Anti-reflection film liquid and photovoltaic glass containing film liquid

Abstract

The invention relates to a composition for preparing an antireflection film liquid for photovoltaic glass. The composition comprises a nano material with light antireflection capability; a nanometer material with infrared reflection capability; the invention also relates to an antireflection film liquid for photovoltaic glass, which contains the composition, a method for preparing the photovoltaic glass by using the antireflection film liquid, and the photovoltaic glass prepared by using the antireflection film liquid and the method provided by the invention.

Description

Technical Field

[0001] The present application relates to materials and compositions for preparing anti-reflective film liquid for photovoltaic glass, anti-reflective film liquid for photovoltaic glass containing the composition, and a method for preparing photovoltaic glass using the anti-reflective film liquid, as well as photovoltaic glass prepared using the anti-reflective film liquid and method of the present application. Background Art

[0002] In the past 20 years, photovoltaic power generation technology has been widely used around the world. In photovoltaic power generation systems, solar energy photoelectric conversion is generally achieved through the absorption of the solar spectrum by silicon wafers. Photovoltaic glass, as a protective layer on the surface of solar cells, is one of the important auxiliary materials of photovoltaic modules. However, since the glass surface will reflect part of the sunlight, the power generation of the battery will decrease. Coating a layer of anti-reflection film on the glass surface is currently the most widely used method to effectively reduce the reflection of sunlight on the surface of photovoltaic glass, which can increase the light flux reaching the surface of crystalline silicon cells, thereby improving the utilization rate of solar energy.

[0003] The sunlight that hits the earth is composed of 7% ultraviolet rays, 39% visible light, and 53% near infrared rays. The near infrared region can be further divided into short-wave near infrared (700-1100nm) and long-wave near infrared (1200-2500nm). For crystalline silicon cells, sunlight within the wavelength range of 380nm-1100nm can be effectively absorbed and converted into electrical energy; incident light with a wavelength greater than 1100nm irradiates the photovoltaic module in the form of thermal radiation, causing the operating temperature of the module to rise, inevitably causing problems such as module failure. Therefore, specific materials are used to selectively reflect incident light, block invalid infrared light, and reduce the operating temperature of the module.

[0004] In addition, in outdoor applications, the amount of sunlight reaching photovoltaic modules is inevitably reduced due to environmental factors such as dust, organic dirt, rain, snow stains, etc. Therefore, the development of anti-reflection films with additional properties such as self-cleaning is crucial to improving the power generation efficiency of modules. Summary of the invention

[0005] A series of studies have been conducted on anti-reflection films in the prior art. For example, Chinese patent CN 101898870B records a coating solution and a preparation method thereof, as well as a method for manufacturing solar cell encapsulation glass using the same. In the document, a coating solution is made of titanium sol, silica sol, zirconium sol, aluminum sol, and fluoride as the main materials. The coating solution is used to form an anti-reflection film on the surface of the solar cell encapsulation glass. Under long-term outdoor exposure, the adhesion, hardness, and salt spray resistance of the anti-reflection film will increase to varying degrees, which can meet the use requirements of solar products in various environmental climates. In Chinese patent application CN108676393A, a preparation method of an anti-reflection coating solution is recorded. The coating solution recorded in the document can form a composite film layer of titanium dioxide / vanadium dioxide, the vanadium dioxide crystal layer can block high-energy infrared light, and titanium dioxide can increase the transmittance of the film layer to visible light, thereby enhancing the light transmission characteristics while enabling the film layer to have temperature regulation ability when applied to glass. At the same time, the document mentions that tea seed extract has a good cleaning effect on the formed film layer. In Chinese patent CN101805134B, a coating solution for vanadium dioxide thin film and a method for preparing and applying the thin film are mentioned. The scheme of the document uses tetravalent vanadium alcohol salt as raw material to prepare a doped or undoped vanadium dioxide thin film with phase change characteristics. The obtained film has a unique surface microporous structure, which not only obtains a high visible light transmittance, but also maintains a strong infrared control performance. In Chinese patent application CN114213033A, a rare earth-based infrared blocking coated glass for energy-saving rooms is recorded. The coated glass is coated with an infrared blocking layer on the outer surface of the glass substrate, and the infrared blocking material is a nano-dispersion of a rare earth-based infrared blocking material. The obtained glass coating can selectively shield light, and the average light transmittance in the infrared light region (800-2500nm) is less than 5%, and the transmittance in the visible light region (400-800nm) is greater than 70%. Chinese patent CN1962508B describes a transparent, highly conductive near-infrared reflective coated glass and its preparation method. The technical solution of the document uses zinc-gallium alloy as a target material and adopts magnetron sputtering to form zinc oxide films with different gallium doping contents on a substrate. The obtained near-infrared reflective coated glass has the characteristics of high transparency, high conductivity, and high infrared reflection (near-infrared transmittance is less than 30%). Chinese patent document CN114180852A describes a photovoltaic glass-based high anti-reflection film. The technical solution uses photovoltaic glass as a substrate and adopts magnetron sputtering to prepare an anti-reflection film, which is from bottom to top: the first Nb2O5 layer, the second SiO2 layer, the third Nb2O5 layer and the fourth TiO2 layer. In the visible light band, the transmittance is 6% higher than that of uncoated glass of the same specification.Chinese patent document CN114772942A describes a photovoltaic glass self-cleaning nano coating and its processing method. In the technical solution of the patent document, organic and inorganic cross-linking doping technology is used to dope conductive element intermediates and photocatalytic element intermediates to form a silicon dioxide / titanium dioxide nano coating to achieve a super-hydrophilic self-cleaning interface. Chinese patent document CN114163882A involves a photovoltaic panel film layer and a production process for river management. The document discloses a film layer for protecting the anti-reflection film on the surface of a photovoltaic panel, including the following raw materials: epoxy-modified polyacrylic resin, curing agent, infrared reflective filler, heat dissipation filler, self-cleaning material, leveling agent and solvent. The film layer can effectively extend the life of the anti-reflection film layer and ensure the stability of the power generation of the component.

[0006] Although efforts have been made in the prior art to improve the anti-reflection performance of photovoltaic glass from many aspects, there is still a pursuit of photovoltaic glass that can efficiently utilize sunlight, block invalid infrared light, reduce component temperature, and maintain the self-cleaning ability of the components for a long time.

[0007] In view of the above problems, the present application is intended to provide an anti-reflection film liquid and a photovoltaic glass containing the film liquid. The anti-reflection film liquid includes a nanomaterial with light anti-reflection ability, a nanomaterial with infrared reflection ability, and a nanomaterial with self-cleaning ability. It can not only efficiently utilize sunlight, block invalid infrared light, and reduce the temperature of the component, but also maintain the self-cleaning ability of the component for a long time and improve the service life of the component.

[0008] This application provides the following solutions:

[0009] 1. A composition for preparing an anti-reflection film liquid for photovoltaic glass, comprising:

[0010] Nanomaterials with light-enhancing properties;

[0011] Nanomaterials with infrared reflective capabilities; and

[0012] Nanomaterials with self-cleaning capabilities.

[0013] 2. The composition according to item 1, wherein

[0014] The nanomaterial with light-enhancing ability and the nanomaterial with cleaning ability are nanomaterials with light-enhancing ability and self-cleaning ability.

[0015] 3. The composition according to item 1 or 2, wherein

[0016] The average particle size of the nanomaterial having light-enhancing transmittance capability is 1 to 100 nm, preferably 1.5 to 50 nm, and more preferably 2 to 30 nm; or

[0017] The average particle size of the infrared reflective nanomaterial is 10 to 150 nm, preferably 15 to 100 nm, and more preferably 20 to 60 nm; or

[0018] The average particle size of the nanomaterial having a self-cleaning ability is 1 to 100 nm, preferably 1.5 to 50 nm, and more preferably 2 to 30 nm.

