Electroplating tool device, electroplating system and coating deposition method

Abstract

The invention provides an electroplating tool device, an electroplating system and a coating deposition method, and relates to the technical field of material surface treatment. The method comprises the steps that a target blade is fixed to a target installation area of an installation face of the electroplating tool device, so that a blade body can make contact with electroplating liquid in an aqueduct; a columnar nickel anode and a shielding mechanism are mounted in the electroplating functional area around the outer contour shape of the target blade; the current density, the stirring speed and the circulating flow are controlled for coating deposition treatment; and the target blade is taken out for deposition post-treatment. According to the plating layer deposition method, for the blade with the complex molded surface, the uniformity and quality of the coating are remarkably improved by optimizing electrode arrangement and dynamically regulating and controlling electroplating parameters, the defects of the coating are reduced, the corrosion resistance of the blade is improved, and the service life of the blade is prolonged. The method adapts to complex profile design, optimizes hydrodynamic conditions, ensures uniform coverage of electroplating liquid, reduces material waste and production cost, and has important industrial application value.

Description

Technical Field

[0001] The present invention relates to the technical field of material surface treatment, and in particular to an electroplating tooling device, an electroplating system and a coating deposition method. Background Art

[0002] Surface treatment technology plays a vital role in today's industrial applications, especially in the fields of aviation, ships and gas turbines. Surface protection treatment technology, especially coating deposition technology, aims to improve the wear resistance, corrosion resistance and high temperature resistance of materials. For components working under extreme conditions, such as aircraft engine blades, these technologies not only enhance the service life of components, but also significantly improve the overall mechanical properties.

[0003] At present, special functional coatings are generally used in surface treatment technology for complex surface parts such as aircraft engine blades to improve their wear resistance. These special functional coatings, such as anti-erosion coatings, are mainly used on compressor blades to improve their resistance to high-speed rotation and sand erosion. However, due to the complex geometric shape of the blades (including leading edge, trailing edge, curved surface, plane and angle, etc.), the complexity of fluid mechanics behavior often occurs during the electroplating coating process, which in turn affects the uniformity and quality of the electroplating coating.

[0004] Although current technology has been able to improve the erosion resistance of blade surfaces to a certain extent, the existing technical defects are still obvious. During the electroplating process, the unique geometric structure of the blade leads to uneven distribution of liquid flow, electric field and ion concentration. These inhomogeneities are the main reasons for uneven coating deposition, different thicknesses and possible coating defects (such as local over-deposition or delamination), which further affect the density and performance of the coating.

[0005] In summary, existing coating technologies face several challenges when processing blades with complex profiles. First, traditional electroplating methods have limited effects in optimizing the distribution of electric and flow fields, making it difficult to achieve highly uniform coatings. Second, existing technologies have failed to effectively solve the problem of low mass transfer efficiency caused by complex geometric shapes. Therefore, it is necessary to explore more efficient electroplating technologies to improve the uniformity and performance of the coating and ensure that the blades can exhibit higher durability and reliability under high temperature, high pressure and high-speed rotation working environments. This is not only a need to improve product quality, but also a major challenge in the field of materials science.

[0006] In view of this, the present invention is proposed. Summary of the invention

[0007] The object of the present invention is to provide an electroplating tooling device, an electroplating system and a coating deposition method, wherein the coating deposition method can accurately control the cathode current density distribution on the surface of a blade with complex surface, which is beneficial to improving the erosion resistance and service life of the nickel-cobalt coating on the blade body and reducing the coating production cost.

[0008] In order to achieve the above-mentioned purpose of the present invention, the following technical solutions are particularly adopted:

[0009] In a first aspect, the present invention provides a coating deposition method for a target blade having a complex profile, comprising:

[0010] Fixing the target blade on a target mounting area of ​​a mounting surface of an electroplating fixture so that a blade body of the target blade can contact the electroplating solution in the aqueduct;

[0011] In the electroplating functional area outside the target mounting area of ​​the mounting surface, a columnar nickel anode and a shielding mechanism are installed around the outer contour shape of the target blade;

[0012] According to the outer contour shape of the target blade, the current density of the electroplating in the aqueduct, the stirring speed of the electroplating solution and the circulation flow rate are controlled to perform coating deposition treatment on the surface of the target blade;

[0013] The target blade after the coating deposition treatment is taken out from the aqueduct and subjected to post-deposition treatment to complete the nickel-cobalt coating deposition.

[0014] In a preferred embodiment, the electroplating solution is Ni 2+ and Co 2+ Nickel-cobalt electroplating solution;

[0015] In a preferred embodiment, the Ni in the nickel-cobalt electroplating solution is 2+ The concentration is 75g / L~85g / L;

[0016] In a preferred embodiment, the nickel-cobalt electroplating solution contains Co 2+ The concentration is 45g / L~60g / L;

[0017] In a preferred embodiment, the operating temperature of the nickel-cobalt electroplating solution in the aqueduct is 50°C to 55°C.

[0018] In a preferred embodiment, in the electroplating functional area outside the target installation area of ​​the installation surface, a columnar nickel anode and a shielding mechanism are installed around the outer contour shape of the target blade, including:

[0019] Using the outer surface of the target blade as a cathode, the columnar nickel anode is installed on the installation surface according to the curvature of the outer contour of the target blade; and determining the shielding area of ​​the target blade, and installing the shielding mechanism based on the shielding area;

[0020] In a preferred embodiment, in the target blade, the density of the columnar nickel anodes installed in the region with a large curvature is smaller than that in the region with a relatively small curvature.

[0021] In a preferred embodiment, on the installation surface of the electroplating tooling device, a plurality of annular installation grooves are provided in the electroplating functional area, which are arranged in a direction away from the center with the target installation area as the center and whose circumferences are arranged in order from small to large; the columnar nickel anode and the shielding mechanism can be detachably installed at any position of the annular installation groove;

[0022] In a preferred embodiment, the spacing between the center lines of adjacent annular mounting grooves is 6 mm to 12 mm;

[0023] In a preferred embodiment, the number of the multiple circles of annular mounting grooves provided on the mounting surface is 5 to 8 circles;

[0024] In a preferred embodiment, the annular mounting groove on the mounting surface, which is closest to the target mounting area, is 3 mm to 6 mm away from the target blade mounted on the target mounting area;

[0025] In a preferred embodiment, the height of the columnar nickel anode is not less than the blade height of the target blade installed in the target installation area;

[0026] In a preferred embodiment, the cross-section diameter of the columnar nickel anode is 2 mm to 6 mm;

[0027] In a preferred embodiment, the total surface area of ​​the columnar nickel anode is not less than 0.6 times the electroplating area of ​​the blade body of the target blade;

[0028] In a preferred embodiment, the columnar nickel anode corresponding to the leading edge portion of the target blade is installed in the annular installation groove of the fourth circle around the periphery of the target installation area;

