Display panel and method for manufacturing same

Abstract

The invention relates to a display panel and a method for manufacturing the same. The display panel includes: a base layer including a display area and a non-display area, the display area including a first light emitting area, a second light emitting area, and a non-light emitting area; a first lower electrode on the base layer, overlapping the first light emitting region, and including a first reflective electrode and a first transparent electrode on the first reflective electrode; a second lower electrode on the base layer, overlapping the second light emitting region, and including a second reflective electrode and a second transparent electrode on the second reflective electrode; and a first inorganic film overlapping the first light emitting region and at least partially between the first reflective electrode and the first transparent electrode, in which the first inorganic film is spaced apart from the second reflective electrode and has a first gap therebetween.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to and the benefit of Korean Patent Application No. 10-2023-0105050 filed in the Korean Intellectual Property Office on August 10, 2023, the disclosure of which is incorporated herein in its entirety by reference. Technical Field

[0003] Aspects of some embodiments of the present disclosure herein relate to a display panel and a method for manufacturing the same. Background Art

[0004] Display devices such as televisions, monitors, smart phones, and tablet computers that display images to users include display panels that display images. As display panels, various display panels such as liquid crystal display panels, organic light emitting display panels, electrowetting display panels, and electrophoretic display panels are being developed.

[0005] Various methods for patterning light emitting elements may enable a display panel to have relatively improved reliability, and recently, research into a high-resolution display device including a light emitting material commonly provided by using an opening mask is being conducted.

[0006] The above information disclosed in this Background section is only for enhancement of understanding of the background technology, and therefore the information discussed in this Background section does not necessarily constitute prior art. Summary of the invention

[0007] Aspects of some embodiments of the present disclosure herein relate to a display panel and a method for manufacturing the same, and, for example, to a display panel having relatively improved durability and reliability.

[0008] Aspects of some embodiments of the present disclosure include a display panel having relatively improved durability and reliability while achieving relatively high resolution, and a method for manufacturing the same.

[0009] According to some embodiments of the present disclosure, a display panel includes: a base layer including a display area and a non-display area, the display area including a first light-emitting area, a second light-emitting area and a non-light-emitting area; a first lower electrode on the base layer, overlapping with the first light-emitting area, and including a first reflective electrode and a first transparent electrode on the first reflective electrode; a second lower electrode on the base layer, overlapping with the second light-emitting area, and including a second reflective electrode and a second transparent electrode on the second reflective electrode; and a first inorganic film overlapping with the first light-emitting area and at least partially between the first reflective electrode and the first transparent electrode, wherein the first inorganic film is spaced apart from the second reflective electrode and has a first gap between the first inorganic film and the second reflective electrode.

[0010] According to some embodiments, the first inorganic film may cover the upper surface and the side surfaces of the first reflective electrode.

[0011] According to some embodiments, the first inorganic film may include silicon oxide (SiO x ), silicon nitride (SiN x ) and silicon oxynitride (SiO x N y ) at least one of.

[0012] According to some embodiments, the display panel may further include: a second inorganic film overlapping the first light emitting region and the second light emitting region and at least partially on the first reflective electrode and the second reflective electrode.

[0013] According to some embodiments, the second inorganic film may be between the first reflective electrode and the first transparent electrode and between the second reflective electrode and the second transparent electrode, respectively.

[0014] According to some embodiments, the display area may further include a third light emitting area, and the display panel may further include a third lower electrode on the base layer, overlapping the third light emitting area, and including a third reflective electrode and a third transparent electrode on the third reflective electrode.

[0015] According to some embodiments, the second inorganic film may be spaced apart from the third reflective electrode with a second gap therebetween.

[0016] According to some embodiments, the third transparent electrode may be directly on the third reflective electrode.

[0017] According to some embodiments, a first distance between the first reflective electrode and the first transparent electrode in a thickness direction of the display panel may be greater than a second distance between the second reflective electrode and the second transparent electrode in the thickness direction.

[0018] According to some embodiments, the first lower electrode and the second lower electrode may respectively include: a first layer including a transparent conductive oxide; a second layer on the first layer and including a reflective metal material; and a third layer on the second layer and including the transparent conductive oxide.

[0019] According to some embodiments, the display panel may further include a pixel defining film that at least partially covers each of the first transparent electrode and the second transparent electrode and includes an inorganic material.

[0020] According to some embodiments, the display panel may further include: at least one organic layer on the first transparent electrode and the second transparent electrode and including a light emitting layer; and an upper electrode on the at least one organic layer.

[0021] According to some embodiments, the display panel may further include: an encapsulation layer on the upper electrode; and a plurality of color filters on the encapsulation layer and in each of the first and second light emitting regions.

[0022] According to some embodiments, the first reflective electrode and the second reflective electrode may be spaced apart from each other in a plan view and in the same layer.

[0023] According to some embodiments, the first transparent electrode may contact the first reflective electrode through a first contact member passing through the first inorganic film.

[0024] According to some embodiments of the present disclosure, a display panel includes: a base layer including a display area and a non-display area, the display area including a first light-emitting area, a second light-emitting area, a third light-emitting area and a non-light-emitting area; a first reflective electrode on the base layer and overlapping with the first light-emitting area; a second reflective electrode on the base layer and overlapping with the second light-emitting area; a third reflective electrode on the base layer and overlapping with the third light-emitting area; a first inorganic film overlapping with the first light-emitting area and at least partially on the first reflective electrode; and a second inorganic film overlapping with the first light-emitting area and the second light-emitting area and at least partially on the second reflective electrode, wherein the first inorganic film is spaced apart from the second reflective electrode and has a first gap between the first inorganic film and the second reflective electrode, and the second inorganic film is spaced apart from the third reflective electrode and has a second gap between the second inorganic film and the third reflective electrode.

[0025] According to some embodiments, the first inorganic film may cover the upper surface and the side surfaces of the first reflective electrode, and the second inorganic film may cover the upper surface and the side surfaces of the second reflective electrode.

[0026] According to some embodiments, a method includes: providing a preliminary display panel, the preliminary display panel including a base layer, a first reflective electrode on the base layer, and a second reflective electrode on the base layer and spaced apart from the first reflective electrode; forming a first preliminary inorganic film to cover the first reflective electrode and the second reflective electrode, respectively; and forming a first inorganic film by patterning the first preliminary inorganic film to remove a portion of the first preliminary inorganic film formed on the second reflective electrode, wherein, when forming the first inorganic film, the first inorganic film and the second reflective electrode are patterned to be spaced apart from each other and to have a first gap between the first inorganic film and the second reflective electrode.

[0027] According to some embodiments, the method may further include: after forming the first inorganic film, forming a second preliminary inorganic film on the first inorganic film to cover the second reflective electrode; and forming the second inorganic film by patterning the second preliminary inorganic film.

[0028] According to some embodiments, the preliminary display panel may be on the first base layer and also include a third reflective electrode spaced apart from the first reflective electrode and the second reflective electrode, and when the second preliminary inorganic film is formed, the second preliminary inorganic film is formed to cover the third reflective electrode, and when the second inorganic film is formed, the second inorganic film and the third reflective electrode are patterned to be spaced apart from each other with a second gap therebetween. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] The accompanying drawings are included to provide a further understanding of the embodiments according to the present disclosure, and are incorporated into and constitute a part of this specification. The accompanying drawings illustrate aspects of some embodiments of the present disclosure and, together with the description, are used to explain aspects of some embodiments of the present disclosure. In the drawings:

[0030] Figure 1 is a perspective view showing an electronic device according to some embodiments of the present disclosure;

[0031] Figure 2A is a perspective view showing an electronic device according to some embodiments of the present disclosure;

[0032] Figure 2B is an exploded perspective view of an electronic device according to some embodiments of the present disclosure;

[0033] Figure 3 is a plan view of a display panel according to some embodiments of the present disclosure;

[0034] Figure 4 is a cross-sectional view of a display panel according to some embodiments of the present disclosure;

[0035] Figure 5A and Figure 5B are respectively enlarged cross-sectional views of some configurations of display panels according to some embodiments of the present disclosure;

[0036] Figure 6 is a cross-sectional view of a display panel according to some embodiments of the present disclosure;

[0037] Fig. 7A and Figure 7B is a cross-sectional view of a light emitting element according to some embodiments of the present disclosure;

[0038] Figure 8 is a flow chart of a method for manufacturing a display panel according to some embodiments of the present disclosure; and

[0039] 9A to 9H are cross-sectional views of some operations of a method for manufacturing a display panel according to some embodiments of the present disclosure. DETAILED DESCRIPTION

[0040] In this specification, when a component (or region, layer, part, etc.) is "on," "connected" or "coupled" to another component, it means that it is directly placed / connected / coupled on the other component, or a third component may be located between them.

[0041] The same reference numerals or symbols represent the same elements. In addition, in the drawings, in order to effectively describe the technical content, the thickness, ratio and size of the components are exaggerated. "And / or" includes all combinations of one or more that the relevant elements can define.

