Imaging system of exposure equipment and adjusting method and device of imaging system

Abstract

The invention discloses an imaging system of exposure equipment and an adjusting method and device of the imaging system, and relates to the technical field of exposure equipment, the imaging system comprises at least one imaging branch, and the imaging branch comprises a first reflector, a second reflector and a wedge-shaped mirror; the first reflecting mirror is mounted below the imaging assembly based on a preset first inclination angle and is used for converting the light from the vertical direction into the transverse direction; the second reflecting mirror is mounted on the reflecting side of the first reflecting mirror based on a preset second inclination angle and is used for converting the light reflected by the first reflecting mirror into the inclination direction; and the wedge-shaped mirror is mounted below the second reflecting mirror based on a preset wedge-shaped mirror thickness and is used for projecting the light rays reflected by the second reflecting mirror on the focal plane. The exposure equipment is used for solving the problems that in the prior art, exposure time of the exposure equipment is long, and splicing marks exist in the exposure area, one-time exposure of the exposure equipment is achieved, and the problem of splicing marks existing in the exposure area is solved.

Description

Technical Field

[0001] The present application relates to the technical field of exposure equipment, and in particular to an imaging system of an exposure equipment, and an adjustment method and device of the imaging system. Background Art

[0002] The digital micromirror device (DMD) and the imaging component are installed in the exposure machine. The laser is irradiated onto the DMD after being homogenized. After being reflected by the DMD, it passes through the imaging component and is exposed on the substrate to form a pattern. The existing exposure machine includes multiple sets of DMDs and imaging components, that is, there are multiple imaging lenses, and the corresponding pattern is obtained by exposing multiple sets of lenses at one time or multiple sets of lenses multiple times.

[0003] In order to save exposure time and shorten the width of the exposure machine, the exposure machine sets the original imaging lenses distributed in one row to multiple rows of staggered shots. For the staggered imaging lenses, the exposure start time of each imaging lens is different, that is, each imaging lens is exposed asynchronously. In the case of asynchronous exposure, one side of the splicing part of the substrate is a reacted solidified material, and the other side is an unreacted photosensitive material, so that the exposure areas corresponding to different imaging lenses partially overlap, resulting in splicing prints. Summary of the invention

[0004] In response to the above-mentioned problems and technical needs, the applicant has proposed an imaging system for exposure equipment, an adjustment method and a device for the imaging system, so as to solve the problems of long exposure time and splicing prints in the exposure area of ​​the exposure equipment in the prior art, realize one-time exposure of the exposure equipment and solve the splicing print problem in the exposure area.

[0005] The embodiment of the present application provides an imaging system of an exposure device, the exposure device comprising: at least two exposure components, the exposure lens component comprising: a digital micromirror device and an imaging component, the exposure components are arranged in a staggered arrangement, the imaging system comprising: at least one imaging branch, the imaging branch comprising: a first reflector, a second reflector and a wedge mirror;

[0006] The first reflector is installed below the imaging component based on a preset first tilt angle, and is used to transform the light passing through the imaging component from a vertical direction to a horizontal direction, and project the transformed light onto the second reflector;

[0007] The second reflector is installed on the reflective side of the first reflector based on a preset second tilt angle, and is used to transform the light reflected by the first reflector into an inclined direction, and project the transformed light onto the wedge mirror;

[0008] The wedge mirror is installed below the second reflector based on a preset wedge mirror thickness, and is used to project the light reflected by the second reflector onto a focal plane;

[0009] The first tilt angle, the second tilt angle, the thickness of the wedge mirror, the installation position of the first reflector, the installation position of the second reflector, and the installation position of the wedge mirror are obtained by pre-adjusting the imaging system based on an adjustment target;

[0010] Wherein, the adjustment target includes: the center of the light spot of the staggered distribution exposure assembly corresponds to a horizontal central axis in the imaging plane, and the stitching difference between any two adjacent light spot images on the central axis belongs to a preset difference range.

[0011] According to an imaging system of an exposure device according to one embodiment of the present application, at least one of the imaging branches includes: two imaging branches.

[0012] According to an imaging system of an exposure device according to one embodiment of the present application, the first reflector, the second reflector and the wedge-shaped mirror are combined into an optical element, and the optical element includes: a first reflective surface, a second reflective surface and a wedge-shaped transmissive body.

[0013] The present application also provides an imaging system adjustment method, which is applied to the imaging system of the exposure device as described in any one of the above items, and the method includes:

[0014] Obtaining the center position corresponding to each light spot center of the exposure component;

[0015] Based on the plurality of center positions, adjusting the distance between the first reflector and the second reflector so that the spot centers of the staggered exposure components correspond to a horizontal center axis in the imaging plane;

[0016] Obtaining the focal plane inclination of each exposure component after imaging, and the focal plane height corresponding to each exposure component;

[0017] Based on the inclination and the focal plane height, adjusting the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure assembly, so that the focal plane height corresponding to the center of the light spot of each exposure assembly is consistent and parallel to the horizontal plane, wherein the installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging assembly in the vertical direction;

[0018] Analyze the spot image obtained based on the imaging system to determine the stitching difference between any two adjacent spot images on the central axis;

[0019] Based on the stitching difference, the installation position of the exposure assembly in the horizontal direction is adjusted until the stitching difference falls within a preset difference range.