[0029] In a preferred embodiment, the number of the columnar nickel anodes installed corresponding to the leading edge portion of the target blade is 2 to 3;

[0030] In a preferred embodiment, the columnar nickel anode corresponding to the trailing edge portion of the target blade is installed in the annular installation groove of the fifth circle around the periphery of the target installation area;

[0031] In a preferred embodiment, the number of columnar nickel anodes installed corresponding to the trailing edge of the target blade is 1 to 2;

[0032] In a preferred embodiment, the columnar nickel anode corresponding to the convex area of ​​the target blade is installed in the annular installation groove of the third circle around the periphery of the target installation area;

[0033] In a preferred embodiment, the number of columnar nickel anodes installed corresponding to the convex area of ​​the target blade is 3 to 4;

[0034] In a preferred embodiment, the curved surface area of ​​the target blade corresponds to the columnar nickel anode, which is installed in the annular installation groove of the first circle on the periphery of the target installation area;

[0035] In a preferred embodiment, the number of columnar nickel anodes installed corresponding to the curved surface area of ​​the target blade is 1 to 2;

[0036] In a preferred embodiment, the columnar nickel anodes corresponding to the two side plane areas of the trailing edge portion of the target blade are installed in the annular installation grooves of the second circle on the periphery of the target installation area;

[0037] In a preferred embodiment, the number of columnar nickel anodes installed corresponding to the two side plane areas of the trailing edge portion of the target blade is 3 to 6.

[0038] In a preferred embodiment, the shielding mechanism comprises at least one insulating component; the insulating component comprises an insulating column that can be installed in the annular installation groove, and an insulating tape connected between the insulating columns;

[0039] In a preferred embodiment, the vertical height of the insulating component relative to the mounting surface is not less than the height of the columnar nickel anode.

[0040] In a preferred embodiment, the controlling of the current density of electroplating in the aqueduct, the stirring speed of the electroplating solution and the circulation flow rate according to the outer contour shape of the target blade comprises:

[0041] A pulse current mode is adopted to adjust the current density according to the thickness of the electroplating coating; and a stirring device and a circulation device are used to control the stirring speed and the circulation flow rate of the electroplating solution in the aqueduct respectively.

[0042] In a preferred embodiment, during the electroplating process, the electroplating process is divided into an initial stage and a coating thickening stage according to the thickness of the electroplated coating;

[0043] Wherein, the thickness of the electroplated coating in the coating thickening stage is greater than that in the initial stage;

[0044] In a preferred embodiment, in the pulse current mode, the duty ratio is 1:3;

[0045] In a preferred embodiment, the current density in the initial stage is controlled to be 1A / dm 2 ~2A / dm 2 ;

[0046] In a preferred embodiment, the current density in the coating thickening stage is controlled at 2A / dm 2 ~3A / dm 2 .

[0047] In a preferred embodiment, the control of the stirring speed by the stirring device should have at least one of the following control conditions:

[0048] A. controlling the stirring speed of the electroplating solution corresponding to the convex area of ​​the target blade to be 250 rpm to 300 rpm;

[0049] B. Control the stirring speed of the electroplating solution corresponding to the trailing edge of the target blade and the shielding area constructed by the shielding mechanism to be 400 rpm to 450 rpm.

[0050] In a preferred embodiment, based on the stirring device and the circulation device, the circulation flow rate of the electroplating solution in the aqueduct should be controlled with at least one of the following control conditions:

[0051] A. Control the circulating flow rate of the electroplating solution corresponding to the convex area of ​​the target blade to account for 20% to 30% of the total flow rate;

[0052] B. The cross-sectional diameter of the circulation port of the circulation device corresponding to the convex area of ​​the target blade is 6 mm to 8 mm;

[0053] C. Control the circulation flow of the electroplating solution corresponding to the curved surface area of ​​the target blade to account for 30% to 40% of the total flow;

[0054] D. The cross-sectional diameter of the circulation port of the circulation device corresponding to the curved surface area of ​​the target blade is 8 mm to 10 mm;

[0055] E. Control the circulation flow of the plating solution corresponding to the plane area on both sides of the target blade to account for 25% to 35% of the total flow;

[0056] F. The cross-sectional diameter of the circulation port of the circulation device corresponding to the plane area on both sides of the target blade is 10 mm to 12 mm;

[0057] G. Control the circulating flow of the plating solution corresponding to the trailing edge of the target blade and the shielding area constructed by the shielding mechanism to account for 15% to 20% of the total flow;

[0058] H. The cross-sectional diameter of the circulation port of the circulation device corresponding to the shielding area and the trailing edge of the target blade is 4 mm to 6 mm.

[0059] In a preferred embodiment, the post-deposition treatment comprises:

[0060] The target blade after the coating deposition treatment is taken out from the aqueduct, washed with water and dried;

[0061] The dried target blade is subjected to vacuum heat treatment to obtain the target blade after coating deposition;

[0062] In a preferred embodiment, the temperature of the vacuum heat treatment is 300°C to 500°C;

[0063] In a preferred embodiment, the vacuum degree of the vacuum heat treatment is controlled at 1×10 -3 Pa~1×10 -2 Pa;

[0064] In a preferred embodiment, the holding time of the vacuum heat treatment is at least 24 hours.

[0065] In a second aspect, the present invention provides an electroplating tooling device, comprising:

[0066] A tool body, a columnar nickel anode and a shielding mechanism; wherein the tool body is provided with a power interface to facilitate supplying power to the columnar nickel anode;

[0067] The tooling body is provided with a mounting surface; the mounting surface is provided with a target mounting area for mounting a target blade, and an electroplating functional area is provided around the target mounting area with the target mounting area as the center;

[0068] The columnar nickel anode and the shielding mechanism are both detachably connected to the mounting surface and can be mounted in the electroplating functional area of ​​the mounting surface.

[0069] In a preferred embodiment, the electroplating functional area is further provided with a plurality of annular installation grooves which are arranged with the target installation area as the center and away from the center and whose circumferences are arranged in order from small to large; the columnar nickel anode and the shielding mechanism can be detachably installed at any position of the annular installation groove;

[0070] In a preferred embodiment, the spacing between the center lines of adjacent annular mounting grooves is 6 mm to 12 mm;

[0071] In a preferred embodiment, the number of the multiple circles of annular mounting grooves provided on the mounting surface is 5 to 8 circles;

[0072] In a preferred embodiment, the annular mounting groove on the mounting surface, which is closest to the target mounting area, is 3 mm to 6 mm away from the target blade mounted on the target mounting area;

[0073] In a preferred embodiment, the height of the columnar nickel anode is not less than the blade height of the target blade installed in the target installation area;

[0074] In a preferred embodiment, the cross-section diameter of the columnar nickel anode is 2 mm to 6 mm;

[0075] In a preferred embodiment, the total surface area of ​​the columnar nickel anode is not less than 0.6 times the electroplating area of ​​the blade body of the target blade;

