A device for controlling tungsten wire etching

Abstract

The present invention relates to the technical field of tungsten wire etching, and discloses a device for controlling tungsten wire etching, comprising: a tungsten wire current control module, a furnace module and a furnace power supply module; the tungsten wire current control module is used to adjust the current flowing through the tungsten wire according to the actual current of the furnace power supply module; the working gas in the furnace performs tungsten wire etching under the action of bias voltage; the furnace power supply module is connected to the furnace module, and is used to provide voltage to the furnace to form the bias voltage required for tungsten wire etching. Through the device, the current flowing through the tungsten wire is adjusted according to the actual current of the furnace power supply module, and a stable bias voltage is formed between the furnace and the tungsten wire, thereby improving the process level of tungsten wire etching.

Description

Technical Field

[0001] The invention relates to the technical field of tungsten wire etching, and in particular to a device for controlling tungsten wire etching. Background Art

[0002] PVD equipment, or Physical Vapor Deposition equipment, is a device used to form a thin film coating on the surface of an object. PVD technology is used to physically transform materials into vapor or ion states under a high vacuum environment, and deposit them on the surface of the substrate to form a thin film. These thin film coatings can have different functions and characteristics, such as increasing the optical reflectivity of objects, providing corrosion protection, and improving surface hardness. This technology is widely used in materials science, electronic engineering, optics, mechanical manufacturing, and other fields, especially in the semiconductor manufacturing process, for forming metal films, such as interconnects and other key structures.

[0003] When applied to the process of tungsten wire etching, PVD equipment can provide precise film thickness control and uniformity, which is particularly important for the etching process of high melting point materials such as tungsten wire. The tungsten wire is electrified so that it carries a large number of active electrons, and then a DC power supply is used to apply an electric field to generate a bias voltage, so that the electrons on the tungsten wire collide with the working gas (such as argon gas, etc.) in the vacuum chamber to ionize into charged ions that bombard the cathode workpiece to achieve the purpose of etching.

[0004] Therefore, there is an urgent need for a device for controlling tungsten filament etching, which can control the generation and stability of bias voltage and meet the process requirements of tungsten filament etching. Summary of the invention

[0005] In order to solve the above technical problems, the present invention provides a device for controlling tungsten wire etching, the device comprising: a tungsten wire current control module, a furnace body module and a furnace body power supply module;

[0006] The tungsten wire current control module is used to adjust the current flowing through the tungsten wire according to the actual current of the furnace power supply module;

[0007] The furnace body module is connected to the tungsten wire current control module, and the working gas in the furnace body etches the tungsten wire under the action of bias voltage;

[0008] The furnace power supply module is connected to the furnace module and is used to provide voltage to the furnace to form a bias voltage required for tungsten filament etching.

[0009] Furthermore, the device also includes a tungsten filament current backup control module, which is used to adjust the current flowing through the tungsten filament according to the actual current of the furnace power supply module when the tungsten filament current control module is abnormal and cannot work normally.

[0010] Further, the tungsten filament current control module includes a smart meter, a power regulator, a first transformer, a diode, a first contactor, a tungsten filament and an electrode;

[0011] The smart electric meter is used to automatically record the amount of electricity consumed;

[0012] The power regulator is connected to the smart meter and adjusts the current flowing through the tungsten wire according to the actual current of the furnace power supply module;

[0013] The first transformer is connected to the power regulator and is used to amplify the current and regulate the current flowing through the tungsten filament;

[0014] The two ends of the diode are respectively connected to the first contactor and the furnace power supply module, and are used to control the reverse current output by the tungsten filament current control module to not be input into the furnace power supply module;

[0015] The two ends of the first contactor are respectively connected to the diode and the intermediate voltage terminal of the secondary winding of the first transformer, and the on-off of the furnace power supply module and the tungsten filament current control module is controlled by the first contactor;

[0016] The two ends of the tungsten wire are connected to the electrodes respectively. The electrode at one end of the tungsten wire is connected to the lowest voltage terminal of the secondary winding of the first transformer, and the electrode at the other end of the tungsten wire is connected to the highest voltage terminal of the secondary winding of the first transformer.

