System for processing a substrate

Abstract

The present invention provides a system for processing a substrate. The system for processing a substrate includes: a processing tube configured to provide a processing space for the substrate; and an exhaust module connected to an exhaust port of the processing tube to discharge processing residues in the processing space to the outside. The exhaust module includes: an exhaust pipe connected to the exhaust port; a sealed housing configured to accommodate at least a portion of the exhaust pipe; and a local exhaust component disposed in the sealed housing to exhaust the interior of the sealed housing.

Description

Technical Field

[0001] The present disclosure relates to a system for processing a substrate, and more particularly, to a system for processing a substrate that prevents exhaust gas discharged through an exhaust pipe from leaking to the outside. Background Art

[0002] Generally, substrate processing methods are classified into a single-wafer type substrate processing method capable of processing one substrate and a batch type substrate processing method capable of processing multiple substrates simultaneously. This single-wafer type substrate processing equipment has a simple structure but has low productivity. Therefore, batch type substrate processing equipment capable of mass-producing substrates is widely used.

[0003] In a system for processing a substrate, a chemical substance can be used as a processing gas for processing the substrate, and the chemical substance may have toxicity, flammability, corrosiveness, flame retardancy, etc., and may be harmful to the human body.

[0004] In a system for processing a substrate according to the related art, at least a part of an exhaust pipe for discharging processing residues of a processing pipe is exposed, and the processing residues discharged into the exhaust pipe may also contain toxic chemicals. Therefore, when the exhaust gas leaks into the exhaust pipe, a safety accident may occur due to the chemical substance.

[0005] Specifically, a connecting member (e.g., an O-ring) inserted into a gap between an exhaust port of a processing pipe and the exhaust pipe and / or between exhaust pipes is deformed and / or damaged by long-term use and / or heat, and thus leakage may occur, and the exhaust gas may leak through the gap.

[0006] When the exhaust gas leaks, not only is the exhaust gas harmful to the human body, but also dozens or hundreds of devices in a semiconductor manufacturing facility (FAB) must be shut down.

[0007] [Prior Art Documents]

[0008] [Patent Documents]

[0009] Korean Patent Publication No. 10-2012-0074326 Summary of the Invention

[0010] The present disclosure provides a system for processing a substrate that can prevent exhaust gas from leaking to the outside by jacketting the exhaust pipe.

[0011] According to an exemplary embodiment, a system for processing a substrate includes: a processing tube configured to provide a processing space for the substrate; and an exhaust module connected to an exhaust port of the processing tube to discharge processing residues in the processing space to the outside, wherein the exhaust module includes: an exhaust pipe connected to the exhaust port; a sealed housing configured to accommodate at least a portion of the exhaust pipe; and a local exhaust component disposed in the sealed housing to exhaust the interior of the sealed housing.

[0012] The exhaust module may further include a leak detection component disposed in the sealed housing to detect an exhaust gas leak of the exhaust pipe.

[0013] The exhaust module may further include a connection component configured to connect the exhaust pipe to the exhaust port of the processing tube.

[0014] The connection component may include: a first flange disposed in the processing tube; a second flange disposed at one end of the exhaust pipe; and a sealing component disposed between the first flange and the second flange.

[0015] The connection component may further include a flexible bellows.

[0016] The exhaust pipe may include a first exhaust pipe connected to the exhaust port and extending in a first direction, and the sealed housing may include a first housing component configured to accommodate the first exhaust pipe.

[0017] The system may further include a lower chamber disposed below the processing tube, wherein the exhaust pipe may further include a second exhaust pipe connected to the first exhaust pipe and extending downward, and the sealed housing may further include a second housing component spaced apart from the lower chamber and configured to accommodate the second exhaust pipe.

[0018] The system may further include a substrate boat in which a plurality of substrates are loaded in multiple levels and accommodated in the processing tube.

[0019] The processing tubes may be provided in a plurality and arranged in a direction intersecting the extending direction of the exhaust pipe, and the exhaust module may be disposed in each of the processing tubes.

[0020] The exhaust pipes of each of the exhaust modules may be arranged side by side with each other.

[0021] The system may further include a plurality of gas supply modules respectively disposed in the processing tubes and symmetrically arranged with each other.

[0022] At least a portion of each of the exhaust modules may be disposed between the plurality of gas supply modules.

[0023] The plurality of gas supply modules and the exhaust modules may be at least partially arranged side by side.

[0024] The exhaust module may further include a leakage gas dilution component connected to the local exhaust component to dilute the leaked exhaust gas. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] The exemplary embodiments can be more particularly understood from the following description taken in conjunction with the accompanying drawings, in which:

[0026] Figure 1 is a schematic perspective view of a system for processing a substrate according to an exemplary embodiment.

[0027] Figure 2 is a conceptual diagram for explaining a lower chamber according to an exemplary embodiment.

[0028] Figure 3 is a coupled perspective view of a dual system for processing a substrate according to an exemplary embodiment.

