Resin composition, method for producing resin composition, pigment derivative, film, optical filter, solid-state imaging element, and image display device

Abstract

Provided is a resin composition containing a pigment, a pigment derivative having a BET specific surface area of 2-300 m2 / g as determined by a nitrogen adsorption method, a resin, and a solvent. Also provided are a method for producing the resin composition, a pigment derivative, a film, an optical filter, a solid-state imaging element, and an image display device.

Description

Technical Field

[0001] The present invention relates to a resin composition containing a pigment and a pigment derivative and a method for producing the same. The present invention also relates to a pigment derivative, a film, an optical filter, a solid-state imaging element, and an image display device. Background Art

[0002] In recent years, with the popularization of digital cameras, mobile phones with cameras, etc., the demand for solid-state imaging elements such as charge coupled device (CCD) image sensors has increased significantly. Color filters are used as core devices of displays or optical elements.

[0003] Optical filters such as color filters are produced using a resin composition containing a color material and a resin. When a pigment is used as the color material, the pigment is dispersed together with a pigment derivative and a resin and used.

[0004] Patent Document 1 describes a red coloring composition for a color filter, which contains: 2 / g or more and 50m 2 / g or less of a benzimidazolone pigment (a1), a colorant (a), a resin (b) and a solvent (c).

[0005] Previous technical literature

[0006] Patent Literature

[0007] Patent Document 1: Japanese Patent Application Publication No. 2013-125265 Summary of the invention

[0008] Technical issues to be solved by the invention

[0009] In recent years, there has been a demand for further improvement in the dispersion stability of pigments in pigment-containing resin compositions.

[0010] Therefore, an object of the present invention is to provide a resin composition having excellent dispersion stability of a pigment and a method for producing the same. In addition, an object of the present invention is to provide a pigment derivative, a film, an optical filter, a solid-state imaging element, and an image display device.

[0011] Means for solving technical problems

[0012] The present invention provides the following contents.

[0013] <1> A resin composition comprising:

[0014] pigment;

[0015] The BET specific surface area based on nitrogen adsorption method is 2 to 300 m 2 / g of pigment derivatives;

[0016] Resins; and

[0017] Solvent.

[0018] <2> according to <1> In the resin composition, the pigment derivative is a particle of a compound having at least one structure selected from the group consisting of a pigment structure and a triazine structure and an acid group or a basic group.

[0019] <3> A resin composition comprising:

[0020] pigment;

[0021] The BET specific surface area based on nitrogen adsorption method is 2 to 300 m 2 / g, and particles of a compound having at least one structure selected from the group consisting of a pigment structure and a triazine structure and an acid group or a basic group;

[0022] Resins; and

[0023] Solvent.

[0024] <4> according to <2> or <3> The resin composition, wherein

[0025] The pigment structure is at least one selected from the group consisting of a diketopyrrolopyrrole structure, a pyrrolopyrrole structure, an azomethine structure, an isoindoline structure, a quinophthalone structure, an azo structure, an anthraquinone structure, a thiazine indigo structure, a quinacridone structure, a benzindole structure, a phthalocyanine structure, and a dioxazine structure.

[0026] <5> according to <2> or <3> The resin composition, wherein

[0027] The above pigment structure is an azomethine structure.

[0028] <6> according to <1> to <5> The resin composition described in any one of the above aspects further comprises a photopolymerization initiator and a polymerizable compound.

[0029] <7> A method for producing a resin composition, comprising:

[0030] Pigments are dispersed in solvents. The BET specific surface area based on nitrogen adsorption method is 2 to 300 m 2 / g of pigment derivatives and resins.

[0031] <8> according to <7> The method for producing the resin composition, wherein:

[0032] The pigment derivative is a particle of a compound having at least one structure selected from the group consisting of a pigment structure and a triazine structure and an acid group or a basic group.

[0033] <9> A pigment derivative, which is a particle of a compound having at least one structure selected from the group consisting of a pigment structure and a triazine structure and an acid group or a basic group, wherein the pigment derivative has a BET specific surface area of ​​2 to 300 m2 by a nitrogen adsorption method. 2 / g.

[0034] <10> according to <9> The pigment derivative is a dispersing aid.

[0035] <11> A membrane, which is used <1> to <6> Obtained from the resin composition described in any one of the above.

[0036] <12> A filter having <11> The membrane.

[0037] <13> A solid-state imaging element having <11> The membrane.

[0038] <14> An image display device having <11> The membrane.

[0039] Effects of the Invention

[0040] According to the present invention, a resin composition having excellent dispersion stability of a pigment and a method for producing the same can be provided. In addition, according to the present invention, a pigment derivative, a film, an optical filter, a solid-state imaging element, and an image display device can be provided. DETAILED DESCRIPTION

[0041] Hereinafter, the contents of the present invention will be described in detail.

[0042] In this specification, "to" is used to mean that the numerical values ​​described before and after it are included as the lower limit and the upper limit.

[0043] In the marking of groups (atomic groups) in this specification, the marking not indicating substitution and unsubstituted includes not only groups (atomic groups) without substitution but also groups (atomic groups) with substitution. For example, "alkyl" includes not only alkyl groups without substitution (unsubstituted alkyl groups) but also alkyl groups with substitution (substituted alkyl groups).

[0044] The term "exposure" in this specification includes not only exposure using light, but also drawing using particle beams such as electron beams and ion beams, unless otherwise specified. In addition, examples of light used for exposure include the bright line spectrum of a mercury lamp, far ultraviolet rays represented by excimer lasers, extreme ultraviolet rays (EUV rays), X-rays, electron beams, and other activating rays or radiation.

[0045] In the present specification, “(meth)acrylate” means both or either acrylate and methacrylate, “(meth)acrylic acid” means both or either acrylic acid and methacrylic acid, and “(meth)acryloyl” means both or either acryloyl and methacryloyl.

[0046] In the present specification, Me in the structural formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, Pr represents a propyl group, and Ph represents a phenyl group.

[0047] In this specification, the weight average molecular weight and the number average molecular weight are polystyrene conversion values ​​measured by GPC (gel permeation chromatography) method.

[0048] In this specification, near infrared rays refer to light with a wavelength of 700 to 2500 nm.

[0049] In this specification, the total solid content refers to the total mass of the components after removing the solvent from all the components of the composition.

[0050] In the present specification, a pigment refers to a color material that is not easily soluble in a solvent. For example, the solubility of the pigment in 100 g of water at 23° C. and 100 g of propylene glycol monomethyl ether acetate at 23° C. is preferably 0.1 g or less, and more preferably 0.01 g or less.

[0051] In this specification, a dye refers to a color material that is not easily dissolved in a solvent.

[0052] In this specification, the term "step" refers not only to an independent step but also to a step that cannot be clearly distinguished from other steps as long as the intended effect of the step can be achieved.

[0053] <Resin composition>

[0054] The resin composition according to the first aspect of the present invention is characterized by containing:

[0055] pigment;

[0056] The BET specific surface area based on nitrogen adsorption method is 2 to 300 m 2 / g of pigment derivatives;

[0057] Resins; and

[0058] Solvent.

[0059] The resin composition according to the second aspect of the present invention is characterized by containing:

[0060] pigment;

[0061] The BET specific surface area based on nitrogen adsorption method is 2 to 300 m 2 / g, and particles of a compound having at least one structure selected from the group consisting of a pigment structure and a triazine structure and an acid group or a basic group;

[0062] Resins; and

[0063] Solvent.

[0064] Hereinafter, the pigment derivative in the resin composition of the first embodiment and the particles in the resin composition of the second embodiment are also collectively referred to as specific particles.

[0065] The resin composition of the present invention has excellent dispersion stability of the pigment. The reason for this effect is presumed to be as follows. It is presumed that the resin composition of the present invention contains a pigment having a BET specific surface area of ​​2 to 300 m 2 / g of the above-mentioned specific particles, the pigment derivative is efficiently adsorbed on the surface of the pigment, so that a strong network of resin, pigment and pigment derivative can be formed in the resin composition. Therefore, it is speculated that the generation of coarse particles caused by the agglomeration of the pigment during the manufacture of the resin composition or the agglomeration of the pigment during the storage of the resin composition can be suppressed, and the change of viscosity over time can be suppressed. It is speculated that, for this reason, a resin composition with excellent dispersion stability of the pigment can be prepared.

[0066] Moreover, when the resin composition of the present invention is used and a pattern is formed by photolithography, the generation of developer residues can also be suppressed. The reason for obtaining this effect is speculated to be as follows. It is speculated that if the above-mentioned specific particles exist as a single substance, the specific particles existing as a particle single substance are adsorbed on the support body, and there is a tendency to remain as developer residues after development, but in the resin composition of the present invention, the specific particles are efficiently adsorbed on the pigment, so the pigment derivative is not easy to remain as a particle single substance. It is speculated that, for this reason, the generation of developer residues can be suppressed. When the resin composition of the present invention is used for photolithography, the resin composition of the present invention preferably also contains a polymerizable compound and a photopolymerization initiator. Moreover, the resin preferably includes a resin having an acid group.

[0067] The resin composition of the present invention can be preferably used as a resin composition for optical filters. As optical filters, color filters, near infrared transmission filters, near infrared cut-off filters, etc. can be cited, preferably color filters. In addition, the resin composition of the present invention can be preferably used as a solid-state imaging element. In more detail, it can be preferably used as a resin composition for optical filters for solid-state imaging elements, and can be more preferably used as a colored pixel forming resin composition for color filters for solid-state imaging elements.

[0068] As a color filter, a filter having colored pixels that transmit light of a specific wavelength can be cited. As colored pixels, red pixels, green pixels, blue pixels, magenta pixels, cyan pixels, yellow pixels, etc. can be cited, preferably red pixels or green pixels, more preferably red pixels. The colored pixels of the color filter can be formed using a resin composition containing a color pigment.

[0069] The maximum absorption wavelength of the near infrared cut filter is preferably present in the range of wavelengths of 700 to 1800 nm, more preferably in the range of wavelengths of 700 to 1400 nm, and further preferably in the range of wavelengths of 700 to 1200 nm. In addition, the transmittance of the near infrared cut filter in the entire range of wavelengths of 400 to 650 nm is preferably 70% or more, more preferably 80% or more, and further preferably 90% or more. In addition, it is preferred that the transmittance of at least one point in the range of wavelengths of 700 to 1800 nm is 20% or less. In addition, the ratio of the absorbance Amax at the maximum absorption wavelength of the near infrared cut filter to the absorbance A550 at a wavelength of 550 nm (absorbance Amax / absorbance A550) is preferably 20 to 500, more preferably 50 to 500, further preferably 70 to 450, and particularly preferably 100 to 400. The near infrared cut filter can be formed using a resin composition containing a near infrared absorbing pigment.

[0070] The near-infrared transmission filter is a filter that transmits at least a portion of near-infrared rays. The near-infrared transmission filter may be a filter (transparent film) that transmits any one of visible light and near-infrared rays, or may be a filter that shields at least a portion of visible light and transmits at least a portion of near-infrared rays. As a near-infrared transmission filter, preferably, there may be cited a filter that satisfies the spectral characteristics that the maximum value of the transmittance within the wavelength range of 400 to 640 nm is less than 20% (preferably less than 15%, more preferably less than 10%) and the minimum value of the transmittance within the wavelength range of 1100 to 1300 nm is more than 70% (preferably more than 75%, more preferably more than 80%). The near-infrared transmission filter is preferably a filter that satisfies any one of the following spectral characteristics (1) to (5).

[0071] (1): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 640 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 800 to 1500 nm.

[0072] (2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 750 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 900 to 1500 nm.

[0073] (3): A filter having a maximum transmittance of less than 20% (preferably less than 15%, more preferably less than 10%) in the wavelength range of 400 to 830 nm and a minimum transmittance of more than 70% (preferably more than 75%, more preferably more than 80%) in the wavelength range of 1000 to 1500 nm.

[0074] (4): A filter having a maximum transmittance of less than 20% (preferably less than 15%, more preferably less than 10%) in the wavelength range of 400 to 950 nm and a minimum transmittance of more than 70% (preferably more than 75%, more preferably more than 80%) in the wavelength range of 1100 to 1500 nm.

[0075] (5): A filter having a maximum transmittance of less than 20% (preferably less than 15%, more preferably less than 10%) in the wavelength range of 400 to 1050 nm and a minimum transmittance of more than 70% (preferably more than 75%, more preferably more than 80%) in the wavelength range of 1200 to 1500 nm.

[0076] The resin composition of the present invention can also be used for a light-shielding film or the like.

[0077] The solid content concentration of the resin composition of the present invention is preferably 5 to 30% by mass. The lower limit is preferably 7.5% by mass or more, more preferably 10% by mass or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, and further preferably 15% by mass or less.

[0078] Hereinafter, each component used for the resin composition of the present invention will be described.

[0079] "pigment"

[0080] Resin combination of the present invention contains pigment. As pigment, white pigment, black pigment, color pigment, near infrared absorbing pigment can be enumerated. In addition, in this manual, white pigment not only includes pure white, but also includes pigments of light gray (such as off-white, light gray, etc.) close to white, etc.

[0081] When the resin composition is used as a color filter, a color pigment is used as the pigment. The color pigment may be only one kind or may contain two or more kinds. When the resin composition is used to form a near-infrared cutoff filter, a near-infrared absorbing pigment is used as the pigment. The near-infrared absorbing pigment may be only one kind or may contain two or more kinds. When the resin composition is used as a near-infrared transmission filter, two or more color pigments are used in combination as the pigment, or a substance containing a black pigment is used.

[0082] The average primary particle size of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more, further preferably 20 nm or more, and further preferably 30 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, further preferably 100 nm or less, further preferably 90 nm or less, and particularly preferably 80 nm or less. If the average primary particle size of the pigment is within the above range, the dispersion stability of the pigment in the resin composition is good. The average primary particle size of the pigment can be measured by the method described in the embodiments described later.

[0083] The BET specific surface area of ​​the pigment by nitrogen adsorption method is preferably 1 to 300 m 2 / g. The lower limit is preferably 10m 2 / g or more, more preferably 30m 2 The upper limit is preferably 250 m 2 / g or less, more preferably 200m 2 The BET specific surface area of ​​the pigment can be measured by the BET method (Brunauer, Emmett, and Teller) based on a nitrogen adsorption method.

[0084] The crystallite size determined from the half width of the peak of any crystal plane in the X-ray diffraction spectrum when the CuKα line of the pigment is used as the X-ray source is preferably 0.1nm to 100nm, more preferably 0.5nm to 50nm, further preferably 1nm to 30nm, and particularly preferably 5nm to 25nm.

[0085] The pigment used in the present invention preferably includes at least one selected from the group consisting of diketopyrrolopyrrole pigments, pyrrolopyrrole pigments, azomethine pigments, isoindoline pigments, quinophthalone pigments, azo pigments, anthraquinone pigments, thiazine indigo pigments, quinacridone pigments, benzindole pigments, phthalocyanine pigments and dioxazine pigments.

[0086] Hereinafter, the pigment used in the present invention will be described in further detail.

[0087] (Color Pigments)

[0088] As the color pigment, it is not particularly limited, and known color pigments can be used. As the color pigment, pigments with a maximum absorption wavelength in the range of wavelength 400 to 700 nm can be cited. For example, yellow pigment, orange pigment, red pigment, green pigment, purple pigment, blue pigment, etc. can be cited. From the viewpoint of heat resistance, the color pigment is more preferably red pigment, yellow pigment and blue pigment, and further preferably red pigment and blue pigment. As their specific examples, for example, the following can be cited.

[0089] Examples of red pigments include diketopyrrolopyrrole compounds, anthraquinone compounds, azo compounds, naphthol compounds, azomethine compounds, xanthene compounds, quinacridone compounds, perylene compounds, and thioindigo compounds. Preferred are diketopyrrolopyrrole compounds, anthraquinone compounds, and azo compounds, and more preferred are diketopyrrolopyrrole compounds.

[0090] Specific examples of red pigments include CI (color index) pigment red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144 , 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294, 295, 296, 297, etc. Furthermore, as the red pigment, the compound described in paragraph 0034 of International Publication No. 2022 / 085485 and the brominated diketopyrrolopyrrole compound described in JP-A-2020-085947 can also be used.

[0091] As the red pigment, CI Pigment Red 122, 177, 254, 255, 264, 269, and 272 are preferred, CI Pigment Red 254, 264, and 272 are more preferred, and CI Pigment Red 254 and 272 are further preferred.

[0092] Examples of green pigments include phthalocyanine compounds and squarylium compounds, preferably phthalocyanine compounds, and more preferably phthalocyanine pigments. In addition, the green colorant is preferably a pigment.

[0093] As specific examples of green pigments, CI Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64, 65, 66, etc. can be cited. In addition, as green pigments, halogenated zinc phthalocyanine pigments having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms in one molecule can also be used. As specific examples, compounds described in International Publication No. 2015 / 118720 can be cited. In addition, as green pigments, compounds described in paragraph 0029 of International Publication No. 2022 / 085485, aluminum phthalocyanine compounds described in Japanese Patent Publication No. 2020-070426, etc. can also be used.

[0094] As the green pigment, CI Pigment Green 7, 36, 58, 62, and 63 are preferred, and CI Pigment Green 36 and 58 are more preferred.

[0095] Specific examples of the orange pigment include CI Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, and 73.

[0096] Examples of yellow pigments include azo compounds, azomethine compounds, isoindoline compounds, pteridine compounds, quinophthalone compounds, and perylene compounds. Specific examples of yellow pigments include CI Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232, 233, 234, 235, 236, etc.

[0097] As the yellow pigment, an azobarbituric acid nickel complex having the following structure can be used.

[0098] [Chemical formula 1]

[0099]

[0100] As the yellow pigment, the compounds described in paragraphs 0031 to 0033 of International Publication No. 2022 / 085485, the methine dyes described in JP-A-2019-073695, the methine dyes described in JP-A-2019-073696, the methine dyes described in JP-A-2019-073697, the methine dyes described in JP-A-2019-073698, and the azo compounds described in JP-A-2020-093994 can be used.

[0101] Specific examples of the violet pigment include CI Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60, and 61.

[0102] Specific examples of blue pigments include CI Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87, 88, etc. In addition, aluminum phthalocyanine compounds having a phosphorus atom can also be used as blue pigments. Specific examples include compounds described in paragraphs 0022 to 0030 of Japanese Patent Application Publication No. 2012-247591 and paragraph 0047 of Japanese Patent Application Publication No. 2011-157478.

[0103] As a green pigment or a blue pigment, a diarylmethane compound described in JP-A-2020-504758 can also be used.

[0104] Regarding the diffraction angles that various pigments preferably have, reference can be made to the records in Japanese Patent No. 6561862, Japanese Patent No. 6413872, Japanese Patent No. 6281345, Japanese Patent Publication No. 2020-026503, and Japanese Patent Publication No. 2020-033526, which are incorporated into this specification. In addition, as a pyrrolopyrrole pigment, it is also preferred to use a crystallite size of 0.040 mm in the plane direction corresponding to the maximum peak in the X-ray diffraction pattern among the 8 planes in the lattice plane (±1±1±1). The following pigments. In addition, the physical properties of the pyrrolopyrrole pigment are preferably set as described in paragraphs 0028 to 0073 of JP-A-2020-097744.

[0105] Color pigments can be used in combination of two or more. For example, when the resin composition of the present invention is used as a green pixel of a color filter, it is preferred to use a green pigment and a yellow pigment. And, when the resin composition of the present invention is used as a red pixel of a color filter, it is preferred to use a red pigment and a yellow pigment.

[0106] When two or more color pigments are used in combination, black can be formed by the combination of two or more color pigments. As these combinations, for example, the following (1) to (7) can be cited. When the resin composition contains two or more color pigments and presents black by the combination of two or more color pigments, the resin composition of the present invention can be preferably used as a resin composition for forming a near-infrared transmission filter.

[0107] (1) A method containing red pigment and blue pigment.

[0108] (2) A method containing red pigment, blue pigment and yellow pigment.

[0109] (3) A method containing red pigment, blue pigment, yellow pigment and violet pigment.

[0110] (4) A method containing red pigment, blue pigment, yellow pigment, purple pigment and green pigment.

[0111] (5) A method containing red pigment, blue pigment, yellow pigment and green pigment.

[0112] (6) A method containing red pigment, blue pigment and green pigment.

[0113] (7) A method containing yellow pigment and purple pigment.

[0114] (white pigment)

[0115] As white pigments, titanium oxide, strontium titanate, barium titanate, zinc oxide, magnesium oxide, zirconium oxide, aluminum oxide, barium sulfate, silicon dioxide, talc, mica, aluminum hydroxide, calcium silicate, aluminum silicate, hollow resin particles, zinc sulfide, etc. can be cited. The white pigment is preferably a particle having a titanium atom, and titanium oxide is more preferred. In addition, the white pigment is preferably a particle having a refractive index of 2.10 or more relative to light of a wavelength of 589 nm. The refractive index is preferably 2.10 to 3.00, and more preferably 2.50 to 2.75.

