Polishing solution supply automatic switching system

Abstract

The invention discloses a polishing solution supply automatic switching system which comprises two groups of polishing solution stations, three polishing machine tabletops, a solution supply pipeline and a valve, two ends of the solution supply pipeline are respectively connected with the polishing solution stations and the polishing machine tabletops, and when a first product is processed, rough polishing solution A of the first group of polishing solution stations is supplied to the polishing machine tabletops TB1 and TB2; the fine polishing liquid A is supplied to a polishing machine tabletop TB3, and the second group of polishing liquid stations do not supply liquid to the polishing machine; when a second product is processed, the rough polishing liquid B of the second group of polishing liquid station is supplied to the polishing machine table top TB1, the fine polishing liquid B of the second group of polishing liquid station is supplied to the polishing machine table tops TB2 and TB1, the fine polishing liquid C is supplied to the polishing machine table top TB3, and the first group of polishing liquid station does not supply liquid to the polishing machine; each liquid supply pipeline of the two groups of polishing liquid stations is provided with a polishing liquid circulation branch, and the polishing liquid internal circulation action is carried out under the condition that each liquid supply pipeline does not supply liquid to the polishing machine. According to the multi-purpose polishing machine, the function of machining different types of products through one polishing machine is achieved, and multiple purposes are achieved through one machine.

Description

Technical Field

[0001] The invention relates to an automatic switching system for supplying a polishing liquid, and belongs to the technical field of silicon wafer production and processing. Background Art

[0002] With the continuous updating and iteration of products on the production site, the processed products show a trend of diversification. When the polishing machine is performing silicon wafer polishing processing, the processing capacity specified when the machine was originally selected can no longer meet the actual production needs. According to the factory setting working conditions of the polishing machine, each polishing table is assigned a type of polishing liquid, which will result in a single machine processing product. If you want to achieve multiple uses of one machine and process more than two products, you can only replace the polishing liquid in the original one-to-one polishing liquid supply system according to the process requirements of the processed products. This not only affects production efficiency, but also the mixed contamination of the polishing liquid has fatal damage to the processed products, which is particularly prone to process abnormalities and product quality problems. How to achieve a polishing machine to process multiple products without stopping and causing process pollution needs to be solved urgently, so an automatic polishing liquid switching system is invented to meet the above production needs. Summary of the invention

[0003] In view of the above problems, the present invention provides an automatic switching system for polishing liquid supply to solve the problems existing in the prior art, realize the function of one polishing machine to process different types of products, change the defect of single processing of the polishing machine, and realize multiple uses of one machine.

[0004] To achieve the above object, the present invention adopts the following technical solutions: A polishing liquid supply automatic switching system, comprising two groups of polishing liquid stations, three polishing machine tables, and liquid supply pipelines and valves respectively connected to the polishing liquid stations and the polishing machine tables at both ends, wherein the first group of polishing liquid stations in the system comprises two liquid supply and storage devices of a rough polishing liquid A and a fine polishing liquid A, and the second group of polishing liquid stations comprises three liquid supply and storage devices of a rough polishing liquid B, a fine polishing liquid B and a fine polishing liquid C; When processing the first product, the first group of polishing liquid stations is used to supply liquid to the polishing machine. At this time, the rough polishing liquid A of the first group of polishing liquid stations is supplied to the polishing machine desktops TB1 and TB2, and the fine polishing liquid A is supplied to the polishing machine desktop TB3. The second group of polishing liquid stations does not supply liquid to the polishing machine; When processing the second product, the second group of polishing liquid stations is used to supply liquid to the polishing machine. At this time, the coarse polishing liquid B of the second group of polishing liquid stations is supplied to the polishing machine table TB1, the fine polishing liquid B is supplied to the polishing machine tables TB2 and TB1, and the fine polishing liquid C is supplied to the polishing machine table TB3. The first group of polishing liquid stations does not supply liquid to the polishing machine; Each liquid supply pipeline of the two groups of polishing liquid stations is provided with a polishing liquid circulation branch, and the polishing liquid is circulated internally when the liquid supply pipeline does not supply liquid to the polishing machine.

