Film layer preparation method for removing waterproof film layer

Abstract

The film layer preparation method for removing the waterproof film layer comprises the following steps: S1, putting a previous product of which the waterproof film layer on the outer surface in a film system on a substrate needs to be removed together with a plating accompanying sheet of a previous film coating as a lens into a tool clamp; s2, hanging into a cavity of a vacuum coating machine, wherein the temperature of the cavity is set to be 50-70 DEG C; s3, vacuumizing is conducted, bombardment is conducted through the ion source, and the bombardment process comprises the sub-steps that S31, under the set temperature of the cavity, large-energy and large-flow bombardment is conducted through the ion source; s32, then reducing the temperature of the cavity by 5-10 DEG C, and performing constant-temperature standing and keeping at the reduced temperature; s33, after standing, the ion source bombards with small energy and small flow at the reduced temperature of the cavity; s4, opening the door and taking out the lens; s5, dripping water on the surface of one side, from which the waterproof film layer is removed, of the lens, wherein the waterproof film layer is completely removed when the water is hung on the surface of the lens; s6, cleaning the lens which is detected to be qualified in the step S5 and from which the waterproof film layer is removed; and S7, re-plating a waterproof film layer on the cleaned lens.

Description

Technical Field

[0001] The present disclosure relates to the field of optical coating, and more specifically to a film preparation method for removing a waterproof film layer. Background Art

[0002] In the field of optical coating, after the surface of the lens is coated with multiple layers of anti-reflection film (also known as anti-reflection film), the lens is particularly prone to stains, and the stains will destroy the anti-reflection effect of the anti-reflection film. Under a microscope, it can be found that the anti-reflection film layer has a porous structure, so oil stains are particularly easy to infiltrate the anti-reflection film layer. The solution is to coat the anti-reflection film layer with a top film that has anti-oil and water resistance, which is what everyone calls a waterproof film layer. And this film layer must be very thin so that it does not change the optical properties of the anti-reflection film.

[0003] In infrared coating, after the anti-reflection film is coated on the accompanying film and the product of the lens, the lens is taken out and coated with a waterproof film layer using a special machine. Sometimes, the product in the lens will have marks or dust spots coated in the waterproof film layer, which cannot be removed. In order to reduce costs and improve efficiency, it is necessary to remove the waterproof film layer and then re-coat the waterproof film layer after removing the waterproof film layer. Summary of the invention

[0004] In view of the problems existing in the background technology, an object of the present invention is to provide a method for preparing a film layer for removing a waterproof film layer, which can enable a product that previously needed to remove the waterproof film layer to be re-coated with a waterproof film layer, thereby enabling the product that has been re-coated with a waterproof film layer to meet the requirements, thereby reducing costs and improving benefits.

[0005] Another object of the present disclosure is to provide a membrane preparation method for removing a waterproof membrane layer, which can both improve the efficiency of removing the waterproof membrane layer and ensure the accuracy of removing the waterproof membrane layer.

[0006] Thus, a film preparation method for removing a waterproof film layer comprises the following steps: S1, placing a previous product of a film system on a substrate whose outer waterproof film layer needs to be removed together with a previously coated accompanying film as a lens into a fixture; S2, hanging the fixture with the lens into a vacuum coating machine cavity, and setting the cavity temperature to 50-70°C; S3, starting the vacuum coating machine to evacuate, and the vacuum degree reaches 3×10 -3When Pa, the ion source of the vacuum coating machine is turned on for bombardment, and the bombardment process includes sub-steps: S31, at the set temperature of the chamber, the ion source bombards with high energy and high flow to remove a part of the waterproof film layer; S32, after the ion source bombards with high energy and high flow, the temperature of the chamber is reduced by 5-10°C and kept at a constant temperature at the reduced temperature; S33, after standing, at the reduced temperature of the chamber, the ion source bombards with low energy and low flow to remove the remaining part of the waterproof film layer; S4, after the ion source bombardment is completed, the door is opened to take out the lens; S5, the taken out lens is inspected, and water is dropped on the surface of the lens on the side where the waterproof film layer is removed. The water hanging on the surface of the lens indicates that the waterproof film layer has been removed cleanly; S6, the lens with the waterproof film layer removed that has passed the inspection in step S5 is cleaned; S7, the cleaned lens is re-coated with a waterproof film layer.