[0116] Furthermore, as the white pigment, titanium oxide described in "Physical Properties and Applications of Titanium Oxide, Manabu Seino, pp. 13-45, published on June 25, 1991, published by Gihodo Publishing" can also be used.

[0117] White pigment can be not only made of single inorganic substance, but also can use particles compounded with other materials. For example, preferably use particles with pores or other materials inside, particles with multiple inorganic particles attached to core particles, core particles including core particles consisting of polymer particles and core and shell composite particles of shells consisting of inorganic nanoparticles. As the above-mentioned core particles including core particles consisting of polymer particles and core and shell composite particles of shells consisting of inorganic nanoparticles, for example, it is possible to refer to the records of paragraphs 0012 to 0042 of Japanese Patent Publication No. 2015-047520, and the content is incorporated in this specification.

[0118] White pigment can also use hollow inorganic particles.Hollow inorganic particles refer to the inorganic particles with the structure of the cavity inside, and have the inorganic particles of the cavity surrounded by the shell.As hollow inorganic particles, the hollow inorganic particles described in Japanese Unexamined Patent Publication No. 2011-075786, International Publication No. 2013 / 061621, Japanese Unexamined Patent Publication No. 2015-164881 etc. can be enumerated, and these contents are incorporated in this description.

[0119] (Black pigment)

[0120] The black pigment is not particularly limited, and known pigments can be used. As inorganic black pigments, carbon black, titanium black, graphite, etc. can be cited, preferably carbon black, titanium black, and more preferably titanium black. Titanium black refers to black particles containing titanium atoms, preferably low-order titanium oxide or titanium oxynitride. For the purpose of improving dispersibility, inhibiting agglomeration, etc., the surface of titanium black can be modified as needed. For example, the surface of titanium black can be coated with silicon oxide, titanium oxide, germanium oxide, aluminum oxide, magnesium oxide or zirconium oxide. In addition, it can also be treated with a waterproof substance as shown in Japanese Patent Gazette No. 2007-302836. As specific examples of inorganic black pigments, CI Pigment Black 1, 7, etc. can be cited. The primary particle size and average primary particle size of each particle of titanium black are preferably small. Specifically, the average primary particle size is preferably 10 to 45 nm. Titanium black can also be used as a dispersed material. For example, a dispersion containing titanium black particles and silicon dioxide particles and wherein the ratio of Si atoms to Ri atoms in the dispersion is adjusted within the range of 0.20 to 0.50 can be cited. For the above-mentioned dispersion, reference can also be made to the records of paragraphs 0020 to 0105 of Japanese Patent Publication No. 2012-169556, which are incorporated into this specification. Examples of commercially available products of titanium black include titanium black 10S, 12S, 13R, 13M, 13M-C, 13R-N, 13M-T (trade name: manufactured by Mitsubishi Materials Corporation), Tilack D (trade name: manufactured by Ako Kasei Co., Ltd.), etc.

[0121] As organic black pigments, bisbenzofuranone compounds, azomethine compounds, perylene compounds, azo compounds, etc. can be cited. As bisbenzofuranone compounds, compounds described in Japanese Patent Publication No. 2010-534726, Japanese Patent Publication No. 2012-515233, Japanese Patent Publication No. 2012-515234, etc. can be cited, for example, "Irgaphor Black" manufactured by BASF can be obtained. As perylene compounds, compounds described in paragraphs 0016 to 0020 of Japanese Patent Publication No. 2017-226821, CI Pigment Black 31, 32, etc. can be cited. As the azomethine compound, there can be mentioned compounds described in Japanese Patent Laid-Open No. 01-170601, Japanese Patent Laid-Open No. 02-034664, etc., for example, it can be obtained as "CHROMO FINE BLACK A1103" manufactured by Dainichiseika Color & Chemicals Mfg. Co., Ltd. In addition, as the black pigment, the black organic pigment described in Japanese Patent No. 6985715, Lumogen Black FK4280, and Paliogen Black S0084 (manufactured by BASF) can be used.

[0122] (Near infrared absorbing pigment)

[0123] The near-infrared absorbing pigment is preferably an organic pigment. Furthermore, the near-infrared absorbing pigment preferably has a maximum absorption wavelength in a range of wavelengths exceeding 700nm and below 1800nm. Furthermore, the maximum absorption wavelength of the near-infrared absorbing pigment is preferably present below 1400nm, more preferably below 1200nm, and further preferably below 1000nm. Furthermore, the ratio A550 / Amax of the absorbance A550 of the near-infrared absorbing pigment at a wavelength of 550nm and the absorbance Amax at the maximum absorption wavelength is preferably 0.1 or less, more preferably 0.05 or less, further preferably 0.03 or less, and particularly preferably 0.02 or less. The lower limit is not particularly limited, but, for example, can be set to more than 0.0001, and can also be set to more than 0.0005. If the ratio of the above absorbance is within the above range, it can be made into a near-infrared absorbing pigment with excellent visible transparency and near-infrared shielding properties.

[0124] As near infrared absorbing pigments, pyrrolopyrrole compounds, cyanine compounds, squaric acid compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, merocyanine compounds, crotonium compounds, oxonol compounds, imine compounds, dithiol compounds, triarylmethane compounds, pyrrole methylene compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, dithiol metal complexes, metal oxides, metal borides, etc. As specific examples of these, compounds described in paragraph 0114 of International Publication No. 2022 / 065215 can be cited. In addition, as near-infrared absorbing color materials, the compounds described in paragraph 0121 of International Publication No. 2022 / 065215, the square acid compounds described in Japanese Patent Gazette No. 2020-075959, the copper complexes described in Korean Patent Gazette No. 10-2019-0135217, the croton acid compounds described in Japanese Patent Gazette No. 2021-195515, and the near-infrared absorbing pigments described in Japanese Patent Gazette No. 2022-022070 can also be used.

[0125] The content of the pigment in the total solid content of the resin composition is preferably 30 to 80% by mass. The lower limit is preferably 40% by mass or more, more preferably 50% by mass or more. The upper limit is preferably 75% by mass or less, more preferably 70% by mass or less.

[0126] When the resin composition of the present invention is used for a color filter, the content of the color pigment in the pigment contained in the resin composition is preferably 80 mass % or more, more preferably 90 mass % or more, further preferably 95 mass % or more, and further preferably 99 mass % or more.

[0127] When the resin composition of the present invention is used as a near-infrared cut filter, the content of the near-infrared absorbing pigment in the pigment contained in the resin composition is preferably 80% by mass or more, more preferably 90% by mass or more, further preferably 95% by mass or more, and further preferably 99% by mass or more.

[0128] "dye"

[0129] The resin composition of the present invention may contain a dye. As a dye, there is no particular limitation, and known dyes can be used. As dyes, color dyes, black dyes, near-infrared absorbing dyes, etc. can be mentioned. As dyes, known dyes can be used. As dyes, pigment polymers can also be used. Pigment multimers have more than two pigment structures in one molecule, preferably more than three pigment structures. The upper limit is not particularly limited, but can also be set to 100 or less. The multiple color pigment structures in one molecule can be the same pigment structure or different pigment structures. The weight average molecular weight (Mw) of the pigment multimer is preferably 2000 to 50000. The lower limit is more preferably 3000 or more, and more preferably 6000 or more. The upper limit is more preferably 30000 or less, and more preferably 20000 or less. As the pigment multimer, compounds described in JP-A-2011-213925, JP-A-2013-041097, JP-A-2015-028144, JP-A-2015-030742, JP-A-2016-102191, International Publication No. 2016 / 031442, etc. can also be used.

[0130] As the pigment or dye, a triarylmethane dye polymer described in Korean Patent Publication No. 10-2020-0028160, a xanthene compound described in Japanese Patent Publication No. 2020-117638, a phthalocyanine compound described in International Publication No. 2020 / 174991, an isoindoline compound or a salt thereof described in Japanese Patent Publication No. 2020-160279, Korean Patent Publication No. 10-2020-0 The compound represented by formula 1 described in Korean Patent Publication No. 069442, the compound represented by formula 1 described in Korean Patent Publication No. 10-2020-0069730, the compound represented by formula 1 described in Korean Patent Publication No. 10-2020-0069070, the compound represented by formula 1 described in Korean Patent Publication No. 10-2020-0069067, the compound represented by formula 1 described in Korean Patent Publication No. 10-2020-006 The compound represented by Formula 1 described in Gazette No. 9062, the zinc phthalocyanine halides described in Japanese Patent No. 6809649, the isoindoline compounds described in Japanese Patent Publication No. 2020-180176, the phenothiazine compounds described in Japanese Patent Publication No. 2021-187913, the zinc phthalocyanine halides described in International Publication No. 2022 / 004261, the zinc phthalocyanine halides described in International Publication No. 2021 / 250883, The pigment or dye may be a rotaxane, and the pigment skeleton may be used for the cyclic structure of the rotaxane, the rod-shaped structure, or both.

[0131] The content of the dye in the total solid content of the resin composition is preferably below 20 mass %, more preferably below 10 mass %, and further preferably below 5 mass %. In addition, relative to 100 mass parts of pigments, the content of the dye in the resin composition is preferably below 60 mass parts, more preferably below 40 mass parts, and further preferably below 20 mass parts.

[0132] The resin composition of the present invention also preferably contains substantially no dye. In addition, in this specification, the situation of containing substantially no dye means that the content of the dye in the total solid content of the resin composition is 0.1 mass % or less, preferably 0.01 mass % or less, and more preferably contains no dye.

[0133] 《Special Particles》

[0134] The resin composition of the first embodiment of the present invention contains a BET specific surface area of ​​2 to 300 m 2 / g of pigment derivatives.

[0135] The resin composition of the second aspect of the present invention contains a BET specific surface area of ​​2 to 300 m 2 / g and particles of a compound having at least one structure selected from the group consisting of a pigment structure and a triazine structure and an acid group or a basic group.

[0136] The pigment derivative in the resin composition of the first embodiment and the particles in the resin composition of the second embodiment are also collectively referred to as specific particles.

[0137] The specific particles can be used as a dispersing aid. A dispersing aid is a material for improving the dispersibility of a pigment in a resin composition.

[0138] The specific particles used in the resin composition of the first embodiment have a BET specific surface area of ​​2 to 300 m2 based on a nitrogen adsorption method. 2 The pigment derivative of / g is preferably particles of a compound having at least one structure selected from the group consisting of a pigment structure and a triazine structure and an acid group or a basic group.

[0139] The BET specific surface area of ​​the specific particles based on the nitrogen adsorption method is 2 to 300 m 2 The lower limit of the BET specific surface area of ​​the specific particles is preferably 3 m 2 / g or more, more preferably 5m 2 The upper limit of the BET specific surface area of ​​the specific particles is preferably 250 m 2 / g or less, more preferably 200m 2 / g or less, more preferably 150m 2 / g or less, more preferably 100m 2 The BET specific surface area of ​​the specific particles is a value measured by the BET method (Brunauer, Emmett, and Teller) based on a nitrogen adsorption method.

[0140] The average primary particle size of the specific particles is preferably 5 to 200 nm. The upper limit is preferably 150 nm or less, more preferably 100 nm or less. The lower limit is preferably 10 nm or more, more preferably 20 nm or more. If the average primary particle size of the pigment derivative is within the above range, the dispersion stability of the pigment can be further improved. The average primary particle size of the specific particles can be measured according to the method described in the examples described below.

[0141] The difference between the average primary particle size of the specific particles contained in the resin composition and the average primary particle size of the pigment is preferably 0 to 100 nm. The upper limit is preferably 50 nm or less, more preferably 30 nm or less. The lower limit is preferably 2 nm or more, more preferably 5 nm or more. If the difference between the average primary particle size of the specific particles and the average primary particle size of the pigment is within the above range, the dispersion stability of the pigment can be further improved.

[0142] When the specific particles are particles of a compound having at least one structure selected from the group consisting of a pigment structure and a triazine structure and an acid group or a basic group, the above-mentioned pigment structure possessed by the specific particles is preferably at least one selected from the group consisting of a diketopyrrolopyrrole structure, a pyrrolopyrrole structure, an azomethine structure, an isoindoline structure, a quinophthalone structure, an azo structure, anthraquinone structure, a thiazine indigo structure, a quinacridone structure, a benzindole structure, a phthalocyanine structure and a dioxazine structure, and more preferably an azomethine structure.

[0143] When the specific particles are particles of a compound having at least one structure selected from the group consisting of a pigment structure and a triazine structure and an acid group or a basic group, examples of the acid group possessed by the specific particles include a carboxyl group, a sulfonic group, a phosphoric acid group, a boric acid group, an imidic acid group, and salts thereof. Examples of the atoms or atomic groups constituting the salt include alkali metal ions (Li + 、Na + , K + etc.), alkaline earth metal ions (Ca 2+ Mg 2+ As the imidic acid group, it is preferably -SO 2 NHSO 2 R X1 、-CONHSO 2 R X2 、-CONHCOR X3 or -SO 2 NHCOR X4 The group represented by -SO 2 NHSO 2 R X1 、-CONHSO 2 R X2 or -SO 2 NHCOR X4 The group represented by -SO 2 NHSO 2 R X1 or -CONHSO 2 R X2 . R X1 ~R X4 R each independently represents an alkyl group or an aryl group.X1 ~R X4 The alkyl group and aryl group represented by R may have a substituent. As the substituent, a halogen atom is preferred, and a fluorine atom is more preferred. X1 ~R X4 Each is independently preferably an alkyl group containing a fluorine atom or an aryl group containing a fluorine atom, and more preferably an alkyl group containing a fluorine atom. The number of carbon atoms in the alkyl group containing a fluorine atom is preferably 1 to 10, more preferably 1 to 5, and further preferably 1 to 3. The number of carbon atoms in the aryl group containing a fluorine atom is preferably 6 to 20, more preferably 6 to 12, and further preferably 6.

[0144] When the specific particles are particles of a compound having at least one structure selected from the group consisting of a pigment structure and a triazine structure and an acidic or basic group, the basic group possessed by the specific particles includes amino, pyridyl and its salt, ammonium salt and phthalimide methyl. As atoms or atomic groups constituting the salt, hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, phenoxide ions, etc. can be cited.

[0145] As the amino group, there can be mentioned -NR x11 R x12 Representing a group and a cyclic amino group.

[0146] By-NR x11 R x12 In the group represented by x11 and R x12 Each independently represents a hydrogen atom, an alkyl group or an aryl group, preferably an alkyl group. That is, the amino group is preferably a dialkylamino group. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 5, and further preferably 1 to 3. The alkyl group may be any of linear, branched, and cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent. As the substituent, the substituent T described below may be mentioned. The number of carbon atoms in the aryl group is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 12. The aryl group may have a substituent. As the substituent, the substituent T described below may be mentioned.

[0147] Examples of the cyclic amino group include pyrrolidinyl, piperidinyl, piperazinyl, and morpholinyl groups. These groups may further have a substituent.

[0148] When the specific particles are particles of a compound having a pigment structure and an acid group or a basic group, the specific particles are preferably particles of a compound represented by formula (B1).

[0149] [Chemical formula 2]

[0150]

[0151] In formula (B1), P represents a pigment structure, L represents a single bond or an n+1 valent linking group, X represents an acid group or a basic group, m represents an integer greater than 1, and n represents an integer greater than 1. When m is greater than 2, multiple Ls and Xs may be different from each other, and when n is greater than 2, multiple Xs may be different from each other.

[0152] The pigment structure represented by P in formula (B1) is preferably a diketopyrrolopyrrole structure, a pyrrolopyrrole structure, an azomethine structure, an isoindoline structure, a quinophthalone structure, an azo structure, an anthraquinone structure, a thiazine indigo structure, a quinacridone structure, a benzindole structure, a phthalocyanine structure or a dioxazine structure, and more preferably an azomethine structure.

[0153] The n+1-valent linking group represented by L in formula (B1) includes an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, -O-, -S-, -CO-, -COO-, -OCO-, -SO 2 -、-NR L -、-NR L CO-、-CONR L -、-NR L SO 2 -、-SO 2 NR L- And groups consisting of combinations thereof. L represents a hydrogen atom, an alkyl group or an aryl group. The number of carbon atoms of the aliphatic hydrocarbon group is preferably 1 to 20, more preferably 2 to 20, further preferably 2 to 10, and particularly preferably 2 to 5. The aliphatic hydrocarbon group may be any of a linear, branched or cyclic shape. Furthermore, the cyclic aliphatic hydrocarbon group may be any of a monocyclic or a polycyclic shape. The number of carbon atoms of the aromatic hydrocarbon group is preferably 6 to 18, more preferably 6 to 14, and further preferably 6 to 10. The aromatic hydrocarbon group is preferably a monocyclic or condensed aromatic hydrocarbon group having a condensed number of 2 to 4. As the aromatic hydrocarbon group, a benzene ring group is preferred. The heterocyclic group is preferably a monocyclic or condensed ring having a condensed number of 2 to 4. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The heteroatoms constituting the ring of the heterocyclic group are preferably nitrogen atoms, oxygen atoms or sulfur atoms. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 3 to 30, more preferably 3 to 18, and more preferably 3 to 12. As the heterocyclic group, a triazine ring group is preferred. The aliphatic hydrocarbon group, the aromatic hydrocarbon group and the heterocyclic group may have a substituent. As the substituent, there can be mentioned the substituent T described later. L The number of carbon atoms in the alkyl group represented is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. L The alkyl group represented by may further have a substituent. As the substituent, there can be mentioned the substituent T described below. LThe number of carbon atoms of the aryl group represented by is preferably 6 to 30, more preferably 6 to 20, and still more preferably 6 to 12. L The aryl group represented by may further have a substituent. As the substituent, the substituent T described below can be mentioned.

[0154] Examples of the acidic group and basic group represented by X in the formula (B1) include the above-mentioned acidic groups and basic groups.

[0155] In formula (B1), m is preferably 1 or 2.

[0156] In formula (B1), n ​​is preferably 1 or 2.

[0157] When the specific particles are particles of a compound having a triazine structure and an acidic group or a basic group, examples of such specific particles include particles of a compound having a group represented by formula (A1).

[0158] [Chemical formula 3]

[0159]

[0160] In formula (A1), * represents a bonding bond,

[0161] Ya 1 And Ya 2 Each independently represents -N(Ra 1 )-or-O-,

[0162] Ra 1 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group,

[0163] B 1 and B 2 Each independently represents a hydrogen atom or a substituent.

[0164] Ya in formula (A1) 1 And Ya 2 Each independently represents -N(Ra 1 )- or -O-, preferably -N(Ra 1 )-. 1 It represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, and is preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom.

[0165] Ra 1 The number of carbon atoms in the alkyl group represented is preferably 1 to 20, more preferably 1 to 15, and still more preferably 1 to 8. The alkyl group may be any of linear, branched, and cyclic, preferably linear or branched, and more preferably linear. 1 The alkyl group represented may further have a substituent. Examples of the substituent include the substituent T described below.

[0166] Ra1 The number of carbon atoms of the alkenyl group represented is preferably 2 to 20, more preferably 2 to 12, and particularly preferably 2 to 8. The alkenyl group may be linear, branched, or cyclic, preferably linear or branched, and more preferably linear. 1 The alkenyl group represented may further have a substituent. As the substituent, the substituent T described below can be mentioned.

[0167] Ra 1 The number of carbon atoms of the alkynyl group represented is preferably 2 to 40, more preferably 2 to 30, and particularly preferably 2 to 25. The alkynyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. 1 The alkynyl group represented may further have a substituent. As the substituent, the substituent T described below can be mentioned.

[0168] Ra 1 The number of carbon atoms of the aryl group represented by is preferably 6 to 30, more preferably 6 to 20, and still more preferably 6 to 12. 1 The aryl group represented by may further have a substituent. As the substituent, the substituent T described below can be mentioned.

[0169] B of formula (A1) 1 and B 2 Each independently represents a hydrogen atom or a substituent. As the substituent, the substituent T described below can be cited, preferably an alkyl group, an aryl group and a heterocyclic group, and more preferably an aryl group and a heterocyclic group. As a preferred embodiment, B 1 and B 2 One of them is a heterocyclic group and the other is an aryl group. The heterocyclic group is preferably a nitrogen-containing heterocyclic group, and more preferably a benzimidazolone group.

[0170] When the specific particles are particles of a compound having a triazine structure and an acid group or a basic group, the specific particles are preferably particles of a compound represented by the following formula (b1).

[0171] A 1 -L 1 -Z 1 ……(b1)

[0172] A in formula (b1) 1 It represents a group represented by the above-mentioned formula (A1).

