Annealing device

Abstract

The invention provides an annealing device which comprises a heat transfer base provided with a heat transfer runner, and the upper surface of the heat transfer base forms a supporting surface for supporting a material to be annealed; the heating part is provided with a heating cavity, and the heating part can contain and heat a heat transfer medium; and the circulating flow channel is connected between the heat transfer base and the heating part and communicates with the heat transfer flow channel and the heating cavity, so that the heat transfer medium flows between the heat transfer flow channel and the heating cavity. According to the technical scheme of the invention, the problem of non-uniform crystal distribution in the perovskite thin film in the prior art can be effectively solved.

Description

Technical Field

[0001] The present invention relates to the technical field of solar cells, and in particular to an annealing device. Background Art

[0002] Building a clean, renewable new energy system is the premise for ensuring the sustainable and stable development of my country's economy and science and technology. As a new type of high-efficiency energy battery, solar cells have received widespread attention.

[0003] Perovskite solar cells are solar cells that use perovskite-type organic metal halide semiconductors in the form of thin films as light-absorbing materials. They have the characteristics of high carrier mobility, adjustable band gap, simple preparation and synthesis process, and low cost. When preparing perovskite thin films, an annealing device is usually used. In the annealing devices in related technologies, infrared heating is often used to heat the perovskite precursor to be annealed, and a perovskite film is formed after annealing. However, the perovskite film formed in this way is prone to uneven crystal distribution. Summary of the invention

[0004] The main purpose of the present invention is to provide an annealing device to solve the problem of uneven crystal distribution in the perovskite film in the related art.

[0005] In order to achieve the above-mentioned purpose, the present invention provides an annealing device, comprising: a heat transfer base, having a heat transfer flow channel, the upper surface of the heat transfer base forming a supporting surface for supporting the material to be annealed; a heating part, having a heating cavity, the heating part can accommodate and heat a heat transfer medium; a circulation flow channel, connected between the heat transfer base and the heating part and connecting the heat transfer flow channel and the heating cavity, so that the heat transfer medium flows between the heat transfer flow channel and the heating cavity.

[0006] Furthermore, the heat transfer channel includes a first coil, which is formed by coiling around the vertical axis of the heat transfer base, and the outer contour of the first coil coincides with the outer contour of the cross section of the heat transfer base.

[0007] Furthermore, the heat transfer channel also includes a second coil, which is staggered with the first coil in the vertical direction, and is formed by coiling around the vertical axis of the heat transfer base. The circulation channel includes a first channel and a second channel. The heat transfer medium flows from the heating chamber to the heat transfer channel through the first channel, and the heat transfer medium flows from the heat transfer channel to the heating chamber through the second channel. The inlet of the second coil is located on the outside of the outlet of the second coil, and the outlet of the first coil is located on the outside of the inlet of the first coil. The inlet of the first coil and the inlet of the second coil are both connected to the first channel, and the outlet of the first coil and the outlet of the second coil are both connected to the second channel.

[0008] Furthermore, the annealing device also includes a first cover body and a negative pressure pump. The first cover body is provided with a plurality of air ducts, the air ducts extend in a vertical direction, and the air ducts are connected to the negative pressure pump.

[0009] Furthermore, a filter is provided on the circulation channel to filter the heat transfer medium; and / or a telescopic structure is provided at the bottom of the heat transfer base to adjust the distance between the material to be annealed and the air duct.

[0010] Furthermore, the annealing device also includes a transport structure and a blowing part arranged upstream of the heat transfer base, the transport structure is arranged between the blowing part and the heat transfer base to transport the material to be annealed, and the blowing part can blow air into the material to be annealed to promote the volatilization of the solvent in the material to be annealed.

[0011] Furthermore, the blowing part includes a second cover body, a fan and a first air guide plate, an installation cavity is formed between the first air guide plate and the second cover body, the fan is arranged in the installation cavity, and a plurality of air outlet holes are penetrated on the first air guide plate.

[0012] Furthermore, the blowing part also includes a second air guide plate arranged in the installation cavity, the second air guide plate is located above the first air guide plate, the second air guide plate includes a plate body and a plurality of air guide plate groups, a plurality of through holes are penetrated through the plate body, the plurality of through holes and the plurality of air guide plate groups are arranged in a one-to-one correspondence, the air guide plate group is arranged at the through hole, the air guide plate group includes a first plate and a second plate arranged relatively, and the distance between the first plate and the second plate gradually decreases in the direction away from the through hole.

