Array substrate and manufacturing method thereof and display panel

Abstract

The present application discloses an array substrate and a preparation method thereof and a display panel, mainly relating to the field of display technology, wherein the array substrate comprises a first substrate, a photoelectric generation layer, a light guide structure layer and a pixel structure layer, wherein the photoelectric generation layer, the light guide structure layer and the pixel structure layer are sequentially arranged on the first substrate, and the light guide structure layer guides the light from the outside through the pixel structure layer to converge on the photoelectric generation layer, and the photoelectric generation layer generates current after receiving the light guided and converged by the light guide structure layer. Through the above design, the area of ​​the non-display area is reduced and the problem of being unable to generate electricity when the intensity of the outside light is low is avoided.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to an array substrate and a preparation method thereof, and a display panel. Background Art

[0002] Cholesteric liquid crystal is a liquid crystal with special properties. It is widely used in liquid crystal displays, optical switches, filters, etc. Especially in the field of electronic paper display panels, cholesteric liquid crystal is used to prepare color electronic paper display panels because it can reflect light of a specific wavelength.

[0003] In the array substrate currently provided with a photoelectric power generation layer, the photoelectric power generation layer is generally provided in the peripheral area of ​​the array substrate to generate electricity, which will cause the non-display area of ​​the array substrate to become larger. Summary of the invention

[0004] The purpose of the present application is to provide an array substrate and a method for preparing the same, and a display panel, which can reduce the area of ​​the non-display region and avoid the problem of being unable to generate electricity when the intensity of external light is low.

[0005] The present application discloses an array substrate, which includes a first substrate, a photoelectric generation layer, a light-guiding structure layer and a pixel structure layer. The photoelectric generation layer, the light-guiding structure layer and the pixel structure layer are sequentially arranged on the first substrate. The light-guiding structure layer guides light from the outside that passes through the pixel structure layer to converge on the photoelectric generation layer. The photoelectric generation layer generates current after receiving the light guided and converged by the light-guiding structure layer.

[0006] Optionally, the photoelectric power generation structure includes a hole transport layer, a perovskite light absorption layer, a composite electron transport layer and an electrode layer, and the hole transport layer, the perovskite light absorption layer, the composite electron transport layer and the electrode layer are sequentially arranged on the first substrate;

[0007] The pixel structure layer includes a first metal layer, a first insulating layer, a second metal layer, a second insulating layer and a pixel electrode layer, and the first metal layer, the first insulating layer, the second metal layer, the second insulating layer and the pixel electrode layer are sequentially arranged on the light guide structure layer.

[0008] Optionally, a direction along the first substrate toward the pixel structure layer is defined as a first direction, and the array substrate includes a plurality of pixel areas;

[0009] The light-guiding structure layer includes a second substrate and a plurality of first light-guiding structures, wherein the plurality of first light-guiding structures are arranged on a side of the second substrate facing the first substrate, wherein the first light-guiding structures correspond to the pixel areas one by one, and the cross-sectional area of ​​the first light-guiding structures gradually increases along the first direction so as to converge the light passing through a single pixel area onto the photoelectric generation layer corresponding to the center position of the single pixel area.

[0010] Optionally, a direction along the first substrate toward the pixel structure layer is defined as a first direction, and the array substrate includes a plurality of pixel areas;

[0011] The light guide structure layer includes a second substrate and a plurality of groups of light guide structures, each group of light guide structures includes a first light guide structure and two second light guide structures, the first light guide structure and the second light guide structure are both arranged on a side of the second substrate facing the first substrate, the first light guide structure is located between the two second light guide structures, and the first light guide structure and the second light guide structure correspond to the pixel areas one by one respectively;

[0012] The cross-sectional area of ​​the first light guide structure gradually increases along the first direction, so as to converge the light transmitted through the single pixel area onto the photovoltaic power generation layer corresponding to the center position of the single pixel area;

[0013] The second light-guiding structure is in the shape of a triangular prism, and the bottom surface of the triangular prism is a right triangle. The second light-guiding structure includes a first side surface and a second side surface. The first side surface is vertically arranged to the pixel structure layer, and the angle between the second side surface and the pixel structure layer is an acute angle. The second side surface of the second light-guiding structure faces the photoelectric generation layer below the first light-guiding structure so as to converge the light passing through the pixel area corresponding to the second light-guiding structure to the photoelectric generation layer corresponding to the center position of the pixel area corresponding to the first light-guiding structure.

[0014] Optionally, the plurality of pixel regions include a red light reflecting region, a green light reflecting region and a blue light reflecting region, the red light reflecting region is used to reflect red light, the green light reflecting region is used to reflect green light, the blue light reflecting region is used to reflect blue light, and the green light reflecting region and the blue light reflecting region are located on both sides of the red light reflecting region;

[0015] The first light guide structure is located on the red light reflecting area, and the two second light guide structures are located on the green light reflecting area and the blue light reflecting area respectively.

[0016] Optionally, the pixel electrode layer includes a plurality of pixel electrodes, the pixel structure layer includes an active switch and a common electrode, the active switch is a top gate active switch, the pixel electrode is connected to the active switch, the common electrode is arranged on the first metal layer and / or the second metal layer, the orthographic projection of the pixel electrode on the first substrate covers the orthographic projection of the common electrode on the first substrate, a storage capacitor is formed between the common electrode and the pixel electrode, and the common electrode and the pixel electrode are both made of transparent conductive material.

[0017] The present application also discloses a method for preparing an array substrate, which is used to prepare the array substrate described above. The steps of the method for preparing the array substrate include:

[0018] forming a photovoltaic layer on a first substrate;

[0019] forming a light-guiding structure layer on the photovoltaic power generation layer;

[0020] forming a pixel structure layer on the light guide structure layer to form the array substrate;

[0021] The light-guiding structure layer guides the light from the outside that passes through the pixel structure layer and converges it onto the photoelectric generation layer. The photoelectric generation layer generates current after receiving the light guided and converged by the light-guiding structure layer.

[0022] Optionally, the step of forming a light-guiding structure layer on the photovoltaic power generation layer includes:

[0023] forming a first light guide structure and a second light guide structure to form the light guide structure layer;

[0024] The light guide structure layer is boxed on the photovoltaic power generation layer.

[0025] The present application also discloses a display panel, which includes a cholesteric liquid crystal layer, an opposing substrate and an array substrate. The array substrate and the opposing substrate are arranged opposite to each other, and the cholesteric liquid crystal layer is arranged between the opposing substrate and the array substrate.