[0017] Furthermore, the furnace power supply module includes a second transformer and an anode power supply;

[0018] The second transformer is used to adjust the input voltage to 220V;

[0019] Two ends of the anode power supply are respectively connected to the second transformer and the furnace body module to provide direct current for the furnace body.

[0020] Further, the furnace module includes a second contactor and a furnace;

[0021] The two ends of the second contactor are respectively connected to the anode power supply and the furnace body, and the on and off of the furnace body power supply module and the furnace body module are controlled by the second contactor;

[0022] The furnace body is filled with working gas, and the tungsten wire and the electrode are arranged in the furnace body, and the electrode does not contact the inner wall of the furnace body.

[0023] Furthermore, the power regulator adjusts the current flowing through the tungsten wire according to the actual current of the furnace power supply module, specifically including:

[0024] Set the target current of the anode power supply according to the process requirements of tungsten filament etching;

[0025] The actual current of the anode power supply is obtained as the actual current of the furnace power supply module, and the ratio of the difference between the actual current of the anode power supply and the target current to the target current is calculated as the anode power supply current error value;

[0026] Compare the current error value with the first threshold in real time:

[0027] If the current error value does not exceed the first threshold value, the current flowing through the tungsten filament is adjusted by a PID algorithm;

[0028] If the current error value is greater than the first threshold value, the current flowing through the tungsten filament is adjusted through the big data model.

[0029] Furthermore, when the current flowing through the tungsten filament is adjusted by the PID algorithm, if the current error value is greater than the first threshold value, the current flowing through the tungsten filament is adjusted by the big data model, and the current error value is compared with the first threshold value in real time;

[0030] If the current error value continues to be greater than the first threshold value within a preset time period, the tungsten filament current control module switches to the tungsten filament current backup control module, and the tungsten filament current backup control module adjusts the current flowing through the tungsten filament according to the actual current of the furnace power supply module.

[0031] Furthermore, the current flowing through the tungsten wire is adjusted by the PID algorithm, and the calculation formula is:

[0032] u(t) = K p × e(t)+T i ×(∫e(t)dt) + T d × (de(t) / dt);

[0033] Where u(t) represents the current flowing through the tungsten wire at time t, k p is the proportionality constant, T i is the integration constant, T d is a differential constant, e(t) represents the current error value of the anode power supply at time t, ∫e(t)dt represents the integral of the current error value e(t) from time 0 to time t, and de(t) / dt represents the derivative of the current error value e(t) with respect to time t.

[0034] Furthermore, the adjusting the current flowing through the tungsten wire by using the big data model specifically includes:

[0035] Obtain the argon pressure a1, hydrogen pressure a2, tungsten wire internal resistance a3, distance a4 from the tungsten wire to the inner wall of the furnace body, tungsten wire length a5, furnace body internal temperature a6, and anode power supply current a7 in the furnace body;

[0036] The target current flowing through the tungsten wire is calculated using the following formula using the big data model:

[0037] Y=K1×a1+K2×a2+K3×a3+K4×a4+K5×a5+K6×a6+K7×a7;

[0038] Among them, Y represents the target current flowing through the tungsten filament, K1 is the proportional constant of argon gas pressure, K2 is the proportional constant of hydrogen gas pressure, K3 is the proportional constant of tungsten filament internal resistance, K4 is the proportional constant of the distance from tungsten filament to the inner wall of furnace body, K5 is the proportional constant of tungsten filament length, K6 is the proportional constant of furnace internal temperature, and K7 is the proportional constant of anode power supply current.

[0039] Furthermore, the first threshold is 20%.