[0076] In a preferred embodiment, the columnar nickel anode corresponding to the leading edge portion of the target blade is installed in the annular installation groove of the fourth circle around the periphery of the target installation area;

[0077] In a preferred embodiment, the number of the columnar nickel anodes installed corresponding to the leading edge portion of the target blade is 2 to 3;

[0078] In a preferred embodiment, the columnar nickel anode corresponding to the trailing edge portion of the target blade is installed in the annular installation groove of the fifth circle around the periphery of the target installation area;

[0079] In a preferred embodiment, the number of columnar nickel anodes installed corresponding to the trailing edge of the target blade is 1 to 2;

[0080] In a preferred embodiment, the columnar nickel anode corresponding to the convex area of ​​the target blade is installed in the annular installation groove of the third circle around the periphery of the target installation area;

[0081] In a preferred embodiment, the number of columnar nickel anodes installed corresponding to the convex area of ​​the target blade is 3 to 4;

[0082] In a preferred embodiment, the curved surface area of ​​the target blade corresponds to the columnar nickel anode, which is installed in the annular installation groove of the first circle on the periphery of the target installation area;

[0083] In a preferred embodiment, the number of columnar nickel anodes installed corresponding to the curved surface area of ​​the target blade is 1 to 2;

[0084] In a preferred embodiment, the columnar nickel anodes corresponding to the two side plane areas of the trailing edge portion of the target blade are installed in the annular installation grooves of the second circle on the periphery of the target installation area;

[0085] In a preferred embodiment, the number of columnar nickel anodes installed corresponding to the two side plane areas of the trailing edge portion of the target blade is 3 to 6.

[0086] In a preferred embodiment, the columnar nickel anode is a columnar structure; the columnar nickel anode comprises a column body, and a mounting platform provided at the bottom end of the column body and matching the annular mounting groove;

[0087] The annular mounting groove is provided with a conductive terminal; the mounting platform is provided with a contact corresponding to the conductive terminal; the contact of the columnar nickel anode can form an electrical connection with the conductive terminal in the annular mounting groove after installation;

[0088] In a preferred embodiment, the mounting platform is a T-shaped boss that matches the cross section of the annular mounting groove;

[0089] In a preferred embodiment, the material of the columnar nickel anode is pure nickel;

[0090] In a preferred embodiment, the diameter of the columnar nickel anode is 2 mm to 6 mm; the height is 50 mm to 300 mm;

[0091] In a preferred embodiment, the column body is a column body with a porous structure distributed on the surface;

[0092] In a preferred embodiment, the column body is a column body with a mesh structure on the surface;

[0093] In a preferred embodiment, the depth of the annular mounting groove is 3 mm to 5 mm, and the width of the groove is 1.2 to 1.5 times the diameter of the columnar nickel anode.

[0094] In a third aspect, the present invention provides an electroplating system, comprising an electroplating tooling device, an electroplating tank, a stirring device and a circulation device as described in any one of the aforementioned embodiments.

[0095] Compared with the prior art, the present invention has the following beneficial effects:

[0096] The coating deposition method provided by the present invention is aimed at target blades with complex surfaces, and significantly improves the uniformity and quality of the coating by optimizing the electrode arrangement and dynamically controlling the electroplating parameters. First, by installing a columnar nickel anode and a shielding mechanism around the outer contour of the blade on the electroplating tooling device, the position and number of the anodes can be flexibly adjusted according to the complex surface of the blade, and the electric field distribution can be optimized to make the current density of various parts of the blade more uniform, thereby reducing local over-deposition or coating defects. At the same time, the method further ensures the uniformity of the coating thickness by controlling the current density, stirring speed and circulation flow of the electroplating solution, and the final coating thickness uniformity can be controlled at (maximum value-minimum value) / maximum value ≤ 15%.

[0097] In addition, this method reduces the formation of microscopic defects and makes the coating denser by optimizing the electric field distribution and fluid dynamics design. Subsequent vacuum heat treatment further improves the bonding strength between the coating and the substrate, optimizes the hardness and corrosion resistance of the coating, and the final coating hardness can reach 700-900HV, which significantly enhances the service performance of the blade in high temperature and high pressure working environment and prolongs its service life. At the same time, this method is also suitable for the design of complex surfaces. By optimizing the stirring speed and circulation flow rate by partition, it ensures the uniform coverage of the electroplating solution on the complex surface, thereby adapting to the complex geometric shape of the blade.

[0098] Finally, this method reduces unnecessary electroplating consumption, avoids local excessive deposition, and reduces material waste by precisely controlling the electric field distribution and coating thickness. The optimized electroplating process parameters and dynamic regulation capabilities improve the efficiency of the electroplating process, reduce production time, and further reduce production costs. At the same time, due to the improvement of coating uniformity and density, the need for rework and post-processing due to coating defects is reduced, further reducing production costs. In summary, this method significantly reduces production costs while improving coating uniformity and quality, and has significant industrial application value. BRIEF DESCRIPTION OF THE DRAWINGS

[0099] In order to more clearly illustrate the specific implementation methods of the present invention or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0100] Figure 1 Schematic diagram of the process of the coating deposition method in the embodiment of the present application;

[0101] Figure 2 This is a schematic diagram of the structure of the target blade in the embodiment of the present application;

[0102] Figure 3 This is a schematic diagram of the overall structure of the electroplating tooling device in the embodiment of the present application;

[0103] Figure 4 This is a schematic diagram of the top view of the electroplating tooling device in an embodiment of the present application;

[0104] Figure 5 It is a schematic diagram of the side structure of the electroplating tooling device in the embodiment of the present application;

[0105] Figure 6 Schematic diagram of the connection relationship between the columnar nickel anode and the annular mounting groove in the electroplating tooling device in the embodiment of the present application;

[0106] Figure 7 Schematic diagram of the structure of the electroplating system in the embodiment of the present application.

[0107] Figure markings: 100-electroplating system; 1-electroplating tooling device; 11-tooling body; 111-power interface; 112-mounting surface; 113-target mounting area; 114-electroplating functional area; 1141-annular mounting groove; 11411-conductive terminal; 12-columnar nickel anode; 121-column body; 122-mounting table; 1221-contact; 13-shielding mechanism; 131-insulating component; 1311-insulating column; 1312-insulating tape; 132-shielding area; 2-target blade; 21-blade back; 211-convex area; 22-blade basin; 221-curved area; 23-leading edge portion; 24-trailing edge portion; 25-plane area; 3-electroplating tank; 4-stirring device; 5-circulation device. DETAILED DESCRIPTION

[0108] The embodiments of the present invention will be described in detail below in conjunction with the examples, but it will be appreciated by those skilled in the art that the following examples are only used to illustrate the present invention and should not be considered as limiting the scope of the present invention. If no specific conditions are specified in the examples, the conditions are carried out according to normal conditions or the conditions recommended by the manufacturer. If the manufacturer of the reagents or instruments used is not specified, they are all conventional products that can be obtained commercially.

