fitting unit" is particularly understood to be a unit that is configured to achieve a positive-fitting connection for protection by means of a protective device. A "positive-fitting connection" refers in particular to the at least partial geometric engagement of two structural components, in particular two structural components of the positive-fitting unit, preferably for force transmission. The positive-fitting unit is particularly embodied as a locking rod unit, preferably comprising at least one locking rod element and at least one locking rod recess, wherein the locking rod element can be engaged into the locking rod recess, in particular for the purpose of implementing and / or preparing a positive-fitting connection. "Preparing for a positive-fitting connection" is particularly understood to mean that the locking rod element is located in a cavity implemented by the locking rod recess without contacting the walls of the locking rod recess. "Implementing a positive-fitting connection" is particularly understood to mean that the locking rod element is located in a cavity implemented by the locking rod recess in a manner that contacts the walls of the locking rod recess. In particular, the positive-fitting unit implements an emergency locking of the wafer transport container opening element, which is particularly configured to keep the wafer transport container opening element in a closed position in the event of failure of the closing mechanism.
[0009] A positive-fitting unit is further proposed, comprising at least one positive-fitting recess and at least one positive-fitting element, wherein the positive-fitting recess and the positive-fitting element are configured to be connected to each other in a contactless manner under appropriate protection, in particular in a protective state of the protective device and in a non-protective state of the protective device. This allows in particular to achieve advantageous protection characteristics, which can in particular lead to a high level of fault-proofing, functional safety and / or operational safety of the wafer transport container, while advantageously avoiding particles generated, for example, by friction. In particular in clean room environments and / or vacuum environments, minimizing the number of particles provides great advantages, which can avoid damage to sensitive workpieces (such as wafers) and / or leakage of seals (such as vacuum seals). Advantageously, the contact of the positive-fitting recess with the positive-fitting element and the possible generation of particles therefore only occur in a protective situation in which the closing mechanism fails and the protective device is in effect.
[0010] The positive-fitting recess in particular implements a locking rod recess, a locking rod opening and / or a locking rod engagement. The positive-fitting element in particular implements a protrusion, which is configured to engage in the positive-fitting recess for protection. In particular, the positive-fitting element implements a locking rod element. The positive-fitting element is in particular embodied relative to the positive-fitting recess, in particular for establishing and / or releasing a positive-fitting connection. Alternatively, the positive-fitting recess may be embodied as moving relative to the positive-fitting element, in particular for establishing and / or releasing a positive-fitting connection. "Appropriate protection" in particular refers to protecting the wafer transport container opening element in a stable and / or vacuum-tight manner by means of a closing mechanism, in particular during the storage phase and / or the transportation phase. "Appropriate release of the protective state" in particular refers to a controlled release implemented according to a given pattern of the wafer transport container opening element of the wafer transport container base. The appropriate release of the protective state is preferably performed in a state where the wafer transport container is connected to the loading and / or unloading station. By the positive-fitting recess and the positive-fitting element being “connected to one another in a contactless manner” is to be understood in particular that the positive-fitting recess and the positive-fitting element have no points of mutual contact when protection is established by the positive-fitting unit and / or when protection is maintained by the positive-fitting unit.
[0011] If the protective device is at least partially embodied in one piece with the wafer transport container, in particular in one piece with the base body of the wafer transport container, a high degree of safety can advantageously be achieved, in particular the loss of the protective device and / or forgetting to install the protective device can be advantageously avoided. "Integrally embodied" in particular means at least connected by a material-to-material bond, for example via a welding process, a gluing process, an injection molding process and / or other processes that appear suitable to a person skilled in the art, and / or advantageously formed as a single piece, for example manufactured via a casting and / or manufactured via a component or a plurality of component injection molding processes, and advantageously manufactured from a single blank.
[0012] In addition, the present invention proposes that the protection device includes at least one reset element, which is configured to make the positive fitting unit, in particular the positive fitting element, at least partially re-deflect to the protection position and / or keep the positive fitting unit, in particular the positive fitting element, in the protection position. This advantageously allows the high safety of the protection device to be achieved, in particular in terms of fail-safe functions. In particular, in this way, the protection state is advantageously implemented as a basic state. In addition, in this way, it is advantageous to autonomously establish the protection position after the protection is released and / or after the effective release is terminated. The reset element is preferably embodied as an elastically deformable element, such as a spring, wherein in particular, the spring can be particularly embodied as a flexible spring, a compression spring, a coil spring, a torsion spring, an air spring and / or a gas compression spring. Alternatively or additionally, the reset element may also include a reset element different from the spring, such as mutually repelling magnets and / or an element made of an elastically deformable material, such as rubber. In addition, the reset element, the positive fitting element and / or the positive fitting recess can be alternatively moved, controlled and / or adjusted by an actuating motor. A “protective position” is embodied in particular as a position of a positive-fitting unit, in particular a position of a positive-fitting element, in which the closing mechanism is protected and / or the positive-fitting element engages in a positive-fitting recess, in particular in a contactless manner.
[0013] It is further proposed that the protective device comprises at least one chamber, which can be particularly hermetically isolated from the environment and comprises a pressure connection channel configured to allow the internal pressure in the chamber to vary relative to a reference pressure, wherein the pressure difference is calculated based on the internal pressure of the chamber and the reference pressure and is configured to influence the protective state of the positive matching unit. In this way, advantageous protective performance can be achieved in particular. In addition, a particularly advantageous method for setting a positive matching unit can be produced, which method is particularly free of mechanical drive components, thereby advantageously reducing complexity. In addition, it is advantageously possible to use an already existing vacuum system to operate the positive matching unit, thereby advantageously reducing complexity. "Chamber" is particularly embodied as a hollow space that is at least mostly enclosed in a structural component, in particular in a protective device. "Most" particularly refers to at least 51%, preferably at least 88%, advantageously at least 75%, preferably at least 85%, and particularly preferably at least 95%. In particular, the chamber is implemented as a vacuum seal except for the pressure connection channel. In particular, the chamber is configured to be evacuated in at least one operating state of the protective device. The pressure connection channel is configured at least as a connection between the interior of the chamber and the environment and / or atmosphere outside the chamber. The pressure connection channel is embodied in particular as a hole in the chamber wall, a penetration in the chamber wall, an opening of the chamber, a pipeline, a flexible tube and / or another channel-forming connection between the inside and outside of the chamber. Preferably, the pressure connection channel is oriented toward the connecting element of the vacuum pump unit, in particular vertically downward. In the connection of the protective device to the vacuum pump unit, in particular in the connection of the wafer transport container to the loading and / or unloading station, the pressure connection channel is configured to be vacuum-tightly connected to the suction element of the vacuum pump unit. The connection of the pressure connection channel and the suction element is preferably implemented simultaneously and / or automatically with the connection of the wafer transport container to the loading and / or unloading station. In particular, the suction element is integrally embodied with the vacuum clamping device of the loading and / or unloading station, which is configured to tension the wafer transport container with the loading and / or unloading station by negative pressure. The suction element is preferably embodied as an opening of the channel of the vacuum clamping device. In particular, the pressure connection channel does not have a coupling element for coupling to the vacuum pump unit, in particular a separate coupling element. In particular, the connection of the pressure connecting channel to the suction element is achieved by direct contact between the opening of the pressure connecting channel and the opening of the suction element. Separating the individual coupling elements advantageously reduces complexity. "Change in the pressure inside the chamber" refers in particular to a reduction and / or increase in the pressure inside the chamber by at least 80%. "Reference pressure" refers in particular to ambient pressure, preferably standard atmospheric pressure, such as 1013.25 hPa, and preferably clean room atmospheric pressure, for example 1013.35 hPa. The safeguarding status is particularly implemented as a safeguarded state of a protective device and / or a non-safeguard state of a protective device, in particular of a positive matching unit."Protection situation affected by pressure difference" is to be understood in particular as meaning that the protective state of the protection device and / or the non-protective state of the protection device is generated depending on the pressure difference, wherein, particularly preferably, in the case of a large pressure difference exceeding 80% of a reference pressure, the non-protective state occurs in particular automatically, and / or in the case of a low pressure difference, in particular a pressure difference below 80% of the reference pressure, the protective state occurs in particular automatically.
