Coated substrate, laminated glass, and vehicle

Abstract

The invention provides a coated substrate, laminated glass and a vehicle. The film-coated substrate comprises a substrate body and a film-coated element arranged on at least one side of the substrate body, the film-coated element comprises at least two light absorption layers and a high-refractive-index layer arranged between the two light absorption layers, the light absorption layers are made of at least one material selected from W, Ni, Cr, Ti, Nb, Mo, Si and Zr, and the refractive index of the high-refractive-index layer is larger than or equal to 1.8 at the position of light with the wavelength of 550 nm. By adopting the film-coated element composed of the light absorption layer and the high-refractive-index layer, the film-coated substrate has lower visible light transmittance TL1 and lower light reflectivity RL, and the shielding function of an ink area in related technologies is met. Moreover, the coating element is arranged on the substrate in a coating high-temperature sintering manner, so that the damage to the substrate due to the arrangement of a printing ink area in the related technology can be reduced, the impact resistance of the edge part of the substrate is improved, the probability of fracture of the substrate is reduced, and the structural strength of the coating substrate is improved.

Description

Technical Field

[0001] The present application belongs to the field of glass technology, and specifically relates to a coated substrate, laminated glass and a vehicle. Background Art

[0002] In vehicles, black ink is often screen-printed around the glass to mask the connection structure between the glass and the vehicle to achieve an aesthetically pleasing appearance. The ink printing process is mature and simple, and has good masking properties.

[0003] However, since the thickness of screen-printed ink is generally in the range of 5 to 20 microns, and the heat absorption coefficient and thermal expansion coefficient of ink and glass are quite different, the glass surface covered by ink will have a deformation trend different from that of the glass itself during heating and forming and subsequent annealing and cooling, which will lead to surface stress. Especially at the junction of ink and glass, it is easy to be superimposed with the edge stress of the glass itself during the forming process to produce a large edge tensile stress, which further leads to a decrease in the strength of the glass in the ink area and the probability of cracking. Summary of the invention

[0004] In view of this, the first aspect of the present application provides a coated substrate, which includes a substrate and a coating element arranged on at least one side of the substrate, the coating element includes at least two light absorption layers and a high refractive index layer arranged between the two light absorption layers, the material of the light absorption layer is selected from at least one of W, Ni, Cr, Ti, Nb, Mo, Si, and Zr, and the high refractive index layer has a refractive index ≥1.8 at a wavelength of 550nm.

[0005] Wherein, the refractive index of the high refractive index layer at the light with a wavelength of 550 nm is ≥2, or ≥2.3, or ≥2.5, or ≥2.8, or ≥3.

[0006] Among them, the material of the high refractive index layer is selected from at least one of Zn, Si, Sn, Ti, Nb, Zr, Hf, Mg, Ni, In, Al, Ga, Bi metal oxides and mixtures thereof, or is selected from at least one of Si, Al, Zr, Ti, Y, Hf, Nb, Ta metal nitrides or oxynitrides and mixtures thereof.

[0007] Wherein, the physical thickness of the coating element is 60nm-500nm, or 70nm-400nm, or 70nm-350nm.

[0008] Wherein, the physical thickness of the high refractive index layer is 60nm to 100nm, or 70nm to 90nm, or 60nm to 80nm.

[0009] Wherein, the total physical thickness of the light absorbing layer in the coating element is ≥10nm, or ≥20nm, or ≥25nm; and / or the total physical thickness of the light absorbing layer in the coating element is ≤300nm, or ≤150nm, or ≤80nm, or ≤50nm.

[0010] Wherein, the physical thickness of one of the light absorbing layers is ≥5 nm, or ≥10 nm, or ≥15 nm; and / or the physical thickness of one of the light absorbing layers is ≤150 nm, or ≤100 nm, or ≤50 nm.

[0011] Wherein, the coating element further comprises at least one dielectric layer, the dielectric layer is arranged between the two light absorbing layers; and / or, the dielectric layer is arranged on the side of the light absorbing layer facing the substrate; and / or, the dielectric layer is arranged on the side of the light absorbing layer facing away from the substrate.

[0012] The material of the dielectric layer is selected from at least one of Zn, Si, Sn, Ti, Nb, Zr, Hf, Mg, Ni, In, Al, Ga, Bi metal oxides and mixtures thereof, or selected from at least one of Si, Al, Zr, Ti, Y, Hf, Nb, Ta metal nitrides or oxynitrides and mixtures thereof.

[0013] Wherein, the ratio of the total physical thickness of the light absorbing layer to the total physical thickness of the dielectric layer is 0.2 to 1.8, or 0.5 to 1.5.

[0014] Wherein, one of the dielectric layers and one of the light absorbing layers form a stacked structure, and the coating element includes at least two of the stacked structures.

[0015] Among them, the coating element includes two stacked structures, and the coating element includes a first dielectric layer, a first light absorption layer, the high refractive index layer, a second light absorption layer, and a second dielectric layer stacked in sequence on one side of the substrate. The first dielectric layer and the first light absorption layer constitute one stacked structure, and the second light absorption layer and the second dielectric layer constitute another stacked structure.

[0016] Wherein, the ratio of the physical thickness of the first dielectric layer to the physical thickness of the second dielectric layer is 0.1 to 4, or 0.5 to 3.5, or 1 to 3;

[0017] And / or, a ratio of the physical thickness of the first light absorbing layer to the physical thickness of the second light absorbing layer is 0.1 to 2, or 0.5 to 1.5, or 0.8 to 1.2.

[0018] Wherein, the physical thickness of the dielectric layer in the coating element closest to the substrate is 20nm-45nm, or 25nm-45nm, or 30nm-40nm.

[0019] Wherein, the physical thickness of the dielectric layer in the coating element which is farthest from the substrate is 3nm to 200nm, or 30nm to 150nm, or 50nm to 100nm.

[0020] The dielectric layer is composed of a first dielectric sublayer and a second dielectric sublayer which are stacked, and the ratio of the physical thickness of the first dielectric sublayer to the physical thickness of the second dielectric sublayer is 0.1 to 1, or 0.3 to 0.7.

