Electric tilting sample table for ion beam processing and testing and use method of electric tilting sample table
By designing an ion beam processing and testing electric tilt sample table, using angle control piezoelectric motor and electrode automation operation, the problem of incompatible sample placement requirements of focused ion beam and transmission electron Kuchichi diffraction analysis is solved, improving processing efficiency and protecting Vacuum environment.
Patent Information
- Application Number
- CN202411414392.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-11
- Publication Date
- 2025-01-10
AI Technical Summary
The prior art is difficult to achieve compatibility between the focused ion beam and the diffraction analysis of the transmitted electrons for sample placement requirements, resulting in the need to repeatedly break the vacuum chamber and replace the sample table, which is inefficient and unfriendly to samples that are prone to oxidation.
An ion beam processing and testing electric tilt sample table is designed, using main installation components, auxiliary installation components, angle control components and sample fixing components. The angle control piezoelectric motor is used to realize fixed-point directional processing and angle adjustment of the sample to avoid vacuum breakage. Exit the bin, combine the electrode and the controller to achieve automated operation.
Various processing methods of samples in vacuum environment are realized, efficiency is improved, sample damage is avoided, vacuum environment is maintained to the maximum extent, and sample clamping and analysis process is simplified.
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Figure CN119297063A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of transmission electron microscopes, in particular to an ion beam processing test electric tilting sample stage and a use method thereof. Background Art
[0002] At present, focused ion beam (FIB) processing technology has been widely used. Its main feature is that it can point and hit wherever it is pointed. Specifically, it can observe the structure and position the processing, with a processing accuracy of ±2nm. With the advancement of materials science, the requirements for fixed-point processing are getting higher and higher. Not only must the location of processing and sampling be clear, but also samples with fixed orientations must be extracted. This is difficult to achieve with current technology, such as doing a large number of electron backscatter diffraction (EBSD) tests, looking for grains with suitable orientations, and then extracting samples. This method requires luck on the one hand, and on the other hand, the amount of data in the early stage is large, and it needs to be manually searched, which is labor-intensive and difficult.
[0003] In addition, the transmission electron Kikuchi diffraction analysis (TKD) in the scanning electron microscope (SEM) is aimed at ultra-thin crystal samples. It uses the interaction between the electron beam and the sample to generate transmission electron Kikuchi diffraction. By collecting these signals, it is possible to analyze crystallographic related information, and high-resolution crystallographic related information can be achieved. It has a wide range of applications in material research, semiconductor testing, failure analysis, etc. For samples such as welding and semiconductors, it is necessary to use a focused ion beam (FIB) to extract the sample at a fixed point for analysis. Since FIB and TKD have different requirements for sample placement, the previous method requires first processing the sample with FIB under vacuum, then breaking the vacuum to exit the chamber, replacing the sample stage or adjusting the sample angle, and then vacuuming for TKD analysis. On the one hand, the traditional method requires repeated exiting of the chamber, which is inefficient; on the other hand, because the vacuum needs to be broken, it is extremely unfriendly to some samples that are easily oxidized. For this reason, an ion beam processing test electric tilting sample stage and its use method are designed. Summary of the invention
[0004] The purpose of the present invention is to solve the above problems and to design an ion beam processing test electric tilting sample stage and a method of using the same.
[0005] To achieve the above-mentioned purpose, the technical solution of the present invention is an electric tilting sample stage for ion beam processing testing, comprising a main mounting component, an auxiliary mounting component is arranged on the main mounting component, an angle control component is arranged on the auxiliary mounting component, a connecting component is arranged at the output end of the angle control component, a sample storage component is arranged on the connecting component, a sample fixing component is arranged on the sample storage component, an auxiliary clamping component is arranged above the sample fixing component, an insulating component is arranged on the main mounting component, and an electrode is arranged above the insulating component.
[0006] As a further description of the technical solution, the main installation component includes a main installation support, the main installation support is provided with an installation step, the installation step is provided with a main fixing hole, and the installation step is provided with an auxiliary installation component.
