A device for measuring the spatial distribution of electron beams at the nanoscale

Abstract

The present invention discloses a device for measuring the spatial distribution of an electron beam at a nanoscale, and the structure thereof includes: a base is located in a receiving hole of a base, and the two are connected by a first connecting beam. A linear motor is vertically fixed on the upper surface of the base, an upper platform is covered on the linear motor, and the upper platform is connected to the base. A lifting plate is horizontally arranged in the upper top surface mounting hole of the upper platform, and the lifting plate is fixedly connected to the mover of the linear motor. One end of the baffle is fixed on the lifting plate, a Faraday cup is fixed on a bracket, and the Faraday cup is located directly below the other end of the baffle. A driving mechanism is connected to the base. The horizontal section of an inverted "L"-shaped connecting plate is connected to the lifting plate, and the vertical section of the connecting plate is located in a side wall channel of the upper platform, and the vertical section is connected to the channel by a second connecting beam. The present invention innovatively introduces a precision displacement platform to realize the shielding action of the baffle structure on the electron beam, which can effectively improve the measurement efficiency and accuracy of the size.

Description

Technical Field

[0001] The invention relates to the technical field of electron beam size measurement, and in particular to a device for measuring the spatial distribution of nanometer-scale electron beams. Background Art

[0002] The information disclosed in the background of the invention is only intended to enhance the understanding of the overall background of the invention and should not be necessarily regarded as an acknowledgment or any form of suggestion that the information constitutes the prior art already known to a person skilled in the art.

[0003] The accurate measurement of electron beam spot size has important practical significance. For example, in the exposure process of electron beam lithography, the exposure time needs to be determined according to the irradiation density of the electron beam. Only by accurately measuring the spatial distribution of the focused electron beam can accurate electron beam exposure measurement be obtained. The existing commonly used method is the imaging method, which uses electrons to bombard a fluorescent screen and observe the fluorescent screen to determine the size of the electron beam. Considering the optical transfer error, the minimum electron beam spot that can usually be observed is about 10um, which is difficult to meet the actual needs of technologies such as electron beam lithography. Summary of the invention

[0004] In view of the above problems, the present invention provides a device for measuring the spatial distribution of an electron beam at a nanoscale. The present invention innovatively introduces a precision displacement platform to realize the shielding action of the baffle structure on the electron beam, which can effectively improve the measurement efficiency and accuracy of the size. To achieve the above purpose, the present invention discloses the following technical solution.

[0005] A device for measuring the spatial distribution of an electron beam at a nanoscale, comprising: a base, a base, a linear motor, an upper platform, a lifting plate, a baffle, a bracket, a Faraday cup, a driving mechanism, and a connecting plate. Wherein: the base is located in a receiving hole of the base, and the two are connected by a first connecting beam. The linear motor is vertically fixed on the upper surface of the base, the upper platform is covered on the linear motor, and the upper platform is connected to the base. The lifting plate is horizontally arranged in the upper top surface mounting hole of the upper platform, and the lifting plate is fixedly connected to the mover of the linear motor so as to be lifted and lowered under the drive of the mover of the linear motor. One end of the baffle is fixed on the lifting plate, the bracket is fixed on the base on one side of the upper platform, the Faraday cup is fixed on the bracket, and the Faraday cup is located directly below the other end of the baffle. The driving mechanism is connected to the base to realize the movement of the base in the X or Y direction. The horizontal section of the inverted "L"-shaped connecting plate is connected to the lifting plate, and the vertical section of the connecting plate is located in the side wall channel of the upper platform. The vertical section and the channel are connected by a second connecting beam, and the first connecting beam and the second connecting beam are deformable parts.

[0006] Furthermore, there are at least four groups of connecting plates, which are evenly distributed around the lifting plate to form an orthogonal structure, thereby ensuring the freedom of the lifting plate only in the vertical direction, limiting the freedom of the lifting plate in the horizontal direction, and ensuring the stability of the lifting plate during the lifting process.

[0007] Furthermore, the upper platform is a hollow cubic structure, the lower end of which is open, and the vertical sections of the connecting plates are evenly distributed on the four side walls of the upper platform.

