Process error compensation method and device, electronic equipment and storage medium

Abstract

The present invention discloses a method and device for compensating process errors, an electronic device and a storage medium, and relates to the field of semiconductor technology. A target change in the refractive index of the cladding of a device to be processed is determined based on a preset simulation model, and the device to be processed is a device with process errors. The target parameters used for secondary processing of a femtosecond laser are determined according to the target change in the refractive index of the cladding, and the femtosecond laser is set according to the target parameters. The device to be processed is subjected to secondary processing based on the set femtosecond laser to compensate for the process errors. After determining the target change in the refractive index of the cladding according to the size error or performance error of the device to be processed, the target parameters of the femtosecond laser corresponding to the target change in the refractive index of the cladding are used to perform secondary processing of the device to be processed based on the femtosecond laser, and the performance of the device can be effectively improved by changing the refractive index of the cladding to compensate for the process errors.

Description

Technical Field

[0001] The present disclosure relates to the field of semiconductor technology, and in particular to a method and device for compensating process errors, an electronic device, and a storage medium. Background Art

[0002] In recent years, the field of photonic integration has developed rapidly, showing great application prospects in optical communications, optical interconnection, etc. At present, the process nodes for preparing photonic integrated devices have made continuous breakthroughs, but there are inevitably certain process errors. For some scenarios that strictly require the intensity and phase of transmitted light, even a small process tolerance will have a significant impact on device performance.

[0003] To compensate for process errors, the following solutions are usually used: according to the thermo-optic effect or electro-optic effect, thermal resistors or ion doping of different concentrations are added to the device composition to change the core layer refractive index by thermal or electrical regulation, thereby achieving compensation for phase and intensity. The above solutions compensate for the process errors of photonic devices to a certain extent, but increase system power consumption and control difficulty, which is not conducive to system integration. Summary of the invention

[0004] The present disclosure provides a method and device for compensating process errors, an electronic device and a storage medium, the main purpose of which is to change the refractive index of the device cladding by femtosecond laser technology, thereby compensating for the process errors of the chip.

[0005] According to a first aspect of the present disclosure, a method for compensating a process error is provided, comprising:

[0006] Determining a target change in the refractive index of a cladding of a device to be processed based on a preset simulation model, wherein the device to be processed is a device with a process error;

[0007] Determining target parameters used in femtosecond laser secondary processing according to the target change in the refractive index of the cladding;

[0008] The femtosecond laser is set according to the target parameter, and the device to be processed is subjected to secondary processing based on the set femtosecond laser to compensate for the process error.

[0009] Optionally, the method of determining a target change in the refractive index of the cladding of the device to be processed based on a preset simulation model further includes:

[0010] Inputting the property information, size error, and performance error of the device to be processed into a preset simulation model, wherein the property information includes at least one of the material and thickness of the cladding, core layer, buried oxide layer, substrate, device structure and composition, and device size;

[0011] Determining a target refractive index of the cladding by the preset simulation model according to the attribute information, the dimensional error and the performance error, wherein the performance is related to the effective refractive index of the transmission mode in the waveguide of the device to be processed;

[0012] A target change in the cladding refractive index is calculated based on the target refractive index and the initial refractive index.

[0013] Optionally, when the device to be processed is a microring device, determining the target change amount of the refractive index of the cladding of the device to be processed based on a preset simulation model includes:

[0014] Measuring the dimensional error of the device to be processed;

[0015] The initial value of the resonant wavelength of the device to be processed obtained by testing;

[0016] Calculating the offset difference between the target value of the resonant wavelength and the initial value of the resonant wavelength; wherein the target value of the resonant wavelength is the design value of the resonant wavelength;

[0017] The size error and the resonance wavelength shift difference are converted into a target change in the cladding refractive index based on a preset simulation model.

[0018] Optionally, before determining the target parameter used for femtosecond laser secondary processing according to the target change in the refractive index of the cladding, the method includes:

[0019] The training device is trained by controlling the variable to change the refractive index of the cladding and the training parameters;

[0020] Generate a preset regular curve of the change of cladding refractive index and femtosecond laser parameters according to the training results;

[0021] The femtosecond laser parameters include at least one of wavelength, power, relative focus position, moving speed, range of the struck area, and striking shape.

[0022] Optionally, determining the target parameter used for femtosecond laser secondary processing according to the target change in the refractive index of the cladding includes:

[0023] Searching for a target change in the refractive index of the cladding in the preset regular curve;

[0024] The target parameter corresponding to the target change amount is searched in the preset regularity curve.

