Focusing assembly and photoetching device with same

Abstract

The invention discloses a focusing assembly and a photoetching device with the focusing assembly, the focusing assembly comprises an exposure piece, a bearing piece and an adjusting piece, the bearing piece and the exposure piece are oppositely arranged, and the bearing piece is used for bearing a circuit board; the adjusting piece is arranged between the exposure piece and the bearing piece, and the adjusting piece is configured to adjust the focusing position of the exposure piece. According to the focusing assembly, the adjusting part is arranged between the exposure part and the bearing part, so that the adjusting part can correspondingly adjust the output focusing condition of the exposure part, a circuit board on the bearing part can obtain the focusing performance better fitting the current condition, the circuit board can obtain a higher etching effect, and the output performance of the focusing assembly is improved. Moreover, the output performance of the exposure part is adjusted by the adjusting part, the structure is relatively simple, and the construction cost is low.

Description

Technical Field

[0001] The present invention relates to the technical field, and in particular to a focusing assembly and a photolithography device having the same. Background Art

[0002] In the prior art, during the production process of a circuit board, an exposure device is required to be used for optical etching. In the actual use process, since the progress of the specific etching process of circuit boards of different models and different requirements is often different, it is necessary to detect the etching condition of the circuit board and adjust the etching performance according to the detection results. In the related art, the exposure performance is usually adjusted in the form of an overall moving exposure part. The above process is relatively complicated and has relatively high requirements for the motor, so it is very important to propose an exposure device with a simple structure and capable of adjusting the exposure performance. Summary of the invention

[0003] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, one object of the present invention is to provide a focusing assembly, wherein an adjustment member is provided in the focusing assembly, and the adjustment member can adjust the exposure performance of the exposure member passing through the focusing assembly according to the demand, and the structure is relatively simple while achieving the adjustment of the exposure performance.

[0004] Another object of the present invention is to provide a lithography apparatus, wherein the lithography apparatus is provided with a focusing assembly as shown above.

[0005] According to an embodiment of the present invention, the focusing assembly includes: an exposure member, a carrier and an adjusting member, wherein the carrier is arranged opposite to the exposure member and is used to carry a circuit board; the adjusting member is arranged between the exposure member and the carrier and is configured to adjust the focusing position of the exposure member.

[0006] According to the focusing assembly of the embodiment of the present invention, an adjusting member is provided between the exposure member and the carrier, so that the adjusting member can adjust the output focusing condition of the exposure member accordingly, so that the circuit board on the carrier can obtain a focusing performance that is more suitable for the current situation, so that the circuit board can obtain a higher etching effect, so that the output performance of the focusing assembly is improved. In addition, the use of the adjusting member to adjust the output performance of the exposure member has a relatively simple structure and low construction cost.

[0007] In some embodiments, the adjusting member includes: an adjusting motor and an adjusting optical wedge, the adjusting motor has an adjusting output end; the adjusting optical wedge is arranged opposite to the exposure member, and the adjusting optical wedge is connected to the adjusting output end, and the adjusting motor drives the adjusting optical wedge to adjust the focusing position of the exposure member.

[0008] In some embodiments, the adjustment optical wedge includes: a first optical wedge and a second optical wedge, the first optical wedge is arranged opposite to the exposure member; the second optical wedge is connected to the adjustment output end, and the second optical wedge is arranged opposite to the first optical wedge and moves relative to each other under the control of the adjustment motor.

[0009] In some embodiments, the first optical wedge and the second optical wedge are both provided with an inclination angle, the inclination angle is α, and the angle α satisfies the relationship: 1°≤α≤10°.

[0010] In some embodiments, the first optical wedge and the second optical wedge are both made of transparent glass.

[0011] In some embodiments, a gap is further provided between the first optical wedge and the second optical wedge, and the width of the gap is A, and the width A satisfies the relationship: 100um≤A≤500um.

[0012] In some embodiments, the exposure member is an exposure lens.

[0013] In some embodiments, it further includes: a detection member, which detects the circuit board on the carrier.

[0014] In some embodiments, the method further includes: a controller, one end of which is communicatively connected to the detection element, and the other end of which is communicatively connected to the adjustment element.

[0015] A lithography apparatus according to an embodiment of the present invention includes: the focusing assembly as described above.

[0016] According to the lithography device of the embodiment of the present invention, since the focusing assembly shown above is provided in the lithography device, an adjusting member is provided between the exposure member and the carrier so that the adjusting member can adjust the output focusing condition of the exposure member accordingly, so that the circuit board on the carrier can obtain a focusing performance that is more in line with the current situation, so that the circuit board can obtain a higher etching effect, so that the output performance of the focusing assembly can be improved, thereby making the lithography device have higher applicability and being able to adjust the focusing performance according to the etching situation, so that the output performance of the lithography device can be improved.