[0029] Figure 4 is a plan view of a dual system for processing a substrate according to an exemplary embodiment. DETAILED DESCRIPTION

[0030] Hereinafter, specific embodiments will be described in more detail with reference to the accompanying drawings. However, the present invention may be embodied in different forms and should not be construed as limited to the embodiments set forth herein. On the contrary, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the present invention to those skilled in the art. In the description, like elements are denoted by like reference numerals. In the drawings, the dimensions of layers and regions are enlarged for clarity of illustration. Throughout the specification, like reference numerals refer to like elements.

[0031] Figure 1 is a schematic perspective view of a system for processing a substrate according to an exemplary embodiment.

[0032] Reference Figure 1 , a system 100 for processing a substrate according to an exemplary embodiment includes: a processing tube 110 providing a processing space for the substrate 10; and an exhaust module 120 connected to an exhaust port 111 of the processing tube 110 to discharge processing residues in the processing space to the outside.

[0033] The processing tube 110 may provide a processing space for the substrate 10, and a processing process of a single or multiple substrates 10 may be performed in the processing space. For example, the processing tube 110 may have a cylindrical shape, which has a closed upper portion and an open lower portion and is made of a heat-resistant material such as quartz or ceramic. A plurality of substrates 10 may be accommodated for processing in the processing tube 110. Here, the processing space may be a space for accommodating the substrate boat 115 and also performing an actual processing process (e.g., a deposition process), and a plurality of substrates 10 are laminated on the substrate boat 115 in the longitudinal direction of the processing tube 110.

[0034] The exhaust module 120 may be connected to the exhaust port 111 of the processing tube 110, and discharge the processing residues in the processing space to the outside. For example, the exhaust pipe 121 may communicate with the exhaust port 111 of the processing tube 110. Therefore, the processing residues may be discharged from the processing space and discharged to the outside.

[0035] Here, the exhaust module 120 includes an exhaust pipe 121 connected to the exhaust port 111, a sealed housing 122 accommodating at least a part of the exhaust pipe 121, and a local exhaust component 123 provided in the sealed housing 122 and exhausting the inside of the sealed housing 122. The exhaust pipe 121 may be connected to the exhaust port 111 and provide a path through which the processing residues are discharged from the processing space via the exhaust port 111, so that the exhaust containing the processing residues is discharged.

[0036] The sealed housing 122 may accommodate at least a part of the exhaust pipe 121 and prevent the exhaust from leaking from the exhaust pipe 121 to the external environment (e.g., the working space of a semiconductor manufacturing facility (FAB)). Therefore, even if the exhaust leaks from the exhaust pipe 121, it is possible to prevent the operator and / or the device in the external environment from being affected or damaged by the leaked exhaust.

[0037] The local exhaust component 123 may be provided in the sealed housing 122 and may exhaust the inside of the sealed housing 122. For example, the local exhaust component 123 may discharge the leaked exhaust from the inside of the sealed housing 122 and prevent the exhaust from saturating in the sealed housing 122. In addition, it is possible to prevent the outer wall of the exhaust pipe 121 and / or the inner wall of the sealed housing 122 from being damaged by the leaked exhaust. In addition, the leaked exhaust may be discharged and removed from the sealed housing 122, and thus a part where leakage occurs may be maintained. Here, after the leaked exhaust is completely removed from the inside of the sealed housing 122, the sealed housing 122 is opened, and then the exhaust pipe 121 and the connection component 125 where leakage occurs inside the sealed housing 122 may be maintained. The local exhaust component 123 may exhaust the inside of the sealed housing 122 to maintain the inside of the sealed housing 122 in a vacuum state, and the internal pressure (or atmospheric pressure) of the sealed housing 122 may be maintained low so as to fundamentally prevent the gas itself from leaking from the inside of the sealed housing 122 to the outside.

[0038] In a system 100 for processing a substrate, chemicals that are toxic, flammable, corrosive, retardant, etc. and harmful to the human body can be used as processing gases for processing the substrate. Additionally, toxic chemicals (such as DCS, NH3, F2, etc.) may be contained in the processing residues discharged into the exhaust pipe 121. Therefore, when the exhaust gas containing the processing residues leaks from the exhaust pipe 121 to the external environment, safety accidents may occur due to the chemicals. Additionally, when the exhaust gas leaks, not only may the exhaust gas be harmful to the human body, but dozens or hundreds of devices in the semiconductor manufacturing facility (FAB) must be shut down. Therefore, even if the exhaust gas leaks from the exhaust pipe 121, it is particularly important to prevent the leaked exhaust gas from leaking to the external environment.

[0039] Therefore, in the system 100 for processing a substrate according to an exemplary embodiment, the exhaust pipe 121 can be jacketed with a sealed housing 122, and the inside of the sealed housing 122 can be exhausted through a local exhaust member 123 so as to prevent the exhaust gas from leaking to the external environment even if a leak occurs in the exhaust pipe 121, the connection member 125, etc. Therefore, safety accidents caused by the chemicals contained in the exhaust gas can be prevented, and the shutdown of all devices in the semiconductor manufacturing facility (FAB) due to the exhaust gas leak can be prevented.

