PEEK implant as well as preparation method and application thereof

Abstract

The invention provides a PEEK implant as well as a preparation method and application thereof. According to the preparation method of the PEEK implant, PEEK is subjected to plasma treatment, and a collagen-like nanofiber network structure is constructed on the surface of the PEEK by adjusting process parameters such as power and time of the plasma treatment; according to the method, in-situ preparation of the collagen-like nanofiber network structure on the PEEK surface is achieved, chemical components are not remarkably changed, an electrostatic spinning process and other collagen-like nanofiber network structure preparation processes are not needed, nanostructure remodeling can be achieved on the basis of the substrate surface, and compared with the PEEK surface prepared through the electrostatic spinning process, the method has the advantages that the cost is low, and the production efficiency is high. The coating has relatively stable bonding capacity, and the potential risk caused by coating falling is reduced; according to the method, in-situ construction of the PEEK surface bionic structure can be achieved, the stable binding capacity is achieved, other chemical components do not need to be introduced, and good biological safety is achieved.

Description

Technical Field

[0001] The present invention relates to the technical field of biomedical materials, and in particular to a PEEK implant and a preparation method and application thereof. Background Art

[0002] Among the commonly used bone repair biomaterials, polyetheretherketone (PEEK) is widely used in bone defect repair due to its elastic modulus comparable to that of human cortical bone, excellent biocompatibility, good chemical stability and radiolucency. However, PEEK is a biologically inert material that cannot form a good bone bond with the surrounding tissue, resulting in a high implant failure rate.

[0003] The construction of micro-nanostructure on the surface of PEEK implants can enhance their ability to promote bone regeneration. The surface nanostructure can regulate the behavior of cells related to the bone regeneration process, such as osteoblasts, angioblasts, neurons, and macrophages, thereby achieving the regulation of the bone regeneration process. Human cells are located in the extracellular matrix (ECM), which is a complex network composed of various macromolecules and plays a key role in the survival and function of cells. It not only provides physical support and structural framework for cells, but also participates in regulating cell behavior, including cell adhesion, proliferation, migration, differentiation, and even cell apoptosis. The main components of the extracellular matrix include collagen, elastin, proteoglycans, and glycoproteins. The morphological characteristics of the nanostructure of the natural extracellular matrix are mainly collagen-like nanofiber network structures. Therefore, the collagen-like nanofiber network structure on the surface of implants has received widespread attention. It is of great significance to construct a bioactivated surface with a natural extracellular matrix structure.

[0004] At present, there is no scheme for in-situ construction of collagen-like nanofiber network structure on PEEK surface. The main technology for constructing collagen-like bionic nanostructure is electrospinning technology. Combining a coating with a collagen-like nanofiber network structure with a hard tissue replacement implant is the main means of constructing a bionic surface on the implant surface. For hard tissue implants, the method of combining an electrospinning coating with the implant surface has the problem of insufficient coating binding ability, easy shedding, and the introduction of other biochemical components, which may lead to potential biosafety issues.

[0005] Based on the defects in the construction of the current PEEK surface collagen nanofiber network structure, it is necessary to improve it. Summary of the invention

[0006] In view of this, the present invention provides a PEEK implant and a preparation method and application thereof, so as to solve or at least partially solve the defects existing in the prior art.

[0007] In a first aspect, the present invention provides a method for preparing a PEEK implant, comprising the following steps:

[0008] The PEEK is placed in a plasma treatment machine for plasma treatment to form a nanofiber network structure on the surface of the PEEK, thereby obtaining a PEEK implant.

[0009] Preferably, the process parameters controlled during the plasma treatment are: the plasma treatment gas is oxygen and / or nitrogen, the plasma treatment power is 120 to 300 W, and the time is 5 to 20 min.

[0010] Preferably, the plasma treatment power is 300 W and the time is 10 to 20 minutes.

[0011] Preferably, the oxygen flow rate is 160-170 mm 3 / min.

[0012] Preferably, the temperature during plasma treatment is 280-300°C.

[0013] Preferably, before subjecting PEEK to plasma treatment, the PEEK is also pretreated, and the pretreatment specifically includes: sequentially performing a first cleaning, polishing, and a second cleaning on the surface of the PEEK.

