27results about How to "Improve craftsmanship" patented technology

The invention provides a display panel, a preparation method thereof and a display device. The display panel comprises a substrate, an isolation structure, a first packaging layer and an etching barrier layer, wherein the isolation structure is arranged on one side of the substrate, a plurality of isolation openings are defined by the isolation structure, and the isolation openings are used for containing at least part of the light-emitting units; the first packaging layer is arranged on the side, away from the substrate, of the light-emitting unit; the etching barrier layer is arranged on the side, away from the substrate, of the first packaging layer. In the display panel, the first packaging layer and the light-emitting unit below are protected through the etching barrier layer, the thickness of the first packaging layer can be reduced, the production process can be accelerated, the productivity can be released, meanwhile, the photoresist thickness in the preparation process can be reduced, the photoresist stripping condition is reduced, the production efficiency and the product yield are improved, and the production cost is reduced. And the processing property of the display panel is improved.

The application discloses a semiconductor heat treatment equipment, which comprises an inner process pipe, an outer process pipe, a mounting base, an air inlet structure and an air outlet structure. The first end of the inner process pipe and the second end of the inner process pipe are both open, and a reaction space is formed in the region defined by the inner process pipe. The first end of the outer process pipe is open, and the second end of the outer process pipe is closed. The outer process pipe is sleeved outside the inner process pipe, and an annular air inlet cavity is formed between the inner process pipe and the outer process pipe. The mounting base is annular, and the first end of the inner process pipe and the first end of the outer process pipe are both sealingly connected with the mounting base. There is a gap between the second end of the inner process pipe and the inner wall of the second end of the outer process pipe. The air inlet structure is connected with the annular air inlet cavity through an air inlet. The above scheme can solve the problem that the process gas and the process material are not fully contacted in the process of the semiconductor heat treatment equipment in the related art.

This invention provides a liquid metal-based thermal grease, its preparation method, and its application. The liquid metal-based thermal grease comprises the following raw materials in parts by weight: 100 parts liquid metal, 2-5 parts silicone oil, 0.1-20 parts thermally conductive powder filler, and 0.1-3 parts other additives. The high-reliability liquid metal-based thermal grease provided by this invention possesses excellent high thermal conductivity, high processability, and high reliability. It can replace traditional thermal grease to solve the heat dissipation and cooling problem of high-power chips, thereby extending the lifespan of electronic products.

The present application belongs to the technical field of rubber mixing process, and particularly relates to an intelligent process parameter optimization method for rubber mixing. The method comprises the following steps: S1, obtaining production data by using an intelligent mixing AI control platform; S2, extracting training data from the production data, training an AI process learning model, and storing the AI process learning model in the intelligent mixing AI control platform; S3, the intelligent mixing AI control platform sends the trained AI process learning model to an AI intelligent terminal; S4, starting an AI process operation program, collecting mixing process data in real time, inputting the collected data into the trained AI process learning model for optimization of process parameters, and outputting the optimized mixing AI process; S5, an auxiliary machine PLC terminal receives the mixing AI process and sends the mixing AI process to a rubber mixing machine; and S6, the rubber mixing machine executes the mixing AI process. The present application has the characteristics of realizing mixing process automation and intelligentization, and improving quality consistency and production efficiency.

The utility model belongs to the field of semiconductor processing technology discloses valve and vacuum equipment, the drive assembly of valve includes: transverse drive mechanism and longitudinal drive mechanism are connected in main shaft, longitudinal drive mechanism drives main shaft to lift along first direction, transverse drive mechanism drives main shaft to reciprocate along second direction, driving piece is drivenly connected in longitudinal drive mechanism and transverse drive mechanism through limiting mechanism, limiting mechanism is configured as the same time as the vertical height of valve plate and the height of export restricts longitudinal drive mechanism, to make longitudinal drive mechanism and transverse drive mechanism act in turn;Main shaft and transverse drive mechanism between setting up there is restraint mechanism, and the restraint mechanism includes installation groove and restraint piece, and restraint piece is restrictively connected in installation groove along first direction, and restraint piece can reciprocate along second direction.The utility model discloses valve can keep the cleanliness of reaction chamber, improves the running stability, is favorable for reducing the production cost and assembly difficulty of vacuum equipment, and promotes the technological performance.

