Nanoimprint device and nanoimprint method

Abstract

The invention discloses a nanoimprint device and a nanoimprint method, and the nanoimprint device is used for microstructure transfer printing of a flexible soft film. The device comprises a soft film fixing assembly, a soft film tension adjusting assembly, an impressing roller and an impressing platform. Wherein the flexible soft film is provided with a first end and a second end, the first end is connected with the soft film fixing assembly, the second end is connected with the soft film tension adjusting assembly, and the height of the soft film tension adjusting assembly is adjustable, so that the tension of the flexible soft film is changed along with the movement of the soft film tension adjusting assembly; the flexible soft film is located between the impressing roller and the impressing platform, and the impressing roller can move back and forth in the extending direction of the flexible soft film. Before imprinting, the soft film tension adjusting assembly is located at the first height so that the tension of the flexible soft film can meet the requirement for tensioning of the flexible soft film. And in the imprinting process, the soft film tension adjusting assembly is located at the second height, so that the tension of the flexible soft film is kept to be zero. According to the technical scheme, the imprinting effect can be improved.

Description

Technical Field

[0001] The present application relates to the field of nanoimprint technology, and in particular to a nanoimprint device and a nanoimprint method. Background Art

[0002] Nanoimprint technology is one of the mainstream technologies for making surface relief structures in augmented reality diffractive optical waveguides. It copies the surface relief structure on the master onto the glass wafer in large quantities and at low cost by means of imprint transfer, thereby manufacturing diffractive optical waveguides. However, the existing nanoimprint process involves applying pressure and rolling pressure. During this process, the tension of the flexible soft film will affect the deformation of the flexible soft film, thereby affecting the effect of the reproduced microstructure. Therefore, the tension control of the flexible soft film is very important. However, since the tension of the flexible soft film is not easy to control, the imprinting effect is often unsatisfactory. Summary of the invention

[0003] The embodiments of the present application provide a nanoimprinting device and a nanoimprinting method, which can improve the structural transfer effect of nanoimprinting by controlling the deformation of a flexible soft film during the imprinting process without being affected by tension.

[0004] A nanoimprinting device is used for microstructure transfer of a flexible soft film, the nanoimprinting device comprising:

[0005] A soft film fixing component, a soft film tension adjusting component, an embossing roller and an embossing platform; wherein the flexible soft film has a first end and a second end, the first end is connected to the soft film fixing component, the second end is connected to the soft film tension adjusting component, the height of the soft film tension adjusting component is adjustable so that the tension of the flexible soft film changes with the movement of the soft film tension adjusting component; the flexible soft film is located between the embossing roller and the embossing platform, and the embossing roller can move back and forth in the extension direction of the flexible soft film; before embossing, the soft film tension adjusting component is located at a first height so that the tension of the flexible soft film satisfies the tension of the flexible soft film; during the embossing process, the soft film tension adjusting component is located at a second height so that the tension of the flexible soft film remains zero.

[0006] Practically, the nanoimprinting device also includes a guide wheel, and the flexible soft film passes through the top of the rolling wheel of the soft film fixing assembly and the bottom of the imprinting roller from the guide wheel in sequence, and is connected to the rolling wheel of the soft film tension adjustment assembly, and is separated from the protective film of the flexible soft film above the rolling wheel of the soft film fixing assembly.

[0007] In practice, the scrolling wheel of the soft film fixing component and the scrolling wheel of the soft film tension adjustment component are used to scroll and select the flexible soft film, and after the selection is completed, the first end of the flexible soft film is fixed on the scrolling wheel of the soft film fixing component, and the second end of the flexible soft film is fixed on the scrolling wheel of the soft film fixing component.

[0008] Preferably, a sensor and a driving member are provided on the soft film tension adjustment component, the sensor is used to detect the alignment state of the flexible soft film, and the driving member is used to drive the soft film tension adjustment component to move to adjust the alignment state of the flexible soft film when the alignment state of the flexible soft film does not meet the alignment condition.

[0009] In practice, the nanoimprinting device further includes a first auxiliary wheel and a second auxiliary wheel, wherein the first auxiliary wheel is used to assist in releasing the flexible soft film, and the second auxiliary wheel is used to assist in recovering the flexible soft film.

