Narrowband device and method for manufacturing electronic device

Abstract

The narrowband device comprises: a first prism; a first grating and a second grating, which are arranged at different positions along the direction of the grooves of either the first grating or the second grating on the optical path of the light beam after passing through the first prism; a beam adjustment optical system, which is arranged on the optical path of the light beam between at least one of the first grating and the second grating and the first prism, so that the first part of the light beam is incident on the first grating and the second part of the light beam is incident on the second grating; a first actuator, which adjusts the incident angle of the first part on the first grating; a second actuator, which adjusts the incident angle of the second part on the second grating; and a third actuator, which adjusts the energy ratio between the first part and the second part by adjusting either the position and the posture of at least one optical element included in the beam adjustment optical system.

Description

Technical Field

[0001] The present invention relates to a method for manufacturing a narrowband device and an electronic component. Background Art

[0002] In recent years, semiconductor exposure equipment has been required to achieve higher resolution as semiconductor integrated circuits become increasingly miniaturized and highly integrated. Consequently, there has been a trend toward shorter wavelengths of light emitted from exposure light sources. For example, gas laser devices used for exposure include KrF excimer lasers, which output laser light with a wavelength of approximately 248 nm, and ArF excimer lasers, which output laser light with a wavelength of approximately 193 nm.

[0003] The spectral line width of the natural oscillation light of KrF excimer laser devices and ArF excimer laser devices is relatively wide, approximately 350 to 400 pm. Therefore, when a projection lens is constructed using a material that transmits ultraviolet light such as KrF and ArF lasers, chromatic aberration may sometimes occur. As a result, the clarity may be reduced. Therefore, it is necessary to narrow the spectral line width of the laser light output from the gas laser device to a level where chromatic aberration is invisible. Therefore, in order to narrow the spectral line width, a narrowing module (LineNarrow Module: LNM) containing narrowing elements (etalon, grating, etc.) is sometimes included in the laser resonator of the gas laser device. Hereinafter, a gas laser device with a narrowed spectral line width is referred to as a narrowed gas laser device.

[0004] Prior art literature

[0005] Patent Literature

[0006] Patent Document 1: U.S. Patent No. 7,154,928

[0007] Patent Document 2: Japanese Patent Application Laid-Open No. 51-031195 Summary of the Invention

[0008] A narrowband device according to one aspect of the present invention comprises: a first prism arranged on an optical path of a light beam; a first grating and a second grating arranged at different positions along the direction of the grooves of either the first grating or the second grating on the optical path of the light beam after passing through the first prism; a light beam adjustment optical system arranged on the optical path of the light beam between at least one of the first grating and the second grating and the first prism, so that a first part of the light beam is incident on the first grating and a second part of the light beam is incident on the second grating; a first actuator which adjusts the incident angle of the first part on the first grating; a second actuator which adjusts the incident angle of the second part on the second grating; and a third actuator which adjusts the energy ratio between the first part and the second part by adjusting either the position or the posture of at least one optical element included in the light beam adjustment optical system.

[0009] Another aspect of the present invention provides a narrowband device comprising: a prism disposed on an optical path of a light beam; a light beam adjustment optical system including a mirror that branches the light beam into a first portion and a second portion reflected by the mirror, wherein the mirror is configured to overlap with a portion of a cross section of the light beam's optical path after passing through the prism; a first grating disposed on the optical path of the first portion; a second grating disposed on the optical path of the second portion; a first actuator that adjusts an incident angle of the first portion incident on the first grating; a second actuator that adjusts an incident angle of the second portion incident on the second grating; and a third actuator that adjusts an energy ratio between the first portion and the second portion.

[0010] According to one aspect of the present invention, a method for manufacturing an electronic device comprises the following steps: generating a pulsed laser by a laser device; outputting the pulsed laser to an exposure device; and exposing the pulsed laser on a photosensitive substrate in the exposure device to manufacture the electronic device, wherein the laser device comprises a laser cavity and an optical resonator, the optical resonator comprises a narrowband device, the narrowband device comprising: a first prism disposed on an optical path of a light beam; a first grating and a second grating disposed at different positions along a direction of grooves on either side of the first grating and the second grating on the optical path of the light beam after passing through the first prism; and the light beam An adjustment optical system is arranged on the optical path of the light beam between at least one of the first and second gratings and the first prism, so that the first part of the light beam is incident on the first grating and the second part of the light beam is incident on the second grating; a first actuator is used to adjust the incident angle of the first part on the first grating; a second actuator is used to adjust the incident angle of the second part on the second grating; and a third actuator is used to adjust the energy ratio between the first part and the second part by adjusting either the position or the posture of at least one optical element included in the light beam adjustment optical system. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] Hereinafter, several embodiments of the present invention will be described as simple examples with reference to the accompanying drawings.

[0012] Figure 1 The configuration of an exposure system in a comparative example is schematically shown.

[0013] Figure 2 The configuration of an exposure system in a comparative example is schematically shown.

[0014] Figure 3A and Figure 3B The structure of a bandwidth narrowing device in a comparative example is schematically shown.

[0015] Figures 4A to 4C The configuration of the bandwidth narrowing device in the first embodiment is schematically shown.

[0016] Figure 5A and Figure 5B The structure of the bandwidth narrowing device in the first modification is schematically shown.

[0017] Figure 6A and Figure 6B The structure of the bandwidth narrowing device in the second modified example is schematically shown.

[0018] Figure 7A and Figure 7B The structure of the bandwidth narrowing device in the third modified example is schematically shown.

[0019] Figure 8A and Figure 8B The structure of the bandwidth narrowing device in the fourth modified example is schematically shown.

[0020] Figures 9A to 9D The configuration of the bandwidth narrowing device in the second embodiment is schematically shown.

[0021] Figure 10A and Figure 10B The configuration of a bandwidth narrowing device in the third embodiment is schematically shown.

[0022] Figure 11A and Figure 11B The configuration of a bandwidth narrowing device in the fourth embodiment is schematically shown.

[0023] Figure 12A and Figure 12B The structure of the bandwidth narrowing device in the fifth embodiment is schematically shown. DETAILED DESCRIPTION

[0024] content

[0025] 1. Comparative Example

[0026] 1.1 Exposure System

[0027] 1.1.1 Structure of Exposure Device 100

[0028] 1.1.2 Action

[0029] 1.2 Narrowband Gas Laser Device

[0030] 1.2.1 Structure

[0031] 1.2.1.1 Main Oscillator MO

[0032] 1.2.1.2 Laser Control Processor 30

[0033] 1.2.1.3 Gas Adjustment Device GA

[0034] 1.2.2 Action

[0035] 1.2.2.1 Laser Control Processor 30

[0036] 1.2.2.2 Main Oscillator MO

[0037] 1.2.2.3 Gas Adjustment Device GA

[0038] 1.3 Narrowband Devices

[0039] 1.3.1 Structure

[0040] 1.3.1.1 Prisms 41 and 42

[0041] 1.3.1.2 Gratings 51 and 52

[0042] 1.3.2 Action

[0043] 1.3.3 Issues of the Comparative Example

[0044] 2. Narrowband device capable of adjusting the energy ratio of multiple wavelength components

[0045] 2.1 First Implementation Method

[0046] 2.1.1 Structure

[0047] 2.1.2 Action

[0048] 2.1.3 Function

[0049] 2.2 First Modification

[0050] 2.2.1 Structure and Action

[0051] 2.2.2 Function

[0052] 2.3 Second Modification

[0053] 2.3.1 Structure

[0054] 2.3.2 Action

[0055] 2.3.3 Other structural examples

[0056] 2.3.4 Function

[0057] 2.4 Third Modification

[0058] 2.4.1 Structure

[0059] 2.4.2 Action

[0060] 2.4.3 Other structural examples

[0061] 2.4.4 Function

[0062] 2.5 Fourth Modification

[0063] 2.5.1 Structure

[0064] 2.5.2 Action

[0065] 2.5.3 Other structural examples

[0066] 2.5.4 Function

[0067] 3. Bandwidth narrowing device including beam splitting optical system and beam shifting optical system

[0068] 3.1 Structure

[0069] 3.2 Action

[0070] 3.3 Other structural examples

[0071] 3.4 Function

[0072] 4. Narrowband device that selects three or more wavelengths

[0073] 4.1 Structure

[0074] 4.1.1 Parallel Plane Substrates 61 and 65

[0075] 4.1.2 Gratings 51-53

[0076] 4.2 Action

[0077] 4.3 Other structural examples

[0078] 4.4 Function

[0079] 5. Narrowband device that splits the beam using a mirror

[0080] 5.1 Structure and Action

[0081] 5.1.1 Beam Adjustment Optical System

[0082] 5.1.2 Gratings 51h and 52h

[0083] 5.2 Other structural examples

[0084] 5.3 Function

[0085] 6. Narrowband device that adjusts energy ratio by mirror position

[0086] 6.1 Structure

[0087] 6.2 Action

[0088] 6.3 Other structural examples

[0089] 6.4 Function

[0090] 7. Others

[0091] Below, embodiments of the present invention will be described in detail with reference to the accompanying drawings. The embodiments described below illustrate several examples of the present invention and are not intended to limit the scope of the present invention. In addition, the structures and actions described in each embodiment are not necessarily all required for the structures and actions of the present invention. In addition, the same reference numerals are used for the same structural elements, and repeated descriptions are omitted.

[0092] 1. Comparative Example

[0093] 1.1 Exposure System

[0094] Figure 1 and Figure 2 The configuration of the exposure system in the comparative example is schematically shown. The comparative example disclosed in the present invention is a method that the applicant recognizes as only known to the applicant and is not a publicly known example acknowledged by the applicant himself.

[0095] The exposure system includes a narrowband gas laser device 1 and an exposure device 100. Figure 1 The narrowband gas laser device 1 is schematically shown in FIG. Figure 2 The exposure device 100 is schematically shown in FIG.