[0019] 4. The composition according to item 1, wherein

[0020] With respect to 1 weight part of the nanomaterial with self-cleaning ability, the nanomaterial with infrared reflection ability is 2 weight parts to 20 weight parts, and the nanomaterial with light transmission enhancement ability is 3 weight parts to 40 weight parts.

[0021] 5. The composition according to item 2, wherein

[0022] The amount of the nanomaterial having the ability to increase light transmission and self-cleaning is 0.1 to 0.6 parts by weight, preferably 0.2 to 0.5 parts by weight, based on 1 part by weight of the nanomaterial having the ability to increase light transmission and self-cleaning.

[0023] 6. The composition according to any one of items 1 to 5, wherein

[0024] The resistivity of the nanomaterial with infrared reflection ability is 1×10 -4 ~0.1Ωcm, preferably 1.5×10 -4 ~0.08Ωcm.

[0025] 7. The composition according to any one of items 1 to 6, wherein

[0026] The nanomaterial with self-cleaning ability or the nanomaterial with light-enhancing ability and self-cleaning ability is a super-hydrophilic material. Preferably, the water contact angle of the super-hydrophilic material is 0°<θ<30°.

[0027] 8. The composition according to any one of items 1 to 7, wherein

[0028] The nanomaterial having light transmission enhancement capability is selected from one or more of SiO2, SiO2-TiO2, SiO2-MgF2, MoO3, Al2O3, Al2O3-MgF2, VO2, TiO2, NiO, ZrO2, and Si3N4; or

[0029] The nanomaterial with infrared reflection capability is ZnO doped with anions or cations or co-doped with anions, i.e., MZO, wherein M is preferably selected from one or more of Al, Ga, F, B, Co, and Ni; or

[0030] The nanomaterial with self-cleaning ability is selected from one or both of TiO2 and Zn-doped TiO2 nanomaterials.

[0031] 9. The composition according to any one of items 2 to 7, wherein

[0032] The nanomaterials with light-enhancing and self-cleaning capabilities are SiO2-TiO2 or TiO2.

[0033] 10. An anti-reflection film liquid for photovoltaic glass, comprising:

[0034] The composition according to any one of items 1 to 9;

[0035] Solvents; and

[0036] Additives.

[0037] 11. The anti-reflection film liquid according to item 10, wherein

[0038] The solvent is selected from one or more of deionized water, ethanol, isopropanol, and ethylene glycol; or

[0039] Additives include curing agents, leveling agents and defoamers;

[0040] Preferably, the curing agent is selected from one or more of m-xylylenediamine, diaminodiphenylmethane, methylenebiscyclohexylamine, diethylenetriamine, aminoethylpiperazine, diaminodiphenylsulfone, diethylaminopropylamine and dicyandiamide; or

[0041] Preferably, the leveling agent is selected from one or more of polydimethylsiloxane, polymethylphenylsiloxane, modified polysiloxane, polyethyl acrylate, and polybutyl acrylate; or

[0042] A preferred defoaming agent is polyethylene glycol.

[0043] 12. The anti-reflection film liquid according to item 10 or 11, wherein

[0044] In the anti-reflection film liquid, the mass percentage of the nanomaterial with light anti-reflection ability is 30-40%, the mass percentage of the nanomaterial with infrared reflection ability is 5-20%, and the mass percentage of the nanomaterial with self-cleaning ability is 1-10%; or

[0045] In the anti-reflection film liquid, the mass percentage of the nano material with infrared reflection ability is 5-20%, and the mass percentage of the nano material with light anti-reflection ability and self-cleaning ability is 31-50%.

[0046] 13. The antireflection film solution according to any one of items 10 to 12, wherein

[0047] In the anti-reflection film liquid, the mass percentage of the solvent is 30-60%, and the mass percentage of the auxiliary agent is 1-7%.

[0048] 14. The antireflection film solution according to any one of items 11 to 13, wherein

[0049] In the anti-reflection film liquid, the mass percentage of the curing agent is 0.5-3%, the mass percentage of the leveling agent is 0.01-2.5%, and the mass percentage of the defoaming agent is 0.1-2%.

[0050] 15. A photovoltaic glass comprising:

[0051] glass substrate; and

[0052] An antireflection film layer formed on a glass substrate using the composition described in any one of items 1 to 9 or the antireflection film solution described in any one of items 10 to 14.

[0053] 16. The photovoltaic glass according to item 15, wherein the thickness of the anti-reflection film layer is 0.8 to 20 μm, preferably 1 to 8 μm.

[0054] 17. The photovoltaic glass according to item 15 or 16, wherein the coating amount of the antireflection film liquid per unit area on the glass substrate is 1 to 50 g / m 2 , preferably 5 to 40 g / m 2 , more preferably 9-20g / m 2 .

[0055] 18. A method for preparing photovoltaic glass, comprising:

[0056] Applying the antireflection coating solution described in any one of items 10 to 14 or a solution containing the composition described in any one of items 1 to 9 on the surface of a glass substrate;

[0057] The coated glass substrate is solidified and sintered to obtain photovoltaic glass.

[0058] 19. The method according to item 18, wherein the glass substrate is an ultra-white glass substrate, preferably an ultra-white float glass or ultra-white patterned glass of 2-6 mm.

[0059] 20. The method according to item 18 or 19, wherein

[0060] The curing is low temperature curing; preferably carried out at 80-200°C for 10-30 minutes; or

[0061] The sintering is high temperature sintering; preferably, it is carried out at 650-720° C. for 1-8 min.

[0062] 21. The method according to item 20, wherein the glass formed by the method is the photovoltaic glass according to any one of items 15 to 17.

[0063] Effects of the Invention

[0064] The present application provides an anti-reflection composition, an anti-reflection film liquid and a photovoltaic glass. The photovoltaic glass prepared by using the anti-reflection composition and the anti-reflection film liquid of the present application can effectively reduce the reflection of sunlight on the glass surface while selectively reflecting invalid infrared light, increase the transmittance of sunlight on the photovoltaic glass surface, improve the power generation efficiency of photovoltaic modules, reduce the operating temperature of the modules, and at the same time, add a self-cleaning function, increase the power generation of the modules, and extend the service life.

[0065] In view of the fact that the anti-reflection film liquid in the prior art only considers improving the transmittance of sunlight in the visible light range, while ignoring the adverse effects of infrared light on the components, the inventors of the present application unexpectedly added nanomaterials with infrared reflection ability to the commonly used anti-reflection film liquid, effectively improving the effective utilization of sunlight by photovoltaic components.

[0066] For infrared reflective coated glass, magnetron sputtering is usually used for multi-layer coating to achieve the ideal effect. Not only is the process cost high, but the working environment requirements are strict, which is not conducive to large-scale production. This application adopts a one-step method to add nanomaterials with infrared reflective ability to the anti-reflective film liquid, which doubles the efficiency, increases transmittance and blocks invalid infrared light, thereby eliminating the complex process of magnetron sputtering.

[0067] In order to address the problem of reduced power generation of photovoltaic modules during long-term outdoor use due to severe weather such as exposure to the sun, snow, dust, and haze, the inventors of this application further added self-cleaning materials to the anti-reflection film liquid, utilizing the super hydrophilic properties and photocatalytic effect of the material itself to maintain the self-cleaning ability for a long time. DETAILED DESCRIPTION

[0068] The following embodiments of the present application are only used to illustrate the specific embodiments of the present application, and these embodiments cannot be understood as limiting the present application. Any other changes, modifications, substitutions, combinations, and simplifications made without departing from the spirit and principle of the present application are deemed to be equivalent replacement methods and fall within the scope of protection of the present application.

