Efem and gas replacement method for efem

Abstract

The present application provides an EFEM and a gas replacement method for the EFEM. In an EFEM of a type in which a non-reactive gas is circulated within a housing, an increase in cost is suppressed, and emission of particles into a transfer chamber is suppressed. The EFEM has a transfer chamber for flowing nitrogen, which has been purified by an FFU for removing particles, in a predetermined direction, and a return passage for returning the nitrogen from a downstream side of the transfer chamber to the FFU. The EFEM is provided with a transfer robot which is arranged in the transfer chamber and performs a predetermined action while holding a wafer. The transfer robot has a housing member which is formed with an opening, an arm mechanism which is arranged outside the housing member and is used for holding the wafer, a support which supports the arm mechanism and penetrates the opening, and a drive mechanism which is housed in the housing member and is used for driving the support, and the transfer robot is provided with a connection passage which connects the housing member with the return passage.

Description

[0001] This application is a divisional application of the application filed on March 5, 2019, with application number 201910164786.3 and entitled "EFEM and Gas Replacement Method of EFEM". Technical Field

[0002] This invention relates to an EFEM (Equipment Front End Module) that enables the circulation of inactive gases. Background Technology

[0003] Patent Document 1 discloses an EFEM that facilitates wafer transfer between a processing apparatus that performs predetermined processing on a semiconductor substrate (wafer) and a FOUP (Front-Opening Unified Pod) containing the wafers. The EFEM includes a housing, loading ports, and a transport device. The housing forms a transport chamber for transporting wafers. Multiple loading ports are arranged on the outside of the housing for each FOUP to hold. The transport device travels on a track extending within the transport chamber to transport the wafers.

[0004] Previously, oxygen and moisture in the delivery chamber had little impact on semiconductor circuits manufactured on wafers. However, in recent years, with the further miniaturization of semiconductor circuits, these effects have become more pronounced. Therefore, Patent Document 1 describes an EFEM configured to fill the delivery chamber with nitrogen, an inert gas. Specifically, the EFEM includes a circulation path, a gas supply component, and a gas discharge component. The circulation path supplies nitrogen to circulate within the housing and contains the delivery chamber. The gas supply component supplies nitrogen to the circulation path, and the gas discharge component discharges nitrogen from the circulation path. Nitrogen is supplied and discharged appropriately based on changes in oxygen concentration and other factors within the circulation path. Thus, compared to a structure that constantly supplies and discharges nitrogen, it is possible to suppress increases in the nitrogen supply and maintain a nitrogen atmosphere within the delivery chamber.

[0005] Furthermore, to suppress the increase in nitrogen supply and maintain a suitable atmosphere within the transport chamber, it is necessary to install sensor devices for monitoring oxygen concentration, humidity, etc. However, simply placing the sensor devices within the transport chamber may interfere with the moving transport device. Therefore, the inventors of this application have investigated the application of a transport device (transport robot) with a fixed position, as described in Patent Document 2, to replace the transport device that moves on a track. In detail, the transport robot includes a main body, a support column, a drive mechanism, and a multi-joint arm. The main body is hollow and fixed within the transport chamber. The support column is configured to protrude upwards from the main body. The drive mechanism drives the support column vertically. The multi-joint arm is mounted on the support column and driven horizontally to hold and transport wafers. This type of transport robot, by driving the multi-joint arm horizontally, can approach FOUPs placed in multiple loading ports. In other words, there is no track within the transport chamber, and the main body does not move, thus ensuring sufficient space for installing sensor devices, etc., within the transport chamber.

[0006] Existing technical documents

[0007] Patent documents

[0008] Patent Document 1: Japanese Patent Application Publication No. 2015-146349

[0009] Patent Document 2: Japanese Patent Application Publication No. 2012-169691 Summary of the Invention

[0010] The problem the invention aims to solve

[0011] In the transport robot described in Patent Document 2, wafers are transported vertically by driving the support column of the multi-joint arm up and down. When such a transport robot is applied to the EFEM described in Patent Document 1, the following problem arises: When the robot is configured to discharge gas (inactive gas) from the body to the external space outside the EFEM housing in order to remove particles that may be generated within the body during the operation of the drive mechanism, nitrogen supplied to the transport chamber is drawn into the body through the gap between the body and the support column, and then discharged to the external space. Therefore, a need to replenish nitrogen arises, potentially increasing nitrogen supply costs. However, when the robot is configured not to discharge nitrogen from the body to the outside, the next time the drive is performed in a manner that retracts the support column downwards (reducing the internal volume of the body), the gas (inactive gas) within the body is pushed to the periphery as the support column moves. Therefore, gas containing particles (inactive gas) may be released into the transport chamber through the gap.

[0012] The object of the present invention is to suppress the increase in cost and suppress the release of particles into the delivery chamber in an EFEM of the type that circulates inactive gas within the housing.

[0013] Solution for solving the problem

[0014] The first invention's EFEM has a delivery chamber and a return path, configured for circulating inactive gas. The delivery chamber allows the inactive gas, purified by a fan-type filter unit for particle removal, to flow in a predetermined direction. The return path allows the inactive gas to return from the downstream side of the delivery chamber in the predetermined direction to the fan-type filter unit. The EFEM is characterized by having an automatic device disposed within the delivery chamber, which performs a predetermined action while holding a substrate. The automatic device includes: a shell member with an opening; a holding portion disposed outside the shell member for holding the substrate; a support portion supporting the holding portion and extending through the opening; and a drive mechanism housed in the shell member for driving the support portion. The automatic device also includes a connection passage connecting the shell member to the return path.

[0015] By using a drive mechanism of an automatic device to drive the support, particles may be generated inside the shell member. When inert gas containing these particles leaks from the gap between the opening of the shell member and the support, the conveying chamber may become contaminated with particles. In this invention, since a connecting passage is provided that connects the shell member to the return passage, even if particles are generated inside the shell member, they are discharged to the return passage via the connecting passage, thus preventing particle leakage into the conveying chamber. Furthermore, a fan-type filter unit disposed downstream of the return passage removes the particles discharged into the return passage. Therefore, contamination of the conveying chamber by particles generated inside the shell member can be prevented. In addition, in such a structure, the inert gas inside the shell member is not directly discharged to the outside, so it is not necessary to replenish the amount of inert gas discharged from the shell member, which can prevent an increase in the supply of inert gas and thus prevent an increase in cost. Therefore, in an EFEM of the type that circulates the inert gas inside the shell, an increase in cost can be prevented, and particle release into the conveying chamber can be prevented.