[0025] According to a second aspect of the present disclosure, there is provided a device for compensating a process error, comprising:

[0026] A first determining unit, configured to determine a target change amount of a cladding refractive index of a device to be processed based on a preset simulation model, wherein the device to be processed is a device with a process error;

[0027] A second determination unit is used to determine a target parameter used in femtosecond laser secondary processing according to a target change in the refractive index of the cladding;

[0028] A setting unit, used for setting the femtosecond laser according to the target parameter;

[0029] A processing unit is used to perform secondary processing on the device to be processed based on the set femtosecond laser to compensate for the process error.

[0030] Optionally, the first determining unit further includes:

[0031] An input module, used to input the property information, size error, and performance error of the device to be processed into a preset simulation model, wherein the property information includes: at least one of the material and thickness of the cladding, core layer, buried oxide layer, substrate, device structure and composition, and device size;

[0032] A determination module, configured to determine a target refractive index of the cladding according to the property information, the size error, and the performance error by the preset simulation model, wherein the performance is related to an effective refractive index of a transmission mode in a waveguide of the device to be processed;

[0033] The first calculation module is used to calculate the target change amount of the refractive index of the cladding according to the target refractive index and the initial refractive index of the cladding.

[0034] Optionally, when the device to be processed is a microring device, the first determining unit includes:

[0035] An acquisition module, used to acquire a size error and an initial value of a resonant wavelength of the device to be processed;

[0036] A second calculation module is used to calculate the offset difference between the target value of the resonant wavelength and the initial value of the resonant wavelength; wherein the target value of the resonant wavelength is the design value of the resonant wavelength;

[0037] The conversion module is used to convert the size error and the resonance wavelength shift difference into the target change amount according to a preset simulation module.

[0038] Optionally, the device comprises:

[0039] A training unit, used for training the change amount of the cladding refractive index and the training parameters by controlling the variables of the training device before the second confirmation unit determines the target parameters used for the femtosecond laser secondary processing according to the target change amount of the cladding refractive index;

[0040] A generating unit, used for generating a preset regular curve of the change of the cladding refractive index and the femtosecond laser parameter according to the training result;

[0041] The femtosecond laser parameters include at least one of wavelength, power, relative focus position, moving speed, range of the struck area, and striking shape.

[0042] Optionally, the second determining unit includes:

[0043] A first search module, used for searching the target change amount of the cladding refractive index in the preset regular curve;

[0044] The second search module is used to search the target parameter corresponding to the target change amount in the preset regular curve.

[0045] According to a third aspect of the present disclosure, there is provided an electronic device, including:

[0046] At least one processor; and a memory communicatively connected to the at least one processor; wherein the memory stores instructions executable by the at least one processor, and the instructions are executed by the at least one processor so that the at least one processor can execute the method described in the first aspect above.

[0047] According to a fourth aspect of the present disclosure, a non-transitory computer-readable storage medium storing computer instructions is provided, wherein the computer instructions are used to enable the computer to execute the method described in the first aspect.

[0048] According to a fifth aspect of the present disclosure, a computer program product is provided, comprising a computer program, wherein when the computer program is executed by a processor, the method according to the first aspect is implemented.

[0049] The present disclosure provides a method and device for compensating process errors, an electronic device, and a storage medium. First, a target change in the refractive index of the cladding of a device to be processed is determined based on a preset simulation model, and the device to be processed is a device with process errors. Second, the target parameters used for secondary processing of a femtosecond laser are determined based on the target change in the refractive index of the cladding. Finally, the femtosecond laser is set according to the target parameters, and the device to be processed is secondary processed based on the set femtosecond laser to compensate for the process errors. Compared with the related art by adding a thermal resistor or ion doping of different concentrations, the embodiment of the present application determines the target change in the refractive index of the cladding of the device to be processed according to the process error of the device to be processed, and then, based on the target parameters of the femtosecond laser corresponding to the target change, performs secondary processing of the device to be processed based on the femtosecond laser, that is, changes the refractive index of the cladding, and compensates for the process errors, thereby improving the performance of the device.

[0050] It should be understood that the content described in this section is not intended to identify the key or important features of the embodiments of the present application, nor is it intended to limit the scope of the present application. Other features of the present application will become easily understood through the following description. BRIEF DESCRIPTION OF THE DRAWINGS

[0051] The accompanying drawings are used to better understand the present solution and do not constitute a limitation of the present disclosure.

