Self-purification air conditioning equipment for wafer film thickness detection laboratory

Abstract

The invention relates to the technical field of air purification and precise instrument environment control, and provides self-purification air conditioning equipment for a wafer film thickness detection laboratory, which comprises a purification pipeline and a base which are sequentially arranged from top to bottom, a filter screen, a non-woven fabric filter bag, a condenser, a first activated carbon filter plate, an electric heater and a fan are sequentially installed in the purification pipeline, a material changing module is arranged in the base, first cleaning devices are arranged on the two sides of the outer wall of the purification pipeline, and a second cleaning device is arranged in the purification pipeline and located at the non-woven fabric filter bag. Some chemical gases generated in a laboratory can be filtered through the first activated carbon filter plate, the purification effect is improved, the first activated carbon filter plate can be replaced through the material changing module, and the service life of the equipment is prolonged; dust on the filter screen is cleaned through the cleaning device I; and the non-woven fabric filter bag is cleaned through the cleaning device II, so that the self-purification effect of the air conditioning equipment is improved.

Description

Technical Field

[0001] The invention relates to the technical field of air purification and precision instrument environment control, in particular to a self-purification air conditioning device used in a wafer film thickness detection laboratory. Background Art

[0002] Wafer refers to the silicon chip used to make silicon semiconductor circuits. Wafer film thickness detection is an important detection link in the semiconductor manufacturing process. Wafer film thickness detection needs to be carried out in a highly clean environment to avoid interference with the wafer surface and the detection process by tiny particles, dust, chemical pollutants in the air; at the same time, various pollutants and heat will continue to be generated inside the laboratory due to factors such as personnel activities and equipment operation. If these pollutants are not handled in time, they will accumulate in the laboratory and further affect the detection environment. In addition, fluctuations in temperature and humidity will also have an adverse effect on the performance and accuracy of the detection equipment, requiring air-conditioning equipment to have precise temperature and humidity control capabilities.

[0003] Most conventional household air-conditioning equipment will have filters at the air inlet to intercept dust, thereby preventing dust from falling onto the condenser surface and affecting the air-conditioning effect. However, the wafer film thickness testing laboratory has high requirements for air cleanliness. The filters of conventional air conditioners are often difficult to meet the cleanliness requirements in the wafer laboratory. Equipment with better filtering effects is needed to filter the air. However, after a long period of filtration, the filter equipment will accumulate a lot of dust, resulting in low purification quality. At the same time, the accumulated dust will lead to a reduction in the air supply, which in turn leads to a decrease in the temperature regulation accuracy. And cleaning personnel are required to clean it, wasting a lot of time and energy.

[0004] Therefore, the present invention provides a self-purifying air conditioning device for a wafer film thickness detection laboratory. Summary of the invention

[0005] The present invention provides a self-purification air-conditioning device for a wafer film thickness detection laboratory. A cleaning device is provided to improve the self-purification effect of the self-purification air-conditioning device so as to solve the problems existing in the background technology.

[0006] The technical solution of the present invention is as follows: A self-purifying air conditioning device for a wafer film thickness detection laboratory, comprising: a purification duct and a base arranged in sequence up and down, an air inlet and an air outlet are respectively arranged at both ends of the purification duct, a filter screen, a non-woven filter bag, a condenser, an activated carbon filter plate 1, an electric heater and a fan are sequentially installed in the purification duct, an installation groove is opened between the bottom of the purification duct and the base, and a material replacement module is arranged in the base, cleaning devices 1 are arranged on both sides of the outer wall of the purification duct, the cleaning device 1 is located between the air inlet and the filter screen, and a cleaning device 2 is arranged in the purification duct and located at the non-woven filter bag; The refueling module can replace the activated carbon filter plate I in the purification pipeline through the installation groove, thereby extending the service life of the equipment and improving the filtering effect; The cleaning device I is used to clean the filter screen; The cleaning device II is used to clean the non-woven fabric filter bag.

