Infrared low-radiation materials for 1.06μm laser windows

Abstract

The invention discloses an infrared low-radiation material for a 1.06μm laser window, comprising a glass substrate, a laser anti-reflection film located on one side of the glass substrate, and a one-dimensional photonic crystal located on the other side of the glass substrate, wherein the laser anti-reflection film and the one-dimensional photonic crystal are respectively vertically multi-layered, and the outermost layers of the laser anti-reflection film and the one-dimensional photonic crystal are both provided with a fluorine-containing protective film, the laser anti-reflection film comprises a first high-refractive index material layer and a first low-refractive index material layer which are alternately arranged, and the one-dimensional photonic crystal comprises a second high-refractive index material layer and a second low-refractive index material layer which are alternately arranged; the infrared low-radiation material for a 1.06μm laser window of the invention has a 1.06μm laser transmittance of ≥99%, an 8μm-12μm infrared band emissivity of ≤0.17, and can be used for suppressing infrared characteristics of a 1.06μm laser window.

Description

Technical Field

[0001] The invention relates to the technical field of infrared functional materials, in particular to infrared low-radiation materials for 1.06 μm laser windows. Background Art

[0002] Infrared camouflage is an important means for weapons and equipment to improve their stealth and penetration capabilities. At present, infrared radiation suppression materials are widely used on the surfaces of armored vehicles, fighter jets, drones and other weapons and equipment. Laser radars, laser weapons and other equipment release heat during operation, resulting in high temperatures, large infrared radiation energy and obvious infrared characteristics. The outer shell of the laser equipment can use traditional infrared low-radiation materials to suppress its infrared characteristics, but traditional infrared low-radiation materials have high reflection and low transmittance at the 1.06μm laser wavelength and cannot be used to suppress the infrared characteristics of the 1.06μm laser window.

[0003] Commonly used infrared feature suppression materials include infrared coatings, metal films, semiconductor films, multilayer dielectric films, etc. Infrared coatings and metal films use the high reflectivity of high-conductivity metal materials in the infrared band to reduce infrared radiation rate, and have low infrared transmittance at 1.06μm laser wavelength; the transmittance of semiconductor films such as ITO and AZO at 1.06μm laser wavelength is generally ≤90%, and the energy loss of the laser beam is obvious. Therefore, infrared coatings, metal films, semiconductor films and other infrared feature suppression materials cannot be used for infrared feature suppression of 1.06μm laser windows.

[0004] The reflective spectrum of the multilayer film structure is designable, and through special structural design, the coordinated design of 1.06μm laser and 8μm-12μm infrared band can be achieved. However, the current research is mainly on laser / infrared compatible camouflage materials, which achieve infrared low emissivity through the photon bandgap of the 8μm-12μm band of the multilayer dielectric film, and reduce the laser reflectivity through the high absorption of the 1.06μm laser by the multilayer dielectric film or the underlying material. The material has a high loss for the 1.06μm laser and cannot be used for the infrared feature suppression of the 1.06μm laser window.

[0005] Based on this, the present invention proposes an infrared low-radiation material for 1.06 μm laser window that can solve the above-mentioned problems. Summary of the invention

[0006] The object of the present invention is to provide an infrared low-radiation material for a 1.06 μm laser window to solve the problems raised in the above-mentioned background technology.

[0007] To achieve the above object, the present invention provides the following technical solution: Infrared low-radiation material for 1.06μm laser window, comprising:

[0008] Glass substrate;

[0009] a laser anti-reflection film on one side of the glass substrate;

[0010] and, a one-dimensional photonic crystal on the other side of the glass substrate;

[0011] The laser anti-reflection film and the one-dimensional photonic crystal are respectively distributed in vertical multiple layers, and the outermost layers of the laser anti-reflection film and the one-dimensional photonic crystal are both provided with a fluorine-containing protective film.

[0012] As a preferred technical solution, the glass substrate is one of quartz glass, aluminum silicate glass, and sapphire glass, and the thickness of the glass substrate is 0.5 mm-3.0 mm.

[0013] As a preferred technical solution, the fluorine-containing protective film has a thickness of 10nm-100nm.