[0010] A nanoimprint method, using the nanoimprint device described above, the nanoimprint method comprising:

[0011] Forming an imprinting adhesive layer on one side of the wafer having the microstructure and then placing it on the imprinting platform;

[0012] Adjusting the soft film tension adjustment component to a first height so that the tension of the flexible soft film satisfies the tension of the flexible soft film;

[0013] The soft film tension adjustment component is adjusted to a second height, and the embossing roller is controlled to apply pressure to the flexible soft film, so that the embossing rubber layer on the flexible soft film contacts the microstructure of the wafer on the embossing platform; and the embossing roller is continued to be controlled to roll in a direction away from the soft film fixing component to apply pressure to the flexible soft film, so that the microstructure on the wafer is transferred to the embossing rubber layer and then to the flexible soft film; wherein, during the embossing process, the tension of the flexible soft film is kept at zero.

[0014] Preferably, the nanoimprinting method further comprises:

[0015] The scroll wheel of the soft film fixing component and the scroll wheel of the soft film tension adjusting component are controlled to scroll to select the flexible soft film, and after the selection is completed, the first end of the flexible soft film is fixed on the scroll wheel of the soft film fixing component, and the second end of the flexible soft film is fixed on the scroll wheel of the soft film fixing component.

[0016] Preferably, the nanoimprinting method further comprises:

[0017] Coating a tackifying material on one side of the flexible soft film facing the imprinting platform;

[0018] After the flexible soft film is removed, the embossed adhesive layer with the microstructure remains on the flexible soft film.

[0019] A nanoimprint method, using the nanoimprint device described above, the nanoimprint method comprising:

[0020] After forming an imprint glue layer on the wafer, place it on the imprint platform;

[0021] Adjusting the soft film tension adjustment component to a first height so that the tension of the flexible soft film satisfies the tension of the flexible soft film;

[0022] The soft film tension adjustment component is adjusted to a second height, and the embossing roller is controlled to apply pressure to the flexible soft film so that the flexible soft film contacts the embossing adhesive on the wafer; and the embossing roller is continuously controlled to roll in a direction away from the soft film fixing component to apply pressure to the flexible soft film so that the microstructure on the flexible soft film is transferred to the embossing adhesive;

[0023] During the stamping process, the tension of the flexible soft film is kept at zero.

[0024] Optionally, the nanoimprinting method further includes: before imprinting, detecting the alignment state of the flexible soft film by the sensor, and when the alignment state of the flexible soft film does not meet the alignment condition, driving the soft film tension adjustment component to move by the driving member to adjust the alignment state of the flexible soft film.

[0025] The present application provides a nanoimprint device and a nanoimprint method, wherein the nanoimprint device comprises a soft film fixing component, a soft film tension adjusting component, an imprint roller and an imprint platform, wherein one end of the flexible soft film is connected to the soft film fixing component, and the other end is connected to the soft film tension adjusting component, and the height of the soft film tension adjusting component is adjustable, so that the flexible soft film can be in a tensioned state before imprinting by adjusting the height of the soft film tension adjusting component, which is convenient for the transmission and shape maintenance of the flexible soft film, and the tension of the flexible soft film is kept at zero during the imprinting process, so that the flexible soft film is prevented from being deformed due to the influence of tension during the imprinting process, which can improve the structural transfer effect of nanoimprinting, and make the reproduction of the microstructure more accurate and more consistent. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0027] Figure 1A schematic diagram of the structure of a nanoimprinting device provided in an embodiment of the present application Figure 1 ;

[0028] Figure 2 A schematic diagram of the structure of a nanoimprinting device provided in an embodiment of the present application Figure 2 ;

[0029] Figure 3 A schematic diagram of the structure of a nanoimprinting device provided in an embodiment of the present application Figure 3 ;

[0030] Figure 4 A schematic diagram of another nanoimprinting device provided in an embodiment of the present application Figure 1 ;

[0031] Figure 5 A schematic diagram of another nanoimprinting device provided in an embodiment of the present application Figure 2 ;