[0016] The second invention's EFEM, based on the first invention described above, is characterized in that the EFEM further comprises a fan, which delivers inactive gas from the shell component to the return path via the connection path.

[0017] In this invention, the inactive gas inside the shell component can be reliably delivered to the return passage using the airflow generated by the fan. Therefore, leakage of the inactive gas inside the shell component from the gap between the opening and the support can be suppressed, thereby more reliably suppressing the release of particles into the delivery chamber.

[0018] The third invention, based on the second invention described above, is characterized in that the EFEM further includes: a fan drive device for rotating the fan; and a control unit for controlling the fan drive device, wherein when the drive mechanism is in operation, the control unit causes the fan speed to be faster than when the drive mechanism is not in operation.

[0019] Within the shell component, particles may easily be generated when the drive mechanism operates and drives the support portion. In this invention, by increasing the fan speed when the drive mechanism is operating, the airflow rate is increased, enabling reliable delivery of inactive gas within the shell component to the return path. Furthermore, by slowing down the fan speed when the drive mechanism is not operating, the power consumption for driving the fan can be reduced.

[0020] The EFEM of the fourth invention is based on any one of the inventions of the first to third inventions described above, characterized in that, as the automatic device, it is provided with a transport robot for transporting the substrate, the shell member is fixed in the transport chamber, as the holding part, it is provided with an arm mechanism for holding the substrate and transporting the substrate in a horizontal direction, and as the support part, it is provided with a support column for supporting the arm mechanism, and the support column is driven up and down by the drive mechanism.

[0021] In this invention, the shell component of the conveying robot is fixed within the conveying chamber. That is, the shell itself does not move within the conveying chamber, thus ensuring sufficient space for installing various devices within it. On the other hand, in structures that drive the support arm mechanism's strut vertically, particularly when driven by retracting the strut downwards, inert gas containing particles generated within the shell component may be pushed upwards with the strut's movement and released into the conveying chamber through the gap between the shell component and the strut. In this invention, with such a structure, since the shell component is connected to the return path via a connecting passage, particles can also be discharged to the return path via the connecting passage. Therefore, the inflow of inert gas containing particles into the conveying chamber can be effectively suppressed.

[0022] The fifth invention, based on the fourth invention, is characterized in that the arm mechanism comprises: a robotic hand for holding the substrate; and a switching unit for switching the state of the robotic hand between a holding state of holding the substrate and a releasing state of releasing the holding state. The EFEM includes an injector that uses the flow of inert gas supplied from an inert gas supply source for particle removal to attract particles generated when the switching unit operates, and further discharges the supplied inert gas and particles together into the return path.

[0023] When the robot hand is switched between a holding state and a releasing state using a switching unit, particles may be generated and adhere to the substrate. Therefore, if a vacuum degassing structure is configured to remove these particles, inert gas is discharged from the delivery chamber, thus requiring replenishment of the inert gas and potentially increasing costs. In this invention, particles are attracted by an injector, and the inert gas supplied from the inert gas supply source is discharged along with the particles into the return path, allowing for direct recirculation of the inert gas. Furthermore, a fan-type filter unit removes the particles. Therefore, compared to a vacuum degassing structure, the cost increase due to replenishment of inert gas can be suppressed.

[0024] The EFEM of the sixth invention is based on the fourth or fifth invention described above, characterized in that the arm mechanism has a hollow arm member with an inlet and an outlet formed therein, the inlet being used to allow the inactive gas supplied by a self-purging inactive gas supply source to flow into the internal space of the arm member, and the outlet being used to allow the inactive gas to flow out from the internal space of the arm member.

[0025] The arm component of a conveyor robot typically has a hollow structure to house the drive mechanism. Ideally, the internal space of the arm component should be completely sealed relative to the conveying chamber. However, in structures without this structure, such as when the conveying chamber is exposed to the atmosphere during maintenance, the internal space of the arm component is also exposed to the atmosphere, allowing oxygen, moisture, and other contaminants to enter. In such cases, if the replacement of inactive gases within the arm component is time-consuming upon restarting after maintenance, production efficiency may decrease. In this invention, the arm component is provided with inlet and outlet ports. Therefore, compared to cases without these ports, the time required for gas replacement within the arm component's internal space can be shortened, suppressing any decrease in production efficiency.

[0026] The gas replacement method of the EFEM of the 7th invention replaces gas in an EFEM having a delivery chamber and a return path configured for circulating inert gas. The delivery chamber allows the inert gas, purified by a fan-type filter unit for particle removal, to flow in a predetermined direction. The return path allows the inert gas to return from the downstream side of the delivery chamber in the predetermined direction to the fan-type filter unit. The gas replacement method is characterized in that the EFEM has an automatic device disposed in the delivery chamber, which performs a predetermined action while holding a substrate. The automatic device has a shell member and a drive mechanism. The shell member has an opening, and the drive mechanism is housed in the shell member. It supplies the inert gas from a source of inert gas into the interior of the shell member and sends gas from the interior of the shell member into the return path, thereby replacing the gas inside the shell member.

[0027] In this invention, for example during EFEM startup, the gas inside the shell component can be rapidly replaced by actively supplying an inactive gas from a self-supply source. Furthermore, since gas is discharged from the inside of the shell component into the return path, the release of particles from the shell component into the delivery chamber can be suppressed during EFEM startup.

[0028] The gas replacement method for EFEM of the eighth invention is based on the seventh invention described above, characterized in that, after the gas atmosphere in the delivery chamber becomes lower than a predetermined oxygen concentration, the supply of the inactive gas from the supply source is stopped, and then the gas in the delivery chamber is introduced into the interior of the shell component and sent out through the return passage.

[0029] In this invention, under normal circumstances, gas is introduced into the shell component from the delivery chamber and discharged through the return path without supplying inactive gas to the shell component from a self-supply source, thereby suppressing the increase in cost. Furthermore, backflow of gas from the shell component into the delivery chamber can be suppressed, thus preventing particles from the shell component from being released into the delivery chamber. Attached Figure Description

[0030] Figure 1 This is a schematic top view of the EFEM and its surroundings in this embodiment.

