Relative sea level change analysis method and device, electronic equipment and storage medium

Abstract

The invention relates to a relative sea level change analysis method and device, electronic equipment and a storage medium, and the method comprises the steps: obtaining logging data of sedimentary rock stratum micro-resistivity imaging, carrying out the preprocessing of the logging data, and obtaining a logging dynamic image; obtaining a gray value of the logging dynamic image, and calculating a logging lithology curve of micro-resistivity imaging based on the gray value; calculating a high-order derivative of the logging lithology curve based on the logging lithology curve, and determining the stratum depth of the sedimentary rock and the interface depth of the cycle small layer based on the high-order derivative; calculating the thickness of the cycle small layer and the average thickness of the cycle small layer based on the interface depth of the cycle small layer; calculating the excursion thickness and the accumulated excursion thickness of the small gyration layer based on the thickness of the small gyration layer and the average thickness of the small gyration layer; and analyzing the relative sea level change of the sedimentary rock stratum according to the change trend of the cumulative migration thickness of the cycle small layer. The accuracy and effectiveness of the research on the change of the sedimentary rock stratum relative to the sea level are improved.

Description

Technical Field

[0001] The present invention relates to the technical field of marine geology and sequence stratigraphy research, and in particular to a relative sea level change analysis method, device, electronic equipment and storage medium. Background Art

[0002] Marine sedimentary rock strata record the changes and evolution characteristics of the marine environment during their deposition period. Using sedimentary rock data to restore relative sea level changes has always been one of the hot spots and difficulties in marine geology and sequence stratigraphy research. The study of relative sea level changes mainly comes from earthquakes, field outcrops, drilling cores, paleontology and conventional logging data. However, seismic data has low resolution; the field environment is not good, and outcrop rock data is difficult to obtain; drilling and coring costs are high, and it is difficult to cover the entire target layer; paleontological data relies on a large amount of analysis and testing, which is time-consuming and labor-intensive; conventional logging data is a one-dimensional curve, and there are multiple solutions in its application. The shortcomings of the above data have greatly affected the precision and accuracy of the results of relative sea level changes.

[0003] Therefore, how to provide a new relative sea level change analysis method, device, electronic equipment and storage medium to improve the efficiency and accuracy of relative sea level change research is a technical problem that needs to be solved urgently. Summary of the invention

[0004] In view of this, it is necessary to provide a relative sea level change analysis method, device, electronic device and storage medium to solve the technical problems of high cost, low efficiency and low precision in relative sea level change research in the prior art.

[0005] In order to solve the above problem, the present invention provides a relative sea level change analysis method, which in a possible implementation manner includes: Acquire logging data of microresistivity imaging of sedimentary rock formations, pre-process the logging data, and obtain dynamic logging images of microresistivity imaging; Acquiring the grayscale value of the well logging dynamic image, and calculating the well logging lithology curve of microresistivity imaging based on the grayscale value; Calculating the high-order derivatives of the microresistivity imaging logging lithology curve, and determining the depth of the sedimentary rock layer and the depth of the sedimentary rock cycle layer interface based on the high-order derivatives; Calculate the thickness of the cyclic sublayer and the average thickness of the cyclic sublayer within the depth range of the sedimentary rock layer based on the depth of the cyclic sublayer interface of the sedimentary rock; Based on the cyclic sublayer thickness and the cyclic sublayer average thickness, the cyclic sublayer offset thickness and the cyclic sublayer cumulative offset thickness within the depth range of the sedimentary rock layer are calculated; According to the changing trend of the cumulative offset thickness of the cyclic sublayer, the relative sea level changes of the sedimentary rock strata are analyzed.

[0006] In a possible implementation, the microresistivity imaging logging lithology curve includes:

[0007] in, is the logging lithology curve value of microresistivity imaging corresponding to the current depth point, is the number of grayscale values ​​of the dynamic image of microresistivity imaging logging at the current depth point, The current depth point microresistivity imaging logging dynamic image Gray value of pixels, 0≤ ≤255, dimensionless.