[0069] The specific embodiments of the present application will be described in more detail below. However, it should be understood that the present application can be implemented in various forms and should not be limited by the embodiments set forth herein. On the contrary, these embodiments are provided to enable a more thorough understanding of the present application and to enable the scope of the present application to be fully communicated to those skilled in the art.

[0070] It should be noted that certain words are used in the specification and claims to refer to specific components. Those skilled in the art should understand that technicians may use different nouns to refer to the same component. This specification and claims do not use the difference in nouns as a way to distinguish components, but use the difference in the functions of the components as the criterion for distinction. As mentioned throughout the specification and claims, "including" or "comprising" is an open term, so it should be interpreted as "including but not limited to". The subsequent description of the specification is a preferred embodiment of the implementation of the present application, but the description is based on the general principles of the specification and is not used to limit the scope of the present application. The scope of protection of the present application shall be determined by the attached claims.

[0071] As used herein, "substantially free" with respect to a particular component is used herein to mean that the particular component is not purposefully formulated into the composition and / or is present only as a contaminant or in trace amounts. Thus, the total amount of the particular component resulting from any accidental contamination of the composition is less than 0.05%, preferably less than 0.01%. Most preferred are compositions in which the amount of the particular component is undetectable by standard analytical methods.

[0072] As used in this specification, "a" or "an" may mean one or more. As used in the claims, when used with the word "comprising", the word "a" or "an" may mean one or more than one.

[0073] The term "or" is used in the claims to mean "and / or" unless explicitly stated to refer only to alternatives or the alternatives are mutually exclusive, although the present disclosure supports a definition referring only to alternatives and "and / or." As used herein, "another" may mean at least a second or more.

[0074] The present application provides a composition for preparing an anti-reflection film liquid for photovoltaic glass, an anti-reflection film liquid containing the composition for preparing an anti-reflection film liquid for photovoltaic glass, and photovoltaic glass containing the film liquid. The photovoltaic glass selectively reflects invalid infrared light while effectively reducing the reflection of sunlight on the glass surface, increasing the transmittance of sunlight on the photovoltaic glass surface, improving the power generation efficiency of photovoltaic modules, reducing the operating temperature of the modules, and having an additional self-cleaning function, thereby increasing the power generation of the modules and extending the service life.

[0075] The present application relates to a composition for preparing an anti-reflection film liquid for photovoltaic glass, which comprises: a nano material with light anti-reflection capability; a nano material with infrared reflection capability; and a nano material with self-cleaning capability.

[0076] The composition of the present application can be further mixed with a solvent and an auxiliary agent to form an anti-reflection film liquid for photovoltaic glass.

[0077] The nanomaterial with infrared reflection capability in the composition or anti-reflection film liquid of the present application is cation-doped or anion-doped or anion-cation co-doped zinc oxide. Defects are introduced into the metal oxide lattice by ion doping to increase the free carrier concentration, thereby improving the conductivity of the material, achieving high infrared reflection characteristics while ensuring high transparency. The inventors of the present application unexpectedly discovered that if the nanomaterial with infrared reflection capability has good conductivity, it can ensure high transparency while achieving high infrared reflection characteristics.

[0078] In this application, the resistivity of the nanomaterial with infrared reflection capability is 1×10 -4 ~0.1Ωcm, preferably 1.5×10 -4 ~0.08Ωcm, under such resistivity conditions, the transparency and infrared reflection characteristics of the nanomaterial with infrared reflection ability can be significantly improved. In a specific embodiment, the resistivity of the nanomaterial with infrared reflection ability can be, for example, 1×10 -4 Ωcm、1.1×10 -4 Ωcm、1.2×10 -4 Ωcm、1.3×10 -4 Ωcm、1.4×10 -4 Ωcm、1.5×10 -4 Ωcm、1.6×10 -4 Ωcm、1.7×10 -4 Ωcm、1.8×10 -4 Ωcm、1.9×10 -4 Ωcm、2.0×10 -4 Ωcm、2.5×10 -4 Ωcm、3.0×10 -4 Ωcm、3.5×10 -4 Ωcm、4.0×10 -4 Ωcm、4.5×10 -4 Ωcm、5.0×10 -4 Ωcm、5.5×10 -4 Ωcm、6.0×10 -4 Ωcm、6.5×10 -4 Ωcm、7.0×10 -4 Ωcm、7.5×10 -4 Ωcm、8.0×10 -4 Ωcm、8.5×10 -4 Ωcm、9.0×10 -4 Ωcm、9.5×10 -4 Ωcm、1.0×10 -3 Ωcm、1.1×10 -3 Ωcm、1.2×10-3 Ωcm、1.3×10 -3 Ωcm、1.4×10 -3 Ωcm、1.5×10 -3 Ωcm、1.6×10 -3 Ωcm、1.7×10 -3 Ωcm、1.8×10 -3 Ωcm、1.9×10 -3 Ωcm、2.0×10 -3 Ωcm、2.5×10 -3 Ωcm、3.0×10 -3 Ωcm、3.5×10 -3 Ωcm、4.0×10 -3 Ωcm、4.5×10 -3 Ωcm、5.0×10 -3 Ωcm、5.5×10 -3 Ωcm、6.0×10 -3 Ωcm、6.5×10 -3 Ωcm、7.0×10 -3 Ωcm、7.5×10 -3 Ωcm、8.0×10 -3 Ωcm、8.5×10 -3 Ωcm、9.0×10 -3 Ωcm、9.5×10 -3 Ωcm、1.0×10 -2 Ωcm、1.1×10 -2 Ωcm、1.2×10 -2 Ωcm、1.3×10 -2 Ωcm、1.4×10 -2 Ωcm、1.5×10 -2 Ωcm、1.6×10 -2 Ωcm、1.7×10 -2 Ωcm、1.8×10 -2 Ωcm、1.9×10 -2 Ωcm、2.0×10 -2 Ωcm、2.5×10 -2 Ωcm、3.0×10 -2 Ωcm、3.5×10 -2 Ωcm、4.0×10 -2 Ωcm、4.5×10 -2 Ωcm、5.0×10 -2 Ωcm、5.5×10 -2 Ωcm、6.0×10 -2 Ωcm、6.5×10 -2Ωcm、7.0×10 -2 Ωcm、7.5×10 -2 Ωcm、8.0×10 -2 Ωcm、8.5×10 -2 Ωcm、9.0×10 -2 Ωcm、9.5×10 -2 Ωcm, 0.1Ωcm.

[0079] In the present application, the nanomaterial with infrared reflection ability is ZnO doped with anions or cations alone or co-doped, i.e., MZO, preferably, M is selected from one or more of Al, Ga, F, B, Co, and Ni. For example, it can be Al-doped ZnO, Ga-doped ZnO, F-doped ZnO, B-doped ZnO, Co-doped ZnO, or Ni-doped ZnO, i.e., ZnO doped with anions or cations alone. It can also be ZnO co-doped with two materials among Al, Ga, F, B, Co, and Ni. It can also be ZnO co-doped with three materials among Al, Ga, F, B, Co, and Ni. It can also be ZnO co-doped with four materials among Al, Ga, F, B, Co, and Ni. It can also be ZnO co-doped with five materials among Al, Ga, F, B, Co, and Ni. It can also be ZnO co-doped with six materials among Al, Ga, F, B, Co, and Ni.

