Optical system pollution source positioning method and device, electronic equipment and medium

Abstract

The invention relates to the technical field of optical system control, provides an optical system debugging method, and particularly relates to an optical system pollution source positioning method and device, electronic equipment and a medium. According to the embodiment of the invention, the method comprises the steps: collecting images in different position states, and determining an optical device with a pollution source based on the change of the position features of key points in the images; the method can be suitable for pollution source checking of all optical imaging systems with optical elements, lighting elements and imaging elements, and has high universality. According to the method, a standard positioning process can be set, smudginess checking steps can be given from shallow to deep and from easy to difficult, the most direct smudginess source can be quickly positioned, and the unobvious smudginess source can be deeply checked.

Description

Technical Field

[0001] The present invention relates to the technical field of optical system control, and is an optical system debugging method, in particular to an optical system pollution source positioning method, device, electronic equipment and medium. Background Art

[0002] In the field of industrial imaging, the dirtiness of the imaging system is unacceptable, especially in the field of high-precision measurement. Since the defect locations are random and the size is extremely small, in order to ensure the detection rate, the original image cannot be corrected by the algorithm to remove the dirtiness of the image caused by the dirt inside the imaging system. Therefore, before the overall delivery of the imaging system, it is necessary to check the internal imaging components, such as the camera, tube lens, objective lens, lens, prism, etc., for dirtiness. Summary of the invention

[0003] In order to achieve the above technical effects, the embodiments of the present application provide a method, device, electronic device and medium for locating pollution sources in an optical system, so as to clarify the debugging standards for the optical system, quickly locate direct pollution sources, and thoroughly investigate inconspicuous pollution sources.

[0004] In order to achieve the above purpose, the technical solution adopted in the embodiment of the present application is as follows: In a first aspect, a method for locating a pollution source of an optical system is provided, the method comprising: sequentially acquiring a first image and a second image in two different states under the same light source condition, determining the grayscale mutation point position features of the two images, and determining the subsystem where the pollution is generated based on the deviation of the grayscale mutation point position features; the first image and the second image are images of the same calibration plate at different positions; the subsystem comprises a calibration plate and an optical subsystem; when the subsystem where the pollution is generated is an optical subsystem, acquiring multiple groups of images of different optical sub-components in different states, each group of images comprising two images of the corresponding optical sub-component in at least two states; determining the grayscale mutation point position features of at least two images in each group of images, and determining whether the optical sub-component is a pollution source based on the deviation of the grayscale mutation point position features; the optical sub-component comprises at least a camera target surface component, a light source exit surface component, and an optical conjugate surface component.

[0005] In some embodiments, the light source condition is a bright field lighting condition.

[0006] In some specific embodiments, sequentially acquiring the first image and the second image in two different states includes: keeping the focal plane of the two acquisitions unchanged, and translating the position of the calibration plate relative to the optical subsystem for acquisition during the second acquisition.

[0007] In some specific embodiments, the subsystem for determining the source of contamination based on the deviation of the grayscale mutation point position feature includes: determining a first position of the grayscale mutation point in the first image, and determining a second position of the grayscale mutation point in the second image; when the first position and the second position are the same, determining that the contamination is generated by the optical subsystem, and when the second position and the second position are different, determining that the contamination is generated by the calibration plate.

[0008] In some specific embodiments, the state change of the different optical sub-components is a position change of any optical sub-component relative to other optical sub-components.

[0009] In some specific embodiments, determining whether this optical sub-device is a pollution source based on the deviation of the grayscale mutation point position feature includes: comparing whether the positions of the grayscale mutation points in at least two images before and after the state change are the same, and when the positions are different, determining that the pollution is generated by this optical sub-device.

[0010] In some specific embodiments, the method also includes driving the object to move based on the target defocus interval, and acquiring multiple defocused images, determining whether there is a diffuse spot in the defocused image, and acquiring the focus position and center position of the diffuse spot in each defocused image; determining whether the focus position in the current defocused image is consistent with the center position of the previous defocused image, and if they are consistent, determining that the diffuse spot originates from a functional component adjacent to the optical conjugate surface device.

[0011] In some specific embodiments, the method further includes adjusting the relative position relationship of any of the functional components, determining whether the imaging position of the diffuse spot changes during the adjustment process, and determining whether contamination is generated in the corresponding functional component based on the change.

[0012] In a second aspect, a device for locating pollution sources of an optical system is provided, the device comprising: a first pollution source determination module, used to determine the subsystem where the pollution is generated; and a second pollution source determination module, used to determine the optical sub-device corresponding to the pollution source.