[0008] In a possible implementation, the high-order derivatives of the microresistivity imaging logging lithology curve include the first-order derivative of the microresistivity imaging logging lithology curve, the second-order derivative of the microresistivity imaging logging lithology curve and the third-order derivative of the microresistivity imaging logging lithology curve; The method of calculating the high-order derivative of the microresistivity imaging logging lithology curve based on the logging lithology curve comprises: The first-order derivative of the microresistivity imaging logging lithology curve is calculated based on the logging lithology curve:

[0009] in, is the first-order derivative of the logging lithology curve of microresistivity imaging corresponding to the current depth point, is the logging lithology curve value of microresistivity imaging corresponding to the previous depth point, is the logging lithology curve value of microresistivity imaging corresponding to the current depth point, It is the depth interval of the lithology curve of micro-resistivity imaging logging; The second-order derivative of the microresistivity imaging logging lithology curve is calculated based on the first-order derivative:

[0010] in, is the second-order derivative of the microresistivity imaging logging lithology curve corresponding to the current depth point, is the first derivative of the microresistivity imaging logging lithology curve corresponding to the previous depth point; The third-order derivative of the microresistivity imaging logging lithology curve is calculated based on the second-order derivative:

[0011] in, is the third-order derivative of the microresistivity imaging logging lithology curve corresponding to the current depth point, It is the second derivative of the microresistivity imaging logging lithology curve corresponding to the previous depth point.

[0012] In a possible implementation, the determining of the sedimentary rock layer depth and the sedimentary rock cycle sublayer interface depth based on the high-order derivatives includes: The first depth value at which the second-order derivative of the microresistivity imaging logging lithology curve changes from negative to positive and the third-order derivative is not equal to 0 is determined as the bottom depth of the sedimentary rock layer, and based on the bottom depth of the sedimentary rock layer, the bottom interface depth of the sedimentary rock cycle layer is determined; The second depth value at which the second-order derivative of the microresistivity imaging logging lithology curve changes from positive to negative and the third-order derivative is not equal to 0 is determined as the top depth of the sedimentary rock layer; and based on the top depth of the sedimentary rock layer, the top interface depth of the sedimentary rock cycle layer is determined.

[0013] In a possible implementation, the step of calculating the thickness of the cyclic sublayer and the average thickness of the cyclic sublayer within the depth range of the sedimentary rock layer based on the depth of the cyclic sublayer interface of the sedimentary rock includes:

[0014]

[0015] in, is the sequence number of the cyclonic sublayers from bottom to top, For the The depth of the bottom interface of the cyclic layer is For the The depth of the top interface of the cyclic layer is For the The thickness of the cyclic layer, is the total number of cyclic layers within the depth range of the sedimentary rock formation, is the average thickness of the cyclic layer.

[0016] In a possible implementation, the calculation of the cyclic sublayer offset thickness and the cyclic sublayer cumulative offset thickness within the depth range of the sedimentary rock layer based on the cyclic sublayer thickness and the cyclic sublayer average thickness includes:

[0017]

[0018] in, For the The offset thickness of the small layer in each cycle is For the The accumulated offset thickness of each cyclic layer.

[0019] In a possible implementation, analyzing the relative sea level change of the sedimentary rock strata according to the change trend of the cumulative offset thickness of the cyclic sublayer includes: If the cumulative displacement thickness of the cyclic sublayer increases gradually from bottom to top, the relative sea level change of the sedimentary rock strata is in an upward state; If the cumulative displacement thickness of the cyclic sublayer gradually decreases from bottom to top, the relative sea level change of the sedimentary rock bottom layer is in a downward state.

[0020] In a second aspect, the present invention further provides a relative sea level change analysis device, comprising: A preprocessing module is used to obtain logging data of microresistivity imaging of sedimentary rock formations, and preprocess the logging data to obtain a dynamic logging image of microresistivity imaging; A curve calculation module, used for obtaining the gray value of the well logging dynamic image, and calculating the well logging lithology curve of microresistivity imaging based on the gray value; A depth calculation module, used to calculate the high-order derivatives of the microresistivity imaging logging lithology curve, and determine the depth of the sedimentary rock layer and the depth of the sedimentary rock cycle layer interface based on the high-order derivatives; A thickness calculation module, used for calculating the thickness of the cyclic sublayer and the average thickness of the cyclic sublayer within the depth range of the sedimentary rock layer based on the depth of the cyclic sublayer interface of the sedimentary rock; An offset thickness calculation module is used to calculate the offset thickness of the cyclic sublayer and the cumulative offset thickness of the cyclic sublayer within the depth range of the sedimentary rock layer based on the cyclic sublayer thickness and the average cyclic sublayer thickness; The analysis module is used to analyze the relative sea level changes of sedimentary rock strata according to the changing trend of the cumulative offset thickness of the cyclic sublayer.

