Display panel, display device and manufacturing method
By setting non-overlapping photosensitive areas and light emitting areas in the display panel, and using the structure and material of the reflective groove, the problem of low in-screen fingerprint recognition accuracy is solved, and the accuracy of fingerprint recognition is significantly improved.
Patent Information
- Application Number
- CN202110368553.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2021-04-06
- Publication Date
- 2025-02-28
- Estimated Expiration
- 2041-04-06
AI Technical Summary
In-screen fingerprint recognition is easily disturbed by external light, resulting in less obvious distinction between dark and bright states, and the fingerprint recognition accuracy is low.
A display panel is designed, wherein the photosensitive region and the orthogonal projection of the light emitting region on the substrate do not overlap, and the photosensitive region is arranged in the reflective groove. The side wall of the reflective groove is formed by the metal wire structure of the transistor layer, the first electrode and the second electrode, and the inner wall is made of a reflective material to provide a fingerprint acquisition path.
By blocking the influence of light in the luminous area and external light on the photosensitive area, the difference in dark and bright state of the photosensitive area is increased and the accuracy of fingerprint recognition is improved.
Smart Images

Figure CN113095200B_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the field of display technology, and in particular to a display panel, a display device and a manufacturing method thereof. Background Art
[0002] With the development of electronic technology, display panels are increasingly used in various devices, and common devices such as smartphones, tablets, and wearable devices cannot do without display panels. In order to improve the safety and efficiency of device use, many high-end devices use full-screen displays that provide in-screen fingerprint recognition.
[0003] However, since the photosensitive area of the in-screen fingerprint recognition is easily disturbed by external light, the distinction between dark and light states is not obvious in the presence and absence of finger reflected light, and the fingerprint recognition accuracy is low. Summary of the invention
[0004] In view of the above problems, the present invention is proposed to provide a display panel, a display device and a manufacturing method that overcome the above problems or at least partially solve the above problems.
[0005] In a first aspect, a display panel is provided, comprising:
[0006] A substrate, a photosensitive area, and a transistor layer, a first electrode, a light-emitting area, and a second electrode sequentially arranged on the substrate;
[0007] The orthographic projections of the photosensitive area and the luminous area on the substrate do not overlap, the photosensitive area is arranged in a reflective groove, and the inner wall of the reflective groove is made of reflective material to provide a fingerprint collection optical path for the photosensitive area.
[0008] Optionally, the sidewall of the reflective groove is formed by enclosing one or more of the following structures: a metal line structure of the transistor layer, the first electrode, and the second electrode.
[0009] Optionally, the reflective groove is a cylinder or an inverted frustum.
[0010] Optionally, the distance between the photosensitive area and the substrate is smaller than the distance between the light-emitting area and the substrate.
[0011] Optionally, the photosensitive area is arranged in the same layer as the first electrode or the transistor layer.
[0012] Optionally, the photosensitive area is arranged in the same layer as the polysilicon layer, the gate or the source and drain of the transistor layer.
[0013] Optionally, the display panel further includes: a light isolation layer, disposed between the substrate and the photosensitive area.
[0014] Optionally, the photosensitive area is a photodiode.
[0015] Optionally, the display panel includes: a plurality of the photosensitive areas and a plurality of the light-emitting areas, wherein the plurality of the photosensitive areas and the plurality of the light-emitting areas are alternately arranged in an array.
[0016] In a second aspect, a display device is provided, comprising the display panel described in the first aspect.
[0017] In a third aspect, a method for manufacturing a display panel is provided, comprising:
[0018] providing a substrate;
[0019] A transistor layer, a first electrode, a light-emitting area and a second electrode are sequentially prepared on the substrate, and a photosensitive area located in a reflective groove is prepared on the substrate, wherein the inner wall of the reflective groove is made of a reflective material to provide a fingerprint collection optical path for the photosensitive area.
[0020] Optionally, the step of sequentially preparing a transistor layer, a first electrode, a light-emitting area, and a second electrode on the substrate, and preparing a photosensitive area located within a reflective groove on the substrate, includes: sequentially preparing a transistor layer, a first electrode, a light-emitting area, and a second electrode on the substrate, and preparing a photosensitive area located within a reflective groove on the substrate, wherein the side wall of the reflective groove is formed by a metal wire structure of the transistor layer, one or more structures of the first electrode and the second electrode.
