Efficient workpiece brushing and polishing device and polishing solution filtering method
By using the rotating centrifugal force of the workpiece fixing disk in the workpiece brush and throwing device to separate the polishing liquid and impurities, the problem of poor filtration of the polishing liquid in the prior art is solved, and efficient filtration and recycling of the polishing liquid is achieved, and equipment cost and energy consumption are reduced.
Patent Information
- Application Number
- CN202411644644.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-18
- Publication Date
- 2025-03-07
AI Technical Summary
During the filtration and reuse of polishing liquid, existing polishing equipment needs to be equipped with additional filtering equipment, which increases equipment cost and energy consumption, and has poor filtration effect.
An efficient workpiece brushing and throwing device is designed, and the polishing liquid and impurities are separated layer by using the rotating centrifugal force of the workpiece fixing disk. The filtered polishing liquid is derived through the liquid outlet holes arranged between the deposition area and the polishing area, thereby achieving efficient filtration and recovery of the polishing liquid.
It improves the filtration effect of polishing liquid, reduces equipment costs and energy consumption, facilitates the removal of impurities, and realizes the efficient recycling of polishing liquid.
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Figure CN119567066A_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the technical field of polishing equipment, and in particular to an efficient workpiece brushing and polishing device and a polishing liquid filtering method. Background Art
[0002] Workpiece polishing is a surface treatment process that aims to improve the surface quality and appearance of the workpiece. It removes scratches, oxide layers, rust and other defects on the surface of the workpiece to make the surface smoother and flatter, achieving a mirror effect. It enhances the beauty of the workpiece and gives it a better visual effect.
[0003] Nowadays, the polishing brush device used for polishing usually uses tools such as polishing wheels and sandpaper, and cooperates with polishing liquid to repeatedly rub against the surface of the workpiece under a certain pressure to remove the microscopic unevenness of the surface. However, the polishing liquid will accumulate a lot of debris and impurities during the long-term polishing and grinding process. In order to reduce costs, it is usually necessary to filter the polishing liquid and reuse it. However, traditional polishing machines usually require additional filtering equipment to filter the polishing liquid, and then pump the filtered polishing liquid back to the polishing brush device for reuse. On the one hand, this structural design requires the addition of filtering equipment, which increases the equipment cost; on the other hand, the additional equipment will inevitably increase the working energy consumption of the device. It is not conducive to energy conservation and emission reduction.
[0004] Therefore, the above-mentioned technical defects need to be changed urgently. Summary of the invention
[0005] In view of the above-mentioned deficiencies in the prior art, the purpose of the present application is to provide an efficient workpiece brushing and polishing device and a polishing liquid filtering method, aiming to improve the effect of polishing liquid filtering and recycling, while facilitating the removal of impurities in the polishing liquid.
[0006] A technical solution adopted by the present application to solve the technical problem is as follows: In the first aspect, an efficient workpiece brushing and polishing device comprises:
[0007] Machine;
[0008] The polishing assembly includes a workpiece fixing plate and a polishing plate. Both the workpiece fixing plate and the polishing plate are arranged on the machine platform. The polishing plate is stacked on the workpiece fixing plate, and the two rotate in opposite directions. The polishing plate is used to polish the workpiece on the workpiece fixing plate.
[0009] and a polishing liquid delivery assembly, the polishing liquid delivery assembly being used to deliver polishing liquid to the workpiece fixing plate and the polishing plate;
[0010] Among them, the workpiece fixing plate is provided with a polishing area and a deposition area. The deposition area is arranged around the polishing area. The deposition area is used to precipitate impurities in the polishing liquid. A first enclosure is arranged on the periphery of the deposition area. The first enclosure is used to prevent the polishing liquid from being thrown out. At least one through liquid outlet is opened between the deposition area and the polishing area. The liquid outlet is used to guide the polishing liquid after deposition.
[0011] This embodiment is further configured such that a second enclosure is provided between the deposition area and the polishing area, and a plurality of through holes are evenly provided at the bottom of the second enclosure, and the through holes are used for guiding the polishing liquid.
[0012] The present embodiment is further configured such that a plurality of through-flowing liquid outlets are provided on the workpiece fixing plate, and the plurality of liquid outlets are evenly arranged between the deposition area and the polishing area.
[0013] The present embodiment is further configured such that an annular collecting groove is provided on the machine platform, and an opening of the annular collecting groove is provided corresponding to a plurality of liquid outlet holes.