[0026] Optionally, the cholesteric liquid crystal layer includes a first cholesteric liquid crystal, a second cholesteric liquid crystal and a third cholesteric liquid crystal, the first cholesteric liquid crystal reflects red light, the second cholesteric liquid crystal reflects green light, and the third cholesteric liquid crystal reflects blue light;

[0027] A direction along the first substrate toward the pixel structure layer is defined as a first direction, and the array substrate includes a plurality of pixel areas;

[0028] The plurality of pixel regions include a red light reflecting region, a green light reflecting region and a blue light reflecting region, wherein the red light reflecting region is used to reflect red light, the green light reflecting region is used to reflect green light, and the blue light reflecting region is used to reflect blue light, and the green light reflecting region and the blue light reflecting region are located on both sides of the red light reflecting region; the first cholesterol liquid crystal is located in the red light reflecting region; the second cholesterol liquid crystal is located in the green light reflecting region; and the third cholesterol liquid crystal is located in the blue light reflecting region;

[0029] The light guide structure layer includes a second substrate and a plurality of groups of light guide structures, each group of light guide structures includes a first light guide structure and two second light guide structures, the first light guide structure and the second light guide structure are both arranged on a side of the second substrate facing the first substrate, the first light guide structure is located between the two second light guide structures, and the first light guide structure and the second light guide structure correspond to the pixel areas one by one respectively;

[0030] The first light guide structure is located on a side of the first cholesteric liquid crystal close to the first substrate, and the two second light guide structures are respectively located on a side of the second cholesteric liquid crystal and the third cholesteric liquid crystal close to the first substrate;

[0031] The cross-sectional area of ​​the first light guide structure gradually increases along the first direction, so as to converge the light transmitted through the single pixel area onto the photovoltaic power generation layer corresponding to the center position of the single pixel area;

[0032] The second light-guiding structure is in the shape of a triangular prism, and the bottom surface of the triangular prism is a right triangle. The second light-guiding structure includes a first side surface and a second side surface. The first side surface is vertically arranged to the pixel structure layer, and the angle between the second side surface and the pixel structure layer is an acute angle. The second side surface of the second light-guiding structure faces the photoelectric generation layer below the first light-guiding structure to converge the light passing through the pixel area corresponding to the second light-guiding structure to the photoelectric generation layer corresponding to the center position of the pixel area corresponding to the first light-guiding structure.

[0033] Compared with the existing array substrate solutions, the present application directly sets the photoelectric generation layer below the pixel structure layer, which is equivalent to directly setting the photoelectric generation layer in the array substrate. There is no need to set the photoelectric generation layer at the periphery of the array substrate, thereby avoiding the increase in the area of ​​the array substrate, which leads to a decrease in the ratio of the display area to the overall area, thereby reducing the area of ​​the non-display area. In addition, the present application uses a light-guiding structure to converge light on the photoelectric generation layer to generate electricity, thereby overcoming the problem that when the photoelectric generation layer is set below the pixel structure layer and the external light intensity is weak, the light intensity passing through the pixel structure layer will be even lower, thereby making it impossible to use this part of the light to generate electricity. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] The included drawings are used to provide a further understanding of the embodiments of the present application, which constitute a part of the specification, are used to illustrate the implementation methods of the present application, and together with the text description, explain the principles of the present application. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work. In the drawings:

[0035] Figure 1 is a schematic diagram of a display panel according to an embodiment of the present application;

[0036] Figure 2 is a schematic diagram of an array substrate according to the first embodiment of the present application;

[0037] Figure 3 is a schematic diagram of an external battery assembly according to the first embodiment of the present application;

[0038] Figure 4 is a schematic top view of a black matrix of the first embodiment of the present application;

[0039] Figure 5 is a schematic diagram of a light guide structure layer according to the first embodiment of the present application;

[0040] Figure 6 is a schematic diagram of another light guide structure layer of the first embodiment of the present application;

[0041] Figure 7 is a schematic diagram of a light guide structure layer according to the second embodiment of the present application;

[0042] Figure 8 is a schematic diagram of a third light guide structure of the second embodiment of the present application;

[0043] Fig. 9 is a schematic diagram of a cholesterol liquid crystal layer according to an embodiment of the present application;

[0044] Fig.10 It is a schematic diagram of a process of preparing an array substrate according to an embodiment of the present application;

[0045] Fig.11 It is a schematic diagram of a process of preparing a light-guiding structure layer according to an embodiment of the present application.

[0046] Among them, 10, display panel; 11, control circuit board; 12, battery assembly; 110, opposing substrate; 120, common electrode layer; 130, black matrix; 140, retaining wall; 210, cholesterol liquid crystal layer; 211, first cholesterol liquid crystal; 212, second cholesterol liquid crystal; 213, third cholesterol liquid crystal; 300, array substrate; 310, pixel area; 311, red light reflection area; 312, green light reflection area; 313, blue light reflection area; 320, first substrate; 330, photoelectric generation layer; 331, hole transport layer; 332, perovskite light absorption layer; 333, composite electron transport layer; 334, electrode layer; 400, light guide structure layer; 410, second substrate; 420, first light guide structure; 430, second light guide structure; 431, first side; 432, second side; 440, third light guide structure; 441, third side; 442, fourth side; 500, pixel structure layer; 510, first metal layer; 520, first insulating layer; 530, second metal layer; 540, second insulating layer; 550, flat layer; 560, pixel electrode layer; 561, pixel electrode; 610, active switch; 620, common electrode; 630, data signal line; 640, scanning signal line; 710, substrate; 720, photoresist material layer. DETAILED DESCRIPTION

[0047] It should be understood that the terms used herein, the specific structures and functional details disclosed are only for describing specific embodiments and are representative, but the present application can be implemented in many alternative forms and should not be construed as being limited to only the embodiments described herein.

[0048] In the description of this application, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating relative importance or implicitly indicating the number of technical features indicated. Therefore, unless otherwise specified, features defined as "first" and "second" may explicitly or implicitly include one or more of the features; "plurality" means two or more. The term "including" and any variation thereof means non-exclusive inclusion, and one or more other features, integers, steps, operations, units, components and / or combinations thereof may exist or be added.

[0049] In addition, terms indicating orientation or positional relationships, such as “center,” “lateral,” “up,” “down,” “left,” “right,” “vertical,” “horizontal,” “top,” “bottom,” “inside,” and “outside,” are described based on the orientation or relative positional relationships shown in the accompanying drawings and are merely simplified descriptions for the convenience of describing the present application. They do not indicate that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limitations on the present application.

[0050] In addition, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be internally connected between two components. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0051] The present application is described in detail below with reference to the accompanying drawings and optional embodiments.