[0096] The narrow-band gas laser device 1 includes a laser control processor 30. The narrow-band gas laser device 1 is configured to output pulse laser light to the exposure device 100.

[0097] 1.1.1 Structure of Exposure Device 100

[0098] like Figure 1 As shown, the exposure device 100 includes an illumination optical system 101 , a projection optical system 102 , and an exposure control processor 110 .

[0099] Illumination optical system 101 illuminates a reticle pattern of a reticle (not shown) arranged on reticle stage RT using pulsed laser light incident from narrowband gas laser device 1 .

[0100] Projection optical system 102 reduces and projects the pulsed laser light transmitted through the reticle, forming an image on a workpiece (not shown) placed on work table WT. The workpiece is a photosensitive substrate such as a semiconductor wafer coated with a resist film.

[0101] The exposure control processor 110 is a processing device that includes a memory 112 storing a control program and a CPU (central processing unit) 111 that executes the control program. The exposure control processor 110 is specifically configured or programmed to perform the various processes included in the present invention. The exposure control processor 110 oversees the overall control of the exposure device 100 and transmits and receives various data and signals to and from the laser control processor 30.

[0102] 1.1.2 Action

[0103] The exposure control processor 110 transmits data on a target wavelength value, data on a target pulse energy value, and a trigger signal to the laser control processor 30. The laser control processor 30 controls the narrowband gas laser device 1 according to these data and signals.

[0104] Exposure control processor 110 causes reticle stage RT and workpiece stage WT to move in parallel in opposite directions in synchronization with each other, thereby exposing the workpiece with pulsed laser light reflecting the reticle pattern.

[0105] Through this exposure process, the reticle pattern is transferred onto the semiconductor wafer. Then, electronic devices can be manufactured through multiple processes.

[0106] 1.2 Narrowband Gas Laser Device

[0107] 1.2.1 Structure

[0108] like Figure 2 As shown, the narrowband gas laser device 1 includes, in addition to the laser control processor 30, a master oscillator MO and a gas adjustment device GA.

[0109] 1.2.1.1 Main Oscillator MO

[0110] The master oscillator MO includes a laser cavity 10, a charger 12, a pulse power module (PPM) 13, a band-narrowing device 14, an output coupling mirror 15, a photodetector 17, and a shutter 18. The band-narrowing device 14 and the output coupling mirror 15 constitute an optical resonator.

[0111] The laser cavity 10 is disposed on the optical path of the optical resonator and is provided with windows 10a and 10b.

[0112] The laser cavity 10 has a pair of electrodes 11 a and 11 b inside, and further contains laser gas as a laser medium. The laser medium is, for example, F 2 , ArF, KrF, XeCl, or XeF.

[0113] A pressure sensor 16 is installed in the laser cavity 10 .

[0114] The charger 12 holds electric energy for supplying to the pulse power module 13. The pulse power module 13 includes a switch 13a.

[0115] The bandwidth narrowing device 14 includes wavelength selection elements such as prisms 41 and 42 and gratings 51 and 52 to be described later.

[0116] The output coupling mirror 15 is formed by a partially reflecting mirror.

[0117] The photodetector 17 includes a beam splitter 17a and a sensor unit 17b. The beam splitter 17a is positioned on the optical path of the pulsed laser light output from the output coupling mirror 15. The beam splitter 17a is configured to transmit a portion of the pulsed laser light with high transmittance while reflecting another portion of the pulsed laser light, allowing it to enter the sensor unit 17b. The sensor unit 17b includes a spectroscopic sensor and is capable of outputting wavelength measurement data. Furthermore, the sensor unit 17b includes an energy sensor and is capable of outputting pulse energy measurement data.

[0118] The shutter 18 is disposed on the optical path of the pulsed laser light after passing through the beam splitter 17a. When the shutter 18 is closed, the pulsed laser light after passing through the beam splitter 17a is blocked and does not enter the exposure device 100. When the shutter 18 is open, the pulsed laser light after passing through the beam splitter 17a is not blocked and enters the exposure device 100.

[0119] 1.2.1.2 Laser Control Processor 30

[0120] The laser control processor 30 is a processing device including a memory 32 storing a control program and a CPU 31 executing the control program. The laser control processor 30 is specially configured or programmed to execute various processes included in the present invention.

[0121] 1.2.1.3 Gas Adjustment Device GA

[0122] The gas adjustment device GA includes a gas supply device 33 , a gas exhaust device 34 , and a gas control processor 35 .

[0123] The gas supply device 33 includes a valve (not shown) provided in a first pipe between the laser cavity 10 and a gas cylinder (not shown).

[0124] The gas exhaust device 34 includes a valve (not shown) provided in a second pipe connected to the laser cavity 10 , a pump, and a detoxification device.

[0125] The gas control processor 35 is a processing device including a memory 37 storing a control program and a CPU 36 executing the control program. The gas control processor 35 is specially configured or programmed to execute various processes included in the present disclosure.

[0126] 1.2.2 Action

[0127] 1.2.2.1 Laser Control Processor 30

[0128] The laser control processor 30 obtains target wavelength data from the exposure control processor 110. Based on the target wavelength, the laser control processor 30 sends an initialization signal to the bandwidth narrowing device 14. After pulsed laser output begins, the laser control processor 30 receives wavelength measurement data from the photodetector 17 and sends a feedback control signal to the bandwidth narrowing device 14 based on the target wavelength and the wavelength measurement data.

[0129] The laser control processor 30 obtains data on the target pulse energy value from the exposure control processor 110. Based on the target pulse energy value, the laser control processor 30 sends an initial setting signal for the charging voltage to the charger 12. After pulse laser output begins, the laser control processor 30 receives pulse energy measurement data from the photodetector 17 and sends a feedback control signal for the charging voltage to the charger 12 based on the target pulse energy value and the pulse energy measurement data.

[0130] The laser control processor 30 receives a trigger signal from the exposure control processor 110. The laser control processor 30 transmits an oscillation trigger signal based on the trigger signal to the switch 13a of the pulse power module 13.

[0131] The laser control processor 30 transmits a gas control signal to the gas control processor 35 . The laser control processor 30 also receives measurement data of the gas pressure P from the pressure sensor 16 and transmits the measurement data of the gas pressure P to the gas control processor 35 .

[0132] 1.2.2.2 Main Oscillator MO

[0133] The switch 13a is turned on upon receiving an oscillation trigger signal from the laser control processor 30. When the switch 13a is turned on, the pulse power module 13 generates a pulsed high voltage based on the electrical energy stored in the charger 12. The pulse power module 13 applies this high voltage to the electrodes 11a and 11b.

[0134] When a high voltage is applied to electrodes 11a and 11b, a discharge occurs between them. The energy from this discharge excites the laser gas within laser cavity 10, causing it to transition to a higher energy level. As the excited laser gas transitions to a lower energy level, it emits light of a wavelength corresponding to the energy level difference.

[0135] Light generated within the laser cavity 10 is emitted outside the laser cavity 10 through windows 10a and 10b. The light emitted from window 10a is incident on the band-narrowing device 14 as a beam. Of the light incident on the band-narrowing device 14, light near a desired wavelength is reflected by the band-narrowing device 14 and returns to the laser cavity 10.

[0136] The output coupling mirror 15 transmits a portion of the light emitted from the window 10 b and outputs the light, and reflects the other portion and returns it to the laser cavity 10 .

[0137] In this way, the light emitted from the laser cavity 10 reciprocates between the bandwidth narrowing device 14 and the output coupling mirror 15. This light is amplified each time it passes through the discharge space between the pair of electrodes 11a and 11b. The light, thus lasing and narrowing, is output from the output coupling mirror 15 as pulsed laser light.

[0138] The pulse laser light outputted from the narrowband gas laser device 1 is incident on the exposure device 100 .

[0139] 1.2.2.3 Gas Adjustment Device GA

[0140] The gas control processor 35 controls the gas supply device 33 and the gas exhaust device 34 based on the gas control signal and the measured data of the gas pressure P received from the laser control processor 30 so that the gas pressure P inside the laser cavity 10 becomes a desired value.

[0141] For example, when increasing the gas pressure P inside the laser cavity 10, the gas control processor 35 controls the valve included in the gas supply device 33 to open, thereby supplying laser gas into the laser cavity 10. Furthermore, when decreasing the gas pressure P inside the laser cavity 10, for example, the gas control processor 35 controls the valve included in the gas exhaust device 34 to open, thereby exhausting a portion of the laser gas inside the laser cavity 10.

[0142] 1.3 Narrowband Devices

[0143] 1.3.1 Structure

[0144] Figure 3A and Figure 3B The structure of the bandwidth narrowing device 14 in the comparative example is schematically shown. In each figure, the V axis, the H axis, and the Z axis are shown perpendicular to each other. Figure 3A The narrowing device 14 is shown as viewed along the -V direction. Figure 3B The narrowing device 14 is shown as viewed along the -H direction. The -V direction and the +V direction are connected to the electrodes 11a and 11b (see Figure 2 The −Z direction is consistent with the direction in which the light beam emitted from window 10 a travels. The +Z direction is consistent with the direction in which the pulsed laser light emitted from window 10 b and output via output coupling mirror 15 travels.

[0145] The narrowband device 14 includes prisms 41 and 42 and gratings 51 and 52 .

[0146] 1.3.1.1 Prisms 41 and 42

[0147] The prism 41 is arranged on the optical path of the light beam emitted from the window 10 a and is supported by a holder 411 .

[0148] The prism 42 is disposed on the optical path of the light beam after passing through the prism 41 . The prism 42 corresponds to the first prism in the present invention. The prism 42 is supported by a holder 421 .

[0149] The prisms 41 and 42 are made of a material such as calcium fluoride or synthetic quartz having high transmittance for the selected wavelength of the band narrowing device 14 .