[0021] Wherein, the film-coated substrate further comprises an infrared reflection layer disposed on the same side of the substrate as the film-coated element, and the infrared reflection layer comprises at least one metal layer or metal alloy layer.

[0022] The second aspect of the present application provides a laminated glass, which includes a first glass plate, an adhesive layer, and a second glass plate, the second glass plate is the coated substrate provided by the first aspect of the present application, the first glass plate has a first surface and a second surface, the second glass plate has a third surface and a fourth surface, and the adhesive layer connects the second surface and the third surface.

[0023] Wherein, along the laminating direction from the first glass plate to the second glass plate, the outer surface of the laminated glass has a light reflectivity RL, and the light reflectivity RL≤30%, or RL≤20%, or RL≤15%, or RL≤7%.

[0024] The reflected color of the first surface to visible light has a Lab value, a is -5 to 3 and b is -5 to 3, or a is -3 to 1 and b is -3 to 1, or a is -1 to 0 and b is -1 to 0.

[0025] A third aspect of the present application provides a vehicle, comprising a vehicle body, and a coating substrate as provided in the first aspect of the present application, wherein the coating substrate is disposed on the vehicle body.

[0026] The coated substrate, laminated glass and vehicle provided by the present application adopt a coated element composed of a stacked arrangement of a light absorption layer and a high refractive index layer, and cooperate with an optimizable film thickness setting, so that when the coated element is set on the substrate, the coated substrate has a lower visible light transmittance TL1 and a lower light reflectivity RL, satisfying the shielding function of the ink zone in the related art. In addition, since the coated element of the present application is set on the substrate by high-temperature sintering of the coating, the damage to the substrate caused by the ink zone in the related art can be reduced, the impact resistance of the edge of the substrate is improved, the probability of substrate breakage is reduced, and the structural strength of the coated substrate is improved. In addition, the outer surface of the coated substrate also has a Lab value for the reflected color of visible light, a is -5 to 3 and b is -5 to 3, so that the outer surface of the coated substrate is neutral in color for the reflected color of visible light, thereby improving visual comfort. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] In order to more clearly illustrate the technical solutions in the implementation modes of the present application, the drawings required for use in the implementation modes of the present application will be described below.

[0028] Figure 1 A schematic structural diagram of a coated substrate provided in one embodiment of the present application.

[0029] Figure 2 A top view of a substrate provided in accordance with one embodiment of the present application.

[0030] Figure 3 A schematic structural diagram of a coating element provided in one embodiment of the present application.

[0031] Figure 4 A schematic structural diagram of a coated substrate provided in another embodiment of the present application.

[0032] Figure 5 A schematic structural diagram of a coated substrate provided in yet another embodiment of the present application.

[0033] Explanation of reference numerals: coated substrate 10, substrate 11, middle area 111, peripheral area 112, coated element 20, first dielectric layer 21, first light absorbing layer 22, high refractive index layer 23, second light absorbing layer 24, second dielectric layer 25, first dielectric sublayer 251, second dielectric sublayer 252, infrared reflecting layer 30, electrode 31. DETAILED DESCRIPTION

[0034] The following are preferred implementations of the present application. It should be noted that, for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principles of the present application, and these improvements and modifications are also considered to be within the scope of protection of the present application.

[0035] Unless otherwise specified or there is a contradiction, the terms and phrases used in this application have the following meanings:

[0036] In this application, "first", "second", etc. are used only for descriptive purposes and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of the features.

[0037] In this application, "one or several" refers to any one, any two or more of the listed items. Among them, "several" refers to any two or more of the listed items.

[0038] The value of x in the chemical formula: if it is clearly defined, it shall be within the defined range. If it is not clearly defined, it can be determined based on the deposition in a stoichiometric, substoichiometric or superstoichiometric manner in the magnetron sputtering process.

[0039] Refractive Index: The refractive index measured at a wavelength of 550 nm.

[0040] like Figure 1 , Figure 2 and Figure 3 As shown, the present application provides a coated substrate 10, the coated substrate 10 includes a substrate 11, and a coating element 20 arranged on at least one side of the substrate 11, the coating element 20 includes at least two light absorption layers, and a high refractive index layer 23 arranged between the two light absorption layers, the material of the light absorption layer is selected from at least one of W, Ni, Cr, Ti, Nb, Mo, Si, and Zr, and the high refractive index layer 23 has a refractive index ≥1.8 at a light with a wavelength of 550nm.

[0041] The coating element 20 is provided on the substrate 11, and the material of the substrate 11 is soda-lime glass, borosilicate glass, aluminosilicate glass, polymethacrylate, or polycarbonate. The coating substrate 10 can be used independently as a vehicle window glass, or can be made into a laminated glass and used as a vehicle window glass. Preferably, the coating substrate 10 is applied to the front windshield of the vehicle. However, it is not limited to this, and the coating substrate 10 can also be applied to the rear windshield or side window glass, thereby providing more display scene applications for the vehicle.

[0042] Optionally, the substrate 11 includes a middle area 111 and a peripheral area 112 arranged at the periphery of the middle area 111, and the coating element 20 covers the peripheral area 112; or, the coating element covers the middle area 111 and the peripheral area 112. The peripheral area 112 includes a tensile stress concentration area connected to the edge of the substrate 11, the width of the tensile stress concentration area is 0 to 50 mm, and the coating element 20 covers the tensile stress concentration area.

[0043] like Figure 1 As shown, the coating component 20 may be composed of two light absorbing layers and one high refractive index layer 23, for example, composed of "light absorbing layer / high refractive index layer 23 / light absorbing layer". Alternatively, the coating component 20 may also include three light absorbing layers and one high refractive index layer, for example, composed of "light absorbing layer / high refractive index layer 23 / light absorbing layer / light absorbing layer". Alternatively, the coating component 20 may also include three light absorbing layers and two high refractive index layers, for example, composed of "light absorbing layer / high refractive index layer 23 / light absorbing layer / high refractive index layer 23 / light absorbing layer". It is understandable that the coating component 20 may also be composed of four light absorbing layers; or five light absorbing layers, etc.

