Silicon monoxide vapor deposition device

Abstract

The invention relates to the technical field of silicon monoxide preparation, in particular to a silicon monoxide vapor deposition device which comprises a transmission mechanism, a vapor deposition mechanism and two material returning mechanisms, the transmission mechanism is arranged on the vapor deposition mechanism, and the two material returning mechanisms are arranged on the two sides of the vapor deposition mechanism respectively. A traditional gas-phase reaction device with a compartment structure and a large size is set as a sealing bin with free partitions, and after four material collecting pads are uniformly distributed in the sealing bin, gasified substances enter a rectangular cavity formed by the four material collecting pads to react until deposition; the four tidy end faces can be matched with the built-in scraping head moving transversely in the two directions to conduct material returning treatment on deposited silicon monoxide, at the moment, the device can achieve free partition in a rectangular cavity formed by the four material collecting pads, and therefore continuous reaction of gasified substances is facilitated, and rapid material returning of sediments is achieved.

Description

Technical Field

[0001] The invention relates to the technical field of silicon dioxide preparation, in particular to a silicon dioxide vapor deposition device. Background Art

[0002] Silicon oxide is a widely used inorganic compound. It can be used as a synthetic raw material for fine ceramics and is also widely used in the optical glass and semiconductor industries.

[0003] Announcement No. CN115321542A proposes a vapor deposition device for preparing silicon monoxide, which proposes a material receiving mechanism and a feeding mechanism that can realize the docking of the inner tank and the outer furnace body, and realize the process of briefly stopping the inner tank, which provides conditions for the feeding mechanism to realize feeding; at the same time, the feeding mechanism includes two valves and a temporary storage chamber, which can store the material in the temporary storage chamber, and vacuumize to provide feeding preparation. When the inner tank stops rotating temporarily, rapid feeding can be achieved. However, the brief stop and stagnation state caused by the feeding process in this application will cause the gasified material to be unable to react continuously, and thus there are great limitations.

[0004] In view of this, a silicon oxide vapor deposition device is designed to solve the above problems. Summary of the invention

[0005] The present invention aims to solve one of the technical problems existing in the prior art or related technology.

[0006] To this end, the technical solution adopted in the present invention is: A silicon dioxide vapor deposition device comprises a transmission mechanism, a vapor deposition mechanism and two sets of material return mechanisms, wherein the transmission mechanism is arranged on the vapor deposition mechanism, and the two material return mechanisms are respectively arranged on both sides of the vapor deposition mechanism; the vapor deposition mechanism comprises a separation deposition component and a built-in scraper head for scraping off the deposited material; the separation deposition component comprises a sealing bin, two aggregate side pads arranged on the two side walls of the inner cavity of the sealing bin, an aggregate top pad arranged on the top of the aggregate side pads and an aggregate bottom pad arranged at the bottom of the two aggregate side pads; the transmission mechanism comprises a striker for striking the aggregate top pad and releasing high-frequency vibration waves; two sets of the material return mechanisms are arranged at both ends of the sealing bin; the material return mechanism comprises a sealing component and a discharge hole for discharging material, and an extrusion pad is arranged in the discharge hole.

[0007] In a preferred example, the present invention can be further configured as follows: slideways are provided at the bottoms of both ends of the aggregate top pad, compression springs are provided in the two slideways, and plugs are movably installed in the two slideways; The two sides of the built-in scraper are provided with cutting edges, and the top of the built-in scraper is provided with a notch adapted for the plug; The built-in scraper head is used to scrape off the materials deposited in the aggregate bottom pad, the aggregate top pad and the two aggregate side pads.

[0008] In a preferred example, the present invention can be further configured as follows: the sealing assembly includes a sealing door, two clamping seats installed on the sealing door, a progressive shaft movably installed in the two clamping seats, and a partition plate arranged on the threaded section of the progressive shaft; An insert tube is arranged in the sealing door, and a reflux component is arranged between the insert tube and the sealing chamber; The reflux component is used for reflux transfer of part of the gasified material in the formed partition.