[0031] Figure 2 This is a diagram showing the electrical structure of EFEM.

[0032] Figure 3 This is the front view of the casing.

[0033] Figure 4 yes Figure 3 Sectional view IV-IV.

[0034] Figure 5 yes Figure 3 VV sectional view.

[0035] Figure 6 This is a diagram showing the structure of a transport robot.

[0036] Figure 7 This is a schematic diagram showing the supply and discharge paths of nitrogen relative to the circulation pathway.

[0037] Figure 8 This is a diagram showing the nitrogen outlet in the conveying robot.

[0038] Figure 9 This is a diagram showing a modified example of a transport robot.

[0039] Figure 10 This is a diagram showing another variation of the aligner.

[0040] Explanation of reference numerals in the attached figures

[0041] 1. EFEM; 3. Conveyor robot (automatic device); 12. Fan control unit (control unit); 43. Return path; 44. FFU (Fan-type filter unit); 54. Aligner (automatic device); 61. Shell component; 61a. Opening; 62. Support column (support part); 63. Drive mechanism; 70. Arm mechanism (holding part); 71, 72, 73. Arm component; 71a, 72a, 73a. Internal space; 71b, 72b, 73b. Inlet; 71c, 72c, 73c. ​​Outlet; 74. Robot arm; 77. Movable part (switching part); 82a. Connection path; 83. Fan; 87. Jet; 92. Shell component; 93. Holding part; 94. Support part; 95. Motor (drive mechanism); 98a. Connection path; W. Wafer (substrate). Detailed Implementation

[0042] Next, refer to Figures 1 to 8 The embodiments of the present invention will be described. Furthermore, for ease of explanation, [the following will be used]. Figure 1 The directions shown are defined as front-back and left-right. That is, the direction in which the EFEM (Equipment Front End Module) 1 and the substrate processing device 6 are arranged is defined as the front-back direction. The side of the EFEM 1 is defined as the front, and the side of the substrate processing device 6 is defined as the rear. The direction in which the multiple loading ports 4 are arranged orthogonal to the front-back direction is defined as the left-right direction. In addition, the direction orthogonal to both the front-back direction and the left-right direction is defined as the up-down direction.

[0043] (A rough outline of EFEM and its surroundings)

[0044] First, use Figure 1 and Figure 2Describe the general structure of EFEM 1 and its surroundings. Figure 1 This is a schematic top view of EFEM 1 and its surroundings in this embodiment. Figure 2 This is a diagram showing the electrical structure of EFEM 1. (Example) Figure 1 As shown, EFEM 1 includes a housing 2, a transport robot 3, a control device 5, and multiple loading ports 4. A substrate processing device 6 is arranged at the rear of EFEM 1 to perform predetermined processing on wafers W (the substrate of this invention). EFEM 1 utilizes the transport robot 3, located within the housing 2, to transfer wafers W between the substrate processing device 6 and FOUP (Front-Opening Unified Pod) 100 placed in the loading ports 4. FOUP 100 is a container capable of holding multiple wafers W arranged vertically, and a cover 101 is installed at its rear end (the end closest to the housing 2 in the front-rear direction). For example, FOUP 100 is transported using an OHT (overhead unmanned transport vehicle) not shown, which travels suspended on a track not shown above the loading ports 4. FOUP 100 is transferred between the OHT and the loading ports 4.

[0045] The housing 2 is used to connect the substrate processing apparatus 6 and multiple loading ports 4. Inside the housing 2, a transport chamber 41 for transporting wafers W is formed, which is substantially sealed relative to the external space. When the EFEM 1 is operating, the transport chamber 41 is filled with nitrogen (the inert gas of this invention). The housing 2 is configured to circulate nitrogen within the internal space containing the transport chamber 41 (see later description). Furthermore, a door 2a is installed at the rear end of the housing 2, through which the transport chamber 41 is connected to the substrate processing apparatus 6.

[0046] The transport robot 3 is configured inside the transport chamber 41 to transport the wafer W. The transport robot 3 has a base section 60 (see reference). Figure 3 ), arm mechanism 70 (refer to) Figure 3 ) and robot control unit 11 (see reference) Figure 2 The position of the aforementioned base portion 60 is fixed, and the aforementioned arm mechanism 70 is disposed above the base portion 60 for holding and transporting the wafer W. The transport robot 3 mainly performs the actions of taking the wafer W out of the FOUP 100 and delivering it to the substrate processing device 6, and receiving the wafer W processed by the substrate processing device 6 and returning the wafer W to the FOUP 100.

[0047] Loading port 4 is used to load FOUP 100 (see reference) Figure 5Multiple loading ports 4 are arranged in a left-right direction along the partition wall on the front side of the housing 2 with their respective rear ends. The loading ports 4 are configured to replace the atmosphere inside the FOUP 100 with inactive gases such as nitrogen. A door 4a is provided at the rear end of the loading port 4. The door 4a is opened and closed using a door opening and closing mechanism (not shown). The door 4a is configured to unlock the cover 101 of the FOUP 100 and to hold the cover 101. With the door 4a holding the unlocked cover 101, the cover 101 is opened by opening the door 4a using the door moving mechanism. Thus, the wafer W inside the FOUP 100 can be removed using the transport robot 3.

[0048] like Figure 2 As shown, the control device 5 is electrically connected to the robot control unit 11 of the conveying robot 3, the control unit (not shown) of the loading port 4, and the control unit (not shown) of the substrate processing device 6, and communicates with these control units. Furthermore, the control device 5 is electrically connected to an oxygen concentration meter 55, a pressure gauge 56, and a hygrometer 57 installed inside the housing 2, receiving measurement results from these devices to obtain information related to the atmosphere inside the housing 2. Additionally, the control device 5 is electrically connected to a supply valve 112 and a discharge valve 113 (described later), and adjusts the opening degree of these valves to appropriately regulate the atmosphere inside the housing 2.

[0049] like Figure 1 As shown, the substrate processing apparatus 6 includes, for example, a loading and locking chamber 6a and a processing chamber 6b. The loading and locking chamber 6a is a room connected to the transport chamber 41 via a door 2a of the housing 2, used to temporarily put the wafer W into standby mode. The processing chamber 6b is connected to the loading and locking chamber 6a via a door 6c. In the processing chamber 6b, a predetermined process is performed on the wafer W using a processing mechanism (not shown).

