A uniformly heated evaporation crucible

By using the technology of interleaving multiple tungsten heating subs and controlling the discharge plate current in the evaporation crucible, the problem of uneven heating of the evaporation crucible is solved, and the uniformity and quality of the coating are improved.

CN118374773BActive Publication Date: 2025-03-18VMAX SEMICON TECH CO LTD
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Patent Information

Application Number
CN202410538702.9
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-04-30
Publication Date
2025-03-18
Estimated Expiration
2044-04-30

AI Technical Summary

Technical Problem

The existing evaporation crucibles are heated unevenly during heating, which affects the uniformity of the coating.

Method used

A uniformly heated evaporation crucible is designed, with multiple tungsten heating sub-sets arranged interlacedly, and current control is performed through the discharge plate and the temperature controller to ensure uniform heating.

Benefits of technology

The uniform heating in the crucible is achieved, the uniformity and quality of the coating are improved, and the uniform adhesion and efficient deposition of the coating are ensured.

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Abstract

The present invention discloses a uniformly heated evaporation crucible, which relates to the field of evaporation equipment, including a lower closed furnace and a crucible body, wherein the crucible body is fixedly connected to the inner bottom wall of the lower closed furnace, the upper surface of the lower closed furnace is fixedly connected to the upper closed furnace, the inner wall of the lower closed furnace is installed with a switch door, and the surface of the lower closed furnace is fixedly connected to a temperature controller. The present invention controls the current of the discharge plate by setting a temperature controller, sprays evaporated particles on the substrate for deposition by setting a glass substrate, performs three-stage vacuuming by setting a vacuum pump, ensures that there are no air molecules in the lower closed furnace and the upper closed furnace, and provides a first power supply line to supply power to a first tungsten heater, so that the first tungsten heater generates heat, vaporizes or sublimates the low-melting-point plating material hanging on its surface, and opens the surface of the tungsten heater in the form of atoms, molecules or atomic groups.
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Description

Technical Field

[0001] The invention relates to the field of evaporation equipment, and in particular to a uniformly heated evaporation crucible. Background Art

[0002] Vacuum evaporation, or evaporation for short, refers to a process in which a coating material (or film material) is evaporated and gasified by a certain heating evaporation method under vacuum conditions, and the particles fly to the surface of the substrate and condense into a film. Evaporation is an earlier and more widely used vapor deposition technology, with the advantages of simple film formation method, high film purity and density, and unique film structure and performance.

[0003] The existing patent with the publication number "CN215481224U" is named a evaporation crucible, which includes a crucible body, a crucible cover and a plurality of crucible nozzles. The crucible cover is located above the edge of the crucible body, and the plurality of crucible nozzles are evenly distributed on the crucible: the crucible cover is detachably connected to the crucible body: the bottom of the crucible body is arc-shaped. The utility model designs the bottom of the crucible body to be arc-shaped, and utilizes the characteristics of the arc shape with a larger heating area and no dead angle, so as to effectively improve the uniformity of organic material evaporation and the problem of unclean crucible cleaning;

[0004] However, the inventors believe that it is obviously not enough to simply design the bottom of the crucible body to be arc-shaped and utilize the arc shape's characteristics of having a larger heating area and no dead angles to effectively improve the uniformity of organic material evaporation. When heating the crucible, tungsten rods (tungsten heaters) are generally used for heating, and the distribution of tungsten rods is the key to uniform heating of the crucible body. Therefore, a uniformly heated evaporation crucible is needed. Summary of the invention

[0005] The purpose of the present application is to provide a uniformly heated evaporation crucible to solve the problem raised in the above background technology that it is obviously not enough to simply design the bottom of the crucible body to be arc-shaped and utilize the characteristics of the arc shape with a larger heating area and no dead angle to effectively improve the uniformity of evaporation of organic materials.

