Device and method for repairing defects of photoetching mask

Abstract

The invention relates to the technical field of photolithography masks, and discloses a photolithography mask defect repairing device and a photolithography mask defect repairing method, and the photolithography mask defect repairing device comprises a machine body; the two mounting frames are symmetrically arranged on the machine body; the two fixing blocks are symmetrically and fixedly mounted on the two mounting frames respectively; the servo motor is fixedly mounted on one mounting frame; the transmission wheel I is rotationally arranged at the output end of the servo motor in a sleeving manner; the half gear is fixedly mounted on the side wall of the fixed block; compared with the prior art, the mask plate cleaning device has the advantages that the worm and the half gear are matched with the telescopic rod, the mask plate is completely immersed into the cleaning tank for chemical cleaning, self-locking at any position can be achieved, it is ensured that the mask plate is stably clamped, the cleaning effect is improved, and after cleaning is completed, the mask plate can be cleaned conveniently. Reverse rotation of the servo motor can drive the telescopic rod and the clamping assembly to be lifted back to the horizontal position, liquid drops on the mask plate are spin-dried through the centrifugal effect of driving the clamping assembly to rotate, and cleanliness of the mask pattern position of the mask plate is further guaranteed.

Description

Technical Field

[0001] The present invention relates to the technical field of photolithography mask plates, and in particular to a device and a method for repairing defects of photolithography mask plates. Background Art

[0002] The photolithography mask is a graphic transfer master in the microelectronics manufacturing process. It plays a key role in the production and manufacturing process of flat panel display, semiconductor, touch screen, circuit board and other industries. It realizes mass production by transferring the designer's circuit graphics to the substrate or wafer of the downstream industry through exposure. Its accuracy and quality will directly affect the quality rate of the final downstream products. As the benchmark and blueprint for photolithography replication graphics, the mask is the key to connecting industrial design and process manufacturing. It has an irreplaceable position and role in semiconductor processing and micro-nano manufacturing. Mask defects can be divided into many types according to their causes, including soft defects and hard defects, among which hard defects include substrate defects, lack of metal chromium defects and excess metal chromium defects. Soft defects: fingerprints, particles, water stains, residual glue, etc.

[0003] After searching, the Chinese patent with publication number CN117644074A discloses a mask cleaning method, device, terminal equipment and storage medium, including performing a dirty detection on the mask through the optical inspection system to obtain the detection result; generating a cleaning process according to the detection result, and obtaining the cleaning parameters according to the cleaning process; inputting the cleaning parameters into the logic controller, controlling the mask tray to rotate through the logic controller, and controlling the spraying device to clean the mask to obtain the cleaning result. The present invention solves the problem that there is no corresponding cleaning process and cleaning parameters when cleaning the mask, resulting in incomplete cleaning, and improves the efficiency of mask cleaning. However, the solution still has the following shortcomings in actual use: After cleaning, there is often a certain amount of moisture or cleaning fluid remaining on the surface of the mask, which not only keeps the mask moist, but also increases the risk of it absorbing dust and impurities in the air, which may lead to secondary contamination during subsequent use. In the precision process of photolithography, any moisture or impurities on the surface of the mask may have an adverse effect on the adhesion of the photoresist and the precise transfer of the pattern, thereby affecting the quality and performance of the final product. However, in actual operation, the drying process is usually time-consuming and relatively inefficient. In addition, special care must be taken during the transfer of the mask to avoid introducing new sources of pollution due to improper operation. How to improve the drying efficiency while ensuring the drying effect and effectively prevent secondary contamination throughout the process is a key technical issue in the process of repairing soft defects in the mask.

[0004] Therefore, it is necessary to design a device and a method for repairing photolithography mask defects to solve the above problems. Summary of the invention

[0005] The purpose of the present invention is to solve the shortcomings in the prior art and to propose a device and a method for repairing photolithography mask defects.

[0006] In order to achieve the above object, the present invention adopts the following technical solutions: The device for repairing defects of a photolithography mask comprises: Body; Two mounting frames are symmetrically arranged on the machine body; Two fixing blocks are symmetrically fixedly mounted on the two mounting frames respectively; A servo motor is fixedly mounted on one of the mounting frames, and an output end of the servo motor passes through one of the fixing blocks and is rotatably connected to the fixing block; A transmission wheel 1, rotatably mounted on an output end of the servo motor; A half gear, fixedly mounted on the side wall of the fixed block; A worm gear rack, fixedly mounted on the top surface of the fixed block; A worm, rotatably mounted on the worm frame; A second transmission wheel is fixedly mounted on one end of the worm; A synchronous belt 1, mounted on the transmission wheel 1 and the transmission wheel 2; a face gear rotatably mounted on the half gear and arranged concentrically with the half gear, the face gear meshing with the worm; A connecting block, fixedly mounted on the side wall of the face gear; A driven gear, rotatably mounted on the connecting block and meshing with the half gear; A drying component, arranged on the mounting frame; A dustproof component, arranged on the servo motor; Wherein, a safety coupling is arranged between the transmission wheel 1 and the output shaft of the servo motor.