[0007] Preferably, a sealing door is arranged on one side of the base.

[0008] Preferably, the refueling module includes a lead screw I, a motor I, and an electric push rod. The two ends of the lead screw I are respectively rotationally connected to the top and bottom of the base. The motor I and the electric push rod are installed in the base. The motor I drives the lead screw I to rotate through a gear. A resisting block is threadedly connected to the lead screw I, and the resisting block is slidably connected to the inner wall of the base. The resisting block and the installation groove are on the same plane. The output end of the electric push rod is fixedly connected with a limiting plate.

[0009] Preferably, the limiting plate is clamped with a plurality of sealing plates I through a plurality of protrusions. The plurality of sealing plates I are located on the side of the base away from the air supply port, and the upper edge of the sealing plate I fits with the top of the base. The sealing plate I is in a U shape, and a sealing plate II is slidably connected inside the sealing plate I. The sealing plate II is in an L shape. An activated carbon filter plate II is stored between the sealing plate I and the sealing plate II. The sealing plate II close to the installation groove is on the same plane as the installation groove, and the width of the sealing plate II is the same as the width of the installation groove.

[0010] Preferably, the cleaning device I includes two fixed frames fixedly connected to both sides of the purification pipeline, and the fixed frames communicate with the purification pipeline. Baffles are rotationally connected to the inner sides of the two open ends of the fixed frames. A motor II for driving the baffle to rotate is installed on the fixed frame. A fixing plate I is fixedly connected to the baffle close to the inside of the purification pipeline, and the fixing plate I is located inside the fixed frame.

[0011] One side of the fixing plate I is rotationally connected with a connecting rod I and a connecting rod II. One end of the connecting rod I is connected with a synchronous pulley. The synchronous pulley is located on the other side of the fixing plate I and there are a plurality of them. A synchronous belt is installed on the plurality of synchronous pulleys. A motor III for driving one of the synchronous pulleys to rotate is installed on the fixing plate I. A connecting rod III is connected between the connecting rod I and the connecting rod II. One end of the connecting rod III is rotationally connected to the other end of the connecting rod I, and the other end is rotationally connected to the middle of the connecting rod II. A sliding rod is slidably connected inside the connecting rod II, and the sliding rod extends outside the connecting rod II. A limiting block is fixedly connected to the fixing plate I. An arc-shaped groove is opened on the limiting block, and the top and bottom of the arc-shaped groove both approach the side of the brush. The limiting block is located on one side of the connecting rod II. A limiting post is fixedly connected to the end of the sliding rod located inside the connecting rod II. An empty groove is opened on one side of the connecting rod II, and the limiting post passes through the empty groove and is located inside the arc-shaped groove.

[0012] Preferably, one end of the connecting rod three located outside the connecting rod two is fixedly connected to an automatic telescopic rod, and a brush two is rotatably connected between the two ends of the automatic telescopic rod. A motor four for driving the brush two to rotate is installed at one end of the automatic telescopic rod, and a plurality of fans are installed in a fixed frame in one of the cleaning devices one, and the fans are located between the brush two and a baffle away from the purification pipe.

[0013] Preferably, the second cleaning device comprises a second fixing plate fixedly connected in the purification pipe and a fixing frame slidably connected in the purification pipe, the second fixing plate and the fixing frame are respectively provided with a first circular groove and a second circular groove, the two ends of the non-woven filter bag are respectively fixedly connected to the second fixing plate and the fixing frame and are located in the first circular groove and the second circular groove, a fixing rod is fixedly connected to one side of the second fixing plate, one end of the fixing rod passes through the fixing frame and a block is fixedly connected to the other end that passes through, a spring is sleeved on the outside of the fixing rod and located between the second fixing plate and the fixing frame, the second cleaning device also comprises a square groove provided above the purification pipe, an inclined conveyor belt and a motor five for driving the conveyor belt are installed in the square groove, and a plurality of push plates are fixedly connected to the conveyor belt.