[0006] To achieve the above-mentioned purpose, the present application provides the following technical solutions: a uniformly heated evaporation crucible, comprising a lower closed furnace and a crucible body, wherein the crucible body is fixedly connected to the inner bottom wall of the lower closed furnace, the upper surface of the lower closed furnace is fixedly connected to the upper closed furnace, the inner wall of the lower closed furnace is installed with a switch door, the surface of the lower closed furnace is fixedly connected to a temperature controller, the inner wall of the upper closed furnace is fixedly connected to an exhaust pipe, the inner wall of the lower closed furnace is fixedly connected to a plurality of vacuum pumps, the inner bottom wall of the lower closed furnace is fixedly connected to an inner heating box, the inner top wall of the upper closed furnace is fixedly connected to a glass substrate, and the inner wall of the crucible body is installed with a uniform heating mechanism;

[0007] The uniform heating mechanism comprises a discharge plate installed on the inner wall of the crucible body, the output end of the discharge plate is fixedly connected to the first power supply line and the second power supply line, the output end of the inner wall of the discharge plate is rotatably connected to a conductive column, the top of the conductive column is fixedly connected to a plurality of third tungsten heaters, the inner surface of the crucible body is fixedly connected to a second ring plate and a first ring plate, the inner wall of the second ring plate is fixedly connected to the first tungsten heater, the inner wall of the second ring plate is fixedly connected to the second tungsten heater, one end of the second power supply line is fixedly connected to the surface of the second tungsten heater, and one end of the first power supply line is fixedly connected to the surface of the first tungsten heater;

[0008] A plurality of first through holes are formed on the surface of the first ring plate, a plurality of second through holes are formed on the surface of the second ring plate, and a plurality of first evaporation holes are formed on the surfaces of the first ring plate and the second ring plate;

[0009] A plurality of fourth tungsten heaters are fixedly connected to the surface of the third tungsten heater, a plurality of uniform attachment components are provided on the surface of the inner heating box, a discharge component is provided on the inner surface of the crucible body, and a swing component is arranged inside the lower closed furnace.

[0010] Preferably, the uniform attachment assembly comprises a plurality of second evaporation holes formed on the surface of the inner heating box, a plurality of third evaporation holes are formed on the upper surface of the inner heating box, and a conical diversion column is fixedly connected to the inner wall of the third evaporation hole.

[0011] Preferably, a base is fixedly connected to the upper surface of the lower closed furnace, an L-shaped plug plate is installed on the inner wall of the base, and an upper row of plates is fixedly connected to the top of the L-shaped plug plate.

[0012] Preferably, the surfaces of the plurality of bases are fixedly connected to a same lower row of plates, and the upper surface of the lower row of plates is in contact with the lower surface of the upper row of plates.

[0013] Preferably, the discharge assembly includes an adapter hole opened on the inner surface of the crucible body, and an avoidance hole is opened on the surface of the lower closed furnace. The inner wall of the avoidance hole is rotatably connected to a turntable, one end of the turntable is fixedly connected to a threaded rod, and the surface of the threaded rod is threadedly connected to a moving cylinder.

[0014] Preferably, the surface of the moving cylinder is slidably connected to the inner wall of the adapting hole, and the surface of the moving cylinder is fixedly connected to a sealing cylinder.

[0015] Preferably, the surface of the sealing cylinder away from the moving cylinder is arranged as a fitting arc surface, and the surface of the fitting arc surface fits with the inner wall of the crucible body.

[0016] Preferably, a hand crank is fixedly connected to the surface of the turntable, a high temperature resistant nozzle is installed on the surface of the inner heating box, and a discharge arc hole is opened on the surface of the lower closed furnace, and the discharge arc hole is connected to the adapter hole.

[0017] Preferably, the swing assembly includes an installation space opened inside the lower closed furnace, the inner bottom wall of the installation space is fixedly connected with a high-temperature resistant reduction motor and a support column, the output end of the high-temperature resistant reduction motor is fixedly connected with a moving disk, the surface of the moving disk is fixedly connected with a cam, the cam is eccentric to the center axis of the moving disk, the surface of the support column is rotatably connected with a tooth plate, the upper surface of the tooth plate is opened with a driving hole, the cam is installed inside the driving hole, the surface of the conductive column is fixedly connected with an insulating gear, and the insulating gear is meshed with the tooth plate.

[0018] Preferably, the first tungsten heater, the second tungsten heater and the third tungsten heater are spiral in shape.