[0007] As a preferred technical solution of the present invention, the drying component comprises: Two hinges are rotatably mounted on the two fixed blocks respectively; A guide plate, fixedly mounted on the driven gear; Two telescopic rods, one end of which is fixedly mounted on the hinge, and one of the telescopic rods passes through the guide plate and is rotatably connected to the guide plate; A limit plate, fixedly mounted on the upper top surface of the hinge near the servo motor; Two clamping assemblies are respectively arranged at the other ends of the two telescopic rods; A vibration assembly, arranged on the mounting frame; A drainage assembly, arranged on the mounting frame; Wherein, a safety coupling is arranged between one of the hinges close to the servo motor and the output shaft of the servo motor.

[0008] As a preferred technical solution of the present invention, the clamping assembly comprises: A bottom plate, hinged to an end of the telescopic rod away from the mounting frame; A rotating shaft frame, fixedly mounted on the top surface of the bottom plate; A rotating shaft, rotatably mounted on the rotating shaft frame; A pressing plate, fixedly mounted on the rotating shaft; A torsion spring, which is sleeved on the rotating shaft and has two ends fixedly connected to the rotating shaft and the rotating shaft frame respectively; Wherein, two symmetrical telescopic plates are fixedly installed between the two bottom plates.

[0009] As a preferred technical solution of the present invention, the vibration component includes: Two sets of fixing plates are symmetrically fixedly mounted on the machine body at positions on both sides of the two mounting frames; A cam, mounted on the output end of the servo motor; A plurality of buffer springs are fixedly mounted between the fixing plate and the mounting frame and are distributed in a linear array; A guide groove is provided on the body; A guide block, fixedly mounted on the bottom of the mounting frame and adapted to the guide groove; Wherein, the mounting frame is slidably connected to the machine body, and the cam is connected to the output end of the servo motor via a one-way bearing.

[0010] As a preferred technical solution of the present invention, the drainage component includes: A mounting block, fixedly mounted on the mounting frame; A piston rod, fixedly mounted on the mounting block, the piston rod passing through the fixing plate and being slidably connected to the fixing plate; A sealing box, slidably sleeved on the piston rod and fixedly connected to the fixing plate; A gas tank, fixedly mounted at one end of the sealing box; An air pipe, fixedly installed between the sealing box and the bottom plate; Wherein, the air pipe and the sealing box are connected via a one-way valve, and the sealing box and the gas tank are connected via a one-way valve.

[0011] As a preferred technical solution of the present invention, the bottom plate and the pressing plate are both provided with a plurality of air holes distributed in a linear array, and the directions of the air holes are distributed in a fan shape with the hinge as the origin.

[0012] As a preferred technical solution of the present invention, a dust cover is provided on the machine body, and a movable door is provided on the dust cover.

[0013] As a preferred technical solution of the present invention, the dustproof component includes: A transmission wheel three is fixedly mounted on the cam; A fixing frame, fixedly installed between a group of the fixing plates; An impeller shaft passes through the fixing frame and is rotatably connected to the fixing frame; An impeller, fixedly mounted on the impeller shaft; An air guide cover, fixedly mounted on the dust cover and sleeved with the impeller; A second synchronous belt, mounted on the impeller shaft and the transmission wheel three; An air guide pipe is rotatably mounted on one end of the impeller away from the impeller shaft, and the other end of the air guide pipe is fixedly connected to another set of fixing frames; Wherein, an air inlet is provided at the bottom of the air guide pipe.

[0014] As a preferred technical solution of the present invention, the upper top surface of the pressing plate is a magnetic surface, and a magnetic plate adapted to the pressing plate is fixedly mounted on the hinge.

[0015] The method for repairing defects of a photolithography mask comprises the following steps: Step 1: The pressure plate is adsorbed on the magnetic plate by magnetic attraction, the mask is placed in the clamping assembly, the pressure plate is released and the edge of the mask is pressed by the torsion spring, and the length of the telescopic rod is adjusted according to the size of the mask to adapt to masks of different sizes; Step 2: Start the servo motor, and drive the worm to rotate through the transmission wheel 1 and the synchronous belt 1. When the worm rotates, it drives the face gear and the driven gear to move downward and rotate, and then drives the clamping assembly and the mask to descend through the guide plate and the telescopic rod. The mask is lowered and immersed in the cleaning tank in the machine body, and washed and decontaminated with chemical cleaning agents such as hydrogen peroxide and sulfuric acid, and then rinsed with deionized water; Step 3: The servo motor reverses, driving the worm to reverse, and then driving the driven gear to rotate and lift the telescopic rod and the clamping assembly to a horizontal position. When the telescopic rod is in a horizontal position, the limit plate limits the hinge. At this time, the servo motor drives the hinge to rotate through the safety coupling, and then drives the telescopic rod and the clamping assembly to rotate, so that the mask rotates for drying; Step 4: The output shaft of the servo motor drives the cam to rotate, and through the action of the fixed plate and the buffer spring, the mounting frame drives the mask to vibrate, and the droplets gathered on the mask due to the rotation are shaken off. At the same time, the reciprocating motion of the mounting frame drives the piston rod to be repeatedly pulled and drawn, and through the cooperation of the one-way valve, the nitrogen in the gas tank is blown out along the air pipe, and blown from the air hole to the surface of the mask, and the liquid on the mask is blown to the edge of the mask; Step 5: During the drying process, the impeller is driven to rotate by the transmission wheel three and the synchronous belt two. When the impeller rotates, the gas in the air duct is sucked to the center of the impeller and flows into the air hood along the impeller blades, forming a negative pressure in the air duct. After the mask is cleaned and dried, all equipment and valves are closed, and the mask is removed from the clamping assembly to complete the entire decontamination and drying process.

