A method and device for measuring crystal orientation angle deviation value

Abstract

The present invention relates to the technical field of crystal orientation measurement, and in particular to a method and device for measuring a crystal orientation angle deviation value. The method is applied to an X-ray orientation instrument, the X-ray orientation instrument comprises an arc guide rail, an X-ray transmitter and an X-ray receiver, the X-ray transmitter and the X-ray receiver can slide on the arc guide rail, and the method comprises the steps of: S100, calibrating the measurement radius of the arc guide rail using a known crystal; S200, measuring the arc length traveled by the X-ray transmitter on the arc guide rail from the theoretical diffraction angle position of the known crystal to the measured diffraction angle position of the measured crystal; S300, calculating the quotient of the arc length and the calibrated measurement radius to obtain the crystal orientation angle deviation value of the measured crystal.

Description

Technical Field

[0001] The present invention relates to the technical field of crystal orientation measurement, and in particular to a method and device for measuring a crystal orientation angle deviation value. Background Art

[0002] In the process of crystal or crystal rod processing, including head and tail removal, slicing, inner circle cutting, end face grinding, reference edge processing, multi-wire cutting and other processes, the crystal needs to be oriented. The orientation instrument equipment measures the crystal orientation angle deviation value of the crystal by adjusting the angle change of the X-ray incident angle and the diffraction angle, so recording the motion angle is very important for the orientation instrument. Conventional motion angle measurement uses an encoder to record the rotation angle. The encoder is either directly connected to the rotating shaft to record the angle value, or the encoder is used to record the rotation angle through a transmission mechanism. However, the direct installation of the encoder needs to occupy the axial position of the rotating shaft, which is not convenient to use when automatically orienting larger crystals. The method of recording the rotation angle through a transmission mechanism will greatly reduce the accuracy of the recorded angle due to the error of the transmission mechanism. Summary of the invention

[0003] Based on the above situation, the main purpose of the present invention is to provide a new method and device for measuring crystal orientation angle deviation value.

[0004] To achieve the above purpose, the technical solution adopted by the present invention is as follows:

[0005] A method for measuring a crystal orientation angle deviation value is applied to an X-ray orientation instrument, wherein the X-ray orientation instrument comprises an arc guide rail, an X-ray transmitter and an X-ray receiver, wherein the X-ray transmitter and the X-ray receiver can slide on the arc guide rail, wherein the method comprises the steps of:

[0006] S100, calibrating the measuring radius of the arc guide rail using a known crystal;

[0007] S200, measuring the arc length traveled by the X-ray emitter on the arc guide from the theoretical diffraction angle position of the known crystal to the measured diffraction angle position of the measured crystal;

[0008] S300, calculating the quotient of the arc length and the calibrated measurement radius to obtain a crystal orientation angle deviation value of the measured crystal.

[0009] Preferably, the step S100 includes:

[0010] S101, using the X-ray orientation instrument to measure the diffraction angles of a first crystal and a second crystal respectively, to obtain a first diffraction angle and a second diffraction angle respectively, wherein the second crystal and the first crystal are crystals of different categories;

[0011] S102, calculating the difference between the first diffraction angle and the second diffraction angle to obtain the measured diffraction angle deviation values ​​of the first crystal and the second crystal;

[0012] S103, calculating a theoretical diffraction angle deviation value of the first crystal and the second crystal, wherein the theoretical diffraction angle deviation value is a difference between the theoretical diffraction angles of the first crystal and the second crystal;

[0013] S104, calculating the theoretical radius of the arc-shaped guide rail according to the measured diffraction angle deviation value, the designed initial radius of the arc-shaped guide rail, and the theoretical diffraction angle deviation value, and updating the designed initial radius to the theoretical radius;

[0014] S105, repeating the above steps to perform data iterative learning until the error of the designed initial radius reaches a preset accuracy.

[0015] Preferably, the theoretical radius is: the product of the measured diffraction angle deviation value and the designed initial radius of the arc guide rail divided by the theoretical diffraction angle deviation value.