[0005] Furthermore, the liquid supply pipeline of the rough polishing liquid A includes a first liquid supply branch to the polishing machine table TB1 and a second liquid supply branch to the polishing machine table TB2; the rough polishing liquid A is output from the rough polishing liquid A liquid supply storage device through the liquid supply pump, and enters the first liquid supply branch through the first manual control valve, the liquid supply pump, and the filter in sequence, and then enters the polishing machine table TB1 through the second manual control valve, the first pneumatic control valve, the second pneumatic control valve and the third manual control valve; The rough polishing liquid A is output from the rough polishing liquid A supply and storage device through the liquid supply pump, passes through the first manual control valve, the liquid supply pump, and the filter in sequence to enter the second liquid supply branch, and then passes through the second manual control valve, the first pneumatic control valve, the second pneumatic control valve, and the third manual control valve to enter the polishing machine table TB2; The fine polishing liquid A is output from the fine polishing liquid A supply and storage device through the liquid supply pump, and enters the polishing machine table TB3 through the first manual control valve, the liquid supply pump, the filter, the second manual control valve, the first pneumatic control valve, the second pneumatic control valve and the third manual control valve in sequence.

[0006] Furthermore, a rough polishing liquid A return pipeline is provided between the rough polishing liquid A supply and storage device of the first group of polishing liquid stations and the polishing machine table. The rough polishing liquid A return pipeline is led out from the polishing machine tables TB1 and TB2. A conversion valve is provided on the rough polishing liquid A return pipeline. After the rough polishing liquid A flows out from the polishing machine tables TB1 and TB2, it passes through the conversion valve and enters the rough polishing liquid A discharge pipe for discharge or enters the rough polishing liquid A return pipeline and flows to the rough polishing liquid A supply and storage device.

[0007] Among them, the conversion valve is used to discharge the rough polishing liquid A and pure water mixture flowing out from the polishing machine tables TB1 and TB2 into the discharge pipe during the initial stage of polishing machine processing; after the initial processing stage is completed, the pure rough polishing liquid A is discharged into the recovery pipe to realize the recovery of the rough polishing liquid.

[0008] Further, the rough polishing liquid B is output from the rough polishing liquid B supply and storage device through the liquid supply pump, and sequentially passes through the first manual control valve, the liquid supply pump, the filter, the second manual control valve, the first pneumatic control valve, the second pneumatic control valve and the third manual control valve to enter the polishing machine table TB1; The liquid supply pipeline of the fine polishing liquid B includes a first liquid supply branch to the polishing machine table TB1 and a second liquid supply branch to the polishing machine table TB2; the fine polishing liquid B is output from the fine polishing liquid B liquid supply storage device through the liquid supply pump, and passes through the first manual control valve, the liquid supply pump, the filter, the second manual control valve, the first pneumatic control valve in sequence to enter the first liquid supply branch, and then passes through the second pneumatic control valve and the third manual control valve to enter the polishing machine table TB1; The fine polishing liquid B is output from the fine polishing liquid B supply and storage device through the liquid supply pump, and enters the second liquid supply branch through the first manual control valve, the liquid supply pump, the filter, the second manual control valve, the first pneumatic control valve, and then enters the polishing machine table TB2 through the second pneumatic control valve and the third manual control valve; The fine polishing liquid C is output from the fine polishing liquid C supply and storage device through the liquid supply pump, and enters the polishing machine table TB3 through the first manual control valve, the liquid supply pump, the filter, the second manual control valve, the first pneumatic control valve, the second pneumatic control valve, and the third manual control valve in sequence.

[0009] Furthermore, the polishing liquid circulation branch is arranged between the outlet of the liquid supply pump of the liquid supply pipeline and the polishing liquid supply storage device, and a manual control valve is arranged on the circulation branch.

