Titanium tetrachloride organic matter vanadium removal residue pulping device and method
By designing a titanium tetrachloride organic vanadium removal residue beautification device, the alkali liquid and residue are mixed under closed conditions to form a slurry and circulate it, the safety hazards and environmental protection problems caused by the combustion of vanadium removal residue are solved, and high efficiency is achieved , safe treatment effect.
Patent Information
- Application Number
- CN202411385703.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-30
- Publication Date
- 2025-01-03
- Estimated Expiration
- 2044-09-30
AI Technical Summary
The vanadium removal residue of titanium tetrachloride organic matter is prone to combustion during the treatment process, resulting in safety hazards and equipment damage. It is difficult for the prior art to ensure environmental protection, safety and efficiency.
A titanium tetrachloride organic vanadium residue beating device was designed. Through components such as beating tanks, beating spray pumps, liquid clean tanks and spray pumps, etc., the alkali and residues are mixed under closed conditions to form slurry to avoid residues. Combust with air and circulate through the spray system.
It effectively avoids residue combustion, reduces breathing pipe deposition, reduces labor intensity of manual cleaning, significantly improves on-site operating environment and safety control, and ensures environmental protection and efficient treatment of residues.
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Figure CN119237441A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of titanium tetrachloride production, and in particular to a titanium tetrachloride organic matter vanadium removal residue slurrying device and method. Background Art
[0002] Titanium tetrachloride is an important intermediate product in titanium industrial production. It can be divided into crude titanium tetrachloride and refined titanium tetrachloride according to the impurity content. Crude titanium tetrachloride is a primary product obtained by removing dust, washing, condensing and collecting titanium-rich materials, petroleum coke and chlorine in a chlorination furnace. It has a relatively high impurity content and is generally called crude titanium tetrachloride. After removing vanadium from crude titanium tetrachloride, or further removing high-boiling point impurities and low-boiling point impurities as needed, pure titanium tetrachloride with a TiCl4 content greater than 99.8% is obtained, which can be used to produce chloride titanium dioxide and sponge titanium. At present, organic vanadium removal technology is widely used in China to purify crude titanium tetrachloride. The slurry generated in the vanadium removal process needs to be recovered to contain more than 90% of TiCl4. In addition, the vanadium removal slurry also contains vanadium chloride and chloride oxide, which can be recycled as a high-value-added vanadium resource.
[0003] Domestic titanium industry enterprises recycle vanadium compounds in organic vanadium removal slurry. Generally, electric furnace evaporation process is adopted to evaporate TiCl4 and its low boiling point impurities in the slurry at 130-400℃, and the crude titanium tetrachloride is recycled. The remaining dry residue is discharged from the bottom of the electric furnace and further extracted as vanadium-containing raw material. The main components of the dry residue include: carbon-containing dust, TiO2, FeCl3, AlCl3, etc. The carbon-containing dust has a large number of micropores, which increase the specific surface area of the carbon powder and will smolder at about 50℃. Smoldering is a form of solid combustion, which is manifested as slow combustion without visible light, usually producing smoke and temperature rise. In addition, carbon-containing dust will burn rapidly when it encounters air at about 100℃. In the process of discharging dry residue from the bottom of the electric furnace, since the temperature of the residue is generally above 100℃, when using an open container to receive the residue, the carbon-containing dust is very easy to burn and catch fire, which brings great safety hazards to production operators, and also damages production equipment and facilities, and even causes fire. It can be seen that how to ensure the environmental protection, safety and efficiency of the discharge and collection and treatment of the organic matter vanadium removal residue of titanium tetrachloride has become an urgent problem to be solved in the field of titanium metallurgy and chemical technology. Summary of the invention
[0004] In order to ensure the environmental protection, safety and high efficiency of the discharge and collection treatment of titanium tetrachloride organic matter vanadium removal residue, the present invention provides a titanium tetrachloride organic matter vanadium removal residue slurrying device and method.
