High-purity quartz component surface cleaning graphite jig for semiconductors and use method of high-purity quartz component surface cleaning graphite jig

Abstract

The invention discloses a high-purity quartz component surface cleaning graphite jig for a semiconductor and a using method, the device comprises a movable working platform, a mechanical arm, a graphite jig, a laser instrument and a dust discharging device, the graphite jig is arranged on the movable working platform, the mechanical arm is arranged on one side of the graphite jig, the laser instrument is arranged at the working end of the mechanical arm, and the dust discharging device is arranged on the mechanical arm. Dust exhaust devices are arranged on the two sides of the laser instrument, each dust exhaust device comprises an exhaust port and an air inlet, and an ultraviolet light source is arranged on the periphery of the upper surface of the graphite jig. According to the treatment method, the cleanliness of the surface of a used component can be guaranteed, no residual film or metal pollution exists, meanwhile, the cleaning efficiency of the component can be improved, and the cleaning operation time is saved; the surface of the high-purity quartz component is treated through laser cleaning, residues on the surface can be effectively removed, the chemical soaking time in a traditional process is shortened, the cleaning loss of the component is reduced, the service life of the component is prolonged, and meanwhile the air leakage risk caused by excessive corrosion of the sealing surface is reduced.

Description

Technical Field

[0001] The invention relates to a cleaning and regeneration method and the field of precision equipment maintenance, and in particular to a surface treatment method for a high-purity quartz component used in a semiconductor epitaxial machine. Background Art

[0002] With the continuous advancement of semiconductor technology, electronic components are becoming more sophisticated, requiring more sophisticated and controllable doping processes, thus placing higher requirements on the cleanliness of various machines used in the production and processing process. Among them, the epitaxial (EPI) machine is mainly composed of five parts: power system, vacuum system, heating system, pre-treatment chamber, and process chamber. The side walls in the process chamber are all made of high-purity quartz material components.

[0003] The components in the process chamber of the epitaxial expansion machine (EPI) are regularly maintained and serviced. For high-purity quartz parts, the existing surface treatment process uses chemical liquid wiping and soaking to remove silicon compounds deposited on the surface, and then removes a small amount of colloidal particles remaining on the surface by local coating or flushing. This cleaning method is time-consuming and labor-intensive, and will cause excessive corrosion to the surface of the component, especially excessive corrosion of the sealing surface will cause the problem of unqualified vacuum. Summary of the invention

[0004] The object of the present invention is to provide a graphite jig for cleaning the surface of high-purity quartz components for semiconductors and a method for using the same, so as to solve the problems raised in the above-mentioned background technology.

[0005] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a graphite jig for cleaning the surface of high-purity quartz components for semiconductors and a method for using the same, the device comprising a movable working platform, a manipulator, a graphite jig, a laser instrument and a dust removal device, a graphite jig is provided on the movable working platform, a manipulator is provided on one side of the graphite jig, a laser instrument is provided at the working end of the manipulator, dust removal devices are provided on both sides of the laser instrument, the dust removal device comprises an exhaust port and an air inlet, and an ultraviolet light source is provided around the upper surface of the graphite jig.

[0006] Preferably, a graphite jig for cleaning the surface of a high-purity quartz component for semiconductors and a method of using the same are provided, wherein the method of using the same is as follows: Step 1: Clean the graphite jig: Wipe the surface of the graphite jig for laser cleaning of high-purity quartz parts with a dust-free cloth moistened with IPA until there is no black residue on the surface of the dust-free cloth; Step 2: Graphite fixture installation: Install the high-purity quartz parts to be cleaned into the cleaned graphite fixture, and lock the parts until the products cannot move relative to the graphite fixture to avoid damage to the parts due to accidental collision; Step 3: Laser cleaning: Turn on the laser cleaning equipment and call the developed laser cleaning program for the corresponding product to start automatic cleaning of high-purity quartz parts. At the same time, clean the air blowing and dust suction mechanism of the laser to remove the waste gas and dust generated during the cleaning process. Step 4: Appearance inspection: After the laser cleaning process is completed and the robot returns to its initial position, turn on the UV background installed at the bottom of the graphite fixture to check whether there is any sediment or particulate matter remaining on the surface of the component; Step 5: Disassemble the graphite fixture: After the inspection is completed and the high-purity quartz component has no surface defects, remove the component from the graphite fixture, and be careful to avoid damage during the movement process.