[0009] In a preferred example, the present invention can be further configured as follows: the reflux assembly includes an outer tube, a transfer end tube and a core tube disposed inside the transfer end tube are installed at the bottom end of the outer tube; Two end tubes are installed at the bottom of the sealed chamber, and two core tubes penetrate into the two end tubes respectively; A sealing valve is arranged in the end tube at the top of the outer tube, which is used for sealing and controlling the pipeline after reflux.

[0010] In a preferred example, the present invention can be further configured as follows: the vapor precipitation mechanism also includes a sealing end head arranged on the sealing bin, a sealing pad arranged in the sealing end head and bearing pressure on the aggregate top pad, two clamps fixedly mounted on the top of the sealing bin, and a push rod installed inside the built-in scraper head; A thread lock is movably mounted on the threaded section of the push rod.

[0011] In a preferred example, the present invention can be further configured as follows: the transmission mechanism further includes a driving assembly disposed on the top of the sealing chamber; The driving assembly is composed of a chassis, a motor and a deflection wheel, and a traction plate is movably mounted on the deflection wheel; A reset assembly is provided on the top of the sealing chamber, and two cantilevers are installed on the sealing chamber; The reset assembly includes an outer frame plate, a column installed on the top of the sealed bin and located on the inner side of the outer frame plate, and a spring arranged outside the column; A support plate is movably mounted on the outside of the column, and the end of the support plate is mounted on the top of the striker.

[0012] In a preferred example, the present invention can be further configured as follows: the transmission mechanism further includes a speed reducer; The input shaft at the bottom of the reducer is connected to the other end of the transmission shaft in the motor, and the output shaft at the top of the reducer is connected to a linkage shaft; Two groups of positioning plates are arranged on the top of the sealing chamber, the linkage shaft is movably installed in the two groups of positioning plates, and a gear is installed on the outer end of the linkage shaft, and a chain is transmission-connected on the gear.

[0013] In a preferred example, the present invention can be further configured as follows: the material return mechanism further includes a gasket disposed in the inner port of the sealing door, and the gasket is adapted to be snap-fitted into the annular groove at the outer end of the sealing bin; A through hole is provided in the middle of the sealing door, and the pushing rod is adapted to pass through the through hole.

[0014] In a preferred example, the present invention can be further configured as follows: the material return mechanism further includes a lifting frame; The lifting frame is composed of two pull rods and a U-shaped rod body, and the U-shaped rod body is movably installed in the sliding groove, and the two ends of the two pull rods that pass through the outside of the sealing door are installed on the partition.

[0015] In a preferred example, the present invention can be further configured as follows: a rectangular notch adapted for the built-in scraper head and plug is opened on the inner side of the sealing door, and the rectangular notch is connected to the discharge hole; The extrusion pad is movably installed in the discharge hole, and is used to cooperate with the vibration wave to provide kinetic energy for the scraped material to quickly return the material.

[0016] By adopting the above technical solution, the beneficial effects achieved by the present invention are: 1. The present invention sets the traditional gas phase reaction device with a chamber structure and a large volume into a sealed chamber with free partitions. After four aggregate pads are evenly distributed inside the sealed chamber, the gasified material enters the rectangular cavity formed by the four aggregate pads to react until it is deposited. The four neat end surfaces can cooperate with the built-in scraper head with bidirectional lateral movement to remove the deposited silicon oxide. At this time, the device can realize free partitioning in the rectangular cavity formed by the four aggregate pads, thereby facilitating the continuous reaction of the gasified material and quickly removing the deposited material.

[0017] 2. The present invention sets two symmetrically distributed plugs at the bottom of the aggregate top pad. When the built-in scraper head withdraws from one of the plugs and approaches the other plug, the vaporized material can continue to flow out and react along the groove on the top of the built-in scraper head, and the deposited silicon dioxide material can be smoothly scraped off by the built-in scraper head. At this time, the airflow will not entrain the scraped material. At the same time, with the cooperation of high-frequency vibration waves, the scraping efficiency of the deposit can be improved.