[0040] Additionally, the exhaust module 120 may further include a leak detection member 124 disposed in the sealed housing 122 to detect an exhaust leak of the exhaust pipe 121. The leak detection member 124 can be disposed in the sealed housing 122 and can sense whether the exhaust gas leaks from the exhaust pipe 121. For example, the leak detection member 124 can detect the leaked exhaust gas by directly detecting the exhaust gas and detect the exhaust leak by measuring (or sensing) a change in the internal pressure of the sealed housing 122. Therefore, the exhaust gas leaked from the exhaust pipe 121 can be effectively removed immediately after the leak occurs. Additionally, the appearance of a gap in the exhaust pipe 121 and the connection member 125 can be detected to stop only the operation of the processing pipe 110 connected to the leaking exhaust pipe 121 and / or the connection member 125, thereby maintaining the leaking exhaust pipe 121 and / or the connection member 125 such that the system 100 for processing a substrate does not continue to operate in a state of exhaust gas leak.

[0041] That is, in the system 100 for processing a substrate according to an exemplary embodiment, the leak detection member 124 can be disposed in the sealed housing 122 to detect an exhaust leak. Therefore, when a leak occurs, the exhaust gas leaked from the exhaust pipe 121 can be immediately and effectively removed, and additionally, the appearance of a gap in the exhaust pipe 121 and / or the connection member 125 can be detected to maintain the exhaust pipe 121 and / or the connection member 125 such that the system 100 for processing a substrate does not continue to operate in a state of exhaust gas leak.

[0042] In addition, the exhaust module 120 may further include a connection member 125 that connects the exhaust pipe 121 to the exhaust port 111 of the processing pipe 110. The connection member 125 may connect one end of the exhaust pipe 121 to the exhaust port 111 of the processing pipe 110 and may seal the gap between one end of the exhaust pipe 121 and the exhaust port 111 of the processing pipe 110. For example, the connection member 125 may include a sealing member 125c such as an O-ring for sealing.

[0043] The system 100 for processing a substrate according to an exemplary embodiment may further include a heater (not shown) disposed in the processing pipe 110 to supply thermal energy to the processing pipe 110.

[0044] The heater (not shown) may be disposed in the processing pipe 110 and may supply thermal energy (or heat) to the processing pipe 110. For example, the heater (not shown) may be disposed outside the processing pipe 110 and may accommodate and heat the processing pipe 110. Accordingly, the temperature of the plurality of substrates 10 accommodated in the processing pipe 110 may be raised to a temperature capable of processing (or reacting) the substrates.

[0045] In the system 100 for processing a substrate, since the processing pipe 110 is heated to a high temperature for substrate processing, heat may be transferred to the connection member 125, and thus, the sealing member 125c may be deformed or damaged due to the heat. Accordingly, a gap may occur in the connection member 125, and thus, exhaust gas may leak through the gap. In addition, since the sealing member 125c is made of a flexible material so as to be in close contact with the exhaust port 111 of the processing pipe 110 and / or the exhaust pipe 121 for sealing, the sealing member 125c may be deformed or damaged to generate a gap even after long-term use.

[0046] When a plurality of exhaust pipes 121 are provided, the connection member 125 may also be provided between the exhaust pipes 121. The connection member 125 provided between the exhaust pipes 121 may also include a sealing member 125c for sealing, and the sealing member 125c may also be deformed and / or damaged due to long-term use and / or heat to generate a gap, and thus, exhaust gas leakage may occur due to the gap.

[0047] The connection member 125 includes a first flange 125a disposed in the processing pipe 110, a second flange 125b disposed on one end of the exhaust pipe 121, and a sealing member 125c disposed between the first flange 125a and the second flange 125b. The first flange 125a may be disposed in the processing pipe 110 and may be disposed at the lower end of the processing pipe 110 to form the exhaust port 111. Here, the first flange 125a may be made of quartz or ceramic in the same manner as the processing pipe 110.

[0048] The second flange 125b can be disposed at one end of the exhaust pipe 121 and can be connected to the first flange 125a to allow the exhaust port 111 and the exhaust pipe 121 to communicate with each other. Here, the second flange 125b can be made of the same material as the exhaust pipe 121 and can be made of a corrosion-resistant metal material.

[0049] The sealing member 125c can be disposed between the first flange 125a and the second flange 125b and can be in close contact with each of the first flange 125a and the second flange 125b to seal the gap between the first flange 125a and the second flange 125b.

[0050] The connecting member 125 can further include a bellows 125d having elasticity or variable length. The bellows 125d can have a variable length and can seal the gap between the first flange 125a and the second flange 125b. In addition, the bellows 125d can allow the first flange 125a and the second flange 125b to be spaced apart from each other by a safe distance or a greater distance so that the first flange 125a and the second flange 125b are not affected by each other again.