[0021] In a third aspect, the present invention further provides an electronic device, comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the processor implements the steps in the above-mentioned relative sea level change analysis method when executing the computer program.

[0022] In a fourth aspect, the present invention further provides a computer storage medium, wherein the computer-readable storage medium stores a computer program, and when the computer program is executed by a processor, the steps in the relative sea level change analysis method as described above are implemented.

[0023] The present invention obtains logging data of microresistivity imaging of sedimentary rock formations, pre-processes the logging data, forms a dynamic image of microresistivity imaging logging, calculates the grayscale average of the dynamic image of microresistivity imaging logging, forms a high-resolution microresistivity imaging logging lithology curve, calculates the high-order derivatives of the microresistivity imaging logging lithology curve, determines the depth of rock formations, automatically picks up the depth of the cyclical sublayer interface, calculates the thickness of the cyclical sublayer within the depth range of the sedimentary rock formations, the average thickness of the cyclical sublayers, the offset thickness of the cyclical sublayers and the cumulative offset thickness of the cyclical sublayers, and finally analyzes the relative sea level change of the sedimentary rock formation according to the vertical change trend of the cumulative offset thickness of the cyclical sublayers from bottom to top, thereby improving the accuracy and effectiveness of the research on the relative sea level change of the sedimentary rock formations. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative work.

[0025] Figure 1 A method flow chart of an embodiment of a relative sea level change analysis method provided by the present invention; Figure 2 A schematic diagram of microresistivity imaging logging data of a portion of a sedimentary rock formation provided by an embodiment of the present invention; Figure 3 A microresistivity imaging logging dynamic image of a part of a well section of a sedimentary rock formation, a microresistivity imaging logging lithology curve, and a schematic diagram of the first-order derivative, second-order derivative, and third-order derivative of the lithology curve provided by an embodiment of the present invention; Figure 4 A schematic diagram of the rock layer depth and the cyclic layer interface depth of a partial well section of a sedimentary rock formation provided by an embodiment of the present invention; Figure 5 A schematic diagram of the research results of the cyclic sub-layer offset thickness, the cyclic sub-layer cumulative offset thickness and the relative sea level change within the depth range of a sedimentary rock layer provided by one embodiment of the present invention; Figure 6 A schematic structural diagram of an embodiment of a relative sea level change analysis device provided by the present invention; Figure 7 A schematic diagram of the structure of an electronic device provided by an embodiment of the present invention. DETAILED DESCRIPTION

[0026] The preferred embodiments of the present invention are described in detail below in conjunction with the accompanying drawings, wherein the accompanying drawings constitute a part of this application and are used together with the embodiments of the present invention to illustrate the principles of the present invention, but are not used to limit the scope of the present invention.

[0027] The descriptions of "first", "second", etc. involved in the embodiments of the present invention are only for descriptive purposes and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of the indicated technical features. Therefore, the technical features defined as "first" and "second" may explicitly or implicitly include at least one of the features.

[0028] Reference to an "embodiment" herein means that a particular feature, structure, or characteristic described in conjunction with the embodiment may be included in at least one embodiment of the present invention. The appearance of the phrase in various places in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those skilled in the art that the embodiments described herein may be combined with other embodiments.

[0029] A specific embodiment of the present invention discloses a relative sea level change analysis method, comprising: Step 101: acquiring logging data of microresistivity imaging of sedimentary rock formations, preprocessing the logging data, and obtaining a dynamic logging image of microresistivity imaging; Step 102: obtaining the gray value of the logging dynamic image, and calculating the logging lithology curve of the microresistivity imaging based on the gray value; Step 103: Calculate the high-order derivatives of the microresistivity imaging logging lithology curve, and determine the sedimentary rock layer depth and the sedimentary rock cycle layer interface depth based on the high-order derivatives; Step 104: Calculate the thickness of the cyclic sublayer and the average thickness of the cyclic sublayer within the depth range of the sedimentary rock layer based on the depth of the cyclic sublayer interface of the sedimentary rock; Step 105: Calculate the cyclic sublayer offset thickness and the cyclic sublayer cumulative offset thickness within the depth range of the sedimentary rock layer based on the cyclic sublayer thickness and the cyclic sublayer average thickness; Step 106: Analyze the relative sea level change of the sedimentary rock strata according to the change trend of the cumulative offset thickness of the cyclic sublayer.