[0013] In some specific implementations, the device further includes: a third pollution source determination module, configured to determine whether the functional component is polluted.

[0014] According to a third aspect, an electronic device is provided, comprising a processor and a memory, wherein the memory stores machine executable instructions that can be executed by the processor, and the processor executes the machine executable instructions to implement any of the above methods for locating a pollution source in an optical system.

[0015] In a fourth aspect, a machine-readable storage medium is provided, wherein the machine-readable storage medium stores machine-executable instructions, and when the machine-executable instructions are called and executed by a processor, the machine-executable instructions prompt the processor to implement any of the above-mentioned methods for locating pollution sources in an optical system.

[0016] As can be seen from the above, the above embodiments of the present invention can achieve one or more of the following beneficial effects: the embodiments provided by the present invention collect images in different position states, and determine the optical device with the pollution source based on the changes in the key point position characteristics in the image; the present invention can be applied to the pollution source investigation of all optical imaging systems with optical elements, lighting elements and imaging elements, and has strong versatility. In addition, the method can set a standard positioning process, and can provide the steps for investigating the dirt from the shallow to the deep and from the easy to the difficult. It can quickly locate the most direct source of dirt, and can also deeply investigate the source of dirt that is not obvious. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0018] The methods, systems and / or programs in the accompanying drawings will be further described according to exemplary embodiments. These exemplary embodiments will be described in detail with reference to the drawings. These exemplary embodiments are non-limiting exemplary embodiments, wherein example numbers represent similar mechanisms in the various views of the accompanying drawings.

[0019] Figure 1 It is a schematic flow chart of the method for locating pollution sources in an optical system provided in Example 1 of the present application.

[0020] Figure 2 This is a schematic diagram of the first state of surface dirtiness in an embodiment of the present application.

[0021] Figure 3 This is a schematic diagram of the second state of surface dirtiness in an embodiment of the present application.

[0022] Figure 4 It is a schematic diagram of the typical optical subsystem structure in the embodiment of the present application.

[0023] Figure 5 Schematic diagram of diffuse spots in an embodiment of the present application.

[0024] Figure 6 It is a flow chart of the method for locating pollution sources in an optical system provided in the second embodiment of the present application.

[0025] Figure 7 It is another structural schematic diagram of a typical optical subsystem in an embodiment of the present application.

[0026] Figure 8 It is a schematic diagram of the structure of the optical system pollution source positioning device in an embodiment of the present application.

[0027] Fig. 9 It is a schematic diagram of the structure of an electronic device in an embodiment of the present application.

[0028] Fig.10 It is a schematic diagram of the storage medium structure in an embodiment of the present application. DETAILED DESCRIPTION

[0029] In order to better understand the above technical scheme, the technical scheme of the present application is described in detail below through the accompanying drawings and specific embodiments. It should be understood that the embodiments of the present application and the specific features in the embodiments are detailed descriptions of the technical scheme of the present application, rather than limitations on the technical scheme of the present application. In the absence of conflict, the embodiments of the present application and the technical features in the embodiments can be combined with each other.

[0030] In the following detailed description, numerous specific details are set forth by way of example in order to provide a comprehensive understanding of the relevant guidance. However, it will be apparent to those skilled in the art that the present application may be practiced without these details. In other cases, well-known methods, procedures, systems, compositions and / or circuits have been described at a relatively high level, without detail, in order to avoid unnecessarily obscuring aspects of the present application.

[0031] Flowcharts are used in the present application to illustrate the execution process performed by the system according to the embodiment of the present application. It should be clearly understood that the execution process of the flowchart may not be performed in order. On the contrary, these execution processes may be performed in reverse order or simultaneously. In addition, at least one other execution process may be added to the flowchart. One or more execution processes may be deleted from the flowchart.

[0032] Before further describing the embodiments of the present invention in detail, the nouns and terms involved in the embodiments of the present invention are described. The nouns and terms involved in the embodiments of the present invention are subject to the following interpretations.

[0033] (1) In response to, it is used to indicate the conditions or states on which the executed operation depends. When the dependent conditions or states are met, one or more operations executed may be in real time or with a set delay. Unless otherwise specified, there is no restriction on the order in which the multiple operations executed are executed.

[0034] (2) Based on: used to indicate the conditions or states on which the executed operations depend. When the dependent conditions or states are met, one or more operations executed may be in real time or with a set delay. Unless otherwise specified, there is no restriction on the order in which the multiple operations executed are executed.