[0007] The beneficial effects of the present disclosure are as follows.

[0008] In the film preparation method for removing the waterproof film layer according to the present invention, the waterproof film layer can be removed by bombardment with an ion source, so that the lens with the waterproof film layer removed can be re-coated with the waterproof film layer, thereby allowing the product that previously needed to remove the waterproof film layer to be re-coated with the waterproof film layer, and then the product that has been re-coated with the waterproof film layer can meet the requirements, thereby reducing costs and improving benefits.

[0009] In the membrane preparation method for removing the waterproof membrane layer according to the present disclosure, during the ion source bombardment process, high energy and high flow bombardment is performed first and then low energy and low flow bombardment is performed, which can not only improve the efficiency of removing the waterproof membrane layer but also ensure the accuracy of removing the waterproof membrane layer.

[0010] In the membrane preparation method for removing the waterproof membrane layer according to the present disclosure, during the ion source bombardment process, the remaining part of the waterproof membrane layer becomes harder and more regular when the remaining part of the waterproof membrane layer is removed before the small energy and small flow bombardment by standing and cooling down between the high energy and high flow bombardment and the small energy and small flow bombardment. In this way, the small energy and small flow bombardment can more accurately and slowly remove the remaining part of the waterproof membrane layer.

[0011] In the film preparation method for removing the waterproof film layer according to the present invention, in addition to being able to visually check whether the product re-coated with the waterproof film layer has marks or dust spots like those in the background technology, the previously coated accompanying film is also placed in the tooling fixture as a lens, and the transmittance of the product re-coated with the waterproof film layer can also be tested to check whether the transmittance can meet the requirements. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 It is a schematic diagram of the structure of the lens together with the film layer in step S1 of embodiment 1.

[0013] Figure 2 It is the transmittance curve in the 8-12 μm infrared band during step S1 of Example 1.

[0014] Figure 3 This is the transmittance curve in the 8-12 μm infrared band after step S7 of Example 1 is completed.

[0015] Figure 4 This is the transmittance curve of comparative example 1 in the 8-12 μm infrared band after the waterproof film layer is re-plated.

[0016] Figure 5 This is the transmittance curve of comparative example 2 in the 8-12 μm infrared band after the waterproof film layer is re-plated. DETAILED DESCRIPTION

[0017] It will be understood that the disclosed embodiments are merely examples of the present disclosure, which may be implemented in various forms, and therefore, the specific details disclosed herein should not be interpreted as limiting, but merely as a basis for the claims and as a representative basis for teaching one of ordinary skill in the art to implement the present disclosure in various ways.

[0018] [Method for preparing a membrane layer by removing a waterproof membrane layer]

[0019] The method for preparing a membrane layer by removing a waterproof membrane layer according to the present disclosure comprises the steps of:

[0020] S1, placing the previous product whose outer waterproof film layer in the film system on the substrate needs to be removed together with the previously coated accompanying film as a lens into a fixture;

[0021] S2, hang the fixture with the lens installed into the vacuum coating machine cavity, and set the cavity temperature to 50-70℃;

[0022] S3, vacuum coating machine starts to evacuate, and the vacuum degree reaches 3×10 -3 When Pa, the ion source of the vacuum coating machine is turned on for bombardment. The bombardment process includes the following sub-steps:

[0023] S31, at the temperature set in the chamber, the ion source bombards with high energy and high flow to remove the

[0024] A portion of the water film layer;

[0025] S32, after the ion source bombards with high energy and high flow, the temperature of the chamber is reduced by 5-10℃ and

[0026] Keep the temperature constant at the reduced temperature;

[0027] S33, after standing still, at a reduced chamber temperature, the ion source is operated at low energy and low flow rate.

[0028] bombardment to remove the remaining parts of the waterproof membrane layer;

[0029] S4, after the ion source bombardment is completed, the door is opened and the lens is taken out;

[0030] S5, inspecting the removed lens, dropping water on the surface of the lens on the side where the waterproof film layer is removed, and if water hangs on the surface of the lens, it indicates that the waterproof film layer has been completely removed;

[0031] S6, cleaning the lens having the waterproof film layer removed after the inspection in step S5;

[0032] S7, the lens is re-coated with a waterproof film after cleaning.

