A visual deviation correction mechanism for photovoltaic silicon wafer suction material

Abstract

The present invention discloses a mechanism for visual deviation correction of photovoltaic silicon wafer suction material, which belongs to the field of silicon wafer processing technology. The present invention comprises a mechanical arm, the bottom of which is mounted on a fixed frame, and a base is mounted on one end of the mechanical arm away from the fixed frame, a column is mounted on the side of the base, and a visual lens is mounted on the end of the column; a limit plate is mounted on the bottom of the base, an inductive capacitance sensor is mounted on the limit plate, an air pump is mounted on the base, and the air pump is interconnected with the suction channel inside the limit plate through a pipeline, and an adsorption cleaning component is mounted on the lower end of the suction channel. The mechanism for visual deviation correction of photovoltaic silicon wafer suction material can facilitate the blowing and cleaning of dust and impurities on the surface of silicon wafers when visually inspecting and adsorbing the silicon wafers, so as to avoid misjudgment of the visual system, and at the same time can increase the blowing range of dust on the surface of silicon wafers and increase the cleaning effect on the surface of silicon wafers.

Description

Technical Field

[0001] The invention relates to the technical field of silicon wafer processing, in particular to a mechanism for visual deviation correction of photovoltaic silicon wafer material suction. Background Art

[0002] Photovoltaic silicon wafers are the key material for manufacturing crystalline silicon photovoltaic cells. In order to improve the transfer and processing efficiency of silicon wafers during the manufacturing process of photovoltaic modules, corresponding absorption and visual correction mechanisms are usually used to achieve the adsorption and transfer of silicon wafers through visual inspection.

[0003] For example, a Chinese patent with announcement number: CN108538772A, name: Receiving device suitable for silicon wafer production line, and announcement date: 2018-09-14, includes a silicon wafer conveyor belt, an empty tray conveyor belt, a full tray conveyor belt, a visual inspection and adjustment mechanism, and several receiving trays; the receiving trays are placed in a set area and automatically placed and unloaded by a loading and unloading mechanism, the empty tray conveyor belt provides empty receiving trays to the loading and unloading mechanism, and the full tray conveyor belt receives the receiving trays full of silicon wafers unloaded by the loading and unloading mechanism; the visual inspection and adjustment mechanism is arranged along the feeding direction of the silicon wafer conveyor belt, and the visual inspection and adjustment mechanism picks up the silicon wafers conveyed on the silicon wafer conveyor belt for inspection and adjustment, and then places them in the corresponding receiving trays.

[0004] The above-mentioned prior art has the following technical problems: when the existing silicon wafer production line conveys silicon wafers, the silicon wafers are adjusted and conveyed by a visual inspection and adjustment mechanism. However, when performing visual inspection, if there are special textures or slight contamination on the surface of the silicon wafer, the visual system may misjudge, resulting in suction failure or position deviation, thereby affecting the subsequent discharge of silicon wafers.

[0005] Therefore, we propose a mechanism for visual correction of photovoltaic silicon wafer material absorption in order to solve the above-mentioned problems. Summary of the invention

[0006] The purpose of the present invention is to provide a mechanism for visual correction of photovoltaic silicon wafer material absorption, so as to solve the problem raised in the above background technology that the existing silicon wafer production lines on the market currently use visual inspection and adjustment mechanisms to adjust and transport silicon wafers when conveying silicon wafers. However, when performing visual inspection, if there are special textures or slight pollution on the surface of the silicon wafer, the visual system may misjudge, resulting in absorption failure or position deviation, which in turn affects the subsequent discharge of silicon wafers.

[0007] To achieve the above-mentioned purpose, the present invention provides the following technical solution: a photovoltaic silicon wafer suction material visual correction mechanism, comprising a mechanical arm, the bottom of the mechanical arm is mounted on a fixed frame, and a base is mounted on one end of the mechanical arm away from the fixed frame, a column is mounted on the side of the base, and a visual lens is mounted on the end of the column, and a camera light source is mounted on the side of the visual lens;

[0008] A limit plate is installed at the bottom of the base, an inductive capacitance sensor is installed on the limit plate, an air pump is installed on the base, and the air pump is connected to the suction channel inside the limit plate through a pipeline, and an adsorption cleaning component is installed at the lower end of the suction channel, which is used for adsorbing photovoltaic silicon wafers.