[0019] In summary, the technical effects and advantages of the present invention are as follows:

[0020] In the present invention, a temperature controller is provided to control the current of the discharge plate, a glass substrate is provided to spray evaporated particles on the substrate for deposition, a vacuum pump is provided to perform three-stage vacuuming to ensure that there are no air molecules in the lower closed furnace and the upper closed furnace, a discharge plate is provided to supply power to the first power supply line, the second power supply line, and the conductive column, the first power supply line is provided to supply power to the first tungsten heater, so that the first tungsten heater generates heat, vaporizes or sublimates the low-melting-point coating material hung on the surface thereof, and opens the surface of the tungsten heater in the form of atoms, molecules, or atomic groups, and the second power supply line is provided to supply power to the second tungsten heater. , so that the second tungsten heater generates heat, vaporizes or sublimates the low-melting-point coating material hanging on its surface, and opens the surface of the tungsten heater in the form of atoms, molecules or atomic groups. By setting the third tungsten heater, similarly, it generates heat. By setting the first through hole and the second through hole, the molten coating material can flow into the crucible body during high-temperature heating. By setting the first evaporation hole, the vaporized or sublimated atoms are avoided. By setting the fourth tungsten heater, multiple fourth tungsten heaters are staggered to increase the heating area. By setting the first tungsten heater, the second tungsten heater and the third tungsten heater are spirally shaped, the heating area is increased, and the heating is more uniform.

[0021] By setting the second evaporation hole and the third evaporation hole, the vaporized or sublimated atoms are discharged upward. By setting the conical diversion column, the vaporized atoms are dispersed through multiple third evaporation holes. By setting the base, the installation of the L-shaped plug plate is stable. By setting the L-shaped plug plate, the connection between the upper row of plates and the lower row of plates is ensured to be stable, and the upper row of plates can be easily removed and replaced from the lower row of plates. By setting the lower row of plates, they cooperate with the upper row of plates to form smaller holes, which makes it easier for the atoms rising from the bottom to adhere evenly to the glass substrate.

[0022] By setting the adapter hole, space is given to the moving cylinder to move around. By setting the turntable, the threaded rod can be driven to rotate by operating the turntable, thereby driving the position of the moving cylinder to change. By setting the sealing cylinder, the sealing of the adapter hole is ensured. By setting the fitting arc surface to adapt to the inner surface curvature of the crucible body, the high-temperature heating of the crucible body is uniform and not affected. By setting the hand crank, it is convenient to operate the turntable through the hand crank. By setting the high-temperature resistant nozzle, the inner surface of the crucible body can be rinsed after the evaporation is completed. By setting the discharge arc hole, the rinsed waste residue can be discharged.

[0023] By setting a high temperature resistant reduction motor, starting the high temperature resistant reduction motor, making the moving disk rotate, driving the cam shaft to move, and by setting a support column, the installation of the tooth plate is kept stable. By setting the tooth plate, the cam shaft moves inside the driving hole, so that the tooth plate swings around the support column as the center, driving the insulating gear to reciprocate. The movement of the insulating gear drives multiple third tungsten heaters to reciprocate through the conductive column. The advantage of this is that during the heating process, it contacts the object placed in the crucible body, driving the object in the crucible body to heat and melt more quickly. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For those skilled in the art, other drawings can be obtained based on these drawings without paying any creative work.

[0025] Figure 1 A schematic diagram of the three-dimensional structure of an embodiment of the present application;

[0026] Figure 2 This is a schematic cross-sectional view of the lower closed furnace and the upper closed furnace in the embodiment of the present application;

[0027] Figure 3 A schematic cross-sectional view of the crucible in the embodiment of the present application;

[0028] Figure 4 For the embodiment of this application Figure 3 A schematic diagram of the enlarged structure at A in the middle;

[0029] Figure 5 This is a schematic diagram of the planar structure of the first tungsten heater and the second tungsten heater in the embodiment of the present application;

[0030] Figure 6 For the embodiment of this application Figure 5 A schematic diagram of the enlarged structure at B in the middle;