[0033] In the film preparation method for removing the waterproof film layer according to the present invention, the waterproof film layer can be removed by bombardment with an ion source, so that the lens with the waterproof film layer removed can be re-coated with the waterproof film layer, thereby allowing the product that previously needed to remove the waterproof film layer to be re-coated with the waterproof film layer, and then the product that has been re-coated with the waterproof film layer can meet the requirements, thereby reducing costs and improving benefits.

[0034] In the membrane preparation method for removing the waterproof membrane layer according to the present disclosure, during the ion source bombardment process, high energy and high flow bombardment is performed first and then low energy and low flow bombardment is performed, which can not only improve the efficiency of removing the waterproof membrane layer but also ensure the accuracy of removing the waterproof membrane layer.

[0035] In the membrane preparation method for removing the waterproof membrane layer according to the present disclosure, during the ion source bombardment process, the remaining part of the waterproof membrane layer becomes harder and more regular when the remaining part of the waterproof membrane layer is removed before the small energy and small flow bombardment by standing and cooling down between the high energy and high flow bombardment and the small energy and small flow bombardment. In this way, the small energy and small flow bombardment can more accurately and slowly remove the remaining part of the waterproof membrane layer.

[0036] In the film preparation method for removing the waterproof film layer according to the present invention, in addition to being able to visually check whether the product re-coated with the waterproof film layer has marks or dust spots like those in the background technology, the previously coated accompanying film is also placed in the tooling fixture as a lens, and the transmittance of the product re-coated with the waterproof film layer can also be tested to check whether the transmittance can meet the requirements.

[0037] In one example, in step S1, the waterproof film layer is SH-HT material, and the film thickness of the waterproof film layer is 80 nm. For example, the SH-HT material is purchased from Duen Optics (Changshu) Co., Ltd.

[0038] The temperature setting of the vacuum coating machine in step S2 heats the lens through the cavity of the coating machine, which helps to remove the waterproof film from the lens and reduce the stress formed when the waterproof film is removed. For example, the vacuum coating machine is a vacuum coating machine with a Hall ion source equipped with a neutralizer manufactured and sold by Chengdu Xiwok Vacuum Technology Co., Ltd., and the Hall ion source equipped with a neutralizer is purchased from Boton Optoelectronics Technology Co., Ltd.

[0039] In step S3 , for example, the ion source is a Hall ion source.

[0040] In one example, in sub-step S31, the parameters of the ion source high energy and high flow bombardment are: anode voltage of 220V, anode current of 1.5A, neutralization current of 1.5A, neutralization gas flow of 10sccm, argon gas flow ratio of 100%, and bombardment time of 2-3min. For example, in sub-step S31, the portion of the waterproof film layer removed is more than half of the film thickness of the waterproof film layer.

[0041] In one example, in sub-step S32, the cooling rate is 0.5-1°C / min, and the static holding time is 10-15min.

[0042] In one example, in sub-step S33, the parameters of the ion source low-energy and low-flow bombardment are: anode voltage is 110V, anode current is 1A, neutralization current is 0.5A, neutralization gas flow is 6sccm, argon gas flow ratio is 100%, and bombardment time is 3-5min.

[0043] In one example, in step S6, the cleaning is performed by pure water ultrasonic cleaning, followed by drying.

[0044] In one example, in step S7, the crystal oscillator method is used to monitor the film thickness of the re-plated waterproof film layer using the corresponding crystal oscillator pieces of the multiple crystal oscillator pieces of the crystal controller, and the crystal controller controls the corresponding operation of the new crystal oscillator piece among the multiple crystal oscillator pieces, and the crystal oscillator frequency is not less than 5.99 MHz.

[0045] In one example, in step S7, the lens is re-plated with a waterproof film without using an ion source assisted evaporation, the temperature of the chamber is set to 130°C, and the vacuum degree reaches and maintains 1.5×10 -3 Pa, the evaporation is carried out by resistance heating evaporation, the waterproof film layer is SH-HT material, and the film thickness of the waterproof film layer is controlled to be 80nm. That is, the process parameters of the lens re-coating the waterproof film layer are the same as the process parameters of the previous coating in step S1.