[0042] Terms such as first and second can be used to describe various components, but these components should not be limited by these terms. These terms are only used for the purpose of distinguishing one component from other components. For example, without departing from the scope of the present invention, a first component can be referred to as a second component, and similarly, a second component can be referred to as a first component. Unless the context clearly indicates otherwise, singular expressions include plural expressions.

[0043] In addition, terms such as "below", "lower", "above", and "upper" are used to describe the relationship between components shown in the drawings. These terms are relative concepts and are described based on the directions indicated in the drawings.

[0044] Terms such as “include” or “have” are intended to specify the presence of features, numbers, steps, actions, components, parts or a combination thereof described in the specification, and it should be understood that they do not exclude the possibility of the presence or addition of one or more other features, numbers, steps, operations, components, parts or a combination thereof.

[0045] In the present application, “directly located” may mean that no layer, film, region, plate, etc. is added between a part such as a layer, film, region or plate and another part. For example, “directly located” may mean placing two layers or two members without using an additional member such as an adhesive member between them.

[0046] Unless otherwise defined, all terms (including technical terms and scientific terms) used in this specification have the same meaning as those commonly understood by ordinary technicians in the field to which the present invention belongs. In addition, terms, such as those defined in commonly used dictionaries, should be interpreted as having the same meaning as in the context of the relevant technology, and should not be interpreted as too ideal or too formal unless clearly defined herein.

[0047] Hereinafter, an electronic device and a display panel included therein according to some embodiments of the present disclosure will be described in more detail with reference to the accompanying drawings.

[0048] Figure 1is a perspective view showing an electronic device EE according to some embodiments of the present disclosure. The electronic device EE can be activated in response to an electrical signal. For example, the electronic device EE can be a television, a monitor, a billboard, a game console, a personal computer, a notebook computer, a mobile phone, a tablet computer, a navigation system, and a wearable device, but embodiments of the present disclosure are not limited thereto.

[0049] Figure 1 A head mounted display (HMD) device is shown as an example of the electronic device EE. The head mounted display device may be a device mounted on the user's head to provide the user with a screen displaying an image or video. The head mounted display device may include a perspective type that provides augmented reality (AR) based on a real external object and a closed type that provides virtual reality (VR) to the user on a screen independent of the external object.

[0050] refer to Figure 1 , the electronic device EE may include a display panel DP and a lens portion LS opposite to the display panel DP. In addition, the electronic device EE may include a main frame MF, a cover frame CF, and a fixing part FP.

[0051] The main frame MF can be attached to the user's face. The main frame MF can have a shape corresponding to the shape of the user's head (face). For example, the length of the fixing part FP can be controlled according to the circumference of the user's head. The fixing part FP as a structure that facilitates the attachment of the main frame MF may include a sling, a strap, etc. However, the embodiments according to the present disclosure are not limited to this, and the fixing part FP may have various forms such as a helmet or glasses legs connected to the main frame MF.

[0052] The lens part LS, the display panel DP, and the cover frame CF may be mounted on the main frame MF. The main frame MF may include a space or structure in which the lens part LS and the display panel DP may be accommodated.

[0053] The lens portion LS may be located between the display panel DP and the user. Light incident from the display panel DP may pass through the lens portion LS and be provided to the user. For example, the lens portion LS may include various types of lenses such as a multi-channel lens, a convex lens, a concave lens, a spherical lens, an aspherical lens, a single lens, a composite lens, a standard lens, a narrow-angle lens, a wide-angle lens, a fixed-focus lens, or a zoom lens.

[0054] The lens portion LS may include a first lens LS1 and a second lens LS2. The first lens LS1 and the second lens LS2 may be arranged to correspond to positions of a left eye and a right eye of a user, respectively. The first lens LS1 and the second lens LS2 may be accommodated in a main frame MF.

[0055] The display panel DP may be disposed in a state of being fixed to the main frame MF, or in a state of being attachable to or detachable from the main frame MF. The display panel DP will be described in more detail later.

[0056] The cover frame CF may be located on one surface of the display panel DP to protect the display panel DP. The cover frame CF and the lens portion LS may be spaced apart from each other with the display panel DP therebetween.

[0057] Figure 1 The following figures show the first direction DR1 to the third direction DR3, and the directions indicated by the first direction DR1, the second direction DR2, and the third direction DR3 described in this specification are relative concepts and can be changed to other directions. In addition, the directions indicated by the first direction DR1, the second direction DR2, and the third direction DR3 can be described as the first direction to the third direction, and the same reference numerals or symbols can be used. In this specification, the first direction DR1 and the second direction DR2 can be perpendicular to each other, and the third direction DR3 can be a normal direction of a plane defined by the first direction DR1 and the second direction DR2.

[0058] The thickness direction of the electronic device EE may be parallel to a third direction DR3 which is a normal direction to a plane defined by the first direction DR1 and the second direction DR2. In the present specification, a front surface (or upper surface) and a rear surface (or lower surface) of a member constituting the electronic device EE may be defined relative to the third direction DR3. In the present specification, "on a plane" or "in a plan view" refers to a view parallel to a surface parallel to a plane defined by the first direction DR1 and the second direction DR2, and "on a cross-section" refers to a surface parallel to the third direction DR3.

[0059] Figure 2A is a perspective view showing an electronic device EE-a according to some embodiments of the present disclosure. Figure 2A is a stereoscopic diagram showing an electronic device according to some embodiments of the present disclosure, and shows a mobile phone as an example of the electronic device EE-a. The electronic device EE-a may display an image IM through an active area AA-DD. The active area AA-DD may include a plane defined by a first direction DR1 and a second direction DR2. The active area AA-DD may include a curved surface bent from at least one side of the plane defined by the first direction DR1 and the second direction DR2. However, this is an example, and the shape of the active area AA-DD is not limited thereto. For example, the active area AA-DD may include only a plane, or may also include at least two curved surfaces bent from the plane, such as four curved surfaces bent from four side surfaces of the plane, respectively.

[0060] The peripheral area NAA-DD is adjacent to the active area AA-DD. The peripheral area NAA-DD may surround the active area AA-DD. Therefore, the shape of the active area AA-DD may be substantially defined by the peripheral area NAA-DD. However, this is merely an example, and the peripheral area NAA-DD may be positioned adjacent to one side of the active area AA-DD, or may be omitted. The active area AA-DD may be provided with various shapes and is not limited to any one embodiment.

[0061] Figure 2B yes Figure 2A An exploded perspective view of the electronic device EE-a shown in FIG. Figure 2B , the electronic device EE-a may include a housing HAU, a display panel DP and a window member WM.

[0062] The window member WM may cover the entire exterior of the display panel DP. The window member WM may include a transmissive area TA and a frame area BZA. The front surface of the window member WM including the transmissive area TA and the frame area BZA may correspond to the front surface of the electronic device EE-a. The transmissive area TA may correspond to the front surface of the electronic device EE-a. Figure 2A The active area AA-DD of the electronic device EE-a shown in FIG. 1 corresponds to the active area AA-DD of the electronic device EE-a shown in FIG. 1 , and the frame area BZA may correspond to the active area AA-DD of the electronic device EE-a shown in FIG. Figure 2A Corresponding to the peripheral area NAA-DD of the electronic device EE-a shown in .

[0063] The transmission area TA may be optically transparent. The frame area BZA may be an area having a relatively lower transmittance than the transmission area TA. For example, according to some embodiments, the frame area BZA may not transmit light. The frame area BZA may have a color (e.g., a set color or a predetermined color). The frame area BZA may be adjacent to the transmission area TA and may surround the transmission area TA. The frame area BZA may define the shape of the transmission area TA, but is not limited thereto according to embodiments of the present disclosure. The frame area BZA may be positioned adjacent to one side of the transmission area TA, and a portion of it may be omitted.

[0064] According to some embodiments, the input sensing portion may be disposed on the display panel DP. The input sensing portion may sense an external input applied from the outside. The external input may be a user input. The user input may include various forms of external input such as a part of the user's body, light, heat, a pen, or pressure. For example, the input sensing portion may be located on an encapsulation layer TFE (see FIG. 1 ) of the display panel DP, which will be described in more detail later. Figure 4 ). Optionally, the input sensing portion can be directly located on the encapsulation layer TFE (see Figure 4 ) or can be directly located on the encapsulation layer TFE (see Figure 4) on a bonding member on the substrate. The bonding member may include a typical adhesive or bonding agent.

[0065] In this specification, a component (region, layer, part, etc.) "directly located on" another component means that there is no third component between the one component and the other component. In other words, a component "directly located on" another component means that the one component and the other component "contact" each other.

[0066] The housing HAU may accommodate the display panel DP, etc. The housing HAU may be coupled to the window member WM.

[0067] Figure 3 1 is a plan view showing a display panel DP according to some embodiments of the present disclosure. Figure 1 and Figure 2B The electronic devices EE and EE-a shown in the figure include a display panel DP.