[0014] Compared with the prior art, the present invention has the following beneficial effects: 1. The present invention can filter out some chemical gases generated in the laboratory through the activated carbon filter plate 1, thereby improving the purification effect. The activated carbon filter plate 1 can be replaced through the material replacement module, thereby extending the service life of the equipment and further improving the purification effect.

[0015] 2. The present invention can achieve better purification effect by arranging non-woven filter bags to filter the air, thereby meeting the cleanliness requirements of the wafer film thickness laboratory.

[0016] 2. The present invention uses a first cleaning device to clean dust on the filter net, thereby improving the air purification effect and reducing the manual cleaning work; and uses a second cleaning device to clean the non-woven filter bag, thereby improving the self-purification effect of the air-conditioning equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 is a perspective view of the apparatus of the present invention; Figure 2 is a schematic cross-sectional view of the apparatus of the present invention; Figure 3 is a cross-sectional perspective view of the apparatus of the present invention; Figure 4 is a front perspective view of the updating device of the present invention; Figure 5 is a side perspective view of the updating device of the present invention; Figure 6 is a three-dimensional diagram of the material changing module of the present invention; Figure 7 It is a three-dimensional diagram of the structure on the air supply pipe of the present invention; Figure 8 The present invention Figure 7 A partial enlarged view of middle A; Fig. 9 It is a three-dimensional diagram of a cleaning device 1 of the present invention; Fig.10 is a cross-sectional view of the brush of the present invention; Fig.11 It is a cross-sectional perspective view of the cleaning device 2 of the present invention.

[0018] In the figure: 1. Purification duct; 2. Base; 21. Mounting slot; 22. Sealing door; 3. Air inlet; 4. Air outlet; 5. Filter; 6. Non-woven filter bag; 7. Condenser; 8. Activated carbon filter plate 1; 9. Electric heater; 10. Fan; 11. Refueling module; 111. Screw rod 1; 112. Motor 1; 113. Electric push rod; 114. Stop block; 115. Limit plate; 116. Sealing plate 1; 117. Sealing plate 2; 118. Activated carbon filter plate 2; 12. Cleaning device 1; 121. Fixed frame; 122. Baffle; 123. Motor 2; 124. Fixed plate 1; 125. Synchronous wheel; 126 , synchronous belt; 127, motor three; 128, connecting rod one; 129, connecting rod two; 1210, connecting rod three; 1211, sliding rod; 1212, limiting block; 1213, limiting column; 1214, automatic telescopic rod; 1215, brush; 1216, motor four; 1217, fan; 1218, arc groove; 1219, empty groove; 13, cleaning device two; 131, fixed plate two; 132, fixed frame; 133, circular groove one; 134, circular groove two; 135, fixed rod; 136, block; 137, spring; 138, square groove; 139, conveyor belt; 1310, motor five; 1311, push plate. DETAILED DESCRIPTION

[0019] The following embodiments of the present invention are described in further detail in conjunction with the accompanying drawings and examples. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0020] Embodiment 1: like Figure 1-10As shown, the present invention provides a self-purifying air conditioning equipment for a wafer film thickness detection laboratory, comprising: a purification pipeline 1 and a base 2 which are sequentially arranged up and down, wherein an air inlet 3 and an air supply port 4 are respectively arranged at both ends of the purification pipeline 1, a filter screen 5, a non-woven filter bag 6, a condenser 7, an activated carbon filter plate 8, an electric heater 9 and a fan 10 are sequentially installed in the purification pipeline 1, an installation groove 21 is opened between the bottom of the purification pipeline 1 and the base 2, and a material replacement module 11 is arranged in the base 2, cleaning devices 12 are arranged on both sides of the outer wall of the purification pipeline 1, and the cleaning device 12 is located between the air inlet 3 and the filter screen 5, and a cleaning device 2 13 is arranged in the purification pipeline 1 and located at the non-woven filter bag 6; The material replacement module 11 can replace the activated carbon filter plate 8 in the purification pipeline 1 through the installation groove 21, thereby extending the service life of the equipment and improving the filtering effect; The cleaning device 12 is used to clean the filter 5; The cleaning device 2 13 is used for cleaning the non-woven filter bag 6 .