[0014] Preferably, the first cleaning liquid is used to clean the PEEK surface for the first time, and the first cleaning time is 3 to 5 minutes;

[0015] Use sandpaper to polish the cleaned PEEK surface for 10 to 200 seconds;

[0016] The polished PEEK surface is cleaned for a second time using the second cleaning liquid, and the second cleaning time is 3 to 5 minutes.

[0017] Preferably, the first cleaning solution includes at least one of acetone, anhydrous ethanol and water;

[0018] The mesh number of the sandpaper is 500-10000 mesh, and the polishing disc speed during polishing is 500-600r / min;

[0019] The second cleaning liquid includes at least one of acetone, anhydrous ethanol and water.

[0020] In a second aspect, the present invention further provides a PEEK implant, which is prepared by the preparation method.

[0021] In a third aspect, the present invention further provides a PEEK implant prepared by the preparation method or use of the PEEK implant in preparing bone repair biomaterials.

[0022] The PEEK implant and its preparation method and application of the present invention have the following beneficial effects compared with the prior art:

[0023] 1. The preparation method of the PEEK implant of the present invention comprises the steps of subjecting PEEK to plasma treatment, and adjusting the process parameters such as the power and time of the plasma treatment to thereby construct a collagen-like nanofiber network structure on the surface of the PEEK; the method realizes the in-situ preparation of the collagen-like nanofiber network structure on the surface of the PEEK without significantly changing the chemical components, and does not require the use of an electrospinning process or other processes for preparing a collagen-like nanofiber network structure, and can realize nanostructure remodeling based on the surface of the substrate, and has a relatively stable binding ability compared to the PEEK surface prepared by the electrospinning process, thereby reducing the potential risk caused by coating shedding; the method for constructing a collagen-like nanofiber network structure on the surface of the PEEK of the present invention is suitable for implant materials with complex structures, and in addition, the method can realize the in-situ construction of a bionic structure on the surface of the PEEK, has a stable binding ability, does not require the introduction of other chemical components, and has good biosafety. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the prior art descriptions. Obviously, the drawings described below are only some embodiments of the present invention, and for ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0025] Figure 1 is a SEM image of the surface of the PEEK implant prepared in Example 1;

[0026] Figure 2 is a SEM image of the surface of the PEEK implant prepared in Example 2;

[0027] Figure 3 is a SEM image of the surface of the PEEK implant prepared in Example 3;

[0028] Figure 4 This is a SEM image of the surface of the PEEK implant prepared in Comparative Example 1;

[0029] Figure 5 is a SEM image of the surface of the PEEK implant prepared in Example 4;

[0030] Figure 6 is a SEM image of the surface of the PEEK implant prepared in Example 5;

[0031] Figure 7 The water contact angle of the PEEK implant and the pretreated PEEK prepared by the method of Example 1;

[0032] Figure 8This is a graph showing the effect of PEEK implants prepared with different plasma treatment times in different embodiments on the proliferation capacity of MC3T3-E1 cells;

[0033] Fig. 9 This is a graph showing the effect of the PEEK implant prepared in Example 5 and the pretreated PEEK on the proliferation capacity of HUVEC cells;

[0034] Figures 10-11 The SEM images at different magnifications of mouse embryonic osteoblast precursor cells (MC3T3-E1) spread on the surface of the PEEK implant prepared in Example 1;

[0035] Figures 12-13 The SEM images at different magnifications are of mouse embryonic osteoblast precursor cells (MC3T3-E1) spread on the PEEK surface pretreated in Example 1. DETAILED DESCRIPTION

[0036] The following will be combined with the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0037] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, further definition and explanation thereof is not required in subsequent drawings.

[0038] The following are described in detail. It should be noted that the order of description of the following embodiments is not intended to limit the preferred order of the embodiments. In addition, in the description of the present application, the term "including" means "including but not limited to". Various embodiments of the present invention may exist in the form of a range; it should be understood that the description in the form of a range is only for convenience and simplicity, and should not be understood as a rigid limitation on the scope of the present invention; therefore, it should be considered that the range description has specifically disclosed all possible sub-ranges and single values ​​within the range. For example, it should be considered that the range description from 1 to 6 has specifically disclosed sub-ranges, such as from 1 to 3, from 1 to 4, from 1 to 5, from 2 to 4, from 2 to 6, from 3 to 6, etc., as well as single numbers within the numbered ranges, such as 1, 2, 3, 4, 5 and 6, which apply regardless of the range. In addition, whenever a numerical range is indicated in this article, it is meant to include any quoted numbers (fractions or integers) within the indicated range.

