Etching liquid cooling device for etching machine

Abstract

The present invention relates to the field of etching processing equipment, and specifically to an etching liquid cooling device for an etching machine, which includes a shell, the shell includes a first square frame and a second square frame with an open structure at one end, the open end of the first square frame is sleeved in the second square frame, and is slidably matched and sealed with the second square frame, and a heat exchange plate for cooling the etching liquid is arranged in the shell. The present invention can reduce the pressure difference inside and outside the heat exchange channel by compressing the shell, improve the problem of sealing failure between the heat exchange plates, enhance the resistance of the heat exchange channel to instantaneous impact, and meet the use requirements of different working conditions; by arranging a plurality of closed independent chambers in the shell, the fine control of the pressure in each independent chamber is realized to adapt to the actual working condition where the pressure in the heat exchange channel gradually decreases from the liquid inlet to the liquid outlet, and further ensures the sealing reliability of the heat exchange channel; the setting of the vacuum chamber enables the shell to have a heat preservation function, reducing the cold energy consumption of the coolant.

Description

Technical Field

[0001] The invention relates to the field of etching processing equipment, in particular to an etching liquid cooling device of an etching machine. Background Art

[0002] Etching machine is a kind of equipment used for etching semiconductor chips, optical components, etc. During the etching process of the etching machine, the etching liquid (strong acid or strong alkali) in the etching tank will generate a lot of heat energy when it comes into contact with the workpiece, causing the temperature of the etching liquid to continue to rise, which is easy to cause some chemical components in the etching liquid to volatilize, causing the chemical composition ratio of the etching liquid to be unbalanced, and even causing the etching liquid to fail, affecting the etching efficiency and quality. At the same time, if the temperature of the etching liquid is too high, it may cause the polymer anti-corrosion layer of the etching machine to be damaged, affecting the service life of the etching equipment. Therefore, an etching liquid cooling device is usually configured during the etching process, which cools the etching liquid through circulating water or other refrigerant media to keep the temperature of the etching liquid within a suitable process range.

[0003] Traditional etching liquid cooling devices often use plate heat exchangers to exchange heat and cool the etching liquid. Plate heat exchangers have the advantages of high heat transfer coefficient, compact structure, and easy disassembly and cleaning, but they also have the obvious defect of low pressure bearing capacity. Limited by the sealing structure of the plate heat exchanger, the working pressure it can withstand is very limited, even lower than 1MPa. The problem of sealing failure is prone to occur during operation, causing leakage of etching liquid. Especially when water hammer and air hammer occur in the cooling channel of the plate heat exchanger, the plate seal will be subjected to a large instantaneous impact, which can easily cause the sealing strip to separate from the sealing surface of the plate instantly, causing the etching liquid to leak out.

[0004] At the same time, the traditional plate etching liquid cooling device has a complex structure and shape, and often requires inspection and maintenance. It lacks simple and effective insulation measures, which increases the cold energy consumption of the coolant and is not conducive to energy saving and environmental protection.

[0005] The information disclosed in the background technology section of the present invention is only intended to deepen the understanding of the general background technology of the present invention, and should not be regarded as acknowledging or suggesting in any form that the information constitutes the prior art already known to those skilled in the art. Summary of the invention

[0006] Based on this, it is necessary to provide an etching liquid cooling device with reliable sealing, energy saving and environmental protection to address the problems that the existing etching liquid cooling device has low pressure bearing capacity, is prone to sealing failure, causes etching liquid leakage, and lacks simple and effective insulation measures.

[0007] The above purpose is achieved through the following technical solutions:

[0008] An etching liquid cooling device for an etching machine comprises a shell, the shell comprises a first square frame and a second square frame, the first square frame and the second square frame are both semi-open structures with one end open, the open end of the first square frame is sleeved in the second square frame, and is slidably matched and sealed with the second square frame, a plurality of heat exchange plates for cooling the etching liquid are arranged in the shell, a water inlet and a water outlet for cooling liquid entering and exiting the shell are connected to the shell, and a liquid inlet and a liquid outlet for etching liquid entering and exiting the shell are also connected, the water inlet, the water outlet, the liquid inlet and the liquid outlet are all provided with valves, and the water inlet, the water outlet, the liquid inlet and the liquid outlet are respectively connected to a heat exchange channel formed by a plurality of heat exchange plates.