[0005] The technical means adopted by the present invention are as follows:
[0006] A titanium tetrachloride organic matter vanadium removal residue beating device, comprising a beating tank, a beating spray pump, a clear liquid tank, a clear liquid delivery pump, a first clear liquid spray pump and a second clear liquid spray pump;
[0007] The slurry evaporation furnace is vertically connected to the top of the pulping tank through a slag discharge pipe at the bottom, and a slag discharge valve is installed on the slag discharge pipe; the slurry evaporation furnace can discharge the residue into the pulping tank through the slag discharge pipe; the clear liquid tank is used to provide alkali liquid to the pulping tank;
[0008] The top of the beating tank is provided with an exhaust gas spray nipple; the inlet of the beating spray pump is connected to the beating tank, and the outlet is connected to the slag discharge pipe, the top of the beating tank and the exhaust gas spray nipple through the first beating spray pipe, the second beating spray pipe and the third beating spray pipe respectively; the exhaust gas spray nipple is connected to the top of the clear liquid tank through the first breathing pipe;
[0009] The inlets of the clear liquid delivery pump, the first clear liquid spray pump and the second clear liquid spray pump are respectively connected to the bottom of the clear liquid tank; the outlet of the clear liquid delivery pump is connected to the top of the pulping tank through a clear liquid delivery pipe; the outlet of the first clear liquid spray pump is connected to the inlet end of the first breathing pipe through the first clear liquid spray pipe; the outlet of the second clear liquid spray pump is connected to the top of the clear liquid tank and the inlet end of the second breathing pipe through the second clear liquid spray pipe and the third clear liquid spray pipe, respectively; the waste gas in the clear liquid tank enters the waste gas elution system through the second breathing pipe.
[0010] Furthermore, it also includes an alkali liquid pipe for replenishing alkali liquid into the clear liquid tank and a new water pipe for replenishing new water into the clear liquid tank; the alkali liquid pipe is connected to the top of the clear liquid tank; the new water pipe is connected to the second breathing pipe; the new water pipe is connected to the second breathing pipe through 3-4 spray branches arranged at equal intervals, and is evenly distributed in the middle and outlet ends of the second breathing pipe, and a spiral nozzle is arranged at the outlet end of the spray branch.
[0011] Furthermore, a liquid outlet is provided at the bottom of the pulping tank, and the inlet of the pulping spray pump is connected to the liquid outlet through a pipe; the inner bottom surface of the pulping tank is a slope inclined downward by 5-10° toward the side where the liquid outlet is located, and the bottom of the slope is lower than the liquid outlet. The inclined bottom surface design can facilitate the discharge of the slurry in the pulping tank; the outlet of the pulping spray pump is also provided with a slurry discharge pipe, which is used to discharge the evenly mixed slurry inside the pulping tank into a collection container.
[0012] Furthermore, the outlet of the first beating spray pipe is connected to the middle part of the slag discharge pipe, and a nozzle is provided at the outlet end of the first beating spray pipe.
[0013] Furthermore, the outlet of the second pulping spray pipe is provided with 3-4 spray branches extending into the pulping tank and evenly distributed in the middle area of the top of the pulping tank; the outlet end of the spray branch pipe is provided with a nozzle.
[0014] Furthermore, the exhaust gas spray short section is arranged at the top of the pulping tank near the edge of the tank wall; the inner diameter of the exhaust gas spray short section is 200-400mm; the exhaust gas spray short section is used to lead out the exhaust gas in the pulping tank to ensure that the pulping tank is in a negative pressure state; the outlet of the third pulping spray pipe is connected to the outlet of the exhaust gas spray short section, and a nozzle is provided at the outlet end of the third pulping spray pipe.
[0015] Furthermore, the outlet of the first clear liquid spray pipe is connected to the first breathing tube through 2-4 spray branches arranged at equal intervals; a nozzle is provided at the outlet end of the spray branch; the first breathing tube is provided with a transverse section and a vertical section from the inlet end to the outlet end, the transverse section is inclined 5-15° relative to the horizontal direction, and one end of the transverse section close to the outlet end of the first breathing tube is lower than the other end.
[0016] Furthermore, the second clear liquid spray pipe is provided with 3-4 spray branches extending into the clear liquid tank and evenly distributed in the middle area of the top of the clear liquid tank; a nozzle is provided at the outlet end of the spray branch.
[0017] Furthermore, the outlet of the third clear liquid spray pipe is connected to the second breathing pipe through 2-4 spray branches arranged at equal intervals; a nozzle is provided at the outlet end of the spray branch pipe; the second breathing pipe is inclined 5-15° relative to the horizontal direction, and the outlet end position of the second breathing pipe is higher than the inlet end position.