[0040] The embodiments of the present invention have the following technical effects:

[0041] The present invention provides a device for controlling tungsten wire etching, comprising: a tungsten wire current control module, a furnace module and a furnace power supply module; the tungsten wire current control module is used to adjust the current flowing through the tungsten wire according to the actual current of the furnace power supply module; the working gas in the furnace performs tungsten wire etching under the action of bias voltage; the furnace power supply module is connected to the furnace module, and is used to provide voltage to the furnace to form the bias voltage required for tungsten wire etching. Through the device, the current flowing through the tungsten wire is adjusted according to the actual current of the furnace power supply module, and a stable bias voltage is formed between the furnace and the tungsten wire, thereby improving the process level of tungsten wire etching. BRIEF DESCRIPTION OF THE DRAWINGS

[0042] In order to more clearly illustrate the specific implementation methods of the present invention or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0043] Figure 1 It is a schematic diagram of a device for controlling tungsten filament etching provided by an embodiment of the present invention.

[0044] 1. Smart meter; 2. Power conditioner; 3. First transformer; 4. Diode; 5. First contactor; 6. Second transformer; 7. Anode power supply; 8. Second contactor; 9. Tungsten wire; 10. Electrode; 11. Furnace body. DETAILED DESCRIPTION

[0045] In order to make the purpose, technical solution and advantages of the present invention clearer, the technical solution of the present invention will be described clearly and completely below. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work belong to the scope of protection of the present invention.

[0046] Etching in PVD equipment requires the preparation of active ions, and then the bias voltage bombards the ions to the cathode workpiece to achieve the purpose of etching. Therefore, the tungsten filament etching method in this application is to energize the tungsten filament so that the tungsten filament carries a large number of active electrons, and then the direct current of the anode power supply applies an electric field to allow the electrons on the tungsten filament to collide with the working gas in the vacuum chamber and ionize into ions. According to the above theory, we have concluded that after the anode power supply normally outputs a stable voltage, the current of the anode power supply is only related to the working gas concentration and ambient temperature in the furnace body and the current flowing through the tungsten filament. However, if the gas concentration or ambient temperature is changed during normal production, it will have other serious effects on the process. Therefore, we control the current flowing through the tungsten filament to achieve the purpose of stabilizing the anode power supply current. However, in fact, the tungsten filament is a relatively unstable device, so the PLC algorithm and big data model in this application are used to stabilize the device to achieve the purpose of stable etching.

[0047] Figure 1 Schematic diagram of a device for controlling tungsten wire etching provided by an embodiment of the present invention, such as Figure 1 As shown, the device comprises: a tungsten filament current control module, a furnace body module and a furnace body power supply module;

[0048] The tungsten wire current control module is used to adjust the current flowing through the tungsten wire according to the actual current of the furnace power supply module;

[0049] The purpose of the current flowing through the tungsten filament is similar to controlling the concentration and ratio of the electrolyte in the battery. By controlling the current of the tungsten filament, the amount of electrons on the tungsten filament can be controlled.

[0050] The furnace body is filled with working gas, such as argon, etc. The tungsten wire current is controlled to be large, and the anode power supply is connected to the furnace body. Voltage is applied to the furnace body. There is a voltage difference, that is, deviation, between the furnace body and the tungsten wire, which will discharge, causing the working gas to be broken down and ionized, which is equivalent to being turned on, forming a current of charged particles, and using charged particles for cleaning.

[0051] The ultimate goal of this application is to make the anode power supply 7 generate a stable current, so as to stabilize the concentration of charged particles in the furnace. In order to make the anode power supply 7 generate a stable current and form a stable internal resistance between the tungsten wire and the furnace, the power regulator 2 is used to achieve this.

[0052] Furthermore, the tungsten filament current control module includes a smart meter 1, a power regulator 2, a first transformer 3, a diode 4, a first contactor 5, a tungsten filament 9 and an electrode 10;

[0053] The smart electric meter 1 is used to automatically record the amount of electricity consumed;

[0054] The power regulator 2 is connected to the smart meter 1 and adjusts the current flowing through the tungsten filament according to the actual current of the furnace power supply module. This is also the key to achieving tungsten filament current regulation in this application.