[0052] Figure 1 is a schematic diagram of a display panel according to an embodiment of the present application, such as Figure 1 As shown, the present application discloses a display panel 10, which includes a cholesterol liquid crystal layer 210, an opposing substrate 110 and an array substrate 300, wherein the array substrate 300 and the opposing substrate 110 are arranged relative to each other, and the cholesterol liquid crystal layer 210 is arranged between the opposing substrate 110 and the array substrate 300.

[0053] The cholesterol liquid crystal layer 210 includes a common electrode layer 120, a black matrix 130, a retaining wall 140, a first cholesterol liquid crystal 211, a second cholesterol liquid crystal 212 and a third cholesterol liquid crystal 213. The retaining wall 140 separates the first cholesterol liquid crystal 211, the second cholesterol liquid crystal 212 and the third cholesterol liquid crystal 213, and the retaining wall 140 also plays a role in supporting the box thickness.

[0054] The first cholesteric liquid crystal 211 , the second cholesteric liquid crystal 212 and the third cholesteric liquid crystal 213 have different pitches. The first cholesteric liquid crystal 211 reflects red light, the second cholesteric liquid crystal 212 reflects green light, and the third cholesteric liquid crystal 213 reflects blue light.

[0055] Exemplarily, the cholesterol liquid crystal layer 210 is composed of cholesterol liquid crystal molecules and UV chiral agents (formamidine ultraviolet absorbers). The function of the UV chiral agent is to enable the cholesterol liquid crystal molecules to rotate, thereby adjusting the pitch of the cholesterol liquid crystal molecules. The content of the UV chiral agent is selected to be 2-5%. The cholesterol liquid crystal is dropped on the array substrate 300 by injection, and then aligned with the counter substrate 110 in a box. The entire cholesterol liquid crystal layer 210 is subjected to three ultraviolet light treatments respectively in combination with an ultraviolet mask. The three ultraviolet light treatments are performed at different times, so that the first cholesterol liquid crystal 211, the second cholesterol liquid crystal 212 and the third cholesterol liquid crystal 213 form three different pitches to reflect the three colors of red, green and blue.

[0056] Exemplarily, the first cholesterol liquid crystal 211, the second cholesterol liquid crystal 212 and the third cholesterol liquid crystal 213 all use ultraviolet light with a wavelength of 300~380nm, and the first cholesterol liquid crystal 211 is irradiated with ultraviolet light for 30~40min; the second cholesterol liquid crystal 212 is irradiated with ultraviolet light for 20~25min, and the third cholesterol liquid crystal 213 is irradiated with ultraviolet light for 10~15min.

[0057] The black matrix 130 is disposed on the counter substrate 110, and the orthographic projection of the black matrix 130 on the counter substrate 110 covers the orthographic projection of the retaining wall 140 on the counter substrate 110. The black matrix 130 defines the outer boundary of each pixel region 310 to prevent the problem of color mixing, making the display image clearer and more orderly. In addition, it can also serve as an insulating layer to reduce signal interference between adjacent pixel regions 310 and reduce problems such as cross contrast imbalance.

[0058] The common electrode layer 120 is disposed on the counter substrate 110 , and an electric field is formed between the common electrode layer 120 and the pixel electrode 561 on the array substrate 300 to drive the first cholesterol liquid crystal 211 , the second cholesterol liquid crystal 212 and the third cholesterol liquid crystal 213 to deflect and reflect light.

[0059] Exemplarily, a layer of transparent conductive film is deposited by a physical vapor deposition process, and then a patterned common electrode layer 120 is obtained by photoresist coating, exposure and development, etching and other techniques. The common electrode layer 120 is made of a transparent conductive material, including one of indium tin oxide (ITO), fluorine-doped tin oxide (FTO) and aluminum-doped zinc oxide (AZO). The film thickness of the common electrode layer 120 is controlled to be 500~1000Å.

[0060] The present application also discloses an array substrate 300, which can be used in the display panel 10 described above. For the array substrate 300, the present application provides the following design, which is specifically introduced through several embodiments:

[0061] Embodiment 1:

[0062] Figure 2 is a schematic diagram of an array substrate according to the first embodiment of the present application, Figure 1-Figure 2 As shown, Figure 2The direction indicated by the dotted arrow represents the propagation path of part of the light after being refracted by the light-guiding structure layer 400. The array substrate 300 includes a first substrate 320, a photoelectric generation layer 330, a light-guiding structure layer 400 and a pixel structure layer 500. The photoelectric generation layer 330, the light-guiding structure layer 400 and the pixel structure layer 500 are sequentially arranged on the first substrate 320. The light-guiding structure layer 400 guides the light from the outside through the pixel structure layer 500 to converge on the photoelectric generation layer 330. In simple terms, the function of the light-guiding structure layer 400 is to guide the light originally dispersed in a large range to converge into a small range. The photoelectric generation layer 330 generates current after receiving the light guided and converged by the light-guiding structure layer 400.

[0063] Compared with the existing array substrate solutions, the present application directly sets the photoelectric generation layer 330 below the pixel structure layer 500, which is equivalent to directly setting the photoelectric generation layer 330 inside the array substrate 300. There is no need to set the photoelectric generation layer 330 at the periphery of the array substrate 300, thereby avoiding the increase in the area of ​​the array substrate 300, which leads to a decrease in the ratio of the effective display area to the overall area, and can reduce the area of ​​the non-display area.

[0064] Moreover, the present application uses the light-guiding structure layer 400 to converge light on the photoelectric generation layer 330 to generate electricity, thereby overcoming the problem that when the photoelectric generation layer 330 is disposed below the pixel structure layer 500 and the intensity of light passing through the pixel structure layer 500 is weak, the intensity of light will be even lower, thereby making it impossible to use this part of light to generate electricity.

[0065] Among them, the photoelectric power generation structure includes a hole transport layer 331, a perovskite light absorption layer 332, a composite electron transport layer 333 and an electrode layer 334, and the hole transport layer 331, the perovskite light absorption layer 332, the composite electron transport layer 333 and the electrode layer 334 are sequentially arranged on the first substrate 320.

[0066] When light irradiates the perovskite light absorption layer 332 , electron-hole pairs are excited, wherein the electrons flow from the perovskite light absorption layer 332 to the electrode layer 334 through the electron transport layer, forming a current, thereby generating electric energy.

[0067] Combination Figure 3 As shown, the electric energy generated by the photoelectric generation layer 330 can be directly connected to the power line of the control circuit board 11 to power the display panel 10. Of course, the generated electric energy can also be stored by setting a battery assembly 12 to power the display panel 10 in special circumstances, and the battery assembly 12 can be set on the array substrate 300, or connected to the outside of the array substrate 300 through metal wires.