[0031] Figure 7 This is a schematic diagram of the three-dimensional structure of the third tungsten heater in the embodiment of the present application;

[0032] Figure 8 This is a schematic cross-sectional view of the internal heating box in the embodiment of the present application;

[0033] Fig. 9 This is a schematic diagram of the three-dimensional structure of the upper row of plates and the lower row of plates in the embodiment of the present application;

[0034] Fig.10 For the embodiment of this application Fig. 9 Schematic diagram of the enlarged structure at C in the middle;

[0035] Fig.11 This is a schematic diagram of the planar structure of the upper row of plates and the lower row of plates in the embodiment of the present application;

[0036] Fig.12 This is a schematic diagram of the planar cross-sectional structure of the lower closed furnace and the upper closed furnace in the embodiment of the present application;

[0037] Fig.13 It is a schematic diagram of the three-dimensional structure of the material discharge in the embodiment of the present application.

[0038] In the figure: 1, lower closed furnace; 2, upper closed furnace; 3, crucible body; 4, exhaust pipe; 5, temperature controller; 6, switch door; 7, vacuum pump; 8, glass substrate; 9, upper row plate; 10, lower row plate; 11, inner heating box; 12, discharge plate; 13, second power supply line; 14, first power supply line; 15, third tungsten heater; 16, second ring plate; 17, first ring plate; 18, first tungsten heater; 19, second tungsten heater; 20, fourth tungsten heater; 21, first through hole; 22, second through hole; 23, first Evaporation hole; 24, the third evaporation hole; 25, the conical diversion column; 26, the second evaporation hole; 27, the L-shaped plug plate; 28, the base; 29, the threaded rod; 30, the discharge arc hole; 31, the sealing cylinder; 32, the fitting arc surface; 33, the moving cylinder; 34, the hand crank; 35, the turntable; 36, the high temperature resistant nozzle; 37, the adapter hole; 38, the installation space; 39, the conductive column; 40, the insulating gear; 41, the support column; 42, the high temperature resistant reduction motor; 43, the cam shaft; 44, the tooth plate; 45, the moving disk; 46, the driving hole. DETAILED DESCRIPTION

[0039] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0040] Example: Reference Figure 1-Figure 13 A uniformly heated evaporation crucible shown comprises a lower closed furnace 1 and a crucible body 3, wherein the crucible body 3 is fixedly connected to the inner bottom wall of the lower closed furnace 1, the upper closed furnace 2 is fixedly connected to the upper surface of the lower closed furnace 1, a switch door 6 is installed on the inner wall of the lower closed furnace 1, a temperature controller 5 is fixedly connected to the surface of the lower closed furnace 1, an exhaust pipe 4 is fixedly connected to the inner wall of the upper closed furnace 2, a plurality of vacuum pumps 7 are fixedly connected to the inner wall of the lower closed furnace 1, an inner heating box 11 is fixedly connected to the inner bottom wall of the lower closed furnace 1, a glass substrate 8 is fixedly connected to the inner top wall of the upper closed furnace 2, and a uniform heating mechanism is installed on the inner wall of the crucible body 3;

[0041] The uniform heating mechanism includes a discharge plate 12 installed on the inner wall of the crucible body 3, the output end of the discharge plate 12 is fixedly connected to the first power supply line 14 and the second power supply line 13, the output end of the inner wall of the discharge plate 12 is rotatably connected to a conductive column 39, the top of the conductive column 39 is fixedly connected to a plurality of third tungsten heaters 15, the inner surface of the crucible body 3 is fixedly connected to a second ring plate 16 and a first ring plate 17, the inner wall of the second ring plate 16 is fixedly connected to a first tungsten heater 18, the inner wall of the second ring plate 16 is fixedly connected to a second tungsten heater 19, one end of the second power supply line 13 is fixedly connected to the surface of the second tungsten heater 19, and one end of the first power supply line 14 is fixedly connected to the surface of the first tungsten heater 18;

[0042] A plurality of first through holes 21 are formed on the surface of the first ring plate 17, a plurality of second through holes 22 are formed on the surface of the second ring plate 16, and a plurality of first evaporation holes 23 are formed on the surfaces of the first ring plate 17 and the second ring plate 16;

[0043] A plurality of fourth tungsten heaters 20 are fixedly connected to the surface of the third tungsten heater 15 , a plurality of uniformly attached components are provided on the surface of the inner heating box 11 , a discharge component is provided on the inner surface of the crucible body 3 , and a swing component is arranged inside the lower closed furnace 1 .