[0020] According to an adjustment method of an imaging system according to an embodiment of the present application, based on the plurality of center positions, the distance between the first reflector and the second reflector is adjusted so that the spot centers of the staggered exposure components correspond to a horizontal center axis in the imaging plane, including:

[0021] Adjust the reflection angle and the distance between the first reflector and the second reflector so that the coordinate values ​​of the center position corresponding to the center of the light spot of each exposure plane are consistent in the horizontal direction, so that the center of the light spot of the staggered exposure assembly corresponds to a central axis in the horizontal direction in the imaging plane, and the installation positions of the plurality of second reflectors corresponding to the staggered exposure assembly are not on the same axis; wherein the reflection angle includes: a first reflection angle of the first reflector and / or a second reflection angle of the second reflector.

[0022] According to an adjustment method of an imaging system according to an embodiment of the present application, based on the inclination and the focal plane height, the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure assembly are adjusted so that the focal plane height corresponding to the center of the light spot of each exposure assembly is consistent and parallel to the horizontal plane, including:

[0023] Based on the inclination, adjusting the installation position of the wedge mirror in the horizontal direction so that the focal plane after imaging is parallel to the horizontal plane;

[0024] Based on the focal plane height, the installation height of the exposure assembly is adjusted to make the projection focal plane height of each exposure assembly consistent.

[0025] According to an imaging system adjustment method according to an embodiment of the present application, after adjusting the installation position of the wedge mirror in the horizontal direction based on the inclination, the method further includes:

[0026] The tilt angle of the digital micromirror device in the vertical direction is adjusted so that the focal plane after imaging is parallel to the horizontal plane.

[0027] According to an adjustment method of an imaging system according to an embodiment of the present application, the reflection angle and the distance between the first reflector and the second reflector are adjusted so that the center of the light spot of the staggered exposure assembly is in front of a central axis corresponding to a horizontal direction in the imaging plane, and further includes:

[0028] The reflection angle is adjusted so that the light passing through the two imaging branches does not interfere before reaching the focal plane, and based on the adjustment process, a first adjustment range corresponding to the first reflection angle, a second adjustment range corresponding to the second reflection angle, and a mapping relationship between the first reflection angle and the second reflection angle are determined.

[0029] According to an adjustment method of an imaging system according to an embodiment of the present application, the first adjustment range includes: 35° to 55°, and the second adjustment range includes: 25° to 45°;

[0030] And / or, the first tilt angle is obtained based on the first preset range, and the second tilt angle is obtained based on the first tilt angle, the mapping relationship and the second adjustment range.

[0031] The present application also provides an adjustment device for an imaging system, the device comprising:

[0032] A first acquisition module, used for acquiring a center position corresponding to each light spot center of the exposure component;

[0033] A first adjustment module is used to adjust the distance between the first reflector and the second reflector based on the plurality of center positions so that the spot centers of the staggered exposure components correspond to a horizontal center axis in the imaging plane;

[0034] A second acquisition module is used to acquire the focal plane inclination of each exposure component after imaging, and the focal plane height corresponding to each exposure component;

[0035] A second adjustment module is used to adjust the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure assembly based on the inclination and the focal plane height, so that the focal plane height corresponding to the center of the light spot of each exposure assembly is consistent and parallel to the horizontal plane, wherein the installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging assembly in the vertical direction;

[0036] An analysis module, used for analyzing the spot image obtained based on the imaging system, and determining the splicing difference between any two adjacent spot images on the central axis;

[0037] The third adjustment module is used to adjust the installation position of the exposure assembly in the horizontal direction based on the stitching difference until the stitching difference falls within a preset difference range.

[0038] An embodiment of the present application also provides an electronic device, including a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein when the processor executes the program, the steps of the imaging system adjustment method as described in any one of the above items are implemented.

[0039] An embodiment of the present application also provides a non-transitory computer-readable storage medium having a computer program stored thereon, which is implemented when the computer program is executed by a processor to perform the steps of the imaging system adjustment method as described in any one of the above items.

[0040] The imaging system of the exposure device provided by the embodiment of the present application, and the adjustment method and device of the imaging system, the imaging system comprises: at least one imaging branch, the imaging branch comprises: a first reflector, a second reflector and a wedge mirror; the imaging system is obtained by pre-adjusting the imaging system based on the adjustment target, determining the first tilt angle, the second tilt angle, the thickness of the wedge mirror, the installation position of the first reflector, the installation position of the second reflector and the installation position of the wedge mirror, and using the imaging branch to simultaneously project light emitted by multiple imaging components to the focal plane, ensuring that the start exposure time of the multiple imaging components is the same, realizing synchronous exposure, and finally realizing that the corresponding pattern can be obtained through one exposure, thereby reducing the exposure time; at the same time, the present application uses the imaging branch to make the spot center of the staggered imaging components correspond to a horizontal central axis in the imaging plane, and the splicing difference between any two adjacent spot images on the central axis belongs to the preset difference range, thereby solving the problem of splicing prints in the exposure area of ​​the staggered imaging components during exposure in the prior art, and improving the exposure effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0041] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0042] Figure 1 is a schematic diagram of staggered distribution provided in an embodiment of the present application;

[0043] Figure 2 is a schematic diagram of the exposure process of the exposure device provided in an embodiment of the present application;

[0044] Figure 3 is a schematic diagram of a light spot image corresponding to an existing exposure device provided in an embodiment of the present application;

[0045] Figure 4 is a schematic diagram of the structure of an imaging system provided in an embodiment of the present application;

[0046] Figure 5 It is one of the schematic diagrams of the light provided in the embodiment of the present application changing from the vertical direction to the horizontal direction;

[0047] Figure 6 This is the second schematic diagram of the light changing from the vertical direction to the horizontal direction provided in the embodiment of the present application;

[0048] Figure 7 is a schematic diagram of the structure of an optical element provided in an embodiment of the present application;