[0173] L in formula (b1) 1 represents a single bond or a divalent linking group, preferably a divalent linking group. 1 The divalent linking group represented by may include an alkylene group, an arylene group, a heterocyclic group, -O-, -NR L1-, -NHCO-, -CONH-, -OCO-, -C00-, -CO-, -SO 2 NH-, -SO 2 - and combinations thereof. The number of carbon atoms of the alkylene group is preferably 1 to 30, more preferably 1 to 15, further preferably 1 to 8, and particularly preferably 1 to 5. The alkylene group may be any of linear, branched, and cyclic, preferably linear or branched, and particularly preferably linear. The number of carbon atoms of the arylene group is preferably 6 to 30, more preferably 6 to 15. The arylene group is preferably a phenylene group. R L1 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. L1 The preferred ranges of alkyl, alkenyl, alkynyl and aryl represented by 1 The preferred ranges of the alkyl, alkenyl, alkynyl and aryl groups are the same as those described above.

[0174] L 1 The divalent linking group represented is preferably a group represented by the following formula (L1).

[0175] -L 1A -L 1B -L 1C -……(L1)

[0176] Where, L 1A and L 1C Each independently represents -O-, -NR L1 -, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO 2 NH- or -SO 2 -, L 1B represents a single bond or a divalent connecting group.

[0177] As L 1B The divalent linking group represented by may be an alkylene group, an arylene group, or a group in which an alkylene group and an arylene group are linked via a single bond or -O-, -NR L1 -, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO 2 NH-, -SO 2 - and groups composed of a combination thereof, alkylene groups or arylene groups are bonded to each other via -O-, -NR L1 -, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO 2 NH-, -SO 2 - and groups formed by bonding groups consisting of combinations of these groups, etc.

[0178] As L 1Specific examples include groups with the following structures.

[0179] [Chemical formula 4]

[0180]

[0181] Z in formula (b1) 1 It represents a group having an acidic group or a basic group. Examples of the types of the acidic group and the basic group include the groups described above.

[0182] Z in formula (b1) 1 Preferred is a group represented by the formula (Z1) or a group represented by the formula (Z10).

[0183] [Chemical formula 5]

[0184]

[0185] In formula (Z1), * represents a bonding bond,

[0186] Y 1 Indicates -N(Ry 1 )-or-O-,

[0187] R 1 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group,

[0188] Lz 1 represents a divalent linking group,

[0189] R 1 and Rz 2 each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group,

[0190] R 1 With Rz 2 can be bonded via a divalent group to form a ring,

[0191] m represents an integer of 1-5.

[0192] [Chemical formula 6]

[0193]

[0194] In formula (Z10), * represents a bond, Lc 1 and Lc 2 Each independently represents a single bond or a linking group, Rc 1 and Rc 2 Each independently represents a substituent, Rc 1 and Rc 2 At least one of represents an acid group or a basic group.

[0195] First, the formula (Z1) is described.

[0196] In formula (Z1), Yz 1 Indicates -N(Ry 1 )- or -O-, preferably -N(Ry 1 )-. 1 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. 1 The preferred ranges of alkyl, alkenyl, alkynyl and aryl represented by 1 The preferred ranges of the alkyl, alkenyl, alkynyl and aryl groups are the same as those described above.

[0197] In formula (Z1), as Lz 1 Examples of the divalent linking group represented by include an alkylene group, an arylene group, a heterocyclic group, -O-, -NR L1 -, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO 2 NH-, -SO 2 - and combinations thereof, preferably alkylene. The number of carbon atoms in the alkylene is preferably 1 to 30, more preferably 1 to 15, further preferably 1 to 8, particularly preferably 1 to 5. The alkylene may be linear, branched, or cyclic, preferably linear or branched, particularly preferably linear.

[0198] In formula (Z1), Rz 1 and Rz 2 Each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably an alkyl group or an aryl group, more preferably an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, and particularly preferably 1 or 2. The alkyl group may be any of a straight chain, a branched chain, or a cyclic group, preferably a straight chain or a branched chain, and more preferably a straight chain. The number of carbon atoms in the alkenyl group is preferably 2 to 10, more preferably 2 to 8, and particularly preferably 2 to 5. The alkenyl group may be any of a straight chain, a branched chain, or a cyclic group, preferably a straight chain or a branched chain, and more preferably a straight chain. The number of carbon atoms in the alkynyl group is preferably 2 to 10, more preferably 2 to 8, and particularly preferably 2 to 5. The alkynyl group may be any of a straight chain, a branched chain, or a cyclic group, preferably a straight chain or a branched chain, and more preferably a straight chain. The number of carbon atoms in the aryl group is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 12.

[0199] In formula (Z1), Rz 1 With Rz 2 The ring can be formed by bonding via a divalent group. Examples of the divalent group include -CH 2 -、-O-、-SO 2 -. As Rz 1 With Rz 2Specific examples of the ring formed via the divalent group include the following.

[0200] [Chemical formula 7]

[0201]

[0202] In the formula (Z1), m represents an integer of 1 to 5, preferably 1 to 4, more preferably 1 to 3, further preferably 2 or 3, and particularly preferably 2.

[0203] The group represented by the formula (Z1) is preferably a group represented by the following formula (Z2).

[0204] [Chemical formula 8]

[0205]

[0206] In formula (Z2), * represents a bonding bond,

[0207] Y 2 Yz 3 Each independently represents -N(Ry 2 )-or-O-,

[0208] R 2 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group,

[0209] Lz 2 and Lz 3 Each independently represents a divalent linking group,

[0210] R 3 ~Rz 6 each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group,

[0211] R 3 With Rz 4 and Rz 5 With Rz 6 They may be bonded via a divalent group to form a ring.

[0212] Yz in formula (Z2) 2 Yz 3 The meaning is the same as Yz in formula (Z1) 1 The meaning is the same, and the preferred range is also the same. 2 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. 2 The preferred ranges of alkyl, alkenyl, alkynyl and aryl represented by 1 The preferred ranges of the alkyl, alkenyl, alkynyl and aryl groups are the same as those described above.

[0213] Lz of formula (Z2) 2 and Lz 3 The meaning is the same as Lz in formula (Z1) 1 The meanings are the same, and the preferred ranges are also the same. Rz in formula (Z2) 3 ~Rz 6 The meaning is the same as Rz in formula (Z1) 1 and Rz 2 The meanings are the same, and the preferred ranges are also the same.

[0214] Next, the formula (Z10) is described.

[0215] In formula (Z10), Lc 1 and Lc 2 Each independently represents a single bond or a linking group, preferably a divalent linking group. Examples of the divalent linking group include alkylene, arylene, -O-, -NR L1 -, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO 2 NH-, -SO 2 - and combinations thereof. The number of carbon atoms of the alkylene group is preferably 1 to 30, more preferably 1 to 15, further preferably 1 to 8, and particularly preferably 1 to 5. The alkylene group may be any of linear, branched, and cyclic, preferably linear or branched, and particularly preferably linear. The number of carbon atoms of the arylene group is preferably 6 to 30, more preferably 6 to 15. The arylene group is preferably a phenylene group. R L1 R represents a hydrogen atom, an alkyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. L1 The number of carbon atoms in the alkyl group represented is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. L1 The alkyl group represented by may further have a substituent. As the substituent, there can be mentioned the substituent T described below. L1 The number of carbon atoms of the aryl group represented by is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. L1 The aryl group represented by may further have a substituent. As the substituent, the substituent T described below can be mentioned.

[0216] In formula (Z10), Rc 1 and Rc 2 Each independently represents a substituent. Examples of the substituent include an alkyl group, an aryl group, a heterocyclic group, a hydroxyl group, an acid group, and a basic group. 1 and Rc 2 At least one of represents an acid group or a basic group. Preferably Rc 1 and Rc 2 At least one of them is a basic group, more preferably Rc1 and Rc 2 Both are basic groups. As the acid group and the basic group, the above-mentioned groups can be mentioned. The number of carbon atoms in the alkyl group is preferably 1 to 30, more preferably 1 to 15, and further preferably 1 to 8. The alkyl group may be any of a straight chain, a branched chain, and a cyclic group, preferably a straight chain or a branched chain, and more preferably a straight chain. The number of carbon atoms in the aryl group is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 12. The heterocyclic group may be a monocyclic ring or a condensed ring. The heterocyclic group is preferably a monocyclic ring or a condensed ring with a condensation number of 2 to 4. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The heteroatoms constituting the ring of the heterocyclic group are preferably nitrogen atoms, oxygen atoms, or sulfur atoms. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 3 to 30, more preferably 3 to 18, and further preferably 3 to 12. The alkyl group, the aryl group, and the heterocyclic group may further have a substituent. As a substituent, the substituent T described below can be mentioned.

[0217] (Substituent T)

[0218] The substituent T may include the following groups: halogen atoms (e.g., fluorine atoms, chlorine atoms, bromine atoms, iodine atoms), alkyl groups (preferably alkyl groups having 1 to 30 carbon atoms), alkenyl groups (preferably alkenyl groups having 2 to 30 carbon atoms), alkynyl groups (preferably alkynyl groups having 2 to 30 carbon atoms), aryl groups (preferably aryl groups having 6 to 30 carbon atoms), heteroaryl groups (preferably heteroaryl groups having 1 to 30 carbon atoms), alkoxy groups (preferably alkoxy groups having 1 to 30 carbon atoms), aryloxy groups (preferably aryloxy groups having 6 to 30 carbon atoms), heteroaryloxy groups (preferably heteroaryloxy groups having 1 to 30 carbon atoms), acyl groups (preferably acyl groups having 2 to 30 carbon atoms), alkoxycarbonyl groups (preferably carbonyl groups having 2 to 30 carbon atoms), atom), an alkoxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), a heteroaryloxycarbonyl group (preferably a heteroaryloxycarbonyl group having 2 to 30 carbon atoms), an acyloxy group (preferably an acyloxy group having 2 to 30 carbon atoms), an acylamino group (preferably an acylamino group having 2 to 30 carbon atoms), an aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), an alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), an aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 30 carbon atoms), a sulfamoyl group (preferably a sulfamoyl group having 0 to 30 carbon atoms), an sulfamoyl group a styryl group (preferably a styryl group having 1 to 30 carbon atoms), a styryl group (preferably a styryl group having 1 to 30 carbon atoms), a styryl group (preferably a styryl group having 6 ...6 to 30 carbon atoms), a styryl group (preferably a styryl group having 6 to 30 carbon atoms), a styryl group (preferably a styryl group having 6 to 30 carbon atoms), a styryl group ), heteroarylsulfonyl (preferably a heteroarylsulfonyl having 1 to 30 carbon atoms), heteroarylsulfonylamino (preferably a heteroarylsulfonylamino having 1 to 30 carbon atoms), alkylsulfinyl (preferably an alkylsulfinyl having 1 to 30 carbon atoms), arylsulfinyl (preferably an arylsulfinyl having 6 to 30 carbon atoms), heteroarylsulfinyl (preferably a heteroarylsulfinyl having 1 to 30 carbon atoms), urea (preferably a urea having 1 to 30 carbon atoms), hydroxyl, nitro, imido, mercapto, cyano, alkylsulfinyl, arylsulfinyl, arylazo, heteroarylazo, silyl, hydrazino, and imino. When these groups are further substituted, they may further have a substituent. As the substituent, the groups described in the substituent T above can be given.

[0219] Specific examples of specific particles include compounds described in the examples described below, compounds described in Japanese Patent Publication No. 56-118462, compounds described in Japanese Patent Publication No. 63-264674, compounds described in Japanese Patent Publication No. 01-217077, compounds described in Japanese Patent Publication No. 03-009961, compounds described in Japanese Patent Publication No. 03-026767, compounds described in Japanese Patent Publication No. 03-153780, compounds described in Japanese Patent Publication No. 03-045662, compounds described in Japanese Patent Publication No. 04-285669 The compounds described in Japanese Patent Application Laid-Open No. 06-145546, the compounds described in Japanese Patent Application Laid-Open No. 06-212088, the compounds described in Japanese Patent Application Laid-Open No. 06-240158, the compounds described in Japanese Patent Application Laid-Open No. 10-030063, the compounds described in Japanese Patent Application Laid-Open No. 10-195326, the compounds described in paragraphs 0086 to 0098 of International Publication No. 2011 / 024896, the compounds described in paragraphs 0063 to 0094 of International Publication No. 2012 / 102399, the compounds described in paragraph 0082 of International Publication No. 2017 / 038252 The compounds described in paragraph 0171 of Japanese Patent Application Laid-Open No. 2015-151530, the compounds described in paragraphs 0162 to 0183 of Japanese Patent Application Laid-Open No. 2011-252065, the compounds described in Japanese Patent Application Laid-Open No. 2003-081972, the compounds described in Japanese Patent No. 5299151, the compounds described in Japanese Patent Application Laid-Open No. 2015-172732, the compounds described in Japanese Patent Application Laid-Open No. 2014-199308, the compounds described in Japanese Patent Application Laid-Open No. 2014-085562, the compounds described in Japanese Patent Application Laid-Open No. 2014-035351 Compounds, compounds described in Japanese Patent Publication No. 2008-081565, compounds described in Japanese Patent Publication No. 2019-109512, compounds described in Japanese Patent Publication No. 2019-133154, diketopyrrolopyrrole compounds having a thiol linking group described in International Publication No. 2020 / 002106, benzimidazolone compounds described in Japanese Patent Publication No. 2018-168244, isoindoline compounds or salts thereof described in Japanese Patent Publication No. 2020-160279, compounds having an isoindoline skeleton represented by the general formula (1) described in Japanese Patent No. 6996282, etc.

[0220] The content of the specific particles is preferably 1 to 70 parts by mass relative to 100 parts by mass of the pigment. The lower limit is preferably 2 parts by mass or more, more preferably 3 parts by mass or more, and further preferably 5 parts by mass or more. The upper limit is preferably 60 parts by mass or less, more preferably 50 parts by mass or less, and further preferably 40 parts by mass or less. The specific particles may be used in one kind only or in combination of two or more kinds. When two or more kinds are used in combination, their total amount is preferably within the above range.

[0221] Resin

[0222] The resin composition of the present invention contains a resin. For example, the resin is prepared for the purpose of dispersing a pigment in the resin composition or for the purpose of an adhesive. In addition, the resin mainly used for dispersing a pigment is also referred to as a dispersant. However, this use of the resin is an example, and the resin can also be used for purposes other than this use.

[0223] As the resin, for example, there can be mentioned a (meth)acrylic resin, an epoxy resin, a (meth)acrylamide resin, an ene-thiol resin, a polycarbonate resin, a polyether resin, a polyarylate resin, a polysulfone resin, a polyethersulfone resin, a polyphenylene resin, a polyarylene ether phosphine oxide resin, a polyimide resin, a polyamideimide resin, a polyolefin resin, a cyclic olefin resin, a polyester resin, a styrene resin, a siloxane resin, and the like. In addition, as the resin, the resin described in the embodiment of International Publication No. 2016 / 088645, the resin described in Japanese Patent Application Publication No. 2017-057265, the resin described in Japanese Patent Application Publication No. 2017-032685, the resin described in Japanese Patent Application Publication No. 2017-075248, the resin described in Japanese Patent Application Publication No. 2017-066240, the resin described in Japanese Patent Application Publication No. 2017-167513, the resin described in Japanese Patent Application Publication No. 2017-173787, the resin described in paragraphs 0041 to 0060 of Japanese Patent Application Publication No. 2017-206689, the resin described in paragraphs 0022 to 0071 of Japanese Patent Application Publication No. 2018-010856, the resin described in paragraphs 0022 to 0071 of Japanese Patent Application Publication No. 2016-222891, The blocked polyisocyanate resin described in the Japanese Patent Publication No. 2020-122052, the resin described in Japanese Patent Publication No. 2020-111656, the resin described in Japanese Patent Publication No. 2020-139021, the resin containing a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain described in Japanese Patent Publication No. 2017-138503, the resin described in paragraphs 0199 to 0233 of Japanese Patent Publication No. 2020-186373, the alkali-soluble resin described in Japanese Patent Publication No. 2020-186325, the resin represented by formula 1 described in Korean Patent Publication No. 10-2020-0078339, and the copolymer containing an epoxy group and an acid group described in International Publication No. 2022 / 030445.

[0224] The weight average molecular weight (Mw) of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit is preferably 4,000 or more, more preferably 5,000 or more.

[0225] As the resin, a resin having an acid group is preferably used. Examples of the acid group include a carboxyl group, a phosphoric acid group, a sulfonic acid group, and a phenolic hydroxyl group.

[0226] The acid value of the resin having an acid group is preferably 30 to 500 mgKOH / g. The lower limit is more preferably 40 mgKOH / g or more, particularly preferably 50 mgKOH / g or more. The upper limit is more preferably 400 mgKOH / g or less, further preferably 300 mgKOH / g or less, particularly preferably 200 mgKOH / g or less. The weight average molecular weight (Mw) of the resin having an acid group is preferably 5000 to 100000, more preferably 5000 to 50000. Furthermore, the number average molecular weight (Mn) of the resin having an acid group is preferably 1000 to 20000.

[0227] The resin having an acid group preferably contains a repeating unit having an acid group on the side chain, and more preferably contains 5 to 70 mol% of the repeating unit having an acid group on the side chain in the total repeating units of the resin. The upper limit of the content of the repeating unit having an acid group on the side chain is preferably 50 mol% or less, more preferably 30 mol% or less. The lower limit of the content of the repeating unit having an acid group on the side chain is preferably 10 mol% or more, more preferably 20 mol% or more.

[0228] Regarding the resin having an acid group, reference can be made to paragraphs 0558 to 0571 of Japanese Patent Publication No. 2012-208494 (paragraphs 0685 to 0700 of the corresponding U.S. Patent Application Publication No. 2012 / 0235099), and paragraphs 0076 to 0099 of Japanese Patent Publication No. 2012-198408, which are incorporated into this specification. In addition, commercially available products can also be used as resins having an acid group. In addition, the method for introducing an acid group into the resin is not particularly limited, but for example, the method described in Japanese Patent Publication No. 6349629 can be cited. In addition, as a method for introducing an acid group into the resin, a method for introducing an acid group by reacting the hydroxyl group generated in the ring-opening reaction of the epoxy group with an acid anhydride can also be cited.

[0229] As the resin, a resin having a basic group can also be used. The resin having a basic group is preferably a resin containing a repeating unit having a basic group on the side chain, more preferably a copolymer having a repeating unit having a basic group on the side chain and a repeating unit not containing a basic group, and further preferably a block copolymer having a repeating unit having a basic group on the side chain and a repeating unit not containing a basic group. The resin having a basic group can also be used as a dispersant. The amine value of the resin having a basic group is preferably 5 to 300 mgKOH / g. The lower limit is preferably 10 mgKOH / g or more, more preferably 20 mgKOH / g or more. The upper limit is preferably 200 mgKOH / g or less, more preferably 100 mgKOH / g or less.

[0230] Examples of commercially available products of the resin having a basic group include DISPERBYK-161, 162, 163, 164, 166, 167, 168, 174, 182, 183, 184, 185, 2000, 2001, 2050, 2150, 2163, 2164, BYK-LPN6919 (all manufactured by BYK-Chemie GmbH), SOLSPERSE 11200, 13240, 13650, 13940, 24000, 26000, 28000, 32000, 32500, 32550, 32600, 33000, 34750, 35100, 35200, 37500, 38500, 39000, 53095, 56000, 7100 (all manufactured by Japan Lubrizol Corporation), Efka PX 4300, 4330, 4046, 4060, 4080 (all manufactured by BASF), etc. In addition, the resin having a basic group can also use the block copolymer (B) described in paragraphs 0063 to 0112 of Japanese Patent Publication No. 2014-219665, the block copolymer A1 described in paragraphs 0046 to 0076 of Japanese Patent Publication No. 2018-156021, and the vinyl resin having a basic group described in paragraphs 0150 to 0153 of Japanese Patent Publication No. 2019-184763, and these contents are incorporated into the present description.

[0231] The resin preferably uses a resin having an acid group and a resin having a basic group. When a resin having an acid group and a resin having a basic group are used together, the content of the resin having a basic group is preferably 20 to 500 parts by mass, more preferably 30 to 300 parts by mass, and even more preferably 50 to 200 parts by mass relative to 100 parts by mass of the resin having an acid group.

[0232] As the resin, it is also preferable to use a resin containing repeating units derived from the following monomer components, wherein the monomer includes a compound represented by the following formula (ED1) and / or a compound represented by the following formula (ED2) (hereinafter, these compounds may also be referred to as "ether dimers").

[0233] [Chemical formula 9]

[0234]

[0235] In formula (ED1), R 1 and R 2 Each independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 25 carbon atoms.

[0236] [Chemical formula 10]

[0237]

[0238] In formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. For details of formula (ED2), reference can be made to the description of Japanese Unexamined Patent Publication No. 2010-168539, the contents of which are incorporated herein.