[0068] See also Figure 1-Figure 2 As shown, the pixel structure layer 500 includes a first metal layer 510, a first insulating layer 520, a second metal layer 530, a second insulating layer 540 and a pixel electrode layer 560. The first metal layer 510, the first insulating layer 520, the second metal layer 530, the second insulating layer 540 and the pixel electrode layer 560 are sequentially arranged on the light guide structure layer 400. Of course, a flat layer 550 can also be arranged between the second insulating layer 540 and the pixel electrode layer 560.

[0069] The pixel electrode layer 560 includes a plurality of pixel electrodes 561 , each of the pixel electrodes 561 corresponds to the pixel region 310 . The pixel structure layer 500 includes an active switch 610 and a common electrode 620 . Exemplarily, the active switch 610 is a top-gate active switch 610 .

[0070] Exemplarily, the source and drain of the active switch 610 are disposed on the first metal layer 510 , the gate of the active switch 610 is disposed on the second metal layer 530 , and the gate of the active switch 610 covers the channel between the source and the drain.

[0071] The pixel electrode 561 is connected to the active switch 610, and the common electrode 620 is arranged on the first metal layer 510 and / or the second metal layer 530. In simple terms, the common electrode 620 can be arranged only on the first metal layer 510, or only on the second metal layer 530. Of course, it is also possible to arrange the common electrode 620 on both the first metal layer 510 and the second metal layer 530, and the common electrode 620 can also be arranged on the second insulating layer 540 and the flat layer 550.

[0072] The common electrode 620 is used to connect to the common electrode layer 120, and the orthographic projection of the pixel electrode 561 on the first substrate 320 covers the orthographic projection of the common electrode 620 on the first substrate 320. A storage capacitor is formed between the common electrode 620 and the pixel electrode 561. The common electrode 620 and the pixel electrode 561 are both made of transparent conductive material.

[0073] For a single pixel area 310, the pixel electrode 561 and the common electrode 620 occupy a large area. Therefore, by making both the common electrode 620 and the pixel electrode 561 with transparent conductive materials, it is possible to avoid the presence of the common electrode 620 and the pixel electrode 561 causing the light intensity to weaken when the light passes through the pixel structure layer 500, thereby improving the light transmittance of the pixel structure layer 500.

[0074] The pixel structure layer 500 also includes a data signal line 630 and a scanning signal line 640. The data signal line 630 and the scanning signal line 640 are arranged in a criss-cross manner, and the area formed therebetween is defined as a pixel area 310. The data signal line 630 and the scanning signal line 640 are arranged in different layers. The data signal line 630 is connected to the source of the active switch 610, the pixel electrode 561 is connected to the drain of the active switch 610, and the scanning signal line 640 is connected to the gate of the active switch 610.

[0075] Exemplarily, the data signal line 630 is disposed on the first metal layer 510, and the scan signal line 640 is disposed on the second metal layer 530. Alternatively, the data signal line 630 is disposed on the second metal layer 530, and the scan signal line 640 is disposed on the first metal layer 510, which is not limited here.

[0076] like Figure 4 As shown, the orthographic projection of the black matrix 130 covers the orthographic projection of the data signal line 630 and the orthographic projection of the scanning signal line 640. This prevents the light from irradiating the data signal line 630 and the scanning signal line 640 to cause the generation of reflected light, thereby improving the display effect of the display panel 10.

[0077] like Figure 5 As shown, Figure 5 The direction indicated by the dotted arrow represents the propagation path of part of the light after being refracted by the light-guiding structure layer 400. The direction along the first substrate 320 toward the pixel structure layer 500 is defined as the first direction. The array substrate 300 includes a plurality of pixel areas 310, and the pixel electrode layer 560 includes a plurality of pixel electrodes 561. The pixel electrodes 561 correspond one-to-one to the pixel areas 310.

[0078] The light guide structure layer 400 includes a second substrate 410 and a plurality of first light guide structures 420. The plurality of first light guide structures 420 are arranged on a side of the second substrate 410 facing the first substrate 320. The first light guide structures 420 correspond to the pixel areas 310 one by one. The cross-sectional area of ​​the first light guide structures 420 gradually increases along the first direction so as to converge the light transmitted through the single pixel area 310 onto the photoelectric generation layer 330 corresponding to the center position of the single pixel area 310.

[0079] In short, in this embodiment, by disposing the first light guide structure 420 on each pixel region 310 , the light originally dispersed on one pixel region 310 is guided by the first light guide structure 420 to converge at the center of the pixel region 310 .

[0080] The first light guide structure 420 and the second substrate 410 may be integrally formed, and of course the first light guide structure 420 may also be separately disposed on the second substrate 410 .

[0081] Exemplarily, the first light guide structure 420 is in the shape of a hemisphere, the bottom surface of the first light guide structure 420 is in contact with the second substrate 410 , and the arc surface of the first light guide structure 420 is convex toward one side of the first substrate 320 .

[0082] For example, Figure 6 As shown, the first light guide structure 420 is in the shape of a truncated cone, the bottom surface of the first light guide structure 420 is in contact with the second substrate 410, the top surface of the first light guide structure 420 is located on the side of the bottom surface of the first light guide structure 420 away from the second substrate 410, and the top surface area of ​​the first light guide structure 420 is smaller than the bottom surface area of ​​the first light guide structure 420.

[0083] In short, this embodiment sets a first light-guiding structure 420 in each pixel area 310 to converge the relatively scattered light in a pixel area 310 to the center of the pixel area 310 to form concentrated light, thereby meeting the power generation light intensity threshold of the photoelectric generation layer 330 and avoiding the situation where the scattered light irradiates the perovskite light absorption layer 332 and fails to excite electron-hole pairs when the external light intensity is weak.

[0084] Embodiment 2:

[0085] Figure 7 is a schematic diagram of a light guide structure layer of the second embodiment of the present application, such as Figure 7 As shown, Figure 7 The direction indicated by the dotted arrow represents the propagation path of part of the light after being refracted by the light-guiding structure layer 400. Different from the first embodiment, the light-guiding structure layer 400 of this embodiment also includes a second light-guiding structure 430, which is specifically as follows: the direction along the first substrate 320 toward the pixel structure layer 500 is defined as the first direction, and the array substrate 300 includes multiple pixel areas 310.

[0086] The light guide structure layer 400 includes multiple groups of light guide structures, each group of light guide structures includes a first light guide structure 420 and two second light guide structures 430, the first light guide structure 420 is located between the two second light guide structures 430, and the first light guide structure 420 and the second light guide structure 430 correspond to the pixel areas 310 one by one, respectively.