[0049] Figure 8 is a flow chart of an adjustment method of an imaging system provided in an embodiment of the present application;

[0050] Fig. 9 is a schematic diagram of a light spot image corresponding to the exposure device of the present application provided in an embodiment of the present application;

[0051] Fig.10 is a schematic diagram of focal plane tilt provided in an embodiment of the present application;

[0052] Fig.11 is a schematic structural diagram of an adjustment device for an imaging system provided in an embodiment of the present application;

[0053] Fig.12 It is a schematic diagram of the structure of an electronic device provided in an embodiment of the present application. DETAILED DESCRIPTION

[0054] In order to make the purpose, technical solution and advantages of the embodiments of the present application clearer, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0055] In order to clearly illustrate this application, the prior art is further described as follows:

[0056] Take two rows of distribution as an example:

[0057] Figure 1 For the staggered imaging lenses, the exposure start time of imaging lens 2 is later than the exposure start time of imaging lens 1, which increases the exposure process time.

[0058] In addition, the imaging lens adopts a double telecentric system, and its principle will inevitably lead to the actual spot size of the imaging light path being larger than the theoretical spot size. In the case of asynchronous exposure, some substrates have reacted solidified material on one side of the splicing part and unreacted photosensitive material on the other side, and the poor combination of the two produces splicing prints. For details, please refer to Figure 2 .

[0059] exist Figure 2 In the figure, the leftmost image represents the theoretical graph, A represents the theoretical exposure graph of imaging lens 2, and B represents the theoretical exposure graph of imaging lens 1.

[0060] exist Figure 2In the figure, the middle image indicates that the imaging lens 1 reaches the set position for exposure at time t1, and the actual exposure area is larger than the theoretical exposure area. The right side of the dotted line indicates the theoretical exposure area.

[0061] exist Figure 2 In the figure, the rightmost image shows that the imaging lens 2 reaches the set position for exposure at time t2. At this time, the photoresist in a part of the exposure area of ​​the imaging lens 2 has reacted, and the photoresist in a part of the exposure area has not reacted. The difference between the two produces a splicing print. For example, a is a reaction position that has been exposed and cured by the optical lens 1, and b is a position that has not been exposed and reacted by the optical lens 1.

[0062] The static projection of the spot image of the two-way DMD optical path of the existing exposure equipment is achieved by Figure 3 To indicate, Figure 3 The following takes 6 optical paths as an example for illustration.

[0063] The embodiment of the present application provides an imaging system of an exposure device. The exposure device includes: at least two exposure components, the exposure lens component includes: a digital micromirror device and an imaging component, and the exposure components are arranged in a staggered manner. Figure 4 As shown, the imaging system includes: at least one imaging branch 40 , and the imaging branch 40 includes: a first reflecting mirror 401 , a second reflecting mirror 402 and a wedge mirror 403 .

[0064] exist Figure 4 In the figure, two branches are used as an example to illustrate the Figure 4 The digital micromirror device 404 and the imaging component 405 are also included. Of course, this is only for illustration and is not used to limit the protection scope of the present application. Some other descriptions in the embodiments of the present application are also for illustration and are not used to limit the protection scope of the present application, and will not be described one by one later.

[0065] The first reflector 401 is installed below the imaging component based on a preset first tilt angle, and is used to convert the light passing through the imaging component from a vertical direction to a horizontal direction, and project the converted light onto the second reflector 402; the second reflector 402 is installed on the reflecting side of the first reflector 401 based on a preset second tilt angle, and is used to convert the light reflected by the first reflector 401 into an inclined direction, and project the converted light onto the wedge mirror 403; the wedge mirror 403 is installed below the second reflector 402 based on a preset wedge mirror thickness, and is used to project the light reflected by the second reflector 402 onto the focal plane.

[0066] The first tilt angle, the second tilt angle, the thickness of the wedge mirror, the installation position of the first reflector, the installation position of the second reflector and the installation position of the wedge mirror are obtained by pre-adjusting the imaging system based on the adjustment target.

[0067] The adjustment targets include: the spot centers of the staggered exposure components correspond to a horizontal central axis in the imaging plane, and the stitching difference between any two adjacent spot images on the central axis falls within a preset difference range.

[0068] The first reflector 401 transforms the light of the imaging component from the vertical direction to the horizontal direction, and the horizontal direction here is not necessarily the horizontal direction. The preset angle range with the horizontal direction as the reference is defined as the horizontal direction. Of course, after the light of the imaging component is transformed from the vertical direction to the horizontal direction by the first reflector 401, the pipeline can be projected on the focal plane through the second reflector 402 and the wedge mirror 403. For details, please refer to Figure 5 and Figure 6 .

[0069] Among them, the present application includes two horizontal directions and vertical directions, one is the horizontal direction and vertical direction corresponding to the spatial rectangular coordinates, and the exposure component takes this as the reference; the other is the horizontal direction and vertical direction in the plane coordinate system in the imaging plane. The vertical direction in this coordinate system is the movement direction of the plate during exposure, and the horizontal direction is the direction perpendicular to the movement direction of the plate. The two can share a coordinate system, or they can establish corresponding coordinate systems separately.

[0070] The installation angles of the first reflector 401 , the second reflector 402 and the wedge-shaped mirror 403 are based on a spatial rectangular coordinate system.