[0007] As a further description of the present technical solution, the auxiliary installation component includes an auxiliary installation rotating support arranged on the installation step, an auxiliary installation hole is arranged in the vertical direction on the auxiliary installation rotating support, a fixing part is arranged in the auxiliary installation hole, and an auxiliary hole is opened in the longitudinal direction of the auxiliary installation rotating support.
[0008] As a further description of the present technical solution, the angle control component includes an angle control piezoelectric motor arranged on the side of the auxiliary mounting component, and a connecting component is arranged at the output end of the angle control piezoelectric motor.
[0009] As a further description of the technical solution, the connecting component includes a connecting shaft for setting an angle control at the output end of the piezoelectric motor, the connecting shaft passes through an auxiliary hole, and a sample storage component is arranged on the connecting shaft.
[0010] As a further description of the technical solution, the sample storage component includes a sample tray arranged on the connecting component, and the sample fixing component is arranged on the sample tray.
[0011] As a further description of the technical solution, the sample fixing component includes a connecting piece arranged on the sample storage component, and a plurality of connecting spring pieces are arranged on the connecting piece.
[0012] As a further description of the technical solution, the auxiliary clamping assembly includes an auxiliary pressing plate arranged above the sample fixing assembly, the auxiliary pressing plate is fixed to the sample storage assembly by fixing screws, and the insulating assembly includes an insulating pad arranged on the main mounting assembly.
[0013] As a further description of the technical solution, the electric tilting sample stage is connected to the controller, which includes an all-solid-state battery, a level, a control unit, a motor drive, and a display. The two terminals of the angle-control piezoelectric motor are respectively connected to the two poles of the motor drive, the electrode is connected to the negative pole of the level, and the main mounting support is connected to the positive pole of the level.
[0014] A method for using an electrically tiltable sample stage for ion beam processing testing comprises the following steps:
[0015] Step 1: The copper mesh support is pressed on the sample holder by connecting the spring sheet, the sample storage assembly is perpendicular to the auxiliary mounting assembly, and the electric tilting sample stage is placed in the focused ion beam-electron beam dual beam system (FIB). At the same time, the sample is also fixed on the sample stage of the FIB equipment. The sample is processed by FIB, and the sample slice is extracted and welded on the copper mesh support, and then thinned. The thickness of the thin area is about 100nm;
[0016] Step 2: Move the sample stage, move the electrode under the electron beam, irradiate the electrode with the electron beam, give the level a negative voltage signal, the level output signal is given to the control unit, the control unit controls the motor drive, the motor drive drives the angle control piezoelectric motor to rotate, and the angle control piezoelectric motor drives the sample holder to rotate to the angle required for TKD test;
[0017] Step 3: Move the sample holder, observe through the electron beam and move the sample to the appropriate position; then move the EBSD probe into the appropriate position; perform the EBSD test with the transmission beam.
[0018] The beneficial effect is that the electric tilting sample stage of the technical solution can realize a variety of sample processing methods in FIB fixed-point and fixed-orientation processing, as well as the combination of FIB and TKD analysis, avoiding the steps of breaking the vacuum chamber to replace the sample stage, and maximally ensuring the vacuum environment. At the same time, it is convenient for sample clamping to avoid damage to the sample. BRIEF DESCRIPTION OF THE DRAWINGS
[0019] Figure 1 It is a schematic diagram of the overall structure of the present invention;
[0020] Figure 2 It is a schematic diagram of the installation structure of the main fixing hole of the present invention;
[0021] Figure 3 is a top view of the present invention;
[0022] Figure 4 It is a schematic diagram of the installation structure of the auxiliary hole of the present invention;
[0023] Figure 5 It is a schematic diagram of the installation structure of the angle-controlled piezoelectric motor of the present invention;
[0024] Figure 6 It is a schematic structural diagram of the sample fixing assembly of the present invention.