[0009] In one embodiment, the first square frame and the second square frame are sealed and connected via a sealing frame, and the sealing frame is arranged at the open end of the second square frame. A sealing ring is circumferentially arranged on the sealing frame corresponding to the outer wall of the first square frame, and a fixing groove for fixing the sealing ring is formed on the inner ring of the sealing frame. The sealing ring lies in the fixing groove of the sealing frame, and the thickness of the sealing ring is higher than the depth of the fixing groove.

[0010] In one embodiment, a first fixing plate is provided at the tail end of the first square frame, a second fixing plate is provided at the open end of the second square frame, and a locking screw is connected between the first fixing plate and the second fixing plate for pressing and locking the first square frame and the second square frame.

[0011] In one embodiment, an extrusion plate for extruding the heat exchange plates is disposed on the inner side of the first fixing plate and the inner side of the rear end of the second square frame. The extrusion plate is arranged corresponding to the shape of the heat exchange plates to achieve compression and tight sealing between the heat exchange plates.

[0012] In one of the embodiments, the first square frame and the second square frame are slidably connected via a slide rail mechanism; a guide slide is fixedly provided in the first square frame along the length direction; a guide slide is fixedly provided in the second square frame corresponding to the guide slide; the guide slide and the guide slide are slidably matched, and the guide slide acts as a limit guide on the guide slide, so that the first square frame and the second square frame can be telescopically connected along a predetermined track.

[0013] In one embodiment, the guide slide is a T-shaped structure, and a slide groove is provided on the middle raised portion of the T-shaped structure. The guide slide rail is a three-section split guide rail structure respectively corresponding to the slide groove and the recessed portions on both sides of the T-shaped structure. The slide groove of the middle raised portion of the guide slide and the recessed portions on both sides of the T-shaped structure are respectively slidably connected, so that the guide slide and the guide slide rail are in a triple bite connection state.

[0014] In one of the embodiments, the heat exchange plate is provided with positioning notches corresponding to the guide slide seat and the guide rail, respectively, for positioning and installing the heat exchange plate.

[0015] In one of the embodiments, a plurality of sealing plates are arranged in the shell at intervals corresponding to the heat exchange plates, and the sealing plates divide the enclosed space in the shell into a plurality of independent chambers.

[0016] In one of the embodiments, the sealing plate is provided with an overflow valve connecting adjacent independent chambers, and the threshold value of the overflow valve on each sealing plate is different. The overflow valve threshold value arranged on the sealing plate close to the liquid inlet is the largest, and the overflow valve threshold values ​​on adjacent sealing plates decrease successively. The overflow valve threshold value on the sealing plate close to the liquid outlet is the smallest, so that the pressure value that can be maintained in each independent chamber decreases gradually to adapt to the actual working condition where the pressure in the heat exchange channel gradually decreases from the liquid inlet to the liquid outlet.

[0017] In one of the embodiments, a sealing ring is provided on the outer wall of the opening end of the first square frame, and the sealing ring is in sealing contact with the inner wall of the second square frame and is slidably connected to seal the fitting gap between the opening end of the first square frame and the second square frame. When the first square frame moves relative to the second square frame, under the joint sealing action of the sealing frame and the sealing ring, a vacuum chamber with a certain negative pressure will be formed in the sliding fitting gap between the first square frame and the second square frame, so as to facilitate the insulation of the shell.

[0018] The beneficial effects of the present invention are:

[0019] The shell of the etching liquid cooling device of the present invention is composed of a first square frame and a second square frame that are separately arranged and slidably and telescopically connected. By promoting the relative sliding of the first square frame and the second square frame, a high-pressure environment can be formed in the confined space of the shell, reducing the pressure difference between the inside and outside of the heat exchange channel, balancing the pressure inside the heat exchange channel, improving the problem of sealing failure between the heat exchange plates, avoiding the leakage of etching liquid during the cooling process, and enhancing the resistance of the heat exchange channel to instantaneous impacts such as water hammer and air hammer, which can meet the use requirements of different working conditions. The present invention forms a high-pressure environment in the shell by the relative movement of the first square frame and the second square frame, and there is no need to additionally inflate and pressurize the shell. The structure is simple and easy to operate. After the relative movement of the first square frame and the second square frame, the volume of the device is significantly reduced, and the floor space is reduced.

