The best method for selecting the cutting direction when removing scratches by magnetorheological polishing
By extracting the scratch position coordinates on the optical element and fitting the curve, calculating the maximum cumulative scratch length in the direction of the normal vector, and determining the optimal feed direction for magnetorheological polishing, the problem of low scratch removal efficiency for large-diameter optical elements is solved. problem, achieving efficient scratch removal and shortening of the manufacturing cycle.
Patent Information
- Application Number
- CN202411416938.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-11
- Publication Date
- 2025-01-21
- Estimated Expiration
- 2044-10-11
AI Technical Summary
The existing magnetorheological polishing technology is less efficient when removing scratches from large-diameter optical components, and the contactless removal technology has limitations on large-diameter optical components.
The defect detection unit extracts the scratch position coordinates on the optical element, obtains the scratch curve by fitting, calculates the maximum cumulative scratch length in the normal vector direction, and determines the optimal feed direction during magnetorheological polishing.
The efficiency of scratch removal by magnetorheological polishing is improved, especially on large-diameter optical components, which shortens the processing cycle and reduces manufacturing costs.
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Figure CN118905736B_ABST
Abstract
Description
Technical Field
[0001] The invention belongs to the technical field of optical element processing, and in particular relates to a method for selecting an optimal feed direction when removing scratches through magnetorheological polishing. Background Art
[0002] During the manufacturing, transportation and even use of large-aperture optical components, scratches are always inevitable. Scratches will reduce the laser damage threshold of high-intensity laser systems and increase the scattering loss of imaging optical systems. They must be removed or suppressed.
[0003] Existing scratch removal methods include contact removal methods and non-contact removal methods. The most commonly used contact removal method is magnetorheological polishing technology, and non-contact removal methods include HF (hydrogen fluoride) etching technology, plasma etching technology, etc. HF etching technology and plasma etching technology will generate reaction products in the process of removing scratches, which will limit the improvement of the laser damage threshold of optical components. In addition, this non-contact removal technology is currently not available for large-caliber optical components, and is limited in removing scratches on large-caliber optical components.
[0004] Magnetorheological polishing technology is popular for its flexible removal mechanism and the fact that it does not introduce new scratches. However, due to the random feed direction, random scratch distribution, and irregular shape of the scratches, the efficiency of scratch removal is low. Especially when removing scratches from large-diameter optical components, it takes a long time to traverse the entire optical component due to the huge surface area, which greatly increases the manufacturing cycle of the optical component. Summary of the invention
[0005] In view of this, the invention aims to provide a method for selecting the best feed direction when removing scratches by magnetorheological polishing, extracting the position coordinates of scratches on large-caliber optical components by a defect detection unit, and then fitting the position coordinates to obtain a scratch curve, solving the normal vector based on the scratch curve, and then calculating the maximum cumulative scratch length in the direction of the normal vector, and determining the best feed direction during magnetorheological polishing according to the length of the normal vector cumulative scratches in each direction. The invention helps to improve the efficiency of removing scratches on optical components.
[0006] To achieve the above object, the technical solution created by the present invention is implemented as follows:
[0007] A method for selecting an optimal feed direction when removing scratches by magnetorheological polishing comprises the following steps:
[0008] S1: Setting a defect detection unit at the tool end of a magnetorheological polishing driving unit, and setting an optical element for scratches to be detected within a detection range of the defect detection unit;
[0009] S2: Control the defect detection unit to extract the scratch position coordinates on the optical element, and then fit the scratch position coordinates to obtain a scratch curve;
[0010] S3: Calculate the cumulative scratch length within the same direction range of the normalized normal vector of each point on the scratch curve, and the normalized normal vector direction corresponding to the longest cumulative scratch length is the optimal feed direction;
[0011] S4: replace the defect detection unit with a magnetorheological polishing module and install it on the tool end of the magnetorheological polishing drive unit; measure the surface error and magnetorheological removal function of the optical element, and calculate the dwell time when processing the optical element;
[0012] S5: Control the magnetorheological polishing module to perform full-aperture processing on the optical component according to the optimal feed direction and dwell time.