[0025] In the figure, 1. main mounting assembly; 2. auxiliary mounting assembly; 3. angle control assembly; 4. connection assembly; 5. sample storage assembly; 6. sample fixing assembly; 7. auxiliary clamping assembly; 8. insulation assembly; 9. electrode; 10. main mounting support; 11. mounting step; 12. main fixing hole; 13. auxiliary mounting rotating support; 14. auxiliary mounting hole; 15. fixing piece; 16. auxiliary hole; 17. angle control piezoelectric motor; 18. connecting shaft; 19. sample holder; 20. connecting plate; 21. connecting spring plate; 22. auxiliary pressing plate; 23. fixing screw; 24. insulation pad; 25. controller; 26. all-solid-state battery; 27. level; 28. control unit; 29. motor drive; 30. display. DETAILED DESCRIPTION
[0026] First of all, the original intention of the design of the present invention is explained. For samples such as welding and semiconductors, it is necessary to use a focused ion beam to extract the samples at a fixed point for analysis. Since the focused ion beam and transmission electron Kikuchi diffraction analysis have different requirements for sample placement, the previous method requires first processing the sample with a focused ion beam under vacuum, and then breaking the vacuum and exiting the chamber, replacing the sample stage or adjusting the sample angle, and then vacuuming again for transmission electron Kikuchi diffraction analysis. On the one hand, the traditional method requires repeated exiting the chamber, which is inefficient; on the other hand, because the vacuum needs to be broken, it is extremely unfriendly to some easily oxidized samples. Therefore, the present invention designs an ion beam processing test electric tilting sample stage and a method for using the same.
[0027] The present invention will be described in detail below in conjunction with the accompanying drawings. Figure 1-Figure 6 As shown, an electric tilting sample stage for ion beam processing testing includes a main mounting component 1. The main mounting component 1 will be described in detail below. The main mounting component 1 includes a main mounting support 10, and the main mounting support 10 is provided with a mounting step 11. The mounting step 11 is provided with a main fixing hole 12, and the mounting step 11 is provided with an auxiliary mounting component 2.
[0028] An auxiliary mounting component 2 is arranged on the main mounting component 1. The auxiliary mounting component 2 will be described in detail below. The auxiliary mounting component 2 includes an auxiliary mounting rotating support 13 arranged on the mounting step 11, and an auxiliary mounting hole 14 is vertically arranged on the auxiliary mounting rotating support 13. A fixing member 15 is arranged in the auxiliary mounting hole 14. The fixing member 15 passes through the auxiliary mounting hole 14 and the main fixing hole 12 to realize the installation of the auxiliary mounting component 2 and the main mounting component 1.
[0029] In order to facilitate the installation of the connecting shaft 18 , the auxiliary installation rotating support 13 is provided with an auxiliary hole 16 in the longitudinal direction.
[0030] In order to facilitate the control of the angle of the sample storage component 5, an angle control component 3 is arranged on the auxiliary mounting component 2. The angle control component 3 will be described in detail below. The angle control component 3 includes an angle control piezoelectric motor 17 arranged on the side of the auxiliary mounting component 2, and the output end of the angle control piezoelectric motor 17 is provided with a connecting component 4.
[0031] In order to facilitate the installation of the sample storage component 5, a connecting component 4 is arranged at the output end of the angle control component 3. The connecting component 4 will be described in detail below. The connecting component 4 includes a connecting shaft 18 at the output end of the angle control piezoelectric motor 17, and the connecting shaft 18 passes through the auxiliary hole 16. The sample storage component 5 is arranged on the connecting shaft 18.
[0032] In order to facilitate the storage of samples, a sample storage component 5 is provided on the connecting component 4. The sample storage component 5 will be described in detail below. The sample storage component 5 includes a sample tray 19 provided on the connecting component 4, and a sample fixing component 6 is provided on the sample tray 19.