[0020] The present invention divides the enclosed space in the shell into several enclosed independent chambers by setting a sealing plate, and connects the independent chambers in sequence through overflow valves with different thresholds, so that the pressure of the independent chamber near the liquid inlet pipe is the largest, and gradually decreases towards the independent chambers near the liquid outlet. The pressure provided by each independent chamber is close to the pressure of the heat exchange channel of the corresponding section, which is convenient for better balancing the internal pressure of each segment of the heat exchange channel, realizing the refined control of the pressure in the independent chamber, and further ensuring the sealing reliability of the heat exchange channel.

[0021] In the present invention, a sealing ring is provided on the outer wall of the opening end of the first square frame, which is used to seal the fitting gap between the opening end of the first square frame and the second square frame. When the first square frame moves relative to the second square frame, under the joint sealing action of the sealing frame and the sealing ring, a vacuum chamber with a certain negative pressure will be formed in the sliding fitting gap between the first square frame and the second square frame, which blocks the heat exchange inside and outside the shell to a certain extent, plays a role in heat preservation for the heat exchange plates in the shell, reduces the cold energy consumption of the coolant, and achieves the application purpose of energy saving and environmental protection. When the first square frame and the second square frame move relative to each other, a positive pressure is formed in the enclosed space in the shell, and a vacuum insulation chamber is synchronously formed in the fitting gap between the first square frame and the second square frame, so that the shell has a heat preservation function, which solves the problem that the etching liquid cooling device in the prior art lacks a simple and effective heat preservation configuration. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is a schematic diagram of the three-dimensional structure of the present invention;

[0023] Figure 2 It is a front view planar structure schematic diagram of the present invention;

[0024] Figure 3 for Figure 2 Schematic diagram of the cross-sectional structure along the AA direction;

[0025] Figure 4 for Figure 3 A partial enlarged schematic diagram of point B in the middle;

[0026] Figure 5 It is a schematic diagram of the top plan structure of the present invention;

[0027] Figure 6 for Figure 5 Schematic diagram of the cross-sectional structure in the CC direction;

[0028] Figure 7 for Figure 6 A partial enlarged schematic diagram of point E in the middle;

[0029] Figure 8 for Figure 6 A partial enlarged schematic diagram of point F in the middle;

[0030] Fig. 9 for Figure 5 Schematic diagram of the cross-sectional structure in the middle DD direction;

[0031] Fig.10 It is a schematic diagram of the assembly structure of the present invention.

[0032] in:

[0033] 100--shell; 110--first square frame; 111--first fixed plate; 120--second square frame; 121--second fixed plate; 130--water inlet; 131--water outlet; 132--liquid inlet; 133--liquid outlet; 134--valve; 140--locking screw; 150--extrusion plate; 160--slide mechanism; 161--guide slide seat; 162--guide slide rail; 163--middle protrusion; 164--slide groove; 170--sealing plate; 171--overflow valve; 172--independent chamber; 180--sealing ring; 190--vacuum chamber; 200--heat exchange plate; 210--positioning notch; 300--sealing frame; 310--sealing ring; 320--fixing groove. DETAILED DESCRIPTION

[0034] In order to make the purpose, technical solution and advantages of the present invention more clearly understood, the present invention is further described in detail below through embodiments and in conjunction with the accompanying drawings. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention.

[0035] The serial numbers assigned to the components herein, such as "first", "second", etc., are only used to distinguish the objects described and do not have any order or technical meaning. The "connection" and "coupling" mentioned in the present invention, unless otherwise specified, include direct and indirect connections (couplings). In the description of the present invention, it should be understood that the terms "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", etc., indicating the orientation or position relationship are based on the orientation or position relationship shown in the accompanying drawings, which is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation to the present invention.

