A plug valve and a vertical double-chamber hot wire CVD system

Abstract

The present invention discloses a plug valve and a vertical double-chamber hot wire CVD system, which relate to the technical field of chemical deposition coating equipment, wherein one end of two connecting plates extends into the shell cavity through an opening, and is respectively connected to two opposite side walls in the shell cavity. Two cold water plates are arranged between the two connecting plates; wherein two rows of slide grooves are provided on one side of the connecting plate close to the cold water plate, and each row of slide grooves includes a first groove and a second groove arranged at intervals; an end of the first groove close to the second groove is bent to form a first arc segment. An end of the second groove away from the first groove is bent to form a second arc segment. At least two sliding rods are respectively arranged on the two opposite side walls of the cold water plate, and one end of the sliding rod is connected to the cold water plate, and the other end of the sliding rod extends into the first groove to slide or extends into the second groove to slide. The cylinder is connected to the outer shell, and the cylinder has a cylinder rod, which extends into the shell cavity and is hinged to the two cold water plates. The present invention is used for isolating a vacuum chamber of a coating equipment.

Description

Technical Field

[0001] The invention relates to the technical field of chemical deposition coating equipment, and in particular to a plug-in valve and a vertical double-chamber hot wire CVD system. Background Art

[0002] Chemical vapor deposition (CVD) is the most widely used technology in the semiconductor industry for depositing a variety of materials. A variety of mixed gases are introduced into the reaction chamber, and chemical reactions occur under the action of hot wires to form the required thin film on the substrate surface. Due to the advantages of CVD technology such as a wide film formation range and good reproducibility, it is widely used in a variety of different forms of film formation.

[0003] At present, vacuum chambers for chemical vapor deposition can be set up continuously, and multiple vacuum chambers are isolated or connected by gate valves. Most of the gate valves are composed of extrusion mechanisms, guide groove mechanisms, gas cap mechanisms, or a combination of the above three mechanisms. However, the general gate valve is relatively complex, has poor sealing performance, and has a high manufacturing cost. Therefore, it is necessary to propose a gate valve with a simple structure that can meet the sealing requirements. Summary of the invention

[0004] The embodiments of the present invention provide a gate valve and a vertical double-chamber hot wire CVD system, which simplify the gate valve structure and enhance the sealing performance of the gate valve in a closed vacuum chamber through the setting of a slide groove.

[0005] To achieve the above object, the embodiments of the present invention adopt the following technical solutions:

[0006] On the one hand, an embodiment of the present invention provides a plug valve, including an outer shell, two connecting plates, two cold water plates, a plurality of sliding rods and a cylinder. The outer shell is provided with an opening and a shell cavity connected to the opening. One end of the two connecting plates extends into the shell cavity from the opening and is respectively connected to two opposite side walls in the shell cavity. The two cold water plates are arranged between the two connecting plates; two rows of slide grooves are provided on the side of the connecting plate close to the cold water plate, and each row of slide grooves includes a first groove and a second groove arranged at intervals; one end of the first groove close to the second groove is bent toward a side away from the other row of slide grooves to form a first arc segment; one end of the second groove away from the first groove is bent toward a side away from the other row of slide grooves to form a second arc segment. At least two sliding rods are respectively arranged on the two opposite side walls of the cold water plate, and one end of the sliding rod is connected to the cold water plate, and the other end of the sliding rod extends into the first groove to slide or extends into the second groove to slide. The cylinder is connected to the shell and has a cylinder rod. The cylinder rod extends into the shell cavity and is hinged with two cold water plates. The extension direction of the cylinder rod is consistent with the extension direction of the two rows of slide grooves.

[0007] In this case, a sliding connection is adopted between the two cold water plates and the two connecting plates. Specifically, the sliding rods arranged on both sides of the cold water plates can be slidably arranged in two rows of slide grooves to achieve a sliding connection. In order to make the cold water plates fit more closely to the inner wall of the vacuum chamber when the plug valve is closed, one end of the first groove and the second slide groove respectively have a first arc segment and a second arc segment. In this way, when the cold water plate is closed toward the side close to the vacuum chamber, the sliding rod at one end of the cold water plate can slide into the first arc segment or the second arc segment. At this time, due to the thrust of the cylinder, the two cold water plates begin to move away from each other, so that the cold water plates begin to squeeze the inner wall of the vacuum chamber at the contact point, thereby achieving further sealing.

[0008] Furthermore, the gate valve also includes a plurality of needle bearings, which are sleeved on the outer side of one end of the slide rod away from the cold water plate and connected to the slide rod.

[0009] Furthermore, the gate valve further comprises a plurality of first connecting plates, a plurality of second connecting plates and a driving plate, wherein one end of the plurality of first connecting plates is connected to the inner sides of the two cold water plates. One end of the plurality of second connecting plates is hinged to the other end of the first connecting plates. One end of the driving plate is hinged to the other end of the second connecting plates, and the other end of the driving plate is connected to the cylinder rod.