[0014] As a preferred technical solution, the laser anti-reflection film comprises a first high refractive index material layer and a first low refractive index material layer which are alternately arranged;

[0015] The first high refractive index material layer is one of titanium dioxide film, hafnium dioxide film, and cerium dioxide film; the first low refractive index material layer is one of silicon dioxide film, aluminum oxide film, magnesium difluoride film, yttrium trifluoride film, and ytterbium trifluoride film; the thickness of the first high refractive index material layer is 198nm-260nm, and the thickness of the first low refractive index material layer is 416nm-633nm.

[0016] As a preferred technical solution, the total number of layers of the laser anti-reflection film is 2-4 layers.

[0017] As a preferred technical solution, the one-dimensional photonic crystal includes alternating second high refractive index material layers and second low refractive index material layers, the second high refractive index material layers are silicon films, and the second low refractive index material layers are one of yttrium trifluoride films and ytterbium trifluoride films.

[0018] As a preferred technical solution, the total number of layers of the one-dimensional photonic crystal is 6.

[0019] As a preferred technical solution, when the second low refractive index material layer is yttrium trifluoride film, the optical thickness ratio of the second high refractive index material layer to the second low refractive index material layer is 0.785, and the sum of the optical thicknesses of one second high refractive index material layer and one second low refractive index material layer is 5 μm.

[0020] As a preferred technical solution, when the second low refractive index material layer is ytterbium trifluoride film, the optical thickness ratio of the second high refractive index material layer to the second low refractive index material layer is 0.852, and the sum of the optical thicknesses of one second high refractive index material layer and one second low refractive index material layer is 4.45 μm.

[0021] The present invention also provides a method for producing infrared low-radiation materials for 1.06 μm laser windows, which is used in any of the above technical solutions and specifically comprises the following steps:

[0022] S1. Using a vacuum evaporation process, a laser anti-reflection film is deposited on one surface of the glass substrate, and a fluorine-containing protective film is deposited on the surface of the laser anti-reflection film;

[0023] S2. Using a vacuum evaporation process, a one-dimensional photonic crystal is deposited on the other surface of the glass substrate, and a fluorine-containing protective film is deposited on the surface of the one-dimensional photonic crystal.

[0024] Compared with the prior art, the beneficial effects of the present invention are: the infrared low-radiation material for 1.06μm laser window of the present invention has a 1.06μm laser transmittance ≥99%, an 8μm-12μm infrared band radiation rate ≤0.17, and can be used for infrared characteristic suppression of 1.06μm laser window. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0026] Figure 2 This is a schematic diagram of the first distribution of the laser anti-reflection film and the one-dimensional photonic crystal on the glass substrate of the present invention;

[0027] Figure 3 It is a schematic diagram of the second distribution of the laser anti-reflection film and the one-dimensional photonic crystal on the glass substrate of the present invention;

[0028] In the figure: 10, glass substrate; 20, laser anti-reflection film; 21, first high refractive index material layer; 22, first low refractive index material layer; 30, one-dimensional photonic crystal; 31, second high refractive index material layer; 32, second low refractive index material layer; 40, fluorine-containing protective film. DETAILED DESCRIPTION

[0029] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0030] See also Figure 1-3The technical problem to be solved by the present invention is that, in response to the infrared camouflage requirements of 1.06μm laser windows, traditional infrared low-radiation materials have high reflection and low transmittance at 1.06μm laser wavelengths, traditional infrared coatings, metal films and other infrared low-radiation materials have high reflection and low transmittance at 1.06μm laser wavelengths, semiconductor films have high loss for 1.06μm lasers, and laser / infrared compatible multilayer dielectric films have high absorption rate and low transmittance for 1.06μm lasers. Therefore, the above materials cannot be used for infrared feature suppression of 1.06μm laser windows. The present invention provides an infrared low-radiation material for 1.06μm laser windows, which has the effects of high laser transmittance and low infrared band emissivity.

[0031] Example 1

[0032] The infrared low-radiation material for 1.06μm laser window includes a glass substrate 10, a laser anti-reflection film 20 located on one side of the glass substrate 10, and a one-dimensional photonic crystal 30 located on the other side of the glass substrate 10, wherein the laser anti-reflection film 20 and the one-dimensional photonic crystal 30 are respectively vertically multi-layered, and the outermost layers of the laser anti-reflection film 20 and the one-dimensional photonic crystal 30 are both provided with a fluorine-containing protective film 40, the laser anti-reflection film 20 includes a first high refractive index material layer 21 and a first low refractive index material layer 22 arranged alternately, and the one-dimensional photonic crystal 30 includes a second high refractive index material layer 31 and a second low refractive index material layer 32 arranged alternately.