[0071] The imaging system of the exposure device provided in the embodiment of the present application includes: at least one imaging branch 40, the imaging branch 40 includes: a first reflector 401, a second reflector 402 and a wedge mirror 403; the imaging system is adjusted in advance based on the adjustment target, and the first tilt angle, the second tilt angle, the thickness of the wedge mirror, the installation position of the first reflector, the installation position of the second reflector and the installation position of the wedge mirror are determined to obtain the imaging system, and the imaging branch is used to simultaneously project light emitted by multiple imaging components to the focal plane to ensure that the start exposure time of the multiple imaging components is the same, so as to achieve synchronous exposure, and finally achieve that the corresponding pattern can be obtained through one exposure, thereby reducing the exposure time; at the same time, the present application uses the imaging branch 10 to make the spot center of the staggered imaging components correspond to a horizontal central axis in the imaging plane, and the splicing difference between any two adjacent spot images on the central axis belongs to the preset difference range, thereby solving the problem of splicing prints in the exposure area of ​​the staggered imaging components during exposure in the prior art, and improving the exposure effect.

[0072] In a specific embodiment, it is an imaging branch 40, which changes the spot center of one row of exposure components through the imaging branch 40, so that the spot centers of the exposure components in two rows correspond to a horizontal central axis in the imaging plane.

[0073] In another specific embodiment, the imaging branch is two imaging branches 40, and the two imaging branches 40 are used to simultaneously reflect, so that the center of the light spot of the two rows of exposure components corresponds to a horizontal central axis in the imaging plane. At this time, the central axis is in the middle of the two rows of exposure components. Fig. 9 As shown, the focal plane inclination angle corresponding to each imaging branch 40 is relatively small, and the focal plane adjustment is simpler than the focal plane adjustment of one imaging branch.

[0074] In addition, the present application utilizes a reflector and a wedge mirror to align the light of the two DMDs. Since the light aligning process does not include a concave lens and a convex lens, the spot size remains unchanged and is the same as the exposure pattern of the existing exposure equipment.

[0075] In a specific embodiment, the first reflector, the second reflector and the wedge-shaped mirror are combined into an optical element, and the optical element includes: a first reflective surface, a second reflective surface and a wedge-shaped transmissive body.

[0076] Among them, Figure 7 As shown, the mirror surface corresponding to AB is the first reflection surface, the mirror surface corresponding to DE is the second reflection surface, and BCD is a wedge-shaped transmission body.

[0077] Specifically, the first reflecting surface realizes the function of a first reflecting mirror, the second reflecting surface realizes the function of a second reflecting mirror, and the wedge-shaped transmitting body realizes the function of a wedge-shaped mirror.

[0078] The present application adopts an integrally formed optical element to achieve the functions of light combination and focal plane adjustment, with good stability and simple adjustment operation. The integrally formed method effectively reduces the number of debugging times and shortens the adjustment time.

[0079] The present application also provides an imaging system adjustment method, which is used to adjust the imaging system of the exposure device described in any of the above embodiments, such as Figure 8 As shown, the method includes:

[0080] Step 801, obtaining the center position corresponding to each light spot center of the exposure component.

[0081] Step 802: Based on the multiple center positions, adjust the distance between the first reflector and the second reflector so that the center of the light spot of the staggered exposure components corresponds to a horizontal center axis in the imaging plane.

[0082] Step 803, obtaining the focal plane inclination of each exposure component after imaging, and the focal plane height corresponding to each exposure component.

[0083] Step 804, based on the inclination and focal plane height, adjust the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure assembly, so that the focal plane height corresponding to the center of the light spot of each exposure assembly is consistent and parallel to the horizontal plane.

[0084] The installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging component in the vertical direction.

[0085] Step 805 , analyzing the spot image obtained based on the imaging system, and determining the stitching difference between any two adjacent spot images on the central axis.

[0086] Step 806: Based on the stitching difference, adjust the installation position of the exposure assembly in the horizontal direction until the stitching difference falls within a preset difference range.

[0087] The present application uses the center position as a reference to adjust the distance between the first reflector and the second reflector so that the staggered distribution corresponds to a central axis in the horizontal direction; and uses the focal plane inclination and the focal plane height as a reference to adjust the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure component so that the focal plane height corresponding to the light spot of each exposure component distributed in each row is consistent and parallel to the horizontal plane; and analyzes the spot image and adjusts the installation position of the exposure component in the horizontal direction so that the stitching difference between any two adjacent spot images on the central axis falls within a preset difference range, so that the imaging system finally obtained can obtain the corresponding pattern through a single exposure, thereby reducing the exposure time, and solving the problem of stitching prints in the exposure area of ​​the staggered imaging components during exposure in the prior art, thereby improving the exposure effect.

[0088] against Figure 7 In the above adjustment method, adjusting the reflection angle and the distance between the first reflector and the second reflector means adjusting the distance between the first reflective surface and the second reflective surface. The reflection angle means the first reflection angle of the first reflective surface and / or the second reflection angle of the second reflective surface. Adjusting the installation position of the wedge mirror in the horizontal direction means adjusting the installation position of the wedge in the horizontal direction.

[0089] In a specific embodiment, based on the multiple center positions, the distance between the first reflector and the second reflector is adjusted so that the spot centers of the staggered exposure components correspond to a horizontal center axis in the imaging plane. The specific implementation includes:

[0090] The distance between the first reflector and the second reflector is adjusted so that the coordinate values ​​of the center position corresponding to the center of the light spot of each exposure plane in the horizontal direction in the imaging plane are consistent, so that the center of the light spot of the staggered exposure components corresponds to a horizontal central axis in the imaging plane.