[0010] Furthermore, two water inlets and two water outlets are provided on the bottom wall of the shell. The gate valve may also include two first bellows and two second bellows, wherein the two first bellows are respectively connected to the two cold water plates, and the other ends of the two first bellows are respectively connected to the two water inlets. The two second bellows are respectively connected to the two cold water plates, and the other ends of the two second bellows are respectively connected to the two water outlets.

[0011] On the other hand, an embodiment of the present application also provides a vertical dual-chamber hot wire CVD system, including the gate valve, injection chamber and process chamber mentioned in any of the above technical solutions.

[0012] Among them, the injection chamber has a pretreatment chamber, the process chamber has a process chamber, and the process chamber is connected to the pretreatment chamber; the other end of the connecting plate in the plug-in valve is inserted into the side of the injection chamber close to the process chamber, and is connected to the inner wall of the pretreatment chamber, the opening of the outer shell is connected to the outer wall of the injection chamber, and the pretreatment chamber is connected to the shell cavity; when the cold water plate in the plug-in valve is used to move into the pretreatment chamber, when a part of the sliding rod is located at the first arc segment and a part of the sliding rod is located at the second arc segment, the pretreatment chamber and the process chamber are respectively isolated into sealed chambers; the cold water plate is also used to connect the pretreatment chamber and the process chamber when it is removed into the pretreatment chamber.

[0013] Furthermore, the vertical dual-chamber hot wire CVD system also includes a number of drive rollers, a sample cart, a hot wire, an air inlet pipeline and an exhaust system. A number of drive rollers are arranged at the bottom of the pretreatment chamber and the process chamber; the sample cart is located on the drive rollers and moves along the drive rollers between the pretreatment chamber and the process chamber; the sample cart has an installation chamber, and the installation chamber has two parallel and opposite installation surfaces, and the installation surfaces are used to install the substrate. A number of hot wires arranged at equal intervals and located in the same plane are arranged in the process chamber, and the hot wire is used to be located in the installation chamber when the sample cart moves into the process chamber, and the substrate is located on one side or both sides of the hot wire. The air inlet pipeline is arranged at the top of the process chamber, and a number of air outlets facing the substrate are opened on the air inlet pipeline, and the air inlet pipeline is used to introduce mixed gas; the exhaust system is used to evacuate, and is connected to the bottom of the pretreatment chamber and the process chamber.

[0014] Furthermore, the vertical dual-chamber hot wire CVD system also includes a bracket, two protrusions and two limiter assemblies, wherein the bracket is arranged at the bottom of the sample chamber and the process chamber and is connected, and the bracket is used to support the sample chamber and the process chamber. The two protrusions are respectively arranged at the left and right ends of the outer bottom wall of the sample cart and are connected to the sample cart. The two limiter assemblies are respectively arranged below the sample chamber and the process chamber and are connected to the bracket.

[0015] The limiting assembly is used to control the transmission roller to stop rotating when it abuts against one of the protrusions.

[0016] Furthermore, the limit assembly includes a telescopic rod, a first photoelectric switch and a second photoelectric switch, wherein the telescopic rod includes a connecting rod, a sleeve, a spring and a roller, the sleeve is sleeved outside the connecting rod, the spring is sleeved outside the connecting rod and located inside the sleeve, and the spring is in contact with the sleeve and the connecting rod; the roller is arranged at one end of the connecting rod close to the sample vehicle. The first photoelectric switch is connected to the bracket, and the first photoelectric switch has a first emitter. The second photoelectric switch is connected to the bracket and is located on the side of the first photoelectric switch away from the transmission roller, and the second photoelectric switch has a second emitter. The side of the protrusion close to the first photoelectric switch has a deceleration slope and a stop plane connected to the deceleration slope. When the roller slides onto the deceleration slope, the end of the connecting rod away from the roller blocks the first emitter and controls the transmission roller to decelerate; when the roller slides onto the stop plane, the end of the connecting rod away from the roller blocks the second emitter and controls the transmission roller to stop rotating. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 A rear view of a vertical dual-chamber hot wire CVD system provided by an embodiment of the present invention;

[0018] Figure 2 A front view of a vertical dual-chamber hot wire CVD system provided by an embodiment of the present invention;

[0019] Figure 3 The embodiment of the present invention provides Figure 2 A partial cross-sectional view of the sample chamber with a sample cart;

[0020] Figure 4 The embodiment of the present invention provides Figure 3 Schematic diagram of the sample car in;

[0021] Figure 5 The embodiment of the present invention provides Figure 2 A partial cross-sectional view of the process chamber with a sample cart;

[0022] Figure 6 The embodiment of the present invention provides Figure 5 Schematic diagram of the hot wire assembly;

[0023] Figure 7 The embodiment of the present invention provides Figure 2 Schematic diagram of the gate valve in FIG.

[0024] Figure 8 The embodiment of the present invention provides Figure 7 Schematic diagram of the connection plate in FIG.

