SRAF graphic generation method, device, storage medium and electronic device

Abstract

The present application discloses a SRAF graphic generation method, device, storage medium and electronic device, wherein the SRAF graphic generation method includes determining the distribution information of the size features in the actual layout; based on the distribution information, extracting the target graphic from the actual layout according to the preset extraction rule; setting the evaluation function of the genetic algorithm; based on the evaluation function, using the genetic algorithm to calculate the target SRAF placement rule of the target graphic; placing the SRAF on the actual layout according to the target SRAF placement rule to obtain the SRAF graphic. This solution can improve the generation efficiency of the SRAF graphic.

Description

Technical Field

[0001] The embodiments of the present application relate to the field of photolithography technology, and specifically to a SRAF graphic generation method, device, storage medium and electronic device. Background Art

[0002] As the size of layout graphics gradually decreases, the requirements for lithography resolution are becoming increasingly higher during the integrated circuit manufacturing process.

[0003] In order to obtain higher lithography resolution, it is necessary to correct the target pattern of the layout and add a sub-resolution scattering strip (Sub Resolution Assist Feature, SRAF) around the target pattern so that during the exposure process, the light intensity received by the photoresist corresponding to the sparsely arranged part of the target pattern is basically equal to the light intensity received by the photoresist corresponding to the densely arranged part of the target pattern.

[0004] The traditional SRAF placement method is to make a test layout before the actual chip lithography process, and then place SRAFs with different rules on the test layout. However, the design of the test layout does not necessarily include all the size features of the actual layout, resulting in inaccurate SRAF graphics. In addition, the SRAF placement rules are more dependent on the experience of engineers and require a long test cycle, resulting in low efficiency in generating SRAF graphics. Summary of the invention

[0005] The embodiments of the present application provide a SRAF graphic generation method, device, storage medium and electronic device, which can improve the generation efficiency of SRAF graphics.

[0006] In a first aspect, an embodiment of the present application provides a method for generating an SRAF graphic, comprising:

[0007] Determine the distribution information of the size features in the actual layout;

[0008] Based on the distribution information, extracting a target graphic from the actual layout according to a preset extraction rule;

[0009] Set the evaluation function of the genetic algorithm;

[0010] Based on the evaluation function, using the genetic algorithm to calculate the target SRAF placement rule of the target graphic;

[0011] SRAF placement is performed on the actual layout according to the target SRAF placement rule to obtain an SRAF graphic.

[0012] In the SRAF graphic generation method provided in the embodiment of the present application, the determining of the distribution information of the size features in the actual layout includes:

[0013] The DRC tool is used to analyze the edge of the actual layout to obtain the distribution information of the spacing size and line width size in the actual layout.

[0014] In the SRAF graphic generation method provided in the embodiment of the present application, the target graphic is extracted from the actual layout according to a preset extraction rule based on the distribution information, including:

[0015] Determine a first size interval of the spacing size and a second size interval of the line width size according to the distribution information;

[0016] Based on the first size interval and the second size interval, a target graphic is extracted from the actual layout according to a preset extraction rule.

[0017] In the SRAF graphic generation method provided in the embodiment of the present application, extracting the target graphic from the actual layout according to a preset extraction rule based on the first size interval and the second size interval includes:

[0018] According to the preset extraction rule, the first size interval and the second size interval are combined to obtain an extraction position;

[0019] Performing redundancy removal processing on the extraction position;

[0020] Graphics are extracted from the actual layout according to the extracted positions after redundancy removal to obtain a target graphic.

[0021] In the SRAF graph generation method provided in the embodiment of the present application, the setting of the evaluation function of the genetic algorithm includes:

[0022] Obtaining an OPC-corrected simulation graph of the target graph;

[0023] An evaluation function of a genetic algorithm is determined according to the OPC correction simulation graph and the target graph.

[0024] In the SRAF graph generation method provided in the embodiment of the present application, the step of determining the evaluation function of the genetic algorithm according to the OPC corrected simulation graph and the target graph includes:

[0025] Acquire dimensional feature changes according to the OPC corrected simulation pattern and the target pattern;

[0026] An evaluation function of a genetic algorithm is set based on the OPC correction simulation graph and the dimensional feature change.