[0014] This embodiment is further configured such that a plurality of polishing heads are detachably connected to one end of the polishing disc facing the workpiece fixing disc, and the polishing heads are evenly arranged around the rotation axis of the polishing disc;
[0015] A liquid accumulation groove is provided at one end of the polishing disc facing away from the workpiece fixing disc, and a plurality of drip holes are provided through the liquid accumulation groove, and the plurality of drip holes are respectively arranged corresponding to the plurality of polishing heads.
[0016] This embodiment is further configured that the polishing liquid delivery component includes:
[0017] A liquid storage tank, which is arranged on the machine platform;
[0018] A collecting pipe, both ends of which are connected to the annular collecting tank and the liquid storage tank respectively;
[0019] And a liquid outlet pipe, one end of which is connected to the annular collecting tank, and the other end is arranged at the open upper end of the liquid accumulation tank. A water pump is arranged on the liquid outlet pipe, and the water pump is used to pump the polishing liquid to the liquid accumulation tank.
[0020] This embodiment is further configured that the polishing assembly further includes:
[0021] A first driving member, the first driving member is arranged on the machine platform, and the first driving member is used to rotate the workpiece fixing plate;
[0022] The second driving member is arranged on the machine platform and is used for rotating the polishing disc.
[0023] This embodiment is further configured as follows: a plurality of workpiece fixing brackets are movably connected to the polishing area, a movable gear is provided on the workpiece fixing bracket, the plurality of workpiece fixing brackets are arranged around the axis of the workpiece fixing disk, a fixed gear is fixed on the machine table, the axis of the fixed gear is the same as the axis of the workpiece fixing disk, a plurality of movable gears are meshed with the fixed gear, and a plurality of movable gears and the fixed gear form a planetary gear structure.
[0024] This embodiment is further configured such that a lifting assembly is provided on the machine platform, the lifting assembly is used to adjust the distance between the polishing plate and the workpiece fixing plate, and the second driving member is provided on the lifting assembly.
[0025] The second aspect of the present application provides a polishing liquid filtering method for an efficient workpiece brush polishing device based on any one of the first aspects, and the polishing liquid filtering method comprises the following steps:
[0026] rotating the polishing disc by means of a first driving member;
[0027] The polishing liquid is thrown into the deposition area by the rotating polishing disc;
[0028] Under the action of centrifugal force, impurities in the polishing liquid are deposited on the outside of the deposition area, and the filtered polishing liquid flows to the annular collection tank through the liquid outlet hole;
[0029] The filtered polishing liquid is transported to the liquid storage tank through the annular collecting tank;
[0030] The polishing liquid in the liquid storage tank is transported to the liquid accumulation groove on the polishing plate by a water pump, so that the polishing liquid drips onto the polishing head.
[0031] Compared with the prior art, the present application provides an efficient workpiece brushing and polishing device. The present invention polishes the workpiece by means of a rotating workpiece fixing disk, and separates the polishing liquid and impurities into layers by means of the rotating centrifugal force of the workpiece fixing disk. The polishing liquid is placed on the inner side of the layers, and the impurities are placed on the outer side of the layers. The filtered polishing liquid is then led out through the liquid outlet hole provided between the deposition area and the polishing area. In this way, the technical effect of filtering and recovering the polishing liquid is achieved, which effectively improves the filtering effect of the polishing liquid and facilitates the removal of impurities. BRIEF DESCRIPTION OF THE DRAWINGS
[0032] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.
[0033] Figure 1 It is a schematic diagram of the overall structure of an efficient workpiece brushing and polishing device provided in this embodiment;
[0034] Figure 2 It is a partial structural schematic diagram of an efficient workpiece brushing and polishing device provided in this embodiment;
[0035] Figure 3 It is a partial structural schematic diagram of an efficient workpiece brushing and polishing device provided in this embodiment;
[0036] Figure 4 It is a partial structural schematic diagram of an efficient workpiece brushing and polishing device provided in this embodiment;
[0037] Figure 5 It is an exploded schematic diagram of a polishing assembly of an efficient workpiece brush polishing device provided in this embodiment;
[0038] Figure 6 It is an exploded schematic diagram of a workpiece fixing plate of an efficient workpiece brushing and polishing device provided in this embodiment;
[0039] Figure 7 It is a top view of a workpiece fixing plate of a high-efficiency workpiece brushing and polishing device provided in this embodiment.