[0025] Fig. 9 A partial schematic diagram of the sliding connection between the sliding rod and the connecting plate on the cold water plate provided by an embodiment of the present invention;

[0026] Fig.10 The embodiment of the present invention provides Figure 7 A partial cross-sectional view of

[0027] Fig.11 A schematic diagram of a gate valve provided in an embodiment of the present invention without a connecting plate and a housing;

[0028] Fig.12 A partial cross-sectional schematic diagram of the connection between the injection chamber and the process chamber provided in an embodiment of the present invention;

[0029] Fig.13 The embodiment of the present invention provides Fig.12 Schematic diagram of the rubber strip in FIG.

[0030] Fig.14 A position relationship diagram of the limit assembly provided in an embodiment of the present invention in a vertical double-chamber hot wire CVD system;

[0031] Fig.15 The embodiment of the present invention provides Fig.14 A cross-sectional schematic diagram of a limiter assembly;

[0032] Fig.16 A schematic diagram of the positional relationship between a limiting component, an injection chamber and a process chamber provided in an embodiment of the present invention;

[0033] Fig.17A schematic diagram of the positional relationship between another limiting assembly, the injection chamber and the process chamber provided in an embodiment of the present invention;

[0034] Fig.18 A schematic cross-sectional view of the connection between the cold water plate and the rubber strip provided in an embodiment of the present invention. DETAILED DESCRIPTION

[0035] The embodiments of the present invention are described in detail below with reference to the accompanying drawings.

[0036] In the description of the present invention, it should be understood that the terms "center", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship are based on the orientation or position relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0037] The terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, unless otherwise specified, "plurality" means two or more.

[0038] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0039] CVD (Chemical Vapor Deposition) refers to the process of introducing the vapor of gaseous reactants or liquid reactants containing the elements that constitute the thin film and other gases required for the reaction into the reaction chamber, causing a chemical reaction on the surface of the substrate to form a thin film.

[0040] The embodiment of the present invention provides a vertical dual-chamber hot wire CVD system 100 for substrate coating, such as Figure 1As shown, the vertical dual-chamber hot wire CVD system 100 may include an injection chamber 101, a process chamber 102, a plug valve 103 and an exhaust system 104. Among them, the injection chamber 101 has a pretreatment chamber. The process chamber 102 has a process chamber, and the process chamber is connected to the pretreatment chamber. The plug valve 103 is used to be inserted on the side of the injection chamber 101 close to the process chamber 102 to isolate the pretreatment chamber from the process chamber. It is also used to connect the pretreatment chamber and the process chamber when the plug valve 103 is pulled out. The exhaust system 104 is used for vacuuming and is connected to the bottom of the pretreatment chamber and the process chamber.

[0041] In this case, if Figure 1 As shown, the pretreatment chamber and the process chamber can be evacuated by the exhaust system 104. The pretreatment chamber and the process chamber can be connected or isolated by the plug valve 103. After the substrate is heated and vacuumed in the pretreatment chamber, it is transported to the process chamber. No outside air is introduced into the process chamber, so the cleanliness is higher. As a result, the purity of the film formed on the surface of the substrate is higher. The exhaust system 104 can be evacuated. For example, in some embodiments of the present application, the exhaust system 104 may include a first mechanical pump 1041 and a second mechanical pump 1042, wherein the first mechanical pump 1041 is connected to the pretreatment chamber for evacuating the pretreatment chamber. The second mechanical pump 1042 is connected to the process chamber for evacuating the process chamber.

[0042] To prevent the temperature in the injection chamber 101 and the process chamber 102 from being too high, in some embodiments of the present application, the side walls of the injection chamber 101 and the process chamber 102 have a gap sandwich, which means that the side walls of the injection chamber 101 and the process chamber 102 are double-layer structures, and there is a gap between the double-layer structures, and water can flow into the gap. Figure 1 As shown, the vertical dual-chamber hot wire CVD system also includes a water cooling system, which includes a cooling water tank 105 and a water pipe 106, wherein the water pipe 106 is connected to the cooling water tank 105, the inlet of the water pipe 106 is connected to the gap sandwich at the bottom of the injection chamber 101 and the process chamber 102, and the water cooling plate (the structure in the plug valve 103, Figure 1 The outlet of the water pipe 106 is connected to the gap sandwich at the top of the sample injection chamber 101 and the process chamber 102, as well as the water cooling plate.

[0043] In this case, if Figure 1As shown, there is a circulating water pump in the cooling water tank 105. The working principle is that the cold water stored in the water tank is sucked into the circulation system by the circulating water pump, passes through the equipment part to be cooled, plays a cooling role, and then flows out the water with higher temperature, and then cools through the water circulation radiator and the cooling fan, and then re-enters the new circulation. The cold water enters the bottom gap interlayer of the sampling chamber 101 and the process chamber 102 through the water pipe 106, so as to flow in the gap interlayer to cool the sampling chamber 101 and the process chamber 102, and then flows out from the gap interlayer at the top of the sampling chamber 101 and the process chamber 102 to the cooling water tank 105, so as to form a cycle. The cooling water can also flow into the cold water plate through the water pipe 106 to cool the cold water plate. Of course, in some other embodiments of the present application, other components can also be connected through the water pipe 106, and the present application will not list them one by one.