[0033] The glass substrate 10 is 0.5 mm thick quartz glass. A laser anti-reflection film 20 is deposited on one surface of the quartz glass using a vacuum evaporation process. The laser anti-reflection film 20 is composed of a 260 nm titanium dioxide film and a 633 nm silicon dioxide film from close to to far away from the glass substrate 10. The total number of film layers is 2, and the total thickness of the film layers is 893 nm.

[0034] A fluorine-containing protective film 40 with a thickness of 10 nm is deposited on the surface of the laser anti-reflection film 20 by using a vacuum evaporation process.

[0035] A one-dimensional photonic crystal 30 is deposited on the other surface of the quartz glass by a vacuum evaporation process. The one-dimensional photonic crystal 30 is composed of 1884nm yttrium trifluoride film and 643nm silicon film arranged alternately from close to to far away from the glass substrate 10. The total number of film layers is 6. The optical thickness ratio of the second high refractive index material layer 31 to the second low refractive index material layer 32 is 0.785, and the sum of the optical thicknesses of one second high refractive index material layer 31 and one second low refractive index material layer 32 is 5μm.

[0036] A fluorine-containing protective film 40 with a thickness of 10 nm is deposited on one surface of the one-dimensional photonic crystal 30 by using a vacuum evaporation process.

[0037] The prepared infrared low-radiation material for 1.06 μm laser window has a transmittance of 99.6% at 1.06 μm laser wavelength and a radiation rate of 0.05 in the 8 μm-12 μm infrared band.

[0038] Example 2

[0039] The infrared low-radiation material for 1.06μm laser window includes a glass substrate 10, a laser anti-reflection film 20 located on one side of the glass substrate 10, and a one-dimensional photonic crystal 30 located on the other side of the glass substrate 10, wherein the laser anti-reflection film 20 and the one-dimensional photonic crystal 30 are respectively vertically multi-layered, and the outermost layers of the laser anti-reflection film 20 and the one-dimensional photonic crystal 30 are both provided with a fluorine-containing protective film 40, the laser anti-reflection film 20 includes a first high refractive index material layer 21 and a first low refractive index material layer 22 arranged alternately, and the one-dimensional photonic crystal 30 includes a second high refractive index material layer 31 and a second low refractive index material layer 32 arranged alternately.

[0040] The glass substrate 10 is a 3.0 mm thick aluminum silicate glass. A laser anti-reflection film 20 is deposited on one surface of the aluminum silicate glass using a vacuum evaporation process. The laser anti-reflection film 20 is composed of a 200 nm titanium dioxide film and a 416 nm aluminum oxide film from close to to far away from the glass substrate 10. The total number of film layers is 2, and the total thickness of the film layers is 616 nm.

[0041] A fluorine-containing protective film 40 with a thickness of 100 nm is deposited on the surface of the laser anti-reflection film 20 by using a vacuum evaporation process.

[0042] A one-dimensional photonic crystal 30 is deposited on the other surface of the aluminum silicate glass by using a vacuum evaporation process. The one-dimensional photonic crystal 30 is composed of 1624nm ytterbium trifluoride film and 598nm silicon film arranged alternately from close to to far away from the glass substrate 10. The total number of film layers is 6. The optical thickness ratio of the second high refractive index material layer 31 to the second low refractive index material layer 32 is 0.852, and the sum of the optical thicknesses of one second high refractive index material layer 31 and one second low refractive index material layer 32 is 4.45μm.

[0043] A fluorine-containing protective film 40 with a thickness of 100 nm is deposited on one surface of the one-dimensional photonic crystal 30 by using a vacuum evaporation process.

[0044] The prepared infrared low-radiation material for 1.06 μm laser window has a transmittance of 99.4% at 1.06 μm laser wavelength and a radiation rate of 0.07 in the 8 μm-12 μm infrared band.