[0017] Additional aspects and advantages of the present invention will be given in part in the following description and in part will be obvious from the following description, or will be learned through practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The above and / or additional aspects and advantages of the present invention will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which: Figure 1 is a schematic structural diagram of a focusing assembly according to an embodiment of the present invention; Figure 2 is a schematic diagram of the structure of an adjustable optical wedge according to an embodiment of the present invention; Figure 3 is a schematic diagram of the structure of an adjustable optical wedge according to an embodiment of the present invention; Figure 4 is a schematic diagram of the structure of an adjustable optical wedge according to an embodiment of the present invention; Figure 5 is a schematic diagram of the structure of an adjustable optical wedge according to an embodiment of the present invention; Reference numerals: Focusing assembly 10, Exposure piece 100, The carrier 200, Adjustment member 300, adjustment motor 310, adjustment optical wedge 320, first optical wedge 321, second optical wedge 322, gap 330, Detection piece 400. DETAILED DESCRIPTION

[0019] Embodiments of the present invention are described in detail below. The embodiments described with reference to the accompanying drawings are exemplary. Embodiments of the present invention are described in detail below.

[0020] Reference below Figure 1-Figure 5 The focusing assembly 10 according to an embodiment of the present invention includes an exposure member 100 , a carrier member 200 and an adjustment member 300 .

[0021] Specifically, the carrier 200 is arranged opposite to the exposure member 100 , and the carrier 200 is used to carry the circuit board; the adjustment member 300 is arranged between the exposure member 100 and the carrier 200 , and the adjustment member 300 is configured to adjust the focus position of the exposure member 100 .

[0022] That is to say, during the use of the focusing assembly 10, it is necessary to adjust the focusing position of the focusing assembly 10 according to the current etching situation so that the etching effect of the circuit board can better meet the current use requirements, thereby making the etching effect of the circuit board higher and improving the performance of the focusing assembly 10.

[0023] Specifically, the focusing assembly 10 is suitable for including an exposure member 100, a carrier 200 and an adjustment member 300. The exposure member 100 is suitable for outputting exposure performance according to control, and since the carrier 200 is arranged relative to the exposure member 100, the performance output by the exposure member 100 can act on the circuit board carried by the carrier 200 to achieve an etching effect. According to different circuit boards and the current etching conditions of the circuit boards, the current position of the adjustment member 300 is adjusted so that the adjustment member 300 can adjust the focus position of the exposure member 100, so that the focus position of the exposure member 100 can be adjusted according to demand. In this way, the focusing assembly 10 can adjust the focus performance according to the use conditions, so that the use performance of the focusing assembly 10 is improved.

[0024] According to the focusing assembly 10 of the embodiment of the present invention, the adjusting member 300 is provided between the exposure member 100 and the carrier 200, so that the adjusting member 300 can adjust the output focusing condition of the exposure member 100 accordingly, so that the circuit board on the carrier 200 can obtain a focusing performance that is more suitable for the current situation, so that the circuit board can obtain a higher etching effect, so that the output performance of the focusing assembly 10 is improved. In addition, the adjusting member 300 is used to adjust the output performance of the exposure member 100, and the structure is relatively simple and the construction cost is low.

[0025] In some embodiments, the adjusting member 300 includes: an adjusting motor 310 and an adjusting optical wedge 320, the adjusting motor 310 has an adjusting output end; the adjusting optical wedge 320 is arranged opposite to the exposure member 100, and the adjusting optical wedge 320 is connected to the adjusting output end, and the adjusting motor 310 drives the adjusting optical wedge 320 to adjust the focusing position of the exposure member 100.

[0026] That is, the adjusting member 300 includes an adjusting motor 310 and an adjusting optical wedge 320 . The adjusting motor 310 is used to output power to correspondingly control the movement of the adjusting optical wedge 320 to adjust the focusing performance of the exposure member 100 .

[0027] In some embodiments, the adjustment optical wedge 320 includes: a first optical wedge 321 and a second optical wedge 322 , the first optical wedge 321 is arranged opposite to the exposure member 100 ; the second optical wedge 322 is connected to the adjustment output end, and the second optical wedge 322 is arranged opposite to the first optical wedge 321 and moves relative to each other under the control of the adjustment motor 310 .

[0028] Moreover, in some specific embodiments, it is suitable to set the adjustment optical wedge 320 to be a first optical wedge 321 and a second optical wedge 322 that are relatively set, so that by adjusting the relative position of the first optical wedge 321 and the second optical wedge 322, the adjustment member 300 can adjust the focus position of the exposure member 100 to constitute the output performance adjustment of the focusing assembly 10.