[0068] refer to Figure 3 , the display panel DP may include a light emitting area PXA and a non-light emitting area NPXA. The non-light emitting area NPXA may surround the light emitting area PXA. The light emitting area PXA may be arranged in plurality. The light emitting area PXA may include a first light emitting area PXA-1, a second light emitting area PXA-2, and a third light emitting area PXA-3. The first light emitting area PXA-1, the second light emitting area PXA-2, and the third light emitting area PXA-3 may respectively emit light having wavelength regions different from each other. The first light emitting area PXA-1 may emit a first light, and the second light emitting area PXA-2 may emit a second light different from the first light. The third light emitting area PXA-3 may emit a third light different from the first light and the second light. At the same time, the first light may be red light, the second light may be green light, and the third light may be blue light.

[0069] Among the first light emitting region PXA-1, the second light emitting region PXA-2, and the third light emitting region PXA-3, the third light emitting region PXA-3 may have the largest area, and the second light emitting region PXA-2 may have the smallest area. However, this is an example, and the areas of the first light emitting region PXA-1, the second light emitting region PXA-2, and the third light emitting region PXA-3 are not limited thereto. Figure 3 It is shown that the first light emitting area PXA-1 and the third light emitting area PXA-3 are alternately arranged in one row, and the second light emitting area PXA-2 is spaced apart from the first light emitting area PXA-1 and the third light emitting area PXA-3 to be arranged in another row. However, this is an example, and the arrangement of the first light emitting area PXA-1, the second light emitting area PXA-2, and the third light emitting area PXA-3 is not limited thereto.

[0070] Figure 4 is a cross-sectional view of a display panel according to some embodiments of the present disclosure. Figure 5A and Figure 5B They are respectively enlarged cross-sectional views of some configurations of display panels according to some embodiments of the present disclosure. Figure 4 is shown with Figure 3 A cross-sectional view of the portion corresponding to line II' in FIG. Figure 5A is included in Figure 4 FIG. 4 is an enlarged view of the first lower electrode LE1 and the second lower electrode LE2 in the display panel DP. Figure 5B is included in Figure 4 FIG. 5 is an enlarged view of the second lower electrode LE2 and the third lower electrode LE3 in the display panel DP.

[0071] refer to Figure 4 The display panel DP may include a base layer BS, a circuit layer DP-CL located on the base layer BS, a display element layer DP-ED located on the circuit layer DP-CL, and an encapsulation layer TFE located on the display element layer DP-ED. In addition, the display panel DP may further include a color filter layer CFL located on the encapsulation layer TFE.

[0072] refer to Figure 4 , the base layer BS may be a member that provides a base surface on which the circuit layer DP-CL is located. The base layer BS may be a rigid substrate, or a flexible substrate that is bendable, foldable, or rollable. The base layer BS may be a glass substrate, a metal substrate, a polymer substrate, etc. However, the embodiments according to the present disclosure are not limited thereto, and the base layer BS may be an inorganic layer, an organic layer, or a composite material layer.

[0073] The base layer BS may include a single layer or multiple layers. For example, the base layer BS may include a first synthetic resin layer, an intermediate layer having a single layer structure or a multilayer structure, and a second synthetic resin layer stacked in sequence. The intermediate layer may be referred to as a base barrier layer. The intermediate layer may include silicon oxide (SiO x ) layer and an amorphous silicon (a-Si) layer located on the silicon oxide layer, but is not particularly limited thereto. For example, the intermediate layer may include at least one of a silicon oxide layer, a silicon nitride layer, a silicon oxynitride layer, and an amorphous silicon layer.

[0074] The first synthetic resin layer and the second synthetic resin layer may each include a polyimide-based resin. In addition, the first synthetic resin layer and the second synthetic resin layer may each include at least one of an acrylic resin, a methacrylate resin, a polyisoprene-based resin, a vinyl-based resin, an epoxy-based resin, a urethane-based resin, a cellulose-based resin, a siloxane-based resin, a polyamide-based resin, and a perylene-based resin. In this specification, "X-based resin" refers to a resin including a "functional group X".

[0075] The circuit layer DP-CL may be located on the base layer BS. The circuit layer DP-CL may include an insulating layer, a semiconductor pattern, a conductive pattern, a signal line, etc. After forming the insulating layer, the semiconductor layer, and the conductive layer on the base layer BS by a method such as coating and deposition, the insulating layer, the semiconductor layer, and the conductive layer may be selectively patterned by multiple photolithography processes. Thereafter, the semiconductor pattern, the conductive pattern, and the signal line included in the circuit layer DP-CL may be formed.

[0076] According to some embodiments, the base layer BS may be a silicon substrate. The base layer BS may be a single crystal silicon wafer, a polycrystalline silicon wafer, or an amorphous silicon wafer. The circuit layer DP-CL may include an insulating layer, a semiconductor pattern, a conductive pattern, a signal line, and the like.

[0077] The display element layer DP-ED may be located on the circuit layer DP-CL and may include first, second and third light emitting elements ED-1, ED-2 and ED-3, an inorganic film TCF, a pixel defining film PDL and a cover layer CPL.

[0078] The first light emitting element ED-1, the second light emitting element ED-2, and the third light emitting element ED-3 may be spaced apart from each other in a direction intersecting the third direction DR3. The first light emitting element ED-1, the second light emitting element ED-2, and the third light emitting element ED-3 may include lower electrodes LE1, LE2, and LE3, respectively, an organic layer OL located on the lower electrodes LE1, LE2, and LE3, and an upper electrode UE located on the organic layer OL. In addition, the display element layer DP-ED may include a cover layer CPL located on the upper electrode UE.

[0079] Reference together Figure 4 , Figure 5A and Figure 5B, the lower electrodes LE1, LE2, and LE3 may include reflective electrodes RE1, RE2, and RE3 located on the circuit layer DP-CL, and transparent electrodes TE1, TE2, and TE3 located on the reflective electrodes RE1, RE2, and RE3, respectively. Meanwhile, in this specification, the lower electrodes LE1, LE2, and LE3 may mean "anodes". The lower electrodes LE1, LE2, and LE3 may include a stacked structure of reflective electrodes RE1, RE2, and RE3, and transparent electrodes TE1, TE2, and TE3, respectively.

[0080] The reflective electrodes RE1, RE2, and RE3 may include a first reflective electrode RE1 included in the first light emitting element ED-1, a second reflective electrode RE2 included in the second light emitting element ED-2, and a third reflective electrode RE3 included in the third light emitting element ED-3.

[0081] The first reflective electrode RE1, the second reflective electrode RE2, and the third reflective electrode RE3 may respectively include electrodes having a three-layer structure. The first reflective electrode RE1, the second reflective electrode RE2, and the third reflective electrode RE3 may respectively include first layers E1-1, E1-2, and E1-3, second layers E2-1, E2-2, and E2-3, and third layers E3-1, E3-2, and E3-3 stacked in sequence. The first layers E1-1, E1-2, and E1-3, and the third layers E3-1, E3-2, and E3-3 may each include a transparent conductive oxide. The first layers E1-1, E1-2, and E1-3, and the third layers E3-1, E3-2, and E3-3 may each include an indium tin oxide (ITO), indium zinc oxide (IZO), indium gallium zinc oxide (IGZO), zinc oxide (ZnO x ) or indium oxide (In 2 O 3 ) and aluminum-doped zinc oxide (AZO). For example, the first layers E1-1, E1-2 and E1-3 and the third layers E3-1, E3-2 and E3-3 may each include indium tin oxide (ITO) or indium zinc oxide (IZO).

[0082] The second layers E2-1, E2-2 and E2-3 may include a reflective metal material. The second layers E2-1, E2-2 and E2-3 may include a metal with high reflectivity, an oxide of a metal with high reflectivity, a nitride of a metal with high reflectivity, etc. The second layers E2-1, E2-2 and E2-3 may include any one of Ag, Mg, Cu, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, Li, Ca, LiF / Ca, LiF / Al, Mo and Ti with high reflectivity. For example, the second layers E2-1, E2-2 and E2-3 may include Ag.

[0083] The transparent electrodes TE1, TE2, and TE3 may include a first transparent electrode TE1 included in the first light emitting element ED-1, a second transparent electrode TE2 included in the second light emitting element ED-2, and a third transparent electrode TE3 included in the third light emitting element ED-3.

[0084] The first transparent electrode TE1, the second transparent electrode TE2, and the third transparent electrode TE3 may each include a transparent conductive oxide. The first transparent electrode TE1, the second transparent electrode TE2, and the third transparent electrode TE3 may each include an indium tin oxide (ITO), indium zinc oxide (IZO), indium gallium zinc oxide (IGZO), zinc oxide (ZnO x ) or indium oxide (In 2 O 3 ) and aluminum-doped zinc oxide (AZO). For example, the first transparent electrode TE1, the second transparent electrode TE2, and the third transparent electrode TE3 may each include indium tin oxide (ITO) or indium zinc oxide (IZO).