[0039] The invention provides a method for preparing a PEEK implant, comprising the following steps: placing PEEK (PEEK) in a plasma treatment machine for plasma treatment to form a nanofiber network structure on the surface of the PEEK to obtain the PEEK implant.

[0040] The present invention performs plasma treatment on PEEK, and adjusts the process parameters such as power and time of the plasma treatment, thereby constructing a collagen-like nanofiber network structure on the surface of PEEK; the method realizes the in-situ preparation of the collagen-like nanofiber network structure on the surface of PEEK, does not significantly change the chemical components, and does not need to use an electrospinning process or other preparation processes for the collagen-like nanofiber network structure, and can realize nanostructure remodeling based on the surface of the substrate. Compared with the PEEK surface prepared by the electrospinning process, the method has a relatively stable binding ability, and reduces the potential risk caused by coating shedding; the method for constructing the collagen-like nanofiber network structure on the surface of PEEK of the present invention is suitable for implant materials with complex structures. In addition, the method can realize the in-situ construction of the bionic structure on the surface of PEEK, and compared with the traditional material of first preparing the coating and then combining it with the substrate, the method has a stable binding ability, does not need to introduce other chemical components, and has good biosafety.

[0041] In some embodiments, the process parameters controlled during plasma treatment are: the plasma treatment gas is oxygen and / or nitrogen, the plasma treatment power is 120 to 300 W, and the time is 5 to 20 min.

[0042] In some embodiments, the plasma treatment power is 300 W and the time is 10 to 20 minutes.

[0043] Specifically, when the plasma power is 120 W, a short fiber structure with a certain orientation is formed on the PEEK surface, and when the plasma power is increased to 300 W, a nanofiber network structure is formed on the PEEK surface. When the plasma power is 300 W and the plasma treatment time is 10 min to 20 min, the collagen-like nanofiber network structure is relatively complete.

[0044] In some embodiments, the oxygen flow rate is 160-170 mm 3 / min (i.e. the oxygen flow rate is 160-170 cubic millimeters per minute).

[0045] In some embodiments, the temperature during plasma treatment is 280-300°C.

[0046] In some embodiments, before the PEEK is subjected to plasma treatment, the PEEK is also pre-treated, and the pre-treatment specifically includes: first cleaning, polishing, and second cleaning of the PEEK surface in sequence. The pre-treated PEEK (with the polished surface facing upward) is then placed in a plasma treatment machine for plasma treatment.

[0047] In some embodiments, the PEEK surface is cleaned with a first cleaning liquid for 3 to 5 minutes;

[0048] Use sandpaper to polish the cleaned PEEK surface for 10 to 200 seconds;

[0049] The polished PEEK surface is cleaned with the second cleaning liquid for 3 to 5 minutes.

[0050] In some embodiments, the first cleaning solution includes at least one of acetone, anhydrous ethanol, and water;

[0051] In some embodiments, the mesh number of the sandpaper is 500 to 10000 mesh, and the polishing disk speed during polishing is 500 to 600 r / min;

[0052] In some embodiments, the second cleaning solution includes at least one of acetone, anhydrous ethanol, and water.

[0053] In some embodiments, the pretreatment specifically includes: soaking the PEEK in acetone, anhydrous ethanol, and water in sequence for cleaning, and drying, each cleaning time being 1 min;

[0054] Then, the dried PEEK surface was polished using sandpapers of 500 mesh, 1200 mesh, 2000 mesh, 3000 mesh, 4000 mesh, and 10000 mesh in sequence, with each polishing time being 10 s;

[0055] The polished PEEK was then sequentially immersed in acetone, anhydrous ethanol, and water for cleaning, and dried for later use. Each cleaning time was 1 min.