[0021] A sealing door 22 is provided on one side of the base 2 for inspecting the material changing module 11 or replacing the activated carbon filter plate 118 in the material changing module 11 .

[0022] like Figure 1-3 As shown, when the air conditioning equipment is working, the fan 10 draws the air in the laboratory from the air inlet 3 into the purification duct 1, and filters out impurities in the air through the filter 5, the non-woven filter bag 6, and the activated carbon filter plate 8. At the same time, the temperature of the indoor air is adjusted through the condenser 7 to make the indoor air reach the temperature required for the experiment, and finally the purified air is sent back to the room from the air supply port 4.

[0023] It should be noted that when heating is performed, the electric heater 9 is used to assist in heating, thereby reducing the energy consumption of the air-conditioning equipment.

[0024] The material changing module 11 includes a screw rod 111, a motor 112 and an electric push rod 113. The two ends of the screw rod 111 are rotatably connected to the top and bottom of the base 2 respectively. The motor 112 and the electric push rod 113 are installed in the base 2. The motor 112 drives the screw rod 111 to rotate through gears. A stop block 114 is threadedly connected to the screw rod 111, and the stop block 114 is slidably connected to the inner wall of the base 2. The stop block 114 and the mounting groove 21 are located on the same plane, and the output end of the electric push rod 113 is fixedly connected to a limiting plate 115.

[0025] The limiting plate 115 is clamped with a plurality of first sealing plates 116 through a plurality of protrusions. The plurality of first sealing plates 116 are located on the side of the base 2 away from the air supply port 4. The upper edge of the first sealing plate 116 is attached to the top of the base 2. The first sealing plate 116 is in a U shape, and a second sealing plate 117 is slidably connected inside the first sealing plate 116. The second sealing plate 117 is in an L shape. An activated carbon filter plate 2 is stored in the first sealing plate 116 and the second sealing plate 117. One of the second sealing plates 117 close to the installation groove 21 is on the same plane as the installation groove 21, and the width of the second sealing plate 117 is the same as the width of the installation groove 21.

[0026] As Figure 4-6 shown, the abutting block 114 abuts against the lower side of the second sealing plate 117. When replacement is needed, the first motor 112 is started to drive the first lead screw 111 to rotate through the gear. Since the abutting block 114 is threadedly connected to the first lead screw 111 and is slidably connected to the inner wall of the base 2, when the first lead screw 111 rotates, it drives the abutting block 114 to descend. At the same time, the activated carbon filter plate 1 in the purification pipeline 1 follows the second sealing plate 117 to descend until the second sealing plate 117 completely slides into the first sealing plate 116. Then, the electric push rod 113 is started to push the first sealing plate 116 and the second sealing plate 117 to move through the limiting plate 115, so that the adjacent first sealing plate 116 and the second sealing plate 117 move to the installation groove 21. Then, the first motor 112 is started to drive the abutting block 114 to rise, so that the abutting block 114 lifts the second sealing plate 117 to the installation groove 21 and drives the activated carbon filter plate 2 into the purification pipeline 1 to complete the replacement, and one side of the second sealing plate 117 fits with the installation groove 21, thereby closing the installation groove 21 through the second sealing plate 117 to prevent the air in the purification pipeline 1 from entering the chamber 32 and consuming the activated carbon filter plate 2.

[0027] Due to the complexity of the laboratory environment, the activated carbon filter plate 1 can adsorb some chemical gases generated in the laboratory, improving the purification effect. The replacement of the activated carbon filter plate 1 can be realized through the material replacement module 11, extending the service life of the equipment and further improving the purification effect.