[0239] For specific examples of the ether dimer, reference can be made to the description in paragraph 0317 of JP-A-2013-029760, for example, and the contents are incorporated into the present specification.

[0240] As the resin, a resin containing a repeating unit derived from a compound represented by the formula (X) is also preferably used.

[0241] [Chemical formula 11]

[0242]

[0243] In the formula, R 1 represents a hydrogen atom or a methyl group, R 21 and R 22 Each independently represents an alkylene group, and n represents an integer of 0 to 15. 21 and R 22 The number of carbon atoms of the alkylene group represented is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, particularly preferably 2 or 3. n represents an integer of 0 to 15, preferably an integer of 0 to 5, more preferably an integer of 0 to 4, further preferably an integer of 0 to 3.

[0244] Examples of the compound represented by formula (X) include ethylene oxide- or propylene oxide-modified (meth)acrylate of para-cumylphenol, and examples of commercially available products include ARONIX M-110 (manufactured by TOAGOSEICO, LTD.).

[0245] As the resin, it is also preferred to use a resin having a crosslinking group. As the crosslinking group, groups containing ethylenically unsaturated bonds and cyclic ether groups can be cited. As the group containing ethylenically unsaturated bonds, vinyl, styryl, (meth)allyl, (meth)acryloyl, etc. can be cited. As the cyclic ether group, epoxy, oxetanyl, etc. can be cited, preferably epoxy. The epoxy can be an alicyclic epoxy. In addition, an alicyclic epoxy refers to a monovalent functional group having a cyclic structure formed by condensation of an epoxy ring and a saturated hydrocarbon ring.

[0246] As the resin, it is also preferred to use a resin having an aromatic carboxyl group (hereinafter also referred to as resin Ac). In resin Ac, the aromatic carboxyl group may be contained in the main chain of the repeating unit or in the side chain of the repeating unit. The aromatic carboxyl group is preferably contained in the main chain of the repeating unit. In addition, in this specification, the aromatic carboxyl group refers to a group having a structure in which one or more carboxyl groups are bonded to an aromatic ring. In the aromatic carboxyl group, the number of carboxyl groups bonded to the aromatic ring is preferably 1 to 4, more preferably 1 to 2.

[0247] The resin Ac is preferably a resin containing at least one repeating unit selected from the repeating unit represented by the formula (Ac-1) and the repeating unit represented by the formula (Ac-2).

[0248] [Chemical formula 12]

[0249]

[0250] In formula (Ac-1), Ar 1 represents a group containing an aromatic carboxyl group, L 1 Indicates -COO- or -CONH-, L 2 represents a divalent linking group.

[0251] In formula (Ac-2), Ar 10 represents a group containing an aromatic carboxyl group, L 11 Indicates -COO- or -CONH-, L 12 represents a trivalent linking group, P 10 Represents a polymer chain.

[0252] In formula (Ac-1), as Ar 1 Examples of the aromatic carboxyl group-containing group include structures derived from aromatic tricarboxylic anhydrides, structures derived from aromatic tetracarboxylic anhydrides, etc. Examples of the aromatic tricarboxylic anhydrides and aromatic tetracarboxylic anhydrides include compounds of the following structures.

[0253] [Chemical formula 13]

[0254]

[0255] In the above formula, Q 1 Represents a single bond, -O-, -CO-, -COOCH 2 CH 2 OCO-, -SO 2 -、-C(CF 3 ) 2 -, a group represented by the following formula (Q-1) or a group represented by the following formula (Q-2).

[0256] [Chemical formula 14]

[0257]

[0258] Ar 1 The group containing an aromatic carboxyl group represented by may have a crosslinking group. The crosslinking group is preferably a group containing an ethylenically unsaturated bond and a cyclic ether group, and more preferably a group containing an ethylenically unsaturated bond. 1 Specific examples of the aromatic carboxyl group-containing group represented by include a group represented by the formula (Ar-11), a group represented by the formula (Ar-12), a group represented by the formula (Ar-13), and the like.

[0259] [Chemical formula 15]

[0260]

[0261] In the formula (Ar-11), n1 represents an integer of 1 to 4, preferably 1 or 2, and more preferably 2.

[0262] In the formula (Ar-12), n2 represents an integer of 1 to 8, preferably an integer of 1 to 4, more preferably 1 or 2, and further preferably 2.

[0263] In formula (Ar-13), n3 and n4 each independently represent an integer of 0 to 4, preferably an integer of 0 to 2, more preferably 1 or 2, and further preferably 1. However, at least one of n3 and n4 is an integer of 1 or more.

[0264] In the formula (Ar-13), Q 1 Represents a single bond, -O-, -CO-, -COOCH 2 CH 2 OCO-, -SO 2 -、-C(CF 3 ) 2 -, a group represented by the above formula (Q-1) or a group represented by the above formula (Q-2).

[0265] In the formulas (Ar-11) to (Ar-13), *1 represents 1 bonding position.

[0266] In formula (Ac-1), L 1 It represents -COO- or -CONH-, and preferably represents -COO-.

[0267] In formula (Ac-1), L 2The divalent linking group represented by may include alkylene, arylene, -O-, -CO-, -COO-, -OCO-, -NH-, -S-, and a group formed by combining two or more of them. The number of carbon atoms of the alkylene is preferably 1 to 30, more preferably 1 to 20, and further preferably 1 to 15. The alkylene may be any of linear, branched, and cyclic. The number of carbon atoms of the arylene is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 10. The alkylene and arylene groups may have substituents. As substituents, hydroxyl groups and the like may be mentioned. L 2 The divalent linking group represented by is preferably -L 2a -O- represented group. 2a Examples include alkylene groups; arylene groups; groups formed by combining alkylene groups and arylene groups; groups formed by combining at least one selected from alkylene groups and arylene groups with at least one selected from -O-, -CO-, -COO-, -OCO-, -NH- and -S-, preferably alkylene groups. The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and further preferably 1 to 15. The alkylene group may be any of a linear, branched and cyclic group. The alkylene group and arylene group may have a substituent. As the substituent, a hydroxyl group and the like may be mentioned.

[0268] In formula (Ac-2), as Ar 10 The group containing an aromatic carboxyl group represented by 1 The meanings are the same, and the preferred ranges are also the same.

[0269] In formula (Ac-2), L 11 It represents -COO- or -CONH-, and preferably represents -COO-.

[0270] In formula (Ac-2), as L 12 The trivalent linking group represented by may include hydrocarbon groups, -O-, -CO-, -COO-, -OCO-, -NH-, -S-, and groups formed by combining two or more of them. Examples of hydrocarbon groups include aliphatic hydrocarbon groups and aromatic hydrocarbon groups. The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1 to 30, more preferably 1 to 20, and further preferably 1 to 15. The aliphatic hydrocarbon group may be any of straight chain, branched chain, and cyclic. The number of carbon atoms in the aromatic hydrocarbon group is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 10. The hydrocarbon group may have a substituent. Examples of the substituent include a hydroxyl group and the like. L 12 The trivalent connecting group represented is preferably a group represented by formula (L12-1), and more preferably a group represented by formula (L12-2).

[0271] [Chemical formula 16]

[0272]

[0273] In formula (L12-1), L 12b represents a trivalent linking group, X 1 represents S, and *1 represents L in formula (Ac-2) 11 The bonding position of *2 indicates the bonding position with P of formula (Ac-2). 10 The bonding position of L 12b The trivalent linking group represented by the above-mentioned may include a hydrocarbon group; a group formed by combining a hydrocarbon group and at least one selected from -O-, -CO-, -COO-, -OCO-, -NH- and -S-, etc., preferably a hydrocarbon group or a group formed by combining a hydrocarbon group and -O-.

[0274] In formula (L12-2), L 12c represents a trivalent linking group, X 1 represents S, and *1 represents L in formula (Ac-2) 11 The bonding position of *2 indicates the bonding position with P of formula (Ac-2). 10 The bonding position of L 12c Examples of the trivalent linking group represented by include a hydrocarbon group; and a group consisting of a hydrocarbon group and at least one selected from -O-, -CO-, -COO-, -OCO-, -NH- and -S-. Preferably, the hydrocarbon group is used.

[0275] In formula (Ac-2), P 10 Represents a polymer chain. 10 The polymer chain represented preferably has at least one structure selected from the group consisting of a polyester structure, a polyether structure, a polystyrene structure, and a poly(meth)acrylic acid structure. 10 The weight average molecular weight of is preferably 500 to 20,000. The lower limit is preferably 1,000 or more. The upper limit is preferably 10,000 or less, more preferably 5,000 or less, and further preferably 3,000 or less. 10 When the weight average molecular weight is within the above range, the dispersibility of the pigment in the composition is good. When the resin having an aromatic carboxyl group is a resin having a repeating unit represented by formula (Ac-2), the resin can be preferably used as a dispersant.

[0276] P 10 The polymer chain represented may contain a crosslinkable group. Examples of the crosslinkable group include a group containing an ethylenically unsaturated bond and a cyclic ether group.

[0277] As the resin, it is preferred to use at least one selected from the group consisting of a graft polymer, a star polymer, a block copolymer, and a resin in which at least one end of a polymer chain is capped with an acid group. Such a resin can be preferably used as a dispersant.

[0278] As graft polymers, there can be mentioned resins having repeating units containing graft chains and resins having repeating units represented by the above-mentioned formula (Ac-2). As graft chains, there can be mentioned graft chains containing at least one structure selected from a polyester structure, a polyether structure, a polystyrene structure and a poly(meth)acrylic acid structure. The terminal structure of the graft chain is not particularly limited. It can be a hydrogen atom or a substituent. As substituents, there can be mentioned alkyl groups, alkoxy groups, alkyl thioether groups and the like. Among them, from the viewpoint of improving the dispersibility of the pigment, groups having a steric repulsion effect are preferred, preferably alkyl groups or alkoxy groups having 5 to 30 carbon atoms. Alkyl groups and alkoxy groups can be any of linear, branched and cyclic, preferably linear or branched.

[0279] Specific examples of the graft polymer include resins described in paragraphs 0025 to 0094 of JP-A-2012-255128, paragraphs 0022 to 0097 of JP-A-2009-203462, and paragraphs 0102 to 0166 of JP-A-2012-255128.

[0280] Examples of the star polymer include resins having a structure in which a plurality of polymer chains are bonded to a core portion. Specific examples of the star polymer include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP-A-2013-043962.

[0281] As a block copolymer, it is preferred that the block of a polymer having a repeating unit containing an acid group or a basic group (hereinafter, also referred to as block A) and the block of a polymer having a repeating unit without an acid group and a basic group (hereinafter, also referred to as block B) are block copolymers. Block copolymers can also use block copolymers (B) described in paragraphs 0063 to 0112 of Japanese Patent Publication No. 2014-219665 and block copolymers A1 described in paragraphs 0046 to 0076 of Japanese Patent Publication No. 2018-156021, and these contents are incorporated into this description.

[0282] As the resin in which at least one end of the polymer chain is blocked with an acid group, there can be mentioned a resin having a structure in which at least one end of the polymer chain is blocked with an acid group, which contains at least one structure selected from a polyester structure, a polyether structure and a poly(meth)acrylic acid structure. As the acid group blocking the end of the polymer chain, there can be mentioned a carboxyl group, a sulfonic group and a phosphoric acid group.

[0283] The resin is preferably a resin used as a dispersant. As the dispersant, an acidic dispersant (acidic resin) and a basic dispersant (basic resin) can be cited. Here, the acidic dispersant (acidic resin) refers to a resin in which the amount of acid groups is greater than the amount of basic groups. As an acidic dispersant (acidic resin), when the total amount of the amount of acid groups and the amount of basic groups is set to 100 mol%, a resin in which the amount of acid groups is 70 mol% or more is preferred. The acid group possessed by the acidic dispersant (acidic resin) is preferably a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH / g. In addition, the basic dispersant (basic resin) refers to a resin in which the amount of basic groups is greater than the amount of acid groups. As an alkaline dispersant (basic resin), when the total amount of the amount of acid groups and the amount of basic groups is set to 100 mol%, a resin in which the amount of basic groups exceeds 50 mol% is preferred. The basic group possessed by the alkaline dispersant is preferably an amino group.

[0284] The dispersant can also be obtained as a commercial product, and specific examples thereof include Disperbyk series manufactured by BYK-Chemie GmbH (e.g., Disperbyk-111, 161, 2001, etc.), SOLSPERSE series manufactured by Lubrizol Japan Ltd. (e.g., SOLSPERSE 20000, 76500, etc.), Ajispar series manufactured by Ajinomoto Fine-Techno Co., Inc., A208F (manufactured by DKS Co. Ltd.), H-3606 (manufactured by DKS Co. Ltd.), SANDET ET (manufactured by SANYO KASEI CO., LTD.), etc. Furthermore, the products described in paragraph 0129 of Japanese Patent Application Laid-Open No. 2012-137564 and the products described in paragraph 0235 of Japanese Patent Application Laid-Open No. 2017-194662 can also be used as the dispersant.

[0285] The content of the resin in the total solid content of the resin composition is preferably 1 to 80% by mass. The lower limit is preferably 5% by mass or more, more preferably 10% by mass or more, further preferably 15% by mass or more, and particularly preferably 20% by mass or more. The upper limit is preferably 60% by mass or less, more preferably 50% by mass or less.

[0286] The content of the resin having an acid group in the total solid content of the resin composition is preferably 1 to 80% by mass. The lower limit is preferably 5% by mass or more, more preferably 10% by mass or more, further preferably 15% by mass or more, and particularly preferably 20% by mass or more. The upper limit is preferably 60% by mass or less, more preferably 50% by mass or less.

[0287] Furthermore, the content of the resin as a dispersant is preferably 10 to 150 parts by mass relative to 100 parts by mass of the pigment. The lower limit is preferably 15 parts by mass or more, more preferably 20 parts by mass or more. The upper limit is preferably 100 parts by mass or less, more preferably 80 parts by mass or less.

[0288] Solvents

[0289] The resin composition of the present invention contains a solvent. As the solvent, an organic solvent can be mentioned. The type of solvent is basically not particularly limited as long as it satisfies the solubility of each component or the coating property of the composition. As the organic solvent, ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, hydrocarbon solvents, etc. can be mentioned. For details of these, reference can be made to paragraph 0223 of International Publication No. 2015 / 166779, which is incorporated into this specification. In addition, cyclic alkyl substituted ester solvents and cyclic alkyl substituted ketone solvents can also be preferably used. Specific examples of the organic solvent include polyethylene glycol monomethyl ether, methylene chloride, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol mono Methyl ether acetate, 3-methoxy-N,N-dimethylpropionamide, 3-butoxy-N,N-dimethylpropionamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, γ-butyrolactone, cyclopentane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, 1,3-butanediol diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol, 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, isopropanol, etc. However, aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as organic solvents may be preferably reduced for reasons such as environmental considerations (for example, it can be 50 mass ppm (parts per million) or less, 10 mass ppm or less, or 1 mass ppm or less relative to the total amount of the organic solvent).

[0290] In the present invention, it is preferred to use an organic solvent with a low metal content, and the metal content of the organic solvent is preferably 10 mass ppb (parts per billion) or less. Organic solvents of mass ppt (parts pertrillion) level can be used as needed, and such organic solvents are provided, for example, by Toyo Gosei Co., Ltd. (Chemical Industry Daily, November 13, 2015).

[0291] As a method for removing impurities such as metals from an organic solvent, for example, distillation (molecular distillation, thin film distillation, etc.) or filtering using a filter can be cited. The filter pore size of the filter used in the filtration is preferably 10 μm or less, more preferably 5 μm or less, and further preferably 3 μm or less. The material of the filter is preferably polytetrafluoroethylene, polyethylene or nylon.

[0292] The organic solvent may contain isomers (compounds having the same number of atoms but different structures), and may contain only one isomer or a plurality of isomers.

[0293] The content of peroxide in the organic solvent is preferably 0.8 mmol / L or less, and more preferably substantially no peroxide is contained.

[0294] The content of the solvent in the resin composition is preferably 10 to 95% by mass, more preferably 20 to 90% by mass, and even more preferably 30 to 90% by mass.

[0295] Moreover, from the viewpoint of environmental regulation, it is preferred that the resin composition of the present invention does not substantially contain environmentally regulated substances. In addition, in the present invention, substantially free of environmentally regulated substances means that the content of environmentally regulated substances in the resin composition is 50 mass ppm or less, preferably 30 mass ppm or less, more preferably 10 mass ppm or less, and particularly preferably 1 mass ppm or less. Environmentally regulated substances include, for example, benzene; alkylbenzenes such as toluene and xylene; halogenated benzenes such as chlorobenzene, etc. These are registered as environmentally regulated substances according to REACH (Registration Evaluation Authorization and Restriction of CHemicals) rules, PRTR (Pollutant Release and Transfer Register) law, VOC (Volatile Organic Compounds) control, etc., and the amount of use or treatment method is strictly controlled. These compounds are sometimes used as solvents when manufacturing the various components used in the resin composition, and are sometimes mixed into the resin composition as residual solvents. From the viewpoint of human safety and environmental considerations, it is preferred to minimize these substances. As a method for reducing environmentally controlled substances, there can be cited a method of heating and reducing the system to a boiling point above the environmentally controlled substances and distilling and removing the environmentally controlled substances from the system to reduce the substances. In addition, when a small amount of environmentally controlled substances are distilled and removed, it is also effective to azeotropize with a solvent having the same boiling point as the solvent in order to improve efficiency. In addition, when containing a compound with free radical polymerizability, in order to suppress the free radical polymerization reaction during the reduced pressure distillation and cross-linking between molecules, an inhibitor can also be added and reduced pressure distillation can be performed. This distillation removal method can be performed at any stage, such as the stage of the product of the raw material reaction (for example, the resin solution or multifunctional monomer solution after polymerization) or the stage of the resin composition made by mixing these compounds.

[0296] 《Polymeric Compounds》

[0297] The resin composition of the present invention preferably contains a polymerizable compound. As the polymerizable compound, compounds having a group containing an ethylenically unsaturated bond can be cited. As the group containing an ethylenically unsaturated bond, vinyl, (meth)allyl, (meth)acryloyl, etc. can be cited. The polymerizable compound is preferably a free radical polymerizable compound.

[0298] The polymerizable compound may be in any chemical form such as a monomer, a prepolymer, or an oligomer, but preferably a monomer. The molecular weight of the polymerizable compound is preferably 100 to 2500. The upper limit is preferably 2000 or less, more preferably 1500 or less. The lower limit is preferably 150 or more, more preferably 250 or more.

[0299] The polymerizable compound is preferably a compound containing three or more groups containing ethylenically unsaturated bonds, and more preferably a compound containing four or more groups containing ethylenically unsaturated bonds. From the viewpoint of the storage stability of the resin composition, the upper limit of the group containing an ethylenically unsaturated bond is preferably 15 or less, more preferably 10 or less, and further preferably 6 or less. The polymerizable compound is preferably a trifunctional or higher (meth)acrylate compound, more preferably a 3-15functional (meth)acrylate compound, further preferably a 3-10functional (meth)acrylate compound, and particularly preferably a 3-6functional (meth)acrylate compound. Specific examples of the polymerizable compound include compounds described in paragraphs 0095 to 0108 of JP-A-2009-288705, paragraph 0227 of JP-A-2013-029760, paragraphs 0254 to 0257 of JP-A-2008-292970, paragraphs 0034 to 0038 of JP-A-2013-253224, paragraph 0477 of JP-A-2012-208494, JP-A-2017-048367, Japanese Patent No. 6057891, and Japanese Patent No. 6031807, and the contents thereof are incorporated into the present specification.

[0300] As the polymerizable compound, dipentaerythritol tri(meth)acrylate (commercially available as KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available as KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available as KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available as KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., NK EsterA-DPH-12E; manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), diglycerol EO (ethylene oxide)-modified (meth)acrylate (commercially available as M-460; manufactured by TOAGOSEI) can also be used. Co., Ltd.), pentaerythritol tetraacrylate (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd., NK EsterA-TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), ARONIX TO-2349 (manufactured by TOAGOSEICO., LTD.), NK Oligo UA-7200 (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), LIGHT ACRYLATE POB-AO (manufactured by KYOEISHA CHEMICAL Co., LTD.), etc.

[0301] As the polymerizable compound, trifunctional (meth)acrylate compounds such as trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide-modified tri(meth)acrylate, trimethylolpropane ethylene oxide-modified tri(meth)acrylate, isocyanuric acid ethylene oxide-modified tri(meth)acrylate, and pentaerythritol tri(meth)acrylate can also be used. Commercially available products of the trifunctional (meth)acrylate compound include ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, and M-450 (manufactured by TOAGOSEICO, LTD.), NK ESTER A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, and TMPT (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, and PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

[0302] As the polymerizable compound, a compound having an acid group such as a carboxyl group, a sulfonic group, a phosphoric acid group, etc. can also be used. Commercially available products of such compounds include ARONIX M-305, M-510, M-520, ARONIX TO-2349 (manufactured by TOAGOSEICO., LTD.), etc.