[0044] like Figure 2 As shown, in some embodiments of the present application, the vertical dual-chamber hot wire CVD system 100 may further include a power supply 107, through which the hot wire 1114 in the process chamber 102 can be electrically heated. Figure 2 As shown, a door body 1011 is provided at the injection chamber 101 for sealing the injection chamber 101 , and a handle 1012 is provided on the outer side of the door body 1011 for a user to open or close the door body 1011 through the handle 1012 .

[0045] like Figure 3 As shown, it is a partial cross-sectional view of the sample cart 108 in the injection chamber 101. It can be seen that the sample cart 108 is in the pretreatment chamber of the injection chamber 101. Several transmission rollers 109 are arranged at the bottom of the pretreatment chamber. The transmission rollers 109 are used for the sample cart 108 to move in the pretreatment chamber. A chain is used to connect the multiple transmission rollers 109 at the bottom of the injection chamber 101 or the process chamber 102, and the motor 110 is coaxially connected to one of the transmission rollers 109 for transmission, thereby driving the chain to rotate, and then driving other related transmission rollers 109 to rotate. Finally, multiple transmission rollers 109 are realized to rotate synchronously. The two motors 110 at the bottom of the injection chamber 101 and the process chamber 102 can rotate synchronously, so that the sample cart 108 can move smoothly in the left and right chambers.

[0046] It should be noted that, in some embodiments of the present application, multiple infrared radiation heaters ( Figure 3 The infrared radiation heater is arranged at the top of the pretreatment chamber to heat the pretreatment chamber. During the production process, the pretreatment chamber is heated to a certain temperature by the infrared radiation heater, so that the temperature in the pretreatment chamber is relatively uniform and stable, so as to ensure the initial ambient temperature of the substrate during the coating process, which is conducive to ensuring the stability of the process.

[0047] The structure of the sample vehicle 108 mentioned above is described below by way of example, for example, in some embodiments of the present application. Figure 4 As shown, the sample vehicle 108 may include a bottom plate 1081, two parallel and spaced side plates 1082, and two parallel and spaced sample plates 1083. The bottom plate 1081 is located on the driving roller 109. The two parallel and spaced side plates 1082 are respectively arranged at both ends of the bottom plate 1081, and are vertically connected to the side of the bottom plate 1081 away from the driving roller 109. The two parallel and spaced sample plates 1083 are arranged between the two side plates 1082, the plate surface of the sample plate 1083 is parallel to the plate surface of the side plate 1082, the sample plate 1083 is connected to the side plate 1082, and the space between the two sample plates 1083 is used as a mounting cavity 1084. The plate surface of the sample plate 1083 away from the side plate 1082 is used as a mounting surface 10831 for mounting the substrate.

[0048] In this case, the bottom plate 1081 can slide along the driving roller 109, and the two parallel side plates 1082 can form a U-shaped cavity with the bottom plate 1081, thereby forming a U-shaped bracket 114, and the two parallel sample plates 1083 in the U-shaped cavity can be fixed to the side plates 1082 through the keel, so that the two parallel side plates 1082 are parallel to the two parallel sample plates 1083. The mounting surface 10831 of the side wall of the mounting cavity 1084 between the two sample plates 1083 can be used to install the substrate, and the substrate can be connected to the mounting surface 10831. The present application does not limit the fixing method of the substrate. The two sample plates 1083 can be graphite plates, which not only have the characteristics of high temperature resistance, but also can provide certain thermal insulation for the heating of the hot wire 1114 when the hot wire 1114 is between the sample plates 1083, thereby reducing the loss of heat.

[0049] In some embodiments of the present application, the vertical dual-chamber hot wire CVD system may also include: Figure 5 The hot wire assembly 111 shown, Figure 5 The figure is a partial cross-sectional view of the sample cart 108 moving into the process chamber 102. A plurality of driving rollers 109 are also installed at the bottom of the process chamber of the process chamber 102, so that the sample cart 108 can move in the pretreatment chamber and the process chamber. In this case, the hot wire assembly 111 is located between the two sample plates 1083 in the sample cart 108, so that the substrate mounted on the mounting surface 10831 can face Figure 6 One side of the hot wire 1114 in the Figure 6As shown, the hot wire assembly 111 may include two parallel fixed plates 1111, two first conductive pillars 1112 and two second conductive pillars 1113. The hot wire 1114 is arranged between the two fixed plates 1111, and the two ends of the hot wire 1114 are respectively connected to the two fixed plates 1111. The two first conductive pillars 1112 are respectively connected to the two ends of one of the fixed plates 1111. The two second conductive pillars 1113 are respectively connected to the two ends of the other fixed plate 1111. The first conductive pillar 1112 and the second conductive pillar 1113 are connected to opposite electrodes.

