High melting point isotope nuclear target mounting base and mounting method thereof

Abstract

The application relates to a high-melting-point isotope nuclear target mounting base and a mounting method thereof, the mounting base comprising an insulating base, a high-voltage electrode disc and a nuclear target seat, the insulating base is in a cylindrical shape, an outer track groove is formed in the top of the sidewall of the insulating base, and a through hole is formed in the sidewall of the insulating base; the high-voltage electrode disc is in a cylindrical shape and is sleeved in the insulating base; an inner track groove is formed in the top of the sidewall of the high-voltage electrode disc, a high-voltage connector hole is formed in the sidewall of the high-voltage electrode disc, and a high-voltage connector is inserted into the high-voltage connector hole through the through hole; the nuclear target seat is used for mounting a nuclear target and a graphite pot, and the nuclear target seat is slid into the high-voltage electrode disc through the outer track groove and the inner track groove; the nuclear target seat can be put into or taken out of the high-voltage electrode disc along the outer track groove and the inner track groove, so that the isotope material and the nuclear target can be conveniently mounted, the mounting workload of the isotope material and the nuclear target is reduced, the operation is simplified, and the preparation period of each batch of high-melting-point isotope nuclear targets is reduced.

Description

A high-melting-point isotope nuclear target mounting base and its mounting method Technical Field

[0001] This invention relates to the field of heavy ion sputtering preparation of nuclear targets, specifically to a high-melting-point isotope nuclear target mounting base and its mounting method. Background Technology

[0002] The basic principle of preparing isotope targets by heavy ion sputtering is to use Ar+ generated by an ion source to be introduced into a high vacuum chamber through an extraction electrode. The energy of Ar+ is accelerated to 10 keV by an accelerating high voltage. Then, by adjusting the focusing voltage of the focusing lens and the discharge state of the ion source, a strong ion beam with a beam spot of about φ2 mm is obtained on the surface of the sputtered material. When the high-energy ion beam bombards the surface of the target material, it exchanges energy with the atoms and molecules on the surface of the target material. When the energy obtained by the atoms or molecules on the surface of the target material is greater than the binding energy of the material surface, the atoms or molecules are sputtered out and deposited on the surrounding substrate to form a target film.

[0003] Due to the high cost of isotope target materials and the scarcity of materials available from users, the preparation of isotope targets presents significant requirements and challenges. Under current technological conditions, isotope target preparation methods are categorized into high-melting-point and low-melting-point materials based on their melting and boiling points. Low-melting-point materials are prepared using spin vapor deposition, a relatively mature technology that produces high-quality isotope targets. For high-melting-point isotope targets, current technology dictates the use of heavy ion sputtering. This is because heavy ion sputtering offers the unique advantages of preparing high-melting-point materials with minimal raw material requirements, minimizing raw material costs while meeting experimental needs.

[0004] During sputtering, the isotopic material is loaded into a graphite pot with an inner diameter of φ4mm and an outer diameter of φ15mm. Four target plates are mounted on a base around the graphite pot, and an accelerator tube and ion source are fixed directly above the target plates and the graphite pot. Each time the isotopic raw material is loaded, the ion source and accelerator tube need to be removed, and then reinstalled sequentially from bottom to top.

[0005] In summary, the existing technology has the following problems: 1. When installing isotope materials and target plates, the ion source and accelerating tube must be removed each time, resulting in a large workload and a complicated process; 2. The graphite pot cannot be moved two-dimensionally in the horizontal and vertical directions, making it difficult to operate when the ion source beam spot deviates from the center; 3. The graphite pot and target plate base are installed separately, which cannot guarantee that the isotope raw material is in the exact center of the four target plates, increasing the non-uniformity of the thickness of the four target plates; 4. The polyethylene insulating base is fixed by two fixing rods, resulting in poor overall stability of the ion source and accelerating tube, which also affects the position of the beam spot. Summary of the Invention

[0006] To address at least one of the problems in the prior art, the present invention aims to provide a high-melting-point isotope nuclear target mounting base and its mounting method, which facilitates the installation of isotope materials and nuclear targets, reduces the workload of installing isotope materials and nuclear targets, simplifies operations, and reduces the preparation cycle of each batch of high-melting-point isotope nuclear targets.