[0028] Embodiment 2: The first cleaning device 12 includes two fixed frames 121 fixedly connected to both sides of the purification pipeline 1, and the fixed frames 121 communicate with the purification pipeline 1. Baffles 122 are rotatably connected to the inner sides of both ends of the fixed frames 121 with openings. A second motor 123 for driving the baffle 122 to rotate is installed on the fixed frame 121. A first fixing plate 124 is fixedly connected to the baffle 122 close to the inside of the purification pipeline 1, and the first fixing plate 124 is located inside the fixed frame 121.

[0029] One side of the fixed plate 124 is rotatably connected with a connecting rod 128 and a connecting rod 2 129, one end of the connecting rod 128 is connected with a synchronous wheel 125, the synchronous wheel 125 is located on the other side of the fixed plate 124 and is provided with a plurality of synchronous wheels 125, a synchronous belt 126 is installed on the plurality of synchronous wheels 125, a motor 3 127 for driving one of the synchronous wheels 125 to rotate is installed on the fixed plate 124, a connecting rod 3 1210 is connected between the connecting rod 128 and the connecting rod 2 129, one end of the connecting rod 3 1210 is rotatably connected to the other end of the connecting rod 128, and the other end is rotatably connected to the middle part of the connecting rod 2 129, and the connecting rod 2 1 A sliding rod 1211 is slidably connected inside 29, and the sliding rod 1211 extends to the outside of the second connecting rod 129. A limiting block 1212 is fixedly connected to the fixing plate 124. An arc groove 1218 is provided on the limiting block 1212, and the top and bottom ends of the arc groove 1218 are both close to the brush 1215. The limiting block 1212 is located on one side of the second connecting rod 129, and one end of the sliding rod 1211 located inside the second connecting rod 129 is fixedly connected to a limiting column 1213. An empty groove 1219 is provided on one side of the second connecting rod 129, and the limiting column 1213 passes through the empty groove 1219 and is located in the arc groove 1218.

[0030] One end of the connecting rod three 1210 located outside the connecting rod two 129 is fixedly connected to the automatic telescopic rod 1214, and a brush 1215 is rotatably connected between the two ends of the automatic telescopic rod 1214. One end of the automatic telescopic rod 1214 is equipped with a motor four 1216 for driving the brush 1215 to rotate. A plurality of fans 1217 are installed in the fixed frame 121 in one of the cleaning devices 12, and the fan 1217 is located between the brush 1215 and the baffle 122 away from the purification pipe 1.

[0031] like Figure 7-9 As shown, during the use of the cleaning device 12, the motor 2 123 is started, and the baffle 122 is driven to rotate by the motor 2 123, so that the two baffles 122 close to the purification pipe 1 are rotated into the purification pipe 1 to close the air inlet 3, and at the same time, the two baffles 122 away from the purification pipe 1 are rotated to the outside of the fixed frame 121; at the same time, the brush 1215 on the fixed plate 124 is directly facing the filter screen 5; Figure 8As shown, during the cleaning process, the starting motor 3 127 drives a synchronous wheel 125 to rotate, and drives multiple synchronous wheels 125 to rotate synchronously through the synchronous belt 126. When the synchronous wheel 125 rotates, it drives the connecting rod 1 128 to rotate, and drives the connecting rod 2 129 to rotate through the connecting rod 3 1210 which is rotatably connected to the connecting rod 1 128 and the connecting rod 2 129: during the rotation of the connecting rod 1 128, the connecting rod 2 129 can be pushed to swing upward or pulled to swing downward through the connecting rod 3 1210, and by continuously rotating the connecting rod 1 128, the connecting rod 2 129 can be intermittently swung up and down, and then the motor 3 127 can realize the reciprocating up and down swing of the connecting rod 2 129, so that the brush 1215 repeatedly cleans the impurities and dust on the filter screen 5, thereby improving the cleaning efficiency.