[0013] Furthermore, the blowing part also includes a drying layer arranged in the installation cavity.

[0014] Further, a one-way valve is provided on the second flow channel to prevent the heat transfer medium from flowing in the second flow channel from the heating chamber to the heat transfer flow channel; and / or a circulation pump is provided on the first flow channel.

[0015] By applying the technical solution of the present invention, the upper surface of the heat transfer base forms a supporting surface for supporting the material to be annealed. During annealing, the material to be annealed is placed on the supporting surface. The heating part has a heating cavity, which can accommodate and heat the heat transfer medium. The circulation channel is connected between the heat transfer base and the heating part and connects the heat transfer channel and the heating cavity, so that the heat transfer medium flows between the heat transfer channel and the heating cavity. That is to say, the heat transfer medium can flow from the heating cavity to the heat transfer channel and can also flow from the heat transfer channel to the heating cavity and form a flow circulation between the heating cavity and the heat transfer channel. During annealing, the heating part heats the heat transfer medium in the heating cavity, and then The heat transfer medium flows into the heat transfer channel through the circulation channel, and the heat of the heat transfer medium is transferred to the heat transfer base, and the heat is then transferred to the material to be annealed through the heat transfer base, thereby heating the material to be annealed. After the heat of the heat transfer medium is reduced, it flows back to the heating part through the circulation channel for reheating, thereby realizing the continuous use of the heat transfer medium. Since each part of the material to be annealed in the horizontal direction can contact the support surface, each part of the material to be annealed in the horizontal direction can be heated, so that the material to be annealed is heated uniformly, and then the crystal distribution in the perovskite film formed after annealing is relatively uniform. Therefore, the technical solution of the present application can effectively solve the problem of uneven crystal distribution in the perovskite film in the related art. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The drawings constituting a part of the present application are used to provide a further understanding of the present invention. The exemplary embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation of the present invention. In the drawings:

[0017] Figure 1 A three-dimensional structural schematic diagram showing a partial structure of an embodiment of an annealing device according to the present invention;

[0018] Figure 2 Shows Figure 1 Schematic diagram of the heat transfer base of the annealing device;

[0019] Figure 3 Shows Figure 1 A cross-sectional schematic diagram of a first cover body and an air duct of an annealing device;

[0020] Figure 4 Shows Figure 1 A schematic cross-sectional view of a blowing portion of an annealing device.

[0021] The above drawings include the following reference numerals:

[0022] 10. Heat transfer base; 11. Heat transfer channel;

[0023] 20. Heating unit;

[0024] 30. Circulation channel; 31. First channel; 32. Second channel;

[0025] 41. first housing; 42. negative pressure pump; 43. air duct;

[0026] 50. Blowing part; 51. Second cover body; 511. Installation cavity; 52. Fan; 53. First air guide plate; 531. Air outlet; 54. Second air guide plate; 541. Plate body; 542. Air guide plate group; 5421. First plate; 5422. Second plate; 543. Through hole; 55. Drying layer;

[0027] 61. One-way valve; 62. Circulation pump. DETAILED DESCRIPTION

[0028] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments. The following description of at least one exemplary embodiment is actually only illustrative and is by no means intended to limit the present invention and its application or use. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0029] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit the exemplary embodiments according to the present application. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should be understood that when the terms "comprise" and / or "include" are used in this specification, it indicates the presence of features, steps, operations, devices, components and / or combinations thereof.

[0030] Unless otherwise specifically stated, the relative arrangement, numerical expressions and numerical values ​​of the parts and steps set forth in these embodiments do not limit the scope of the present invention. Meanwhile, it should be understood that, for ease of description, the sizes of the various parts shown in the accompanying drawings are not drawn according to the actual proportional relationship. The technology, method and equipment known to those of ordinary skill in the relevant art may not be discussed in detail, but in appropriate cases, the technology, method and equipment should be considered as a part of the specification. In all examples shown and discussed here, any specific value should be interpreted as being merely exemplary, rather than as a limitation. Therefore, other examples of exemplary embodiments may have different values. It should be noted that similar reference numerals and letters represent similar items in the following drawings, and therefore, once a certain item is defined in an accompanying drawing, it does not need to be further discussed in subsequent drawings.