[0021] The technical solution provided in the embodiments of the present invention has at least the following technical effects or advantages:
[0022] The display panel, display device and manufacturing method provided by the embodiment of the present invention are arranged so that the orthographic projections of the photosensitive area and the luminous area of the display panel on the substrate do not overlap, and the photosensitive area is arranged in the reflective groove, and the side wall of the reflective groove can block the light of the luminous area and the influence of external light on the photosensitive area, so that the dark state of the photosensitive area is more obvious. And by setting the inner wall of the reflective groove to be a reflective material, a fingerprint collection light path is provided for the photosensitive area, so that the reflected light of the fingerprint is reflected by the reflective inner wall and irradiated to the photosensitive area to a greater extent, so that the bright state of the photosensitive area is more obvious, thereby increasing the difference between the dark and bright states of the photosensitive area and improving the accuracy of fingerprint recognition.
[0023] The above description is only an overview of the technical solution of the present invention. In order to more clearly understand the technical means of the present invention, it can be implemented according to the contents of the specification. In order to make the above and other purposes, features and advantages of the present invention more obvious and easy to understand, the specific implementation methods of the present invention are listed below. BRIEF DESCRIPTION OF THE DRAWINGS
[0024] Various other advantages and benefits will become apparent to those of ordinary skill in the art by reading the detailed description of the preferred embodiments below. The accompanying drawings are only for the purpose of illustrating the preferred embodiments and are not to be considered as limiting the present invention. Moreover, the same reference symbols are used throughout the accompanying drawings to represent the same components. In the accompanying drawings:
[0025] Figure 1 The structure of the display panel in the embodiment of the present invention is Figure 1 ;
[0026] Figure 2 The structure of the display panel in the embodiment of the present invention is Figure 2 ;
[0027] Figure 3 is a schematic diagram of the layout of a display panel in an embodiment of the present invention;
[0028] Figure 4 A partial enlarged view of the photosensitive area in an embodiment of the present invention;
[0029] Figure 5 is a flow chart of a method for manufacturing a display panel according to an embodiment of the present invention;
[0030] Figure 6 It is a structural diagram of a display device in an embodiment of the present invention. DETAILED DESCRIPTION
[0031] The exemplary embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. Although the exemplary embodiments of the present disclosure are shown in the accompanying drawings, it should be understood that the present disclosure can be implemented in various forms and should not be limited by the embodiments set forth herein. On the contrary, these embodiments are provided to enable a more thorough understanding of the present disclosure and to fully convey the scope of the present disclosure to those skilled in the art.
[0032] The present invention provides a display panel, please refer to Figure 1 , is a structural diagram of a display panel in an embodiment of the present invention, including:
[0033] A substrate 1, a photosensitive area 2, and a transistor layer 3, a first electrode 4, a light-emitting area 5 and a second electrode 6 sequentially arranged on the substrate 1;
[0034] The orthographic projections of the photosensitive area 2 and the luminous area 5 on the substrate 1 do not overlap, and the photosensitive area 2 is arranged in the reflective groove 101, and the inner wall of the reflective groove 101 is made of reflective material to provide a fingerprint collection optical path for the photosensitive area 2 (the light transmission path is as shown in FIG. Figure 1 ), that is, providing a reflection path for the light reflected by the finger 102.
[0035] The display panel may be an organic light-emitting diode (OLED) display panel or a light emitting diode (LED) display panel, which is not limited here. Specifically, if the display panel is an OLED display panel, the light-emitting area 5 is an organic light-emitting layer, wherein the first electrode 4 is an anode and the second electrode 6 is a cathode. Of course, the first electrode 4 may also be a cathode and the second electrode 6 may be an anode, which is not limited here.
[0036] like Figure 1 As shown, the transistor layer 3 is disposed on the substrate 1, and includes a polysilicon layer 31 (or an amorphous silicon layer), a gate 32 or a source and drain 33, wherein the source and drain 33 are conductively connected to the first electrode 4 to switch and drive the light-emitting area 5. A buffer layer 7 may be disposed between the transistor layer 3 and the substrate 1 to relieve stress between the transistor layer 3 and the substrate 1. The substrate 1 may be a transparent substrate or an opaque substrate, which is not limited here.