[0044] The present application has found that the use of screen-printed black ink for shielding on the substrate 11 may reduce the strength of the substrate 11 by at least 40-50%. If the substrate 11 is coated with an infrared reflective coating and then sintered at high temperature, the strength of the substrate 11 may be reduced by 2%-5%. If black ink and an infrared reflective coating are stacked on the substrate 11, the strength of the substrate 11 may be reduced by at least 50-55%. It can be seen that in the related art, due to the large differences in the heat absorption coefficient and thermal expansion coefficient between the ink and the substrate, light distortion is easily formed at the interface between the ink and the substrate after the substrate is heated and formed, thereby weakening the stress of the substrate in the ink area and making the substrate in the ink area easy to crack. Therefore, the ink is the main factor that reduces the strength of the substrate.

[0045] However, the coated element 20 of the present application can be prepared by physical vapor deposition (PVD) or chemical vapor deposition (CVD), and is set on the substrate 11 by high-temperature sintering of the coating. This can reduce the damage to the substrate 11 caused by setting the ink area in the related technology, improve the impact resistance of the edge of the coated substrate 10, reduce the probability of the coated substrate 10 breaking, and improve the structural strength of the coated glass.

[0046] The material of the light absorbing layer is selected from at least one of W, Ni, Cr, Ti, Nb, Mo, Si, and Zr, and specifically includes NiCr, NiAl, NiSi, Cr, TiN, NbN, MoTi, etc. The light absorbing layer can also be understood as a visible light absorbing layer for absorbing visible light.

[0047] The refractive index of the high refractive index layer 23 at a wavelength of 550nm is ≥1.8, and specific examples include 1.8, or 1.9, or 2.0, or 2.1, or 2.2, or 2.3, or 2.4, or 2.5, or 2.6, or 2.7, or 2.8, or 2.9, or 3.0, etc. Preferably, the refractive index of the high refractive index layer 23 at a wavelength of 550nm is ≥2, and more preferably, the refractive index of the high refractive index layer 23 at a wavelength of 550nm is ≥2.3, and further preferably, the refractive index of the high refractive index layer 23 at a wavelength of 550nm is ≥2.5, or ≥2.8, or ≥3.

[0048] The material of the high refractive index layer 23 is selected from at least one of Zn, Si, Sn, Ti, Nb, Zr, Hf, Mg, Ni, In, Al, Ga, Bi metal oxides and mixtures thereof, or selected from at least one of Si, Al, Zr, Ti, Y, Hf, Nb, Ta metal nitrides or oxynitrides and mixtures thereof. Specific examples include SiN, SiO x , ZnSnOx (zinc tin oxide)), TiOx (titanium oxide), SiNx (silicon nitride), AZO (aluminum-doped zinc oxide), ZrOx (zirconium oxide), NbOx (niobium oxide), etc.

[0049] The physical thickness of the coating element 20 is 60nm to 500nm, and specifically, for example, 60nm, or 70nm, or 80nm, or 90nm, or 100nm, or 150nm, or 200nm, or 250nm, or 300nm, or 350nm, or 400nm, or 450nm, or 500nm, etc. Preferably, the physical thickness of the coating element 20 is 70nm to 400nm, and more preferably, the physical thickness of the coating element 20 is 70nm to 350nm. In the related art, compared with the use of an ink layer with a physical thickness of 5μm to 20μm, the physical thickness of the coating element 20 is reduced by one order of magnitude. During the molding process, the coating element 20 with a nanometer-level thickness will hardly have a weakening effect on the surface of the substrate 11, which is equivalent to improving the impact resistance of the edge of the substrate 11, reducing the cracking of the substrate 11, and improving the structural strength of the coated substrate 10.

[0050] In the coating element 20, the physical thickness of the high refractive index layer 23 is 60nm to 100nm, specifically, 60nm, 65nm, 70nm, 75nm, 80nm, 85nm, 90nm, 95nm, 100nm, etc. Preferably, the physical thickness of the high refractive index layer 23 is 70nm to 90nm, and more preferably, the physical thickness of the high refractive index layer 23 is 60nm to 80nm.

[0051] The total physical thickness of the light absorbing layer refers to the sum of the physical thicknesses of all light absorbing layers in the coating element 20. The total physical thickness of the light absorbing layer is ≥10nm, and specifically, it can be 10nm, or 15nm, or 20nm, or 25nm, or 30nm, or 35nm, or 40nm, or 50nm, or 60nm, or 70nm, or 80nm, etc. The total physical thickness of the light absorbing layer can be ≥20nm, and further, the total physical thickness of the light absorbing layer is ≥25nm. In addition, the total physical thickness of the light absorbing layer in the coating element is ≤300nm, and further, it can be ≤150nm, and further, it can be ≤80nm, or ≤50nm.

[0052] The physical thickness of the light absorbing layer is ≥5 nm, specifically, 5 nm, 10 nm, 15 nm, 20 nm, 25 nm, 30 nm, etc. The physical thickness of the light absorbing layer may be ≥10 nm, and further, the physical thickness of the light absorbing layer may be ≥15 nm. In addition, the physical thickness of the light absorbing layer may be ≤150 nm, and further, ≤100 nm, and further, ≤50 nm.

[0053] In summary, the present application adopts a coating element 20 composed of a stacked light absorption layer and a high refractive index layer 23, and cooperates with an optimizable film layer thickness setting, so that when the coating element 20 is set on the substrate 11, the coated substrate 10 has a lower visible light transmittance TL1 and a lower light reflectivity RL, satisfying the shielding function of the ink area in the relevant technology.

[0054] Specifically, the coating element 20 also includes at least one dielectric layer, which is arranged between the two light absorbing layers; and / or, the dielectric layer is arranged on the side of the light absorbing layer facing the substrate 11; and / or, the dielectric layer is arranged on the side of the light absorbing layer away from the substrate 11.