[0007] To achieve the above objectives, the present invention adopts the following technical solution:

[0008] A high-melting-point isotope nuclear target mounting base includes:

[0009] An insulating base is cylindrical in shape, with an outer track groove on the top of its side wall and a through hole on the side wall of the insulating base.

[0010] The high-voltage electrode disk is cylindrical and is fitted into the insulating base. The top of the side wall of the high-voltage electrode disk has an inner track groove, and the side wall of the high-voltage electrode disk has a high-voltage connector hole. The high-voltage connector passes through the through hole and is inserted into the high-voltage connector hole.

[0011] A nuclear target holder is used to install a nuclear target and a graphite pot. The nuclear target holder slides into and is installed in the high-voltage electrode disk through the outer track groove and the inner track groove.

[0012] Preferably, the insulating base has three screw holes on its side wall, and the three screw holes are evenly distributed along the same circumference; the screw holes are internally threaded with adjusting screws, and the three adjusting screws are used to adjust the position of the high-voltage electrode disk in the insulating base.

[0013] Preferably, the bottom edge of the insulating base is provided with annular scale lines.

[0014] Preferably, the nuclear target and the graphite pot are mounted on the nuclear target holder; the nuclear target holder is provided with a shield, which covers the outside of the nuclear target and the graphite pot.

[0015] Preferably, the shielding cover has an observation window.

[0016] Preferably, the insulating base has a fixing hole, and a fixing bolt is provided in the fixing hole.

[0017] A method for mounting a high-melting-point isotope nuclear target, based on the high-melting-point isotope nuclear target mounting base described in any one of the above claims, includes:

[0018] Install the insulating base onto the fixed rod of the vacuum chamber;

[0019] Install the high-voltage electrode plate inside the insulating base, align the outer track groove with the inner track groove, and insert the high-voltage connector through the through hole into the high-voltage connector hole.

[0020] The ion source and the accelerating tube are mounted together on the fixed rod, the high-voltage wiring is connected to the high-voltage connector, and the ion source is connected to the argon gas pipeline interface.

[0021] The isotopic raw material is placed in a graphite pot, and the nuclear target and the graphite pot are installed on the nuclear target holder.

[0022] The nuclear target is placed in the outer and inner orbital slots, and then pushed into the high-voltage electrode disk along the outer and inner orbital slots.

[0023] Preferably, the method further includes the steps of tuning the ion source and adjusting the beam spot:

[0024] Seal and cover the vacuum chamber, evacuate the vacuum chamber, and when the vacuum level in the vacuum chamber reaches the set threshold, open the argon control valve to fill the vacuum chamber with argon gas;

[0025] Turn on the high voltage power supply to apply a high voltage to the ion source until the ion source starts to arc and emits a beam, and then accelerate the high voltage to the preset value;

[0026] Adjust the focusing voltage, the ion source voltage, and the argon flow rate to achieve the optimal beam output from the ion source;

[0027] Observe whether the position of the beam spot emitted from the ion source is located at the center of the graphite pot. If so, no adjustment is needed; if not, the beam spot is deviated and needs adjustment. The adjustment steps include:

[0028] Turn off the high-voltage power supply and the argon gas control valve, and open the vacuum chamber;

[0029] Remove the ion source and the accelerating tube, observe the deviation distance and direction of the beam spot position, and move the nuclear target to the set position.

[0030] Preferably, adjusting the beam spot further includes:

[0031] By observing the deviation distance and direction of the beam spot position through the scale lines, rotating the three adjustment screws pushes the high-voltage electrode disk to move, and the high-voltage electrode disk drives the graphite pot on the nuclear target to move to the position.

[0032] Preferably, in the steps of placing the isotopic raw material into the graphite pot and installing the nuclear target and graphite pot onto the nuclear target holder, the graphite pot is installed at the center of the nuclear target holder, and the nuclear target is installed on the outside of the graphite pot.