[0052] Figure 1 A schematic flow chart of a method for compensating a process error provided by an embodiment of the present disclosure;

[0053] Figure 2 A schematic flow chart of a method for obtaining a target change in the refractive index of a cladding of a microring device provided by an embodiment of the present disclosure;

[0054] Figure 3 A schematic diagram of a simulation of the relationship between the change in the cladding refractive index and the shift in the micro-ring resonance wavelength provided in an embodiment of the present disclosure;

[0055] Figure 4 A flow chart of a method for generating a preset regular curve of a cladding refractive index change and a femtosecond laser parameter provided by an embodiment of the present disclosure;

[0056] Figure 5 A schematic diagram of a device to be processed by femtosecond laser processing provided by an embodiment of the present disclosure;

[0057] Figure 6 A test curve diagram of the relationship between the relative focus position of a femtosecond laser and the change in the refractive index of the cladding provided in an embodiment of the present disclosure;

[0058] Figure 7 A schematic diagram of the structure of a device for compensating process errors provided by an embodiment of the present disclosure;

[0059] Figure 8 A schematic structural diagram of an implementable method of a device for compensating a process error provided by an embodiment of the present disclosure;

[0060] Fig. 9 A schematic block diagram of an exemplary electronic device 500 provided for an embodiment of the present disclosure. DETAILED DESCRIPTION

[0061] The following is a description of exemplary embodiments of the present disclosure in conjunction with the accompanying drawings, including various details of the embodiments of the present disclosure to facilitate understanding, which should be considered as merely exemplary. Therefore, it should be recognized by those of ordinary skill in the art that various changes and modifications may be made to the embodiments described herein without departing from the scope and spirit of the present disclosure. Similarly, for the sake of clarity and conciseness, descriptions of well-known functions and structures are omitted in the following description.

[0062] The following describes a method and apparatus for compensating process errors, an electronic device, and a storage medium according to an embodiment of the present disclosure with reference to the accompanying drawings.

[0063] Figure 1 A schematic flow chart of a method for compensating process errors provided in an embodiment of the present disclosure.

[0064] like Figure 1 As shown, the method comprises the following steps:

[0065] Step 101 : determining a target change amount of a cladding refractive index of a device to be processed based on a preset simulation model, wherein the device to be processed is a device with process errors.

[0066] The application scenario of the embodiment of the present application is to use laser femtosecond technology to perform secondary processing on the cladding of the device to be processed after confirming that the device to be processed has a process error, so as to reduce or eliminate the process error by changing the refractive index of the cladding.

[0067] As an implementation method of the embodiment of the present application, when confirming the error value of the device to be processed, it can be confirmed by calculating the difference between the actual value of the device size and the designed value, comparing the difference between the actual value of the performance and the designed value, etc. In the subsequent embodiments, the embodiment of the present application simultaneously uses the method of testing the size error and the performance error to confirm the process error. Since the order of magnitude of the size error is small, in the actual operation process, the actual value of the size of the device to be processed can be obtained through a microscope. However, it should be noted that this implementation method is not a specific limitation on the confirmation method.

[0068] Input at least one of the attribute information, dimensional error and performance error of the device to be processed into a preset simulation model, wherein the attribute information includes: the material and thickness of the cladding, core layer, buried oxide layer, substrate, device structure and composition, and at least one of the device size. The preset simulation model simulates the performance of the device to be processed and the regular curve of the cladding refractive index based on the above information, and finds the target change of the cladding refractive index corresponding to the compensation performance error of the device to be processed based on the regular curve. Among them, the device performance is related to the effective refractive index of the transmission mode in the waveguide of the device to be processed. The material of the cladding includes: silicon nitride, silicon oxynitride, silicon dioxide and other materials. In the subsequent embodiments, the embodiment of the present application uses the cladding material of silicon dioxide as an example for illustration, and this implementation method is not a specific limitation on the identification method.

[0069] The simulation model includes various forms such as models established by software with simulation functions such as FDE solvers or formula calculation models established according to device principles. In subsequent embodiments, the embodiment of the present application first uses an FDE solver to simulate the effect of changes in the cladding refractive index on the effective refractive index of the mode in the waveguide, and then obtains the change of device performance with the effective refractive index through formula simulation, thereby obtaining the change of device performance with the cladding refractive index. However, it should be noted that this implementation method is not a specific limitation on the confirmation method.

[0070] Step 102: determining target parameters used for femtosecond laser secondary processing according to the target change in the refractive index of the cladding.

[0071] The parameters of the femtosecond laser described in the embodiments of the present application include but are not limited to at least one of the wavelength, power, scanning speed, relative focus position or area and shape of the struck area of ​​the femtosecond laser. Changes in any of the above parameters may affect the refractive index of the cladding, showing the potential for compensating process errors. In order to improve the efficiency of secondary processing, the embodiments of the present application pre-study the relationship between the femtosecond laser parameters and the change in the refractive index of the cladding before secondary processing, and establish a relationship curve, so that during secondary processing, the target parameters of the femtosecond laser corresponding to the compensation of performance errors can be quickly determined according to the aforementioned relationship curve.

[0072] Step 103 , setting the femtosecond laser according to the target parameter, and performing secondary processing on the device to be processed based on the set femtosecond laser to compensate for the process error.