[0055] like Figure 3 As shown, the coating element 20 is composed of two light absorbing layers, a high refractive index layer 23, and two dielectric layers, for example, composed of "first dielectric layer 21 / first light absorbing layer 22 / high refractive index layer 23 / second light absorbing layer 24 / second dielectric layer 25". The high refractive index layer 23 can also be understood as an intermediate dielectric layer.

[0056] The dielectric layer may be a single-layer structure or a multi-layer structure, for example, including at least two dielectric sub-layers. For example, the dielectric layer is composed of a first dielectric sub-layer 251 and a second dielectric sub-layer 252 stacked in layers. Figure 1 As shown, the second dielectric layer 25 is composed of a first dielectric sub-layer 251 and a second dielectric sub-layer 252 which are stacked.

[0057] The material of the dielectric layer is selected from at least one of Zn, Si, Sn, Ti, Nb, Zr, Hf, Mg, Ni, In, Al, Ga, Bi metal oxides and mixtures thereof, or selected from at least one of Si, Al, Zr, Ti, Y, Hf, Nb, Ta metal nitrides or oxynitrides and mixtures thereof. Specific examples include SiN, SiO x , ZnSnOx (zinc tin oxide)), TiOx (titanium oxide), SiNx (silicon nitride), AZO (aluminum-doped zinc oxide), ZrOx (zirconium oxide), NbOx (niobium oxide), etc.

[0058] The ratio of the total physical thickness of the light absorbing layer to the total physical thickness of the dielectric layer is 0.2 to 1.8, and specifically, it can be 0.2, or 0.5, or 0.8, or 1.0, or 1.2, or 1.5, or 1.8, etc. Preferably, the ratio of the total physical thickness of the light absorbing layer to the total physical thickness of the dielectric layer is 0.5 to 1.5. By optimizing the film thickness of the coating element 20, the coating substrate 10 has a lower visible light transmittance TL1 and a lower light reflectivity RL, which satisfies the shielding function of the ink zone in the related art, and also makes the outer surface of the coating substrate 10 have a Lab value for the reflected color of visible light, a is -5 to 3 and b is -5 to 3, so that the outer surface of the coating substrate 10 has a neutral color for the reflected color of visible light, thereby improving visual comfort.

[0059] Specifically, one dielectric layer and one light absorbing layer form a laminated structure, and the coating element 20 includes at least two laminated structures. Optionally, the coating element 20 includes 2 to 5 laminated structures. Specifically, for example, the coating element 20 includes 2, 3, 4, or 5 laminated structures.

[0060] like Figure 3 As shown, the coating element 20 includes two stacked structures, and the coating element 20 includes a first dielectric layer 21, a first light absorbing layer 22, the high refractive index layer 23, a second light absorbing layer 24, and a second dielectric layer 25 which are sequentially stacked on one side of the substrate 11. The first dielectric layer 21 and the first light absorbing layer 22 form one stacked structure, and the second light absorbing layer 24 and the second dielectric layer 25 form another stacked structure.

[0061] Among them, the ratio of the physical thickness of the first dielectric layer 21 to the physical thickness of the second dielectric layer 25 is 0.1-4, and specifically includes 0.1, or 0.5, or 1, or 1.5, or 2, or 2.5, or 3, or 3.5, or 4, etc. Preferably, the ratio of the physical thickness of the first dielectric layer 21 to the physical thickness of the second dielectric layer 25 is 0.5-3.5, and more preferably, the ratio of the physical thickness of the first dielectric layer 21 to the physical thickness of the second dielectric layer 25 is 1-3.

[0062] The ratio of the physical thickness of the first light absorbing layer 22 to the physical thickness of the second light absorbing layer 24 is 0.1 to 2, and specifically, 0.2, 0.5, 0.8, 1.0, 1.2, 1.5, 1.8, 2, etc. Preferably, the ratio of the physical thickness of the first light absorbing layer 22 to the physical thickness of the second light absorbing layer 24 is 0.5 to 1.5, and more preferably, the ratio of the physical thickness of the first light absorbing layer 22 to the physical thickness of the second light absorbing layer 24 is 0.8 to 1.2.

[0063] Optionally, the physical thickness of the first dielectric layer 21 is 20nm-45nm, and the physical thickness of the second dielectric layer 25 is 3nm-200nm. The physical thickness of the first light absorbing layer 22 is 10nm-100nm, and the physical thickness of the second light absorbing layer 24 is 10nm-100nm.

[0064] In the film-coated component 20, the physical thickness of the dielectric layer closest to the substrate 11 in the film-coated component 20 is 20nm to 45nm, and specifically, for example, 20nm, 25nm, 30nm, 35nm, 40nm, 45nm, etc. Preferably, the physical thickness of the dielectric layer closest to the substrate 11 in the film-coated component 20 is 25nm to 45nm, and more preferably, the physical thickness of the dielectric layer closest to the substrate 11 in the film-coated component 20 is 30nm to 40nm. Figure 3 As shown, the first dielectric layer 21 is the dielectric layer in the coating element 20 that is closest to the substrate 11 , and the physical thickness of the first dielectric layer 21 is 20 nm to 45 nm.

[0065] The physical thickness of the dielectric layer in the coating element 20 farthest from the substrate 11 is 3nm to 200nm, and specifically, for example, 3nm, 10nm, 50nm, 100nm, 150nm, 200nm, etc. Preferably, the physical thickness of the dielectric layer in the coating element 20 farthest from the substrate 11 is 30nm to 150nm, and more preferably, the physical thickness of the dielectric layer in the coating element 20 farthest from the substrate 11 is 50nm to 100nm. Figure 3As shown, the second dielectric layer 25 is the dielectric layer in the coating element 20 that is farthest from the substrate 11 , and the physical thickness of the second dielectric layer 25 is 3 nm to 200 nm.

[0066] In one embodiment, the dielectric layer is composed of a first dielectric sublayer 251 and a second dielectric sublayer 252 stacked in layers, and the ratio of the physical thickness of the first dielectric sublayer 251 to the physical thickness of the second dielectric sublayer 252 is 0.1-1, and specifically, for example, 0.1, or 0.2, or 0.3, or 0.4, or 0.5, or 0.6, or 0.7, or 0.8, or 0.9, or 1, etc. Preferably, the ratio of the physical thickness of the first dielectric sublayer 251 to the physical thickness of the second dielectric sublayer 252 is 0.3-0.7. Figure 3 As shown, the second dielectric layer 25 is composed of a first dielectric sub-layer 251 and a second dielectric sub-layer 252 which are stacked.