[0018] The present invention also provides a method for beating titanium tetrachloride organic matter vanadium removal residue, which adopts the above beating device and specifically comprises the following steps:
[0019] A. Add alkali solution (30% NaOH solution) to the clear liquid tank through the alkali solution pipe, and then add new water to the clear liquid tank through the new water pipe. The volume ratio of alkali solution to new water is 1:1 to 2:1;
[0020] B. Start the second clean liquid spray pump to circulate the alkali solution and fresh water in the clean liquid tank through the second clean liquid spray pipe and the third clean liquid spray pipe to mix the alkali solution and fresh water in the clean liquid tank evenly;
[0021] C. Start the clear liquid delivery pump to deliver the alkali solution mixed with new water to the pulping tank. The volume ratio of the alkali solution added to the pulping tank to the volume of the residue discharged from each batch of the pulp evaporation furnace is 10:1;
[0022] D. Start the first clear liquid spray pump to circulate and spray the alkali solution on the first breathing tube;
[0023] E. Start the beating spray pump, and simultaneously circulate and spray alkali solution to the slag discharge pipe, the top of the beating tank and the exhaust gas spray short section through the first beating spray pipe, the second beating spray pipe and the third beating spray pipe respectively;
[0024] F. Open the slag discharge valve of the slurry evaporation furnace and discharge a batch of residue into the pulping tank to mix it fully with the alkali solution;
[0025] G. Close the slag discharge valve of the slurry evaporation furnace. After the slurry spray pump has been running for 1-2 hours, open the valve on the slurry discharge pipe to transfer the evenly mixed slurry in the slurry tank to the collection container. This completes the slurrying treatment of one batch of residues. Subsequently, the slurrying treatment of the next batch of residues is carried out through the cycle steps AG.
[0026] Compared with the prior art, the present invention has the following advantages:
[0027] The titanium tetrachloride organic matter vanadium removal residue slurrying device and method provided by the present invention can make the residue of the slurry evaporation furnace be mixed with alkali solution under closed conditions to form slurry, and the carbon-containing dust generated in the slurrying process is fully washed to avoid combustion caused by contact with air, and at the same time, the deposition of carbon-containing dust in the breathing duct is reduced, the air pressure of the slurrying device is stabilized, the labor intensity of manual cleaning of the breathing duct is greatly reduced, and the on-site working environment and safety control level are significantly improved.
[0028] Based on the above reasons, the present invention can be widely promoted in the field of titanium tetrachloride production. BRIEF DESCRIPTION OF THE DRAWINGS
[0029] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.
[0030] Figure 1 It is a schematic diagram of the overall process flow of the vanadium removal residue pulping device of the present invention.
[0031] Figure 2 It is a schematic diagram of a partial process flow of the pulping tank of the present invention.
[0032] Figure 3 It is a schematic diagram of a partial process flow of the clear liquid tank of the present invention.
[0033] In the figure: 1. Slurry evaporation furnace; 11. Slag discharge valve; 12. Slag discharge pipe; 2. Slurrying tank; 21. Slurrying spray pump; 22. First slurrying spray pipe; 23. First breathing pipe; 24. Second slurrying spray pipe; 25. Third slurrying spray pipe; 26. Waste gas spray short section; 27. Slurry discharge pipe; 28. Agitator; 3. Clean liquid tank; 31. Clean liquid delivery pump; 32. Clean liquid delivery pipe; 33. First clean liquid spray pump; 34. First clean liquid spray pipe; 35. Second clean liquid spray pump; 36. Second clean liquid spray pipe; 37. Third clean liquid spray pipe; 38. Second breathing pipe; 4. Alkali liquid pipe; 5. New water pipe. DETAILED DESCRIPTION
[0034] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.
[0035] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. The following description of at least one exemplary embodiment is actually only illustrative and is by no means intended to limit the present invention and its application or use. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
[0036] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit exemplary embodiments according to the present invention. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should be understood that when the terms "comprising" and / or "including" are used in this specification, it indicates the presence of features, steps, operations, devices, components and / or combinations thereof.
[0037] Unless otherwise specifically stated, the relative arrangement, numerical expressions and numerical values of the parts and steps described in these embodiments do not limit the scope of the present invention. At the same time, it should be clear that, for ease of description, the sizes of the various parts shown in the drawings are not drawn according to the actual proportional relationship. The technology, methods and equipment known to ordinary technicians in the relevant field may not be discussed in detail, but in appropriate cases, the technology, methods and equipment should be regarded as a part of the authorization specification. In all examples shown and discussed here, any specific value should be interpreted as being merely exemplary, rather than as a limitation. Therefore, other examples of exemplary embodiments may have different values. It should be noted that similar reference numerals and letters represent similar items in the following drawings, so once a certain item is defined in an accompanying drawing, it does not need to be further discussed in subsequent drawings.
