Continuous double-sided magnetron sputtering coating machine

Abstract

The invention discloses a continuous double-sided magnetron sputtering coating machine which comprises a loading device, a feeding box, a vacuum coating box I, a vacuum coating box II, a discharging box and an unloading device which are arranged in sequence along the conveying direction of a base material, the in-box conveying device comprises a motor, a first rotating shaft and a transmission belt, the first rotating shaft is connected to the middle of a side plate of the box body through a bearing, the end, close to the side plate of the box body, of the first rotating shaft is connected with the transmission belt, and the other end of the transmission belt is connected with the motor after being connected with the multiple first rotating shafts in series; the upper portion of the other end of the first rotating shaft is in lap joint with a base material plate, the side face of the base material plate makes contact with the limiting baffle, and a first target material plate and a second target material plate are arranged on the upper side and the lower side of the base material plate respectively. According to the device disclosed by the invention, one vacuum coating box is internally divided into two coating cavities, so that the upper surface and the lower surface of the base material can be coated, the investment cost and the occupied space of a production line are saved, and the production efficiency of a product is also improved.

Description

Technical Field

[0001] The invention relates to the field of film coating, and in particular to a continuous double-sided magnetron sputtering coating machine. Background Art

[0002] In modern industrial coating, magnetron sputtering is a commonly used physical vapor deposition method, which is widely used due to its advantages such as simple equipment, easy control, large coating area and strong adhesion. Magnetron sputtering coating equipment includes vacuum chamber, vacuum system, cathode target, sputtering power supply, air intake system and baffle. When coating, the vacuum system is used to extract the gas in the vacuum chamber so that the air pressure in the vacuum chamber reaches the specified vacuum requirement, and then the air intake system is used to fill the vacuum chamber with argon gas. After that, the sputtering power supply is used to add high voltage to the argon gas in the vacuum chamber, so that glow discharge is generated between the cathode and the anode. The argon gas molecules between the electrodes are ionized and generate electric charges. The positive ions are accelerated by the negative potential of the cathode and collide with the cathode target, thereby sputtering out the atoms and other particles in it. The sputtered atoms are deposited on the substrate at the anode to form a thin film.

[0003] There are few continuous magnetron sputtering devices for material coating in the prior art, and most of the equipment used is a single vacuum chamber. The overall parameters of the equipment must be adjusted for each layer of film coating, and there is no way to avoid cross-contamination between the target materials; some use multi-cavity cluster magnetron sputtering equipment, but the cost is high and general enterprises and research institutes cannot afford it. At the same time, there is no equipment in the prior art that can coat the front and back of the substrate. In the actual production process, the distance between the target material and the substrate is different under different processes, and the staff needs to adjust it according to the production process. As the target material is continuously consumed, the distance between the target material and the substrate becomes larger, resulting in uneven sputtering and affecting the sputtering effect. Some substrates need to be coated on both sides. The prior art requires taking out the substrate, turning it over manually, and then putting it back into the vacuum chamber for coating, which has low production efficiency. Summary of the invention

[0004] The purpose of the present invention is to solve the problems raised in the above background technology, and then propose a continuous double-sided magnetron sputtering coating machine. The vacuum coating box of the device disclosed in the present invention is divided into two coating chambers, which can coat the upper and lower surfaces of the substrate, saving the investment cost and floor space of the production line and improving the production efficiency of the product; a lifting device is provided to remotely control the distance between the target material and the substrate, which improves the production efficiency and the quality of the product.

[0005] The technical solution adopted by the present invention to solve the technical problem is:

[0006] A continuous double-sided magnetron sputtering coating machine comprises a loading device, a feeding box, a vacuum coating box 1, a vacuum coating box 2, a discharging box and a discharging device which are arranged in sequence along the conveying direction of the substrate. The right outlet of the feeding box and the left inlet of the discharging box are both provided with vacuum box valves. A turbomolecular pump is arranged on the connecting passage between the feeding box, the vacuum coating box 1, the vacuum coating box 2 and the discharging box to ensure that the vacuum state set in the vacuum coating box 1 and the vacuum coating box 2 is maintained. The feeding box, the vacuum coating box 1, the vacuum coating box 2 and the discharging box are provided with an external conveying device and an internal conveying device. The external conveying device is the same as the prior art and will not be described in detail. The internal conveying device comprises a motor, a rotating shaft 1 and a transmission belt. The rotating shaft 1 is connected to the middle part of the side plate of the box body through a bearing, and the rotating shaft 1 can rotate around its axis. The rotating shaft 1 is connected to a transmission belt at one end close to the side plate of the box body, and the other end of the transmission belt is connected to a plurality of rotating shafts 1 in series and then connected to a motor. A limit baffle is arranged in the middle part of the rotating shaft 1, and the upper part of the other end of the rotating shaft 1 overlaps the substrate plate, and the side surface of the substrate plate contacts the limit baffle. The motor drives the rotating shaft 1 to rotate through the transmission belt, and the rotating shaft 1 drives the substrate plate to move horizontally; target plate 1 and target plate 2 are respectively arranged on the upper and lower sides of the substrate plate, the target plate 1 is arranged on the top plate of the box body, and the target plate 2 is arranged on the bottom plate of the box body, and both the target plate 1 and the target plate 2 can be coated on the substrate plate, thereby realizing double-sided coating of the substrate.

[0007] Preferably, target plate two includes a mounting frame and a cylindrical target, wherein the cylindrical target is connected to the mounting frame via a rotating shaft two, and the cylindrical target can rotate around the rotating shaft two. A vertical mounting frame is arranged on the side of the mounting frame, and a flipping power assembly is arranged on the vertical mounting frame. The flipping power assembly can not only ensure that the target and the mounting frame are parallel, but also drive the cylindrical target to rotate. The target plate one and the target plate two have the same structure.

[0008] Preferably, the flipping power assembly includes a gear, a chain and a driving motor, wherein the gear is arranged on a second rotating shaft, and the gear is located between the target material and the mounting frame. The chain is connected to two adjacent gears, that is, two adjacent targets can rotate synchronously, and one of the two adjacent rotating shafts passes through the mounting frame, and a right-angle gear 1 is arranged at its end. A driving motor is arranged on a mounting frame vertical to the side of the mounting frame, and a right-angle gear 2 is arranged on the top of the driving motor. The right-angle gear 1 is meshed with the right-angle gear 2, and the driving motor drives the target material to rotate.

[0009] Preferably, target plate 1 is arranged on the top plate of the box through a lifting device, and target plate 2 is arranged on the bottom plate of the box through a lifting device, the lifting device comprises a telescopic shaft, a hydraulic cylinder, a cylinder control mechanism and a fixed base connected in sequence, the lifting device is fixed to the box through bolts passing through the fixed base, a support pallet 1 is arranged on the lifting device fixed on the top plate of the box, the plate thickness of the two ends of the support pallet 1 is different, and the plate thickness of the support pallet 1 changes in a sudden manner, the target plate 1 overlaps the top surface of the thin plate of the support pallet 1, and the telescopic shaft is connected to the top surface of the thick plate of the support pallet 1; a support pallet 2 is arranged on the lifting device fixed on the bottom plate of the box, the support pallet 2 is an L-shaped plate, the target plate 2 overlaps the top surface of the horizontal plate of the support pallet 2, the telescopic shaft is connected to the bottom surface of the horizontal plate of the support pallet 2, and the spacing between the target plate 1 and the target plate 2 and the substrate plate can be adjusted through the lifting device.

[0010] Preferably, a shielding plate 1 is provided on both sides of the conveying device in the box, one end of the shielding plate 1 is fixed to the side plate of the box body, and the other end of the shielding plate 1 is in contact with the limit baffle. The vacuum coating box 1 and the vacuum coating box 2 are respectively divided into an upper and lower coating chamber by the shielding plate 1. The two coating chambers do not interfere with each other, thereby avoiding mutual contamination of coating material particles in the upper and lower coating chambers during operation.

[0011] Preferably, a shielding plate 2 is arranged on the outside of the lifting device, and on the top plate of the box, one end of the shielding plate 2 is fixed to the top plate of the box, and the other end of the shielding plate 2 is in contact with the side of the thick plate of the supporting pallet 1, and the space between the target plate 1 and the top plate of the box is sealed by the shielding plate 2 to prevent particles from entering and causing material precipitation pollution; on the bottom plate of the box, one end of the shielding plate 2 is fixed to the bottom plate of the box, and the other end of the shielding plate 2 is in contact with the outer side of the vertical plate of the supporting pallet 2, and the space between the target plate 2 and the bottom plate of the box is sealed by the shielding plate 2 to prevent particles from entering and causing material precipitation pollution.