[0037] The light-emitting regions 5 are arranged at intervals on the first electrode 4, and specifically may include an alternating arrangement of red light-emitting (RedEL) devices, green light-emitting (GreenEL) devices, and blue light-emitting (BlueEL) devices. A pixel definition layer 8 (PDL) may be arranged between the light-emitting regions 5 to isolate the light-emitting regions 5 to prevent short circuits and tip discharges.
[0038] In some embodiments, the sidewall of the reflective groove 101 may be formed by enclosing one or more structures of the metal wire structure (eg, source-drain SD structure) of the transistor layer 3, the first electrode 4, and the second electrode 6. For example, Figure 1 As shown, the source and drain metals of the transistor layer 3 enclose the lower sidewall of the reflective groove 101, the first electrode 4 encloses the middle sidewall of the reflective groove 101, and the second electrode 6 encloses the upper sidewall of the reflective groove 101 under the support of the pixel definition layer 8. Since the electrodes, source and drain structures in the display panel are mostly made of metal materials and have good reflective effects, the original reflective structure that is essential for the display panel is used to enclose the reflective groove 101, which can reduce the complexity of the process caused by preparing the reflective groove 101 in an additional separate area and save costs.
[0039] Of course, the reflective groove 101 may also be made of metal material or other reflective materials, which is not limited here.
[0040] In some embodiments, the reflective groove 101 can be set as a cylinder or an inverted rounded table to better guide the reflected light of the fingerprint to the photosensitive area 2 located therein, thereby increasing the dark-light state difference of the photosensitive area 2. Of course, the reflective groove 101 can also be set as a square cylinder or an inverted trapezoidal table, etc., which is not limited here. The sidewalls of the reflective groove 101 can be continuously enclosed sidewalls or spaced enclosed sidewalls, which is not limited here.
[0041] In some embodiments, the photosensitive area 2 may be a photosensitive diode or an optical sensor to identify the fingerprint by identifying the intensity of the received fingerprint reflected light. Taking the photosensitive area 2 as a photosensitive diode as an example, the photosensitive diode may be as follows: Figure 1 The photodiode shown is a planar (Full in-cell) photodiode, which can also be a stacked photodiode. The corresponding conventional interconnection structure is used for photodiodes of different structures. For photodiodes, when there is no light, the reverse current is very small (generally less than 0.1 microamperes), which is called the dark current I_off. When there is light, photogenerated carriers are generated to form a reverse current of I_on. The greater the light intensity, the greater the I_on. The difference between the dark and bright states of the photosensitive area 2 is increased by the reflective groove 101, that is, the difference between I_on and I_off is increased, which greatly improves the accuracy of fingerprint recognition.
[0042] like Figure 1 As mentioned above, considering that the light from the luminous area 5 is often emitted in a direction away from the substrate 1, the distance between the photosensitive area 2 and the substrate 1 can also be set to be smaller than the distance between the luminous area 5 and the substrate 1, so as to further avoid the interference of the light emitted by the luminous area 5 on the photosensitive area 2, and avoid the reflective groove 101 surrounding the photosensitive area 2 on the light emitted by the luminous area 5, so as to ensure the display effect.
[0043] In some embodiments, the photosensitive area 2 can be set at the same layer as the first electrode 4, or at the same layer as the transistor layer 3. Since the transistor 3 is closer to the substrate 1 and the distance of the depression relative to the display panel surface is greater, it can better block the light in the bright state and increase the difference between the dark and bright states. Furthermore, the photosensitive area 2 can be set at the same layer as the polysilicon layer 31 (or amorphous silicon layer), the gate 32 or the source and drain 33 of the transistor layer 3. Figure 1 As shown, since the polysilicon layer 31 (or amorphous silicon layer) is often at the bottom of the transistor layer 3, setting the photosensitive area 2 and the polysilicon layer 31 (or amorphous silicon layer) in the same layer can better block the light in the bright state and increase the difference between the dark and bright states.
[0044] Of course, the photosensitive area 2 may also be disposed below the transistor layer 3, for example, disposed at the same layer as the buffer layer 7 or embedded in the substrate 1, which is not limited here. Furthermore, the photosensitive area 2 is not limited to being disposed at the same layer as other structures in the display panel, but may also be disposed at the junction of other two layers of structures, which is not limited here either.