[0032] It should be noted that, during the swinging of the second connecting rod 129, the brush 1215 will move in a circular trajectory, which causes the brush 1215 to gradually move away from the filter 5 when it moves from the midpoint of the trajectory to the highest point or the lowest point, thereby reducing the cleaning force on the filter 5. To solve this problem, a limit block 1212 is provided on one side of the second connecting rod 129, and an arc groove 1218 is provided on the limit block 1212, and the arc groove 1218 The top and bottom ends of the brush 1215 are both close to the side of the brush 1215. When the limiting column 1213 follows the movement of the connecting rod 129, it will also move in the arc groove 1218, so that when the brush 1215 moves upward or downward from the midpoint of the trajectory, the limiting column 1213 drives the sliding rod 1211 to gradually extend out from the connecting rod 129, thereby reducing the distance between the brush 1215 and the filter 5, and improving the cleaning force of the brush 1215 on the filter 5 when it moves upward or downward from the midpoint of the trajectory.

[0033] like Fig.10 As shown, the central axis of the brush 1215 is an extendable telescopic rod, and a large sleeve and a small sleeve are fixedly connected at both ends of the telescopic rod. The small sleeve is located in the large sleeve and can slide against each other. Bristles are provided on the outside of the large sleeve and the small sleeve. When the automatic telescopic rod 1214 is extended, one end of the brush 1215 is pulled to extend it, so that the small sleeve slides out of the large sleeve, thereby increasing the cleaning area of ​​the brush 1215. At the same time, the automatic telescopic rod 1214 is shortened when the two baffles 122 are driven to rotate to prevent the brush 1215 from contacting the fixed frame 121 and damaging the brush 1215.

[0034] During the cleaning process, the fan 1217 in the fixed frame 121 on one side is started to blow the dust from the purification duct 1 to the fixed frame 121 on the other side, and the dust is recovered through the dust collection device, and finally the two baffles 122 are closed.

[0035] The dust on the filter screen 5 is cleaned by the cleaning device 12, thereby improving the air purification effect and reducing the manual cleaning work.

[0036] The cleaning device 2 13 includes a fixed plate 2 131 fixedly connected to the purification pipeline 1 and a fixed frame 132 slidably connected to the purification pipeline 1, and a circular groove 133 and a circular groove 2 134 are respectively provided on the fixed plate 2 131 and the fixed frame 132. Both ends of the non-woven filter bag 6 are respectively fixedly connected to the fixed plate 2 131 and the fixed frame 132 and are located in the circular groove 133 and the circular groove 2 134. A fixed rod 135 is fixedly connected to one side of the fixed plate 2 131, and one end of the fixed rod 135 passes through the fixed frame 132 and a stopper 136 is fixedly connected to the other end of the fixed rod 135. A spring 137 is sleeved on the outside of the fixed rod 135 and located between the fixed plate 2 131 and the fixed frame 132. The cleaning device 2 13 also includes a square groove 138 opened above the purification pipeline 1, and an inclined conveyor belt 139 and a motor 5 1310 for driving the conveyor belt 139 are installed in the square groove 138. A plurality of push plates 1311 are fixedly connected to the conveyor belt 139.

[0037] like Fig.11 As shown, during the operation of the cleaning device 2 13, the motor 5 1310 is started to drive the conveyor belt 139 to transmit, so that the push plate 1311 on the conveyor belt 139 pushes the fixed frame 132 to make it close to the fixed plate 2 131 and compress the spring 137. Since the conveyor belt 139 is tilted, when the push plate 1311 moves a certain distance and separates from the fixed frame 132, the fixed frame 132 that loses the thrust is immediately reset under the push of the elastic force of the spring 137, thereby driving the non-woven filter bag 6 to first shrink and then immediately straighten through the fixed frame 132, thereby bouncing the dust adhered to the non-woven filter bag 6 and separating from the non-woven filter bag 6; the reset fixed frame 132 is pushed by the next push plate 1311, and the above process is repeated to further bounce the dust in the non-woven filter bag 6; at the same time, the bounced dust is blown to the cleaning device 1 12 by the fan 10, and is recovered through the dust collection device at the fixed frame 121 on one side.