[0013] Further, step S2 includes the following steps:
[0014] S21: Calculate the distance between adjacent points on each scratch according to the scratch position coordinates, and then obtain the normalized cumulative arc length of each point on each scratch;
[0015] S22: setting the B-spline order of the fitting, and calculating the B-spline control points according to the normalized cumulative arc length of each point on each scratch;
[0016] S23: setting a B-spline node vector, and performing B-spline fitting in combination with the B-spline order and the B-spline control points to obtain a scratch curve of each scratch.
[0017] Furthermore, in step S21, the distance between adjacent points on each scratch is calculated by the following formula, namely:
[0018] ;
[0019] in, represents the distance between the i-th point and the i-1-th point in the k-th scratch, represents the position coordinates of the i-th point of the k-th scratch, represents the position coordinates of the i-1th point of the kth scratch, , n represents the total number of points on each scratch;
[0020] According to distance Get the cumulative arc length of each point on each scratch :
[0021] ;
[0022] Where j represents the number of points on each scratch;
[0023] The cumulative arc length of each point on each scratch is calculated by the following formula Perform normalization to obtain the normalized cumulative arc length of each point on each scratch :
[0024] .
[0025] Further, in step S22, the normalized cumulative arc length of each point on each scratch is calculated by the following formula: The corresponding fitting position coordinates :
[0026] ;
[0027] in, , m represents the number of B-spline control points, M represents the maximum number of B-spline control points, and p represents the B-spline order. represents the mth B-spline control point when fitting the kth scratch, represents the B-spline basis function of the m-th B-spline control point under the B-spline order p when fitting the k-th scratch;
[0028] The position coordinates of the i-th point of the k-th scratch are calculated by the following formula: The corresponding fitting position coordinates The gap between E:
[0029] ;
[0030] Minimize the above formula to get the B-spline control point when fitting the k-th scratch .
[0031] Further, in step S23, the B-spline node vector u is:
[0032] ;
[0033] At this time, each scratch curve is obtained :
[0034] .
[0035] Furthermore, in step S3:
[0036] Find each scratch curve The derivative of , and each scratch curve is obtained The tangent vector ,Right now:
[0037] ;
[0038] Find the tangent vector of each scratch The derivative of , and each scratch curve is obtained The normal vector ,Right now:
[0039] ;
[0040] Normal vector Normalize to get the normalized normal vector ,Right now:
[0041] ;
[0042] Calculate the cumulative scratch length within the same direction range of each normalized normal vector, that is:
[0043] ;
[0044] in, represents the position coordinates of the ath point on the kth scratch, Indicates the position coordinates of the bth point on the kth scratch, the normalized normal vector of the ath point and the normalized normal vector of the bth point are in the same direction; Represents the cumulative scratch length between the a-th point and the b-th point on the k-th scratch; the cumulative scratch length within the same direction range of the normalized normal vectors of all points is calculated by the above formula.
[0045] Furthermore, the same direction range is, the angle between the normalized normal vector of the a-th point and the normalized normal vector of the b-th point is .
[0046] Further, in step S4, the surface error E is measured by interferometer. 0 , and the magnetorheological polishing module is used to process the test piece made of the same material as the optical element to obtain the magnetorheological removal function RF; the residence time T is obtained by the following formula:
[0047] ;
[0048] in, Represents convolution calculation.
[0049] Compared with the prior art, the invention can achieve the following beneficial effects:
[0050] In the method for selecting the best feed direction when removing scratches by magnetorheological polishing created by the present invention, the scratch position coordinates of the full-aperture optical surface are extracted by the defect detection unit carried by the magnetorheological polishing drive unit, and then the position coordinates are formed into a curve, and then the cumulative scratch length under the same direction range of the normal vector of each point is calculated, and the normal vector direction with the longest cumulative scratch length is used as the feed direction of magnetorheological polishing. Compared with the traditional method, the method proposed by the present invention can maximize the efficiency of magnetorheological polishing in removing scratches, especially when removing scratches on the surface of large-aperture optical components. The method proposed by the present invention has significant advantages in improving the post-processing efficiency of high-power laser optical components and reducing manufacturing costs. BRIEF DESCRIPTION OF THE DRAWINGS
[0051] The drawings constituting part of the present invention are used to provide a further understanding of the present invention. The exemplary embodiments and descriptions of the present invention are used to explain the present invention and do not constitute an improper limitation on the present invention. In the drawings:
[0052] Figure 1 A schematic flow chart of a method for selecting an optimal feed direction when removing scratches by magnetorheological polishing according to an embodiment of the present invention;
[0053] Figure 2 A schematic diagram of the detection and use of the method for selecting the best feed direction when removing scratches by magnetorheological polishing according to an embodiment of the present invention;
[0054] Figure 3 To create a motion trajectory of the defect detection unit described in the embodiment of the present invention;
[0055] Figure 4 It is a schematic diagram of vertical removal and parallel removal;
[0056] Figure 5 A schematic diagram of selecting the best feed direction according to an embodiment of the present invention;
[0057] Figure 6 A schematic diagram of the processing and use of the method for selecting the best feed direction when removing scratches by magnetorheological polishing described in an embodiment of the present invention.