[0030] Among them, the lithology of sedimentary rock formations includes mudstone, sandstone, dolomite and limestone. The raw data of microresistivity imaging logging are preprocessed, usually including the removal of abnormal values ​​in the logging data and the enhancement of the dynamic logging image. The raw data of microresistivity imaging logging of the entire well section are obtained from the sedimentary rock formation. For some data, please refer to Figure 2 .

[0031] The present invention obtains logging data of microresistivity imaging of sedimentary rock formations, pre-processes the logging data, forms a dynamic image of microresistivity imaging logging, calculates the grayscale average of the dynamic image of microresistivity imaging logging, forms a high-resolution microresistivity imaging logging lithology curve, calculates the high-order derivatives of the microresistivity imaging logging lithology curve, determines the depth of rock formations, automatically picks up the depth of the cyclical sublayer interface, calculates the thickness of the cyclical sublayer within the depth range of the sedimentary rock formations, the average thickness of the cyclical sublayers, the offset thickness of the cyclical sublayers and the cumulative offset thickness of the cyclical sublayers, and finally analyzes the relative sea level change of the sedimentary rock formation according to the vertical change trend of the cumulative offset thickness of the cyclical sublayers from bottom to top, thereby improving the accuracy and effectiveness of the research on the relative sea level change of the sedimentary rock formations.

[0032] In one embodiment of the present invention, the microresistivity imaging logging lithology curve includes: It can be understood that based on the dynamic image of microresistivity imaging logging, the grayscale average value of the dynamic image of microresistivity imaging logging is calculated to form a high-resolution microresistivity imaging logging lithology curve. is the logging lithology curve value of microresistivity imaging corresponding to the current depth point, is the number of grayscale values ​​of the dynamic image of microresistivity imaging logging at the current depth point, The current depth point microresistivity imaging logging dynamic image Gray value of pixels, 0≤ ≤255, dimensionless.

[0033] In one embodiment of the present invention, the high-order derivatives of the microresistivity imaging logging lithology curve include the first-order derivative of the microresistivity imaging logging lithology curve, the second-order derivative of the microresistivity imaging logging lithology curve and the third-order derivative of the microresistivity imaging logging lithology curve; Calculate the high-order derivatives of microresistivity imaging logging lithology curves based on logging lithology curves, including: Calculate the first derivative of the microresistivity imaging logging lithology curve based on the logging lithology curve:

[0034] in, is the first-order derivative of the logging lithology curve of microresistivity imaging corresponding to the current depth point, is the logging lithology curve value of microresistivity imaging corresponding to the previous depth point, is the logging lithology curve value of microresistivity imaging corresponding to the current depth point, It is the depth interval of the lithology curve of micro-resistivity imaging logging; The second-order derivative of the microresistivity imaging logging lithology curve is calculated based on the first-order derivative:

[0035] in, is the second-order derivative of the microresistivity imaging logging lithology curve corresponding to the current depth point, is the first derivative of the microresistivity imaging logging lithology curve corresponding to the previous depth point; The third-order derivative of the microresistivity imaging logging lithology curve is calculated based on the second-order derivative:

[0036] in, is the third-order derivative of the microresistivity imaging logging lithology curve corresponding to the current depth point, It is the second derivative of the microresistivity imaging logging lithology curve corresponding to the previous depth point.

[0037] Determine the depth of sedimentary rock layers and the depth of the interface of sedimentary rock cycle layers based on high-order derivatives, including: The first depth value at which the second-order derivative of the microresistivity imaging logging lithology curve changes from negative to positive and the third-order derivative is not equal to 0 is determined as the bottom depth of the sedimentary rock layer, and based on the bottom depth of the sedimentary rock layer, the bottom interface depth of the sedimentary rock cycle layer is determined; The second depth value where the second-order derivative of the microresistivity imaging logging lithology curve changes from positive to negative and the third-order derivative is not equal to 0 is determined as the top depth of the sedimentary rock layer; and based on the top depth of the sedimentary rock layer, the top interface depth of the sedimentary rock cycle layer is determined.