[0032] Figure 6 A schematic diagram of a partial structure of a nanoimprinting device provided in an embodiment of the present application;

[0033] Figure ID:

[0034] 100: nanoimprint device; 110: flexible soft film; 120: soft film fixing assembly; 130: soft film tension adjustment assembly; 140: imprint roller; 150: imprint platform; 160: wafer; 170: guide wheel; 180: first auxiliary wheel; 190: second auxiliary wheel; 210: sensor; 220: driving member; 230: rolling wheel of the soft film tension adjustment assembly. DETAILED DESCRIPTION

[0035] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0036] The technical solution of the present application is described in detail with specific embodiments below. The following specific embodiments can be combined with each other, and the same or similar concepts or processes may not be described in detail in some embodiments.

[0037] The present application provides a nanoimprinting device for transferring microstructures of a flexible soft film, the nanoimprinting device comprising: a soft film fixing component, a soft film tension adjusting component, an imprinting roller and an imprinting platform; wherein the flexible soft film has a first end and a second end, the first end is connected to the soft film fixing component, the second end is connected to the soft film tension adjusting component, the height of the soft film tension adjusting component is adjustable, so that the tension of the flexible soft film changes with the movement of the soft film tension adjusting component; the flexible soft film is located between the imprinting roller and the imprinting platform, and the imprinting roller can move back and forth in the extension direction of the flexible soft film; before imprinting, the soft film tension adjusting component is located at a first height, so that the tension of the flexible soft film satisfies the tension of the flexible soft film; during the imprinting process, the soft film tension adjusting component is located at a second height, so that the tension of the flexible soft film is kept at zero.

[0038] Specifically, the nanoimprinting device provided in the present application is used for transferring the microstructure of a flexible soft film. It should be noted that the aforementioned transfer of the microstructure of the flexible soft film includes two situations: transferring the microstructure on the flexible soft film to other components, and transferring the microstructure on other components to the flexible soft film. Among them, the microstructure can specifically be a surface relief grating. The nanoimprinting method provided in the present application includes two stages, and the state of the flexible soft film is different in different stages. In the imprinting preparation stage before imprinting, the flexible soft film is in a tensioned state, that is, it is flattened. In the imprinting stage, the flexible soft film is in a relaxed state, not subjected to force, and the tension is zero.

[0039] refer to Figure 1-3 , Figure 1 This is a schematic diagram of the structure of the nanoimprint device in the imprint preparation stage. Figure 2-3 The schematic diagram of the structure of the nanoimprint device in the imprinting stage is shown in FIG. The nanoimprint device 100 includes a soft film fixing component 120, a soft film tension adjustment component 130, an imprint roller 140, and an imprint platform 150. A wafer 160 is placed on the imprint platform 150. The imprint roller 140 applies pressure to the flexible soft film 110 to transfer the microstructure on the wafer 160 to the flexible soft film 110, or transfer the microstructure on the flexible soft film 110 to the wafer 160.

[0040] The flexible soft film 110 has a first end and a second end, the first end is connected to the soft film fixing component 120, and the second end is connected to the soft film tension adjusting component 130. The position of the soft film fixing component 120 is fixed, and the height of the soft film tension adjusting component 130 is adjustable. When the soft film fixing component 120 and the soft film tension adjusting component 130 are both in fixed contact with the flexible soft film, the tension of the flexible soft film changes with the movement of the soft film tension adjusting component. The flexible soft film 110 is located between the embossing roller 140 and the embossing platform 150, and the embossing roller 140 can move back and forth in the extension direction of the flexible soft film 110 to achieve embossing and demolding.

[0041] Specifically, in the embossing preparation stage, the soft film tension adjustment component is located at a first height so that the tension of the flexible soft film satisfies the tension of the flexible soft film; this makes the flexible soft film in a tensioned state before embossing, which is convenient for the transmission and maintenance of the shape and structure of the flexible soft film. In the embossing stage, the soft film tension adjustment component is located at a second height so that the tension of the flexible soft film is kept at zero; this controls the flexible soft film to be free from tension during the embossing process, thereby achieving a consistent stretching degree of the microstructure on the soft film and a consistent filling of the embossed structure.