The application discloses a silicon dioxide deposition coating process of a vertical LPCVD device, and comprises the following steps: S1, checking whether the process pipe leaks; S2, blowing the process pipe with nitrogen gas under low pressure; S3, after the leakage rate detection is qualified, nitrogen gas is blown into the gas path pipeline, so that the pressure and the gas flow of the process pipe are stabilized under the pressure and the gas flow conditions set during film deposition; S4, under the set pressure condition, a reaction gas source is introduced, and a silicon dioxide film is deposited on the surface of a semiconductor substrate; and S5, after the silicon dioxide film deposition is completed, nitrogen gas is blown into the process pipe and the exhaust pipeline, nitrogen gas is introduced to increase the pressure to normal pressure, and the boat is discharged. The application has the advantages of simple operation, good stability, high film uniformity and the like, solves the problems of poor film thickness uniformity, high process granularity, poor repeat stability and extremely harsh requirements on process pressure of the existing LPCVD when depositing a SiO2 film, and realizes high-quality wafer coating.

The embodiment of the invention provides a preparation method of a support plate structure, the support plate structure and a semiconductor packaging structure, and the preparation method of the support plate structure comprises the steps: preparing a conductive column at one side of a first layer-adding assembly along the thickness direction, the first layer-adding assembly comprises a first conductive part, and the first conductive part is electrically connected with the conductive column; preparing a bonding part on one side of the first layer-adding assembly along the thickness direction of the first layer-adding assembly, wherein the bonding part and the conductive column are located on the same side of the first layer-adding assembly; a through hole is formed in the preparation substrate in a penetrating mode, so that a substrate is formed; sleeving the conductive column with the substrate and pressing the substrate on the bonding part; and curing the bonding part. According to the embodiment of the invention, the processing performance of the support plate structure can be improved.

The present disclosure relates to the field of semiconductor and photovoltaic technology, and particularly relates to a process furnace and process equipment, which solves the problem of poor uniformity and stability of the atmosphere around the sheet at different regions in the furnace in the related art, which affects the process effect. The process furnace comprises a furnace body, has at least one process chamber, the process chamber has at least one column of a plurality of gas inlets communicated with the process chamber, the plurality of gas inlets located in the same column are arranged at intervals along a first direction; a gas inlet assembly communicated with the plurality of gas inlets, the gas inlet assembly is configured to guide at least one gas from the communicated gas inlets into the process chamber; a plurality of sets of adjusting assemblies, at least arranged at the gas inlet assembly, each set of adjusting assemblies corresponds to one or a plurality of gas inlets adjacent in the first direction, and each adjusting assembly can independently adjust the gas inlet flow of the corresponding gas inlet. The process furnace and process equipment provided by the present disclosure can improve the uniformity and stability of the atmosphere around the sheet at different regions in the furnace to ensure the process quality.

This invention relates to the field of wet lithium battery recycling technology, specifically to an ultrasonic-assisted wet stripping device for waste lithium battery black powder. The device includes a reaction vessel, a drive mechanism, and a stripping mechanism. The stripping mechanism comprises a stator unit and a rotor unit. The rotor unit includes a filter cylinder and grinding media. The bottom of the filter cylinder has a feed inlet and a spiral blade. The stator unit includes an ultrasonic component and a turbulence component. By constructing a stripping mechanism with the stator and rotor units coaxially nested, the device utilizes the microscopic cavitation effect of ultrasound and the gentle mechanical scrubbing of the grinding media to replace the harsh blade cutting. This solves the problems of insufficient microscopic adhesion and incomplete stripping caused by relying solely on mechanical cutting in existing technologies. Simultaneously, it avoids the problem of excessive pulverization of the current collector, which contaminates the black powder, thus achieving efficient and complete stripping of the black powder and lossless recovery of the current collector.