[0014] If at least one resetting element is arranged at least mostly inside the chamber, this advantageously allows a compact structure. "At least mostly inside" is to be understood in particular as at least 51%, preferably at least 66%, advantageously at least 75%, particularly advantageously at least 85%, preferably at least 95% and particularly preferably 100%.
[0015] It is further proposed that the positive-fitting unit comprises at least one positive-fitting element which is movably supported, wherein the position of the positive-fitting element relative to at least one chamber wall of the chamber, in particular the chamber wall on which the reset element is supported, depends on the pressure difference. In this way, an actuation of the positive-fitting unit can advantageously be achieved, in particular for the purpose of protecting the closing mechanism, without a mechanical actuation element. This advantageously allows the particle generation to be kept at a low level. Alternatively, the positive-fitting recess can be supported in a movably manner according to the pressure difference. In particular, the position comprises at least two stable positions, wherein in a first stable position, the positive-fitting element is at least partially and / or contactlessly engaged in the positive-fitting recess, and in a second stable position, the positive-fitting element is not engaged with the positive-fitting recess. The movement between the first stable position and the second stable position is particularly implemented continuously and / or without stable intermediate positions.
[0016] If the positive-fitting unit, in particular the positive-fitting element, is configured to assume a non-protective position when the pressure difference exceeds a limit pressure difference, the normal state of the positive-fitting unit can advantageously be achieved, in particular the normal state of the positive-fitting unit is automatically caused, and this normal state is established if the pressure connection channel is open to the environment, and is realized as a protective state of the protective device. This advantageously allows a high degree of safety, in particular when the protective device, in particular the wafer transport container, is in a storage state and / or a transport state. The "limit pressure difference" is in particular implemented as a pressure difference, wherein the pressure acting on the positive-fitting element due to the pressure difference between the internal pressure of the chamber and the reference pressure has a value at least substantially the same as the reset force, in particular the spring force of the reset element. In particular, the limit pressure difference is at least greater than 80% of the ambient pressure, preferably at least greater than 90%, preferably at least greater than 95% and particularly preferably at least greater than 99%, which is preferably the standard atmospheric pressure of 1013.25 hPa and preferably the clean room atmospheric pressure of 1013.35 hPa.
[0017] It is further proposed that the protective device comprises at least one further chamber, which has an internal pressure which is the same as the ambient pressure in the protective state of the protective device and in the non-protective state of the protective device. This advantageously allows an internal pressure difference to be generated within the protective device. In addition, the volume of the chamber to be evacuated can advantageously be kept small, whereby a high adjustment speed of protecting the positive fitting unit and / or releasing the protection of the positive fitting unit can advantageously be achieved. In particular, the chamber and the further chamber have at least one common chamber wall, which is preferably embodied as vacuum-tight and / or movable. In particular, the internal volume of the chamber and / or the further chamber is variable, in particular depending on the position of the movable chamber wall between the chamber and the further chamber. The further chamber is in particular permanently open to the environment. The internal pressure in the further chamber corresponds in particular to the reference pressure.
[0018] In addition, it is proposed that the protective device comprises at least one movably supported setting element, which at least partially delimits the chamber and the further chamber. This advantageously allows a movement to be generated that depends on the respective internal pressures of the chamber and the further chamber, in particular independently of the electrical and / or mechanical drive element. The setting element is in particular embodied as a common chamber wall of the chamber and the further chamber. The setting element is in particular supported in an airtight manner. The setting element is in particular embodied as an airtightly sealed, translationally movable piston. The position of the setting element in the protective device and the volume of the chamber and the further chamber depend on the pressure difference between the chamber and the further chamber.
[0019] If the setting element is configured to vary depending on the pressure difference between the internal pressures of the chamber and the further chamber, the internal volume of the chamber and / or the internal volume of the further chamber, an already existing vacuum system can advantageously be used to operate the positive fitting unit, thereby advantageously reducing complexity.
[0020] It is also proposed that the protective device comprises at least one additional further chamber which is configured to have an internal pressure different from the ambient pressure, in particular the reference pressure, in at least one operating state, in particular in the non-protective state of the protective device. This advantageously allows the pressure distribution within the protective device to be optimized.
[0021] If the protective device comprises a linear bearing configured to allow a translational movement of the positive-fitting unit, in particular the positive-fitting element and / or the positive-fitting recess, a high level of mobility of at least a part of the positive-fitting unit can advantageously be provided. In addition, the particle generation can be kept at a low level by means of the linear bearing. The linear bearing is in particular embodied as a plain bearing and / or a ball bearing. It is also conceivable that the linear bearing is at least partially integrated with the positive-fitting unit, in particular at least integrated with a guide element, in particular a support rod, guiding the positive-fitting element.
[0022] Furthermore, if the pressure connection channel is configured to be connected in particular in a gas-tight manner without flexible tubes and / or without separate connecting elements, at least the chamber has a vacuum clamping device of a loading and / or unloading station, which is configured to load at least at least one wafer into a wafer transport container and / or unload it from a wafer transport container, advantageously making it possible to use an already existing vacuum system to operate the matching unit, thereby advantageously helping to reduce complexity.