[0036] In the present invention, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, a first feature being "above", "above" or "above" a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being "below", "below" or "below" a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0037] like Figure 1-10As shown, an etching liquid cooling device of an etching machine includes a shell 100, and the shell 100 includes a first square frame 110 and a second square frame 120. The first square frame 110 and the second square frame 120 are both semi-open structures with one end open. The open end of the first square frame 110 is sleeved in the second square frame 120, and is slidably matched and sealed with the second square frame 120 to form a retractable shell 100 with an enclosed space. The housing 100 is provided with a plurality of heat exchange plates 200 for cooling the etching liquid. The housing 100 is connected with a water inlet 130 and a water outlet 131 for the cooling liquid to enter and exit the housing 100, and is also connected with a liquid inlet 132 and a liquid outlet 133 for the etching liquid to enter and exit the housing 100. The water inlet 130, the water outlet 131, the liquid inlet 132 and the liquid outlet 133 are all provided with valves 134. The water inlet 130, the water outlet 131, the liquid inlet 132 and the liquid outlet 133 are respectively connected to the heat exchange channel formed by the plurality of heat exchange plates 200. The water inlet 130 is connected to the cooling liquid source to supply the cooling liquid to the heat exchange channel, and the liquid inlet 132 is connected to the etching tank of the etching machine to supply the high-temperature etching liquid into the heat exchange channel.

[0038] Before use, install a number of heat exchange plates 200 in the housing 100, close the valves 134 on the water inlet 130, the water outlet 131, the liquid inlet 132 and the liquid outlet 133, push the first square frame 110 and the second square frame 120 to slide relative to each other, press the heat exchange plates 200, form an end face seal, and generate a closed heat exchange channel. The first square frame 110 and the second square frame 120 that slide relative to each other compress the closed space in the housing 100, forming a high-pressure environment in the housing 100. Then, open the valves 134 of the water inlet 130, the water outlet 131, the liquid inlet 132 and the liquid outlet 133 to discharge the air in the heat exchange channel, and check whether there is continuous air leakage to determine the sealing state between the heat exchange plates 200. If there is no continuous leakage of high-pressure gas, it indicates that the sealing state between the heat exchange plates 200 is good, there is no leakage in the heat exchange channel, and the closed chamber in the shell 100 has maintained a high-pressure state, and the etching liquid can be cooled. When in use, the coolant and the etching liquid enter the shell 100 through the water inlet 130 and the liquid inlet 132 respectively, and the etching liquid is heat exchanged and cooled in the heat exchange channel formed by the heat exchange plate 200. In this process, the heat exchange channel has the pressure of the etching liquid supplied, and outside the heat exchange channel, the high-pressure closed chamber formed by the compression of the first square frame 110 and the second square frame 120 effectively balances the pressure of the etching liquid and the coolant in the heat exchange channel, and maintains a good seal between the heat exchange plates 200. The etching liquid that has completed the heat exchange is discharged from the shell 100 through the liquid outlet 133, and continues to participate in the etching operation to form a cooling cycle of the etching liquid; at the same time, the coolant that has completed the heat exchange is discharged through the water outlet 131, and continues to participate in the circulation cooling after the cooling treatment.

[0039] This embodiment can form a high-pressure environment in the closed space of the shell 100 by promoting the relative sliding of the first square frame 110 and the second square frame 120 to balance the pressure inside the heat exchange channel, reduce the pressure difference between the inside and outside of the heat exchange channel, improve the problem of sealing failure between the heat exchange plates 200, avoid leakage of etching liquid during the cooling process, ensure the sealing performance between the heat exchange plates 200, enhance the resistance of the heat exchange channel to instantaneous impacts such as water hammer and air hammer, and meet the use requirements of different working conditions.