[0073] Based on the set target parameters of the femtosecond laser, the cladding of the device to be processed is subjected to secondary processing to change the refractive index of the cladding, thereby compensating for the process error of the device to be processed and improving the performance of the device to be processed. It should be noted that the embodiments of the present application are described using femtosecond laser as an example, but this description is not intended to limit the method of changing the refractive index of the cladding to only by femtosecond laser. In addition to changing the refractive index of the cladding by femtosecond laser, other methods of compensating for the process error of the device to be processed by the refractive index of the cladding are all within the protection scope of the embodiments of the present application.

[0074] The present disclosure provides a method for compensating process errors. First, based on a preset simulation model, a target change in the cladding refractive index of a device to be processed is determined. The device to be processed is a device with process errors. Secondly, the target parameters used for femtosecond laser secondary processing are determined according to the target change in the cladding refractive index. Finally, the femtosecond laser is set according to the target parameters, and the device to be processed is secondary processed based on the set femtosecond laser to compensate for the process errors. Compared with the related art by adding thermal resistors or ion doping of different concentrations, the embodiment of the present application determines the target change in the cladding refractive index of the device to be processed according to the process error of the device to be processed. Based on the target parameters of the femtosecond laser corresponding to the target change, the device to be processed is secondary processed based on the femtosecond laser, that is, the cladding refractive index is changed to compensate for the process errors, thereby improving the performance of the device. Femtosecond laser processing is compatible with CMOS technology, does not affect the integrated chip area, does not increase power consumption, is simple to operate, and especially increases the reliability and stability of large-scale functional systems.

[0075] As an extension of the above embodiment, the device to be processed is taken as an example of a microring resonator to illustrate step 101. Figure 2 A schematic flow chart of a method for obtaining a target change in the refractive index of a microring resonator cladding provided in an embodiment of the present application is shown in FIG. Figure 2 As shown, including:

[0076] Step 201 : obtaining an initial value of a resonant wavelength of the device to be processed, wherein the initial value of the resonant wavelength is a resonant wavelength obtained by testing before secondary processing by femtosecond laser.

[0077] Before femtosecond laser processing, the initial value of the resonant wavelength of the device to be processed is detected and recorded; a variety of methods or devices can be used for testing when detecting the resonant wavelength. In subsequent embodiments, the embodiments of the present application use the spectrum of the device to be processed as an example for illustration. This implementation method is not a specific limitation on the identification method.

[0078] Step 202, calculating the offset difference between the target value of the resonant wavelength and the initial value of the resonant wavelength; wherein the target value of the resonant wavelength is the design value of the resonant wavelength.

[0079] Step 203: convert the offset difference into a target change in the refractive index of the cladding according to a preset simulation model.

[0080] Optical power transfer function of microring Where T is the optical power at the straight end of the micro-ring, t is the amplitude transmission coefficient between the ring and the straight waveguide, α is the attenuation factor inside the ring, is the single-pass phase shift within the ring, where λ is the laser wavelength and neff(λ) is the effective refractive index of the mode in the waveguide, which is related to λ.

[0081] The embodiment of the present application first uses the FDE solver to simulate the change in the effective refractive index neff(λ) of the mode in the waveguide when the cladding refractive index changes, and substitutes neff(λ) into the aforementioned optical power transfer function to calculate the regular curve of the performance of the microring device with the cladding refractive index. However, it should be noted that this description is not a specific limitation on the specific implementation method. The target change value of the cladding refractive index corresponding to the offset difference can be obtained by referring the offset difference to the regular curve.

[0082] For example, Figure 3 A simulation diagram of the relationship between the change in the cladding refractive index and the resonant wavelength shift provided in the embodiment of the present application. The simulation shows that when the change in the cladding silica refractive index increases from 0 to +0.1, the resonant wavelength of the microring redshifts, and when the change in the silica refractive index decreases from 0 to -0.1, the resonant wavelength of the microring blueshifts. The shift value is positively correlated with the refractive index change.

[0083] As an extension of the above embodiment, a flow chart of a method for generating a preset regular curve of cladding refractive index change and femtosecond laser parameters provided in the embodiment of the present application is as follows: Figure 4 As shown, including:

[0084] Step 301, training the change of the cladding refractive index and the training parameters by controlling the variables of the training device.

[0085] Under the condition that the materials and thicknesses of the cladding, core layer, buried oxide layer and substrate of the training device are the same, the change in the cladding refractive index and the training parameters are trained by controlling variables; for example: the training equipment is located on the same chip and prepared from the same batch, the wavelength of the femtosecond laser is fixed at 405nm, the power is set to 0.05mW, the scanning speed is 100um / s, the position of the core surface relative to the focus is changed, training is performed, each time the relative focus position is changed, the cladding refractive index is tested, and the training results are recorded; the training equipment is located on the same chip and prepared from the same batch, the power is fixed at 0.05mW, the scanning speed is 100um / s, the relative focus position of the femtosecond laser is the cladding, the wavelength of the femtosecond laser is changed, training is performed, and the training results are recorded; the same method is used to train the power, scanning speed, area and shape of the striking area of ​​the femtosecond laser, and the training results are recorded.