[0012] Preferably, a shielding cover one is arranged on the back side of target plate one, and a shielding cover two is arranged on the back side of target plate two. Shielding cover one and shielding cover two cooperate with shielding plate two to further protect target plate one and target plate two from particle contamination, and at the same time protect the internal components of the target from being coated and affecting the normal function operation.

[0013] Preferably, detectors are arranged in the upper and lower coating cavities of vacuum coating box 1 and vacuum coating box 2, and the detectors are arranged on the side plates on both sides of the coating cavity. The detectors respectively monitor the distance between target plate 1 and substrate plate, and the distance between target plate 2 and substrate plate, and simultaneously detect the remaining amount of target material on target plate 1 and target plate 2; a transparent protective cover may be arranged outside the detector.

[0014] Preferably, the device disclosed in the present invention also includes a control terminal, which is electrically connected to the external conveying device, the turbomolecular pump, the internal conveying device, the detector, the lifting device and the flipping power assembly, respectively, and the operation of the above-mentioned devices is controlled by the control terminal.

[0015] Compared with the prior art, the present invention has the following beneficial effects:

[0016] 1. A vacuum coating box of the device disclosed in the present invention is divided into two coating chambers, which can coat the upper and lower surfaces of the substrate, thereby saving production line investment costs and floor space, and improving product production efficiency.

[0017] 2. The device disclosed in the present invention enables the target material to rotate by providing a flipping power assembly, thereby meeting the requirements of the coating process of different materials and improving the production efficiency of the product.

[0018] 3. The flipping power assembly of the device disclosed in the present invention includes gears, chains and drive motors, which realize the mechanical automation of target rotation, make the mechanism more precise, and improve the production efficiency of the product.

[0019] 4. The device disclosed in the present invention can adjust the distance between target plate 1 and target plate 2 and the substrate plate by setting a lifting device. It can not only meet the process requirements of coating of different materials, but also solve the problem of increased spacing caused by target material loss, thereby improving the production efficiency and quality of the product.

[0020] 5. The device disclosed in the present invention sets a shielding plate to prevent the two coating chambers in the vacuum coating box from interfering with each other, thereby avoiding mutual contamination of coating material particles in the upper and lower coating chambers during operation, thereby improving product quality.

[0021] 6. The device disclosed in the present invention seals the space between the target plate 1 and the top plate of the box by setting a shielding plate 2, a shielding cover 1 and a shielding cover 2, and also seals the space between the target plate 2 and the bottom plate of the box, thereby preventing particles from entering and causing material precipitation pollution, saving resources and costs, and improving product quality.

[0022] 7. The invention discloses a device that sets up detectors to monitor the distance between target plate one and substrate plate, and the distance between target plate two and substrate plate, respectively, and simultaneously detects the remaining amount of target material on target plate one and target plate two, feeds back the detection information to the control terminal, controls the distance between the target plate and the substrate plate, always maintains the best production state, and issues a prompt before the target material is exhausted, thereby improving both work efficiency and product quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 This is a schematic diagram of the front structure of the device disclosed in the present invention;

[0024] Figure 2 It is a schematic diagram of the side structure of the device disclosed in the present invention;

[0025] Figure 3 It is a schematic diagram of the structure of the top lifting device of the device disclosed in the present invention;

[0026] Figure 4 It is a schematic diagram of the structure of the bottom lifting device of the device disclosed in the present invention;

[0027] Figure 5 The device disclosed in the present invention is attached Figure 2 A partial enlarged view of the inner A;

[0028] Figure 6 The device disclosed in the present invention is attached Figure 2 A partial enlarged view of the inner B;

[0029] Figure 7 It is a schematic diagram of the top view structure of the target plate 2 of the device disclosed in the present invention;

[0030] Figure 8 It is a schematic diagram of the target plate of the device disclosed in the present invention from two side views;

[0031] Fig. 9 It is a schematic diagram of the structure of the flip power assembly of the device disclosed in the present invention;

[0032] Fig.10 This is a diagram showing the working principle of double-cavity magnetron sputtering of the device disclosed in the present invention.