The application discloses a circuit board manufacturing method and electronic equipment, relates to the technical field of production data collaborative analysis, and first establishes a process influence coupling model based on single-board time sequence data sequences corresponding to a whole production line in a historical production process. The process influence coupling model can quantize the dynamic influence capability of each process on a subsequent quality state. Thus, the fusion weight expressing the influence and causality of each process and the reliability of data can be determined in combination with the process influence coupling model and the reliability of each process data source equipment. In this way, the fusion weight is used to fuse the quality characteristics of each process of the current batch, so that a comprehensive quality characterization vector corresponding to the collaborative state of the whole process is obtained, and a defect propagation path diagram matched with the comprehensive quality characterization vector is constructed. With the aid of the defect propagation path diagram, a target process causing defects of the circuit board can be determined from the production line, and the target process is optimized, so that the overall process performance can be effectively improved.

The invention relates to the technical field of sewage treatment, in particular to a non-stop oxidation ditch-MBR sewage treatment upgrading and reconstruction device and method.The non-stop oxidation ditch-MBR sewage treatment upgrading and reconstruction device comprises an MBR aeration membrane assembly, the MBR aeration membrane assembly is arranged at the bottom of an oxidation ditch and located in front of a water impeller, and the MBR aeration membrane assembly comprises a lower aeration body, a top plate, a membrane assembly, an inner aeration body and an outer aeration body; the two outer aeration bodies are arranged on the two sides of the top end of the lower aeration body respectively, the multiple inner aeration bodies are evenly arranged at the positions, located between the two outer aeration bodies, of the top end of the lower aeration body, the top plate is arranged at the top ends of the two outer aeration bodies and the multiple inner aeration bodies, and the multiple membrane assemblies are evenly arranged between the top plate and the lower aeration body respectively. The inner aeration bodies are separated from one another through a plurality of inner aeration bodies; the inner aeration body and the outer aeration body are arranged in parallel and form an included angle alpha with the X direction of the oxidation ditch; the invention provides a sewage treatment upgrading and reconstruction device and method capable of effectively reducing activated sludge attached to the surface of a membrane and reducing membrane pollution.

This utility model discloses a hydraulic system, specifically relating to the field of hydraulic system technology, including a hydraulic cover plate assembly, a return hose, and a suction hose. The hydraulic cover plate assembly includes: a cover plate body; a filler pipe fixedly installed on the cover plate body, with a filler cap fixedly installed at the top of the filler pipe; a suction steel pipe fixedly installed on the cover plate body, with a suction filter fixedly installed at one end of the suction steel pipe and the other end of the suction steel pipe fixedly connected to one end of the suction hose; and a return steel pipe fixedly installed on the cover plate body, with a return oil filter fixedly installed at one end of the return steel pipe and the other end of the return steel pipe fixedly connected to one end of the return hose. This utility model integrates the suction steel pipe and the return steel pipe onto the cover plate body of the hydraulic cover plate assembly, enabling the hydraulic cover plate assembly to perform both suction, return, and filtration functions. When welded together, it improves manufacturability, assemblability, and ease of maintenance.

The application relates to the technical field of bridge erecting machines and discloses an integrated flow distribution valve group arranged in a pump station and comprising m oil inlets, each of which is connected with different control oil paths; n oil outlets, the distal ends of the oil pipes connected with each oil outlet being total oil inlets, the total oil inlets being connected to adjacent execution groups; m*n one-way valves, each oil inlet being connected to n oil outlets through n parallel pipelines, and n one-way valves being arranged in the n parallel pipelines one by one; and front-end oil pipes of all the one-way valves corresponding to one oil inlet meeting in the valve group, and rear-end oil pipes of all the one-way valves corresponding to one oil outlet meeting in the valve group. The integrated flow distribution valve group solves the problems of too long total length of oil pipes and poor pipe arrangement process in the traditional oil pipe arrangement scheme.