[0109] refer to Figure 1 In an embodiment of the present application, a coating deposition method is provided for a target blade with a complex surface.

[0110] The "target blades" in the embodiments refer to blades with complex profiles, which are usually used in aircraft engines, ground gas turbines, ship combustion engines, etc. The shapes and forms of these blades are complex, and special electroplating processes are required to ensure the uniformity and quality of their surface coatings.

[0111] refer to Figure 2The target blade targeted in this embodiment may include two main regions in terms of structural shape: the back of the blade and the blade basin, wherein the back of the blade refers to the entire region in the convex direction of the target blade; the blade basin refers to the entire region in the concave direction of the target blade. The two end regions in the length direction of the target blade are the leading edge portion protruding at the front end and the trailing edge portion at the rear end. In the region close to the leading edge portion, the portion in the direction of the back of the blade is a convex region, and the region in the direction of the blade basin is a curved region; in the region close to the trailing edge portion, both sides are plane regions with small curvature. First, the leading edge portion of the blade is usually designed as a convex shape with high curvature to optimize the airflow dynamics. This design enables the blade to better guide the airflow when rotating at high speed. However, during the electroplating process, the high curvature and protrusion of this region cause a significant increase in the flow rate of the plating solution. Although this high-speed flow increases the ion mass transfer rate, it also shortens the residence time of the plating solution on the surface, resulting in a rapid decrease in the local ion concentration and excessive current density, thereby causing problems of excessive deposition or unevenness of the coating. On the contrary, the trailing edge of the blade is prone to fluid separation and eddy currents due to its sharp geometric characteristics, which reduces the fluidity of the plating solution in this area and causes insufficient ion concentration, leading to coating defects.

[0112] Secondly, the back and basin areas of the blade are usually complex transition surfaces, and their geometric characteristics cause the flow rate of the electroplating solution to change gradiently when it flows through this area. This change will lead to uneven ion mass transfer efficiency, especially at the transition point where the curvature suddenly changes, which is easy to form a fluid stagnation area or ion concentration gradient. This will cause fluctuations in coating thickness. In addition, the streamline shape of the curved surface area may also cause the electric field distribution to bend, increase or decrease the local current density, and aggravate uneven deposition.

[0113] Although the geometry of the transition area between the back and the blade with small curvature is relatively simple, it is still affected by the overall flow field distribution. The plane area may become a fluid retention area or a low-speed flow area, causing the ion concentration of the plating solution to decrease, resulting in insufficient deposition or rough surface. In addition, at the junction of the plane and the curved surface, due to the sudden change in surface shape, eddy currents or turbulence may occur locally, further reducing the ion mass transfer efficiency.

[0114] The blade shielding area (such as the trailing edge shielding area) has a narrow geometry and a sharp angle change, making it difficult for the plating solution to flow in smoothly, and it is very easy to form a low-speed flow area or a static area. This fluid "blind area" not only leads to extremely low local ion mass transfer efficiency, but also may cause excessive current density due to the electric field concentration effect, thereby causing defects, voids or insufficient thickness of the coating.

[0115] In terms of overall shape, the target blade is usually a thin-walled shell structure, and the overall shape is similar to the airfoil of aerodynamic design. The blade is longer in the length direction (span direction) and thinner in the thickness direction to meet the use requirements under harsh working conditions such as high temperature, high pressure, and high-speed rotation. The center of gravity of the blade is usually located on the rear support column, and the blade surface is closed by the rear support column to form an inner cavity. This structural design helps to improve the strength and stability of the blade.

[0116] In short, the target blade is a blade with a complex surface, such as an aircraft engine blade. Its unique geometric structure makes it exhibit complex fluid mechanical behavior during the electroplating process, and the flow velocity distribution, electric field distribution and ion concentration supplement characteristics of each area are significantly different. This "uneven mass transfer of the plating solution caused by the unique fluid mechanical structure" is one of the fundamental reasons for the uneven deposition of the coating. Therefore, it needs to be solved through targeted optimization design (such as electrode arrangement, flow field regulation and dynamic process parameter adjustment) to ensure the uniformity, density and high performance of the coating. The geometric characteristics of the complex surface of the target blade lead to uneven electric field distribution during the electroplating process, which affects the thickness uniformity of the electroplated coating, and is prone to local over-deposition or coating defects, which is difficult to meet the requirements of actual applications.

[0117] The coating deposition method provided in this embodiment includes:

[0118] Step S1, fixing the target blade on the target installation area of ​​the installation surface of the electroplating tooling device, so that the blade body of the target blade can contact the electroplating liquid in the aqueduct.

[0119] In the above steps, the electroplating tooling device (reference Figure 3 , Figure 4 and Figure 5 ) is a specially designed device used to fix the blades and optimize the electric field distribution and fluid dynamics conditions during the electroplating process. Figure 3 This is the overall structure diagram of the electroplating tooling device. Figure 4 This is a top view of the electroplating tooling device. Figure 5 It is a side view of the electroplating tooling device.

[0120] Functionally, the device can fix the blade. Specifically, the electroplating fixture provides a mounting surface for fixing the target blade, ensuring that the blade remains stable during the electroplating process and that the blade body part of the blade can contact the electroplating solution. In terms of electrode arrangement, a cylindrical nickel anode can be installed on the fixture on the mounting surface.

[0121] The position, number and distance of the anodes can be flexibly adjusted according to the complex surface of the blade to optimize the electric field distribution. The electroplating tooling device is also equipped with a shielding mechanism to shield the electric field in specific areas to further optimize the electric field distribution. A multi-channel conductive system can be designed inside the electroplating tooling device, which can be precisely controlled according to the current density required in different areas.

[0122] As mentioned above, the aqueduct is a container for electroplating operations, which is used to hold the electroplating solution and provide the necessary environment for the electroplating process. The plating tank contains the electroplating solution and provides the medium for the electrochemical reaction in the electroplating process. The aqueduct can be equipped with automatic temperature control, stirring and circulation systems to ensure the temperature, fluidity and uniformity of the electroplating solution.

[0123] As mentioned above, the plating solution is a chemical solution used in the electroplating process, providing metal ions and other additives required for the electrochemical reaction.

[0124] In this step, the target blade with a complex surface is fixed on the mounting surface of the electroplating fixture to ensure that the blade body can contact the electroplating solution in the electroplating tank. The blade is firmly mounted in a specific designated position through the clamping or fixing mechanism of the electroplating fixture. The design of the fixture must ensure that the blade body part of the blade can be completely immersed in the electroplating solution, while other parts that do not need to be electroplated are effectively shielded.

[0125] After the blade is stably fixed on the tooling, the blade body part can fully contact with the electroplating liquid during the electroplating process, providing stable conditions for the subsequent electroplating process.

