A closed baffle structure

By designing a closed baffle structure, the position of the electron beam focal spot is completely closed, and the problem of film particle contamination in the prior art is solved, effective protection of peripheral components and substrate to be plated is achieved, and the function of observing the pre-melting condition of the film is provided in real time.

CN112921279BActive Publication Date: 2025-03-21SHENZHEN THREE BEAM COATING TECH CO LTD
View PDF 3 Cites 0 Cited by

Patent Information

Application Number
CN202110373738.2
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2021-04-07
Publication Date
2025-03-21
Estimated Expiration
2041-04-07

AI Technical Summary

Technical Problem

The existing electron gun coating machine baffle cannot completely enclose the surroundings of the electron beam focal spot position, causing the film gas particles to move or reflect the contamination of peripheral components and substrates to be plated.

Method used

A closed baffle structure is designed, including a baffle, an observation cylinder, a support frame and a driving mechanism. The baffle is a cylindrical structure, and an open hole is provided with a viewing cylinder on the side wall. The driving mechanism is used to lift and rotate the baffle to completely close the position of the electron beam focal spot.

Benefits of technology

Fully enclosed and obstructed at the position of the electron beam focal spot is achieved, preventing the film particles from moving out of the crucible from contaminating peripheral components and the substrate to be plated, and an observation cylinder is provided to observe the pre-melting of the film.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN112921279B_ABST
    Figure CN112921279B_ABST
Patent Text Reader

Abstract

The present invention discloses a closed baffle structure, which includes a baffle, an observation tube, a support frame and a driving mechanism. The baffle is a cylindrical structure with an open bottom and a closed top. An opening is provided on the side wall of the baffle, and the opening is connected to one end of the observation tube. The observation tube is fixed on the support frame. The power output end of the driving mechanism is connected to the support frame to drive the support frame to rise and fall and rotate. When the baffle structure of the present invention is applied to an electron gun coating device, the evaporation source can be completely closed during the pre-melting of the film material, thereby avoiding serious dirt around the crucible and contamination of the substrate. The baffle structure is also provided with an observation tube, which can observe the melting state of the film material in real time when the baffle is buckled. When the present invention is used in a coating device with dual electron guns, it can prevent the film materials of the two crucibles from contaminating each other.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] The invention relates to the technical field of vacuum coating technology and equipment manufacturing, and in particular to a closed baffle structure. Background Art

[0002] The electron gun coating process generally has a pre-melting procedure for the film material before coating. During the melting process, although there is a baffle to block the evaporation source, the baffles equipped with existing electron gun coating machines only block the top of the crucible, and some film material gas particles will still move out from the surroundings, or film material particles will be reflected by collision with the baffle or liner, contaminating the surrounding parts, and may also contaminate the substrate to be plated on the workpiece rack through collision or reflection.

[0003] Therefore, it is necessary to design a baffle to completely seal the surroundings of the electron beam focal spot to solve the above problems. Summary of the invention

[0004] The present invention provides a closed baffle structure. The baffle structure can completely close the space around the electron beam focal spot during pre-melting of the film material, avoiding serious dirt around the crucible and contamination of the substrate, and an observation tube is provided on the baffle to observe the condition of the film material at the electron gun focal spot in real time.

[0005] The closed baffle structure provided by the present invention includes a baffle, an observation tube, a support frame and a driving mechanism. The baffle is a cylindrical structure with an open bottom and a closed top. An opening is provided on the side wall of the baffle, and the opening is connected to one end of the observation tube. The observation tube is fixed on the support frame. The power output end of the driving mechanism is connected to the support frame to drive the support frame to rise, fall and rotate.

[0006] Furthermore, the size of the opening is the same as the size and shape of the inner cross-section of the observation tube, and the observation tube and the baffle are welded and connected at the opening.

[0007] Furthermore, the support frame is triangular in shape, the observation tube is fixed on the hypotenuse of the triangle of the support frame, and the other end of the observation tube points to the observation window of the coating machine.

[0008] Furthermore, the driving mechanism includes: a telescopic driver, a connecting plate and a rotary driver, the telescopic driver is fixed to the bottom plate of the vacuum chamber, a power output end of the telescopic driver is connected to the connecting plate, and the rotary driver is fixed to the connecting plate.

[0009] Furthermore, the power output end of the rotary driver is connected to the support frame through the connecting plate and the bottom plate of the vacuum chamber.

[0010] Furthermore, the telescopic driver is a telescopic motor or a telescopic cylinder, and the rotary driver is a rotary motor or a rotary cylinder. Both the telescopic driver and the rotary driver are connected to the coating machine control system in communication.