This invention discloses a pipeline lead-out structure, a casing, and an aero-engine. The pipeline lead-out structure includes a lead-out sleeve for connecting the interior and exterior of the casing and a mounting base for mounting on the outer casing. A stepped hole is formed through the mounting base along the height direction. A floating ring is fitted with the small-diameter hole of the stepped hole with clearance. A first frustum protrudes radially from the outer side of the floating ring at its upper end along the height direction, fitting with the large-diameter hole of the stepped hole with clearance. A cover plate is provided on the mounting base to restrict the movement of the floating ring along the height direction. One end of the lead-out sleeve is located on the inner casing, and the other end is fitted with the inner hole of the floating ring with clearance, extending to the outside of the outer casing for external pipeline connection. A first sealing ring is provided between the lead-out sleeve and the inner hole of the floating ring. This invention achieves installation compensation and compensation for the radial offset of the lead-out sleeve due to thermal expansion between the inner and outer casings, reducing the positional accuracy requirements of the lead-out sleeve's mounting hole.

This invention discloses a method for vanadium extraction by co-roasting vanadium slag with plant ash extract. This invention utilizes plant ash extract as an additive to replace NaCl, and replaces traditional sodium roasting with potassium roasting for vanadium extraction. This completely eliminates the environmental pollution caused by traditional vanadium extraction processes. Furthermore, this invention achieves a vanadium leaching rate as high as 98%, ensuring high vanadium leaching even when completely replacing NaCl as an additive. In addition, using plant ash extract as an additive offers the advantages of readily available and inexpensive raw materials compared to NaCl.

The application discloses a high-reliability long-service-life air intake passage co-sulfurization sealing structure of an aero-engine, which comprises a bypass door flange and a rubber sealing ring, the bypass door flange comprises a first rubber plate and a second rubber plate, and the first rubber plate and the second rubber plate are connected through an air inlet channel and a rubber column; the rubber sealing ring comprises a first clamping portion and a second clamping portion, the second clamping portion comprises a second outer clamping portion, and a sawtooth portion is arranged on the second outer clamping portion. The connecting mode of the rubber sealing ring is changed to co-sulfurization with metal parts, so that the structure glue or fasteners and the like are reduced, the delicate process performance of the sealing rubber part and the bypass door is effectively improved, and the grade of the product is improved. The product appearance and delicate process performance are ensured, and the rubber sealing reliability is improved.

The application discloses a cigarette production silk production key equipment process performance analysis and evaluation method, comprising the following steps: determining process tasks and control systems of each process of a cigarette production silk production line; determining multi-level equipment performance evaluation items of each process; classifying and testing the equipment performance evaluation items; respectively performing equipment performance evaluation on each process according to the equipment performance evaluation item classification and testing method; if the equipment performance evaluation result meets the requirement, respectively performing index carding and classification on each process according to the process parameters, and respectively performing process performance evaluation on each process according to the process index classification result; if the equipment performance evaluation result does not meet the requirement, performing maintenance on the process equipment with a lower evaluation result, and then returning to the equipment performance evaluation step. The cigarette production silk production key equipment process performance analysis and evaluation method can improve the equipment process performance, guarantee the product processing quality consistency and improve the fine processing production level.