[0038] In the description of the present invention, it is necessary to understand that the directions or positional relationships indicated by directional words such as "front, back, up, down, left, right", "lateral, vertical, perpendicular, horizontal" and "top, bottom" are usually based on the directions or positional relationships shown in the drawings. They are only for the convenience of describing the present invention and simplifying the description. Unless otherwise specified, these directional words do not indicate or imply that the device or element referred to must have a specific direction or be constructed and operated in a specific direction. Therefore, they cannot be understood as limiting the scope of protection of the present invention: the directional words "inside and outside" refer to the inside and outside relative to the contours of each component itself.
[0039] For ease of description, spatially relative terms such as "above", "above", "on the upper surface of", "above", etc. may be used here to describe the spatial positional relationship between a device or feature and other devices or features as shown in the figure. It should be understood that spatially relative terms are intended to include different orientations of the device in use or operation in addition to the orientation described in the figure. For example, if the device in the accompanying drawings is inverted, the device described as "above other devices or structures" or "above other devices or structures" will be positioned as "below other devices or structures" or "below their position devices or structures". Thus, the exemplary term "above" can include both "above" and "below". The device can also be positioned in other different ways (rotated 90 degrees or in other orientations), and the spatially relative descriptions used here are interpreted accordingly.
[0040] In addition, it should be noted that the use of terms such as "first" and "second" to limit components is only for the convenience of distinguishing the corresponding components. If not otherwise stated, the above terms have no special meaning and therefore cannot be understood as limiting the scope of protection of the present invention.
[0041] Example 1
[0042] like Figure 1 As shown, the present invention provides a titanium tetrachloride organic matter vanadium removal residue beating device, comprising a beating tank 2, a beating spray pump 21, a clear liquid tank 3, a clear liquid delivery pump 31, a first clear liquid spray pump 33 and a second clear liquid spray pump 35;
[0043] The slurry evaporation furnace 1 is vertically connected to the top of the pulping tank 2 through the slag discharge pipe 12 at the bottom; the slurry evaporation furnace 1 can discharge the residue into the pulping tank 2 through the slag discharge pipe 12; the clear liquid tank 3 is used to provide alkali solution to the pulping tank 2;
[0044] An exhaust gas spray nipple 26 is provided on the top of the pulping tank 2; the inlet of the pulping spray pump 21 is connected to the pulping tank 2, and the outlet is connected to the slag discharge pipe 12, the top of the pulping tank 2 and the exhaust gas spray nipple 26 through the first pulping spray pipe 22, the second pulping spray pipe 24 and the third pulping spray pipe 25 respectively; the exhaust gas spray nipple 26 is connected to the top of the clear liquid tank 3 through the first breathing pipe 23;
[0045] The inlets of the clear liquid delivery pump 31, the first clear liquid spray pump 33 and the second clear liquid spray pump 35 are respectively connected to the bottom of the clear liquid tank 3; the outlet of the clear liquid delivery pump 31 is connected to the top of the pulping tank 2 through the clear liquid delivery pipe 32; the outlet of the first clear liquid spray pump 33 is connected to the inlet end of the first breathing pipe 23 through the first clear liquid spray pipe 34; the outlet of the second clear liquid spray pump 35 is connected to the top of the clear liquid tank 3 and the inlet end of the second breathing pipe 38 through the second clear liquid spray pipe 36 and the third clear liquid spray pipe 37 respectively; the waste gas in the clear liquid tank 3 enters the waste gas elution system through the second breathing pipe 38.
[0046] Furthermore, a slag discharge valve 11 is installed on the slag discharge pipe 12 .
[0047] Furthermore, it also includes an alkali liquid pipe 4 for replenishing alkali liquid (30% NaOH solution) into the clear liquid tank 3 and a new water pipe 5 for replenishing new water into the clear liquid tank 3; the alkali liquid pipe 4 is connected to the top of the clear liquid tank 3, and the alkali liquid provided by the alkali liquid pipe 4 comes from the alkali liquid pipe network; the new water pipe 5 is connected to the second breathing pipe 38, and the new water provided by the new water pipe 5 comes from the new water pipe network.
[0048] Furthermore, the waste gas washing system is used to deeply wash the waste gas treated by the pulping device of the present invention to ensure that the treated waste gas can meet the emission standards. The waste gas washing system can adopt equipment in the prior art that has a good absorption effect on HCl and Cl2 gases.
