Production process of hydrofluoric acid polishing solution for touch screen processing

Abstract

The invention discloses a production process of a hydrofluoric acid polishing solution for touch screen processing, and particularly relates to the technical field of polishing solution production.The production process comprises the following steps that firstly, high-purity hydrofluoric acid is selected as a basic raw material to ensure the initial quality of the polishing solution, ingredients are selected and screened, impurities in the ingredients are removed, and a hydrofluoric acid solution is obtained; then adjusting the concentration of the ingredients; 2, hydrofluoric acid and other ingredients are sequentially added into the reaction container, the feeding speed is controlled, and dangerous accidents caused by violent reaction are prevented; 3, adding a proper amount of deionized water into the reaction container, and heating to a proper temperature; the hydrofluoric acid polishing solution is filtered three times from coarse to fine in a triple filtering mode, solid particles and impurities in the polishing solution are almost completely removed, the cleanliness and transparency of the polishing solution are remarkably improved, scratches and defects in the polishing process are greatly reduced, and the prepared polishing solution is good in quality.

Description

Technical Field

[0001] The invention relates to the technical field of polishing liquid production, and more specifically to a production process of hydrofluoric acid polishing liquid for touch screen processing. Background Art

[0002] Hydrofluoric acid polishing liquid is a chemical polishing agent widely used in material processing, and is particularly suitable for surface polishing of materials such as glass and metal. The main component of hydrofluoric acid polishing liquid is hydrofluoric acid (HF), which is a strong acid that can react with a variety of metal and non-metal oxides to remove uneven parts of the material surface and achieve a polishing effect. The hydrofluoric acid polishing liquid produced by the existing hydrofluoric acid polishing liquid production process uses only a single filtration during the production process, resulting in the presence of solid particles and impurities in the hydrofluoric acid polishing liquid, which may cause scratches and defects in the later polishing process, resulting in poor actual use effect of the existing hydrofluoric acid polishing liquid production process.

[0003] Therefore, there is an urgent need for a production process of a hydrofluoric acid polishing solution for touch screen processing to solve the above problems. Summary of the invention

[0004] In order to overcome the above-mentioned defects of the prior art, an embodiment of the present invention provides a production process of a hydrofluoric acid polishing liquid for touch screen processing. The present invention adopts a triple filtration method to filter the hydrofluoric acid polishing liquid, and performs it three times from coarse to fine, so that the solid particles and impurities in the polishing liquid are almost completely removed, which significantly improves the cleanliness and transparency of the polishing liquid, and greatly reduces scratches and defects in the polishing process. The prepared polishing liquid has good quality, so as to solve the problems raised in the above-mentioned background technology.

[0005] To achieve the above object, the present invention provides the following technical solution: a production process of a hydrofluoric acid polishing liquid for touch screen processing, comprising the following steps: Step 1: Select high-purity hydrofluoric acid as the basic raw material to ensure the initial quality of the polishing liquid, select the ingredients, screen the ingredients, remove impurities in the ingredients, and then adjust the concentration of the ingredients; Step 2: Add hydrofluoric acid and other ingredients into the reaction container in sequence, and control the feeding speed to prevent violent reactions from causing dangerous accidents; Step 3: Add an appropriate amount of deionized water into the reaction container and heat it to a suitable temperature. At the same time, turn on the agitator to fully mix the raw materials, which helps to improve the uniformity of the polishing liquid and the polishing effect; Step 4: The reacted polishing liquid is taken out from the reaction container and put into a coarse filter for primary filtration to remove coarser solid particles and impurities in the polishing liquid, improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 5: Put the polishing liquid filtered by the coarse filter into the precision filter for secondary filtration to remove relatively fine solid particles and impurities in the polishing liquid, further improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 6: Put the polishing liquid after secondary filtration by the precision filter into the ultrafilter for tertiary filtration to remove the tiny impurities in the polishing liquid, and almost completely remove the solid particles and impurities in the polishing liquid, so as to once again improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 7: Purify the polishing liquid after three filtrations by distillation purification method to remove harmful impurities and residues in the polishing liquid and improve the purity and quality of the polishing liquid; Step 8: Collect the purified polishing liquid to obtain a finished hydrofluoric acid polishing liquid.

[0006] In a preferred embodiment, the ingredients in step 1 include nitric acid, hydrochloric acid, glacial acetic acid, saturated citric acid solution and saturated disodium hydrogen phosphate solution.