[0029] In some specific embodiments, the first optical wedge 321 and the second optical wedge 322 are both provided with an inclination angle, and the inclination angle is α, and the angle α satisfies the relationship: 1°≤α≤10°. In this way, since the inclination angle is provided on the first optical wedge 321 and the second optical wedge 322, when the first optical wedge 321 and the second optical wedge 322 move in relative directions, since the inclination angle is provided on the relatively arranged inclined surfaces, the first optical wedge 321 and the second optical wedge 322 can also adjust the thickness in the vertical direction when moving in the horizontal direction, so that the performance adjustment of the adjustment member 300 can be achieved, so that the output focus of the exposure member 100 can be adjusted. In order to make the adjustment member 300 have good adjustment performance and relatively high adjustment accuracy, it is suitable to set the inclination angle between 1° and 10°. In some specific embodiments, the inclination angle is set to 4.37°.

[0030] In some embodiments, the first optical wedge 321 and the second optical wedge 322 are both made of transparent glass. It is understood that by setting the first optical wedge 321 and the second optical wedge 322 to be made of transparent glass, the light output by the exposure member 100 is transmitted through the adjustment member 300, and the loss on the adjustment member 300 is relatively low, so as to reduce the influence of the adjustment member 300 on the use of the exposure member 100. At the same time, the first optical wedge 321 and the second optical wedge 322 are set to be made of glass material, so that the first optical wedge 321 and the second optical wedge 322 have a higher structural strength, so that the performance and service life of the focusing assembly 10 are relatively high.

[0031] In some embodiments, a gap 330 is further provided between the first optical wedge 321 and the second optical wedge 322, and the width of the gap 330 is A, and the width A satisfies the relationship: 100um≤A≤500um. That is, in order to avoid the influence of the air gap 330 on the light transmission during the relative movement between the first optical wedge 321 and the second optical wedge 322, a gap 330 is provided between the first optical wedge 321 and the second optical wedge 322, and the gap 330 remains unchanged during the movement. In order to avoid the motor precision being too high due to the gap 330 being too small, and the adjustment performance being insufficient due to the gap 330 being too large, it is suitable to set the range of the gap 330 between 100um and 500um, so that the motor precision is relatively appropriate and the adjustment performance is better. In some specific embodiments, it is suitable to set the width of the gap 330 to 300um.

[0032] In some specific embodiments, the exposure member 100 is an exposure lens. Thus, by setting the exposure member 100 as an exposure lens, the exposure member 100 can have a higher output performance for focusing exposure, so that the output performance of the focusing assembly 10 is more reliable.

[0033] In some embodiments, the focusing assembly 10 further includes: a detection member 400, which detects the circuit board on the carrier 200. It is understandable that the focusing assembly 10 is also suitable for including the detection member 400, which is suitable for detecting the circuit board on the carrier 200, so as to output a control signal according to the detection result to control the focusing assembly 10 to adjust the output performance accordingly.

[0034] In some embodiments, the focusing assembly 10 further includes: a controller, one end of which is in communication connection with the detection member 400, and the other end of which is in communication connection with the adjustment member 300. In other words, the focusing assembly 10 is also suitable for including a controller, and after the detection member 400 detects the etching condition of the circuit board, it is suitable for transmitting the detection result to the controller, and the controller sends a control signal according to the detection result to control the adjustment member 300 to adjust, thereby realizing the automatic performance adjustment of the focusing assembly 10, so that the use efficiency of the focusing assembly 10 is improved.

[0035] The lithography apparatus according to the embodiment of the present invention comprises: the focusing assembly 10 as described above.

[0036] The principle of this application is as follows: When two wedges with the same material and wedge angle are parallel, their overlapping parts can be regarded as parallel plates. When parallel plate glass is placed on the focusing light path of the imaging lens, the working distance of the lens can be increased, that is, the distance from the rear surface of the lens to the exposure surface can be increased. When the plate thickness is l and the refractive index is n, the lens working distance changes to , when n is a constant, the change in the working distance of the optical path is proportional to the thickness of the flat glass, so changing the thickness of the parallel flat plate can change the focal plane position of the lens. The air gap 330 between the optical wedges will cause the thickness of the overlapped part of the optical wedges, i.e., the equivalent parallel flat plate part, to change when the optical wedges in the optical path of the present invention move up and down along the inclined plane, and the horizontal width will decrease and the vertical width will increase. At this time, the focal plane position of the exposure optical path changes with the movement of the optical wedge 1, and the specific changes are as follows: Figure 4 (a) is the initial position where the wedge does not slide. At this time, the thickness of the overlapped part of the wedge is t. Due to the wedge, the focal position of the exposure light path changes from the original Move to . Assume that the refractive index of the current wedge material is , according to the above formula, the axial offset .