[0023] In addition, it is proposed that the protective device comprises at least one emergency protection and / or emergency release element, which is particularly embodied as a cam mechanism and is configured for manual emergency protection and / or emergency release of the protective device, in particular the positive mating unit. In this way, manual operation of the protective device can be advantageously provided, thereby advantageously allowing an operator to easily intervene, for example in an emergency situation.
[0024] If the emergency protection and / or emergency release element is at least partially arranged in the further chamber, this advantageously allows a compact structure. In particular, the emergency protection and / or emergency release element cannot be completely removed from the further chamber. In particular, in the event of an emergency release, the emergency protection and / or emergency release element is at least partially moved out of the further chamber. The emergency protection and / or emergency release element is in particular visible from outside the protective device. In particular, if the emergency protection and / or emergency release element has been actuated to establish a manual non-protection state, this can be easily perceived from the outside. This advantageously allows avoiding accidental continuous manual releases. The emergency protection and / or emergency release element "at least partially arranged in another chamber" should be understood in particular as meaning that in the normal state the emergency protection and / or emergency release element is not pulled out in particular due to manual release of the protection device, in particular the shape-fitting unit, and at least 50% of the volume of the emergency protection and / or emergency release element is surrounded by the chamber wall of the other chamber, preferably at least 65% of the volume, preferably at least 75% of the volume, preferably at least 75% of the volume, and particularly preferably not more than 90% of the volume, and / or in the non-protective state of the protection device, in particular the positive fitting unit, caused by pulling out the emergency protection and / or emergency release element, at least 35% of the volume of the emergency protection and / or emergency release element is surrounded by the chamber wall of the other chamber, preferably at least 50% of the volume, preferably at least 65% of the volume, and particularly preferably not more than 80% of the volume.
[0025] It is also proposed that the protective device comprises at least one status sensor, which is configured to sense the protective state of the protective device, in particular the position of a positive mating element of a positive mating unit of the protective device. This advantageously allows an automatic and / or electronic readout of the protective state, thereby facilitating in particular remote monitoring. In addition, a high level of operational safety can advantageously be achieved, in particular an automatic check of the protective state of the protective device, in particular of the positive mating unit, can be provided, for example before removing and / or opening the opening element of the wafer transport container by means of a loading and / or unloading station. This advantageously allows the risk of damage due to a malfunction of the protective device to be reduced. The status sensor is in particular embodied as a magnetic sensor. Alternatively or additionally, the status sensor may comprise at least one optical sensor, such as a camera and / or a light barrier, and / or a contact sensor.
[0026] Furthermore, a wafer transport container is proposed, having at least one protective device, which is configured to prevent the complete removal of the wafer transport container opening element from the base of the wafer transport container under protective conditions, in particular in the event of failure of the closing mechanism of the wafer transport container. By means of the embodiment of the wafer transport container according to the invention, advantageous protective characteristics can be achieved in particular, in particular with regard to fail-safe behavior. In this way, a high level of fail-safety, functional safety and / or operational safety, in particular of the wafer transport container, can be advantageously achieved. It is conceivable that the protective device allows partial removal of the wafer transport container opening element and / or allows a reduction in the pressure that presses the wafer transport container opening element on the base of the wafer transport container. In particular, the protective device of the wafer transport container may include a plurality of individually embodied protective modules, each of which has at least one positively mating unit, which protects the closing mechanism of the wafer transport container opening element. In particular, the protective modules of the protective device individually embodied are preferably arranged circumferentially around the wafer transport container opening element and / or around the base of the wafer transport container in a regularly spaced manner. In particular, a protective condition is provided if the closing mechanism does not and / or is unable to hold the wafer transport container opening element in the closed position in an operational state in which the wafer transport container is not coupled to a loading and / or unloading station.
[0027] In the case where the at least one protective device is embodied integrally with the base body of the wafer transport container, a simple structure can advantageously be achieved.
[0028] Furthermore, it is proposed that the wafer transport container, in particular at least the wafer transport container opening element, comprises at least one positively fitting recess which implements an additional pressure connection channel which is configured for evacuating an additional further chamber of the protective device. This advantageously allows a simple connection of at least one chamber of the protective device, in particular an additional further chamber of the protective device, to a vacuum pump system.
[0029] Furthermore, a protection system, in particular a vacuum protection system, is proposed, having at least one protection device, having a wafer transport container and having a loading and / or unloading station, which is configured at least for loading wafers into the wafer transport container and / or unloading them from the wafer transport container. Embodiments of the protection system according to the invention in particular allow advantageous safety properties to be achieved, in particular with regard to fail-safe behavior. In this way, a high level of fail-safety, functional safety and / or operational safety, in particular of the wafer transport container, can advantageously be achieved.
[0030] If the protection system includes a vacuum pump unit configured to at least be used to vacuum clamp the wafer transport container on the loading and / or unloading station in the loading and / or unloading position and to change the internal pressure in the chamber, the complexity can be advantageously kept low, and in particular, only one vacuum system is advantageously required, rather than two separate vacuum systems. In addition, it is advantageously possible to easily adjust the respective suction rates to each other to change the internal pressure in the chamber and to vacuum clamp each other. This advantageously allows to ensure that the safety elements of the protection device, in particular the positive matching unit, are only released when the wafer transport container is successfully and / or correctly fixed on the loading and / or unloading station by the vacuum clamping device. In particular, the connection between the vacuum pump unit and the pressure connection channel of the chamber is established only when the wafer transport container is successfully and / or correctly fixed on the loading and / or unloading station. In particular, the vacuum pump unit includes a single pump, which is configured to complete two tasks, in particular the vacuum clamping work and the release of the protection device, in particular the positive matching unit. Alternatively, the vacuum pump unit may include multiple pumps for different tasks.
[0031] In addition, a method for using a protective device with at least one positive-fitting unit is proposed, wherein a wafer transport container opening element of a wafer transport container is held in its closed position by a closing mechanism and protected by the positive-fitting unit. In particular, embodiments of the method according to the invention allow advantageous protective properties to be achieved, in particular with regard to fail-safe behavior. In this way, a high level of fail-safety, functional safety and / or operational safety, in particular of the wafer transport container, can be advantageously achieved.
[0032] It is further proposed that the protection and / or release of the positively mating unit is achieved by a change in the internal pressure in the chamber of the protection device. In this way, the complexity can advantageously be kept at a low level, in particular because a separate mechanical and / or electrical drive unit can be omitted.