[0040] In the figure: 1. machine table; 11. lifting assembly; 2. polishing assembly; 21. workpiece fixing plate; 211. polishing area; 2111. workpiece fixing bracket; 2112. moving gear; 2113. fixed gear; 212. deposition area; 213. first enclosure; 214. liquid outlet; 215. second enclosure; 2151. through hole; 22. polishing plate; 221. polishing head; 222. liquid accumulation tank; 223. dripping hole; 23. annular collecting tank; 24. first driving member; 25. second driving member; 3. polishing liquid delivery assembly; 31. liquid storage tank; 32. collecting pipe; 33. liquid outlet pipe. DETAILED DESCRIPTION
[0041] The embodiments of the present application are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application, and cannot be understood as limiting the present application.
[0042] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present application. In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present application, unless otherwise specified, "multiple" means two or more.
[0043] In the description of this application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.
[0044] In addition, the technical features involved in the different embodiments of the present invention described above can be combined with each other as long as they do not conflict with each other.
[0045] The present invention provides Figure 1 , Figure 2 , Figure 3 and Figure 4 As shown, a highly efficient workpiece brushing and polishing device is used to grind and polish the surface of the workpiece, remove scratches, oxide layers, rust and other defects on the surface of the workpiece, make the surface smoother and flatter, and achieve a mirror effect. Enhance the aesthetics of the workpiece and give it a better visual effect. Its main structure includes: a machine 1, a polishing assembly 2 and a polishing liquid delivery assembly 3; the machine 1 is used to fix the polishing assembly 2 and the polishing liquid delivery assembly 3. The polishing assembly 2 includes a workpiece fixing disk 21 and a polishing disk 22, and the workpiece fixing disk 21 and the polishing disk 22 are both arranged on the machine 1. The polishing disk 22 is stacked on the workpiece fixing disk 21, and the two rotate in opposite directions to make the grinding and polishing more efficient. The polishing disk 22 is used to polish the workpiece on the workpiece fixing disk 21; the polishing liquid delivery assembly 3 is used to deliver polishing liquid to the workpiece fixing disk 21 and the polishing disk 22, and the addition of polishing liquid makes the grinding and polishing effect better;
[0046] Among them, the workpiece fixing plate 21 is provided with a polishing area 211 and a deposition area 212. The deposition area 212 is arranged around the polishing area 211. The deposition area 212 is used to precipitate impurities in the polishing liquid. The polishing area 211 is used to fix the workpiece to be polished, and the workpiece is polished in the polishing area 211. A first enclosure 213 is arranged on the periphery of the deposition area 212. The first enclosure 213 is used to prevent the polishing liquid from being thrown out and prevent the polishing liquid from splashing out when the workpiece is polished. At least one through-hole 214 is opened between the deposition area 212 and the polishing area 211. The liquid outlet 214 is used to guide the polishing liquid after deposition. The polishing liquid after polishing flows from the polishing area 211 to the deposition area 212 through the liquid outlet 214. Then the polishing liquid and impurities are separated by layers in the deposition area 212 by centrifugal force. In this way, the effect of filtering and purifying the polishing liquid is achieved.
[0047] It should be noted that traditional polishing machines usually require additional filtering equipment to filter the polishing liquid, and then pump the filtered polishing liquid back to the polishing brush device for reuse. This structural design requires the addition of filtering equipment, which increases the equipment cost; on the other hand, the additional equipment will inevitably increase the working energy consumption of the device. This is not conducive to energy conservation and emission reduction.
[0048] The present invention performs polishing operation on the workpiece by means of the rotating workpiece fixing disk 21, and separates the polishing liquid and impurities into layers by means of the rotating centrifugal force of the workpiece fixing disk 21. The polishing liquid is placed on the inner side of the layers, and the impurities are placed on the outer side of the layers, and then the filtered polishing liquid is led out through the liquid outlet 214 provided between the deposition area 212 and the polishing area 211. In this way, the technical effect of filtering and recovering the polishing liquid is achieved, which effectively improves the filtering effect of the polishing liquid and facilitates the removal of impurities. In some embodiments, an annular groove is provided in the deposition area 212, and the annular groove extends around the extension direction of the deposition area 212, and the annular groove is provided on the periphery of the deposition area 212, and the annular groove is used to deposit impurities in the polishing liquid, so that the impurities in the polishing liquid can be better formed in the annular groove. It is also more convenient for the staff to remove the formed impurity blocks.