[0091] Specifically, the first reflector and the second reflector are schematically installed and then debugged, wherein the reflection angles of the first reflectors and the second reflectors corresponding to the staggered exposure components are all 45°, so that the light emitted by the exposure component is transformed from the vertical direction to the horizontal direction after passing through the first reflector, and from the horizontal direction to the vertical direction after passing through the second reflector, and the vertical direction and the horizontal direction here are both the horizontal direction and the vertical direction corresponding to the spatial rectangular coordinates. Subsequently, by adjusting the distance between the first reflector and the second reflector, the coordinate values ​​of the light spot center of each exposure component in the horizontal direction in the imaging plane are made consistent.

[0092] In another specific implementation, based on the multiple center positions, the distance between the first reflector and the second reflector is adjusted so that the spot centers of the staggered exposure components correspond to a horizontal center axis in the imaging plane. The specific implementation includes:

[0093] Adjust the distance and reflection angle between the first reflector and the second reflector so that the coordinate values ​​of the center position corresponding to the center of the light spot in each exposure plane in the horizontal direction in the imaging plane are consistent, so that the staggered distribution corresponds to a horizontal center axis in the imaging plane, and at the same time, the installation positions of the several second reflectors corresponding to the staggered exposure components are not on the same axis.

[0094] The reflection angle includes: a first reflection angle of the first reflector and / or a second reflection angle of the second reflector.

[0095] Specifically, after the first reflector and the second reflector are schematically installed, they are debugged, and the distance and reflection angle between the first reflector and the second reflector are adjusted so that the staggered arrangement corresponds to a horizontal central axis in the imaging plane, and at the same time, the installation positions of the second reflectors corresponding to the staggered exposure components are not on the same axis. Figure 4 In the figure, the first reflection angle of the first reflection mirror 401 of the two exposure assemblies is 45°, which converts the light from the vertical direction to the horizontal direction; the second reflection angle of the second reflection mirror 402 is 40°, which converts the light from the horizontal direction to the inclined direction.

[0096] By adjusting the reflection angle, the installation positions of the second reflectors corresponding to several exposure components are not on the same axis. If the reflection angle is not adjusted and the reflection angle is 45°, the second reflectors of each exposure component will be installed on the same axis, which will easily cause the two reflectors to collide during installation, making installation difficult. Therefore, by adjusting the reflection angle, the light is inclined to be incident for easy installation.

[0097] Among them, through Fig. 9 It indicates that the statically projected spot image after passing through the imaging system of the present application is located on a horizontal central axis.

[0098] The following is a schematic illustration using two imaging branches as an example:

[0099] Place a camera with a charge coupled device (CCD) image sensor at the spot position, measure the coordinates of the first center point of the first row of distribution, and the coordinates of the second center point of the second row of distribution; adjust the reflection angle to make the coordinate values ​​of the first center line coordinate and the second center point coordinate consistent in the horizontal direction. Adjust the distance between the first reflector and the second reflector to make the coordinate values ​​of the first center coordinate and the second center coordinate consistent in the vertical direction, and finally make the two rows of distribution correspond to the central axis of a horizontal direction line.

[0100] In a specific embodiment, based on the inclination and the focal plane height, the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure assembly are adjusted so that the focal plane height corresponding to each row of distribution is consistent and parallel to the horizontal plane. The specific implementation includes:

[0101] Based on the inclination, adjust the installation position of the wedge mirror in the horizontal direction so that the focal plane after imaging is parallel to the horizontal plane; based on the focal plane height, adjust the installation height so that the focal plane height corresponding to each row of distribution is consistent.

[0102] Specifically, since the second reflector converts the light from the horizontal direction to the inclined direction, this behavior will cause the focal plane of the light spot to tilt (for a specific diagram, see Fig.10 ), which affects the image quality. Therefore, the light before and after the wedge mirror passes through glass of different thicknesses to achieve the optical path difference, which is used to compensate for the focal plane tilt. The longer the distance the light passes through the glass, the shorter the optical path.

[0103] The following is a schematic illustration using two imaging branches as an example:

[0104] The CCD camera is used to measure the inclination corresponding to each row of distribution, and the installation position of the wedge mirror in the horizontal direction is adjusted, that is, by changing the thickness of the wedge mirror, the inclination values ​​of different focal planes are compensated so that each focal plane is parallel to the horizontal plane; and the height of each focal plane is made consistent by adjusting the installation angle.

[0105] However, in the actual adjustment process, there is still a certain error in the method of changing the thickness of the wedge mirror to compensate for the different inclination values ​​of the focal plane, and the effect of being parallel to the horizontal plane cannot be achieved, but the error can be reduced to within 0.5mm.

[0106] In a specific embodiment, after adjusting the installation position of the wedge mirror in the horizontal direction based on the inclination, the inclination angle of the digital micromirror device in the vertical direction is adjusted so that the focal plane after imaging is parallel to the horizontal plane.

[0107] Specifically, the effect of only adjusting the thickness of the wedge mirror is poor, so the tilt angle of the digital micromirror device in the vertical direction is adjusted to further compensate for the tilt values ​​of different focal planes, reduce errors, and achieve the effect of making each focal plane parallel to the horizontal plane.

[0108] However, in the actual adjustment process, there may be a certain error, but the error can be reduced to within 0.1mm. It cannot achieve the effect of absolute parallelism with the horizontal plane, but it will not have any impact on the use of the exposure equipment.

[0109] In a specific embodiment, the reflection angle and the distance between the first reflector and the second reflector are adjusted so that the center of the light spot of the staggered exposure components is before a central axis corresponding to a horizontal direction in the imaging plane, and the reflection angle is adjusted so that the light passing through the two imaging branches does not interfere before reaching the focal plane, and based on the adjustment process, a first adjustment range corresponding to the first reflection angle, a second adjustment range corresponding to the second reflection angle, and a mapping relationship between the first reflection angle and the second reflection angle are determined.