[0087] The cross-sectional area of ​​the first light guide structure 420 gradually increases along the first direction, so as to converge the light transmitted through the single pixel region 310 onto the photovoltaic layer 330 corresponding to the center position of the single pixel region 310 .

[0088] The first light guide structure 420 in this embodiment has the same shape as the first light guide structure 420 in the first embodiment, which can be a hemispherical shape or a truncated cone shape. This embodiment is explained by taking the hemispherical shape of the first light guide structure 420 as an example.

[0089] The second light-guiding structure 430 is in the shape of a triangular prism, and the bottom surface of the triangular prism is a right triangle. The second light-guiding structure 430 includes a first side surface 431 and a second side surface 432. The first side surface 431 is vertically arranged to the pixel structure layer 500. The angle between the second side surface 432 and the pixel structure layer 500 is an acute angle. The second side surface 432 of the second light-guiding structure 430 faces the photoelectric generation layer 330 below the first light-guiding structure 420.

[0090] The light transmitted through the pixel region 310 corresponding to the second light guide structure 430 is converged onto the photovoltaic layer 330 corresponding to the center position of the pixel region 310 corresponding to the first light guide structure 420 .

[0091] In simple terms, the present application sets a first light-guiding structure 420 and sets a second light-guiding structure 430 on both sides of the first light-guiding structure 420. The light passing through the first light-guiding structure 420 will converge on the photoelectric generation layer 330 below the first light-guiding structure 420, and the light passing through the second light-guiding structure 430 will be refracted by the second light-guiding structure 430 and converged below the adjacent first light-guiding structure 420, thereby realizing the convergence of light passing through three adjacent pixel areas 310 into one pixel area 310, thereby increasing the light intensity of the photoelectric generation layer 330 below the first light-guiding structure 420 corresponding to the single pixel area 310, thereby ensuring the power generation function can be achieved even in weak light conditions.

[0092] Furthermore, in the reflecting red light region 311, the reflecting green light region 312 and the reflecting blue light region 313, since the reflecting red light region 311 has a higher light transmittance, the present embodiment arranges the reflecting green light region 312 and the reflecting blue light region 313 on both sides of the reflecting red light region 311, and arranges the first light guiding structure 420 in the reflecting red light region 311, and arranges the two second light guiding structures 430 in the reflecting blue light region 313 and the reflecting green light region 312, respectively.

[0093] Specifically, the multiple pixel areas 310 include a red light reflecting area 311, a green light reflecting area 312 and a blue light reflecting area 313, the red light reflecting area 311 is used to reflect red light, the green light reflecting area 312 is used to reflect green light, the blue light reflecting area 313 is used to reflect blue light, and the green light reflecting area 312 and the blue light reflecting area 313 are located on both sides of the red light reflecting area 311; the first light guide structure 420 is located on the red light reflecting area 311, and the two second light guide structures 430 are respectively located on the green light reflecting area 312 and the blue light reflecting area 313.

[0094] By setting the first light-guiding structure 420 in the red light reflecting area 311, and setting the two second light-guiding structures 430 in the blue light reflecting area 313 and the green light reflecting area 312 respectively, the light passing through the blue light reflecting area 313 and the light passing through the green light reflecting area 312 will converge into the middle red light reflecting area 311, and because the light transmittance of the red light reflecting area 311 is greater, the light intensity of a single pixel area 310 can be further improved, so as to further ensure that the power generation function can be achieved even in weak light conditions.

[0095] like Figure 8 As shown, Figure 8 The direction indicated by the dotted arrow represents the propagation path of part of the light after being refracted by the light-guiding structure layer 400. The array substrate 300 also includes a third light-guiding structure 440, which is arranged on the side of the photoelectric generation layer 330 away from the first substrate 320, and the third light-guiding structure 440 is located between the second light-guiding structure 430 and the photoelectric generation layer 330.

[0096] The third light guide structure 440 is in the shape of a triangular prism, and the bottom surface of the triangular prism is a right triangle. The third light guide structure 440 includes a third side surface 441 and a fourth side surface 442. The third side surface 441 is vertically arranged to the photoelectric power generation layer 330, and the angle between the fourth side surface 442 and the photoelectric power generation layer 330 is an acute angle. The fourth side surface 442 of the third light guide structure 440 faces the photoelectric power generation layer 330 below the first light guide structure 420, so as to converge the light passing through the second light guide structure 430 to the photoelectric power generation layer 330 corresponding to the center position of the pixel area 310 corresponding to the first light guide structure 420.

[0097] In short, by providing the third light guide structure 440 , the light that cannot be refracted from the second light guide structure 430 to below the first light guide structure 420 is refracted to below the first light guide structure 420 , thereby further improving the light intensity below the first light guide structure 420 .

[0098] like Fig. 9 As shown, the cholesteric liquid crystal layer 210 includes a first cholesteric liquid crystal 211, a second cholesteric liquid crystal 212 and a third cholesteric liquid crystal 213, wherein the first cholesteric liquid crystal 211 reflects red light, the second cholesteric liquid crystal 212 reflects green light, and the third cholesteric liquid crystal 213 reflects blue light.

[0099] A direction along the first substrate 320 toward the pixel structure layer 500 is defined as a first direction. The array substrate 300 includes a plurality of pixel regions 310 .

[0100] The plurality of pixel regions 310 include a red light reflecting region 311 , a green light reflecting region 312 and a blue light reflecting region 313 . The red light reflecting region 311 is used to reflect red light, the green light reflecting region 312 is used to reflect green light, and the blue light reflecting region 313 is used to reflect blue light.

[0101] The green light reflecting area 312 and the blue light reflecting area 313 are located on both sides of the red light reflecting area 311; the first cholesterol liquid crystal 211 is located in the red light reflecting area 311; the second cholesterol liquid crystal 212 is located in the green light reflecting area 312; and the third cholesterol liquid crystal 213 is located in the blue light reflecting area 313.

[0102] The light guide structure layer 400 includes a second substrate 410 and multiple groups of light guide structures, each group of light guide structures includes a first light guide structure 420 and two second light guide structures 430, the first light guide structure 420 and the second light guide structure 430 are both arranged on the side of the second substrate 410 facing the first substrate 320, the first light guide structure 420 is located between the two second light guide structures 430, and the first light guide structure 420 and the second light guide structure 430 correspond to the pixel area 310 one by one, respectively.

[0103] The first light guiding structure 420 is located on a side of the first cholesteric liquid crystal 211 close to the first substrate 320 , and the two second light guiding structures 430 are respectively located on a side of the second cholesteric liquid crystal 212 and the third cholesteric liquid crystal 213 close to the first substrate 320 .