[0018] 3. The present invention sets two sets of material return mechanisms, opens discharge holes inside the two sealing doors, and after the deposited materials are transferred to the inside of one of the sealing doors with the help of built-in scrapers and plugs, the extrusion pad that is lifted and lowered can cooperate with the vibration wave to shake the materials out. Finally, the materials can be discharged without stopping the equipment, thereby improving the efficiency of silicon oxide production and reducing the overall footprint of the equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1It is a schematic diagram of the present invention when used; Figure 2 It is a three-dimensional schematic diagram of the present invention; Figure 3 is a schematic diagram of the transmission mechanism of the present invention; Figure 4 For the present invention Figure 3 The enlarged schematic diagram of point A in the middle; Figure 5 is a schematic diagram of the vapor deposition mechanism of the present invention; Figure 6 It is a schematic diagram of the separation and precipitation component of the present invention; Figure 7 It is a cross-sectional schematic diagram of the aggregate top pad of the present invention; Figure 8 It is a schematic diagram of the material return mechanism of the present invention; Fig. 9 It is a cross-sectional schematic diagram of the sealing door of the present invention; Fig.10 For the present invention Fig. 9 The enlarged schematic diagram of point B in the middle; Fig.11 For the present invention Fig. 9 Enlarged schematic diagram of point C in the middle.

[0020] Reference numerals: 100, vapor phase precipitation mechanism; 110, separation precipitation assembly; 111, sealing chamber; 112, end pipe; 113, aggregate side pad; 114, aggregate bottom pad; 115, aggregate top pad; 116, slideway; 117, compression spring; 118, plug; 120, clamp; 130, sealing end; 140, sealing pad; 150, cantilever; 160, thread lock head; 170, push rod; 180, built-in scraper; 200, transmission mechanism; 210, driving assembly; 220, speed reducer; 230, linkage shaft; 240, chain; 250, positioning plate; 260, traction plate; 270, reset assembly; 271, outer frame plate; 272, column; 273, spring; 280, support plate; 290, striker; 300, material return mechanism; 310, sealing assembly; 311, sealing door; 312, clamping seat; 313, progressive shaft; 314, partition; 320, gasket; 330, insert tube; 340, slide groove; 350, lifting frame; 360, extrusion pad; 370, discharge hole; 380, reflux assembly; 381, outer tube; 382, ​​adapter end tube; 383, core tube. DETAILED DESCRIPTION

[0021] To make the purpose, technical solution and advantages of the present invention more clear, the present invention is further described in detail below in combination with specific implementations and with reference to the accompanying drawings. It should be noted that the embodiments of the present invention and the features in the embodiments can be combined with each other without conflict.

[0022] It is to be understood that these descriptions are exemplary only and are not intended to limit the scope of the invention.

[0023] A silicon dioxide vapor deposition device provided by some embodiments of the present invention will be described below in conjunction with the accompanying drawings.

[0024] Embodiment 1: Combination Figure 1-Figure 11 As shown, a silicon dioxide vapor deposition device provided by the present invention includes a transmission mechanism 200, a vapor deposition mechanism 100 and two sets of material withdrawal mechanisms 300. The transmission mechanism 200 is arranged on the vapor deposition mechanism 100, and the two material withdrawal mechanisms 300 are respectively arranged on both sides of the vapor deposition mechanism 100.