[0046] In step S1, the previous coating process of the previous product and the accompanying coating sheet of the previous coating is not limited. In one example, in step S1, the previous coating process of the previous product and the accompanying coating sheet of the previous coating is:

[0047] Sa, the surface of the accompanying plating sheet and the product of the chalcogenide glass substrate as the lens is cleaned by ultrasonic alcohol, the chalcogenide glass substrate is a VIG04 substrate, and the thickness of the accompanying plating sheet is 1.0 mm;

[0048] Sb, put the cleaned lens into a fixture, and hang the fixture with the lens into the cavity of a vacuum coating machine, the temperature of the cavity is set to 130°C, the vacuum coating machine is a vacuum coating machine with a Hall ion source equipped with a neutralizer manufactured and sold by Chengdu Xiwok Vacuum Technology Co., Ltd., and the Hall ion source equipped with a neutralizer is purchased from Boton Optoelectronics Technology Co., Ltd.;

[0049] Sc, vacuum coating machine starts to evacuate, and the vacuum degree reaches 1.5×10 -3 Pa, turn on the auxiliary coating ion source of the vacuum coating machine for cleaning, the cleaning time is 6 minutes, the anode voltage of the ion source is 220V, the anode current is 1.2A, the neutralization current is 1.5A, and argon is used as the working gas;

[0050] Sd, maintain the above vacuum degree, on the first surface of the lens according to 20nmGe / 278nmZnS / 140nmGe / 695nmZnS / 1053nmYbF 3 / 148nmZnS is used to coat each film layer (i.e., to form an antireflection film layer / film system). The number before nm represents the film thickness. Ge is evaporated by electron beam heating. The deposition rate of Ge film layer is 0.4nm / s, the deposition rate of ZnS film layer is 0.6nm / s, and the deposition rate of YbF 3 The deposition rate of the film layer is 0.6nm / s, and each film layer is deposited with ion source assistance.

[0051] The ion source adopts Hall ion source.

[0052] When coating the ZnS film, the ion source parameters are: neutralization current 0.5A, neutralization flow rate 8sccm, anode voltage 120V, anode current 1.2A, and argon flow rate 100%;

[0053] When depositing the Ge film, the ion source parameters are: neutralization current is 0.5A, neutralization flow rate is 7sccm, anode voltage is 120V, anode current is 1A, and argon flow rate accounts for 100%;

[0054] YbF plated 3 The ion source parameters during the membrane layer are: neutralization current is 0.5A, neutralization flow rate is 10sccm, anode voltage is 110V, anode current is 1.2A, argon flow rate accounts for 30%, and oxygen flow rate accounts for 70%;

[0055] The crystal oscillator method uses the corresponding crystal oscillator of the multiple crystal oscillators of the crystal controller to monitor the film thickness. After the ion source is cleaned, the crystal controller controls the corresponding operation of the new crystal oscillator among the multiple crystal oscillators.

[0056] The vibration frequency is 5.99MHz;

[0057] Se, after the coating system on the first side of the lens is completed, the chamber is naturally cooled to 80°C, and the fixture and the lens are taken out;

[0058] Sf, in another vacuum coating machine, a waterproof film layer is evaporated without using an ion source to assist the evaporation, the other vacuum coating machine is the same model as the vacuum coating machine in steps Sa to Se, the temperature of the chamber is set to 130°C, and the vacuum degree reaches and maintains 1.5×10 -3 Pa, the evaporation adopts resistance heating evaporation, the waterproof film layer is SH-HT material, and the film thickness of the waterproof film layer is controlled to be 80nm.

[0059] The crystal oscillator method uses the corresponding crystal oscillator of multiple crystal oscillators of the crystal controller to monitor the film thickness. The crystal controller controls the corresponding operation of the new crystal oscillator among the multiple crystal oscillators. The crystal oscillator frequency is

[0060] 5.99MHz;

[0061] The cavity is cooled naturally to 80°C, and the fixture and the lens are taken out;

[0062] Sg, repeat steps Sa to Sf to coat the same film layer on the second opposite side of the lens.