[0049] Further, such as Figure 5 and Figure 6 As shown, a second enclosure 215 is provided between the deposition area 212 and the polishing area 211 , and a plurality of through holes 2151 are evenly formed at the bottom of the second enclosure 215 , and the through holes 2151 are used to guide the polishing liquid.
[0050] It should be noted that the second enclosure 215 can prevent the polishing liquid sprayed in the polishing area 211 from directly splashing to the deposition area 212. Since the splashed polishing liquid carries kinetic energy, when the polishing liquid splashes to the polishing liquid in the deposition area 212 that is separating impurities, it will interfere with the polishing liquid that is separating impurities, affecting the impurity separation effect and efficiency of the polishing liquid. Therefore, it is necessary to set the second enclosure 215 between the deposition area 212 and the polishing area 211, and the polishing liquid in the polishing area 211 slowly flows to the deposition area 212 through the through hole 2151 at the bottom of the second enclosure 215, and then the impurities are separated in the deposition area 212.
[0051] Further, such as Figure 6 and Figure 7 As shown, a plurality of through-holes 214 are formed on the workpiece fixing plate 21 , and the plurality of liquid outlet holes 214 are evenly arranged between the deposition area 212 and the polishing area 211 .
[0052] It should be noted that while the rotating workpiece fixing disk 21 is polishing the workpiece, centrifugal force will be generated on the polishing liquid on the workpiece fixing disk 21. The polishing liquid and impurities are separated by layers through centrifugal force. Since the polishing liquid is light in weight, the polishing liquid is on the inner side of the deposition area 212. The impurities are heavier and are on the outer side of the layers. Over time, the impurities in the polishing liquid will be deposited and agglomerated on the outer side of the deposition area 212. The polishing liquid can flow out of the liquid outlet 214 between the deposition area 212 and the polishing area 211. In this way, the technical effect of filtering and recovering the polishing liquid is achieved, which effectively improves the filtering effect of the polishing liquid and facilitates the removal of impurities.
[0053] Further, such as Figure 2 , Figure 3 , Figure 4 and Figure 5 As shown, an annular collecting groove 23 is disposed on the machine 1 , and the opening of the annular collecting groove 23 is disposed corresponding to a plurality of liquid outlet holes 214 .
[0054] It should be noted that the polishing liquid flowing out of the liquid outlet 214 will be collected by the annular collecting groove 23, and drained to the liquid storage tank 31 through the collecting pipe 32 at the bottom of the annular collecting groove 23, and can be deposited again in the liquid storage tank 31, so that the polishing liquid can be further purified.
[0055] Further, such as Figure 5As shown, one end of the polishing disc 22 facing the workpiece fixing disc 21 is detachably connected with a plurality of polishing heads 221, and the polishing heads 221 are evenly arranged around the rotation axis of the polishing disc 22; the polishing heads 221 are arranged correspondingly to the workpiece fixing bracket 2111, so that even if the workpiece fixing disc 21 and the polishing disc 22 rotate in opposite directions, the polishing heads 221 and the workpiece fixing bracket 2111 can be ensured to be on the same rotation movement track, so that the polishing heads 221 can grind and polish the workpiece to be polished on the workpiece fixing bracket 2111 at all times.
[0056] like Figure 4 and Figure 5 As shown, a liquid accumulating groove 222 is provided at one end of the polishing disc 22 facing away from the workpiece fixing disc 21, and a plurality of drip holes 223 are provided through the liquid accumulating groove 222, and the plurality of drip holes 223 are respectively arranged corresponding to the plurality of polishing heads 221. The purified polishing liquid in the liquid storage tank 31 is conveyed to the liquid accumulating groove 222 through the liquid outlet pipe 33, and then drips onto the polishing head 221 through the drip holes 223 on the liquid accumulating groove 222. The polishing head 221 can always be involved in the polishing liquid when polishing the workpiece, thereby improving the polishing effect.