[0150] The prisms 41 and 42 are arranged so that the surfaces of the prisms 41 and 42 through which the light beams enter and exit are parallel to the V-axis. The prism 42 can be rotated around an axis parallel to the V-axis by a rotating stage 422 .

[0151] 1.3.1.2 Gratings 51 and 52

[0152] Gratings 51 and 52 are arranged at different positions along the V-axis on the optical path of the light beam after passing through prism 42. Grating 51 corresponds to the first grating in the present invention, and grating 52 corresponds to the second grating in the present invention. The orientation of the grooves in gratings 51 and 52 aligns with the V-axis. The positions of gratings 51 and 52 are set so that the light beam after passing through prism 42 straddles gratings 51 and 52 and enters the gratings.

[0153] The gratings 51 and 52 are supported by a holder 511. However, the grating 51 is supported so as to maintain a fixed posture, whereas the grating 52 is rotatable around an axis parallel to the V-axis by a rotation mechanism 522.

[0154] 1.3.2 Action

[0155] The light beam emitted from window 10a is redirected by prisms 41 and 42 within a plane parallel to the HZ plane, which is perpendicular to the V axis. This widens the beam width within the plane parallel to the HZ plane. For example, the direction of the light beam passing through both prisms 41 and 42 and heading toward gratings 51 and 52 is substantially aligned with the -Z direction.

[0156] Light incident on gratings 51 and 52 from prism 42 is reflected by the multiple grooves of each grating 51 and 52 and diffracted in a direction corresponding to the wavelength of the light. As a result, the light reflected by the multiple grooves of each grating 51 and 52 is dispersed in a plane parallel to the HZ plane. Grating 51 is configured in a Littrow manner so that the angle of incidence of the light beam incident on grating 51 from prism 42 coincides with the diffraction angle of the desired first wavelength of diffracted light. Grating 52 is configured in a Littrow manner so that the angle of incidence of the light beam incident on grating 52 from prism 42 coincides with the diffraction angle of the desired second wavelength of diffracted light. When the angles of incidence of the light beams incident on gratings 51 and 52 from prism 42 are different from each other, a wavelength difference occurs between the first wavelength of the diffracted light returning from grating 51 to prism 42 and the second wavelength of the diffracted light returning from grating 52 to prism 42.

[0157] exist Figure 3A and Figure 3B In FIG. 4 , the dotted arrows representing the light beams only show the direction from the prism 41 toward the gratings 51 and 52 , but the light beam of the selected wavelength of the narrowband device 14 travels from the gratings 51 and 52 toward the prism 41 through the path opposite to these dotted arrows.

[0158] The prisms 42 and 41 reduce the beam width of the light returning from the gratings 51 and 52 in a plane parallel to the HZ plane, and return the light into the laser cavity 10 through the window 10 a.

[0159] The rotating stage 422 and the rotating mechanism 522 are controlled by the laser control processor 30 (see Figure 2 ) to control.

[0160] When the rotating stage 422 slightly rotates the prism 42, the propagation direction of the light beam emitted from the prism 42 toward the gratings 51 and 52 slightly changes within a plane parallel to the HZ plane. As a result, the angle of incidence of the light beam from the prism 42 incident on the gratings 51 and 52 slightly changes. As a result, both the first wavelength and the second wavelength change.

[0161] When the rotation mechanism 522 slightly rotates the grating 52, the incident angle of the light beam from the prism 42 to the grating 51 does not change, but the incident angle of the light beam from the prism 42 to the grating 52 slightly changes. As a result, the wavelength difference between the first wavelength and the second wavelength changes.

[0162] According to the above structure and operation, the first wavelength and the second wavelength of the light beam emitted from the window 10a of the laser cavity 10 are selected and returned to the laser cavity 10. As a result, the narrowband gas laser device 1 is capable of dual-wavelength oscillation. By controlling the rotating stage 422 and the rotating mechanism 522, the first wavelength and the second wavelength can also be set separately.

[0163] Exposure device 100 (see Figure 1 The focal length of the laser beam depends on the wavelength of the pulsed laser. The pulsed laser light output from the narrowband gas laser device 1, which oscillates at two wavelengths, can form an image at two different positions on the workpiece stage WT of the exposure apparatus 100, along the optical axis of the pulsed laser light. This can substantially increase the depth of focus. For example, even when exposing a thick resist film, it is possible to suppress variations in imaging performance across the thickness of the resist film.

[0164] 1.3.3 Issues of the Comparative Example

[0165] In the comparative example, the first and second wavelengths can be set independently. However, it is sometimes difficult to achieve a desired cross-sectional shape for the resist film obtained by exposing and developing the resist film. For example, when it is desired that the resist wall surface, which is the boundary between the portion of the resist film removed by exposure and development and the portion of the resist film remaining on the semiconductor wafer, be nearly perpendicular to the surface of the semiconductor wafer, the resist wall surface may become tilted.

[0166] In some embodiments described below, the energy ratio between the first wavelength component and the second wavelength component included in the pulsed laser light can be adjusted. By adjusting the energy ratio, the exposure balance in the thickness direction of the resist film can be adjusted.

[0167] 2. Narrowband device capable of adjusting the energy ratio of multiple wavelength components

[0168] 2.1 First Implementation Method

[0169] 2.1.1 Structure

[0170] Figures 4A to 4C The configuration of the bandwidth narrowing device 14a in the first embodiment is schematically shown. Figure 4A The narrowing device 14a is shown as viewed along the -V direction. Figure 4B and Figure 4C The narrowing device 14a is shown as viewed along the -H direction.

[0171] The bandwidth narrowing device 14 a includes a beam splitting optical system 60 a as a beam adjustment optical system. The beam splitting optical system 60 a includes a parallel plane substrate 61 .

[0172] The parallel plane substrate 61 is arranged so as to overlap a portion of the cross-section of the optical path of the light beam after passing through the prism 42. The parallel plane substrate 61 is arranged in the optical path of the light beam between the prism 42 and the grating 52. The parallel plane substrate 61 is supported by a holder 611. The parallel plane substrate 61 is made of a material such as calcium fluoride or synthetic quartz. The parallel plane substrate 61 is movable in the -V direction and the +V direction via a linear stage 612. In the first embodiment, the linear stage 612 corresponds to the third actuator in the present invention.

[0173] The parallel plane substrate 61 includes an incident surface 613 for a portion of the light beam that has passed through the prism 42 to enter, and an exit surface 614 (see FIG. 5 ) for the light beam that has entered the parallel plane substrate 61 through the incident surface 613 to exit from the interior of the parallel plane substrate 61 toward the grating 52. Figure 4B ). Both the incident surface 613 and the exit surface 614 are parallel to the H-axis and parallel to each other. The incident surface 613 and the exit surface 614 are tilted relative to the incident direction of the light beam to bend the light beam. Specifically, the normal vector 613v of the incident surface 613 is parallel to the VZ plane and has directional components in the -V direction and the +Z direction.

[0174] The parallel-plane substrate 61 further includes an end face 615 facing the first portion B1 of the light beam. The end face 615 forms an acute angle with the exit surface 614. The angle between the exit surface 614 and the end face 615 is preferably less than 70°. The end face 615 may be parallel to the HZ plane.

[0175] The gratings 51 and 52 are rotatable by rotation mechanisms 512 and 522, respectively. Specifically, the rotation mechanism 512 rotates the grating 51 about an axis parallel to the V axis, and the rotation mechanism 522 rotates the grating 52 about an axis parallel to the V axis. In the first embodiment, the rotation mechanism 512 corresponds to the first actuator of the present invention, and the rotation mechanism 522 corresponds to the second actuator of the present invention.

[0176] The prism 42 may be supported by the holder 421 so as to maintain a fixed posture. In other words, the prism 42 may not be rotated by the actuator.

[0177] 2.1.2 Action

[0178] After passing through the prism 42, the first portion B1 of the light beam passes through the outside of the parallel plane substrate 61 and is incident on the grating 51. The second portion B2 of the light beam is transmitted through the inside of the parallel plane substrate 61 and is incident on the grating 52. That is, the beam separation optical system 60a causes the first portion B1 of the light beam to be incident on the grating 51 and the second portion B2 of the light beam to be incident on the grating 52. At this time, the parallel plane substrate 61 shifts the optical path axis of the second portion B2 of the light beam in the +V direction relative to the optical path axis of the first portion B1. The optical path axis refers to the central axis of the optical path. In this way, the parallel plane substrate 61 transmits a portion of the light beam, thereby separating the second portion B2 from the first portion B1 of the light beam.

[0179] Furthermore, the linear stage 612 changes the position of the plane-parallel substrate 61 in the V-axis direction, thereby changing the energy ratio between the first portion B1 and the second portion B2.

[0180] When the second portion B2 of the light beam incident on the parallel plane substrate 61 increases by moving the parallel plane substrate 61 in the -V direction, more light enters the grating 52. Therefore, the energy of the second wavelength component included in the pulsed laser light increases.

[0181] When the second portion B2 of the light beam incident on the parallel plane substrate 61 is reduced by moving the parallel plane substrate 61 in the +V direction, less light is incident on the grating 52. Therefore, the energy of the second wavelength component included in the pulsed laser light decreases.

[0182] The direction of movement of the parallel plane substrate 61 by the linear stage 612 may not be the V-axis direction. The linear stage 612 only needs to move the parallel plane substrate 61 in a direction intersecting the HZ plane, which is a plane perpendicular to the V-axis.

[0183] Exposure control processor 110 (see Figure 2 ) sends the target value of the first wavelength, the target value of the second wavelength and the target value of the energy ratio to the laser control processor 30.

[0184] The laser control processor 30 controls the rotation mechanism 512 based on the target value of the first wavelength. Thus, the rotation mechanism 512 changes the posture of the grating 51 and adjusts the incident angle (first incident angle) of the first portion B1 of the light beam on the grating 51 .