[0063] [test]

[0064] Example 1

[0065] The method for preparing a membrane layer by removing the waterproof membrane layer of Example 1 adopts the following steps:

[0066] S1, put the previous product containing dust spots and the waterproof film layer on the surface of the film system on the substrate (check that only one side of the waterproof film layer has dust spots) and the previously coated accompanying film as a lens into the fixture,

[0067] In step S1, the previous product together with the previously coated accompanying film is subjected to the previous coating process (refer to Figure 1 )for:

[0068] Sa, the surface of the accompanying plating sheet and the product of the chalcogenide glass substrate as the lens is cleaned by ultrasonic alcohol, the chalcogenide glass substrate is a VIG04 substrate, and the thickness of the accompanying plating sheet is 1.0 mm;

[0069] Sb, put the cleaned lens into a fixture, and hang the fixture with the lens into the cavity of a vacuum coating machine, the temperature of the cavity is set to 130°C, the vacuum coating machine is a vacuum coating machine with a Hall ion source equipped with a neutralizer manufactured and sold by Chengdu Xiwok Vacuum Technology Co., Ltd., and the Hall ion source equipped with a neutralizer is purchased from Boton Optoelectronics Technology Co., Ltd.;

[0070] Sc, vacuum coating machine starts to evacuate, and the vacuum degree reaches 1.5×10 -3 Pa, open the auxiliary coating ion source of the vacuum coating machine for cleaning, the cleaning time is 6 minutes, the anode voltage of the ion source is 220V, the anode current is 1.2A, the neutralization current is 1.5A, and argon is used as the working gas;

[0071] Sd, maintain the above vacuum degree, on the first surface of the lens according to 20nmGe / 278nmZnS / 140nmGe / 695nmZnS / 1053nmYbF 3 / 148nmZnS is used to coat each film layer (i.e., to form an antireflection film layer / film system). The number before nm represents the film thickness. Ge is evaporated by electron beam heating. The deposition rate of Ge film layer is 0.4nm / s, the deposition rate of ZnS film layer is 0.6nm / s, and the deposition rate of YbF 3 The deposition rate of the film layer is 0.6nm / s, and each film layer is deposited with ion source assistance.

[0072] The ion source adopts Hall ion source.

[0073] When coating the ZnS film, the ion source parameters are: neutralization current 0.5A, neutralization flow rate 8sccm, anode voltage 120V, anode current 1.2A, and argon flow rate 100%;

[0074] When depositing the Ge film, the ion source parameters are: neutralization current is 0.5A, neutralization flow rate is 7sccm, anode voltage is 120V, anode current is 1A, and argon flow rate accounts for 100%;

[0075] YbF plated 3 The ion source parameters during the membrane layer are: neutralization current is 0.5A, neutralization flow rate is 10sccm, anode voltage is 110V, anode current is 1.2A, argon flow rate accounts for 30%, and oxygen flow rate accounts for 70%;

[0076] The crystal oscillator method is used to monitor the film thickness using the corresponding crystal oscillator of the multiple crystal oscillators of the crystal controller. After the ion source is cleaned, the crystal controller controls the corresponding operation of the new crystal oscillator of the multiple crystal oscillators, and the crystal oscillator frequency is 5.99MHz.

[0077] Se, after the coating system on the first side of the lens is completed, the chamber is naturally cooled to 80°C, and the fixture and the lens are taken out;

[0078] Sf, in another vacuum coating machine, a waterproof film layer is evaporated without using an ion source to assist the evaporation, the other vacuum coating machine is the same model as the vacuum coating machine in steps Sa to Se, the temperature of the chamber is set to 130°C, and the vacuum degree reaches and maintains 1.5×10 -3 Pa, the evaporation adopts resistance heating evaporation, the waterproof film layer is SH-HT material, the SH-HT material is purchased from Duen Optics (Changshu) Co., Ltd., and the film thickness of the waterproof film layer is controlled to be 80nm.

[0079] The crystal oscillator method uses a corresponding crystal oscillator of a plurality of crystal oscillators of a crystal controller to monitor the film thickness. The crystal controller controls a new crystal oscillator of the plurality of crystal oscillators to work correspondingly, and the crystal oscillator frequency is 5.99 MHz.