[0067] The substrate 11 is a 2.1 mm transparent glass plate, and the transparent glass plate has a visible light transmittance TL0, TL0 ≥ 88%. The coated substrate 10 has a visible light transmittance TL1 in the area where the coating element 20 is provided, TL1 ≤ 30%, specifically, 30%, or 25%, or 20%, or 15%, or 10%, or 7%, or 6%, or 5%, or 4%, or 3%, or 2%, or 1%, etc. Preferably, the coated substrate 10 has a visible light transmittance TL1 ≤ 20%, more preferably, the coated substrate 10 has a visible light transmittance TL1 ≤ 10%, and further preferably, the coated substrate 10 has a visible light transmittance TL1 ≤ 7%, or TL1 ≤ 3%, or TL1 ≤ 1%.

[0068] Wherein, the TL1 and the TL0 satisfy: TL1 / TL0<0.08, specifically, 0.08, or 0.07, or 0.06, or 0.05, or 0.04, or 0.03, or 0.01, or 0.005, etc. Preferably, TL1 / TL0≤0.05, more preferably TL1 / TL0≤0.03, further preferably, TL1 / TL0≤0.01, or TL1 / TL0≤0.005. The coating element 20 of the present application can save the materials used for the ink layer in the related art to a certain extent, and replace the ink layer in the related art, which is conducive to reducing the manufacturing cost of laminated glass.

[0069] like Figure 4 and Figure 5As shown, the coated substrate 10 also includes an infrared reflection layer 30 disposed on the same side of the substrate 11 as the coating element 20, and the infrared reflection layer 30 is used to connect the electrode 31, thereby electrically connecting the power supply. The power supply applies a voltage to the infrared reflection layer 30 so that the infrared reflection layer 30 heats the substrate 11. Optionally, the electrode 31 is disposed in the area covered by the coating element 20 on the substrate 11. Optionally, the infrared reflection layer 30 covers at least part of the coating element 20. The infrared reflection layer 30 includes at least one metal layer or metal alloy layer. Among them, the material of the metal layer or metal alloy layer is selected from at least one of Au, Ag, Cu, Al, Mo, and Pt; and / or, the number of the metal layer or metal alloy layer is 1-5. By providing the infrared reflection layer 30, more infrared light is reflected, the total solar energy transmittance of the coated substrate 10 can be reduced, and the coated substrate 10 can also achieve a sunscreen effect.

[0070] The present application also provides a laminated glass, which includes a first glass plate, an adhesive layer, and a second glass plate, the second glass plate being a coated substrate as provided above in the present application, the coated element being connected to the adhesive layer, the first glass plate having a first surface and a second surface, the second glass plate having a third surface and a fourth surface, the adhesive layer connecting the second surface and the third surface, and the laminated glass having a shielding area formed by the coated element, and the shielding area being arranged at least along an edge of the laminated glass.

[0071] Specifically, the first glass plate is used as the outer glass plate of the laminated glass, and the first glass plate has a first surface and a second surface, the first surface is away from the adhesive layer and in contact with the vehicle exterior environment, and the second surface is close to the adhesive layer; the second glass plate is used as the inner glass plate of the laminated glass, and the second glass plate has a third surface and a fourth surface, the third surface is close to the adhesive layer, and the fourth surface is away from the adhesive layer and in contact with the vehicle interior environment; the adhesive layer connects the second surface and the third surface. The coating layer is provided on at least one of the second surface, the third surface, and the fourth surface.

[0072] Wherein, the first glass plate is transparent glass or tinted glass, the thickness of the first glass plate is 0.7mm-4mm, and the visible light transmittance of the first glass plate is greater than or equal to 80%. The second glass plate is transparent glass or tinted glass, the thickness of the second glass plate is 0.7mm-4mm, and the visible light transmittance of the second glass plate is greater than or equal to 80%. The total iron content (in terms of Fe2O3) of the transparent glass is less than or equal to 0.1%, even less than or equal to 0.05%, and further less than or equal to 0.01%, and the visible light transmittance of the transparent glass is 80%-95%; the total iron content (in terms of Fe2O3) of the tinted glass is 0.1% to 0.8%, preferably 0.1% to 0.5%, and the visible light transmittance of the tinted glass is 80%-90%. For example, the first glass plate can be a transparent glass with a thickness of 2.1mm and a visible light transmittance of 89%, and the second glass plate can be a green glass with a thickness of 1.6mm and a visible light transmittance of 83%, or a green glass with a thickness of 2.1mm and a visible light transmittance of 80%.

[0073] Wherein, the bonding layer is a transparent thermoplastic polymer film or a colored thermoplastic polymer film, and the thickness of the bonding layer is 0.38mm~2.28mm. For example, the thickness of the bonding layer can be but not limited to 0.38mm, or 0.76mm, or 1.14mm, or 1.52mm, or 1.9mm, or 2.28mm, or other values ​​between 0.38mm~2.28mm. The material of the thermoplastic polymer film can be selected from at least one of polyvinyl butyral (PVB), polyurethane (PU), ethylene-vinyl acetate copolymer (EVA) and ionomer (SGP). When the bonding layer is a transparent thermoplastic polymer, the visible light transmittance of the transparent thermoplastic polymer is greater than or equal to 80%. For example, the visible light transmittance of the bonding layer can be but not limited to 80%, or 85%, or 90%, or 95%, etc. When the bonding layer is a colored thermoplastic polymer film, the visible light transmittance of the colored thermoplastic polymer film is greater than or equal to 80%. For example, the visible light transmittance of the bonding layer can be, but is not limited to, 80%, 85%, or 90%. The colored thermoplastic polymer film can be a gray thermoplastic polymer film, a green thermoplastic polymer film, or a blue thermoplastic polymer film. Exemplarily, the bonding layer can be a single-layer structure or a multi-layer structure. The multi-layer structure can be exemplified by a double-layer structure, a three-layer structure, a four-layer structure, a five-layer structure, etc. The bonding layer can also have other functions, such as providing at least one colored area as a shadow band to reduce the interference of sunlight to the human eye, or adding an infrared absorber to have a sunscreen or heat insulation function, or adding an ultraviolet absorber to have an ultraviolet light isolation function, or at least one layer of the multi-layer structure has a higher plasticizer content to have a sound insulation function.