[0007] In a preferred embodiment, the ratio of nitric acid, hydrochloric acid, glacial acetic acid, saturated solution of citric acid and saturated solution of disodium hydrogen phosphate in the ingredients is 180:55:20:55.

[0008] In a preferred embodiment, the reaction temperature in step three is set to 30°C-60°C.

[0009] In a preferred embodiment, the stirring speed of the stirrer in step three is set to 100-200 rpm.

[0010] In a preferred embodiment, the stirring time of the stirrer in step 3 is 5-15 minutes.

[0011] Technical effects and advantages of the present invention: The present invention selects high-purity hydrofluoric acid as a basic raw material to ensure the initial quality of the polishing liquid, selects ingredients, screens the ingredients, removes impurities in the ingredients, and then adjusts the concentration of the ingredients, adds hydrofluoric acid and other ingredients to a reaction container in sequence, controls the feeding speed during feeding, and prevents dangerous accidents caused by violent reactions, adds an appropriate amount of deionized water to the reaction container, and heats it to a suitable temperature, and turns on an agitator at the same time to fully mix the raw materials, which helps to improve the uniformity and polishing effect of the polishing liquid, takes the reacted polishing liquid out of the reaction container, and puts it into a coarse filter for primary filtration to remove coarser solid particles and impurities in the polishing liquid, improves the cleanliness and transparency of the polishing liquid, and reduces scratches and defects in the polishing process, puts the polishing liquid filtered by the coarse filter into a precision filter for secondary filtration to remove relatively fine solid particles and impurities in the polishing liquid, and then The cleanliness and transparency of the polishing liquid are improved in one step, and scratches and defects in the polishing process are reduced. The polishing liquid after secondary filtration by the precision filter is put into the ultrafilter for tertiary filtration to remove extremely small impurities in the polishing liquid, and the solid particles and impurities in the polishing liquid are almost completely removed, and the cleanliness and transparency of the polishing liquid are improved again, and scratches and defects in the polishing process are reduced. The polishing liquid after tertiary filtration is purified by a distillation purification method to remove harmful impurities and residues in the polishing liquid, improve the purity and quality of the polishing liquid, collect the purified polishing liquid, and obtain a finished hydrofluoric acid polishing liquid. The present invention adopts a triple filtration method to filter the hydrofluoric acid polishing liquid, and performs it three times from coarse to fine, so that the solid particles and impurities in the polishing liquid are almost completely removed, which significantly improves the cleanliness and transparency of the polishing liquid, and greatly reduces scratches and defects in the polishing process. The obtained polishing liquid has good quality. DETAILED DESCRIPTION

[0012] The technical solutions in the embodiments of the present invention are described clearly and completely below. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0013] Example 1 The present invention provides a production process of a hydrofluoric acid polishing liquid for touch screen processing, comprising the following steps: Step 1: Select high-purity hydrofluoric acid as the basic raw material to ensure the initial quality of the polishing liquid, select the ingredients, screen the ingredients, remove impurities in the ingredients, and then adjust the concentration of the ingredients; Step 2: Add hydrofluoric acid and other ingredients into the reaction container in sequence, and control the feeding speed to prevent violent reactions from causing dangerous accidents; Step 3: Add an appropriate amount of deionized water into the reaction container and heat it to a suitable temperature. At the same time, turn on the agitator to fully mix the raw materials, which helps to improve the uniformity of the polishing liquid and the polishing effect; Step 4: The reacted polishing liquid is taken out from the reaction container and put into a coarse filter for primary filtration to remove coarser solid particles and impurities in the polishing liquid, improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 5: Put the polishing liquid filtered by the coarse filter into the precision filter for secondary filtration to remove relatively fine solid particles and impurities in the polishing liquid, further improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 6: Put the polishing liquid after secondary filtration by the precision filter into the ultrafilter for tertiary filtration to remove the tiny impurities in the polishing liquid, and almost completely remove the solid particles and impurities in the polishing liquid, so as to once again improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 7: Purify the polishing liquid after three filtrations by distillation purification method to remove harmful impurities and residues in the polishing liquid and improve the purity and quality of the polishing liquid; Step 8: Collect the purified polishing liquid to obtain a finished hydrofluoric acid polishing liquid.

[0014] The ingredients in step 1 include nitric acid, hydrochloric acid, glacial acetic acid, saturated citric acid solution and saturated disodium hydrogen phosphate solution.