[0045] In some embodiments, considering that the substrate 1 is often a transparent glass substrate, a light-isolating layer 9 may be provided between the substrate 1 and the photosensitive area 2. The light-isolating layer 9 is made of an opaque material, which may be a deposited thin film or a coating, to block the interference of light from below the substrate 1 on the photosensitive area 2, further increase the difference between the dark and bright states, and improve the fingerprint recognition accuracy. Figure 2 As shown, the light-isolating layer 9 can be disposed between the buffer layer 7 and the substrate 1 , and of course, can also be disposed between the buffer layer 7 and the photosensitive area 2 , which is not limited here.
[0046] like Figure 1 As shown, a transparent protective cover plate 10 may be further provided on the display panel at the opposite side of the substrate 1 to protect the display panel.
[0047] In some embodiments, in order to enhance the accuracy of fingerprint recognition, it is necessary to set a plurality of photosensitive areas 2 in a designated area of the display panel or in a full-screen distribution. Specifically, a plurality of photosensitive areas 2 and a plurality of light-emitting areas 5 may be arranged alternately and repeatedly in an array, so that the photosensitive areas 2 can evenly and fully cover the screen area where fingerprints need to be recognized, thereby increasing the accuracy of fingerprint recognition from a layout perspective.
[0048] For example, Figure 3 and Figure 4 As shown, Figure 3 The small rectangular box in the middle is the light-emitting area 5, that is, the RGB pixel area; the circular area is the photosensitive area 2; and the area in the dotted box is the under-screen fingerprint recognition area. Figure 4 for Figure 3 The enlarged view of the photosensitive area 2 and the reflective groove 101 in FIG. 1 shows that the photosensitive area 2 is located in the reflective groove 101 . Figure 3 The photosensitive areas 2 and the light-emitting areas 5 are alternately aligned and arranged in a rectangular array, so as to make full use of the gaps between the light-emitting areas 5 to increase the distribution of the photosensitive areas 2. Of course, the photosensitive areas 2 can also be arranged in the gaps between the light-emitting areas 5 along the diagonal direction of the light-emitting areas 5, and alternately arranged in a network array, which is not limited here.
[0049] Based on the same inventive concept, an embodiment of the present invention further provides a method for manufacturing a display panel, such as Figure 5 FIG. 1 is a flow chart of a method for manufacturing a display panel according to an embodiment of the present invention, comprising:
[0050] Step S501, providing a substrate 1;
[0051] Step S502, prepare a transistor layer 3, a first electrode 4, a light-emitting area 5 and a second electrode 6 in sequence on the substrate 1, and prepare a photosensitive area 2 located in the reflective groove 101 on the substrate 1, wherein the inner wall of the reflective groove 101 is a reflective material to provide a fingerprint collection optical path for the photosensitive area 2.
[0052] Specifically, in step S502, semiconductor processes such as deposition, etching and cleaning are first used to sequentially prepare the polysilicon layer 31, the gate 32 and the source and drain 33 of the transistor layer 3 on the substrate 1. Then, a first electrode 4 is formed on the substrate 1 by evaporation, sputtering or etching, and then a pixel light-emitting area 5 is prepared on the first electrode 4, and then a second electrode 6 is prepared.
[0053] Regarding the photosensitive area 2, it can be prepared before or after any step of preparing the transistor layer 3, preparing the first electrode 4, preparing the light-emitting area 5 and preparing the second electrode 6. There is no limitation here. It only needs to ensure that the prepared photosensitive area 2 is located in the reflective groove 101.
[0054] Regarding the reflective groove 101, the metal wire structure (for example, source-drain structure) of the transistor layer 3, the first electrode 4, and one or more structures of the second electrode 6 can be used to enclose and form the sidewall of the reflective groove 101. Since the electrodes in the display panel, such as the source and drain structures, are mostly made of metal materials and have good reflective effects, the original reflective structure indispensable to the display panel is used to enclose and form the reflective groove 101, which can reduce the complexity of the process caused by preparing the reflective groove 101 in an additional separate area and save costs. Of course, the reflective material can also be deposited and etched to prepare the reflective groove 101, which is not limited here.