[0080] In the present application, the average particle size of the nanomaterial with infrared reflection ability is 10 to 150 nm, preferably 15 to 100 nm, and more preferably 20 to 60 nm. The average particle size can be, for example, 11 nm, 12 nm, 13 nm, 14 nm, 15 nm, 16 nm, 17 nm, 18 nm, 19 nm, 20 nm, 21 nm, 22 nm, 23 nm, 24 nm, 25 nm, 26 nm, 27 nm, 28 nm, 29 nm, 30 nm, 31 nm, 32 nm, 33 nm, 34 nm, 35 nm, 36 nm, 37 nm, 38 nm, 39 nm, 40 nm, 41 nm, 42 nm, 43 nm, 44 nm, 45 nm, 46 nm, 47 nm, 48 nm, 49nm, 50nm, 51nm, 52nm, 53nm, 54nm, 55nm, 56nm, 57nm, 58nm, 59nm, 60nm, 61nm, 62nm, 63nm, 64nm, 65nm, 66nm, 67nm, 68nm, 69nm, 70nm, 75nm, 80nm, 85nm, 90nm, 95nm, 100nm, 105nm, 110nm, 115nm, 120nm, 125nm, 130nm, 135nm, 140nm, 145nm, 150nm.

[0081] Regarding the average particle size of the above-mentioned nanomaterials with infrared reflection capability, in the present application, the average particle size of the particles refers to the characterization of the microscopic morphology of the material using a scanning electron microscope, and the size statistical analysis of the observed particles to obtain the particle size distribution of the material, and the average particle size is calculated based on the data of these particle size distributions.

[0082] The above definition of average particle size is also applicable to nanomaterials with light-enhancing transmittance capability, nanomaterials with self-cleaning capability, and nanomaterials with both light-enhancing transmittance capability and self-cleaning capability.

[0083] In the present application, the nanomaterials with infrared reflection capability may be commercially available or self-prepared.

[0084] In a specific method, the above infrared reflective nanomaterial is prepared by a solvothermal method: taking Al-doped ZnO as an example, zinc acetate dihydrate and aluminum nitrate nonahydrate are used as precursors, diethylene glycol is used as a solvent, sodium dodecylbenzenesulfonate or hexadecyltrimethylammonium bromide is used as a surfactant, and a solvothermal reaction is carried out at a reaction temperature of 150-260°C, a reaction time of 6-200h, and the solution is continuously stirred at a speed of 250rpm until the reaction is completed. The desired nanomaterial is obtained after repeated centrifugation, washing, and drying.

[0085] The nanomaterials with light transmittance enhancement capability involved in the above-mentioned composition or anti-reflection film liquid can be any material that can improve the light transmittance enhancement capability, and SiO2, SiO2-TiO2, SiO2-MgF2, MoO3, Al2O3, Al2O3-MgF2, VO2, TiO2, NiO, ZrO2, and Si3N4 can be listed. These materials can be used alone, or they can be used in combination of one, two, three, or more than four materials selected from these materials. Among them, when using SiO2-TiO2, SiO2-MgF2, and Al2O3-MgF2 composite materials, the refractive index of the film liquid can be improved by adjusting the ratio of the two components, and the surface density of the film layer can be improved while ensuring high transmittance, thereby achieving good mechanical properties. In addition, if it is a mixed material of several materials, the refractive index of the film liquid can also be improved by adjusting the ratio of the above-mentioned materials, and the surface density of the film layer can be improved while ensuring high transmittance, thereby achieving good mechanical properties.

[0086] In the present application, the average particle size of the nanomaterial with light transmission enhancement capability is 1 to 100 nm, preferably 1.5 to 50 nm, and more preferably 2 to 30 nm. The average particle size can be, for example, 1 nm, 2 nm, 3 nm, 4 nm, 5 nm, 6 nm, 7 nm, 8 nm, 9 nm, 10 nm, 11 nm, 12 nm, 13 nm, 14 nm, 15 nm, 16 nm, 17 nm, 18 nm, 19 nm, 20 nm, 21 nm, 22 nm, 23 nm, 24 nm, 25 nm, 26 nm, 27 nm, 28 nm, 29 nm, 30 nm, 31 nm, 32 nm, 33 nm, 34 nm, 35 nm, 36 nm, 37 nm, 38 nm , 39nm, 40nm, 41nm, 42nm, 43nm, 44nm, 45nm, 46nm, 47nm, 48nm, 49nm, 50nm, 51nm, 52nm, 53nm, 54nm, 55nm, 56nm, 57nm, 58nm, 59nm, 60nm, 61nm, 62nm, 63nm, 64nm, 65nm, 66nm, 67nm, 68nm, 69nm, 70nm, 75nm, 80nm, 85nm, 90nm, 95nm, 100nm.

[0087] In the present application, the nanomaterials with light-enhancing transmittance capability may be commercially available or self-prepared.

[0088] In a specific manner, the above-mentioned light-enhancing nanomaterial can be prepared by a sol-gel method: a metal salt (or metal alkoxide) is added to a H2O-C2H5OH mixed solvent (H2O: C2H5OH volume ratio 1:4), and magnetic stirring is performed until the drug is completely dissolved to obtain a solution, and citric acid and PEG300 are successively added to the mixed solution according to n (metal ion): n (citric acid) = 1:1 and n (metal ion): n (PEG300) = 27.8:1, 2-3 drops of hydrochloric acid are added to adjust the pH to 3, magnetic stirring is performed for a certain period of time, and then the stirred solution is placed in a 90°C water bath for constant temperature treatment for 9 hours to obtain a gel. Vacuum drying is performed for 12 hours, and annealing is performed at 300-400°C for 3 hours.

[0089] The metal salt used in the above method may be tetraethyl silicate, tetrabutyl titanate, ammonium molybdate, aluminum chloride, aluminum nitrate, aluminum isopropoxide, vanadium pentoxide, nickel nitrate, nickel acetate, zirconium oxychloride, and the like.

[0090] The above reactions all use acidic catalysts. Under this condition, the hydrolysis rate of the metal salt is greater than the condensation rate, thereby forming a chain polymer. The polymer clusters will react to form a fibrous cross-linked structure with a dense structure, which can improve the wear resistance and hardness to a certain extent.

[0091] In this application, the material with self-cleaning ability is TiO2-based nanomaterial. Under the action of light, the surface of TiO2 shows a super-hydrophilic effect, and water droplets form a water film on its surface. During the flow process, surface impurities and pollutants are removed, producing a self-cleaning effect; on the other hand, when the excitation energy is greater than the energy band of TiO2, photogenerated electrons and holes are generated, and the photogenerated electrons and holes react with oxygen and water in the air to generate oxidatively active species such as peroxy hydroxyl radicals, superoxide radicals or hydroxyl radicals. The oxidatively active species react with organic matter on the surface, decomposing organic pollutants into CO2 and water, thereby producing a self-cleaning effect.

[0092] In a specific embodiment, the nanomaterial with self-cleaning ability is a superhydrophilic material: one or more selected from TiO2 or Zn-doped TiO2 nanomaterials, wherein the water contact angle of the superhydrophilic material is 0°<θ<30°.

[0093] In a specific embodiment, the average particle size of the nanomaterial with self-cleaning ability involved in the above-mentioned composition or anti-reflection film liquid is 1 to 100 nm, preferably 1.5 to 50 nm, and more preferably 2 to 30 nm. The average particle size can be, for example, 1 nm, 2 nm, 3 nm, 4 nm, 5 nm, 6 nm, 7 nm, 8 nm, 9 nm, 10 nm, 11 nm, 12 nm, 13 nm, 14 nm, 15 nm, 16 nm, 17 nm, 18 nm, 19 nm, 20 nm, 21 nm, 22 nm, 23 nm, 24 nm, 25 nm, 26 nm, 27 nm, 28 nm, 29 nm, 30 nm, 31 nm, 32 nm, 33 nm, 34 nm, 35 nm, 36 nm, 37 nm, 38 nm , 39nm, 40nm, 41nm, 42nm, 43nm, 44nm, 45nm, 46nm, 47nm, 48nm, 49nm, 50nm, 51nm, 52nm, 53nm, 54nm, 55nm, 56nm, 57nm, 58nm, 59nm, 60nm, 61nm, 62nm, 63nm, 64nm, 65nm, 66nm, 67nm, 68nm, 69nm, 70nm, 75nm, 80nm, 85nm, 90nm, 95nm, 100nm.