[0033] In order to facilitate the fixation of the sample, a sample fixing component 6 is provided on the sample storage component 5. The sample fixing component 6 will be described in detail below. The sample fixing component 6 includes a connecting piece 20 provided on the sample storage component 5, and a plurality of connecting spring pieces 21 are provided on the connecting piece 20.
[0034] In order to facilitate fixing the sample fixing component 6 on the sample storage component 5, an auxiliary clamping component 7 is arranged above the sample fixing component 6. The auxiliary clamping component 7 will be described in detail below. The auxiliary clamping component 7 includes an auxiliary pressing plate 22 arranged above the sample fixing component 6, and the auxiliary pressing plate 22 is fixed to the sample storage component 5 by fixing screws 23.
[0035] In addition, an insulating component 8 is arranged on the main installation component 1 , and an electrode 9 is arranged above the insulating component 8 ; the insulating component 8 includes an insulating pad 24 arranged on the main installation component 1 .
[0036] The electric tilting sample stage is connected to the controller 25, which includes an all-solid-state battery 26, an electric level 27, a control unit 28, a motor drive 29, and a display 30. The two terminals of the angle-controlling piezoelectric motor 17 are respectively connected to the two poles of the motor drive 29, the electrode 9 is connected to the negative pole of the electric level 27, and the main mounting support 10 is connected to the positive pole of the electric level 27.
[0037] The specific structure of the present invention is described in detail above. The working principle of the present invention will be described below: The method for using the electric tilting sample stage for ion beam processing testing comprises the following steps:
[0038] Step 1: The copper mesh support is pressed against the sample holder 19 by connecting the spring sheet 21, and the sample storage component 5 is perpendicular to the auxiliary mounting component 2. The electric tilting sample stage is placed in a focused ion beam-electron beam dual beam system (FIB), and the sample is also fixed on the sample stage of the FIB equipment. The sample is processed by FIB, and the sample slice is extracted and welded on the copper mesh support, and then thinned. The thickness of the thin area is about 100nm;
[0039] Step 2: Move the sample stage, move the electrode 9 to the bottom of the electron beam, irradiate the electrode 9 with the electron beam, give the level 27 a negative voltage signal, the level 27 outputs a signal to the control unit 28, the control unit 28 controls the motor drive 29, the motor drive 29 drives the angle control piezoelectric motor 17 to rotate, and the angle control piezoelectric motor 17 drives the sample holder 19 to rotate to the angle required for the TKD test;
[0040] Step 3: Move the sample holder 19, observe through the electron beam and move the sample to a suitable position; then move the EBSD probe to a suitable position; and perform a transmission beam EBSD test.
[0041] The electric tilting sample stage of this technical solution can realize a variety of sample processing methods in FIB fixed-point and fixed-orientation processing, as well as the combination of FIB and TKD analysis, avoiding the steps of breaking the vacuum chamber to replace the sample stage, etc., thus ensuring the vacuum environment to the maximum extent, facilitating sample clamping and avoiding damage to the sample.
[0042] The above technical solutions only reflect the preferred technical solutions of the technical solutions of the present invention. Some changes that may be made to certain parts thereof by technicians in this technical field all reflect the principles of the present invention and fall within the protection scope of the present invention.
Claims
1. An electrically tiltable sample stage for ion beam processing testing, characterized in that: The invention comprises a main mounting component (1), an auxiliary mounting component (2) is arranged on the main mounting component (1), an angle control component (3) is arranged on the auxiliary mounting component (2), a connection component (4) is arranged at the output end of the angle control component (3), a sample storage component (5) is arranged on the connection component (4), a sample fixing component (6) is arranged on the sample storage component (5), an auxiliary pressing component (7) is arranged above the sample fixing component (6), an insulating component (8) is arranged on the main mounting component (1), and an electrode (9) is arranged above the insulating component (8).
2. The electric tilting sample stage for ion beam processing test according to claim 1, characterized in that: The main mounting assembly (1) comprises a main mounting support (10), a mounting step (11) is provided on the main mounting support (10), a main fixing hole (12) is provided on the mounting step (11), and an auxiliary mounting assembly (2) is provided on the mounting step (11).