[0035] The embodiment of the present invention provides a method for locating pollution sources for an optical system, and the optical system is mainly used in optical imaging scenarios, and is mainly used in optical imaging systems in industrial visual inspection scenarios. Among them, the industrial visual inspection scenario in this embodiment is specifically the field of semiconductor quantity inspection, including but not limited to wafer-level high-precision optical inspection, substrate lead frame optical inspection, packaged chip optical inspection and other semiconductor front-end and back-end products and process.

[0036] Wherein, for the present embodiment, "wafer" generally refers to a substrate formed of semiconductor or non-semiconductor materials. Examples include (but are not limited to) single crystal silicon, gallium arsenide, gallium nitride, and indium phosphide. Such substrates are typically found and / or processed in semiconductor manufacturing facilities. In some cases, a wafer may include only a substrate (i.e., a bare die). Alternatively, a wafer may include one or more layers of different materials formed on a substrate. One or more layers formed on a wafer may be "patterned" or "unpatterned". For example, a wafer may include multiple dies with repeatable pattern features.

[0037] The present application provides a method for locating a pollution source of an optical system, the method comprising: Under the same light source condition, sequentially acquire a first image and a second image in two different states, determine the grayscale mutation point position features of the two images, and determine the subsystem where the pollution is generated based on the deviation of the grayscale mutation point position features; When the subsystem where the pollution is generated is an optical subsystem, multiple groups of images of different optical sub-components under state changes are obtained, and each group of images includes two images of the corresponding optical sub-component in at least two states; the grayscale mutation point position characteristics of at least two images in each group of images are determined, and based on the deviation of the grayscale mutation point position characteristics, it is determined whether this optical sub-component is a pollution source.

[0038] Among them, in this embodiment, for the light source condition of bright field lighting, the image acquisition is based on the industrial camera focusing on a pattern-free calibration plate, and the imaging grayscale of the image is controlled between 100-200 by adjusting the brightness of the light source or adjusting the exposure time of the industrial camera, and the bright field image is statically acquired.

[0039] Specifically, for industrial cameras including any one of area array cameras, line array cameras and line array TDI cameras, different image acquisition methods are used for different industrial cameras. Specifically, when the industrial camera is an area array camera, it acquires an image of the full field of view; when the industrial camera is a line array camera, it acquires a single line of images; when the industrial camera is a line array TDI camera, the area array mode of the camera is turned on.

[0040] Among them, the grayscale mutation point is the characteristic of the pollutant on the image, and the grayscale mutation point is used to determine whether there is pollution. In addition, by adjusting the position of the device in the optical system, it is determined whether the grayscale mutation point has a corresponding position change during the position adjustment process, thereby determining whether the pollutant exists on the device.

[0041] Since there are many types of devices in the optical system, this embodiment respectively illustrates how to locate pollution sources for different types of devices through Embodiment 1 and Embodiment 2.

[0042] It is worth noting that the division of multiple embodiments in the present invention is only for the convenience of description and should not constitute a special limitation. The features in various embodiments can be combined and referenced to each other without contradiction.

[0043] Embodiment 1 See also Figure 1 According to this embodiment, a method for locating a pollution source of an optical system is provided, and the method comprises the following steps: Step S11. Under the same light source condition, sequentially acquire a first image and a second image in two different states, determine the grayscale mutation point position features of the two images, and determine the subsystem where the pollution occurs based on the deviation of the grayscale mutation point position features.

[0044] In this embodiment, for the same light source condition as described above, which is a bright field lighting condition, any of the above methods can be used for image acquisition. Of course, in other embodiments, any image acquisition method in the prior art can also be used, which is not the core technical solution in this embodiment and will not be described in detail in this embodiment.

[0045] In this embodiment, the first image and the second image are images collected from the same calibration plate at different positions. The calibration plate is mainly used to provide a specific object of the image, and is a non-patterned calibration plate. The calibration plate is used as a standard for the optical debugging solution, and in other embodiments, it can also be a background plate or a reference object.

[0046] However, since the calibration plate is introduced to realize the acquisition of the target image, the pollution mark carried by the calibration plate itself may lead to inaccurate judgment of the pollution source of the optical system. Therefore, in this embodiment, the first step of locating the pollution source of the optical system is to determine whether the pollution comes from the calibration plate.

[0047] Because the pollutants in this embodiment include pollutants visible to the naked eye and pollutants that are so tiny that they are difficult to identify with the naked eye, it is necessary to determine whether there are pollutants on the calibration plate through an image processing method.