[0185] The laser control processor 30 controls the rotation mechanism 522 based on the target value of the second wavelength. Thus, the rotation mechanism 522 changes the posture of the grating 52 and adjusts the incident angle (second incident angle) of the second portion B2 of the light beam on the grating 52.

[0186] The laser control processor 30 controls the linear stage 612 according to the target value of the energy ratio. Thus, the linear stage 612 adjusts the position of the parallel plane substrate 61 and adjusts the energy ratio between the first portion B1 and the second portion B2 of the light beam.

[0187] like Figure 4C As shown, the linear stage 612 may retract the parallel plane substrate 61 from the optical path of the light beam, thereby making the energy ratio of the second portion B2 to the first portion B1 0. That is, the entire light beam may be incident on the grating 51 as the first portion B1.

[0188] exist Figures 4A to 4C In the example shown, the gratings 51 and 52 are arranged with substantially no gap, but the present invention is not limited thereto. A gap may exist between the gratings 51 and 52, and the gap may be smaller than the interval between the first portion B1 and the second portion B2 of the light beam.

[0189] 2.1.3 Function

[0190] In the first embodiment, the energy ratio between the first portion B1 and the second portion B2 of the light beam is adjusted by adjusting the position of at least one optical element included in the beam adjustment optical system, namely, the parallel plane substrate 61. This allows adjustment of the energy ratio between the first wavelength component and the second wavelength component contained in the pulsed laser light output from the narrowband gas laser device 1. By exposing a resist film using this pulsed laser light, the cross-sectional shape of the resist film can be adjusted to a desired shape.

[0191] In the first embodiment, the first actuator, or rotation mechanism 512, rotates the grating 51 about an axis parallel to the grooves of the grating 51. The axis parallel to the grooves of the grating 51 is the V-axis. This adjusts the first angle of incidence of the first portion B1 of the light beam on the grating 51, thereby controlling the first wavelength.

[0192] In the first embodiment, the second actuator, namely the rotation mechanism 522, rotates the grating 52 about an axis parallel to the grooves of the grating 52. The axis parallel to the grooves of the grating 52 is the V-axis. This allows the second angle of incidence of the second portion B2 of the light beam incident on the grating 52 to be adjusted, thereby controlling the second wavelength.

[0193] In the first embodiment, the beam adjustment optical system includes a beam splitting optical system 60a. The beam splitting optical system 60a is arranged to overlap a portion of the cross-section of the optical path of the light beam, allowing a portion of the light beam to pass through while separating the second portion B2 from the first portion B1 of the light beam. This prevents the light beam from entering the boundary between the grating 51 and grating 52. The diffraction efficiency at the boundary between the grating 51 and grating 52 is sometimes low, so the first embodiment can mitigate this reduction in diffraction efficiency.

[0194] Furthermore, in the beam splitting optical system 60a, the third actuator, or linear stage 612, changes the position of at least one optical element, or parallel plane substrate 61, included in the beam splitting optical system 60a, thereby varying the energy ratio between the first portion B1 and the second portion B2. This allows adjustment of the energy ratio between the first wavelength component and the second wavelength component contained in the pulsed laser light output from the narrowband gas laser device 1.

[0195] In the first embodiment, the beam splitting optical system 60a includes a parallel-plane substrate 61. A third actuator, namely a linear stage 612, moves the parallel-plane substrate 61 in a direction intersecting the HZ plane, which is a plane perpendicular to the grooves of the grating 51 or 52. The use of the parallel-plane substrate 61 can suppress changes in the wavefront of the light beam. Furthermore, by moving the parallel-plane substrate 61 in a direction intersecting the HZ plane, the linear stage 612 can change the energy ratio between the first portion B1 and the second portion B2.

[0196] In the first embodiment, the third actuator, i.e., the linear stage 612, retracts the parallel plane substrate 61 from the optical path of the light beam, thereby reducing the energy ratio of the second portion B2 of the light beam to the first portion B1 to 0. This enables switching from laser oscillation in a two-wavelength mode to laser oscillation in a single-wavelength mode.

[0197] In the first embodiment, the parallel-plane substrate 61 includes an exit surface 614 for emitting the second portion B2 of the light beam from the interior of the parallel-plane substrate 61 toward the grating 52, and an end surface 615 that faces the first portion B1 of the light beam and forms an acute angle with the exit surface 614. The acute angle between the exit surface 614 and the end surface 615 can prevent the second portion B2 incident on the parallel-plane substrate 61 via the incident surface 613 from being wasted by being incident on the end surface 615.

[0198] 2.2 First Modification

[0199] 2.2.1 Structure and Action

[0200] Figure 5A and Figure 5B The configuration of the bandwidth narrowing device 14b in the first modified example is schematically shown. Figure 5A The narrowing device 14b is shown as viewed along the -V direction. Figure 5B The narrowing device 14b is shown as viewed along the -H direction.

[0201] In the bandwidth narrowing device 14b, the prism 42 is rotatable around an axis parallel to the V axis by a rotating table 422. In the first modification, the rotating table 422 corresponds to the first actuator in the present invention.

[0202] In the bandwidth narrowing device 14 b , the grating 51 is supported so as to maintain a fixed posture, and the grating 52 is rotatable around an axis parallel to the V-axis by a rotation mechanism 522 .

[0203] The structure and operation of the prism 42 and the grating 51 are similar to those of the reference Figure 3A and Figure 3B The corresponding structures and operations are the same as those in the comparative example described above.

[0204] Regarding other aspects, the structure and operation of the first modification are similar to those of the reference Figures 4A to 4C The corresponding structures and operations are the same as those in the first embodiment described above.

[0205] 2.2.2 Function

[0206] In the first modified example, the first actuator, or rotating stage 422, rotates prism 42. This changes the angle of incidence of the light beam from prism 42 incident on gratings 51 and 52. Consequently, both the first and second wavelengths change. Furthermore, by rotating grating 52 using rotating mechanism 522, the second wavelength changes, thereby varying the wavelength difference between the first and second wavelengths.

[0207] 2.3 Second Modification

[0208] 2.3.1 Structure

[0209] Figure 6A and Figure 6B The configuration of a bandwidth narrowing device 14c in a second modified example is schematically shown. Figure 6A The narrowing device 14c is shown as viewed along the -V direction. Figure 6B The narrowing device 14c is shown as viewed along the -H direction.

[0210] The narrowband device 14 c includes a prism 43 .

[0211] The prism 43 is arranged on the optical path of the first portion B1 separated from the second portion B2 by the beam separation optical system 60 a . The prism 43 is supported by a holder 431 .

[0212] The prism 43 is made of materials such as calcium fluoride or synthetic quartz.

[0213] The prism 43 has an equilateral triangle shape when viewed from the -V direction. The prism 43 is configured so that all surfaces of the prism 43 through which the first portion B1 of the light beam enters and exits are parallel to the V axis. The prism 43 is rotatable about an axis parallel to the V axis by a rotating stage 432.

[0214] The prism 43 in the second modification example corresponds to the second prism in the present invention, and the rotation stage 432 in the second modification example corresponds to the first actuator in the present invention.

[0215] The gratings 51 and 52 are both supported so as to maintain a fixed posture by the holder 511. That is, either or both of the rotation mechanism for rotating the grating 51 and the rotation mechanism for rotating the grating 52 may not be provided.

[0216] Regarding other aspects, the structure of the second modification is the same as that of the first modification.

[0217] 2.3.2 Action

[0218] After passing through prism 42, first portion B1 of the light beam passes outside of parallel-plane substrate 61 and enters prism 43. Upon entering prism 43, first portion B1 changes its direction of travel within a plane parallel to the HZ plane and passes through prism 43. Then, first portion B1 enters grating 51.

[0219] The second portion B2 of the light beam that has passed through the prism 42 passes through the interior of the parallel plane substrate 61. After being separated from the first portion B1 by the parallel plane substrate 61, the second portion B2 enters the grating 52 without changing its direction of travel within a plane parallel to the HZ plane.

[0220] Therefore, a difference occurs between the angle of incidence of the first portion B1 incident on the grating 51 and the angle of incidence of the second portion B2 incident on the grating 52. Consequently, a wavelength difference occurs between the first wavelength of the diffracted light returning from the grating 51 to the prism 42 and the second wavelength of the diffracted light returning from the grating 52 to the prism 42.

[0221] The rotating stage 432 is controlled by the laser control processor 30 (refer to Figure 2 ) to control.

[0222] When the prism 43 is slightly rotated by the rotating stage 432, the propagation direction of the first portion B1 of the light beam emitted from the prism 43 toward the grating 51 slightly changes within a plane parallel to the HZ plane. As a result, the angle of incidence of the first portion B1 of the light beam incident on the grating 51 from the prism 43 changes. In this case, the second wavelength does not change, but the first wavelength does.

[0223] When the rotating stage 422 is driven to slightly rotate the prism 42, the traveling direction of the light beam emitted from the prism 42 toward the gratings 51 and 52 slightly changes within a plane parallel to the HZ plane. As a result, the angle of incidence of the light beam from the prism 42 incident on the gratings 51 and 52 changes. As a result, both the first wavelength and the second wavelength change.

[0224] According to the above-described configuration and operation, the narrowband gas laser device 1 can perform dual-wavelength oscillation, and the first wavelength and the second wavelength can be set separately.

[0225] Regarding other aspects, the operation of the second modification is the same as that of the first modification.

[0226] 2.3.3 Other structural examples

[0227] In the second modified example, gratings 51 and 52 are maintained in a fixed position, while prism 42 is rotated. However, the present invention is not limited to this. In the second modified example, grating 51 and prism 42 may be maintained in a fixed position, while grating 52 is rotated. In this case, the second wavelength can be controlled by rotating grating 52, and the first wavelength can be controlled by rotating prism 43.

[0228] 2.3.4 Function

[0229] In the second modification, the bandwidth narrowing device 14c includes a prism 43 disposed on the optical path of the first portion B1 of the light beam, and a first actuator, namely a rotation stage 432, rotates the prism 43. This allows the first wavelength to be controlled independently of the second wavelength.