[0045] Example 3

[0046] The infrared low-radiation material for 1.06μm laser window includes a glass substrate 10, a laser anti-reflection film 20 located on one side of the glass substrate 10, and a one-dimensional photonic crystal 30 located on the other side of the glass substrate 10, wherein the laser anti-reflection film 20 and the one-dimensional photonic crystal 30 are respectively vertically multi-layered, and the outermost layers of the laser anti-reflection film 20 and the one-dimensional photonic crystal 30 are both provided with a fluorine-containing protective film 40, the laser anti-reflection film 20 includes a first high refractive index material layer 21 and a first low refractive index material layer 22 arranged alternately, and the one-dimensional photonic crystal 30 includes a second high refractive index material layer 31 and a second low refractive index material layer 32 arranged alternately.

[0047] The glass substrate 10 is a 1.0 mm thick sapphire glass. A laser anti-reflection film 20 is deposited on one surface of the sapphire glass using a vacuum evaporation process. The laser anti-reflection film 20 is composed of 235 nm hafnium dioxide films and 471 nm silicon dioxide films arranged alternately from close to to far away from the glass substrate 10. The total number of film layers is 4, and the total thickness of the film layers is 1412 nm.

[0048] A fluorine-containing protective film 40 with a thickness of 50 nm is deposited on the surface of the laser anti-reflection film 20 by using a vacuum evaporation process.

[0049] A one-dimensional photonic crystal 30 is deposited on the other surface of the sapphire glass by using a vacuum evaporation process. The one-dimensional photonic crystal 30 is composed of 1884nm yttrium trifluoride film and 643nm silicon film arranged alternately from close to to far away from the glass substrate 10. The total number of film layers is 6. The optical thickness ratio of the second high refractive index material layer 31 to the second low refractive index material layer 32 is 0.785, and the sum of the optical thicknesses of one second high refractive index material layer 31 and one second low refractive index material layer 32 is 5μm.

[0050] A fluorine-containing protective film 40 with a thickness of 50 nm is deposited on one surface of the one-dimensional photonic crystal 30 by using a vacuum evaporation process.

[0051] The prepared infrared low-radiation material for 1.06 μm laser window has a transmittance of 99.7% at 1.06 μm laser wavelength and a radiation rate of 0.06 in the 8 μm-12 μm infrared band.

[0052] Example 4

[0053] The infrared low-radiation material for 1.06μm laser window includes a glass substrate 10, a laser anti-reflection film 20 located on one side of the glass substrate 10, and a one-dimensional photonic crystal 30 located on the other side of the glass substrate 10, wherein the laser anti-reflection film 20 and the one-dimensional photonic crystal 30 are respectively vertically multi-layered, and the outermost layers of the laser anti-reflection film 20 and the one-dimensional photonic crystal 30 are both provided with a fluorine-containing protective film 40, the laser anti-reflection film 20 includes a first high refractive index material layer 21 and a first low refractive index material layer 22 arranged alternately, and the one-dimensional photonic crystal 30 includes a second high refractive index material layer 31 and a second low refractive index material layer 32 arranged alternately.

[0054] The glass substrate 10 is a 1.5 mm thick quartz glass. A laser anti-reflection film 20 is deposited on one side of the quartz glass by vacuum evaporation. The laser anti-reflection film 20 is composed of a 198 nm cerium dioxide film and a 255 nm magnesium difluoride film from the direction close to the glass substrate 10 to the direction far away from the glass substrate 10. The total number of film layers is 2, and the total thickness of the film layers is 720 nm. A fluorine-containing protective film 40 with a thickness of 80 nm is deposited on the surface of the laser anti-reflection film 20 by vacuum evaporation.

[0055] A one-dimensional photonic crystal 30 is deposited on the other side of the quartz glass by using a vacuum evaporation process. The one-dimensional photonic crystal 30 is composed of 1884nm yttrium trifluoride film and 643nm silicon film arranged alternately from close to the glass substrate 10 to far away from the glass substrate 10. The total number of film layers is 6. The optical thickness ratio of the second high refractive index material layer 31 to the second low refractive index material layer 32 is 0.785. The total optical thickness of one layer of the second high refractive index material layer 31 and one layer of the second low refractive index material layer 32 is 5μm. A fluorine-containing protective film 40 with a thickness of 80nm is deposited on one side of the one-dimensional photonic crystal 30 by using a vacuum evaporation process.