[0016] Preferably, the arc length in step S200 is the arc length that the X-ray emitter travels on the arc guide from the theoretical diffraction angle position of the first crystal to the measured diffraction angle position of the measured crystal.

[0017] Preferably, the step S200 includes:

[0018] When the crystal to be measured satisfies the Bragg diffraction formula, the diffraction angle position of the crystal to be measured is obtained, and the arc length traveled by the X-ray emitter on the arc guide from the theoretical diffraction angle position of the known crystal to the measured diffraction angle position of the crystal to be measured is measured.

[0019] Preferably, the arc length is measured using a magnetic grating displacement sensor.

[0020] The present invention also discloses a device for measuring a crystal orientation angle deviation value, which is applied to an X-ray orientation instrument. The X-ray orientation instrument comprises an arc guide rail, an X-ray transmitter and an X-ray receiver. The X-ray transmitter and the X-ray receiver can slide on the arc guide rail. The device comprises a radius calibration module, an arc length measurement module and a crystal orientation angle deviation value calculation module:

[0021] The radius calibration module is used to calibrate the measurement radius of the arc guide rail using a known crystal;

[0022] The arc length measurement module is used to measure the arc length that the X-ray emitter travels on the arc guide from the theoretical diffraction angle position of the known crystal to the measured diffraction angle position of the measured crystal;

[0023] The crystal orientation angle deviation value calculation module is used to calculate the quotient of the arc length and the calibrated measurement radius to obtain the crystal orientation angle deviation value of the measured crystal.

[0024] Preferably, the radius calibration module includes a diffraction angle measurement unit, a measured diffraction angle deviation value calculation unit, a theoretical diffraction angle deviation value calculation unit and an initial radius update unit:

[0025] The diffraction angle measuring unit is used to measure the diffraction angles of the first crystal and the second crystal respectively using the X-ray orientation instrument to obtain the first diffraction angle and the second diffraction angle respectively, and the second crystal and the first crystal are crystals of different categories;

[0026] The measured diffraction angle deviation value calculation unit is used to calculate the difference between the first diffraction angle and the second diffraction angle to obtain the measured diffraction angle deviation values ​​of the first crystal and the second crystal;

[0027] The theoretical diffraction angle deviation value calculation unit is used to calculate the theoretical diffraction angle deviation values ​​of the first crystal and the second crystal, and the theoretical diffraction angle deviation value is the difference between the theoretical diffraction angles of the first crystal and the second crystal;

[0028] The initial radius updating unit is used to calculate the theoretical radius of the arc guide rail according to the measured diffraction angle deviation value, the designed initial radius of the arc guide rail, and the theoretical diffraction angle deviation value, update the designed initial radius to the theoretical radius, and perform data iterative learning until the error of the designed initial radius reaches a preset accuracy.

[0029] Preferably, the theoretical radius is: the product of the measured diffraction angle deviation value and the designed initial radius of the arc guide rail divided by the theoretical diffraction angle deviation value.

[0030] Preferably, the arc length is the length of the arc that the X-ray emitter travels on the arc guide from the theoretical diffraction angle position of the first crystal to the measured diffraction angle position of the measured crystal.

[0031] Preferably, when the arc length measurement module measures the arc length, when the measured crystal satisfies the Bragg diffraction formula, the diffraction angle position of the measured crystal is obtained, and the arc length traveled by the X-ray emitter on the arc guide rail from the theoretical diffraction angle position of the known crystal to the measured diffraction angle position of the measured crystal is measured.

[0032] Preferably, the arc length is measured using a magnetic grating displacement sensor.

