Mask manufacturing method

Abstract

According to one embodiment of the present invention, a mask manufacturing method comprises: a step of disposing a mask sheet on a first roller and a second roller spaced apart from each other, the mask sheet including a pattern region in which a first region and a second region are defined; arranging the pattern region on an exposure module by rotating the first roller and the second roller; a step of performing a first exposure process on the first region by the exposure module to form a first pattern on the first region; and a step of performing a second exposure process on the second region by the exposure module to form a second pattern on the second region.

Description

[0001] This application is a divisional application of the invention patent application with application date of August 28, 2020, application number 202010883215.8, and invention name “Mask manufacturing method”. Technical Field

[0002] The invention relates to a mask manufacturing method. Background Art

[0003] The display panel includes a plurality of pixels. Each of the plurality of pixels includes a driving element such as a transistor and a display element such as a light emitting diode. The display element can be formed by stacking electrodes and a light emitting pattern on a substrate.

[0004] The light emitting pattern is patterned using a mask having holes defined therein, so as to be formed on a prescribed area. The light emitting pattern may be formed in an area exposed by the opening. The shape of the light emitting pattern may be controlled according to the shape of the opening. Summary of the invention

[0005] An object of the present invention is to provide a mask manufacturing method capable of improving the productivity of a display device.

[0006] According to one embodiment of the present invention, a mask manufacturing method includes: a step of configuring a mask sheet on a first roller and a second roller separated from each other, the mask sheet including a pattern area defining a first area and a second area; a step of configuring the pattern area on an exposure module by rotating the first roller and the second roller; a step of performing a first exposure process on the first area by the exposure module to form a first pattern on the first area; and a step of performing a second exposure process on the second area by the exposure module to form a second pattern on the second area.

[0007] According to an embodiment of the present invention, by performing a first exposure process on a first area of ​​a pattern area and then performing a second exposure process on a second area of ​​the same pattern area, a larger number of unit areas can be ensured for one mask, thereby improving the productivity of the display device.

[0008] According to one embodiment of the present invention, by configuring a third area between the first area and the second area where a pattern is to be formed, the impact of defects occurring in any one of the first area and the second area on other areas is minimized, thereby reducing the defect rate of the display device. BRIEF DESCRIPTION OF THE DRAWINGS

[0009] Figure 1 FIG. 1 is a diagram schematically illustrating a mask assembly according to an embodiment of the present invention.

[0010] Figure 2 yes Figure 1A perspective view of the mask is shown.

[0011] Figure 3 and Figure 4 It is a diagram illustrating a mask according to an embodiment of the present invention.

[0012] Figure 5 FIG. 1 is a diagram schematically showing a process of manufacturing a display device using a mask according to an embodiment of the present invention.

[0013] Figure 6 It is a flowchart showing a method of manufacturing a mask according to an embodiment of the present invention.

[0014] Figure 7 This is a diagram schematically showing the overall situation of a system that performs an exposure process in a process of manufacturing a mask according to an embodiment of the present invention.

[0015] Figure 8 It is a schematic diagram Figure 7 Diagram of the shape of the mask shown.

[0016] Fig. 9 is a schematic diagram showing the first region through Figure 7 The diagram shows a state where the first roller and the second roller are arranged on the exposure module.

[0017] Figures 10 to 12 is schematically illustrated by Fig. 9 A diagram showing a process in which an exposure module performs an exposure process on a mask sheet.

[0018] Fig.13 is a schematic diagram showing the second region through Figure 7 The diagram shows a state where the first roller and the second roller are arranged on the exposure module.

[0019] Fig.14 The figure schematically shows the shape of the mask sheet after the first exposure step and the second exposure step are completed.

[0020] Figures 15 to 17 It is a figure for demonstrating the mask manufacturing method which concerns on one Example of this invention. DETAILED DESCRIPTION

[0021] In the specification, when it is mentioned that a certain structural element (or region, layer or part, etc.) is "located on", "connected to" or "coupled to" other structural elements, this means that it can be directly configured / connected / coupled to the other structural elements or a third structural element may be configured between them.

[0022] The same reference numerals refer to the same structural elements. In addition, in the drawings, in order to effectively explain the technical content, the thickness, ratio and size of the structural elements are exaggerated.

[0023] “And / or” includes all combinations of more than one that can be defined by the associated structures.

[0024] Although the terms first, second, etc. can be used to illustrate a variety of structural elements, the structural elements should not be limited by the terms. The terms are used only for the purpose of distinguishing one structural element from other structural elements. For example, without departing from the scope of the present invention, the first structural element can be named as the second structural element, and similarly, the second structural element can also be named as the first structural element. Regarding the expression of the singular, as long as other meanings are not clearly expressed in the context, the expression of the singular includes the expression of the plural number.

[0025] In addition, the terms “below”, “on the lower side”, “above” or “on the upper side” are used to explain the relationship between the structures shown in the drawings. These terms are relative concepts and are explained based on the directions shown in the drawings.