[0038] The non-woven filter bag 6 has a high purification effect in the purification air-conditioning equipment, but the cleaning process is difficult. The non-woven filter bag 6 can be cleaned by the cleaning device 13 to improve the self-purification effect of the air-conditioning equipment.

[0039] The embodiments of the present invention are provided for the purpose of illustration and description. Although the embodiments of the present invention have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limitations of the present invention. Ordinary technicians in this field can change, modify, replace and modify the above embodiments within the scope of the present invention.

Claims

1. A self-purifying air conditioning device for a wafer film thickness testing laboratory, comprising: A purification pipeline (1) and a base (2) arranged vertically in sequence, characterized in that: air inlets (3) and air outlets (4) are respectively arranged at both ends of the purification pipeline (1), a filter screen (5), a non-woven fabric filter bag (6), a condenser (7), a first activated carbon filter plate (8), an electric heater (9) and a fan (10) are sequentially installed in the purification pipeline (1), an installation groove (21) is formed between the bottom of the purification pipeline (1) and the base (2), and a material replacement module (11) is arranged in the base (2), cleaning devices one (12) are arranged on both sides of the outer wall of the purification pipeline (1), the cleaning devices one (12) are located between the air inlet (3) and the filter screen (5), and a cleaning device two (13) is arranged in the purification pipeline (1) at the position of the non-woven fabric filter bag (6); The material replacement module (11) replaces the first activated carbon filter plate (8) in the purification pipeline (1) through the installation groove (21).

2. The self-purifying air conditioning equipment for wafer film thickness testing laboratory according to claim 1, characterized in that: A sealing door (22) is arranged on one side of the base (2).

3. The self-purifying air conditioning equipment for wafer film thickness testing laboratory according to claim 1, characterized in that: The material replacement module (11) includes a first lead screw (111), a first motor (112) and an electric push rod (113), the two ends of the first lead screw (111) are respectively rotatably connected to the top and the bottom of the base (2), the first motor (112) and the electric push rod (113) are installed in the base (2), the first motor (112) drives the first lead screw (111) to rotate through a gear, a pressing block (114) is threadedly connected to the first lead screw (111), and the pressing block (114) is slidably connected to the inner wall of the base (2), the pressing block (114) and the installation groove (21) are in the same plane, and the output end of the electric push rod (113) is fixedly connected with a limiting plate (115).

4. The self-purifying air conditioning equipment for wafer film thickness testing laboratory according to claim 3, characterized in that: The limiting plate (115) is clamped with a plurality of first sealing plates (116) through a plurality of protrusions, the plurality of first sealing plates (116) are located on the side of the base (2) away from the air outlet (4), the upper edge of the first sealing plate (116) is attached to the top of the base (2), the first sealing plate (116) is in a U shape, a second sealing plate (117) is slidably connected in the first sealing plate (116), the second sealing plate (117) is in an L shape, a second activated carbon filter plate (118) is stored between the first sealing plate (116) and the second sealing plate (117), one second sealing plate (117) close to the installation groove (21) is in the same plane as the installation groove (21), and the width of the second sealing plate (117) is the same as the width of the installation groove (21).

5. The self-purifying air conditioning equipment for wafer film thickness testing laboratory according to claim 1, characterized in that: The cleaning device one (12) includes two fixed frames (121) fixedly connected to both sides of the purification pipeline (1), the fixed frames (121) are communicated with the purification pipeline (1), baffles (122) are rotatably connected to the inner sides of both ends of the fixed frames (121) with openings, a second motor (123) for driving the baffles (122) to rotate is installed on the fixed frames (121), a first fixing plate (124) is fixedly connected to the baffle (122) close to the inside of the purification pipeline (1), and the first fixing plate (124) is located inside the fixed frame (121).