[0049] Furthermore, after liquid is introduced into the pulping tank 2 and the clear liquid tank 3, a liquid phase zone and a gas phase zone located above the liquid phase zone are formed; the outlets of the slag discharge pipe 12, the second pulping spray pipe 24 and the clear liquid conveying pipe 32 are all connected to the gas phase zone located at the top in the pulping tank 2; the exhaust gas spray short section 26 is used to connect the gas phase zones in the pulping tank 2 and the clear liquid tank 3; the outlets of the alkali liquid pipe 4 and the second clear liquid spray pipe 36 and the inlet of the second breathing pipe 38 are all connected to the gas phase zone located at the top in the clear liquid tank 3.
[0050] Furthermore, a liquid outlet is provided at the bottom of the pulping tank 2, and the inlet of the pulping spray pump 21 is connected to the liquid outlet through a pipe; the inner bottom surface of the pulping tank 2 is a slope that is tilted downward by 5-10° toward the side where the liquid outlet is located, and the bottom of the slope is lower than the liquid outlet. The inclined bottom surface design can facilitate the discharge of the slurry in the pulping tank 2; the outlet of the pulping spray pump 21 is also provided with a slurry discharge pipe 27, which is used to discharge the evenly mixed slurry inside the pulping tank 2 into a collection container.
[0051] Furthermore, an agitator 28 is provided inside the pulping tank 2, and the agitator 28 is provided with 1-2 layers of blades. The specific number of layers of the blades can be determined according to the height of the pulping tank 2. In the present embodiment, the agitator 28 is provided with 2 layers of blades. During the pulping process of the pulping tank 2, the agitator 28 runs continuously, which can prevent the mud from being deposited at the bottom of the pulping tank 2, and also speed up the mixing efficiency of the vanadium removal residue and the alkali solution.
[0052] Furthermore, a liquid level gauge, a pressure gauge and a thermocouple for monitoring the liquid level, pressure and temperature respectively are arranged on the top of the pulping tank 2; according to the monitoring result of the liquid level gauge, the operator can be reminded that the addition of alkali solution reaches a certain amount or the slurry is discharged to a certain amount; when the pressure gauge monitors that the pressure reaches the control upper limit, the operator can be reminded to stop discharging slag into the pulping tank 2 to ensure safe operation; when the thermocouple monitors that the temperature exceeds the normal temperature and continues to rise, the operator can be reminded that the vanadium-removing slag has been discharged into the pulping tank 2.
[0053] Furthermore, the outlet of the first beating spray pipe 22 is connected to the middle part of the slag discharge pipe 12, and a nozzle is provided at the outlet end of the first beating spray pipe 22, so that the vanadium removal residue and the alkali solution can be pre-mixed during the slag discharge process and the temperature of the vanadium removal residue can be reduced; in order to prevent the nozzle from being blocked or burned by the mud, the nozzle structure can be selected from a stainless steel spiral type, or other nozzles that are resistant to solid particle blockage and high temperature can be selected.
[0054] Furthermore, the outlet of the second pulping spray pipe 24 is provided with 3-4 spray branches extending into the pulping tank 2, and are evenly distributed in the middle area of the top of the pulping tank 2. The specific number of the spray branches is determined according to the diameter of the pulping tank 2. In the present embodiment, 4 spray branches are provided; the outlet end of the spray branch is provided with a stainless steel spiral nozzle, so that the vanadium removal residue and the alkali solution can be fully mixed in the pulping tank 2, thereby reducing the carbon-containing dust entering the first breathing tube 23.
[0055] Furthermore, the exhaust gas spray short section 26 is arranged at the top of the pulping tank 2 near the edge of the tank wall; the inner diameter of the exhaust gas spray short section 26 is 200-400mm; the exhaust gas spray short section 26 is used to lead out the exhaust gas in the pulping tank 2 to ensure that the pulping tank 2 is in a negative pressure state; the outlet of the third pulping spray pipe 25 is connected to the outlet of the exhaust gas spray short section 26, and the outlet end of the third pulping spray pipe 25 is provided with a stainless steel spiral nozzle, so that the carbon-containing dust entrained in the exhaust gas discharged from the pulping tank 2 can be pre-washed.
[0056] Furthermore, three liquid outlets are arranged at the bottom of the clear liquid tank 3, and each liquid outlet is connected to the inlet of the clear liquid delivery pump 31, the first clear liquid spray pump 33 and the second clear liquid spray pump 35 through a pipeline, so that the spraying function and effect of the three pumps arranged in the clear liquid tank 3 can be fully utilized; a liquid level gauge is arranged on the top of the clear liquid tank 3, and the operator can determine the amount of alkali solution and new water added or discharged according to the liquid level monitoring results.