[0031] like Figure 1As shown, the present application provides an annealing device, and an embodiment of the annealing device of the present application includes: a heat transfer base 10, a heating part 20, and a circulation channel 30. The heat transfer base 10 has a heat transfer channel 11, and the upper surface of the heat transfer base 10 forms a supporting surface for supporting the material to be annealed; the heating part 20 has a heating cavity, and the heating part 20 can accommodate and heat a heat transfer medium; the circulation channel 30 is connected between the heat transfer base 10 and the heating part 20 and connects the heat transfer channel 11 and the heating cavity, so that the heat transfer medium flows between the heat transfer channel 11 and the heating cavity.

[0032] By applying the technical solution of this embodiment, the upper surface of the heat transfer base 10 forms a support surface for supporting the material to be annealed. During annealing, the material to be annealed is placed on the support surface. The heating portion 20 has a heating cavity. The heating portion 20 can accommodate and heat the heat transfer medium. The circulation channel 30 is connected between the heat transfer base 10 and the heating portion 20 and connects the heat transfer channel 11 with the heating cavity, so that the heat transfer medium flows between the heat transfer channel 11 and the heating cavity. That is, the heat transfer medium can flow from the heating cavity to the heat transfer channel 11 and can also flow from the heat transfer channel 11 to the heating cavity and form a flow cycle between the heating cavity and the heat transfer channel 11. During annealing, the heating portion 20 heats the heat transfer medium in the heating cavity. The heat transfer medium is heated, and then flows into the heat transfer channel 11 through the circulation channel 30. The heat of the heat transfer medium is transferred to the heat transfer base 10, and the heat is then transferred to the material to be annealed through the heat transfer base 10, thereby heating the material to be annealed. After the heat of the heat transfer medium is reduced, it flows back to the heating part 20 through the circulation channel 30 for reheating, thereby realizing the continuous use of the heat transfer medium. Since each part of the material to be annealed in the horizontal direction can contact the support surface, each part of the material to be annealed in the horizontal direction can be heated, so that the material to be annealed is evenly heated, and then the crystal distribution in the perovskite film formed after annealing is more uniform. Therefore, the technical solution of this embodiment can effectively solve the problem of uneven crystal distribution in the perovskite film in the related art.

[0033] It should be noted that, in this embodiment, the material to be annealed is a perovskite precursor, that is, a perovskite solution. The perovskite precursor is distributed on a glass substrate by spin coating, and then after annealing, a perovskite film is formed on the glass substrate. The heat transfer medium is heat transfer oil.

[0034] like Figure 1As shown, the heat transfer channel 11 includes a first coil, which is formed by coiling around the vertical axis of the heat transfer base 10, and the outer contour of the first coil coincides with the outer contour of the cross section of the heat transfer base 10. Such an arrangement enables the heat transfer medium to have a larger contact area with the heat transfer base 10 when flowing in the first coil, so that all parts of the material to be annealed placed on the heat transfer base 10 can be heated, and avoids the situation where some areas are insufficiently in contact with the heat transfer medium and the heat transfer effect is poor.