[0010] Furthermore, there is no longer a fine polishing liquid return pipeline between the fine polishing liquid supply and storage device and the polishing machine table. The polishing machine table TB3 is provided with a drainage pipeline, and the fine polishing liquid is directly discharged from the polishing machine table TB3 during processing; when the polishing machine table TB2 supplies fine polishing liquid B, the fine polishing liquid B is discharged into the discharge pipe through the conversion valve.

[0011] Furthermore, when the second group of polishing liquid stations supply liquid, the polishing machine desktop TB1 supplies two polishing liquids, coarse polishing liquid B and fine polishing liquid B. The polishing machine desktop TB1 is provided with a drainage pipeline. During processing, the coarse polishing liquid B and the fine polishing liquid B are discharged into the discharge pipeline through the conversion valve.

[0012] Beneficial effects of the present invention: The automatic switching system for supplying polishing liquid of the present invention has two groups of polishing liquid stations. According to the actual products to be processed on site, the two groups of polishing liquids can currently meet production needs by using them alone. When processing the first product, the first group of polishing liquid stations is used to supply liquid to the polishing machine, and the second group of polishing liquid stations performs internal circulation of the polishing liquid; when processing the second product, the second group of polishing liquid stations is used to supply liquid to the polishing machine, and the first group of polishing liquid stations performs internal circulation of the polishing liquid. The two groups of liquid stations can automatically switch the liquid supply system, so that the processed products can be switched at any time without stopping the machine, thereby improving the efficiency of the machine and avoiding the quality degradation problem caused by process abnormalities of the product.

[0013] When one group of polishing liquid stations is supplying liquid, the valve on the liquid supply pipeline of the group of liquid stations is opened, and the valve of the circulation branch is closed. The other group of polishing liquid stations that do not supply liquid has only the circulation branch valve open to circulate the polishing liquid, while the valve on the liquid supply pipeline is closed. On the liquid supply pipeline of each group of polishing liquid stations, there are multi-level valve controls after the liquid supply pump to ensure that the group of liquid stations that do not supply liquid will not cause the problem of polishing liquid mixing due to damage to the valve of the liquid supply pipeline.

[0014] The automatic switching system for supplying polishing liquid of the present invention can also meet the requirement that two groups of polishing liquid stations work at the same time, and can be set according to the process requirements. For example, the rough polishing liquid A supply and storage device of the first group of polishing liquid stations is used to supply rough polishing liquid A to the polishing machine desktop TB1, and the fine polishing liquid B supply and storage device of the second group of polishing liquid stations is used to supply fine polishing liquid B to the polishing machine desktop TB2, and the fine polishing liquid A supply and storage device of the first group of polishing liquid stations is used to supply fine polishing liquid A to the polishing machine desktop TB3. According to this process, the processing and production of the third product can be realized. Therefore, the technical solution provided by the present invention can realize the processing conditions of more than two products and meet the production requirements of multiple products on the production line. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 The present invention is a schematic structural diagram of an automatic switching system for polishing liquid supply according to an embodiment of the present invention. DETAILED DESCRIPTION

[0016] The present invention will be further described below through the accompanying drawings and specific embodiments.

[0017] Figure 1 A schematic diagram of the structure of an automatic switching system for supplying polishing liquid of the present invention is given. The automatic switching system for supplying polishing liquid of the present invention is used for supplying polishing liquid when a polishing machine processes products. The system has two groups of polishing liquid stations, which can automatically switch the liquid supply system, so that the processed products can be switched at any time without stopping the machine, and the processing quality of the multi-purpose products of one machine is not affected while improving the efficiency of the machine.

[0018] like Figure 1 As shown, the polishing liquid automatic switching system includes two groups of polishing liquid stations 5 and 6, a polishing machine 4, and connecting pipes and valves between the two groups of polishing liquid stations and the polishing machine. The polishing machine 4 includes three polishing machine tables TB1, TB2, and TB3. The first group of polishing liquid stations 5 includes a fine polishing liquid A supply and storage device 10 and a rough polishing liquid A supply and storage device 20. The second group of polishing liquid stations 6 includes a fine polishing liquid C supply and storage device 11, a fine polishing liquid B supply and storage device 12, and a rough polishing liquid B supply and storage device 21.