[0110] In a specific embodiment, the first adjustment range includes: 35° to 55°, and the second adjustment range includes: 25° to 45°.

[0111] In a specific embodiment, the first tilt angle is obtained based on a first preset range; the second tilt angle is obtained based on the first tilt angle, a mapping relationship and a second adjustment range.

[0112] Specifically, the first reflection angle of the first reflector is 35° to 55°, which converts the light from the vertical direction to the horizontal direction; the second reflector is parallel to the first reflector and is reduced by 5° to 10°, so that the second reflection angle is 25° to 45°. By adjusting the incident angle of the second reflector, the light spot can be adjusted to move forward and backward in the exposure plane, which is used to compensate for the deviation between the actual position and the theoretical position of the light spot caused by the system error.

[0113] For example, Figure 4As shown, the first reflection angle of the first reflector 401 is 45°, which converts the light from the vertical direction to the horizontal direction; the second reflection angle of the second reflector 402 is 40°, which is 5° less than the first reflection angle, and converts the horizontal light emitted by the first reflector into an inclined direction. Figure 5 As shown, the first reflection angle of the first reflector 401 is 38.4°, which converts the light from the vertical direction to the lateral direction that is inclined upward; the second reflection angle of the second reflector is 33.4°, which is 5° less than the first reflection angle, and converts the lateral light emitted by the first reflector into the inclined direction. Figure 6 As shown, the first reflection angle of the first reflector 401 is 51.93°, which converts the light from the vertical direction to the lateral direction inclined downward, and the second reflection accuracy of the second reflector is 46.85°, which is 5.08° less than the first reflection angle, and converts the lateral light emitted by the first reflector into the inclined direction. In addition, the above three embodiments need to ensure that the light of the two imaging lenses does not interfere in this process.

[0114] Specifically, the wedge mirror realizes the optical path difference of the focal plane in the horizontal direction through the wedge angle and the thickness of the wedge mirror, so as to solve the problem of the front focal plane tilt in the horizontal direction caused by the difference between the first reflection angle and the second reflection angle. Specifically, different focal plane tilt values ​​can be compensated by adjusting the thickness of the wedge mirror or moving it left and right in the horizontal direction.

[0115] The imaging branch of the present application does not pass through any concave lens or convex lens, which can ensure that the spot size remains unchanged, and eliminate the splicing print when the exposure distribution remains unchanged. In addition, the staggered exposure of the staggered light path directly forms a central axis for one exposure, saving exposure time. In addition, the present application has a simple structure, easy-to-obtain materials, simple installation, convenient debugging, and improved user experience.

[0116] The present application also provides an imaging system adjustment device. The specific implementation of the device can refer to the description of the imaging system adjustment method, and the repeated parts will not be repeated. Fig.11 As shown, the device comprises:

[0117] The first acquisition module 1101 is used to acquire the center position corresponding to each light spot center of the exposure component;

[0118] A first adjustment module 1102 is used to adjust the distance between the first reflector and the second reflector based on the multiple center positions so that the spot centers of the staggered exposure components correspond to a horizontal center axis in the imaging plane;

[0119] The second acquisition module 1103 is used to acquire the focal plane inclination of each exposure component after imaging, and the focal plane height corresponding to each exposure component;

[0120] The second adjustment module 1104 is used to adjust the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure assembly based on the inclination and the focal plane height, so that the focal plane height corresponding to the center of the light spot of each exposure assembly is consistent and parallel to the horizontal plane, wherein the installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging assembly in the vertical direction;

[0121] An analysis module 1105 is used to analyze the spot image obtained based on the imaging system and determine the splicing difference between any two adjacent spot images on the central axis;

[0122] The third adjustment module 1106 is used to adjust the installation position of the exposure assembly in the horizontal direction based on the stitching difference until the stitching difference falls within a preset difference range.

[0123] In a specific embodiment, the first adjustment module 1102 is used to adjust the reflection angle and the distance between the first reflector and the second reflector so that the coordinate values ​​of the center position corresponding to the center of the light spot of each exposure plane are consistent in the horizontal direction, so that the center of the light spot of the staggered exposure components corresponds to a horizontal center axis in the imaging plane, and the installation positions of the several second reflectors corresponding to the staggered exposure components are not on the same axis.

[0124] The reflection angle includes: a first reflection angle of the first reflector and / or a second reflection angle of the second reflector.

[0125] In a specific embodiment, the second adjustment module 1104 is used to adjust the installation position of the wedge mirror in the horizontal direction based on the inclination so that the focal plane after imaging is parallel to the horizontal plane; and to adjust the installation height of the exposure assembly based on the focal plane height so that the projection focal plane height of each exposure assembly is consistent.

[0126] In a specific embodiment, the second adjustment module 1104 is further used to adjust the tilt angle of the digital micromirror device in the vertical direction so that the focal plane after imaging is parallel to the horizontal plane.

[0127] In a specific embodiment, the first adjustment module 1102 is also used to adjust the reflection angle so that the light passing through the two imaging branches does not interfere before reaching the focal plane, and determines the first adjustment range corresponding to the first reflection angle, the second adjustment range corresponding to the second reflection angle, and the mapping relationship between the first reflection angle and the second reflection angle based on the adjustment process.

[0128] In a specific embodiment, the first adjustment range includes: 35° to 55°, and the second adjustment range includes: 25° to 45°;

[0129] And / or, the first tilt angle is obtained based on the first preset range, and the second tilt angle is obtained based on the first tilt angle, the mapping relationship and the second adjustment range.