[0094] The water contact angle of the above-mentioned nanomaterial with self-cleaning ability refers to the angle θ between the tangent line of the solid-liquid interface at the intersection of the liquid and solid phases and the solid-liquid boundary line on the liquid side. The contact angle of the liquid on the surface of the solid material is an important parameter to measure the wetting performance of the liquid on the surface of the material. The water contact angle can be measured by methods known to those skilled in the art, for example, it can be measured by commercially available instruments such as a water drop angle tester.

[0095] The water contact angle can be, for example, 0°, 1°, 2°, 3°, 4°, 5°, 6°, 7°, 8°, 9°, 10°, 11°, 12°, 13°, 14°, 15°, 16°, 17°, 18°, 19°, 20°, 21°, 22°, 23°, 24°, 25°, 26°, 27°, 28°, 29° or 30°.

[0096] The nanomaterial with light-enhancing ability and the nanomaterial with cleaning ability involved in the composition or anti-reflection film liquid of the present application can be the same material, for example, the material is a nanomaterial with both light-enhancing ability and self-cleaning ability. For example, it is SiO2-TiO2 or TiO2. Such a material can be used as a nanomaterial with cleaning ability and can also be used as a nanomaterial with light-enhancing ability.

[0097] In a specific embodiment, the average particle size of the nanomaterial having light-enhancing transmittance and self-cleaning capabilities is 1 to 100 nm, preferably 1.5 to 50 nm, and more preferably 2 to 30 nm. The average particle size can be, for example, 1 nm, 2 nm, 3 nm, 4 nm, 5 nm, 6 nm, 7 nm, 8 nm, 9 nm, 10 nm, 11 nm, 12 nm, 13 nm, 14 nm, 15 nm, 16 nm, 17 nm, 18 nm, 19 nm, 20 nm, 21 nm, 22 nm, 23 nm, 24 nm, 25 nm, 26 nm, 27 nm, 28 nm, 29 nm, 30 nm, 31 nm, 32 nm, 33 nm, 34 nm, 35 nm, 36 nm, 37 nm, 38 nm , 39nm, 40nm, 41nm, 42nm, 43nm, 44nm, 45nm, 46nm, 47nm, 48nm, 49nm, 50nm, 51nm, 52nm, 53nm, 54nm, 55nm, 56nm, 57nm, 58nm, 59nm, 60nm, 61nm, 62nm, 63nm, 64nm, 65nm, 66nm, 67nm, 68nm, 69nm, 70nm, 75nm, 80nm, 85nm, 90nm, 95nm, 100nm.

[0098] In a specific embodiment, the nanomaterial having light-enhancing and self-cleaning capabilities is a superhydrophilic material.

[0099] In a specific embodiment, the water contact angle of the nanomaterial having light-enhancing and self-cleaning capabilities can be 0°, 1°, 2°, 3°, 4°, 5°, 6°, 7°, 8°, 9°, 10°, 11°, 12°, 13°, 14°, 15°, 16°, 17°, 18°, 19°, 20°, 21°, 22°, 23°, 24°, 25°, 26°, 27°, 28°, 29° or 30°.

[0100] In a specific embodiment, in the composition of the present application, relative to 1 weight part of nanomaterial with self-cleaning ability, the nanomaterial with infrared reflection ability is 2 weight parts to 20 weight parts, and the nanomaterial with light transmission enhancement ability is 3 weight parts to 40 weight parts.

[0101] In a specific embodiment, relative to 1 weight part of nanomaterial with self-cleaning ability, the amount of nanomaterial with infrared reflection ability is 2 weight parts, 3 weight parts, 4 weight parts, 5 weight parts, 6 weight parts, 7 weight parts, 8 weight parts, 9 weight parts, 10 weight parts, 11 weight parts, 12 weight parts, 13 weight parts, 14 weight parts, 15 weight parts, 16 weight parts, 17 weight parts, 18 weight parts, 19 weight parts, and 20 weight parts.

[0102] In a specific embodiment, relative to 1 weight part of nanomaterial with self-cleaning ability, the nanomaterial with light transmission enhancement ability is 3 weight parts, 4 weight parts, 5 weight parts, 6 weight parts, 7 weight parts, 8 weight parts, 9 weight parts, 10 weight parts, 11 weight parts, 12 weight parts, 13 weight parts, 14 weight parts, 15 weight parts, 16 weight parts, 17 weight parts, 18 weight parts, 19 weight parts, 20 weight parts, 21 weight parts, 22 weight parts, 23 weight parts, 24 weight parts, 25 weight parts, 26 weight parts, 27 weight parts, 28 weight parts, 29 weight parts, 30 weight parts, 31 weight parts, 32 weight parts, 33 weight parts, 34 weight parts, 35 weight parts, 36 weight parts, 37 weight parts, 38 weight parts, 39 weight parts, and 40 weight parts.

[0103] In a specific embodiment, relative to 1 part by weight of the nanomaterial having self-cleaning ability, the nanomaterial having self-cleaning ability is 2 parts by weight, 3 parts by weight, 4 parts by weight, 5 parts by weight, 6 parts by weight, 7 parts by weight, 8 parts by weight, 9 parts by weight, 10 parts by weight, 11 parts by weight, 12 parts by weight, 13 parts by weight, 14 parts by weight, 15 parts by weight, 16 parts by weight, 17 parts by weight, 18 parts by weight, 19 parts by weight, 20 parts by weight, and the nanomaterial having light-enhancing transmittance is 3 parts by weight, 4 parts by weight, 5 parts by weight, 6 parts by weight, 7 parts by weight, 8 parts by weight. , 9 parts by weight, 10 parts by weight, 11 parts by weight, 12 parts by weight, 13 parts by weight, 14 parts by weight, 15 parts by weight, 16 parts by weight, 17 parts by weight, 18 parts by weight, 19 parts by weight, 20 parts by weight, 21 parts by weight, 22 parts by weight, 23 parts by weight, 24 parts by weight, 25 parts by weight, 26 parts by weight, 27 parts by weight, 28 parts by weight, 29 parts by weight, 30 parts by weight, 31 parts by weight, 32 parts by weight, 33 parts by weight, 34 parts by weight, 35 parts by weight, 36 parts by weight, 37 parts by weight, 38 parts by weight, 39 parts by weight, 40 parts by weight.

[0104] In a specific embodiment, the ratio of the nanomaterial with self-cleaning ability: the nanomaterial with infrared reflection ability: the nanomaterial with light transmission enhancement ability is 1:(2-20):(3-40); for example, more specifically, the ratio of the nanomaterial with self-cleaning ability: the nanomaterial with infrared reflection ability: the nanomaterial with light transmission enhancement ability can also be (0.1-1):(0.5-2):(3-4). Those skilled in the art can appropriately calculate the ratio between the nanomaterial with self-cleaning ability: the nanomaterial with infrared reflection ability: the nanomaterial with light transmission enhancement ability as needed.