[0027] In the SRAF graphic generation method provided in the embodiment of the present application, the evaluation function of the genetic algorithm is set based on the OPC correction simulation graphic and the size feature change, including:

[0028] Obtaining the exposure area of ​​the non-main pattern and the area of ​​the missing main pattern in the OPC correction simulation pattern;

[0029] The evaluation function of the genetic algorithm is set according to the change of the size feature, the area of ​​the exposure region of the non-main pattern and the area of ​​the region where the main pattern is missing.

[0030] In a second aspect, an embodiment of the present application provides a SRAF graphic generation device, including:

[0031] A distribution determination unit, used to determine the distribution information of the size features in the actual layout;

[0032] A graphics extraction unit, configured to extract a target graphics from the actual layout according to a preset extraction rule based on the distribution information;

[0033] A function setting unit is used to set the evaluation function of the genetic algorithm;

[0034] A rule calculation unit, used for calculating the target SRAF placement rule of the target graphic using a genetic algorithm based on the evaluation function;

[0035] The graphic generation unit is used to place SRAF on the actual layout according to the target SRAF placement rule to obtain a SRAF graphic.

[0036] In a third aspect, an embodiment of the present application provides a storage medium, wherein the storage medium stores a plurality of instructions, wherein the instructions are suitable for loading by a processor to execute any of the above-mentioned SRAF graphic generation methods.

[0037] In a fourth aspect, an embodiment of the present application provides an electronic device, comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the processor implements any of the above-described SRAF graphic generation methods when executing the computer program.

[0038] In summary, the SRAF graphic generation method provided by the embodiment of the present application includes determining the distribution information of the size features in the actual layout; based on the distribution information, extracting the target graphic from the actual layout according to the preset extraction rule; setting the evaluation function of the genetic algorithm; based on the evaluation function, using the genetic algorithm to calculate the target SRAF placement rule of the target graphic; performing SRAF placement on the actual layout according to the target SRAF placement rule to obtain the SRAF graphic. This solution can automatically generate SRAF graphics without manual participation, thereby improving the generation efficiency of SRAF graphics. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For those skilled in the art, other drawings can be obtained based on these drawings without creative work.

[0040] Figure 1 It is a flowchart of the SRAF graphic generation method provided in an embodiment of the present application.

[0041] Figure 2 It is a schematic diagram of a scenario for placing an SRAF provided in an embodiment of the present application.

[0042] Figure 3 It is a structural schematic diagram of the SRAF graphic generation device provided in an embodiment of the present application.

[0043] Figure 4 It is a schematic diagram of the structure of an electronic device provided in an embodiment of the present application. DETAILED DESCRIPTION

[0044] Exemplary embodiments will be described in detail herein, examples of which are shown in the accompanying drawings. When the following description refers to the drawings, the same numbers in different drawings represent the same or similar elements unless otherwise indicated. The implementations described in the following exemplary embodiments do not represent all implementations consistent with the present application. Instead, they are merely examples of devices and methods consistent with some aspects of the present application as detailed in the appended claims.

[0045] It should be noted that, in this article, the terms "include", "comprises" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also includes other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, an element defined by the sentence "includes a ..." does not exclude the existence of other identical elements in the process, method, article or device including the element. In addition, components, features, and elements with the same name in different embodiments of the present application may have the same meaning or different meanings, and their specific meanings need to be determined by their explanation in the specific embodiment or further combined with the context of the specific embodiment.

[0046] It should be understood that the specific embodiments described herein are only used to explain the present application and are not used to limit the present application.

[0047] In the subsequent description, the suffixes such as "module", "component" or "unit" used to represent elements are only used to facilitate the description of the present application, and have no specific meanings. Therefore, "module", "component" or "unit" can be used in a mixed manner.

[0048] In the description of the present application, it should be noted that the terms "upper", "lower", "left", "right", "inner", "outer", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present application. In addition, terms such as "first" and "second" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance.