[0057] Furthermore, the outlet of the first clear liquid spray pipe 34 is connected to the first breathing pipe 23 through 2-4 spray branches arranged at equal intervals, and the number of the spray branches is determined according to the length of the first breathing pipe 23. In the present embodiment, three spray branches are arranged; a stainless steel spiral nozzle is arranged at the outlet end of the spray branch; the first breathing pipe 23 is provided with a transverse section and a vertical section from the inlet end to the outlet end, and the transverse section is inclined by 5-15° relative to the horizontal direction, and one end of the transverse section close to the outlet end of the first breathing pipe 23 is lower than the other end, so as to ensure that the alkali solution and carbon-containing dust in the first breathing pipe 23 can flow smoothly to the pulping tank 2.
[0058] Furthermore, the second clear liquid spray pipe 36 is provided with 3-4 spray branches extending into the clear liquid tank 3, and are evenly distributed in the middle area at the top of the clear liquid tank 3. The specific number of the spray branches is determined according to the diameter of the clear liquid tank 3. In the present embodiment, 4 spray branches are provided; the outlet end of the spray branch is provided with a stainless steel spiral nozzle, so that the alkali solution and the new water can be fully mixed in the clear liquid tank 3, and at the same time, the carbon-containing dust entering the clear liquid tank 3 is further sprayed and washed to reduce its entry into the second breathing pipe 38.
[0059] Furthermore, the outlet of the third clear liquid spray pipe 37 is connected to the second breathing pipe 38 through 2-4 spray branches arranged at equal intervals. The number of the spray branches is determined according to the number of elbows of the second breathing pipe 38. 1-2 spray branches can be arranged at each elbow. In the present embodiment, 2 spray branches are arranged. A stainless steel spiral nozzle is arranged at the outlet end of the spray branch, so that the carbonaceous dust escaping from the clear liquid tank 3 can be further sprayed and washed, thereby further reducing its entry into the exhaust gas washing system. The second breathing pipe 38 is inclined at 5-15° relative to the horizontal direction, and the outlet end position of the second breathing pipe 38 is higher than the inlet end position, so as to ensure that the alkali solution, new water and carbonaceous dust in the second breathing pipe 38 can smoothly flow back to the clear liquid tank 3.
[0060] Furthermore, the new water pipe 5 is connected to the second breathing pipe 38 through 3-4 spray branches arranged equidistantly, and are evenly distributed in the middle and outlet ends of the second breathing pipe 38. The number of the spray branches is determined according to the length of the second breathing pipe 38. In the present embodiment, 4 spray branches are arranged, and a spiral nozzle is arranged at the outlet end of the spray branch. Such a design can clean the carbon-containing dust attached to the second breathing pipe 38 while adding new water to the clear liquid tank 3.
[0061] The present invention also provides a method for beating titanium tetrachloride organic matter vanadium removal residue, which adopts the above beating device and specifically comprises the following steps:
[0062] A. Alkali liquid (30% NaOH solution) is added to the clean liquid tank 3 through the alkali liquid pipe 4, and then new water is added to the clean liquid tank 3 through the new water pipe 5. During the process of adding new water, the inner wall of the second breathing tube 38 is cleaned through the spray branch pipe provided on the new water pipe 5. The volume ratio of the alkali liquid to the new water is 1:1 to 2:1. In this embodiment, it is controlled at 1:1;
[0063] B. Start the second clean liquid spray pump 35, and circulate the alkali solution and fresh water in the clean liquid tank 3 through the second clean liquid spray pipe 36 and the third clean liquid spray pipe 37 to mix the alkali solution and fresh water in the clean liquid tank 3 evenly for 1-2 hours. After that, the second clean liquid spray pump 35 continues to operate to ensure that the exhaust gas entering the clean liquid tank 3 and the second breathing pipe 38 can be continuously sprayed through the second clean liquid spray pipe 36 and the third clean liquid spray pipe 37; adjust the valve openings on the first clean liquid spray pipe 34 and the second clean liquid spray pipe 36 according to the actual alkali solution flow requirements for washing carbonaceous dust at each part;
[0064] C. Start the clear liquid delivery pump 31 to deliver the alkali solution mixed with new water to the pulping tank 2. The volume ratio of the alkali solution added to the pulping tank 2 to the volume ratio of the residue discharged from each batch of the pulp evaporation furnace 1 is about 10:1, so as to ensure that the residue and the alkali solution maintain good fluidity after mixing, avoid clogging the pipeline and the nozzle, and also control the pH value of the slurry in the pulping tank 2 to be between 9 and 10;
[0065] D. Start the first clear liquid spray pump 33 to circulate and spray the alkali solution to the first breathing tube 23;
[0066] E. Start the beating spray pump 21, and simultaneously circulate and spray alkali solution to the slag discharge pipe 11, the top of the beating tank 2 and the exhaust gas spray short section 26 through the first beating spray pipe 22, the second beating spray pipe 24 and the third beating spray pipe 25, and adjust the valve openings on the first beating spray pipe 22, the second beating spray pipe 24 and the third beating spray pipe 25 according to the actual alkali solution flow requirements for washing carbonaceous dust at each part;
[0067] F. Open the slag discharge valve 11 of the slurry evaporation furnace 1, discharge a batch of residue into the pulping tank 2 and mix it with the alkali solution; start the agitator 28 for stirring;
[0068] G. Close the slag discharge valve 11 of the slurry evaporation furnace 1. After the slurry spray pump 21 has been running for 1-2 hours, open the valve on the slurry discharge pipe 27 to transport the evenly mixed slurry in the slurry tank 2 to the collection container. The slurrying treatment of one batch of residues is now completed; the slurrying treatment of the next batch of residues is subsequently carried out through the circulation step AG.