[0026] Unless otherwise defined, all terms (including technical and scientific terms) used in this specification have the same meaning as those generally understood by those skilled in the art to which the present invention belongs. In addition, terms such as those defined in commonly used dictionaries should be interpreted as having the same meaning as in the context of the relevant technology. Unless they are interpreted as ideal or excessive meanings, they are clearly defined here.

[0027] It should be understood that terms such as “including” or “having” are intended to specify the existence of the features, numbers, steps, operations, structural elements, components or their combinations recorded in the specification, and are not intended to exclude in advance the existence or additional possibility of one or more other features, numbers, steps, operations, structural elements, components or their combinations.

[0028] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[0029] Figure 1 FIG. 1 is a diagram schematically illustrating a mask assembly according to an embodiment of the present invention. Figure 2 yes Figure 1 A perspective view of the mask is shown.

[0030] The mask assembly MA can be used in a manufacturing process of a display device. Specifically, the mask assembly MA can be used in a process of depositing an organic light emitting element layer on a deposition substrate of the display device.

[0031] Reference Figure 1 and Figure 2The mask assembly MA may include a plurality of masks MK and a mask frame MF. The mask assembly MA may have a quadrilateral shape having sides extending along a first direction DR1 and sides extending along a second direction DR2 intersecting the first direction DR1. However, this is not limited thereto, and the mask assembly MA may have a variety of shapes corresponding to the shape of the display device.

[0032] Hereinafter, a direction substantially perpendicularly intersecting a plane defined by the first direction DR1 and the second direction DR2 is defined as a third direction DR3. In the present specification, the meaning of "when viewed from above" may refer to a state viewed from the third direction DR3.

[0033] The mask frame MF may have a square ring shape when viewed from above. Specifically, the mask frame MF may include two frames extending in the first direction DR1 and two frames extending in the second direction DR2. As the frames are connected, an opening portion may be defined in a central portion of the mask frame MF.

[0034] The mask frame MF may have sufficient rigidity. For example, the mask frame MF may include a metal substance such as stainless steel (SUS), Invar, nickel (Ni), or cobalt (Co).

[0035] The mask MK may be fixed to the mask frame MF. For example, the mask MK may be fixed to the mask frame MF in a state of being arranged along the second direction DR2. Each mask MK may extend along the first direction DR1. The mask MK may include a body BO, a clamping portion CP, a plurality of first unit regions CEL1, and a plurality of second unit regions CEL2.

[0036] The body BO may have a long side extending in the first direction DR1, and a short side extending in the second direction DR2. When viewed from above, the body BO may have a rectangular shape extending long in the first direction DR1. The clamping portion CP may extend from the short side of the body BO in the first direction DR1. The clamping portion CP may be removed after the body BO is fixed to the mask frame MF.

[0037] According to an embodiment of the present invention, the body BO may include a first portion PP1, a second portion PP2 and a third portion PP3. The third portion PP3 may be disposed between the first portion PP1 and the second portion PP2. The first portion PP1, the third portion PP3 and the second portion PP2 may be arranged in sequence based on the first direction DR1.

[0038] The length of the first portion PP1 in the first direction DR1 may be a first length L1. The length of the second portion PP2 in the first direction DR1 may be a second length L2. The length of the third portion PP3 in the first direction DR1 may be a third length L3. The first length L1 may be the same as the second length L2. The third length L3 may be less than the first length L1.

[0039] The first unit region CEL1 may be defined in the first portion PP1. When viewed from above, each of the first unit regions CEL1 may have a quadrilateral shape. The length of each of the first unit regions CEL1 in the first direction DR1 may be a fourth length L4. The fourth length L4 may be smaller than the first length L1. Although not shown, the area of ​​the first unit region CEL1 may substantially correspond to the area of ​​one display device.

[0040] Although in Figure 2 4 shows that the number of first unit regions CEL1 defined in the first portion PP1 is four, but this is only for the convenience of explanation and the number of first unit regions CEL1 is not limited thereto. In fact, the number of first unit regions CEL1 defined in the first portion PP1 may be more than four.

[0041] The first unit regions CEL1 may be spaced apart from each other in the first direction DR1. For example, the interval between adjacent first unit regions CEL1 in the first direction DR1 may be a first distance d1. A plurality of first holes H1 may be defined on each first unit region CEL1. When viewed from above, each first hole H1 may have a quadrilateral shape. The first hole H1 may penetrate the body BO along the thickness direction (e.g., the third direction DR3).

[0042] Although in Figure 2 20 first holes H1 are defined in the first unit region CEL1, but in practice the number of first holes H1 defined in one first unit region CEL1 may be more than 20. In addition, the shape of the first hole H1 is not limited to a quadrilateral shape, and the shape of the first hole H1 may be changed to various shapes.