[0126] The electroplating fixture can ensure the stability of the blade position during the electroplating process and avoid uneven electroplating caused by blade movement. Specifically, the blade can be fixed to the fixture by a clamping device, screw fixation or other mechanical fixing methods. For example, a clamping fixture is used to clamp and fix the blade by a cylinder-controlled clamp.

[0127] Step S2, installing a columnar nickel anode and a shielding mechanism around the outer contour shape of the target blade in the electroplating functional area outside the target mounting area of ​​the mounting surface.

[0128] The above-mentioned columnar nickel anode is an anode material used in the electroplating process, and its shape can be a cylindrical pure nickel electrode. In the electroplating process, nickel ions (Ni 2+ ) to achieve the deposition of nickel-cobalt alloy.

[0129] During the electroplating process, the columnar nickel anode releases nickel ions (Ni 2+ ), these ions migrate to the cathode (blade body) under the action of the electric field and deposit to form a metal coating.

[0130] In this step, by adjusting the position, number and distance of the anodes, the electric field distribution can be optimized to make the current density in various parts of the blade more uniform, thereby reducing local excessive deposition or coating defects.

[0131] According to the complex profile of the blade, the anodes can be arranged flexibly based on its external contour shape. For example, the leading edge and trailing edge areas can be sparsely arranged with anodes to reduce the current density; the middle curved surface and flat area can be densely arranged with anodes to increase the current density.

[0132] The shielding mechanism is a device used to optimize the electric field distribution, and is usually made of insulating materials. It further optimizes the electric field distribution and reduces the electric field concentration effect by shielding the electric field lines in a specific area.

[0133] In the above, in the electroplating functional area of ​​the mounting surface of the electroplating tooling device, a columnar nickel anode and a shielding mechanism are installed around the outer contour shape of the target blade. The mounting surface may include two areas, a target mounting area arranged in the central area, and an electroplating functional area arranged outside the target mounting area, the target mounting area is used to fix and install the target blade, and the electroplating functional area is used to install the columnar nickel anode and the shielding structure.

[0134] In this step, the position, quantity and distance of the columnar nickel anodes are flexibly adjusted according to the complex surface of the blade, and a shielding mechanism is installed to optimize the electric field distribution.

[0135] For example, the anodes can be sparsely arranged in the leading and trailing edge areas of the blade, while they can be densely arranged in the middle curved and flat areas. By optimizing the anode arrangement and the setting of the shielding mechanism, precise control of the electric field distribution on complex surfaces is achieved, making the current density in various parts of the blade more uniform.

[0136] Flexible adjustment of the installation of columnar nickel anodes and shielding mechanisms can reduce local over-deposition or coating defects and improve coating uniformity.

[0137] Step S3, according to the outer contour shape of the target blade, the current density of the electroplating in the aqueduct, the stirring speed of the electroplating solution and the circulation flow rate are controlled to perform coating deposition treatment on the surface of the target blade.

[0138] According to the external contour shape of the target blade, the current density of the electroplating in the electroplating tank, the stirring speed of the electroplating solution and the circulation flow rate are controlled to perform coating deposition treatment on the blade surface.

[0139] By dynamically controlling the current density, stirring speed and circulation flow, the fluid mechanics and electrochemical conditions in the electroplating process are optimized, thereby achieving uniform deposition of coatings in complex surface areas, and the uniformity of coating thickness can be controlled within (maximum value - minimum value) / maximum value ≤ 15%.

[0140] This step improves the uniformity and quality of the coating, reduces the formation of microscopic defects, and enhances the density and durability of the coating. Specifically, the stirring speed and circulation flow rate can be controlled by the stirring device and circulation system in the electroplating tank. For example, the fluid dynamics conditions in different areas can be optimized by using the partition stirring and local circulation port design.

[0141] Step S4, taking the target blade after the coating deposition treatment out of the aqueduct, performing post-deposition treatment, and completing the nickel-cobalt coating deposition.

[0142] The target blade after the coating deposition treatment is taken out from the electroplating tank and subjected to post-deposition treatment to complete the deposition of the nickel-cobalt coating. The post-deposition treatment may include, but is not limited to, drying, heat treatment, and the like.

[0143] Through post-deposition treatment, the bonding force between the coating and the substrate is improved, the density and corrosion resistance of the coating are further improved, and the hardness performance of the coating is optimized. The final coating hardness can reach 700HV~900HV. Through post-deposition treatment, the service performance of the blade in a high temperature and high pressure working environment is significantly enhanced, and its service life is extended. Implementation method: A vacuum heat treatment furnace can be used for post-treatment, and the coating performance can be optimized by precisely controlling the heat treatment temperature, vacuum degree and insulation time.

[0144] Furthermore, the electroplating solution is Ni 2+ and Co 2+ of nickel-cobalt plating solution.

[0145] Furthermore, the Ni in the nickel-cobalt electroplating solution 2+ The concentration is 75 g / L to 85 g / L; for example, the concentration can be 75 g / L, 78 g / L, 80 g / L, 82 g / L, 85 g / L, and the like.

[0146] Furthermore, the nickel-cobalt electroplating solution contains Co 2+ The concentration is 45g / L to 60g / L; for example, the concentration can be 45g / L, 48g / L, 50g / L, 55g / L, 60g / L, etc.

[0147] Furthermore, the working temperature of the nickel-cobalt electroplating solution in the aqueduct is 50° C. to 55° C. For example, the working temperature may be 50° C., 52° C., 53° C., 54° C., 55° C., and the like.

[0148] As mentioned above, the plating solution contains Ni 2+ and Co 2+ Ion, nickel-cobalt electroplating solution, used to deposit nickel-cobalt alloy coating on the blade surface. By adjusting parameters such as ion concentration, additive type and temperature, the current density, ion mass transfer efficiency and coating quality in the electroplating process are optimized.

[0149] The electroplating solution may also include additives, for example, including but not limited to brighteners, levelers, etc., for improving the appearance and performance of the coating.

[0150] The plating solution can be achieved by accurately preparing a solution of the above ingredients, ensuring that its concentration and temperature meet the process requirements.

[0151] Further, the step S2, in the electroplating functional area outside the target installation area of ​​the installation surface, installing a columnar nickel anode and a shielding mechanism around the outer contour shape of the target blade, includes:

[0152] Step S21, using the outer surface of the target blade as the cathode, installing the columnar nickel anode on the installation surface according to the curvature of the outer contour shape of the target blade; and determining the shielding area of ​​the target blade, and installing the shielding mechanism based on the shielding area.

[0153] On the mounting surface of the electroplating fixture, the columnar nickel anode is installed according to the curvature of the outer contour of the target blade. In the above steps, the installation position of the columnar nickel anode needs to be determined according to the complex profile of the blade, especially the geometric shapes of the leading edge, trailing edge, middle curved surface and flat surface.