[0069] Furthermore, the method also includes the following steps: after the pulping is completed, every 1-2 days, open the spray branches on the first pulping spray pipe 22, the second pulping spray pipe 24, the third pulping spray pipe 25, the first clear liquid spray pipe 34, the second clear liquid spray pipe 36, and the third clear liquid spray pipe 37 to check and clean the stainless steel spiral nozzles on each spray branch.
[0070] The titanium tetrachloride organic matter vanadium removal residue slurrying device and method provided by the present invention can make the residue of the slurry evaporation furnace be mixed with alkali solution under closed conditions to form slurry, and the carbon-containing dust generated in the slurrying process is fully washed to avoid combustion caused by contact with air, and at the same time, the deposition of carbon-containing dust in the breathing duct is reduced, the air pressure of the slurrying device is stabilized, the labor intensity of manual cleaning of the breathing duct is greatly reduced, and the on-site working environment and safety control level are significantly improved.
[0071] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein by equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.
Claims
1. A titanium tetrachloride organic matter vanadium removal residue beating device, characterized in that: It includes a pulping tank, a pulping spray pump, a clear liquid tank, a clear liquid delivery pump, a first clear liquid spray pump and a second clear liquid spray pump; The slurry evaporation furnace is vertically connected to the top of the pulping tank through a slag discharge pipe at the bottom, and a slag discharge valve is installed on the slag discharge pipe; the slurry evaporation furnace can discharge the residue into the pulping tank through the slag discharge pipe; the clear liquid tank is used to provide alkali liquid to the pulping tank; The top of the beating tank is provided with an exhaust gas spray nipple; the inlet of the beating spray pump is connected to the beating tank, and the outlet is connected to the slag discharge pipe, the top of the beating tank and the exhaust gas spray nipple through the first beating spray pipe, the second beating spray pipe and the third beating spray pipe respectively; the exhaust gas spray nipple is connected to the top of the clear liquid tank through the first breathing pipe; The inlets of the clear liquid delivery pump, the first clear liquid spray pump and the second clear liquid spray pump are respectively connected to the bottom of the clear liquid tank; the outlet of the clear liquid delivery pump is connected to the top of the pulping tank through a clear liquid delivery pipe; the outlet of the first clear liquid spray pump is connected to the inlet end of the first breathing pipe through the first clear liquid spray pipe; the outlet of the second clear liquid spray pump is connected to the top of the clear liquid tank and the inlet end of the second breathing pipe through the second clear liquid spray pipe and the third clear liquid spray pipe, respectively; the waste gas in the clear liquid tank enters the waste gas elution system through the second breathing pipe.
2. The titanium tetrachloride organic matter vanadium removal residue beating device according to claim 1, characterized in that: It also includes an alkali liquid pipe for replenishing alkali liquid into the clear liquid tank and a new water pipe for replenishing new water into the clear liquid tank; the alkali liquid pipe is connected to the top of the clear liquid tank; the new water pipe is connected to the second breathing pipe; the new water pipe is connected to the second breathing pipe through 3-4 spray branches arranged at equal intervals, and is evenly distributed in the middle and outlet ends of the second breathing pipe, and a spiral nozzle is arranged at the outlet end of the spray branch.