[0043] The second unit regions CEL2 may be defined in the second portion PP2. Each second unit region CEL2 may have a quadrilateral shape when viewed from above. The length of each second unit region CEL2 in the first direction DR1 may be a fifth length L5. In the present embodiment, the fifth length L5 may be the same as the fourth length L4.

[0044] The second cell regions CEL2 may be spaced apart from each other in the first direction DR1. For example, the interval between adjacent second cell regions CEL2 may be a second distance d2. In the present embodiment, the second distance d2 may be the same as the first distance d1.

[0045] A plurality of second holes H2 may be defined on each second unit region CEL2. When viewed from above, each second hole H2 may have a quadrilateral shape. The second hole H2 may penetrate the body BO along the thickness direction (e.g., the third direction DR3). However, the shape of the second hole H2 is not limited thereto. The shape of the second hole H2 may be changed to a variety of shapes such as a rhombus or a circle.

[0046] The third portion PP3 may separate the first portion PP1 and the second portion PP2. For example, the third portion PP3 may be disposed between the first portion PP1 and the second portion PP2. The third length L3 may be less than the first length L1 and greater than the first distance d1. The third portion PP3 may prevent a defect (e.g., wrinkles) occurring in any region of the first portion PP1 and the second portion PP2 from extending to other regions. Thus, the defect rate of the display device may be reduced in the process of manufacturing the display device.

[0047] Figure 3 and Figure 4 It is a diagram illustrating a mask according to an embodiment of the present invention.

[0048] Reference Figure 3 , the first hole H1 may have a shape different from that of the second hole H2. For example, the second hole H2 defined in the second unit region CEL2 may have a rhombus shape when viewed from above. As a result, the first hole H1 and the second hole H2 having different shapes may be defined on one mask MK. Thus, a display device having different light emission patterns may be manufactured using one mask MK. However, the shapes of the first hole H1 and the second hole H2 are not limited to the aforementioned shapes.

[0049] Reference Figure 4 , a dummy pattern DUP may be defined on the third portion PP3. The dummy pattern DUP may include a plurality of third holes H3. The third hole H3 may penetrate the body BO along the third direction DR3. The third hole H3 may be formed together in the process of forming the first hole H1 and the second hole H2. For example, when viewed from above, the third hole H3 may have a quadrilateral shape. However, the shape of the third hole H3 is not limited thereto. The third hole H3 may be deformed into various shapes such as a circle or a polygon.

[0050] The length of the dummy pattern DUP in the first direction DR may be a sixth length L6. The sixth length L6 may be less than the fourth length L4 of the first unit region CEL1. According to the present embodiment, since the third portion PP3 includes the dummy pattern DUP defining a plurality of third holes H3, the third portion PP3 can more effectively prevent a defect occurring in any region of the first portion PP1 and the second portion PP2 from extending to other regions.

[0051] Figure 5 Schematically shows a process of manufacturing a display device using a mask according to an embodiment of the present invention. Hereinafter, a process of depositing an organic light emitting element on a substrate SUB of a display device using the mask MK will be described.

[0052] Reference Figure 5 The deposition device ED may include a chamber CHB, a deposition source S, a worktable ST, a driving plate PP and a mask assembly MA.

[0053] A deposition source S, a workbench ST, a driving plate PP, and a mask assembly MA may be disposed inside the chamber CHB. The chamber CHB may form a closed space. The chamber CHB may include at least one gate GT. The chamber CHB may be opened and closed by the gate GT. The mask assembly MA and the substrate SUB may enter and exit through the gate GT provided in the chamber CHB. The substrate SUB may be a base substrate on which a deposition material is to be deposited in the display device.

[0054] The deposition source S may be disposed at the lower portion of the chamber CHB. The deposition source S may include a deposition substance. The deposition substance is a sublimable or vaporizable substance, and may include one or more of an inorganic substance, a metal, or an organic substance. In this embodiment, the deposition source S is exemplarily described as including an organic substance for manufacturing an organic light-emitting element (not shown).

[0055] The work table ST may be disposed on the upper portion of the deposition source S. A mask assembly MA may be mounted on the work table ST. The mask assembly MA may be opposite to the deposition source S. In a top view, the work table ST may overlap with the mask frame MF and support the mask assembly MA. The work table ST may be disposed outside a moving path of a deposition material supplied from the deposition source S to the substrate SUB.

[0056] The substrate SUB may be disposed on the mask assembly MA. The driving board PP may be disposed on the substrate SUB. The driving board PP can align the substrate SUB onto the mask assembly MA.

[0057] Sediment can be deposited through Figure 2 The first hole H1 and the second hole H2 of the mask MK are shown to be deposited on the substrate SUB. As a result, an organic light emitting element can be deposited on the substrate SUB through the mask assembly MA.

[0058] Next, a method for manufacturing a mask according to an embodiment of the present invention will be described.