[0033] It is further proposed that, in the event of a fault-free normal operation of the closing mechanism, the wafer transport container opening element is protected in a contactless manner by a positive fitting unit, wherein, in the event of a fault in the closing mechanism, a contact between the positive fitting unit, in particular the positive fitting element of the positive fitting unit, and the wafer transport container opening element is established to keep the wafer transport container opening element near the closed position. This advantageously allows the generation of particles to be avoided in the event of a fault-free normal operation, in particular because surface friction is avoided in the event of a fault-free normal operation and in the protection and / or release of the positive fitting unit. In particular, in the event of a fault in the closing mechanism, the wafer transport container opening element is detached from the base of the wafer transport container. As a result, the wafer transport container opening element moves away from the opening of the wafer transport container, for example due to gravity. The movement of the wafer transport container opening element results in the contact of the positive fitting element of the positive fitting unit with the positive fitting recess of the wafer transport container opening element, as a result of which the wafer transport container opening element remains near its original position. The aforementioned vicinity is realized in particular to include an area where the wafer transport container opening element in its closed position deviates from its closed position by a maximum of 10 mm, preferably a maximum of 5 mm, advantageously a maximum of 3 mm, preferably not more than 2 mm and particularly preferably at least 0.5 mm in at least one direction, preferably perpendicular to the main extension plane of the wafer transport container opening element. The "main extension plane" of the structural unit is to be understood in particular as a plane which is parallel to the maximum side area of the smallest imaginary rectangular cuboid that just encloses the structural unit and in particular extends through the center point of the cuboid.
[0034] The protective device according to the invention, the wafer transport container according to the invention, the protective system according to the invention and the method according to the invention are not limited to the above-mentioned applications and implementation forms. In particular, in order to implement the functions described herein, the protective device according to the invention, the wafer transport container according to the invention, the protective system according to the invention and the method according to the invention may include a plurality of corresponding elements, structural components and units and method steps different from the numerical values mentioned here. BRIEF DESCRIPTION OF THE DRAWINGS
[0035] Further advantages will become apparent from the following description of the drawings. In the drawings, exemplary embodiments of the invention are shown. The drawings, the description and the claims contain a combination of several features. A person skilled in the art will purposefully consider these features individually and find further advantageous combinations. Among them:
[0036] Figure 1 is a schematic diagram of a protection system according to the invention, which has a protection device according to the invention, a wafer transport container and a loading and / or unloading station;
[0037] Figure 2 is a schematic top view of the protection system;
[0038] Figure 3 is a cross-sectional view of the protection system, wherein the protection device is in a protection state;
[0039] Figure 4 is a cross-sectional view of the protection system, wherein the protection device is in a non-protective state;
[0040] Figure 5 is a cross-sectional view of the protective device in a non-protective state caused by the emergency protection element and / or the emergency release element of the protective device; and
[0041] Figure 6 is a flow chart of a method according to the present invention. DETAILED DESCRIPTION
[0042] Figure 1 A protection system 56 with a protection device is shown. The protection system 56 is implemented as a vacuum protection system. The protection device is implemented as a protection device for a wafer transport container. The protection device includes three protection modules 60 (also refer to Figure 2 ). Alternatively, the protection device may include a plurality of protection modules 60 other than three. The protection system 56 includes a wafer transport container 16. The wafer transport container 16 is configured to store and / or transport wafers 46. The wafer transport container 16 is configured to vacuum transport wafers 46. The wafer transport container 16 is implemented in a vacuum sealable manner. The wafer transport container 16 is implemented as a vacuum wafer transport container.
[0043] The wafer transport container 16 includes a base 52. The base 52 surrounds most of the interior of the wafer transport container 16. The base 52 has an opening 62 (see Figure 3 ). The wafers 46 stored in the wafer transport container 16 can be taken out of the wafer transport container 16 and / or introduced into the wafer transport container 16 through the opening 62. The diameter of the opening 62 is larger than the diameter of the wafer 46. The wafer transport container 16 includes a wafer transport container opening element 14 (see Figure 3 The wafer transport container opening element 14 is configured to close the opening 62 of the wafer transport container 16. The wafer transport container opening element 14 is implemented in a manner that it can be removed from the base 52. The protective device is configured to prevent the wafer transport container opening element 14 from being completely removed from the base 52 of the wafer transport container 16 under protective conditions.
[0044] The protection system 56 includes a loading and / or unloading station 44. The loading and / or unloading station 44 is configured to load wafers 46 into and / or unload wafers 46 from the wafer transport container 16. In order to load and / or unload the wafers 46, the loading and / or unloading station 44 opens the wafer transport container 16 by releasing the wafer transport container opening element 14 from the base 52. In order to open the wafer transport container 16, the loading and / or unloading station 44 moves the wafer transport container opening element 14 along a loading and / or unloading direction 64. The loading and / or unloading direction 64 extends at least substantially perpendicular to the main extension plane of the wafer transport container opening element 14. When opening, the wafer transport container opening element 14 is lowered into the interior of the loading and / or unloading station 44 by the loading and / or unloading station 44. During the loading and / or unloading of the wafer transport container 16, the interior space of the base 52 is vacuum-tightly connected to the interior space of the loading and / or unloading station 44. The loading and / or unloading station 44 is configured to transport the wafers 46 unloaded from the wafer transport container 16 onward to at least one processing module (not shown) and / or at least one transport module (not shown).
[0045] The protection system 56 includes a vacuum pump unit 58. The vacuum pump unit 58 is configured to vacuum clamp the wafer transport container 16 in the loading and / or unloading position on the loading and / or unloading station 44. The vacuum pump unit 58 includes a vacuum pump 66. The vacuum pump unit 58 includes a vacuum clamp 42. The vacuum pump 66 is configured to generate a negative pressure of the vacuum clamp 42. The vacuum clamp 42 is configured to securely hold the wafer transport container 16 in the intended loading and / or unloading position relative to the surface 68 of the loading and / or unloading station 44 by the negative pressure.
[0046] Figure 2 A top view of the protective system 56 is shown. The vacuum clamping device 42 comprises a vacuum clamping element 70. The vacuum clamping device 42 comprises a corresponding vacuum clamping element 72. The vacuum clamping element 70 is arranged on the loading and / or unloading station 44. The vacuum clamping element 70 is embodied as a channel-shaped deepening in the surface 68 of the loading and / or unloading station 44. The corresponding vacuum clamping element 72 is arranged on the wafer transport container 16. The corresponding vacuum clamping element 72 is embodied as an ear-shaped flat protrusion protruding horizontally from the base body 52. In the loading and / or unloading position, the corresponding vacuum clamping element 72 completely covers the vacuum clamping element 70. During vacuum clamping, the vacuum pump unit 58 generates a negative pressure between the vacuum clamping elements 70, 72, resulting in the pressure caused by the ambient pressure pressing the corresponding vacuum clamping element 72 against the vacuum clamping element 70. Due to the negative pressure between the vacuum clamping elements 70, 72, the base body 52 is firmly pressed against the surface 68 of the loading and / or unloading station 44.