[0050] In this case, combined Figure 5 and Figure 6 As shown, the two fixed plates 1111 can be energized through the first conductive column 1112 and the second conductive column 1113, so that the hot wire 1114 fixed between the two fixed plates 1111 generates heat. For example, the first conductive column 1112 can be a positive electrode, and the second conductive column 1113 is a negative electrode. If the first conductive column 1112 is a negative electrode, then the second conductive column 1113 is a positive electrode. The present application does not limit the positive and negative electrodes of the first conductive column 1112 and the second conductive column 1113, as long as the first conductive column 1112 and the second conductive column 1113 are opposite electrodes. Figure 1 The positive and negative electrodes of the power supply 107 are connected to the first conductive column 1112 and the second conductive column 1113 respectively, so that the hot wire 1114 in the process chamber 102 can be powered on for heating, thereby radiating heat to the substrates on both sides.

[0051] In some embodiments of the present application, the vertical dual-chamber hot wire CVD system may also include: Figure 5 The air inlet pipeline 112 shown is installed at the top of the process chamber and is located at the top of the hot wire 111. The air inlet pipeline 112 is provided with a plurality of air outlets facing the substrate. The air inlet pipeline 112 is used to introduce a mixed gas (such as methane and hydrogen) to spray toward the substrate.

[0052] Combination Figure 3~Figure 5 As shown, the sample cart 108 is located on the transmission roller 109 and moves along the transmission roller 109 between the pretreatment chamber and the process chamber. The sample cart 108 has a mounting chamber 1084, and the mounting chamber 1084 has two parallel mounting surfaces 10831 opposite to each other, and the mounting surface 10831 is used to mount the substrate. A plurality of hot wires 1114 arranged at equal intervals and located in the same plane are arranged in the process chamber, and the hot wires 1114 are used to be located in the mounting chamber 1084 when the sample cart 108 moves into the process chamber, and the substrate is located on one side or both sides of the hot wires 1114. The air inlet pipeline 112 is arranged at the top of the process chamber.

[0053] In this case, the user can mount the substrate on the mounting surface 10831 on the sample cart 108, and then move the sample cart 108 from the pretreatment chamber to the process chamber through the transmission roller 109. The hot wire 1114 can heat the mixed gas discharged from the gas outlet of the gas inlet pipe 112 to form a film on the substrate.

[0054] Since the pretreatment chamber and the process chamber are connected, the sample cart 108 can pass through. Therefore, a gate valve 103 needs to be inserted between the pretreatment chamber and the process chamber to connect the two chambers or isolate them. The gate valve 103 mentioned above is described below by way of example. For example, in some embodiments of the present application, Figure 7 As shown, the gate valve 103 may include a shell 1031, two connecting plates 1032, two cold water plates 1033, a plurality of slide rods 10331 and a cylinder 1034. The shell 1031 is provided with an opening and a shell cavity connected to the opening. One end of the two connecting plates 1032 extends into the shell cavity from the opening and is respectively connected to two opposite side walls in the shell cavity. The two cold water plates 1033 are spaced apart between the two connecting plates 1032, and the cold water plates 1033 have a cold water cavity, into which coolant flows. Figure 8 As shown, two rows of slide grooves are provided on one side of the connecting plate 1032 close to the cold water plate 1033, and each row of slide grooves includes a first groove 10321 and a second groove 10322 arranged at intervals; one end of the first groove 10321 close to the second groove 10322 is bent toward the side away from the other row of slide grooves to form a first arc segment a; one end of the second groove 10322 away from the first groove 10321 is bent toward the side away from the other row of slide grooves to form a second arc segment b. In other words, the arc segments in the same vertical row all extend outward, and the two horizontal arc segments extend in opposite directions. Fig. 9 As shown, at least two slide bars 10331 are respectively disposed on two opposite side walls of the cold water plate 1033, and one end of the slide bar 10331 is connected to the cold water plate 1033, and the other end of the slide bar 10331 extends into the first groove 10321 to slide or extends into the second groove 10322 to slide. Fig.10 As shown, the cylinder 1034 is connected to the shell 1031, and the cylinder 1034 has a cylinder rod. The cylinder rod extends into the shell cavity and is hinged to the two cold water plates 1033. The extension direction of the cylinder rod is consistent with the extension direction of the two rows of slide grooves.

[0055] In this case, combined Figures 7 to 10As shown, a sliding connection is adopted between the two cold water plates 1033 and the two connecting plates 1032. Specifically, the sliding rods 10331 arranged on both sides of the cold water plates 1033 can be slidably arranged in two rows of slide grooves to achieve a sliding connection. In order to make the cold water plates 1033 fit more closely to the inner wall of the vacuum chamber when the plug valve 103 is closed, one end of the first groove 10321 and the second slide groove 10322 respectively have a first arc segment a and a second arc segment b. In this way, when the cold water plate 1033 is closed toward the side close to the vacuum chamber, the sliding rod 10331 at one end of the cold water plate 1033 can slide into the first arc segment a or the second arc segment b. At this time, due to the action of the cylinder 1034, the two cold water plates 1033 begin to move away from each other, so that the cold water plates 1033 begin to squeeze the inner wall of the contact point of the vacuum chamber (i.e., the inner wall of the pretreatment chamber), thereby achieving further sealing.