[0055] For example, the preparation Figure 1 The process steps of the display panel shown may be:
[0056] First, the source and drain metal of the transistor layer 3 is deposited and etched to enclose the lower sidewall of the reflective groove 101, and the photosensitive area 2 and the interconnection structure of the photosensitive area 2 are deposited and prepared in the process interval of preparing the transistor layer 3.
[0057] The first electrode 4 is then deposited and etched to enclose and form the middle sidewall of the reflective groove 101 .
[0058] Then, a pixel defining layer 8 is deposited, and the pixel defining layer 8 is etched to expose the area where the light emitting area 5 needs to be prepared, and to expose the area where the photosensitive area 2 is prepared.
[0059] Next, the light-emitting area 5 and the patterned second electrode 6 are prepared in sequence. The second electrode 6 does not cover the area where the photosensitive area 2 is prepared, and covers the edge of the light-emitting area 5 and the pixel defining layer 8 to enclose and form the upper side wall of the reflective groove 101 under the support of the pixel defining layer 8.
[0060] In this way, the source and drain electrodes 33, the first electrode 4, and the second electrode 6 together enclose the reflective groove 101, thereby providing an optical path for the light reflected by the fingerprint to the photosensitive area 2 inside the reflective groove 101. Through the reflective effect of the inner wall of the reflective groove 101, the reflected light of the fingerprint is reflected by the metal inner wall to irradiate the photosensitive area 2 to a greater extent, thereby greatly improving the accuracy of fingerprint recognition.
[0061] Since the manufacturing method of the display panel introduced in the embodiment of the present invention is the manufacturing method corresponding to the display panel introduced in the embodiment of the present invention, its specific implementation method has been described in the process of introducing the display panel, so based on the display panel introduced in the embodiment of the present invention, the person skilled in the art can understand the specific process and variation of the method, so it is not repeated here. All the manufacturing methods corresponding to the display panel of the embodiment of the present invention belong to the scope of protection of the present invention.
[0062] Based on the same inventive concept, an embodiment of the present invention further provides a display device, such as Figure 6 , which is a structural diagram of a display device in an embodiment of the present invention, including: a display panel 601 provided in an embodiment of the present invention.
[0063] The technical solution provided in the embodiments of the present invention has at least the following technical effects or advantages:
[0064] The display panel, display device and manufacturing method provided by the embodiment of the present invention are arranged so that the orthographic projections of the photosensitive area and the luminous area of the display panel on the substrate do not overlap, and the photosensitive area is arranged in the reflective groove, and the side wall of the reflective groove can block the light of the luminous area and the influence of external light on the photosensitive area, so that the dark state of the photosensitive area is more obvious. And by setting the inner wall of the reflective groove to be a reflective material, a fingerprint collection light path is provided for the photosensitive area, so that the reflected light of the fingerprint is reflected by the reflective inner wall and irradiated to the photosensitive area to a greater extent, so that the bright state of the photosensitive area is more obvious, thereby increasing the difference between the dark and bright states of the photosensitive area and improving the accuracy of fingerprint recognition.
[0065] The algorithm and display provided herein are not inherently related to any particular computer, virtual system or other device. Various general purpose systems can also be used together with the teachings based on this. According to the above description, it is obvious that the structure required for constructing such systems. In addition, the present invention is not directed to any specific programming language either. It should be understood that various programming languages can be utilized to realize the content of the present invention described herein, and the description of the above specific languages is for disclosing the best mode of the present invention.
[0066] In the description provided herein, a large number of specific details are described. However, it is understood that embodiments of the present invention can be practiced without these specific details. In some instances, well-known methods, structures and techniques are not shown in detail so as not to obscure the understanding of this description.
[0067] Similarly, it should be understood that in order to streamline the present disclosure and aid in understanding one or more of the various inventive aspects, in the above description of exemplary embodiments of the present invention, various features of the present invention are sometimes grouped together into a single embodiment, figure, or description thereof. However, this disclosed method should not be interpreted as reflecting the intention that the claimed invention requires more features than those explicitly recited in each claim. More specifically, as reflected in the claims below, inventive aspects lie in less than all the features of the individual embodiments disclosed above. Therefore, the claims that follow the specific embodiment are hereby expressly incorporated into the specific embodiment, with each claim itself serving as a separate embodiment of the present invention.