[0047] The protection system 66 includes an alignment mechanism 74. The alignment mechanism 74 is configured to align the wafer transport container 16 relative to the loading and / or unloading station 44. The alignment mechanism 74 includes a plurality of protrusions 76 implemented in a bolt-like manner. The protrusions 76 are arranged on the base 52 of the wafer transport container 16. The alignment mechanism 74 includes a plurality of cavities 78, each cavity 78 being configured to receive a corresponding protrusion 76. The cavities 78 are arranged on the surface 68 of the loading and / or unloading station 44.
[0048] Figure 3 The protection system 56 is shown extending centrally through the protection module 60 and Figure 2 The cross section of the cross section indicated by the reference numeral A in FIG. Figure 3 In the illustrated situation, the wafer transport container 16 and the loading and / or unloading station 44 are in a non-coupled state. Figure 3 In the illustrated case, the protective device is in a protective state. The wafer transport container 16 includes a closing mechanism 12. The closing mechanism 12 is configured to keep the wafer transport container opening element 14 in a closed position. The closing mechanism 12 is implemented as a vacuum closing mechanism. In the closed position, the wafer transport container opening element 14 closes the opening 62 of the base 52 of the wafer transport container 16. Due to the vacuum in the internal space of the wafer transport container 16, the wafer transport container opening element 14 is pressed against the base 52 of the wafer transport container 16 by external pressure. The closing mechanism 12 includes a sealing element 80. The sealing element 80 of the closing mechanism 12 is configured to seal the closing mechanism 12 at least substantially in an airtight manner. The sealing element 80 of the closing mechanism 12 is implemented as an O-ring. Alternatively or additionally, the sealing element 80 of the closing mechanism 12 may include a lip seal and / or a vulcanized seal.
[0049] The protection device comprises a positive engagement unit 10. The positive engagement unit 10 is configured for securing a wafer transport container opening element 14 of a wafer transport container 16, which is held in its closed position by a closing mechanism 12.
[0050] The positive-fitting unit 10 includes a positive-fitting recess 18. The positive-fitting recess 18 is configured to partially accommodate a positive-fitting element 20 of the positive-fitting unit 10. The positive-fitting recess 18 is implemented as a groove in the wafer transport container opening element 14. Alternatively, the positive-fitting recess 18 may have any other shape, preferably suitable for the shape of the positive-fitting element 20. In the connected state of the wafer transport container 16 and the loading and / or unloading station 44, the positive-fitting recess 18 is open to the inner space of the loading and / or unloading station 44. The positive-fitting unit 10 includes a positive-fitting element 20. The positive-fitting element 20 is configured to be partially engaged in the positive-fitting recess 18. The positive-fitting element 20 is partially implemented as a rod-shaped locking rod. The positive-fitting recess 18 and the positive-fitting element 20 are configured to be connected to each other in a non-contact manner under appropriate protection. The positive-fitting recess 18 and the positive-fitting element 20 are configured to be connected to each other in a contact manner in the event of an unexpected failure of the closing mechanism 12.
[0051] The protection module 60 includes a module base 82. The module base 82 forms a portion of the outer boundary of the protection module 60. The positive mating element 20 is partially arranged in the module base 82. The positive mating element 20 is partially surrounded by the module base 82. The module base 82 includes an opening 84. The positive mating element 20 partially extends through the opening 84 of the module base 82. The positive mating element 20 does not contact the opening 84 of the module base 82. In this way, particle generation can be advantageously kept at a low level when the positive mating element 20 moves.
[0052] The protective device is partially implemented as an integral part of the wafer transport container 16. The protective device is implemented as an integral part of the base 52 of the wafer transport container 16. The module base 82 is implemented as an integral part of the base 52 of the wafer transport container 16. The positive mating element 20 is supported in a manner that is movable relative to the module base 82. The protective device includes a guide element 90. The guide element 90 is configured to guide the movement of the positive mating element 20. The guide element 90 is implemented as a circular guide rod. The guide element 90 and the positive mating element 20 are implemented as an integral part of each other.
[0053] The protective device comprises a linear bearing 40. The linear bearing 40 is configured to allow a translational movement of the positive-fitting unit 10. The linear bearing 40 is configured to allow a translational movement of the positive-fitting element 20. The linear bearing 40 comprises two bearing elements 86, 88. The bearing elements 86, 88 are implemented as sliding bearings. The bearing elements 86, 88 form a sliding bushing. During the movement of the positive-fitting element 20, the bearing elements 86, 88 remain stationary relative to the wafer transport container 16. The bearing elements 86, 88 are implemented by a plastic material or a metal coated with plastic. Alternatively, the linear bearing 40 may comprise a plurality of bearing elements 86, 88 other than two, for example one bearing element 86, 88 or three bearing elements 86, 88. Furthermore, the linear bearing 40 may alternatively or additionally comprise at least one ball bearing. Furthermore, the positive-fitting element 20, in particular the guide element 90, may also be implemented as one piece with the linear bearing 40, for example in such a way that at least the guide element 90 comprises a sliding surface, which is in particular realized by a coating.
[0054] The protection device includes a chamber 24. The chamber 24 forms a hollow space inside the protection module 60. The chamber 24 includes a pressure connection channel 26. The pressure connection channel 26 is configured to connect the chamber 24 with the vacuum clamping device 42. The vacuum clamping device 42 includes a suction channel 100. The suction channel 100 is fluidically connected to the vacuum pump 66. When the pressure connection channel 26 is connected to the vacuum clamping device 42, the suction channel 100 is airtightly connected to the pressure connection channel 26. The connection of the pressure connection channel 26 to the suction channel 100 is implemented without a coupling element and a flexible tube, and is only achieved by the close abutment of the protection module 60 on the surface 68 of the loading and / or unloading station 44.
[0055] The chamber 24 is isolated from the environment in an airtight manner except for the pressure connection channel 26. The chamber 24 has an internal volume 34. The pressure connection channel 26 is configured to allow the internal pressure in the chamber 24 to vary relative to a reference pressure. The pressure connection channel 26 forms a connection element for a vacuum pump unit 58. The chamber 24 can be evacuated by the pressure connection channel 26. The pressure connection channel 26 is implemented as a hole in the chamber wall 28 of the chamber 24. The pressure connection channel 26 is arranged on the lower side of the protection module 60. The pressure connection channel 26 extends along a direction at least substantially perpendicular to the main extension plane of the wafer transport container opening element 14 in a state where the wafer transport container 16 is connected to the base 52 of the wafer transport container 16. The pressure connection channel 26 leads to the chamber 24 in both the protection state and the non-protection state. The chamber wall 28 defining the chamber 24 is implemented separately from the module base 82. The chamber wall 28 defining the chamber 24 is threadedly connected to the module base 82. This advantageously allows for simple assembly and / or maintenance of the protection module 60. The chamber wall 28 defining the chamber 24 is implemented to be non-destructively removable. Alternatively, at least a portion of the chamber wall 28 defining the chamber 24 may be implemented integrally with the wafer transport container 16.