[0033] At least two nuclear targets are provided, and the at least two nuclear targets are evenly distributed and installed on the outside of the graphite pot;

[0034] A shield is installed on the nuclear target holder, and the shield is placed over the outside of the nuclear target and the graphite pot;

[0035] An observation window is provided on the shielding cover, and the nuclear target holder is rotated to adjust the observation window to the desired observation position.

[0036] The present invention has the following advantages due to the adoption of the above technical solutions:

[0037] 1. The high-melting-point isotope nuclear target mounting base provided by the present invention consists of an insulating base, a high-voltage electrode disk, and a nuclear target holder arranged sequentially from the outside to the inside. The insulating base and the high-voltage electrode disk are respectively provided with an outer track groove and an inner track groove. By aligning the outer track groove with the inner track groove, the nuclear target holder can be easily slid into and installed in the high-voltage electrode disk through the outer track groove and the inner track groove. This facilitates the installation of isotope materials and nuclear targets, reduces the workload of installing isotope materials and nuclear targets, simplifies and facilitates operation, and reduces the preparation cycle of each batch of high-melting-point isotope nuclear targets.

[0038] 2. The high melting point isotope nuclear target mounting base provided by the present invention has three adjusting screws on the side wall of the insulating base. By rotating the three adjusting screws, the adjusting high voltage electrode disk is pushed to drive the nuclear target seat to move in two dimensions, horizontally and vertically, within the insulating base. This can adjust the position of the graphite pot, which is convenient for beam adjustment of the ion source. It also reduces the amount of isotope target raw materials required and reduces the amount of isotope raw materials installed each time.

[0039] 3. The high-melting-point isotope nuclear target mounting base provided by the present invention has an annular scale line at the edge of the bottom surface of the insulating base. This allows for easy observation of the position of the high-voltage electrode disk on the scale line to determine the moving direction and distance of the high-voltage electrode base 2. This facilitates the rotation of the three adjusting screws to push the high-voltage electrode disk to move the graphite pot to the required position, further facilitating the beam adjustment of the ion source and making it easier to adjust the beam spot to the exact center of the isotope raw material, thereby improving the beam adjustment efficiency of the ion source and the uniformity of the target thickness.

[0040] 4. The high-melting-point isotope nuclear target mounting base provided by this invention allows the graphite pot and target sheet to be integrally mounted on the nuclear target base, making the operation of adding isotope raw materials into the graphite pot simpler and more convenient. By adopting this nuclear target base, the heavy ion sputtering operation process is made simpler and more convenient, greatly shortening the preparation cycle of high-melting-point isotope targets and improving the uniformity of target thickness in the same batch. For example, when four nuclear targets are set, the uniformity of the thickness of four isotope targets in the same batch can be improved.

[0041] 5. The high melting point isotope nuclear target mounting base provided by the present invention can be equipped with a shielding cover, and an observation window can be opened on the shielding cover to facilitate observation of the beam spot position when the ion source is working.

[0042] 6. The high melting point isotope nuclear target mounting base provided by the present invention has fixing holes on the insulating base, and fixing bolts are provided in the fixing holes, so that the insulating base can be connected and installed on the fixing rod of the vacuum chamber through the fixing bolts; the fixing holes and fixing bolts can be set to three and evenly distributed on the same circumference, thereby improving the overall stability of the insulating base and the ion source.

[0043] 7. The high-melting-point isotope nuclear target installation method provided by the present invention, by using the high-melting-point isotope nuclear target installation base provided by the present invention, can avoid removing the ion source and acceleration tube when installing isotope materials and target sheets, thereby reducing the amount of installation work and simplifying the operation. Attached Figure Description

[0044] Figure 1 is a schematic diagram of the structure of a high melting point isotope nuclear target mounting base provided in an embodiment of the present invention.

[0045] Figure 2 is a front view of a high melting point isotope nuclear target mounting base provided in an embodiment of the present invention.

[0046] Figure 3 is a side view of a high melting point isotope nuclear target mounting base provided in an embodiment of the present invention.