[0016] The present invention has the following beneficial effects: 1. By setting the worm and the half gear, the mask can be completely immersed in the cleaning tank for chemical cleaning in conjunction with the telescopic rod, and can achieve self-locking at any position, ensuring the stable clamping of the mask and improving the cleaning effect. After the cleaning is completed, the reverse rotation of the servo motor can drive the telescopic rod and the clamping assembly to rise back to the horizontal position, and the centrifugal effect of the rotation of the clamping assembly can be used to dry the droplets on the mask, further ensuring the cleanliness of the mask pattern position; 2. By setting the linkage between the cam and the output shaft of the servo motor, and the reciprocating motion of the mounting frame under the action of the guide block and the buffer spring, the vibration effect of the mask is achieved, and the droplets gathered on the mask due to rotation can be shaken off. The reciprocating motion of the mounting frame can also drive the repeated pulling and pulling of the piston rod, which can continuously blow the nitrogen in the gas tank along the air pipe, and through the fan-shaped air holes, the nitrogen can be evenly blown to the surface of the mask and the liquid can be blown to the edge of the mask, which speeds up the drying process, ensures the cleanliness of the mask surface, and avoids secondary contamination of the mask due to too long drying time; 3. By setting the drive wheel three and the synchronous belt two to drive, the impeller rotates, thereby forming a negative pressure in the air duct. This negative pressure environment can effectively attract the air and dust particles in the dust cover to the air duct to prevent them from falling onto the mask, providing effective dust protection for the mask, avoiding secondary contamination after decontamination, ensuring the normal operation of the mask, and then ensuring the accuracy and quality of lithography. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 This is a schematic structural diagram of a device for repairing photolithography mask defects proposed by the present invention; Figure 2 This is a schematic diagram of the internal structure of the device for repairing photolithography mask defects proposed by the present invention; Figure 3 for Figure 2A schematic diagram of the enlarged structure at A in the middle; Figure 4 A schematic diagram of the partial structure of the device for repairing photolithography mask defects proposed by the present invention; Figure 5 This is a schematic diagram of the structure of the adjustment component of the device for repairing photolithography mask defects proposed by the present invention; Figure 6 A schematic diagram of the multi-angle structure of the adjusting component of the device for repairing photolithography mask defects proposed by the present invention; Figure 7 This is a schematic structural diagram of a half gear of a device for repairing photolithography mask defects proposed by the present invention; Figure 8 This is a schematic cross-sectional view of the device for repairing photolithography mask defects proposed by the present invention; Fig. 9 This is a schematic structural diagram of the impeller of the device for repairing photolithography mask defects proposed by the present invention.

[0018] In the figure: 1. body; 2. mounting frame; 21. fixing block; 22. driving wheel 1; 23. synchronous belt 1; 24. driving wheel 2; 25. half gear; 26. driven gear; 27. worm; 28. face gear; 29. ​​connecting block; 3. servo motor; 4. hinge; 41. guide plate; 42. telescopic rod; 43. bottom plate; 44. rotating shaft; 45. pressure plate; 46. torsion spring; 47. telescopic plate; 48. limit plate; 49. magnetic plate; 5. fixing plate; 51. cam; 52. buffer spring; 53. guide block; 6. mounting block; 61. piston rod; 62. sealing box; 63. gas tank; 64. air pipe; 65. air hole; 7. driving wheel 3; 71. fixing frame; 72. impeller; 73. air guide cover; 74. synchronous belt 2; 75. air guide pipe. DETAILED DESCRIPTION

[0019] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments.