[0015] The ratio of nitric acid, hydrochloric acid, glacial acetic acid, saturated solution of citric acid and saturated solution of disodium hydrogen phosphate in the ingredients is 180:55:20:55.

[0016] The reaction temperature in step 3 is set to 30°C.

[0017] The stirring speed of the stirrer in step 3 is set to 100 rpm.

[0018] The stirring time of the stirrer in step 3 is 5 minutes.

[0019] This embodiment uses a triple filtration method to filter the hydrofluoric acid polishing liquid, performing the process three times from coarse to fine, and almost completely removes solid particles and impurities in the polishing liquid, significantly improving the cleanliness and transparency of the polishing liquid, and greatly reducing scratches and defects during the polishing process. The polishing liquid obtained is better than the polishing liquid obtained by the production process in the prior art.

[0020] Example 2 The present invention provides a production process of a hydrofluoric acid polishing liquid for touch screen processing, comprising the following steps: Step 1: Select high-purity hydrofluoric acid as the basic raw material to ensure the initial quality of the polishing liquid, select the ingredients, screen the ingredients, remove impurities in the ingredients, and then adjust the concentration of the ingredients; Step 2: Add hydrofluoric acid and other ingredients into the reaction container in sequence, and control the feeding speed to prevent violent reactions from causing dangerous accidents; Step 3: Add an appropriate amount of deionized water into the reaction container and heat it to a suitable temperature. At the same time, turn on the agitator to fully mix the raw materials, which helps to improve the uniformity of the polishing liquid and the polishing effect; Step 4: The reacted polishing liquid is taken out from the reaction container and put into a coarse filter for primary filtration to remove coarser solid particles and impurities in the polishing liquid, improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 5: Put the polishing liquid filtered by the coarse filter into the precision filter for secondary filtration to remove relatively fine solid particles and impurities in the polishing liquid, further improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 6: Put the polishing liquid after secondary filtration by the precision filter into the ultrafilter for tertiary filtration to remove the tiny impurities in the polishing liquid, and almost completely remove the solid particles and impurities in the polishing liquid, so as to once again improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 7: Purify the polishing liquid after three filtrations by distillation purification method to remove harmful impurities and residues in the polishing liquid and improve the purity and quality of the polishing liquid; Step 8: Collect the purified polishing liquid to obtain a finished hydrofluoric acid polishing liquid.

[0021] The ingredients in step 1 include nitric acid, hydrochloric acid, glacial acetic acid, saturated citric acid solution and saturated disodium hydrogen phosphate solution.

[0022] The ratio of nitric acid, hydrochloric acid, glacial acetic acid, saturated solution of citric acid and saturated solution of disodium hydrogen phosphate in the ingredients is 180:55:20:55.

[0023] The reaction temperature in step 3 is set to 40°C.

[0024] The stirring speed of the stirrer in step 3 is set to 120 rpm.

[0025] The stirring time of the stirrer in step 3 is 10 minutes.

[0026] This embodiment uses a triple filtration method to filter the hydrofluoric acid polishing liquid, performing the process three times from coarse to fine, and almost completely removes solid particles and impurities in the polishing liquid, significantly improving the cleanliness and transparency of the polishing liquid, and greatly reducing scratches and defects during the polishing process. The polishing liquid obtained is better than the polishing liquid obtained by the production process in the prior art.

[0027] Example 3 The present invention provides a production process of a hydrofluoric acid polishing liquid for touch screen processing, comprising the following steps: Step 1: Select high-purity hydrofluoric acid as the basic raw material to ensure the initial quality of the polishing liquid, select the ingredients, screen the ingredients, remove impurities in the ingredients, and then adjust the concentration of the ingredients; Step 2: Add hydrofluoric acid and other ingredients into the reaction container in sequence, and control the feeding speed to prevent violent reactions from causing dangerous accidents; Step 3: Add an appropriate amount of deionized water into the reaction container and heat it to a suitable temperature. At the same time, turn on the agitator to fully mix the raw materials, which helps to improve the uniformity of the polishing liquid and the polishing effect; Step 4: The reacted polishing liquid is taken out from the reaction container and put into a coarse filter for primary filtration to remove coarser solid particles and impurities in the polishing liquid, improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 5: Put the polishing liquid filtered by the coarse filter into the precision filter for secondary filtration to remove relatively fine solid particles and impurities in the polishing liquid, further improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 6: Put the polishing liquid after secondary filtration by the precision filter into the ultrafilter for tertiary filtration to remove the tiny impurities in the polishing liquid, and almost completely remove the solid particles and impurities in the polishing liquid, so as to once again improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 7: Purify the polishing liquid after three filtrations by distillation purification method to remove harmful impurities and residues in the polishing liquid and improve the purity and quality of the polishing liquid; Step 8: Collect the purified polishing liquid to obtain a finished hydrofluoric acid polishing liquid.