[0051] Since the first flange 125a and the second flange 125b are made of different materials (e.g., quartz and metal materials), at least one of the first flange 125a and the second flange 125b may be damaged when they are in close contact with each other to press or collide with each other. For example, the second flange 125b made of a metal material is relatively stronger than the first flange 125a made of quartz. Therefore, when the second flange 125b collides with the first flange 125a or applies pressure to the first flange 125a, the first flange 125a may be damaged, such as cracked. Thus, the first flange 125a and the second flange 125b can be spaced apart from each other by a safe distance or a greater distance through the bellows 125d and can seal the first flange 125a and the second flange 125b. Here, the exhaust pipe 121 made of different materials can be frequently coupled to and separated from the exhaust port of the processing pipe 110 in order to maintain the processing pipe 110 and the exhaust module 120. Here, the bellows 125d can prevent the first flange 125a and the second flange 125b made of different materials from being damaged due to collision and from pressing against each other by being coupled to each other.

[0052] When the connecting member 125 includes the bellows 125d, particles can be generated from the outer wall of the bellows 125d when the bellows 125d is stretched or changed (in length), and additionally, the bellows 125d can be deformed and / or damaged by long-term use and / or heat to create gaps. In the system 100 for processing a substrate according to an exemplary embodiment, particles generated from the outer wall of the bellows 125d can be prevented from leaking into the external environment through the sealing housing 122 and / or the local exhaust member 123, and additionally, exhaust gas leaking through gaps created by long-term use and / or heat can be prevented from leaking into the external environment.

[0053] When the exhaust port 111 of the processing tube 110 is coupled (or re-coupled) to one exhaust pipe 121 and / or a plurality of exhaust pipes 121 due to the initial installation of the system 100 for processing a substrate and / or re-installation after maintaining the processing tube 110, the exhaust pipes 121, the connecting member 125, etc., it is necessary to detect whether leakage occurs in the connecting member 125 between the exhaust port 111 of the processing tube 110 and the exhaust pipe 121 and / or between the exhaust pipes 121. In this case, in the system 100 for processing a substrate according to an exemplary embodiment, leakage can be effectively detected through the sealing housing 122 and the leakage detection member 124, and even if leakage occurs due to a defective coupling, the leakage exhaust gas can be effectively removed (or discharged) through the local exhaust member 123 without leaking the exhaust gas into the external environment. Here, although the process is carried out in a state where separate detection is omitted, leakage of the exhaust gas can still be detected.

[0054] When cooling is performed to prevent deformation due to heat through the sealing member 125c, when the exhaust gas cools on the surface of the sealing member 125c, particles can adhere to the surface of the sealing member 125c, and thus, the particles may affect the discharge or processing process. Therefore, the sealing member 125c may not be cooled, and even if the sealing member 125c is cooled, it is difficult to install a cooling configuration due to the narrow space. Therefore, it is necessary to detect leakage of the exhaust gas from the connecting member 125, effectively remove the leakage exhaust gas, and maintain the leaking connecting member 125. Therefore, in this embodiment, the exhaust pipe 121 and the connecting member 125 can be jacketed using the sealing housing 122, and the inside of the sealing housing 122 can be exhausted through the local exhaust member 123 so as to prevent the exhaust gas from leaking into the external environment even if leakage occurs in the exhaust pipe 121, the connecting member 125, etc.

[0055] Here, the exhaust pipe 121 may include a first exhaust pipe 121a connected to the exhaust port 111 and extending in the first direction 11. The first exhaust pipe 121a may be connected to the exhaust port 111 and extend in the first direction 11, and at least a part of the first exhaust pipe 121a may be accommodated in the sealed housing 122. Here, the first exhaust pipe 121a may be horizontally arranged and may be a part having only a straight section. In this case, the exhaust pipe 121 may be arranged in a straight line without bending at the exhaust port 111, and thus, the exhaust pipe 121 may have a structure with straightness rather than a bent shape to improve the exhaust performance of the processing pipe 110.

[0056] If the exhaust pipe 121 is bent, the exhaust performance may deteriorate depending on the number of bends of the exhaust pipe 121, and the first exhaust pipe 121a may be horizontally arranged in a straight line to prevent the exhaust performance from deteriorating, and the exhaust performance of the processing pipe 110 can be ensured. Therefore, the horizontal section of the exhaust pipe 121 including the first exhaust pipe 121a can be arranged in a straight line. When the horizontal section of the exhaust pipe 121 is arranged in a straight line, the exhaust pipe 121 may have an inner diameter of about 50 mm or more than 50 mm (or a size of about 100 Å or more than 100 Å), and thus the exhaust performance of the processing pipe 110 can be further improved. In this case, the inner diameter of the exhaust pipe 121 may be smaller than the width of the processing pipe 110.

[0057] The sealed housing 122 may include a first housing member 122a that houses the first exhaust pipe 121a. The first housing member 122a may house the first exhaust pipe 121a, and at least one end of the first exhaust pipe 121a connected to the exhaust port 111 and the connecting member 125 may be housed in the first housing member 122a. Therefore, the housing can act to prevent the gap between the exhaust port 111 of the processing pipe 110 where exhaust leakage frequently occurs and one end of the exhaust pipe 121 from being exposed to the outside. Therefore, even if exhaust leaks in this part (such as the connecting member, etc.), the exhaust leakage to the external environment can still be prevented.