[0230] 2.4 Third Modification

[0231] 2.4.1 Structure

[0232] Figure 7A and Figure 7B The structure of a bandwidth narrowing device 14d in a third modified example is schematically shown. Figure 7A The narrowing device 14d is shown as viewed along the -V direction. Figure 7B The narrowing device 14d is shown as viewed along the -H direction.

[0233] The bandwidth narrowing device 14 d includes a beam shifting optical system 60 d as a beam adjustment optical system instead of the beam splitting optical system 60 a . The beam shifting optical system 60 d includes a parallel plane substrate 62 .

[0234] Parallel plane substrate 62 is positioned on the optical path of the light beam after passing through prism 42. Parallel plane substrate 62 is supported by a holder 621. Parallel plane substrate 62 is made of a material such as calcium fluoride or synthetic quartz. Parallel plane substrate 62 is rotatable about an axis parallel to the H-axis via a rotating stage 622. In the third modification, rotating stage 622 corresponds to the third actuator of the present invention.

[0235] The parallel-plane substrate 62 may not be movable by the linear stage.

[0236] The plane-parallel substrate 62 includes an incident surface 623 on which the light beam passing through the prism 42 is incident, and an exit surface 624 on which the light beam incident on the plane-parallel substrate 62 through the incident surface 623 is exited from the interior of the plane-parallel substrate 62 toward the gratings 51 and 52. The incident surface 623 and the exit surface 624 are both parallel to the H-axis, and the incident surface 623 and the exit surface 624 are parallel to each other.

[0237] Regarding other aspects, the structure of the third modification is the same as that of the first embodiment. However, it is preferable that the grating 51 and the grating 52 are arranged with substantially no gap therebetween.

[0238] 2.4.2 Action

[0239] The parallel plane substrate 62 allows the light beam to pass through, straddling the gratings 51 and 52 and entering there. Specifically, the parallel plane substrate 62 does not separate the light beam into a first portion B1 and a second portion B2. Instead, the parallel plane substrate 62 integrates the first portion B1 incident on the grating 51 and the second portion B2 incident on the grating 52. The first angle of incidence of the first portion B1 on the grating 51 is adjusted by the rotation mechanism 512. The second angle of incidence of the second portion B2 on the grating 52 is adjusted by the rotation mechanism 522.

[0240] When the incident surface 623 of the parallel-plane substrate 62 is tilted relative to the incident direction of the light beam, the parallel-plane substrate 62 shifts the optical path axis of the light beam. In the third modified example, the normal vector 623v of the incident surface 623 is parallel to the VZ plane, and furthermore, this normal vector 623v has directional components in the -V direction and the +Z direction. In this case, the optical path axis of the light beam incident from the incident surface 623 and emitted from the emission surface 624 is shifted in the +V direction.

[0241] When the rotating stage 622 rotates the parallel plane substrate 62 about an axis parallel to the H axis, the displacement of the optical path axis of the light beam in the V axis direction changes. By adjusting the posture of the parallel plane substrate 62 in this way, the position of the light beam incident on the gratings 51 and 52 from the parallel plane substrate 62 changes in the V axis direction. As a result, the energy ratio of the first part B1 incident on the grating 51 and the second part B2 incident on the grating 52 can be changed. For example, when the parallel plane substrate 62 is rotated about an axis parallel to the H axis, the position of the light beam incident on the grating 51 and 52 changes in the V axis direction. Figure 7B When the parallel plane substrate 62 is rotated clockwise, the energy ratio of the first portion B1 increases, and when the parallel plane substrate 62 is rotated counterclockwise, the energy ratio of the second portion B2 increases. In this way, the energy ratio of the first wavelength component and the second wavelength component of the pulsed laser can be adjusted.

[0242] 2.4.3 Other structural examples

[0243] In the third modified example, the beam shifting optical system 60d shifts the optical path axis in the +V direction. However, the present invention is not limited to this. The optical path axis may be shifted in the -V direction by adjusting the posture of the parallel plane substrate 62. Alternatively, the optical path axis may not be shifted by aligning the incident surface 623 perpendicularly to the incident direction of the light beam.

[0244] In the third modified example, the light beam enters across the gratings 51 and 52, but the present invention is not limited to this. The posture of the parallel plane substrate 62 can also be adjusted to make the energy ratio of the second portion B2 relative to the first portion B1 zero. In other words, the entire light beam can be made incident on the grating 51 as the first portion B1. Alternatively, conversely, the energy ratio of the first portion B1 relative to the second portion B2 can be made zero. In other words, the entire light beam can be made incident on the grating 52 as the second portion B2.

[0245] In the third modification, the prism 42 is kept in a fixed position and the gratings 51 and 52 are rotatable. However, the present invention is not limited thereto. As in the first modification, the grating 51 may be kept in a fixed position and the grating 52 and the prism 42 may be rotatable.

[0246] 2.4.4 Function

[0247] In the third modified example, the beam adjustment optical system includes a beam shifting optical system 60d. The beam shifting optical system 60d is positioned on the optical path of the light beam, allowing the light beam to pass through and enter the gratings 51 and 52. In the beam shifting optical system 60d, a third actuator, or a rotation stage 622, changes the posture of at least one optical element included in the beam shifting optical system 60d, or a parallel plane substrate 62. This causes the position of the light beam incident on the gratings 51 and 52 from the beam shifting optical system 60d to change in a direction intersecting the HZ plane, which is a plane perpendicular to the grooves of the gratings 51 and 52. This configuration allows adjustment of the energy ratio between the first and second portions B1 and B2, even without separating the light beam into the first and second portions B2 and providing a gap.

[0248] In the third modified example, the beam shifting optical system 60d includes a parallel plane substrate 62. The parallel plane substrate 62 is rotated about an axis perpendicular to both the direction of beam travel and the direction of the grooves of the grating 51 or 52, that is, about an axis parallel to the H-axis, by a third actuator, namely, a rotation stage 622. This allows the energy ratio between the first portion B1 and the second portion B2 to be adjusted using a simple structure.

[0249] 2.5 Fourth Modification

[0250] 2.5.1 Structure

[0251] Figure 8A and Figure 8B The structure of the bandwidth narrowing device 14e in the fourth modified example is schematically shown. Figure 8A The narrowing device 14e is shown as viewed along the -V direction. Figure 8B The narrowing device 14e is shown as viewed along the -H direction.

[0252] The narrowband device 14e includes a beam shifting optical system 60e as a beam adjustment optical system, in place of the beam shifting optical system 60d. The beam shifting optical system 60e includes prisms 63 and 64. Prisms 63 and 64 have identical shapes. Prism 63 is positioned on the optical path of the light beam after passing through prism 42, and prism 64 is positioned on the optical path of the light beam after passing through prism 63. The surfaces of prisms 63 and 64, through which the light beams enter and exit, are both parallel to the H-axis. Prisms 63 and 64 are made of materials such as calcium fluoride or synthetic quartz.

[0253] Prism 63 is supported by a holder 631. Prism 64 is supported by a holder 641. Prism 64 is movable in the V-axis direction via a linear stage 642. In the fourth variation, prism 63 corresponds to the third prism of the present invention, and prism 64 corresponds to the fourth prism of the present invention. In the fourth variation, linear stage 642 corresponds to the third actuator of the present invention.

[0254] Regarding other aspects, the structure of the fourth modification is the same as that of the third modification.

[0255] 2.5.2 Action

[0256] The light beam that has passed through the prism 42 passes through the interiors of the prisms 63 and 64 , respectively, and enters the gratings 51 and 52 .

[0257] Prisms 63 and 64 bend the optical path axes of the light beams in opposite directions within a plane parallel to the VZ plane. As a result, the optical path axes of the light beams emitted from prism 64 toward gratings 51 and 52 are parallel to the optical path axes of the light beams incident on prism 63 from prism 42, and are displaced in the +V direction.

[0258] When the linear stage 642 moves the prism 64 in the V-axis direction, the distance between the prism 63 and the prism 64 changes, and the displacement of the optical path axis in the V-axis direction changes. By adjusting the position of the prism 64 in the V-axis direction, the energy ratio between the first portion B1 of the light beam incident on the grating 51 and the second portion B2 of the light beam incident on the grating 52 changes. For example, when the prism 64 is moved in the +V direction, the energy ratio of the first portion B1 increases, while when the prism 64 is moved in the -V direction, the energy ratio of the second portion B2 increases. This allows the energy ratio of the first wavelength component and the second wavelength component of the pulsed laser light to be adjusted.

[0259] Furthermore, by making the energy ratio of the second portion B2 0, laser oscillation in a single wavelength mode can be performed.

[0260] Regarding other aspects, the operation of the fourth modification is the same as that of the third modification.

[0261] 2.5.3 Other structural examples

[0262] In the fourth modification, the prism 64 is moved in the V-axis direction, but the present invention is not limited thereto and the prism 64 may be moved in other directions in a plane parallel to the VZ plane to change the distance between the prism 63 and the prism 64 .

[0263] In the fourth modification, the prism 63 does not move, but the present invention is not limited thereto. The prism 63 may be moved, or both the prism 63 and the prism 64 may be moved.

[0264] 2.5.4 Function

[0265] In the fourth modified example, the beam shifting optical system 60e includes prisms 63 and 64. A third actuator, namely a linear stage 642, moves at least one of the prisms 63 and 64 to change the distance between them. This allows adjustment of the energy ratio between the first portion B1 and the second portion B2. By appropriately setting the arrangement and movable range of the prisms 63 and 64, the amount of displacement of the optical path axis in the V-axis direction can also be increased.

[0266] Furthermore, according to the fourth modification, even if one or both of the prisms 63 and 64 are moved, the change in the angle of incidence of the light beam incident on the surfaces of the prisms 63 and 64 is small. Thus, even if the transmittance of the anti-reflection coating on the surfaces of the prisms 63 and 64 depends on the angle of incidence of the light beam, changes in the transmittance due to the movement of the prisms 63 and 64 can be suppressed.