[0130] Fig.12 An example of a physical structure diagram of an electronic device is shown in FIG. Fig.12 As shown, the electronic device may include: a processor (processor) 1201, a communication interface (Communications Interface) 1202, a memory (memory) 1203 and a communication bus 1204, wherein the processor 1201, the communication interface 1202, and the memory 1203 communicate with each other through the communication bus 1204. The processor 1201 can call the logic instructions in the memory 1203 to execute the adjustment method of the imaging system, which includes: obtaining the center position corresponding to each light spot center of the exposure component; adjusting the distance between the first reflector and the second reflector based on multiple center positions, so that the light spot centers of the staggered exposure components correspond to a horizontal center axis in the imaging plane; obtaining the focal plane inclination of each exposure component after imaging, and the focal plane height corresponding to each exposure component; adjusting the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure component based on the inclination and the focal plane height, so that the focal plane height corresponding to the light spot center of each exposure component is consistent and parallel to the horizontal plane, wherein the installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging component in the vertical direction; analyzing the light spot image obtained based on the imaging system, and determining the splicing difference between any two adjacent light spot images on the central axis; adjusting the installation position of the exposure component in the horizontal direction based on the splicing difference until the splicing difference belongs to the preset difference range.

[0131] In addition, the logic instructions in the above-mentioned memory 1203 can be implemented in the form of software functional units and can be stored in a computer-readable storage medium when sold or used as an independent product. Based on such an understanding, the technical solution of the present invention, in essence, or the part that contributes to the prior art or the part of the technical solution, can be embodied in the form of a software product, and the computer software product is stored in a storage medium, including several instructions for a computer device (which can be a personal computer, a server, or a network device, etc.) to perform all or part of the steps of the method described in each embodiment of the present invention. The aforementioned storage medium includes: U disk, mobile hard disk, read-only memory (ROM, Read-Only Memory), random access memory (RAM, Random Access Memory), disk or optical disk and other media that can store program codes.

[0132] On the other hand, the present invention also provides a computer program product, which includes a computer program stored on a non-transitory computer-readable storage medium, and the computer program includes program instructions. When the program instructions are executed by a computer, the computer can execute the adjustment method of the imaging system provided by the above methods, the method comprising: obtaining the center position corresponding to each light spot center of the exposure component; based on multiple center positions, adjusting the distance between the first reflector and the second reflector so that the light spot centers of the staggered exposure components correspond to a horizontal center axis in the imaging plane; obtaining the focal plane of each exposure component after imaging The invention relates to a method for measuring the inclination of a wedge mirror and the focal plane height corresponding to each exposure component; based on the inclination and the focal plane height, adjusting the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure component, so that the focal plane height corresponding to the center of the light spot of each exposure component is consistent and parallel to the horizontal plane, wherein the installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging component in the vertical direction; analyzing the light spot image obtained based on the imaging system, and determining the splicing difference between any two adjacent light spot images on the central axis; based on the splicing difference, adjusting the installation position of the exposure component in the horizontal direction until the splicing difference belongs to the preset difference range.

[0133] On the other hand, the present invention also provides a non-transitory computer-readable storage medium having a computer program stored thereon, which is implemented when the processor executes the adjustment method of the imaging system provided by the above embodiments, the method comprising: obtaining a center position corresponding to each light spot center of the exposure assembly; adjusting the distance between the first reflector and the second reflector based on multiple center positions, so that the light spot centers of the staggered exposure assemblies correspond to a horizontal center axis in the imaging plane; obtaining the focal plane inclination of each exposure assembly after imaging, and the focal plane height corresponding to each exposure assembly; adjusting the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure assembly based on the inclination and the focal plane height, so that the focal plane height corresponding to the light spot center of each exposure assembly is consistent and parallel to the horizontal plane, wherein the installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging assembly in the vertical direction; analyzing the light spot image obtained based on the imaging system, and determining the splicing difference between any two adjacent light spot images on the central axis; adjusting the installation position of the exposure assembly in the horizontal direction based on the splicing difference until the splicing difference belongs to the preset difference range.

[0134] The device embodiments described above are merely illustrative, wherein the units described as separate components may or may not be physically separated, and the components displayed as units may or may not be physical units, that is, they may be located in one place, or they may be distributed on multiple network units. Some or all of the modules may be selected according to actual needs to achieve the purpose of the scheme of this embodiment. Ordinary technicians in this field can understand and implement it without paying creative labor.

[0135] Through the description of the above implementation methods, those skilled in the art can clearly understand that each implementation method can be implemented by means of software plus a necessary general hardware platform, and of course, it can also be implemented by hardware. Based on this understanding, the above technical solution is essentially or the part that contributes to the prior art can be embodied in the form of a software product, and the computer software product can be stored in a computer-readable storage medium, such as ROM / RAM, a disk, an optical disk, etc., including a number of instructions for a computer device (which can be a personal computer, a server, or a network device, etc.) to execute the methods described in each embodiment or some parts of the embodiments.

[0136] Finally, it should be noted that the above is only the preferred implementation of the present application, and the present application is not limited to the above embodiments. It is understood that other improvements and changes directly derived or associated by those skilled in the art without departing from the spirit and concept of the present application should be considered to be included in the scope of protection of the present application.