[0044] By means of the above structure, the current of the discharge plate 12 is controlled by setting a temperature controller 5, the evaporated particles are sprayed on the substrate for deposition by setting a glass substrate 8, and three-stage vacuuming is performed by setting a vacuum pump 7 to ensure that there are no air molecules in the lower closed furnace 1 and the upper closed furnace 2. The discharge plate 12 is set to supply power to the first power supply line 14, the second power supply line 13, and the conductive column 39. The first power supply line 14 is set to supply power to the first tungsten heater 18, so that the first tungsten heater 18 heats up, vaporizes or sublimates the low-melting-point coating material hung on its surface, and high-opens the tungsten heater 18 in the form of atoms, molecules or atomic groups. The second tungsten heater 19 is powered by setting a second power supply line 13, so that the second tungsten heater 19 generates heat, vaporizes or sublimates the low-melting-point coating material hung on the surface, and opens the surface of the tungsten heater in the form of atoms, molecules or atomic clusters. Similarly, the third tungsten heater 15 is set to generate heat. The first through hole 21 and the second through hole 22 are set so that the molten coating material can flow into the crucible body 3 during high-temperature heating. The first evaporation hole 23 is set to avoid the vaporized or sublimated atoms. The fourth tungsten heater 20 is set, and multiple fourth tungsten heaters 20 are staggered to increase the heating area.

[0045] As a preferred implementation in this embodiment, refer to the attached Figure 8 The uniform attachment component includes a plurality of second evaporation holes 26 opened on the surface of the inner heating box 11 , a plurality of third evaporation holes 24 are opened on the upper surface of the inner heating box 11 , and a conical diversion column 25 is fixedly connected to the inner wall of the third evaporation hole 24 .

[0046] By providing the second evaporation holes 26 and the third evaporation holes 24 , vaporized or sublimated atoms are discharged upward, and by providing the conical diversion column 25 , the vaporized atoms are dispersed through a plurality of third evaporation holes 24 .

[0047] As a preferred implementation in this embodiment, refer to the attached Figure 2 , Fig. 9 , Fig.10 The upper surface of the lower closed furnace 1 is fixedly connected with a base 28 , the inner wall of the base 28 is installed with an L-shaped plug plate 27 , and the top of the L-shaped plug plate 27 is fixedly connected with an upper row of plates 9 .

[0048] The base 28 is provided to facilitate the stable installation of the L-shaped plug plate 27. The L-shaped plug plate 27 ensures a stable connection between the upper row of plates 9 and the lower row of plates 10, and the upper row of plates 9 can be easily removed from the lower row of plates 10 for replacement.

[0049] As a preferred implementation in this embodiment, refer to the attached Fig. 9 , Fig.11The surfaces of the multiple bases 28 are fixedly connected to the same lower row plate 10 , and the upper surface of the lower row plate 10 is in contact with the lower surface of the upper row plate 9 .

[0050] By providing the lower row of plates 10 , in cooperation with the upper row of plates 9 , together finer holes are formed, so that the atoms rising from the bottom can be evenly attached to the glass substrate 8 .

[0051] As a preferred implementation in this embodiment, refer to the attached Fig.12 The discharge assembly includes an adapting hole 37 opened on the inner surface of the crucible body 3, and an avoidance hole is opened on the surface of the lower closed furnace 1. A turntable 35 is rotatably connected to the inner wall of the avoidance hole. A threaded rod 29 is fixedly connected to one end of the turntable 35, and a moving cylinder 33 is threadedly connected to the surface of the threaded rod 29.

[0052] By providing the adapting hole 37, a space is provided for the moving cylinder 33 to move and avoid. By providing the turntable 35, the threaded rod 29 can be driven to rotate by rotating the turntable 35, thereby driving the position of the moving cylinder 33 to change.