[0019] A polishing liquid circulation branch is provided on the liquid supply pipeline of each group of polishing liquid stations. The starting point of the circulation branch is the outlet of each liquid supply pump and the end point is each liquid supply storage device. A manual control valve is provided on the circulation branch. When the group of liquid stations does not supply liquid, the circulation branch is opened, and the polishing liquid is output from the liquid supply storage device, and then flows back to the liquid supply storage device through the first manual control valve, the liquid supply pump and the circulation branch manual control valve in sequence, so as to realize the internal circulation of the polishing liquid, ensure the uniformity of the polishing liquid in the liquid supply storage device, and prevent the precipitation of the polishing liquid from causing process abnormalities.

[0020] According to the production situation, the use of two sets of polishing liquid stations corresponds to two different processed products, which are described below with a specific production example: When processing the first product, the first group of polishing liquid stations 5 are used to supply liquid to the polisher, the rough polishing liquid A is supplied to the polishing machine tables TB1 and TB2, the fine polishing liquid A is supplied to the polishing machine table TB3, and the second group of polishing liquid stations 6 do not supply liquid to the polisher. In this case, the liquid supply, return and discharge process of the polishing machine tables TB1, TB2, and TB3 is as follows: Liquid supply of polishing machine table TB1: Rough polishing liquid A is output from the rough polishing liquid A supply storage device 20 through the liquid supply pump 31, and enters the first liquid supply branch of the rough polishing liquid A supply pipeline in the direction of polishing machine table TB1 through the first manual control valve 103, the liquid supply pump 31, and the filter 51 in sequence, and then enters the polishing machine table TB1 through the second manual control valve 115, the first pneumatic control valve 305, the second pneumatic control valve 325 and the third manual control valve 125; Liquid supply of polishing machine table TB2: the rough polishing liquid A is output from the rough polishing liquid A supply storage device 20 through the liquid supply pump 31, and enters the second liquid supply branch of the rough polishing liquid A supply pipeline in the direction of the polishing machine table TB2 through the first manual control valve 103, the liquid supply pump 31, and the filter 51 in sequence, and then enters the polishing machine table TB2 through the second manual control valve 113, the first pneumatic control valve 303, the second pneumatic control valve 323 and the third manual control valve 123; Liquid supply of polishing machine table TB3: fine polishing liquid A is output from fine polishing liquid A supply and storage device 10 through liquid supply pump 30, and enters polishing machine table TB3 through first manual control valve 101, liquid supply pump 30, filter 50, second manual control valve 111, first pneumatic control valve 301, second pneumatic control valve 321 and third manual control valve 121 in sequence; Liquid return of polishing machine desktops TB1 and TB2: A conversion valve 73 is provided on the liquid return pipeline of polishing machine desktop TB1, and a conversion valve 71 is provided on the liquid return pipeline of polishing machine desktop TB2. The conversion valve 73 can discharge the rough polishing liquid A and pure water mixture flowing out of the polishing machine desktop TB1 into the discharge pipeline 95 in the initial stage of polishing machine processing; the conversion valve 71 can discharge the rough polishing liquid A and pure water mixture flowing out of the polishing machine desktop TB2 into the discharge pipeline 93 in the initial stage of polishing machine processing. After the primary processing stage is completed, the conversion valves 71 and 73 will switch to flow the pure rough polishing liquid A from the polishing machine desktops TB1 and TB2 to the liquid return pipeline, and rely on the height difference between the liquid station and the polishing machine to flow back to the rough polishing liquid A liquid supply and storage device 20 by gravity. The rough polishing liquid A is output from the polishing machine table TB1 and enters the rough polishing liquid A return line through the conversion valve 73; the rough polishing liquid A is output from the polishing machine table TB2 and enters the rough polishing liquid A return line through the conversion valve 71. The rough polishing liquids A of the two tables are collected into one path after passing through the conversion valve and flow into the rough polishing liquid A supply and storage device 20; Liquid discharge from polishing machine table TB3: After being discharged from polishing machine table TB3, fine polishing liquid A enters the discharge pipe along the discharge pipe 91 and is no longer recovered.