6. The self-purifying air conditioning equipment for wafer film thickness testing laboratory according to claim 5, characterized in that: One side of the fixing plate 1 (124) is rotatably connected to a connecting rod 1 (128) and a connecting rod 2 (129); one end of the connecting rod 1 (128) is connected to a synchronous wheel (125); the synchronous wheels (125) are located on the other side of the fixing plate 1 (124) and are provided in plurality; a synchronous belt (126) is installed on the plurality of synchronous wheels (125); a motor 3 (127) is installed on the fixing plate 1 (124) for driving one of the synchronous wheels (125) to rotate; a connecting rod 3 (1210) is connected between the connecting rod 1 (128) and the connecting rod 2 (129); one end of the connecting rod 3 (1210) is rotatably connected to the other end of the connecting rod 1 (128), and the other end is rotatably connected to the middle of the connecting rod 2 (129); the connecting rod 2 (129) is provided with a plurality of synchronous belts (126); a motor 3 (127) is installed on the fixing plate 1 (124) for driving one of the synchronous wheels (125) to rotate; A slide rod (1211) is slidably connected to the connecting rod 129, and the slide rod (1211) extends to the outside of the second connecting rod (129). A limiting block (1212) is fixedly connected to the fixing plate 1 (124), and an arc groove (1218) is provided on the limiting block (1212), and the top and bottom ends of the arc groove (1218) are close to the brush 1215. The limiting block (1212) is located on one side of the second connecting rod (129), and one end of the slide rod (1211) located in the second connecting rod (129) is fixedly connected to the limiting column (1213), and an empty groove (1219) is provided on one side of the second connecting rod (129), and the limiting column (1213) passes through the empty groove (1219) and is located in the arc groove (1218).

7. The self-purifying air conditioning equipment for wafer film thickness testing laboratory according to claim 6, characterized in that: One end of the connecting rod three (1210) located outside the connecting rod two (129) is fixedly connected to an automatic telescopic rod (1214), and a brush two (1215) is rotatably connected between the two ends of the automatic telescopic rod (1214). A motor four (1216) for driving the brush two (1215) to rotate is installed at one end of the automatic telescopic rod (1214), and a plurality of fans (1217) are installed in a fixed frame (121) in one of the cleaning devices one (12), and the fans (1217) are located between the brush two (1215) and a baffle (122) away from the purification pipe (1).

8. The self-purifying air conditioning equipment for wafer film thickness testing laboratory according to claim 7, characterized in that: The cleaning device (13) comprises a second fixing plate (131) fixedly connected to the purification pipe (1) and a fixing frame (132) slidably connected to the purification pipe (1), wherein the second fixing plate (131) and the fixing frame (132) are respectively provided with a first circular groove (133) and a second circular groove (134), and the two ends of the non-woven filter bag (6) are respectively fixedly connected to the second fixing plate (131) and the fixing frame (132) and are located in the first circular groove (133) and the second circular groove (134), and a fixing rod (135) is fixedly connected to one side of the second fixing plate (131), and the fixing rod (135) is fixedly connected to the fixing plate (131). One end of the fixed rod (135) passes through the fixed frame (132) and the other end is fixedly connected to a stopper (136). A spring (137) is sleeved on the outside of the fixed rod (135) and located between the second fixed plate (131) and the fixed frame (132). The second cleaning device (13) also includes a square groove (138) opened above the purification pipeline (1). An inclined conveyor belt (139) and a motor (1310) for driving the conveyor belt (139) are installed in the square groove (138). A plurality of push plates (1311) are fixedly connected to the conveyor belt (139).

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