[0056] Based on the same inventive concept, the present invention also provides a PEEK implant, which is prepared by the above-mentioned preparation method.

[0057] Based on the same inventive concept, the present invention also provides a PEEK implant prepared by the above preparation method or the use of the above PEEK implant in the preparation of bone repair biomaterials.

[0058] The PEEK implant prepared by the invention has the function of promoting cell regeneration, thereby being able to repair bone tissue, and can be used for preparing bone repair biomaterials.

[0059] The following further describes the PEEK implant of the present application and its preparation method and application with specific examples. This section further describes the content of the present invention in conjunction with specific examples, but should not be construed as limiting the present invention. Unless otherwise specified, the technical means used in the embodiments are conventional means well known to those skilled in the art. Unless otherwise specified, the reagents, methods and equipment used in the present invention are conventional reagents, methods and equipment in the art.

[0060] Example 1

[0061] The present application embodiment provides a method for preparing a PEEK implant, comprising the following steps:

[0062] S1. Pre-treat PEEK, including:

[0063] S11, PEEK (thickness 1 mm) is sequentially immersed in acetone, anhydrous ethanol, and water for cleaning and drying, and each cleaning time is 1 min;

[0064] S12, polishing the PEEK surface dried in S11 using sandpapers of 500 mesh, 1200 mesh, 2000 mesh, 3000 mesh, and 10000 mesh in sequence, each polishing time is 10 s, and the polishing disc speed during polishing is 500 r / min;

[0065] S13, the PEEK polished in S12 is then immersed in acetone, anhydrous ethanol and water in turn for cleaning, drying and standby use; each cleaning time is 1 minute;

[0066] S2, placing the PEEK pretreated in S1 in a plasma treatment machine for plasma treatment. The process parameters controlled during the plasma treatment are: the gas for plasma treatment is oxygen, and the oxygen flow rate is 160mm 3 / min, the plasma treatment temperature is 280°C, the plasma treatment power is 300W, and the time is 20min.

[0067] Example 2

[0068] The embodiment of the present application provides a method for preparing a PEEK implant, which is the same as that of Embodiment 1, except that the plasma treatment power in step S2 is 120 W, and the remaining steps and process parameters are the same as those of Embodiment 1.

[0069] Example 3

[0070] The embodiment of the present application provides a method for preparing a PEEK implant, which is the same as that of Embodiment 1, except that the plasma treatment power in step S2 is 240 W, and the remaining steps and process parameters are the same as those of Embodiment 1.

[0071] Example 4

[0072] The embodiment of the present application provides a method for preparing a PEEK implant, which is the same as that of Embodiment 1, except that the plasma treatment time in step S2 is 5 minutes, and the remaining steps and process parameters are the same as those of Embodiment 1.

[0073] Example 5

[0074] The embodiment of the present application provides a method for preparing a PEEK implant, which is the same as that of Embodiment 1, except that the plasma treatment time in step S2 is 10 minutes, and the remaining steps and process parameters are the same as those of Embodiment 1.

[0075] Example 6

[0076] The embodiment of the present application provides a method for preparing a PEEK implant, which is the same as that of Embodiment 1, except that the plasma treatment time in step S2 is 40 minutes, and the remaining steps and process parameters are the same as those of Embodiment 1.

[0077] Example 7

[0078] The embodiment of the present application provides a method for preparing a PEEK implant, which is the same as that of Embodiment 1, except that the plasma treatment time in step S2 is 60 minutes, and the remaining steps and process parameters are the same as those of Embodiment 1.

[0079] Comparative Example 1

[0080] This comparative example provides a method for preparing a PEEK implant, which is the same as Example 1, except that the plasma treatment power in step S2 is 0 W, and the remaining steps and process parameters are the same as those in Example 1, that is, the PEEK implant in Comparative Example 1 is essentially pretreated PEEK according to the method in Example 1 to obtain pretreated PEEK.

[0081] Performance Testing

[0082] Figure 1 This is a SEM image of the surface of the PEEK implant prepared in Example 1.

[0083] Figure 2 This is a SEM image of the surface of the PEEK implant prepared in Example 2.

[0084] Figure 3 This is a SEM image of the surface of the PEEK implant prepared in Example 3.