[0056] The difference between the internal pressure of the chamber 24 and the reference pressure constitutes a pressure difference. The pressure difference is achieved to affect the protective state of the positive fit unit 10. The position of the positive fit element 20 relative to the stationary chamber wall 28 of the chamber 24 depends on the pressure difference. If the pressure difference exceeds the limit pressure difference, the positive fit unit 10 is configured to assume a non-protective position. If the pressure difference is lower than the limit pressure difference, the positive fit element 20 does not engage with the positive fit recess 18. If the pressure difference is lower than the limit pressure difference, the positive fit unit 10 is configured to assume a protective position. If the pressure difference exceeds the limit pressure difference, the positive fit element 20 engages with the positive fit recess 18. The limit pressure difference is achieved as a limit value of the pressure difference.
[0057] The protective device includes a reset element 22. The reset element 22 is configured to deflect the positive fitting unit 10 back to the protective position. The reset element 22 is configured to keep the positive fitting unit 10 in the protective position. The reset element 22 is implemented as a compression spring. The reset force of the reset element 22 acts in a direction extending parallel to the main extension direction of the positive fitting element 20. Here, the "main extension direction" of the object is particularly understood to be a direction extending parallel to the longest edge of the smallest geometric cuboid that just completely surrounds the object. The reset force of the reset element 22 acts at least indirectly on the positive fitting element 20. The reset force of the reset element 22 presses the positive fitting element 20 into the protective position. The reset element 22 is arranged in the chamber 24. The reset element 22 is close to the inner surface of the chamber wall 28 facing away from the wafer transport container 16. The reset element 22 is partially engaged around the guide element 90. The chamber wall 28 facing away from the wafer transport container 16 includes a protrusion 92. The protrusion 92 is implemented as a cylinder. The protrusion 92 is configured to partially accommodate the reset element 22. The protrusion 92 is configured to advantageously prevent the return element 22 from sliding, such as when the wafer transport container 16 is moved.
[0058] The protective device comprises a further chamber 30. The further chamber 30 has an internal volume 36. In the protective state of the protective device and in the non-protective state of the protective device, the further chamber 30 has an internal pressure that is the same as the ambient pressure. The ambient pressure is implemented as atmospheric pressure or clean room atmospheric pressure. From the perspective of the wafer transport container 16, the further chamber 30 is arranged before the chamber 24. The guide element 90 is arranged in the further chamber 30. The linear bearing 40 is arranged in the further chamber 30. The protective device comprises a setting element 32 that is movably supported. The setting element 32 that is movably supported is implemented as a movable piston. The setting element 32 that is movably supported partially defines the chamber 24. The setting element 32 that is movably supported partially defines the further chamber 30. The chamber 24 and the further chamber 30 are hermetically sealed to each other by the setting element 32 that is movably supported. The setting element 32 that is movably supported comprises a sealing element 94. The sealing element 94 of the movably supported setting element 32 is embodied as an O-ring. Alternatively or additionally, the sealing element 94 of the movably supported setting element 32 can comprise a lip seal and / or a vulcanized seal.
[0059] The guide element 90 is guided through the movably supported setting element 32. The guide element 90 is fixedly connected to the movably supported setting element 32 via a fixation device 98. The fixation device 98 comprises Alternatively or additionally, the fixing device 98 may include Protective ring, safety wiring and / or threaded connection. The movably supported setting element 32 includes another sealing element 96. The other sealing element 96 of the movably supported setting element 32 is configured to hermetically seal the through hole of the guide element 90 against the chamber 24. The other sealing element 96 of the movably supported setting element 32 is implemented as an O-ring. Alternatively or additionally, the other sealing element 96 of the movably supported setting element 32 may include a lip seal and / or a vulcanized seal. The movably supported setting element 32 is configured to change the internal volume 34 of the chamber 24 according to the pressure difference between the internal pressure of the chamber 24 and the other chamber 30. The movably supported setting element 32 is configured to change the internal volume 36 of the other chamber 30 according to the pressure difference between the internal pressure of the chamber 24 and the other chamber 30.
[0060] The protective device comprises a status sensor 50. The status sensor 50 is configured to sense the protective status of the protective device. The status sensor 50 is assigned to the loading and / or unloading station 44. The status sensor 50 is configured to transmit the protective status of the protective device to the loading and / or unloading station 44. In this way, it is advantageously possible to prevent the initiation of an opening procedure for opening the wafer transport container opening element 14 by the loading and / or unloading station 44 while the protection of the protective device, in particular the positive mating unit 10, is still effective, thereby advantageously avoiding damage to the wafer transport container 16. The status sensor 50 comprises a magnetic sensor, which is capable of capturing the movement and / or position of components of the protective module 60, in particular the guide element 90 and / or the positive mating element 20.
[0061] The protective device includes an additional additional chamber 38. The additional additional chamber 38 is configured to have an internal pressure different from the ambient pressure in at least one operating state. The additional additional chamber 38 is arranged before the additional chamber 30 from the perspective of the wafer transport container 16. The additional additional chamber 38 is arranged before the chamber 24 from the perspective of the wafer transport container 16. The additional additional chamber 38 hermetically seals the additional chamber 30. The protective device includes an additional sealing element 102. The additional sealing element 102 of the protective device is configured to isolate the additional chamber 30 and the additional additional chamber 38 from each other in an airtight manner. The additional sealing element 102 of the protective device is implemented as compressible. The additional sealing element 102 of the protective device is configured to be compressed and / or expanded when the positive mating element 20 and / or the guide element 90 move. The protective device includes a transfer element 104. The transfer element 104 is configured to transfer the movement of the guide element 90 and / or the positive mating element 20 to the additional sealing element 102 of the protective device. The transfer element 104 is implemented as an integral part of the guide element 90. The transfer element 104 is implemented as an integral part of the positive fitting element 20. The additional sealing element 102 of the protective device is implemented as an edge-welded bellows element. The edge-welded bellows element is made of metal. The positive fitting element 20 is partially arranged in the additional further chamber 38. The additional further chamber 38 is implemented in such a way that it leads to the outside through the opening 84 of the module base 82. In the non-connected state of the wafer transport container 16, the internal pressure in the additional further chamber 38 is the same as the ambient pressure.