[0050] (The shell and its internal structure)

[0051] Next, use Figures 3-5 Describe the structure of shell 2 and its interior. Figure 3 This is the front view of shell 2. Figure 4 yes Figure 3 Sectional view IV-IV. Figure 5 yes Figure 3 VV sectional view. Additionally, in Figure 3 The diagram of the partition wall has been omitted. Additionally, in... Figure 5 The illustration of conveyor robot 3, etc., is omitted in the text.

[0052] Shell 2 is generally rectangular in shape. For example... Figures 3-5 As shown, the housing 2 has pillars 21 to 26 and partition walls 31 to 36. Partition walls 31 to 36 are installed on the pillars 21 to 26 extending in the vertical direction, and the internal space of the housing 2 is substantially sealed relative to the external space.

[0053] More specifically, such as Figure 4 As shown, at the front end of the housing 2, columns 21 to 24 are arranged and erected sequentially from left to right. Columns 22 and 23, located between columns 21 and 24, are shorter than columns 21 and 24. Columns 25 and 26 are erected on the left and right sides of the rear end of the housing 2.

[0054] like Figure 3 As shown, a partition wall 31 is disposed at the bottom of the housing 2, and a partition wall 32 is disposed at the top. Figure 4 As shown, a partition wall 33 is provided at the front end, a partition wall 34 at the rear end, a partition wall 35 at the left end, and a partition wall 36 at the right end. A mounting portion 53 (see reference 53) is provided at the right end of the housing 2, on which the alignment device 54 (described later) is mounted. Figure 3 The aligner 54 and the mounting part 53 are also housed inside the housing 2 (see reference). Figure 4 ).

[0055] like Figure 3 and Figure 5 As shown, a support plate 37 extending horizontally is disposed on the upper part (above columns 22 and 23) inside the housing 2. This divides the interior of the housing 2 into the aforementioned delivery chamber 41 formed on the lower side and the FFU installation chamber 42 formed on the upper side. An FFU (fan-type filter unit) 44, described later, is disposed in the FFU installation chamber 42. An opening 37a is formed in the center of the support plate 37 in the front-rear direction, communicating between the delivery chamber 41 and the FFU installation chamber 42. Furthermore, the partition walls 33 to 36 of the housing 2 are divided into a lower wall for the delivery chamber 41 and an upper wall for the FFU installation chamber 42 (for example, see reference...). Figure 5 (Separation walls 33a and 33b at the front end and separation walls 34a and 34b at the rear end).

[0056] Next, the internal structure of the housing 2 will be described. Specifically, the structure for nitrogen circulation within the housing 2, its surrounding structure, and the equipment disposed within the delivery chamber 41 will be described.

[0057] use Figures 3-5 Describe the structure within shell 2 used for nitrogen cycling and its surrounding structures. For example... Figure 5 As shown, a circulation passage 40 for nitrogen circulation is formed inside the housing 2. The circulation passage 40 consists of a delivery chamber 41, an FFU placement chamber 42, and a return passage 43. In summary, in the circulation passage 40, clean nitrogen is delivered downwards from the FFU placement chamber 42. After reaching the lower end of the delivery chamber 41, the nitrogen rises through the return passage 43 and returns to the FFU placement chamber 42 (see reference). Figure 5 (The arrow). The following is a detailed explanation.

[0058] An FFU 44 is disposed on a support plate 37 in an FFU chamber 42, and a chemical filter 45 is disposed on the FFU 44. The FFU 44 has a fan 44a and a filter 44b. The FFU 44 uses the fan 44a to blow nitrogen downwards from the FFU chamber 42, and the filter 44b removes particles (not shown) contained in the nitrogen. The chemical filter 45 is used to remove, for example, reactive gases brought into the circulation path 40 from the substrate processing apparatus 6. The nitrogen purified by the FFU 44 and the chemical filter 45 is sent from the FFU chamber 42 through an opening 37a formed in the support plate 37 to a delivery chamber 41. The nitrogen sent to the delivery chamber 41 forms a laminar flow and flows downwards.

[0059] The return pathway 43 is formed in the pillars 21 to 24 disposed at the front end of the housing 2 (in Figure 5 The middle section consists of column 23 and support plate 37. That is, columns 21 to 24 are hollow, forming nitrogen-supplying spaces 21a to 24a respectively (refer to...). Figure 4 In other words, spaces 21a to 24a respectively constitute return pathways 43. Return pathways 43 communicate with the FFU installation chamber 42 via an opening 37b formed at the front end of the support plate 37 (see reference). Figure 5 ).

[0060] Reference Figure 5 To further elaborate on regression pathway 43. Additionally, in Figure 5 Column 23 is shown in the diagram, but the same applies to columns 21, 22, and 24. An inlet pipe 27 is installed at the lower end of column 23 to facilitate the flow of nitrogen from the delivery chamber 41 into the return passage 43 (space 23a). An opening 27a is formed in the inlet pipe 27, allowing nitrogen reaching the lower end of the delivery chamber 41 to flow into the return passage 43. An enlargement section 27b is formed at the upper part of the inlet pipe 27, widening towards the rear as it descends. A fan 46 is positioned below the enlargement section 27b. The fan 46, driven by an electric motor (not shown), draws nitrogen reaching the lower end of the delivery chamber 41 into the return passage 43 (space 23a). Figure 5 The nitrogen is sent upwards from space 23a) and returned to the FFU setting chamber 42. The nitrogen returning to the FFU setting chamber 42 is purified by the FFU 44 and chemical filter 45, and then sent out again to the delivery chamber 41. Nitrogen can be circulated within the circulation path 40 in this manner.

[0061] In addition, such as Figure 3 As shown, a supply pipe 47 for supplying nitrogen into the circulation passage 40 is connected to the side of the FFU (Fan Filter Unit) chamber 42. The supply pipe 47 is connected to the nitrogen supply source 111. A supply valve 112, capable of changing the amount of nitrogen supplied per unit time, is provided midway through the supply pipe 47. Additionally, as... Figure 5As shown, a discharge pipe 48 for discharging gas from the circulation passage 40 is connected to the front end of the delivery chamber 41. The discharge pipe 48 is connected to the external space. A discharge valve 113 is provided midway along the discharge pipe 48, capable of changing the amount of gas discharged per unit time from the circulation passage 40. The supply valve 112 and the discharge valve 113 are electrically connected to the control device 5 (see reference). Figure 2 Therefore, nitrogen can be appropriately supplied and discharged relative to the circulation path 40. For example, if the oxygen concentration in the circulation path 40 increases, a large amount of nitrogen is temporarily supplied from the supply source 111 to the circulation path 40 via the supply pipe 47, and oxygen is discharged along with the nitrogen via the discharge pipe 48, thereby reducing the oxygen concentration.