[0021] When the polishing liquid station 5 supplies liquid to the polishing machine, the manual control valve 102 of the circulation branch of the rough polishing liquid A supply and storage device 20 and the manual control valve 100 of the circulation branch of the fine polishing liquid A supply and storage device 10 are closed, and the circulation branches do not work.

[0022] The polishing liquid station 6 does not supply liquid to the polishing machine, but performs internal circulation of the polishing liquid. The first manual control valve 105, the liquid supply pump 32, and the manual control valve 104 of the circulation branch related to the liquid supply and storage device 11 of the fine polishing liquid C are in an open state, and the second manual control valve 131 and the first pneumatic control valve 311 of its liquid supply pipeline are in a closed state; the first manual control valve 107, the liquid supply pump 33, and the manual control valve 106 of the circulation branch related to the liquid supply and storage device 12 of the fine polishing liquid B are in an open state, and the second manual control valve 133 and the first pneumatic control valve 313 of its liquid supply pipeline are in a closed state; the first manual control valve 109, the liquid supply pump 34, and the manual control valve 108 of the circulation branch related to the liquid supply and storage device 21 of the rough polishing liquid B are in an open state, and the second manual control valve 135 and the first pneumatic control valve 315 of its liquid supply pipeline are in a closed state.

[0023] When processing the second product, the second group of polishing liquid stations 6 are used to supply liquid to the polishing machine, the rough polishing liquid B is supplied to the polishing machine table TB1, the fine polishing liquid B is supplied to the polishing machine tables TB2 and TB1, and the fine polishing liquid C is supplied to the polishing machine table TB3. The first group of polishing liquid stations 5 do not supply liquid to the polishing machine. In this case, the liquid supply and discharge process of the polishing machine tables TB1, TB2, and TB3 is as follows: Liquid supply of polishing machine desktop TB1: coarse polishing liquid B is output from coarse polishing liquid B liquid supply storage device 21 through liquid supply pump 34, and enters polishing machine desktop TB1 through first manual control valve 109, liquid supply pump 34, filter 54, second manual control valve 135, first pneumatic control valve 315, second pneumatic control valve 325 and third manual control valve 125 in sequence; fine polishing liquid B is output from fine polishing liquid B liquid supply storage device 12 through liquid supply pump 33, and enters first liquid supply branch of fine polishing liquid B liquid supply pipeline in the direction of polishing machine desktop TB1 through first manual control valve 107, liquid supply pump 33, filter 53, second manual control valve 133 and first pneumatic control valve 313 in sequence, and then enters polishing machine desktop TB1 through second pneumatic control valve 327 and third manual control valve 127; Liquid supply of polishing machine table TB2: fine polishing liquid B is output from the fine polishing liquid B liquid supply storage device 12 through the liquid supply pump 33, and sequentially passes through the first manual control valve 107, the liquid supply pump 33, the filter 53, the second manual control valve 133, and the first pneumatic control valve 313 to enter the second liquid supply branch of the fine polishing liquid B liquid supply pipeline in the direction of the polishing machine table TB2, and then passes through the second pneumatic control valve 323 and the third manual control valve 123 to enter the polishing machine table TB2; Liquid supply of polishing machine table TB3: the fine polishing liquid C is output from the fine polishing liquid C liquid supply storage device 11 through the liquid supply pump 32, and sequentially passes through the first manual control valve 105, the liquid supply pump 32, the filter 52, the second manual control valve 131, the first pneumatic control valve 311, the second pneumatic control valve 321, and the third manual control valve 121 to enter the polishing machine table TB3; The polishing liquids on the three polishing machine tables are not recycled. The coarse polishing liquid B and the fine polishing liquid B on the polishing machine table TB1 are discharged into the discharge pipe 95 through the conversion valve 73, the fine polishing liquid B on the polishing machine table TB2 is discharged into the discharge pipe 93 through the conversion valve 71, and the fine polishing liquid C on the polishing machine table TB3 is discharged into the discharge pipe 91.