[0080] The cavity is cooled naturally to 80°C, and the fixture and the lens are taken out;

[0081] Sg, repeating steps Sa to Sf to coat the same film layer on the second opposite side of the lens;

[0082] S2, hang the fixture with the lens installed into the cavity of the vacuum coating machine, the temperature of the cavity is set to 60°C, the vacuum coating machine is a vacuum coating machine with a Hall ion source equipped with a neutralizer manufactured and sold by Chengdu Xiwoke Vacuum Technology Co., Ltd., and the Hall ion source equipped with a neutralizer is purchased from Boton Optoelectronics Technology Co., Ltd.;

[0083] S3, vacuum coating machine starts to evacuate, and the vacuum degree reaches 3×10 -3 When the ion source of the vacuum coating machine is turned on, the bombardment is carried out. The bombardment process adopts the following sub-steps:

[0084] S31, at the temperature set in the chamber, the ion source is bombarded with high energy and high flow to remove a part of the waterproof film layer, wherein the parameters of the ion source high energy and high flow bombardment are: anode voltage of 220V, anode current of 1.5A, neutralization current of 1.5A, neutralization gas flow of 10sccm, argon gas flow ratio of 100%, and bombardment time of 2.5min;

[0085] S32, after the ion source bombarded with high energy and high flow, the temperature of the chamber was reduced by 10°C and kept at a constant temperature at the reduced temperature, wherein the cooling rate was 0.5°C / min, and the holding time was

[0086] 15min;

[0087] S33, after standing still, at the lowered chamber temperature, the ion source is bombarded with low energy and low flow to remove the remaining part of the waterproof film layer, wherein the parameters of the ion source low energy and low flow bombardment are: anode voltage of 110V, anode current of 1A, neutralization current of 0.5A, and neutralization gas

[0088] The flow rate is 6 sccm, the argon flow rate is 100%, and the bombardment time is 3 min;

[0089] S4, after the ion source bombardment is completed, the door is opened and the lens is taken out;

[0090] S5, inspecting the removed lens, dropping water on the surface of the lens (i.e., the product) on the side where the waterproof film layer is removed, and water is stuck on the surface of the lens, which indicates that the waterproof film layer is completely removed;

[0091] S6, cleaning the lenses (i.e., the products and accompanying plating sheets) that have passed the test in step S5 and have had the waterproof film removed, using pure water ultrasonic cleaning and then air-drying;

[0092] S7, the lens after cleaning is re-coated with a waterproof film layer, the vacuum coating machine adopts the coating machine of step S2, the lens after cleaning (i.e., the product and the accompanying coating film) is placed in a fixture, the fixture with the lens placed is hung in the cavity of the vacuum coating machine, the lens is re-coated with a waterproof film layer without using an ion source to assist evaporation, the temperature of the cavity is set to 130°C, and the vacuum degree reaches and maintains 1.5×10 -3 Pa, the vapor deposition adopts resistance heating evaporation, the waterproof film layer is SH-HT material, the film thickness of the waterproof film layer is controlled to be 80nm, and the crystal oscillator method is used to use the corresponding crystal oscillator pieces of multiple crystal oscillators of the crystal controller to monitor the film thickness of the re-plated waterproof film layer. The crystal controller controls the corresponding work of the new crystal oscillator piece among the multiple crystal oscillators, and the crystal oscillator frequency is not less than 5.99MHz. After the waterproof film layer is re-plated, the cavity is naturally cooled to 80℃, and the tooling fixture and the lens are taken out.

[0093] Comparative Example 1

[0094] Except that the sub-step S32 of cooling and standing still is not performed in step S3, the rest is the same as in embodiment 1 (ie, the bombardment with small energy and small flow rate is directly followed by the bombardment with large energy and large flow rate in step S3).

[0095] Comparative Example 2

[0096] Except that the temperature is not lowered in sub-step S32 of step S3, the rest is the same as in embodiment 1 (i.e., in step S3, bombardment with high energy and high flow rate is followed by standing without temperature reduction, and bombardment with low energy and low flow rate is then performed).

[0097] After visual inspection, the products in the lenses of Example 1 and Comparative Examples 1-2 that were re-coated with a waterproof film layer did not contain any dust spots.

[0098] Figure 2 It is the transmittance curve of the previously coated accompanying film (i.e., step Sg is completed) in the 8-12 μm infrared band in step S1 of embodiment 1. The average transmittance in the 8-12 μm infrared band is 96.8%.

[0099] Figure 3 The transmittance curve of the accompanying plated sheet together with the antireflection film layer and the re-plated waterproof film layer in the 8-12 μm infrared band after step S7 of embodiment 1 is completed. The average transmittance in the 8-12 μm infrared band is 96.6%. Figure 1 The average transmittance in the 8-12μm infrared band differs by 0.2%.