[0025] The vapor phase precipitation mechanism 100 includes a separation precipitation assembly 110, a built-in scraper 180 for scraping off the deposited material, a sealing end 130 disposed on the sealing chamber 111, a sealing pad 140 disposed in the sealing end 130 and bearing pressure on the aggregate top pad 115, two clamps 120 fixedly mounted on the top of the sealing chamber 111, and a push rod 170 installed inside the built-in scraper 180; A thread lock 160 is movably mounted on the threaded section of the push rod 170; The separation and sedimentation assembly 110 includes a sealed bin 111, two aggregate side pads 113 arranged on both side walls of the inner cavity of the sealed bin 111, an aggregate top pad 115 arranged on the top of the aggregate side pads 113, and an aggregate bottom pad 114 arranged at the bottom of the two aggregate side pads 113; The transmission mechanism 200 includes a striker 290 for striking the aggregate top pad 115 and releasing high-frequency shock waves; Two sets of material return mechanisms 300 are arranged at both ends of the sealing chamber 111; The material return mechanism 300 includes a sealing assembly 310 and a material discharge hole 370 for discharging materials, and a material extrusion pad 360 is arranged in the material discharge hole 370 .

[0026] Traditionally, silicon nitride is prepared by the gas phase method, but this type of production device is large in size. The chamber separation method used in large equipment has the problem of intermittent shutdown. In this process, the reaction of the vaporized material will be disturbed, and after the deposited material is transferred within the deposition chamber, the unseparated vaporized material will overflow. Frequent intermittent shutdowns will not only affect the service life of the equipment, but also reduce the efficiency of silicon nitride return.

[0027] When the inner wall of the sealed bin 111 is evenly distributed with the aggregate bottom pad 114, the two aggregate side pads 113 and the aggregate top pad 115, the rectangular cavity formed inside the above four aggregate pads can provide a deposition platform for the materials after the gasification material reacts. After the gasification material reacts for a period of time, the motor can be started. After the transmission of the reducer 220, the linkage shaft 230 can drive the chain 240 and the threaded lock 160. At this time, the threaded lock 160 constrained by the two cantilevers 150 can push the propulsion rod 170. At this time, the built-in scraper 180 can cooperate with the two plugs 118 to scrape the materials deposited in the rectangular cavity. At the same time, the deflection wheel driven by the other end of the transmission shaft in the motor will provide kinetic energy for the striker 290. Finally, the striker 290 with high-frequency vibration can knock the aggregate top pad 115. At this time, the vibration wave will radiate toward the aggregate side pad 113 and the aggregate bottom pad 114. When the built-in scraper 180 moves to another plug 118 position without interfering with the reaction of the gasified material, the combined built-in scraper 180 and the plug 118 at that location can cooperate with a sealing door 311 to form an independent partition, and part of the gasified material can flow back through the reflux component 380, and the remaining material can be discharged outward from the discharge hole 370 in cooperation with the extrusion pad 360.

[0028] Embodiment 2: Combination Figure 5-Figure 11 As shown, on the basis of Example 1, slideways 116 are provided at the bottom of both ends of the aggregate top pad 115, compression springs 117 are provided in the two slideways 116, and plugs 118 are movably installed in the two slideways 116; Both sides of the built-in scraper head 180 are provided with cutting edges, and the top of the built-in scraper head 180 is provided with a notch adapted to fit the plug 118; The built-in scraper 180 can effectively scrape away the materials deposited in the aggregate bottom pad 114 , the aggregate top pad 115 and the two aggregate side pads 113 without interfering with the reaction of the gasified substances.

[0029] Preferably, the groove on the top of the built-in scraper head 180 can provide a flow path for the vaporized material when it does not contact the plug 118. When the built-in scraper head 180 passes through and fits the plug 118, the rectangular scraper head structure formed as an overall structure can stably move laterally along the rectangular cavity, and finally quickly scrape off the deposited material with the cooperation of the vibration wave, while preventing the airflow from entraining the scraped material.

[0030] The sealing assembly 310 includes a sealing door 311, two clamping seats 312 installed on the sealing door 311, a progressive shaft 313 movably installed in the two clamping seats 312, and a partition 314 arranged on the threaded section of the progressive shaft 313; An insert pipe 330 is provided in the sealing door 311, and a reflux assembly 380 is provided between the insert pipe 330 and the sealing chamber 111; The built-in scraper head 180 is used to scrape off the materials deposited in the aggregate bottom pad 114 , the aggregate top pad 115 and the two aggregate side pads 113 .