[0055] Furthermore, the power regulator 2 adjusts the current flowing through the tungsten wire according to the actual current of the furnace power supply module, specifically including:

[0056] The target current of the anode power supply 7 is set according to the process requirements of the tungsten wire etching;

[0057] The actual current of the anode power supply 7 is obtained as the actual current of the furnace power supply module, and the ratio of the difference between the actual current of the anode power supply 7 and the target current to the target current is calculated as the current error value of the anode power supply 7;

[0058] Compare the current error value with the first threshold in real time:

[0059] Furthermore, the first threshold is 20%. Under the premise of meeting the requirements of the processing technology, the current error value is not greater than 20%, which can be considered to have an acceptable impact on the process, while taking into account the processing efficiency and quality requirements.

[0060] If the current error value does not exceed the first threshold value, the current flowing through the tungsten filament is adjusted by a PID algorithm;

[0061] Furthermore, the current flowing through the tungsten wire is adjusted by the PID algorithm, and the calculation formula is:

[0062] u(t) = K p × e(t)+T i ×(∫e(t)dt) + T d × (de(t) / dt);

[0063] Where u(t) represents the current flowing through the tungsten wire at time t, k p is the proportionality constant, T i is the integration constant, T d is a differential constant, e(t) represents the current error value of the anode power supply at time t, ∫e(t)dt represents the integral of the current error value e(t) from time 0 to time t, and de(t) / dt represents the derivative of the current error value e(t) with respect to time t, that is, the rate of change of the current error.

[0064] If the current error value is greater than the first threshold value, the current flowing through the tungsten filament is adjusted through the big data model.

[0065] Furthermore, the adjusting the current flowing through the tungsten wire by using the big data model specifically includes:

[0066] Obtain the argon pressure a1, hydrogen pressure a2, tungsten wire internal resistance a3, distance a4 from the tungsten wire to the inner wall of the furnace body, tungsten wire length a5, furnace body internal temperature a6, and anode power supply current a7 in the furnace body;

[0067] The target current flowing through the tungsten wire is calculated using the following formula using the big data model:

[0068] Y=K1×a1+K2×a2+K3×a3+K4×a4+K5×a5+K6×a6+K7×a7;

[0069] Among them, Y represents the target current flowing through the tungsten filament, K1 is the proportional constant of the argon gas pressure, K2 is the proportional constant of the hydrogen gas pressure, K3 is the proportional constant of the internal resistance of the tungsten filament, K4 is the proportional constant of the distance from the tungsten filament to the inner wall of the furnace body, K5 is the proportional constant of the tungsten filament length, K6 is the proportional constant of the internal temperature of the furnace body, and K7 is the proportional constant of the current of the anode power supply. K1 to K7 are obtained by statistics and fitting of a large amount of historical data. For example, by controlling the variables, that is, controlling K2-K7 unchanged, only changing K1, and then adjusting to a suitable Y value, under the target current of the tungsten filament, the actual anode power supply current will reach 80% of the set value.

[0070] The PID algorithm can be used to accurately adjust the current flowing through the tungsten wire, but the adjustment efficiency is relatively low. When the current error value is greater than the first threshold, in order to ensure the continuity of processing, the current flowing through the tungsten wire is adjusted through a big data model to achieve rapid adjustment of the current flowing through the tungsten wire.

[0071] If the current error value continues to be greater than the first threshold value within the preset time period, it is determined that an abnormal situation such as sparking or tungsten filament fusing has occurred, and the system switches to the tungsten filament current backup control module, triggers an early warning, and confirms and repairs the fault manually or by other positioning means. The tungsten filament current backup control module first adjusts the current flowing through the tungsten filament through the big data model. The current error value is monitored in real time. When the current error value does not exceed the first threshold value, the system switches to the PID algorithm to adjust the current flowing through the tungsten filament.

[0072] Exemplarily, the preset time period may be 1 minute or 30 seconds, which may be set according to actual processing requirements.