[0100] Figure 4 The transmittance curve of the accompanying plate of Example 1 together with the anti-reflection film layer and the re-plated waterproof film layer in the 8-12μm infrared band is 96.2% on average. Figure 1 The average transmittance in the 8-12μm infrared band differs by 0.6%.

[0101] Figure 5 The transmittance curve of the accompanying plate of Example 2 together with the anti-reflection film layer and the re-plated waterproof film layer in the 8-12μm infrared band is 96.4% on average. Figure 1 The average transmittance in the 8-12μm infrared band differs by 0.4%.

[0102] The above detailed description is used to describe multiple exemplary embodiments, but this document is not intended to be limited to the explicitly disclosed combinations. Therefore, unless otherwise stated, the various features disclosed herein can be combined together to form multiple additional combinations that are not shown for the sake of simplicity.

Claims

1. A method for preparing a film layer for removing a waterproof film layer, characterized in that: Includes steps: S1, placing the previous product whose outer waterproof film layer in the film system on the substrate needs to be removed together with the previously coated accompanying film as a lens into a fixture; S2, hang the fixture with the lens installed into the vacuum coating machine cavity, and set the cavity temperature to 50-70℃; S3, vacuum coating machine starts to evacuate, and the vacuum degree reaches 3×10 -3 When Pa, the ion source of the vacuum coating machine is turned on for bombardment. The bombardment process includes the following sub-steps: S31, at the temperature set in the chamber, the ion source bombards with high energy and high flow to remove a part of the waterproof film layer; S32, after the ion source bombards with high energy and high flow, the temperature of the chamber is lowered by 5-10°C and kept at a constant temperature at the lowered temperature; S33, after standing still, at a reduced chamber temperature, the ion source bombards with low energy and low flow rate to remove the remaining portion of the waterproof film layer; S4, after the ion source bombardment is completed, the door is opened and the lens is taken out; S5, inspecting the removed lens, dropping water on the surface of the lens on the side where the waterproof film layer is removed, and if water hangs on the surface of the lens, it indicates that the waterproof film layer has been completely removed; S6, cleaning the lens having the waterproof film layer removed after the inspection passing the step S5; S7, the lens is re-coated with a waterproof film after cleaning.

2. The method for preparing a membrane layer for removing a waterproof membrane layer according to claim 1, characterized in that: In step S1 , the waterproof film layer is made of SH-HT material, and the thickness of the waterproof film layer is 80 nm.

3. The method for preparing a membrane layer for removing a waterproof membrane layer according to claim 1, characterized in that: In step S3, the ion source is a Hall ion source.

4. The method for preparing a membrane layer for removing a waterproof membrane layer according to claim 3, characterized in that: In sub-step S31, The parameters of the high-energy and high-flow bombardment of the ion source are: anode voltage of 220 V, anode current of 1.5 A, neutralization current of 1.5 A, neutralization gas flow rate of 10 sccm, argon gas flow rate of 100%, and bombardment time of 2-3 min.

5. The method for preparing a membrane layer for removing a waterproof membrane layer according to claim 4, characterized in that: In sub-step S31, the portion of the waterproof membrane layer removed is greater than half of the membrane thickness of the waterproof membrane layer.

6. The method for preparing a membrane layer for removing a waterproof membrane layer according to claim 3, characterized in that: In sub-step S32, the cooling rate is 0.5-1°C / min, and the static holding time is 10-15min.

7. The method for preparing a membrane layer for removing a waterproof membrane layer according to claim 3, characterized in that: In sub-step S33, The parameters of the ion source low-energy and low-flow bombardment are: anode voltage of 110 V, anode current of 1 A, neutralization current of 0.5 A, neutralization gas flow of 6 sccm, argon gas flow ratio of 100%, and bombardment time of 3-5 min.

8. The method for preparing a membrane layer for removing a waterproof membrane layer according to claim 1, characterized in that: In step S6, the cleaning is performed by ultrasonic cleaning with pure water and then air-dried.