[0303] As a polymerizable compound, a compound having a caprolactone structure can also be used. For compounds having a caprolactone structure, reference can be made to paragraphs 0042 to 0045 of Japanese Patent Publication No. 2013-253224, which are incorporated into this specification. For compounds having a caprolactone structure, for example, DPCA-20, DPCA-30, DPCA-60, DPCA-120, etc., which are commercially available from Nippon Kayaku Co., Ltd. as the KAYARAD DPCA series, can be cited.

[0304] As a polymerizable compound, a polymerizable compound having an alkyleneoxy group can also be used. The polymerizable compound having an alkyleneoxy group is preferably a polymerizable compound having an ethyleneoxy group and / or a propyleneoxy group, more preferably a polymerizable compound having an ethyleneoxy group, and further preferably a 3-6 functional (meth) acrylate compound having 4 to 20 ethyleneoxy groups. As commercially available products of polymerizable compounds having an alkyleneoxy group, for example, SR-494, a 4-functional (meth) acrylate having 4 ethyleneoxy groups manufactured by Sartomer Company, Inc., KAYARAD TPA-330, a 3-functional (meth) acrylate having 3 isobutyleneoxy groups manufactured by Nippon Kayaku Co., Ltd., and the like can be cited.

[0305] As the polymerizable compound, a polymerizable compound having a fluorene skeleton can also be used. Examples of commercially available products include OGSOL EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., a (meth)acrylate monomer having a fluorene skeleton).

[0306] As the polymerizable compound, it is also preferable to use a compound that does not substantially contain environmentally regulated substances such as toluene. Examples of commercially available products of such a compound include KAYARAD DPHA LT and KAYARAD DPEA-12LT (manufactured by Nippon Kayaku Co., Ltd.).

[0307] As the polymerizable compound, polyurethane acrylates described in JP-48-041708, JP-51-037193, JP-02-032293, JP-02-016765, and carbamate compounds having an ethylene oxide skeleton described in JP-58-049860, JP-56-017654, JP-62-039417, JP-62-039418 are also preferred. In addition, polymerizable compounds having an amino structure or a thioether structure in the molecule described in JP-63-277653, JP-63-260909, JP-01-105238 are also preferably used. Furthermore, as the polymerizable compound, commercially available products such as UA-7200 (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, and LINC-202UA (manufactured by KYOEISHA CHEMICAL Co., Ltd.) can be used.

[0308] The content of the polymerizable compound in the total solid content of the resin composition is preferably 1 to 35% by mass. The upper limit is preferably 30% by mass or less, more preferably 25% by mass or less, further preferably 20% by mass or less, and particularly preferably 10% by mass or less. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more. The resin composition of the present invention may contain only one polymerizable compound or may contain two or more polymerizable compounds. When containing two or more polymerizable compounds, it is preferred that their total amount is within the above range.

[0309] Photopolymerization initiators.

[0310] The resin composition of the present invention preferably contains a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, it is preferably a compound that is photosensitized to light in the ultraviolet region to the visible region. The photopolymerization initiator is preferably a photo-radical polymerization initiator.

[0311] Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyltriazine compound, a benzyldimethylketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a hexaarylbiimidazole compound, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyloxadiazole compound, and a 3-aryl-substituted coumarin compound, more preferably a compound selected from the group consisting of an oxime compound, an α-hydroxyketone compound, an α-aminoketone compound, and an acylphosphine compound, and even more preferably an oxime compound. Examples of the photopolymerization initiator include compounds described in paragraphs 0065 to 0111 of JP-A-2014-130173, compounds described in JP-A-6301489, and MATERIAL STAGE 37-60p, vol. 19, No. 3, 2019, a peroxide-based photopolymerization initiator described in International Publication No. 2018 / 221177, a photopolymerization initiator described in International Publication No. 2018 / 110179, a photopolymerization initiator described in Japanese Patent Publication No. 2019-043864, a photopolymerization initiator described in Japanese Patent Publication No. 2019-044030, a peroxide-based initiator described in Japanese Patent Publication No. 2019-167313, an oxazolidinyl group described in Japanese Patent Publication No. 2020-055992 e) aminoacetophenone-based initiators, oxime-based photopolymerization initiators described in Japanese Patent Publication No. 2013-190459, polymers described in Japanese Patent Publication No. 2020-172619, compounds represented by formula 1 described in International Publication No. 2020 / 152120, compounds described in Japanese Patent Publication No. 2021-181406, photopolymerization initiators described in Japanese Patent Publication No. 2022-013379, compounds represented by formula (1) described in Japanese Patent Publication No. 2022-015747, fluorine-containing fluorene oxime ester-based photoinitiators described in Japanese Patent Publication No. 2021-507058, etc.

[0312] Specific examples of the hexaarylbiimidazole compound include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole and the like.

[0313] Examples of commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, and Omnirad 127 (all manufactured by tGM Resins BV), Irgacure 184, Irgacure 1173, Irgacure 2959, and Irgacure 127 (all manufactured by BASF). Examples of commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, and Omnirad 379EG (all manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, and Irgacure 379EG (all manufactured by BASF). Examples of commercially available products of the acylphosphine compound include Omnirad 819 and Omnirad TPO (both manufactured by IGM Resins BV), Irgacure 819 and Irgacure TPO (both manufactured by BASF).

[0314] Examples of oxime compounds include compounds described in paragraph 0142 of International Publication No. 2022 / 085485, compounds described in Japanese Patent No. 5430746, compounds described in Japanese Patent No. 5647738, compounds represented by the general formula (1) or compounds described in paragraphs 0022 to 0024 of Japanese Patent Application Publication No. 2021-173858, compounds represented by the general formula (1) or compounds described in paragraphs 0117 to 0120 of Japanese Patent Application Publication No. 2021-170089, and the like. Specific examples of oxime compounds include 3-benzoyloxyiminobutane-2-one, 3-acetoxyiminobutane-2-one, 3-propionyloxyiminobutane-2-one, 2-acetoxyiminopentane-3-one, 2-acetoxyimino-1-phenylpropane-1-one, 2-benzoyloxyimino-1-phenylpropane-1-one, 3-(4-toluenesulfonyloxy)iminobutane-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropane-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(0-acetyloxime), and the like. As commercial products, Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04 (all manufactured by BASF), TR-PBG-301, TR-PBG-304, TR-PBG-327 (manufactured by TRONLY), Adeka Optomer N-1919 (manufactured by ADEKA CORPORATION, photopolymerization initiator 2 described in Japanese Patent Publication No. 2012-014052). In addition, as oxime compounds, non-coloring compounds or compounds with high transparency and low color change are also preferably used. As commercial products, ADEKA ARKLS NCI-730, NCI-831, NCI-930 (all manufactured by ADEKA CORPORATION) and the like can be mentioned.

[0315] As the photopolymerization initiator, it is also possible to use an oxime compound having a fluorene ring, an oxime compound having a skeleton in which at least one benzene ring in a carbazole ring is converted into a naphthalene ring, an oxime compound having a fluorine atom, an oxime compound having a nitro group, an oxime compound having a benzofuran skeleton, an oxime compound having a substituent having a hydroxyl group bonded to the carbazole skeleton, and the compounds described in paragraphs 0143 to 0149 of International Publication No. 2022 / 085485.

[0316] Specific examples of the oxime compound that can be preferably used in the present invention are shown below, but the present invention is not limited to these.

[0317] [Chemical formula 17]

[0318]

[0319] [Chemical formula 18]

[0320]

[0321] [Chemical formula 19]

[0322]

[0323] The oxime compound is preferably a compound having a maximum absorption wavelength in the range of wavelength 350 to 500 nm, and more preferably a compound having a maximum absorption wavelength in the range of wavelength 360 to 480 nm. In addition, from the viewpoint of sensitivity, the molar absorption coefficient of the oxime compound at a wavelength of 365 nm or a wavelength of 405 nm is preferably high, more preferably 1000 to 300000, further preferably 2000 to 300000, and particularly preferably 5000 to 200000. The molar absorption coefficient of the compound can be measured using a known method. For example, it is preferably measured by a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian), using an ethyl acetate solvent, at a concentration of 0.01 g / L.

[0324] As the photopolymerization initiator, it is also preferable to use Irgacure OXE01 (manufactured by BASF) and / or Irgacure OXE02 (manufactured by BASF) and Omnirad 2959 (manufactured by IGM Resins BV) in combination.

[0325] As the photopolymerization initiator, a photoradical polymerization initiator having difunctional or trifunctional functions or more can be used. By using such a photoradical polymerization initiator, more than two free radicals are generated from one molecule of the photoradical polymerization initiator, so good sensitivity can be obtained. In addition, when a compound of an asymmetric structure is used, the crystallinity decreases and the solubility in a solvent etc. becomes high, and it becomes difficult to separate out over time, thereby being able to improve the stability over time of the resin combination. Specific examples of the bifunctional or trifunctional or higher photoradical polymerization initiator include dimers of oxime compounds described in JP-T 2010-527339, JP-T 2011-524436, International Publication No. 2015 / 004565, paragraphs 0407 to 0412 of JP-T 2016-532675, and paragraphs 0039 to 0055 of International Publication No. 2017 / 033680, and compounds described in JP-T 2013-522445 (E ) and compound (G), Cmpd1 to 7 described in International Publication No. 2016 / 034963, the oxime ester photoinitiator described in paragraph 0007 of Japanese Patent Publication No. 2017-523465, the photoinitiator described in paragraphs 0020 to 0033 of Japanese Patent Publication No. 2017-167399, the photopolymerization initiator (A) described in paragraphs 0017 to 0026 of Japanese Patent Publication No. 2017-151342, the oxime ester photoinitiator described in Japanese Patent No. 6469669, etc.

[0326] The content of the photopolymerization initiator in the total solid content of the resin composition is preferably 0.1 to 30% by mass. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. The upper limit is preferably 20% by mass or less, more preferably 15% by mass or less. The resin composition of the present invention may contain only one photopolymerization initiator or may contain two or more photopolymerization initiators. When containing two or more photopolymerization initiators, it is preferred that their total amount is within the above range.

[0327] 《Compounds having a cyclic ether group>

[0328] The resin composition of the present invention can contain a compound having a cyclic ether group. Examples of the cyclic ether group include an epoxy group, an oxetanyl group, and the like. The compound having a cyclic ether group is preferably a compound having an epoxy group (hereinafter, also referred to as an epoxy compound). Examples of the epoxy compound include compounds having one or more epoxy groups in one molecule, preferably compounds having two or more epoxy groups. The epoxy compound is preferably a compound having 1 to 100 epoxy groups in one molecule. The upper limit of the epoxy group contained in the epoxy compound can be set to, for example, 10 or less, or can be set to 5 or less. The lower limit of the epoxy group contained in the epoxy compound is preferably 2 or more. As the epoxy compound, the compounds described in paragraphs 0034 to 0036 of JP-A-2013-011869, paragraphs 0147 to 0156 of JP-A-2014-043556, paragraphs 0085 to 0092 of JP-A-2014-089408, the compounds described in JP-A-2017-179172, the xanthene type epoxy resin described in JP-A-2021-195421, and the xanthene type epoxy resin described in JP-A-2021-195422 can also be used.

[0329] The epoxy compound may be a low molecular weight compound (e.g., a molecular weight of less than 2000, and further a molecular weight of less than 1000), or a macromolecular compound (e.g., a molecular weight of 1000 or more, and when it is a polymer, the weight average molecular weight is 1000 or more). The weight average molecular weight of the compound having an epoxy group is preferably 200 to 100000, and more preferably 500 to 50000. The upper limit of the weight average molecular weight is more preferably 10000 or less, particularly preferably 5000 or less, and further preferably 3000 or less.

[0330] Commercially available products of the compound having a cyclic ether group include, for example, EHPE3150 (manufactured by Daicel Corporation), EPICLON N-695 (manufactured by DIC Corporation), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, and G-01758 (all manufactured by NOF CORPORATION, and are polymers containing an epoxy group).

[0331] The content of the compound having a cyclic ether group in the total solid content of the resin composition is preferably 0.1 to 20% by mass. The lower limit is, for example, more preferably 0.5% by mass or more, and further preferably 1% by mass or more. The upper limit is, for example, more preferably 15% by mass or less, and further preferably 10% by mass or less. The compound having a cyclic ether group may be used in only one kind or in two or more kinds. When two or more kinds are used, it is preferred that their total amount is within the above range.

[0332] 《Curing Accelerator>

[0333] The resin composition of the present invention can contain a curing accelerator. As a curing accelerator, a thiol compound, a methylol compound, an amine compound, a phosphonium salt compound, an amidine salt compound, an amide compound, an alkali generator, an isocyanate compound, an alkoxysilane compound, an onium salt compound, etc. can be cited. As a specific example of a curing accelerator, compounds described in paragraph 0164 of International Publication No. 2022 / 085485, compounds described in Japanese Patent Publication No. 2021-181406, etc. can be cited. The content of the curing accelerator in the total solid content of the resin composition is preferably 0.3 to 8.9% by mass, more preferably 0.8 to 6.4% by mass.

[0334] 《UV Absorber>

[0335] The resin composition of the present invention can contain an ultraviolet light absorber. As an ultraviolet light absorber, conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, triazine compounds, dibenzoyl compounds, etc. can be cited. As a specific example of an ultraviolet light absorber, the compound described in paragraph 0179 of International Publication No. 2022 / 085485, the reactive triazine ultraviolet light absorber described in Japanese Patent Publication No. 2021-178918, and the ultraviolet light absorber described in Japanese Patent Publication No. 2022-007884 can also be used.

[0336] The content of the ultraviolet absorber in the total solid content of the resin composition is preferably 0.01 to 10% by mass, and more preferably 0.01 to 5% by mass. The resin composition of the present invention may contain only one ultraviolet absorber, or may contain two or more ultraviolet absorbers. When containing two or more ultraviolet absorbers, it is preferred that their total amount is within the above range.

[0337] 《Inhibitors>

[0338] The resin composition of the present invention can contain a polymerization inhibitor. As the polymerization inhibitor, hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-tert-butylphenol), 2,2'-methylenebis (4-methyl-6-tert-butylphenol), N-nitrosophenylhydroxylamine salt (ammonium salt, cerium salt, etc.) can be cited. Among them, p-methoxyphenol is preferred. The content of the polymerization inhibitor in the total solid content of the resin composition is preferably 0.0001 to 5% by mass. The resin composition of the present invention may contain only one polymerization inhibitor, or may contain two or more polymerization inhibitors. When containing two or more polymerization inhibitors, it is preferred that their total amount is within the above range.

[0339] 《Silane coupling agent>

[0340] The resin composition of the present invention can contain a silane coupling agent. In this specification, a silane coupling agent refers to a silane compound having a hydrolyzable group and a functional group other than the hydrolyzable group. In addition, a hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can produce a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. As a hydrolyzable group, for example, a halogen atom, an alkoxy group, an acyloxy group, etc., preferably an alkoxy group, can be cited. That is, the silane coupling agent preferably has a compound of an alkoxysilyl group. In addition, as a functional group other than a hydrolyzable group, for example, vinyl, (meth) allyl, (meth) acryloyl, thiol, epoxy, oxetane, amino, urea, thioether, isocyanate, phenyl, etc. can be cited, preferably amino, (meth) acryloyl and epoxy. As a specific example of a silane coupling agent, the compound described in paragraph 0177 of International Publication No. 2022 / 085485 can be cited. The content of the silane coupling agent in the total solid content of the resin composition is preferably 0.01 to 15% by mass, and more preferably 0.05 to 10% by mass. The resin composition of the present invention may contain only one silane coupling agent, or may contain two or more silane coupling agents. When containing two or more silane coupling agents, it is preferred that their total amount is within the above range.

[0341] 《Surfactants>

[0342] The resin composition of the present invention may contain a surfactant. As the surfactant, various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant may be used. The surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant. Regarding the surfactant, reference may be made to the surfactants described in paragraphs 0238 to 0245 of International Publication No. 2015 / 166779, which are incorporated into this specification.

[0343] As the fluorine-based surfactant, the compounds described in paragraphs 0167 to 0173 of International Publication No. 2022 / 085485 can be used.

[0344] Examples of the nonionic surfactant include compounds described in paragraph 0174 of International Publication No. 2022 / 085485.

[0345] Examples of the silicone surfactant include DOWSIL SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, SF 8419 OIL (all manufactured by Dow Corning Toray Co., Ltd.), TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials Inc.), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (all manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-3760, BYK-UV3510 (all manufactured by BYK-Chemie GmbH), etc.

[0346] Furthermore, as the silicone-based surfactant, compounds having the following structures can also be used.

[0347] [Chemical formula 20]

[0348]

[0349] The content of the surfactant in the total solid content of the resin composition is preferably 0.001% to 5.0% by mass, and more preferably 0.005% to 3.0% by mass. The resin composition of the present invention may contain only one surfactant or two or more surfactants. When containing two or more surfactants, their total amount is preferably within the above range.

[0350] Antioxidants

[0351] The resin composition of the present invention can contain an antioxidant. As the antioxidant, phenolic antioxidants, amine antioxidants, phosphorus antioxidants, sulfur antioxidants, etc. can be mentioned. As the phenolic antioxidant, hindered phenol compounds can be mentioned. The phenolic antioxidant is preferably a compound having a substituent at a position adjacent to the phenolic hydroxyl group (ortho position). As the substituent, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferred. In addition, the antioxidant is also preferably a compound having a phenolic group and a phosphite group in the same molecule. In addition, the antioxidant can also preferably use a phosphorus antioxidant. Examples of the phosphorus-based antioxidant include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphorin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetrakis-tert-butyldibenzo[d,f][1,3,2]dioxaphosphorin-2-yl)oxy]ethyl]amine, and bis(2,4-di-tert-butyl-6-methylphenyl)ethyl phosphite. Commercially available antioxidants include, for example, ADEKA STAB AO-20, ADEKA STAB AO-30, ADEKA STAB AO-40, ADEKA STAB AO-50, ADEKA STAB AO-50F, ADEKA STAB AO-60, ADEKA STAB AO-60G, ADEKASTAB AO-80, ADEKA STAB AO-330 (all manufactured by ADEKA CORPORATION), etc. In addition, antioxidants may also include compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, compounds described in International Publication No. 2017 / 006600, compounds described in International Publication No. 2017 / 164024, and compounds described in Korean Patent Publication No. 10-2019-0059371. The content of the antioxidant in the total solid content of the resin composition is preferably 0.01 to 20% by mass, more preferably 0.3 to 15% by mass. The resin composition of the present invention may contain only one antioxidant, or may contain two or more antioxidants. When containing two or more antioxidants, it is preferred that their total amount is within the above range.

[0352] 《Other ingredients》

[0353] The resin composition of the present invention may contain sensitizers, curing accelerators, fillers, thermosetting accelerators, plasticizers and other additives (e.g., conductive particles, defoamers, flame retardants, leveling agents, peeling accelerators, fragrances, surface tension modifiers, chain transfer agents, etc.) as needed. By appropriately containing these ingredients, properties such as film properties can be adjusted. As these ingredients, the compounds described in paragraph 0182 of International Publication No. 2022 / 085485 can be cited.

[0354] The resin composition of the present invention may contain a light resistance improver. Examples of the light resistance improver include compounds described in paragraph 0183 of International Publication No. 2022 / 085485.

[0355] The resin composition of the present invention also preferably contains substantially no terephthalate. Here, “substantially contains no” means that the content of terephthalate is 1000 ppb or less, more preferably 100 ppb or less, and particularly preferably 0, based on the total amount of the resin composition.

[0356] The free metal content of the resin composition of the present invention is preferably 100 ppm or less, more preferably 50 ppm or less. In addition, the free halogen content is preferably 100 ppm or less, more preferably 50 ppm or less. As a method for reducing the free metal or halogen in the resin composition, methods such as washing with ion exchange water, filtration, ultrafiltration, and refining with ion exchange resin can be cited.

[0357] From the perspective of environmental regulation, the use of perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt is sometimes regulated. In the resin composition of the present invention, when the content of the above-mentioned compounds is reduced, the content of perfluoroalkyl sulfonic acid (especially perfluoroalkyl sulfonic acid with 6 to 8 carbon atoms in the perfluoroalkyl group) and its salt, and perfluoroalkyl carboxylic acid (especially perfluoroalkyl carboxylic acid with 6 to 8 carbon atoms in the perfluoroalkyl group) and its salt is preferably in the range of 0.01 ppb to 1,000 ppb, more preferably in the range of 0.05 ppb to 500 ppb, and further preferably in the range of 0.1 ppb to 300 ppb. The resin composition of the present invention may be substantially free of perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt. For example, by using a compound that can replace perfluoroalkyl sulfonic acid and its salt, and a compound that can replace perfluoroalkyl carboxylic acid and its salt, a resin composition that is substantially free of perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt can be selected. As compounds that can replace the regulated compounds, for example, compounds that are excluded from the regulated objects due to the difference in the number of carbon atoms of the perfluoroalkyl group can be cited. However, the above content does not prevent the use of perfluoroalkyl sulfonic acid and its salts and perfluoroalkyl carboxylic acid and its salts. The resin composition of the present invention can contain perfluoroalkyl sulfonic acid and its salts and perfluoroalkyl carboxylic acid and its salts within the maximum allowable range.