[0033] Among them: 1. Control terminal; 2. Loading device; 3. Feed box; 4. Vacuum coating box 1; 5. Vacuum coating box 2; 6. Discharging box; 7. Unloading device; 8. External conveying device; 9. Vacuum box valve; 10. Turbomolecular pump; 11. Internal conveying device; 111. Rotating shaft 1; 112. Limit baffle; 113. Transmission belt; 12. Target plate 1; 13. Detector; 14. Target plate 2; 141. Rotating shaft 2; 142. Installation frame; 143. Cylindrical target; 15. Lifting device; 151. Supporting pallet 1; 152. Telescopic shaft; 153. Hydraulic cylinder; 154. Cylinder control mechanism; 155. Fixed base; 156. Supporting pallet 2; 16. Flipping power assembly; 161. Gear; 162. Chain; 163. Right-angle gear 1; 164. Right-angle gear 2; 165. Driving motor; 17. Substrate plate; 18. Shielding plate 1; 19. Shielding plate 2; 20. Shielding cover 1; 21. Shielding cover 2. DETAILED DESCRIPTION

[0034] It should be noted that the following detailed descriptions are illustrative and are intended to provide further explanation of the present application. Unless otherwise specified, all technical and scientific terms used herein have the same meanings as those commonly understood by those skilled in the art to which the present application belongs.

[0035] like Figure 1-Figure 10 As shown, a continuous double-sided magnetron sputtering coating machine is disclosed, which includes a loading device 2, a feeding box 3, a vacuum coating box 1 4, a vacuum coating box 2 5, a discharging box 6 and a unloading device 7 arranged in sequence along the conveying direction of the substrate, and a vacuum box valve 9 is arranged on the right outlet of the feeding box 3 and the left inlet of the discharging box 6. A turbomolecular pump 10 is arranged on the connecting channel between the feeding box 3, the vacuum coating box 1 4, the vacuum coating box 2 5 and the discharging box 6 to ensure that the vacuum state set in the vacuum coating box 1 4 and the vacuum coating box 2 5 is maintained; the feeding box 3, the vacuum coating box 1 4, the vacuum coating box 2 5 and the discharging box 6 are provided with an external conveying device 8 and an internal conveying device 11, the external conveying device 8 is the same as the prior art and is not described in detail, the internal conveying device 11 includes a motor, a rotating shaft 111 and a transmission belt 113, the rotating shaft 111 is connected to the middle part of the side plate of the box body through a bearing, and the rotating shaft 111 is connected to the middle part of the side plate of the box body through a bearing. 111 can rotate around its axis, one end of the rotating shaft 111 close to the side plate of the box is connected to the transmission belt 113, the other end of the transmission belt 113 is connected to multiple rotating shafts 111 in series and then connected to the motor, a limit baffle 112 is arranged in the middle of the rotating shaft 111, the upper part of the other end of the rotating shaft 111 overlaps the substrate plate 17, the side of the substrate plate 17 is in contact with the limit baffle 112, the motor drives the rotating shaft 111 to rotate through the transmission belt 113, and the rotating shaft 111 drives the substrate plate 17 to move horizontally; target plate 12 and target plate 2 14 are respectively arranged on the upper and lower sides of the substrate plate 17, the target plate 12 is arranged on the top plate of the box, and the target plate 2 14 is arranged on the bottom plate of the box, and both the target plate 12 and the target plate 2 14 can be coated on the substrate plate 17, thereby realizing double-sided coating of the substrate; the vacuum coating box 1 4 and the vacuum coating box 2 5 can be increased or decreased according to the production needs of the factory.

[0036] like Figure 2 , Figure 7-Figure 9 As shown, the target plate 14 includes a mounting frame 142 and a cylindrical target 143. The cylindrical target 143 is connected to the mounting frame 142 through a second rotating shaft 141. The cylindrical target 143 can rotate around the second rotating shaft 141. A vertical mounting frame is arranged on the side of the mounting frame 142. A flipping power assembly 16 is arranged on the vertical mounting frame. The flipping power assembly 16 can drive the cylindrical target 143 to rotate. The target plate 12 and the target plate 2 14 have the same structure.

[0037] The flipping power assembly 16 includes a gear 161, a chain 162 and a driving motor 165. The gear 161 is arranged on the rotating shaft 141, and the gear 161 is located between the target material 143 and the mounting frame 142. The chain 162 is connected to two adjacent gears 161, that is, the two adjacent targets 143 can rotate synchronously. One of the two adjacent rotating shafts 141 passes through the mounting frame 142, and a right-angle gear 1 163 is arranged at its end. The driving motor 165 is arranged on the mounting frame perpendicular to the side of the mounting frame 142, and a right-angle gear 2 164 is arranged on the top of the driving motor 165. The right-angle gear 1 163 and the right-angle gear 2 164 are meshed, and the driving motor 165 drives the target material 143 to rotate. The flipping power assembly 16 can also be arranged one-to-one with the cylindrical target material 143.