[0031] Preferably, two sealing doors 311 are arranged at both ends of the sealing chamber 111 to provide partitioned discharge for the scraped materials in the rectangular cavity. At this time, the two sealing doors 311 can move freely together with the built-in scraper head 180 and the plug 118 to form an independent partitioned space, thereby ensuring that the gasified material continues to react and deposit while providing a channel for rapid discharge of the sediment.

[0032] The reflux assembly 380 includes an outer tube 381, a transfer end tube 382 and a core tube 383 disposed inside the transfer end tube 382 are installed at the bottom end of the outer tube 381; Two end tubes 112 are installed at the bottom of the sealed chamber 111, and the two core tubes 383 penetrate into the two end tubes 112 respectively; A sealing valve is provided in the end tube at the top of the outer tube 381 for sealing and controlling the pipeline after reflux.

[0033] Preferably, the two groups of reflux components 380 are respectively connected to the two end tubes 112. When the two end tubes 112 input the vaporized material into the rectangular cavity and fully react, the material scraped away by the scraper structure and part of the vaporized material can be refluxed and transferred through the two groups of reflux components 380. When part of the vaporized material is completely refluxed, the sealing valve can be closed. At this time, the vibration wave can cooperate with the built-in scraper head 180 and the plug 118 to quickly vibrate the material out, and under the extrusion action of the extrusion pad 360, the material can be safely extruded.

[0034] Embodiment 3: Combination Figure 3-Figure 11 As shown, based on the embodiment 1, the transmission mechanism 200 further includes a reducer 220 and a driving assembly 210 disposed on the top of the sealing chamber 111; The driving assembly 210 is composed of a chassis, a motor and a deflection wheel, and a traction plate 260 is movably mounted on the deflection wheel; A reset assembly 270 is disposed on the top of the sealing chamber 111, and two cantilevers 150 are installed on the sealing chamber 111; The reset assembly 270 includes an outer frame plate 271, a column 272 installed on the top of the sealing chamber 111 and located on the inner side of the outer frame plate 271, and a spring 273 arranged outside the column 272; A support plate 280 is movably mounted on the outside of the column 272 , and the end of the support plate 280 is mounted on the top of the striker 290 .

[0035] Preferably, the outer frame plate 271 arranged on the top of the sealing bin 111 provides a constrained platform for the support plate 280 to stably lift and lower, and cooperates with the column 272 and the spring 273 to limit the pressure on the support plate 280. As the traction plate 260 is reciprocated by the deflection wheel, the constrained support plate 280 can drive the impact pin 290 to perform high-frequency impact on the aggregate top pad 115. At this time, the separation and sedimentation assembly 110 as a whole can obtain the radiation of vibration waves to improve the scraping efficiency of the deposited materials.

[0036] The input shaft at the bottom of the reducer 220 is connected to the other end of the transmission shaft in the motor, and the output shaft at the top of the reducer 220 is connected to the linkage shaft 230; Two sets of positioning plates 250 are arranged on the top of the sealing chamber 111 , and the linkage shaft 230 is movably installed in the two sets of positioning plates 250 . A gear is installed at the outer end of the linkage shaft 230 , and a chain 240 is transmission-connected to the gear.

[0037] The speed reducer 220 is used to reduce the rotation speed of the linkage shaft 230. At this time, the slowly rotating linkage shaft 230 can drive the chain 240, and the constrained threaded lock head 160 can be driven. At this time, the push rod 170 drives the built-in scraper head 180 to move horizontally stably, and the above-mentioned striker 290 will also vibrate. At this time, the material deposited in the rectangular cavity can be quickly scraped off. With the reciprocating horizontal movement of the push rod 170, the built-in scraper head 180 can regularly scrape the deposits in the rectangular cavity within the selected time period.