[0024] When the polishing liquid station 6 supplies liquid to the polishing machine, the manual control valve 108 of the circulation branch of the coarse polishing liquid B supply and storage device 21, the manual control valve 106 of the circulation branch of the fine polishing liquid B supply and storage device 12, and the manual control valve 104 of the circulation branch of the fine polishing liquid C supply and storage device 11 are in closed state, and the circulation branches do not work.

[0025] The polishing liquid station 5 does not supply liquid to the polishing machine, but performs internal circulation of the polishing liquid. The first manual control valve 101, the liquid supply pump 30, and the manual control valve 100 of the circulation branch related to the liquid supply and storage device 10 of the fine polishing liquid A are in an open state, and the second manual control valve 111 and the first pneumatic control valve 301 of its liquid supply pipeline are in a closed state; the first manual control valve 103, the liquid supply pump 31, and the manual control valve 102 of the circulation branch related to the liquid supply and storage device 20 of the rough polishing liquid A are in an open state, the second manual control valve 115 and the first pneumatic control valve 305 of the first liquid supply branch of the rough polishing liquid A supply pipeline in the direction of the polishing machine desktop TB1 are closed, and the second manual control valve 113 and the first pneumatic control valve 303 of the second liquid supply branch of the rough polishing liquid A supply pipeline in the direction of the polishing machine desktop TB2 are closed.

[0026] The setting of the second manual control valve in the system ensures that when one group of liquid stations is supplying liquid, the liquid supply pipeline of the other group of liquid stations will not be supplied with liquid due to the failure of the first pneumatic control valve. If the first pneumatic control valve fails and there is no second manual control valve, the other group of circulating liquid stations will supply liquid, which will cause mixing accidents of the polishing liquid and cause process abnormalities.

[0027] The manual control valve and the pneumatic control valve are preferably made of PFA material, and the liquid supply pump is preferably a diaphragm pump that is resistant to acid and alkali corrosion.

[0028] The branch input end of the liquid supply pipeline and the input end of the circulation branch are connected through a tee.

[0029] When there is no production task, the manual control valves of each circulation branch of the polishing liquid station are in the open state to carry out the internal circulation of the polishing liquid.

[0030] The automatic switching system for polishing liquid supply also includes filters 50, 51, 52, 53, and 54, which are installed at the corresponding outlets of the liquid supply pumps. The installation of the filters is directional, and the inlet of the filters is connected to the outlet of the liquid supply pump, and the outlet of the filters is connected to the three tables of the polishing machine. During the liquid supply process, the filters can filter impurities in the polishing liquid, improve the supply quality of the polishing liquid, and ensure the processing effect.

[0031] The liquid supply pump, the first pneumatic control valve, the second pneumatic control valve and the conversion valve are all connected to the polishing machine control system. The control system can realize the liquid control of the liquid station according to the requirements of the process formula. Different process formulas are selected according to different processed products. When the process formula is set, the control system issues corresponding control instructions to the liquid station.

[0032] Due to the adoption of the above technical solution, the automatic switching system for polishing liquid supply has two groups of polishing liquid stations. According to the actual products processed on site, the two groups of polishing liquid can currently meet production needs by using them alone. When one group of polishing liquid stations is supplying liquid, the valve on the liquid supply pipeline of this group of liquid stations is opened, and the valve of the circulation branch is closed. The other group of polishing liquid stations that do not supply liquid has only the circulation branch valve open to perform the internal circulation of the polishing liquid, while the valve on the liquid supply pipeline is closed. On the liquid supply pipeline of each group of polishing liquid stations, multi-stage valve control is provided after the liquid supply pump to ensure that the group of liquid stations that do not supply liquid will not cause the problem of polishing liquid supply mixing due to damage to the valve of the liquid supply pipeline. The two groups of liquid stations can automatically switch the liquid supply system, so that the processed products can be switched at any time without stopping the machine, which improves the efficiency of the machine and avoids the quality decline caused by process abnormalities of the product.