[0042] It should be noted that the aforementioned first height and second height are different heights and are not specific height values. Any height that can satisfy the tension of the flexible soft film to satisfy the tension of the flexible soft film can be the first height, and any height that can make the tension of the flexible soft film zero can be the second height.

[0043] Practically, the nanoimprinting device also includes a guide wheel, and the flexible soft film passes through the top of the rolling wheel of the soft film fixing assembly and the bottom of the imprinting roller from the guide wheel in sequence, and is connected to the rolling wheel of the soft film tension adjustment assembly, and is separated from the protective film of the flexible soft film above the rolling wheel of the soft film fixing assembly.

[0044] In practice, the rolling wheel of the soft film fixing component and the rolling wheel of the soft film tension adjustment component are used to roll and select the flexible soft film, and after the selection is completed, the first end of the flexible soft film is fixed on the rolling wheel of the soft film fixing component, and the second end of the flexible soft film is fixed on the rolling wheel of the soft film fixing component.

[0045] In practice, the nanoimprinting device further includes a first auxiliary wheel and a second auxiliary wheel, wherein the first auxiliary wheel is used to assist in releasing the flexible soft film, and the second auxiliary wheel is used to assist in recovering the flexible soft film.

[0046] Specifically, refer to Figure 4-5The nanoimprint device 100 includes: a soft film fixing component 120, a soft film tension adjusting component 130, an imprint roller 140, an imprint platform 150 and a guide wheel 170. The soft film fixing component 120 and the soft film tension adjusting component 130 both include a rolling wheel. The flexible soft film 110 passes through the upper part of the rolling wheel of the soft film fixing component 120 and the lower part of the imprint roller 140 from the guide wheel 170, and then connects with the rolling wheel of the soft film tension adjusting component 130, and is separated from the protective film of the flexible soft film 110 at the upper part of the rolling wheel of the soft film fixing component 120. In the imprint preparation stage, the flexible soft film 110 is in active contact with the soft film fixing component 120 and the soft film tension adjusting component 130 respectively, so that the rolling wheel of the soft film fixing component and the rolling wheel of the soft film tension adjusting component can drive the flexible soft film to be transported when rolling, so as to realize the rolling selection of the flexible soft film. After the selection is completed, the first end of the flexible soft film is fixed to the rolling wheel of the soft film fixing component, and the second end of the flexible soft film is fixed to the rolling wheel of the soft film fixing component, that is, the flexible soft film 110 and the soft film fixing component 120 and the soft film tension adjustment component 130 are switched from active contact to fixed contact. Figure 4-5 The nanoimprinting device 100 further includes a first auxiliary wheel 180 and a second auxiliary wheel 190 , wherein the first auxiliary wheel 180 is used to assist in receiving materials, and the second auxiliary wheel 190 is used to assist in feeding materials.

[0047] In some embodiments, it can be considered that during the non-embossing process, the soft film tension adjustment component 130 is located at the first height to make the tension of the flexible soft film meet the tension of the flexible soft film during the entire non-embossing process. During the embossing process, the soft film tension adjustment component 130 is located at the second height to keep the tension of the flexible soft film at zero during the entire embossing process.

[0048] The soft film tension adjustment component is provided with a sensor and a driving member, the sensor is used to detect the alignment state of the flexible soft film, and the driving member is used to drive the soft film tension adjustment component to move to adjust the alignment state of the flexible soft film when the alignment state of the flexible soft film does not meet the alignment condition.

[0049] It is understood that the flexible soft film should be flat and aligned at both ends during embossing. If the first end and the second end of the flexible soft film are not aligned and twisted, the embossing effect will be seriously affected. Figure 6, the soft film tension adjustment component 130 is provided with a sensor 210 and a driving member 220, the sensor 210 is used to detect the alignment state of the flexible soft film 110, and the driving member 220 is used to drive the rolling wheel 230 of the soft film tension adjustment component 130 to move left and right to adjust the alignment state of the flexible soft film 110 when the alignment state of the flexible soft film 110 does not meet the alignment condition. Wherein, exemplarily, the sensor can be an image sensor, which determines whether the alignment state of the flexible soft film meets the alignment condition by collecting an image of the second end of the flexible soft film. If the alignment state of the flexible soft film meets the alignment condition, the imprinting stage can be entered; if the alignment state of the flexible soft film does not meet the alignment condition, the imprinting stage can be entered after adjusting the alignment state of the flexible soft film.