[0049] The traditional SRAF placement method is to make a test layout before the actual chip lithography process, and then place SRAFs with different rules on the test layout. However, the design of the test layout does not necessarily include all the size features of the actual layout, resulting in inaccurate SRAF graphics. In addition, the SRAF placement rules are more dependent on the experience of engineers and require a long test cycle, resulting in low efficiency in generating SRAF graphics.

[0050] Based on this, the embodiments of the present application provide a SRAF graphic generation method, device, storage medium and electronic device. Specifically, the SRAF graphic generation device can be integrated in an electronic device, which can be a server or a terminal; wherein the terminal can include terminal devices such as a tablet computer, a laptop computer, and a personal computer (PC); the server can be an independent physical server, or a server cluster or distributed system composed of multiple physical servers, or a cloud server that provides basic cloud computing services such as cloud services, cloud databases, cloud computing, cloud functions, cloud storage, network services, cloud communications, middleware services, domain name services, security services, CDN, and big data and artificial intelligence platforms.

[0051] The technical solutions shown in the present application will be described in detail below through specific embodiments. It should be noted that the description order of the following embodiments is not intended to limit the priority order of the embodiments.

[0052] See also Figure 1 , Figure 1 : is a flow chart of the SRAF graphic generation method provided in the embodiment of the present application. The specific flow of the SRAF graphic generation method can be as follows:

[0053] 101. Determine the distribution information of the size features in the actual layout.

[0054] The size feature includes a spacing size (space) and a line width size (width). Figure 2 This is an example of placing SRAF. Generally, it is placed based on the edge of the main graphic (Target). The distance from one edge of the Target to the other edge is generally called space, and the distance from one edge to the opposite edge is called width. The distance from the placed SRAF to the Target is sraf_target_distance, the distance from the second SRAF to the first SRAF is sraf_sraf_distance, and the width of the placed SRAF is sraf_width.

[0055] In some embodiments, a design rule check (DRC) tool may be used to analyze the edges of the actual layout to obtain distribution information of the spacing size and line width size in the actual layout.

[0056] For example, through the DRC tool, we can get the minimum width on the actual layout is 90nm, the maximum width is 500nm, the minimum space is 100nm, and the maximum space is generally the outermost part of the actual layout and is regarded as infinite.

[0057] 102. Based on the distribution information, the target graphics are extracted from the actual layout according to the preset extraction rules.

[0058] It is understandable that the distribution information clarifies the range of the spacing size and line width size on the actual layout, and provides boundary conditions for the extraction process of the target graphics. In some embodiments, the preset extraction rules can set appropriate intervals based on the distribution information to ensure that the extracted target graphics cover all possible combinations of spacing size and line width size.

[0059] Through step 101, the maximum and minimum values ​​of the interval size and the maximum and minimum values ​​of the line width size can be obtained, thereby determining the first size interval of the interval size and the second size interval of the line width size. That is, the first size interval of the interval size and the second size interval of the line width size can be determined according to the distribution information; based on the first size interval and the second size interval, the target pattern is extracted from the actual layout according to the preset extraction rule.

[0060] For example, the first size range may be 100 nm-600 nm (here regarded as infinity at 600 nm), and the second size range may be 90 nm-500 nm.

[0061] Among them, the step of "extracting the target graphic from the actual layout based on the first size interval and the second size interval according to the preset extraction rule" can specifically be to combine the first size interval and the second size interval according to the preset extraction rule to obtain the extraction position; perform redundancy removal processing on the extraction position; and perform graphic extraction on the actual layout according to the extraction position after the redundancy removal processing to obtain the target graphic.

[0062] For example, the preset extraction rule is that the line width size is extracted at intervals of 10nm, and the interval size is extracted at intervals of 50nm. Then, when combining the first size interval and the second size interval, the line width size can be gradually extracted at preset intervals (10nm) starting from the minimum line width size until the maximum line width size is reached. For example: the extracted line width sizes are 90nm, 100nm, 110nm, ..., 500nm. Similarly, starting from the minimum interval size, the interval size is gradually extracted at preset intervals (50nm) until the maximum interval size is reached. For example: the extracted interval sizes are 100nm, 150nm, 200nm, ..., infinity (regarded as 600nm). Afterwards, the extracted line width size and interval size values ​​are combined to form different extraction positions. For example: The line width size is 90nm and the interval size is 100nm. The line width size is 90-100nm and the interval size is 100nm. The line width is 490-500nm and the interval is 100nm. The line width is 490-500nm and the interval is 550-600nm (considered as infinite).