[0009] Preferably, a plurality of the limiting plates are evenly distributed on the bottom of the base, and the air suction channels and the adsorption and cleaning components in the limiting plates are interconnected.

[0010] By adopting the above technical solution, through the setting of the adsorption and cleaning component, the airflow inside the adsorption and cleaning component can be extracted when the air is evacuated in the air suction channel, so that the adsorption and cleaning component forms a negative pressure to adsorb the photovoltaic silicon wafer.

[0011] Preferably, the adsorption and cleaning component includes a connecting block, and a rubber pad is fixedly installed at the bottom of the connecting block, through holes are provided on the rubber pad and the connecting block, and an adjusting plate is arranged inside the connecting block, a small electric telescopic rod is installed on the inner side of the middle part of the adjusting plate, and a partition plate is installed at the telescopic end of the small electric telescopic rod, and the partition plate is located in the accommodating groove provided on the adjusting plate, a piston plate is fixedly installed on the upper end of the middle part of the adjusting plate, and the piston plate extends into the interior of the center block, the piston plate is connected to each other through an auxiliary spring and the top of the connecting block, the internal cavity of the center block is connected to each other through an air supply pipe and a power-boosting airbag, and the power-boosting airbag is fixed to the inside of the clamping block and between the lower end slider of the guide rack, a gear is installed above the guide rack, and the gear is fixed on the shunt pipe, a jet head is fixedly installed on the lower end of the shunt pipe, and the shunt pipe passes through the supporting block and is connected with the internal cavity of the center block, and a vortex spring providing a reset elastic force is installed on the outside of the shunt pipe.

[0012] By adopting the above technical solution, the vortex spring can be set to enable the shunt pipe to return to its original position after rotation.

[0013] Preferably, the rubber pad and the connecting block are both provided with a plurality of through holes, and the through holes on the rubber pad and the connecting block are located on the same vertical line.

[0014] By adopting the above technical solution, when negative pressure is formed inside the connecting block, the photovoltaic silicon wafer can be adsorbed through the through holes on the rubber pad.

[0015] Preferably, the outer wall of the partition plate and the inner wall of the accommodating groove provided on the adjustment plate fit each other, and the partition plate can slide on the adjustment plate.

[0016] By adopting the above technical solution, the partition plate is moved on the adjustment plate, so that the receiving groove can be easily blocked or opened.

[0017] Preferably, the piston plate can slide on the connecting block, and the end of the piston plate extending into the interior of the central block forms a seamless sliding connection structure with the central block through a sealing ring wrapped around the edge.

[0018] By adopting the above technical solution, the rubber pad wrapped around the edge of the piston plate can improve the sealing performance of the piston plate when it moves in the center block.

[0019] Preferably, the outer wall of the slider at the lower end of the guide rack and the inner wall of the clamping block fit each other, and the guide rack and the clamping block are slidably connected, and the tooth block on the guide rack is intermittently arranged.

[0020] By adopting the above technical solution, the meshingly connected gears can be rotated by moving the guide rack.

[0021] Preferably, the diverter pipe can rotate on the supporting block and the central block, and the diverter pipe and the airflow in the internal cavity of the central block are interconnected.

[0022] By adopting the above technical solution, the jetting range of the jet head on the diverter pipe can be increased by rotating the diverter pipe.

[0023] Preferably, the interior of the diverter pipe is configured as a hollow structure, and a plurality of air jets are evenly distributed at the bottom of the diverter pipe.

[0024] By adopting the above technical solution, when airflow enters the interior of the diverter pipe, the airflow can be ejected outward through the jet head.