[0105] In a specific embodiment, when the nanomaterial with light-enhancing transmittance capability and the nanomaterial with cleaning capability are nanomaterials with light-enhancing transmittance capability and self-cleaning capability, the nanomaterial with infrared reflection capability is 0.1 to 0.6 parts by weight, for example, 0.10 parts by weight, 0.11 parts by weight, 0.12 parts by weight, 0.13 parts by weight, 0.14 parts by weight, 0.15 parts by weight, 0.16 parts by weight, 0.17 parts by weight, 0.18 parts by weight, 0.19 parts by weight, 0.20 parts by weight, 0.21 parts by weight, 0.22 parts by weight, 0.23 parts by weight, 0.24 parts by weight, 0.25 parts by weight, 0.26 parts by weight, 0.27 parts by weight, 0.28 parts by weight, 0.29 parts by weight, 0.30 parts by weight, 0.31 parts by weight, 0.32 parts by weight, 0.33 parts by weight, 0.34 parts by weight, 0.35 parts by weight, 0.36 parts by weight, 0.37 parts by weight, 0.38 parts by weight, 0.39 parts by weight, 0.40 parts by weight, 0.41 parts by weight, 0.42 parts by weight, 0.43 parts by weight, 0.44 parts by weight, 0.45 parts by weight, 0.46 parts by weight, 0.47 parts by weight, 0.48 parts by weight, 0.49 parts by weight, 0.50 parts by weight, 0.51 parts by weight, 0.52 parts by weight, 0.53 parts by weight, 0.54 parts by weight, 0.55 parts by weight, 0.56 parts by weight, 0.57 parts by weight, 0.58 parts by 28 parts by weight, 0.29 parts by weight, 0.30 parts by weight, 0.31 parts by weight, 0.32 parts by weight, 0.33 parts by weight, 0.34 parts by weight, 0.35 parts by weight, 0.36 parts by weight, 0.37 parts by weight, 0.38 parts by weight, 0.39 parts by weight, 0.40 parts by weight, 0.41 parts by weight, 0.42 parts by weight, 0.43 parts by weight, 0.44 parts by weight, 0.45 parts by weight, 0.46 parts by weight, 0.47 parts by weight, 0.48 parts by weight, 0.49 parts by weight, 0.50 parts by weight, 0.51 parts by weight, 0.52 parts by weight, 0.53 parts by weight, 0.54 parts by weight, 0.55 parts by weight, 0.56 parts by weight, 0.57 parts by weight, 0.58 parts by weight, 0.59 parts by weight, 0.60 parts by weight.

[0106] When the composition of the present application is formulated into an anti-reflection film liquid for photovoltaic glass, the above weight ratios of the components do not change. In the present application, the composition of the present application can be mixed and formulated first, or directly mixed with a solvent and an additive to formulate an anti-reflection film liquid for photovoltaic glass.

[0107] In the present application, the solvent used in the anti-reflection film liquid for photovoltaic glass is one or two or three or four of deionized water, ethanol, isopropanol, and ethylene glycol.

[0108] In a specific embodiment, the anti-reflection film liquid for photovoltaic glass includes nanomaterials with light anti-reflection ability, nanomaterials with infrared reflection ability, nanomaterials with self-cleaning ability, solvents and additives, and other ingredients that may be used.

[0109] In a specific embodiment, the anti-reflection film liquid for photovoltaic glass is composed of nanomaterials with light anti-reflection ability, nanomaterials with infrared reflection ability, nanomaterials with self-cleaning ability, solvents and additives.

[0110] In a specific embodiment, the anti-reflection film liquid for photovoltaic glass includes nanomaterials with light-anti-reflection and self-cleaning capabilities, nanomaterials with infrared reflection capabilities, solvents and additives, and other ingredients that may be used.

[0111] In a specific embodiment, the anti-reflection film liquid for photovoltaic glass is composed of nanomaterials with light anti-reflection ability and self-cleaning ability, nanomaterials with infrared reflection ability, solvents and additives.

[0112] In this application, the additives used in the anti-reflection film liquid for photovoltaic glass include curing agent, leveling agent, and defoaming agent. Among them, the curing agent is m-phenylenediamine, diaminodiphenylmethane, methylenebiscyclohexaneamine, diethylenetriamine, aminoethylpiperazine, diaminodiphenylsulfone, diethylaminopropylamine, dicyandiamide, etc. The proportion is 0.5-3%. The leveling agent is polydimethylsiloxane, polymethylphenylsiloxane, modified polysiloxane, polyethyl acrylate, polybutyl acrylate, etc., accounting for 0.01-2.5%. The defoaming agent is polyethylene glycol PEG1000-10000, accounting for 0.1-2%.

[0113] In a specific embodiment, the anti-reflection film liquid components are calculated by weight: nanomaterials with light anti-reflection ability (30-40%), nanomaterials with infrared reflection ability (5-20%), nanomaterials with self-cleaning ability (1-10%), solvents (30-60%) and additives (1-7%).

[0114] In a specific embodiment, for example, when the total weight of the anti-reflection film liquid is 100 parts by weight, the nanomaterial with light anti-reflection ability is 30 to 40 parts by weight, the nanomaterial with infrared reflection ability is 5 to 20 parts by weight, the nanomaterial with self-cleaning ability is 1 to 10 parts by weight, the solvent is 30 to 60 parts by weight, and the total amount of additives is 1 to 7 parts by weight. Those skilled in the art can make adjustments according to actual conditions.

[0115] When the total weight of the anti-reflection film liquid is 100 parts by weight, the nanomaterial with light anti-reflection ability is 30 to 40 parts by weight, for example, 30 parts by weight, 31 parts by weight, 32 parts by weight, 33 parts by weight, 34 parts by weight, 35 parts by weight, 36 parts by weight, 37 parts by weight, 38 parts by weight, 39 parts by weight, and 40 parts by weight, the nanomaterial with infrared reflection ability is 5 to 20 parts by weight, for example, 5 parts by weight, 6 parts by weight, 7 parts by weight, 8 parts by weight, 9 parts by weight, 10 parts by weight, 11 parts by weight, 12 parts by weight, 13 parts by weight, 14 parts by weight, 15 parts by weight, 16 parts by weight, 17 parts by weight, 18 parts by weight, 19 parts by weight, and 20 parts by weight, and the nanomaterial with self-cleaning ability is 1 to 10 parts by weight, for example, 1 part by weight, 2 parts by weight, 3 parts by weight, 4 parts by weight, 5 parts by weight the amount of the solvent is 30-60 parts by weight, for example, 31 parts by weight, 32 parts by weight, 33 parts by weight, 34 parts by weight, 35 parts by weight, 36 parts by weight, 37 parts by weight, 38 parts by weight, 39 parts by weight, 40 parts by weight, 41 parts by weight, 42 parts by weight, 43 parts by weight, 44 parts by weight, 45 parts by weight, 46 parts by weight, 47 parts by weight, 48 parts by weight, 49 parts by weight, 50 parts by weight, 51 parts by weight, 52 parts by weight, 53 parts by weight, 54 parts by weight, 55 parts by weight, 56 parts by weight, 57 parts by weight, 58 parts by weight, 59 parts by weight, 60 parts by weight, and the total amount of the auxiliary agent is 1-7 parts by weight, for example, 1 part by weight, 2 parts by weight, 3 parts by weight, 4 parts by weight, 5 parts by weight, 6 parts by weight, 7 parts by weight.

[0116] In a specific embodiment, the antireflection film liquid components are calculated by weight: the mass percentage of nanomaterials with light antireflection and self-cleaning capabilities is (31-50%), nanomaterials with infrared reflection capabilities (5-20%), solvents (30-60%) and additives (1-7%).

[0117] In a specific embodiment, for example, when the total weight of the anti-reflection film liquid is 100 parts by weight, the nanomaterial with light anti-reflection ability and self-cleaning ability is 31 to 50 parts by weight, the nanomaterial with infrared reflection ability is 5 to 20 parts by weight, the solvent is 30 to 60 parts by weight, and the total amount of additives is 1 to 7 parts by weight. Those skilled in the art can adjust it according to actual conditions.