[0063] In the process of extracting positions, there may be multiple positions in the same interval (line width and / or interval) of the actual layout, which means that there may be multiple edges or graphics with the same features in these intervals. Therefore, in order to simplify data and avoid redundancy, usually only one of the multiple positions in the same interval is taken. In other words, de-redundancy processing of the extraction position means taking only one of the multiple positions in the same interval.

[0064] It can be understood that, through the above steps, a series of target graphics with specific line widths and spacing sizes can be extracted from the actual layout, and these target graphics contain the size features of all edges on the actual layout.

[0065] 103. Set the evaluation function of the genetic algorithm.

[0066] In the embodiment of the present application, the evaluation function of the genetic function can be as follows:

[0067] Cost_value = +EXTRA+MISSING_PATTERN.

[0068] Among them, PV_BAND_VALUE refers to the size feature change. Size feature change detection generally has multiple values. Therefore, in actual application, the average value of size feature change is used. EXTRA is the exposure area of ​​non-main graphics in OPC correction simulation graphics. MISSING_PATTERN is the area of ​​the main graphics missing in OPC correction simulation graphics.

[0069] Therefore, the evaluation function can only be obtained by first obtaining the size feature change, the exposure area of ​​the non-main pattern and the area where the main pattern is missing.

[0070] Specifically, an OPC corrected simulation graph of the target graph may be obtained; and an evaluation function of the genetic algorithm may be determined according to the OPC corrected simulation graph and the target graph.

[0071] Among them, the step of "determining the evaluation function of the genetic algorithm based on the OPC corrected simulation graphics and the target graphics" can be: obtaining the size feature change based on the OPC corrected simulation graphics and the target graphics; setting the evaluation function of the genetic algorithm based on the OPC corrected simulation graphics and the size feature change.

[0072] Among them, the step of "setting the evaluation function of the genetic algorithm based on the OPC corrected simulation graphics and the change of dimensional features" can be used to obtain the exposure area area of ​​the non-main graphics and the area area of ​​the main graphics missing in the OPC corrected simulation graphics; and set the evaluation function of the genetic algorithm according to the change of dimensional features, the exposure area area of ​​the non-main graphics and the area area of ​​the main graphics missing.

[0073] 104. Based on the evaluation function, a genetic algorithm is used to calculate the target SRAF placement rule of the target graphic.

[0074] The process of calculating SRAF placement rules through genetic algorithms is an iterative optimization process, which gradually approaches the optimal solution through steps such as generating an initial population, evaluating fitness, selection, crossover, and mutation. This process can effectively explore the complex solution space and provide the best SRAF placement rule (target SRAF placement rule) for each extracted target pattern, thereby improving the accuracy and quality of the lithography process.

[0075] It can be understood that the evaluation function can be used to evaluate the quality (i.e., fitness) of each individual, and the goal is to minimize the cost value (Cost_value). That is, through the iterative calculation of the genetic algorithm, the SRAF placement rule with the lowest Cost_value is the optimal SRAF placement rule.

[0076] The specific process of calculating the SRAF placement rule by using the genetic algorithm can refer to the existing genetic algorithm, which will not be described in detail in the embodiments of the present application.

[0077] 105. Perform SRAF placement on the actual layout according to the target SRAF placement rule to obtain a SRAF graphic.

[0078] It can be understood that by placing SRAFs on the actual layout according to the target SRAF placement rules, a SRAF pattern that meets the requirements is finally generated, which can improve the resolution of features and reduce the optical proximity effect during the lithography process, thereby ensuring the performance and yield of the final chip.