[0059] Figure 6 It is a flowchart showing a method of manufacturing a mask according to an embodiment of the present invention. Figure 7 This is a diagram schematically showing the overall situation of a system that performs an exposure process in a process of manufacturing a mask according to an embodiment of the present invention. Figure 8 It is a schematic diagram Figure 7 Diagram of the shape of the mask shown.

[0060] Reference Figures 6 to 8 In step S1, the mask sheet MS may be arranged on the first roller RO1 and the second roller RO2. The mask sheet MS may have a sheet shape having a thin thickness based on the third direction DR3. The mask sheet MS may be flexible. For example, the mask sheet MS may be rolled or unrolled based on the central axis CX. The central axis CX may be parallel to the second direction DR2.

[0061] The mask sheet MS may include a first photoresist PR1, a metal layer ML, and a second photoresist PR2. For example, the first photoresist PR1 may be disposed on the upper surface of the metal layer ML, and the second photoresist PR2 may be disposed on the lower surface of the metal layer ML. The first photoresist PR1 and the second photoresist PR2 may include a positive photosensitive resist material. However, the materials of the first photoresist PR1 and the second photoresist PR2 are not limited thereto. For example, the first photoresist PR1 and the second photoresist PR2 may also include a negative photosensitive resist material. A pattern may be formed on each of the first photoresist PR1 and the second photoresist PR2 by an exposure process described later.

[0062] The metal layer ML may have sufficient rigidity. Figure 2 The metal layer ML may include a metal material such as Invar alloy.

[0063] The mask sheet MS may include an upper surface UF and a lower surface BF. Figure 8 As shown, the upper surface UF and the lower surface BF may be defined by the first direction DR1 and the second direction DR2. In essence, the upper surface UF of the mask sheet MS may refer to the upper surface of the first photoresist PR1, and the lower surface BF may refer to the lower surface of the second photoresist PR2.

[0064] The mask sheet MS may include a plurality of pattern areas PTA. The length of each pattern area PTA in the first direction DR1 may be Figure 2 The length of the main body BO of the mask MK in the first direction DR1 corresponds to . Specifically, a first area AE1, a second area AE2 and a third area AE3 may be defined on each pattern area PTA. The third area AE3 may be disposed between the first area AE1 and the second area AE2.

[0065] The length of the first area AE1 in the first direction DR1 may be a first length L1. The first area AE1 may have a length L1 equal to the first portion PP1 (see FIG. 1 ). Figure 2The length of the second area AE2 in the first direction DR1 may be a second length L2. The second area AE2 may have a length L2 equal to the length of the second portion PP2 (reference Figure 2 ). However, the lengths of the first area AE1 and the second area AE2 may be longer than the lengths of the first portion PP1 and the second portion PP2. The length of the third area AE3 in the first direction DR1 may be a third length L3. Based on the first direction DR1, the third area AE3 may have a length L3 equal to the length of the third portion PP3 (refer to Figure 2 ) have the same length.

[0066] The first roller RO1 and the second roller RO2 can move the mask sheet MS. The first roller RO1 can be separated from the second roller RO2. For example, based on the third direction DR3, the first roller RO1 can be arranged at a higher position than the second roller RO2. The first roller RO1 and the second roller RO2 can contact the mask sheet MS respectively. For example, the first roller RO1 can contact a part of the lower surface BF of the mask sheet MS, and the second roller RO2 can contact a part of the upper surface UF of the mask sheet MS.

[0067] An exposure module PRM may be disposed between the first roller RO1 and the second roller RO2. The exposure module PRM may include at least one exposure device. For example, the exposure module PRM may include a first exposure device PRD1. The first exposure device PRD1 may perform an exposure process on at least one side of the mask sheet MS. Details of the first exposure device PRD1 will be described later.

[0068] According to one embodiment of the present invention, a guide roller GRO may be further arranged between the first roller RO1 and the central axis CX on which the mask sheet MS is wound. The guide roller GRO may be arranged at the same height as the first roller RO1 based on the third direction DR3. The guide roller GRO can guide the mask sheet MS unwound from the central axis CX to the first roller RO1.

[0069] Fig. 9 is a schematic diagram showing the first region through Figure 7 The diagram shows a state where the first roller and the second roller are arranged on the exposure module.

[0070] Reference Figure 6 and Fig. 9In step S2, the pattern area PTA can be arranged on the exposure module PRM. At this time, the mask sheet MS can move with the rotation of the first roller RO1 and the second roller RO2. Specifically, the first roller RO1 can rotate in the counterclockwise direction, and the second roller RO2 can rotate in the clockwise direction. Friction can be exerted between the first roller RO1 and the second roller RO2 and the mask sheet MS. As a result, the mask sheet MS can be unwound and moved from the first roller RO1 to the second roller RO2.

[0071] When the first area AE1 of the pattern area PTA is disposed on the first exposure device PRD1, the rotation of the first roller RO1 and the second roller RO2 may be stopped. At this time, the third area AE3 and the second area AE2 may be disposed between the first exposure device PRD1 and the first roller RO1 or near the first roller RO1.