[0056] Furthermore, if Fig. 9 As shown, the gate valve 103 may further include a plurality of needle bearings 10332, which are sleeved on the outer side of one end of the slide bar 10331 away from the cold water plate 1033 and connected to the slide bar 10331. In this case, the needle bearings 10332 can reduce the friction between the slide bar 10331 and the slide groove, thereby increasing the service life.

[0057] In some embodiments of the present application, Fig.11 As shown, the gate valve 103 may also include a plurality of first connecting pieces 1035 and a plurality of second connecting pieces 1036, wherein one end of the plurality of first connecting pieces 1035 is connected to the inner side of the two cold water plates 1033. One end of the plurality of second connecting pieces 1036 (in the present application, the second connecting pieces 1036 may be in the shape of a long strip) is hinged to the other end of the first connecting piece 1035, one end of the driving plate is hinged to the other end of the second connecting piece 1036, and the other end of the driving plate is connected to the cylinder rod. In this way, when the cylinder rod moves downward, a downward force may be applied to the end of the second connecting piece 1036 connected to the cylinder rod, so that the second connecting piece 1036 gradually swings from the initial state of the oblique direction to the horizontal setting, at which time, the second connecting piece 1036 applies a horizontal force to the first connecting piece 1035, thereby causing the two cold water plates 1033 to move in opposite directions.

[0058] In addition, continue to refer to Figure 7 The bottom wall of the housing 1031 is provided with two water inlets 10311 and two water outlets 10312. The gate valve 103 may further include two first bellows and two second bellows, wherein the two first bellows are respectively connected to the two cold water plates 1033, and the other ends of the two first bellows are respectively connected to the two water inlets 10311. The two second bellows are respectively connected to the two cold water plates 1033, and the other ends of the two second bellows are respectively connected to the two water outlets 10312.

[0059] In order to make the cold water plate 1033 seal the process chamber more tightly, in some embodiments of the present application, Fig.12 As shown, a circle of rubber strip 113 is provided on one side of the process chamber close to the pretreatment chamber, and the rubber strip 113 can abut against the outer edge of the cold water plate 1033. In order to make the abutment more compact, the combination Figure 8 and Fig.11 When the cold water plate 1033 slides into the pretreatment chamber, the uppermost slide bar 10331 slides into the first arc segment a below the first groove 10321, and the lowermost slide bar 10331 slides into the second arc segment b below the second groove 10322, so that the two cold water plates 1033 are separated to both sides by the oblique force generated by the arc segments, thereby generating a horizontal force. Fig.12 As shown, the cold water plate 1033 on the right side will move to the right, thereby abutting against the rubber strip 113 (as shown in FIG. Fig.13 As shown, the shape of the rubber strip 113 can fit the outer edge of the cold water plate 1033), and the abutment force is exerted on the rubber strip 113, so that the left side of the process chamber is sealed more tightly.

[0060] In order to prevent the sample cart 108 from colliding with the injection chamber 101 and the process chamber 102 when moving left and right, thereby affecting normal use, in some embodiments of the present application, the vertical dual-chamber hot wire CVD system may also include the following: Fig.14 The bracket 114, two protrusions 115 and two limit assemblies 116 are shown. Among them, the bracket 114 is arranged at the bottom of the injection chamber 101 and the process chamber 102 and is connected. The bracket 114 is used to support the injection chamber 101 and the process chamber 102. The two protrusions 115 are respectively arranged at the left and right ends of the outer bottom wall of the sample cart 108, and are connected to the sample cart 108. The two limit assemblies 116 are respectively arranged below the injection chamber 101 and the process chamber 102, and are connected to the bracket 114. Among them, the limit assembly 116 is used to control the transmission roller 109 to stop rotating when it abuts against one of the protrusions 115.

[0061] In this way, if Fig.15 As shown, the sample chamber 101 and the process chamber 102 can be supported by the bracket 114, and the transmission roller 109 can be controlled to rotate or stop by the cooperation of the two limit components 116 and the protrusion 115. When the protrusion 115 at the bottom of the moving sample vehicle 108 abuts against the limit component 116, the mechanical signal can be converted into an electrical signal and transmitted to the electronic control system, and the electronic control system then issues a control command to control the transmission roller 109 to stop rotating, so that the sample vehicle 108 can stop rotating. The user can also control the transmission roller 109 to rotate through the electronic control system.