[0050] In the nanoimprinting device provided in the present application, the inventors have taken a different approach and no longer use complex structures and complex procedures to monitor the tension of the flexible soft film in real time to maintain a constant tension to ensure consistent deformation of the entire flexible soft film. Instead, the inventors adjust the height of the soft film tension adjustment component so that the flexible soft film is in a tensioned state before imprinting, which is convenient for the transmission of the flexible soft film and the maintenance of its shape and structure. During the imprinting process, the tension of the flexible soft film is kept at zero to prevent the flexible soft film from being deformed by the tension during the imprinting process, thereby improving the structural transfer effect of nanoimprinting and making the reproduction of the microstructure more accurate and more consistent.

[0051] It should be noted that in some embodiments, in the embossing preparation stage before embossing, the flexible soft film is in a taut state and preferably does not deform, so as to better ensure the consistency of microstructure filling. Of course, in other embodiments, in the embossing preparation stage before embossing, the flexible soft film is in a taut state and is allowed to deform, but the overall stretching degree of the flexible soft film needs to be kept consistent.

[0052] The present application also provides two nanoimprinting methods based on the above nanoimprinting device, specifically:

[0053] In one embodiment, a nanoimprinting method, using the above-mentioned nanoimprinting device, includes:

[0054] S110, forming an imprinting adhesive layer on a side of the wafer having the microstructure and placing the wafer on an imprinting platform;

[0055] S120, adjusting the soft film tension adjustment component to a first height so that the tension of the flexible soft film satisfies the tension of the flexible soft film;

[0056] S130, adjusting the soft film tension adjustment component to a second height, and controlling the embossing roller to apply pressure to the flexible soft film, so that the embossing rubber layer on the flexible soft film and the wafer on the embossing platform are in contact; and continuing to control the embossing roller to roll in a direction away from the soft film fixing component to apply pressure to the flexible soft film, so that the microstructure on the wafer is transferred to the embossing rubber layer and then to the flexible soft film; wherein, during the embossing process, the tension of the flexible soft film is kept at zero.

[0057] The nanoimprinting method may further include: before step S230, controlling the scroll wheel of the soft film fixing component and the scroll wheel of the soft film tension adjustment component to select the flexible soft film, and after the selection is completed, fixing the first end of the flexible soft film on the scroll wheel of the soft film fixing component, and fixing the second end of the flexible soft film on the scroll wheel of the soft film fixing component.

[0058] The nanoimprinting method may further include: before step S120: coating a tackifying material on a side of the flexible soft film facing the imprinting platform; after step S130: after removing the flexible soft film, the imprinting adhesive layer with the microstructure remains on the flexible soft film.

[0059] The nanoimprinting method may further include: before step S130, before imprinting, detecting the alignment state of the flexible soft film by a sensor, and when the alignment state of the flexible soft film does not meet the alignment condition, driving the soft film tension adjustment component to move by a driving member to adjust the alignment state of the flexible soft film.