[0073] The first transformer 3 is connected to the power regulator 2 and is used to amplify the current and regulate the current flowing through the tungsten filament. The power at both ends of the transformer is constant. The voltage is reduced from 220V to 75V through the first transformer 3. When the voltage is reduced, the current is amplified, thereby achieving the regulation of the current flowing through the tungsten filament.

[0074] The two ends of the diode 4 are respectively connected to the first contactor 5 and the furnace power supply module, and are used to control the reverse current output by the tungsten filament current control module to not be input into the furnace power supply module;

[0075] The furnace power supply module provides a DC power supply, and its negative pole first passes through the diode 4. Since the negative pole of the DC power supply will eventually be connected to the intermediate voltage terminal of the secondary winding of the first transformer 3 through the first contactor 5, the diode 4 can prevent the reverse current output by the tungsten filament current control module from being input into the DC power supply of the furnace power supply module, thereby ensuring the stable operation of the DC power supply in the system.

[0076] The two ends of the first contactor 5 are respectively connected to the diode 4 and the intermediate voltage terminal of the secondary winding of the first transformer 3, and the on-off of the furnace power supply module and the tungsten wire current control module is controlled by the first contactor 5;

[0077] The two ends of the tungsten wire 9 are connected to the electrodes 10 respectively. The electrode 10 at one end of the tungsten wire 9 is connected to the lowest voltage terminal of the secondary winding of the first transformer 3 , and the electrode 10 at the other end of the tungsten wire 9 is connected to the highest voltage terminal of the secondary winding of the first transformer 3 .

[0078] Exemplarily, the secondary winding middle voltage terminal, the secondary winding minimum voltage terminal and the secondary winding maximum voltage terminal are respectively as follows: Figure 1 As shown in the figure, the first transformer 3 has a 35V terminal in the middle, a 0V terminal near the side of the tungsten filament current backup control module, and a 70V terminal on the side. Furthermore, the device also includes a tungsten filament current backup control module, which is used to adjust the current flowing through the tungsten filament according to the actual current of the furnace power supply module when the tungsten filament current control module is abnormal and cannot work normally. The layout of the tungsten filament current backup control module is the same as that of the tungsten filament current control module, and also includes a smart meter 1, a power regulator 2, a first transformer 3, a diode 4, a first contactor 5, a tungsten filament 9 and an electrode 10. The functions of each part will not be repeated here.

[0079] Because tungsten wire is a consumable material and may break during use, the tungsten wire current backup control module also has a backup design for the tungsten wire part. Through the first contactor 5, the furnace power supply module is connected to the tungsten wire current control module or the tungsten wire current backup control module.

[0080] Furthermore, when the current flowing through the tungsten filament is adjusted by the PID algorithm, if the current error value is greater than the first threshold value, the current flowing through the tungsten filament is adjusted by the big data model, and the current error value is compared with the first threshold value in real time;

[0081] If the current error value continues to be greater than the first threshold value within a preset time period, the tungsten filament current control module switches to the tungsten filament current backup control module, and the tungsten filament current backup control module adjusts the current flowing through the tungsten filament according to the actual current of the furnace power supply module.

[0082] The furnace body module is connected to the tungsten wire current control module, and the working gas in the furnace body etches the tungsten wire under the action of bias voltage;

[0083] Further, the furnace module includes a second contactor 8 and a furnace body 11;

[0084] The two ends of the second contactor 8 are respectively connected to the anode power supply 7 and the furnace body 11, and the second contactor 8 is used to control the on and off of the furnace power supply module and the furnace body module;

[0085] The furnace body 11 is filled with working gas, and the tungsten wire 9 and the electrode 10 are arranged in the furnace body 11 , and the electrode 10 does not contact the inner wall of the furnace body 11 .