[0062] The above-mentioned limiting component 116 is described below by way of example. For example, in some embodiments of the present application, Fig.16 As shown, the limit assembly 116 may include a telescopic rod 1161, a first photoelectric switch 1162 and a second photoelectric switch 1163. The telescopic rod 1161 includes a connecting rod 11611, a sleeve 11612, a spring 11613 and a roller 11614. The sleeve 11612 is sleeved outside the connecting rod 11611. The spring 11613 is sleeved outside the connecting rod 11611 and is located inside the sleeve 11612. The spring 11613 abuts against the sleeve 11612 and the connecting rod 11611. The roller 11614 is disposed at one end of the connecting rod 11611 close to the sample vehicle 108. The first photoelectric switch 1162 is connected to the bracket 114, and the first photoelectric switch 1162 has a first transmitter. The second photoelectric switch 1163 is connected to the bracket 114 and is located on the side of the first photoelectric switch 1162 away from the transmission roller 109. The second photoelectric switch 1163 also has a second transmitter. Combined with Fig.16 As shown, the side of the protrusion 115 close to the first photoelectric switch 1162 has a deceleration slope and a stop plane connected to the deceleration slope. When the roller 11614 slides onto the deceleration slope, the end of the connecting rod 11611 away from the roller 11614 blocks the first emitter (such as Fig.16 When the roller 11614 slides onto the stop plane, the end of the connecting rod 11611 away from the roller 11614 blocks the second launcher (such as Fig.17 right side), and controls the transmission roller 109 to stop rotating.

[0063] So, for example, Figure 16-17 As shown, when the sample car 108 moves from left to right, when the sample car 108 is close to the right side of the process chamber, at this time, the roller 11614 connected to the connecting rod 11611 begins to climb the deceleration slope of the protrusion 115. At this time, the connecting rod 11611 is subjected to downward compression force, and the spring 11613 gives the compression rod an upward force. Since the connecting rod 11611 moves downward, at this time, it will block the first photoelectric switch 1162, thereby triggering the first photoelectric switch 1162 to send a signal, and then the electric control system sends a corresponding control instruction. When the roller 11614 continues to climb to the highest point stop plane of the protrusion 115, the connecting rod 11611 blocks the second photoelectric switch 1163, so that the second photoelectric switch 1163 sends a corresponding signal, and then the electric control system sends a corresponding control instruction, so that the transmission roller 109 stops running. When the user controls the transmission roller 109 to drive to the left through the electric control system, the roller 11614 gradually leaves the stop plane and the deceleration slope, and at this time, the spring 11613 gradually recovers its deformation. When the sample vehicle 108 moves to the pretreatment chamber on the left, the same is true, which will not be repeated here.

[0064] The first photoelectric switch 1162 and the second photoelectric switch 1163 mentioned above are illustrated below. In some embodiments of the present application, the first photoelectric switch 1162 and the second photoelectric switch 1163 are both photoelectric switches (photoelectric sensors), which are abbreviations of photoelectric proximity switches. They use the object to be detected (i.e., the end of the connecting rod 11611 away from the roller 11614 in the present application) to block or reflect the emitted light beam, and the circuit is connected by the synchronization circuit to detect the presence or absence of the object. Objects are not limited to metals, and all objects that can reflect light (or block light) can be detected. The photoelectric switch converts the input current into an optical signal on the transmitter (the first transmitter or the second transmitter in the present application) and emits it. The receiver then detects the target object based on the strength or presence of the received light.

[0065] It should be noted that in other embodiments of the present application, Fig.18 As shown, the cross-sectional view of the rubber strip 113 may be a trapezoidal structure, and the cold water plate 1033 may have a trapezoidal groove matching the shape of the rubber strip 113 on one side close to the rubber strip 113. In this way, when the cold water plate 1033 abuts against the rubber strip 113, the contact area increases (the contact surface changes from the original single-sided contact to three-sided contact). In this case, the sealing is better.

[0066] In order to more clearly illustrate the technical solution of the present application, in some embodiments of the present application, the present invention may also provide a method for using the vertical dual-chamber hot wire CVD system 100, comprising the following steps:

[0067] Open the injection chamber 101, fix the substrate in the installation chamber 1084 of the sample vehicle 108, close the injection chamber 101, evacuate the pretreatment chamber to a vacuum degree of 0.1 Pa to 0.9 Pa, and heat the pretreatment chamber to a temperature between 150° C. and 250° C.;

[0068] Open the gate valve 103, control the sample vehicle 108 to move from the pretreatment chamber to the process chamber, close the gate valve 103, energize the hot wire 1114, heat the substrate to 800°C~1200°C, and introduce the mixed gas into the air inlet pipe 112 to perform film coating;

[0069] After the coating is completed, the temperature in the process chamber is cooled to 150°C-250°C, the gate valve 103 is opened, the sample cart 108 is moved into the pretreatment chamber, the gate valve 103 is closed, and the substrate is taken out after the pretreatment chamber is cooled to room temperature.

[0070] In the description of this specification, specific features, structures, materials or characteristics may be combined in an appropriate manner in any one or more embodiments or examples.

[0071] The above is only a specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any person skilled in the art can easily think of changes or substitutions within the technical scope disclosed by the present invention, which should be included in the protection scope of the present invention. Therefore, the protection scope of the present invention should be based on the protection scope of the claims.