[0118] When the total weight of the antireflection film liquid is 100 parts by weight, the nanomaterial with light antireflection ability and self-cleaning ability is 31 to 50 parts by weight, for example, 31 parts by weight, 32 parts by weight, 33 parts by weight, 34 parts by weight, 35 parts by weight, 36 parts by weight, 37 parts by weight, 38 parts by weight, 39 parts by weight, 40 parts by weight, 41 parts by weight, 42 parts by weight, 43 parts by weight, 44 parts by weight, 45 parts by weight, 46 parts by weight, 47 parts by weight, 48 parts by weight, 49 parts by weight, and 50 parts by weight; the nanomaterial with infrared reflection ability is 5 to 20 parts by weight, for example, 5 parts by weight, 6 parts by weight, 7 parts by weight, 8 parts by weight, 9 parts by weight, 10 parts by weight, 11 parts by weight, 12 parts by weight, 13 parts by weight, 14 parts by weight, 15 parts by weight, 16 parts by weight, 17 parts by weight, 18 parts by weight, 19 parts by weight, and 20 parts by weight, and the nanomaterial with self-cleaning ability is 1 to 10 parts by weight. parts by weight, for example, 1 part by weight, 2 parts by weight, 3 parts by weight, 4 parts by weight, 5 parts by weight, 6 parts by weight, 7 parts by weight, 8 parts by weight, 9 parts by weight, 10 parts by weight, and the solvent is 30 to 60 parts by weight, for example, 31 parts by weight, 32 parts by weight, 33 parts by weight, 34 parts by weight, 35 parts by weight, 36 parts by weight, 37 parts by weight, 38 parts by weight, 39 parts by weight, 40 parts by weight, 41 parts by weight, 42 parts by weight, 43 parts by weight, 44 parts by weight, 4 parts by weight, 45 parts by weight, 46 parts by weight, 47 parts by weight, 48 parts by weight, 49 parts by weight, 50 parts by weight, 51 parts by weight, 52 parts by weight, 53 parts by weight, 54 parts by weight, 55 parts by weight, 56 parts by weight, 57 parts by weight, 58 parts by weight, 59 parts by weight, 60 parts by weight, and the total amount of the auxiliary agent is 1 to 7 parts by weight, for example, 1 part by weight, 2 parts by weight, 3 parts by weight, 4 parts by weight, 5 parts by weight, 6 parts by weight, and 7 parts by weight.

[0119] In the present application, the method for preparing the anti-reflection film liquid is as follows: weigh an appropriate amount of nanomaterials with light anti-reflection ability, nanomaterials with infrared reflection ability, and nanomaterials with self-cleaning ability, dissolve them in a solvent, stir them magnetically to a uniform mixed solution, add a certain amount of additives thereto, stir at room temperature for 48-72 hours, and obtain the anti-reflection film liquid.

[0120] In the present application, the preparation method of the anti-reflection film liquid is as follows: weigh an appropriate amount of nanomaterials with light anti-reflection ability and self-cleaning ability, and a nanomaterial with infrared reflection ability, dissolve them in a solvent, stir magnetically to a uniform mixed solution, add a certain amount of auxiliary agent thereto, stir at room temperature for 48-72 hours, and obtain the anti-reflection film liquid.

[0121] In a specific embodiment, in the anti-reflection film liquid, the mass percentage of the curing agent is 0.5-3%, the mass percentage of the leveling agent is 0.01-2.5%, and the mass percentage of the defoaming agent is 0.1-2%.

[0122] In a specific embodiment, in the anti-reflection film liquid, the mass percentage of the curing agent is 0.5%, 0.6%, 0.7%, 0.8%, 0.9%, 1.0%, 1.1%, 1.2%, 1.3%, 1.4%, 1.5%, 1.6%, 1.7%, 1.8%, 1.9%, 2.0%, 2.1%, 2.2%, 2.3%, 2.4%, 2.5%, 2.6%, 2.7%, 2.8%, 2.9%, 3%, and the mass percentage of the leveling agent is 0.01%, 0.05%, 0.1%, 0.2%, 0.3%, 0.4%, 0.5 %, 0.6%, 0.7%, 0.8%, 0.9%, 1.0%, 1.1%, 1.2%, 1.3%, 1.4%, 1.5%, 1.6%, 1.7%, 1.8%, 1.9%, 2.0%, 2.1%, 2.2%, 2.3%, 2.4%, 2.5%; the defoaming agent is 0.1%, 0.2%, 0.3%, 0.4%, 0.5%, 0.6%, 0.7%, 0.8%, 0.9%, 1.0%, 1.1%, 1.2%, 1.3%, 1.4%, 1.5%, 1.6%, 1.7%, 1.8%, 1.9%, 2%.

[0123] The solvent used in the present application is only a carrier and will not react with the nanomaterials with light-enhancing ability, the nanomaterials with infrared reflecting ability, the nanomaterials with self-cleaning ability, or the nanomaterials with both light-enhancing ability and self-cleaning ability.

[0124] The present application also relates to photovoltaic glass prepared using the composition for preparing an anti-reflective film liquid for photovoltaic glass or the anti-reflective film liquid for photovoltaic glass of the present application, wherein the photovoltaic glass comprises a glass substrate; and an anti-reflective film layer formed on the glass substrate by the above-mentioned composition of the present application or by the above-mentioned anti-reflective film liquid of the present application.

[0125] In the present application, there is no limitation on the glass substrate, which can be any substrate used as photovoltaic glass that can be used by those skilled in the art.

[0126] In a specific embodiment, the photovoltaic glass containing the film liquid is composed of an anti-reflection film layer and an ultra-white glass substrate, and the ultra-white glass substrate is 2-6 mm ultra-white float glass or ultra-white embossed glass.

[0127] The present application also relates to a method for preparing photovoltaic glass, which comprises: coating the above-mentioned anti-reflection film liquid of the present application or coating a solution containing the above-mentioned composition of the present application on the surface of a glass substrate, and solidifying and sintering the coated glass substrate to obtain photovoltaic glass.

[0128] The present application does not have any limitation on the method for preparing photovoltaic glass, which can be any method in the art that can be used to prepare photovoltaic glass.

[0129] The preparation method of photovoltaic glass containing the film liquid is as follows: the anti-reflection film liquid is applied to an ultra-white glass substrate by roller coating, and after low-temperature curing (temperature is 80-200°C, time is 10-30min), high-temperature sintering is performed to obtain a finished photovoltaic glass product (temperature is 650-720°C, time is 1-8min).

[0130] The present application provides an anti-reflection film liquid and a photovoltaic glass containing the film liquid. The coating amount of the anti-reflection film liquid per unit area on the glass substrate is 1 to 50 g / m 2 , preferably 5 to 40 g / m 2 , more preferably 9-20g / m 2 For example, the coating amount is 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50 g / m 2 .

[0131] The thickness of the antireflection film formed on the glass substrate is 0.8-20 μm, preferably 1-8 μm. The thickness is, for example, 0.8, 0.9, 1.0, 1.1, 1.5, 2, 2.5, 3, 3.5, 4, 4.5, 5, 5.5, 6, 6.5, 7, 7.5, 8, 8.5, 9, 9.5, 10, 10.5, 11, 11.5, 12, 12.5, 13, 13.5, 14, 14.5, 15, 15.5, 16, 16.5, 17, 17.5, 18, 18.5, 19, 19.5, 20 μm.

[0132] Example

[0133] The present application provides a general and / or specific description of the materials and test methods used in the experiments. In the following examples, unless otherwise specified, % means wt%, i.e., weight percentage. The reagents or instruments used without indicating the manufacturer are all conventional reagent products that can be obtained commercially.