[0038] Embodiment 4: Combination Figure 5-Figure 11 As shown, in the above embodiment, the material return mechanism 300 further includes a lifting frame 350 and a gasket 320 disposed in the inner port of the sealing door 311, and the gasket 320 is adapted to be clamped in the annular groove at the outer end of the sealing chamber 111; A through hole is provided in the middle of the sealing door 311 , and the push rod 170 is adapted to pass through the through hole.

[0039] Preferably, the through holes in the middle of the two sealing doors 311 can provide a platform with sufficient pressure resistance for the lateral movement of the pushing rod 170, and at this time, the built-in scraper head 180 can be pushed horizontally to maintain a stable movement speed.

[0040] The lifting frame 350 is composed of two pull rods and a U-shaped rod body, and the U-shaped rod body is movably installed in the slide groove 340, and the two ends of the two pull rods that pass through the outside of the sealing door 311 are installed on the partition 314; A rectangular notch adapted for the built-in scraper head 180 and the plug 118 is provided on the inner side of the sealing door 311, and the rectangular notch is connected to the discharge hole 370; The extrusion pad 360 is movably installed in the discharge hole 370 to cooperate with the vibration wave to provide kinetic energy for the scraped material to be quickly withdrawn.

[0041] When the closed built-in scraper head 180 and plug 118 continue to move toward the inside of the sealing door 311, the space after the independent partition can cooperate with the lifting and lowering of the extrusion pad 360 to provide a transfer channel for the scraped material. As the material is discharged, the extrusion pad 360 pushed in the reverse direction can quickly close the inner cavity of the discharge hole 370. At this time, the reset of the built-in scraper head 180 will not be disturbed by external factors, and at the same time ensure that the rectangular cavity remains airtight at all times.

[0042] The working principle and use process of the present invention are as follows: In the traditional vapor precipitation preparation process of silicon oxide, when the reacting vaporized substances are respectively input into the deposition chamber, silicon oxide will be deposited downwards during the reaction and then adhere to the inner wall of the deposition chamber. When the generated material needs to be withdrawn, the equipment room is not stopped and the silicon oxide is indirectly disturbed by the airflow. At the same time, in order to achieve the filling and withdrawal of materials without stopping the equipment, the existing equipment needs to be partitioned, and the volume of the equipment is indirectly increased.