[0058] The exhaust module 120 may further include a vacuum sensor 127 connected to the exhaust pipe 121 (for example, connected to the first exhaust pipe) to measure the degree of vacuum in the processing pipe 110. The vacuum sensor 127 may be provided (or connected) to the exhaust pipe 121, such as the first exhaust pipe 121a, and may measure the degree of vacuum in the processing pipe 110. The vacuum sensor 127 must be connected to the exhaust pipe 121 to communicate with the exhaust pipe 121 in order to measure the degree of vacuum in the processing pipe 110. Therefore, the connecting member 125 may also be provided at the connecting part between the exhaust pipe 121 and the vacuum sensor 127, and exhaust leakage may occur between the exhaust pipe 121 and the vacuum sensor 127 (such as the connecting member). Therefore, the sealed housing 122 may house the connecting member between the exhaust pipe 121 and the vacuum sensor 127.

[0059] Figure 2 A conceptual diagram for explaining a lower chamber according to an exemplary embodiment. Here, Figure 2 (a) of shows a side view of a system for processing a substrate, and Figure 2 (b) of shows a front view of the lower chamber.

[0060] Referring to Figure 2 , a system 100 for processing a substrate according to an exemplary embodiment may further include a lower chamber 130 disposed below a processing tube 110.

[0061] The lower chamber 130 may be disposed below the processing tube 110 to provide a space in which a plurality of substrates 10 are loaded in multiple levels (or vertically) and stacked on a substrate boat 115. Here, the substrate boat 115 on which a plurality of substrates 10 are loaded in the lower chamber 130 may be raised and received in the processing space of the processing tube 110 to perform a substrate processing process. For example, an upper portion of the lower chamber 130 may be opened to allow the substrate boat 115 to move up and down, and a passage for accessing the substrates 10 may be provided on one side to allow loading of a plurality of substrates 10. Here, the lower chamber 130 may be connected to a transfer chamber (not shown) and may have a passage connected to the transfer chamber (not shown). The substrates 10 may be loaded into the lower chamber from the transfer chamber (not shown) through the passage. A gate valve (not shown) may be installed outside the passage, and the passage may be opened and closed by the gate valve (not shown).

[0062] A system 100 for processing a substrate according to an exemplary embodiment may further include a substrate boat 115 in which a plurality of substrates 10 are laminated in multiple levels and received in the processing tube 110.

[0063] The plurality of substrates 10 may be loaded and received in the processing tube 110 in various states to perform a substrate processing process. That is, in the substrate boat 115, a plurality of substrates 10 may be loaded in multiple levels to perform a substrate processing process in a batch type. In addition, the substrate boat 115 may be disposed in the processing space of the processing tube 110, and when the substrate processing process is performed, the substrate boat 115 may be received in the internal space (i.e., the processing space). Here, a plurality of substrate boats 115 may be provided and respectively disposed in the processing spaces of a plurality of processing tubes 110. Here, the substrate boat 115 may have a plurality of independent spaces for individually processing a plurality of substrates 10.

[0064] In addition, the exhaust pipe 121 may further include a second exhaust pipe 121b that is connected to the first exhaust pipe 121a and extends downward. The second exhaust pipe 121b may extend downward, be directly connected to the first exhaust pipe 121a, or be connected through an additional exhaust pipe 121 and / or a connecting member 125. Even if the exhaust port 111 is disposed at a higher position through the lower chamber 130 via the second exhaust pipe 121b, the first exhaust pipe 121a may still be horizontal and straight.

[0065] In addition, when the exhaust pipe 121 has a top-mounted structure due to having a horizontal section of the first exhaust pipe 121a and a vertical section of the second exhaust pipe 121b, the first exhaust pipe 121a may be spaced apart from the bottom surface (or the surface facing downward) to provide a maintenance space between the first exhaust pipe 121a and the bottom surface.

[0066] Here, the sealing housing 122 may further include a second housing member 122b that is spaced apart from the lower chamber 130 and houses the second exhaust pipe 121b. The second housing member 122b may house the second exhaust pipe 121b. Since exhaust leakage may still occur in the second exhaust pipe 121b and / or the connecting member 125 that connects the second exhaust pipe 121b to another exhaust pipe 121, the second exhaust pipe 121b, the connecting member 125, etc. may be jacketed so as not to be exposed to the outside. Therefore, even if exhaust leakage occurs in the second exhaust pipe 121b, the connecting member 125, etc., the exhaust leakage can be prevented from leaking to the external environment.

[0067] In addition, the second housing member 122b may be spaced apart from the lower chamber 130, and a maintenance space between the second housing member 122b and the lower chamber 130 may be provided. In this case, the second housing member 122b may be disposed to face the lower chamber 130, and a maintenance port for maintaining the second exhaust pipe 121b, etc. may be provided on the surface opposite to the lower chamber 130. When the second housing member 122b is disposed to face the lower chamber 130, the exhaust port 111 is provided at the center of the processing tube 110 in the first direction 11, and the first exhaust pipe 121a may be provided in a straight line in the first direction 11 so as to maximize (or optimize) the exhaust performance of the processing tube 110. In addition, when the second housing member 122b has a maintenance port, the maintenance of the second exhaust pipe 121b, etc. may be facilitated in the maintenance space between the lower chamber 130 and the second housing member 122b.