[0035] like Figure 1 and Figure 2 As shown, the heat transfer channel 11 also includes a second coil, which is staggered with the first coil in the vertical direction, and is formed by coiling around the vertical axis of the heat transfer base 10. The circulation channel 30 includes a first channel 31 and a second channel 32. The heat transfer medium flows from the heating chamber to the heat transfer channel 11 through the first channel 31, and the heat transfer medium flows from the heat transfer channel 11 to the heating chamber through the second channel 32. The inlet of the second coil is located on the outside of the outlet of the second coil, and the outlet of the first coil is located on the outside of the inlet of the first coil. The inlet of the first coil and the inlet of the second coil are both connected to the first channel 31, and the outlet of the first coil and the outlet of the second coil are both connected to the second channel 32. Specifically, the first flow channel 31 and the second flow channel 32 are isolated from each other. The setting of the first flow channel 31 allows the heat transfer medium to flow from the heating chamber to the heat transfer flow channel 11, and the setting of the second flow channel 32 allows the heat transfer medium to flow from the heat transfer flow channel 11 to the heating chamber, thereby forming a circulating flow of the heat transfer medium. The outlet of the first coil is located on the outside of the inlet of the first coil, that is, in the flow direction of the heat transfer medium, the first coil is wound from the inside to the outside, and the heat transfer medium also flows from the inside to the outside in the first coil. The inlet of the second coil is located on the outside of the outlet of the second coil, that is, in the flow direction of the heat transfer medium, the second coil is wound from the outside to the inside, and the heat transfer medium also flows from the outside to the inside in the second coil. Due to the flow of the heat transfer medium Heat will be continuously released during the movement, which means that the heat of the heat transfer medium at the outlet of the heat transfer channel 11 will be less than the heat of the heat transfer medium at the inlet of the heat transfer channel 11. This will cause uneven heating of various areas of the heat transfer base 10, so that the second coil and the first coil are staggered in the vertical direction, so that the outlet of the first coil and the inlet of the second coil are correspondingly arranged and are both on the outside of the heat transfer base 10 in the radial direction, and the inlet of the first coil and the outlet of the second coil are correspondingly arranged and are both on the inside of the heat transfer base 10 in the radial direction. In this way, the heat transferred to the material to be annealed from both the inside and the outside of the heat transfer base 10 is roughly the same, which further ensures that the material to be annealed is heated evenly.

[0036] like Figure 3As shown, the annealing device further includes a first cover body 41 and a negative pressure pump 42. A plurality of air ducts 43 are provided on the first cover body 41. The air ducts 43 extend in a vertical direction and are connected to the negative pressure pump 42. Specifically, during the annealing process of the perovskite film, the solvent in the perovskite film will volatilize, and the volatilization paths of the solvent in different regions are different, so that the crystal distribution in the finally formed perovskite film is uneven. The air duct 43 extends in the vertical direction and is connected to the negative pressure pump 42, so that negative pressure is formed above the perovskite precursor. The solvent in the perovskite film will enter the negative pressure wind field vertically upward, that is, the solvent in each area will evaporate vertically upward. The process of the solvent evaporating vertically upward will also assist the perovskite film to crystallize along the vertical direction to form vertical grains. The grain boundaries of the vertical grains are also vertical, and the transmission direction of the carriers is perpendicular to the direction of sunlight. Therefore, the vertical grain boundaries have less hindering effect on the carriers, thereby improving the carrier transmission efficiency and the photoelectric conversion efficiency of the perovskite solar cell.

[0037] In addition, in this embodiment, a filter is provided on the circulation channel 30 to filter the heat transfer medium. Specifically, the heat transfer oil may be cracked or polymerized during the heating process, resulting in coking and carbon deposition. In order to prevent the above impurities from affecting the annealing effect, a filter is provided to filter the impurities in the heat transfer medium.

[0038] In addition, in this embodiment, a telescopic structure is provided at the bottom of the heat transfer base 10 to adjust the distance between the material to be annealed and the air duct 43. Specifically, the telescopic structure can be mutually nested telescopic rods, or a telescopic motor, and the telescopic structure can raise or lower the height of the heat transfer base 10 to adjust the distance between the material to be annealed and the air duct 43, thereby better controlling the effect of the negative pressure wind field on the formation of the perovskite film, on the one hand, avoiding the distance between the material to be annealed and the air duct 43 being too small to affect the growth of the grains, and on the other hand, avoiding the distance between the material to be annealed and the air duct 43 being too large to make the negative pressure wind field unable to guide the volatilization of the solvent.

[0039] like Figure 4 As shown, in this embodiment, the annealing device further includes a transport structure and a blowing section 50 disposed upstream of the heat transfer base 10. The transport structure is disposed between the blowing section 50 and the heat transfer base 10 to transport the material to be annealed. The blowing section 50 can blow air to the material to be annealed to reduce the water content of the material to be annealed. Specifically, the transport structure can be a transmission belt, and the transport structure can transfer the material to be annealed at the blowing section 50 to the heat transfer base 10. Before the material to be annealed is transferred to the heat transfer base 10 for annealing, the blowing section 50 can blow air to the material to be annealed to promote the volatilization of the solvent in the material to be annealed, thereby effectively accelerating the formation of the perovskite film.