[0008] Furthermore, the driving mechanism is divided into two groups, both of which are arranged in the through holes on the side wall of the base, and the driving end of the driving mechanism is connected to the base. The first group of the driving mechanism and the bracket are respectively located on both sides of the upper platform, and the second group of the driving mechanism is located on the side of the upper platform between the first group of the driving mechanism and the bracket, so that the two groups of driving mechanisms are orthogonally distributed to realize the movement of the base and the upper platform in the X or Y direction.

[0009] Furthermore, the driving mechanism includes: a fixing part and a piezoelectric ceramic, wherein: the fixing part is detachably connected in the through hole, one end of the piezoelectric ceramic is connected to the fixing part, and the other end passes through the through hole and contacts the side wall of the square base, so as to utilize the telescopic movement of the piezoelectric ceramic to drive the base to move.

[0010] Furthermore, the fixing member is threadedly connected to the through hole so as to conveniently connect the piezoelectric ceramic in the through hole.

[0011] Furthermore, the first connecting beam is a group of vertically arranged metal sheets, and the four side walls of the square base are all provided with the first connecting beam, so as to ensure that the lifting plate has only horizontal freedom and limit the vertical freedom of the lifting plate.

[0012] Furthermore, the second connecting beam is a horizontally arranged group of metal sheets, and such second connecting beams are distributed on both sides of the lower end of the vertical section of the connecting plate, and its two ends are respectively connected to the inner walls of the side wall channels of the connecting plate and the upper platform, so as to constrain its freedom in the horizontal direction when the connecting plate moves up / down.

[0013] Furthermore, the metal sheet group is composed of a plurality of metal sheets, preferably aviation aluminum alloy sheets.

[0014] Furthermore, an electron beam emitting device is disposed above the Faraday cup, and the other end of the baffle is located between the electron beam emitting device and the Faraday cup.

[0015] Furthermore, a fixing hole is provided on the base, and a bolt passes through the fixing hole from the bottom surface of the base and is connected to the stator part of the linear motor, thereby fixing the linear motor on the base.

[0016] Furthermore, the bolts pass through the fixing holes from the bottom surface of the base and are connected to the wall surface of the lower port of the upper platform, thereby fixing the upper platform on the base.

[0017] Compared with the prior art, the present invention has the following beneficial effects: the measuring device of the spatial distribution of the nanoscale electron beam in the example of the present invention innovatively introduces a micro-nano motion platform, and realizes the shielding action of the baffle on the electron beam, which can effectively improve the measurement efficiency and accuracy of the electron beam spot size. When in use, the electron beam emitting device is first turned on and focused, and the end of the baffle is adjusted to be located outside the cup mouth of the Faraday cup through the movement of the driving mechanism, that is, the cup mouth of the Faraday cup is in an unblocked state, and then the current of the Faraday cup is recorded. Then, the baffle completely blocks the cup mouth of the Faraday cup through the vertical movement provided by the linear motor and the horizontal movement provided by the driving mechanism. At this time, the current of the Faraday cup is recorded, and then the electron beam spot size is obtained according to the change of the current situation before and after. This method of auxiliary measurement through the micro-nano motion platform designed by the present invention can significantly improve the measurement accuracy and efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The accompanying drawings in the specification, which constitute a part of the present invention, are used to provide a further understanding of the present invention. The exemplary embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute improper limitations on the present invention.

[0019] Figure 1 Schematic diagram of the structure of the device for measuring the spatial distribution of the nanoscale electron beam in the embodiment.

[0020] Figure 2 is a side view of a device for measuring the spatial distribution of an electron beam at the nanoscale in an embodiment.

[0021] Figure 3 It is a partial cross-sectional view of a device for measuring the spatial distribution of an electron beam at the nanoscale in an embodiment.

[0022] Figure 4 4 is an overall cross-sectional view of a device for measuring the spatial distribution of an electron beam at the nanoscale in an embodiment.

[0023] Figure 5 It is a front view of the upper platform in the embodiment.