[0086] For example, the second contactor 8 can be designed as a double device, and the second contactor 8 controls whether the anode power supply 7 is connected to the furnace body 11 or to the target seat in the furnace body: Figure 1 The second contactor 8 on the right side connects the anode power supply 7 to the furnace body 11, that is, the tungsten wire is etched by the physical vapor deposition process described above, which is recorded as the first etching method. Figure 1 The second contactor 8 on the left side connects the anode power supply 7 to the target seat in the furnace body, which is recorded as the second etching method. This method forms a stable electric field between the tungsten wire and the target seat. When etching is performed in the same way, ionized high-energy particles will be formed between the target seat and the tungsten wire. Compared with the first etching method, this etching method has higher uniformity, but the etching effect is relatively weak.

[0087] The specific connection method to be used needs to be determined according to the process requirements. For some processes with weak etching effects but high uniformity requirements, the second etching method will be used. For those that require stronger etching effects, the first etching method is generally used.

[0088] The furnace power supply module is connected to the furnace module and is used to provide voltage to the furnace to form a bias voltage required for tungsten filament etching.

[0089] Furthermore, the furnace power supply module includes a second transformer 6 and an anode power supply 7;

[0090] The second transformer 6 is used to adjust the input voltage to 220V. Since China's industrial electricity is three-phase 380V, the second transformer 6 reduces the input 380V voltage to 220V to meet processing needs.

[0091] The two ends of the anode power supply 7 are respectively connected to the second transformer 6 and the furnace module to provide direct current for the furnace. The output is a direct current, and the output current must be stable so that the broken gas forms a current of charged particles with a stable flow.

[0092] It should be noted that the terms used in the present invention are only for describing specific embodiments, rather than limiting the scope of the present application. As shown in the present specification, unless the context clearly indicates an exception, the words "one", "a", "a kind of" and / or "the" do not specifically refer to the singular, but may also include the plural. The terms "include", "comprise" or any other variant thereof are intended to cover non-exclusive inclusion, so that the process, method or device including a series of elements includes not only those elements, but also includes other elements not explicitly listed, or also includes elements inherent to such process, method or device. In the absence of more restrictions, the elements defined by the sentence "include one..." do not exclude the presence of other identical elements in the process, method or device including the elements.

[0093] It should also be noted that the terms "center", "up", "down", "left", "right", "vertical", "horizontal", "inside", "outside", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention. Unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", etc. should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be an indirect connection through an intermediate medium, or it can be a connection between the two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0094] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein by equivalents. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the technical solutions of the embodiments of the present invention.

Claims

1. A device for controlling tungsten wire etching, characterized in that: The device comprises: a tungsten filament current control module, a furnace body module and a furnace body power supply module; The tungsten wire current control module is used to adjust the current flowing through the tungsten wire according to the actual current of the furnace power supply module; The tungsten filament current control module comprises a smart electric meter (1), a power regulator (2), a first transformer (3), a diode (4), a first contactor (5), a tungsten filament (9), and an electrode (10); The smart electric meter (1) is used to automatically record the amount of electricity consumed; The power regulator (2) is connected to the smart electric meter (1) and adjusts the current flowing through the tungsten wire according to the actual current of the furnace power supply module; The first transformer (3) is connected to the power regulator (2) and is used to amplify the current and regulate the current flowing through the tungsten filament; The two ends of the diode (4) are respectively connected to the first contactor (5) and the furnace power supply module, and are used to control the reverse current output by the tungsten filament current control module to not be input into the furnace power supply module; The two ends of the first contactor (5) are respectively connected to the diode (4) and the intermediate voltage terminal of the secondary winding of the first transformer (3), and the on-off of the furnace power supply module and the tungsten filament current control module is controlled by the first contactor (5); The two ends of the tungsten wire (9) are respectively connected to the electrodes (10), the electrode (10) at one end of the tungsten wire (9) is connected to the lowest voltage terminal of the secondary winding of the first transformer (3), and the electrode (10) at the other end of the tungsten wire (9) is connected to the highest voltage terminal of the secondary winding of the first transformer (3); The furnace body module is connected to the tungsten wire current control module, and the working gas in the furnace body etches the tungsten wire under the action of bias voltage; The furnace power supply module is connected to the furnace module for providing voltage to the furnace to form the bias voltage required for tungsten wire etching; The device also includes a tungsten filament current backup control module, which is used to adjust the current flowing through the tungsten filament according to the actual current of the furnace power supply module when the tungsten filament current control module fails to work normally.