[0048] Specifically, this process collects images of the calibration plate at two different positions, namely the first image and the second image, performs grayscale processing on the first image and the second image, identifies the grayscale mutation points on the grayscale image, and calculates the coordinates of the corresponding grayscale mutation points, namely the grayscale mutation point position features, to determine whether the grayscale mutation point position features on the two images have deviations. That is, it is determined whether the coordinates of the two grayscale mutation points are different. When the grayscale mutation point position features on the two images do not have deviations, it means that the pollutant will not change due to the movement of the calibration plate, which means that the pollutant does not exist on the calibration plate; when the grayscale mutation point position features on the two images have deviations, it means that the pollutant moves due to the movement of the calibration plate, which means that the pollutant exists on the calibration plate. For the expression of the deviation of the grayscale mutation point position features, please refer to Figure 2 and Figure 3 ,in Figure 2 is a schematic diagram of the pollutant in the first state. Figure 3 is a schematic diagram of the pollutant in the second state, through Figure 2 and Figure 3 It can be seen that the position characteristics of the grayscale mutation points of the pollutants in the two images have deviations.

[0049] The calculation of the grayscale mutation point in this embodiment is implemented based on image processing software in the prior art, including but not limited to matlab, imageJ, halcon (auto_threshold), and this process will not be described in detail in this embodiment.

[0050] It is worth noting that when the first image and the second image are captured, the conditions for image capture are the same, that is, the focal planes of the two captures are kept unchanged, that is, whether the contaminant exists on the calibration plate is determined by moving the calibration plate.

[0051] Through the above process, it can be determined whether contaminants exist on the calibration plate. If contaminants exist on the calibration plate, it is necessary to replace the calibration plate with a clean one or clean the calibration plate with contaminants to ensure that the calibration plate is clean.

[0052] After cleaning, the calibration plate needs to be rechecked to ensure that there are no contaminants on the calibration plate. The rechecking process is also carried out using the above process, which will not be described in detail.

[0053] Step S12. When the subsystem where the pollution is generated is an optical subsystem, multiple groups of images of different optical sub-components under state changes are obtained; the grayscale mutation point position characteristics of at least two images in each group of images are determined, and based on the deviation of the grayscale mutation point position characteristics, it is determined whether this optical sub-component is a pollution source.

[0054] In step S11 , if the grayscale mutation point position feature does not change correspondingly due to the movement of the calibration plate, it means that the object covered by the contaminant is not the calibration plate, but the optical subsystem.

[0055] The optical subsystem in this embodiment is classified according to optical functionality and includes any one of a camera target surface device, a light source exit surface device and an optical conjugate surface device.

[0056] See also Figure 4 , providing a typical optical subsystem structure diagram. Figure 4 It can be seen that the optical subsystem is provided with a light source 41, a light collecting lens 42, an auxiliary lens 43, an aperture stop 44, a condenser lens 45, an object plane 46, and an objective lens 47 in sequence according to the light propagation path. Among them, the light source surface, the auxiliary lens, and the object plane are conjugate, that is, if the light source surface or the auxiliary lens surface is dirty, it may be imaged on the object plane, and thus on the camera plane.

[0057] It is worth noting that the typical optical subsystem in this embodiment does not only include the optical path structure defined in this embodiment. This diagram is only used as a summary and illustration, and also includes devices that form optical target surfaces, devices that form exit surfaces, and devices that form conjugate surfaces in other optical path structures in other scenes. In other embodiments, the optical path structure is different from that in this embodiment, but as long as there are camera target surface devices, light source exit surface devices, and optical conjugate surface devices, even if the optical path structure is different, it also falls within the protection scope of this embodiment.

[0058] The method for locating the pollution source of the above optical device determines the optical sub-device to be inspected, and then collects images of a clean calibration plate of the device in two different states to form a set of images. The two different states are two different position states of the optical sub-device, including position change modes such as movement and rotation. If the optical sub-device is a separate optical device, only the state of the separate optical device needs to be changed; if the optical sub-device is a combination device, each device in the combination device needs to be independently changed. For example, the combination device includes three lenses. In each state change, the states of two lenses are kept unchanged, and only the state of one lens is changed.

[0059] The two collected images are grayed and identified to see if there are gray mutation points in the gray images. If there are gray mutation points, the position features of the gray mutation points in the two images, i.e., the position coordinates of the two gray mutation points, are determined to be the same. If the position coordinates of the gray mutation points in the two images are the same, it means that the pollution source is not on the corresponding optical sub-device; if the position coordinates of the gray mutation points in the two images are different, it means that the pollution source is on the optical sub-device corresponding to the state change.

[0060] Specifically, the pollution source locations of up to three optical devices of the optical subsystem are described below.