[0038] like Figure 2-Figure 4 As shown, the target plate 12 is arranged on the top plate of the box body through the lifting device 15, and the target plate 14 is arranged on the bottom plate of the box body through the lifting device 15. The lifting device 15 includes a telescopic shaft 152, a hydraulic cylinder 153, a cylinder control mechanism 154 and a fixed base 155 connected in sequence. The lifting device 15 is fixed to the box body through bolts passing through the fixed base 155. A support plate 151 is arranged on the lifting device 15 fixed on the top plate of the box body. The plate thickness of the support plate 151 at both ends is different. The plate thickness of the support plate 151 changes. The method is sudden change, the target plate 12 is overlapped on the thin plate top surface of the support plate 151, and the telescopic shaft 152 is connected to the thick plate top surface of the support plate 151; the support plate 2 156 is arranged on the lifting device 15 fixed on the bottom plate of the box body, and the support plate 2 156 is an L-shaped plate, the target plate 2 14 is overlapped on the horizontal plate top surface of the support plate 2 156, and the telescopic shaft 152 is connected to the horizontal plate bottom surface of the support plate 2 156, and the distance between the target plate 12 and the target plate 2 14 and the substrate plate can be adjusted by the lifting device 15.

[0039] like Figure 2 and Figure 5 As shown, shielding plates 18 are respectively arranged on both sides of the conveying device 11 in the box, one end of the shielding plate 18 is fixed to the side plate of the box body, and the other end of the shielding plate 18 is in contact with the limit baffle 112. The shielding plate 18 divides the vacuum coating box 1 4 and the vacuum coating box 2 5 into two upper and lower coating chambers, and the coating work in the two coating chambers runs independently without interfering with each other, so as to avoid mutual contamination of coating material particles in the upper and lower coating chambers during operation;

[0040] It should be noted that the upper and lower coating cavities respectively form sealed magnetic fields through the shielding plate 18.

[0041] like Fig.10As shown, it is a working principle diagram of magnetron sputtering of double coating chambers in a vacuum coating box. Under the action of a shielding plate 18, the upper and lower coating chambers form sealed magnetic fields respectively, which do not interfere with each other. When coating begins, under the action of an electric field, argon gas is ionized into argon ions and electrons. Argon ions are accelerated to bombard the target material under the action of the electric field, so that molecules, atoms, ions and electrons on the surface of the target material are sputtered out. The sputtered particles carry a certain kinetic energy and are ejected toward the surface of the substrate plate 17 along a certain direction to form a coating.

[0042] like Figure 2 and Figure 6 As shown, a shielding plate 19 is arranged outside the lifting device 15. On the top plate of the box, one end of the shielding plate 19 is fixed on the top plate of the box, and the other end of the shielding plate 19 contacts the side of the thick plate of the supporting pallet 151. The space between the target plate 12 and the top plate of the box is sealed by the shielding plate 19 to prevent particles from entering and causing material precipitation pollution; on the bottom plate of the box, one end of the shielding plate 19 is fixed on the bottom plate of the box, and the other end of the shielding plate 19 contacts the outer side of the vertical plate of the supporting pallet 156. The space between the target plate 14 and the bottom plate of the box is sealed by the shielding plate 19 to prevent particles from entering and causing material precipitation pollution;

[0043] It should be noted that when the lifting device 15 adjusts the positions of the target plate 12 and the target plate 2 14 , the shielding plate 2 19 can well maintain the sealing state between the target plate 1 12 and the top plate of the box, and between the target plate 2 14 and the bottom plate of the box.

[0044] like Figure 2 and Figure 6 As shown, a shielding cover 20 is provided on the back side of the target plate 12, and a shielding cover 21 is provided on the back side of the target plate 14. The shielding cover 20 and the shielding cover 21 cooperate with the shielding plate 19 to further protect the target plate 12 and the target plate 14 from particle contamination, and at the same time protect the internal components of the target from being coated and affecting the normal operation of the target.