[0062] Next, use Figure 3 and Figure 4 This describes the equipment, etc., configured within the conveyor chamber 41. For example... Figure 3 and Figure 4 As shown, the aforementioned conveying robot 3, control unit storage box 51, measuring equipment storage box 52, and alignment device 54 are arranged inside the conveying chamber 41. The structure of the conveying robot 3 will be described later. The control unit storage box 51 is, for example, installed on the base 60 of the conveying robot 3 (see reference). Figure 3 On the left side of ), and configured to not interfere with arm mechanism 70 (see reference). Figure 3 The robot control unit 11 described above is housed in the control unit storage box 51. The measuring equipment storage box 52 is located, for example, on the right side of the base 60, and is configured to not interfere with the arm mechanism 70. It can hold the aforementioned measuring equipment such as the oxygen concentration meter 55, pressure gauge 56, and hygrometer 57 (see reference). Figure 2 ) Stored in measuring equipment storage box 52.

[0063] Aligner 54 is used to detect the arm mechanism 70 of the conveyed robot 3 (see reference). Figure 3 How much has the holding position of the wafer W deviated from the target holding position? For example, in a FOUP 100 (refer to) transported using the above-described OHT (not shown), Figure 1 Inside the substrate processing unit 6, the wafer W may move slightly. Therefore, the transfer robot 3 temporarily places the unprocessed wafer W, taken from the FOUP 100, onto the alignment unit 54. The alignment unit 54 measures how much the wafer W has deviated from its target holding position while being held by the transfer robot 3, and sends the measurement result to the robot control unit 11. Based on the measurement result, the robot control unit 11 corrects the holding position of the arm mechanism 70, controls the arm mechanism 70 to hold the wafer W in the target holding position, and transports it to the loading locking chamber 6a of the substrate processing apparatus 6. Thus, the substrate processing apparatus 6 can process the wafer W normally.

[0064] (Structure of the transport robot)

[0065] Next, use Figure 6 The structure of the conveying robot 3 (the automatic device of the present invention) is described. Figure 6 (a) is a cross-sectional view showing the internal structure of the conveyor robot 3. Figure 6 (b) is a top view of the robot arm 74, which will be described later. As described above, the transport robot 3 has a base portion 60 and an arm mechanism 70 (the holding portion of the present invention).

[0066] like Figure 6 As shown in (a), the base portion 60 is provided with a shell member 61, a support column 62, and a drive mechanism 63. The support column 62 protrudes upward from inside the shell member 61 and supports an arm mechanism 70. The drive mechanism 63 drives the support column 62 up and down.

[0067] Shell member 61 is a cylindrical member extending vertically. Shell member 61 is fixed inside conveying chamber 41. An opening 61a is formed on the upper surface of shell member 61 for support column 62 to pass through. Support column 62 is a columnar member protruding upward from the inside of shell member 61 through opening 61a. A gap is formed between support column 62 and opening 61a. An arm mechanism 70 is installed at the upper end of support column 62.

[0068] As an example, the drive mechanism 63 includes a motor 64, a belt 65, a ball screw shaft 66, and a slider 67. The power of the motor 64 is transmitted to the ball screw shaft 66 via the belt 65, causing the ball screw shaft 66, which extends vertically, to rotate. When the ball screw shaft 66 rotates, the slider 67, which is threaded into the ball screw shaft 66, moves vertically, thereby causing the support column 62 to move vertically.

[0069] The electric motor 64 is a typical AC motor with a rotating shaft 64a. The electric motor 64 is controlled by the robot control unit 11 (see reference 11). Figure 2 Control. A pulley (not shown) is mounted at the top of the rotating shaft 64a, and a belt 65 is wound around it. The ball screw shaft 66 extends in the vertical direction. A pulley (not shown) is mounted at the lower end of the ball screw shaft 66, and a belt 65 is wound around it. An external thread (not shown) is formed on the ball screw shaft 66. A sliding member 67 is a component that supports the support column 62. An internal thread (not shown) is formed on the sliding member 67 that mates with the external thread of the ball screw shaft 66. As the ball screw shaft 66 rotates, the sliding member 67 can move up and down along a guide (not shown) that extends in the vertical direction. The support column 62 is driven up and down using a drive mechanism 63 having the above structure. Thus, the wafer W, which is housed in separate positions in the vertical direction within the FOUP 100, can be held by the arm mechanism 70.

[0070] like Figure 6As shown in (a), as an example, the arm mechanism 70 has three arm members 71-73 and two robotic hands 74. The arm mechanism 70 is supported from below by a support column 62, and the robotic hands 74 holding the wafer W are moved horizontally by rotating the arm members 71-73. Alternatively, only one robotic hand 74 may be provided.

[0071] Arm members 71 to 73 are hollow members extending in a predetermined direction. Specifically, arm member 71 has an internal space 71a, arm member 72 has an internal space 72a, and arm member 73 has an internal space 73a. Furthermore, the internal spaces 71a, 72a, and 73a are connected via gaps. Arm members 71, 72, and 73 are arranged sequentially from below. One end of arm member 71 is rotatably connected to the support column 62, and one end of arm member 72 is rotatably connected to the other end of arm member 71. One end of arm member 73 is rotatably connected to the other end of arm member 72. Robotic hand 74 is rotatably connected to the other end of arm member 73. Arm members 71 to 73 and robotic hand 74 are each driven to rotate horizontally by a motor (not shown).