[0011] Furthermore, a dynamic seal is provided between the power output end of the rotary driver and the bottom plate of the vacuum chamber, and the dynamic seal is an oil seal or a magnetic fluid seal.

[0012] Furthermore, it also includes a lining plate and a shroud, wherein the lining plate is fixed on the bottom plate of the vacuum chamber and is provided with a hole, wherein the hole is located above the area from the anode hole of the electron gun to the electron beam focal spot position; the shroud is fixed around the hole to cover the hole.

[0013] The technical solution of the present invention is: when melt is needed, the baffle is lowered and buckled onto the shroud through a driving mechanism, and the baffle, the shroud and the liner together completely seal the area around the electron beam focal spot. When coating is needed, the baffle can be opened, that is, the baffle is raised and rotated by a certain angle to leave the crucible through a driving mechanism.

[0014] By adopting the above scheme, the closed baffle structure of the present invention has the following beneficial effects:

[0015] The closed baffle structure of the present invention replaces the existing baffle structure and can fully block the electron beam focal spot position to prevent film material particles from moving out of the gaps around the crucible during melting to contaminate surrounding components and substrates to be plated. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 Schematic diagram of the closed baffle structure of the present invention.

[0017] Figure 2 It is a top view of the closed baffle structure of the present invention (with the liner seen through).

[0018] Figure 3 It is a side schematic diagram of the initial position of the closed baffle structure of the present invention.

[0019] Figure 4 It is a side view schematic diagram of the middle position of the closed baffle structure of the present invention.

[0020] Figure 5 It is a side view schematic diagram of the shielding position of the closed baffle structure of the present invention.

[0021] The reference numerals in the accompanying drawings are as follows:

[0022] 10- baffle 20- observation tube 21- coating machine observation window 30- support frame

[0023] 40-driving mechanism 41-retractable driver 42-connecting plate

[0024] 43-rotation drive 60-electron beam focal spot position 80-vacuum chamber

[0025] 90-dynamic seal 100-lining plate 101-hole 102-circumferential tube

[0026] 200-crucible 300-electron gun 301-anode hole of electron gun DETAILED DESCRIPTION

[0027] The present embodiment is described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0028] See also Figure 1-2 The present invention provides a closed baffle structure, which includes a baffle 10, an observation tube 20, a support frame 30 and a driving mechanism 40. The baffle 10 described in this embodiment is a cylindrical structure with an open bottom and a closed top. When it falls, the open cover is on the shroud 102, and the top surface is in close contact with the upper end of the shroud. Then, the baffle 10, the shroud 102 and the lining plate 100 completely seal the electron beam focal spot position, and there is no gap around it, so that the film material particles cannot move out from the periphery.

[0029] An opening 11 is provided on the side wall of the baffle 10, and the opening 11 is welded to one end of the observation tube 20. The observation tube 20 is fixed on the hypotenuse of the triangle of the support frame 30, so that the observation tube 20 forms an angle with the horizontal line and points to the observation window 21 of the coating machine. Therefore, the operator can observe the condition of the film material at the electron beam focal spot position 60 through the observation tube 20 from the observation window 21 of the coating machine, and adjust the deflection magnetic field parameters and the crucible position at any time.

[0030] The power output end of the driving mechanism 40 is connected to the support frame 30 to drive the support frame 30 to rise and fall and rotate. The driving mechanism 40 includes: a telescopic driver 41, a connecting plate 42 and a rotating driver 43. In this embodiment, the telescopic driver 41 is a telescopic cylinder, and the rotating driver 43 is a rotating cylinder. The telescopic driver 41 is fixed to the lower surface of the vacuum chamber bottom plate, and its power output end is connected to the connecting plate 42 to drive the connecting plate 42 to move up and down. The rotating driver 43 is fixed to the connecting plate 42, and the connecting plate 42 and the vacuum chamber bottom plate each have an opening. The power output end 44 of the rotating driver 43, as the power output end of the entire driving mechanism 40, passes through the opening of the connecting plate 42 and the opening of the vacuum chamber bottom plate and is connected to the support frame 30 in the vacuum chamber. At the opening of the vacuum chamber bottom plate, the power output end 44 and the vacuum chamber bottom plate are sealed with a dynamic seal 90. In this embodiment, the dynamic seal 90 is a pair of oil seals.