[0033] The present invention provides a new process method for measuring the crystal orientation angle deviation value, by calibrating the measuring radius of the arc guide in the X-ray orientation instrument, and measuring the arc length that the X-ray emitter travels on the arc guide from the diffraction angle position of the known crystal to the diffraction angle position of the measured crystal, and calculating the movement angle of the measured crystal according to the arc length and the measuring radius, that is, the crystal orientation angle deviation value. There is no need to use encoders and the like to measure the angle, and the space of the rotation axis in the traditional technology is completely given up, which is convenient for the realization of subsequent functions, and the measurement of the angle movement does not introduce a transmission mechanism, avoiding the influence of transmission errors, so that the measurement accuracy is improved, and crystals of more shapes and specifications can be measured. At the same time, the accurate crystal orientation angle deviation value is measured, which provides a better premise for the subsequent polishing of the wafer, so that the performance of the wafer is better and the accuracy is higher.

[0034] Other beneficial effects of the present invention will be explained in the specific implementation manner through the introduction of specific technical features and technical solutions. Through the introduction of these technical features and technical solutions, those skilled in the art should be able to understand the beneficial technical effects brought about by the technical features and technical solutions. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] The preferred embodiment of the process method for measuring the crystal orientation angle deviation value of the present invention will be described below with reference to the accompanying drawings.

[0036] Figure 1 A flow chart of a method for measuring a crystal orientation angle deviation value according to a preferred embodiment of the present invention;

[0037] Figure 2 A flow chart of a method for calibrating a curved guide rail measuring radius according to a preferred embodiment of the present invention;

[0038] Figure 3 The figure is a block diagram of a device for measuring a crystal orientation angle deviation value according to a preferred embodiment of the present invention. DETAILED DESCRIPTION

[0039] The present invention is described below based on embodiments, but the present invention is not limited to these embodiments. In the following detailed description of the present invention, some specific details are described in detail. In order to avoid confusing the essence of the present invention, known methods, processes, procedures, and components are not described in detail.

[0040] In addition, persons of ordinary skill in the art will appreciate that the drawings provided herein are for illustration purposes and are not necessarily drawn to scale.

[0041] Unless the context clearly requires otherwise, throughout the specification and claims, the words "include", "comprising" and similar words should be interpreted in an inclusive sense rather than an exclusive or exhaustive sense; that is, in the sense of "including but not limited to".

[0042] In the description of the present invention, it should be understood that the terms "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying relative importance. In addition, in the description of the present invention, unless otherwise specified, "plurality" means two or more.

[0043] Figure 1 The present invention is a flowchart of a method for measuring the crystal orientation angle deviation value according to a preferred embodiment of the present invention. The method is used for an X-ray orientation instrument, and the X-ray orientation instrument includes an arc-shaped guide rail, an X-ray transmitter and an X-ray receiver. The X-ray transmitter and the X-ray receiver can slide on the arc-shaped guide rail. The X-ray transmitter and the X-ray receiver can slide on the arc-shaped guide rail directly or through a connecting mechanism. The method includes the steps of:

[0044] S100, calibrating the measuring radius of the arc guide rail using a known crystal;

[0045] S200, measuring the arc length traveled by the X-ray emitter on the arc guide from the theoretical diffraction angle position of the known crystal to the measured diffraction angle position of the measured crystal;

[0046] S300, calculating the quotient of the arc length and the calibrated measurement radius to obtain a crystal orientation angle deviation value of the measured crystal.

[0047] The known crystal in the present invention generally refers to a crystal with a known theoretical diffraction angle.

[0048] The present invention provides a new process method for measuring the crystal orientation angle deviation value, by calibrating the measuring radius of the arc guide in the X-ray orientation instrument, and measuring the arc length that the X-ray emitter travels on the arc guide from the diffraction angle position of the known crystal to the diffraction angle position of the measured crystal, and calculating the movement angle of the measured crystal according to the arc length and the measuring radius, that is, the crystal orientation angle deviation value. There is no need to use encoders and the like to measure the angle, and the space of the rotation axis in the traditional technology is completely given up, which is convenient for the realization of subsequent functions, and the measurement of the angle movement does not introduce a transmission mechanism, avoiding the influence of transmission errors, so that the measurement accuracy is improved, and crystals of more shapes and specifications can be measured. At the same time, the accurate crystal orientation angle deviation value is measured, which provides a better premise for the subsequent polishing of the wafer, so that the performance of the wafer is better and the accuracy is higher.