[0047] Figure 4 is a top view of a high melting point isotope nuclear target mounting base provided in an embodiment of the present invention.

[0048] Figure 5 is a schematic diagram of the structure of the insulating base of the high melting point isotope nuclear target mounting base provided in an embodiment of the present invention.

[0049] Figure 6 is a front view of the insulating base of a high melting point isotope nuclear target mounting base provided in an embodiment of the present invention.

[0050] Figure 7 is a side view of the insulating base of a high melting point isotope nuclear target mounting base provided in an embodiment of the present invention.

[0051] Figure 8 is a top view of the insulating base of a high melting point isotope nuclear target mounting base provided in an embodiment of the present invention.

[0052] Figure 9 is a schematic diagram of the high-voltage electrode disk of the high-melting-point isotope nuclear target mounting base provided in an embodiment of the present invention.

[0053] Figure 10 is a front view of the high-voltage electrode disk of a high-melting-point isotope nuclear target mounting base provided in an embodiment of the present invention.

[0054] Figure 11 is a side view of the high-voltage electrode disk of a high-melting-point isotope nuclear target mounting base provided in an embodiment of the present invention.

[0055] Figure 12 is a top view of the high-voltage electrode disk of a high-melting-point isotope nuclear target mounting base provided in an embodiment of the present invention.

[0056] Figure 13 is a schematic diagram of the structure of a high melting point isotope nuclear target mounting base provided in an embodiment of the present invention.

[0057] Figure 14 is a front view of a high melting point isotope nuclear target mounting base provided in an embodiment of the present invention.

[0058] Figure 15 is a side view of a high melting point isotope nuclear target mounting base provided in an embodiment of the present invention.

[0059] Figure 16 is a top view of a high melting point isotope nuclear target mounting base provided in an embodiment of the present invention.

[0060] Figure 17 is a schematic diagram of the connection between the mounting base and the fixing rod according to an embodiment of the present invention.

[0061] Figure 18 is a flowchart of a high-melting-point isotope nuclear target mounting method provided in an embodiment of the present invention.

[0062] Figure 19 is a flowchart of a high-melting-point isotope nuclear target mounting method provided in another embodiment of the present invention.

[0063] Figure 20 is a flowchart of a high-melting-point isotope nuclear target mounting method provided in another embodiment of the present invention.

[0064] Figure reference numerals:

[0065] 1 is an insulating base, 110 is an outer track groove, 120 is a through hole, 130 is a high-voltage connector, 140 is an adjusting screw, 150 is a scale line, 160 is a fixing hole, 2 is a high-voltage electrode plate, 210 is an inner track groove, 220 is a high-voltage connector hole, 3 is a nuclear target holder, 310 is a nuclear target, 320 is a graphite pot, 330 is a shielding cover, and 331 is an observation window. Detailed Implementation

[0066] To make the objectives, technical solutions, and advantages of this invention clearer, the technical solutions of this invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this invention. All other embodiments obtained by those skilled in the art based on the embodiments of this invention without creative effort are within the scope of protection of this invention.

[0067] In the description of this invention, it should be noted that the terms "upper", "lower", "front", "rear", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the system or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0068] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "assembly," "setup," and "connection" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0069] This invention provides a high-melting-point isotope nuclear target mounting base and its mounting method. The mounting base includes an insulating base 1, a high-voltage electrode disk 2, and a nuclear target holder 3, which are sequentially arranged from the outside to the inside. The insulating base 1 and the high-voltage electrode disk 2 are respectively provided with an outer track groove 110 and an inner track groove 210. By aligning the outer track groove 110 with the inner track groove 210, the nuclear target holder 3 can be easily slid into the high-voltage electrode disk 2 through the outer track groove 110 and the inner track groove 210. This facilitates the installation of isotope materials and nuclear targets, reduces the workload of installing isotope materials and nuclear targets, simplifies the operation, and reduces the preparation cycle of each batch of high-melting-point isotope nuclear targets.

[0070] The embodiments of the present invention will be described in detail.