[0024] In the above drawings, the numbers represent: 1-base, 2-base, 3-linear motor, 4-upper platform, 5-lifting plate, 6-baffle, 7-bracket, 8-Faraday cup, 9-driving mechanism, 10-connecting plate, 11-first connecting beam, 12-second connecting beam, 13-electron beam emitting device, 14-fixing hole, 101-through hole, 901-fixing part, 902-piezoelectric ceramic. DETAILED DESCRIPTION

[0025] It should be noted that the following detailed descriptions are illustrative and intended to provide further explanation of the present invention. Unless otherwise specified, all technical and scientific terms used in the present invention have the same meanings as those commonly understood by those skilled in the art to which the present invention belongs.

[0026] It should be noted that the terms used here are only for describing specific embodiments and are not intended to limit the exemplary embodiments according to the present invention. For the convenience of description, if the words "up", "down", "left" and "right" appear in the present invention, they only indicate that they are consistent with the up, down, left and right directions of the drawings themselves, and do not limit the structure. They are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to needs to have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention. The device for measuring the spatial distribution of nanoscale electron beams proposed in the present invention is now further described in conjunction with the drawings and specific embodiments of the specification.

[0027] refer to Figures 1 to 5 , an example of a device for measuring the spatial distribution of a nanoscale electron beam, comprising: a base 1, a base 2, a linear motor 3, an upper platform 4, a lifting plate 5, a baffle 6, a bracket 7, a Faraday cup 8, a driving mechanism 9, and a connecting plate 10. Among them:

[0028] refer to Figure 1 and Figure 3 The base 1 is a square block structure made of aviation aluminum alloy, with a receiving hole in the center. The base 2 is located in the receiving hole of the base 1, and the two are connected by a first connecting beam 11. The first connecting beam 11 is a metal sheet group made of aviation aluminum alloy arranged vertically, each of which is composed of a number of metal sheets made of aviation aluminum alloy that are parallel to each other and arranged at intervals, and the four side walls of the square base 2 are distributed with such first connecting beams 11, so as to ensure that the lifting plate 5 has only a horizontal degree of freedom and limit the vertical degree of freedom of the lifting plate 5. The metal sheet group can be cut on the base 1 by cutting technology. For example, the base 2 and the first connecting beam 11 are formed by cutting the central part of the base 1 by wire cutting technology, that is, the base 2 and the first connecting beam 11 themselves are part of the base 1, and after processing, they become a new structure different from the base 1. The above structure can also be formed by connecting the independent base 1, base 2, and first connecting beam 11. In short, the formation methods of the base 1 , the base 2 , and the first connecting beam 11 can be selected or determined according to actual needs.

[0029] refer to Figure 4, the linear motor 3 is vertically fixed on the upper surface of the base 2, that is, the mover of the linear motor 3 is on the top. Specifically, a fixing hole 14 is provided on the base 2, and a bolt passes through the fixing hole 14 from the bottom surface of the base 2 and is connected to the stator part of the linear motor 3, thereby fixing the linear motor 3 on the base 2. Other suitable methods can also be used to achieve the fixing of the linear motor 3 on the base 2.

[0030] The upper platform 4 is a hollow cubic structure, and its lower end is open. The upper platform 4 covers the linear motor 3. Figure 3 The bolts pass through the fixing holes 14 from the bottom surface of the base 2 and are connected to the lower port wall of the upper platform 4, thereby fixing the upper platform 4 on the base 2.

[0031] A circular mounting hole is opened on the top surface of the upper platform 4, and the circular lifting plate 5 is horizontally arranged in the mounting hole on the upper top surface of the upper platform 4, and the lifting plate 5 is fixedly connected to the mover of the linear motor 3 so as to be lifted and lowered under the drive of the mover of the linear motor 3.

[0032] There are four channels evenly distributed around the circular mounting hole, and the channels extend to the side wall of the upper platform 4, that is, the four side walls of the upper platform 4 have the channels, so as to facilitate the installation of the connecting plate 10. The connecting plate 10 is in an inverted "L" shape, and its horizontal section is located in the channel on the top surface of the upper platform 4, and one end of the horizontal section is connected to the side wall of the lifting plate 5 as a whole, and the vertical section of the connecting plate 10 is located in the side wall channel of the upper platform 4. The connecting plates 10 are four groups, which are evenly distributed around the lifting plate 5 to form an orthogonal structure, thereby ensuring the freedom of the lifting plate 5 only in the vertical direction, limiting the freedom of the lifting plate 5 in the horizontal direction, and ensuring the stability of the lifting plate 5 during the lifting process.