[0086] For ease of understanding, the present application embodiment provides a schematic diagram of a femtosecond laser processing training device, such as Figure 5 As shown, the control variable method is used, the laser wavelength is fixed at 405nm, the power is set to 0.05mW, the scanning speed is 100um / s, and the position from the core surface to the relative focus is changed. It is defined that the focus is just on the core surface as the critical state, and the corresponding relative focus position is 0. The value of the relative focus position is set from negative to 0 to positive, and the stage is gradually raised. The corresponding focus state can be divided into four stages: focus above the cladding, focus inside the cladding, focus on the core surface (critical), and focus below the core surface.

[0087] Step 302: Generate a preset regular curve of the change in cladding refractive index and femtosecond laser parameters according to the training results, wherein the femtosecond laser parameters include at least one of wavelength, power, relative focus position, moving speed, range of the struck area, and striking shape.

[0088] Based on the above examples, the test results of the femtosecond laser direct writing device to be processed corresponding to the above stages are as follows Figure 6 As shown, Figure 6 A graph showing the relationship between the relative focal position of a femtosecond laser and the change in the refractive index of the cladding provided in an embodiment of the present application. As the relative focal position changes from negative to zero to positive, the change in the refractive index of the cladding increases first and then decreases. This is because the rapid deposition of femtosecond laser energy produces high-density plasma, and the energy is transmitted from the focus to the outside in the form of a shock wave. In the above stages, the compression of the cladding material around the laser focus increases first and then decreases, so the density also increases first and then decreases, which ultimately causes the cladding refraction to increase first and then decrease, thus proving that femtosecond laser processing does change the refractive index of the cladding.

[0089] The regular curve is used to quickly confirm the target parameters of the femtosecond laser after determining the target parameters of the cladding refractive index. It should be noted that there may not be only one parameter combination that can achieve the target change value of the cladding refractive index; after the preset regular curve of the cladding refractive index change and the femtosecond laser parameter is generated, it is not only applicable to the same type of device as the training device, but also to other types of devices under the conditions of the same cladding material and thickness, the same core material and thickness; it is not necessary to have a regular curve to obtain the best parameter combination. If the number of devices is sufficient, the femtosecond laser can also be directly applied to the device cladding, and processed in sequence by controlling the variables until a parameter combination that can compensate for the performance error is obtained.

[0090] As an extension of the above-mentioned application embodiment, when confirming the target parameters of the femtosecond laser based on the target change of the cladding refractive index, the following method can be used: first, search for the target change of the cladding refractive index in the preset regular curve, and then search for the target parameter corresponding to the target change in the preset regular curve.

[0091] In summary, the embodiments of the present application change the refractive index of the cladding silica by changing at least one of the target parameters of the femtosecond laser: wavelength, power, scanning speed, relative focus position, area and shape of the struck area, thereby affecting the effective refractive index of the transmission mode in the core waveguide and compensating for the performance degradation caused by CMOS process errors. Femtosecond laser processing is compatible with CMOS processes, which can compensate for the common process error problems of CMOS processes and increase the reliability and stability of large-scale functional systems. In addition, the embodiments of the present application do not affect the area of ​​the integrated chip, do not increase power consumption, and are simple to operate.

[0092] Figure 7 A schematic diagram of a structure of a process error compensation device provided by an embodiment of the present disclosure, such as Figure 7 As shown, including:

[0093] A first determining unit 41 is used to determine a target change amount of a cladding refractive index of a device to be processed based on a preset simulation model, wherein the device to be processed is a device with a process error;

[0094] A second determining unit 42 is used to determine a target parameter used in femtosecond laser secondary processing according to a target change in the refractive index of the cladding;

[0095] A setting unit 43, used for setting the femtosecond laser according to the target parameter;

[0096] The processing unit 44 is used to perform secondary processing on the device to be processed based on the set femtosecond laser to compensate for the process error.

[0097] The present disclosure provides a device for compensating process errors. First, based on a preset simulation model, a target change in the cladding refractive index of a device to be processed is determined. The device to be processed is a device with process errors. Secondly, the target parameters used for femtosecond laser secondary processing are determined according to the target change in the cladding refractive index. Finally, the femtosecond laser is set according to the target parameters, and the device to be processed is subjected to secondary processing based on the set femtosecond laser. Compared with the related art by adding thermal resistors or ion doping of different concentrations, the embodiment of the present application determines the target change in the cladding refractive index of the device to be processed according to the process error of the device to be processed. Based on the target parameters of the femtosecond laser corresponding to the target change, the device to be processed is subjected to secondary processing based on the femtosecond laser, that is, the process error is compensated, thereby improving the performance of the device. Femtosecond laser processing is compatible with CMOS technology, does not affect the integrated chip area, does not increase power consumption, is simple to operate, and especially increases the reliability and stability of large-scale functional systems.