[0085] Figure 4 This is a SEM image of the surface of the PEEK implant prepared in Comparative Example 1.

[0086] Figure 5 This is a SEM image of the surface of the PEEK implant prepared in Example 4.

[0087] Figure 6 This is a SEM image of the surface of the PEEK implant prepared in Example 5.

[0088] Under a series of plasma power treatment conditions, different nanofiber network structures were formed on the surface of PEEK implants. Figures 1 to 4 The effect of power on the nanostructure of PEEK surface is demonstrated. The results show that the surface of PEEK without plasma treatment in comparative example 1 has no structural features. When the plasma power is 120W, a short fiber structure with a certain orientation is formed on the surface of PEEK. When the plasma power is increased to 300W, a nanofiber network structure is formed on the surface of PEEK.

[0089] from Figures 1 to 6 In the SEM images of PEEK surfaces treated with different plasma powers and plasma treatment times, it was found that when the plasma power was 300 W and the plasma treatment time was 10 min and 20 min, the collagen nanofiber network structure on the PEEK surface was relatively complete.

[0090] A PEEK implant was prepared as a sample group according to the method in Example 1, and PEEK was pretreated according to the method in Example 1 to obtain a pretreated PEEK control group; the control group sample and the experimental group sample were placed on the operating table, and a water droplet with a volume of 4 μL was dripped onto the surface of the material through a manual droplet syringe, and photos were taken and the contact angle was analyzed to observe the regulation of the surface hydrophilicity and hydrophobicity of the nanostructure. The results are as follows Figure 7 shown. Figure 7 PEEK here represents pretreated PEEK, and PEEK-O2 represents a PEEK implant prepared according to the method in Example 1.

[0091] from Figure 7 It can be seen that the water contact angle of the pretreated PEEK is 81.25±1.15°, and the water contact angle of the PEEK implant is 47.38±0.78°, which shows that the PEEK implant prepared by the present invention has a nanofiber network structure on the surface and has better hydrophilicity.

[0092] The PEEK implants prepared in Example 1 and Examples 5 to 7 and the PEEK pretreated in Example 1 (as a blank group) were placed in a 48-well plate after UV disinfection, and mouse embryonic osteoblast precursor cells (MC3T3-E1) were inoculated on the surface of the PEEK implant or the pretreated PEEK, and the inoculation number was 5000 / well; at the same time, mouse embryonic osteoblast precursor cells (MC3T3-E1) were directly inoculated in a 48-well plate, and the inoculation number was 5000 / well as a Control control group (i.e. Figure 8The OD values ​​of 3D and 7D were tested by CCK8 experiment to evaluate the ability of the nanofiber network structure on the surface of PEEK implants to promote cell regeneration. Figure 8 As shown, Figure 8 The PEEK in the middle corresponds to the PEEK pretreated in Example 1, P+O 10 The PEEK implant prepared in Example 5, P+O 20 The PEEK implant prepared in Example 1, P+O 40 The PEEK implant prepared in Example 6, P+O 60 Corresponding to the PEEK implant prepared in Example 7.

[0093] The cell regeneration-promoting ability of the nanofiber network structure on the surface of PEEK implants was evaluated by CCK-8 experiment. Figure 8 As shown, when the plasma treatment time in Example 5 is 10 min, there is no significant change in the amount of cells on the surface of the PEEK implant at 3D. When the culture time is extended to 7D, the PEEK implant with nanofiber network morphology (10 min, 20 min plasma treatment) prepared in Examples 1 and 5 can significantly promote the proliferation of MC3T3-E1 cells. Compared with the PEEK pretreated in the blank group, the plasma treatment used in the present invention can significantly improve the problem of biological inertness on its surface.

[0094] The PEEK implant prepared in Example 5 and the PEEK pretreated in Example 1 (as a blank group) were placed in a 48-well plate after UV disinfection, and human umbilical vein endothelial cells (HUVEC) were inoculated on the surface of the PEEK implant or the pretreated PEEK, and the inoculation number was 5000 / well; at the same time, human umbilical vein endothelial cells (HUVEC) were directly inoculated in a 48-well plate, and the inoculation number was 5000 / well as a control group (i.e., Fig. 9 The OD values ​​of 3D and 7D were tested by CCK8 experiment to evaluate the ability of the nanofiber network structure on the surface of PEEK implants to promote cell regeneration. Fig. 9 As shown, Fig. 9 The PEEK in the embodiment corresponds to the PEEK pretreated in Example 5, and the PEEK-O corresponds to the PEEK implant prepared in Example 1.