[0154] Adjust the density of the columnar nickel anode according to the curvature of different areas of the blade. The anode density is lower in areas with large curvature (such as the leading edge and trailing edge), and higher in areas with small curvature (such as the blade basin and the transition between the back of the blade and the trailing edge). Install the columnar nickel anode on the mounting surface of the tooling device, and ensure that the anode is connected to the positive pole of the electroplating power supply.

[0155] By optimizing the anode arrangement, the current density in each part of the blade is more uniform, reducing local over-deposition or coating defects. The flexible arrangement of the anode can adapt to the complex surface of the blade and ensure the uniformity of the coating. This can improve the uniformity and quality of the coating, reduce the formation of microscopic defects, adapt to the geometry of complex surfaces, and ensure the efficiency and stability of the electroplating process.

[0156] According to the geometry of the blade and the electric field distribution requirements, the areas that need electric field shielding are determined. For example, the trailing edge tip and leading edge are areas where electric field concentration is likely to occur. Shielding mechanisms such as insulating acrylic rods and insulating tape are installed in the determined shielding areas. The shielding device can be inserted into the anode groove and fixed with insulating tape to form a shielding surface.

[0157] Thus, by shielding the electric field lines in a specific area, the electric field distribution is further optimized and the electric field concentration effect is reduced. The coating defects caused by excessive local current density are reduced, and the uniformity and quality of the coating are further improved. This step can optimize the electric field distribution, reduce the electric field concentration effect, improve the uniformity of the coating, and flexibly adjust the position and style of the shielding device to meet the electric field optimization requirements of different blade profiles by setting a shielding structure.

[0158] In some embodiments, in the target blade, the density of the columnar nickel anodes installed in the region with a large curvature is smaller than that in the region with a relatively small curvature.

[0159] After the target blade is installed on the electroplating tooling device that can flexibly change the electrode position, only the blade body part can directly contact the plating solution. The blade tenon part is conductively connected through the internal conductive structure of the tooling, so that the blade body electroplating area can obtain current and perform electrodeposition.

[0160] Install the columnar nickel anode in the electroplating functional area of ​​the mounting surface, conduct electricity to the nickel anode through the conductive structure inside the tooling, and connect it to the positive electrode of the electroplating power supply. The number of nickel anodes and the distance from the cathode surface can be flexibly changed according to the surface requirements to achieve electric field uniformity control.

[0161] The density of the columnar nickel anodes to be arranged is determined according to the curvature of the outer contour shape of the target blade. Specifically, the curvature is inversely proportional to the density of the columnar nickel anodes to be arranged; that is, the density of the columnar nickel anodes installed in the area with a large curvature is smaller than that in the area with a relatively small curvature.

[0162] For example, for leading and trailing edges with larger curvatures, the electrode density can be appropriately reduced, and the electrode distance can be increased to reduce the cathode current density on the surface and improve the overall coating uniformity.

[0163] In some embodiments, on the mounting surface of the electroplating tooling device, a plurality of annular mounting grooves are provided in the electroplating functional area, which are arranged with the target mounting area as the center and away from the center, and the circumferences are arranged in sequence from small to large; the columnar nickel anode and the shielding mechanism can be detachably installed at any position of the annular mounting groove.

[0164] As mentioned above, on the mounting surface of the electroplating fixture, the annular mounting groove is a key structure for flexibly mounting the columnar nickel anode and the shielding mechanism.

[0165] The annular mounting groove is a multi-circle annular structure with the target mounting area (i.e. the blade fixing area) as the center and arranged in sequence in the direction away from the center. Usually, there are multiple circles of annular mounting grooves, and the circumference of each circle gradually increases from the inside to the outside. This design can meet the needs of different areas for anodes and shielding mechanisms.

[0166] Each circle of the annular installation groove is not in the shape of a perfect circle, but is adapted to the shape of the target installation area in the middle, thereby forming multiple circles of annular shapes of different sizes that are the same shape as the middle target installation area.

[0167] Specifically, each annular mounting groove may be elliptical, and its specific shape is designed according to the outer contour of the blade. The width and depth of each circle of annular mounting groove are designed according to the size of the columnar nickel anode and the shielding mechanism.

[0168] The columnar nickel anode and the shielding mechanism can be installed in the annular mounting groove by means of threaded connection, snap-on or plug-in, so as to facilitate quick replacement and adjustment.

[0169] The mounting groove is provided with a fixing device (such as a threaded hole, a slot, etc.) for firmly fixing the anode and the shielding mechanism at a specified position. In addition, the anode and the shielding mechanism can be installed at any position of the annular mounting groove as required to adapt to different blade geometric shapes and electric field distribution requirements.

[0170] The installation method and structure of the columnar nickel anode and the shielding mechanism can be, for example, the following specific implementation method: after the columnar nickel anode and the shielding mechanism are installed in the annular mounting groove, a nickel conductive terminal is embedded in the annular mounting groove to form an electrical connection with the elastic contact at the bottom of the columnar nickel anode; a threaded hole is reserved on the edge of the annular mounting groove for fixing the adjustable baffle of the shielding mechanism; a magnetic positioning pin is set on the side wall of the annular mounting groove, which cooperates with the groove on the side of the columnar nickel anode to achieve circumferential positioning.

[0171] In addition, the conductive terminal in the annular mounting groove can be an elastic conductive terminal. When the columnar nickel anode is inserted into the annular mounting groove, the conductive terminal abuts against the bottom end of the mounting platform and deforms (contracts) in a direction away from the mounting platform, so that the mounting platform can continue to vertically penetrate into the groove. After reaching the specified position, the conductive terminal can be inserted into the groove on the side of the mounting platform and dock with the contact to achieve electrical connection.

[0172] The columnar nickel anode can be electrically connected to the power supply system in the electroplating tooling device, so that during the electroplating process, the target blade is used as the cathode and the columnar nickel anode is used as the anode to perform electroplating treatment in the electroplating solution.

[0173] The installation and adjustment methods of the annular mounting groove may include:

[0174] (1) Fixing the blade: Fix the target blade on the target installation area to ensure that the blade body part can contact the electroplating solution.

[0175] (2) Determine the anode position: Determine the installation position of the columnar nickel anode in each annular installation groove based on the outer contour shape and curvature of the blade.

[0176] (3) Installing the anode: Insert the cylindrical nickel anode into the annular mounting groove and securely fix it in the mounting groove by threaded connection or other fixing means.

[0177] In addition, a shielding mechanism can also be installed. In the area where the electric field needs to be shielded, the shielding mechanism (such as an insulating acrylic rod and insulating tape) is installed in the annular installation groove and fixed with insulating tape.

[0178] Furthermore, for the adjustment of anode density, anodes with lower density can be installed in areas with large curvature (such as the leading edge and the trailing edge), and anodes with higher density can be installed in areas with small curvature (such as the middle curved surface and the flat surface). For shielding area adjustment, the areas that need to be shielded can be determined based on the electric field distribution simulation results, and shielding mechanisms can be installed in these areas. In addition, during the electroplating process, the position and number of anodes and shielding mechanisms can be dynamically adjusted according to the actual electric field distribution and coating deposition conditions.