Claims

1. A gate valve, characterized in that: include: A shell having an opening and a shell cavity connected to the opening; Two connecting plates, one end of which extends from the opening into the shell cavity and is respectively connected to two opposite side walls in the shell cavity; Two cold water plates are arranged between the two connecting plates at intervals; wherein, two rows of slide grooves are provided on a side of the connecting plate close to the cold water plate, and each row of slide grooves includes a first groove and a second groove arranged at intervals; an end of the first groove close to the second groove is bent toward a side away from the other row of slide grooves to form a first arc segment; an end of the second groove away from the first groove is bent toward a side away from the other row of slide grooves to form a second arc segment; A plurality of slide bars, at least two of which are respectively disposed on two opposite side walls of the cold water plate, and one end of each slide bar is connected to the cold water plate, and the other end of each slide bar extends into the first groove to slide or extends into the second groove to slide; The cylinder is connected to the shell, and has a cylinder rod. The cylinder rod extends into the shell cavity and is hinged to the two cold water plates. The extension direction of the cylinder rod is consistent with the extension direction of the two rows of slide grooves.

2. A gate valve according to claim 1, characterized in that: The gate valve further comprises a plurality of needle bearings which are sleeved on the outer side of one end of the slide bar away from the cold water plate and connected to the slide bar.

3. A gate valve according to claim 1, characterized in that: The gate valve also includes: A plurality of first connecting pieces, one end of which is connected to the inner sides of the two cold water plates; A plurality of second connecting pieces, one end of which is hinged to the other end of the first connecting piece; A driving plate, one end of which is hinged to the other end of the second connecting piece; and the other end of the driving plate is connected to the cylinder rod.

4. A gate valve according to claim 1, characterized in that: The bottom wall of the shell is provided with two water inlets and two water outlets; The gate valve may further include: Two first corrugated pipes are respectively connected to the two cold water plates, and the other ends of the two first corrugated pipes are respectively connected to the two water inlets; The two second corrugated pipes are respectively connected to the two cold water plates, and the other ends of the two second corrugated pipes are respectively connected to the two water outlets.

5. A vertical dual-chamber hot wire CVD system, characterized in that: It comprises the gate valve, injection chamber and process chamber according to any one of claims 1 to 4; Wherein, the injection chamber has a pretreatment chamber, the process chamber has a process chamber, and the process chamber is connected to the pretreatment chamber; the other end of the connecting plate in the plug valve is inserted into the side of the injection chamber close to the process chamber, and is connected to the inner wall of the pretreatment chamber, the opening of the outer shell is connected to the outer wall of the injection chamber, and the pretreatment chamber is connected to the shell cavity; when the cold water plate in the plug valve is used to move into the pretreatment chamber, when a part of the sliding rod is located at the first arc segment and a part of the sliding rod is located at the second arc segment, the pretreatment chamber and the process chamber are respectively isolated into sealed chambers; the cold water plate is also used to connect the pretreatment chamber and the process chamber when it is removed into the pretreatment chamber.

6. The vertical dual-chamber hot wire CVD system according to claim 5, characterized in that: The vertical double-chamber hot wire CVD system also includes a plurality of transmission rollers, a sample car, a hot wire, an air intake pipeline and an exhaust system; A plurality of transmission rollers are arranged at the bottom of the pretreatment chamber and the process chamber; the sample vehicle is located on the transmission rollers and moves along the transmission rollers between the pretreatment chamber and the process chamber; the sample vehicle has a mounting chamber, and the mounting chamber has two mounting surfaces arranged in parallel and opposite to each other, and the mounting surfaces are used to mount a substrate; a plurality of hot wires arranged at equal intervals and located in the same plane are arranged in the process chamber, and the hot wires are used to be located in the mounting chamber when the sample vehicle moves into the process chamber, and the substrate is located on one side or both sides of the hot wires; The air inlet pipeline is arranged at the top of the process chamber, and is provided with a plurality of air outlets facing the substrate, and the air inlet pipeline is used to introduce mixed gas; the exhaust system is used for vacuuming, and is connected with the pretreatment chamber and the bottom of the process chamber.

7. The vertical dual-chamber hot wire CVD system according to claim 6, characterized in that: The vertical dual-chamber hot wire CVD system also includes a bracket, two bumps and two limit assemblies; The limiting component comprises: The telescopic rod comprises a connecting rod, a sleeve, a spring and a roller, wherein the sleeve is sleeved outside the connecting rod, the spring is sleeved outside the connecting rod and located inside the sleeve, and the spring abuts against the sleeve and the connecting rod; the roller is arranged at one end of the connecting rod close to the sample vehicle; A first photoelectric switch connected to the bracket, wherein the first photoelectric switch has a first emitter; A second photoelectric switch is connected to the bracket and is located on a side of the first photoelectric switch away from the transmission roller, wherein the second photoelectric switch has a second emitter; The side of the protrusion close to the first photoelectric switch has a deceleration slope and a stop plane connected to the deceleration slope; When the roller slides onto the deceleration slope, the end of the connecting rod away from the roller blocks the first launcher and controls the transmission roller to decelerate; when the roller slides onto the stop plane, the end of the connecting rod away from the roller blocks the second launcher and controls the transmission roller to stop rotating.

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