[0074] Optionally, a dimming film is provided between the first glass plate and the second glass plate, and the dimming film may be a polymer dispersed liquid crystal film (PDLC), a suspended particle film (SPD), an electrochromic film (EC), a dye liquid crystal film (LC), etc. The minimum visible light transmittance of the dimming film is less than or equal to 3%, such as 3%, 2%, 1%, 0.5%, 0%. In addition, the maximum visible light transmittance of the dimming film is set as required, such as 10%, 20%, 30%, 50%, 70%, 80%, etc. For example: the visible light transmittance of the dimming film can be adjusted between 0% and 20%, between 0.5% and 50%, between 0% and 70%, etc. The dimming film can meet the requirements of visible light transmittance in multiple scenarios. For example, when black-border display is required, the dimming film is in an opaque state (visible light transmittance is less than or equal to 3%, or even 0%) to improve the contrast between the displayed image and the displayed background. When no display is performed, the dimming film is in a transparent state (visible light transmittance is greater than or equal to 70%) to achieve transparency in a larger area of ​​the window glass. The dimming film is arranged in an adhesive layer. For example, the adhesive layer can be two thermoplastic polymer films, and the dimming film is sandwiched between the two thermoplastic polymer films.

[0075] Along the laminating direction from the first glass plate to the second glass plate, the outer surface of the laminated glass corresponding to the shielding area has a light reflectivity RL of 7% to 30%, specifically, 30%, 25%, 20%, 15%, 10%, 7%, etc. Preferably, the light reflectivity RL is 10% to 25%, more preferably, the light reflectivity RL is 12% to 20%, and further preferably, the light reflectivity RL is 15% to 20%, so that the mirror effect of the laminated glass is more obvious and the user experience is improved. It should be noted that the light reflectivity RL of the outer surface of the laminated glass is measured in the laminating direction from the first glass plate to the second glass plate, and the outer surface of the laminated glass can also be understood as the first surface, which is arranged to face the outside of the vehicle.

[0076] The reflection color of the first surface to visible light has a Lab value, a is -5 to 3 and b is -5 to 3, specifically, a is -2 to 3 and b is -2 to 3, or a is -5 to 1 and b is -5 to 1, or a is -5 to 0 and b is -5 to 0, or a is -2 to 0 and b is -2 to 0, or a is -1 to 0 and b is -1 to 0, etc. Preferably, a is -3 to 1 and b is -3 to 1 in the Lab value, and more preferably a is -1 to 0 and b is -1 to 0 in the Lab value, so that the reflection color of the outer surface of the laminated glass to visible light is neutral, thereby improving visual comfort.

[0077] The present application also provides a vehicle, comprising a vehicle body and the above-mentioned coated substrate provided in the present application, wherein the coated substrate is arranged on the vehicle body. When the coated substrate is installed on the vehicle, it is preferably used as the front windshield of the vehicle. However, it is not limited thereto, and the coated substrate can also be used as the rear windshield or side window glass, thereby providing more display scene applications for the vehicle.

[0078] In order to make the purpose and advantages of the present application clearer, the effects of the reflective element of the present application are further described in detail below in conjunction with specific embodiments.

[0079] In Comparative Examples 1-4 and Examples 1-3, the film-plating element is disposed on the substrate for illustration.

[0080] The present application prepares an outer glass plate and an inner glass plate with a thickness of 2.1 mm, both of which are white glass, and an adhesive layer connects the outer glass plate and the inner glass plate. The visible light transmittance of the outer glass plate and the inner glass plate is 90%. Among them, the coating element covers the peripheral area of ​​the glass plate, and the infrared reflection layer covers the peripheral area and the middle area of ​​the glass plate.

[0081] Comparative Example 1: Screen printing is performed using black light-shielding ink on the peripheral areas of both the outer glass plate and the inner glass plate, and the physical thickness of the ink layer is 15 μm-25 μm.

[0082] Comparative Example 2: A titanium nitride or aluminum nitride visible light absorbing film layer is prepared by coating the inner surface of the outer glass plate, outer glass plate / SiN 15nm / TiN 350nm / SiN 15nm. In addition, the peripheral area of ​​the inner glass plate is screen-printed with black light-shielding ink. The bonding layer is a gray PVB layer with a transmittance of 10±2%. The physical thickness of the titanium nitride visible light absorbing film layer is 380nm.

[0083] Comparative Example 3: The inner surface of the outer glass plate is coated to prepare an infrared reflective double silver coating, the outer glass plate / ZnSnOx20nm / AZO 10nm / Ag 11nm / TiO 8nm / ZnSnOx 65nm / AZO 10nm / Ag 10nm / TiOx 10nm / / AZO 12nm / SiN 20nm. In addition, black light-shielding ink is used for screen printing on the peripheral areas of the outer glass plate and the inner glass plate. The physical thickness of the ink layer is 15μm-25μm. The bonding layer is a transparent PVB layer with a transmittance of ≥90%.

[0084] Comparative Example 4: The inner surface of the outer glass plate is coated to prepare an infrared reflective triple silver coating, outer glass plate / ZnSnOx25nm / AZO 10nm / Ag 12.5nm / TiO 7nm / ZnSnOx 55nm / AZO 15nm / Ag 13.5nm / TiOx10nm / ZnSnOx 53nm / AZO 12nm / Ag 11.5nm / TiO 11nm / ZnSnOx 13nm / SiN 15nm. The infrared reflective triple silver coating can be used to connect a power source and heat the outer glass plate. In addition, black light-shielding ink is used for screen printing on the peripheral areas of the outer glass plate and the inner glass plate. The physical thickness of the ink layer is 15μm-25μm. The bonding layer is a transparent PVB layer with a transmittance of ≥90%.