[0068] The system 100 for processing a substrate according to an exemplary embodiment may further include a control module 150 provided in the first direction 11 of the second housing member 122b.

[0069] The control module 150 may be disposed in the first direction 11 of the second housing part 122b and may control the substrate processing process performed in the processing tube 110. For example, the control module 150 may control the operations of each of the exhaust module 120 and the gas supply module 140 to control the substrate processing process. Here, the control module 150 may be provided in the form of a control box, and the second housing part 122b may have a maintenance port for maintaining the second exhaust pipe 121b etc. on the surface in the first direction 11. Here, the maintenance port may be opened and closed by the control module 150. For example, the control module 150 may be connected to the second housing part 122b through a hinge structure so as to be opened and closed. Accordingly, the surface of the second housing part 122b in the first direction 11 may be opened and closed.

[0070] Figure 3 is a coupled perspective view of a dual system for processing a substrate according to an exemplary embodiment, and Figure 4 is a plan view of a dual system for processing a substrate according to an exemplary embodiment.

[0071] Reference Figure 3 and Figure 4 , a plurality of processing tubes 110 may be provided in a direction intersecting the extending direction of the exhaust pipe 121. For example, the exhaust pipe 121 may extend in the first direction 11, and a plurality of processing tubes 110 may be arranged in a second direction 12 intersecting the first direction 11. The plurality of processing tubes 110 may be arranged to be spaced apart from each other and paired in the second direction 12, and may also provide independent processing spaces. Here, the second direction 12 may be a direction transverse to the system 100 for processing a substrate. Each of the plurality of processing tubes 110 may have an internal space that can accommodate a substrate boat 115 during the substrate processing process, and may independently control the gas atmosphere (or ambient gas), temperature, etc. The plurality of processing tubes 110 may be independently controlled so that the substrate processing process is stably performed, the substrate throughput and the substrate processing quality of the system 100 for processing a substrate are improved, and the distance and / or the surrounding arrangement of the plurality of processing tubes 110 are reduced to reduce the footprint. Here, the plurality of processing tubes 110 may be provided as a single tube or may be provided as a plurality of tubes. Here, it is sufficient if the substrate boat 115 is accommodated therein to provide a processing space for performing the substrate processing process. For example, the plurality of processing tubes 110 may include an outer tube and an inner tube.

[0072] Here, the exhaust module 120 may be provided in each of the processing tubes 110. Since the exhaust module 120 is provided in each of the processing tubes 110, the exhaust of each processing tube 110 can be independently controlled, and the substrate processing process of each processing tube 110 can be independently controlled.

[0073] In this case, the exhaust pipes 121 of each of the exhaust modules 120 may be disposed side by side with each other. That is, the exhaust pipes 121 respectively provided to the exhaust module 120 may be disposed side by side so as to be linearly provided from the exhaust port 111 at the center of the processing pipe 110, and the exhaust performance of the processing pipe 110 may be maximized. In addition, the exhaust pipes 121 may be symmetric with each other such that a uniform substrate processing process is performed through uniform exhaust between the plurality of processing pipes 110.

[0074] The system 100 for processing a substrate according to an embodiment may further include a plurality of gas supply modules 140 respectively disposed in the processing pipes 110 and symmetrically arranged with each other.

[0075] The plurality of gas supply modules 140 may be respectively provided to the processing pipes 110 and symmetrically disposed with respect to each other. For example, the plurality of gas supply modules 140 may be respectively disposed in the first direction 11 of the processing pipes 110 and symmetrically disposed with respect to a line extending from the center between the plurality of processing pipes 110 in the first direction 11 (or a line extending from the center between the plurality of processing pipes 110 in the first direction). The plurality of gas supply modules 140 are disposed symmetrically with each other in the first direction 11 of the processing pipes 110 to respectively control the gas supply of the processing pipes 110. Here, the substrate processing process of each of the processing pipes 110 may be independently controlled by controlling the gas supply of each of the processing pipes 110, and a uniform substrate processing process may be performed through uniform gas supply between the plurality of processing pipes 110. Here, the plurality of gas supply modules 140 may be spaced apart from each other in the second direction 12 to provide a space therebetween and between the gas supply module 140 and the processing pipe 110, and lime may be maintained in the space between the plurality of gas supply modules 140.

[0076] In the system 100 for processing a substrate according to an exemplary embodiment, the substrate throughput may be improved by providing a plurality of processing pipes 110 having independent processing spaces from each other. In addition, in the system 100 for processing a substrate, the plurality of gas supply modules 140 may be arranged to be symmetric with each other in the first direction 11 of each of the processing pipes 110 to provide a maintenance space in the space between the plurality of gas supply modules 140 and / or in the spaced space between the sealing case 122 and each of the gas supply modules 140.