[0079] In summary, the SRAF graphics generation method provided in the embodiment of the present application includes determining the distribution information of the size features in the actual layout; based on the distribution information, extracting the target graphics from the actual layout according to the preset extraction rules; setting the evaluation function of the genetic algorithm; based on the evaluation function, using the genetic algorithm to calculate the target SRAF placement rule of the target graphics; performing SRAF placement on the actual layout according to the target SRAF placement rule to obtain the SRAF graphics. This scheme can automatically generate SRAF graphics without manual participation, thereby improving the generation efficiency of SRAF graphics. In addition, since this scheme is to design the SRAF placement rules directly on the actual layout, it includes all the size features on the actual layout, and the SRAF placement rules finally formed are the optimal SRAF placement rules, which also improves the accuracy of the SRAF graphics.

[0080] In order to better implement the SRAF graphic generation method provided in the embodiment of the present application, the embodiment of the present application also provides a SRAF graphic generation device, wherein the meanings of the terms are the same as those in the above-mentioned SRAF graphic generation method, and the specific implementation details can refer to the description in the method embodiment.

[0081] See also Figure 3 , Figure 3 201 is a schematic diagram of the structure of the SRAF graphic generation device provided in the embodiment of the present application. The SRAF graphic generation device may include a distribution determination unit 201, a graphic extraction unit 202, a function setting unit 203, a rule calculation unit 204 and a graphic generation unit 205.

[0082] A distribution determination unit 201, used to determine the distribution information of the size features in the actual layout;

[0083] A graphics extraction unit 202, configured to extract a target graphics from the actual layout according to a preset extraction rule based on the distribution information;

[0084] Function setting unit 203, used to set the evaluation function of the genetic algorithm;

[0085] A rule calculation unit 204 is used to calculate the target SRAF placement rule of the target graphic using a genetic algorithm based on the evaluation function;

[0086] The pattern generation unit 205 is used to place SRAF on the actual layout according to the target SRAF placement rule to obtain a SRAF pattern.

[0087] The specific implementation of each of the above units can refer to the above-mentioned embodiment of the SRAF graphic generation method, which will not be described one by one here.

[0088] In summary, the SRAF graphic generation device provided by the embodiment of the present application can determine the distribution information of the size features in the actual layout through the distribution determination unit 201; the graphic extraction unit 202 extracts the target graphic from the actual layout according to the preset extraction rules based on the distribution information; the function setting unit 203 sets the evaluation function of the genetic algorithm; the rule calculation unit 204 uses the genetic algorithm to calculate the target SRAF placement rule of the target graphic based on the evaluation function; the graphic generation unit 205 performs SRAF placement on the actual layout according to the target SRAF placement rule to obtain the SRAF graphic. This scheme can automatically generate SRAF graphics without manual participation, thereby improving the generation efficiency of SRAF graphics. In addition, since this scheme is to design the SRAF placement rules directly on the actual layout, it includes all the size features on the actual layout, and the SRAF placement rules finally formed are the best SRAF placement rules, which also improves the accuracy of the SRAF graphics.

[0089] The present application also provides an electronic device, in which the SRAF graphic generation device of the present application can be integrated, such as Figure 4 As shown, it shows a schematic diagram of the structure of the electronic device involved in the embodiment of the present application, specifically:

[0090] The electronic device may include a radio frequency (RF) circuit 301, a memory 302 including one or more computer-readable storage media, an input unit 303, a display unit 304, a sensor 305, an audio circuit 306, a wireless fidelity (WiFi) module 307, a processor 308 including one or more processing cores, and a power supply 309. Those skilled in the art will appreciate that Figure 4 The electronic device structure shown in the figure does not constitute a limitation on the electronic device, and may include more or fewer components than shown in the figure, or combine certain components, or arrange the components differently.

[0091] The RF circuit 301 can be used for receiving and sending signals during the process of sending and receiving information or making calls. In particular, after receiving the downlink information of the base station, it is handed over to one or more processors 308 for processing; in addition, the data related to the uplink is sent to the base station. Usually, the RF circuit 301 includes but is not limited to an antenna, at least one amplifier, a tuner, one or more oscillators, a subscriber identity module (Subscriber Identity Module, SIM) card, a transceiver, a coupler, a low noise amplifier (LowNoiseAmplifier, LNA), a duplexer, etc. In addition, the RF circuit 301 can also communicate with the network and other devices through wireless communication. Wireless communication can use any communication standard or protocol, including but not limited to Global System of Mobile communication (Global System of Mobile communication, GSM), General Packet Radio Service (General PacketRadio Service, GPRS), Code Division Multiple Access (Code Division Multiple Access, CDMA), Wideband Code Division Multiple Access (Wideband Code Division Multiple Access, WCDMA), Long Term Evolution (Long Term Evolution, LTE), email, Short Messaging Service (SMS), etc.