The present application relates to a kind of novel light color alkali-resistant and hydrogen peroxide immersion roller, including outer rubber layer and internal core, the outer rubber layer is wrapped in the outside of internal core;The outer rubber layer includes component by weight fraction: chlorosulfonated polyethylene rubber, 70~90 parts;Ethylene-propylene-diene rubber, 10~30 parts;Iron red, 5~8 parts;Red lead, 10~20 parts;Reinforcing agent, 50~80 parts;Vulcanizing agent, 3 parts;Accelerator, 2~3 parts;Plasticizer, 10 parts;Antioxidant, 1~1.5 parts;Extrusion dispersing agent, 3 parts, the advantage of the present application is that other auxiliary materials and extrusion dispersing agent are matched, the Mooney viscosity of compound is reduced, the process performance of compound in the process of forming extrusion is improved, the high temperature resistance, alkali resistance, hydrogen peroxide resistance, chemical medium resistance and other properties of immersion roller are improved, thereby prolonging the service life.

The application provides a longitudinal ring band reinforced form composite cabin section forming die and a forming method thereof, which comprises a core die, a split male die, an outer female die, a mouth frame pressing tool, an upper end frame pressing ring, a lower end frame pressing ring and a base. The core die is arranged in the center of the forming die and fixed on the base. The split male die is wrapped on the outer wall of the core die. A reinforcing ring groove is arranged on the split male die along the longitudinal direction and the circumferential direction. The mouth frame pressing tool is arranged on the outer side of the split male die. The upper end frame pressing ring is horizontally fixed on the upper end surface of the core die. The lower end frame pressing ring is horizontally fixed on the bottom surface of the core die. The outer female die is wrapped on the outer wall of the split male die. The cabin section has the consistency of the overall performance and quality, and the structure has high dimensional position precision, better surface state and good rigidity and bearing capacity.

The utility model relates to the technical field of bonding auxiliary device especially relates to a kind of glue spreading device for bonding silicon rod and slicing machine resin plate, including handle and the glue spreading strip of fixed connection on handle, the width direction of glue spreading strip one side side is first arc surface, and first arc surface adapts the arc of resin plate to form first glue spreading face;Wherein, glue storage chamber of storing adhesive is formed in handle, output channel is formed in glue spreading strip, glue outlet is set on first arc surface, output channel can be respectively connected glue storage chamber and glue outlet;When reaching threshold value after pressurizing to glue storage chamber, glue outlet can output adhesive, its beneficial effect is that the bonding efficiency and quality between silicon rod and slicing machine resin plate can be significantly improved.The device integrates handle and glue spreading strip, and realizes the accurate delivery and smearing of adhesive by built-in glue storage chamber and output channel.

The invention relates to the technical field of sewage treatment, in particular to an MBR sewage treatment device and method.The MBR sewage treatment device comprises a top plate, a bottom plate, a first aeration device, a second aeration device, a third aeration device, a first fixing chain, a fixing frame, an MBR aeration membrane assembly, a lower aeration body and a second fixing chain; the fixing frame is supported at the bottom of the oxidation ditch; the bottom plate is connected below the top plate through a first fixing chain, and the four groups of MBR aeration membrane assemblies are arranged between the top plate and the bottom plate and are respectively and sequentially sleeved on the outer side of the first aeration device, between the first aeration device and the second aeration device, between the second aeration device and the third aeration device and on the inner side of the third aeration device from outside to inside; the lower aeration body is arranged at the bottom of the oxidation ditch, and the top end of the lower aeration body is connected with the bottom end of the bottom plate through a second fixing chain. The MBR sewage treatment device and method can effectively reduce activated sludge attached to the membrane surface.

The invention discloses a halogen-free flame-retardant high-adhesion epoxy structural adhesive film as well as a preparation method and application thereof. The preparation method comprises the following steps: reacting phosphorus-containing polyol with general-purpose diisocyanate to obtain an isocyanate-terminated polyurethane prepolymer, then adding liquid epoxy resin, in the presence of a catalyst, initiating a ring-opening reaction between isocyanate and an epoxy group to generate an oxazolidinone heterocyclic ring, and then introducing cardanol modified linear phenolic resin to react with the epoxy group to obtain the oxazolidinone modified phenolic resin. And finally, uniformly mixing the modified epoxy resin with a latent curing system, and coating a film, so as to prepare the halogen-free flame-retardant high-adhesion epoxy structural adhesive film. The preparation process is reasonable, the flame retardance and heat resistance of the adhesive film are improved through the synergistic flame retardant effect of phosphorus-nitrogen and the synergistic effect of phenolic resin while the excellent processing property of the adhesive film is guaranteed, and the adhesive property of a resin system is improved through the synergistic effect of a strong-polarity carbamate structure and the modified linear phenolic resin.