Claims

1. An imaging system of an exposure device, the exposure device comprising: At least two exposure components, the exposure lens component includes: a digital micromirror device and an imaging component, the exposure components are arranged in a staggered manner, characterized in that the imaging system includes: at least one imaging branch, the imaging branch includes: a first reflector, a second reflector and a wedge mirror; The first reflector is installed below the imaging component based on a preset first tilt angle, and is used to transform the light passing through the imaging component from a vertical direction to a horizontal direction, and project the transformed light onto the second reflector; The second reflector is installed on the reflective side of the first reflector based on a preset second tilt angle, and is used to transform the light reflected by the first reflector into an inclined direction, and project the transformed light onto the wedge mirror; The wedge mirror is installed below the second reflector based on a preset wedge mirror thickness, and is used to project the light reflected by the second reflector onto a focal plane; The first tilt angle, the second tilt angle, the thickness of the wedge mirror, the installation position of the first reflector, the installation position of the second reflector, and the installation position of the wedge mirror are obtained by pre-adjusting the imaging system based on an adjustment target; Wherein, the adjustment target includes: the spot centers of the staggered exposure components correspond to a horizontal central axis in the imaging plane, and the stitching difference between any two adjacent spot images on the central axis belongs to a preset difference range.

2. The imaging system of the exposure device according to claim 1, characterized in that: The at least one imaging branch includes: two imaging branches.

3. The imaging system of the exposure device according to claim 1, characterized in that: The first reflector, the second reflector and the wedge-shaped mirror are combined into an optical element, and the optical element includes: a first reflective surface, a second reflective surface and a wedge-shaped transmissive body.

4. A method for adjusting an imaging system, characterized in that: An imaging system applied to an exposure device according to any one of claims 1 to 3, wherein the method comprises: Obtaining the center position corresponding to each light spot center of the exposure component; Based on the plurality of center positions, adjusting the distance between the first reflector and the second reflector so that the spot centers of the staggered exposure components correspond to a horizontal center axis in the imaging plane; Obtaining the focal plane inclination of each exposure component after imaging, and the focal plane height corresponding to each exposure component; Based on the inclination and the focal plane height, adjusting the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure assembly, so that the focal plane height corresponding to the center of the light spot of each exposure assembly is consistent and parallel to the horizontal plane, wherein the installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging assembly in the vertical direction; Analyze the spot image obtained based on the imaging system to determine the stitching difference between any two adjacent spot images on the central axis; Based on the stitching difference, the installation position of the exposure assembly in the horizontal direction is adjusted until the stitching difference falls within a preset difference range.

5. The imaging system adjustment method according to claim 4, characterized in that: Based on the plurality of center positions, adjusting the distance between the first reflector and the second reflector so that the spot centers of the staggered exposure components correspond to a horizontal center axis in the imaging plane, comprising: Adjust the reflection angle and the distance between the first reflector and the second reflector so that the coordinate values ​​of the center position corresponding to the center of the light spot of each exposure plane are consistent in the horizontal direction, so that the center of the light spot of the staggered exposure assembly corresponds to a central axis in the horizontal direction in the imaging plane, and the installation positions of the plurality of second reflectors corresponding to the staggered exposure assembly are not on the same axis; wherein the reflection angle includes: a first reflection angle of the first reflector and / or a second reflection angle of the second reflector.

6. The imaging system adjustment method according to claim 4, characterized in that: Based on the inclination and the focal plane height, adjusting the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure assembly so that the focal plane height corresponding to the center of the light spot of each exposure assembly is consistent and parallel to the horizontal plane, including: Based on the inclination, adjusting the installation position of the wedge mirror in the horizontal direction so that the focal plane after imaging is parallel to the horizontal plane; Based on the focal plane height, the installation height of the exposure assembly is adjusted to make the projection focal plane height of each exposure assembly consistent.

7. The imaging system adjustment method according to claim 6, characterized in that: After adjusting the installation position of the wedge mirror in the horizontal direction based on the inclination, the method further includes: The tilt angle of the digital micromirror device in the vertical direction is adjusted so that the focal plane after imaging is parallel to the horizontal plane.

8. The imaging system adjustment method according to claim 5, characterized in that: The reflection angle and the distance between the first reflector and the second reflector are adjusted so that the center of the light spot of the staggered exposure components is in front of a central axis corresponding to a horizontal direction in the imaging plane, and further includes: The reflection angle is adjusted so that the light passing through the two imaging branches does not interfere before reaching the focal plane, and based on the adjustment process, a first adjustment range corresponding to the first reflection angle, a second adjustment range corresponding to the second reflection angle, and a mapping relationship between the first reflection angle and the second reflection angle are determined.

9. The imaging system adjustment method according to claim 8, characterized in that: The first adjustment range includes: 35°~55°, and the second adjustment range includes: 25°~45°; And / or, the first tilt angle is obtained based on the first preset range, and the second tilt angle is obtained based on the first tilt angle, the mapping relationship and the second adjustment range.

10. An adjustment device for an imaging system, characterized in that: The device comprises: A first acquisition module, used for acquiring a center position corresponding to each light spot center of the exposure component; A first adjustment module is used to adjust the distance between the first reflector and the second reflector based on the plurality of center positions so that the spot centers of the staggered exposure components correspond to a horizontal center axis in the imaging plane; A second acquisition module is used to acquire the focal plane inclination of each exposure component after imaging, and the focal plane height corresponding to each exposure component; A second adjustment module is used to adjust the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure assembly based on the inclination and the focal plane height, so that the focal plane height corresponding to the center of the light spot of each exposure assembly is consistent and parallel to the horizontal plane, wherein the installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging assembly in the vertical direction; An analysis module, used for analyzing the spot image obtained based on the imaging system, and determining the splicing difference between any two adjacent spot images on the central axis; The third adjustment module is used to adjust the installation position of the exposure assembly in the horizontal direction based on the stitching difference until the stitching difference falls within a preset difference range.

Images