[0092] The memory 302 can be used to store software programs and modules. The processor 308 executes various functional applications and information processing by running the software programs and modules stored in the memory 302. The memory 302 may mainly include a program storage area and a data storage area, wherein the program storage area may store an operating system, an application required for at least one function (such as a sound playback function, an image playback function, etc.), etc.; the data storage area may store data created according to the use of the electronic device (such as audio data, a phone book, etc.), etc. In addition, the memory 302 may include a high-speed random access memory, and may also include a non-volatile memory, such as at least one disk storage device, a flash memory device, or other volatile solid-state storage devices. Accordingly, the memory 302 may also include a memory controller to provide the processor 308 and the input unit 303 with access to the memory 302.

[0093] The input unit 303 can be used to receive input digital or character information, and generate keyboard, mouse, joystick, optical or trackball signal input related to user settings and function control. Specifically, in a specific embodiment, the input unit 303 may include a touch-sensitive surface and other input devices. The touch-sensitive surface, also known as a touch display screen or a touch pad, can collect the user's touch operations on or near it (such as the user's operation on or near the touch-sensitive surface using any suitable object or accessory such as a finger, a stylus, etc.), and drive the corresponding connection device according to a pre-set program. Optionally, the touch-sensitive surface may include a touch detection device and a touch controller. Among them, the touch detection device detects the user's touch orientation, detects the signal brought by the touch operation, and transmits the signal to the touch controller; the touch controller receives the touch information from the touch detection device, converts it into the touch point coordinates, and then sends it to the processor 308, and can receive and execute the command sent by the processor 308. In addition, the touch-sensitive surface can be implemented using multiple types such as resistive, capacitive, infrared and surface acoustic wave. In addition to the touch-sensitive surface, the input unit 303 may also include other input devices. Specifically, other input devices may include, but are not limited to, one or more of a physical keyboard, function keys (such as a volume control key, a switch key, etc.), a trackball, a mouse, a joystick, and the like.

[0094] The display unit 304 can be used to display information input by the user or information provided to the user, as well as various graphical user interfaces of the electronic device, which can be composed of graphics, text, icons, videos, and any combination thereof. The display unit 304 may include a display panel. Optionally, the display panel may be configured in the form of a liquid crystal display (LCD), an organic light-emitting diode (OLED), or the like. Furthermore, the touch-sensitive surface may cover the display panel, and when the touch-sensitive surface detects a touch operation on or near it, it is transmitted to the processor 308 to determine the type of touch event, and then the processor 308 provides a corresponding visual output on the display panel according to the type of touch event. Although in Figure 4 In the embodiment, the touch-sensitive surface and the display panel are used as two independent components to realize input and output functions, but in some embodiments, the touch-sensitive surface and the display panel can be integrated to realize input and output functions.

[0095] The electronic device may also include at least one sensor 305, such as a light sensor, a motion sensor, and other sensors. Specifically, the light sensor may include an ambient light sensor and a proximity sensor, wherein the ambient light sensor may adjust the brightness of the display panel according to the brightness of the ambient light, and the proximity sensor may turn off the display panel and / or backlight when the electronic device is moved to the ear. As a type of motion sensor, the gravity acceleration sensor can detect the magnitude of acceleration in each direction (generally three axes), and can detect the magnitude and direction of gravity when stationary. It can be used for applications that identify the posture of the mobile phone (such as horizontal and vertical screen switching, related games, magnetometer posture calibration), vibration recognition related functions (such as pedometer, tapping), etc.; As for other sensors that can be configured in electronic devices, such as gyroscopes, barometers, hygrometers, thermometers, infrared sensors, etc., they will not be repeated here.