[0057] Further, such as Figure 3 , Figure 4 As shown, the polishing liquid delivery assembly 3 includes: a liquid storage tank 31, a collecting pipe 32 and a liquid outlet pipe 33, the liquid storage tank 31 is arranged on the machine 1; the two ends of the collecting pipe 32 are respectively connected to the annular collecting tank 23 and the liquid storage tank 31; one end of the liquid outlet pipe 33 is connected to the annular collecting tank 23, and the other end is arranged at the open upper end of the liquid accumulation tank 222, and a water pump is arranged on the liquid outlet pipe 33, and the water pump is used to pump the polishing liquid to the liquid accumulation tank 222.
[0058] Further, such as Figure 2 , Figure 3 As shown, the polishing assembly 2 further includes: a first driving member 24 and a second driving member 25, wherein the first driving member 24 is disposed on the machine table 1 and is used to rotate the workpiece fixing disk 21; the second driving member 25 is disposed on the machine table 1 and is used to rotate the polishing disk 22. The workpiece fixing disk 21 and the polishing disk 22 are rotated in opposite directions, so that the workpiece can obtain a better grinding and polishing effect. In some embodiments, the workpiece fixing disk 21 and the polishing disk 22 have the same rotation axis.
[0059] Further, such as Figure 4 , Figure 5 and Figure 6As shown, a plurality of workpiece fixing brackets 2111 are movably connected to the polishing area 211, and a movable gear 2112 is provided on the workpiece fixing bracket 2111. The plurality of workpiece fixing brackets 2111 are arranged around the axis of the workpiece fixing disk 21, and the machine table 1 is provided with a fixed gear 2113, the axis of the fixed gear 2113 is the same as the axis of the workpiece fixing disk 21, and a plurality of movable gears 2112 are meshed with the fixed gear 2113, and the plurality of movable gears 2112 and the fixed gear 2113 form a planetary gear structure.
[0060] Further, such as Figure 2 , Figure 3 , Figure 4 As shown, a lifting assembly 11 is provided on the machine 1, and the lifting assembly 11 is used to adjust the distance between the polishing disc 22 and the workpiece fixing disc 21, and the second driving member 25 is provided on the lifting assembly 11. The distance between the polishing disc 22 and the workpiece fixing disc 21 is adjusted by the lifting assembly 11. When it is necessary to take or place the workpiece on the workpiece fixing bracket 2111 or replace the polishing head 221, the polishing disc 22 needs to be separated from the workpiece fixing disc 21. Sufficient space is freed up for taking or placing the workpiece or replacing the polishing head 221.
[0061] The second aspect of the present application provides a polishing liquid filtering method for an efficient workpiece brush polishing device based on any one of the first aspects, and the polishing liquid filtering method comprises the following steps:
[0062] Step 1: rotating the polishing disc 22 by the first driving member 24;
[0063] Step 2, the polishing liquid is thrown to the deposition area 212 by the rotating polishing disc 22;
[0064] Step 3: Under the action of centrifugal force, impurities in the polishing liquid are deposited on the outside of the deposition area 212, and the filtered polishing liquid flows to the annular collection tank 23 through the liquid outlet 214;
[0065] Step 4, transporting the filtered polishing liquid to the liquid storage tank 31 through the annular collecting tank 23;
[0066] Step five: transport the polishing liquid in the liquid storage tank 31 to the liquid storage tank 222 on the polishing plate 22 through a water pump, so that the polishing liquid drips onto the polishing head 221 .
[0067] In summary, the present application provides an efficient workpiece brushing device and a polishing liquid filtering method. The present invention performs polishing operations on the workpiece through the rotating workpiece fixing disk 21, and separates the polishing liquid and impurities into layers through the rotating centrifugal force of the workpiece fixing disk 21. The polishing liquid is placed on the inner side of the layer, and the impurities are placed on the outer side of the layer. Then, the filtered polishing liquid is discharged through the liquid outlet 214 provided between the deposition area 212 and the polishing area 211. In this way, the technical effect of polishing liquid filtration and recovery is achieved, which effectively improves the polishing liquid filtration effect and facilitates the removal of impurities.
[0068] Obviously, the above embodiments are merely examples for the purpose of clear explanation, and are not intended to limit the implementation methods. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to list all the implementation methods here. The obvious changes or modifications derived therefrom are still within the scope of protection of the invention.