[0085] The inorganic film TCF is located between at least some of the reflective electrodes RE1, RE2, and RE3 and the transparent electrodes TE1, TE2, and TE3. The inorganic film TCF may be located between at least some of the reflective electrodes RE1, RE2, and RE3 and the transparent electrodes TE1, TE2, and TE3, and thus the resonance distance of each of the first light emitting element ED-1, the second light emitting element ED-2, and the third light emitting element ED-3 may be controlled. The inorganic film TCF may be located between at least some of the reflective electrodes RE1, RE2, and RE3 and the transparent electrodes TE1, TE2, and TE3, and thus the reflective electrodes RE1, RE2, and RE3 and the transparent electrodes TE1, TE2, and TE3 may be spaced apart from each other, thereby being designed to achieve an optimal resonance frequency that causes optical resonance by light emitted by the first light emitting element ED-1, the second light emitting element ED-2, and the third light emitting element ED-3, respectively.

[0086] At the same time, Figure 4 , Figure 5A and Figure 5B Different from the above, the lower electrodes LE1, LE2 and LE3 may include only the reflective electrodes RE1, RE2 and RE3, and may not include the transparent electrodes TE1, TE2 and TE3. The lower electrodes LE1, LE2 and LE3 may include the reflective electrodes RE1, RE2 and RE3, and the reflective electrodes RE1, RE2 and RE3 may include, for example, titanium oxide (TiO x ). At least a portion of the inorganic film TCF may be located on the reflective electrodes RE1, RE2, and RE3.

[0087] The inorganic film TCF may include a first inorganic film TCF1 and a second inorganic film TCF2. The first inorganic film TCF1 is located between the first reflective electrode RE1 and the first transparent electrode TE1. The second inorganic film TCF2 may be located between the first reflective electrode RE1 and the first transparent electrode TE1. The second inorganic film TCF2 may be located between the second reflective electrode RE2 and the second transparent electrode TE2. The first inorganic film TCF1 may not be located between the second reflective electrode RE2 and the second transparent electrode TE2 and between the third reflective electrode RE3 and the third transparent electrode TE3. The second inorganic film TCF2 may not be located between the third reflective electrode RE3 and the third transparent electrode TE3.

[0088] The first inorganic film TCF1 and the second inorganic film TCF2 may all be located between the first reflective electrode RE1 and the first transparent electrode TE1, and thus the first reflective electrode RE1 and the first transparent electrode TE1 may be spaced apart from each other by a first distance d1 in the thickness direction of the display panel DP. The second inorganic film TCF2 may be located between the second reflective electrode RE2 and the second transparent electrode TE2, and thus the second reflective electrode RE2 and the second transparent electrode TE2 may be spaced apart from each other by a second distance d2 in the thickness direction of the display panel DP. The first distance d1 may be greater than the second distance d2. The inorganic film TCF may not be located between the third reflective electrode RE3 and the third transparent electrode TE3, and thus the third transparent electrode TE3 may be located directly on the third reflective electrode RE3.

[0089] The first inorganic film TCF1 may not be located between the second reflective electrode RE2 and the second transparent electrode TE2 and between the third reflective electrode RE3 and the third transparent electrode TE3, and may be spaced apart from each of the second reflective electrode RE2 and the third reflective electrode RE3. The first inorganic film TCF1 may be spaced apart from the second reflective electrode RE2 and have a first gap GP1 between the first inorganic film TCF1 and the second reflective electrode RE2. The first inorganic film TCF1 may be spaced apart from the third reflective electrode RE3 and have a second gap GP2 between the first inorganic film TCF1 and the third reflective electrode RE3. The second inorganic film TCF2 may not be located between the third reflective electrode RE3 and the third transparent electrode TE3, and may be spaced apart from the third reflective electrode RE3. The second inorganic film TCF2 may be spaced apart from the third reflective electrode RE3 and have a second gap GP2 between the second inorganic film TCF2 and the third reflective electrode RE3. The first gap GP1 and the second gap GP2 may each be, for example, about 2 μm or less.

[0090] The transparent electrodes TE1, TE2, and TE3 may contact the reflective electrodes RE1, RE2, and RE3. The transparent electrodes TE1, TE2, and TE3 may contact the reflective electrodes RE1, RE2, and RE3 to provide a hole transport region HTR (see FIG. 1 ) located on the transparent electrodes TE1, TE2, and TE3. Fig. 7A ) provides charges. At the same time, since the first inorganic film TCF1 and the second inorganic film TCF2 are located between the first reflective electrode RE1 and the first transparent electrode TE1, the first transparent electrode TE1 can contact the first reflective electrode RE1 through the first contact member CH1 passing through the first inorganic film TCF1 and the second inorganic film TCF2. Since the second inorganic film TCF2 is located between the second reflective electrode RE2 and the second transparent electrode TE2, the second transparent electrode TE2 can contact the second reflective electrode RE2 through the second contact member CH2 passing through the second inorganic film TCF2.

[0091] The first inorganic film TCF1 may cover the upper surface and the side surface of the first reflective electrode RE1. The first inorganic film TCF1 may completely cover the remaining portion and the side surface of the upper surface of the first reflective electrode RE1 except for the portion corresponding to the first contact CH1. The second inorganic film TCF2 may cover the upper surface and the side surface of the second reflective electrode RE2. The second inorganic film TCF2 may completely cover the remaining portion and the side surface of the upper surface of the second reflective electrode RE2 except for the portion corresponding to the second contact CH2.

[0092] The first inorganic film TCF1 and the second inorganic film TCF2 each include an inorganic material. The first inorganic film TCF1 and the second inorganic film TCF2 may each include silicon oxide (SiO x ), silicon nitride (SiN x ) and silicon oxynitride (SiO x N y The first inorganic film TCF1 and the second inorganic film TCF2 may each include, for example, silicon oxide (SiO x ).

[0093] The display element layer DP-ED of the display panel DP may include a pixel defining film PDL. The pixel defining film PDL may be located on at least a portion of the lower electrodes LE1, LE2, and LE3 and on the inorganic film TCF. The pixel defining film PDL may partially cover each of the transparent electrodes TE1, TE2, and TE3 (e.g., cover the edges of the transparent electrodes TE1, TE2, and TE3). The pixel defining film PDL may include a pixel opening that at least partially exposes the upper surface of each of the transparent electrodes TE1, TE2, and TE3 included in the lower electrodes LE1, LE2, and LE3, and the pixel opening may define a first light emitting region PXA-1, a second light emitting region PXA-2, and a third light emitting region PXA-3.

[0094] The pixel definition film PDL may include an inorganic material. The pixel definition film PDL may include silicon oxide (SiO x ), silicon nitride (SiN x ) and silicon oxynitride (SiO x N y The pixel definition film PDL may include, for example, silicon oxide (SiO x ).

[0095] The side surfaces of the pixel-defining film PDL that defines the pixel opening may each have a predetermined cone angle. The side surfaces of the pixel-defining film PDL may each have a cone angle of about 40° or more. The side surfaces of the pixel-defining film PDL may each have a cone angle of, for example, about 75° to about 90°. Since the pixel-defining film PDL includes an inorganic material, the side surfaces of the pixel-defining film PDL may each have a large cone angle of about 75° or more.

[0096] The first inorganic film TCF1 and the second inorganic film TCF2 may each have a thickness of, for example, about to about The pixel definition film PDL may have a thickness of, for example, about to about Thickness.

[0097] In the first light-emitting element ED-1, the second light-emitting element ED-2, and the third light-emitting element ED-3, the organic layer OL may be provided as a common layer. The organic layer OL may include at least one light-emitting layer. The first light-emitting element ED-1, the second light-emitting element ED-2, and the third light-emitting element ED-3 may be light-emitting elements having a tandem structure. The organic layer OL may overlap with the first light-emitting area PXA-1, the second light-emitting area PXA-2, and the third light-emitting area PXA-3 and the non-light-emitting area NPXA. Meanwhile, in the present specification, the wording “one component overlaps with another component” includes not only that the two components have the same area and the same shape on a plane or in a plan view, but also that the two components have different areas and / or different shapes. The organic layer OL may include at least a plurality of light-emitting layers EML-1, EML-2, and EML-3 (see Fig. 7A ). The organic layer OL will be described in more detail later.

[0098] In the first light-emitting element ED-1, the second light-emitting element ED-2, and the third light-emitting element ED-3, the upper electrode UE may be provided as a common electrode. The upper electrode UE may be a common layer overlapping all of the first light-emitting region PXA-1, the second light-emitting region PXA-2, and the third light-emitting region PXA-3 and the non-light-emitting region NPXA, and has an integral shape. Meanwhile, in the present specification, the upper electrode UE located on the organic layer OL may refer to a "cathode".