[0085] Embodiment 1: A coating element is arranged on the inner surface of the outer glass plate, outer glass plate / dielectric layer SiN 30nm / light absorption layer NiCr15nm / high refractive index layer SiN 75nm / light absorption layer NiCr 13nm / dielectric sublayer SiN 7nm / dielectric sublayer SiO220nm. The physical thickness of the coating element is 160nm. In addition, the peripheral area of ​​the inner glass plate is screen-printed with black light-shielding ink. The bonding layer is a gray PVB layer with a transmittance of 10±2%.

[0086] Embodiment 2: A coating element is arranged on the inner surface of the outer glass plate, outer glass plate / dielectric layer SiN 32nm / light absorption layer NiCr17nm / high refractive index layer SiN 78nm / light absorption layer NiCr 17nm / dielectric sublayer SiN 8nm / dielectric sublayer SiO220nm. The inner surface of the outer glass plate is also coated to prepare an infrared reflective double silver coating, outer glass plate / coating element / ZnSnOx20nm / AZO 10nm / Ag 11nm / TiO 8nm / ZnSnOx 65nm / AZO 10nm / Ag 10nm / TiOx 10nm / / AZO 12nm / SiN 20nm. The physical thickness of the coating element is 172nm. In addition, the peripheral area of ​​the inner glass plate is screen-printed with black light-shielding ink. The bonding layer is a transparent PVB layer with a transmittance of ≥90%.

[0087] Embodiment 3: A coating element is arranged on the inner surface of the outer glass plate, outer glass plate / dielectric layer SiN 32nm / light absorption layer NiCr18nm / high refractive index layer SiN 78nm / light absorption layer NiCr 17nm / dielectric sublayer SiN 8nm / dielectric sublayer SiO220nm. The inner surface of the outer glass plate is also coated to prepare an infrared reflective triple silver coating, outer glass plate / coating element / ZnSnOx25nm / AZO 10nm / Ag 12.5nm / TiO 7nm / ZnSnOx 55nm / AZO 15nm / Ag 13.5nm / TiOx10nm / ZnSnOx 53nm / AZO 12nm / Ag 11.5nm / TiO 11nm / ZnSnOx 13nm / SiN 15nm. The physical thickness of the coating element is 173nm. The infrared reflective triple silver coating can be used to connect the power supply and heat the outer glass plate. In addition, the peripheral area of ​​the inner glass plate is screen-printed with black light-shielding ink. The bonding layer is a transparent PVB layer with a transmittance of ≥90%.

[0088] Table 1: Performance parameters of laminated glass of Comparative Examples 1-4 and Examples 1-3

[0089]

[0090]

[0091] Comparative Example 1 is a laminated glass with traditional peripheral printing ink. The advantages of using traditional ink screen printing are simple process and good shielding property. However, due to the large differences in heat absorption coefficient and thermal expansion coefficient between ink and glass, the glass is prone to light distortion at the junction of ink and glass, stress weakening of glass in the ink area, and easy cracking of glass in the ink area after thermoforming of the glass. Especially when used for laminated panoramic sunroof products with heat-reflective coating, the ink printing area is large, and the large difference in heat absorption coefficient between the ink area and the middle transparent area makes it more likely to cause the above defects, which increases the difficulty of glass processing to a certain extent.

[0092] Comparative Example 2 and Example 1 both use a coating method to replace ink, improve the problems caused by ink, and still obtain a beautiful and neutral color from the outside of the car, and obtain good shielding properties. However, the solution of Comparative Example 2 uses a titanium nitride visible light absorption film layer as a visible light "darkening layer", which requires a thicker thickness (the thickness of the separate TiN layer needs to be greater than 300nm) to reduce the visible light transmittance to a lower level (<20% transmittance), and the sputtering efficiency of titanium nitride or aluminum nitride coating by magnetron sputtering is relatively low, which is not conducive to economical production.

[0093] Both Example 2 and Example 3 use the coating element of the present application, and prepare an infrared reflection layer such as double silver coating or triple silver coating on the coating element. Not only can the area covered by the coating element obtain a beautiful neutral color, but the light reflectivity of the glass surface in the area covered by the coating element is close to the reflectivity of the glass surface in the area covered by the infrared reflection layer, which is more conducive to the consistency of the overall reflectivity of the glass surface.

[0094] Comparative Example 3 is a traditional glass solution with a triple silver coating that has an infrared reflective coating and can be electrically heated: for the sake of power and aesthetics, the triple silver coating and the electrode part need to be arranged in the black edge ink area; its disadvantages are: 1. The surface roughness of the ink is relatively large, reaching the micron level, and the triple silver coating cannot form a continuous and flat film layer on the ink, affecting the conduction of current; 2. The ink thickness is relatively thick, reaching 15μm-25μm, which is much higher than the film thickness of the triple silver coating (about 300nm-400nm), so it is easy to cause the triple silver coating to conduct current unfavorably at the junction of the ink edge and the risk of triple silver coating faults. The above problems will cause the resistance of the triple silver coating on the glass to increase, affecting the heating efficiency.

[0095] However, Example 3 uses the coating element of the present application instead of ink, and the visible light transmittance of the peripheral area is less than 10%, which can not only obtain a more beautiful shielding color and a good shielding effect, but also the coating element has a uniform and flat surface and a very thin thickness (<200nm), which greatly improves the conduction of the three-silver coating current and solves the risk of easy fracture at the junction of the film layer. Compared with Comparative Example 3, the three-silver coating resistance of Example 3 is significantly reduced, and the heating efficiency is significantly improved.

[0096] The above is a detailed introduction to the contents provided in the implementation mode of the present application. This article explains and illustrates the principles and implementation modes of the present application. The above explanation is only used to help understand the method and core idea of ​​the present application. At the same time, for those skilled in the art, according to the idea of ​​the present application, there will be changes in the specific implementation mode and application scope. In summary, the contents of this specification should not be understood as limiting the present application.