[0049] In a preferred embodiment, two known crystals (a first crystal and a second crystal) can be selected and used as follows: Figure 2 The method shown is to calibrate the measuring radius of the arc guide rail:

[0050] S101, using the X-ray orientation instrument to measure the diffraction angles of a first crystal and a second crystal respectively, to obtain a first diffraction angle and a second diffraction angle respectively, wherein the second crystal and the first crystal are crystals of different categories;

[0051] S102, calculating the difference between the first diffraction angle and the second diffraction angle to obtain the measured diffraction angle deviation values ​​of the first crystal and the second crystal;

[0052] S103, calculating theoretical diffraction angle deviation values ​​of the first crystal and the second crystal; wherein the theoretical diffraction angles of the first crystal and the second crystal are known, and the theoretical diffraction angle deviation value is the difference between the theoretical diffraction angles of the first crystal and the second crystal.

[0053] S104, calculating the theoretical radius of the arc-shaped guide rail according to the measured diffraction angle deviation value, the designed initial radius of the arc-shaped guide rail, and the theoretical diffraction angle deviation value, and updating the designed initial radius to the theoretical radius;

[0054] S105, repeat the above steps to perform data iterative learning until the error of the designed initial radius reaches a preset accuracy. The preset accuracy can be set according to design requirements, for example, 0.001% can be selected as the preset accuracy.

[0055] The arc radius of motion is a constant related to the system, but it is affected by factors such as machining accuracy and installation accuracy, such as the diameter error of the arc mechanism. Or, if a magnetic grating displacement sensor is used for distance measurement, it is affected by factors such as the thickness of the adhesive layer when the magnetic strip is pasted, the accuracy of the magnetic strip when it is installed, etc. This constant is not the same for different mechanisms. This method uses iterative calculation to reversely calculate the initial radius of the design using the known crystal orientation angle to improve the measurement accuracy.

[0056] In a preferred embodiment, the theoretical radius is: the product of the measured diffraction angle deviation value and the designed initial radius of the arc guide rail divided by the theoretical diffraction angle deviation value. After obtaining the measured diffraction angle deviation and the designed initial radius, the theoretical diffraction angle deviation value can also be calculated by the theoretical diffraction angles of the first crystal and the second crystal at the same time, and the arc lengths corresponding to the measured diffraction angle deviation and the theoretical diffraction angle deviation value should be equal, so the product of the measured diffraction angle deviation value and the designed initial radius of the arc guide rail and the product of the theoretical diffraction angle deviation value and the theoretical radius should be equal, so the theoretical radius can be obtained as: the product of the measured diffraction angle deviation value and the designed initial radius of the arc guide rail divided by the theoretical diffraction angle deviation value.

[0057] In a preferred embodiment, the arc length in step S200 is the arc length that the X-ray emitter travels on the arc guide from the theoretical diffraction angle position of the first crystal to the measured diffraction angle position of the measured crystal.

[0058] In a preferred embodiment, step S200 may include: when the crystal to be measured satisfies the Bragg diffraction formula, that is, when the light signal received by the X-ray receiver is the strongest, obtaining the diffraction angle position of the crystal to be measured, and measuring the arc length traveled by the X-ray transmitter on the arc guide rail from the theoretical diffraction angle position of the known crystal to the measured diffraction angle position of the crystal to be measured.

[0059] In a specific implementation, when the X-rays of the X-ray transmitter irradiate the surface of the crystal to be measured, by sliding the X-ray transmitter on the arc guide to a certain suitable position (the surface of the crystal to be measured forms a specific angle with the X-rays), the X-rays will produce diffraction phenomenon in the crystal to be measured according to the Bragg law. After the diffracted light is received and amplified by the X-ray receiver, the diffraction intensity can be displayed on the microampere meter. When the meter indicates the maximum, the position is the diffraction angle position of the crystal to be measured. At this time, the arc length from the diffraction angle position of the known crystal to the diffraction angle position of the crystal to be measured can be measured.