[0053] As a preferred implementation in this embodiment, refer to the attached Fig.12 The surface of the moving cylinder 33 is slidably connected to the inner wall of the adapting hole 37 , and the surface of the moving cylinder 33 is fixedly connected to the sealing cylinder 31 .

[0054] By providing the sealing cylinder 31 , the sealing of the adapting hole 37 is ensured.

[0055] As a preferred implementation in this embodiment, refer to the attached Fig.13 The surface of the sealing cylinder 31 away from the moving cylinder 33 is configured as a fitting arc surface 32 , and the surface of the fitting arc surface 32 fits with the inner wall of the crucible body 3 .

[0056] The fitting arc surface 32 is provided to adapt to the curvature of the inner surface of the crucible body 3 so that the high-temperature heating of the crucible body 3 is uniform and not affected.

[0057] As a preferred implementation in this embodiment, refer to the attached Fig.12 A hand crank 34 is fixedly connected to the surface of the turntable 35 , a high temperature resistant nozzle 36 is installed on the surface of the inner heating box 11 , and a discharge arc hole 30 is opened on the surface of the lower closed furnace 1 , and the discharge arc hole 30 is connected to the adapter hole 37 .

[0058] By providing a hand crank 34, it is convenient to operate the turntable 35 by driving the hand crank 34 to rotate, and by providing a high temperature resistant nozzle 36, the inner surface of the crucible body 3 can be rinsed after the evaporation is completed, and the waste residue rinsed can be discharged by providing a discharge arc hole 30.

[0059] As a preferred implementation in this embodiment, refer to the attached Figure 3, Figure 4 The swing assembly includes an installation space 38 opened inside the lower closed furnace 1, and the inner bottom wall of the installation space 38 is fixedly connected with a high-temperature resistant reduction motor 42 and a support column 41. The output end of the high-temperature resistant reduction motor 42 is fixedly connected with a moving disk 45, and the surface of the moving disk 45 is fixedly connected with a convex shaft 43, and the convex shaft 43 is eccentric to the central axis of the moving disk 45. The surface of the support column 41 is rotatably connected with a tooth plate 44, and a driving hole 46 is opened on the upper surface of the tooth plate 44. The convex shaft 43 is installed inside the driving hole 46. The surface of the conductive column 39 is fixedly connected with an insulating gear 40, and the insulating gear 40 is meshed with the tooth plate 44.

[0060] By setting a high temperature resistant reduction motor 42, starting the high temperature resistant reduction motor 42, making the moving disk 45 rotate, driving the cam 43 to move, and by setting the support column 41, keeping the installation of the tooth plate 44 stable, by setting the tooth plate 44, the cam 43 moves inside the driving hole 46, so that the tooth plate 44 swings around the support column 41, driving the insulating gear 40 to reciprocate, and the movement of the insulating gear 40 drives multiple third tungsten heaters 15 to reciprocate through the conductive column 39. The advantage of this is that during the heating process, it contacts the object placed in the crucible body 3, driving the object in the crucible body 3 to heat and melt more quickly.

[0061] As a preferred implementation in this embodiment, refer to the attached Figure 6 , Figure 7 The first tungsten heater 18 , the second tungsten heater 19 , and the third tungsten heater 15 are in a spiral shape.

[0062] By setting the first tungsten heater 18, the second tungsten heater 19 and the third tungsten heater 15 to be spiral in shape, the heating area is increased and the heating is more uniform.