[0104] The cross-sectional area of ​​the first light guide structure 420 gradually increases along the first direction, so as to converge the light transmitted through the single pixel region 310 onto the photovoltaic power generation layer 330 corresponding to the center position of the single pixel region 310 .

[0105] The second light guide structure 430 is in the shape of a triangular prism, and the bottom surface of the triangular prism is a right triangle. The second light guide structure 430 includes a first side surface 431 and a second side surface 432. The first side surface 431 is vertically arranged to the pixel structure layer 500, and the angle between the second side surface 432 and the pixel structure layer 500 is an acute angle. The second side surface 432 of the second light guide structure 430 faces the photoelectric generation layer 330 below the first light guide structure 420 to converge the light passing through the pixel area 310 corresponding to the second light guide structure 430 to the photoelectric generation layer 330 corresponding to the center position of the pixel area 310 corresponding to the first light guide structure 420.

[0106] In simple terms, since the light transmittance of the first cholesterol liquid crystal 211 is greater, the light passing through the third cholesterol liquid crystal 213 and the light passing through the second cholesterol liquid crystal 212 will all converge under the middle of the first cholesterol liquid crystal 211, thereby further improving the light intensity of a single pixel area 310, to further ensure that the function of power generation can be achieved even in weak light conditions.

[0107] Fig.10 FIG. 1 is a flow chart of a method for preparing an array substrate according to an embodiment of the present application. Fig.10 As shown, the present application also discloses a method for preparing an array substrate 300, which is used to prepare the array substrate 300. The steps of the method for preparing the array substrate 300 include:

[0108] S1: forming a photovoltaic power generation layer on a first substrate;

[0109] S2: forming a light-guiding structure layer on the photovoltaic layer;

[0110] S3: forming a pixel structure layer on the light guide structure layer to form the array substrate;

[0111] The light guide structure layer 400 guides the light from the outside through the pixel structure layer 500 to converge on the photoelectric generation layer 330 , and the photoelectric generation layer 330 generates current after receiving the light guided and converged by the light guide structure layer 400 .

[0112] By directly setting the photoelectric generation layer 330 under the pixel structure layer 500, it is equivalent to directly setting the photoelectric generation layer 330 inside the array substrate 300. There is no need to set the photoelectric generation layer 330 at the periphery of the array substrate 300, thereby avoiding the increase in the area of ​​the array substrate 300, which leads to a decrease in the ratio of the effective display area to the overall area, and the area of ​​the non-display area can be reduced.

[0113] Moreover, the present application uses the light-guiding structure layer 400 to converge light on the photoelectric generation layer 330 to generate electricity, thereby overcoming the problem that when the photoelectric generation layer 330 is disposed below the pixel structure layer 500 and the intensity of light passing through the pixel structure layer 500 is weak, the intensity of light will be even lower, thereby making it impossible to use this part of light to generate electricity.

[0114] The step of forming a photovoltaic power generation layer on a first substrate in step S1 includes:

[0115] S11: forming a hole transport layer on a first substrate;

[0116] S12: forming a perovskite light absorbing layer on the hole transport layer;

[0117] S13: forming a composite electron transport layer on the perovskite light absorbing layer;

[0118] S14: forming an electrode layer on the composite electron transport layer;

[0119] Exemplarily, the first substrate 320 may be one of FTO, ITO, and TCO glass substrates. Exemplarily, the material of the hole transport layer 331 includes one of inorganic materials such as nickel oxide (NiO), polymer materials, and small molecules.

[0120] Exemplarily, the material of the perovskite light absorbing layer 332 includes one of an all-inorganic perovskite, an organic-inorganic halide perovskite and an organic cation perovskite; the material of the perovskite light absorbing layer 332 of the present application is CH3NH3PbI3 as an example, and the preparation method can be a one-step solution method, that is, film formation by spin coating annealing, and the film thickness of the perovskite light absorbing layer 332 is controlled at 1000~1500Å.

[0121] Exemplarily, the composite electron transport layer 333 can be one of ZnO, TmPyPb, TiO2, WO3 or SnO2, and can be prepared by a solution method or an evaporation method. The film thickness of the electrode layer 334 is controlled to be 400~600Å.

[0122] Exemplarily, the electrode layer 334 may be one of ITO / FTO, prepared by physical vapor deposition process, and the film thickness is controlled at 1000Å.

[0123] Furthermore, the composite electron transport layer 333 and the electrode layer 334 may be laid on the entire surface, or may be disposed only below the first light guide structure 420 in the light guide structure layer 400 .

[0124] The step S2: forming a light-guiding structure layer on the photovoltaic layer comprises:

[0125] S21: forming a first light guide structure and a second light guide structure to form the light guide structure layer;

[0126] S22: assembling the light-guiding structure layer onto the photovoltaic power generation layer.

[0127] In step S22, the cell assembly operation can be completed by coating optical glue on the photovoltaic power generation layer 330 and then attaching the light guide structure layer 400 to the photovoltaic power generation layer 330. The refractive index of the optical glue is smaller than that of the light guide structure layer 400.

[0128] Fig.11 FIG. 1 is a schematic diagram of a process for preparing a light guide structure layer according to an embodiment of the present application. Fig.11 As shown, the step S21: forming a first light guide structure and a second light guide structure to form the light guide structure layer includes:

[0129] S211: Disposing a photoresist material layer on the substrate;

[0130] S212: forming a first groove and a second groove on the photoresist material layer, wherein the formation of the first groove matches the first light guide structure, and the shape of the second groove matches the shape of the second light guide structure;

[0131] S213: pouring plastic or glass material on the photoresist material layer to form a light guide structure layer;

[0132] S214: demoulding the light guide structure.

[0133] In simple terms, a photoresist material layer 720 is disposed on a base substrate 710 to prepare a mold, and then a plastic or glass material is injected to form the light guide structure layer 400 .

[0134] The step S3: forming a pixel structure layer 500 on the light guide structure layer 400 to form the array substrate 300 includes:

[0135] S31: forming a first metal layer on the light guide structure layer;

[0136] S32: forming a first insulating layer on the first metal layer;

[0137] S33: forming a second metal layer on the first insulating layer;

[0138] S34: forming a second insulating layer on the second metal layer;

[0139] S35: forming a pixel electrode layer on the second insulating layer;

[0140] Of course, a step S341 may be added between the step S34: forming a second insulating layer on the second metal layer; and the step S35: forming a pixel electrode layer on the second insulating layer: forming a planar layer on the second metal layer.