[0060] In a preferred embodiment, the arc length can be measured by a magnetic grating displacement sensor. For different measured crystals, the arc length is different. This parameter belongs to the variable in the measurement method. By reading the distance moved, the accurate arc length value can be obtained. A magnetic grating displacement sensor is used, the magnetic strip is pasted on the arc guide rail, the magnetic head is fixedly installed on the motion mechanism, and the data on the magnetic strip is obtained through the relative movement of the magnetic head and the magnetic grating, so as to calculate the arc length.

[0061] The present invention also discloses an X-ray orientator, which includes an arc guide rail, an X-ray transmitter and an X-ray receiver. The X-ray transmitter and the X-ray receiver can slide on the arc guide rail. The X-ray orientator adopts the process method for measuring the crystal orientation angle deviation value described in the present invention to realize the measurement of the crystal orientation angle deviation.

[0062] The present invention also discloses a device for measuring the crystal orientation angle deviation value, which is applied to an X-ray orientation instrument. The X-ray orientation instrument comprises an arc guide rail, an X-ray transmitter and an X-ray receiver. The X-ray transmitter and the X-ray receiver can slide on the arc guide rail. Figure 3As shown, the device includes a radius calibration module 100, an arc length measurement module 200 and a crystal orientation angle deviation value calculation module 300, wherein the radius calibration module 100 is used to calibrate the measurement radius of the arc guide rail using a known crystal; the arc length measurement module 200 is used to measure the arc length traveled by the X-ray emitter on the arc guide rail from the theoretical diffraction angle position of the known crystal to the measured diffraction angle position of the measured crystal; the crystal orientation angle deviation value calculation module 300 is used to calculate the quotient of the arc length and the calibrated measurement radius to obtain the crystal orientation angle deviation value of the measured crystal.

[0063] In a preferred embodiment, the radius calibration module 100 includes a diffraction angle measurement unit, a measured diffraction angle deviation value calculation unit, a theoretical diffraction angle deviation value calculation unit and an initial radius update unit, wherein the diffraction angle measurement unit is used to use the X-ray orientation instrument to measure the diffraction angles of the first crystal and the second crystal respectively, and obtain the first diffraction angle and the second diffraction angle respectively, and the second crystal and the first crystal are crystals of different categories; the measured diffraction angle deviation value calculation unit is used to calculate the difference between the first diffraction angle and the second diffraction angle, and obtain the measured diffraction angle deviation value of the first crystal and the second crystal; the theoretical diffraction angle deviation value calculation unit is used to calculate the theoretical diffraction angle deviation value of the first crystal and the second crystal, and the theoretical diffraction angle deviation value is the difference between the theoretical diffraction angles of the first crystal and the second crystal; the initial radius update unit is used to calculate the theoretical radius of the arc guide rail according to the measured diffraction angle deviation value, the designed initial radius of the arc guide rail, and the theoretical diffraction angle deviation value, update the designed initial radius to the theoretical radius, and perform data iterative learning until the error of the designed initial radius reaches a preset accuracy.

[0064] In a preferred embodiment, the theoretical radius is: the product of the measured diffraction angle deviation value and the designed initial radius of the arc guide rail divided by the theoretical diffraction angle deviation value.

[0065] In a preferred embodiment, the arc length is the length of the arc that the X-ray emitter travels on the arc guide from the theoretical diffraction angle position of the first crystal to the measured diffraction angle position of the measured crystal.

[0066] In a preferred embodiment, when the arc length measurement module 200 measures the arc length, when the measured crystal satisfies the Bragg diffraction formula, the diffraction angle position of the measured crystal is obtained, and the arc length traveled by the X-ray emitter on the arc guide from the theoretical diffraction angle position of the known crystal to the measured diffraction angle position of the measured crystal is measured.