[0058] Description of reference numerals:
[0059] 1. Magnetorheological polishing drive unit; 2. Defect detection unit; 3. Optical element; 4. Support platform; 5. Magnetorheological polishing module. DETAILED DESCRIPTION
[0060] In order to make the purpose, technical solution and advantages of the invention more clear, the invention is further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described here are only used to explain the invention and do not constitute a limitation of the invention.
[0061] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments may be combined with each other.
[0062] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention. In addition, the terms "first", "second", etc. are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as "first", "second", etc. may explicitly or implicitly include one or more of the features. In the description of the present invention, unless otherwise specified, "multiple" means two or more.
[0063] In the description of the invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the invention can be understood according to specific circumstances.
[0064] The present invention will be described in detail below with reference to the accompanying drawings and in combination with embodiments.
[0065] like Figure 1 As shown, the method for selecting the best feed direction when removing scratches by magnetorheological polishing according to the embodiment of the present invention comprises the following steps:
[0066] S1: The defect detection unit 2 is set at the tool end of the magnetorheological polishing driving unit 1, and the optical element 3 to be detected for scratches is placed on the supporting platform 4, and the optical element 3 is within the detection range of the defect detection unit 2, ensuring that the defect detection unit 2 can completely scan the optical element 3, such as Figure 2The coordinates of the optical element 3 and the magnetorheological polishing driving unit 1 are unified in one coordinate system, thereby facilitating the extraction and fitting of the position coordinates of the scratches.
[0067] Among them, the magnetorheological polishing drive unit 1 can be a magnetorheological polishing machine tool (such as a conventional CNC machine tool) or a new magnetorheological polishing processing equipment such as an industrial robot. In an embodiment of the present invention, the magnetorheological polishing drive unit 1 preferably adopts a robotic arm, and the defect detection unit 2 is arranged at the tool end of the robotic arm.
[0068] The defect detection unit 2 in the embodiment of the present invention preferably adopts a high-resolution industrial camera of model MV-CE200-11UM / C, a resolution of 5472×3648, and a pixel size of 2.4μm×2.4μm, which is a device for defect detection on the surface of the optical element 3 and can distinguish scratches with a width of tens of microns. The defect detection unit 2 uses a scattering imaging method to detect defects on the surface of the optical element 3. When the incident light is irradiated on the surface defect, the defect area will produce chaotic scattering. Although the roughness of the reflector surface will also cause a certain degree of scattering, the scattering directionality and intensity of the surface defects are significantly higher in comparison. In the dark field imaging mode, the defect detection unit 2 uses six ring lights for grazing incidence illumination, which can effectively highlight the scattering of the surface defect area. When there are defects on the surface, these areas will show bright scratch morphology in the image captured by the camera. This grazing incidence illumination has the characteristics of high efficiency and is suitable as a rough scanning method to find surface defects. The fine scanning mode of the defect detection unit 2 uses high-power white light for vertical illumination. At surface defects, scattering also occurs, but scratches appear as dark shadows. This type of illumination has a high signal-to-noise ratio and is therefore often used to accurately calculate the size and shape of surface defects.