[0020] Reference Figure 1-9, a device for repairing defects in a photolithography mask, comprising a body 1; two mounting frames 2, symmetrically arranged on the body 1; two fixed blocks 21, symmetrically fixedly installed on the two mounting frames 2; a servo motor 3, fixedly installed on one mounting frame 2, the output end of the servo motor 3 passes through a fixed block 21 and is rotatably connected to the fixed block 21; a transmission wheel 1 22, rotatably sleeved on the output end of the servo motor 3; a half gear 25, fixedly installed on the side wall of the fixed block 21; a worm rack, fixedly installed on the top surface of the fixed block 21; a worm 27, rotatably installed on the worm rack; a transmission wheel 24, fixedly installed on one end of the worm 27; a synchronous belt 1 23, sleeved on the transmission wheel 1 22 and the transmission wheel 2 24; a face gear 28, rotatably installed on the half gear 25 and concentrically arranged with the half gear 25, and the face gear 28 is meshed with the worm 27; a connecting block 29, Fixedly mounted on the side wall of the face gear 28; the driven gear 26 is rotatably mounted on the connecting block 29 and meshed with the half gear 25; a drying component is arranged on the mounting frame 2; a dustproof component is arranged on the servo motor 3, and the drying component includes: two hinges 4, which are rotatably mounted on the two fixed blocks 21 respectively; a guide plate 41, which is fixedly mounted on the driven gear 26; two telescopic rods 42, one end of which is fixedly mounted on the hinge 4, and one telescopic rod 42 passes through the guide plate 41 and is rotatably connected to the guide plate 41; a limit plate 48, which is fixedly mounted on the upper top surface of the hinge 4 close to the servo motor 3; two clamping components are respectively arranged at the other ends of the two telescopic rods 42; a vibration component is arranged on the mounting frame 2; a drainage component is arranged on the mounting frame 2; wherein a safety coupling is arranged between a hinge 4 close to the servo motor 3 and the output shaft of the servo motor 3;The servo motor 3 drives the transmission wheel 1 22 to rotate, and the transmission wheel 1 22 drives the transmission wheel 2 24 through the synchronous belt 1 23, and then drives the worm 27 to rotate. When the worm 27 rotates, it can drive the face gear 28 to rotate, and then drive the driven gear 26 to move downward and rotate at the same time. Since the half gear 25 is meshed with the driven gear 26 and the half gear 25 is fixed, when the driven gear 26 rotates, it drives the telescopic rod 42 to bend downward through the guide plate 41. Since the two telescopic rods 42 are symmetrically arranged, the two move downward synchronously and the angle between them and the horizontal plane becomes larger. During the process, the extension of the telescopic rod 42 can ensure that the distance between the clamping components remains unchanged, and the mask can be stably clamped. At the same time, the worm 27 can realize self-locking with the face gear 28 to ensure that the mask can remain stationary at a certain position. When the driven gear 26 drives the guide plate 41 to rotate downward, the hinge 4 forms an angle at its own hinge. When the output end of the servo motor 3 drives the hinge 4 to rotate, a large torque will be generated due to the non-horizontal telescopic rod 42. At this time, the safety coupling will cause the output shaft of the servo motor 3 and the part of the hinge 4 connected to it to slide, and the output shaft of the servo motor 3 and the hinge 4 connected thereto will not slide. The hinge 4 will be caused to rotate. When the mask is lowered and immersed in the cleaning tank in the body 1, it can be rinsed with a chemical cleaning agent and then rinsed with deionized water. After cleaning, the servo motor 3 reverses to drive the worm 27 to reverse, thereby driving the driven gear 26 to rotate and simultaneously lifting the telescopic rod 42 and the clamping assembly to a horizontal position. When the telescopic rod 42 is in a horizontal position, the limit plate 48 will limit the hinge 4, and the telescopic rod 42 will not continue to lift upward. At this time, the torque generated by the limiting resistance brought by the limit plate 48 on the transmission wheel 22 slides relative to the output shaft of the servo motor 3. At this time, the output shaft of the servo motor 3 is parallel to the hinge 4, and the rotation torque of the hinge 4 is small. The safety coupling between the output shaft of the servo motor 3 and the hinge 4 can enable the output end of the servo motor 3 to drive the hinge 4 to rotate and then drive the telescopic rod 42 and the clamping assembly to rotate, thereby rotating the mask, which can allow the droplets on the mask to be air-dried and spun dry at the same time, and the droplets move to the edges around the mask under the centrifugal action, thereby ensuring that the graphic position in the center of the mask is clean. ;

[0021] Reference Figure 3The clamping assembly includes: a bottom plate 43, hinged on the end of the telescopic rod 42 away from the mounting frame 2; a rotating shaft frame, fixedly mounted on the top surface of the bottom plate 43; a rotating shaft 44, rotatably mounted on the rotating shaft frame; a pressing plate 45, fixedly mounted on the rotating shaft 44; a torsion spring 46, sleeved on the rotating shaft 44 and fixedly connected to the rotating shaft 44 and the rotating shaft frame at both ends; wherein, two symmetrical telescopic plates 47 are fixedly mounted between the two bottom plates 43, the top surface of the pressing plate 45 is a magnetic surface, and a magnetic plate 49 adapted to the pressing plate 45 is fixedly mounted on the hinge 4; when installing the mask, the pressing plate 45 is fixedly mounted on the rotating shaft 44. The plate 45 is reversed along the rotating shaft 44, and the pressure plate 45 can be adsorbed on the magnetic plate 49 under the attraction of magnetic force. At this time, the mask can be placed on the base plate 43, and the pressure plate 45 is lowered. Under the action of the torsion spring 46, the pressure plate 45 presses the edge of the mask to achieve clamping and fixing of the mask. The telescopic plate 47 between the two pressure plates 45 can adjust the length according to the size of the mask and can transmit the rotation of the base plate 43 to avoid damage to the mask due to torque. The telescopic plate 47 is set at the edge positions on both sides of the base plate 43, and can not block the mask, thereby maximizing the decontamination effect.