[0099] The cap layer CPL may be located on the upper electrode UE. The cap layer CPL may include a single layer or a plurality of layers. The cap layer CPL may be an organic layer or an inorganic layer. For example, when the cap layer CPL includes an inorganic material, the inorganic material may include an alkali metal compound such as LiF, an alkali metal compound such as MgF 2 、SiON、SiN x 、SiO y In contrast, when the cap layer CPL includes an organic material, the organic material may include α-NPD, NPB, TPD, m-MTDATA, Alq 3 , CuPc, TPD15 (N4,N4,N4',N4'-tetrakis(biphenyl-4-yl)biphenyl-4,4'-diamine), TCTA (4,4',4"-tris(carbazole-9-yl)triphenylamine), etc., or may include epoxy resins or acrylates such as methacrylates.

[0100] The encapsulation layer TFE may be located on the display element layer DP-ED. The encapsulation layer TFE may protect the display element layer DP-ED from impurities such as moisture, oxygen, and dust particles. The encapsulation layer TFE may include at least one inorganic film (hereinafter, inorganic encapsulation film). In addition, the encapsulation layer TFE may include at least one organic film (hereinafter, organic encapsulation film) and at least one inorganic encapsulation film.

[0101] The inorganic encapsulation film can protect the display element layer DP-ED from moisture / oxygen, and the organic encapsulation film can protect the display element layer DP-ED from impurities such as dust particles. The inorganic encapsulation film may include silicon nitride, silicon oxynitride, silicon oxide, titanium oxide, aluminum oxide, etc., but is not particularly limited thereto. The organic encapsulation film may include an acrylic compound, an epoxy-based compound, etc. The organic encapsulation film may include an organic photosynthesizable material, but is not particularly limited thereto.

[0102] The color filter layer CFL may be located on the encapsulation layer TFE. The color filter layer CFL may include a first filter CF1 corresponding to the first light emitting area PXA-1, a second filter CF2 corresponding to the second light emitting area PXA-2, and a third filter CF3 corresponding to the third light emitting area PXA-3. According to some embodiments, the color filter layer CFL may further include a light blocking portion. The light blocking portion may be a black matrix. The light blocking portion may be formed to include an organic light blocking material or an inorganic light blocking material including a black pigment or a black dye. The light blocking portion may prevent light leakage and may separate adjacent filters CF1, CF2, and CF3.

[0103] The first filter CF1, the second filter CF2, and the third filter CF3 may each include a polymer photosensitive resin and a colorant. In this specification, the colorant includes a pigment and a dye. The red colorant includes a red pigment and a red dye, the green colorant includes a green pigment and a green dye, and the blue colorant includes a blue pigment and a blue dye.

[0104] exist Figure 4In the embodiment of the present invention, the first filter CF1 may include a red pigment and a red dye, the second filter CF2 may include a green pigment and a green dye, and the third filter CF3 may include a blue pigment and a blue dye. That is, the first filter CF1 located on the first light-emitting element ED-1 may include a red colorant, the second filter CF2 located on the second light-emitting element ED-2 may include a green colorant, and the third filter CF3 located on the third light-emitting element ED-3 may include a blue colorant. The overcoat layer OC is disposed on the color filter layer CFL and may cover each of the first color filter CF1, the second color filter CF2, and the third color filter CF3. The overcoat layer OC may make the upper surface of the color filter layer CFL flat. The overcoat layer OC may include an organic material.

[0105] Figure 6 is a cross-sectional view of a display panel according to some embodiments of the present disclosure. Figure 6 A display panel DP-1 according to some embodiments of the present disclosure is shown. Hereinafter, in the description of the display panel DP-1 according to some embodiments of the present disclosure, the same numbers or symbols will be given to the same configurations as those described above, and some repeated detailed descriptions thereof may be omitted.

[0106] refer to Figure 6 , in the display panel DP-1 according to some embodiments, the inorganic film TCF-1 included in the display element layer DP-ED may include a first inorganic film TCF1, a second inorganic film TCF2, and a third inorganic film TCF3.

[0107] The first inorganic film TCF1 is located between the first reflective electrode RE1 and the first transparent electrode TE1. The second inorganic film TCF2 may be located between the first reflective electrode RE1 and the first transparent electrode TE1. The second inorganic film TCF2 may be located between the second reflective electrode RE2 and the second transparent electrode TE2. The third inorganic film TCF3 may be located between the first reflective electrode RE1 and the first transparent electrode TE1. The third inorganic film TCF3 may be located between the second reflective electrode RE2 and the second transparent electrode TE2. The third inorganic film TCF3 may be located between the third reflective electrode RE3 and the third transparent electrode TE3. The third inorganic film TCF3 may be provided as a common layer.

[0108] The first inorganic film TCF1 may not be located between the second reflective electrode RE2 and the second transparent electrode TE2 and between the third reflective electrode RE3 and the third transparent electrode TE3. The second inorganic film TCF2 may not be located between the third reflective electrode RE3 and the third transparent electrode TE3.

[0109] The first to third inorganic films TCF1 to TCF3 may all be located between the first reflective electrode RE1 and the first transparent electrode TE1, the second and third inorganic films TCF2 and TCF3 may be located between the second reflective electrode RE2 and the second transparent electrode TE2, and the third inorganic film TCF3 may be located between the third reflective electrode RE3 and the third transparent electrode TE3.

[0110] The display panel according to some embodiments of the present disclosure includes an inorganic film disposed between a reflective electrode and a transparent electrode in at least one lower electrode, and thus can have a resonant structure suitable for the wavelength of light emitted by the light-emitting element, thereby achieving excellent display resolution and improved luminous efficiency. For example, according to some embodiments of the present disclosure, because the thickness of the first resonant electrode in the light-emitting element is designed according to the wavelength of the light to be output, the resonant distance can be controlled to have an optimal resonant frequency, thereby having excellent display resolution. At the same time, the inorganic film configured to control the resonant distance has a structure overlapping with the light-emitting element and is spaced apart from the reflective electrode of another light-emitting element. For example, as Figure 4 As shown in , the first inorganic film TCF1 located between the first reflective electrode RE1 and the first transparent electrode TE1 has a structure spaced apart from the second reflective electrode RE2 and the third reflective electrode RE3. Therefore, a large step difference in the pixel defining film including an inorganic material can be prevented, and thus the restriction of disconnection of the upper electrode located on the pixel defining film can be prevented. Therefore, the display panel according to some embodiments of the present disclosure can achieve high resolution and high luminous efficiency through an excellent optical resonance design, and the durability and reliability of the display panel can be improved.

[0111] Fig. 7A and Figure 7B is a cross-sectional view of a light emitting element according to some embodiments of the present disclosure. Fig. 7A and Figure 7B The organic layer OL included in the light emitting element ED according to some embodiments of the present disclosure is specifically shown. Fig. 7A and Figure 7B The description of the light emitting element ED described in the above can be applied to Figure 4 Each of the first light-emitting element ED-1, the second light-emitting element ED-2 and the third light-emitting element ED-3.

[0112] refer to Fig. 7A and Figure 7BAccording to some embodiments, the organic layer OL may include a hole transport region HTR, a first light emitting layer EML-1, an auxiliary light emitting portion EA, a second light emitting layer EML-2, a third light emitting layer EML-3, and an electron transport region ETR. In the light emitting element ED, the hole transport region HTR, the first light emitting layer EML-1, the auxiliary light emitting portion EA, the second light emitting layer EML-2, the third light emitting layer EML-3, and the electron transport region ETR may be set as a common layer. The light emitting element ED including the first light emitting layer EML-1, the second light emitting layer EML-2, and the third light emitting layer EML-3, which respectively generate light having different wavelength regions, may emit white light. According to some embodiments, the thickness of each of the hole transport region HTR, the auxiliary light emitting portion EA, and the electron transport region ETR included in the light emitting element ED may be set so that the red light, the green light, or the blue light has an nth resonance. At the same time, the above-mentioned inorganic film TCF (see Figure 4 ) so that the red light, green light or blue light emitted by each of the light emitting layers EML-1, EML-2 and EML-3 of the light emitting element ED has an n-th resonance.

[0113] The first light emitting layer EML-1, the second light emitting layer EML-2, and the third light emitting layer EML-3 set as a common layer can be deposited without any mask, and thus a pixel with a smaller area can be formed. In the display panel DP according to some embodiments, more pixels with a smaller area can be arranged on a plane or in a plan view, thereby achieving a relatively high resolution.

[0114] In the light emitting element ED, the hole transport region HTR may be disposed on the lower electrode LE and the inorganic film TCF. Fig. 7A and Figure 7B The lower electrode LE in the Figure 4 , Figure 5A and Figure 5BThe lower electrodes LE1, LE2 and LE3 described in the figure. The hole transport region HTR may have a single layer composed of a single material, a single layer composed of a plurality of different materials, or a multilayer structure having a plurality of layers composed of a plurality of different materials. For example, the hole transport region HTR may include a phthalocyanine compound such as copper phthalocyanine, DNTPD (N1,N1'-([1,1'-biphenyl]-4,4'-diyl)bis(N1-phenyl-N4,N4-di-m-toluene-1,4-diamine)), m-MTDATA (4,4',4"-[tri(3-tolyl)phenylamino]triphenylamine), TDATA (4,4',4"-tri(N,N-diphenylamino)triphenylamine), 2-TNATA (4,4',4"-tri[N(2-naphthyl)-N-phenylamino]-triphenylamine), PEDOT / PSS (poly(3,4-ethylenediamine) The invention relates to poly(4-styrene sulfonate)), PANI / DBSA (polyaniline / dodecylbenzenesulfonic acid), PANI / CSA (polyaniline / camphorsulfonic acid), PANI / PSS (polyaniline / poly(4-styrene sulfonate)), NPB (N,N'-di(naphthalene-l-yl)-N,N'-diphenyl-benzidine), TPAPEK (polyether ketone containing triphenylamine), 4-isopropyl-4'-methyldiphenyliodonium [tetrakis(pentafluorophenyl)borate], HATCN (dipyrazino[2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,11-hexanitrile), etc.