Claims
1. An efficient workpiece brushing and polishing device, characterized in that: include: Machine; A polishing assembly, the polishing assembly comprising a workpiece fixing disk and a polishing disk, the workpiece fixing disk and the polishing disk are both arranged on the machine platform, the polishing disk is stacked on the workpiece fixing disk, and the two rotate in opposite directions, and the polishing disk is used to polish the workpiece on the workpiece fixing disk; and a polishing liquid delivery assembly, the polishing liquid delivery assembly being used to deliver polishing liquid to the workpiece fixing plate and the polishing plate; Among them, the workpiece fixing plate is provided with a polishing area and a deposition area, the deposition area is arranged around the polishing area, the deposition area is used to precipitate impurities in the polishing liquid, a first enclosure is arranged on the periphery of the deposition area, the first enclosure is used to prevent the polishing liquid from being thrown out, and at least one through liquid outlet is opened between the deposition area and the polishing area, and the liquid outlet is used to guide the polishing liquid after deposition.
2. An efficient workpiece brushing and polishing device according to claim 1, characterized in that: A second enclosure is arranged between the deposition area and the polishing area, and a plurality of through holes are evenly opened at the bottom of the second enclosure, and the through holes are used for guiding the polishing liquid.
3. An efficient workpiece brushing and polishing device according to claim 1, characterized in that: The workpiece fixing plate is provided with a plurality of through-going liquid outlet holes, and the plurality of liquid outlet holes are evenly arranged between the deposition area and the polishing area.
4. An efficient workpiece brushing and polishing device according to claim 3, characterized in that: An annular collecting groove is arranged on the machine platform, and an opening of the annular collecting groove is arranged corresponding to a plurality of the liquid outlet holes.
5. The efficient workpiece brushing and polishing device according to claim 4 is characterized in that: A plurality of polishing heads are detachably connected to one end of the polishing disc facing the workpiece fixing disc, and the polishing heads are evenly arranged around the rotation axis of the polishing disc; A liquid accumulation groove is formed at one end of the polishing disc facing away from the workpiece fixing disc, and a plurality of drip holes are formed in the liquid accumulation groove, and the plurality of drip holes are respectively arranged corresponding to the plurality of polishing heads.
6. An efficient workpiece brushing and polishing device according to claim 5, characterized in that: The polishing liquid delivery assembly comprises: A liquid storage tank, the liquid storage tank is arranged on the machine platform; A collecting pipe, both ends of which are connected to the annular collecting tank and the liquid storage tank respectively; And a liquid outlet pipe, one end of which is connected to the annular collecting tank, and the other end is arranged at the open upper end of the liquid accumulation tank. A water pump is arranged on the liquid outlet pipe, and the water pump is used to pump the polishing liquid to the liquid accumulation tank.
7. The efficient workpiece brushing and polishing device according to claim 1 is characterized in that: The polishing assembly also includes: A first driving member, the first driving member is disposed on the machine platform, and the first driving member is used to rotate the workpiece fixing plate; A second driving member, wherein the second driving member is arranged on the machine platform and is used for rotating the polishing disc.
8. The efficient workpiece brushing and polishing device according to claim 7, characterized in that: A plurality of workpiece fixing brackets are movably connected to the polishing area, and a moving gear is arranged on the workpiece fixing bracket. The plurality of workpiece fixing brackets are arranged around the axis of the workpiece fixing disk. The machine table is provided with a fixed gear, and the axis of the fixed gear is the same as the axis of the workpiece fixing disk. The plurality of moving gears are meshed with the fixed gear, and the plurality of moving gears and the fixed gear form a planetary gear structure.
9. The efficient workpiece brushing and polishing device according to claim 7, characterized in that: The machine platform is provided with a lifting assembly, the lifting assembly is used to adjust the distance between the polishing disk and the workpiece fixing disk, and the second driving member is provided on the lifting assembly.
10. A polishing liquid filtering method for a high-efficiency workpiece brush polishing device according to any one of claims 1 to 9, characterized in that: The polishing liquid filtering method comprises the following steps: rotating the polishing disc by means of a first driving member; Throwing the polishing liquid to the deposition area by the rotating polishing disc; Under the action of centrifugal force, impurities in the polishing liquid are deposited outside the deposition area, and the filtered polishing liquid flows to the annular collection tank through the liquid outlet hole; The filtered polishing liquid is transported to the liquid storage tank through the annular collecting groove; The polishing liquid in the liquid storage tank is transported to the liquid storage tank on the polishing plate by a water pump, so that the polishing liquid drips onto the polishing head.
Citation Information
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