[0063] The working principle of the present invention is: a uniformly heated evaporation crucible, before evaporation, the material to be evaporated is placed in the crucible body 3, the switch door 6 is closed, the interior of the lower closed furnace 1 is evacuated to a vacuum through the vacuum pump 7, the temperature controller 5 is started, the discharge plate 12 is controlled to discharge, and the first tungsten heater 18, the second tungsten heater 19, and the plurality of third tungsten heaters 15 are powered by the first power supply line 14, the second power supply line 13, and the conductive column 39, respectively, so that the first tungsten heater 18, the second tungsten heater 19 and the plurality of third tungsten heaters 15 are heated, and the first tungsten heater 18, the second tungsten heater 19 and the plurality of third tungsten heaters 15 generate heat , so that the low melting point coating material hanging on its surface is vaporized or sublimated, and the surface of the tungsten heater is opened in the form of atoms, molecules or atomic groups. The first tungsten heater 18, the second tungsten heater 19, and the third tungsten heater 15 are spirally shaped, which increases the heating area and makes the heating more uniform. When heating, the high temperature resistant reduction motor 42 is started, and the output end of the high temperature resistant reduction motor 42 drives the moving disk 45 to rotate. The rotation of the moving disk 45 drives the convex shaft 43 to move. The convex shaft 43 moves inside the driving hole 46, so that the tooth plate 44 swings around the support column 41 as the center, driving the insulating gear 40 to reciprocate. The insulating gear 40 moves through the conductive column 39 to drive multiple third tungsten heaters. The heater 15 reciprocates, and the advantage of this is that during the heating process, it contacts the object placed in the crucible body 3, driving the object in the crucible body 3 to heat and melt more quickly. The first through hole 21 and the second through hole 22 can make the molten plating material flow into the crucible body 3 during the high-temperature heating process. By setting the first evaporation hole 23, the vaporized or sublimated atoms are avoided. By setting the fourth tungsten heater 20, multiple fourth tungsten heaters 20 are staggered to increase the heating area. The vaporized or sublimated plating material is discharged through the second evaporation hole 26 and multiple third evaporation holes 24, and then converges and is discharged through the lower row plate 10 and the upper row plate 9. The lower row plate 10 and the upper row plate 9 are The plates 9 cooperate with each other to form smaller holes, which are convenient for the atoms rising from the bottom to be evenly attached to the glass substrate 8 for evaporation. When the evaporation is completed, the operator drives the turntable 35 to rotate through the hand crank 34. The rotation of the turntable 35 can drive the threaded rod 29 to rotate, thereby driving the position of the moving cylinder 33 to change. The movement of the moving cylinder 33 drives the position of the sealing cylinder 31 to change. At this time, the high-temperature resistant nozzle 36 is started. After the evaporation is completed, the inner surface of the crucible body 3 can be rinsed. By setting the discharge arc hole 30, the rinsed waste residue can be discharged. With the above structure, the crucible body 3 is evenly heated and evaporated by installing and distributing the tungsten rods, so that the evaporation adhesion is more uniform.

[0064] Finally, it should be noted that the above is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, it is still possible for those skilled in the art to modify the technical solutions described in the aforementioned embodiments or to make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A uniformly heated evaporation crucible, comprising a lower closed furnace (1) and a crucible body (3), wherein the crucible body (3) is fixedly connected to the inner bottom wall of the lower closed furnace (1), characterized in that: The upper surface of the lower closed furnace (1) is fixedly connected to the upper closed furnace (2), the inner wall of the lower closed furnace (1) is provided with a switch door (6), the surface of the lower closed furnace (1) is fixedly connected to a temperature controller (5), the inner wall of the upper closed furnace (2) is fixedly connected to an exhaust pipe (4), the inner wall of the lower closed furnace (1) is fixedly connected to a plurality of vacuum pumps (7), the inner bottom wall of the lower closed furnace (1) is fixedly connected to an inner heating box (11), the inner top wall of the upper closed furnace (2) is fixedly connected to a glass substrate (8), and the inner wall of the crucible body (3) is provided with a uniform heating mechanism; The uniform heating mechanism comprises a discharge plate (12) mounted on the inner wall of the crucible body (3), the output end of the discharge plate (12) being fixedly connected to a first power supply line (14) and a second power supply line (13), the output end of the inner wall of the discharge plate (12) being rotatably connected to a conductive column (39), the top of the conductive column (39) being fixedly connected to a plurality of third tungsten heaters (15), the inner surface of the crucible body (3) being fixedly connected to a second ring plate (16) and a first ring plate (17), the inner wall of the first ring plate (17) being fixedly connected to a first tungsten heater (18), the inner wall of the second ring plate (16) being fixedly connected to a second tungsten heater (19), one end of the second power supply line (13) being fixedly connected to the surface of the second tungsten heater (19), and one end of the first power supply line (14) being fixedly connected to the surface of the first tungsten heater (18); A plurality of first through holes (21) are formed on the surface of the first ring plate (17), a plurality of second through holes (22) are formed on the surface of the second ring plate (16), and a plurality of first evaporation holes (23) are formed on the surfaces of the first ring plate (17) and the second ring plate (16); A plurality of fourth tungsten heaters (20) are fixedly connected to the surface of the third tungsten heater (15), a plurality of uniformly attached components are provided on the surface of the inner heating box (11), a discharge component is provided on the inner surface of the crucible body (3), and a swing component is provided inside the lower closed furnace (1).