[0060] It can be understood that the nanoimprinting process in this embodiment is a process of transferring the microstructure on the master to the flexible soft film. Specifically, in the example of preparing the diffraction optical waveguide, Figure 4-5In some scenarios, a protective film exists on the flexible soft film. On the one hand, after preparing a master with a surface relief grating structure (such as a silicon-based wafer), an embossing adhesive layer is formed on one side of the master with the surface relief grating structure and then placed on the embossing platform 150. On the other hand, in the nanoimprinting device, after the flexible soft film passes around the lower right of the second auxiliary wheel 190, it passes around the upper left of the guide wheel 170, the upper part of the rolling wheel of the soft film fixing assembly 120, the lower part of the embossing roller 140, the upper part of the rolling wheel of the soft film tension adjusting assembly 130, and the lower left of the first auxiliary wheel 180, and then is recovered. The part of the flexible soft film between the soft film fixing assembly 120 and the soft film tension adjusting assembly 130 is the target area for embossing. In the imprint preparation stage, the soft film tension adjustment component 130 is located at the first height, the tension of the flexible soft film 110 is not zero, and it is in a tensioned state under stress. The flexible soft film 110 is in active contact with the soft film fixing component 120 and the soft film tension adjustment component 130 respectively, so that the rolling wheel of the soft film fixing component 120 and the rolling wheel of the soft film tension adjustment component 130 can drive the flexible soft film 110 to be transported when rolling, so as to realize the rolling selection of the flexible soft film 110. After the selection is completed, the first end of the flexible soft film 110 is fixed on the rolling wheel of the soft film fixing component 130, and the second end of the flexible soft film 110 is fixed on the rolling wheel of the soft film fixing component 130, that is, the flexible soft film 110 switches from active contact to fixed contact with the soft film fixing component 120 and the soft film tension adjustment component 130. The height of the soft film tension adjustment component 130 drops to the second height, so that the tension of the flexible soft film 110 is zero, and it is in a relaxed state without stress. Further, the embossing roller 140 is controlled to apply pressure to the flexible soft film 110, so that the flexible soft film 110 contacts the embossing adhesive layer of the master on the embossing platform; and the embossing roller 140 is continuously controlled to roll in a direction away from the soft film fixing assembly 120 to apply pressure to the flexible soft film 110, so that the surface relief grating structure on the master is transferred to the embossing adhesive layer and then to the flexible soft film 110; wherein, during the embossing process, the tension of the flexible soft film 110 is kept at zero. Further, the transferred surface relief grating structure is fixed by UV light of the UV exposure device, and thereafter, the embossing roller 140 is rolled toward the direction of the soft film fixing assembly 120, so that the embossing adhesive layer with the surface relief grating structure is separated from the surface relief grating structure of the master, so that the embossing adhesive layer with the surface relief grating structure remains on the flexible soft film, and a flexible soft film with the surface relief grating structure is obtained for embossing a diffractive optical waveguide product.

[0061] In one embodiment, a nanoimprinting method, using the above-mentioned nanoimprinting device, includes:

[0062] S210, forming an imprint adhesive layer on the wafer and placing the wafer on an imprint platform;

[0063] S220, adjusting the soft film tension adjustment component to a first height so that the tension of the flexible soft film satisfies the tension of the flexible soft film;

[0064] S230, adjusting the soft film tension adjustment component to a second height, and controlling the embossing roller to apply pressure to the flexible soft film, so that the flexible soft film contacts the embossing adhesive on the wafer; and continuing to control the embossing roller to roll in a direction away from the soft film fixing component to apply pressure to the flexible soft film, so that the microstructure on the flexible soft film is transferred to the embossing adhesive; wherein, during the embossing process, the tension of the flexible soft film is kept at zero.

[0065] The nanoimprinting method may further include: before step S230, before imprinting, detecting the alignment state of the flexible soft film by a sensor, and when the alignment state of the flexible soft film does not meet the alignment condition, driving the soft film tension adjustment component to move by a driving member to adjust the alignment state of the flexible soft film.