[0072] like Figure 6 As shown in (b), the robotic arm 74 has a mounting member 75, protrusions 76a to 76d, and a movable portion 77 (the switching portion of the present invention). The wafer W is mounted along the extending direction of the robotic arm 74 (see reference). Figure 6 The wafer W is held on the extended mounting member 75 (b). The wafer W is held by protrusions 76a and 76b on the top end side of the mounting member 75, protrusions 76c and 76d on the base end side of the mounting member 75, and a pressing part 78 provided at the top end of the movable part 77. The wafer W is held in this way by the robot arm 74. The movable part 77 is moved along the extending direction of the robot arm 74 by an actuation cylinder 79 built into the robot arm 74. The rod (not shown) of the actuation cylinder 79 is configured to supply nitrogen from a different supply source 111 (see reference 111). Figure 3 The supply source 114 can extend and retract in the extension direction. When nitrogen is supplied to the actuating cylinder 79 and the pressing part 78 is located at the top (see reference...). Figure 6 Under the solid line of (b), the wafer W is pressed and held by the pressing part 78 (held state). In the state where nitrogen is not supplied to the actuating cylinder 79 and the pressing part 78 is located on the base end side (see reference). Figure 6 Under the double-dotted line in (b), the state is released (the state is released).

[0073] When the conveying robot 3 with the above structure is applied to the EFEM 1, the following problem arises. First, at the base 60, the support column 62 is driven up and down by the drive mechanism 63, thereby generating particles inside the shell member 61. The generated particles may leak into the conveying chamber 41 through the gap between the opening 61a and the support column 62. In particular, as Figure 6 As indicated by the arrow in (a), when the strut 62 is driven downward by the drive mechanism 63, nitrogen inside the shell member 61 is pushed upward, which may cause particulate nitrogen to be dispersed into the delivery chamber 41 through the gap.

[0074] Furthermore, when the movable part 77 of the robot hand 74 is driven by the actuating cylinder 79, particles may be generated in the conveying chamber 41. When the structure is configured to remove these particles for venting, nitrogen is discharged from the conveying chamber 41, thus creating a need to replenish nitrogen from the supply source 111, which may increase costs.

[0075] Furthermore, in structures where the internal spaces 71a of arm member 71 to 73a of arm member 73 are not completely sealed relative to the conveying chamber 41, for example, when the conveying chamber 41 is exposed to the atmosphere during maintenance, the internal spaces 71a to 73a are also exposed to the atmosphere, and oxygen, moisture, etc., may enter these internal spaces. In this case, if the replacement of nitrogen in the internal spaces 71a to 73a takes a long time during restarting after maintenance, production efficiency may decrease. Therefore, EFEM 1 has the following structure to solve these problems.

[0076] (Nitrogen removal path in the transport robot, etc.)

[0077] use Figure 7 and Figure 8 Explain the nitrogen discharge path in conveyor robot 3, etc. Figure 7 This is a schematic diagram showing the nitrogen supply and discharge paths relative to circulation pathway 40. Figure 8 This is a diagram showing the nitrogen discharge outlet in the conveying robot 3.

[0078] First, the structure for discharging particulate nitrogen from the shell component 61 of the self-contained robot 3 will be explained. For example... Figure 7 and Figure 8As shown, an outlet 61b for discharging nitrogen into the circulation passage 40 is formed on the side of the shell member 61. Furthermore, a discharge section 81 for discharging nitrogen from the shell member 61 into the circulation passage 40 is provided inside the housing 2. The discharge section 81 includes a fan 83 (the fan of the present invention), a motor 84 (the fan drive device of the present invention), and a connection passage 82a formed by a connecting pipe 82. The connection passage 82a connects the shell member 61 and the return passage 43. The connection passage 82a extends from the outlet 61b of the shell member 61 and connects to the upstream end of the return passage 43 in the nitrogen flow direction (more specifically, a position upstream of the fan 46). In other words, the shell member 61 and the return passage 43 are directly connected without passing through the delivery chamber 41. The fan 83 is positioned near the outlet 61b and is driven to rotate at a certain speed by the motor 84.

[0079] Using the above structure, nitrogen inside the shell member 61 is delivered to the return path 42 via the outlet 61b (see above). Figure 8 Arrows 201 and 202). This suppresses particulate contamination of the delivery chamber 41 generated within the shell member 61. Furthermore, nitrogen within the shell member 61 is not directly discharged to the outside of the shell 2, thus eliminating the need for immediate replenishment of the amount of nitrogen released from the shell member 61 and suppressing an increase in nitrogen supply. Additionally, the airflow generated by the fan 83 reliably delivers nitrogen from the shell member 61 to the return passage, thereby suppressing nitrogen leakage from the opening 61a (see reference 83). Figure 6 (a) and pillar 62 (refer to) Figure 6 Leakage between (a) and (b).

[0080] Next, the structure for removing particles generated when the movable part 77 of the robot hand 74 is driven by the actuating cylinder 79 will be described. For example... Figure 7 As shown, EFEM 1 includes a suction unit 86 that attracts and removes particles generated by the operation of the actuating cylinder 79. The suction unit 86 has an ejector 87, which utilizes a supply source 111, 114 (see reference 114) that is different from those described above. Figure 6Nitrogen supplied by supply source 115 (an inactive gas supply source for particle removal of the present invention) in (b) is used to attract and remove particles. The injector 87 has a nozzle 87a, a diffuser 87b, and a suction port 87c. The injector 87 uses the airflow of nitrogen ejected from the nozzle 87a toward the diffuser 87b to create a negative pressure in the suction port 87c. The nozzle 87a is connected to a supply passage 88a, which supplies nitrogen supplied from supply source 115. The diffuser 87b is connected to a delivery passage 88b, which delivers nitrogen to the circulation passage 40. The downstream end of the delivery passage 88b connects to the middle section of the connecting passage 82a, merging with the delivery section 81. The suction port 87c is connected to the suction passage 88c extending near the actuating cylinder 79.

[0081] In the suction section 86 with the above structure, nitrogen is supplied to the injector 87 from the supply source 115, and particles generated by the operation of the actuating cylinder 79 are attracted through the suction passage 88c. Furthermore, the supplied nitrogen and the attracted particles flow together into the connecting passage 82a through the delivery passage 88b, and are then delivered to the return passage 43. In other words, the nitrogen is not directly discharged into the external space of the housing 2, but temporarily flows into the circulation passage 40.