[0061] The dirt on the camera target surface is the most direct factor leading to dirty imaging. The location of the pollution source of the camera target surface device includes the following steps: controlling the light source environment to bright field lighting, controlling the industrial camera to focus on a calibration plate without a pattern, wherein this calibration plate is a clean calibration plate, and there is no pollution source on this calibration plate. By adjusting the light source brightness or the camera exposure time, the image grayscale is controlled between 100-200, and the first bright field image is collected statically. Then, all components of the imaging system are kept stationary, and the camera is rotated alone to change the state of the camera, and the image is collected based on the same light source environment and imaging environment to obtain the second bright field image.

[0062] For the first bright field image and the second bright field image, the image processing method in the prior art is used to obtain the position coordinates of the high-order grayscale mutation points in the image based on the existing tools. The position coordinate difference between the first bright field image and the second bright field image is compared. If there is no difference, it means that the pollution source is not on the camera target surface. If there is a difference, it means that the pollution source is on the camera target surface.

[0063] It is worth noting that different types of cameras may have windows or different types of coatings on the target surface or sensor surface depending on the application scenario. The types of dirt can be dust, particles, water stains, etc. In addition to special instructions given by the official camera, the general cleaning method is to use a dedicated camera cleaning tool, which includes a blow nozzle, a cleaning brush and a cleaning solution. The steps are as follows: Turn on the camera cleaning mode, invert the camera and expose the sensor, aim the blow nozzle at the sensor and blow from bottom to top to blow away the dust attached to the sensor. Then pour a drop of detergent on the cleaning brush to moisten it, suspend the cleaning brush in the air for 10 seconds, extend the cleaning brush into the fuselage, stick one side of the cleaning brush to the sensor side, press the cleaning brush gently, brush slowly from one side to the other, flip the cleaning brush and brush it back to the starting position.

[0064] For the light source exit surface device, due to the structural reasons of critical illumination, the light source is imaged directly on the object plane after passing through the condenser, so the dirt on the light source surface may be imaged. The method for locating the pollution source can adopt the same process as the method for locating the pollution source of the camera target surface device, that is, collecting the first bright field image and the second bright field image of the light source exit surface device in two states, and determining whether the positions of the two high-order grayscale mutation points in the first bright field image and the second bright field image have deviations. If there is a deviation, it means that the pollution source is on the light source exit surface. If there is no deviation, it means that the pollution source is not on the light source exit surface. Similarly, the state change of the light source exit surface device in this embodiment refers to the position state change.

[0065] For optical conjugate surface devices, in the optical system, the position, direction and wavefront of light will change after refraction, reflection, transmission and other processes, but some properties between the incident light and the outgoing light remain unchanged. This is the basic principle of conjugation. Therefore, in the object plane, that is, the focusing plane, in addition to the camera target plane being a conjugate plane, there will be one or more other conjugate planes in a complex optical system. If there are optical components at these conjugate planes, dirt on their surfaces may also form images. Please continue to read Figure 4 In this optical path structure, the light source surface, the auxiliary lens and the object plane are conjugate. If the light source surface or the auxiliary lens surface is dirty, it may be imaged on the object plane, and thus on the camera plane.

[0066] The above-mentioned positioning method is also used to locate the pollution source of the optical conjugate surface device. Specifically, the first bright field image and the second bright field image in two different states are collected and it is determined whether the positions of the two high-order grayscale mutation points in the first bright field image and the second bright field image have deviations. If there is a deviation, it means that the pollution source is on the surface of the conjugate component. If there is no deviation, it means that the pollution source is not on the surface of the conjugate component. Similarly, the state change on the surface of the conjugate component in this embodiment refers to the position state change. However, it is worth noting that the conjugate component includes multiple optical devices in the actual scene, so for the pollution source positioning of the conjugate component, it is necessary to adjust the state change of each optical device separately, and determine whether the surface of the optical device has a pollution source based on the position of the grayscale mutation point in the image after the state change, and each adjustment is an independent adjustment, so as to accurately determine that the pollution source is generated on the specific optical device surface.

[0067] This step is used to determine whether there is a pollution source in the optical subsystem, and to specifically locate and identify the pollution source.

[0068] Embodiment 2 Please continue reading Figure 4 The optical system structure shown in the figure has, in addition to the basic camera target surface device, light source exit surface device and optical conjugate surface device, a functional optical device, such as a diffuser, is also arranged adjacent to the conjugate surface device in some systems.

[0069] If there is contamination on the surface of the optical device, the dirt on the surface will be out of focus and imaged on the object surface because it is very close to the conjugate plane. If the dirt is large, it will form a diffuse dirt spot and produce a diffuse image on the image plane. For a diagram of this diffuse image, please refer to 5.