[0040] like Figure 4 As shown, the blowing part 50 includes a second cover body 51, a fan 52 and a first air guide plate 53. An installation cavity 511 is formed between the first air guide plate 53 and the second cover body 51. The fan 52 is arranged in the installation cavity 511. A plurality of air outlet holes 531 are provided through the first air guide plate 53. Specifically, the second cover body 51 is provided above the material to be annealed, the fan 52 can generate an overall downward airflow, and a plurality of air outlet holes 531 are provided through the first air guide plate 53, so that there are more airflow outlets, ensuring that the solvent in each area of ​​the material to be annealed can be promoted to volatilize.

[0041] like Figure 4 As shown, the blowing part 50 also includes a second air guide plate 54 disposed in the mounting cavity 511, the second air guide plate 54 is located above the first air guide plate 53, the second air guide plate 54 includes a plate body 541 and a plurality of air guide plate groups 542, a plurality of through holes 543 are provided through the plate body 541, the plurality of through holes 543 and the plurality of air guide plate groups 542 are provided one-to-one, the air guide plate groups 542 are provided at the through holes 543, the air guide plate groups 542 include a first plate 5421 and a second plate 5422 which are arranged opposite to each other, and the distance between the first plate 5421 and the second plate 5422 gradually decreases in the direction away from the through holes 543. Specifically, with such an arrangement, the air guide plate group 542 in the second air guide plate 54 can first guide the airflow generated by the fan 52, so that the flow direction of the airflow is vertically downward, so as to prevent the airflows of different directions from affecting the distribution of substances in the material to be annealed.

[0042] like Figure 4 As shown, the blowing part 50 also includes a drying layer 55 disposed in the mounting cavity 511. Specifically, the drying layer 55 is located above the second air guide plate 54, and the drying layer 55 can absorb moisture in the airflow, thereby making the airflow relatively dry, thereby ensuring that the airflow can promote the volatilization of the solvent of the material to be annealed.

[0043] like Figure 1 As shown, a one-way valve 61 is provided on the second flow channel 32 to prevent the heat transfer medium from flowing from the heating chamber to the heat transfer flow channel 11 in the second flow channel 32. Such a configuration enables the heat transfer medium to flow in the circulation flow channel 30 in one direction.

[0044] like Figure 1 As shown, a circulation pump 62 is provided on the first flow channel 31. Specifically, the circulation pump 62 can promote the heat transfer medium to flow smoothly in the circulation flow channel 30.

[0045] In addition, in this embodiment, the heating unit 20 further includes a temperature detection member, which can detect the temperature of the heat transfer medium in the heating chamber. When the temperature of the heat transfer medium is lower than the preset temperature value, the heating unit 20 is made to continue to heat the heat transfer medium until the preset temperature is reached. When the temperature of the heat transfer medium is equal to the preset temperature, the heating unit 20 is made to be in a suitable working state to keep the heat transfer medium at the current temperature.

[0046] In the description of the present invention, it is necessary to understand that the directions or positional relationships indicated by directional words such as "front, back, up, down, left, right", "lateral, vertical, perpendicular, horizontal" and "top, bottom" are usually based on the directions or positional relationships shown in the drawings. They are only for the convenience of describing the present invention and simplifying the description. Unless otherwise specified, these directional words do not indicate or imply that the devices or elements referred to must have a specific direction or be constructed and operated in a specific direction. Therefore, they cannot be understood as limiting the scope of protection of the present invention. The directional words "inside and outside" refer to the inside and outside relative to the contours of each component itself.

[0047] For ease of description, spatially relative terms such as "above", "above", "on the upper surface of", "above", etc. may be used here to describe the spatial positional relationship between a device or feature and other devices or features as shown in the figure. It should be understood that spatially relative terms are intended to include different orientations of the device in use or operation in addition to the orientation described in the figure. For example, if the device in the accompanying drawings is inverted, the device described as "above other devices or structures" or "above other devices or structures" will be positioned as "below other devices or structures" or "below other devices or structures". Thus, the exemplary term "above" can include both "above" and "below". The device can also be positioned in other different ways (rotated 90 degrees or in other orientations), and the spatially relative descriptions used here are interpreted accordingly.