[0082] Next, the internal spaces 71a of the arm member 71 to 73a of the arm member 73 of the transport robot 3 will be described (see reference). Figure 8 Structures that undergo nitrogen substitution. For example... Figure 7 and Figure 8 As shown, the conveying robot 3 is provided with a replacement passage 91 that passes through the interior of arm members 71 to 73. The replacement passage 91 has a supply passage 91a and an internal passage 91b (see reference). Figure 8 The supply passage 91a extends from a supply source 116 (the inactive gas supply source for purging in this invention), which is different from the supply sources 111, 114, and 115 described above, and supplies nitrogen supplied from the supply source 116. The supply passage 91a is formed, for example, by a flexible hose, and passes through the interior of the shell member 61 and the interiors of the arm members 71 to 73. The top end of the supply passage 91a is disposed within the interior space 73a of the uppermost arm member 73. That is, nitrogen is first supplied into the interior space 73a of the arm member 73 via the supply passage 91a. The internal passage 91b is a passage containing nitrogen in the interior spaces 71a to 73a, disposed downstream of the supply passage 91a in the nitrogen flow direction.

[0083] Reference Figure 8Here is an example of an internal passage 91b. Inlet 71b to inlet 73b for nitrogen inflow and outlet 71c to outlet 73c for gas outflow are formed in arm members 71 to 73, respectively. More specifically, the top end of a supply passage 91a is installed near the inlet 73b formed at the lower part of arm member 73. The internal space 73a of arm member 73 communicates with the supply passage 91a. The internal space 72a of arm member 72 communicates with the internal space 73a via outlet 73c and inlet 72b. The internal space 71a of arm member 71 communicates with the internal space 72a via outlet 72c and inlet 71b. The internal space 71a communicates with the interior of shell member 61 via outlet 71c. Thus, nitrogen supplied from the supply source 116 to the internal space 73a via the supply passage 91a flows into the interior of the shell component 61 through the internal spaces 73a, 72a, and 71a, and is transported to the return passage 42 via the outlet 61b.

[0084] Next, the method for replacing the gas inside the transport robot 3 will be explained. First, for example, when EFEM 1 is started, the self-supply source 116 (refer to...) Figure 7 The supply source of the present invention supplies nitrogen to the internal space 73a of the arm member 73 via the supply passage 91a, and supplies nitrogen to the interior of the shell member 61 via the internal spaces 72a and 71a (see reference). Figure 8 The gas inside the shell member 61 is further discharged through the outlet 61b into the return passage 43. This rapidly replaces the gas inside the shell member 61 with nitrogen. Subsequently, once the oxygen concentration in the delivery chamber 41 falls below a predetermined value (e.g., below 100 ppm), the supply of nitrogen from the supply source 116 is stopped. Normally, gas is introduced into the shell member 61 from the delivery chamber 41 through the opening 61a, etc., by rotating the fan 83. Then, the gas inside the shell member 61 is discharged into the return passage 43. This suppresses the release of particles into the delivery chamber 41.

[0085] As described above, a connection passage 82a is provided to connect the shell member 61 of the conveying robot 3 to the return passage 43. Therefore, even if particles are generated in the internal space of the shell member 61, the particles are discharged to the return passage 43 via the connection passage 82a, thus preventing particles from leaking into the conveying chamber 41. Furthermore, the particles discharged into the return passage 43 are removed by an FFU 44 disposed on the downstream side of the return passage 43. Thus, it is possible to prevent the conveying chamber 41 from being contaminated by particles generated in the internal space of the shell member 61. In addition, in such a structure, the nitrogen in the shell member 61 is not directly discharged to the outside, so it is not necessary to replenish the amount of nitrogen discharged from the shell member 61, which can suppress the increase in nitrogen supply and thus suppress the increase in cost. Therefore, in an EFEM 1 of the type that circulates nitrogen in the shell 2, it is possible to suppress the increase in cost and suppress the release of particles into the conveying chamber 41. In addition, for example, when the EFEM 1 is started, the gas in the shell member 61 can be quickly replaced by actively supplying inactive gas from the self-supply source 116. In addition, once the oxygen concentration in the delivery chamber 41 falls below a predetermined value, the supply of nitrogen from the nitrogen self-supply source 116 is stopped, thereby suppressing the increase in costs.

[0086] In addition, nitrogen in the shell member 61 can be reliably delivered to the return passage 43 by the airflow generated by the fan 83, thus suppressing the leakage of nitrogen in the shell member 61 from the gap between the opening 61a and the support 62, thereby more reliably suppressing the release of particles into the delivery chamber 41.

[0087] Furthermore, the injector 87 attracts particles generated near the actuating cylinder 79, and nitrogen supplied from the supply source 115 is discharged along with the particles into the return path 43, thus allowing the nitrogen to circulate directly. Additionally, the FFU 44 removes particles. Therefore, compared to a structure that performs vacuum venting, the increase in cost due to nitrogen replenishment can be suppressed.

[0088] Furthermore, inlet 71b to inlet 73b and outlet 71c to outlet 73c are formed in arm members 71 to 73 respectively. Therefore, compared with the case where these inlets and outlets are not formed, the time spent on gas replacement in the internal space 71a of arm member 71 to the internal space 73a of arm member 73 can be shortened, thereby suppressing the decline in production efficiency.

[0089] Next, variations obtained by modifying the above embodiments will be described. However, for components having the same structure as the above embodiments, the same reference numerals will be used as in the drawings, and descriptions will be appropriately omitted.

[0090] (1) In the above embodiment, the fan 83 is driven to rotate at a constant speed by an electric motor 84, but the present invention is not limited thereto. Within the housing member 61, particles may easily be generated when the drive mechanism 63 drives the support column 62 up and down. Therefore, as... Figure 9 As shown, the conveying robot 3a may also have a fan control unit 12 (the control unit of the present invention) that controls the motor 84. Furthermore, when the drive mechanism 63 is operating, the fan control unit 12 may increase the rotational speed of the fan 83 compared to when the drive mechanism 63 is not operating. This increases the airflow by increasing the rotational speed of the fan 83 when the drive mechanism 63 is operating, thus reliably conveying nitrogen from the shell member 61 to the return passage 43. Additionally, by slowing down the rotational speed of the fan 83 when the drive mechanism 63 is not operating, the power consumption of the motor 84 can be reduced. Alternatively, the control device 5 (see reference 5) may also be configured to... Figure 1 (etc.) or robot control unit 11 (refer to) Figure 2 (etc.) to control the speed of fan 83.