[0038] It can be understood that by calculating the first-order derivative, second-order derivative and third-order derivative of the microresistivity imaging logging lithology curve. Figure 3 As shown, Figure 3 A dynamic image of a microresistivity imaging logging of a part of a well section of a sedimentary rock formation, a microresistivity imaging logging lithology curve, and a schematic diagram of the first-order derivative, second-order derivative, and third-order derivative of the lithology curve are provided as one embodiment of the present invention. The depth of the rock formation is determined according to the microresistivity imaging logging lithology curve. If the second-order derivative of the lithology curve changes from negative to positive, and the depth value of the third-order derivative is not equal to 0, it is the depth of the bottom of the rock formation; if the second-order derivative of the lithology curve changes from positive to negative, and the depth value of the third-order derivative is not equal to 0, it is the depth of the top of the rock formation. The depth of the cyclic sublayer interface is automatically picked up. The depth of the bottom of the sandstone, dolomite or limestone rock layer is the bottom interface of the cyclic sublayer; the depth of the top of the mudstone rock layer overlying the sandstone, dolomite or limestone is the depth of the top interface of the cyclic sublayer. Figure 4 As shown, Figure 4 A schematic diagram of the rock formation depth and cyclic sub-layer interface depth of a partial well section of a sedimentary rock formation provided by an embodiment of the present invention.

[0039] In one embodiment of the present invention, the thickness of the cyclic sublayer and the average thickness of the cyclic sublayer within the depth range of the sedimentary rock layer are calculated based on the depth of the cyclic sublayer interface of the sedimentary rock, including:

[0040]

[0041] in, is the sequence number of the cyclonic sublayers from bottom to top, For the The depth of the bottom interface of the cyclic layer is For the The depth of the top interface of the cyclic layer is For the The thickness of the cyclic layer, is the total number of cyclic layers within the depth range of the sedimentary rock formation, is the average thickness of the cyclic layer.

[0042] It can be understood that, based on the depth of the cyclic sublayer interface, the thickness of the cyclic sublayer within the depth range of the sedimentary rock layer can be calculated, and the average thickness of the cyclic sublayer can be further calculated.

[0043] In one embodiment of the present invention, based on the cyclic layer thickness and the cyclic layer average thickness, the cyclic layer offset thickness and the cyclic layer cumulative offset thickness within the depth range of the sedimentary rock layer are calculated, including:

[0044]

[0045] in, For the The offset thickness of the small layer in each cycle is For the The cumulative offset thickness of the small layer in each cycle is Dimensionless.

[0046] According to the variation trend of the cumulative offset thickness of the cyclic sublayer, the relative sea level change of the sedimentary rock strata is analyzed, including: If the cumulative offset thickness of the cyclic sublayer increases gradually from bottom to top, the relative sea level change of the sedimentary rock strata is in an upward state; If the cumulative offset thickness of the cyclic sublayer gradually decreases from bottom to top, the relative sea level change of the sedimentary rock bottom layer is in a downward state.

[0047] like Figure 5 As shown, Figure 5 A schematic diagram of the research results of the cyclical layer offset thickness, the cyclical layer cumulative offset thickness and the relative sea level change within the depth range of the sedimentary rock layer provided by one embodiment of the present invention, from Figure 5It can be seen that according to the vertical variation trend of the cumulative offset thickness of the cyclic small layer from bottom to top, the relative sea level change of the sedimentary rock strata is analyzed. The cumulative offset thickness of the cyclic small layer gradually increases from bottom to top, which represents the relative sea level rise, and the cumulative offset thickness of the cyclic small layer gradually decreases from bottom to top, which represents the relative sea level drop.

[0048] More specifically, in one embodiment of the present invention, referring to Figure 4 A total of 517 cyclic layers were picked up, with a layer density of 8.86 layers / m, a minimum single layer thickness of 2.42 cm, a maximum single layer thickness of 74.38 cm, and an average single layer thickness of 11.28 cm. According to the change trend of the cumulative offset thickness of the cyclic layers from bottom to top, reference Figure 5 , a total of 5 periods of relative sea level rise and fall were identified.