[0096] The audio circuit 306, the speaker, and the microphone can provide an audio interface between the user and the electronic device. The audio circuit 306 can transmit the electrical signal converted from the received audio data to the speaker, which is converted into a sound signal for output; on the other hand, the microphone converts the collected sound signal into an electrical signal, which is received by the audio circuit 306 and converted into audio data, and then the audio data is output to the processor 308 for processing, and then sent to another electronic device through the RF circuit 301, or the audio data is output to the memory 302 for further processing. The audio circuit 306 may also include an earplug jack to provide communication between an external headset and the electronic device.

[0097] WiFi is a short-range wireless transmission technology. Electronic devices can help users send and receive emails, browse web pages, and access streaming media through WiFi module 307. It provides users with wireless broadband Internet access. Figure 4 , a WiFi module 307 is shown, but it is understandable that it is not a necessary component of the electronic device and can be omitted as needed without changing the essence of the invention.

[0098] The processor 308 is the control center of the electronic device. It uses various interfaces and lines to connect various parts of the entire mobile phone. By running or executing software programs and / or modules stored in the memory 302 and calling data stored in the memory 302, it executes various functions of the electronic device and processes data, thereby monitoring the mobile phone as a whole. Optionally, the processor 308 may include one or more processing cores; preferably, the processor 308 may integrate an application processor and a modem processor, wherein the application processor mainly processes the operating system, user interface, and application programs, and the modem processor mainly processes wireless communications. It is understandable that the above-mentioned modem processor may not be integrated into the processor 308.

[0099] The electronic device also includes a power supply 309 (such as a battery) for supplying power to each component. Preferably, the power supply can be logically connected to the processor 308 through a power management system, so that the power management system can manage charging, discharging, and power consumption management. The power supply 309 can also include one or more DC or AC power supplies, recharging systems, power failure detection circuits, power converters or inverters, power status indicators, and other arbitrary components.

[0100] Although not shown, the electronic device may also include a camera, a Bluetooth module, etc., which will not be described in detail herein. Specifically in this embodiment, the processor 308 in the electronic device will load the executable files corresponding to the processes of one or more application programs into the memory 302 according to the following instructions, and the processor 308 will run the application programs stored in the memory 302, thereby realizing various functions, such as:

[0101] Determine the distribution information of the size features in the actual layout;

[0102] Based on the distribution information, the target graphics are extracted from the actual layout according to the preset extraction rules;

[0103] Set the evaluation function of the genetic algorithm;

[0104] Based on the evaluation function, the target SRAF placement rules of the target graph are calculated using a genetic algorithm;

[0105] SRAF placement is performed on the actual layout according to the target SRAF placement rule to obtain an SRAF pattern.

[0106] In summary, the electronic device provided by the embodiment of the present application can determine the distribution information of the size features in the actual layout; based on the distribution information, extract the target graphic from the actual layout according to the preset extraction rules; set the evaluation function of the genetic algorithm; based on the evaluation function, use the genetic algorithm to calculate the target SRAF placement rule of the target graphic; perform SRAF placement on the actual layout according to the target SRAF placement rule to obtain the SRAF graphic. This solution can automatically generate SRAF graphics without manual participation, thereby improving the generation efficiency of SRAF graphics. In addition, since this solution is to design the SRAF placement rules directly on the actual layout, it includes all the size features on the actual layout, and the SRAF placement rules finally formed are the optimal SRAF placement rules, which also improves the accuracy of the SRAF graphics.

[0107] In the above embodiments, the description of each embodiment has its own emphasis. For the part that is not described in detail in a certain embodiment, please refer to the detailed description of the SRAF graphic generation method above, and will not be repeated here.

[0108] It should be noted that, for the SRAF graphic generation method in the embodiment of the present application, those skilled in the art can understand that all or part of the process of implementing the SRAF graphic generation method in the embodiment of the present application can be completed by controlling related hardware through a computer program. The computer program can be stored in a computer-readable storage medium, such as stored in the memory of the terminal, and executed by at least one processor in the terminal. During the execution process, it may include the process of the embodiment of the SRAF graphic generation method.