[0098] Further, as one possible implementation method of the present application, Figure 8 As shown, the first determining unit 41, the device further includes:

[0099] Input module 411, used to input the property information, size error, and performance error of the device to be processed into a preset simulation model, wherein the property information includes: at least one of the material and thickness of the cladding, core layer, buried oxide layer, substrate, device structure and composition, and device size. ;

[0100] A determination module 412, configured to determine a target refractive index of the cladding according to the property information, the size error, and the performance error by the preset simulation model, wherein the performance is related to an effective refractive index of a transmission mode in a waveguide of the device to be processed;

[0101] The first calculation module 413 is used to calculate a target change in the cladding refractive index according to the target refractive index and the initial refractive index.

[0102] Further, as one possible implementation method of the present application, Figure 8 As shown, when the device to be processed is a micro-ring device, the first confirmation unit 41 includes:

[0103] An acquisition module 414 is used to acquire a dimension error and an initial value of a resonant wavelength of the device to be processed, wherein the initial value of the resonant wavelength is a resonant wavelength obtained by testing before secondary processing by a femtosecond laser;

[0104] The second calculation module 415 is used to calculate the offset difference between the target value of the resonant wavelength and the initial value of the initial resonant wavelength; wherein the target value of the resonant wavelength is the design value of the resonant wavelength of the microring;

[0105] The conversion module 416 is used to convert the offset difference into a target change in the refractive index of the cladding according to a preset simulation model.

[0106] Further, as one possible implementation method of the present application, Figure 8 As shown, the device comprises:

[0107] The training unit 45 is used to train the change amount of the cladding refractive index and the training parameters by controlling the variables of the training device before the second confirmation unit 42 determines the target parameters used for the femtosecond laser secondary processing according to the target change amount of the cladding refractive index;

[0108] A generating unit 46, used to generate a preset regular curve of the cladding refractive index change and the femtosecond laser parameter according to the training result;

[0109] The femtosecond laser parameters include at least one of wavelength, power, relative focus position, moving speed, range of the struck area, and striking shape.

[0110] Further, as one possible implementation method of the present application, Figure 8 As shown,

[0111] The second confirmation unit 42 includes:

[0112] A first search module 421, used to search for a target change amount of the cladding refractive index in the preset regular curve;

[0113] The second search module 422 is used to search the target parameter corresponding to the target change amount in the preset regular curve.

[0114] It should be noted that the above explanation of the method embodiment is also applicable to the device of this embodiment, and the principle is the same, which is not limited in this embodiment.

[0115] According to an embodiment of the present disclosure, the present disclosure also provides an electronic device, a readable storage medium and a computer program product.

[0116] Fig. 9A schematic block diagram of an example electronic device 500 that can be used to implement an embodiment of the present disclosure is shown. The electronic device is intended to represent various forms of digital computers, such as laptop computers, desktop computers, workstations, personal digital assistants, servers, blade servers, mainframe computers, and other suitable computers. The electronic device can also represent various forms of mobile devices, such as personal digital processing, cellular phones, smart phones, wearable devices, and other similar computing devices. The components shown herein, their connections and relationships, and their functions are merely examples and are not intended to limit the implementation of the present disclosure described and / or required herein.

[0117] like Fig. 9 As shown, the device 500 includes a computing unit 501, which can perform various appropriate actions and processes according to a computer program stored in a ROM (Read-Only Memory) 502 or a computer program loaded from a storage unit 508 to a RAM (Random Access Memory) 503. In the RAM 503, various programs and data required for the operation of the device 500 can also be stored. The computing unit 501, the ROM 502, and the RAM 503 are connected to each other via a bus 504. An I / O (Input / Output) interface 505 is also connected to the bus 504.

[0118] A number of components in the device 500 are connected to the I / O interface 505, including: an input unit 506, such as a keyboard, a mouse, etc.; an output unit 507, such as various types of displays, speakers, etc.; a storage unit 508, such as a disk, an optical disk, etc.; and a communication unit 509, such as a network card, a modem, a wireless communication transceiver, etc. The communication unit 509 allows the device 500 to exchange information / data with other devices through a computer network such as the Internet and / or various telecommunication networks.