[0077] At least a portion of each exhaust module 120 may be disposed between the plurality of gas supply modules 140. For example, the first exhaust pipe 121a of each exhaust module 120 may be disposed between the plurality of gas supply modules 140. That is, the plurality of gas supply modules 140 may be symmetrically disposed to deviate from both sides of a line extending from the center of the corresponding processing tube 110 of the plurality of processing tubes 110 in the first direction 11 (or a line extending from the center of the corresponding processing tube in the first direction) (or in a direction away from each other).

[0078] When the plurality of gas supply modules 140 deviate from the line extending from the center of the corresponding processing tube 110 in the first direction 11, the space between the plurality of gas supply modules 140 may be wider, and a wider maintenance space may be ensured between the plurality of gas supply modules 140. For example, the plurality of gas supply modules 140 may be disposed to deviate from the line extending from the center of the corresponding processing tube 110 (e.g., from the center of the corresponding processing tube) diagonally (or in the diagonal direction) in the first direction 11. In addition, the plurality of gas supply modules 140 may be disposed to deviate from the line extending from the center of the corresponding processing tube 110 in the first direction 11 by extending so as to deviate from the center of the corresponding processing tube 110 in the second direction 12.

[0079] In this case, the plurality of gas supply modules 140 and the exhaust module 120 may be at least partially disposed side by side. For example, the first exhaust pipe 121a of the exhaust module 120 may be linearly arranged in the first direction 11, and the plurality of gas supply modules 140 may also extend parallel to the first exhaust pipe 121a in the first direction 11. When the plurality of gas supply modules 140 extend in the first direction 11, the width of the system 100 for processing the substrate in the second direction 12 may be minimized. Here, the plurality of gas supply modules 140 may be disposed side by side at both ends of the plurality of processing tubes 110 in the first direction 11, and may be disposed side by side to extend from both ends of the processing component (or processing area) where the plurality of processing tubes 110 are disposed in the first direction 11. In this case, the width of the system 100 for processing the substrate in the second direction 12 may be minimized, and thus the maintenance space may be maximized. In addition, for the laminar flow of the processing gas, the plurality of gas supply modules 140 must supply the processing gas in a direction opposite to the exhaust port 111 of the processing tube 110. Here, when the plurality of gas supply modules 140 are arranged side by side at both ends of the system 100 for processing the substrate in the second direction 12, the number of bends and / or the bending distance of the gas supply pipeline may be reduced and minimized. In addition, since the plurality of gas supply modules 140 may not interfere with the exhaust module 120 such as the exhaust pipe 121, the plurality of gas supply modules 140 may be disposed as close as possible to each processing tube 110, respectively. Therefore, the length of the gas supply pipeline may be shortened, and thus the gas supply time may be shortened, and the gas supply performance may be improved.

[0080] Each of the plurality of gas supply modules 140 may be disposed in the lower portion of the sealed housing 122 (i.e., the lower portion of the first housing member) to provide a spaced-apart space (or a spaced-apart space from the first housing member) from the sealed housing 122. A maintenance space may be provided in the spaced-apart space between the plurality of gas supply modules 140 and the first housing member 122a to maintain the gas supply module 140, the exhaust module 120, and the processing tube 110.

[0081] The exhaust module 120 may further include a leak gas dilution member 126 connected to the local exhaust member 123 to dilute the leaked exhaust. The leak gas dilution member 126 may be connected to the local exhaust member 123 to dilute the leaked exhaust and also dilute the toxic gas contained in the leaked exhaust to be discharged to the outside. For example, after collecting the leaked exhaust in a predetermined space, the collected exhaust may be diluted with nitrogen (N2) or the like to discharge the exhaust to the outside in a non-toxic state.

[0082] As described above, in this embodiment, the exhaust pipe may be jacketed with a sealed housing, and the inside of the sealed housing may be exhausted through the local exhaust member. Therefore, even if a leak occurs in the exhaust pipe, the exhaust can be prevented from leaking to the outside. Accordingly, safety accidents caused by the chemicals contained in the exhaust can be prevented, and the shutdown of all devices in a semiconductor manufacturing facility (FAB) due to exhaust leakage can be prevented. In addition, a leak detection member may be provided in the sealed housing to detect the leakage of the exhaust, thereby effectively removing the exhaust leaked from the exhaust pipe. In addition, the appearance of a gap in the exhaust pipe and / or the connection member is detected, thereby maintaining the exhaust pipe and / or the connection member so that the system for processing the substrate does not continue to operate in a state of exhaust leakage. In addition, the substrate throughput can be improved by providing a plurality of processing tubes having independent processing spaces, and the plurality of gas supply modules may be symmetrically arranged in the first direction of each of the processing tubes to provide a maintenance space in the space between the plurality of gas supply modules and / or in the spaced-apart space between the sealed housing and the gas supply module. Exhaust pipes made of different materials may be frequently coupled to and separated from the exhaust ports of the processing tubes in order to maintain the processing tubes and the exhaust module. Here, a bellows may be provided between the exhaust port of the processing tube and the exhaust pipe to prevent the exhaust ports of the processing tubes made of different materials and the exhaust pipe from colliding with each other, and to prevent damage to the exhaust port of the processing tube and / or the exhaust pipe due to pressurization.