[0109] For the SRAF graphic generation device of the embodiment of the present application, each functional module can be integrated into a processing chip, or each module can exist physically separately, or two or more modules can be integrated into one module. The above-mentioned integrated module can be implemented in the form of hardware or in the form of software functional modules. If the integrated module is implemented in the form of a software functional module and sold or used as an independent product, it can also be stored in a computer-readable storage medium.

[0110] To this end, the embodiment of the present application provides a storage medium, in which a plurality of instructions are stored, and the instructions can be loaded by a processor to execute the steps in any SRAF graphic generation method provided in the embodiment of the present application. The storage medium can be a disk, an optical disk, a read-only memory (ROM), a random access memory (RAM), etc.

[0111] The SRAF graphic generation method, device, storage medium and electronic device provided by the present application are respectively introduced in detail above. Specific examples are used in this article to illustrate the principles and implementation methods of the present application. The description of the above embodiments is only used to help understand the core idea of ​​the present application; at the same time, for technical personnel in this field, according to the idea of ​​the present application, there will be changes in the specific implementation method and application scope. In summary, the content of this specification should not be understood as a limitation on the present application.

Claims

1. A method for generating a SRAF graph, characterized in that: include: Determine the distribution information of the size features in the actual layout; Based on the distribution information, extracting a target graphic from the actual layout according to a preset extraction rule; Obtaining an OPC-corrected simulation graph of the target graph; Acquire dimensional feature changes according to the OPC corrected simulation pattern and the target pattern; Obtaining the exposure area of ​​the non-main pattern and the area of ​​the missing main pattern in the OPC correction simulation pattern; Setting an evaluation function of a genetic algorithm according to the change in the size feature, the area of ​​the exposure region of the non-main pattern and the area of ​​the region where the main pattern is missing; Based on the evaluation function, using the genetic algorithm to calculate the target SRAF placement rule of the target graphic; SRAF placement is performed on the actual layout according to the target SRAF placement rule to obtain an SRAF graphic.

2. The SRAF graphic generation method according to claim 1, characterized in that: The determining of the distribution information of the size features in the actual layout includes: The DRC tool is used to analyze the edge of the actual layout to obtain the distribution information of the spacing size and line width size in the actual layout.

3. The SRAF pattern generation method according to claim 2, characterized in that: The step of extracting a target graphic from the actual layout based on the distribution information and according to a preset extraction rule includes: Determine a first size interval of the spacing size and a second size interval of the line width size according to the distribution information; Based on the first size interval and the second size interval, a target graphic is extracted from the actual layout according to a preset extraction rule.

4. The SRAF pattern generation method according to claim 3, characterized in that: The step of extracting the target graphic from the actual layout according to a preset extraction rule based on the first size interval and the second size interval includes: According to the preset extraction rule, the first size interval and the second size interval are combined to obtain an extraction position; Performing redundancy removal processing on the extraction position; Graphics are extracted from the actual layout according to the extracted positions after redundancy removal to obtain a target graphic.

5. A SRAF pattern generating device, characterized in that: include: A distribution determination unit, used to determine the distribution information of the size features in the actual layout; A graphics extraction unit, configured to extract a target graphics from the actual layout according to a preset extraction rule based on the distribution information; A function setting unit, used for obtaining an OPC correction simulation graph of the target graph; Acquire dimensional feature changes according to the OPC corrected simulation pattern and the target pattern; Obtaining the exposure area of ​​the non-main pattern and the area of ​​the missing main pattern in the OPC correction simulation pattern; Setting an evaluation function of a genetic algorithm according to the change in the size feature, the area of ​​the exposure region of the non-main pattern and the area of ​​the region where the main pattern is missing; A rule calculation unit, used for calculating the target SRAF placement rule of the target graphic using a genetic algorithm based on the evaluation function; The graphic generation unit is used to place SRAF on the actual layout according to the target SRAF placement rule to obtain a SRAF graphic.

6. A storage medium, characterized in that: The storage medium stores a plurality of instructions, and the instructions are suitable for being loaded by a processor to execute the SRAF graphic generation method according to any one of claims 1 to 4.

7. An electronic device, characterized in that: The method comprises a memory, a processor and a computer program stored in the memory and executable on the processor, wherein the processor implements the SRAF graphic generation method according to any one of claims 1 to 4 when executing the computer program.

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