[0179] In some embodiments, the spacing between the center lines of adjacent annular mounting grooves is 6 mm to 12 mm; for example, the spacing may be 6 mm, 7 mm, 8 mm, 9 mm, 10 mm, 11 mm, 12 mm, and the like.

[0180] In some embodiments, the number of the multiple circles of annular mounting grooves provided on the mounting surface is 5 to 8 circles, for example, the number may be 5 circles, 6 circles, 7 circles, 8 circles, and so on.

[0181] In some embodiments, the distance between the annular installation groove on the installation surface closest to the target installation area and the target blade installed in the target installation area is 3 mm to 6 mm, for example, 3 mm, 4 mm, 5 mm, 6 mm, etc.

[0182] In some embodiments, the height of the columnar nickel anode is not less than the height of the blade body of the target blade installed in the target installation area.

[0183] The height of the columnar nickel anode is consistent with the height of the blade to be plated or slightly greater than the height of the target blade. The heights here are all vertical heights based on the plane where the installation surface is located.

[0184] In some embodiments, the cross-section of the columnar nickel anode has a diameter of 2 mm to 6 mm, for example, the diameter may be 2 mm, 3 mm, 4 mm, 5 mm, 6 mm, etc.

[0185] In some embodiments, the total surface area of ​​the columnar nickel anode is not less than 0.6 times the electroplating area of ​​the blade body of the target blade.

[0186] As mentioned above, the number of columnar nickel anodes is preferably such that the total surface area of ​​the columnar nickel anodes is not less than 0.6 times the total electroplating area of ​​the blade body (cathode) of the target blade.

[0187] In addition, the cylindrical nickel anode can be processed into a porous, mesh-like structure to increase the total surface area of ​​the anode.

[0188] In some embodiments, the columnar nickel anode corresponding to the leading edge portion of the target blade is installed in the annular installation groove of the fourth circle around the periphery of the target installation area.

[0189] In some embodiments, the number of columnar nickel anodes installed corresponding to the leading edge portion of the target blade is 2 to 3. For example, the number of columnar nickel anodes installed may be 2, 3, and so on.

[0190] In some embodiments, the columnar nickel anode corresponding to the trailing edge portion of the target blade is installed in the annular installation groove of the fifth circle around the periphery of the target installation area.

[0191] In some embodiments, the number of columnar nickel anodes installed corresponding to the trailing edge of the target blade is 1 to 2. For example, the number of columnar nickel anodes installed may be 1, 2, and so on.

[0192] In some embodiments, the columnar nickel anode corresponding to the convex area of ​​the target blade is installed in the annular installation groove of the third circle around the periphery of the target installation area.

[0193] In some embodiments, the number of columnar nickel anodes installed corresponding to the convex area of ​​the target blade is 3 to 4.

[0194] In some embodiments, the curved surface area (at the blade basin groove) of the target blade corresponds to the columnar nickel anode, which is installed in the annular mounting groove of the first circle (try to install it at the corresponding position in the closest annular mounting groove) around the target mounting area; the number of columnar nickel anodes installed corresponding to the curved surface area of ​​the target blade is 1 to 2; for example, the installation number can be 1, 2, and so on.

[0195] In some embodiments, the columnar nickel anodes corresponding to the two side plane areas (small curvature areas) of the trailing edge portion of the target blade are installed in the annular installation grooves of the second circle on the periphery of the target installation area;

[0196] In some embodiments, the number of columnar nickel anodes installed corresponding to the two side plane areas of the trailing edge of the target blade is 3 to 6. For example, the number of columnar nickel anodes installed may be 3, 4, 5, 6, and so on.

[0197] In some embodiments, the shielding mechanism includes at least one insulating component; the insulating component includes an insulating column that can be installed in the annular installation groove, and an insulating tape connected between the insulating columns.

[0198] As mentioned above, the shielding mechanism is composed of one or more insulating components, each of which may include, for example, two insulating columns and an insulating tape connected between the two insulating columns. The material of the insulating component may be an acrylic column structure.

[0199] In some embodiments, a vertical height of the insulating assembly relative to the mounting surface is not less than a height of the columnar nickel anode.

[0200] In some embodiments, the step S3, controlling the current density of electroplating in the aqueduct, the stirring speed of the electroplating solution and the circulation flow rate according to the external contour shape of the target blade, comprises:

[0201] Step S31, adopting a pulse current mode to adjust the current density according to the thickness of the electroplating coating; and using a stirring device and a circulation device to respectively control the stirring speed and circulation flow rate of the electroplating solution in the aqueduct.

[0202] The above-mentioned pulse current mode means that during the electroplating process, the current is applied to the plating solution in the form of periodic pulses instead of the traditional continuous DC current. The current rises rapidly to a peak value in each pulse cycle, and then quickly drops to near zero or a lower level. The waveform of the pulse current can be a square wave, a sine wave, a triangle wave or a sawtooth wave, etc. The specific waveform depends on the application requirements. By adjusting the width, frequency and amplitude of the pulse, the electroplating process can be precisely controlled.

[0203] The main reason for using the pulse current mode is that it can significantly improve the quality and efficiency of electroplating. First of all, the pulse current mode can reduce the porosity of the coating, forming a bright, uniform and dense coating, thereby improving the corrosion resistance of the coating. In addition, it can also enhance the bonding and dispersion forces of the coating, and increase the density and hardness of the coating. By adjusting the pulse parameters (such as pulse width, frequency and amplitude), the thickness of the coating can be accurately controlled to reduce material waste. The pulse current mode reduces the concentration polarization phenomenon in the electroplating process by intermittent power supply, thereby improving the uniformity and quality of the coating. Pulse electroplating uses a periodic on-off power supply method, which can effectively reduce power waste and reduce energy consumption. For blades with complex surfaces, the pulse current mode can better adapt to the electroplating needs of different areas, optimize the electric field distribution, and reduce local excessive deposition or coating defects.

[0204] In this step, a pulse current source is used to optimize the current distribution during the electroplating process by periodically changing the magnitude and direction of the current. The pulse current mode can reduce concentration polarization during the electroplating process and improve the uniformity and density of the coating. The current density is dynamically adjusted according to the thickness requirements of the electroplated coating. The initial current density is low, and as the coating thickness increases, the current density is gradually increased to ensure uniform growth of the coating. Thus, it can be achieved that the uniformity and quality of the coating are significantly improved by the pulse current mode and dynamic current density adjustment, and local excessive deposition or coating defects are reduced. The coating thickness uniformity can be controlled at (maximum value-minimum value) / maximum value ≤ 10%.

[0205] In some embodiments, during the electroplating process, the electroplating process is divided into an initial stage and a coating thickening stage according to the thickness of the electroplated coating, wherein the thickness of the electroplated coating in the coating thickening stage is greater than that in the initial stage.