9. The method for preparing a membrane layer for removing a waterproof membrane layer according to claim 1, characterized in that: In step S7, a crystal oscillator method is used to monitor the film thickness of the re-plated waterproof film layer using a corresponding crystal oscillator of a plurality of crystal oscillators of a crystal controller, and the crystal controller controls a new crystal oscillator of the plurality of crystal oscillators to work accordingly, and the crystal oscillator frequency is not less than 5.99 MHz; In step S7, the lens is re-plated with a waterproof film without using an ion source to assist evaporation. The temperature of the chamber is set to 130°C, and the vacuum degree reaches and maintains 1.5×10 -3 Pa, the vapor deposition adopts resistance heating evaporation, the waterproof film layer is SH-HT material, and the film thickness of the waterproof film layer is controlled to be 80nm.

10. The method for preparing a membrane layer for removing a waterproof membrane layer according to claim 1, characterized in that: In step S1, the previous coating process of the previous product and the previously coated accompanying sheet is: Sa, the surface of the accompanying plating sheet and the product of the chalcogenide glass substrate as the lens is cleaned by ultrasonic alcohol, the chalcogenide glass substrate is a VIG04 substrate, and the thickness of the accompanying plating sheet is 1.0 mm; Sb, put the cleaned lens into a fixture, and hang the fixture with the lens into the cavity of a vacuum coating machine, the temperature of the cavity is set to 130°C, the vacuum coating machine is a vacuum coating machine with a Hall ion source equipped with a neutralizer manufactured and sold by Chengdu Xiwok Vacuum Technology Co., Ltd., and the Hall ion source equipped with a neutralizer is purchased from Boton Optoelectronics Technology Co., Ltd.; Sc, vacuum coating machine starts to evacuate, and the vacuum degree reaches 1.5×10 -3 Pa, open the auxiliary coating ion source of the vacuum coating machine for cleaning, the cleaning time is 6 minutes, the anode voltage of the ion source is 220V, the anode current is 1.2A, the neutralization current is 1.5A, and argon is used as the working gas; Sd, maintaining the aforementioned vacuum degree, on the first surface of the lens, various film layers are plated according to 20nmGe / 278nmZnS / 140nmGe / 695nmZnS / 1053nmYbF3 / 148nmZnS. The number before nm represents the film thickness. Ge is evaporated by electron beam heating. The deposition rate of Ge film is 0.4nm / s, the deposition rate of ZnS film is 0.6nm / s, and the deposition rate of YbF3 film is 0.6nm / s. Each film layer is deposited by ion source assisted deposition. The ion source adopts Hall ion source. When coating the ZnS film, the ion source parameters are: neutralization current 0.5A, neutralization flow rate 8sccm, anode voltage 120V, anode current 1.2A, and argon flow rate 100%; When depositing the Ge film, the ion source parameters are: neutralization current is 0.5A, neutralization flow rate is 7sccm, anode voltage is 120V, anode current is 1A, and argon flow rate accounts for 100%; When coating the YbF3 film, the ion source parameters are: neutralization current 0.5A, neutralization flow rate 10sccm, anode voltage 110V, anode current 1.2A, argon flow rate 30%, oxygen flow rate 70%; The crystal oscillator method is used to monitor the film thickness using the corresponding crystal oscillator of the multiple crystal oscillators of the crystal controller. After the ion source is cleaned, the crystal controller controls the corresponding operation of the new crystal oscillator of the multiple crystal oscillators, and the crystal oscillator frequency is 5.99MHz. Se, after the coating system on the first side of the lens is completed, the chamber is naturally cooled to 80°C, and the fixture and the lens are taken out; Sf, in another vacuum coating machine, a waterproof film layer is evaporated without using an ion source to assist the evaporation, the other vacuum coating machine is the same model as the vacuum coating machine in steps Sa to Se, the temperature of the chamber is set to 130°C, and the vacuum degree reaches and maintains 1.5×10 -3 Pa, the evaporation adopts resistance heating evaporation, the waterproof film layer is SH-HT material, and the film thickness of the waterproof film layer is controlled to be 80nm. The crystal oscillator method uses a corresponding crystal oscillator of a plurality of crystal oscillators of a crystal controller to monitor the film thickness. The crystal controller controls a new crystal oscillator of the plurality of crystal oscillators to work correspondingly, and the crystal oscillator frequency is 5.99 MHz. The cavity is cooled naturally to 80°C, and the fixture and the lens are taken out; Sg, repeat steps Sa to Sf to coat the same film layer on the second opposite side of the lens.

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