[0033] The vertical section of the connecting plate 10 is connected to the channel by a second connecting beam 12, which is a horizontally arranged metal sheet group made of aviation aluminum alloy. Each of the metal sheet groups is composed of a number of parallel and spaced metal sheets made of aviation aluminum alloy. The second connecting beams 12 are distributed on both sides of the lower end of the vertical section of the connecting plate 10, and the two ends thereof are respectively connected to the inner walls of the side wall channel of the connecting plate 10 and the upper platform 4. Under the action of the second connecting beam 12 formed by the metal sheet group made of aviation aluminum alloy, the connecting plate 10 is suspended and supported in the channel of the upper platform 4, thereby ensuring the stability of the moving part of the linear motor 3 and realizing the purpose of constraining the freedom of the connecting plate 10 in the horizontal direction when it moves up / down, thereby ensuring the detection accuracy.

[0034] One end of the baffle 6 is fixed to the lifting plate 5 by bolts, and the other end of the baffle 6 extends to the outside of the upper platform 4. The bracket 7 is fixed to the base 1 on the left side of the upper platform 4, and the Faraday cup 8 is fixed to the bracket 7, and the Faraday cup 8 is located directly below the other end of the baffle 6.

[0035] The driving mechanism 9 is divided into two groups, both of which are arranged in the through hole 101 on the side wall of the base 1, and the driving end of the driving mechanism 9 is connected to the base 2. The bracket 7 and the first group of the driving mechanism 9 are respectively located on the left and right sides of the upper platform 4, and the second group of the driving mechanism 9 is located on the side of the upper platform 4 between the first group of the driving mechanism 9 and the bracket 7, so that the two groups of driving mechanisms 9 are orthogonally distributed to achieve the movement of the base 2 and the upper platform 4 in the X or Y direction. Specifically, the driving mechanism 9 includes: a fixing member 901 and a piezoelectric ceramic 902. Among them: the fixing member 901 is threadedly connected to the through hole 101 to conveniently connect the piezoelectric ceramic 902 to the through hole 101. One end of the piezoelectric ceramic 902 is connected to the fixing member 901, and the other end passes through the through hole 101 and contacts the side wall of the square base 2, so as to facilitate the movement of the base 2 by the telescopic drive of the piezoelectric ceramic 902. An electron beam emitting device 13 is further disposed above the Faraday cup 8 , and the other end of the baffle 6 is located between the electron beam emitting device 13 and the Faraday cup 8 .

[0036] When in use, first turn on the electron beam emitting device 13 and adjust the focus, and adjust the end of the baffle 6 to be located outside the cup mouth of the Faraday cup 8 through the movement of the driving mechanism 9, that is, the cup mouth of the Faraday cup 8 is in an unblocked state, and then record the current condition of the Faraday cup 8.

[0037] Then, the baffle 6 completely blocks the mouth of the Faraday cup 8 through the vertical motion provided by the linear motor and the horizontal motion provided by the driving mechanism 9. At this time, the current of the Faraday cup 8 is recorded, and then the electron beam spot size is obtained according to the change of the current before and after. Since the above-mentioned nanoscale electron beam spatial distribution measurement device innovatively introduces a micro-nano motion platform and realizes the blocking action of the baffle 6 on the electron beam, the measurement efficiency and accuracy of the electron beam spot size can be effectively improved.

[0038] Finally, it should be noted that any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention. Although the above describes the specific implementation of the present invention in conjunction with the drawings, it is not a limitation of the protection scope of the present invention. Those skilled in the art should understand that on the basis of the technical solution of the present invention, various modifications or deformations that can be made by those skilled in the art without creative labor are still within the protection scope of the present invention.