[0069] Before using the defect detection unit 2 to perform defect detection on the optical element 3, it is necessary to calibrate the defect detection unit 2 using a standard part with known defect information, that is:
[0070] The standard part is placed on the support platform 4, and the magnetorheological polishing driving unit 1 is driven, so that the magnetorheological polishing driving unit 1 drives the defect detection unit 2 to move along the surface of the standard part. At the same time, the defect detection unit 2 performs defect detection on the surface of the standard part to obtain the detected defect position coordinates. . Get the coordinates of the defect location The actual defect position coordinates of the standard part The difference ,Right now:
[0071]
[0072] If the difference If the error range is within the error range, it is considered that the defect detection unit 2 has been calibrated. Otherwise, the defect detection unit 2 needs to be recalibrated. In the embodiment of the present invention, the error range is less than 0.01 mm, that is, , and All are less than 0.01mm.
[0073] S2: Control the defect detection unit 2 to move along the surface of the optical element 3 as follows: Figure 3 The scratch position coordinates on the optical element 3 are extracted and then the scratch position coordinates are fitted to obtain the scratch curve. Figure 3 The direction of the blue arrow in the middle is the step direction of the defect detection unit 2, and the direction of the red arrow is the gauge direction of the defect detection unit 2's motion trajectory.
[0074] The fitting method for the scratch curve in step S2 includes but is not limited to the least square method, the polynomial fitting method and the B-spline fitting method. In the embodiment of the present invention, the B-spline fitting method is preferably used.
[0075] In an embodiment of the present invention, the method for performing B-spline fitting on a scratch curve comprises the following steps:
[0076] S21: Calculate the distance between adjacent points on each scratch according to the scratch position coordinates, and then obtain the normalized cumulative arc length of each point on each scratch.
[0077] In step S21, the scratch position coordinates are parameterized by cumulative arc length parameterization, that is, the distance between adjacent points on each scratch is calculated by the following formula:
[0078] ;
[0079] in, represents the distance between the i-th point and the i-1-th point in the k-th scratch, represents the position coordinates of the i-th point of the k-th scratch, represents the position coordinates of the i-1th point of the kth scratch, , n represents the total number of points on each scratch.
[0080] According to distance Get the cumulative arc length of each point on each scratch :
[0081] ;
[0082] Where j represents the number of points on each scratch.
[0083] The cumulative arc length of each point on each scratch is calculated by the following formula Perform normalization to obtain the normalized cumulative arc length of each point on each scratch :
[0084] .
[0085] S22: setting the B-spline order of the fitting, and calculating the B-spline control points according to the normalized cumulative arc length of each point on each scratch.
[0086] The normalized cumulative arc length of each point on each scratch is calculated by the following formula: The corresponding fitting position coordinates :
[0087] ;
[0088] in, , m represents the number of B-spline control points, M represents the maximum number of B-spline control points, and p represents the B-spline order. represents the mth B-spline control point when fitting the kth scratch, represents the B-spline basis function of the m-th B-spline control point at B-spline order p when fitting the k-th scratch.
[0089] The higher the order of B-spline fitting, the smoother the fitting curve will be, but the corresponding calculation will be more complicated. The third-order B-spline is sufficient to fit the scratches on the surface of the optical element 3. Therefore, in the embodiment of the present invention, the third-order B-spline fitting is preferably used, that is, p=3.
[0090] The position coordinates of the i-th point of the k-th scratch are calculated by the following formula: The corresponding fitting position coordinates The gap between E:
[0091] ;
[0092] Use the least squares method to minimize the above formula and get the B-spline control points when fitting the k-th scratch. .
[0093] S23: setting a B-spline node vector, and performing B-spline fitting in combination with the B-spline order and the B-spline control points to obtain a scratch curve of each scratch.
[0094] The selection of the B-spline node vector will affect the shape of the B-spline. Common node vectors are uniformly distributed, but non-uniform node vectors can be used for complex data. In the embodiment of the present invention, uniform node vectors are preferably used to fit scratches. Therefore, for a p-order B-spline and M+1 control points, the B-spline node vector u is:
[0095] ;
[0096] In the above formula, for a B-spline order of p and M+1 control points, the length of the B-spline knot vector u is M+1+p+1 and is uniformly distributed in [0,1]. Taking the third-order B-spline with M=16 as an example, the length of the B-spline knot vector u is 21, and the corresponding B-spline knot vector u is:
[0097] .
[0098] According to the B-spline control points Perform B-spline fitting with the B-spline node vector u to obtain each scratch curve :
[0099] .