[0056] The prepared infrared low-radiation material for 1.06 μm laser window has a transmittance of 99.5% at 1.06 μm laser wavelength and a radiation rate of 0.11 in the 8 μm-12 μm infrared band.

[0057] Example 5

[0058] The infrared low-radiation material for 1.06μm laser window includes a glass substrate 10, a laser anti-reflection film 20 located on one side of the glass substrate 10, and a one-dimensional photonic crystal 30 located on the other side of the glass substrate 10, wherein the laser anti-reflection film 20 and the one-dimensional photonic crystal 30 are respectively vertically multi-layered, and the outermost layers of the laser anti-reflection film 20 and the one-dimensional photonic crystal 30 are both provided with a fluorine-containing protective film 40, the laser anti-reflection film 20 includes a first high refractive index material layer 21 and a first low refractive index material layer 22 arranged alternately, and the one-dimensional photonic crystal 30 includes a second high refractive index material layer 31 and a second low refractive index material layer 32 arranged alternately.

[0059] The glass substrate 10 is a 2.0 mm thick sapphire glass. A laser anti-reflection film 20 is deposited on one side of the sapphire glass using a vacuum evaporation process. The laser anti-reflection film 20 is composed of a 201 nm titanium dioxide film and a 461 nm ytterbium trifluoride film from the direction close to the glass substrate 10 to the direction away from the glass substrate 10. The total number of film layers is 2, and the total thickness of the film layers is 662 nm. A 30 nm fluorine-containing protective film 40 is deposited on the surface of the laser anti-reflection film 20 using a vacuum evaporation process.

[0060] A one-dimensional photonic crystal 30 is deposited on the other side of the sapphire glass by using a vacuum evaporation process. The one-dimensional photonic crystal 30 is composed of 1624nm ytterbium trifluoride film and 598nm silicon film arranged alternately from close to far away from the glass substrate 10. The total number of film layers is 6. The optical thickness ratio of the second high refractive index material layer 31 to the second low refractive index material layer 32 is 0.852. The total optical thickness of one layer of the second high refractive index material layer 31 and one layer of the second low refractive index material layer 32 is 4.45μm. A 30nm fluorine-containing protective film 40 is deposited on one side of the one-dimensional photonic crystal 30 by using a vacuum evaporation process.

[0061] The prepared infrared low-radiation material for 1.06 μm laser window has a transmittance of 99.1% at 1.06 μm laser wavelength and a radiation rate of 0.15 in the 8 μm-12 μm infrared band.

[0062] Example 6

[0063] The infrared low-radiation material for 1.06μm laser window includes a glass substrate 10, a laser anti-reflection film 20 located on one side of the glass substrate 10, and a one-dimensional photonic crystal 30 located on the other side of the glass substrate 10, wherein the laser anti-reflection film 20 and the one-dimensional photonic crystal 30 are respectively vertically multi-layered, and the outermost layers of the laser anti-reflection film 20 and the one-dimensional photonic crystal 30 are both provided with a fluorine-containing protective film 40, the laser anti-reflection film 20 includes a first high refractive index material layer 21 and a first low refractive index material layer 22 arranged alternately, and the one-dimensional photonic crystal 30 includes a second high refractive index material layer 31 and a second low refractive index material layer 32 arranged alternately.

[0064] The glass substrate 10 is 2.5 mm thick aluminum silicate glass. A laser anti-reflection film 20 is deposited on one surface of the aluminum silicate glass using a vacuum evaporation process. The laser anti-reflection film 20 is composed of 469 nm yttrium trifluoride film and 238 nm hafnium dioxide film arranged alternately from close to to far away from the glass substrate 10. The total number of film layers is 3 and the total thickness of the film layers is 1176 nm.

[0065] A fluorine-containing protective film 40 with a thickness of 50 nm is deposited on the surface of the laser anti-reflection film 20 by using a vacuum evaporation process.

[0066] A one-dimensional photonic crystal 30 is deposited on the other surface of the aluminum silicate glass by using a vacuum evaporation process. The one-dimensional photonic crystal 30 is composed of 1624nm ytterbium trifluoride film and 598nm silicon film arranged alternately from close to to far away from the glass substrate 10. The total number of film layers is 6. The optical thickness ratio of the second high refractive index material layer 31 to the second low refractive index material layer 32 is 0.852, and the sum of the optical thicknesses of one second high refractive index material layer 31 and one second low refractive index material layer 32 is 4.45μm.