[0267] 3. Bandwidth narrowing device including beam splitting optical system and beam shifting optical system

[0268] 3.1 Structure

[0269] Figures 9A to 9D The configuration of the bandwidth narrowing device 14f in the second embodiment is schematically shown. Figure 9A and Figure 9C The narrowing device 14f is shown as viewed along the -V direction. Figure 9B and Figure 9D The narrowing device 14f is shown as viewed along the -H direction. Figure 9A and Figure 9B The narrowband device 14f of the two-wavelength mode is shown. Figure 9C and Figure 9D A narrowband device 14f in a single wavelength mode is shown.

[0270] The narrowband device 14f includes a combination of a beam splitting optical system 60a and a beam shifting optical system 60d as a beam adjustment optical system. The beam splitting optical system 60a includes a parallel plane substrate 61. The beam shifting optical system 60d includes a parallel plane substrate 62.

[0271] The parallel plane substrate 62 is disposed on the optical path of the light beam after passing through the prism 42. The structure and operation of the parallel plane substrate 62 are the same as those of the parallel plane substrate 62 in the third modification.

[0272] The parallel plane substrate 61 is arranged so as to overlap a portion of the cross-section of the optical path of the light beam after passing through the parallel plane substrate 62. The structure and operation of the parallel plane substrate 61 are the same as those of the parallel plane substrate 61 in the first embodiment. However, the linear stage 612 in the second embodiment corresponds to the fourth actuator in the present invention.

[0273] 3.2 Action

[0274] The lower end position of the optical path of the first portion B1 of the light beam is adjusted by the posture of the parallel-plane substrate 62. The upper end position of the optical path of the first portion B1 of the light beam is adjusted by the position of the parallel-plane substrate 61. The lower end refers to the end on the -V side, and the upper end refers to the end on the +V side.

[0275] The lower end position of the optical path of the second portion B2 of the light beam is adjusted by the position of the parallel-plane substrate 61 . The upper end position of the optical path of the second portion B2 of the light beam is adjusted by the posture of the parallel-plane substrate 62 .

[0276] In this way, in the second embodiment, the lower end position of the first part B1 and the upper end position of the second part B2 of the light beam and the upper end position of the first part B1 and the lower end position of the second part B2 are adjusted independently of each other, and accordingly, the energy ratio of the first part B1 and the second part B2 is adjusted.

[0277] like Figure 9C and Figure 9D As shown, by adjusting the posture of the parallel plane substrate 62, the entire light beam can be made incident on the grating 51 as the first portion B1. This also makes it possible to make the energy ratio of the second portion B2 zero and perform laser oscillation in a single wavelength mode.

[0278] Regarding other aspects, the structure and operation of the second embodiment are the same as those of the first embodiment.

[0279] 3.3 Other structural examples

[0280] In the second embodiment, the position of the parallel plane substrate 61 can be adjusted, but the present invention is not limited to this. The parallel plane substrate 61 can also be fixed in a fixed position. In this case, the upper end position of the optical path of the first part B1 of the light beam and the lower end position of the optical path of the second part B2 of the light beam are both fixed. By adjusting the posture of the parallel plane substrate 62, the lower end position of the optical path of the first part B1 of the light beam and the upper end position of the optical path of the second part B2 of the light beam are adjusted, and the energy ratio between the first part B1 and the second part B2 is adjusted accordingly. By reducing the energy ratio of the second part B2 to 0, laser oscillation in a single wavelength mode can also be achieved.

[0281] In the second embodiment, prism 42 is maintained in a fixed position, while gratings 51 and 52 are rotatable. However, the present invention is not limited to this. As in the first modified example, grating 51 may be maintained in a fixed position, while grating 52 and prism 42 are rotatable. Alternatively, grating 51 may be maintained in a fixed position, while prism 43 is provided as in the second modified example.

[0282] In the second embodiment, a beam shifting optical system 60e as in the fourth modified example may be used instead of the beam shifting optical system 60d.

[0283] 3.4 Function

[0284] According to the second embodiment, the beam adjustment optical system is composed of a combination of a beam shifting optical system 60d and a beam splitting optical system 60a. This allows the V-axis position of the first portion B1 of the light beam incident on the grating 51 and the V-axis position of the second portion B2 of the light beam incident on the grating 52 to be appropriately adjusted. For example, the optical paths of the first portion B1 and the second portion B2 can be prevented from reaching the boundary between the gratings 51 and 52, and the energy ratio between the first portion B1 and the second portion B2 can be adjusted.

[0285] According to the second embodiment, a fourth actuator, namely a linear stage 612, is provided. By changing the position of at least one optical element, namely the parallel plane substrate 61, included in the beam splitting optical system 60a, the linear stage 612 changes the energy ratio between the first portion B1 and the second portion B2. This allows the position of the first portion B1 of the light beam incident on the grating 51 and the position of the second portion B2 of the light beam incident on the grating 52 to be further adjusted to appropriate positions. For example, the first portion B1 can be adjusted so as to be incident on the center position of the grating 51 in the V-axis direction, while the second portion B2 can be adjusted so as to be incident on the center position of the grating 52 in the V-axis direction.

[0286] 4. Narrowband device that selects three or more wavelengths

[0287] 4.1 Structure

[0288] Figure 10A and Figure 10B The configuration of a bandwidth narrowing device 14g in the third embodiment is schematically shown. Figure 10A The narrowing device 14g is shown as viewed along the -V direction. Figure 10B The narrowing device 14g is shown as viewed along the -H direction.

[0289] The narrowband device 14g includes a beam splitting optical system 60g as a beam adjustment optical system. The beam splitting optical system 60g includes parallel plane substrates 61 and 65.

[0290] The band narrowing device 14 g includes a grating 53 in addition to the gratings 51 and 52 .

[0291] 4.1.1 Parallel Plane Substrates 61 and 65

[0292] The structures of the parallel plane substrate 61 , the holding frame 611 , and the linear stage 612 are the same as the corresponding structures in the first embodiment.

[0293] The parallel plane substrate 65 is arranged so as to overlap a portion of the cross-section of the optical path of the light beam after passing through the parallel plane substrate 61. The parallel plane substrate 65 is supported by a holder 651. The parallel plane substrate 65 is configured to be movable in the -V direction and the +V direction via a linear stage 652. In the third embodiment, the linear stage 652 corresponds to the fifth actuator in the present invention.

[0294] With regard to other aspects, the structure of the parallel-plane substrate 65 is the same as that of the parallel-plane substrate 61 .

[0295] 4.1.2 Gratings 51-53

[0296] The structures of the gratings 51 and 52 and the rotating mechanisms 512 and 522 are the same as the corresponding structures in the first embodiment.

[0297] Grating 53 is arranged in parallel with gratings 51 and 52 in the V-axis direction on the optical path of the light beam after passing through parallel plane substrate 65. Grating 53 corresponds to the third grating in the present invention. The direction of the grooves of grating 53 is consistent with the V-axis direction.

[0298] The grating 53 is supported by a holder 511. The grating 53 is rotatable about an axis parallel to the V-axis by a rotation mechanism 532. The rotation mechanism 532 corresponds to the sixth actuator in the present invention.

[0299] Regarding other aspects, the structure of the third embodiment is the same as that of the first embodiment.

[0300] 4.2 Action

[0301] After passing through prism 42, first portion B1 of the light beam passes through the outside of parallel-plane substrate 61 and is incident on grating 51. Second portion B2 and third portion B3 of the light beam pass through the inside of parallel-plane substrate 61. Second portion B2 of the light beam passes through the outside of parallel-plane substrate 65 and is incident on grating 52. Third portion B3 of the light beam passes through the inside of parallel-plane substrate 65 and is incident on grating 53. That is, beam splitting optical system 60g causes first portion B1 of the light beam to be incident on grating 51, second portion B2 of the light beam to be incident on grating 52, and third portion B3 of the light beam to be incident on grating 53.

[0302] At this time, the optical path axis of the second portion B2 of the light beam is displaced in the +V direction relative to the optical path axis of the first portion B1, and the optical path axis of the third portion B3 of the light beam is further displaced in the +V direction relative to the optical path axis of the second portion B2. In this way, the light beam splitting optical system 60g separates the first portion B1, the second portion B2, and the third portion B3 of the light beam from each other.

[0303] The linear stage 652 changes the position of the parallel plane substrate 65 in the V-axis direction, thereby changing the energy ratio between the second portion B2 and the third portion B3.

[0304] The linear stage 612 changes the position of the parallel plane substrate 61 in the V-axis direction, thereby changing the energy ratio between the energy of the first portion B1 and the total energy of the second portion B2 and the third portion B3. As a result, the energy ratio between the first portion B1 and the second portion B2 changes.

[0305] Exposure control processor 110 (see Figure 2 ) sends the target values ​​of the first to third wavelengths and the target values ​​of the energy ratios of the first to third parts B1 to B3 to the laser control processor 30.

[0306] The laser control processor 30 controls the rotation mechanism 512 based on the target value of the first wavelength, controls the rotation mechanism 522 based on the target value of the second wavelength, and controls the rotation mechanism 532 based on the target value of the third wavelength. The rotation mechanism 532 changes the posture of the grating 53, thereby adjusting the third angle of incidence at which the third portion B3 of the light beam is incident on the grating 53.

[0307] The laser control processor 30 controls the linear stages 612 and 652 based on the target value of the energy ratio of the first to third parts B1 to B3.

[0308] The parallel plane substrate 65 may be retracted from the optical path of the light beam to make the energy ratio of the third portion B3 0. That is, the light beam may be switched to a two-wavelength mode in which the light beam is incident on the gratings 51 and 52 but not on the grating 53 .