[0100] S3: Calculate the cumulative scratch length within the same direction range of the normalized normal vector of each point on the scratch curve, and the normalized normal vector direction corresponding to the longest cumulative scratch length is the optimal feed direction.
[0101] Since the shape of the magnetorheological removal function is non-circularly symmetrical, it has a major axis and a minor axis. It is approximately axisymmetric in the major axis direction and asymmetric in the minor axis direction. If the major axis direction of the magnetorheological removal function is consistent with the normal vector direction of the scratch curve, then the magnetorheological removal function is considered to be perpendicular to the scratch removal, that is, the major axis direction of the magnetorheological removal function is the direction of the magnetorheological removal function. If the major axis direction of the magnetorheological removal function is perpendicular to the normal vector direction of the scratch curve, then the magnetorheological removal function is considered to be parallel to the scratch removal. Vertical removal and parallel removal are as follows: Figure 4 Therefore, in order to determine that the major axis direction of the magnetorheological removal function is the direction of the magnetorheological removal function, that is, the magnetorheological removal function is perpendicular to the scratch removal, it is necessary to solve the normal vector of the scratch parameterization curve.
[0102] First, find each scratch curve The derivative of , and each scratch curve is obtained The tangent vector ,Right now:
[0103] ;
[0104] Then find the tangent vector of each scratch The derivative of , and each scratch curve is obtained The normal vector ,Right now:
[0105] ;
[0106] The spatial interval when calculating the normal vector is the same as the spatial interval when removing scratches with magnetorheological fluid, which can reduce the time of normal vector calculation without affecting the removal efficiency. Normalize to get the normalized normal vector ,Right now:
[0107] ;
[0108] Among them, the normalized normal vector The direction of is a range rather than a specific value. Since the scratch is a curve in most cases, the direction of the normal vector is not equal everywhere, but the trend of the scratch normal vector change is gentle, so it can be considered to be the same normal vector direction within a certain range. This range is .like Figure 5 As shown, the normalized normal vector of point a on the same scratch is and the normalized normal vector of point b Angle for:
[0109] ;
[0110] When the angle between the normalized normal vectors of point a and point b is exist When , it is assumed that the normalized normal vectors of point a and point b are in the same direction.
[0111] Calculate the cumulative scratch length within the same direction of each normalized normal vector, and approximately get:
[0112]
[0113] in, represents the position coordinates of the ath point on the kth scratch, Represents the position coordinates of the bth point on the kth scratch and the normalized normal vector of the ath point and the normalized normal vector of the bth point In the same direction; represents the cumulative scratch length between the ath point and the bth point on the kth scratch. The cumulative scratch length within the same direction of the normalized normal vectors of all points is calculated by the above formula.
[0114] S4: The magnetorheological polishing module 5 replaces the defect detection unit 2 and is installed on the tool end of the magnetorheological polishing drive unit 1, such as Figure 6 The surface error and magnetorheological removal function of the optical element 3 are measured, and the dwell time when processing the optical element 3 is calculated.
[0115] In step S4, the surface error E of the optical element 3 is measured by an interferometer.0 , and the magnetorheological polishing module 5 is used to process the test piece of the same material as the optical element 3 to obtain the magnetorheological removal function RF of the optical element 3. The residence time T is obtained by the following formula:
[0116] ;
[0117] in, Represents convolution calculation.
[0118] In an embodiment of the present invention, the magnetorheological polishing structure in the invention patent application with Chinese patent publication number CN113352152A, publication date September 7, 2021, and patent name "A magnetorheological polishing processing system based on a robotic arm" is preferably integrated into the magnetorheological polishing module 5 in an embodiment of the present invention.
[0119] S5: Control the magnetorheological polishing module 5 to perform full-aperture processing on the optical element 3 according to the optimal feed direction and dwell time.
[0120] It should be understood that the various forms of processes shown above can be used to reorder, add or delete steps. For example, the steps described in the disclosure of the present invention can be performed in parallel, sequentially or in different orders, as long as the desired results of the technical solution disclosed in the present invention can be achieved, and this document does not limit this.