The invention relates to the technical field of semiconductor packaging, in particular to a welding flux tray, an SMT welding flux infiltrating device, an SMT bonding machine and a flip chip surface mounting method. Different depths of different accommodating areas in a welding flux accommodating groove of the welding flux tray correspond to different convex point heights in a plurality of flip chips to be mounted; therefore, when flip chips with various bump heights need to be bonded in a single package, and the bumps of the flip chips are immersed into the soldering flux in the soldering flux accommodating groove, the flip chips with different bump heights correspond to accommodating areas with different depths in the soldering flux accommodating groove, so that the equipment comprehensive efficiency (OEE) and the productivity are improved.

One embodiment of the present disclosure provides a slit mold coating apparatus that discharges a slurry onto a current collector to form a coating layer, the slit mold coating apparatus including: a slit mold unit including a first mold block and a second mold block on the first mold block, a first mold block and a second mold block, and including a flow path through which slurry flowing between the first mold block and the second mold block flows; and a load adjusting unit located on at least one of the first mold block and the second mold block and adjusting a width of the flow path, in which the load adjusting unit includes: a shape changing unit facing the flow path; a pressing unit that adjusts a pressure applied to the shape changing unit to change a shape of the shape changing unit; and a connecting unit that connects the pressing unit and the shape changing unit.

The utility model discloses a cab corner closed structure and car, including side plate, car neck box, front wall, side plate, car neck box, front wall are located one end of its connecting angle point and are equipped with flanging, and multiple flange can partially or completely cover the angle point of side plate, car neck box, front wall junction. In the utility model, through being equipped with flanging at side plate, car neck box, front wall are located one end of its connecting angle point, and make all flange can partially or completely cover the angle point of side plate, car neck box, front wall junction, thereby avoid appearing the hole of cab angle point, improved the air tightness of car, reduced the car noise.

The application belongs to the field of semiconductor MEMS device processing, and particularly relates to a structure-assisted electromagnetic MEMS micromirror processing method, which improves the problems of high processing complexity and high processing cost existing in the prior art. By using the schemes of selective silicon-silicon bonding after local roughening, thick silicon MEMS processing technology based on conventional silicon-silicon bonding, fusion of high-precision laser cutting in the MEMS processing flow, increase of temporary support and heat dissipation structure and the like, the dependence of the MEMS micromirror processing process on the temporary bonding and debonding equipment and technology required for wafer processing can be reduced, the machine time occupation of the single crystal silicon dry etching equipment is reduced, the processing cost is controlled, the mutual compatibility of each single-step process in the process flow is improved, the processing can be realized only by using the combination of conventional equipment and its process, the complexity of the processing process is reduced, the processing cost is reduced, and the electromagnetic MEMS micromirror has good manufacturability.

The invention discloses an array substrate, a preparation method thereof and a display panel. The array substrate comprises a substrate, a first transistor and a second transistor. The first transistor located in the middle area comprises a first active layer, and the material of the first active layer comprises oxide. The second transistor in the side region comprises a second active layer, and the material of the second active layer comprises silicon, that is, the middle region is an oxide transistor, and the side region is a silicon transistor. Transistors of different materials are designed in different areas, when scanning crystallization is carried out on the array substrate, selective scanning silicon transistor areas, namely selective scanning side edge areas and middle areas, can rapidly pass through in the scanning process, the production takt is effectively improved, the effect of reducing the process operation cost and the production cost is achieved, and the production efficiency is improved. Therefore, the processing property of a display product is improved.