[0071] Example

[0072] Referring to Figures 1 to 16, this embodiment provides a high-melting-point isotope nuclear target mounting base, including an insulating base 1, a high-voltage electrode disk 2, and a nuclear target holder 3. The insulating base 1 is cylindrical, with an outer track groove 110 on the top of its side wall and a through hole 120 on its side wall. The high-voltage electrode disk 2 is cylindrical and is fitted inside the insulating base 1. The high-voltage electrode disk 2 has an inner track groove 210 on the top of its side wall and a high-voltage connector hole 220 on its side wall. A high-voltage connector 130 passes through the through hole 120 and is inserted into the high-voltage connector hole 220. The nuclear target holder 3 is used to mount the nuclear target 310 and the graphite pot 320. The nuclear target holder 3 slides into the high-voltage electrode disk 2 through the outer track groove 110 and the inner track groove 210.

[0073] In this embodiment, a high-melting-point isotope nuclear target mounting base includes a graphite pot 320 for holding isotope materials. A target holder 3 is used to mount the nuclear target 310 and the graphite pot 320. A high-voltage electrode disk 2 is mounted in an insulating base 1, with its inner track groove 210 aligned with the outer track groove 110 on the insulating base 1. The cylindrical inner cavity of the high-voltage electrode disk 2 forms a slot for mounting the target holder 3. The target holder 3 can be inserted into or removed from the high-voltage electrode disk 2 along the outer track groove 110 and the inner track groove 210, facilitating the installation of isotope materials and the nuclear target, reducing the workload of installing isotope materials and the nuclear target, simplifying operations, and reducing the preparation cycle for each batch of high-melting-point isotope nuclear targets.

[0074] The nuclear target holder 3 is fitted into the high-voltage electrode disk 2 with a clearance fit, and the nuclear target holder 3 can rotate 360° around its vertical central axis.

[0075] The high-voltage connector 130 uses a plug-in interface for easy operation. The high-voltage connector 130 can be a product based on existing technology.

[0076] Referring to Figures 17 and 18, this embodiment also provides a method for mounting a high-melting-point isotope nuclear target, using a high-melting-point isotope nuclear target mounting base provided in this embodiment, including the following steps:

[0077] Step S1: Install the insulating base:

[0078] Install the insulating base 1 on the fixed rod of the vacuum chamber;

[0079] Step S2: Install the high-voltage electrode plate:

[0080] Install the high-voltage electrode plate 2 inside the insulating base 1, align the outer track groove 110 with the inner track groove 210, and insert the high-voltage connector 130 through the through hole 120 into the high-voltage connector hole 220.

[0081] Step S3: Install the ion source and accelerating tube:

[0082] Install the ion source and accelerator tube as a whole on the fixed rod, connect the high voltage wiring to the high voltage connector 130, and connect the ion source to the argon gas pipeline interface.

[0083] Step S4: Install the nuclear target and graphite pot:

[0084] The isotopic raw material is placed in the graphite pot 320, and the nuclear target 310 and the graphite pot 320 are installed on the nuclear target holder 3.

[0085] Step S5: Install the nuclear target holder:

[0086] Place the nuclear target holder 3 at the outer track groove 110 and the inner track groove 210, and push the nuclear target holder 3 into the high-voltage electrode disk 2 along the outer track groove 110 and the inner track groove 210.

[0087] Referring to Figure 18, in some embodiments, step 6, beam modulation ion source and beam spot adjustment, includes the following steps:

[0088] Step S61, Argon purging:

[0089] Seal the vacuum chamber and evacuate it. When the vacuum level inside the chamber reaches the set value (which can be 1.8 × 10⁻⁶), the vacuum level will be reached. 4 When Pa, open the argon control valve and fill the ion source chamber with argon gas;

[0090] Step S62, Apply high pressure:

[0091] Turn on the high voltage power supply and apply high voltage to the ion source until the ion source starts to arc and emit beam. Accelerate the high voltage to the preset value, which can be 10KV.