[0309] The parallel plane substrate 61 may be retracted from the optical path of the light beam to make the energy ratio between the second portion B2 and the third portion B3 0. That is, the mode may be switched to a single wavelength mode in which the entire light beam is incident on the grating 51 as the first portion B1.

[0310] Regarding other aspects, the operation of the third embodiment is the same as that of the first embodiment.

[0311] 4.3 Other structural examples

[0312] In the third embodiment, prism 42 is maintained in a fixed position, while gratings 51 to 53 are individually rotatable. However, the present invention is not limited to this. As in the first modified example, grating 51 may be maintained in a fixed position, while prism 42 is rotatable. Alternatively, grating 51 may be maintained in a fixed position, while prism 43 is provided as in the second modified example.

[0313] In the third embodiment, the band narrowing device 14g selects three wavelengths, but the present invention is not limited thereto and four or more gratings may be provided to select four or more wavelengths.

[0314] 4.4 Function

[0315] The third embodiment further includes a fifth actuator, namely a linear stage 652; a sixth actuator, namely a rotation mechanism 532; and a grating 53 arranged alongside gratings 51 and 52 on the optical path of the light beam after passing through prism 42. The beam adjustment optical system causes the third portion B3 of the light beam to be incident on the grating 53. The linear stage 652 adjusts the position of the parallel plane substrate 65, which is at least one optical element included in the beam adjustment optical system, thereby adjusting the energy ratio between the second portion B2 and the third portion B3. The rotation mechanism 532 adjusts the angle of incidence of the third portion B3 on the grating 53. This makes it possible to adjust the energy ratio of the first to third wavelength components contained in the pulsed laser light output from the narrowband gas laser device 1.

[0316] 5. Narrowband device that splits the beam using a mirror

[0317] 5.1 Structure and Action

[0318] Figure 11A and Figure 11B The configuration of a bandwidth narrowing device 14h in the fourth embodiment is schematically shown. Figure 11A The narrowband device 14h is shown as viewed along the -V direction. Figure 11B The narrowing device 14h is shown viewed along the -H direction.

[0319] The bandwidth narrowing device 14h includes a combination of a beam splitting optical system 60a, a beam shifting optical system 60d, and a mirror 71 as a beam adjustment optical system.

[0320] The narrowband device 14h includes gratings 51h and 52h.

[0321] 5.1.1 Beam Adjustment Optical System

[0322] The beam splitting optical system 60 a and the beam shifting optical system 60 d in the fourth embodiment have the same configurations as the corresponding ones in the second embodiment.

[0323] Mirror 71 is positioned so that it overlaps with the optical path of the second portion B2, which is separated from the first portion B1 of the light beam in the +V direction by the beam splitting optical system 60a, within the optical path of the light beam after passing through prism 42 and the beam shifting optical system 60d. Mirror 71 is positioned so that the surface of mirror 71, on which the second portion B2 of the light beam enters, is parallel to the V-axis. The second portion B2 is reflected by mirror 71, thereby changing its direction of travel within a plane parallel to the HZ plane. Thus, the beam adjustment optical system splits the light beam into the first portion B1 and the second portion B2, which is reflected by mirror 71.

[0324] The mirror 71 is supported by a holder 711. The holder 711 is positioned outside the optical path of the first portion B1 of the light beam. When the first portion B1 of the light beam is located below the second portion B2 in the direction of gravity, the holder 711 is positioned on the side opposite to the direction of gravity. For example, the holder 711 is fixed to the top plate of a housing (not shown) that houses the narrowing device 14h.

[0325] 5.1.2 Gratings 51h and 52h

[0326] The grating 51h is arranged on the optical path of the first portion B1 of the light beam, and the grating 52h is arranged on the optical path of the second portion B2 of the light beam after being reflected by the mirror 71. The gratings 51h and 52h may not be arranged side by side in the V-axis direction. The gratings 51h and 52h may be arranged at different positions in a plane parallel to the HZ plane, such as Figure 11B As shown, the +V-side end 51he of the grating 51h may be closer to the +V side than the -V-side end 52he of the grating 52h. That is, the gratings 51h and 52h may be arranged so that their positions in the V-axis direction overlap.

[0327] The grating 51h is supported by a holder 511h and can be rotated around an axis parallel to the V-axis by a rotating mechanism 512h.

[0328] The grating 52h is supported by a holder 521h and can be rotated around an axis parallel to the V-axis by a rotating mechanism 522h.

[0329] Regarding other aspects, the structure and operation of the fourth embodiment are the same as those of the second embodiment.

[0330] 5.2 Other structural examples

[0331] In the fourth embodiment, the beam adjustment optical system includes the beam splitting optical system 60a and the beam shifting optical system 60d similar to those in the second embodiment. However, the present invention is not limited to this. Instead of including both the beam splitting optical system 60a and the beam shifting optical system 60d, the first portion B1 of the light beam split by the beam splitting optical system 60a similar to that in the first embodiment may be incident on the grating 51h, while the second portion B2 is incident on the mirror 71 and then on the grating 52h.

[0332] In the fourth embodiment, prism 42 is maintained in a fixed posture, and gratings 51h and 52h are independently rotatable. However, the present invention is not limited to this. As in the first modified example, either gratings 51h or 52h may be maintained in a fixed posture, and prism 42 may be rotatable. Alternatively, grating 51h may be maintained in a fixed posture, and prism 43 may be provided as in the second modified example.

[0333] In the fourth embodiment, the beam adjustment optical system includes the beam shift optical system 60d, but the present invention is not limited thereto and the beam shift optical system 60e similar to that of the fourth modified example may be used instead of the beam shift optical system 60d.

[0334] In the fourth embodiment, the beam adjustment optical system includes a single mirror 71. However, the present invention is not limited thereto. Two or more mirrors may be used to branch the beam into the first to third portions B1 to B3, thereby performing wavelength selection of three or more wavelengths as in the third embodiment.

[0335] 5.3 Function

[0336] According to the fourth embodiment, the beam adjustment optical system includes a mirror 71, which is arranged so as to overlap a portion of the cross-section of the optical path of the light beam after passing through the prism 42. The beam adjustment optical system splits the light beam into a first portion B1 and a second portion B2 reflected by the mirror 71. Furthermore, the grating 51h is arranged in the optical path of the first portion B1, and the grating 52h is arranged in the optical path of the second portion B2. This eliminates the need to arrange the gratings 51h and 52h side by side in the V-axis direction, reduces spatial constraints on the mechanism for supporting or rotating the gratings 51h and 52h, and thus facilitates the design of the band-narrowing device 14h.

[0337] According to the fourth embodiment, the mirror 71 is positioned at one end of the optical path of the light beam in the V-axis direction, parallel to the grooves of either grating 51h or 52h, to change the direction of travel of the second portion B2 of the light beam within a plane parallel to the HZ plane perpendicular to the grooves. This allows the gratings 51h and 52h to be positioned at different positions within a plane parallel to the HZ plane, and the gratings 51h and 52h to be positioned so that their positions in the V-axis direction overlap.

[0338] 6. Narrowband device that adjusts energy ratio by mirror position

[0339] 6.1 Structure

[0340] Figure 12A and Figure 12B The configuration of the bandwidth narrowing device 14i in the fifth embodiment is schematically shown. Figure 12A The narrowing device 14i is shown as viewed along the -V direction. Figure 12B The narrowing device 14i is shown as viewed along the -H direction.

[0341] The narrowband device 14i includes a mirror 72 as a beam adjustment optical system.

[0342] The mirror 72 is arranged so as to overlap a portion of the cross section of the optical path of the light beam after passing through the prism 42. The mirror 72 is arranged so that the surface of the mirror 72 on which the portion of the light beam is incident is parallel to the V-axis direction.

[0343] The mirror 72 is supported by a holder 721. The mirror 72 is rotatable about an axis parallel to the V axis by a rotation mechanism 722. Furthermore, the mirror 72 is movable in the -V and +V directions by a linear stage 723. The holder 721, rotation mechanism 722, and linear stage 723 are positioned outside the optical path of the first portion B1 of the light beam. In the fifth embodiment, the rotation mechanism 722 corresponds to the second actuator of the present invention, and the linear stage 723 corresponds to the third actuator of the present invention.

[0344] The gratings 51h and 52h are supported by holders 511h and 521h, respectively, so as to maintain fixed postures. Either or both of the rotating mechanism for rotating the grating 51h and the rotating mechanism for rotating the grating 52h may not be provided.

[0345] The prism 42 is rotatable around an axis parallel to the V-axis by a rotating table 422. In the fifth embodiment, the rotating table 422 corresponds to the first actuator in the present invention.

[0346] Regarding other aspects, the structure of the fifth embodiment is the same as that of the fourth embodiment.

[0347] 6.2 Action

[0348] After passing through prism 42, the first portion B1 of the light beam does not enter mirror 72, but instead passes through the space on the -V side of mirror 72 and enters grating 51h. The second portion B2 of the light beam enters mirror 72 and is reflected by it, thereby changing its direction of travel within a plane parallel to the HZ plane and entering grating 52h. In other words, the light beam adjustment optical system including mirror 72 causes the first portion B1 of the light beam to enter grating 51h and the second portion B2 of the light beam to enter grating 52h. In this way, the light beam adjustment optical system including mirror 72 reflects a portion of the light beam, thereby splitting the light beam into the first portion B1 and the second portion B2.

[0349] Furthermore, the linear stage 723 changes the position of the mirror 72 in the V-axis direction, thereby changing the energy ratio between the first portion B1 and the second portion B2.

[0350] When the mirror 72 is slightly rotated by the rotation mechanism 722, the propagation direction of the second portion B2 of the light beam emitted from the mirror 72 toward the grating 52h slightly changes within a plane parallel to the HZ plane. Consequently, the angle of incidence of the second portion B2 of the light beam incident on the grating 52h from the mirror 72 changes. Consequently, the second wavelength changes.