[0134] Embodiment 1:

[0135] The composition of the anti-reflection film liquid is calculated by weight fraction: 38% of SiO2-TiO2 sol prepared by a sol-gel method, 13% of Al / F co-doped ZnO nanomaterials prepared by a solvothermal method, 6% of self-cleaning nanomaterial Zn-TiO2, ethylene glycol is used as a solvent, and its mass ratio is 39%, and the auxiliary agent is 4%. Among the above auxiliary agents, the curing agent is m-phenylenediamine, accounting for 2% of the anti-reflection film liquid, the leveling agent is polydimethylsiloxane, accounting for 1% of the anti-reflection film liquid, and the defoaming agent is polyethylene glycol PEG-1000, accounting for 1% of the anti-reflection film liquid.

[0136] Weigh appropriate amounts of SiO2-TiO2 sol nanomaterial with light-enhancing ability, nanomaterial with infrared reflection ability (Al / F co-doped ZnO), and self-cleaning nanomaterial, dissolve them in a solvent, stir magnetically to a uniform mixed solution, add a certain amount of additives, and stir at room temperature for 48-72 hours to obtain the anti-reflection film liquid.

[0137] The anti-reflection film liquid was coated onto the ultra-white glass substrate by roller coating, and after low-temperature curing (temperature of 150°C for 15 minutes), high-temperature sintering was performed to obtain the finished photovoltaic glass product (temperature of 680°C for 3 minutes).

[0138] Performance test: The photovoltaic glass was subjected to a transmittance test in the visible light range (380-780 nm), an infrared reflection spectrum test in the range of 1100-5000 nm, and an outdoor dust accumulation test. The results are listed in Table 1.

[0139] Examples 2-8 and Comparative Examples 1-6 are similar to Example 1, except that the raw material ratios are different. The performance test results are shown in Table 1.

[0140]

[0141]

[0142] Although the embodiments of the present application are described above, the present application is not limited to the above specific embodiments and application fields, and the above specific embodiments are merely illustrative and instructive, rather than restrictive. A person of ordinary skill in the art can make many forms under the guidance of this specification and without departing from the scope of protection of the claims of the present application, all of which belong to the protection of the present application.

Claims

1. A composition for preparing an anti-reflection film liquid for photovoltaic glass, comprising: Nanomaterials with light-enhancing properties; Nanomaterials with infrared reflection capabilities; as well as Nanomaterials with self-cleaning capabilities.

2. The composition according to claim 1, wherein The nanomaterial with light-enhancing ability and the nanomaterial with cleaning ability are nanomaterials with light-enhancing ability and self-cleaning ability.

3. The composition according to claim 1 or 2, wherein The average particle size of the nanomaterial having light-enhancing transmittance capability is 1 to 100 nm, preferably 1.5 to 50 nm, and more preferably 2 to 30 nm; or The average particle size of the infrared reflective nanomaterial is 10 to 150 nm, preferably 15 to 100 nm, and more preferably 20 to 60 nm; or The average particle size of the nanomaterial having a self-cleaning ability is 1 to 100 nm, preferably 1.5 to 50 nm, and more preferably 2 to 30 nm.

4. The composition according to claim 1, wherein With respect to 1 weight part of the nanomaterial with self-cleaning ability, the nanomaterial with infrared reflection ability is 2 weight parts to 20 weight parts, and the nanomaterial with light transmission enhancement ability is 3 weight parts to 40 weight parts.

5. The composition according to claim 2, wherein The amount of the nanomaterial having the ability to increase light transmission and self-cleaning is 0.1 to 0.6 parts by weight, preferably 0.2 to 0.5 parts by weight, based on 1 part by weight of the nanomaterial having the ability to increase light transmission and self-cleaning.

6. The composition according to any one of claims 1 to 5, wherein The resistivity of the nanomaterial with infrared reflection ability is 1×10 -4 ~0.1Ωcm, preferably 1.5×10 -4 ~0.08Ωcm.

7. The composition according to any one of claims 1 to 6, wherein The nanomaterial with self-cleaning ability or the nanomaterial with light-enhancing ability and self-cleaning ability is a super-hydrophilic material. Preferably, the water contact angle of the super-hydrophilic material is 0°<θ<30°.

8. The composition according to any one of claims 1 to 7, wherein The nanomaterial having light transmission enhancement capability is selected from one or more of SiO2, SiO2-TiO2, SiO2-MgF2, MoO3, Al2O3, Al2O3-MgF2, VO2, TiO2, NiO, ZrO2, and Si3N4; or The nanomaterial with infrared reflection capability is ZnO doped with anions or cations or co-doped with anions, i.e., MZO, wherein M is preferably selected from one or more of Al, Ga, F, B, Co, and Ni; or The nanomaterial with self-cleaning ability is selected from one or both of TiO2 and Zn-doped TiO2 nanomaterials.

9. The composition according to any one of claims 2 to 7, wherein The nanomaterials with light-enhancing and self-cleaning capabilities are SiO2-TiO2 or TiO2.

10. An anti-reflection film liquid for photovoltaic glass, comprising: The composition according to any one of claims 1 to 9; Solvents; and Additives.

11. The anti-reflection film liquid according to claim 10, wherein: The solvent is selected from one or more of deionized water, ethanol, isopropanol, and ethylene glycol; or Additives include curing agents, leveling agents and defoamers; Preferably, the curing agent is selected from one or more of m-xylylenediamine, diaminodiphenylmethane, methylenebiscyclohexylamine, diethylenetriamine, aminoethylpiperazine, diaminodiphenylsulfone, diethylaminopropylamine and dicyandiamide; or Preferably, the leveling agent is selected from one or more of polydimethylsiloxane, polymethylphenylsiloxane, modified polysiloxane, polyethyl acrylate, and polybutyl acrylate; or A preferred defoaming agent is polyethylene glycol.

12. The anti-reflection film liquid according to claim 10 or 11, wherein: In the anti-reflection film liquid, the mass percentage of the nanomaterial with light anti-reflection ability is 30-40%, the mass percentage of the nanomaterial with infrared reflection ability is 5-20%, and the mass percentage of the nanomaterial with self-cleaning ability is 1-10%; or In the anti-reflection film liquid, the mass percentage of the nano material with infrared reflection ability is 5-20%, and the mass percentage of the nano material with light anti-reflection ability and self-cleaning ability is 31-50%.

13. The antireflection film solution according to any one of claims 10 to 12, wherein In the anti-reflection film liquid, the mass percentage of the solvent is 30-60%, and the mass percentage of the auxiliary agent is 1-7%.

14. The antireflection film solution according to any one of claims 11 to 13, wherein In the anti-reflection film liquid, the mass percentage of the curing agent is 0.5-3%, the mass percentage of the leveling agent is 0.01-2.5%, and the mass percentage of the defoaming agent is 0.1-2%.

15. A photovoltaic glass comprising: glass substrate; and An antireflection film layer formed on a glass substrate using the composition according to any one of claims 1 to 9 or the antireflection film solution according to any one of claims 10 to 14.

16. The photovoltaic glass according to claim 15, wherein: The thickness of the antireflection film layer is 0.8 to 20 μm, preferably 1 to 8 μm.

17. The photovoltaic glass according to claim 15 or 16, wherein: The coating amount of the antireflection film liquid per unit area on the glass substrate is 1 to 50 g / m 2 , preferably 5 to 40 g / m 2 , more preferably 9-20g / m 2 .

18. A method for preparing photovoltaic glass, comprising: Applying the antireflection coating solution according to any one of claims 10 to 14 or a solution comprising the composition according to any one of claims 1 to 9 on the surface of a glass substrate; The coated glass substrate is solidified and sintered to obtain photovoltaic glass.

19. The method according to claim 18, wherein: The glass substrate is an ultra-white glass substrate, preferably an ultra-white float glass or ultra-white patterned glass with a thickness of 2-6 mm.

20. The method according to claim 18 or 19, wherein: The curing is low temperature curing; preferably carried out at 80-200°C for 10-30 minutes; or The sintering is high temperature sintering; preferably, it is carried out at 650-720° C. for 1-8 min.

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