[0072] Since the first roll RO1 is separated from the second roll RO2 in the third direction DR3 , a portion of the mask sheet MS disposed between the first roll RO1 and the second roll RO2 may be disposed parallel to a plane defined by the second direction DR2 and the third direction DR3 .

[0073] However, the rotation directions of the first roll RO1 and the second roll RO2 are not limited to the above. For example, the mask sheet MS may be wound up by rotating the first roll RO1 in the clockwise direction and the second roll RO2 in the counterclockwise direction.

[0074] Figures 10 to 12 It is used to illustrate the Fig. 9 FIG. 1 is a diagram showing an exposure process performed on a mask sheet by an exposure module. Fig.11 yes Fig.10 FIG. 4 is a top view of the first exposure mask PMA1.

[0075] Reference Figure 6 and Figures 9 to 12 In step S3, the first pattern PT1 may be formed on the first area AE1 by performing the first exposure process on the first area AE1. The first exposure process may be performed in a vacuum state. The range in which the exposure process may be performed by one operation of the first exposure device PRD1 may be limited to within the first area AE1. For example, in the length direction (e.g., the third direction DR3), the length of the available exposure area of ​​the first exposure device PRD1 may be the same as the first length L1.

[0076] The first exposure device PRD1 may form a first pattern PT1 on the upper surface UF and the lower surface BF of the first area AE1. The first exposure device PRD1 may include a first sub-exposure device SPD1 and a second sub-exposure device SPD2. The first sub-exposure device SPD1 may perform a first exposure process on the upper surface UF of the first area AE1. For the first sub-exposure device SPD1, a first exposure mask PMA1 may be configured on the upper surface UF of the first area AE1.

[0077] A plurality of exposure lines PL may be defined on the first exposure mask PMA1 (see Fig.11 ). The exposure lines PL may be spaced apart in the second direction DR2, and each exposure line PL may extend along the third direction DR3. Fig.11 FIG. 4 illustrates that four exposure lines PL are defined on the first exposure mask PMA1 , but this is only for the convenience of explanation. In fact, the number of exposure lines PL defined on the first exposure mask PMA1 may be greater.

[0078] An exposure line PL can actually be Figure 2 Specifically, the exposure line PL may include four groups GU. The group GU may actually correspond to the first part PP1 of the mask MK shown. Figure 2 Each group GU may include a plurality of first exposure holes PRH1. The first exposure holes PRH1 may have a shape similar to Figure 2 For example, the first exposure hole PRH1 may have a quadrilateral shape when viewed from above. A portion of the upper surface UF of the first area AE1 that overlaps with the first exposure hole PRH1 may be exposed to the outside of the first exposure mask PMA1.

[0079] The first sub-exposure device SPD1 may irradiate light to the upper surface UF of the first area AE1. Thus, a first pattern PT1 may be formed on the upper surface UF of the first area AE1 (see Fig.12 ). Specifically, the shape of the first pattern PT1 may correspond to the shape of the first exposure hole PRH1 of the first exposure mask PMA1. The chemical properties of the first photoresist PR1 portion exposed to light through the first exposure hole PRH1 may be changed.

[0080] The second sub-exposure device SPD2 is capable of performing a first exposure process on the lower surface BF of the first area AE1. For the second sub-exposure device SPD2, a second exposure mask PMA2 may be configured on the lower surface BF of the first area AE1. A plurality of second exposure holes PRH2 may be defined on the second exposure mask PMA2. Although not shown, the second exposure mask PMA2 may have the same shape as the first exposure mask PMA1. For example, each second exposure hole PRH2 may have the same shape as the first exposure hole PRH1, and the second exposure holes PRH2 may be arranged in the same structure as the first exposure holes PRH1. The portion overlapping with the second exposure holes PRH2 in the lower surface BF of the first area AE1 may be exposed to the outside of the second exposure mask PMA2. However, the shape of the second exposure mask PMA2 is not limited thereto, for example, the second exposure holes PRH2 of the second exposure mask PMA2 may have a shape different from that of the first exposure holes PRH1.

[0081] The second sub-exposure device SPD2 may irradiate light to the lower surface BF of the first area AE1. A first pattern PT1 may be formed on the lower surface BF of the first area AE1 (see Fig.12 The shape of the first pattern PT1 may correspond to the shape of the second exposure hole PRH2 of the second exposure mask PMA2. The chemical properties of the portion of the second photoresist PR2 of the mask sheet MS exposed to light through the second exposure hole PRH2 may be changed. Thus, the first exposure process of the first area AE1 can be completed.

[0082] Fig.13 is a schematic diagram showing the second region through Figure 7 The first roller and the second roller shown are arranged on the exposure module.