[0040] As a preferred embodiment, Figure 1 , 2 As shown in Figures 7 and 8, the first square frame 110 and the second square frame 120 are sealed and connected via the sealing frame 300. Specifically, the sealing frame 300 is arranged at the open end of the second square frame 120. A sealing ring 310 is circumferentially arranged on the sealing frame 300 corresponding to the outer wall of the first square frame 110. A fixing groove 320 for fixing the sealing ring 310 is opened on the inner ring of the sealing frame 300. The sealing ring 310 lies in the fixing groove 320 of the sealing frame 300, and the thickness of the sealing ring 310 is higher than the depth of the fixing groove 320, so that the sealing ring 310 is exposed in the fixing groove 320 and slidably cooperates with the outer wall of the first square frame 110 to achieve a sealed connection between the first square frame 110 and the second square frame 120.

[0041] Preferably, a first fixing plate 111 is provided at the tail end of the first square frame 110, and a second fixing plate 121 is provided at the open end of the second square frame 120. A locking screw 140 is connected between the first fixing plate 111 and the second fixing plate 121, and the first square frame 110 and the second square frame 120 are pressed and locked by rotating the locking screw 140.

[0042] Furthermore, if Figure 3 , 6 As shown, an extrusion plate 150 for extruding the heat exchange plate 200 is provided on the inner side of the first fixing plate 111 and the inner side of the rear end of the second square frame 120. The extrusion plate 150 is set corresponding to the shape of the heat exchange plate 200 to achieve compression and tight sealing between the heat exchange plates 200.

[0043] Preferably, if Figure 3 , 4As shown in Figures 9 and 10, the first square frame 110 and the second square frame 120 are slidably connected via a slide rail mechanism 160. Specifically, a guide slide 161 is fixedly provided in the first square frame 110 along the length direction, and a guide slide rail 162 is fixedly provided in the second square frame 120 corresponding to the guide slide 161, and the guide slide 161 and the guide slide rail 162 are slidably matched. Through the limiting and guiding effect of the guide slide rail 162 on the guide slide 161, the first square frame 110 and the second square frame 120 can be telescopically connected along a predetermined track, thereby improving the relative motion accuracy of the two and ensuring the sealing strength.

[0044] Preferably, if Figure 4 As shown, the guide slide 161 is a T-shaped structure, and a slide groove 164 is provided on the middle raised portion 163 of the T-shaped structure, and the guide rail 162 is a three-section split guide rail structure respectively corresponding to the slide groove 164 and the recessed portions on both sides of the T-shaped structure. The slide groove 164 of the middle raised portion 163 of the guide slide 161 and the recessed portions on both sides of the T-shaped structure are respectively slidably connected, so that the guide slide 161 and the guide rail 162 are in a triple bite connection state, which further improves the matching accuracy of the two.

[0045] Furthermore, if Fig.10 As shown, the heat exchange plate 200 is provided with positioning notches 210 corresponding to the guide slide 161 and the guide rail 162, respectively, for positioning and installing the heat exchange plate 200. During installation, the positioning notches 210 at both ends of the heat exchange plate 200 are respectively clamped on the guide slide 161 and the guide rail 162, so as to realize the positioning and installation of the heat exchange plate 200, thereby ensuring the installation accuracy of the heat exchange plate 200 and further ensuring the sealing performance between the heat exchange plates 200.

[0046] Preferably, if Fig. 9 , 10As shown, a plurality of sealing plates 170 are arranged at intervals corresponding to the heat exchange plates 200 in the housing 100. The sealing plates 170 divide the enclosed space in the housing 100 into a plurality of independent chambers 172. After the heat exchange plates 200 are pressed, the sealing plates 170 are sealed and connected with the heat exchange plates 200 to form a plurality of enclosed independent chambers 172. Preferably, the sealing plates 170 are provided with overflow valves 171 communicating with adjacent independent chambers 172, and the thresholds of the overflow valves 171 on each sealing plate 170 are different. Specifically, the threshold of the overflow valve 171 arranged on the sealing plate 170 close to the liquid inlet 132 is the largest, the thresholds of the overflow valves 171 on the adjacent sealing plates 170 decrease successively, and the threshold of the overflow valve 171 on the sealing plate 170 close to the liquid outlet 133 is the smallest. The pressure value that can be maintained in each independent chamber 172 is gradually reduced to adapt to the actual working condition that the pressure in the heat exchange channel gradually decreases from the liquid inlet 132 to the liquid outlet 133. When the first square frame 110 and the second square frame 120 move relative to each other, the pressure in the housing 100 continues to increase. When the pressure value exceeds the threshold of the overflow valve 171 on the sealing plate 170 close to the liquid inlet pipe, the overflow valve 171 opens to release the high-pressure gas into the adjacent second independent chamber 172. When the pressure of the second independent chamber 172 exceeds the threshold of the overflow valve 171 on the second sealing plate 170, the high-pressure gas continues to release into the third independent chamber 172 until the pressure of each independent chamber 172 is fully charged.