[0121] The above specific implementations do not constitute a limitation on the protection scope of the present invention. It should be understood by those skilled in the art that various modifications, combinations, sub-combinations and substitutions can be made according to design requirements and other factors. Any modification, equivalent substitution and improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims
1. A method for selecting the best feed direction when removing scratches by magnetorheological polishing, characterized in that: The following steps are involved: S1: Setting a defect detection unit at a tool end of a magnetorheological polishing driving unit, and setting an optical element for scratches to be detected within a detection range of the defect detection unit; S2: Controlling the defect detection unit to extract the scratch position coordinates on the optical element, and then fitting the scratch position coordinates to obtain a scratch curve; Step S2 includes the following steps: S21: Calculate the distance between adjacent points on each scratch according to the scratch position coordinates, and then obtain the normalized cumulative arc length of each point on each scratch; In step S21, the distance between adjacent points on each scratch is calculated by the following formula, that is: ; in, represents the distance between the i-th point and the i-1-th point in the k-th scratch, represents the position coordinates of the i-th point of the k-th scratch, represents the position coordinates of the i-1th point of the kth scratch, , n represents the total number of points on each scratch; According to the distance Get the cumulative arc length of each point on each scratch : ; Where j represents the number of points on each scratch; The cumulative arc length of each point on each scratch is calculated by the following formula Perform normalization to obtain the normalized cumulative arc length of each point on each scratch : ; S22: Set the B-spline order of the fitting, and calculate the B-spline control point according to the normalized cumulative arc length of each point on each scratch; in step S22, the normalized cumulative arc length of each point on each scratch is calculated by the following formula: The corresponding fitting position coordinates : ; in, , m represents the number of the B-spline control points, M represents the maximum number of the B-spline control points, p represents the B-spline order, represents the mth B-spline control point when fitting the kth scratch, represents the B-spline basis function of the m-th B-spline control point at the B-spline order p when fitting the k-th scratch; The position coordinates of the i-th point of the k-th scratch are calculated by the following formula: The corresponding fitting position coordinates The gap between E: ; Minimize the above formula to get the B-spline control point when fitting the k-th scratch ; S23: Setting a B-spline node vector, and performing B-spline fitting in combination with the B-spline order and the B-spline control points to obtain a scratch curve for each scratch; in step S23, the B-spline node vector u is: ; At this time, each scratch curve is obtained : ; S3: Calculate the cumulative scratch length within the same direction range of the normalized normal vector of each point on the scratch curve, and the normalized normal vector direction corresponding to the longest cumulative scratch length is the optimal feed direction; in step S3: Find each scratch curve The derivative of , and each scratch curve is obtained The tangent vector ,Right now: ; Find the tangent vector of each scratch The derivative of , and each scratch curve is obtained The normal vector ,Right now: ; Normal vector Normalize to get the normalized normal vector ,Right now: ; Calculate the cumulative scratch length within the same direction range of each normalized normal vector, that is: ; in, represents the position coordinates of the ath point on the kth scratch, Indicates the position coordinates of the bth point on the kth scratch, the normalized normal vector of the ath point and the normalized normal vector of the bth point are in the same direction; Represents the cumulative scratch length between the a-th point and the b-th point on the k-th scratch; the cumulative scratch length within the same direction range of the normalized normal vectors of all points is calculated by the above formula.
2. The method for selecting the best feed direction when removing scratches by magnetorheological polishing according to claim 1 is characterized in that: The same direction range is that the angle between the normalized normal vector of the a-th point and the normalized normal vector of the b-th point is .
3. A processing method based on the optimal feed direction for removing scratches by magnetorheological polishing, characterized in that: After executing the optimal feed direction selection method for removing scratches by magnetorheological polishing as described in any one of claims 1 to 2, the method comprises: S4: replacing the defect detection unit with a magnetorheological polishing module and installing it on the tool end of the magnetorheological polishing drive unit; measuring the surface error and magnetorheological removal function of the optical element, and calculating the dwell time when processing the optical element; S5: Control the magnetorheological polishing module to perform full-aperture processing on the optical element according to the optimal feed direction and the dwell time.
4. The processing method for the optimal feed direction when removing scratches based on magnetorheological polishing according to claim 3 is characterized in that: In step S4, the surface error E0 is measured by an interferometer, and the magnetorheological polishing module is used to process a test piece made of the same material as the optical element to obtain a magnetorheological removal function RF; the residence time T is obtained by the following formula: ; in, Represents convolution calculation.
Citation Information
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