[0049] In order to better implement the relative sea level change analysis method in the embodiment of the present invention, based on the relative sea level change analysis method, correspondingly, Figure 6 As shown, the embodiment of the present invention further provides a relative sea level change analysis device 600, and the relative sea level change analysis device 600 includes: The preprocessing module 601 is used to obtain the logging data of the microresistivity imaging of the sedimentary rock formation, preprocess the logging data, and obtain the dynamic logging image of the microresistivity imaging; The curve calculation module 602 is used to obtain the gray value of the logging dynamic image and calculate the logging lithology curve of the microresistivity imaging based on the gray value; The depth calculation module 603 is used to calculate the high-order derivatives of the microresistivity imaging logging lithology curve, and determine the depth of the sedimentary rock layer and the depth of the sedimentary rock cycle layer interface based on the high-order derivatives; Thickness calculation module 604, used for calculating the thickness of the cyclic sublayer and the average thickness of the cyclic sublayer within the depth range of the sedimentary rock layer based on the depth of the cyclic sublayer interface of the sedimentary rock; The offset thickness calculation module 605 is used to calculate the offset thickness of the cyclic sublayer and the cumulative offset thickness of the cyclic sublayer within the depth range of the sedimentary rock layer based on the cyclic sublayer thickness and the average thickness of the cyclic sublayer; The analysis module 606 is used to analyze the relative sea level change of the sedimentary rock strata according to the change trend of the cumulative offset thickness of the cyclic sublayer.

[0050] The relative sea level change analysis device 600 provided in the above embodiment can implement the technical solution described in the above relative sea level change analysis method embodiment. The specific implementation principles of the above modules or units can refer to the corresponding contents in the above relative sea level change analysis method embodiment, which will not be repeated here.

[0051] like Figure 7As shown, the present invention also provides an electronic device 700. The electronic device 700 includes a processor 701, a memory 702 and a display 703. Figure 7 Only some components of the electronic device 700 are shown, but it should be understood that it is not required to implement all of the components shown, and more or fewer components may be implemented instead.

[0052] In some embodiments, the processor 701 may be a central processing unit (CPU), a microprocessor or other data processing chip, used to run program codes or process data stored in the memory 702, such as the relative sea level change analysis method of the present invention.

[0053] In some embodiments, the processor 701 may be a single server or a server group. The server group may be centralized or distributed. In some embodiments, the processor 701 may be local or remote. In some embodiments, the processor 701 may be implemented in a cloud platform. In one embodiment, the cloud platform may include a private cloud, a public cloud, a hybrid cloud, a community cloud, a distributed cloud, an internal cloud, a multi-cloud, etc., or any combination thereof.

[0054] In some embodiments, the memory 702 may be an internal storage unit of the electronic device 700, such as a hard disk or memory of the electronic device 700. In other embodiments, the memory 702 may also be an external storage device of the electronic device 700, such as a plug-in hard disk, a smart media card (SMC), a secure digital (SD) card, a flash card, etc., equipped on the electronic device 700.

[0055] Furthermore, the memory 702 may include both an internal storage unit of the electronic device 700 and an external storage device. The memory 702 is used to store application software installed in the electronic device 700 and various data.

[0056] In some embodiments, the display 703 may be an LED display, a liquid crystal display, a touch-sensitive liquid crystal display, an OLED (Organic Light-Emitting Diode) touch device, etc. The display 703 is used to display information of the electronic device 700 and to display a visual user interface. The components 701-703 of the electronic device 700 communicate with each other via a system bus.

[0057] In some embodiments, when the processor 701 executes the relative sea level change analysis program in the memory 702, the following steps may be implemented: Acquire logging data of microresistivity imaging of sedimentary rock formations, pre-process the logging data, and obtain dynamic logging images of microresistivity imaging; Obtaining the gray value of the logging dynamic image, and calculating the logging lithology curve of the microresistivity imaging based on the gray value; Calculate the high-order derivatives of the microresistivity imaging logging lithology curve, and determine the depth of the sedimentary rock layer and the depth of the sedimentary rock cycle layer interface based on the high-order derivatives; Based on the depth of the sedimentary rock cyclic layer interface, the thickness of the cyclic layer and the average thickness of the cyclic layer within the depth range of the sedimentary rock layer are calculated; Based on the cyclic layer thickness and the average cyclic layer thickness, the cyclic layer offset thickness and the cyclic layer cumulative offset thickness within the depth range of the sedimentary rock layer are calculated; According to the changing trend of the cumulative offset thickness of the cyclic sublayer, the relative sea level changes of the sedimentary rock strata are analyzed.