[0070] In view of the above situation, in order to further realize the location of the pollution source of the optical system, a method for locating the pollution source of the optical system is also proposed in this embodiment. Figure 6 , including the following steps: Step S11. Under the same light source condition, sequentially acquire a first image and a second image in two different states, determine the grayscale mutation point position features of the two images, and determine the subsystem where the pollution occurs based on the deviation of the grayscale mutation point position features.

[0071] Step S12. When the subsystem where the pollution is generated is an optical subsystem, multiple groups of images of different optical sub-components under state changes are obtained; the grayscale mutation point position characteristics of at least two images in each group of images are determined, and based on the deviation of the grayscale mutation point position characteristics, it is determined whether this optical sub-component is a pollution source.

[0072] Step S11 to step S12 in this embodiment are the same as those in the first embodiment, and will not be further described in this process.

[0073] Step S13. Drive the object to move based on the target defocus interval, and obtain multiple defocus images, determine whether there is a diffuse spot in the defocus image, and obtain the focus position and center position of the diffuse spot in each defocus image; determine whether the focus position in the current defocus image is consistent with the center position of the previous defocus image, and if they are consistent, determine that the diffuse spot comes from the functional component adjacent to the optical conjugate surface device.

[0074] In this embodiment, for the calibration plate placed on the object plane as the moving object, the target defocus interval is actually the moving distance, and this interval distance is 0.5 mm, that is, the calibration plate placed on the object plane is moved with a displacement of 0.5 mm within one moving cycle, and image acquisition is performed based on the movement to obtain multiple defocused images.

[0075] See also Figure 7 , the light source plane, the auxiliary lens plane and the object plane form a conjugate relationship, then the above three planes are conjugate planes, and a functional component 48 is arranged near the conjugate plane, and the conjugate plane of the functional component is the right position 49 of the object plane. Assuming that there is a pollution source on the functional component, if the object plane is moved to the right position 49 to form a conjugate plane with the functional component, the pollution source will be focused in the image.

[0076] Therefore, according to this technical principle, in the embodiment of the present application, the pollution source positioning of the functional components arranged on the conjugate surface components, that is, near the conjugate surface is achieved by establishing a defocus plane.

[0077] Specifically, for the moving object, that is, the calibration plate set at the object plane, the moving cycle is set to 10 cycles in this embodiment, that is, ten moves are performed according to the target defocus interval, and the movement is stopped when it moves to ±5mm. During the movement process, ten image acquisitions are also performed to obtain ten defocused images.

[0078] For the acquired defocused image, it is necessary to determine whether there is a diffuse spot in the image and the focus position and center position of the diffuse spot. In order to determine whether the diffuse spot originates from the functional component adjacent to the optical conjugate surface device, it is necessary to determine whether the focus position in the current defocused image is consistent with the center position of the previous defocused image. If the above two positions are the same, it means that the generation of the diffuse spot originates from the functional component close to the optical conjugate surface device.

[0079] In order to further determine that the specific lens in the functional components is the pollution source lens, it is also necessary to adjust the relative position relationship of any of the above functional components on the basis of the above confirmation, determine whether the imaging position of the diffuse spot changes during the adjustment process, and determine whether the pollution is generated in the corresponding functional component based on the change.

[0080] In this embodiment, the relative position relationship change is a circumferential change on the image, and the means to achieve the circumferential change is to rotate the corresponding functional components. For example, assuming that the functional components adjacent to the optical conjugate surface device include an objective lens, a lens barrel or other lenses, after rotating the objective lens, the lens barrel or other lenses, the diffuse spot moves with it, and the surface contamination source comes from the corresponding functional component; if no movement phenomenon occurs, it means that the contamination source does not come from the corresponding functional component.

[0081] In this embodiment, in order to further limit the positional relationship between the functional components and the conjugate surface optical components, a limited distance is introduced. This limited distance is set based on the conjugate surface, that is, the components within the limited distance of the conjugate surface are collectively referred to as functional components.

[0082] Specifically, in this embodiment, the limited distance is 5 mm, that is, the optical elements arranged within 5 mm of the conjugate plane are all functional components, and these functional components are the objects to be positioned in this step. Of course, the setting of the limited distance is based on the classical optical path of this embodiment. In other embodiments, especially for complex optical path structures, the limited distance can also be other distance ranges, which will not be repeated in this embodiment.

[0083] This embodiment is based on the method for locating the pollution source of the optical system provided by the first and second embodiments, and can be applied to the pollution source investigation of all optical imaging systems with optical elements, lighting elements and imaging elements, and has strong versatility. In addition, this method can set a standard positioning process, and can provide the steps for investigating the pollution from the shallow to the deep and from the easy to the difficult, so that the most direct pollution source can be quickly located, and the less obvious pollution source can be investigated in depth.