[0067] A fluorine-containing protective film 40 with a thickness of 50 nm is deposited on one surface of the one-dimensional photonic crystal 30 by using a vacuum evaporation process.

[0068] The prepared infrared low-radiation material for 1.06 μm laser window has a transmittance of 99.2% at 1.06 μm laser wavelength and a radiation rate of 0.17 in the 8 μm-12 μm infrared band.

[0069] The main component of the fluorine-containing protective film 40 in the above-mentioned embodiments 1-6 is a mixture of perfluoropolyethers, which can be purchased, has high stability and inertness, and is suitable for environments such as high temperature, high pressure and humidity.

[0070] In summary, the present invention provides an infrared low-radiation material for a 1.06μm laser window, which has a 1.06μm laser transmittance ≥99% and an 8μm-12μm infrared band emissivity ≤0.17, and can be used for suppressing the infrared characteristics of a 1.06μm laser window. At the same time, the infrared low-radiation material also has good hydrophobic and oleophobic properties, good weather resistance and the like.

[0071] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. 1.06μm infrared low-radiation material for laser window, characterized in that: include: Glass substrate; a laser anti-reflection film on one side of the glass substrate; and, a one-dimensional photonic crystal on the other side of the glass substrate; Wherein, the laser anti-reflection film and the one-dimensional photonic crystal are respectively distributed in vertical multilayers, and the outermost layers of the laser anti-reflection film and the one-dimensional photonic crystal are both provided with a fluorine-containing protective film; The one-dimensional photonic crystal comprises a second high refractive index material layer and a second low refractive index material layer arranged alternately, wherein the second high refractive index material layer is a silicon film, and the second low refractive index material layer is one of a yttrium trifluoride film and a ytterbium trifluoride film; The total number of layers of the one-dimensional photonic crystal is 6; When the second low refractive index material layer is a yttrium trifluoride film, the optical thickness ratio of the second high refractive index material layer to the second low refractive index material layer is 0.785, and the sum of the optical thicknesses of one second high refractive index material layer and one second low refractive index material layer is 5 μm; When the second low refractive index material layer is ytterbium trifluoride film, the optical thickness ratio of the second high refractive index material layer to the second low refractive index material layer is 0.852, and the sum of the optical thicknesses of one second high refractive index material layer and one second low refractive index material layer is 4.45 μm.

2. The infrared low-radiation material for 1.06 μm laser window according to claim 1, characterized in that: The glass substrate is one of quartz glass, aluminum silicate glass and sapphire glass, and the thickness of the glass substrate is 0.5 mm-3.0 mm.

3. The infrared low-radiation material for 1.06 μm laser window according to claim 1, characterized in that: The thickness of the fluorine-containing protective film is 10nm-100nm.

4. The infrared low-radiation material for 1.06 μm laser window according to claim 1, characterized in that: The laser anti-reflection film comprises a first high refractive index material layer and a first low refractive index material layer which are alternately arranged; The first high refractive index material layer is one of titanium dioxide film, hafnium dioxide film, and cerium dioxide film; the first low refractive index material layer is one of silicon dioxide film, aluminum oxide film, magnesium difluoride film, yttrium trifluoride film, and ytterbium trifluoride film; the thickness of the first high refractive index material layer is 198nm-260nm, and the thickness of the first low refractive index material layer is 416nm-633nm.

5. The infrared low-radiation material for 1.06 μm laser window according to claim 4, characterized in that: The total number of layers of the laser anti-reflection film is 2-4 layers.

6. A method for producing infrared low-radiation materials for 1.06 μm laser windows, used for the infrared low-radiation materials described in any one of claims 1 to 5, characterized in that: The specific steps include: S1. Using a vacuum evaporation process, a laser anti-reflection film is deposited on one surface of the glass substrate, and a fluorine-containing protective film is deposited on the surface of the laser anti-reflection film; S2. Using a vacuum evaporation process, a one-dimensional photonic crystal is deposited on the other surface of the glass substrate, and a fluorine-containing protective film is deposited on the surface of the one-dimensional photonic crystal.

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