[0033] The automatic switching system for polishing liquid supply can also realize the working of two groups of polishing liquid stations, so as to meet the processing of the third and fourth types of products, or even the processing of more types of products. A specific embodiment is used to illustrate: according to the process requirements, for example, the rough polishing liquid A supply and storage device of the first group of polishing liquid stations is used to supply rough polishing liquid A to the polishing machine table TB1, and the fine polishing liquid B supply and storage device of the second group of polishing liquid stations is used to supply fine polishing liquid B to the polishing machine table TB2, and the fine polishing liquid A supply and storage device of the first group of polishing liquid stations is used to supply fine polishing liquid A to the polishing machine table TB3, so as to realize the processing and production of another product.

[0034] The above is a detailed description of the embodiments of the present invention. The present invention realizes the function of processing different types of products by one polishing machine, achieving the effect of one machine with multiple uses. While improving work efficiency, it reduces the risk of product process abnormalities, ensures product quality, changes the single product processing mode, and meets actual production tasks.

Claims

1. A polishing liquid supply automatic switching system, characterized in that: The polishing liquid automatic switching system comprises two groups of polishing liquid stations, three polishing machine tables, and liquid supply pipelines and valves respectively connected to the polishing liquid stations and the polishing machine tables at both ends. In the system, the first group of polishing liquid stations (5) comprises two liquid supply and storage devices, namely, rough polishing liquid A and fine polishing liquid A, and the second group of polishing liquid stations (6) comprises three liquid supply and storage devices, namely, rough polishing liquid B, fine polishing liquid B and fine polishing liquid C. When processing the first product, the first group of polishing liquid stations (5) are used to supply liquid to the polishing machine. At this time, the rough polishing liquid A of the first group of polishing liquid stations (5) is supplied to the polishing machine tables TB1 and TB2, and the fine polishing liquid A is supplied to the polishing machine table TB3. The second group of polishing liquid stations does not supply liquid to the polishing machine. When processing the second product, the second polishing liquid station (6) is used to supply liquid to the polishing machine. At this time, the coarse polishing liquid B of the second polishing liquid station (6) is supplied to the polishing machine table TB1, the fine polishing liquid B is supplied to the polishing machine tables TB2 and TB1, and the fine polishing liquid C is supplied to the polishing machine table TB3. The first polishing liquid station (5) does not supply liquid to the polishing machine. Each liquid supply pipeline of the two groups of polishing liquid stations is provided with a polishing liquid circulation branch, and the polishing liquid is circulated internally when the liquid supply pipeline does not supply liquid to the polishing machine.

2. The polishing liquid supply automatic switching system according to claim 1 is characterized in that: The liquid supply pipeline of the rough polishing liquid A comprises a first liquid supply branch to the polishing machine table TB1 and a second liquid supply branch to the polishing machine table TB2; the rough polishing liquid A is output from the rough polishing liquid A supply storage device (20) through a liquid supply pump (31), passes through a first manual control valve (103), a liquid supply pump (31), and a filter (51) in sequence to enter the first liquid supply branch, and then passes through a second manual control valve (115), a first pneumatic control valve (305), a second pneumatic control valve (325), and a third manual control valve (125) to enter the polishing machine table TB1; The rough polishing liquid A is output from the rough polishing liquid A supply and storage device (20) through the liquid supply pump (31), passes through the first manual control valve (103), the liquid supply pump (31), and the filter (51) in sequence to enter the second liquid supply branch, and then passes through the second manual control valve (113), the first pneumatic control valve (303), the second pneumatic control valve (323), and the third manual control valve (123) to enter the polishing machine table TB2; The fine polishing liquid A is output from the fine polishing liquid A supply and storage device (10) through the liquid supply pump (30), and sequentially passes through the first manual control valve (101), the liquid supply pump (30), the filter (50), the second manual control valve (111), the first pneumatic control valve (301), the second pneumatic control valve (321) and the third manual control valve (121) to enter the polishing machine table TB3.