[0084] See also Figure 8 The embodiment of the present invention provides a pollution source positioning device 800, which is used to execute the pollution source positioning methods of the above-mentioned embodiment 1 and embodiment 2, and the pollution source positioning method of embodiment 2 is preferentially executed. The device includes: The first pollution source determination module 810 executes the method of step S11 to determine the subsystem where the pollution is generated; The second pollution source determination module 820 executes the method of step S12 to determine the optical sub-component corresponding to the pollution source; The third pollution source determination module 830 executes the method of step S13 to determine whether the functional component is polluted.

[0085] The embodiment of the present invention further provides an electronic device, see Fig. 9 As shown, the electronic device includes a processor 910 and a memory 911, wherein the memory 911 stores machine executable instructions that can be executed by the processor 910, and the processor 910 executes the machine executable instructions to implement the above-mentioned camera debugging method or imaging device debugging method.

[0086] Further, Fig. 9 The electronic device shown also includes a bus 912 and a communication interface 913 , and the processor 910 , the communication interface 913 and the memory 911 are connected via the bus 912 .

[0087] The memory 911 may include a high-speed random access memory (RAM), and may also include a non-volatile memory, such as at least one disk storage. The communication connection between the system network element and at least one other network element is realized through at least one communication interface 913 (which may be wired or wireless), and the Internet, wide area network, local area network, metropolitan area network, etc. may be used. The bus 912 may be an ISA bus, a PCI bus, or an EISA bus, etc. The bus may be divided into an address bus, a data bus, a control bus, etc. For ease of representation, Fig. 9 Only one bidirectional arrow is used in the diagram, but this does not mean that there is only one bus or only one type of bus.

[0088] The processor 910 may be an integrated circuit chip with signal processing capabilities. In the implementation process, each step of the above method can be completed by the hardware integrated logic circuit or software instructions in the processor 910. The above processor 910 can be a general-purpose processor, including a central processing unit (CPU), a network processor (NP), etc.; it can also be a digital signal processor (DSP), an application-specific integrated circuit (ASIC), a field-programmable gate array (FPGA) or other programmable logic devices, discrete gates or transistor logic devices, discrete hardware components. The methods, steps and logic block diagrams disclosed in the embodiments of the present invention can be implemented or executed. The general-purpose processor can be a microprocessor or the processor can also be any conventional processor, etc. The steps of the method disclosed in conjunction with the embodiments of the present invention can be directly embodied as a hardware decoding processor for execution, or a combination of hardware and software modules in the decoding processor for execution. The software module may be located in a storage medium mature in the art, such as a random access memory, a flash memory, a read-only memory, a programmable read-only memory, or an electrically erasable programmable memory, a register, etc. The storage medium is located in the memory 911, and the processor 910 reads the information in the memory 911 and completes the steps of the method of the above embodiment in combination with its hardware.

[0089] See also Fig.10 An embodiment of the present invention provides a readable medium 10, which stores computer-readable instructions 101. The computer-readable instructions 101 include instructions for executing any one of the calibration methods in the first embodiment, the second embodiment, or the third embodiment.

[0090] The functions and technical effects of the readable medium 10 provided in the embodiment of the present invention may refer to the technical effects of the calibration method in the first embodiment, the second embodiment or the third embodiment, and will not be described in detail here.

[0091] It should be noted that in the several embodiments provided in the present application, it should be understood that the disclosed systems, devices and / or methods can be implemented in other ways. For example, the device embodiments described above are merely schematic. For example, the division of the units / modules is only a logical function division. There may be other division methods in actual implementation, such as multiple units or modules can be combined or integrated into another system, or some features can be ignored or not executed. Another point is that the mutual coupling or direct coupling or communication connection shown or discussed can be an indirect coupling or communication connection through some interfaces, devices or units, which can be electrical, mechanical or other forms.

[0092] The units / modules described as separate components may or may not be physically separated, and the components shown as units / modules may or may not be physical units, that is, they may be located in one place or distributed on multiple network units. Some or all of the units / modules may be selected according to actual needs to achieve the purpose of the solution of this embodiment.

[0093] In addition, each functional unit / module in each embodiment of the present invention may be integrated into one processing unit / module, or each unit / module may exist physically separately, or two or more units / modules may be integrated into one unit / module. The above-mentioned integrated unit / module may be implemented in the form of hardware or in the form of hardware plus software functional units / modules.