[0028] The ingredients in step 1 include nitric acid, hydrochloric acid, glacial acetic acid, saturated citric acid solution and saturated disodium hydrogen phosphate solution.

[0029] The ratio of nitric acid, hydrochloric acid, glacial acetic acid, saturated solution of citric acid and saturated solution of disodium hydrogen phosphate in the ingredients is 180:55:20:55.

[0030] The reaction temperature in step 3 is set to 50°C.

[0031] The stirring speed of the stirrer in step 3 is set to 150 rpm.

[0032] The stirring time of the stirrer in step 3 is 10 minutes.

[0033] This embodiment uses a triple filtration method to filter the hydrofluoric acid polishing liquid, performing the process three times from coarse to fine, and almost completely removes solid particles and impurities in the polishing liquid, significantly improving the cleanliness and transparency of the polishing liquid, and greatly reducing scratches and defects during the polishing process. The polishing liquid obtained is better than the polishing liquid obtained by the production process in the prior art.

[0034] Example 4 The present invention provides a production process of a hydrofluoric acid polishing liquid for touch screen processing, comprising the following steps: Step 1: Select high-purity hydrofluoric acid as the basic raw material to ensure the initial quality of the polishing liquid, select the ingredients, screen the ingredients, remove impurities in the ingredients, and then adjust the concentration of the ingredients; Step 2: Add hydrofluoric acid and other ingredients into the reaction container in sequence, and control the feeding speed to prevent violent reactions from causing dangerous accidents; Step 3: Add an appropriate amount of deionized water into the reaction container and heat it to a suitable temperature. At the same time, turn on the agitator to fully mix the raw materials, which helps to improve the uniformity of the polishing liquid and the polishing effect; Step 4: The reacted polishing liquid is taken out from the reaction container and put into a coarse filter for primary filtration to remove coarser solid particles and impurities in the polishing liquid, improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 5: Put the polishing liquid filtered by the coarse filter into the precision filter for secondary filtration to remove relatively fine solid particles and impurities in the polishing liquid, further improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 6: Put the polishing liquid after secondary filtration by the precision filter into the ultrafilter for tertiary filtration to remove the tiny impurities in the polishing liquid, and almost completely remove the solid particles and impurities in the polishing liquid, so as to once again improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 7: Purify the polishing liquid after three filtrations by distillation purification method to remove harmful impurities and residues in the polishing liquid and improve the purity and quality of the polishing liquid; Step 8: Collect the purified polishing liquid to obtain a finished hydrofluoric acid polishing liquid.

[0035] The ingredients in step 1 include nitric acid, hydrochloric acid, glacial acetic acid, saturated citric acid solution and saturated disodium hydrogen phosphate solution.

[0036] The ratio of nitric acid, hydrochloric acid, glacial acetic acid, saturated solution of citric acid and saturated solution of disodium hydrogen phosphate in the ingredients is 180:55:20:55.

[0037] The reaction temperature in step 3 is set to 60°C.

[0038] The stirring speed of the stirrer in step 3 is set to 200 rpm.

[0039] The stirring time of the stirrer in step 3 is 15 minutes.

[0040] This embodiment uses a triple filtration method to filter the hydrofluoric acid polishing liquid, performing the process three times from coarse to fine, and almost completely removes solid particles and impurities in the polishing liquid, significantly improving the cleanliness and transparency of the polishing liquid, and greatly reducing scratches and defects during the polishing process. The polishing liquid obtained is better than the polishing liquid obtained by the production process in the prior art.