[0068] Those skilled in the art will appreciate that the modules in the devices in the embodiments may be adaptively changed and arranged in one or more devices different from the embodiments. The modules or units or components in the embodiments may be combined into one module or unit or component, and in addition they may be divided into a plurality of submodules or subunits or subcomponents. All features disclosed in this specification (including the accompanying claims, abstracts and drawings) and all processes or units of any method or device disclosed in this manner may be combined in any combination, except that at least some of such features and / or processes or units are mutually exclusive. Unless otherwise expressly stated, each feature disclosed in this specification (including the accompanying claims, abstracts and drawings) may be replaced by an alternative feature providing the same, equivalent or similar purpose.
[0069] In addition, those skilled in the art will appreciate that, although some embodiments herein include certain features included in other embodiments but not other features, the combination of features of different embodiments is meant to be within the scope of the present invention and form different embodiments. For example, in the claims below, any one of the claimed embodiments may be used in any combination.
[0070] It should be noted that the above embodiments illustrate the present invention rather than limit it, and that those skilled in the art may devise alternative embodiments without departing from the scope of the appended claims. In the claims, any reference symbol between brackets shall not be construed as a limitation on the claims. The word "comprising" does not exclude the presence of components or steps not listed in the claims. The word "one" or "an" preceding a component does not exclude the presence of a plurality of such components. The present invention may be implemented by means of hardware comprising a number of different components and by means of a suitably programmed computer. In a unit claim enumerating a number of devices, several of these devices may be embodied by the same hardware item. The use of the words first, second, and third, etc., does not indicate any order. These words may be interpreted as names.
Claims
1. A display panel, characterized in that: include: A substrate, a photosensitive area, and a transistor layer, a first electrode, a light-emitting area, and a second electrode sequentially arranged on the substrate; The orthographic projections of the photosensitive area and the luminous area on the substrate do not overlap, the photosensitive area is arranged in a reflective groove, and the inner wall of the reflective groove is made of a reflective material to provide a fingerprint collection optical path for the photosensitive area; The sidewall of the reflective groove is formed by enclosing one or more of the following structures: the metal line structure of the transistor layer, the first electrode and the second electrode; The distance between the photosensitive area and the substrate is smaller than the distance between the light-emitting area and the substrate; The photosensitive area is arranged in the same layer as the first electrode or the transistor layer.
2. The display panel according to claim 1, wherein: The reflective groove is a cylinder or an inverted frustum.
3. The display panel according to claim 1, wherein: The photosensitive area is arranged in the same layer as the polysilicon layer, the gate or the source and drain of the transistor layer.
4. The display panel according to claim 1, wherein: Also includes: The light-isolating layer is disposed between the substrate and the photosensitive area.
5. The display panel according to claim 1, wherein: The photosensitive area is a photosensitive diode.
6. The display panel according to claim 1, wherein: include: There are a plurality of the photosensitive areas and a plurality of the luminescent areas, wherein the plurality of the photosensitive areas and the plurality of the luminescent areas are alternately arranged in an array.
7. A display device, characterized in that: A display panel comprising any one of claims 1 to 6.
8. A method for preparing a display panel, characterized in that: include: providing a substrate; A transistor layer, a first electrode, a light-emitting area, and a second electrode are sequentially prepared on the substrate, and a photosensitive area located in a reflective groove is prepared on the substrate, wherein the inner wall of the reflective groove is made of a reflective material to provide a fingerprint collection optical path for the photosensitive area; The method of sequentially preparing a transistor layer, a first electrode, a light-emitting area, and a second electrode on the substrate, and preparing a photosensitive area located in a reflective groove on the substrate, comprises: A transistor layer, a first electrode, a light-emitting area, and a second electrode are sequentially prepared on the substrate, and a photosensitive area located in a reflective groove is prepared on the substrate, wherein the sidewall of the reflective groove is formed by enclosing one or more structures of the metal wire structure of the transistor layer, the first electrode, and the second electrode; The distance between the photosensitive area and the substrate is smaller than the distance between the light-emitting area and the substrate; The photosensitive area is arranged in the same layer as the first electrode or the transistor layer.
Citation Information
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