[0025] Compared with the prior art, the beneficial effects of the present invention are as follows: the photovoltaic silicon wafer suction material visual correction mechanism can facilitate the blowing and cleaning of dust and impurities on the surface of the silicon wafer when the silicon wafer is visually inspected and adsorbed for feeding, thereby avoiding misjudgment of the visual system, and at the same time can increase the blowing range of dust on the surface of the silicon wafer, thereby increasing the cleaning effect on the surface of the silicon wafer;

[0026] 1. A connecting block is provided. When the vacuum pump draws air into the air suction channel through the pipeline, the air suction channel is connected to the inside of the connecting block, so that negative pressure is formed inside the connecting block, thereby using the through holes on the rubber pad at the bottom of the connecting block to adsorb the photovoltaic silicon wafer;

[0027] 2. A piston plate is provided. The partition plate is pushed by a small electric telescopic rod to block the receiving groove. At this time, after the air is pumped inside the connecting plate to form a negative pressure, the adjustment plate and the piston plate can be moved upward. After the piston plate moves, the airflow inside the center block can be squeezed into the inside of the shunt pipe. The airflow entering the shunt pipe is ejected outward to the surface of the photovoltaic silicon wafer through the jet nozzle at the bottom. The photovoltaic silicon wafer can be automatically cleaned by the airflow ejected to the surface of the photovoltaic silicon wafer;

[0028] 3. A guide rack is provided. When the piston block moves upward and squeezes the airflow inside the center block outward, part of the airflow in the center block enters the interior of the power-assisting airbag through the air supply pipe. The power-assisting airbag expands after being inflated, thereby pushing the guide rack to move. After the guide rack moves, the upper tooth block engages and disengages with the gear, so that the shunt pipe can reciprocate under the action of the vortex spring. The reciprocating rotation of the shunt pipe can increase the blowing range of the airflow ejected outward by the jet head thereon, thereby improving the cleaning effect on the surface of the photovoltaic silicon wafer. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 This is a schematic diagram of the front three-dimensional structure of the present invention;

[0030] Figure 2 This is a schematic diagram of the structure of the visual lens and camera light source of the present invention;

[0031] Figure 3 For the present invention Figure 2 The enlarged structural diagram at A in the middle;

[0032] Figure 4 This is a schematic diagram of the central block and the shunt pipe structure of the present invention;

[0033] Figure 5 It is a schematic diagram of the structure of the diverter pipe and the spray head of the present invention;

[0034] Figure 6 For the present invention Figure 5 The enlarged structural diagram at B in the middle;

[0035] Figure 7 It is a schematic diagram of the supporting block and vortex spring structure of the present invention;

[0036] Figure 8 This is a schematic diagram of the structure of a small electric telescopic rod and a partition board of the present invention;

[0037] Fig. 9 This is a schematic diagram of the structure of the power-assisting airbag and the guide rack of the present invention;

[0038] Fig.10 It is a schematic diagram of the exploded structure of the shunt pipe and vortex spring of the present invention.

[0039] In the figure: 1. Robotic arm; 2. Fixed frame; 3. Base; 4. Column; 5. Visual lens; 6. Camera light source; 7. Limit plate; 8. Inductive capacitance sensor; 9. Vacuum pump; 10. Suction channel; 11. Adsorption cleaning component; 111. Connecting block; 112. Rubber pad; 113. Through hole; 114. Adjusting plate; 115. Small electric telescopic rod; 116. Partition plate; 117. Receiving groove; 118. Piston plate; 119. Center block; 1110. Auxiliary spring; 1111. Air pipe; 1112. Power airbag; 1113. Snap-in block; 1114. Guide rack; 1115. Gear; 1116. Diverter pipe; 1117. Injector head; 1118. Support block; 1119. Vortex spring. DETAILED DESCRIPTION