Claims

1. A device for measuring the spatial distribution of a nanoscale electron beam, wherein: include: Base, base, linear motor, upper platform, lifting plate, baffle, bracket, Faraday cup, driving mechanism, connecting plate; wherein: the base is located in the receiving hole of the base, and the two are connected by a first connecting beam; the linear motor is vertically fixed on the upper surface of the base, the upper platform is covered on the linear motor, and the upper platform is connected to the base; the lifting plate is horizontally arranged in the upper top surface mounting hole of the upper platform, and the lifting plate is fixedly connected to the mover of the linear motor; one end of the baffle is fixed on the lifting plate, the bracket is fixed on the base on one side of the upper platform, the Faraday cup is fixed on the bracket, and the Faraday cup is located directly below the other end of the baffle; the driving mechanism is connected to the base to realize the movement of the base in the X or Y direction; the horizontal section of the inverted "L"-shaped connecting plate is connected to the lifting plate, the vertical section of the connecting plate is located in the side wall channel of the upper platform, and the vertical section is connected to the channel by a second connecting beam, and the first connecting beam and the second connecting beam are deformable parts.

2. The device for measuring the spatial distribution of a nanoscale electron beam according to claim 1, characterized in that: The connecting plates are at least four groups, which are evenly distributed around the lifting plate to form an orthogonal structure.

3. The device for measuring the spatial distribution of a nanoscale electron beam according to claim 1, characterized in that: The upper platform is a hollow cubic structure with an open lower end, and the vertical sections of the connecting plates are evenly distributed on the four side walls of the upper platform.

4. The device for measuring the spatial distribution of a nanoscale electron beam according to claim 1, characterized in that: There are two groups of driving mechanisms, both of which are arranged in the through holes on the side walls of the base, and the driving ends of the driving mechanisms are connected to the base; the driving mechanisms and the brackets of the first group are respectively located on both sides of the upper platform, and the driving mechanisms of the second group are located on the side of the upper platform between the driving mechanisms of the first group and the bracket, so that the two groups of driving mechanisms are orthogonally distributed.

5. The device for measuring the spatial distribution of a nanoscale electron beam according to claim 1, characterized in that: The driving mechanism comprises: a fixing member and a piezoelectric ceramic; wherein: the fixing member is detachably connected in the through hole, one end of the piezoelectric ceramic is connected to the fixing member, and the other end passes through the through hole and contacts the side wall of the square base.

6. The device for measuring the spatial distribution of a nanoscale electron beam according to claim 5, characterized in that: The fixing piece is threadedly connected to the through hole.

7. The device for measuring the spatial distribution of a nanoscale electron beam according to claim 1, characterized in that: The first connecting beam is a group of metal sheets arranged vertically, and the first connecting beam is distributed on the four side walls of the square base.

8. The device for measuring the spatial distribution of a nanoscale electron beam according to claim 7, characterized in that: The metal sheet group consists of a plurality of metal sheets.

9. The device for measuring the spatial distribution of a nanoscale electron beam according to claim 8, characterized in that: The metal sheet is an aviation aluminum alloy sheet.

10. The device for measuring the spatial distribution of a nanoscale electron beam according to claim 1, characterized in that: The second connecting beam is a horizontally arranged metal sheet group, and the second connecting beam is distributed on both sides of the lower end of the vertical section of the connecting plate, and its two ends are respectively connected to the connecting plate and the inner wall of the side wall channel of the upper platform.

11. The device for measuring the spatial distribution of a nanoscale electron beam according to claim 10, characterized in that: The metal sheet group consists of a plurality of metal sheets.

12. The device for measuring the spatial distribution of a nanoscale electron beam according to claim 11, characterized in that: The metal sheet is an aviation aluminum alloy sheet.

13. The device for measuring the spatial distribution of a nanoscale electron beam according to any one of claims 1 to 12, characterized in that: An electron beam emitting device is also arranged above the Faraday cup, and the other end of the baffle is located between the electron beam emitting device and the Faraday cup.

14. The device for measuring the spatial distribution of a nanoscale electron beam according to any one of claims 1 to 8, characterized in that: The base is provided with a fixing hole, and a bolt is passed through the fixing hole from the bottom surface of the base and connected with the stator part of the linear motor.

15. The device for measuring the spatial distribution of a nanoscale electron beam according to claim 14, characterized in that: The bolt passes through the fixing hole from the bottom surface of the base and is connected to the lower port wall surface of the upper platform.

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