[0095] The cell regeneration-promoting ability of the nanofiber network structure on the surface of PEEK implants was evaluated by CCK-8 experiment. Fig. 9As shown, when the plasma treatment time in Example 5 is 10 min, there is no significant change in the amount of cells on the surface of the PEEK implant at 3D. When the culture time is extended to 7D, the PEEK implant with nanofiber network morphology (10 min plasma treatment) prepared in Example 5 can significantly promote the proliferation of HUVEC cells. Compared with the PEEK pretreated in the blank group, the plasma treatment used in the present invention can significantly improve the problem of biological inertness on its surface.

[0096] The PEEK implant prepared in Example 1 and the PEEK pretreated in Example 1 (as a blank group) were placed in a 48-well plate after UV disinfection, and 5000 mouse embryonic osteoblast precursor cells (MC3T3-E1) were inoculated on the surface of the PEEK implant or the pretreated PEEK. After inoculation and culturing for 48 hours, the samples were fixed and dehydrated, and then SEM images were taken to observe the cell spreading. The results are shown in Figure 2. Figures 10 to 13 As shown, Figures 10-11 The SEM images of the surface of the PEEK implant prepared by mouse embryonic osteoblast precursor cells (MC3T3-E1) in Example 1 at different magnifications; Figures 12-13 These are SEM images of the PEEK surface pretreated with mouse embryonic osteoblast precursor cells (MC3T3-E1) at different magnifications in Example 1.

[0097] from Figures 10 to 13 It can be seen that MC3T3-E1 cells have better spreading behavior on the surface of the PEEK implant with a nanofiber network structure prepared by the present invention.

[0098] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A method for preparing a PEEK implant, characterized in that: The following steps are involved: The PEEK is placed in a plasma treatment machine for plasma treatment to form a nanofiber network structure on the surface of the PEEK, thereby obtaining a PEEK implant.

2. The method for preparing a PEEK implant according to claim 1, characterized in that: The process parameters controlled during the plasma treatment are: the gas for the plasma treatment is oxygen and / or nitrogen, the power of the plasma treatment is 120 to 300 W, and the time is 5 to 60 minutes.

3. The method for preparing a PEEK implant according to claim 2, characterized in that: The plasma treatment power is 300 W and the time is 10 to 20 minutes.

4. The method for preparing a PEEK implant according to claim 2 or 3, characterized in that: Oxygen flow rate is 160~170mm 3 / min.

5. The method for preparing a PEEK implant according to claim 2 or 3, characterized in that: The temperature during plasma treatment is 280-300°C.

6. The method for preparing a PEEK implant according to claim 1, characterized in that: Before subjecting PEEK to plasma treatment, PEEK is also pre-treated, and the pre-treatment specifically includes: first cleaning, polishing, and second cleaning of the PEEK surface in sequence.

7. The method for preparing a PEEK implant according to claim 6, characterized in that: The first cleaning liquid is used to clean the PEEK surface for the first time, and the first cleaning time is 3 to 5 minutes; Use sandpaper to polish the cleaned PEEK surface for 10 to 200 seconds; The polished PEEK surface is cleaned for a second time using the second cleaning liquid, and the second cleaning time is 3 to 5 minutes.

8. The method for preparing a PEEK implant according to claim 7, characterized in that: The first cleaning solution includes at least one of acetone, anhydrous ethanol, and water; The mesh number of the sandpaper is 500-10000 mesh, and the polishing disc speed during polishing is 500-600r / min; The second cleaning liquid includes at least one of acetone, anhydrous ethanol and water.

9. A PEEK implant prepared by the preparation method according to any one of claims 1 to 8.

10. Use of a PEEK implant prepared by the preparation method according to any one of claims 1 to 8 or the PEEK implant according to claim 9 in the preparation of bone repair biomaterials.

Images