3. The polishing liquid supply automatic switching system according to claim 2 is characterized in that: A return line for rough polishing liquid A is provided between the rough polishing liquid A supply and storage device (20) of the first group of polishing liquid stations (5) and the polishing machine table. The return line for rough polishing liquid A is led out from the polishing machine tables TB1 and TB2. A conversion valve is provided on the return line for rough polishing liquid A. After the rough polishing liquid A flows out from the polishing machine tables TB1 and TB2, it passes through the conversion valve and enters the discharge pipe for rough polishing liquid A for discharge or enters the return line for rough polishing liquid A to flow to the supply and storage device for rough polishing liquid A.

4. The polishing liquid supply automatic switching system according to claim 3 is characterized in that: The conversion valve is used to discharge the rough polishing liquid A and pure water mixture flowing out from the polishing machine tables TB1 and TB2 into the discharge pipe during the initial processing stage of the polishing machine; after the initial processing stage is completed, the pure rough polishing liquid A is discharged into the recovery pipe to realize the recovery of the rough polishing liquid.

5. The polishing liquid supply automatic switching system according to claim 1 is characterized in that: The rough polishing liquid B is output from the rough polishing liquid B supply and storage device (21) through the liquid supply pump (34), and sequentially passes through the first manual control valve (109), the liquid supply pump (34), the filter (54), the second manual control valve (135), the first pneumatic control valve (315), the second pneumatic control valve (325) and the third manual control valve (125) to enter the polishing machine table TB1; The liquid supply pipeline of the fine polishing liquid B comprises a first liquid supply branch to the polishing machine table TB1 and a second liquid supply branch to the polishing machine table TB2; the fine polishing liquid B is output from the fine polishing liquid B liquid supply storage device (12) through a liquid supply pump (33), passes through a first manual control valve (107), a liquid supply pump (33), a filter (53), a second manual control valve (133), and a first pneumatic control valve (313) in sequence to enter the first liquid supply branch, and then passes through a second pneumatic control valve (327) and a third manual control valve (127) to enter the polishing machine table TB1; The fine polishing liquid B is output from the fine polishing liquid B supply and storage device (12) through the liquid supply pump (33), passes through the first manual control valve (107), the liquid supply pump (33), the filter (53), the second manual control valve (133), the first pneumatic control valve (313) in sequence, enters the second liquid supply branch, and then passes through the second pneumatic control valve (323) and the third manual control valve (123) to enter the polishing machine table TB2; The fine polishing liquid C is output from the fine polishing liquid C supply and storage device (11) through the liquid supply pump (32), and sequentially passes through the first manual control valve (105), the liquid supply pump (32), the filter (52), the second manual control valve (131), the first pneumatic control valve (311), the second pneumatic control valve (321), and the third manual control valve (121) to enter the polishing machine table TB3.

6. The polishing liquid supply automatic switching system according to claim 1, characterized in that: The polishing liquid circulation branch is arranged between the outlet of the liquid supply pump of the liquid supply pipeline and the polishing liquid supply storage device, and a manual control valve is arranged on the circulation branch.

7. The polishing liquid supply automatic switching system according to claim 2 or 5, characterized in that: There is no longer a fine polishing liquid return pipeline between the fine polishing liquid supply and storage device and the polishing machine table. The polishing machine table TB3 is provided with a drainage pipeline, and the fine polishing liquid is directly discharged from the polishing machine table TB3 during processing; when the polishing machine table TB2 supplies fine polishing liquid B, the fine polishing liquid B is discharged into the discharge pipe through the conversion valve.

8. The polishing liquid supply automatic switching system according to claim 1 or 5, characterized in that: When the second group of polishing liquid stations supply liquid, the polishing machine desktop TB1 supplies two polishing liquids, rough polishing liquid B and fine polishing liquid B. The polishing machine desktop TB1 is provided with a drainage pipeline. During processing, the rough polishing liquid B and the fine polishing liquid B are discharged into the discharge pipeline through the conversion valve.

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