[0041] The present invention selects high-purity hydrofluoric acid as a basic raw material to ensure the initial quality of the polishing liquid, selects ingredients, screens the ingredients, removes impurities in the ingredients, and then adjusts the concentration of the ingredients, adds hydrofluoric acid and other ingredients to a reaction container in sequence, controls the feeding speed during feeding, and prevents dangerous accidents caused by violent reactions, adds an appropriate amount of deionized water to the reaction container, and heats it to a suitable temperature, and turns on an agitator at the same time to fully mix the raw materials, which helps to improve the uniformity and polishing effect of the polishing liquid, takes the reacted polishing liquid out of the reaction container, and puts it into a coarse filter for primary filtration to remove coarser solid particles and impurities in the polishing liquid, improves the cleanliness and transparency of the polishing liquid, and reduces scratches and defects in the polishing process, puts the polishing liquid filtered by the coarse filter into a precision filter for secondary filtration to remove relatively fine solid particles and impurities in the polishing liquid, and then The cleanliness and transparency of the polishing liquid are improved in one step, and scratches and defects in the polishing process are reduced. The polishing liquid after secondary filtration by the precision filter is put into the ultrafilter for tertiary filtration to remove extremely small impurities in the polishing liquid, and the solid particles and impurities in the polishing liquid are almost completely removed, and the cleanliness and transparency of the polishing liquid are improved again, and scratches and defects in the polishing process are reduced. The polishing liquid after tertiary filtration is purified by a distillation purification method to remove harmful impurities and residues in the polishing liquid, improve the purity and quality of the polishing liquid, collect the purified polishing liquid, and obtain a finished hydrofluoric acid polishing liquid. The present invention adopts a triple filtration method to filter the hydrofluoric acid polishing liquid, and performs it three times from coarse to fine, so that the solid particles and impurities in the polishing liquid are almost completely removed, which significantly improves the cleanliness and transparency of the polishing liquid, and greatly reduces scratches and defects in the polishing process. The obtained polishing liquid has good quality.

[0042] Finally: The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A production process for a hydrofluoric acid polishing liquid for touch screen processing, characterized in that: The following steps are involved: Step 1: Select high-purity hydrofluoric acid as the basic raw material to ensure the initial quality of the polishing liquid, select the ingredients, screen the ingredients, remove impurities in the ingredients, and then adjust the concentration of the ingredients; Step 2: Add hydrofluoric acid and other ingredients into the reaction container in sequence, and control the feeding speed to prevent violent reactions from causing dangerous accidents; Step 3: Add an appropriate amount of deionized water into the reaction container and heat it to a suitable temperature. At the same time, turn on the agitator to fully mix the raw materials, which helps to improve the uniformity of the polishing liquid and the polishing effect; Step 4: The reacted polishing liquid is taken out from the reaction container and put into a coarse filter for primary filtration to remove coarser solid particles and impurities in the polishing liquid, improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 5: Put the polishing liquid filtered by the coarse filter into the precision filter for secondary filtration to remove relatively fine solid particles and impurities in the polishing liquid, further improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 6: Put the polishing liquid after secondary filtration by the precision filter into the ultrafilter for tertiary filtration to remove the tiny impurities in the polishing liquid, and almost completely remove the solid particles and impurities in the polishing liquid, so as to once again improve the cleanliness and transparency of the polishing liquid, and reduce scratches and defects during the polishing process; Step 7: Purify the polishing liquid after three filtrations by distillation purification method to remove harmful impurities and residues in the polishing liquid and improve the purity and quality of the polishing liquid; Step 8: Collect the purified polishing liquid to obtain a finished hydrofluoric acid polishing liquid.

2. The production process of a hydrofluoric acid polishing liquid for touch screen processing according to claim 1, characterized in that: The ingredients in step 1 include nitric acid, hydrochloric acid, glacial acetic acid, saturated citric acid solution and saturated disodium hydrogen phosphate solution.

3. The production process of a hydrofluoric acid polishing liquid for touch screen processing according to claim 2, characterized in that: The ratio of nitric acid, hydrochloric acid, glacial acetic acid, saturated solution of citric acid and saturated solution of disodium hydrogen phosphate in the ingredients is 180:55:20:

55.

4. The production process of a hydrofluoric acid polishing liquid for touch screen processing according to claim 1, characterized in that: The reaction temperature in step 3 is set to 30°C-60°C.

5. The production process of a hydrofluoric acid polishing liquid for touch screen processing according to claim 1, characterized in that: The stirring speed of the stirrer in step three is set to 100-200 rpm.

6. The production process of a hydrofluoric acid polishing liquid for touch screen processing according to claim 1, characterized in that: The stirring time of the stirrer in step 3 is 5-15 minutes.