[0083] Reference Figure 6 and Fig.13 , in step S4, the second area AE2 can be arranged on the first exposure device PRD1 of the exposure module PRM. Specifically, the first roller RO1 and the second roller RO2 can rotate. The first area AE1 formed with the first pattern PT1 can be transported to the outside of the first exposure device PRD1. The third area AE3 arranged between the first area AE1 and the second area AE2 can be arranged outside the first exposure device PRD1 through the inside of the first exposure device PRD1. As a result, when the second area AE2 is arranged on the first exposure device PRD1, the first area AE1 and the third area AE3 can be arranged between the first exposure device PRD1 and the second roller RO2 or near the second roller RO2.

[0084] In step S5, a second exposure process may be performed on the second area AE2 by the exposure module PRM, so as to form a second pattern PT2 on the second area AE2. The second exposure process may be performed on the second area AE2 in the same manner as the first exposure process. For example, for the first sub-exposure device SPD1 of the first exposure device PRD1, a first exposure mask PMA1 may be arranged on the upper surface UF of the second area AE2, and light may be irradiated to the upper surface UF of the second area AE2. Thus, a second pattern PT2 may be formed on the upper surface UF of the second area AE2.

[0085] For the second sub-exposure device SPD2, a second exposure mask PMA2 can be arranged on the lower surface BF of the second area AE2, and light can be irradiated to the lower surface BF of the second area AE2. Thus, a second pattern PT2 can be formed on the lower surface BF of the second area AE2. According to this embodiment, the first pattern PT1 and the second pattern PT2 can have the same shape because they are formed using the same exposure device (first exposure device PRD1). Thus, the second exposure process can be completed for the second area AE2.

[0086] Next, the second area AE2 can be transported out of the first exposure device PRD1 by rotating the first roller RO1 and the second roller RO2, and the first area AE1 of the next pattern area PTA can be arranged on the first exposure device PRD1. By repeatedly performing the above steps S1 to S5, the first pattern PT1 and the second pattern PT2 can be formed on each of the plurality of pattern areas PTA of the mask sheet MS.

[0087] Fig.14 The figure schematically shows the shape of the mask sheet after the first exposure step and the second exposure step are completed.

[0088] Reference Fig.14 After the first exposure process and the second exposure process are completed, a plurality of mask patterns MAT may be formed on one pattern area PTA. For example, four mask patterns MAT may be formed on one pattern area PTA. Each mask pattern MAT may be Figure 2 The mask sheet MS having the mask pattern MAT formed thereon can be manufactured through various processes (for example, wet etching, etc.) after the exposure process. Figure 2 The mask MK is shown.

[0089] According to an embodiment of the present invention, since the first exposure process and the second exposure process are separately performed on one pattern area PTA, the mask MK having a length longer than the length of the available exposure area of ​​the first exposure device PRD1 can be manufactured, thereby increasing the production efficiency of the display device.

[0090] According to an embodiment of the present invention, in the first exposure process and the second exposure process, the pattern area PTA of the mask sheet MS is arranged parallel to the gravity direction (third direction DR3 ), thereby improving the problem of wrinkles on the pattern area PTA of the mask sheet MS.

[0091] According to one embodiment of the present invention, the third area AE3 is intentionally configured between the first area AE1 and the second area AE2 to perform the first exposure process and the second exposure process, so as to prevent the problem that any area of ​​the first area AE1 and the second area AE2 adversely affects other areas.

[0092] According to an embodiment of the present invention, by performing a first exposure process on the first area AE1 of the pattern area PTA and then performing a second exposure process on the second area AE2 of the same pattern area PTA, more unit areas can be ensured for one mask MK, thereby improving the productivity of the display device.

[0093] The aforementioned steps S1 to S5 involve manufacturing Figure 2 The method of forming the mask MK shown in the figure is not limited to this. The aforementioned steps S1 to S5 can be changed within the scope of the present invention. For example, the exposure module PRM can also form a pattern area PTA with the same Figure 2 The pattern corresponding to the clamping portion CP shown. For example, the exposure mask of the first exposure device PRD1 may further include a groove corresponding to the clamping portion CP. In this case, the first exposure device PRD1 may be rotated 180° relative to the first direction DR1 between the first exposure process and the second exposure process. Here, the first direction DR1 may be a direction perpendicular to the upper surface UF of the mask sheet MS. Thus, the clamping portion CP having a shape symmetrical to each other with the third area AE3 as the center can be formed.

[0094] Figure 4 The dummy pattern DUP shown can be produced by performing the first exposure process or the second exposure process on the third area AE3. For example, when the first area AE1 and the second area AE2 are designed to be smaller than the first length L1 (or the second length L2), the third area AE3 disposed between the first area AE1 and the second area AE2 can also be patterned by the first exposure process and the second exposure process, thereby forming a third hole H3 defined in the dummy pattern DUP.

[0095] Next, a mask manufacturing method of an embodiment different from the above-mentioned embodiment is described. In the following figures, the same reference numerals are used to illustrate the same structures as the above-mentioned embodiment. Therefore, the description of the same structures is omitted, and the structures with differences are mainly described in detail.