[0047] In this embodiment, the enclosed space in the housing 100 is divided into a plurality of enclosed independent chambers 172 by a sealing plate 170, and the independent chambers 172 are connected in sequence by overflow valves 171 with different thresholds, so that the pressure of the independent chamber 172 near the liquid inlet pipe is the largest, and gradually decreases toward the independent chambers 172 near the liquid outlet 133. When the etching liquid is supplied into the heat exchange channel from the liquid inlet 132, the pressure of the initial heat exchange channel is the largest, and the pressure of the independent chamber 172 corresponding to the initial heat exchange channel is also relatively large. Subsequently, the pressure in the heat exchange channel will gradually decrease, and the pressure of the independent chamber 172 will also decrease accordingly, so that the pressure provided by each independent chamber 172 is close to the pressure of the corresponding section of the heat exchange channel, which is convenient for better balancing the internal pressure of each segment of the heat exchange channel, realizing the refined control of the pressure in the independent chamber, and further ensuring the sealing reliability of the heat exchange channel.

[0048] In a further embodiment, Figure 7 , 8As shown, a sealing ring 180 is provided on the outer wall of the open end of the first square frame 110, and the sealing ring 180 is in sealing contact and sliding connection with the inner wall of the second square frame 120, and is used to seal the matching gap between the open end of the first square frame 110 and the second square frame 120. When the first square frame 110 moves relative to the second square frame 120, under the joint sealing action of the sealing frame 300 and the sealing ring 180, a vacuum chamber 190 with a certain negative pressure will be formed in the sliding matching gap between the first square frame 110 and the second square frame 120. The formation of the vacuum chamber 190 blocks the heat exchange between the inside and outside of the housing 100 to a certain extent, plays a role in heat preservation for the heat exchange plate 200 in the housing 100, reduces the cold energy consumption of the coolant, and achieves the application purpose of energy saving and environmental protection.

[0049] In this embodiment, when the first square frame 110 and the second square frame 120 move relative to each other, a positive pressure is formed in the enclosed space in the shell 100, and a vacuum insulation chamber is synchronously formed in the matching gap between the first square frame 110 and the second square frame 120, so that the shell 100 has an insulation function, which solves the problem of the lack of insulation configuration in the etching liquid cooling device in the prior art.

[0050] The technical features of the above embodiments may be combined arbitrarily. To make the description concise, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0051] The above-described embodiments only express several implementation methods of the present invention, and the description thereof is relatively specific and detailed, but it cannot be understood as limiting the scope of the present invention. It should be pointed out that, for a person of ordinary skill in the art, several modifications and improvements can be made without departing from the concept of the present invention, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the attached claims.