[0040] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0041] Example 1: Please refer to Figure 1-Figure 10In the existing silicon wafer production line, when conveying silicon wafers, the silicon wafers are adjusted and conveyed by a visual inspection and adjustment mechanism. However, when performing visual inspection, if there are special textures or slight pollution on the surface of the silicon wafer, the visual system may misjudge, resulting in suction failure or position deviation, thereby affecting the subsequent discharge of silicon wafers. In order to solve this technical problem, the present embodiment discloses the following technical content, including a robot arm 1, the bottom of the robot arm 1 is installed on a fixed frame 2, and a base 3 is installed at the end of the robot arm 1 away from the fixed frame 2, a column 4 is installed on the side of the base 3, and a visual lens 5 is installed at the end of the column 4, and a camera light source 6 is installed on the side of the visual lens 5; a limit plate 7 is installed at the bottom of the base 3, an inductive capacitance sensor 8 is installed on the limit plate 7, an air pump 9 is installed on the base 3, and the air pump 9 is connected to the suction channel 10 inside the limit plate 7 through a pipeline, and an adsorption cleaning component 11 is installed at the lower end of the suction channel 10, and the adsorption cleaning component 11 is used to adsorb photovoltaic silicon wafers. There are multiple limit plates 7 evenly distributed at the bottom of the base 3, and the suction channel 10 in the limit plate 7 and the adsorption cleaning component 11 are connected to each other. The adsorption cleaning component 11 includes a connecting block 111, and a rubber pad 112 is fixedly installed at the bottom of the connecting block 111. Through holes 113 are provided on the rubber pad 112 and the connecting block 111, and an adjustment plate 114 is provided inside the connecting block 111. A small electric telescopic rod 115 is installed on the inner side of the middle of the adjustment plate 114, and a partition plate 116 is installed at the telescopic end of the small electric telescopic rod 115. The partition plate 116 is located in the receiving groove 117 provided on the adjustment plate 114, and the upper end of the middle of the adjustment plate 114 is fixed. A piston plate 118 is installed, and the piston plate 118 extends into the interior of the center block 119. The piston plate 118 is connected to each other through the auxiliary spring 1110 and the top of the connecting block 111. The lower end of the shunt pipe 1116 is fixedly installed with a nozzle 1117, and the shunt pipe 1116 passes through the supporting block 1118 and communicates with the internal cavity of the center block 119. A plurality of through holes 113 are provided on the rubber pad 112 and the connecting block 111, and the through holes 113 on the rubber pad 112 and the connecting block 111 are located on the same vertical line. The outer wall of the partition plate 116 and the inner wall of the receiving groove 117 provided on the adjustment plate 114 fit each other, and the partition plate 116 can slide on the adjustment plate 114. The piston plate 118 can slide on the connecting block 111, and the end of the piston plate 118 extending into the interior of the center block 119 forms a seamless sliding connection structure with the center block 119 through a sealing ring wrapped at the edge. The interior of the shunt pipe 1116 is configured as a hollow structure, and a plurality of spray nozzles 1117 are evenly distributed at the bottom of the shunt pipe 1116 .

[0042] Before starting, the system performs a self-check to ensure that the robot arm, visual system, control system and other parts are operating normally. According to production requirements, the parameters such as the silicon wafer suction position, placement position, and allowable deviation range are set for subsequent production debugging. When it is necessary to suck the photovoltaic silicon wafer, the base 3 is moved to the top of the photovoltaic silicon wafer through the robot arm 1, and then the small electric telescopic rod 115 is turned on. After the small electric telescopic rod 115 is turned on, it can push the partition plate 116 to move, so that the receiving groove 117 on the adjustment plate 114 is blocked through the partition plate 116, and the vacuum pump 9 is turned on. After the vacuum pump 9 is turned on, the air in the suction channel 10 can be extracted by the pipeline, and the suction channel 10 is connected to the connecting block 111. Therefore, when the air is pumped, a negative pressure can be formed inside the connecting block 111, and the partition plate 116 has blocked the receiving groove 117. At this time, under the action of the negative pressure, the adjustment plate 114 can move upward, and after the adjustment plate 114 moves upward, it can drive the piston plate 118 to move synchronously. After the piston plate 118 moves, the center The airflow inside the block 119 is squeezed into the inside of the shunt pipe 1116. After entering the shunt pipe 1116, the airflow is ejected outwardly to the surface of the photovoltaic silicon wafer through the nozzle 1117 at the bottom, thereby using the ejected airflow to automatically clean the surface of the photovoltaic silicon wafer. Thereafter, the outline of the silicon wafer is identified through the visual lens 5 thereon, thereby determining the adsorption position. The camera light source 6 can provide light to the visual lens 5 when the light is poor. After cleaning the surface of the silicon wafer, the partition plate 116 is reset through the small electric telescopic rod 115, thereby releasing the blockage of the receiving groove 117 on the adjustment plate 114. At this time, the vacuum pump 9 starts to pump air to generate negative pressure inside the connecting block 111, and the negative pressure can adsorb and fix the photovoltaic silicon wafer through the through hole 113 on the rubber pad 112 at the bottom of the connecting block 111. After the silicon wafer is adsorbed, the robot arm 1 moves the silicon wafer to the specified position along the planned path, and releases the silicon wafer after the final positioning correction is performed using the visual lens 5 again. The visual system continuously monitors the entire process and cooperates with the robot to perform dynamic correction when necessary.