[0022] Reference Figure 3 , Figure 4 and Figure 8 The vibration assembly includes: two sets of fixing plates 5, which are symmetrically fixedly mounted on the machine body 1 at the positions on both sides of the two mounting frames 2; a cam 51, which is sleeved on the output end of the servo motor 3; a plurality of buffer springs 52, which are fixedly mounted between the fixing plates 5 and the mounting frames 2 and are distributed in a linear array; a guide groove, which is provided on the machine body 1; a guide block 53, which is fixedly mounted at the bottom of the mounting frame 2 and is adapted to the guide groove; wherein the mounting frame 2 is slidably connected with the machine body 1, and the cam 51 is connected to the output end of the servo motor 3 through a one-way bearing; the cam 51 can be driven by the output shaft of the servo motor 3, and then it will contact with the fixing plate 5 on one side while rotating, and squeeze the mounting frame 2 to slide to one side under the action of the guide block 53, and then reset under the action of the buffer spring 52, and repeat this process to achieve the vibration effect on the mask, which can shake off the droplets gathered on the mask due to rotation, and accelerate the drying process, the cam 51 and the output shaft are connected through a one-way bearing, when the height of the mask is lowered for decontamination, the cam 51 can remain stationary, so that the process of the system putting down the mask remains stable.

[0023] Reference Figure 2-4The drainage assembly includes: a mounting block 6, fixedly mounted on the mounting frame 2; a piston rod 61, fixedly mounted on the mounting block 6, the piston rod 61 passes through the fixing plate 5 and is slidably connected to the fixing plate 5; a sealing box 62, which is slidably mounted on the piston rod 61 and is fixedly connected to the fixing plate 5; a gas tank 63, fixedly mounted on one end of the sealing box 62; an air pipe 64, fixedly mounted between the sealing box 62 and the bottom plate 43; wherein the air pipe 64 and the sealing box 62 are connected by a one-way valve, the sealing box 62 and the air tank 63 are connected by a one-way valve, and the bottom plate 43 and the pressure plate 45 are both A plurality of air holes 65 are provided which are distributed in a linear array, and the directions of the air holes 65 are distributed in a fan shape with the hinge 4 as the origin. When the mounting frame 2 drives the mask to vibrate, the reciprocating motion of the mounting frame 2 can drive the piston rod 61 to be repeatedly pulled and drawn. Through the cooperation of the one-way valve, the piston rod 61 continuously blows out the nitrogen in the gas tank 63 along the air pipe 64, and then blows it toward the mask surface from the air holes 65. The angles of the air holes 65 are distributed in a fan shape with the hinge as the center, so that the liquid on the mask can be blown toward the edge of the mask, which is convenient for shaking off or shaking off the droplets, and can speed up the drying speed.

[0024] Reference Figure 1 , Figure 2 , Figure 4 , Figure 5 and Fig. 9 The machine body 1 is provided with a dust cover, and a movable door is provided on the dust cover. The dust-proof assembly includes: a transmission wheel 3 7, which is fixedly mounted on the cam 51; a fixing frame 71, which is fixedly mounted between a set of fixing plates 5; an impeller shaft, which passes through the fixing frame 71 and is rotatably connected with the fixing frame 71; an impeller 72, which is fixedly mounted on the impeller shaft; an air guide cover 73, which is fixedly mounted on the dust cover and is sleeved with the impeller 72; a synchronous belt 2 74, which is sleeved on the impeller shaft and the transmission wheel 3 7; an air guide duct 75, which is rotatably mounted on one end of the impeller 72 away from the impeller shaft, and the other end of the air guide duct 75 is fixedly connected with another set of fixing frames 71; Among them, an air inlet is opened at the bottom of the air duct 75; the transmission wheel three 7 drives the synchronous belt two 74 to rotate, and then drives the impeller 72 to rotate. The connection between the impeller 72 and one end of the air duct 75 is communicated with the air duct 75. When the impeller 72 rotates, the gas in the air duct 75 can be sucked to the center of the impeller 72 and then flows into the air guide cover 73 along the blades of the impeller 72, so that a negative pressure can be formed in the air duct 75. The environment in the dust cover moves into the air duct 75 under the action of wind pressure, thereby protecting the mask, preventing dust from falling on the mask, ensuring the normal operation of the mask, and thus ensuring the accuracy and quality of lithography.