3. The electric tilting sample stage for ion beam processing test according to claim 2, characterized in that: The auxiliary installation component (2) comprises an auxiliary installation rotating support (13) arranged on the installation step (11), an auxiliary installation hole (14) is arranged on the auxiliary installation rotating support (13) in the vertical direction, a fixing piece (15) is arranged in the auxiliary installation hole (14), and an auxiliary hole (16) is opened in the longitudinal direction of the auxiliary installation rotating support (13).
4. The electric tilting sample stage for ion beam processing test according to claim 3, characterized in that: The angle control component (3) comprises an angle control piezoelectric motor (17) arranged on the side of the auxiliary mounting component (2), and a connection component (4) is arranged at the output end of the angle control piezoelectric motor (17).
5. The electric tilting sample stage for ion beam processing test according to claim 4, characterized in that: The connecting component (4) comprises a connecting shaft (18) provided at the output end of the angle-controlled piezoelectric motor (17), the connecting shaft (18) passing through the auxiliary hole (16), and a sample storage component (5) is provided on the connecting shaft (18).
6. The electric tilting sample stage for ion beam processing test according to claim 1, characterized in that: The sample storage component (5) comprises a sample tray (19) arranged on the connection component (4), and a sample fixing component (6) is arranged on the sample tray (19).
7. The electric tilting sample stage for ion beam processing test according to claim 1, characterized in that: The sample fixing component (6) comprises a connecting piece (20) arranged on the sample storage component (5), and a plurality of connecting spring pieces (21) are arranged on the connecting piece (20).
8. The electric tilting sample stage for ion beam processing test according to claim 5, characterized in that: The auxiliary pressing component (7) includes an auxiliary pressing plate (22) arranged above the sample fixing component (6), and the auxiliary pressing plate (22) is fixed to the sample storage component (5) by a fixing screw (23). The insulating component (8) includes an insulating pad (24) arranged on the main mounting component (1).
9. The electric tilting sample stage for ion beam processing test according to claim 8, characterized in that: The electric tilting sample stage is connected to a controller (25), and the controller (25) includes an all-solid-state battery (26), an electric level (27), a control unit (28), a motor drive (29), and a display (30). The two terminals of the angle-controlling piezoelectric motor (17) are respectively connected to the two poles of the motor drive (29), the electrode (9) is connected to the negative pole of the electric level (27), and the main mounting support (10) is connected to the positive pole of the electric level (27).
10. A method for using an electrically tiltable sample stage for ion beam processing testing as claimed in any one of claims 1 to 9, characterized in that: The following steps are involved: Step 1: The copper mesh support is pressed onto the sample holder (19) by connecting the spring sheet (21), the sample storage component (5) is vertically connected to the auxiliary mounting component (2), and the electric tilting sample stage is placed into a focused ion beam-electron beam dual beam system (FIB). At the same time, the sample is also fixed on the sample stage of the FIB equipment. The sample is processed by FIB, and the sample slice is extracted and welded on the copper mesh support, and then thinned. The thickness of the thin area is about 100nm; Step 2: Move the sample stage, move the electrode (9) to below the electron beam, irradiate the electrode (9) with the electron beam, give a negative voltage signal to the level (27), the level (27) outputs a signal to the control unit (28), the control unit (28) controls the motor drive (29), the motor drive (29) drives the angle control piezoelectric motor (17) to rotate, and the angle control piezoelectric motor (17) drives the sample holder (19) to rotate to the angle required for the TKD test; Step 3: Move the sample holder (19), observe through the electron beam and move the sample to a suitable position; then move the EBSD probe to a suitable position; and perform a transmission beam EBSD test.
Citation Information
Patent Citations
Sample platform and microscope system
CN104183453A
A device for using ion beam sample processing interface to realize bear dispersion
CN200982932Y