[0358] Storage Container

[0359] The storage container for the resin composition is not particularly limited, and a known storage container can be used. In addition, the storage container described in paragraph 0187 of International Publication No. 2022 / 085485 can be used.

[0360] <Method for producing resin composition>

[0361] The method for producing a resin composition of the present invention is characterized by comprising: dispersing a pigment in a solvent, and preparing a resin composition having a BET specific surface area of ​​2 to 300 m 2 / g of pigment derivatives and resins.

[0362] Examples of the solvent, pigment and resin include the solvents, pigments and resins described as those contained in the above-mentioned resin composition. The resin preferably contains a resin as a dispersant.

[0363] Preferred aspects of the chemical structure of the pigment derivative are the same as those described in the section of the specific particles contained in the above-mentioned resin composition.

[0364] The BET specific surface area of ​​the pigment derivatives based on the nitrogen adsorption method is 2 to 300 m 2 / g. The lower limit of the BET specific surface area of ​​the pigment derivative is preferably 3 m 2 / g or more, more preferably 5m 2 The upper limit of the BET specific surface area of ​​the pigment derivative is preferably 250 m 2 / g or less, more preferably 200m 2 / g or less, more preferably 150m 2 / g or less, more preferably 100m 2 When the BET specific surface area of ​​the pigment derivative as measured by a nitrogen adsorption method is within the above range, a resin composition having excellent dispersion stability of the pigment can be produced.

[0365] The average primary particle size of the pigment derivative is preferably 5 to 200 nm. The upper limit is preferably 150 nm or less, more preferably 100 nm or less. The lower limit is preferably 10 nm or more, more preferably 20 nm or more.

[0366] The average primary particle size of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more, further preferably 20 nm or more, and further preferably 30 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, further preferably 100 nm or less, further preferably 90 nm or less, and particularly preferably 80 nm or less.

[0367] The difference between the average primary particle size of the pigment derivative and the average primary particle size of the pigment is preferably 0 to 100 nm. The upper limit is preferably 50 nm or less, more preferably 30 nm or less. The lower limit is preferably 2 nm or more, more preferably 5 nm or more.

[0368] The method for producing a resin composition of the present invention comprises the following steps (dispersing a pigment in a solvent, and obtaining a BET specific surface area of ​​2 to 300 m2 by a nitrogen adsorption method). 2 After preparing the dispersion in the step of preparing the dispersion by mixing the obtained dispersion with other materials such as a polymerizable compound, a photopolymerization initiator, a resin, and a solvent, the other materials can be appropriately selected according to the purpose of the resin composition. For example, when preparing a resin composition for photolithography, it is preferred to select a material containing a polymerizable compound and a photopolymerization initiator as the other material. In addition, as other materials, resins, solvents, surfactants, silane coupling agents, inhibitors, ultraviolet absorbers, and the like, which are described in the above-mentioned items of the resin composition, can also be added.

[0369] When manufacturing the resin composition, it is preferred to filter the resin composition with a filter for the purpose of removing impurities, reducing defects, etc. As the type of filter used for filtering and the filtering method, the filters and filtering methods described in paragraphs 0196 to 0199 of International Publication No. 2022 / 085485 can be cited.

[0370] <Pigment derivatives>

[0371] The pigment derivative of the present invention is characterized in that it is a particle of a compound having at least one structure selected from the group consisting of a pigment structure and a triazine structure and an acid group or a basic group, wherein the BET specific surface area of ​​the particle based on a nitrogen adsorption method is 2 to 300 m 2 / g.

[0372] The lower limit of the BET specific surface area of ​​the pigment derivative is preferably 3 m 2 / g or more, more preferably 5m 2 The upper limit of the BET specific surface area of ​​the pigment derivative is preferably 250 m 2 / g or less, more preferably 200m 2 / g or less, more preferably 150m 2 / g or less, more preferably 100m 2 / g or less.

[0373] The average primary particle size of the pigment derivative is preferably 5 to 200 nm. The upper limit is preferably 150 nm or less, more preferably 100 nm or less. The lower limit is preferably 10 nm or more, more preferably 20 nm or more.

[0374] Preferred embodiments of the chemical structure of the pigment derivative are the same as those described in the section of the specific particles contained in the above-mentioned resin composition.

[0375] The pigment derivative of the present invention is preferably a dispersing aid.

[0376] <Film>

[0377] Film of the present invention is the film obtained by the above-mentioned resin composition of the present invention. The film thickness of film of the present invention can be appropriately adjusted according to the purpose. For example, the film thickness is preferably below 20 μ m, more preferably below 10 μ m, and further preferably below 5 μ m. The lower limit of the film thickness is preferably above 0.1 μ m, more preferably above 0.2 μ m, and further preferably above 0.3 μ m.

[0378] The film of the present invention can be used for color filters, near infrared transmission filters, near infrared cut-off filters, black matrices, light shielding films, etc. The film of the present invention can be preferably used as colored pixels of color filters. As colored pixels, red pixels, green pixels, blue pixels, magenta pixels, cyan pixels, yellow pixels, etc. can be cited.

[0379] When the film of the present invention is used as a near infrared cut filter, the maximum absorption wavelength of the film of the present invention is preferably present in the range of wavelengths of 700 to 1800 nm, more preferably in the range of wavelengths of 700 to 1400 nm, and further preferably in the range of wavelengths of 700 to 1200 nm. In addition, the transmittance in all ranges of wavelengths of 400 to 650 nm of the film is preferably 70% or more, more preferably 80% or more, and further preferably 90% or more. In addition, the transmittance at at least one point in the range of wavelengths of 700 to 1800 nm of the film is preferably 20% or less. In addition, the ratio of the absorbance Amax at the maximum absorption wavelength to the absorbance A550 at a wavelength of 550 nm (absorbance Amax / absorbance A550) is preferably 20 to 500, more preferably 50 to 500, further preferably 70 to 450, and particularly preferably 100 to 400.

[0380] When the film of the present invention is used as a near-infrared transmission filter, the film of the present invention preferably has any one of the following spectral characteristics (¨) to (i5).

[0381] (¨): A film having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 640 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 800 to 1500 nm. A film having such spectral characteristics can shield light in the wavelength range of 400 to 640 nm and transmit light with a wavelength exceeding 750 nm.

[0382] (i2): A film having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in a wavelength range of 400 to 750 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in a wavelength range of 900 to 1500 nm. A film having such spectral characteristics can shield light in a wavelength range of 400 to 750 nm and can transmit light with a wavelength exceeding 850 nm.

[0383] (i3): A film having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 830 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1000 to 1500 nm. A film having such spectral characteristics can shield light in the wavelength range of 400 to 830 nm and can transmit light with a wavelength exceeding 950 nm.

[0384] (i4): A film having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in a wavelength range of 400 to 950 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in a wavelength range of 1100 to 1500 nm. A film having such spectral characteristics can shield light in a wavelength range of 400 to 950 nm and can transmit light with a wavelength exceeding 1050 nm.

[0385] (i 5): A film having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm. A film having such spectral characteristics can shield light in the wavelength range of 400 to 1050 nm and can transmit light with a wavelength exceeding 1150 nm.

[0386] <Method for producing film>

[0387] Next, the manufacturing method of the film of the present invention is described. The film of the present invention can be manufactured by applying the process of the resin composition of the present invention. In the manufacturing method of the film, it is preferred to also include a process of forming a pattern (pixel). As the formation method of the pattern (pixel), photolithography, dry etching method, preferably photolithography can be cited.

[0388] The pattern formation by photolithography preferably includes the following steps: a step of forming a resin composition layer on a support using the resin composition of the present invention; a step of exposing the resin composition layer in a pattern; and a step of developing and removing the unexposed portion of the resin composition layer to form a pattern (pixel). If necessary, a step of baking the resin composition layer (pre-baking step) and a step of baking the developed pattern (pixel) (post-baking step) may also be provided.

[0389] In the process of forming a resin composition layer, a resin composition layer is formed on a support using the resin composition of the present invention. As a support, it is not particularly limited and can be appropriately selected according to the purpose. For example, a glass substrate, a silicon substrate, etc. can be cited, preferably a silicon substrate. In addition, a charge coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, etc. can also be formed on the silicon substrate. In addition, a black matrix is ​​sometimes formed on the silicon substrate to isolate each pixel. In addition, in order to improve the adhesion with the upper layer, prevent the diffusion of substances or the flattening of the substrate surface, a primer layer can be provided on the silicon substrate. When measured with diiodomethane, the surface contact angle of the primer layer is preferably 20 to 70°. And, when measured with water, it is preferably 30 to 80°.

[0390] As a method for applying the resin composition, a known method can be used. For example, the coating method described in paragraph 0207 of International Publication No. 2022 / 085485 can be used.

[0391] The resin composition layer formed on the support can be dried (prebaked). When the film is manufactured by a low-temperature process, prebaking is not required. When prebaking is performed, the prebaking temperature is preferably below 150°C, more preferably below 120°C, and further preferably below 110°C. The lower limit can be set to above 50°C, for example, and can also be set to above 80°C. The prebaking time is preferably 10 to 300 seconds, more preferably 40 to 250 seconds, and further preferably 80 to 220 seconds. Prebaking can be performed using a hot plate, an oven, or the like.

[0392] Next, the resin composition layer is exposed in a pattern (exposure process). For example, a stepper, a scanner, etc. are used to expose the resin composition layer through a mask having a predetermined mask pattern, thereby exposing in a pattern. Thus, the exposed portion can be cured.

[0393] As radiation (light) that can be used during exposure, g-rays, i-rays, etc. can be cited. In addition, light with a wavelength of 300nm or less (preferably light with a wavelength of 180 to 300nm) can also be used. As light with a wavelength of 300nm or less, KrF rays (wavelength 248nm), ArF rays (wavelength 193nm), etc. can be cited, preferably KrF rays (wavelength 248nm). In addition, a light source with a long wavelength of more than 300nm can also be used. As a light source, an electrodeless ultraviolet lamp system, ultraviolet and infrared mixed curing can be used.

[0394] Furthermore, during exposure, light can be irradiated continuously or in pulses (pulse exposure). In addition, pulse exposure refers to an exposure method in which light is repeatedly irradiated and paused for a short period of time (e.g., less than milliseconds) to expose the image.

[0395] For example, the irradiation amount (exposure amount) is preferably 0.03 to 2.5 J / cm 2 , more preferably 0.05 to 1.0 J / cm 2 The oxygen concentration during exposure can be appropriately selected. In addition to exposure under the atmosphere, exposure can also be performed in a low oxygen atmosphere with an oxygen concentration of 19% by volume or less (e.g., 15% by volume, 5% by volume, or substantially oxygen-free), or in a high oxygen atmosphere with an oxygen concentration exceeding 21% by volume (e.g., 22% by volume, 30% by volume, or 50% by volume). In addition, the exposure illuminance can be appropriately set, usually from 1000 W / m 2 ~100000W / m 2 (For example, 5000W / m 2 , 15000W / m 2 or 35000W / m 2 The oxygen concentration and exposure illuminance can be appropriately combined. For example, the oxygen concentration can be set to 10% by volume and the illuminance can be set to 10000 W / m 2 , oxygen concentration 35 volume % and illumination 20000W / m 2 wait.

[0396] Next, the unexposed portion of the resin composition layer is removed by development to form a pattern (pixel). The unexposed portion of the resin composition layer can be removed by development using a developer. As a result, the unexposed portion of the resin composition layer in the exposure process is dissolved into the developer, and only the photocured portion remains. The temperature of the developer is preferably 20 to 30° C., for example. The development time is preferably 20 to 180 seconds. In addition, in order to improve the removability of the residue, the process of shaking off the developer every 60 seconds and then supplying a new developer can be repeated multiple times.

[0397] The developer may be an organic solvent, an alkaline developer, or the like, and an alkaline developer may be preferably used. As for the developer and the cleaning (rinsing) method after development, the developer or the cleaning method described in paragraph 0214 of International Publication No. 2022 / 085485 may be used.

[0398] It is preferred that additional exposure treatment or heating treatment (post-baking) is performed after development and drying. Additional exposure treatment or post-baking is a curing treatment after development for fully curing it. The heating temperature in the post-baking is preferably 100 to 240°C, more preferably 200 to 240°C, for example. The film after development can be post-baked continuously or intermittently using a heating mechanism such as a heating plate or a convection oven (hot air circulation dryer), a high-frequency heater, etc. in a manner that meets the above conditions so that the film meets the above conditions. In the case of additional exposure treatment, the light used for exposure is preferably light with a wavelength of less than 400nm. In addition, the additional exposure treatment can be performed by the method described in Korean Patent Gazette No. 10-2017-0122130.

[0399] The pattern formation by dry etching preferably includes the following steps: forming a resin composition layer on a support using the resin composition of the present invention, and curing the resin composition layer as a whole to form a cured layer; forming a photoresist layer on the cured layer; exposing the photoresist layer in a patterned manner, and then developing it to form a resist pattern; and using the resist pattern as a mask, using an etching gas to dry-etch the cured layer. When forming the photoresist layer, it is preferred to further implement a pre-baking treatment. In particular, as a process for forming the photoresist layer, it is preferred to implement a heating treatment after exposure and a heating treatment after development (post-baking treatment). Regarding the content of forming a pattern by dry etching, reference can be made to the records of paragraphs 0010 to 0067 of Japanese Patent Publication No. 2013-064993, which are incorporated into this specification.

[0400] <Optical filter>

[0401] The optical filter of the present invention has the above-mentioned film of the present invention. As the type of the optical filter, a color filter, a near infrared cut filter and a near infrared transmission filter can be cited, and a color filter is preferred. The color filter preferably has the film of the present invention as its pixel, and more preferably has the film of the present invention as a colored pixel.

[0402] In the optical filter, the film thickness of the film of the present invention can be appropriately adjusted according to the purpose. The film thickness is preferably 20 μm or less, more preferably 10 μm or less, and further preferably 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more, and further preferably 0.3 μm or more.

[0403] The width of the pixel contained in the filter is preferably 0.4 to 10.0 μm. The lower limit is preferably 0.4 μm or more, more preferably 0.5 μm or more, and further preferably 0.6 μm or more. The upper limit is preferably 5.0 μm or less, more preferably 2.0 μm or less, further preferably 1.0 μm or less, and further preferably 0.8 μm or less. In addition, the Young's modulus of the pixel is preferably 0.5 to 20 GPa, and more preferably 2.5 to 15 GPa.

[0404] Each pixel contained in the filter preferably has high flatness. Specifically, the surface roughness Ra of the pixel is preferably less than 100 nm, more preferably less than 40 nm, and further preferably less than 15 nm. There is no regulation on the lower limit, but for example, it is preferably greater than 0.1 nm. Regarding the surface roughness of the pixel, for example, it can be measured using AFM (atomic force microscope) Dimension3100 manufactured by Veeco. In addition, the water contact angle on the pixel can be appropriately set to a preferred value, but is generally in the range of 50 to 110°. The contact angle can be measured, for example, using a contact angle meter CV-DT·A type (manufactured by Kyowa Interface Science Co., LTD.). In addition, the volume resistance value of the pixel is preferably high. Specifically, the volume resistance value of the pixel is preferably 10 9 Ω·cm or more, more preferably 10 11 The upper limit is not specified, but for example, it is preferably 10 14 The volume resistance value of the pixel can be measured using an ultra high resistance meter 5410 (manufactured by Advantest Corporation).

[0405] In the optical filter, a protective layer can be provided on the surface of the film of the present invention. By providing a protective layer, various functions such as oxidation resistance, low reflection, hydrophilicity / hydrophobicity, and shielding of light of a specific wavelength (ultraviolet rays, near infrared rays, etc.) can be imparted. As the thickness of the protective layer, preferably 0.01 to 10 μm, more preferably 0.1 to 5 μm. As a method for forming the protective layer, a method of forming by coating a protective layer forming composition, a chemical vapor deposition method, a method of attaching a formed resin with an adhesive, etc. can be cited. Examples of the component constituting the protective layer include (meth) acrylic resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, polyol resins, polyvinylidene chloride resins, melamine resins, urethane resins, aramid resins, polyamide resins, alkyd resins, epoxy resins, modified silicone resins, fluororesins, polyacrylonitrile resins, cellulose resins, Si, C, W, Al 2O 3 、Mo、SiO 2 、Si 2 N 4 For example, in the case of a protective layer for the purpose of preventing oxidation, the protective layer preferably contains a polyol resin, SiO 2 and Si 2 N 4 Furthermore, in the case of a protective layer for the purpose of reducing reflection, the protective layer preferably contains a (meth)acrylic resin and a fluororesin.

[0406] The protective layer may contain organic / inorganic particles, absorbents of light of specific wavelengths (e.g., ultraviolet rays, near infrared rays, etc.), refractive index adjusters, antioxidants, adhesion agents, surfactants and other additives as needed. As examples of organic / inorganic particles, for example, polymer particles (e.g., silicone resin particles, polystyrene particles, melamine resin particles), titanium oxide, zinc oxide, zirconium oxide, indium oxide, aluminum oxide, titanium nitride, titanium oxynitride, magnesium fluoride, hollow silica, silicon dioxide, calcium carbonate, barium sulfate, etc. can be cited. The absorbent of light of specific wavelengths can use known absorbents. The content of these additives can be appropriately adjusted, but is preferably 0.1 to 70% by mass, and more preferably 1 to 60% by mass, relative to the total mass of the protective layer.

[0407] As the protective layer, the protective layer described in paragraphs 0073 to 0092 of Japanese Patent Application Laid-Open No. 2017-151176 can also be used.

[0408] The optical filter may have a structure in which pixels are embedded in spaces partitioned into, for example, a grid pattern by partition walls.

[0409] <Solid-state imaging device>

[0410] The solid-state imaging device of the present invention has the above-mentioned film of the present invention. The structure of the solid-state imaging device is not particularly limited as long as it is a structure that functions as a solid-state imaging device, and examples thereof include the following structures.

[0411] The structure of the solid-state imaging element is as follows: a plurality of photodiodes and transfer electrodes of polysilicon or the like including a light-receiving area constituting the solid-state imaging element (CCD (charge coupled device) image sensor, CMOS (complementary metal oxide semiconductor) image sensor, etc.) are provided on a substrate, a light-shielding film having only the light-receiving portion of the photodiode opened is provided on the photodiode and the transfer electrode, a device protection film composed of silicon nitride or the like formed in a manner covering the entire surface of the light-shielding film and the light-receiving portion of the photodiode is provided on the light-shielding film, and a color filter is provided on the device protection film. Furthermore, it may be a structure having a focusing mechanism (e.g., a microlens, etc., the same below) on the device protection film and below the color filter (on the side close to the substrate) or a structure having a focusing mechanism on the color filter. Furthermore, the color filter may have a structure in which each color pixel is embedded in a space separated by a partition wall, for example, in a grid shape. It is preferred that the refractive index of the partition wall at this time is lower than the refractive index of each color pixel. As an example of an imaging device having such a structure, the devices described in Japanese Patent Publication No. 2012-227478, Japanese Patent Publication No. 2014-179577, and International Publication No. 2018 / 043654 can be cited. In addition, as shown in Japanese Patent Publication No. 2019-211559, an ultraviolet absorption layer can also be provided in the structure of the solid-state imaging element to improve light resistance. The imaging device having the solid-state imaging element of the present invention can be used as a vehicle-mounted camera or a surveillance camera in addition to being able to be used in a digital camera or an electronic device having an imaging function (such as a mobile phone).

[0412] <Image Display Device>

[0413] The image display device of the present invention has the above-mentioned film of the present invention. As the image display device, a liquid crystal display device or an organic electroluminescent display device can be cited. The definition of the image display device or the details of each image display device are recorded in, for example, "Electronic Display Device (written by Akio Sasaki, Kogyo Chosakai Publishing Co., Ltd., published in 1990)", "Display Device (written by Junzhang Ibuki, Sangyo Tosho Publishing Co., Ltd., published in 1989)" and the like. In addition, regarding the liquid crystal display device, it is recorded in, for example, "Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, Kogyo Chosakai Publishing Co., Ltd., published in 1994)". There is no particular limitation on the liquid crystal display device to which the present invention can be applied. For example, it can be applied to various types of liquid crystal display devices described in the above-mentioned "Next Generation Liquid Crystal Display Technology".