[0119] The computing unit 501 may be a variety of general and / or special processing components with processing and computing capabilities. Some examples of the computing unit 501 include, but are not limited to, a CPU (Central Processing Unit), a GPU (Graphic Processing Units), various dedicated AI (Artificial Intelligence) computing chips, various computing units running machine learning model algorithms, a DSP (Digital Signal Processor), and any appropriate processor, controller, microcontroller, etc. The computing unit 501 performs the various methods and processes described above, such as a method for compensating for process errors. For example, in some embodiments, the method for compensating for process errors may be implemented as a computer software program, which is tangibly contained in a machine-readable medium, such as a storage unit 508. In some embodiments, part or all of the computer program may be loaded and / or installed on the device 500 via the ROM 502 and / or the communication unit 509. When the computer program is loaded into the RAM 503 and executed by the computing unit 501, one or more steps of the method described above may be performed. Alternatively, in other embodiments, the computing unit 501 may be configured to execute the aforementioned process error compensation method in any other appropriate manner (for example, by means of firmware).

[0120] Various embodiments of the systems and techniques described above herein may be implemented in digital electronic circuit systems, integrated circuit systems, FPGAs (Field Programmable Gate Arrays), ASICs (Application-Specific Integrated Circuits), ASSPs (Application Specific Standard Products), SOCs (System On Chips), CPLDs (Complex Programmable Logic Devices), computer hardware, firmware, software, and / or combinations thereof. These various embodiments may include: being implemented in one or more computer programs that may be executed and / or interpreted on a programmable system including at least one programmable processor that may be a dedicated or general-purpose programmable processor that may receive data and instructions from a storage system, at least one input device, and at least one output device, and transmit data and instructions to the storage system, the at least one input device, and the at least one output device.

[0121] The program code for implementing the method of the present disclosure may be written in any combination of one or more programming languages. These program codes may be provided to a processor or controller of a general-purpose computer, a special-purpose computer, or other programmable data processing device, so that the program code, when executed by the processor or controller, enables the functions / operations specified in the flow chart and / or block diagram to be implemented. The program code may be executed entirely on the machine, partially on the machine, partially on the machine and partially on a remote machine as a stand-alone software package, or entirely on a remote machine or server.

[0122] In the context of the present disclosure, a machine-readable medium may be a tangible medium that may contain or store a program for use by or in conjunction with an instruction execution system, device, or equipment. A machine-readable medium may be a machine-readable signal medium or a machine-readable storage medium. A machine-readable medium may include, but is not limited to, an electronic, magnetic, optical, electromagnetic, infrared, or semiconductor system, device, or device, or any suitable combination of the foregoing. More specific examples of machine-readable storage media may include electrical connections based on one or more lines, portable computer disks, hard disks, RAM, ROM, EPROM (Electrically Programmable Read-Only-Memory) or flash memory, optical fiber, CD-ROM (Compact Disc Read-Only Memory), optical storage devices, magnetic storage devices, or any suitable combination of the foregoing.

[0123] To provide interaction with a user, the systems and techniques described herein can be implemented on a computer having: a display device (e.g., a CRT (Cathode-Ray Tube) or LCD (Liquid Crystal Display) monitor) for displaying information to the user; and a keyboard and pointing device (e.g., a mouse or trackball) through which the user can provide input to the computer. Other types of devices can also be used to provide interaction with the user; for example, the feedback provided to the user can be any form of sensory feedback (e.g., visual feedback, auditory feedback, or tactile feedback); and input from the user can be received in any form (including acoustic input, voice input, or tactile input).

[0124] The systems and techniques described herein may be implemented in a computing system that includes backend components (e.g., as a data server), or a computing system that includes middleware components (e.g., an application server), or a computing system that includes frontend components (e.g., a user computer with a graphical user interface or a web browser through which a user can interact with implementations of the systems and techniques described herein), or a computing system that includes any combination of such backend components, middleware components, or frontend components. The components of the system may be interconnected by any form or medium of digital data communication (e.g., a communication network). Examples of communication networks include: LAN (Local Area Network), WAN (Wide Area Network), the Internet, and blockchain networks.

[0125] A computer system may include a client and a server. The client and the server are generally remote from each other and usually interact through a communication network. The relationship between the client and the server is generated by computer programs running on the corresponding computers and having a client-server relationship with each other. The server may be a cloud server, also known as a cloud computing server or cloud host, which is a host product in the cloud computing service system to solve the defects of difficult management and weak business scalability in traditional physical hosts and VPS services ("Virtual Private Server", or "VPS" for short). The server may also be a server of a distributed system, or a server combined with a blockchain.

[0126] It should be noted that artificial intelligence is a discipline that studies how computers can simulate certain human thought processes and intelligent behaviors (such as learning, reasoning, thinking, planning, etc.), and includes both hardware-level and software-level technologies. Artificial intelligence hardware technologies generally include technologies such as sensors, dedicated artificial intelligence chips, cloud computing, distributed storage, and big data processing; artificial intelligence software technologies mainly include computer vision technology, speech recognition technology, natural language processing technology, as well as machine learning / deep learning, big data processing technology, knowledge graph technology, and other major directions.