[0115] In addition, the hole transport region HTR may include carbazole-based derivatives such as N-phenylcarbazole and polyvinylcarbazole, fluorene-based derivatives, triphenylamine-based derivatives such as TPD (N,N'-bis(3-methylphenyl)-N,N'-diphenyl-[1,1'-biphenyl]-4,4'-diamine) and TCTA (4,4',4"-tri(N-carbazolyl)triphenylamine), TAPC (4,4'-cyclohexylenebis[N,N-bis(4-methylphenyl)- [N,N'-(3-methylphenyl)amino]-3,3'-dimethylbiphenyl]), CzSi (9-(4-tert-butylphenyl)-3,6-bis(triphenylsilyl)-9H-carbazole), CCP (9-phenyl-9H-3,9'-biscarbazole), mCP (1,3-bis(N-carbazolyl)benzene), mDCP (1,3-bis(1,8-dimethyl-9H-carbazole-9-yl)benzene), etc.

[0116] The hole transport region HTR may further include a charge generating material to improve the conductive properties, as well as the above-mentioned materials. The charge generating material may be uniformly or non-uniformly dispersed in the hole transport region HTR. The charge generating material may be, for example, a p-type dopant. The p-type dopant may include at least one of a halogenated metal compound, a quinone derivative, a metal oxide, and a cyano-containing compound, but is not limited thereto. For example, the p-type dopant may be a halogenated metal compound such as CuI and RbI, a quinone derivative such as TCNQ (tetracyanoquinodimethane) and F4-TCNQ (2,3,5,6-tetrafluoro-7,7',8,8'-tetracyanoquinodimethane), a metal oxide such as tungsten oxide and molybdenum oxide, a cyano group-containing compound such as HATCN (dipyrazino[2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,11-hexanitrile) and NDP9 (4-[[2,3-bis[cyano-(4-cyano-2,3,5,6-tetrafluorophenyl)methylene]cyclopropyl]-cyanomethyl]-2,3,5,6-tetrafluorobenzonitrile), but is not limited thereto according to embodiments of the present disclosure.

[0117] The hole transport region HTR may include a hole injection layer HIL, a first hole transport layer HTL, and a first sub-hole control layer AIL-1 stacked in sequence. Unlike what is shown, at least one of the hole injection layer HIL, the first hole transport layer HTL, and the first sub-hole control layer AIL-1 may be omitted. The hole injection layer HIL, the first hole transport layer HTL, and the first sub-hole control layer AIL-1 may include the compound of the hole transport region HTR as described above.

[0118] The first sub-hole control layer AIL-1 may be positioned adjacent to the first light-emitting layer EML-1 that generates the first light. The first sub-hole control layer AIL-1 may be formed to have a HOMO (highest occupied molecular orbital) energy level and a LUMO (lowest unoccupied molecular orbital) energy level that promote the movement of holes. Therefore, the driving voltage of the light-emitting element ED including the first sub-hole control layer AIL-1 may be prevented from increasing. In addition, the first sub-hole control layer AIL-1 may prevent electrons from moving from the first light-emitting layer EML-1 to the hole transport region HTR. Therefore, the display panel DP including the light-emitting element ED including the first sub-hole control layer AIL-1 may have an improved display lifespan.

[0119] The electron transport region ETR may be disposed on the auxiliary light emitting portion EA. The electron transport region ETR may have a single layer consisting of a single material, a single layer consisting of a plurality of different materials, or a multi-layered structure having a plurality of layers consisting of a plurality of different materials.

[0120] For example, the electron transport region ETR may include an anthracene-based compound, but is not limited thereto. The electron transport region ETR may include Alq3 (tris(8-hydroxyquinolinolato)aluminum), 1,3,5-tri[(3-pyridyl)-phenyl-3-yl]benzene, 2,4,6-tri(3'-(pyridin-3-yl)biphenyl-3-yl)-1,3,5-triazine, 2-(4-(N-phenylbenzimidazol-1-yl)phenyl)-9,10-dinaphthylanthracene, TPBi(1,3,5-tri(1-phenyl-1H-benzo[d]imidazol-2-yl)benzene), BCP(2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline), Bphen( 4,7-diphenyl-1,10-phenanthroline), TAZ (3-(4-biphenyl)-4-phenyl-5-tert-butylphenyl-1,2,4-triazole), NTAZ (4-(naphthalen-1-yl)-3,5-diphenyl-4H-1,2,4-triazole), tBu-PBD (2-(4-biphenyl)-5-(4-tert-butylphenyl)-1,3,4-oxadiazole), BAlq (bis(2-methyl-8-hydroxyquinolinolato-N1,O8)-(1,1'-biphenyl-4-ato)aluminum), BeBq 2 (bis(benzoquinolin-10-ato)beryllium), ADN(9,10-di(naphthalene-2-yl)anthracene), BmPyPhB(1,3-bis[3,5-di(pyridin-3-yl)phenyl]benzene) and mixtures thereof.

[0121] In addition, the electron transport region ETR may include a halogenated metal such as LiF, NaCl, CsF, RbCl, RbI, CuI, KI, a lanthanide metal such as Yb, or a co-deposited material of the above halogenated metals and lanthanide metals. For example, the electron transport region ETR may include KI:Yb, RbI:Yb, LiF:Yb, etc. as a co-deposited material. 2 Metal oxides of O and BaO, Liq (8-hydroxy-quinoline lithium), etc. can be used as electron transport regions ETR, but are not limited thereto according to the embodiments of the present disclosure. The electron transport region ETR may also be composed of a mixture of an electron transport material and an insulating organic metal salt. The organic metal salt may have an energy band gap of about 4 eV or greater. For example, the organic metal salt may include a metal acetate, a metal benzoate, a metal acetoacetate, a metal acetylacetonate, or a metal stearate.

[0122] The electron transport region ETR may further include at least one of BCP (2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline), TSPO1 (diphenyl(4-(triphenylsilyl)phenyl)phosphine oxide), and Bphen (4,7-diphenyl-1,10-phenanthroline) as well as the materials described above, but is not limited thereto according to embodiments of the present disclosure.

[0123] The electron transport region ETR may include a buffer layer BUF-3, a first electron transport layer ETL, and an electron injection layer EIL stacked in sequence. Unlike what is shown, at least one of the buffer layer BUF-3, the first electron transport layer ETL, and the electron injection layer EIL may be omitted. The buffer layer BUF-3, the first electron transport layer ETL, and the electron injection layer EIL may include the compound of the electron transport region ETR described above. The buffer layer BUF-3 may block holes from moving from the third light emitting layer EML-3 to the electron transport region ETR.

[0124] The auxiliary light emitting portion EA located between the first light emitting layer EML-1 and the second light emitting layer EML-2 may include a buffer layer BUF, a second electron transport layer ETL-A, a first charge generation layer nCGL, a second charge generation layer pCGL, a second hole transport layer HTL-A, and a second sub-hole control layer AIL-2. The first charge generation layer nCGL may be an n-type charge generation layer, and the second charge generation layer pCGL may be a p-type charge generation layer. Unlike what is shown, at least one of the buffer layer BUF, the second electron transport layer ETL-A, the first charge generation layer nCGL, the second charge generation layer pCGL, the second hole transport layer HTL-A, and the second sub-hole control layer AIL-2 may be omitted.

[0125] The second sub-hole control layer AIL-2 may include a material different from the first sub-hole control layer AIL-1. The second sub-hole control layer AIL-2 may include a material that helps generate the second light of the second light-emitting layer EML-2 or a material that helps generate the third light of the third light-emitting layer EML-3. The first sub-hole control layer AIL-1 may include a material that helps generate the first light of the first light-emitting layer EML-1, but is not limited thereto according to an embodiment of the present disclosure. The first sub-hole control layer AIL-1 and the second sub-hole control layer AIL-2 may include the same material.