2. The device for controlling tungsten wire etching according to claim 1, characterized in that: The furnace power supply module comprises a second transformer (6) and an anode power supply (7); The second transformer (6) is used to adjust the input voltage to 220V; Two ends of the anode power supply (7) are respectively connected to the second transformer (6) and the furnace body module, and are used to provide direct current to the furnace body.

3. The device for controlling tungsten wire etching according to claim 2, characterized in that: The furnace body module comprises a second contactor (8) and a furnace body (11); Two ends of the second contactor (8) are respectively connected to the anode power supply (7) and the furnace body (11), and the on / off connection between the furnace body power supply module and the furnace body module is controlled by the second contactor (8); The furnace body (11) is filled with working gas, and the tungsten wire (9) and the electrode (10) are arranged in the furnace body (11), and the electrode (10) does not contact the inner wall of the furnace body (11).

4. The device for controlling tungsten wire etching according to claim 2, characterized in that: The power regulator (2) regulates the current flowing through the tungsten wire according to the actual current of the furnace power supply module, specifically including: Setting a target current of the anode power supply (7) according to the process requirements of tungsten wire etching; The actual current of the anode power supply (7) is obtained as the actual current of the furnace power supply module, and the ratio of the difference between the actual current of the anode power supply (7) and the target current to the target current is calculated as the current error value of the anode power supply (7); Compare the current error value with the first threshold in real time: If the current error value does not exceed the first threshold value, the current flowing through the tungsten filament is adjusted by a PID algorithm; If the current error value is greater than the first threshold value, the current flowing through the tungsten filament is adjusted through the big data model.

5. The device for controlling tungsten wire etching according to claim 4, characterized in that: If the current error value continues to be greater than the first threshold value within a preset time period, the tungsten filament current control module switches to the tungsten filament current backup control module, and the tungsten filament current backup control module adjusts the current flowing through the tungsten filament according to the actual current of the furnace power supply module.

6. The device for controlling tungsten wire etching according to claim 4, characterized in that: The PID algorithm is used to adjust the current flowing through the tungsten wire. The calculation formula is: u(t) = K p × e(t)+ T i ×(∫e(t)dt) + T d ×(de(t) / dt); Where u(t) represents the current flowing through the tungsten wire at time t, K p is the proportionality constant, T i is the integration constant, T d is a differential constant, e(t) represents the current error value of the anode power supply at time t, ∫e(t)dt represents the integral of the current error value e(t) from time 0 to time t, and de(t) / dt represents the derivative of the current error value e(t) with respect to time t.

7. The device for controlling tungsten wire etching according to claim 4, characterized in that: The method of adjusting the current flowing through the tungsten wire by using the big data model specifically includes: Obtain the argon pressure a1, hydrogen pressure a2, tungsten wire internal resistance a3, distance a4 from the tungsten wire to the inner wall of the furnace body, tungsten wire length a5, furnace body internal temperature a6, and anode power supply current a7 in the furnace body; The target current flowing through the tungsten wire is calculated using the following formula using the big data model: Y=K1×a1+K2×a2+K3×a3+K4×a4+K5×a5+K6×a6+ K7×a7; Among them, Y represents the target current flowing through the tungsten filament, K1 is the proportional constant of argon gas pressure, K2 is the proportional constant of hydrogen gas pressure, K3 is the proportional constant of tungsten filament internal resistance, K4 is the proportional constant of the distance from tungsten filament to the inner wall of furnace body, K5 is the proportional constant of tungsten filament length, K6 is the proportional constant of furnace internal temperature, and K7 is the proportional constant of anode power supply current.

8. The device for controlling tungsten wire etching according to claim 4, characterized in that: The first threshold is 20%.

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