[0141] The active switch 610 of the present application is a top-gate active switch 610 . Exemplarily, the source and drain of the active switch 610 are arranged on the first metal layer 510 in order to further increase the size of the storage capacitor formed between the pixel electrode 561 and the common electrode 620 .

[0142] The present application also sets a pixel electrode layer 560 between the first metal layer 510 and the light-guiding structure layer 400, and patterns it into a pixel electrode 561, and sets the common electrode 620 between the second insulating layer 540 and the flat layer 550, so that a first storage capacitor is formed between the pixel electrode layer 560 and the common electrode 620 between the first metal layer 510 and the light-guiding structure layer 400, and a second storage capacitor is formed between the pixel electrode 561 on the flat layer 550 and the common electrode 620.

[0143] Of course, the pixel electrode layer 560 may be disposed only on the second insulating layer 540 , or the pixel electrode layer 560 may be disposed only between the first metal layer 510 and the light guide structure layer 400 .

[0144] Exemplarily, the pixel electrode layer 560 can also be deposited on the second substrate 410 by physical vapor deposition (PVD) process, and the material can be a transparent conductive material, such as one of indium tin oxide (ITO), fluorine-doped tin oxide (FTO) and aluminum-doped zinc oxide (AZO), and the film thickness is controlled to be 1000~1500Å.

[0145] Exemplarily, a photoresist material is coated on the surface of the pixel electrode layer 560 with a thickness controlled at 3000-5000 Å, and a patterned pixel electrode layer 560 is formed by mask exposure, development, wet etching and other processes to form the pixel electrode 561. Oxalic acid can be used as an etching solution for the transparent conductive material.

[0146] Exemplarily, a first metal layer 510 is then deposited by a physical vapor deposition process (PVD) to form a source and a drain, wherein the material of the source and the drain includes one or more of aluminum, copper, silver, and molybdenum, and the film thickness is controlled to be 3000-4000 Å; an active layer of a phosphorus-doped semiconductor is then deposited by a chemical vapor deposition process (CVD), wherein the active layer material of the phosphorus-doped semiconductor is selected from α-Si material, and the film thickness is controlled to be 300-500 Å; a photoresist is coated on the surface of the active layer of the phosphorus-doped semiconductor, and the mask is exposed and developed, and a patterned semiconductor active layer, a drain, and a source are formed through a dry etching process and a wet etching process, wherein the dry etching gas mainly includes: Cl2, SF6, NF3, etc., and the wet etching solution can be selected from a mixture of nitric acid, phosphoric acid, and acetic acid; and then the first insulating layer 520 and the second metal layer 530 are formed, and the gate of the active switch 610 is set on the second metal layer 530, and the gate covers the channel between the source and the drain.

[0147] Of course, a single wet etching process can also be used to form a patterned semiconductor active layer, drain electrode, and source electrode, wherein the etching solution is a mixture of nitric acid, phosphoric acid, and hydrofluoric acid.

[0148] Exemplarily, the semiconductor active layer and the first insulating layer 520 are sequentially deposited by chemical vapor deposition, and then the second metal layer 530 is deposited by physical vapor deposition, wherein the semiconductor active layer material is α-Si, and the film thickness is controlled to be 1000~1500Å, the first insulating layer 520 material is generally Si3N4 or SiO2, and the film thickness of the first insulating layer 520 is controlled to be 3000~4500Å, and the material of the second metal layer 530 can be one or more of aluminum, copper, silver, and molybdenum, and the film thickness of the second metal layer 530 is controlled to be 3000~4500Å. Then, photoresist is applied, and the patterned semiconductor active layer, the first insulating layer 520, and the second metal layer 530 are formed through a wet etching process and a dry etching process.

[0149] The dry etching gas mainly includes Cl2, SF6, NF3, etc., and the wet etching solution is a mixture of nitric acid, phosphoric acid and acetic acid. A single wet etching process can also be used to form a patterned semiconductor active layer, a first insulating layer 520 and a gate, and the etching solution is a mixture of nitric acid, phosphoric acid and hydrofluoric acid.

[0150] Exemplarily, the second insulating layer 540 is deposited by chemical vapor deposition process. The material of the second insulating layer 540 may be Si 3 N 4 or SiO 2 , and the film thickness is controlled to be 2500-4000 Å.

[0151] Exemplarily, the common electrode 620 is deposited by physical vapor deposition process. Since the size of the common electrode 620 can be adjusted, when the common electrode 620 is set in a strip shape, the area occupied by the pixel area 310 is small, and its material can be one or more of aluminum, copper, silver, and molybdenum, and the film thickness is controlled at 3000~4000 Å; when the common electrode 620 is set in a sheet shape, the area occupied by the pixel area 310 is large, and its material uses a transparent conductive material, such as indium tin oxide (ITO), fluorine-doped tin oxide (FTO) and aluminum-doped zinc oxide (AZO). Then, a photoresist is applied, exposed and developed through a mask, and a patterned common electrode 620 is formed through a wet etching process. The wet etching solution is a mixture of nitric acid, phosphoric acid and acetic acid.

[0152] Exemplarily, the common electrode 620 can form a storage capacitor with the pixel electrode 561. The material of the common electrode 620 is a transparent conductive material, so that part of the light source not reflected by the cholesterol liquid crystal can pass through and enter the perovskite light absorption layer 332, thereby improving the utilization rate of light.

[0153] Exemplarily, a planar layer 550 is coated with a thickness of 20,000 to 25,000 Å. Vias are formed on the planar layer 550 through mask exposure and development, and then a patterned second insulating layer 540 is formed through a dry etching process. The main function of the patterned second insulating layer 540 is to open the terminal area and expose the bound metal points.

[0154] It should be noted that the limitations on the various steps involved in this solution, without affecting the implementation of the specific solution, are not deemed to limit the order of the steps. The steps written in front can be executed first, or later, or even simultaneously. As long as this solution can be implemented, it should be deemed to fall within the scope of protection of this application.

[0155] It should be noted that the inventive concept of the present application can form a large number of embodiments, but the length of the application document is limited and it is impossible to list them one by one. Therefore, under the premise of no conflict, the embodiments or technical features described above can be arbitrarily combined to form new embodiments. After the embodiments or technical features are combined, the original technical effects will be enhanced.

[0156] The above content is a further detailed description of the present application in combination with specific optional implementation methods, and it cannot be determined that the specific implementation of the present application is limited to these descriptions. For ordinary technicians in the technical field to which the present application belongs, several simple deductions or substitutions can be made without departing from the concept of the present application, which should be deemed to fall within the scope of protection of the present application.