[0037] Figure 4 (b) The optical wedge moves downward along the inclined surface The thickness of the overlapping part of the optical wedge is , assuming the wedge angle is According to the geometric relationship,

[0038] but

[0039] Figure 4 (c) The optical wedge moves upward along the inclined surface The thickness of the overlapping part of the optical wedge is , assuming the wedge angle is According to the geometric relationship,

[0040] but

[0041] According to the above formula, the optical wedge 1 moves along the inclined plane. The focal plane change caused by the distance Due to the optical wedge All are fixed values. and In practical applications, the optical wedge moving distance, i.e. the motor adjustment distance, can be deduced based on the required focal plane adjustment distance.

[0042] In addition, due to , the mechanism is a displacement reduction mechanism, for example ,at this time When the motor precision displacement is 50um, the displacement accuracy of the mechanism can reach 12.5um, so the requirements on motor precision can be further relaxed.

[0043] In the present invention, to ensure that the optical wedges can slide relative to each other, there is a small air gap 330 between the inclined surfaces of the first optical wedge 321 and the second optical wedge 322. The gap 330 has no effect on the axial position of the focal plane, but will cause a deviation in the vertical axis direction. Assuming the thickness of the air gap 330 is s, the wedge angle is α, the refractive index of the optical wedge glass is n1, and the refractive index of air is 1 by default, the optical axis deviation is:

[0044] In one embodiment of the present invention, the air gap 330 is 300um, the wedge angle is 4.57°, the glass material is H-K9L, the refractive index is 1.5168, and according to the above formula, the optical axis offset is 12um, that is, the focal plane of the optical path is offset by 12um along the vertical axis direction, and the effect on the exposure effect of the optical path can be ignored. It should be noted that during the sliding of the optical wedge along the inclined surface, the thickness of the air gap 330 needs to remain unchanged at all times, otherwise aberrations such as optical path distortion will be introduced.

[0045] According to the lithography device of the embodiment of the present invention, since the focusing assembly 10 as shown above is provided in the lithography device, an adjusting member 300 is provided between the exposure member 100 and the carrier 200 so that the adjusting member 300 can adjust the output focusing condition of the exposure member 100 accordingly, so that the circuit board on the carrier 200 can obtain a focusing performance that is more in line with the current situation, so that the circuit board can obtain a higher etching effect, so that the output performance of the focusing assembly 10 is improved, thereby making the lithography device have higher applicability and being able to adjust the focusing performance according to the etching situation, so that the output performance of the lithography device is improved.

[0046] Other structures and operations of the lithography apparatus according to the embodiment of the present invention are known to those skilled in the art and will not be described in detail here.

[0047] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example.

[0048] Although the embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the claims and their equivalents.

Claims

1. A focusing assembly, characterized in that: include: Exposure pieces; A carrier, the carrier is arranged opposite to the exposure member, and the carrier is used to carry a circuit board; An adjusting member is disposed between the exposure member and the supporting member, and is configured to adjust a focus position of the exposure member.

2. The focusing assembly according to claim 1, characterized in that: The adjusting member comprises: A regulating motor having a regulating output end; An adjusting optical wedge is arranged opposite to the exposure member and connected to the adjusting output end. The adjusting motor drives the adjusting optical wedge to adjust the focus position of the exposure member.

3. The focusing assembly according to claim 2, characterized in that: The adjusting optical wedge comprises: a first optical wedge, the first optical wedge being arranged opposite to the exposure member; A second optical wedge is connected to the adjustment output end, and the second optical wedge is arranged opposite to the first optical wedge and moves relatively under the control of the adjustment motor.

4. The focusing assembly according to claim 3, characterized in that: The first optical wedge and the second optical wedge are both provided with an inclination angle, the inclination angle is α, and the angle α satisfies the relationship: 1°≤α≤10°.

5. The focusing assembly according to claim 3, characterized in that: The first optical wedge and the second optical wedge are both made of transparent glass.

6. The focusing assembly according to claim 3, characterized in that: A gap is further provided between the first optical wedge and the second optical wedge. The width of the gap is A. The width A satisfies the relationship: 100um≤A≤500um.

7. The focusing assembly according to claim 1, characterized in that: The exposure component is an exposure lens.

8. The focusing assembly according to claim 1, characterized in that: Also includes: A detection member is used to detect the circuit board on the carrier.

9. The focusing assembly according to claim 8, characterized in that: Also includes: A controller, one end of the controller is communicatively connected to the detection component, and the other end of the controller is communicatively connected to the adjustment component.

10. A photolithography apparatus, characterized in that: include: A focusing assembly as claimed in any one of claims 1 to 9.

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