[0007] Preferably, in step three, the laser power in laser cleaning is 200-500W, the frequency is from 10-80HZ, and the wavelength is 1064nm.

[0008] Preferably, in step 4, the appearance inspection uses ultraviolet light with a wavelength of 300-500nm.

[0009] Preferably, in steps 2 to 5, the material of the laser cleaning special jig is high-purity graphite.

[0010] Compared with the prior art, the present invention has the following beneficial effects: 1. The present invention relates to a surface treatment method for removing colloidal particles attached to the surface of high-purity quartz by laser cleaning, which is used to remove the residual colloidal particles and other sediments attached to the surface of high-purity quartz parts. The treatment method can ensure the cleanliness of the surface of the used parts without residual film and metal pollution, and at the same time can improve the cleaning efficiency of the parts and save the cleaning operation time.

[0011] 2. Using laser cleaning to treat the surface of high-purity quartz components can effectively remove surface residues, reduce the time of chemical immersion in traditional processes, reduce the loss of component cleaning, and increase the service life of components. At the same time, it reduces the risk of air leakage caused by excessive corrosion of the sealing surface.

[0012] 3. Check the effect of laser cleaning through the UV inspection system of the fixture to ensure that the high-purity quartz parts have been cleaned. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 It is a schematic diagram of the structure of the device of the present invention.

[0014] In the figure: 1 robot, 2 laser instrument, 3 quartz component, 4 mobile working platform, 5 air inlet, 6 exhaust port, 7 ultraviolet light source, 8 graphite fixture. DETAILED DESCRIPTION

[0015] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0016] See also Figure 1 The present invention provides a technical solution: a graphite jig for cleaning the surface of a high-purity quartz component for a semiconductor and a method for using the same. The device comprises a movable working platform 4, a manipulator 1, a graphite jig 8, a laser instrument 2 and a dust removal device. The movable working platform 4 is provided with a graphite jig 8, a manipulator 1 is provided on one side of the graphite jig 8, a laser instrument 2 is provided at the working end of the manipulator, dust removal devices are provided on both sides of the laser instrument 2, the dust removal device comprises an exhaust port 6 and an air inlet 5, and an ultraviolet light source 7 is provided around the upper surface of the graphite jig.

[0017] A graphite jig for cleaning the surface of high-purity quartz components for semiconductors and a method of using the same, wherein the method of using the same is as follows: Step 1: Clean the graphite jig: Wipe the surface of the graphite jig for laser cleaning of high-purity quartz parts with a dust-free cloth moistened with IPA until there is no black residue on the surface of the dust-free cloth; Step 2: Graphite fixture installation: Install the high-purity quartz parts to be cleaned into the cleaned graphite fixture, and lock the parts until the products cannot move relative to the graphite fixture to avoid damage to the parts due to accidental collision; Step 3: Laser cleaning: Turn on the laser cleaning equipment and call the developed laser cleaning program for the corresponding product to start automatic cleaning of high-purity quartz parts. At the same time, clean the air blowing and dust suction mechanism of the laser to remove the waste gas and dust generated during the cleaning process. Step 4: Appearance inspection: After the laser cleaning process is completed and the robot returns to its initial position, turn on the UV background installed at the bottom of the graphite fixture to check whether there is any sediment or particulate matter remaining on the surface of the component; Step 5: Disassemble the graphite fixture: After the inspection is completed and the high-purity quartz component has no surface defects, remove the component from the graphite fixture, and be careful to avoid damage during the movement process.

[0018] In step 3, the laser power in laser cleaning is 200-500W, the frequency is from 10-80HZ, and the wavelength is 1064nm.

[0019] In step 4, the appearance inspection uses ultraviolet light with a wavelength of 300-500nm.

[0020] In steps 2 to 5, the laser cleaning fixture material is high-purity graphite. Example

[0021] The traditional cleaning process of high-purity quartz components in epitaxial devices is to remove various Si compounds deposited on the surface by chemical immersion cleaning. The cleaning process requires the use of highly corrosive chemical liquids, which will cause corrosion to other parts of the components while removing surface deposits, in the form of atomization or corrosion pits; at the same time, the corrosion of the sealing surface causes the surface roughness to increase, and the vacuum leakage of the sealing surface will occur.