[0031] Preferably, the closed baffle structure of this embodiment further includes: a lining plate 100 and a shroud 102. The lining plate 100 is fixed on the bottom plate of the vacuum chamber and is provided with a hole 101, and the hole 101 is located above the area from the anode hole of the electron gun to the electron beam focal spot position. The shroud 102 is fixed around the hole 101 to cover the hole 101. The lining plate 100 of this embodiment is made of stainless steel, and it can also be made of other heat-resistant materials. Its hole 101 is circular, such as Figure 2 The shroud 102 is a stainless steel cylinder, which can also be made of other heat-resistant materials, and its port diameter is larger than the diameter of the hole 101 and smaller than the bottom diameter of the baffle 10. The bottom end of the shroud 102 is welded to the liner 100. The hole 101 is located above the area from the electron gun anode hole 301 to the electron beam focal spot 60.

[0032] The steps of performing a coating operation using the closed baffle of the present invention are as follows:

[0033] Step 1: Melt:

[0034] When the crucible is filled with film material, the baffle 10 is in the open initial position, such as Figure 3 As shown, after the loading is completed, the coating machine control device issues a command to control the rotation driver 43 to operate, driving the support frame 30 to rotate right 90 degrees, thereby rotating the baffle 10 to the middle position above the shroud 102, as shown in FIG. Figure 4 The control device issues another command to control the telescopic driver 41 to operate, driving the support frame 30 to move downward, thereby causing the baffle 10 to descend until its top surface contacts the upper end of the shroud 102. Figure 5 As shown, the baffle 10 reaches the shielding position, completely shielding the electron beam focal spot position 60 exposed by the liner hole 101. When the vacuum degree of the vacuum chamber reaches the requirement, the electron gun 300 is started and the melting operation begins.

[0035] Step 2: Coating

[0036] After the melting is finished, the coating machine control device controls the telescopic driver 41 to make the baffle 10 rise and reach the Figure 4 The control device then controls the rotary drive 43 to rotate the baffle 10 to the middle position. Figure 3 The electron gun is started and the workpiece begins to be coated.

[0037] It is worth mentioning that when the coating machine has two electron guns, the melt from one electron gun can prevent the film material in the crucible of the other electron gun from being contaminated.

[0038] In the description of the present invention, it is necessary to understand that the terms "upper", "lower" and the like indicate directions based on the directions or positional relationships shown in the drawings of the present invention, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as a limitation on the present invention.

[0039] In summary, the present invention provides a closed electron gun baffle structure, which can completely seal the evaporation source when the film material is pre-melted, avoiding serious dirt around the crucible and contamination of the substrate, and the baffle structure is also provided with an observation tube, which can observe the pre-melting of the film material in real time. When the baffle structure of the present invention is used in a coating device with dual electron guns, it can also prevent the mutual contamination of the film materials in the two crucibles. The present invention is simple in design and easy to implement, but it solves the problem of serious contamination of the baffle auxiliary device during the pre-melting of the film material in the prior art, has a large application market, and is worthy of vigorous promotion and use.

[0040] The above are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A closed baffle structure, characterized in that: It includes a baffle, an observation tube, a support frame and a driving mechanism, wherein the baffle is a cylindrical structure with an open bottom and a closed top, an opening is provided on the side wall of the baffle, the opening is connected to one end of the observation tube, the size of the opening is the same as the size and shape of the inner cross-section of the observation tube, the support frame is a triangle, the observation tube is fixed on the hypotenuse of the triangle of the support frame, the other end of the observation tube points to the observation window of the coating machine, the power output end of the driving mechanism is connected to the support frame, and drives the support frame to rise and fall and rotate, the driving mechanism includes: a telescopic drive, a connecting plate and a rotating drive, the telescopic drive is fixed to the bottom plate of the vacuum chamber, and its power output end is connected to the connecting plate, the rotating drive is fixed to the connecting plate, the power output end of the rotating drive passes through the connecting plate and the bottom plate of the vacuum chamber to be connected to the support frame, a dynamic seal is provided between the power output end of the rotating drive and the bottom plate of the vacuum chamber, and the dynamic seal is an oil seal or a magnetic fluid seal; It also includes a lining plate and a shroud. The lining plate is fixed on the bottom plate of the vacuum chamber and is provided with a hole. The hole is located above the area from the anode hole of the electron gun to the electron beam focal spot position. The shroud is fixed around the hole to cover the hole.

2. The closed baffle structure according to claim 1, characterized in that: The observation tube and the baffle are welded and connected at the opening.

3. The closed baffle structure according to claim 1, characterized in that: The telescopic driver is a telescopic motor or a telescopic cylinder, and the rotary driver is a rotary motor or a rotary cylinder. Both the telescopic driver and the rotary driver are communicatively connected to a coating machine control system.

Citation Information

Patent Citations

  • Optical coating machine and melt protective cover

    CN212833998U

  • Closed baffle structure

    CN214830630U

  • Vacuum deposition and vacuum deposition device

    JP1996120442A