[0092] Step S63: Adjust the focusing voltage:

[0093] Adjust the focusing voltage, ion source voltage, and argon flow rate to achieve the optimal beam output from the ion source;

[0094] Step S64: Observe the beam spot:

[0095] Observe whether the position of the beam spot emitted from the ion source is located at the center of the graphite pot 320. If so, no adjustment is needed; if not, the beam spot is deviated and needs to be adjusted. Proceed to steps S65 to S67.

[0096] Step S65, Adjustment and Preparation:

[0097] Turn off the high-voltage power supply and argon control valve, and open the vacuum chamber;

[0098] Step S66: Adjust the beam spot:

[0099] Remove the ion source and accelerator tube, observe the deviation distance and direction of the beam spot position, and move the nuclear target 3 to the set position.

[0100] Beam spot calibration was achieved after beam spot adjustment.

[0101] Referring to Figure 19, in some embodiments, the following steps are also included:

[0102] Step S7: Disassemble nuclear target 3:

[0103] The nuclear target holder 3 is removed from the high-voltage electrode disk 2 along the outer track groove 110 and the inner track groove 210;

[0104] Step S8: Disassemble the nuclear target:

[0105] The nuclear target 310 was removed from the nuclear target 3.

[0106] The nuclear target pedestal 3 and nuclear target 310 were disassembled.

[0107] Referring to Figures 1 to 12, in some embodiments of the high-melting-point isotope target mounting base, the insulating base 1 has three screw holes on its side wall, evenly distributed along the same circumference. Adjusting screws 140 are threaded into these screw holes and are used to adjust the position of the high-voltage electrode disk 2 within the insulating base 1. Rotating the three adjusting screws 140 adjusts the length of their inner ends extending into the insulating base 1, bringing them into contact with the outer wall of the high-voltage electrode disk 2. This allows the high-voltage electrode disk 2 to move laterally and longitudinally within the insulating base 1, thereby adjusting its position and facilitating beam adjustment of the ion source.

[0108] An annular scale line 150 is provided on the edge of the bottom surface of the insulating base 1. By observing the position of the high-voltage electrode disk 2 on the scale line 150, the direction and distance of movement of the high-voltage electrode disk 2 can be determined. This facilitates the rotation of the three adjusting screws 140 to push the high-voltage electrode disk 2 to move the graphite pot 320 in two dimensions in the horizontal and vertical directions to the required position, further facilitating the beam adjustment of the ion source.

[0109] Specifically, in step S66, when adjusting the beam spot, the deviation distance and direction of the beam spot position are observed through the scale line 150. The three adjusting screws 140 are rotated to push the high-voltage electrode disk 2 to move, and the graphite pot 320 on the target holder 3 is moved to the position through the high-voltage electrode disk 2.

[0110] Referring to Figures 1 to 4 and Figures 13 to 16, in some embodiments of the above-mentioned high melting point isotope nuclear target mounting base, the nuclear target base 3 is equipped with a nuclear target 310 and a graphite pot 320; the nuclear target base 3 is provided with a shield 330, which covers the outside of the nuclear target 310 and the graphite pot 320.

[0111] An observation window 331 is provided on the shield 330 to observe the position of the beam spot when the ion source is working.

[0112] The insulating base 1 has a fixing hole 160, and a fixing bolt is installed in the fixing hole 160.

[0113] The vacuum chamber has a connecting hole on its fixing rod. A fixing bolt is installed in the fixing hole 160 and the connecting hole to connect the insulating base 1 to the fixing rod. The specific height position of the insulating base 1 is determined according to the size of the ion source.

[0114] Specifically, in step S1, when installing the insulating base, the insulating base 1 is placed on the fixing rod, and the fixing bolt is connected to the fixing hole 160 and the connecting hole, so that the insulating base 1 is installed on the fixing rod of the vacuum chamber.

[0115] In step S4, when installing the nuclear target and graphite pot, the graphite pot 320 is installed at the center of the nuclear target holder 3, and the nuclear target 310 is installed on the outside of the graphite pot 320.

[0116] At least two nuclear targets 310 are provided, and at least two nuclear targets 310 are evenly distributed and installed on the outside of the graphite pot 320.