[0043] Embodiment 2: The technical contents disclosed in this embodiment are further improved on the basis of the above-mentioned embodiment 1. The following technical contents are disclosed in this embodiment: the internal cavity of the center block 119 is interconnected through the air delivery pipe 1111 and the booster airbag 1112, and the booster airbag 1112 is fixed between the inside of the clamping block 1113 and the lower end slider of the guide rack 1114, a gear 1115 is installed above the guide rack 1114, and the gear 1115 is fixed on the shunt pipe 1116, and a vortex spring 1119 providing a reset elastic force is installed on the outer side of the shunt pipe 1116. The outer wall of the lower end slider of the guide rack 1114 and the inner wall of the clamping block 1113 fit each other, and the guide rack 1114 and the clamping block 1113 are slidably connected, and the tooth block on the guide rack 1114 is intermittently arranged. The shunt pipe 1116 can rotate on the supporting block 1118 and the central block 119, and the airflows in the shunt pipe 1116 and the internal cavity of the central block 119 are interconnected.

[0044] When the piston plate 118 moves upward to squeeze the airflow inside the center block 119 outward, part of the airflow in the internal cavity of the center block 119 enters the interior of the booster airbag 1112 through the air supply pipe 1111, and the booster airbag 1112 expands after being inflated. The expanded booster airbag 1112 pushes the guide rack 1114 to move on the clamping block 1113, and the guide rack 1114 moves and meshes with the gear 1115, so that the gear 1115 can drive the shunt pipe 1116 to rotate. When the guide rack 1114 continues to move, the tooth block on it disengages from the gear 1115, and the shunt pipe 1116 resets and rebounds under the action of the vortex spring 1119, thereby realizing the reciprocating rotation of the shunt pipe 1116. The reciprocating rotation of the shunt pipe 1116 can increase the blowing range of the bottom nozzle 1117, increase the cleaning effect of impurities on the surface of the photovoltaic silicon wafer, and avoid the occurrence of areas where cleaning is missed on the surface of the photovoltaic silicon wafer.

[0045] The contents not described in detail in this specification belong to the prior art known to professional and technical personnel in this field.

[0046] In the description of the present invention, unless otherwise specified, "plurality" means two or more than two; the orientations or positional relationships indicated by the terms "upper", "lower", "left", "right", "inner", "outer", "front end", "rear end", "head", "tail", etc. are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", "third", etc. are only used for descriptive purposes and cannot be understood as indicating or implying relative importance.