[0025] The method for repairing defects of a photolithography mask comprises the following steps: Step 1: The pressing plate 45 is attracted to the magnetic plate 49 by magnetic force, the mask is placed in the clamping assembly, the pressing plate 45 is released and the edge of the mask is pressed by the torsion spring 46, and the length of the telescopic rod 42 is adjusted according to the size of the mask to adapt to masks of different sizes; Step 2: Start the servo motor 3, and drive the worm 27 to rotate through the transmission wheel 22 and the synchronous belt 23. When the worm 27 rotates, it drives the face gear 28 and the driven gear 26 to move downward and rotate, and then drives the clamping assembly and the mask to descend through the guide plate 41 and the telescopic rod 42, and the mask is lowered and immersed in the cleaning tank in the body 1, and washed and decontaminated with chemical cleaning agents such as hydrogen peroxide and sulfuric acid, and then rinsed with deionized water; Step 3: The servo motor 3 rotates in reverse, driving the worm 27 to rotate in reverse, and then driving the driven gear 26 to rotate and lift the telescopic rod 42 and the clamping assembly to a horizontal position. When the telescopic rod 42 is in a horizontal position, the limit plate 48 limits the hinge 4. At this time, the servo motor 3 drives the hinge 4 to rotate through the safety coupling, and then drives the telescopic rod 42 and the clamping assembly to rotate, so that the mask rotates to be dried; Step 4: The output shaft of the servo motor 3 drives the cam 51 to rotate, and through the action of the fixed plate 5 and the buffer spring 52, the mounting frame 2 drives the mask to vibrate, and the droplets gathered on the mask due to the rotation are shaken off. At the same time, the reciprocating motion of the mounting frame 2 drives the piston rod 61 to be repeatedly pulled and drawn, and through the cooperation of the one-way valve, the nitrogen in the gas tank 63 is blown out along the gas pipe 64 and blown from the air hole 65 to the surface of the mask, and the liquid on the mask is blown to the edge of the mask; Step 5: During the drying process, the impeller 72 is driven to rotate by the transmission wheel 3 7 and the synchronous belt 2 74. When the impeller 72 rotates, the gas in the air duct 75 is sucked to the center of the impeller 72 and flows into the air duct 73 along the blades of the impeller 72, forming a negative pressure in the air duct 75. After the mask is cleaned and dried, all equipment and valves are closed, and the mask is removed from the clamping assembly to complete the entire decontamination and drying process.

[0026] The specific working principle of the present invention is as follows: When in use, the mask is placed in the clamping assembly and fixed, and the servo motor 3 drives the transmission wheel 1 22 to rotate, and the transmission wheel 1 22 drives the transmission wheel 2 24 through the synchronous belt 1 23, and then drives the worm 27 to rotate. When the worm 27 rotates, it can drive the face gear 28 to rotate, and then drive the driven gear 26 to move downward and rotate at the same time. Since the half gear 25 is engaged with the driven gear 26 and the half gear 25 is fixed, when the driven gear 26 rotates, it drives the telescopic rod 42 to bend downward through the guide plate 41. Since the two telescopic rods 42 are symmetrically arranged, the two move downward synchronously and are aligned with the horizontal plane. As the angle increases, the extension of the telescopic rod 42 can ensure that the distance between the clamping components remains unchanged, and the mask can be stably clamped. At the same time, the worm 27 can achieve self-locking with the face gear 28 to ensure that the mask can remain stationary at a certain position. When the driven gear 26 drives the guide plate 41 to rotate downward, the hinge 4 forms an angle at its own hinge. When the output end of the servo motor 3 drives the hinge 4 to rotate, a large torque will be generated due to the unevenness of the telescopic rod 42. At this time, the safety coupling will cause the output shaft of the servo motor 3 and the part of the hinge 4 connected to it to slide, without causing the hinge 4 to occur. When the mask is lowered and immersed in the cleaning tank in the machine body 1, it can be washed with a chemical cleaning agent such as a chemical hydrogen peroxide (H2O2) and sulfuric acid (H2SO4) in a ratio of 5:1, and then rinsed with deionized water. After washing, the servo motor 3 reverses to drive the worm 27 to reverse, thereby driving the driven gear 26 to rotate and simultaneously lift the telescopic rod 42 and the clamping assembly to a horizontal position. When the telescopic rod 42 is in a horizontal position, the limit plate 48 will limit the hinge 4, and the telescopic rod 42 will not continue to lift upward. At this time, the transmission wheel 22 is limited due to the limit The torque generated by the limiting resistance brought by the positioning plate 48 causes sliding relative to the output shaft of the servo motor 3. At this time, the output shaft of the servo motor 3 is parallel to the hinge 4, and the rotation torque of the hinge 4 is small. The safety coupling between the output shaft of the servo motor 3 and the hinge 4 can make the output end of the servo motor 3 drive the hinge 4 to rotate, and then drive the telescopic rod 42 and the clamping assembly to rotate, so as to rotate the mask, so that the droplets on the mask can be dried by air and spun at the same time, and the droplets move to the edges around the mask under the centrifugal effect, so as to ensure that the graphic position in the center of the mask is clean; When installing the mask, the pressing plate 45 is reversed along the rotating shaft 44, and the pressing plate 45 can be adsorbed on the magnetic plate 49 under the attraction of magnetic force. At this time, the mask can be placed on the bottom plate 43, and the pressing plate 45 is lowered. Under the action of the torsion spring 46, the pressing plate 45 presses the edge of the mask to achieve clamping and fixing of the mask. The telescopic plate 47 between the two pressing plates 45 can adjust the length according to the size of the mask and can transmit the rotation of the bottom plate 43 to avoid damage to the mask due to torque. The telescopic plate 47 is set at the edge positions on both sides of the bottom plate 43, and can not cover the mask, so as to maximize the decontamination effect. When drying, the cam 51 can be driven by the output shaft of the servo motor 3, and then it will contact with the fixed plate 5 on one side while rotating, squeezing the mounting frame 2 to slide to one side under the action of the guide block 53, and then reset under the action of the buffer spring 52, repeating this process to achieve the vibration effect on the mask, which can shake off the droplets gathered on the mask due to rotation, and speed up the drying process. The cam 51 and the output shaft are connected by a one-way bearing. When the height of the mask is lowered for decontamination, the cam 51 can remain stationary, so that the system can keep the process of lowering the mask stable; While the mounting frame 2 drives the mask to vibrate, the reciprocating motion of the mounting frame 2 can drive the piston rod 61 to be repeatedly pulled and drawn. Through the cooperation of the one-way valve, the gas can only move from the gas tank 63 to the sealing box 62 and from the sealing box 62 to the air pipe 64, so that the piston rod 61 continuously blows the nitrogen in the gas tank 63 out along the air pipe 64, and then blows it to the mask surface from the air hole 65. The angle of the air hole 65 is fan-shaped with the hinge as the center, which can blow the liquid on the mask to the edge of the mask, making it convenient to throw or shake off the droplets, and speeding up the drying speed. After the mask is cleaned, its surface is wet and can easily absorb dust and various floating particles in the environment. When it is dry, the impeller 72 is driven to rotate under the action of the transmission wheel 3 7 and the synchronous belt 2 74. The connection between the impeller 72 and one end of the air duct 75 is connected to the air duct 75. When the impeller 72 rotates, the gas in the air duct 75 can be sucked to the center of the impeller 72 and then flow into the air duct 73 along the blades of the impeller 72, thereby forming a negative pressure in the air duct 75. The environment in the dust cover moves into the air duct 75 under the action of wind pressure, thereby protecting the mask and preventing dust from falling onto the mask.