[0045] like Figure 2 As shown, detectors 13 are arranged in the upper and lower coating chambers of vacuum coating box 1 4 and vacuum coating box 2 5. The detectors 13 are arranged on the side plates on both sides of the coating chambers. The detectors respectively monitor the distance between target plate 12 and substrate plate 17, and the distance between target plate 2 14 and substrate plate 17, and detect the remaining amount of target material on target plate 1 12 and target plate 2 14.

[0046] like Figure 1As shown, the device also includes a control terminal 1, which is electrically connected to the outer conveying device 8, the turbomolecular pump 10, the inner conveying device 11, the detector 13, the lifting device 15 and the flip power assembly 16, respectively, and the operation of the above-mentioned devices is controlled by the control terminal 1;

[0047] The control terminal 1 controls the operation of the outer conveying device 8 and the inner conveying device 11 to convey the substrate plate 17 to the equipment set by the coating process; the control terminal 1 controls the turbomolecular pump 10 to make the vacuum state in the vacuum coating box 1 4 and the vacuum coating box 2 5 reach the vacuum state required by the process; the control terminal 1 controls the detector 13, and receives the signal transmitted by the detector 13 at the same time, and controls other equipment to change the operation state according to the transmitted signal; the control terminal 1 controls the lifting device 15, and the distance between the substrate and the target material required for coating different materials is different. According to the distance value set in advance by the advance process, the position of the target plate 1 12 and the target plate 2 14 is adjusted. When a certain amount is consumed, the distance between the substrate and the target material increases. According to the distance signal detected by the detector 13, the position of the target plate 1 12 and the target plate 2 14 is adjusted to make the distance between the substrate and the target material constant; the control terminal 1 controls the flip power assembly 16, and the flip power assembly 16 drives the cylindrical target 143 to rotate, and the consumption of the coating material is balanced. The cylindrical target 143 is suitable for workpieces of various shapes, especially those with complex shapes.

[0048] In the description of the present invention, the terms "upper", "lower", "front", "back", "left", "right", "top", "bottom", "vertical", "horizontal" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the purpose of describing the present invention rather than requiring the present invention to be constructed or operated in a specific position, and therefore should not be construed as limiting the present invention. The terms "connected" and "connected" in the present invention should be understood in a broad sense, for example, it can be a connection or a detachable connection; it can be a direct connection or an indirect connection through an intermediate component. For those of ordinary skill in the art, the specific meanings of the above terms can be understood according to specific circumstances.

[0049] The above is the preferred operation mode of the present invention, and the description of the specific operation mode is only used to better understand the concept of the present invention. For ordinary technicians in this technical field, several improvements or equivalent substitutions can be made according to the principles of the present invention, and these improvements or equivalent substitutions are also considered to fall within the protection scope of the present invention.

Claims

1. A continuous double-sided magnetron sputtering coating machine, comprising a loading device (2), a feeding box (3), a vacuum coating box 1 (4), a vacuum coating box 2 (5), a discharging box (6) and a discharging device (7) arranged in sequence along the conveying direction of the substrate, characterized in that: The right outlet of the feed box (3) and the left inlet of the discharge box (6) are both provided with vacuum box valves (9); a turbomolecular pump (10) is provided on the connecting passages between the feed box (3), the vacuum coating box 1 (4), the vacuum coating box 2 (5) and the discharge box (6) to ensure that the vacuum state set in the vacuum coating box 1 (4) and the vacuum coating box 2 (5) is maintained; The feed box (3), vacuum coating box 1 (4), vacuum coating box 2 (5) and discharge box (6) are provided with an external conveying device (8) and an internal conveying device (11), wherein the internal conveying device (11) comprises a motor, a rotating shaft 1 (111) and a transmission belt (113), wherein the rotating shaft 1 (111) is connected to the middle of the side plate of the box body through a bearing, and the rotating shaft 1 (111) can rotate around its axis, and the rotating shaft 1 (111) is connected to the transmission belt (113) at one end close to the side plate of the box body, and the transmission belt (113) is connected to the transmission belt (113) at one end of the rotating shaft 1 (111). The other end of the moving belt is connected to a plurality of rotating shafts (111) connected in series and then connected to a motor; a limit baffle (112) is arranged in the middle of the rotating shaft (111); the upper part of the other end of the rotating shaft (111) overlaps a substrate plate (17); the side surface of the substrate plate (17) contacts the limit baffle (112); a target plate (12) and a target plate (14) are arranged on the upper and lower sides of the substrate plate (17); the target plate (12) is arranged on the top plate of the box body, and the target plate (14) is arranged on the bottom plate of the box body.