[0058] It should be understood that: when the processor 701 executes the relative sea level change analysis program in the memory 702, in addition to the above functions, other functions can also be implemented. For details, please refer to the description of the corresponding method embodiment above.

[0059] Furthermore, the embodiment of the present invention does not specifically limit the type of the electronic device 700 mentioned, and the electronic device 700 may be a portable electronic device such as a mobile phone, a tablet computer, a personal digital assistant (PDA), a wearable device, a laptop computer, etc. Exemplary embodiments of portable electronic devices include but are not limited to portable electronic devices equipped with IOS, Android, Microsoft or other operating systems. The above-mentioned portable electronic devices may also be other portable electronic devices, such as a laptop computer with a touch-sensitive surface (e.g., a touch panel). It should also be understood that in some other embodiments of the present invention, the electronic device 700 may not be a portable electronic device, but a desktop computer with a touch-sensitive surface (e.g., a touch panel).

[0060] Accordingly, an embodiment of the present application also provides a computer-readable storage medium, which is used to store computer-readable programs or instructions. When the program or instructions are executed by a processor, it can implement the steps or functions in the relative sea level change analysis method provided in the above-mentioned method embodiments.

[0061] Those skilled in the art will appreciate that all or part of the processes of the above-mentioned embodiments can be implemented by instructing related hardware through a computer program, and the program can be stored in a computer-readable storage medium, wherein the computer-readable storage medium is a disk, an optical disk, a read-only storage memory, or a random access memory, etc.

[0062] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any changes or substitutions that can be easily conceived by any technician familiar with the technical field within the technical scope disclosed by the present invention should be covered within the protection scope of the present invention.

Claims

1. A relative sea level change analysis method, characterized in that: include: Acquire logging data of microresistivity imaging of sedimentary rock formations, pre-process the logging data, and obtain dynamic logging images of microresistivity imaging; Acquiring the grayscale value of the logging dynamic image, and calculating the microresistivity imaging logging lithology curve based on the grayscale value; Calculating the high-order derivatives of the microresistivity imaging logging lithology curve, and determining the depth of the sedimentary rock layer and the depth of the sedimentary rock cycle layer interface based on the high-order derivatives; Calculate the thickness of the cyclic sublayer and the average thickness of the cyclic sublayer within the depth range of the sedimentary rock layer based on the depth of the cyclic sublayer interface of the sedimentary rock; Based on the cyclic sublayer thickness and the cyclic sublayer average thickness, the cyclic sublayer offset thickness and the cyclic sublayer cumulative offset thickness within the depth range of the sedimentary rock layer are calculated; According to the changing trend of the cumulative offset thickness of the cyclic sublayer, the relative sea level changes of the sedimentary rock strata are analyzed.

2. The relative sea level change analysis method according to claim 1, characterized in that: The microresistivity imaging logging lithology curve includes: , in, is the logging lithology curve value of microresistivity imaging corresponding to the current depth point, is the number of grayscale values ​​of the dynamic image of microresistivity imaging logging at the current depth point, The current depth point microresistivity imaging logging dynamic image The gray value of pixels, 0≤ ≤255, dimensionless.

3. The relative sea level change analysis method according to claim 1, characterized in that: The high-order derivatives of the microresistivity imaging logging lithology curve include the first-order derivative of the microresistivity imaging logging lithology curve, the second-order derivative of the microresistivity imaging logging lithology curve and the third-order derivative of the microresistivity imaging logging lithology curve; The method of calculating the high-order derivative of the microresistivity imaging logging lithology curve based on the logging lithology curve comprises: The first-order derivative of the microresistivity imaging logging lithology curve is calculated based on the logging lithology curve: in, is the first-order derivative of the logging lithology curve of microresistivity imaging corresponding to the current depth point, is the logging lithology curve value of microresistivity imaging corresponding to the previous depth point, is the logging lithology curve value of microresistivity imaging corresponding to the current depth point, It is the depth interval of the lithology curve of micro-resistivity imaging logging; The second-order derivative of the microresistivity imaging logging lithology curve is calculated based on the first-order derivative: in, is the second-order derivative of the microresistivity imaging logging lithology curve corresponding to the current depth point, is the first derivative of the microresistivity imaging logging lithology curve corresponding to the previous depth point; The third-order derivative of the microresistivity imaging logging lithology curve is calculated based on the second-order derivative: in, is the third-order derivative of the microresistivity imaging logging lithology curve corresponding to the current depth point, It is the second derivative of the microresistivity imaging logging lithology curve corresponding to the previous depth point.