[0091] (2) In the above embodiments, the shell member 61 of the conveying robot 3 is connected to the return path 43 by the connecting path 82a (i.e., the conveying robot 3 is equivalent to the automatic device of the present invention), but the present invention is not limited thereto. For example, the present invention can also be applied to the alignment device 54 described above. In this case, the alignment device 54 is also equivalent to the automatic device of the present invention. Hereinafter, using Figure 10 Please explain in detail. Figure 10 (a) is a partial cross-sectional view showing the construction of the aligner 54. Figure 10 (b) is a top view of the aligner 54 and its surroundings.

[0092] Here's a brief explanation of the structure of the alignment device 54. For example... Figure 10 As shown in (a), the aligner 54 includes a housing member 92, a holding portion 93, a support portion 94, a motor 95 (the drive mechanism of the present invention), and a camera 96. An opening 92a is formed in the housing member 92. The holding portion 93 for holding the wafer W is disposed on the outside of the housing member 92. The support portion 94 supports the holding portion 93 from below. The motor 95 drives the support portion 94 to rotate. The camera 96 ​​captures images of the outer edge of the wafer W rotating while held by the holding portion 93. Thus, the aligner 54 measures how much the wafer W has deviated from its target holding position by the transport robot 3 and sends the measurement result to the robot control unit 11.

[0093] By using an electric motor 95 to rotate the support 94, particles may be generated within the shell member 92. Thus, as... Figure 10 As shown in (a), a nitrogen vent 97 is formed in the shell member 92. The vent 97 is connected to a connection passage 98a formed by a connecting pipe 98. Figure 10 As shown in (b), the connection passage 98a connects the housing member 92 and the return passage 43. Additionally, a fan 99 may be configured in the connection passage 98a.

[0094] (3) In the above embodiments, the spaces 21a to 24a formed inside the columns 21 to 24 are the return pathways 43, but the present invention is not limited to this. That is, the return pathways 43 can also be formed by other components.

[0095] (4) In the above embodiments, nitrogen is used as an inactive gas, but the present invention is not limited thereto. For example, argon or the like can also be used as an inactive gas.

Claims

1. An EFEM having a delivery chamber and a return path configured for circulating inert gas, the delivery chamber for the inert gas, purified by a fan-type filter unit for particle removal, to flow in a predetermined direction, the return path for the inert gas to return from the downstream side of the delivery chamber in the predetermined direction to the fan-type filter unit, characterized in that, The EFEM includes an automated device disposed within the transport chamber, which performs predetermined actions while holding the substrate. The automatic device has: Shell components, which have openings; A retaining part, disposed on the outside of the shell member, is used to retain the substrate; A support portion that supports the retaining portion and extends through the opening; as well as A drive mechanism, housed within the shell member, is used to drive the support portion. The automated device is provided with a connection path that connects the shell component to the return path. The return path is equipped with a first fan that conveys the gas within the return path to the downstream side in the predetermined direction. The connecting passage connects to the return passage at a position in the predetermined direction that is downstream of the conveying chamber and upstream of the first fan. The connection path is connected between the inlet of the return path and the first fan.

2. The EFEM according to claim 1, characterized in that, The EFEM also includes a second fan that delivers inactive gas from the shell component to the return path via the connection path.

3. The EFEM according to claim 2, characterized in that, The EFEM also includes: A fan drive device that drives the second fan to rotate; and The control unit controls the fan drive device. When the drive mechanism is in operation, the control unit makes the rotation speed of the second fan faster than when the drive mechanism is not in operation.

4. The EFEM according to any one of claims 1 to 3, characterized in that, As part of the automated device, a transport robot is provided for transporting the substrate. The shell component is fixed in the conveying chamber. As the holding part, an arm mechanism is provided to hold the substrate and transport the substrate in a horizontal direction. As the supporting part, a support column is provided to support the arm mechanism. The drive mechanism is used to drive the support column up and down.

5. The EFEM according to claim 4, characterized in that, The arm mechanism has a hollow arm component. The arm member has an inlet and an outlet. The inlet is used to allow the inert gas supplied by the self-purging inert gas supply source to flow into the internal space of the arm member, and the outlet is used to allow the gas to flow out of the internal space of the arm member.

6. A gas replacement method for an EFEM, wherein a gas is replaced in the EFEM having a delivery chamber and a return path configured for circulating inert gas, the delivery chamber supplying the inert gas, purified by a fan-type filter unit for particle removal, to flow in a predetermined direction, and the return path allowing the inert gas to return from the downstream side of the delivery chamber in the predetermined direction to the fan-type filter unit, the gas replacement method being characterized in that... The EFEM includes an automated device disposed within the transport chamber, which performs predetermined actions while holding the substrate. The automatic device has a housing component and a drive mechanism, the housing component having an opening, and the drive mechanism being housed within the housing component. The automated device is provided with a connection path that connects the shell component to the return path. The return path is equipped with a fan that transports the gas within the return path to the downstream side in the predetermined direction. The connection path connects to the return path at a position in the predetermined direction that is downstream of the conveying chamber and upstream of the fan. The inactive gas is supplied from the inactive gas supply source to the interior of the shell member, and the fan draws gas from the connection passage to the return passage, and sends gas from the interior of the shell member to the return passage, thereby displacing the gas inside the shell member. The connection pathway is thinner than the regression pathway.

7. A gas replacement method for an EFEM, wherein a gas is replaced in the EFEM having a delivery chamber and a return path configured for circulating inert gas, the delivery chamber supplying the inert gas, purified by a fan-type filter unit for particle removal, to flow in a predetermined direction, and the return path allowing the inert gas to return from the downstream side of the delivery chamber in the predetermined direction to the fan-type filter unit, the gas replacement method being characterized in that... The EFEM includes an automated device disposed within the transport chamber, which performs predetermined actions while holding the substrate. The automatic device has a housing component and a drive mechanism, the housing component having an opening, and the drive mechanism being housed within the housing component. The inactive gas is supplied from the inactive gas supply source to the interior of the shell component, and gas is discharged from the interior of the shell component to the return passage, thereby displacing the gas inside the shell component. Once the gas atmosphere in the delivery chamber falls below a predetermined oxygen concentration, the supply of the inactive gas from the supply source is stopped, and the gas in the delivery chamber is introduced into the interior of the shell component and discharged through the return passage. The EFEM is respectively provided with a gas supply source for supplying gas to the automatic device and a gas supply source for supplying gas to the delivery chamber.

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