[0062] and Figure 3 similar, Figure 4 The protection system 56 is shown extending centrally through the protection module 60 and extending Figure 2 The cross section is indicated by the reference numeral A in FIG. Figure 4 In the illustrated embodiment, the wafer transport container 16 and the loading and / or unloading station 44 are in a coupled state. Figure 4In the illustrated situation, the protective device is in the non-protective state. In the non-protective state, the chamber 24 is evacuated via the pressure connection channel 26 and is thus pushed by the movably supported setting element 32 in a direction away from the wafer transport container 16. As a result, the internal volume 34 of the chamber 24 is reduced and the internal volume 130 of the additional further chamber 38 is increased. Furthermore, the positive-fitting element 20 is thus arranged in such a way that it is largely retracted into the additional further chamber 38. The additional sealing element 102 of the protective device is compressed.
[0063] The positive fitting recess 18 implemented in the wafer transport container 16 forms an additional pressure connection channel 54. The additional pressure connection channel 54 is configured for evacuating an additional additional chamber 38 of the protective device. The possibility of evacuating the additional additional chamber 38 by means of the additional pressure connection channel 54 is limited to the state when the wafer transport container 16 is coupled to the loading and / or unloading station 44. In the coupled state of the wafer transport container 16 and the loading and / or unloading station 44, the pressure connection channel 54 realizes the coupling of the additional additional chamber 38 to the gap 106 which is hermetically isolated between the lower side of the wafer transport container opening element 14 and the upper side of the loading and / or unloading station 44. The internal pressure in the gap 106 is coupled to the internal pressure in the chamber 24. The internal pressure in the chamber 24 and the internal pressure in the gap 106, and therefore the internal pressure in the additional additional chamber 38, are also generated via the vacuum pump 66 of the vacuum pump unit 58. The vacuum pump unit 58 is configured for changing the internal pressure in the chamber 24.
[0064] The protective device comprises an emergency protection and / or emergency release element 48. The emergency protection and / or emergency release element 48 is configured for manual emergency protection and / or manual emergency release of the protective device. The emergency protection and / or emergency release element 48 is at least partially arranged in the further chamber 30. The emergency protection and / or emergency release element 48 is movably supported in the further chamber 30. For emergency release, the operator pulls the emergency protection and / or emergency release element 48 out of the further chamber 30. The emergency protection and / or emergency release element 48 is implemented as a pull-out rod extending from the protective module 60.
[0065] Figure 5 The protection system 56 is shown extending through the protection module 60 and Figure 2 Another cross section of another cross section indicated by the reference numeral B. Figure 5In the illustrated case, the safety element of the protection device has been released by the emergency protection and / or emergency release element 48. The emergency protection and / or emergency release element 48 is configured to displace the movably supported setting element 32 toward the chamber 24 during emergency release. The emergency protection and / or emergency release element 48 is configured to push the positive mating element 20 toward the chamber 24 during emergency release. The emergency protection and / or emergency release element 48 is configured to cancel the engagement of the positive mating element 20 with the positive mating recess 18 during emergency release. The emergency protection and / or emergency release element 48 includes a cam mechanism 108. The cam mechanism 108 is configured to convert the movement of the emergency protection and / or emergency release element 48 into a movement of the movably supported setting element 32 and / or the positive mating element 20 perpendicular to the movement of the emergency protection and / or emergency release element 48. The cam mechanism 108 includes a ramp 110 and a pin 112. The ramp 110 is arranged on the emergency protection and / or emergency release element 48. The inclined plane 110 connects the point where the emergency protection and / or emergency release element 48 has a small material thickness with the point where the emergency protection and / or emergency release element 48 has a larger material thickness. The pin 112 is arranged on the setting element 32 supported movably. In the protection state of the protection device, the pin 112 abuts against the point where the emergency protection and / or emergency release element 48 has a small material thickness. When the emergency protection and / or emergency release element 48 is pulled out in the vertical direction, the inclined plane 110 moves along the pin 112 fixed in the vertical direction. The material thickness of the emergency protection and / or emergency release element 48 increases along the ramp 110, so the pin 112 must be deflected horizontally. In the emergency release state of the protection device, the pin 112 abuts against the point where the emergency protection and / or emergency release element 48 has a larger material thickness. When the emergency protection and / or emergency release element 48 then moves back to another chamber 30, the reset element 22 deflects the setting element 32 and / or the positive matching element 20 supported movably back to the initial position of the protection state.
[0066] Figure 6A flow chart of a method for using a protective device is shown. In at least one method step 114, a wafer transport container 16 is transported and / or stored. During the above-mentioned transport and / or during the above-mentioned storage, in at least one method step 116, the wafer transport container opening element 14, which is maintained in its closed position by the closing mechanism 12, is protected by the positive matching unit 10. In the fault-free normal operation of the closing mechanism 12, in at least one method step 120, the wafer transport container opening element 14 is protected by the positive matching unit 10 in a contactless manner. In the event of a failure of the closing mechanism 12, in at least one method step 118, contact between the positive matching unit 10 and the wafer transport container opening element 14 is established. Here, contact between the positive matching unit 10 and the wafer transport container opening element 14 is established to ensure that the wafer transport container opening element 14 remains near the closed position. In at least one method step 122, the wafer transport container 16 is connected to the loading and / or unloading station 44. In at least one method step 124, protection and / or release of the positive mating unit 10 is produced via a change in the internal pressure in the chamber 24 of the protective device. In order to protect the wafer transport container opening element 14, in at least one method step 128, the positive mating element 20 is moved into the protective position by reducing the pressure difference between the chamber 24 and the further chamber 30. In order to release the protection of the wafer transport container opening element 14, in at least one method step 126, the positive mating element 20 is moved into the non-protective position by increasing the pressure difference between the chamber 24 and the further chamber 30.