[0117] A shield 330 is installed on the nuclear target holder 3, and the shield 330 is placed over the outside of the nuclear target 310 and the graphite pot 320.

[0118] An observation window 331 is provided on the shield 330. Rotate the nuclear target 3 to adjust the observation window 331 to the desired observation position.

[0119] The observation window 331 is located on the side wall of the shielding cover 330.

[0120] Specifically, referring to Figures 1 to 12, the above-mentioned high melting point isotope nuclear target mounting base is designed as a vertical cylinder with an opening at the top and a bottom surface at the bottom.

[0121] The insulating base 1 is made of polyethylene.

[0122] Referring to Figures 1 to 8, the outer track groove 110 is configured as a recess, with its two side walls being inclined surfaces. The two side walls of the outer track groove 110 are parallel to each other.

[0123] The through hole 120 is set as a round hole.

[0124] The adjusting screw 140 is configured as a horizontal screw, with its horizontal central axis perpendicular to and intersecting the vertical central axis of the insulating base 1. A handle is connected to the outer end of the adjusting screw 140, allowing for easy rotation of the adjusting screw 140 by hand.

[0125] The scale line 150 is a circular line. There are at least two scale lines 150, and multiple scale lines 150 are arranged sequentially and concentrically at equal intervals. The spacing between adjacent scale lines 150 is set to 1 mm.

[0126] The fixing hole 160 is a vertical circular through hole. There are three fixing holes 160, which are evenly distributed along the circumference. The fixing bolt is a vertical cylindrical bolt.

[0127] The fixing hole 160 and the connecting hole are set as internal threaded holes, and the fixing bolt is set as a bolt.

[0128] Referring to Figures 1 to 4 and Figures 9 to 12, the inner track groove 210 is configured as a recess, with its two side walls being inclined surfaces. The two side walls of the inner track groove 210 are parallel to each other. The two side walls of the inner track groove 210 are parallel to the two side walls of the outer track groove 110.

[0129] The high-pressure connector hole 220 is set as a horizontal round hole.

[0130] Referring to Figures 1 to 4 and Figures 13 to 16, the nuclear target holder 3 is configured as a horizontal disk. The nuclear target 310 is configured as a vertical rectangular target sheet, with its vertical central axis lying in the same vertical plane as the vertical central axis of the nuclear target holder 3. The nuclear target 310 is perpendicular to the nuclear target holder 3.

[0131] The graphite pot 320 is designed as a vertical cylinder with an opening at the top and a hemispherical groove at the center of the top. The graphite pot 320 is installed at the center of the nuclear target holder 3.

[0132] There are at least two, for example four, nuclear targets 310, which are evenly distributed around the graphite pot 320.

[0133] The shield 330 is cylindrical, with a top surface at the top and an opening at the bottom. The shield 330 is placed on the nuclear target holder 3 and covers the outside of the nuclear target 310 and the graphite pot 320.

[0134] An observation window 331 is provided on the side wall of the shielding cover 330. The observation window 331 is configured as a through hole. There is only one observation window 331.

[0135] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A mounting base for a high-melting-point isotope nuclear target, characterized in that, include: An insulating base (1) is cylindrical, with an outer track groove (110) on the top of its side wall, and a through hole (120) on the side wall of the insulating base (1); a high-voltage electrode disk (2) is cylindrical, and the high-voltage electrode disk (2) is fitted inside the insulating base (1); an inner track groove (210) is provided on the top of the side wall of the high-voltage electrode disk (2), and a high-voltage connector hole (220) is provided on the side wall of the high-voltage electrode disk (2), and a high-voltage connector (130) passes through the through hole (120) and is inserted into the high-voltage connector hole (220). 20) Inside; nuclear target holder (3), used to install nuclear target (310) and graphite pot (320), the nuclear target holder (3) slides into the high voltage electrode disk (2) through the outer track groove (110) and the inner track groove (210); three screw holes are opened on the side wall of the insulating base (1), the three screw holes are evenly distributed along the same circumference; the screw holes are connected to the adjusting screws (140) by internal threads, the three adjusting screws (140) are used to adjust the position of the high voltage electrode disk (2) in the insulating base (1).