[0127] It should be understood that the various forms of processes shown above can be used to reorder, add or delete steps. For example, the steps recorded in this disclosure can be executed in parallel, sequentially or in different orders, as long as the desired results of the technical solutions disclosed in this disclosure can be achieved, and this document does not limit this.

[0128] The above specific implementations do not constitute a limitation on the protection scope of the present disclosure. It should be understood by those skilled in the art that various modifications, combinations, sub-combinations and substitutions can be made according to design requirements and other factors. Any modification, equivalent substitution and improvement made within the spirit and principle of the present disclosure shall be included in the protection scope of the present disclosure.

Claims

1. A method for compensating process errors, characterized in that: include: Determining a target change in the refractive index of a cladding of a device to be processed based on a preset simulation model, wherein the device to be processed is a device with a process error; Determining the target parameters used in the femtosecond laser secondary processing according to the target change in the refractive index of the cladding; wherein the femtosecond laser target parameters include at least one of wavelength, power, relative focus position, moving speed, and the range and striking shape of the struck area; Setting the femtosecond laser according to the target parameter, and performing secondary processing on the device to be processed based on the set femtosecond laser to compensate for the process error; Wherein, the method further comprises: determining the target change amount of the refractive index of the cladding of the device to be processed based on the preset simulation model; Inputting the property information, size error, and performance error of the device to be processed into a preset simulation model, wherein the property information includes: the material and thickness of the cladding layer, core layer, buried oxide layer, substrate, device structure and composition, and at least one of the device size; The preset simulation model determines the target refractive index of the cladding when achieving compensation according to the attribute information, the size error, and the performance error, wherein the performance is related to the effective refractive index of the transmission mode in the waveguide of the device to be processed; The target change of the cladding refractive index is calculated according to the target refractive index and the initial refractive index of the cladding.

2. The compensation method according to claim 1, characterized in that: When the device to be processed is a microring device, determining the target change amount of the refractive index of the cladding of the device to be processed based on the preset simulation model includes: Obtaining a dimensional error and an initial value of a resonant wavelength of the device to be processed, wherein the initial value of the resonant wavelength is a resonant wavelength obtained by testing before secondary processing by a femtosecond laser; Calculating the offset difference between the target value of the resonant wavelength and the initial value of the resonant wavelength; wherein the target value of the resonant wavelength is the design value of the resonant wavelength of the microring; The offset difference is converted into a target change in the refractive index of the cladding according to a preset simulation model.

3. The compensation method according to claim 1, characterized in that: Before determining the target parameter used for femtosecond laser secondary processing according to the target change in the refractive index of the cladding, the method includes: The training device is trained by controlling the variable to change the refractive index of the cladding and the training parameters; A preset regular curve of the cladding refractive index change and femtosecond laser parameters is generated according to the training results.

4. The compensation method according to claim 3, characterized in that: The target parameters used in femtosecond laser secondary processing are determined according to the target change in the refractive index of the cladding, including: Searching for a target change in the refractive index of the cladding in the preset regular curve; The target parameter corresponding to the target change amount is searched in the preset regularity curve.

5. A device for compensating process errors, characterized in that: include: A first determining unit, configured to determine a target change amount of a cladding refractive index of a device to be processed based on a preset simulation model; A second determining unit is used to determine a target parameter used in femtosecond laser secondary processing according to a target change in the refractive index of the cladding; A setting unit, used for setting the femtosecond laser according to the target parameter; A processing unit, used for performing secondary processing on the device to be processed based on the set femtosecond laser to compensate for the process error; Wherein, the first determining unit includes: An input module, used to input the property information, size error, and performance error of the device to be processed into a preset simulation model, wherein the property information includes: at least one of the material and thickness of the cladding, core layer, buried oxide layer, substrate, device structure and composition, and device size; A determination module, configured to determine a target refractive index of the cladding according to the property information, the size error, and the performance error by the preset simulation model, wherein the performance is related to an effective refractive index of a transmission mode in a waveguide of a device to be processed; The first calculation module is used to calculate a target change in the refractive index of the cladding according to the target refractive index of the cladding and the initial refractive index of the cladding.

6. An electronic device, characterized in that: include: at least one processor; and a memory communicatively connected to the at least one processor; wherein the memory stores instructions executed by the at least one processor, and the instructions are executed by the at least one processor so that the at least one processor can execute the method according to any one of claims 1 to 4.

7. A non-transitory computer-readable storage medium storing computer instructions, characterized in that: The computer instructions are used to cause the computer to execute the method according to any one of claims 1-4.

8. A computer program product, characterized in that The invention comprises a computer program which, when executed by at least one processor, implements the method according to any one of claims 1 to 4.

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