[0126] The second sub-hole control layer AIL-2 may be positioned adjacent to the third light-emitting layer EML-3 generating the third light, or adjacent to the second light-emitting layer EML-2 generating the second light. The second sub-hole control layer AIL-2 may be formed to have a HOMO (highest occupied molecular orbital) energy level and a LUMO (lowest unoccupied molecular orbital) energy level that promote the movement of holes. Therefore, the driving voltage of the light-emitting element ED including the second sub-hole control layer AIL-2 may be prevented from increasing. In addition, the second sub-hole control layer AIL-2 may prevent electrons from moving from the second light-emitting layer EML-2 or the third light-emitting layer EML-3 to the second hole transport layer HTL-A. Therefore, the display panel DP including the light-emitting element ED including the second sub-hole control layer AIL-2 may have an improved display lifespan.

[0127] The upper electrode UE may be disposed on the organic layer OL. Fig. 7A and Figure 7B The upper electrode UE in may refer to Figure 4 The upper electrode UE described in . The upper electrode UE may include at least one selected from Ag, Mg, Cu, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, Li, Ca, LiF, Mo, Ti, W, In, Sn and Zn, a compound of two or more selected therefrom, a mixture of two or more selected therefrom, or an oxide of at least one selected therefrom. The upper electrode UE may be a transmissive electrode, a semi-transmissive electrode or a reflective electrode. When the upper electrode UE is a transmissive electrode, the upper electrode UE may be composed of a transparent metal oxide (e.g., indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium tin zinc oxide (IGZO)), etc.

[0128] When the upper electrode UE is a semi-transmissive electrode or a reflective electrode, the upper electrode UE may include Ag, Mg, Cu, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, Li, Ca, LiF / Ca, LiF / Al, Mo, Ti, Yb or W or a compound or mixture thereof (e.g., AgMg, AgYb or MgYb). Optionally, the upper electrode UE may have a structure having multiple layers, the multiple layers including a reflective film or a semi-transmissive film formed by the above materials and a transparent conductive film formed by indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium tin zinc oxide (ITZO), etc. For example, the upper electrode UE may include the above metal materials, a combination of two or more metal materials selected from the above metal materials, an oxide of the above metal materials, etc.

[0129] The cap layer CPL may be disposed on the upper electrode UE. The cap layer CPL may include a single layer or a plurality of layers. The cap layer CPL may be an organic layer or an inorganic layer. For example, when the cap layer CPL includes an inorganic material, the inorganic material may include an alkali metal compound such as LiF, an alkali metal compound such as MgF 2 、SiON、SiN x 、SiO y In contrast, when the cap layer CPL includes an organic material, the organic material may include α-NPD, NPB, TPD, m-MTDATA, Alq 3 , CuPc, TPD15 (N4,N4,N4',N4'-tetrakis(biphenyl-4-yl)biphenyl-4,4'-diamine), TCTA (4,4',4"-tris(carbazole-9-yl)triphenylamine), etc., or may include epoxy resins or acrylates such as methacrylates.

[0130] refer to Fig. 7A , according to some embodiments, the first light emitting layer EML-1 may be located on the hole transport region HTR. The second light emitting layer EML-2 may be located on the auxiliary light emitting portion EA. The third light emitting layer EML-3 may be located between the second light emitting layer EML-2 and the auxiliary light emitting portion EA. Figure 7B According to some embodiments, the first light emitting layer EML-1 may be located on the hole transport region HTR, the second light emitting layer EML-2 may be located on the auxiliary light emitting portion EA, and the third light emitting layer EML-3 may be located between the first light emitting layer EML-1 and the auxiliary light emitting portion EA. However, this is an example, and embodiments according to the present disclosure are not limited thereto.

[0131] The first light-emitting layer EML-1 may generate blue light, the second light-emitting layer EML-2 may generate red light, and the third light-emitting layer EML-3 may generate green light. Alternatively, the first light-emitting layer EML-1 may generate green light, the second light-emitting layer EML-2 may generate blue light, and the third light-emitting layer EML-3 may generate red light. Alternatively, the first light-emitting layer EML-1 may generate red light, the second light-emitting layer EML-2 may generate green light, and the third light-emitting layer EML-3 may generate blue light.

[0132] Hereinafter, a method for manufacturing a display panel according to some embodiments of the present disclosure will be described in more detail with reference to the accompanying drawings. In the description of the method for manufacturing a display panel according to some embodiments, descriptions repeated with the above description of the display panel according to some embodiments may be omitted.

[0133] Figure 8 is a flowchart of a method for manufacturing a display panel according to some embodiments of the present disclosure. 9A to 9H are cross-sectional views of some operations of a method for manufacturing a display panel according to some embodiments of the present disclosure. 9A to 9H The manufacturing methods are shown respectively. Figure 4 The corresponding sections in the display panel show the states of some operations of the method.

[0134] refer to Figure 8 , a method for manufacturing a display panel includes: an operation S100 of providing a preliminary display panel including a base layer, a first reflective electrode, and a second reflective electrode; an operation S200 of forming a first preliminary inorganic film covering each of the first reflective electrode and the second reflective electrode; and an operation S300 of forming a first inorganic film by patterning the first preliminary inorganic film to remove a portion of the first preliminary inorganic film formed on the second reflective electrode.

[0135] Reference together Figure 8 , Fig. 9A and Fig. 9BAccording to some embodiments, a method for manufacturing a display panel includes: an operation S100 of providing a preliminary display panel including a base layer BS and a plurality of reflective electrodes RE1, RE2, and RE3 located on the base layer BS; and an operation S200 of forming a first preliminary inorganic film by depositing an inorganic material on the preliminary display panel.

[0136] In the preliminary display panel, a circuit layer DP-CL may be located on the base layer BS, and a plurality of reflective electrodes RE1 , RE2 , and RE3 may be located on the circuit layer DP-CL.

[0137] The base layer BS may be a rigid substrate, or a flexible substrate that is bendable, foldable, or rollable. The base layer BS may be a glass substrate, a metal substrate, a polymer substrate, or the like. However, the embodiments of the present disclosure are not limited thereto, and the base layer BS may be an inorganic layer, an organic layer, or a composite material layer. The circuit layer DP-CL may include an insulating layer, a semiconductor pattern, a conductive pattern, a signal line, and the like. After forming the insulating layer, the semiconductor layer, and the conductive layer on the base layer BS by a method such as coating or deposition, the insulating layer, the semiconductor layer, and the conductive layer may be selectively patterned by multiple photolithography processes. Thereafter, the semiconductor pattern, the conductive pattern, and the signal line included in the circuit layer DP-CL may be formed.

[0138] The reflective electrodes RE1, RE2, and RE3 may be located on the circuit layer DP-CL and may include a first reflective electrode RE1, a second reflective electrode RE2, and a third reflective electrode RE3. The first reflective electrode RE1, the second reflective electrode RE2, and the third reflective electrode RE3 may be arranged to be spaced apart from each other. The first reflective electrode RE1, the second reflective electrode RE2, and the third reflective electrode RE3 may all be located on the circuit layer DP-CL. The first reflective electrode RE1, the second reflective electrode RE2, and the third reflective electrode RE3 may be located on the uppermost layer of a plurality of insulating layers included in the circuit layer DP-CL.

[0139] The first reflective electrode RE1, the second reflective electrode RE2, and the third reflective electrode RE3 may each include a first layer E1-1, E1-2, and E1-3, a second layer E2-1, E2-2, and E2-3, and a third layer E3-1, E3-2, and E3-3 stacked in sequence. The first reflective electrode RE1, the second reflective electrode RE2, and the third reflective electrode RE3 may each include an electrode having a three-layer structure in which the first layer E1-1, E1-2, and E1-3, the second layer E2-1, E2-2, and E2-3, and the third layer E3-1, E3-2, and E3-3 are stacked.

[0140] The first preliminary inorganic film TCF1-P may be formed by depositing an inorganic material. The first preliminary inorganic film TCF1-P may be formed to cover the upper surface and the side surface of each of the first reflective electrode RE1, the second reflective electrode RE2, and the third reflective electrode RE3. The inorganic material forming the first preliminary inorganic film TCF1-P may include silicon oxide (SiO x ), silicon nitride (SiN x ) and silicon oxynitride (SiO x N y ) at least one of.

[0141] Reference together Figure 8 , FIG. 9B to FIG. 9D , the method for manufacturing a display panel according to some embodiments includes operation S300 of forming a first inorganic film TCF1 by patterning a first preliminary inorganic film TCF1-P.

[0142] The operation of patterning the first preliminary inorganic film TCF1-P may include an operation of partially removing the first preliminary inorganic film TCF1-P using the photoresist pattern as a mask. In the method for manufacturing a display panel according to some embodiments, after forming a first photoresist pattern PR1 on the first preliminary inorganic film TCF1-P, the first preliminary inorganic film TCF1-P may be partially removed using the first photoresist pattern PR1 as a mask.