[0414] Example

[0415] Hereinafter, the present invention will be described in more detail by giving examples. The materials, usage amounts, ratios, processing contents, processing steps, etc. shown in the following examples can be appropriately changed without departing from the gist of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. In addition, in the structural formula shown below, Me is a methyl group, Et is an ethyl group, and Ph is a phenyl group.

[0416] <Measurement Conditions of Weight Average Molecular Weight and Number Average Molecular Weight by Gel Permeation Chromatography>

[0417] Column type: A column combining TOSOH TSKgel Super HZM-H, TOSOH TSKgel Super HZ4000 and TOSOH TSKgelSuper HZ2000

[0418] Developing solvent: tetrahydrofuran

[0419] Column temperature: 40℃

[0420] Flow rate (sample injection volume): 1.0 μL (sample concentration: 0.1 mass %)

[0421] Device name: HLC-8220GPC manufactured by Tosoh Corporation

[0422] Detector: RI (refractive index) detector

[0423] Calibration curve base resin: polystyrene resin

[0424] <Method for measuring average primary particle size of pigments and pigment derivatives>

[0425] The size of the primary particles of the pigment was directly measured from photos taken using a transmission electron microscope (TEM). Specifically, the short axis diameter and long axis diameter of each primary particle of the pigment were measured, and the average was used as the primary particle size of the pigment. Next, for 100 primary particles of the pigment, the volume of each primary particle was calculated in a manner that approximated the cube of the particle size of the primary particle, and the volume average particle size was used as the average primary particle size of the pigment. For pigment derivatives, the average primary particle size was also measured in the same way.

[0426] <Manufacturing of Dispersion Liquid (Resin Composition)>

[0427] (Recipe 1)

[0428] A total of 15.6 parts by mass of the pigment and pigment derivative, 3.9 parts by mass of the resin, and 80.5 parts by mass of the solvent were mixed and dispersed for 3 hours using a bead mill (0.1 mm diameter zirconia beads). Next, a high pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism was used to disperse the mixture at a pressure of 2000 kg / cm 2 The dispersion treatment was carried out under the conditions of 500 g / min and a flow rate of 500 g / min. The dispersion treatment was repeated 10 times in total to obtain a dispersion liquid. In addition, the pigment, pigment derivative, resin and solvent used the materials shown in the following table respectively. In addition, the mixing ratio of the pigment in the following table is a value calculated based on the solid content, and the BET specific surface area of ​​the pigment derivative is a value measured using an automatic vapor adsorption measurement device ("BELSORP18" manufactured by MicrotracBEL Corp.) and according to the BET method based on the nitrogen adsorption method.

[0429] (Recipe 2)

[0430] A total of 13 parts by mass of pigment and pigment derivative, 7.8 parts by mass of resin, 150 parts by mass of solvent were mixed with a bead mill (0.3 mm diameter zirconium oxide beads) and dispersed for 5 hours using a paint agitator. Afterwards, the beads were separated with a filter to obtain a dispersion. In addition, the pigment, pigment derivative, resin and solvent used the materials shown in the following table, respectively. In addition, the mixing ratio of the pigment in the following table is a value calculated based on solid content, and the BET specific surface area of ​​the pigment derivative is a value measured using an automatic vapor adsorption measurement device ("BELSORP18" manufactured by MicrotracBEL Corp.) and based on the BET method based on nitrogen adsorption.

[0431] [Table 1]

[0432]

[0433] [Table 2]

[0434]

[0435] [Table 3]

[0436]

[0437] [Table 4]

[0438]

[0439] The details of the raw materials described by abbreviations in the above tables are as follows.

[0440] (pigment)

[0441] PR177: CI Pigment Red 177 (red pigment)

[0442] PR254: CI Pigment Red 254 (red pigment)

[0443] PR272: CI Pigment Red 272 (red pigment)

[0444] PY117: CI Pigment Yellow 117 (yellow pigment)

[0445] PY129: CI Pigment Yellow 129 (yellow pigment)

[0446] PY138: CI Pigment Yellow 138 (yellow pigment)

[0447] PY139: CI Pigment Yellow 139 (yellow pigment)

[0448] PY185: CI Pigment Yellow 185 (yellow pigment)

[0449] PB15:6:CI Pigment Blue 15:6 (blue pigment)

[0450] PV19: CI Pigment Violet 19 (Purple Pigment)

[0451] PV23: CI Pigment Violet 23 (Purple Pigment)

[0452] PP-Pig-1 to PP-Pig-22: Compounds of the following structures (near infrared absorbing pigments)

[0453] [Chemical formula 21]

[0454]

[0455] [Chemical formula 22]

[0456]

[0457] [Chemical formula 23]

[0458]

[0459] [Chemical formula 24]

[0460]

[0461] [Chemical formula 25]

[0462]

[0463] [Chemical formula 26]

[0464]

[0465] [Chemical formula 27]

[0466]

[0467] (Pigment derivatives)

[0468] DPP-1 to DPP-30: Compounds of the following structures (pigment derivatives having a diketopyrrolopyrrole structure)

[0469] [Chemical formula 28]

[0470]

[0471] [Chemical formula 29]

[0472]

[0473] [Chemical formula 30]

[0474]

[0475] [Chemical formula 31]

[0476]

[0477] PP-1 to PP-29: Compounds of the following structures (pigment derivatives having a pyrrolopyrrole structure)

[0478] [Chemical formula 32]

[0479]

[0480] [Chemical formula 33]

[0481]

[0482] [Chemical formula 34]

[0483]

[0484] [Chemical formula 35]

[0485]

[0486] [Chemical formula 36]

[0487]

[0488] AZM-1 to AZM-36: Complexes of the following metals and the following ligands (pigment derivatives having an azomethine structure)

[0489] [Table 5]

[0490]

[0491] [Chemical formula 37]

[0492]

[0493] [Chemical formula 38]

[0494]

[0495] [Chemical formula 39]

[0496]

[0497] tIN-1 to ItN-3: Compounds of the following structures (pigment derivatives having an isoindoline structure)

[0498] [Chemical formula 40]

[0499]

[0500] QP-1: A compound with the following structure (a pigment derivative having a quinophthalone structure)

[0501] [Chemical formula 41]

[0502]

[0503] AZO-1: Compound having the following structure (pigment derivative having an azo structure)

[0504] [Chemical formula 42]

[0505]

[0506] ATQ-1 to ATQ-3: Compounds of the following structures (pigment derivatives having anthraquinone structure)

[0507] [Chemical formula 43]

[0508]

[0509] TI-1: Compound having the following structure (pigment derivative having thiazine indigo structure)

[0510] [Chemical formula 44]

[0511]

[0512] QCD-1: Compound having the following structure (pigment derivative having a quinacridone structure)

[0513] [Chemical formula 45]

[0514]

[0515] BZI-1: A compound with the following structure (a pigment derivative having a benzindole structure)

[0516] [Chemical formula 46]

[0517]

[0518] PC-1: A compound with the following structure (a pigment derivative having a phthalocyanine structure)

[0519] [Chemical formula 47]

[0520]

[0521] DOZ-1: Compound having the following structure (pigment derivative having a dioxazine structure)

[0522] [Chemical formula 48]

[0523]

[0524] TAZ-1: A compound with the following structure (a pigment derivative having a triazine structure)

[0525] [Chemical formula 49]

[0526]

[0527] (resin)

[0528] D-1: Resin D-1 synthesized by the following method

[0529] 50 parts by mass of methyl methacrylate, 30 parts by mass of n-butyl methacrylate, 20 parts by mass of tert-butyl methacrylate, and 45.4 parts by mass of propylene glycol monomethyl ether acetate (PGMEA) were placed in a reaction vessel, and the atmosphere was replaced with nitrogen. The reaction vessel was heated to 70°C, and 6 parts by mass of 3-mercapto-1,2-propanediol was added, and 0.12 parts by mass of AIBN (azobisisobutyronitrile) was added, and the reaction was allowed to proceed for 12 hours. The solid content was measured to confirm that 95% of the reaction had occurred. Next, 9.7 parts by mass of pyromellitic anhydride, 70.3 parts by mass of PGMEA, and 0.20 parts by mass of DBU (1,8-diazabicyclo-[5.4.0]-7-undecene) as a catalyst were added, and the reaction was allowed to proceed for 7 hours at 120°C. The acid value was measured to confirm that 98% or more of the acid anhydride was half-esterified, and the reaction was terminated to obtain a resin D-1 having the following structure and an acid value of 43 mgKOH / g and a weight average molecular weight (Mw) of 9,000.

[0530] [Chemical formula 50]

[0531]

[0532] D-2: Resin D-2 synthesized by the following method

[0533] 6.0 parts by mass of 3-mercapto-1,2-propanediol, 9.5 parts by mass of pyromellitic anhydride, 62 parts by mass of PGMEA, and 0.2 parts by mass of 1,8-diazabicyclo-[5.4.0]-7-undecene were placed in a reaction vessel, and the atmosphere was replaced with nitrogen. The reaction vessel was heated to 100°C and reacted for 7 hours. After confirming that more than 98% of the anhydride was half-esterified by measuring the acid value, the temperature in the system was cooled to 70°C, and 65 parts by mass of methyl methacrylate, 5.0 parts by mass of ethyl acrylate, 15 parts by mass of tert-butyl acrylate, 5.0 parts by mass of methacrylic acid, 10 parts by mass of hydroxyethyl methacrylate, and 53.5 parts by mass of a PGMEA solution in which 0.1 parts by mass of 2,2'-azobisisobutyronitrile was dissolved were added, and reacted for 10 hours. The polymerization was confirmed to have progressed 95% by solid content measurement, and the reaction was terminated to obtain a resin D-2 having the following structure and an acid value of 70.5 mgKOH / g and a weight average molecular weight (Mw) of 10,000.

[0534] [Chemical formula 51]

[0535]

[0536] D-3: Resin D-3 synthesized by the following method

[0537] In the synthesis of resin D-1, except that 20 parts by mass of tert-butyl methacrylate was changed to 20 parts by mass of (3-ethyloxetan-3-yl)methyl methacrylate, a resin D-3 having the following structure and having an acid value of 43 mgKOH / g and a weight average molecular weight (Mw) of 9000 was obtained in the same manner.

[0538] [Chemical formula 52]

[0539]

[0540] D-4: Resin D-4 synthesized by the following method

[0541] 108 parts by mass of 1-thioglycerol, 174 parts by mass of pyromellitic anhydride, 650 parts by mass of methoxypropyl acetate, and 0.2 parts by mass of monobutyltin oxide as a catalyst were placed in a reaction vessel, and after replacing the atmosphere with nitrogen, the reaction was carried out at 120° C. for 5 hours (first step). The acid value was measured to confirm that 95% or more of the anhydride was half-esterified. Next, 160 parts by mass of the compound obtained in the first step, 200 parts by mass of 2-hydroxypropyl methacrylate, 200 parts by mass of ethyl acrylate, 150 parts by mass of tert-butyl acrylate, 200 parts by mass of 2-methoxyethyl acrylate, 200 parts by mass of methyl acrylate, 50 parts by mass of methacrylic acid, and 663 parts by mass of PGMEA were charged into a reaction container, and the reaction container was heated to 80°C, and 1.2 parts by mass of 2,2'-azobis(2,4-dimethylvaleronitrile) was added, and the reaction was allowed to proceed for 12 hours (second step). The reaction was confirmed to be 95% by mass by measuring the solid content. Finally, 500 parts by mass of 50% PGMEA solution of the compound obtained in the second step, 27.0 parts by mass of 2-methacryloyloxyethyl isocyanate (MOI), and 0.1 parts by mass of hydroquinone were charged into a reaction container for reaction until 2270 cm based on the isocyanate group was confirmed. -1 After confirming the disappearance of the peak, the reaction solution was cooled to obtain a resin D-4 having the following structure and having an acid value of 68 mgKOH / g, an ethylenically unsaturated bond group value of 0.62 mmol / g, and a weight average molecular weight (Mw) of 13,000.

[0542] [Chemical formula 53]

[0543]

[0544] D-5: Resin having the following structure (the value indicated on the main chain is the molar ratio, and the value indicated on the side chain is the number of repeating units. Weight average molecular weight: 16,000, acid value: 67 mgKOH / g)

[0545] [Chemical formula 54]

[0546]

[0547] D-6: Resin having the following structure (the value indicated on the main chain is the molar ratio, and the value indicated on the side chain is the number of repeating units. Weight average molecular weight: 20,000, acid value: 36 mgKOH / g)

[0548] [Chemical formula 55]

[0549]

[0550] D-7: DISPERBYK-111 (manufactured by BYK-Chemie GmbH, acidic dispersant)

[0551] D-8: BYK LPN-21116 (manufactured by BYK-Chemie GmbH, alkaline dispersant)

[0552] D-9: SOLSPERSE 20000 (manufactured by Lubrizol Japan Ltd., alkaline dispersant)

[0553] D-10: AJISPER PB821 (manufactured by Ajinomoto Fine-Techno Co., Inc., alkaline dispersant)

[0554] D-11: Resin having the following structure (the value indicated on the main chain is the molar ratio, and the value indicated on the side chain is the number of repeating units. Weight average molecular weight: 18,000, acid value: 82.1 mgKOH / g)

[0555] [Chemical formula 56]

[0556]

[0557] (Solvent)

[0558] S-1: Propylene glycol monomethyl ether acetate (PGMEA)

[0559] <Evaluation of Dispersion Liquid>

[0560] (coarse particles)

[0561] On a glass substrate, the dispersion immediately after production and the dispersion stored at 45° C. for 72 hours were applied using a spin coater so that the thickness after heating was 0.25 μm, and heated at 85° C. for 2 minutes using a hot plate to form a film. The film was observed in 5 fields of view using an optical microscope (magnification: 200 times), the number of coarse particles with a maximum width of 0.3 μm or more was counted, and the coarse particles were evaluated according to the following evaluation criteria.

[0562] The evaluation results when the dispersion immediately after production was used are described in the column of "Initial", and the evaluation results when the dispersion stored at 45°C for 72 hours is described in the column of "Elapsed time".

[0563] A: The number of coarse particles is less than 20

[0564] B: The number of coarse particles is more than 20 and less than 40

[0565] C: The number of coarse particles is more than 40 and less than 100

[0566] D: The number of coarse particles exceeds 100

[0567] (Stability over time)

[0568] The viscosity (mPa·s) of each dispersion just after manufacture was measured using an E-type viscometer (manufactured by Toki Sangyo Co., Ltd, RE-85L). After the measurement, each dispersion was allowed to stand at 45°C for 3 days, and the viscosity was measured again. The viscosity change rate of the dispersion before and after standing was calculated, and the stability over time was evaluated according to the following evaluation criteria. It can be said that the smaller the value of the viscosity change rate, the better the stability over time. The above viscosity measurements were all measured in a laboratory where the temperature and humidity were controlled at 22±5°C and 60±20% and the temperature of the dispersion was adjusted to 25°C. All measurements were performed 3 times, and the average value was used.

[0569] Viscosity change rate (%) = (viscosity of the dispersion after standing at 45°C for 3 days - viscosity of the dispersion immediately after production / viscosity of the dispersion immediately after production) × 100

[0570] A: Viscosity change rate is less than 5%

[0571] B: Viscosity change rate is more than 5% and less than 10%

[0572] C: Viscosity change rate is more than 10% and less than 15%

[0573] D: Viscosity change rate exceeds 15%

[0574] [Table 6]

[0575]

[0576] [Table 7]

[0577]

[0578] [Table 8]

[0579]

[0580] [Table 9]

[0581]

[0582] [Table 10]

[0583]

[0584] As shown in the above table, the dispersion liquid (resin composition) of the example has few coarse particles, is excellent in stability over time, and is excellent in the dispersion stability of the pigment.

[0585] The pigment derivatives contained in the dispersions of Examples 1 to 181 (dispersion liquids 1 to 181) have a BET specific surface area of ​​2 to 300 m 2 In addition, the average primary particle size of the pigment contained in the dispersions of Examples 1 to 181 (dispersion liquids 1 to 181) was in the range of 10 to 100 nm, and the average primary particle size of the pigment derivative was in the range of 5 to 200 nm.

[0586] On the other hand, the BET specific surface area of ​​the pigment derivative contained in the dispersion of Comparative Example 1 (dispersion C1) was less than 2 m 2 / g, and the BET specific surface area of ​​the pigment derivative contained in the dispersion of Comparative Example 2 (dispersion C2) exceeded 300 m 2 / g.

[0587] <Manufacturing of resin composition>

[0588] The respective materials were mixed in the ratios of the following formulations 1 to 3, and filtered through a nylon filter (manufactured by Nihon Pall Ltd.) having a pore size of 0.45 μm to produce respective resin compositions.

[0589] (Recipe 1)

[0590] Dispersion liquid described in the following table ... 78.8 parts by mass

[0591] Polymerizable monomers listed in the following table: 0.6 parts by mass

[0592] Resins listed in the following table: 5.5 parts by mass (amount in a 20% by mass PGMEA solution or a 20% by mass cyclohexanone solution)

[0593] Photopolymerization initiator listed in the following table: 0.5 parts by mass

[0594] Surfactants listed in the following table ... 0.0001 parts by mass

[0595] The polymerization inhibitor described in the following table ... 0.00135 parts by mass

[0596] Solvents listed in the following table ... 14.7 parts by mass

[0597] (Recipe 2)

[0598] Dispersion liquid described in the following table ... 55.0 parts by mass

[0599] Polymerizable monomers listed in the following table: 6.4 parts by mass

[0600] Resins listed in the following table: 27.5 parts by mass (amount in a 20% by mass PGMEA solution or a 20% by mass cyclohexanone solution)

[0601] Photopolymerization initiator listed in the following table: 1.0 part by mass

[0602] Additives listed in the following table: 0.5 parts by mass

[0603] Surfactants listed in the following table ... 0.03 parts by mass

[0604] The polymerization inhibitors listed in the following table ... 0.001 parts by mass

[0605] Solvents listed in the following table ... 43.2 parts by mass

[0606] (Recipe 3)

[0607] Dispersion liquid described in the following table ... 78.8 parts by mass

[0608] Polymerizable monomers listed in the following table: 0.6 parts by mass

[0609] Resins listed in the following table: 4.0 parts by mass (amount in a 20% by mass PGMEA solution or a 20% by mass cyclohexanone solution)

[0610] Photopolymerization initiator listed in the following table: 0.5 parts by mass

[0611] Additives listed in the following table: 0.3 parts by mass

[0612] Surfactants listed in the following table ... 0.0001 parts by mass

[0613] The polymerization inhibitor described in the following table ... 0.00135 parts by mass

[0614] Solvents listed in the following table ... 15.9 parts by mass [Table 11]

[0615] formula Dispersion Polymerization Photopolymerization initiator Resin additive Surfactants Inhibitor Solvents Embodiment 1001 1 Dispersion 1 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1002 1 Dispersion 2 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1003 1 Dispersion 3 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1004 1 Dispersion 4 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1005 1 Dispersion 5 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1006 1 Dispersion 6 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1007 1 Dispersion 7 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1008 1 Dispersion 8 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1009 1 Dispersion 9 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1010 1 Dispersion 10 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1011 1 Dispersion 11 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1012 1 Dispersion 12 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1013 1 Dispersion 13 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1014 1 Dispersion 14 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1015 1 Dispersion 15 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1016 1 Dispersion 16 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1017 1 Dispersion 17 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1018 1 Dispersion 18 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1019 1 Dispersion 19 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1020 1 Dispersion 20 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1021 1 Dispersion 21 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1022 1 Dispersion 22 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1023 1 Dispersion 23 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1024 1 Dispersion 24 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1025 1 Dispersion 25 M-1 I-6 B-2 - Su-1 In-1 S-1

[0616] [Table 12]

[0617] formula Dispersion Polymerization Photopolymerization initiator Resin additive Surfactants Inhibitor Solvents Embodiment 1026 1 Dispersion 26 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1027 1 Dispersion 27 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1028 1 Dispersion 28 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1029 1 Dispersion 29 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1030 1 Dispersion 30 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1031 1 Dispersion 31 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1032 1 Dispersion 32 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1033 1 Dispersion 33 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1034 1 Dispersion 34 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1035 1 Dispersion 35 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1036 1 Dispersion 36 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1037 1 Dispersion 37 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1038 1 Dispersion 38 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1039 1 Dispersion 39 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1040 1 Dispersion 40 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1041 1 Dispersion 41 M-1 I-10 B-2 - Su-1 In-1 S-1 Embodiment 1042 1 Dispersion 42 M-1 I-6 / I-1(1 / 1) B-2 - Su-1 In-1 S-1 Embodiment 1043 1 Dispersion 43 M-1 I-6 / I-2(1 / 1) B-2 - Su-1 In-1 S-1 Embodiment 1044 1 Dispersion 44 M-1 I-11 B-2 - Su-1 In-1 S-1 Embodiment 1045 1 Dispersion 45 M-1 I-6 / I-2(1 / 1) B-2 - Su-1 In-1 S-1 Embodiment 1046 1 Dispersion 46 M-1 I-6 / I-3(1 / 1) B-2 - Su-1 In-1 S-1 Embodiment 1047 1 Dispersion 47 M-1 I-6 / I-4(1 / 1) B-2 - Su-1 In-1 S-1 Embodiment 1048 1 Dispersion 48 M-1 I-6 / I-5(1 / 1) B-2 - Su-1 In-1 S-1 Embodiment 1049 1 Dispersion 49 M-1 I-6 / I-7(1 / 1) B-2 - Su-1 In-1 S-1 Embodiment 1050 1 Dispersion 50 M-1 I-6 / I-8(1 / 1) B-2 - Su-1 In-1 S-1