Claims

1. An array substrate, characterized in that: The array substrate comprises a first substrate, a photovoltaic power generation layer, a light guide structure layer and a pixel structure layer. The photovoltaic power generation layer, the light guide structure layer and the pixel structure layer are sequentially arranged on the first substrate. The light guide structure layer guides light from the outside that passes through the pixel structure layer to converge on the photovoltaic power generation layer. The photovoltaic power generation layer generates current after receiving the light guided and converged by the light guide structure layer. A direction along the first substrate toward the pixel structure layer is defined as a first direction, and the array substrate includes a plurality of pixel areas; The light guide structure layer includes a second substrate and a plurality of groups of light guide structures, each group of light guide structures includes a first light guide structure and two second light guide structures, the first light guide structure and the second light guide structure are both arranged on a side of the second substrate facing the first substrate, the first light guide structure is located between the two second light guide structures, and the first light guide structure and the second light guide structure correspond to the pixel areas one by one respectively; The cross-sectional area of ​​the first light guide structure gradually increases along the first direction, so as to converge the light transmitted through the single pixel area onto the photovoltaic power generation layer corresponding to the center position of the single pixel area; The second light guide structure is in the shape of a triangular prism, and the bottom surface of the triangular prism is a right triangle. The second light guide structure includes a first side surface and a second side surface. The first side surface is vertically arranged to the pixel structure layer. The angle between the second side surface and the pixel structure layer is an acute angle. The second side surface of the second light guide structure faces the photoelectric power generation layer below the first light guide structure, so as to converge the light transmitted through the pixel area corresponding to the second light guide structure to the photoelectric power generation layer corresponding to the center position of the pixel area corresponding to the first light guide structure. The plurality of pixel regions include a red light reflecting region, a green light reflecting region and a blue light reflecting region, wherein the red light reflecting region is used to reflect red light, the green light reflecting region is used to reflect green light, and the blue light reflecting region is used to reflect blue light, and the green light reflecting region and the blue light reflecting region are located on both sides of the red light reflecting region; The first light guide structure is located on the red light reflecting area, and the two second light guide structures are located on the green light reflecting area and the blue light reflecting area respectively.

2. The array substrate according to claim 1, characterized in that: The photoelectric power generation structure comprises a hole transport layer, a perovskite light absorption layer, a composite electron transport layer and an electrode layer, wherein the hole transport layer, the perovskite light absorption layer, the composite electron transport layer and the electrode layer are sequentially arranged on the first substrate; The pixel structure layer includes a first metal layer, a first insulating layer, a second metal layer, a second insulating layer and a pixel electrode layer, and the first metal layer, the first insulating layer, the second metal layer, the second insulating layer and the pixel electrode layer are sequentially arranged on the light guide structure layer.

3. The array substrate according to claim 2, characterized in that: The pixel electrode layer includes a plurality of pixel electrodes, the pixel structure layer includes an active switch and a common electrode, the active switch is a top-gate active switch, the pixel electrode is connected to the active switch, the common electrode is arranged on the first metal layer and / or the second metal layer, the orthographic projection of the pixel electrode on the first substrate covers the orthographic projection of the common electrode on the first substrate, a storage capacitor is formed between the common electrode and the pixel electrode, and the common electrode and the pixel electrode are both made of transparent conductive material.

4. A method for preparing an array substrate, characterized in that: The method for preparing the array substrate according to any one of claims 1 to 3 comprises the following steps: forming a photovoltaic power generation layer on a first substrate; forming a light-guiding structure layer on the photovoltaic power generation layer; forming a pixel structure layer on the light guide structure layer to form the array substrate; The light-guiding structure layer guides the light from the outside that passes through the pixel structure layer and converges it onto the photoelectric generation layer. The photoelectric generation layer generates current after receiving the light guided and converged by the light-guiding structure layer.

5. The method for preparing an array substrate according to claim 4, characterized in that: On the photovoltaic layer The steps of forming the light guide structure layer include: forming a first light guide structure and a second light guide structure to form the light guide structure layer; The light guide structure layer is boxed on the photovoltaic power generation layer.

6. A display panel, characterized in that: The display panel comprises a cholesteric liquid crystal layer, an opposing substrate and an array substrate as claimed in any one of claims 1 to 3, wherein the array substrate and the opposing substrate are arranged opposite to each other, and the cholesteric liquid crystal layer is arranged between the opposing substrate and the array substrate.

7. The display panel according to claim 6, characterized in that: The cholesteric liquid crystal layer comprises a first cholesteric liquid crystal, a second cholesteric liquid crystal and a third cholesteric liquid crystal, wherein the first cholesteric liquid crystal reflects red light, the second cholesteric liquid crystal reflects green light, and the third cholesteric liquid crystal reflects blue light; A direction along the first substrate toward the pixel structure layer is defined as a first direction, and the array substrate includes a plurality of pixel areas; The plurality of pixel regions include a red light reflecting region, a green light reflecting region and a blue light reflecting region, wherein the red light reflecting region is used to reflect red light, the green light reflecting region is used to reflect green light, and the blue light reflecting region is used to reflect blue light, and the green light reflecting region and the blue light reflecting region are located on both sides of the red light reflecting region; the first cholesterol liquid crystal is located in the red light reflecting region; the second cholesterol liquid crystal is located in the green light reflecting region; and the third cholesterol liquid crystal is located in the blue light reflecting region; The light guide structure layer includes a second substrate and a plurality of groups of light guide structures, each group of light guide structures includes a first light guide structure and two second light guide structures, the first light guide structure and the second light guide structure are both arranged on a side of the second substrate facing the first substrate, the first light guide structure is located between the two second light guide structures, and the first light guide structure and the second light guide structure correspond to the pixel areas one by one respectively; The first light guide structure is located on a side of the first cholesteric liquid crystal close to the first substrate, and the two second light guide structures are respectively located on a side of the second cholesteric liquid crystal and the third cholesteric liquid crystal close to the first substrate; The cross-sectional area of ​​the first light guide structure gradually increases along the first direction, so as to converge the light transmitted through the single pixel area onto the photovoltaic power generation layer corresponding to the center position of the single pixel area; The second light-guiding structure is in the shape of a triangular prism, and the bottom surface of the triangular prism is a right triangle. The second light-guiding structure includes a first side surface and a second side surface. The first side surface is vertically arranged to the pixel structure layer, and the angle between the second side surface and the pixel structure layer is an acute angle. The second side surface of the second light-guiding structure faces the photoelectric generation layer below the first light-guiding structure to converge the light passing through the pixel area corresponding to the second light-guiding structure to the photoelectric generation layer corresponding to the center position of the pixel area corresponding to the first light-guiding structure.

Images