[0043] The device is provided with a free-style partition structure in an independent reaction chamber, and two sealing end heads 130, a bottom aggregate pad 114 and a top aggregate pad 115 are arranged on the inner wall of the sealed chamber 111 so as to be evenly distributed on the circumference. At this time, the rectangular cross section formed by the two side aggregate pads 113, the bottom aggregate pad 114 and the top aggregate pad 115 can provide a deposition platform for the gas phase reaction material. When the gasified material is injected from the two end pipes 112 respectively, the built-in scraper 180 will be located in the groove on the inner side of one of the sealing doors 311. At this time, the rectangular cavity formed by the two side aggregate pads 113, the bottom aggregate pad 114 and the top aggregate pad 115 is in a connected state. After the above-mentioned gasified substances react for a certain period of time, the motor in the driving component 210 can be operated. As the transmission shaft in the motor rotates, the deflection wheel installed at its outer end will drive the traction plate 260 to rise and fall back and forth. At this time, the reset component 270 installed on the top of the sealing chamber 111 can provide a stable reset thrust for the traction plate 260 and the support plate 280. At this time, the striker 290 installed at the end of the support plate 280 will apply a high-frequency vibration force to the aggregate top pad 115. At the same time, the two sides of the bottom of the aggregate top pad 115 are pressed on the tops of the two aggregate side pads 113. The continuous radiation of the vibration wave will eventually radiate to the two aggregate side pads 113 and the aggregate bottom pad 114. At this time, the loose silicon oxide material deposited on the aggregate top pad 115, the aggregate side pad 113 and the aggregate bottom pad 114 can be loosened; At the same time, the other end of the motor drive shaft is connected to the input shaft of the reducer 220, and the output shaft of the reducer 220 is connected to the linkage shaft 230. Therefore, as the striker 290 vibrates, the linkage shaft 230 slowly rotates to transmit the chain 240, and finally the chain 240 drives the thread lock 160 clamped by the two cantilevers 150. At this time, the rotation of the thread lock 160 will recursively push the push rod 170, and the built-in scraper 180 installed on the push rod 170 will slide along the above-mentioned rectangular cavity. Under the action of the continuous radiation of the vibration wave, the four-sided blades of the built-in scraper 180 The opening can deliver the materials deposited on the end surfaces of the aggregate top pad 115, the aggregate bottom pad 114 and the two aggregate side pads 113 to the inside of the other sealing door 311, until the notch on the top of the built-in scraper head 180 fits with the plug 118 close to the other sealing door 311. As the built-in scraper head 180 cooperates with the other plug 118 to continuously move, the gasified materials can eventually be guided through the notch on the top of the built-in scraper head 180. At the same time, the rectangular cavity is partitioned by cooperating with the other plug 118 and the built-in scraper head 180. At this time, the partitioned and delivered materials can enter one of the discharge holes 370. When the rectangular cavity is partitioned by the above operation, the progressive shaft 313 can be controlled to rotate clockwise, and the partition 314 will drive the lifting frame 350 to lift upward, and the extrusion pad 360 will be lifted upward along the inside of the discharge hole 370 until the inner cavity of the discharge hole 370 is connected with the external environment. When the built-in scraper head 180 continues to move horizontally and cooperates with the radiation of the vibration wave, silicon dioxide can eventually be quickly discharged from the discharge hole 370 to the outside. After the material is discharged, the progressive shaft 313 can be controlled to rotate counterclockwise until the extrusion pad 360 is reset and the discharge hole 370 is blocked. At this time, the above-mentioned rectangular cavity can provide an unobstructed deposition platform for the gasified material. Repeat the above steps. At this time, the device can achieve automated partitioning operations with the smallest volume.

[0044] Although the embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the claims and their equivalents.

Claims

1. A silicon dioxide vapor deposition device, comprising a transmission mechanism (200), characterized in that: It also includes a vapor deposition mechanism (100) and two sets of material return mechanisms (300), wherein the transmission mechanism (200) is arranged on the vapor deposition mechanism (100), and the two material return mechanisms (300) are respectively arranged on both sides of the vapor deposition mechanism (100); The vapor phase precipitation mechanism (100) comprises a separation precipitation component (110) and a built-in scraper (180) for scraping off deposited materials; The separation and sedimentation assembly (110) comprises a sealed bin (111), two aggregate side pads (113) arranged on two side walls of the inner cavity of the sealed bin (111), an aggregate top pad (115) arranged on the top of the aggregate side pads (113), and an aggregate bottom pad (114) arranged on the bottom of the two aggregate side pads (113); The transmission mechanism (200) comprises a striker (290) for striking the aggregate top pad (115) and releasing high-frequency vibration waves; Two sets of the material return mechanisms (300) are arranged at two ends of the sealing chamber (111).

2. The silicon dioxide vapor deposition device according to claim 1, characterized in that: The bottoms of both ends of the aggregate top pad (115) are provided with slideways (116), compression springs (117) are provided in the two slideways (116), and plugs (118) are movably installed in the two slideways (116); Both sides of the built-in scraper head (180) are provided with cutting edges, and the top of the built-in scraper head (180) is provided with a notch adapted to fit the plug (118); The built-in scraper (180) is used to scrape off materials deposited in the aggregate bottom pad (114), the aggregate top pad (115), and the two aggregate side pads (113).