2. A continuous double-sided magnetron sputtering coating machine according to claim 1, characterized in that: The target plate 1 (14) comprises a mounting frame (142) and a cylindrical target (143). The cylindrical target (143) is connected to the mounting frame (142) via a rotating shaft 2 (141). A vertical mounting frame is arranged on the side of the mounting frame (142). A turning power assembly (16) is arranged on the vertical mounting frame. The target plate 1 (12) and the target plate 2 (14) have the same structure.

3. According to claim 2, a continuous double-sided magnetron sputtering coating machine is characterized in that: The flipping power assembly (16) comprises a gear (161), a chain (162) and a driving motor (165); the gear (161) is arranged on the second rotating shaft (141); the gear (161) is located between the target material (143) and the mounting frame (142); the chain (162) is connected to two adjacent gears (161); one of the two adjacent rotating shafts (141) passes through the mounting frame (142); a right-angle gear (163) is arranged at the end thereof; a driving motor (165) is arranged on a mounting frame vertical to the side of the mounting frame (142); a right-angle gear (164) is arranged on the top of the driving motor (165); the right-angle gear (163) and the right-angle gear (164) are meshed.

4. According to claim 1, a continuous double-sided magnetron sputtering coating machine is characterized in that: The target plate 1 (12) is arranged on the top plate of the box body through a lifting device (15), and the target plate 2 (14) is arranged on the bottom plate of the box body through a lifting device (15). The lifting device (15) comprises a telescopic shaft (152), a hydraulic cylinder (153), a cylinder control mechanism (154) and a fixed base (155) connected in sequence. The lifting device (15) is fixed to the box body through bolts passing through the fixed base (155). A support plate 1 (151) is arranged on the lifting device (15) fixed to the top plate of the box body. The support plate 1 (151) is L-shaped. The thickness of one side of the support plate (151) is greater than that of the other side, and the thickness suddenly changes in the middle. The material plate (12) overlaps the thin plate surface of the support plate (151), and the telescopic shaft (152) is connected to the thick plate surface of the support plate (151); the support plate (156) is arranged on the lifting device (15) fixed on the bottom plate of the box body, and the support plate (156) is an L-shaped plate. The target plate (14) overlaps the top surface of the horizontal plate of the support plate (156), and the telescopic shaft (152) is connected to the bottom surface of the horizontal plate of the support plate (156).

5. The continuous double-sided magnetron sputtering coating machine according to claim 1, characterized in that: A shielding plate (18) is provided on both sides of the conveying device (11) in the box, one end of the shielding plate (18) is fixed to the side plate of the box body, and the other end of the shielding plate (18) is in contact with the limit baffle (112). The shielding plate (18) divides the vacuum coating box (4) and the vacuum coating box (5) into two upper and lower coating chambers, and the two coating chambers do not interfere with each other.

6. A continuous double-sided magnetron sputtering coating machine according to claim 4, characterized in that: A shielding plate 2 (19) is arranged outside the lifting device (15); on the top plate of the box body, one end of the shielding plate 2 (19) is fixed to the top plate of the box body, and the other end of the shielding plate 2 (19) contacts the side surface of the thick plate of the supporting pallet 1 (151); on the bottom plate of the box body, one end of the shielding plate 2 (19) is fixed to the bottom plate of the box body, and the other end of the shielding plate 2 (19) contacts the outer side surface of the vertical plate of the supporting pallet 2 (156).

7. A continuous double-sided magnetron sputtering coating machine according to claim 1, characterized in that: A shielding cover (20) is arranged on the back side of the target plate (12), and a shielding cover (21) is arranged on the back side of the target plate (14).

8. The continuous double-sided magnetron sputtering coating machine according to claim 5, characterized in that: Detectors (13) are arranged in the upper and lower coating cavities of the vacuum coating box 1 (4) and the vacuum coating box 2 (5), and the detectors (13) are arranged on the side plates on both sides of the coating cavities.

9. A continuous double-sided magnetron sputtering coating machine according to any one of claims 2 or 4, characterized in that: It also includes a control terminal (1), which is electrically connected to the external transport device (8), the turbomolecular pump (10), the internal transport device (11), the detector (13), the lifting device (15) and the turning power assembly (16).

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