2. The uniformly heated evaporation crucible according to claim 1, characterized in that: The uniform attachment assembly comprises a plurality of second evaporation holes (26) formed on the surface of an inner heating box (11), a plurality of third evaporation holes (24) formed on the upper surface of the inner heating box (11), and a conical flow dividing column (25) fixedly connected to the inner wall of the third evaporation hole (24).

3. The uniformly heated evaporation crucible according to claim 2, characterized in that: A base (28) is fixedly connected to the upper surface of the lower closed furnace (1), an L-shaped plug plate (27) is installed on the inner wall of the base (28), and an upper row of plates (9) is fixedly connected to the top of the L-shaped plug plate (27).

4. The uniformly heated evaporation crucible according to claim 3, characterized in that: The surfaces of the plurality of bases (28) are fixedly connected to the same lower row plate (10), and the upper surface of the lower row plate (10) is in contact with the lower surface of the upper row plate (9).

5. The uniformly heated evaporation crucible according to claim 1, characterized in that: The discharge assembly comprises an adapting hole (37) formed on the inner surface of the crucible body (3); a relief hole is formed on the surface of the lower closed furnace (1); a turntable (35) is rotatably connected to the inner wall of the relief hole; a threaded rod (29) is fixedly connected to one end of the turntable (35); and a moving cylinder (33) is threadedly connected to the surface of the threaded rod (29).

6. The uniformly heated evaporation crucible according to claim 5, characterized in that: The surface of the moving cylinder (33) is slidably connected to the inner wall of the adapting hole (37), and the surface of the moving cylinder (33) is fixedly connected to the sealing cylinder (31).

7. The uniformly heated evaporation crucible according to claim 6, characterized in that: The surface of the sealing cylinder (31) away from the moving cylinder (33) is arranged as a fitting cambered surface (32), and the surface of the fitting cambered surface (32) fits with the inner wall of the crucible body (3).

8. The uniformly heated evaporation crucible according to claim 5, characterized in that: A hand crank (34) is fixedly connected to the surface of the turntable (35), a high temperature resistant nozzle (36) is installed on the surface of the inner heating box (11), and a discharge arc hole (30) is opened on the surface of the lower closed furnace (1), and the discharge arc hole (30) is connected to the adapter hole (37).

9. The uniformly heated evaporation crucible according to claim 1, characterized in that: The swing assembly comprises an installation space (38) opened inside the lower closed furnace (1), the inner bottom wall of the installation space (38) is fixedly connected to a high temperature resistant reduction motor (42) and a support column (41), the output end of the high temperature resistant reduction motor (42) is fixedly connected to a moving disk (45), the surface of the moving disk (45) is fixedly connected to a convex shaft (43), the convex shaft (43) is eccentric to the central axis of the moving disk (45), the surface of the support column (41) is rotatably connected to a toothed plate (44), the upper surface of the toothed plate (44) is provided with a driving hole (46), the convex shaft (43) is installed inside the driving hole (46), and the surface of the conductive column (39) is fixedly connected to an insulating gear (40), the insulating gear (40) is meshed with the toothed plate (44).

10. The uniformly heated evaporation crucible according to claim 1, characterized in that: The first tungsten heater (18), the second tungsten heater (19), and the third tungsten heater (15) are in a spiral shape.

Citation Information

Patent Citations

  • Evaporation crucible

    CN215481224U

  • Rotary multi-resistance evaporation vessel

    CN110453182A

  • Heating device of evaporation source

    KR101390413B1