[0066] It can be understood that the nanoimprinting process in this embodiment is a process of transferring the microstructure on the flexible soft film to the product. Specifically, in the example of preparing the diffraction optical waveguide, Figure 4-5In some scenarios, the flexible soft film has a protective film. On the one hand, an imprinting glue layer is formed on the surface of the waveguide substrate (such as a glass wafer) and then placed on the imprinting platform 150. On the other hand, in the nanoimprinting device, after the flexible soft film passes around the lower right of the second auxiliary wheel 190, it passes around the upper left of the guide wheel 170, the upper part of the rolling wheel of the soft film fixing component 120, the lower part of the embossing roller 140, the upper part of the rolling wheel of the soft film tension adjusting component 130, and the lower left of the first auxiliary wheel 180, and then is recovered. The part of the flexible soft film between the soft film fixing component 120 and the soft film tension adjusting component 130 is the target area for imprinting. In the imprint preparation stage, the soft film tension adjustment component 130 is located at the first height, the tension of the flexible soft film 110 is not zero, and it is in a tensioned state under stress. The flexible soft film 110 is in active contact with the soft film fixing component 120 and the soft film tension adjustment component 130 respectively, so that the rolling wheel of the soft film fixing component 120 and the rolling wheel of the soft film tension adjustment component 130 can drive the flexible soft film 110 to be transported when rolling, so as to realize the rolling selection of the flexible soft film 110. After the selection is completed, the first end of the flexible soft film 110 is fixed on the rolling wheel of the soft film fixing component 130, and the second end of the flexible soft film 110 is fixed on the rolling wheel of the soft film fixing component 130, that is, the flexible soft film 110 switches from active contact to fixed contact with the soft film fixing component 120 and the soft film tension adjustment component 130. The height of the soft film tension adjustment component 130 drops to the second height, so that the tension of the flexible soft film 110 is zero, and it is in a relaxed state without stress. Further, the embossing roller 140 is controlled to apply pressure to the flexible soft film 110, so that the surface relief grating structure of the flexible soft film 110 contacts the embossed adhesive layer of the waveguide substrate on the embossing platform; and the embossing roller 140 is continuously controlled to roll in a direction away from the soft film fixing assembly 120 to apply pressure to the flexible soft film 110, so that the surface relief grating structure on the flexible soft film is transferred to the embossed adhesive layer and then to the waveguide substrate; wherein, during the embossing process, the tension of the flexible soft film 110 is kept at zero. Further, the transferred surface relief grating structure is fixed by UV light of the UV exposure device, and thereafter, the embossing roller 140 is rolled toward the direction of the soft film fixing assembly 120, so that the embossed adhesive layer with the surface relief grating structure is separated from the surface relief grating structure of the flexible soft film, so that the embossed adhesive layer with the surface relief grating structure remains on the waveguide substrate, and a diffraction optical waveguide product with a surface relief grating structure is obtained.

[0067] Of course, in the above two nanoimprinting methods, before entering the imprinting stage, the alignment state of the flexible soft film needs to be detected by a sensor. When the alignment state of the flexible soft film 110 does not meet the alignment condition, the driving member is started to drive the rolling wheel of the soft film tension adjustment component to move left and right to adjust the alignment state of the flexible soft film. When the alignment state of the flexible soft film meets the alignment condition, the imprinting stage can be entered.

[0068] In the nanoimprinting method provided in the present application, the inventors have taken a different approach and no longer use complex structures and complex procedures to monitor the tension of the flexible soft film in real time to maintain a constant tension to ensure consistent deformation of the entire flexible soft film. Instead, the inventors adjust the height of the soft film tension adjustment component so that the flexible soft film is in a tensioned state before imprinting, which is convenient for the transmission of the flexible soft film and the maintenance of its shape and structure. During the imprinting process, the tension of the flexible soft film is kept at zero to prevent the flexible soft film from being deformed by the tension during the imprinting process, thereby improving the structural transfer effect of nanoimprinting and making the reproduction of the microstructure more accurate and more consistent.

[0069] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit it. Although the present application has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A nanoimprinting device, characterized in that: For microstructure transfer of flexible soft films, the nanoimprinting device comprises: A soft film fixing component, a soft film tension adjusting component, an embossing roller and an embossing platform; wherein the flexible soft film has a first end and a second end, the first end is connected to the soft film fixing component, the second end is connected to the soft film tension adjusting component, the height of the soft film tension adjusting component is adjustable so that the tension of the flexible soft film changes with the movement of the soft film tension adjusting component; the flexible soft film is located between the embossing roller and the embossing platform, and the embossing roller can move back and forth in the extension direction of the flexible soft film; before embossing, the soft film tension adjusting component is located at a first height so that the tension of the flexible soft film satisfies the tension of the flexible soft film; during the embossing process, the soft film tension adjusting component is located at a second height so that the tension of the flexible soft film remains zero.