[0048] In addition, it should be noted that the use of terms such as "first" and "second" to limit components is only for the convenience of distinguishing the corresponding components. If not otherwise stated, the above terms have no special meaning and therefore cannot be understood as limiting the scope of protection of the present invention.

[0049] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. An annealing device, characterized in that: include: A heat transfer base (10) having a heat transfer channel (11), wherein the upper surface of the heat transfer base (10) forms a support surface for supporting the material to be annealed; A heating part (20) having a heating chamber, wherein the heating part (20) is capable of accommodating and heating a heat transfer medium; A circulation channel (30) is connected between the heat transfer base (10) and the heating portion (20) and communicates between the heat transfer channel (11) and the heating chamber, so that the heat transfer medium flows between the heat transfer channel (11) and the heating chamber.

2. The annealing device according to claim 1, characterized in that: The heat transfer channel (11) comprises a first coil, which is formed by coiling around the vertical axis of the heat transfer base (10), and the outer contour of the first coil coincides with the outer contour of the cross section of the heat transfer base (10).

3. The annealing device according to claim 2, characterized in that: The heat transfer channel (11) further comprises a second coil, the second coil and the first coil are arranged in a staggered manner in the vertical direction, the second coil is formed by being coiled around the vertical axis of the heat transfer base (10), the circulation channel (30) comprises a first channel (31) and a second channel (32), the heat transfer medium flows from the heating chamber to the heat transfer channel (11) through the first channel (31), and the heat transfer medium flows from the heat transfer channel (11) to the heating chamber through the second channel (32), the inlet of the second coil is located outside the outlet of the second coil, the outlet of the first coil is located outside the inlet of the first coil, the inlet of the first coil and the inlet of the second coil are both connected to the first channel (31), and the outlet of the first coil and the outlet of the second coil are both connected to the second channel (32).

4. The annealing device according to claim 1, characterized in that: The annealing device further comprises a first cover body (41) and a negative pressure pump (42); a plurality of air ducts (43) are arranged on the first cover body (41); the air ducts (43) extend along the vertical direction; and the air ducts (43) are connected to the negative pressure pump (42).

5. The annealing device according to claim 4, characterized in that: The circulation channel (30) is provided with a filter to filter the heat transfer medium; and / or, The bottom of the heat transfer base (10) is provided with a telescopic structure to adjust the distance between the material to be annealed and the air duct (43).

6. The annealing device according to any one of claims 1 to 5, characterized in that: The annealing device further comprises a transport structure and an air blowing section (50) arranged upstream of the heat transfer base (10); the transport structure is arranged between the air blowing section (50) and the heat transfer base (10) to transport the material to be annealed; the air blowing section (50) is capable of blowing air toward the material to be annealed to promote the volatilization of a solvent in the material to be annealed.

7. The annealing device according to claim 6, characterized in that: The blowing portion (50) comprises a second cover body (51), a fan (52) and a first air guide plate (53); an installation cavity (511) is formed between the first air guide plate (53) and the second cover body (51); the fan (52) is arranged in the installation cavity (511); and a plurality of air outlet holes (531) are penetrated through the first air guide plate (53).

8. The annealing device according to claim 7, characterized in that: The blowing portion (50) also includes a second air guide plate (54) arranged in the installation cavity (511), the second air guide plate (54) is located above the first air guide plate (53), the second air guide plate (54) includes a plate body (541) and a plurality of air induction plate groups (542), a plurality of through holes (543) are penetrated through the plate body (541), the plurality of through holes (543) and the plurality of air induction plate groups (542) are arranged in a one-to-one correspondence, the air induction plate group (542) is arranged at the through hole (543), the air induction plate group (542) includes a first plate (5421) and a second plate (5422) arranged opposite to each other, and the distance between the first plate (5421) and the second plate (5422) gradually decreases in a direction away from the through hole (543).

9. The annealing device according to claim 7, characterized in that: The air blowing portion (50) further comprises a drying layer (55) arranged in the installation cavity (511).

10. The annealing device according to claim 3, characterized in that: A one-way valve (61) is provided on the second flow channel (32) to prevent the heat transfer medium from flowing in the second flow channel (32) from the heating chamber to the heat transfer flow channel (11); and / or, A circulation pump (62) is provided on the first flow channel (31).

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