[0067] In a preferred embodiment, the arc length is measured using a magnetic grating displacement sensor.

[0068] It will be appreciated by those skilled in the art that, under the premise of no conflict, the above-mentioned preferred solutions can be freely combined and superimposed. Among them, the flowcharts and block diagrams in the accompanying drawings illustrate the possible architecture, functions and operations of the systems, methods and computer program products according to various embodiments of the present disclosure. In this regard, each box in the flowchart or block diagram can represent a module, a program segment, or a part of a code, and the module, program segment, or a part of a code contains one or more executable instructions for implementing the specified logical function. It should also be noted that in some alternative implementations, the functions marked in the box can also occur in an order different from that marked in the accompanying drawings, for example, two boxes represented in succession can actually be executed substantially in parallel, and they can sometimes be executed in the opposite order, depending on the functions involved. It should also be noted that each box in the block diagram and / or flowchart, and the combination of boxes in the block diagram and / or flowchart can be implemented with a dedicated hardware-based system that performs a specified function or operation, or can be implemented with a combination of dedicated hardware and computer instructions. The numbering of each step in this article is only for the convenience of description and reference, and is not used to limit the order of execution. The specific execution order is determined by the technology itself, and those skilled in the art can determine various allowable and reasonable orders based on the technology itself.

[0069] It should be noted that the use of step numbers (letters or numbers) to refer to certain specific method steps in the present invention is only for the purpose of convenience and simplicity of description, and is by no means intended to limit the order of these method steps. Those skilled in the art will understand that the order of the relevant method steps should be determined by the technology itself and should not be inappropriately limited by the existence of step numbers. Those skilled in the art can determine various permissible and reasonable step orders based on the technology itself.

[0070] Those skilled in the art will appreciate that, without conflict, the above-mentioned preferred solutions can be freely combined and superimposed.

[0071] It should be understood that the above-mentioned embodiments are merely illustrative and not restrictive. Without departing from the basic principles of the present invention, various obvious or equivalent modifications or substitutions that can be made by those skilled in the art to the above-mentioned details will be included in the scope of the claims of the present invention.

Claims

1. A method for measuring a crystal orientation angle deviation value, applied to an X-ray orientation instrument, the X-ray orientation instrument comprising an arc guide rail, an X-ray transmitter and an X-ray receiver, the X-ray transmitter and the X-ray receiver being able to slide on the arc guide rail, characterized in that: The method comprises the steps of: S100, calibrating the measurement radius of the arc guide rail using a known crystal, including: S101, using the X-ray orientation instrument to measure the diffraction angles of a first crystal and a second crystal respectively, to obtain a first diffraction angle and a second diffraction angle respectively, wherein the second crystal and the first crystal are crystals of different categories; S102, calculating the difference between the first diffraction angle and the second diffraction angle to obtain the measured diffraction angle deviation values ​​of the first crystal and the second crystal; S103, calculating a theoretical diffraction angle deviation value of the first crystal and the second crystal, wherein the theoretical diffraction angle deviation value is a difference between the theoretical diffraction angles of the first crystal and the second crystal; S104, calculating the theoretical radius of the arc-shaped guide rail according to the measured diffraction angle deviation value, the designed initial radius of the arc-shaped guide rail, and the theoretical diffraction angle deviation value, and updating the designed initial radius to the theoretical radius; S105, repeating the above steps to perform data iterative learning until the error of the designed initial radius reaches a preset accuracy; S200, measuring the arc length traveled by the X-ray emitter on the arc guide from the theoretical diffraction angle position of the known crystal to the measured diffraction angle position of the measured crystal; S300, calculating the quotient of the arc length and the calibrated measurement radius to obtain the crystal orientation angle deviation value of the measured crystal.

2. The method for measuring the crystal orientation angle deviation value according to claim 1, characterized in that: The theoretical radius is: the product of the measured diffraction angle deviation value and the designed initial radius of the arc guide rail divided by the theoretical diffraction angle deviation value.