[0027] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical scheme and inventive concept of the present invention within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A device for repairing photolithography mask defects, characterized in that: include: Body (1); Two mounting frames (2) are symmetrically arranged on the machine body (1); Two fixing blocks (21) are symmetrically fixedly mounted on the two mounting frames (2); A servo motor (3) is fixedly mounted on one of the mounting frames (2), and an output end of the servo motor (3) passes through one of the fixing blocks (21) and is rotationally connected to the fixing block (21); A transmission wheel (22) is rotatably mounted on an output end of the servo motor (3); A half gear (25) fixedly mounted on a side wall of the fixed block (21); A worm gear rack, fixedly mounted on the top surface of the fixed block (21); A worm (27) rotatably mounted on the worm frame; A second transmission wheel (24) fixedly mounted on one end of the worm (27); A synchronous belt 1 (23), mounted on the transmission wheel 1 (22) and the transmission wheel 2 (24); a face gear (28) rotatably mounted on the half gear (25) and arranged concentrically with the half gear (25), the face gear (28) meshing with the worm (27); A connecting block (29) fixedly mounted on a side wall of the face gear (28); A driven gear (26) is rotatably mounted on the connecting block (29) and meshes with the half gear (25); A drying component, arranged on the mounting frame (2); A dustproof component, arranged on the servo motor (3); Wherein, a safety coupling is provided between the transmission wheel 1 (22) and the output shaft of the servo motor (3).

2. The device for repairing photolithography mask defects according to claim 1, characterized in that: The drying component comprises: Two hinges (4) are rotatably mounted on the two fixed blocks (21) respectively; A guide plate (41) fixedly mounted on the driven gear (26); Two telescopic rods (42), one end of which is fixedly mounted on the hinge (4), and one of the telescopic rods (42) passes through the guide plate (41) and is rotatably connected to the guide plate (41); A limit plate (48) fixedly mounted on the upper top surface of the hinge (4) near the servo motor (3); Two clamping assemblies, respectively arranged at the other ends of the two telescopic rods (42); A vibration assembly, arranged on the mounting frame (2); A drainage component, arranged on the mounting frame (2); Wherein, a safety coupling is provided between a hinge (4) close to the servo motor (3) and an output shaft of the servo motor (3).

3. The device for repairing photolithography mask defects according to claim 2, characterized in that: The clamping assembly comprises: A bottom plate (43) hingedly connected to an end of the telescopic rod (42) away from the mounting frame (2); A rotating shaft frame, fixedly mounted on the top surface of the bottom plate (43); A rotating shaft (44) is rotatably mounted on the rotating shaft frame; A pressing plate (45) fixedly mounted on the rotating shaft (44); a torsion spring (46) which is sleeved on the rotating shaft (44) and has two ends fixedly connected to the rotating shaft (44) and the rotating shaft frame respectively; Two symmetrical telescopic plates (47) are fixedly mounted between the two bottom plates (43).