[0047] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "connected" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0048] Although the present invention has been described in detail with reference to the aforementioned embodiments, it is still possible for those skilled in the art to modify the technical solutions described in the aforementioned embodiments, or to make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A photovoltaic silicon wafer suction material visual correction mechanism, comprising a mechanical arm (1), the bottom of the mechanical arm (1) is mounted on a fixed frame (2), and a base (3) is mounted on the end of the mechanical arm (1) away from the fixed frame (2), a column (4) is mounted on the side of the base (3), and a visual lens (5) is mounted on the end of the column (4), and a camera light source (6) is mounted on the side of the visual lens (5); It is characterized in that Also includes: A limit plate (7) is installed at the bottom of the base (3), an inductive capacitance sensor (8) is installed on the limit plate (7), an air pump (9) is installed on the base (3), and the air pump (9) is connected to an air suction channel (10) inside the limit plate (7) through a pipeline, and an adsorption cleaning component (11) is installed at the lower end of the air suction channel (10), and the adsorption cleaning component (11) is used to adsorb photovoltaic silicon wafers; The adsorption cleaning component (11) comprises a connecting block (111), and a rubber pad (112) is fixedly mounted on the bottom of the connecting block (111), and through holes (113) are provided on the rubber pad (112) and the connecting block (111), and an adjustment plate (114) is arranged inside the connecting block (111), and a small electric telescopic rod (115) is installed on the inner side of the middle of the adjustment plate (114), and a partition plate (116) is installed at the telescopic end of the small electric telescopic rod (115), and the partition plate (116) is located in a receiving groove (117) provided on the adjustment plate (114), and a piston plate (118) is fixedly mounted on the upper end of the middle of the adjustment plate (114), and the piston plate (118) extends into the interior of the central block (119), and the piston plate (118) is connected to each other through an auxiliary spring (1110) and the top of the connecting block (111), and the internal cavity of the central block (119) is connected through an input The air pipe (1111) and the booster airbag (1112) are connected to each other, and the booster airbag (1112) is fixed inside the clamping block (1113) and between the lower end slider of the guide rack (1114), a gear (1115) is installed above the guide rack (1114), and the gear (1115) is fixed on the shunt pipe (1116), and a nozzle (1117) is fixed at the lower end of the shunt pipe (1116), and the shunt pipe (1116) is fixed with a nozzle (1117). 116) passes through the supporting block (1118) and is connected to the internal cavity of the center block (119); a vortex spring (1119) providing a return force is installed on the outer side of the shunt tube (1116); after the piston plate (118) moves, the airflow inside the center block (119) can be squeezed into the inside of the shunt tube (1116); after the airflow enters the shunt tube (1116), the airflow is ejected outwards to the surface of the photovoltaic silicon wafer through the nozzle (1117) at the bottom.

2. The photovoltaic silicon wafer suction material visual correction mechanism according to claim 1 is characterized by: A plurality of the limiting plates (7) are evenly distributed at the bottom of the base (3), and the air suction channels (10) and the adsorption and cleaning components (11) in the limiting plates (7) are interconnected.

3. The photovoltaic silicon wafer suction material visual correction mechanism according to claim 1, characterized in that: The rubber pad (112) and the connecting block (111) are both provided with a plurality of through holes (113), and the through holes (113) on the rubber pad (112) and the connecting block (111) are located on the same vertical straight line.

4. The photovoltaic silicon wafer suction material visual correction mechanism according to claim 1, characterized in that: The outer wall of the partition plate (116) and the inner wall of the receiving groove (117) provided on the adjustment plate (114) fit each other, and the partition plate (116) can slide on the adjustment plate (114).

5. The photovoltaic silicon wafer suction material visual correction mechanism according to claim 1, characterized in that: The piston plate (118) is capable of sliding on the connecting block (111), and one end of the piston plate (118) extending into the interior of the central block (119) forms a seamless sliding connection structure with the central block (119) through a sealing ring wrapped around the edge.

6. The photovoltaic silicon wafer suction material visual correction mechanism according to claim 1, characterized in that: The outer wall of the slider at the lower end of the guide rack (1114) and the inner wall of the clamping block (1113) fit each other, the guide rack (1114) and the clamping block (1113) are slidably connected, and the tooth blocks on the guide rack (1114) are intermittently arranged.

7. The photovoltaic silicon wafer suction material visual correction mechanism according to claim 1, characterized in that: The diverter pipe (1116) is capable of rotating on the supporting block (1118) and the central block (119), and the airflows in the internal cavities of the diverter pipe (1116) and the central block (119) are interconnected.

8. The photovoltaic silicon wafer suction material visual correction mechanism according to claim 1, characterized in that: The interior of the diverter pipe (1116) is configured as a hollow structure, and a plurality of spray heads (1117) are evenly distributed at the bottom of the diverter pipe (1116).

Images