3. The method for measuring the crystal orientation angle deviation value according to claim 1, characterized in that: The arc length in step S200 is the arc length that the X-ray emitter travels on the arc guide from the theoretical diffraction angle position of the first crystal to the measured diffraction angle position of the measured crystal.

4. The method for measuring the crystal orientation angle deviation value according to claim 1, characterized in that: The step S200 includes: When the crystal to be measured satisfies the Bragg diffraction formula, the diffraction angle position of the crystal to be measured is obtained, and the arc length traveled by the X-ray emitter on the arc guide from the theoretical diffraction angle position of the known crystal to the measured diffraction angle position of the crystal to be measured is measured.

5. The method for measuring the crystal orientation angle deviation value according to any one of claims 1 to 4, characterized in that: The arc length is measured using a magnetic grating displacement sensor.

6. A device for measuring the crystal orientation angle deviation value, applied to an X-ray orientation instrument, the X-ray orientation instrument comprising an arc guide rail, an X-ray transmitter and an X-ray receiver, the X-ray transmitter and the X-ray receiver being able to slide on the arc guide rail, characterized in that: The device comprises a radius calibration module, an arc length measurement module and a crystal direction angle deviation value calculation module: The radius calibration module is used to calibrate the measured radius of the arc guide rail using a known crystal; the radius calibration module includes a diffraction angle measurement unit, a measured diffraction angle deviation value calculation unit, a theoretical diffraction angle deviation value calculation unit and an initial radius update unit: The diffraction angle measuring unit is used to measure the diffraction angles of the first crystal and the second crystal respectively using the X-ray orientation instrument to obtain the first diffraction angle and the second diffraction angle respectively, and the second crystal and the first crystal are crystals of different categories; The measured diffraction angle deviation value calculation unit is used to calculate the difference between the first diffraction angle and the second diffraction angle to obtain the measured diffraction angle deviation values ​​of the first crystal and the second crystal; The theoretical diffraction angle deviation value calculation unit is used to calculate the theoretical diffraction angle deviation values ​​of the first crystal and the second crystal, and the theoretical diffraction angle deviation value is the difference between the theoretical diffraction angles of the first crystal and the second crystal; The initial radius updating unit is used to calculate the theoretical radius of the arc guide rail according to the measured diffraction angle deviation value, the designed initial radius of the arc guide rail, and the theoretical diffraction angle deviation value, update the designed initial radius to the theoretical radius, and perform data iterative learning until the error of the designed initial radius reaches a preset accuracy; The arc length measurement module is used to measure the arc length that the X-ray emitter travels on the arc guide from the theoretical diffraction angle position of the known crystal to the measured diffraction angle position of the measured crystal; The crystal orientation angle deviation value calculation module is used to calculate the quotient of the arc length and the calibrated measurement radius to obtain the crystal orientation angle deviation value of the measured crystal.

7. The device for measuring the crystal orientation angle deviation value according to claim 6, characterized in that: The theoretical radius is: the product of the measured diffraction angle deviation value and the designed initial radius of the arc guide rail divided by the theoretical diffraction angle deviation value.

8. The device for measuring the crystal orientation angle deviation value according to claim 6, characterized in that: The arc length is the arc length that the X-ray emitter travels on the arc guide from the theoretical diffraction angle position of the first crystal to the measured diffraction angle position of the measured crystal.

9. The device for measuring the crystal orientation angle deviation value according to claim 6, characterized in that: When the arc length measurement module measures the arc length, when the measured crystal satisfies the Bragg diffraction formula, the diffraction angle position of the measured crystal is obtained, and the arc length traveled by the X-ray emitter on the arc guide rail from the theoretical diffraction angle position of the known crystal to the measured diffraction angle position of the measured crystal is measured.

10. The device for measuring the crystal orientation angle deviation value according to any one of claims 6 to 9, characterized in that: The arc length is measured using a magnetic grating displacement sensor.

Images