[0618] [Table 13]

[0619] formula Dispersion Polymerization Photopolymerization initiator Resin additive Surfactants Inhibitor Solvents Embodiment 1051 1 Dispersion 51 M-1 I-6 / I-9(1 / 1) B-2 - Su-1 In-1 S-1 Embodiment 1052 1 Dispersion 52 M-1 I-6 / I-10(1 / 1) B-2 - Su-1 In-1 S-1 Embodiment 1053 1 Dispersion 53 M-1 I-6 / I-11(1 / 1) B-2 - Su-1 In-1 S-1 Embodiment 1054 1 Dispersion 54 M-1 I-6 / I-12(1 / 1) B-2 - Su-1 In-1 S-1 Embodiment 1055 1 Dispersion 55 M-1 I-6 / I-12(1 / 1) B-2 - Su-1 In-1 S-1 Embodiment 1056 1 Dispersion 56 M-1 I-6 / I-12(1 / 1) B-2 - Su-1 In-1 S-1 Embodiment 1057 1 Dispersion 57 M-5 / M-6(5 / 1) I-6 B-2 - Su-1 In-1 S-1 Embodiment 1058 1 Dispersion 58 M-1 / M-2(1 / 1) I-6 B-2 - su-1 In-1 S-1 Embodiment 1059 1 Dispersion 59 M-5 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1060 1 Dispersion 60 M-4 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1061 1 Dispersion 61 M-3 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1062 1 Dispersion 62 M-1 / M-6(5 / 1) I-6 B-2 - Su-1 In-1 S-1 Embodiment 1063 1 Dispersion 63 M-2 / M-6(5 / 1) I-6 B-2 - Su-1 In-1 S-1 Embodiment 1064 1 Dispersion 64 M-4 / M-6(5 / 1) I-6 B-2 - Su-1 In-1 S-1 Embodiment 1065 1 Dispersion 65 M-3 / M-6(5 / 1) I-6 B-2 - Su-1 In-1 S-1 Embodiment 1066 1 Dispersion 66 M-5 / M-6(5 / 1) I-6 B-2 - Su-1 In-1 S-1 Embodiment 1067 1 Dispersion 67 M-1 I-6 B-1 - Su-1 In-1 S-1 Embodiment 1068 1 Dispersion 68 M-1 I-6 B-3 - Su-1 In-1 S-1 Embodiment 1069 1 Dispersion 69 M-1 I-6 B-4 - Su-1 In-1 S-1 Embodiment 1070 1 Dispersion 70 M-1 I-6 B-5 - Su-1 In-1 S-1 Embodiment 1071 1 Dispersion 71 M-1 I-6 B-6 - Su-1 In-1 S-1 Embodiment 1072 1 Dispersion 72 M-1 I-6 B-1 / B-2(1 / 1) - Su-1 In-1 S-1 Embodiment 1073 1 Dispersion 73 M-1 I-6 B-2 / B-3(1 / 1) - Suu-1 In-1 S-1 Embodiment 1074 1 Dispersion 74 M-1 I-6 B-2 / B-4(1 / 1) - su-1 In-1 S-1 Embodiment 1075 1 Dispersion 75 M-1 I-6 B-2 / B-5(1 / 1) - Su-1 In-1 S-1

[0620] [Table 14]

[0621] formula Dispersion Polymerization Photopolymerization initiator Resin additive Surfactants Inhibitor Solvents Embodiment 1076 1 Dispersion 76 M-1 I-6 B-2 / B-6(1 / 1) - Su-1 In-1 S-1 Embodiment 1077 3 Dispersion 77 M-1 I-6 B-2 A-1 Su-1 In-1 s-1 Embodiment 1078 3 Dispersion 78 M-1 I-6 B-2 A-1 Su-1 In-1 S-1 Embodiment 1079 3 Dispersion 79 M-1 I-6 B-2 A-1 Su-1 In-1 S-1 Embodiment 1080 3 Dispersion 80 M-1 I-6 B-2 A-1 Su-1 In-1 S-1 Embodiment 1081 3 Dispersion 81 M-1 I-6 B-2 A-1 Su-1 In-1 S-1 Embodiment 1082 3 Dispersion 82 M-1 I-6 B-2 A-1 Su-1 In-1 S-1 Embodiment 1083 3 Dispersion 83 M-1 I-6 B-2 A-1 Su-1 In-1 S-1 Embodiment 1084 3 Dispersion 84 M-1 I-6 B-2 A-1 Su-1 In-1 S-1 Embodiment 1085 3 Dispersion 85 M-1 I-6 B-2 A-1 Su-1 In-1 S-1 Embodiment 1086 3 Dispersion 86 M-1 I-6 B-2 A-1 Su-1 In-1 S-1 Embodiment 1087 3 Dispersion 87 M-1 I-6 B-2 A-1 Su-1 In-1 S-1 Embodiment 1088 1 Dispersion 47 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1089 1 Dispersion 48 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1090 1 Dispersion 49 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1091 1 Dispersion 50 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1092 1 Dispersion 51 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1093 1 Dispersion 52 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1094 1 Dispersion 53 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1095 1 Dispersion 54 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1096 1 Dispersion 55 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1097 1 Dispersion 56 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1098 1 Dispersion 57 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1099 1 Dispersion 58 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1100 1 Dispersion 59 M-1 I-6 B-2 - Su-1 In-1 S-1

[0622] [Table 15]

[0623] formula Dispersion Polymerization Photopolymerization initiator Resin additive Surfactants Inhibitor Solvents Embodiment 1101 1 Dispersion 60 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1102 1 Dispersion 61 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1103 1 Dispersion 62 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1104 1 Dispersion 63 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1105 1 Dispersion 64 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1106 1 Dispersion 65 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1107 1 Dispersion 66 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1108 1 Dispersion 67 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1109 1 Dispersion 68 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1110 1 Dispersion 69 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1111 1 Dispersion 70 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1112 1 Dispersion 71 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1113 1 Dispersion 72 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1114 1 Dispersion 73 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1115 1 Dispersion 74 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1116 1 Dispersion 75 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1117 1 Dispersion 76 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1118 1 Dispersion 77 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1119 1 Dispersion 78 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1120 1 Dispersion 79 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1121 1 Dispersion 80 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1122 1 Dispersion 81 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1123 1 Dispersion 82 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1124 1 Dispersion 83 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 25 1 Dispersion 84 M-1 I-6 B-2 - Su-1 In-1 S-1

[0624] [Table 16]

[0625] formula Dispersion Polymerization Photopolymerization initiator Resin additive Surfactants Inhibitor Solvents Embodiment 1126 1 Dispersion 85 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1127 1 Dispersion 86 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1128 1 Dispersion 87 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1129 1 Dispersion 88 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1130 1 Dispersion 89 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1131 1 Dispersion 90 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1132 1 Dispersion 91 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1133 1 Dispersion 92 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1134 2 Dispersion 93 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1135 2 Dispersion 94 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1136 2 Dispersion 95 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1137 2 Dispersion 96 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1138 2 Dispersion 97 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1139 2 Dispersion 98 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1140 2 Dispersion 99 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1141 2 Dispersion 100 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1142 2 Dispersion 101 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1143 2 Dispersion 102 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1144 2 Dispersion 103 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1145 2 Dispersion 104 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1146 2 Dispersion 105 M-5 I-11 B-1 UV-1 Su-1 In-1 s-1 Embodiment 1147 2 Dispersion 106 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1148 2 Dispersion 107 M-5 I-11 B-1 UV-1 su-1 In-1 S-1 Embodiment 1149 2 Dispersion 108 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1150 2 Dispersion 109 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1

[0626] [Table 17]

[0627] formula Dispersion Polymerization Photopolymerization initiator Resin additive Surfactants Inhibitor Solvents Embodiment 1151 2 Dispersion 110 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1152 2 Dispersion 111 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1153 2 Dispersion 112 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1154 2 Dispersion 113 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1155 2 Dispersion 114 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1156 2 Dispersion 115 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1157 2 Dispersion 116 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1158 2 Dispersion 117 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1159 2 Dispersion 118 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1160 2 Dispersion 119 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1161 2 Dispersion 120 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1162 2 Dispersion 121 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1163 2 Dispersion 122 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1164 2 Dispersion 123 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1165 2 Dispersion 124 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1166 2 Dispersion 125 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1167 2 Dispersion 126 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1168 2 Dispersion 127 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1169 2 Dispersion 128 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1170 2 Dispersion 129 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1171 2 Dispersion 130 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1172 2 Dispersion 131 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1173 2 Dispersion 132 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1174 2 Dispersion 133 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1175 2 Dispersion 134 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1

[0628] [Table 18]

[0629] formula Dispersion Polymerization Photopolymerization initiator Resin additive Surfactants Inhibitor Solvents Embodiment 1176 2 Dispersion 135 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1177 2 Dispersion 136 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1178 2 Dispersion 137 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1179 2 Dispersion 138 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1180 2 Dispersion 139 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1181 2 Dispersion 140 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1182 2 Dispersion 141 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1183 2 Dispersion 142 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1184 2 Dispersion 143 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1185 2 Dispersion 144 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1186 2 Dispersion 145 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1187 2 Dispersion 146 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1188 2 Dispersion 147 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1189 2 Dispersion 148 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1190 2 Dispersion 149 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1191 2 Dispersion 150 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1192 2 Dispersion 151 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1193 2 Dispersion 152 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1194 2 Dispersion 153 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1195 2 Dispersion 154 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1196 2 Dispersion 155 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1197 2 Dispersion 156 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1198 2 Dispersion 157 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1199 2 Dispersion 158 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1200 2 Dispersion 159 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1

[0630] [Table 19]

[0631] formula Dispersion Polymerization Photopolymerization initiator Resin additive Surfactants Inhibitor Solvents Embodiment 1201 2 Dispersion 160 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1202 2 Dispersion 161 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1203 2 Dispersion 162 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1204 2 Dispersion 163 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1205 2 Dispersion 164 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1206 2 Dispersion 165 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1207 2 Dispersion 166 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1208 2 Dispersion 167 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1209 2 Dispersion 168 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1210 2 Dispersion 169 M-5 / M-6(4.8 / 1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Embodiment 1211 1 Dispersion 170 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1212 1 Dispersion 171 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1213 1 Dispersion 172 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1214 1 Dispersion 173 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1215 1 Dispersion 174 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1216 1 Dispersion 175 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1217 1 Dispersion 176 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1218 1 Dispersion 177 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1219 1 Dispersion 178 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1220 1 Dispersion 179 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1221 1 Dispersion 180 M-1 I-6 B-2 - Su-1 In-1 S-1 Embodiment 1222 1 Dispersion 181 M-1 I-6 B-2 - Su-1 In-1 S-1 Comparative Example 1001 1 Dispersion C1 M-1 I-6 B-2 - Su-1 In-1 S-1 Comparative Example 1002 1 Dispersion C2 M-1 I-6 B-2 - Su-1 In-1 S-1

[0632] The details of the raw materials described by abbreviations in the above tables are as follows.

[0633] (Dispersion liquid)

[0634] Dispersions 1 to 181, Dispersions C1, Dispersions C2: Dispersions 1 to 181, Dispersions C1, Dispersions C2 above

[0635] (Polymerizable Monomer)

[0636] M-1: Compound with the following structure

[0637] [Chemical formula 57]

[0638]

[0639] M-2: Compound with the following structure

[0640] [Chemical formula 58]

[0641]

[0642] M-3: KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd., a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate, manufactured by Nippon Kayaku Co., Ltd.)

[0643] M-4: Compound with the following structure

[0644] [Chemical formula 59]

[0645]

[0646] M-5: A mixture of compounds of the following structures (containing 55 mol% to 63 mol% of the left-hand compound)

[0647] [Chemical formula 60]

[0648]

[0649] M-6: A compound having the following structure.

[0650] [Chemical formula 61]

[0651]

[0652] (Photopolymerization Initiator)

[0653] I-1: Irgacure OXE01 (manufactured by BASF, oxime compound)

[0654] I-2: Irgacure OXE02 (manufactured by BASF, oxime compound)

[0655] I-3 to I-8: Compounds of the following structures

[0656] [Chemical formula 62]

[0657]

[0658] I-9: Omnirad 379 (manufactured by IGM Resins BV, α-amino ketone compound)

[0659] I-10: Omnirad 907 (manufactured by IGM Resins BV, α-amino ketone compound)

[0660] I-11 to I-12: Compounds of the following structures

[0661] [Chemical formula 63]

[0662]

[0663] (resin)

[0664] B-1: 20 mass% PGMEA solution of a resin having the following structure (the numerical value indicated on the main chain is a molar ratio. Resin having an acid group, weight average molecular weight 11000, acid value 69.2 mgKOH / g)

[0665] [Chemical formula 64]

[0666]

[0667] B-2: A 20% by mass cyclohexanone solution of a resin having the following structure (the numerical value indicated on the main chain is a molar ratio. A resin having an acid group, a weight average molecular weight of 21,000)

[0668] [Chemical formula 65]

[0669]

[0670] B-3: 20 mass% PGMEA solution of the resin of the following structure (the numerical value indicated on the main chain is the molar ratio, and the numerical value indicated on the side chain is the number of repeating units. Weight average molecular weight: 16000, acid value: 67 mgKOH / g)

[0671] [Chemical formula 66]

[0672]

[0673] B-4: 20 mass% PGMEA solution of a resin having the following structure (the numerical value indicated on the main chain is the molar ratio, and the numerical value indicated on the side chain is the number of repeating units. Weight average molecular weight: 18,000, acid value: 82.1 mgKOH / g)

[0674] [Chemical formula 67]

[0675]

[0676] B-5: 20 mass% PGMEA solution of a resin having the following structure (the numerical value indicated on the main chain is a molar ratio. Resin having an acid group, weight average molecular weight 10,000, acid value 110 mgKOH / g)

[0677] [Chemical formula 68]

[0678]

[0679] B-6: 20 mass% PGMEA solution of a resin having the following structure (the numerical value indicated on the main chain is a molar ratio. Resin having an acid group, weight average molecular weight 10,000, acid value 110 mgKOH / g)

[0680] [Chemical formula 69]

[0681]

[0682] (additive)

[0683] A-1: EHPE3150 (manufactured by Daicel Corporation, 1,2-epoxy-4-(2-oxiranyl)cyclohexane adduct of 2,2'-bis(hydroxymethyl)-1-butanol)

[0684] UV-1: Compound with the following structure (ultraviolet absorber)

[0685] [Chemical formula 70]

[0686]

[0687] (Surfactant)

[0688] Su-1: KF-6001 (manufactured by Shin-Etsu Chemical Co., Ltd., silicone surfactant, polydimethylsiloxane modified with carbinol at both ends, hydroxyl value 62 mgKOH / g)

[0689] (Inhibitor)

[0690] In-1: p-Methoxyphenol

[0691] (Solvent)

[0692] S-1: Propylene glycol monomethyl ether acetate (PGMEA)

[0693] <Evaluation of Development Residue>

[0694] On the glass substrate, a composition for forming a base layer (CT-4000, manufactured by FUJIFILM Electronic Materials Co., Ltd.) was applied using a spin coater to a thickness of 0.1 μm after post-baking, and a hot plate was used to heat at 220° C. for 1 hour to form a base layer, thereby obtaining a glass substrate (support) with a base layer. Next, each resin composition was applied by spin coating to a film thickness of 0.4 μm after post-baking. Next, a hot plate was used to heat at 100° C. for 3 minutes. Next, the glass substrate was placed on a horizontal rotating table of a spin / spray developer (DW-30 type, manufactured by CHEMITRONICS CO., LTD.), and a developer (CD-2000, manufactured by FUJIFILM Electronic Materials Co., Ltd.) was used to perform a spin-on immersion development at 23°C for 60 seconds. The glass substrate was then fixed on a horizontal rotating table by a vacuum chuck, and the glass substrate was rotated at a speed of 50 rpm by a rotating device, while pure water was supplied from a spray nozzle above the center of rotation in a spraying manner for rinsing treatment, and then spray drying was performed. Furthermore, a heating treatment (post-baking) was performed for 5 minutes using a 200°C hot plate.

[0695] The absorbance A1 of the glass substrate before the resin composition was applied and the absorbance A1 of the glass substrate after post-baking were measured using a spectrophotometer, and the change in absorbance ΔA was calculated by the following formula, and the maximum value of the change in absorbance ΔA was used to evaluate the development residue. In addition, the maximum value of the change in absorbance ΔA refers to the change in absorbance at the wavelength where the change in absorbance ΔA becomes the largest. It means that the smaller the maximum value of the change in absorbance ΔA, the less the development residue.

[0696] Absorbance change ΔA = absorbance A1 - absorbance A2

[0697] A: The maximum value of the absorbance change ΔA is less than 0.01

[0698] B: The maximum value of the change in absorbance ΔA is more than 0.01 and less than 0.03

[0699] C: The maximum value of the change in absorbance ΔA is more than 0.03 and less than 0.05

[0700] D: The maximum value of the absorbance change ΔA exceeds 0.05

[0701] [Table 20]

[0702]

[0703] [Table 21]

[0704]

[0705] As shown in the above table, the resin composition of the example can form pixels with less development residue.

[0706] In addition, the BET specific surface area of ​​the pigment derivative contained in the resin composition of Examples 1001 to 1222 is 2 to 300 m 2 In addition, the average primary particle size of the pigment contained in Examples 1001 to 1222 was in the range of 10 to 100 nm, and the average primary particle size of the pigment derivative was in the range of 5 to 200 nm.

[0707] On the other hand, the BET specific surface area of ​​the pigment derivative contained in the resin composition of Comparative Example 1001 is less than 2 m 2 / g, and the BET specific surface area of ​​the pigment derivative contained in the resin composition of Comparative Example 1002 exceeds 300 m 2 / g.

[0708] The film obtained from the resin composition of the example can be preferably used for an optical filter, a solid-state imaging element, and an image display device.

Claims

1. A resin composition comprising: pigment; The BET specific surface area based on nitrogen adsorption is 2 m 2 / g~300m 2 / g of pigment derivatives; Resins; and Solvent.

2. The resin composition according to claim 1, wherein The pigment derivative is a particle of a compound having at least one structure selected from the group consisting of a pigment structure and a triazine structure and an acid group or a basic group.

3. A resin composition comprising: pigment; The BET specific surface area based on nitrogen adsorption is 2 m 2 / g~300m 2 / g, and particles of a compound having at least one structure selected from the group consisting of a pigment structure and a triazine structure and an acid group or a basic group; Resins; and Solvent.

4. The resin composition according to claim 2 or 3, wherein The pigment structure is at least one selected from the group consisting of a diketopyrrolopyrrole structure, a pyrrolopyrrole structure, an azomethine structure, an isoindoline structure, a quinophthalone structure, an azo structure, an anthraquinone structure, a thiazine indigo structure, a quinacridone structure, a benzindole structure, a phthalocyanine structure, and a dioxazine structure.

5. The resin composition according to claim 2 or 3, wherein The pigment structure is an azomethine structure. The resin composition according to claim 1 or 3, further comprising a photopolymerization initiator and a polymerizable compound.

7. A method for producing a resin composition, comprising: The pigment is dispersed in a solvent and the BET specific surface area based on the nitrogen adsorption method is 2 m 2 / g~300m 2 / g of pigment derivatives and resins.

8. The method for producing a resin composition according to claim 7, wherein The pigment derivative is a particle of a compound having at least one structure selected from the group consisting of a pigment structure and a triazine structure and an acid group or a basic group.

9. A pigment derivative, which is a particle of a compound having at least one structure selected from the group consisting of a pigment structure and a triazine structure and an acid group or a basic group, wherein the pigment derivative has a BET specific surface area of ​​2 m 2 / g~300m 2 / g. 10 . The pigment derivative according to claim 9 , which is a dispersing aid.

11. A film obtained by using the resin composition according to claim 1 or 3.

12. An optical filter comprising the film according to claim 11. 13 . A solid-state imaging element comprising the film according to claim 11 . 14 . An image display device comprising the film according to claim 11 .

Images