[0083] Although the embodiments have been described with reference to several illustrative embodiments, the embodiments are not limited to the foregoing embodiments, and thus, it should be understood that numerous other modifications and embodiments that will fall within the spirit and scope of the principles of the present disclosure can be designed by those skilled in the art. Accordingly, the actual protection scope of the present invention will be determined by the technical scope of the appended claims.

[0084] In a system for processing a substrate according to an exemplary embodiment, an exhaust pipe may be jacketed with a sealed housing, and the interior of the sealed housing may be exhausted through a local exhaust component, and thus, even if a leak occurs in the exhaust pipe, exhaust leakage to the outside can be prevented. Accordingly, safety accidents caused by chemicals contained in the exhaust can be prevented, and shutdown of all devices in a semiconductor manufacturing facility (FAB) due to exhaust leakage can be prevented.

[0085] In addition, a leak detection component may be provided in the sealed housing to detect exhaust leakage, thereby effectively removing the exhaust leaking from the exhaust pipe, and in addition, detecting the occurrence of a gap in the exhaust pipe and / or the connecting component, thereby maintaining the exhaust pipe and / or the connecting component such that the system for processing a substrate does not continue to operate in a state of exhaust leakage.

[0086] In addition, the substrate throughput can be improved by providing a plurality of processing tubes that provide independent processing spaces, and a plurality of gas supply modules can be symmetrically arranged in a first direction of each of the processing tubes to provide a maintenance space in the space between the plurality of gas supply modules and / or in the spaced-apart space between the sealed housing and the gas supply module.

[0087] Exhaust pipes made of different materials may be frequently coupled to and separated from the exhaust ports of the processing tubes in order to maintain the processing tubes and the exhaust modules. Here, a bellows may be provided between the exhaust ports of the processing tubes and the exhaust pipes to prevent the exhaust ports of the processing tubes and the exhaust pipes made of different materials from colliding with each other, and to prevent damage to the exhaust ports of the processing tubes and / or the exhaust pipes due to pressurization.

[0088] Although a system for processing a substrate has been described with reference to specific embodiments, it is not limited thereto. Accordingly, those skilled in the art will readily understand that various modifications and changes can be made thereto without departing from the spirit and scope of the present invention defined by the appended claims.

Claims

1. A system for processing a substrate, the system comprising: A processing tube configured to provide a processing space for the substrate; And An exhaust module connected to an exhaust port of the processing tube to discharge processing residues in the processing space to the outside, Wherein the exhaust module includes: An exhaust pipe connected to the exhaust port; A sealed housing configured to accommodate at least a portion of the exhaust pipe; A local exhaust component disposed in the sealed housing to exhaust the interior of the sealed housing; A vacuum sensor connected to the exhaust pipe to measure the degree of vacuum in the processing tube; and A leak detection component disposed in the sealed housing to detect exhaust leaks in the exhaust pipe, Wherein the sealed housing accommodates at least the connection portion between the exhaust pipe and the vacuum sensor, Wherein the exhaust module further includes a leak gas dilution component connected to the local exhaust component to dilute the leaked exhaust.

2. The system for processing a substrate according to claim 1, wherein the exhaust module further includes a connection component configured to connect the exhaust pipe to the exhaust port of the processing tube.

3. The system for processing a substrate according to claim 2, wherein the connection component includes: A first flange disposed in the processing tube; A second flange disposed at one end of the exhaust pipe; And A sealing component disposed between the first flange and the second flange.

4. The system for processing a substrate according to claim 3, wherein the connection component further includes a flexible bellows.

5. The system for processing a substrate according to claim 1, wherein the exhaust pipe includes a first exhaust pipe connected to the exhaust port and extending in a first direction, and The sealed housing includes a first housing component configured to accommodate the first exhaust pipe.

6. The system for processing a substrate according to claim 5, further including a lower chamber disposed below the processing tube, Wherein the exhaust pipe further includes a second exhaust pipe connected to the first exhaust pipe and extending downward, and The sealed housing further includes a second housing component spaced apart from the lower chamber and configured to accommodate the second exhaust pipe.

7. The system for processing a substrate according to claim 1, further including a substrate boat in which a plurality of substrates are loaded in multiple stages and accommodated in the processing tube.

8. The system for processing a substrate according to claim 1, wherein the processing tubes are provided in multiple numbers and arranged in a direction intersecting the extending direction of the exhaust pipe, and The exhaust module is disposed in each of the processing tubes.

9. The system for processing a substrate according to claim 8, wherein the exhaust pipes of each of the exhaust modules are arranged side by side with each other.

10. The system for processing a substrate according to claim 8, further including a plurality of gas supply modules respectively disposed in the processing tubes and symmetrically arranged with each other.

11. The system for processing a substrate according to claim 10, wherein at least a portion of each of the exhaust modules is disposed between the plurality of gas supply modules.

12. The system for processing a substrate according to claim 10, wherein the plurality of gas supply modules and the exhaust module are arranged at least partially side by side.

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