[0067] Reference numerals
[0068] 10 Positive fit unit
[0069] 12 Closing of institutions
[0070] 14 Wafer transport container opening element
[0071] 16 Wafer Shipping Container
[0072] 18 Positive fit in the concave part
[0073] 20 Positive-fit components
[0074] 22 Reset element
[0075] 24 Chamber
[0076] 26 Pressure connection channel
[0077] 28 chamber wall
[0078] 30 Additional Chambers
[0079] 32 Setting elements
[0080] 34 Internal volume
[0081] 36 Internal volume
[0082] 38 additional chambers
[0083] 40 Linear bearings
[0084] 42 Vacuum clamping device
[0085] 44 Loading and / or unloading stations
[0086] 46 Wafer
[0087] 48 Emergency protection and / or emergency release elements
[0088] 50 Status Sensor
[0089] 52 Matrix
[0090] 54 Additional pressure connection channel
[0091] 56 Protection System
[0092] 58 Vacuum pump unit
[0093] 60 Protection module
[0094] 62 Opening
[0095] 64 Loading and / or unloading direction
[0096] 66 Vacuum Pump
[0097] 68 Surface
[0098] 70 Vacuum clamping element
[0099] 72 Corresponding vacuum clamping elements
[0100] 74 Alignment mechanism
[0101] 76 bulge
[0102] 78 Cavity
[0103] 80 Sealing element
[0104] 82 module base
[0105] 84 Opening
[0106] 86 Bearing elements
[0107] 88 Bearing elements
[0108] 90 Guide element
[0109] 92 protrusion
[0110] 94 Sealing element
[0111] 96 Additional sealing elements
[0112] 98 Fixtures
[0113] 100 Suction channels
[0114] 102 Additional sealing element
[0115] 104 Transfer element
[0116] 106 Gap
[0117] 108 Cam mechanism
[0118] 110 bevel
[0119] 112 Pins
[0120] 114 Methods and Steps
[0121] 116 Methods and Steps
[0122] 118 Methods and Steps
[0123] 120 Methods and Steps
[0124] 122 Methods and Steps
[0125] 124 Methods and Steps
[0126] 126 Methods and Steps
[0127] 128 Methods and Steps
[0128] 130 Internal volume
[0129] A Section
[0130] B Section
Claims
1. A protection device having at least one positively mating unit (10) configured to protect at least a wafer transport container opening element (14) of a wafer transport container (16), wherein the wafer transport container opening element (14) is held in its closed position by a closing mechanism (12), characterized in that The protection device has at least one chamber (24), the chamber comprising a pressure connection channel (26) configured to allow the internal pressure in the chamber (24) to vary relative to a reference pressure, and at least one further chamber (30), the further chamber (30) having an internal pressure that is the same as the ambient pressure in a protection state of the protection device and in a non-protection state of the protection device, wherein a pressure difference is calculated based on the internal pressure of the chamber (24) and the reference pressure and is configured to influence the protection state of the at least one positive fitting unit (10); wherein the chamber (24) is configured to be evacuated in at least one operating state of the protection device; The pressure connection channel (26) is at least configured to connect the interior of the chamber (24) with the environment and / or atmosphere outside the chamber (24).
2. The protection device according to claim 1, characterized in that: The positive-fitting unit (10) comprises at least one positive-fitting recess (18) and at least one positive-fitting element (20), wherein the positive-fitting recess (18) and the positive-fitting element (20) are configured to be coupled to each other in a contactless manner when properly protected.
3. The protection device according to claim 1 or 2, characterized in that The protective device is at least partially implemented integrally with the wafer transport container (16).
4. The protection device according to claim 1, characterized in that At least one resetting element (22) is provided, which is configured to at least partially deflect the positive mating unit (10) back to the protection position and / or to hold the positive mating unit (10) in the protection position.
5. The protection device according to claim 4, characterized in that: The at least one resetting element (22) is at least mostly arranged within the chamber (24).
6. The protection device according to claim 1, characterized in that: The positive-fit unit (10) comprises at least one movably supported positive-fit element (20), wherein the position of the positive-fit element (20) relative to at least one chamber wall (28) of the chamber (24) depends on the pressure difference.
7. The protection device according to claim 1, characterized in that: The positive fitting unit (10) is configured to adopt a non-protective position when the pressure difference exceeds a limit pressure difference.
8. The protection device according to claim 1, characterized in that At least one movably supported setting element (32) is provided, which at least partially delimits the chamber (24) and the further chamber (30).
9. The protection device according to claim 8, characterized in that: The setting element (32) is configured to change the internal volume (34) of the chamber (24) and / or the internal volume (36) of the further chamber (30) depending on the pressure difference between the internal pressures of the chamber (24) and the further chamber (30).
10. The protection device according to claim 1, characterized in that At least one additional further chamber (38) is provided, the additional further chamber being configured to have an internal pressure different from the ambient pressure in at least one operating state.
11. The protection device according to claim 1, characterized in that A linear bearing (40) is provided, which is configured to allow translational movement of the positive fitting unit (10).
12. The protection device according to claim 1, characterized in that: The pressure connection channel (26) is configured to connect at least the chamber (24) to a vacuum clamping device (42) of a loading and / or unloading station (44), and the loading and / or unloading station (44) is configured to load at least one wafer (46) into a wafer transport container (16) and / or unload from a wafer transport container (16).
13. The protection device according to claim 1, characterized in that There is at least one emergency protection and / or emergency release element (48) which is configured for manual emergency protection and / or manual emergency release of the protection device.
14. The protection device according to claim 13, characterized in that The emergency protection and / or emergency release element (48) is at least partially arranged in the further chamber (30).
15. The protection device according to claim 1, characterized in that At least one state sensor (50) is provided, wherein the state sensor is configured to sense the protection state of the protection device.
16. A wafer transport container (16) having at least one protective device according to any one of claims 1 to 15, wherein the protective device is configured to prevent the wafer transport container opening element (14) from being completely removed from the base (52) of the wafer transport container (16) under protective conditions.
17. The wafer transport container (16) according to claim 16, characterized in that: The at least one protective device is embodied in one piece with a base body (52) of the wafer transport container (16).
18. The wafer transport container (16) according to claim 16 or 17, characterized in that: The wafer transport container (16) includes at least one positive fitting recess (18) enabling an additional pressure connection channel (54) configured for evacuating an additional additional chamber (38) of the protective device.
19. A protection system (56) having at least one protection device as described in any one of claims 1 to 15, having a wafer transport container (16) as described in any one of claims 16 to 18, and having a loading and / or unloading station (44) configured at least for loading wafers (46) into the wafer transport container (16) and / or unloading wafers from the wafer transport container (16).
20. The protection system of claim 19 is a vacuum protection system.
21. A protection system according to claim 19 or 20, characterized in that A vacuum pump unit (58) is provided, which is configured at least to vacuum-clamp the wafer transport container (16) on the loading and / or unloading station (44) at a loading and / or unloading position and to change the internal pressure in the chamber (24).
22. A method for using a protection device according to any one of claims 1 to 15, a wafer transport container (16) according to any one of claims 16 to 18 and / or a protection system (56) according to any one of claims 19 to 21, wherein the protection device has at least one positive fitting unit (10), characterized in that The wafer transport container (16) is protected by the positive mating unit (10) through the wafer transport container opening element (14) which is held in its closed position by the closing mechanism (12).
23. The method of claim 22, wherein: The protection of the positive fitting unit (10) is achieved by changing the internal pressure in the chamber (24) of the protection device.
24. The method according to claim 22 or 23, characterized in that In normal operation without failure of the closing mechanism (12), the wafer transport container opening element (14) is protected by the positive mating unit (10) in a contactless manner, wherein in the event of failure of the closing mechanism (12), in order to keep the wafer transport container opening element (14) near the closed position, contact between the positive mating unit (10) and the wafer transport container opening element (14) is established.
25. The method of claim 24, wherein: Contact between the positive-fitting element (20) of the positive-fitting unit (10) and the wafer transport container opening element (14) is established.
Citation Information
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