[0096] Fig.15It is a figure for demonstrating the mask manufacturing method which concerns on one Example of this invention.

[0097] Reference Fig.15 , the exposure module PRM-1 may include a first exposure device PRD1-1 and a second exposure device PRD2-1. The first exposure device PRD1-1 may be spaced apart from the second exposure device PRD2-1. Specifically, based on the third direction DR3, the distance between the first exposure device PRD1-1 and the second exposure device PRD2-1 may be the same as the third length L3. In essence, the distance between the first exposure device PRD1-1 and the second exposure device PRD2-1 may be the same as the length of the third area AE3.

[0098] In this embodiment, the first exposer PRD1-1 may perform a first exposure process on the first area AE1, and the second exposer PRD2-1 may perform a second exposure process on the second area AE2. The first exposure process and the second exposure process may be performed simultaneously.

[0099] A first pattern PT1 may be formed on the first area AE1 by the first exposure device PRD1-1, and a second pattern PT2 may be formed on the second area AE2 by the second exposure device PRD2-1.

[0100] The first pattern PT1 may be different from the second pattern PT2. For example, the first exposure mask PMA1 of the first exposure device PRD1-1 may have a shape different from the second exposure mask PMA2 of the second exposure device PRD2-1. For example, when viewed from above, the first exposure hole PRH1 of the first exposure mask PMA1 may have a quadrilateral shape, and the second exposure hole PRH2 of the second exposure mask PMA2 may have a rhombus shape.

[0101] Therefore, if Figure 3 As shown, the mask MK having holes having shapes different from each other defined in the first portion PP1 and the second portion PP2 can be manufactured.

[0102] According to an embodiment of the present invention, since two exposure devices can be used to simultaneously perform an exposure process on the first area AE1 and the second area AE2 , the process time for manufacturing the mask MK can be shortened.

[0103] According to an embodiment of the present invention, by forming different patterns in the first portion PP1 and the second portion PP2 of one mask MK, a display device having different light emission patterns can be manufactured using one mask MK.

[0104] Fig.16 and Fig.17 It is a figure for demonstrating the mask manufacturing method which concerns on one Example of this invention.

[0105] Reference Fig.16, the exposure module PRM-2 may include a first exposer PRD1-2, a second exposer PRD2-2 and a plurality of sub-rollers SRO1, SRO2, SRO3, and SRO4. The first exposer PRD1-2 may be separated from the second exposer PRD2-2. Specifically, the second exposer PRD2-2 may be separated from the first exposer PRD1-2 along the first direction DR1. The first exposer PRD1-2 may be disposed adjacent to the first roller RO1. The second exposer PRD2-2 may be disposed adjacent to the second roller RO2. The first exposer PRD1-2 and the second exposer PRD2-2 may be disposed parallel to each other.

[0106] A plurality of sub-rollers SRO1, SRO2, SRO3, and SRO4 may be arranged between the first exposure device PRD1-2 and the second exposure device PRD2-2. Specifically, the first to fourth sub-rollers SRO1, SRO2, SRO3, and SRO4 may be arranged in sequence from the first exposure device PRD1-2 in a direction toward the second exposure device PRD2-2. The first sub-roller SRO1 and the second sub-roller SRO2 may form a first horizontal path. The second sub-roller SRO2 and the third sub-roller SRO3 may form a vertical path. The third sub-roller SRO3 and the fourth sub-roller SRO4 may form a second horizontal path. However, the number and configuration structure of the sub-rollers SRO1, SRO2, SRO3, and SRO4 arranged between the first exposure device PRD1-2 and the second exposure device PRD2-2 are not limited thereto.

[0107] The first exposer PRD1-2 may form a first pattern PT1 on the first area AE1 of the pattern area PTA, and the second exposer PRD2-2 may form a second pattern PT2 on the second area AE2 of the pattern area PTA. The first pattern PT1 and the second pattern PT2 may be the same or different from each other.

[0108] Reference Fig.17 , the exposure module PRM-3 may include a plurality of exposure devices. For example, the exposure module PRM-3 may include first to Nth exposure devices PRD1-3 to PRDn-3. N is a natural number greater than 2. A sub-roller SRO may be arranged between two adjacent exposure devices. The first to Nth exposure devices PRD1-3 to PRDn-3 may be arranged in parallel with each other.

[0109] According to the present embodiment, the first to Nth exposure devices PRD1-3 to PRDn-3 may perform the exposure process in a variety of ways. For example, the odd-numbered exposure devices among the N exposure devices may perform the first exposure process on the first area AE1, and the even-numbered exposure devices may perform the second exposure process on the second area AE2. Alternatively, when a mask MK having a long length is manufactured by performing N exposure processes on N areas arranged in series, N exposure devices may also be used. The patterns formed by the first to Nth exposure devices PRD1-3 to PRDn-3 may be the same or different from each other.