3. The titanium tetrachloride organic matter vanadium removal residue beating device according to claim 1, characterized in that: A liquid outlet is provided at the bottom of the pulping tank, and the inlet of the pulping spray pump is connected to the liquid outlet through a pipe; the inner bottom surface of the pulping tank is a slope that is tilted downward by 5-10° toward the side where the liquid outlet is located, and the bottom of the slope is lower than the liquid outlet. The inclined bottom surface design can facilitate the discharge of the slurry in the pulping tank; the outlet of the pulping spray pump is also provided with a slurry discharge pipe, which is used to discharge the evenly mixed slurry inside the pulping tank into a collection container.
4. The titanium tetrachloride organic matter vanadium removal residue beating device according to claim 1, characterized in that: The outlet of the first beating spray pipe is connected to the middle part of the slag discharge pipe, and a nozzle is arranged at the outlet end of the first beating spray pipe.
5. The titanium tetrachloride organic matter vanadium removal residue beating device according to claim 1, characterized in that: The outlet of the second pulping spray pipe is provided with 3-4 spray branches extending into the pulping tank and evenly distributed in the middle area of the top of the pulping tank; the outlet end of the spray branch is provided with a nozzle.
6. The titanium tetrachloride organic matter vanadium removal residue beating device according to claim 1, characterized in that: The exhaust gas spray short section is arranged at the top of the pulping tank near the edge of the tank wall; the inner diameter of the exhaust gas spray short section is 200-400mm; the exhaust gas spray short section is used to lead out the exhaust gas in the pulping tank to ensure that the pulping tank is in a negative pressure state; the outlet of the third pulping spray pipe is connected to the outlet of the exhaust gas spray short section, and a nozzle is arranged at the outlet end of the third pulping spray pipe.
7. The titanium tetrachloride organic matter vanadium removal residue beating device according to claim 1, characterized in that: The outlet of the first clear liquid spray pipe is connected to the first breathing tube through 2-4 spray branches arranged at equal intervals; a nozzle is provided at the outlet end of the spray branch; the first breathing tube is provided with a transverse section and a vertical section from the inlet end to the outlet end, the transverse section is inclined 5-15° relative to the horizontal direction, and one end of the transverse section close to the outlet end of the first breathing tube is lower than the other end.
8. The titanium tetrachloride organic matter vanadium removal residue beating device according to claim 1, characterized in that: The second clear liquid spray pipe is provided with 3-4 spray branches extending into the clear liquid tank and evenly distributed in the middle area of the top of the clear liquid tank; a spray head is provided at the outlet end of the spray branch.
9. The titanium tetrachloride organic matter vanadium removal residue beating device according to claim 1, characterized in that: The outlet of the third clear liquid spray pipe is connected to the second breathing pipe through 2-4 spray branches arranged at equal intervals; a nozzle is arranged at the outlet end of the spray branch; the second breathing pipe is inclined 5-15° relative to the horizontal direction, and the outlet end position of the second breathing pipe is higher than the inlet end position.
10. A method for pulping titanium tetrachloride organic matter vanadium removal residue, characterized in that: The beating device according to claim 3 is used, which specifically includes the following steps: A. Add alkali solution (30% NaOH solution) to the clear liquid tank through the alkali solution pipe, and then add new water to the clear liquid tank through the new water pipe. The volume ratio of alkali solution to new water is 1:1 to 2:1; B. Start the second clean liquid spray pump to circulate the alkali solution and fresh water in the clean liquid tank through the second clean liquid spray pipe and the third clean liquid spray pipe to mix the alkali solution and fresh water in the clean liquid tank evenly; C. Start the clear liquid delivery pump to deliver the alkali solution mixed with new water to the pulping tank. The volume ratio of the alkali solution added to the pulping tank to the volume of the residue discharged from each batch of the pulp evaporation furnace is 10:1; D. Start the first clear liquid spray pump to circulate and spray the alkali solution on the first breathing tube; E. Start the beating spray pump, and simultaneously circulate and spray alkali solution to the slag discharge pipe, the top of the beating tank and the exhaust gas spray short section through the first beating spray pipe, the second beating spray pipe and the third beating spray pipe respectively; F. Open the slag discharge valve of the slurry evaporation furnace and discharge a batch of residue into the pulping tank to mix it fully with the alkali solution; G. Close the slag discharge valve of the slurry evaporation furnace. After the slurry spray pump has been running for 1-2 hours, open the valve on the slurry discharge pipe to transfer the evenly mixed slurry in the slurry tank to the collection container. This completes the slurrying treatment of one batch of residues. Subsequently, the slurrying treatment of the next batch of residues is carried out through the cycle steps AG.
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