2. The nanoimprinting device according to claim 1, characterized in that: The nanoimprinting device also includes a guide wheel, and the flexible soft film passes through the top of the rolling wheel of the soft film fixing assembly and the bottom of the embossing roller in sequence from the guide wheel to be connected to the rolling wheel of the soft film tension adjustment assembly, and is separated from the protective film of the flexible soft film above the rolling wheel of the soft film fixing assembly.

3. The nanoimprinting device according to claim 2, characterized in that: The rolling wheel of the soft film fixing component and the rolling wheel of the soft film tension adjusting component are used to roll and select the flexible soft film, and after the selection is completed, the first end of the flexible soft film is fixed on the rolling wheel of the soft film fixing component, and the second end of the flexible soft film is fixed on the rolling wheel of the soft film fixing component.

4. The nanoimprinting device according to claim 3, characterized in that: The soft film tension adjustment component is provided with a sensor and a driving member, the sensor is used to detect the alignment state of the flexible soft film, and the driving member is used to drive the soft film tension adjustment component to move to adjust the alignment state of the flexible soft film when the alignment state of the flexible soft film does not meet the alignment condition.

5. The nanoimprinting device according to claim 2, characterized in that: The nanoimprinting device further includes a first auxiliary wheel and a second auxiliary wheel, wherein the first auxiliary wheel is used to assist in releasing the flexible soft film, and the second auxiliary wheel is used to assist in recovering the flexible soft film.

6. A nanoimprinting method, characterized in that: Using the nanoimprint device according to any one of claims 1 to 5, the nanoimprint method comprises: Forming an imprinting adhesive layer on one side of the wafer having the microstructure and then placing it on the imprinting platform; Adjusting the soft film tension adjustment component to a first height so that the tension of the flexible soft film satisfies the tension of the flexible soft film; The soft film tension adjustment component is adjusted to a second height, and the embossing roller is controlled to apply pressure to the flexible soft film, so that the embossing rubber layer on the flexible soft film contacts the microstructure of the wafer on the embossing platform; and the embossing roller is continued to be controlled to roll in a direction away from the soft film fixing component to apply pressure to the flexible soft film, so that the microstructure on the wafer is transferred to the embossing rubber layer and then to the flexible soft film; wherein, during the embossing process, the tension of the flexible soft film is kept at zero.

7. The nanoimprint method according to claim 6, characterized in that: The nanoimprinting method further comprises: The scroll wheel of the soft film fixing component and the scroll wheel of the soft film tension adjusting component are controlled to scroll to select the flexible soft film, and after the selection is completed, the first end of the flexible soft film is fixed on the scroll wheel of the soft film fixing component, and the second end of the flexible soft film is fixed on the scroll wheel of the soft film fixing component.

8. The nanoimprint method according to claim 7, characterized in that: The nanoimprinting method further comprises: Coating a tackifying material on one side of the flexible soft film facing the imprinting platform; After the flexible soft film is removed, the embossed adhesive layer with the microstructure remains on the flexible soft film.

9. A nanoimprinting method, characterized in that: Using the nanoimprint device according to any one of claims 1 to 5, the nanoimprint method comprises: After forming an imprint glue layer on the wafer, place it on the imprint platform; Adjusting the soft film tension adjustment component to a first height so that the tension of the flexible soft film satisfies the tension of the flexible soft film; The soft film tension adjustment component is adjusted to a second height, and the embossing roller is controlled to apply pressure to the flexible soft film so that the flexible soft film contacts the embossing adhesive on the wafer; and the embossing roller is continuously controlled to roll in a direction away from the soft film fixing component to apply pressure to the flexible soft film so that the microstructure on the flexible soft film is transferred to the embossing adhesive; During the stamping process, the tension of the flexible soft film is kept at zero.

10. The nanoimprint method according to claim 9, characterized in that: The nanoimprinting method further includes: before imprinting, detecting the alignment state of the flexible soft film by the sensor, and when the alignment state of the flexible soft film does not meet the alignment condition, driving the soft film tension adjustment component to move by the driving member to adjust the alignment state of the flexible soft film.

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