[0110] The above description is made with reference to various embodiments, but it should be understood that those skilled in the art can modify and change the present invention in various ways without departing from the scope of the concept and field of the present invention recorded in the attached claims. In addition, the embodiments disclosed in the present invention are not intended to limit the technical concept of the present invention, and all technical concepts within the scope of the attached claims and equivalents thereto should be interpreted as being included in the scope of the present invention.

[0111] Description of Reference Numerals

[0112] MA Mask Kit MK Mask

[0113] MF mask frame MS mask sheet

[0114] RO1 first roller RO2 second roller

[0115] PTA pattern area AE1 first area

[0116] AE2 Second Area PRM Exposure Module

Claims

1. A mask manufacturing method, comprising: a step of disposing a mask sheet on a first roller and a second roller spaced apart from each other, wherein the mask sheet comprises a pattern region defining a first region, a second region, and a third region disposed between the first region and the second region; The step of arranging the pattern area on an exposure module by rotating the first roller and the second roller; performing a first exposure process on the first area by the exposure module to form a first pattern on the first area; as well as performing a second exposure process on the second area by the exposure module to form a second pattern on the second area, The third area is not subjected to the exposure process. The first pattern includes a plurality of first unit regions spaced apart from each other by a first distance in a first direction, A length of the third region in the first direction is greater than the first distance.

2. The mask manufacturing method according to claim 1, wherein: The second pattern includes a plurality of second unit regions spaced apart from each other by a second distance in the first direction, The length of the third area in the first direction is greater than the second distance, The second distance is equal to the first distance.

3. The mask manufacturing method according to claim 1, wherein: The exposure module includes a first exposure device, The step of forming the first pattern comprises: A step of arranging the first area on the first exposure device by rotating the first roller and the second roller; and The step of forming the first pattern by the first exposure device.

4. The mask manufacturing method according to claim 3, wherein: The step of forming the second pattern comprises: A step of arranging the second area on the first exposure device by rotating the first roller and the second roller; and The step of forming the second pattern by the first exposure device.

5. The mask manufacturing method according to claim 1, wherein: The exposure module includes a first sub-exposure device and a second sub-exposure device. The step of forming the first pattern comprises: forming the first pattern on the upper surface of the first region by the first sub-exposure device; and The step of forming the first pattern on a lower surface of the first region opposite to the upper surface by the second sub-exposure device.

6. The mask manufacturing method according to claim 5, wherein: The step of forming the second pattern comprises: forming the second pattern on the upper surface of the second region by the first sub-exposure device; and and forming the second pattern on a lower surface of the second region opposite to the upper surface by the second sub-exposure device.

7. The mask manufacturing method according to claim 1, wherein: The step of forming the first pattern comprises: a step of disposing an exposure mask defining a plurality of holes corresponding to the first pattern on the first area; and The step of exposing the portion of the first region exposed through the hole to light.

8. The mask manufacturing method according to claim 1, wherein: The first roller is arranged above the second roller and the exposure module.

9. The mask manufacturing method according to claim 1, wherein: The mask sheet comprises: Metal layer; a first photoresist disposed on one side of the metal layer; and A second photoresist is disposed on an opposite surface of the metal layer, wherein the opposite surface is a surface opposite to the one surface of the metal layer.

10. The mask manufacturing method according to claim 1, wherein: The exposure module comprises: a first exposure device; and A second exposure device is spaced apart from the first exposure device.

11. The mask manufacturing method according to claim 10, wherein: The step of forming the first pattern is performed by the first exposure device, and the step of forming the second pattern is performed by the second exposure device.

12. The mask manufacturing method according to claim 11, wherein: The first pattern has a pattern shape different from that of the second pattern.

13. The mask manufacturing method according to claim 10, wherein: The exposure module further includes: one or more sub-rollers arranged between the first exposure device and the second exposure device.

14. The mask manufacturing method according to claim 1, wherein: The mask sheet has a plane defined by the first direction and a second direction intersecting the first direction, The mask manufacturing method includes the step of rotating the exposure module by 180° with respect to a direction perpendicular to the plane.

15. A mask comprising: A main body, comprising a first portion, a second portion, and a third portion disposed between the first portion and the second portion; a plurality of first unit regions, defined on the first portion and spaced apart from each other by a first distance in a first direction; as well as a plurality of second unit regions, defined on the second portion and spaced apart from each other by a second distance in the first direction, A length of the third portion in the first direction is greater than the first distance and the second distance.

16. The mask according to claim 15, wherein First holes having a first shape are respectively defined on the first unit regions, Second holes having a second shape are defined in the second unit regions, respectively.

17. The mask according to claim 16, wherein: The first shape is the same as the second shape.

18. The mask according to claim 16, wherein: The first shape is different from the second shape.

19. The mask according to claim 15, wherein: The third portion further includes a dummy pattern defining a third hole.

20. The mask according to claim 19, wherein A length of the dummy pattern in the first direction is smaller than a length of the first unit region and the second unit region in the first direction.

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