[0351] When prism 42 is slightly rotated by rotating stage 422, the direction of travel of the light beam emitted from prism 42 toward mirror 72 and grating 51h slightly changes within a plane parallel to the HZ plane. Consequently, the angle of incidence of the light beam from prism 42 incident on gratings 51h and 52h changes. Consequently, both the first wavelength and the second wavelength change.

[0352] Regarding other aspects, the operation of the fifth embodiment is the same as that of the fourth embodiment.

[0353] 6.3 Other structural examples

[0354] In the fifth embodiment, gratings 51h and 52h are not rotated individually, and prism 42 and mirror 72 are rotated individually. However, the present invention is not limited to this. The combination of an optical element that is not rotatable about an axis parallel to the V axis and an optical element that is rotatable about an axis parallel to the V axis may be any of the following [1] to [3].

[0355] [1] Non-rotating optical elements: prism 42, mirror 72

[0356] Optical elements capable of rotation: gratings 51h and 52h

[0357] [2] Non-rotating optical elements: grating 51h, mirror 72

[0358] Rotatable optical elements: prism 42, grating 52h

[0359] [3] Non-rotating optical elements: prism 42, grating 52h

[0360] Rotatable optical elements: grating 51h, mirror 72

[0361] Alternatively, a rotatable prism 43 as in the second variant may be provided so that the combination of other optical elements that do not rotate around an axis parallel to the V axis and optical elements that can rotate around an axis parallel to the V axis is any one of the following [4] and [5].

[0362] [4] Non-rotating optical elements: prism 42, gratings 51h and 52h

[0363] Optical element capable of rotation: Mirror 72

[0364] [5] Non-rotating optical elements: prism 42, grating 51h, mirror 72

[0365] Optical element capable of rotation: Grating 52h

[0366] In the fifth embodiment, the beam adjustment optical system includes a single mirror 72. However, the present invention is not limited thereto. Two or more mirrors may be used to branch the beam into the first to third portions B1 to B3, thereby performing wavelength selection of three or more wavelengths as in the third embodiment.

[0367] 6.4 Function

[0368] According to the fifth embodiment, the mirror 72 is rotated about an axis parallel to the grooves of the grating 52h by the second actuator, namely the rotation mechanism 722. The axis parallel to the grooves of the grating 52h is the V-axis. This adjusts the second angle of incidence of the second portion B2 of the light beam incident on the grating 52h, thereby controlling the second wavelength.

[0369] According to the fifth embodiment, the mirror 72 is moved in the V-axis direction parallel to the grooves of the grating 52h by the third actuator, the linear stage 723. This allows adjustment of the energy ratio between the first portion B1 and the second portion B2. Furthermore, the first portion B1 and the second portion B2 can be branched even without using a parallel-plane substrate.

[0370] 7. Others

[0371] The above description is not limiting but merely illustrative. Therefore, it will be apparent to those skilled in the art that modifications may be made to the embodiments of the present invention without departing from the scope of the claims. Furthermore, it will be apparent to those skilled in the art that the embodiments of the present invention may also be used in combination.

[0372] Unless otherwise expressly stated, the terms used in this specification and claims as a whole should be interpreted as “non-limiting” terms. For example, terms such as “including”, “all”, “having”, and “having” should be interpreted as “excluding the presence of structural elements other than the structural elements to be recorded”. In addition, the modifier “one” should be interpreted as meaning “at least one” or “one or more”. In addition, terms such as “at least one of A, B, and C” should be interpreted as “A”, “B”, “C”, “A+B”, “A+C”, “B+C”, or “A+B+C”. Furthermore, it should be interpreted as also including combinations of these and parts other than “A”, “B”, and “C”.

Claims

1. A narrowband device comprising: a first prism disposed on the optical path of the light beam; a first grating and a second grating, which are arranged at different positions along the direction of the grooves of either the first grating or the second grating on the optical path of the light beam after passing through the first prism; a beam adjustment optical system disposed on an optical path of the light beam between at least one of the first and second gratings and the first prism, causing a first portion of the light beam to be incident on the first grating and causing a second portion of the light beam to be incident on the second grating; a first actuator configured to adjust an incident angle of the first portion on the first grating; a second actuator configured to adjust an incident angle of the second portion on the second grating; and A third actuator adjusts the energy ratio between the first portion and the second portion by adjusting either a position or an attitude of at least one optical element included in the beam adjusting optical system.

2. The narrowband device according to claim 1, wherein: The first actuator rotates the first grating around an axis parallel to the direction of the grooves.

3. The narrowband device according to claim 1, wherein: The second actuator rotates the second grating around an axis parallel to the direction of the grooves.

4. The narrowband device according to claim 1, wherein: The beam adjustment optical system includes a beam separation optical system, which is configured to overlap with a portion of the cross-section of the optical path of the light beam. The beam separation optical system separates the second portion from the first portion by allowing a portion of the light beam to pass through, and changes the energy ratio between the first portion and the second portion by using the third actuator to change the position of at least one optical element included in the beam separation optical system.

5. The narrowband device according to claim 4, wherein: The beam splitting optical system comprises a parallel plane substrate, The third actuator moves the parallel plane substrate in a direction intersecting a surface perpendicular to the groove.

6. The narrowband device according to claim 5, wherein: The third actuator retracts the parallel plane substrate from the optical path of the light beam, thereby making the energy ratio of the second portion to the first portion zero.

7. The narrowband device according to claim 5, wherein: The parallel-plane substrate comprises: an exit surface for emitting the second portion from the interior of the parallel-plane substrate toward the second grating; and an end surface facing the first portion and forming an acute angle with the exit surface.

8. The narrowband device according to claim 1, wherein: The first actuator rotates the first prism.

9. The narrowband device according to claim 1, wherein: The narrowband device further includes a second prism, the second prism being arranged on the optical path of the first portion. The first actuator rotates the second prism.

10. The narrowband device according to claim 1, wherein: The beam adjustment optical system includes a beam shifting optical system, which is arranged on the optical path of the light beam, allows the light beam to pass through and is incident on the first grating and the second grating. The beam shifting optical system uses the third actuator to change any one of the position and posture of at least one optical element included in the beam shifting optical system, thereby changing the position of the light beam incident on the first grating and the second grating from the beam shifting optical system in the following direction: the direction intersects the surface perpendicular to the groove.

11. The narrowband device according to claim 10, wherein: The beam shifting optical system comprises a parallel plane substrate, The third actuator rotates the parallel plane substrate around an axis perpendicular to both the direction of travel of the light beam and the direction of the grooves.

12. The narrowband device according to claim 10, wherein: The beam adjustment optical system includes a third prism and a fourth prism, The third actuator moves at least one of the third prism and the fourth prism to change the distance between the third prism and the fourth prism.

13. The narrowband device according to claim 1, wherein: The beam adjustment optical system comprises: a beam shifting optical system disposed on an optical path of the light beam and transmitting the light beam, the beam shifting optical system changing any one of a position and an attitude of at least one optical element included in the beam shifting optical system using the third actuator, thereby changing the position of the light beam incident on the first grating from the beam shifting optical system in a direction intersecting a surface perpendicular to the grooves of the first grating; and The beam splitting optical system is arranged to overlap a portion of a cross section of the optical path of the light beam after passing through the beam shifting optical system, and separates the second portion from the first portion by transmitting a portion of the light beam.

14. The narrowband device according to claim 13, wherein: The narrowband device further comprises a fourth actuator, The beam splitting optical system changes the energy ratio between the first portion and the second portion by changing the position of at least one optical element included in the beam splitting optical system using the fourth actuator.

15. The narrowband device according to claim 1, wherein: The narrowband device further comprises: a fifth actuator and a sixth actuator; and a third grating arranged in parallel with the first grating and the second grating on the optical path of the light beam after passing through the first prism; The beam adjustment optical system causes the third portion of the beam to be incident on the third grating. The fifth actuator adjusts the energy ratio between the second part and the third part. The sixth actuator adjusts an incident angle of the third portion on the third grating.

16. A narrowband device comprising: a prism disposed on the optical path of the light beam; a beam adjustment optical system comprising a mirror for branching the light beam into a first portion and a second portion reflected by the mirror, wherein the mirror is arranged to overlap a portion of a cross section of an optical path of the light beam after passing through the prism; a first grating disposed on the optical path of the first portion; a second grating disposed on the optical path of the second portion; a first actuator configured to adjust an incident angle of the first portion on the first grating; a second actuator configured to adjust an incident angle of the second portion on the second grating; as well as The third actuator adjusts the energy ratio between the first portion and the second portion.

17. The narrowband device according to claim 16, wherein: The mirror changes the traveling direction of the second portion in a plane perpendicular to the grooves of the second grating.

18. The narrowband device according to claim 16, wherein: The second actuator rotates the mirror around an axis parallel to the direction of the grooves of the second grating.

19. The narrowband device according to claim 16, wherein: The third actuator moves the mirror in the direction of the grooves of the second grating.

20. A method for manufacturing an electronic device, comprising the following steps: generating pulsed laser light by a laser device; outputting the pulse laser to an exposure device; and exposing the pulsed laser light on a photosensitive substrate in the exposure device to manufacture electronic devices, The laser device comprises a laser cavity and an optical resonator, wherein the optical resonator comprises a narrowband device. The narrowband device comprises: a first prism disposed on the optical path of the light beam; a first grating and a second grating, which are arranged at different positions along the direction of the grooves of either the first grating or the second grating on the optical path of the light beam after passing through the first prism; a beam adjustment optical system disposed on an optical path of the light beam between at least one of the first and second gratings and the first prism, causing a first portion of the light beam to be incident on the first grating and causing a second portion of the light beam to be incident on the second grating; a first actuator configured to adjust an incident angle of the first portion on the first grating; a second actuator configured to adjust an incident angle of the second portion on the second grating; and A third actuator adjusts the energy ratio between the first portion and the second portion by adjusting either a position or an attitude of at least one optical element included in the beam adjusting optical system.

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