[0094] The above-mentioned integrated unit / module implemented in the form of a software functional unit / module can be stored in a computer-readable storage medium. The above-mentioned software functional unit is stored in a storage medium, including a number of instructions for causing one or more processors of a computer device (which can be a personal computer, a server, or a network device, etc.) to perform some steps of the method described in each embodiment of the present invention.

[0095] The above description is only a preferred embodiment of the present invention and does not limit the present invention in any form. Although the present invention has been disclosed as a preferred embodiment as above, it is not used to limit the present invention. Any technician familiar with this profession can make some changes or modifications to equivalent embodiments of equivalent changes using the technical contents disclosed above without departing from the scope of the technical solution of the present invention. However, any simple modification, equivalent change and modification made to the above embodiments based on the technical essence of the present invention without departing from the content of the technical solution of the present invention still fall within the scope of the technical solution of the present invention.

Claims

1. A method for locating pollution sources in an optical system, characterized in that: The method comprises: Under the same light source condition, a first image and a second image in two different states are sequentially acquired, and grayscale mutation point position features of the two images are determined, and a subsystem where contamination is generated is determined based on the deviation of the grayscale mutation point position features; the first image and the second image are images of the same calibration plate at different positions; the subsystem includes a calibration plate and an optical subsystem; When the subsystem where the pollution is generated is an optical subsystem, a group of images of the optical sub-device under state changes are obtained, and each group of images contains two images of the corresponding optical sub-device in at least two states; the grayscale mutation point position characteristics of at least two images in each group of images are determined, and based on the deviation of the grayscale mutation point position characteristics, it is determined whether this optical sub-device is a pollution source; the optical sub-device includes at least any one of a camera target surface device, a light source exit surface device and an optical conjugate surface device.

2. The method for locating the pollution source of an optical system according to claim 1, characterized in that: The light source condition is a bright field lighting condition.

3. The method for locating the pollution source of an optical system according to claim 1, characterized in that: The sequentially acquiring the first image and the second image in two different states includes: keeping the focal plane of the two acquisitions unchanged, and translating the position of the calibration plate relative to the optical subsystem for acquisition during the second acquisition.

4. The method for locating the pollution source of an optical system according to claim 3, characterized in that: The subsystem for determining the source of contamination based on the deviation of the grayscale mutation point position feature includes: determining a first position of the grayscale mutation point in a first image, and determining a second position of the grayscale mutation point in a second image; when the first position and the second position are the same, determining that the contamination is generated by the optical subsystem, and when the second position and the second position are different, determining that the contamination is generated by the calibration plate.

5. The method for locating the pollution source of an optical system according to claim 1, characterized in that: The state change of different optical sub-components is a position change of any optical sub-component relative to other optical sub-components.

6. The method for locating the pollution source of an optical system according to claim 5, characterized in that: The method of determining whether the optical sub-device is a pollution source based on the deviation of the grayscale mutation point position feature includes: comparing whether the grayscale mutation point positions in at least two images before and after the state change are the same, and when the positions are different, determining that the pollution is generated in the optical sub-device.

7. The method for locating the pollution source of an optical system according to claim 1, characterized in that: The method also includes driving the object to move based on the target defocus interval and acquiring multiple defocused images, determining whether there is a diffuse spot in the defocused image, and acquiring the focus position and center position of the diffuse spot in each defocused image; determining whether the focus position in the current defocused image is consistent with the center position of the previous defocused image, and if they are consistent, determining that the diffuse spot originates from a functional component adjacent to the optical conjugate surface device.

8. The method for locating the pollution source of an optical system according to claim 7, characterized in that: The method further includes adjusting the relative position relationship of any of the functional components, determining whether the imaging position of the diffuse spot changes during the adjustment process, and determining whether contamination occurs in the corresponding functional component based on the change.

9. An optical system pollution source positioning device, characterized in that: The device comprises: A first pollution source determination module, used to determine the subsystem where the pollution is generated; The second pollution source determination module is used to determine the optical sub-component corresponding to the pollution source.

10. The optical system pollution source positioning device according to claim 9, characterized in that: The device also includes: The third pollution source determination module is used to determine whether the functional components are polluted.

11. An electronic device, characterized in that: The method comprises a processor and a memory, wherein the memory stores machine executable instructions that can be executed by the processor, and the processor executes the machine executable instructions to implement the method for locating a pollution source of an optical system according to any one of claims 1 to 8.

12. A machine-readable storage medium, characterized in that: The machine-readable storage medium stores machine-executable instructions. When the machine-executable instructions are called and executed by a processor, the machine-executable instructions prompt the processor to implement the method for locating a pollution source of an optical system as described in any one of claims 1-8.

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