3. The silicon dioxide vapor deposition device according to claim 1, characterized in that: The material return mechanism (300) comprises a sealing assembly (310) and a material discharge hole (370) for discharging material, wherein a material extrusion pad (360) is arranged in the material discharge hole (370); The sealing assembly (310) further comprises a sealing door (311), two clamping seats (312) mounted on the sealing door (311), a progressive rotating shaft (313) movably mounted in the two clamping seats (312), and a partition plate (314) arranged on a threaded section of the progressive rotating shaft (313); The sealing door (311) is provided with an insert pipe (330), and a reflux component (380) is provided between the insert pipe (330) and the sealing chamber (111); The reflux component (380) is used to reflux and transfer part of the gasified material in the partition.

4. The silicon dioxide vapor deposition device according to claim 3, characterized in that: The reflux assembly (380) comprises an outer tube (381), and a transfer end tube (382) and a core tube (383) arranged inside the transfer end tube (382) are installed at the bottom end of the outer tube (381); Two end tubes (112) are installed at the bottom of the sealing chamber (111), and two core tubes (383) respectively penetrate into the two end tubes (112); A sealing valve is provided in the end pipe at the top of the outer pipe (381) for sealing and controlling the pipeline after reflux.

5. The silicon dioxide vapor deposition device according to claim 1, characterized in that: The vapor deposition mechanism (100) further comprises a sealing end head (130) arranged on the sealing chamber (111), a sealing pad (140) arranged in the sealing end head (130) and bearing pressure on the aggregate top pad (115), two clamps (120) fixedly mounted on the top of the sealing chamber (111), and a pushing rod (170) mounted inside the built-in scraper (180); A thread lock head (160) is movably mounted on the threaded section of the push rod (170).

6. The silicon dioxide vapor deposition device according to claim 1, characterized in that: The transmission mechanism (200) further comprises a driving assembly (210) arranged on the top of the sealing chamber (111); The driving assembly (210) is composed of a chassis, a motor, and a deflection wheel, and a traction plate (260) is movably mounted on the deflection wheel; A reset assembly (270) is disposed on the top of the sealing chamber (111), and two cantilevers (150) are installed on the sealing chamber (111); The reset assembly (270) comprises an outer frame plate (271), a column (272) installed on the top of the sealing chamber (111) and located on the inner side of the outer frame plate (271), and a spring (273) arranged outside the column (272); A support plate (280) is movably mounted on the outside of the column (272), and the end of the support plate (280) is mounted on the top of the striker (290).

7. The silicon dioxide vapor deposition device according to claim 1, characterized in that: The transmission mechanism (200) further includes a reducer (220); The input shaft at the bottom of the reducer (220) is connected to the other end of the transmission shaft in the motor, and the output shaft at the top of the reducer (220) is connected to a linkage shaft (230); Two groups of positioning plates (250) are arranged on the top of the sealing chamber (111), the linkage shaft (230) is movably mounted in the two groups of positioning plates (250), and a gear is mounted on the outer end of the linkage shaft (230), and a chain (240) is transmission-connected to the gear.

8. The silicon dioxide vapor deposition device according to claim 5, characterized in that: The material return mechanism (300) further comprises a gasket (320) arranged in the inner port of the sealing door (311), and the gasket (320) is adapted to be snap-fitted into the annular groove at the outer end of the sealing chamber (111); A through hole is provided in the middle of the sealing door (311), and the pushing rod (170) is adapted to pass through the through hole.

9. The silicon dioxide vapor deposition device according to claim 1, characterized in that: The material return mechanism (300) further comprises a lifting frame (350); The lifting frame (350) is composed of two pull rods and a U-shaped rod body, and the U-shaped rod body is movably installed in the slide groove (340). The two pull rods extend through the two ends outside the sealing door (311) and are installed on the partition plate (314).

10. The silicon dioxide vapor deposition device according to claim 3, characterized in that: The sealing door (311) has a rectangular notch on its inner side adapted to fit the built-in scraper head (180) and the plug (118), and the rectangular notch is in communication with the discharge hole (370); The material extrusion pad (360) is movably mounted in the material discharge hole (370) and is used to cooperate with the vibration wave to provide kinetic energy for the scraped material to be quickly discharged.

Images