4. The device for repairing photolithography mask defects according to claim 3, characterized in that: The vibration assembly comprises: Two sets of fixing plates (5) are symmetrically fixedly mounted on the machine body (1) at positions on both sides of the two mounting frames (2); A cam (51) mounted on the output end of the servo motor (3); A plurality of buffer springs (52) are fixedly mounted between the fixing plate (5) and the mounting frame (2) and are distributed in a linear array; A guide groove is provided on the machine body (1); A guide block (53) fixedly mounted on the bottom of the mounting frame (2) and adapted to fit the guide groove; The mounting frame (2) is slidably connected to the machine body (1), and the cam (51) is connected to the output end of the servo motor (3) via a one-way bearing.

5. The device for repairing photolithography mask defects according to claim 4, characterized in that: The drainage component comprises: A mounting block (6) fixedly mounted on the mounting frame (2); A piston rod (61) is fixedly mounted on the mounting block (6), the piston rod (61) passing through the fixing plate (5) and being slidably connected to the fixing plate (5); A sealing box (62) is slidably mounted on the piston rod (61) and fixedly connected to the fixing plate (5); A gas tank (63) fixedly mounted on one end of the sealing box (62); An air pipe (64) fixedly mounted between the sealing box (62) and the bottom plate (43); The air pipe (64) and the sealing box (62) are connected via a one-way valve, and the sealing box (62) and the air tank (63) are connected via a one-way valve.

6. The device for repairing photolithography mask defects according to claim 5, characterized in that: The bottom plate (43) and the pressing plate (45) are both provided with a plurality of air holes (65) distributed in a linear array, and the directions of the air holes (65) are distributed in a fan shape with the hinge (4) as the origin.

7. The device for repairing photolithography mask defects according to claim 4, characterized in that: The machine body (1) is provided with a dust cover, and the dust cover is provided with a movable door.

8. The device for repairing photolithography mask defects according to claim 7, characterized in that: The dustproof component comprises: A transmission wheel three (7) fixedly mounted on the cam (51); A fixing frame (71) fixedly mounted between a group of the fixing plates (5); An impeller shaft passes through the fixing frame (71) and is rotatably connected to the fixing frame (71); An impeller (72) fixedly mounted on the impeller shaft; An air guide cover (73) is fixedly mounted on the dust cover and sleeved with the impeller (72); A second synchronous belt (74) is mounted on the impeller shaft and the transmission wheel (7); An air guide pipe (75) is rotatably mounted on one end of the impeller (72) away from the impeller shaft, and the other end of the air guide pipe (75) is fixedly connected to another set of fixing frames (71); Wherein, an air inlet is provided at the bottom of the air guide pipe (75).

9. The device for repairing photolithography mask defects according to claim (3), characterized in that: The top surface of the pressing plate (45) is a magnetic surface, and a magnetic plate (49) matching the pressing plate (45) is fixedly mounted on the hinge (4).

10. A method for repairing photolithography mask defects, based on the device for repairing photolithography mask defects according to any one of claims 1 to 9, characterized in that: The following steps are involved: Step 1: The pressing plate (45) is adsorbed on the magnetic plate (49) by magnetic attraction, the mask is placed in the clamping assembly, the pressing plate (45) is released and the edge position of the mask is pressed by the torsion spring (46), and the length of the telescopic rod (42) is adjusted according to the size of the mask to adapt to masks of different sizes; Step 2: Start the servo motor (3), and drive the worm (27) to rotate through the transmission wheel (22) and the synchronous belt (23). When the worm (27) rotates, it drives the face gear (28) and the driven gear (26) to move downward and rotate, and then drives the clamping assembly and the mask to descend through the guide plate (41) and the telescopic rod (42). The mask is lowered and immersed in the cleaning tank in the machine body (1), and washed and decontaminated with a chemical cleaning agent such as hydrogen peroxide and sulfuric acid, and then rinsed with deionized water; Step 3: The servo motor (3) rotates in the reverse direction, driving the worm (27) to rotate in the reverse direction, thereby driving the driven gear (26) to rotate and lift the telescopic rod (42) and the clamping assembly to a horizontal position. When the telescopic rod (42) is in the horizontal position, the limit plate (48) limits the hinge (4). At this time, the servo motor (3) drives the hinge (4) to rotate through the safety coupling, thereby driving the telescopic rod (42) and the clamping assembly to rotate, so that the mask is rotated for drying; Step 4: The output shaft of the servo motor (3) drives the cam (51) to rotate, and through the action of the fixed plate (5) and the buffer spring (52), the mounting frame (2) drives the mask to vibrate, so that the droplets gathered on the mask due to the rotation are shaken off. At the same time, the reciprocating motion of the mounting frame (2) drives the piston rod (61) to be repeatedly pulled and drawn, and through the cooperation of the one-way valve, the nitrogen in the gas tank (63) is blown out along the gas pipe (64) and blown from the gas hole (65) to the surface of the mask, so that the liquid on the mask is blown to the edge of the mask; Step 5: During the drying process, the impeller (72) is driven to rotate by the transmission wheel (7) and the synchronous belt (74). When the impeller (72) rotates, the gas in the air duct (75) is sucked to the center of the impeller (72) and flows into the air duct (73) along the blades of the impeller (72), thereby forming a negative pressure in the air duct (75). After the mask is cleaned and dried, all equipment and valves are closed, and the mask is removed from the clamping assembly, completing the entire decontamination and drying process.

Images