[0022] Laser cleaning of high-purity quartz parts uses the high energy characteristics of lasers to achieve efficient removal of pollutants. The temperature of the quartz matrix and the silicon compounds deposited on the surface increases due to the absorption of part of the laser energy. The cleaning mechanism includes ablation, gasification, photodecomposition, thermal expansion, phase explosion, etc. The implementation process is as follows: After the quartz component Lower Dome is blown dry, it is placed on a special fixture for mounting the component. The fixture can be made of graphite to avoid metal contamination. After locking the quartz component with the fixture, call the laser cleaning program (including frequency, pulse, width, scanning frequency) of the corresponding component lower dome to accurately scan the surface of the component and remove the surface deposits.

[0023] The surface treatment process for Lower Dome is as follows: Step 1: Clean the fixture 8 with a dust-free cloth moistened with IPA until there is no residue on the surface; Step 2: Install the Lower Dome components. Move component 3 safely into the fixture and clamp the components to make sure that the components cannot move relative to each other. Step 3: Use a specific laser cleaning process to clean the Lower dome The laser cleaning process is used to remove silicon compounds and colloidal particles on the surface of the Lower Dome. A specific laser instrument 2 is used in the laser cleaning process, and a special laser cleaning program is compiled: frequency: 10-20KHz; pulse width: 10-500ns; width 10-100mm; scanning frequency: 10-100Hz; robot 1 moving speed 10-50mm / s; during the cleaning process, the air blowing 5 and suction device 6 of the laser instrument can clear the waste gas and particulate matter of the product during the cleaning process; the use of laser cleaning and film removal can effectively reduce the loss of the Lower Dome surface of the component and increase the service life of the component; Step 4: UV inspection Use 365nm UV lamp 7 background light source to check whether the surface of the component is clean and no particles remain; Step 5: Disassemble the fixture After cleaning, remove the quartz component from the jig. During the disassembly process, avoid relative movement of the component on the jig to avoid damaging the jig.

[0024] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A graphite jig for cleaning the surface of high-purity quartz components for semiconductors and a method of using the same, characterized by: The device comprises a movable working platform, a manipulator, a graphite jig, a laser instrument and a dust removal device. The movable working platform is provided with a graphite jig, a manipulator is provided on one side of the graphite jig, a laser instrument is provided at the working end of the manipulator, dust removal devices are provided on both sides of the laser instrument, the dust removal device comprises an exhaust port and an air inlet, and an ultraviolet light source is provided around the upper surface of the graphite jig.

2. The graphite jig for cleaning the surface of a high-purity quartz component for semiconductors and the method for using the same according to claim 1, characterized in that: The method of use is as follows, Step 1: Clean the graphite jig: Wipe the surface of the graphite jig for laser cleaning of high-purity quartz parts with a dust-free cloth moistened with IPA until there is no black residue on the surface of the dust-free cloth; Step 2: Graphite fixture installation: Install the high-purity quartz parts to be cleaned into the cleaned graphite fixture, and lock the parts until the products cannot move relative to the graphite fixture to avoid damage to the parts due to accidental collision; Step 3: Laser cleaning: Turn on the laser cleaning equipment and call the developed laser cleaning program for the corresponding product to start automatic cleaning of high-purity quartz parts. At the same time, clean the air blowing and dust suction mechanism of the laser to remove the waste gas and dust generated during the cleaning process. Step 4: Appearance inspection: After the laser cleaning process is completed and the robot returns to its initial position, turn on the UV background installed at the bottom of the graphite fixture to check whether there is any sediment or particulate matter remaining on the surface of the component; Step 5: Disassemble the graphite fixture: After the inspection is completed and the high-purity quartz component has no surface defects, remove the component from the graphite fixture, and be careful to avoid damage during the movement process.

3. The graphite jig for cleaning the surface of a high-purity quartz component for semiconductors and the method for using the same according to claim 2, characterized in that: In step 3, the laser power in laser cleaning is 200-500W, the frequency is from 10-80HZ, and the wavelength is 1064nm.

4. The graphite jig for cleaning the surface of a high-purity quartz component for semiconductors and the method for using the same according to claim 2, characterized in that: In step 4, the appearance inspection uses ultraviolet light with a wavelength of 300-500nm.

5. The graphite jig for cleaning the surface of a high-purity quartz component for semiconductors and the method for using the same according to claim 2, characterized in that: In steps 2 to 5, the laser cleaning fixture material is high-purity graphite.

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