[0143] A first opening PR1-OP may be provided in the first photoresist pattern PR1, and a portion of the first preliminary inorganic film TCF1-P corresponding to the first opening PR1-OP may be removed. The first opening PR1-OP may be provided to overlap each of the second reflective electrode RE2 and the third reflective electrode RE3. Therefore, portions of the first preliminary inorganic film TCF1-P respectively overlapping the second reflective electrode RE2 and the third reflective electrode RE3 may be removed, and thus the first inorganic film TCF1 may be formed. Since the first opening PR1-OP is provided to overlap not only portions in which the second reflective electrode RE2 and the third reflective electrode RE3 are respectively arranged, but also portions adjacent to the second reflective electrode RE2 and the third reflective electrode RE3, the patterned first inorganic film TCF1 may be formed to be spaced apart from each of the second reflective electrode RE2 and the third reflective electrode RE3. The first inorganic film TCF1 may be spaced apart from the second reflective electrode RE2 with a first gap GP1 therebetween, and the first inorganic film TCF1 may be spaced apart from the third reflective electrode RE3 with a second gap GP2 therebetween.

[0144] The operation of patterning the first preliminary inorganic film TCF1-P may be performed through a dry etching process. The operation of patterning the first preliminary inorganic film TCF1-P may include an operation of removing a portion of the first preliminary inorganic film TCF1-P corresponding to the first opening PR1-OP through a dry etching process.

[0145] Reference together Fig.9D and Fig.9E , a method for manufacturing a display panel according to some embodiments may include an operation of forming a second preliminary inorganic film TCF2 -P after an operation of forming the first inorganic film TCF1 .

[0146] The second preliminary inorganic film TCF2-P may be formed by depositing an inorganic material. The second preliminary inorganic film TCF2-P may be formed to cover an upper portion of the first inorganic film TCF1 and to cover an exposed upper surface and an exposed side surface of each of the second reflective electrode RE2 and the third reflective electrode RE3. The inorganic material forming the second preliminary inorganic film TCF2-P may include silicon oxide (SiO x ), silicon nitride (SiN x ) and silicon oxynitride (SiO x N y ) at least one of.

[0147] Reference together FIG. 9E to FIG. 9G , the method for manufacturing a display panel according to some embodiments may include an operation of forming the second inorganic film TCF2 by patterning the second preliminary inorganic film TCF2-P.

[0148] The operation of patterning the second preliminary inorganic film TCF2-P may include an operation of partially removing the second preliminary inorganic film TCF2-P using the photoresist pattern as a mask. In the method for manufacturing a display panel according to some embodiments, after forming a second photoresist pattern PR2 on the second preliminary inorganic film TCF2-P, the second preliminary inorganic film TCF2-P may be partially removed using the second photoresist pattern PR2 as a mask.

[0149] A second opening PR2-OP may be provided in the second photoresist pattern PR2, and a portion of the second preliminary inorganic film TCF2-P corresponding to the second opening PR2-OP may be removed. The second opening PR2-OP may be provided to overlap with the third reflective electrode RE3. Therefore, a portion of the second preliminary inorganic film TCF2-P overlapping with the third reflective electrode RE3 may be removed, and thus the second inorganic film TCF2 may be formed. Since the second opening PR2-OP is provided to overlap not only with a portion in which the third reflective electrode RE3 is located but also with a portion adjacent to the third reflective electrode RE3, the patterned second inorganic film TCF2 may be formed to be spaced apart from the third reflective electrode RE3. The second inorganic film TCF2 may be spaced apart from the third reflective electrode RE3 and have a second gap GP2 between the second inorganic film TCF2 and the third reflective electrode RE3.

[0150] The operation of patterning the second preliminary inorganic film TCF2-P may be performed through a dry etching process. The operation of patterning the second preliminary inorganic film TCF2-P may include an operation of removing a portion of the second preliminary inorganic film TCF2-P corresponding to the second opening PR2-OP through a dry etching process.

[0151] refer to Figure 9G and Figure 9H , after the operation of forming the second inorganic film TCF2 , the operation of forming transparent electrodes TE1 , TE2 , and TE3 and the operation of forming a pixel defining layer PDL may be further included.

[0152] The transparent electrodes TE1, TE2, and TE3 may include a first transparent electrode TE1 located on the first reflective electrode RE1, a second transparent electrode TE2 located on the second reflective electrode RE2, and a third transparent electrode TE3 located on the third reflective electrode RE3. The first transparent electrode TE1 may be located on the first inorganic film TCF1 and the second inorganic film TCF2. The second transparent electrode TE2 may be located on the second inorganic film TCF2. The third transparent electrode TE3 may be directly located on the third reflective electrode RE3.

[0153] A pixel defining film PDL may be formed on at least a portion of the lower electrodes LE1, LE2, and LE3 and on the inorganic film TCF. The pixel defining film PDL may be formed to partially cover each of the transparent electrodes TE1, TE2, and TE3 (e.g., edges of the transparent electrodes TE1, TE2, and TE3). The pixel defining film PDL may be formed of an inorganic material. The pixel defining film PDL may be formed of a silicon oxide (SiO x ), silicon nitride (SiN x ) and silicon oxynitride (SiO x N y ) to form a pixel definition film PDL.

[0154] Some embodiments of the present disclosure include a display panel having a narrow distance between its lower electrodes, which can have a relatively high resolution and include an inorganic film located between a reflective electrode and a transparent electrode in at least one lower electrode to have a resonant structure suitable for the wavelength of light emitted by the light-emitting element, thereby achieving excellent display resolution and improved luminous efficiency. In addition, a large step difference in a pixel defining film including an inorganic material can be prevented, and thus the limitation of disconnection of an upper electrode located on the pixel defining film can be prevented. Therefore, the durability and reliability of the display panel can be relatively improved.

[0155] In the above, some aspects of the embodiments of the present disclosure have been described with reference to them, but those skilled in the art or those of ordinary skill in the relevant technical field can understand that various modifications and changes can be made to the disclosed embodiments without departing from the spirit and technical scope of the embodiments of the present disclosure described in the claims and their equivalents. Therefore, the technical scope of the embodiments of the present disclosure is not limited to the contents described in the specific embodiments of the specification, but should be determined by the claims and their equivalents.

Claims

1. A display panel, comprising: A base layer, comprising a display area and a non-display area, wherein the display area comprises a first light-emitting area, a second light-emitting area and a non-light-emitting area; a first lower electrode, on the base layer, overlapping the first light emitting region, and comprising a first reflective electrode and a first transparent electrode on the first reflective electrode; a second lower electrode, on the base layer, overlapping the second light emitting region, and comprising a second reflective electrode and a second transparent electrode on the second reflective electrode; as well as a first inorganic film overlapping the first light emitting region and at least partially between the first reflective electrode and the first transparent electrode, The first inorganic film is spaced apart from the second reflective electrode and a first gap is formed between the first inorganic film and the second reflective electrode.

2. The display panel according to claim 1, wherein: The first inorganic film covers an upper surface and side surfaces of the first reflective electrode.

3. The display panel according to claim 1, wherein: The first inorganic film includes at least one of silicon oxide, silicon nitride, and silicon oxynitride. 4 . The display panel of claim 1 , further comprising a second inorganic film overlapping the first and second light emitting regions and at least partially on the first and second reflective electrodes.

5. The display panel according to claim 4, wherein: The second inorganic film is respectively between the first reflective electrode and the first transparent electrode and between the second reflective electrode and the second transparent electrode.

6. The display panel according to claim 4, wherein: The display area also includes a third light emitting area, and The display panel further includes a third lower electrode, which is on the base layer, overlaps the third light emitting region, and includes a third reflective electrode and a third transparent electrode on the third reflective electrode.

7. The display panel according to claim 1, wherein: A first distance between the first reflective electrode and the first transparent electrode in a thickness direction of the display panel is greater than a second distance between the second reflective electrode and the second transparent electrode in the thickness direction.

8. The display panel according to claim 1, wherein: The first transparent electrode contacts the first reflective electrode through a first contact member passing through the first inorganic film.

9. A display panel, comprising: A base layer, comprising a display area and a non-display area, wherein the display area comprises a first light-emitting area, a second light-emitting area, a third light-emitting area and a non-light-emitting area; a first reflective electrode, on the base layer and overlapping the first light emitting area; a second reflective electrode, on the base layer and overlapping the second light emitting area; a third reflective electrode, on the base layer and overlapping the third light emitting area; a first inorganic film overlapping the first light emitting region and at least partially on the first reflective electrode; as well as a second inorganic film overlapping the first light emitting region and the second light emitting region and at least partially on the second reflective electrode, wherein the first inorganic film is spaced apart from the second reflective electrode and a first gap is formed between the first inorganic film and the second reflective electrode; and The second inorganic film is spaced apart from the third reflective electrode and has a second gap therebetween.

10. A method for manufacturing a display panel, the method comprising: providing a preliminary display panel, the preliminary display panel comprising a base layer, a first reflective electrode on the base layer, and a second reflective electrode on the base layer and spaced apart from the first reflective electrode; forming a first preliminary inorganic film to cover the first reflective electrode and the second reflective electrode respectively; as well as forming a first inorganic film by patterning the first preliminary inorganic film to remove a portion of the first preliminary inorganic film formed on the second reflective electrode, When the first inorganic film is formed, the first inorganic film and the second reflective electrode are patterned to be spaced apart from each other with a first gap therebetween.

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