4. The relative sea level change analysis method according to claim 3, characterized in that: The method of determining the depth of sedimentary rock layers and the depth of the interface of sedimentary rock cyclic layers based on the high-order derivatives comprises: The first depth value at which the second-order derivative of the microresistivity imaging logging lithology curve changes from negative to positive and the third-order derivative is not equal to 0 is determined as the bottom depth of the sedimentary rock layer, and based on the bottom depth of the sedimentary rock layer, the bottom interface depth of the sedimentary rock cycle layer is determined; The second depth value at which the second-order derivative of the microresistivity imaging logging lithology curve changes from positive to negative and the third-order derivative is not equal to 0 is determined as the top depth of the sedimentary rock layer; and based on the top depth of the sedimentary rock layer, the top interface depth of the sedimentary rock cycle layer is determined.

5. The relative sea level change analysis method according to claim 4, characterized in that: The step of calculating the thickness of the cyclic sublayer and the average thickness of the cyclic sublayer within the depth range of the sedimentary rock layer based on the depth of the cyclic sublayer interface of the sedimentary rock comprises: in, is the sequence number of the cyclonic sublayers from bottom to top, For the The depth of the bottom interface of the cyclic layer is For the The depth of the top interface of the cyclic layer is For the The thickness of the cyclic layer, is the total number of cyclic layers within the depth range of the sedimentary rock formation, is the average thickness of the cyclic sublayer.

6. The relative sea level change analysis method according to claim 5, characterized in that: The step of calculating the cyclical sublayer offset thickness and the cyclical sublayer cumulative offset thickness within the depth range of the sedimentary rock layer based on the cyclical sublayer thickness and the cyclical sublayer average thickness comprises: in, For the The offset thickness of the small layer in each cycle is For the The accumulated offset thickness of each cyclic layer.

7. The relative sea level change analysis method according to claim 6, characterized in that: The analysis of the relative sea level change of the sedimentary rock strata according to the change trend of the cumulative offset thickness of the cyclic sub-layers includes: If the cumulative displacement thickness of the cyclic sublayer increases gradually from bottom to top, the relative sea level change of the sedimentary rock strata is in an upward state; If the cumulative displacement thickness of the cyclic sublayer gradually decreases from bottom to top, the relative sea level change of the sedimentary rock bottom layer is in a downward state.

8. A relative sea level change analysis device, characterized in that: include: A preprocessing module is used to obtain logging data of microresistivity imaging of sedimentary rock formations, and preprocess the logging data to obtain a dynamic logging image of microresistivity imaging; A curve calculation module, used for acquiring the gray value of the well logging dynamic image, and calculating the well logging lithology curve of microresistivity imaging based on the gray value; A depth calculation module, used to calculate the high-order derivatives of the microresistivity imaging logging lithology curve, and determine the depth of the sedimentary rock layer and the depth of the sedimentary rock cycle layer interface based on the high-order derivatives; A thickness calculation module, used for calculating the thickness of the cyclic sublayer and the average thickness of the cyclic sublayer within the depth range of the sedimentary rock layer based on the depth of the cyclic sublayer interface of the sedimentary rock; An offset thickness calculation module is used to calculate the offset thickness of the cyclic sublayer and the cumulative offset thickness of the cyclic sublayer within the depth range of the sedimentary rock layer based on the cyclic sublayer thickness and the average cyclic sublayer thickness; The analysis module is used to analyze the relative sea level changes of sedimentary rock strata according to the changing trend of the cumulative offset thickness of the cyclic sublayer.

9. An electronic device, characterized in that: comprising a memory and a processor, wherein: The memory is used to store programs; The processor is coupled to the memory and is used to execute the program stored in the memory to implement the steps in the relative sea level change analysis method described in any one of claims 1 to 7 above.

10. A computer-readable storage medium, characterized in that: Used to store computer-readable programs or instructions, which, when executed by a processor, can implement the steps in the relative sea level change analysis method described in any one of claims 1 to 7.

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