Claims

1. A film-coated substrate, characterized in that: The coated substrate includes a substrate and a coating element arranged on at least one side of the substrate, the coating element includes at least two light absorption layers and a high refractive index layer arranged between the two light absorption layers, the material of the light absorption layer is selected from at least one of W, Ni, Cr, Ti, Nb, Mo, Si, and Zr, and the refractive index of the high refractive index layer is ≥1.8 at a wavelength of 550nm.

2. The coated substrate according to claim 1, characterized in that: The high refractive index layer has a refractive index of ≥2, or ≥2.3, or ≥2.5, or ≥2.8, or ≥3 at a light having a wavelength of 550 nm.

3. The film-coated substrate according to claim 2, characterized in that: The material of the high refractive index layer is selected from at least one of Zn, Si, Sn, Ti, Nb, Zr, Hf, Mg, Ni, In, Al, Ga, Bi metal oxides and mixtures thereof, or selected from at least one of Si, Al, Zr, Ti, Y, Hf, Nb, Ta metal nitrides or oxynitrides and mixtures thereof.

4. The coated substrate according to claim 1, characterized in that: The physical thickness of the coating element is 60nm to 500nm, or 70nm to 400nm, or 70nm to 350nm.

5. The coated substrate according to claim 1, characterized in that: The physical thickness of the high refractive index layer is 60nm to 100nm, or 70nm to 90nm, or 60nm to 80nm.

6. The coated substrate according to claim 1, characterized in that: The total physical thickness of the light absorbing layer in the coating element is ≥10nm, or ≥20nm, or ≥25nm; and / or the total physical thickness of the light absorbing layer in the coating element is ≤300nm, or ≤150nm, or ≤80nm, or ≤50nm.

7. The film-coated substrate according to claim 1, characterized in that: The physical thickness of one of the light absorbing layers is ≥5 nm, or ≥10 nm, or ≥15 nm; and / or the physical thickness of one of the light absorbing layers is ≤150 nm, or ≤100 nm, or ≤50 nm.

8. The coated substrate according to claim 1, characterized in that: The coating element further comprises at least one dielectric layer, wherein the dielectric layer is disposed between the two light absorbing layers; and / or, the dielectric layer is disposed on a side of the light absorbing layer facing the substrate; and / or, the dielectric layer is disposed on a side of the light absorbing layer facing away from the substrate.

9. The film-coated substrate according to claim 8, characterized in that: The material of the dielectric layer is selected from at least one of Zn, Si, Sn, Ti, Nb, Zr, Hf, Mg, Ni, In, Al, Ga, Bi metal oxides and mixtures thereof, or selected from at least one of Si, Al, Zr, Ti, Y, Hf, Nb, Ta metal nitrides or oxynitrides and mixtures thereof.

10. The film-coated substrate according to claim 8, characterized in that: The ratio of the total physical thickness of the light absorbing layer to the total physical thickness of the dielectric layer is 0.2 to 1.8, or 0.5 to 1.

5.

11. The film-coated substrate according to claim 8, characterized in that: One of the dielectric layers and one of the light absorbing layers form a stacked structure, and the coating element includes at least two of the stacked structures.

12. The film-coated substrate according to claim 11, characterized in that: The coating element includes two stacked structures, and the coating element includes a first dielectric layer, a first light absorbing layer, the high refractive index layer, a second light absorbing layer, and a second dielectric layer stacked in sequence on one side of the substrate. The first dielectric layer and the first light absorbing layer form one stacked structure, and the second light absorbing layer and the second dielectric layer form another stacked structure.

13. The film-coated substrate according to claim 12, characterized in that: The ratio of the physical thickness of the first dielectric layer to the physical thickness of the second dielectric layer is 0.1 to 4, or 0.5 to 3.5, or 1 to 3; And / or, a ratio of the physical thickness of the first light absorbing layer to the physical thickness of the second light absorbing layer is 0.1 to 2, or 0.5 to 1.5, or 0.8 to 1.

2.

14. The film-coated substrate according to claim 8, characterized in that: The physical thickness of the dielectric layer in the coating element closest to the substrate is 20 nm to 45 nm, or 25 nm to 45 nm, or 30 nm to 40 nm.

15. The film-coated substrate according to claim 8, characterized in that: The physical thickness of the dielectric layer in the coating element that is farthest from the substrate is 3nm to 200nm, or 30nm to 150nm, or 50nm to 100nm.

16. The film-coated substrate according to claim 8, characterized in that: The dielectric layer is composed of a first dielectric sublayer and a second dielectric sublayer which are stacked, and the ratio of the physical thickness of the first dielectric sublayer to the physical thickness of the second dielectric sublayer is 0.1 to 1, or 0.3 to 0.

7.

17. The film-coated substrate according to claim 1, characterized in that: The film-coated substrate further comprises an infrared reflection layer disposed on the same side of the substrate as the film-coated element, and the infrared reflection layer comprises at least one metal layer or metal alloy layer.

18. A laminated glass, characterized in that: The laminated glass includes a first glass plate, an adhesive layer, and a second glass plate, the second glass plate is a coated substrate as described in any one of claims 1 to 17, the coated element is connected to the adhesive layer, the first glass plate has a first surface and a second surface, the second glass plate has a third surface and a fourth surface, and the adhesive layer connects the second surface and the third surface.

19. The laminated glass according to claim 18, characterized in that: Along the laminating direction from the first glass plate to the second glass plate, the outer surface of the laminated glass has a light reflectivity RL, and the light reflectivity RL≤30%, or RL≤20%, or RL≤15%, or RL≤7%.

20. The laminated glass according to claim 18, characterized in that: The reflection color of the first surface to visible light has a Lab value, a is -5 to 3 and b is -5 to 3, or a is -3 to 1 and b is -3 to 1, or a is -1 to 0 and b is -1 to 0.

21. A vehicle, characterized in that: The vehicle comprises a vehicle body and a coating substrate as described in any one of claims 1 to 17, wherein the coating substrate is arranged on the vehicle body.

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