Claims

1. An etching liquid cooling device for an etching machine, characterized in that: The invention comprises a shell (100), wherein the shell (100) comprises a first square frame (110) and a second square frame (120), wherein the first square frame (110) and the second square frame (120) are both semi-open structures with one end open, the open end of the first square frame (110) is sleeved in the second square frame (120), and is slidably matched with and sealedly connected to the second square frame (120), a plurality of heat exchange plates (200) for cooling etching liquid are arranged in the shell (100), and a water inlet (130) for cooling liquid to enter and exit the shell (100) is connected to the shell (100). and a water outlet (131), and is also connected to a liquid inlet (132) and a liquid outlet (133) for the etching liquid to enter and exit the housing (100); the water inlet (130), the water outlet (131), the liquid inlet (132) and the liquid outlet (133) are all provided with valves (134); the water inlet (130), the water outlet (131), the liquid inlet (132) and the liquid outlet (133) are respectively connected to a heat exchange channel formed by a plurality of heat exchange plates (200); the heat exchange plates (200) are capable of sliding relative to the first square frame (110) or the second square frame (120); The first square frame (110) and the second square frame (120) are sealed and connected via a sealing frame (300); the sealing frame (300) is arranged at the open end of the second square frame (120); a sealing ring (310) is arranged on the sealing frame (300) along the circumferential direction on the outer wall corresponding to the first square frame (110); a fixing groove (320) for fixing the sealing ring (310) is provided on the inner ring of the sealing frame (300); the sealing ring (310) lies in the fixing groove (320) of the sealing frame (300); and the thickness of the sealing ring (310) is greater than the depth of the fixing groove (320); The first square frame (110) and the second square frame (120) are slidably connected via a slide rail mechanism (160); a guide slide seat (161) is fixedly arranged in the first square frame (110) along the length direction; a guide slide rail (162) is fixedly arranged in the second square frame (120) corresponding to the guide slide seat (161); the guide slide seat (161) and the guide slide rail (162) are slidably matched; The guide slide (161) is a T-shaped structure, and a slide groove (164) is provided on the middle raised portion (163) of the T-shaped structure. The guide rail (162) is a three-section split rail structure respectively arranged corresponding to the slide groove (164) and the recessed portions on both sides of the T-shaped structure. The slide groove (164) of the middle raised portion (163) of the guide slide (161) and the recessed portions on both sides of the T-shaped structure are respectively slidably connected.

2. The etching liquid cooling device of the etching machine according to claim 1, characterized in that: A first fixing plate (111) is arranged at the rear end of the first square frame (110), and a second fixing plate (121) is arranged at the open end of the second square frame (120); a locking screw (140) is connected between the first fixing plate (111) and the second fixing plate (121) for pressing and locking the first square frame (110) and the second square frame (120).

3. The etching liquid cooling device of the etching machine according to claim 2, characterized in that: An extrusion plate (150) for extruding the heat exchange plate (200) is provided on the inner side of the first fixing plate (111) and the inner side of the rear end of the second square frame (120). The extrusion plate (150) is arranged in a shape corresponding to the heat exchange plate (200) to achieve compression and tight sealing between the heat exchange plates (200).

4. The etching liquid cooling device of the etching machine according to claim 1, characterized in that: The heat exchange plate (200) is provided with positioning notches (210) corresponding to the guide slide seat (161) and the guide rail (162), respectively, for positioning and installing the heat exchange plate (200).

5. The etching liquid cooling device of the etching machine according to claim 1, characterized in that: A plurality of sealing plates (170) are arranged in the shell (100) at intervals corresponding to the heat exchange plates (200), and the sealing plates (170) divide the closed space in the shell (100) into a plurality of independent chambers (172).

6. The etching liquid cooling device of the etching machine according to claim 5, characterized in that: The sealing plate (170) is provided with an overflow valve (171) communicating with adjacent independent chambers (172), and the thresholds of the overflow valves (171) on each sealing plate (170) are different. The overflow valve (171) on the sealing plate (170) close to the liquid inlet (132) has the largest threshold, and the thresholds of the overflow valves (171) on adjacent sealing plates (170) decrease in sequence. The overflow valve (171) on the sealing plate (170) close to the liquid outlet (133) has the smallest threshold, so that the pressure value that can be maintained in each independent chamber (172) decreases gradually, so as to adapt to the actual working condition where the pressure in the heat exchange channel gradually decreases from the liquid inlet (132) to the liquid outlet (133).

7. The etching liquid cooling device of the etching machine according to claim 1, characterized in that: A sealing ring (180) is provided on the outer wall of the open end of the first square frame (110), and the sealing ring (180) is in sealing contact with and slidably connected to the inner wall of the second square frame (120), and is used to seal the fitting gap between the open end of the first square frame (110) and the second square frame (120). When the first square frame (110) moves relative to the second square frame (120), under the joint sealing action of the sealing frame (300) and the sealing ring (180), a vacuum chamber (190) with negative pressure is formed in the sliding fitting gap between the first square frame (110) and the second square frame (120), so as to facilitate heat preservation of the shell.

Images