2. The high-melting-point isotope nuclear target mounting base according to claim 1, characterized in that, The insulating base (1) has an annular scale line (150) at the edge of its bottom surface.

3. The high-melting-point isotope nuclear target mounting base according to claim 1, characterized in that, The nuclear target (310) and the graphite pot (320) are mounted on the nuclear target holder (3); the nuclear target holder (3) is provided with a shield (330), which covers the outside of the nuclear target (310) and the graphite pot (320).

4. The high-melting-point isotope nuclear target mounting base according to claim 3, characterized in that, An observation window (331) is provided on the shielding cover (330).

5. The high-melting-point isotope nuclear target mounting base according to any one of claims 1-4, characterized in that, The insulating base (1) has a fixing hole (160) and a fixing bolt is provided in the fixing hole (160).

6. A method for mounting a high-melting-point isotope nuclear target, characterized in that, The high-melting-point isotope nuclear target mounting base according to any one of claims 1-5 is completed, comprising: mounting an insulating base (1) on a fixed rod in a vacuum chamber; mounting a high-voltage electrode disk (2) inside the insulating base (1), aligning the outer track groove (110) with the inner track groove (210), inserting a high-voltage connector (130) through a through hole (120) into a high-voltage connector hole (220); mounting an ion source and an accelerating tube as a whole on the fixed rod, connecting a high-voltage wiring to the high-voltage connector (130), and connecting the ion source to an argon gas pipeline interface; placing the isotope raw material into a graphite pot (320), mounting the nuclear target (310) and the graphite pot (320) onto the nuclear target holder (3); placing the nuclear target holder (3) at the outer track groove (110) and the inner track groove (210), and pushing the nuclear target holder (3) along the outer track groove (110) and the inner track groove (210) into the high-voltage electrode disk (2).

7. The method for mounting a high-melting-point isotope nuclear target according to claim 6, characterized in that, It also includes the steps of adjusting the beam ion source and adjusting the beam spot: sealing and covering the vacuum chamber, evacuating the vacuum chamber, and when the vacuum level in the vacuum chamber reaches a set threshold, opening the argon control valve and filling the vacuum chamber with argon gas; Turn on the high voltage power supply to apply a high voltage to the ion source until the ion source starts to arc and emits a beam, and then accelerate the high voltage to the preset value; Adjust the focusing voltage, the ion source voltage, and the argon flow rate to achieve the optimal beam output from the ion source; observe whether the position of the beam spot of the ion source beam is located at the center of the graphite pot (320). If so, no adjustment is required. If not, the beam deviation needs to be adjusted. The adjustment steps include: turning off the high-voltage power supply and the argon control valve, opening the vacuum chamber; removing the ion source and the acceleration tube, observing the deviation distance and direction of the beam position, and moving the nuclear target holder (3) to the set position.

8. The method for mounting a high-melting-point isotope nuclear target according to claim 7, characterized in that, Adjusting the beam spot also includes: observing the deviation distance and deviation direction of the beam spot position through the scale line (150), rotating the three adjustment screws (140) to push the high-voltage electrode disk (2) to move, and driving the graphite pot (320) on the nuclear target holder (3) to move to the position through the high-voltage electrode disk (2).

9. The method for mounting a high-melting-point isotope nuclear target according to any one of claims 6-8, characterized in that, In the steps of placing the isotopic raw material into the graphite pot (320) and installing the nuclear target (310) and the graphite pot (320) onto the nuclear target holder (3), the graphite pot (320) is installed at the center of the nuclear target holder (3), and the nuclear target (310) is installed on the outside of the graphite pot (320); at least two nuclear targets (310) are provided, and at least two nuclear targets (310) are evenly distributed and installed on the outside of the graphite pot (320); a shield (330) is installed on the nuclear target holder (3), and the shield (330) covers the outside of the nuclear target (310) and the graphite pot (320); an observation window (331) is opened on the shield (330), and the nuclear target holder (3) is rotated to adjust the observation window (331) to the desired observation position.

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