[0206] In some embodiments, in the pulse current mode, the duty cycle is 1:3;

[0207] In some embodiments, the current density in the initial stage is controlled to be 1A / dm 2 ~2A / dm 2 ; For example, the current density can be controlled to 1A / dm 2 , 1.5A / dm 2 , 2A / dm 2 etc.

[0208] In some embodiments, the current density in the coating thickening stage is controlled to be 2A / dm 2 ~3A / dm 2 For example, the current density can be controlled to 2A / dm 2 , 2.5A / dm 2 、3A / dm 2 etc.

[0209] The above electroplating adopts pulse current mode, the duty cycle is preferably 1:3, and the current density in the initial stage is 1A / dm 2 ~2A / dm 2 As the coating thickness gradually increases, the current density can be increased to 2A / dm 2 ~3A / dm 2 .

[0210] In some embodiments, based on the control of the stirring speed by the stirring device, at least one of the following control conditions should be met:

[0211] A. Control the stirring speed of the electroplating solution corresponding to the back area of ​​the target blade to be 250 rpm to 300 rpm. For example, the stirring speed may be 250 rpm, 260 rpm, 270 rpm, 280 rpm, 290 rpm, 300 rpm, etc.

[0212] B. Control the stirring speed of the electroplating solution corresponding to the blade basin of the target blade to be 400 rpm to 450 rpm. For example, the stirring speed may be 400 rpm, 410 rpm, 420 rpm, 430 rpm, 440 rpm, 450 rpm, etc.

[0213] The speed of the stirring device is also optimized according to the differences in the electroplating areas, which may include:

[0214] (1) Due to the high fluid velocity in the back of the blade, the stirring speed is appropriately reduced to 250 rpm to 300 rpm;

[0215] (2) Due to the significant fluid stagnation phenomenon in the blade basin area, the stirring speed was increased to 400-450 rpm to enhance the ion mass transfer efficiency in the low-speed flow area.

[0216] In some embodiments, the circulation flow rate of the electroplating solution in the aqueduct is controlled based on the stirring device and the circulation device.

[0217] Among them, by optimizing the auxiliary stirring device and the circulation system, a local circulation port is set in the angle area to further strengthen the flow of the plating solution, avoid eddy currents and insufficient local ion concentration, and thus ensure uniform coverage of the plating solution on the blades with complex profiles. In this operation mode, at least one of the following control conditions should be met:

[0218] A. Control the circulation flow of the electroplating solution corresponding to the convex area of ​​the target blade to account for 20% to 30% of the total flow, for example, 20%, 22%, 25%, 28%, 30%, etc.

[0219] B. The cross-sectional diameter of the circulation port of the circulation device corresponding to the convex area of ​​the target blade is 6 mm to 8 mm; for example, the cross-sectional diameter of the circulation port can be 6 mm, 7 mm, 8 mm, etc.

[0220] It should be noted that in the back area of ​​the blade (such as the leading edge and raised parts of the blade), due to the high flow rate of the plating solution and the fast ion mass transfer efficiency, in order to avoid excessive deposition caused by excessive local ion concentration, the circulating liquid flow in this area is controlled at 20% to 30% of the total flow, and a small-section circulation port (cross-sectional diameter of 6mm to 8mm) is designed near the convex surface to reduce the flow rate and increase the ion residence time.

[0221] C. Control the circulation flow of the electroplating solution corresponding to the curved surface area of ​​the target blade to account for 30% to 40% of the total flow; for example, it can be 30%, 32%, 35%, 38%, 40% and so on.

[0222] D. The cross-sectional diameter of the circulation port of the circulation device corresponding to the curved surface area of ​​the target blade is 8 mm to 10 mm; for example, the cross-sectional diameter of the circulation port can be 8 mm, 9 mm, 10 mm, etc.

[0223] As mentioned above, in the blade basin groove area (such as the transition curvature of the blade), that is, the curved surface area, due to the significant change in flow velocity gradient, the circulating liquid flow rate needs to be appropriately increased to 30% to 40% of the total flow rate. The cross-sectional diameter of the circulation port is preferably 8mm to 10mm, and the ion concentration distribution is optimized in combination with the arrangement of the anode to reduce the fluctuation of the coating thickness.

[0224] E. Control the circulation flow of the plating solution corresponding to the planar area on both sides of the target blade to account for 25% to 35% of the total flow; for example, it can be 25%, 26%, 28%, 30%, 32%, 34%, 35% and so on.

[0225] F. The cross-sectional diameter of the circulation port of the circulation device corresponding to the plane area on both sides of the target blade is 10 mm to 12 mm; for example, the cross-sectional diameter of the circulation port can be 10 mm, 11 mm, 12 mm, etc.

[0226] As mentioned above, in the transition area of ​​small curvature near the trailing edge of the target blade, the fluid distribution is relatively uniform, but uneven deposition may occur locally due to fluid retention. Therefore, the circulating liquid flow rate here accounts for 25% to 35% of the total flow rate. The liquid coverage range is increased through the multi-section combined circulation port (section diameter is 10mm to 12mm) to ensure mass transfer stability.

[0227] G. Control the circulation flow of the plating solution corresponding to the trailing edge of the target blade and the shielding area constructed by the shielding mechanism to account for 15% to 20% of the total flow; for example, it can be 15%, 16%, 18%, 20%, etc.

[0228] H. The cross-sectional diameter of the circulation port of the circulation device corresponding to the shielding area and the trailing edge of the target blade is 4 mm to 6 mm. For example, the cross-sectional diameter of the circulation port can be 4 mm, 5 mm, 6 mm, etc.

[0229] In the shielding and trailing edge areas, the fluid flow is poor, and it is the part with the most serious uneven mass transfer. Therefore, it is necessary to prioritize the increase of circulating liquid flow, which accounts for 15% to 20% of the total flow. By arranging small-section circulation ports (4mm to 6mm) and auxiliary circulation ports, the local fluid pressure and flow rate are increased, the stagnation and eddy current phenomena are optimized, and sufficient coverage of the electroplating solution in the angle area is ensured.

[0230] In some embodiments, in step S4, post-deposition processing includes:

[0231] Step S41, taking the target blade after the coating deposition treatment out of the aqueduct, washing it with water and drying it.

[0232] In the above steps, after the electroplating treatment is completed, the target blade is taken out from the plating tank and can be fully cleaned with deionized water and dried to remove the residual plating solution on the surface to prevent contamination of the plating layer in subsequent treatments.

[0233] Step S42, performing vacuum heat treatment on the dried target blade to obtain the target blade after coating deposition.

[0234] The temperature of the vacuum heat treatment is 300° C. to 500° C. For example, the temperature may be 300° C., 400° C., 500° C., and the like.

[0235] In some embodiments, the vacuum degree of the vacuum heat treatment is controlled at 1×10 -3 Pa~1×10 -2 Pa; for example, the vacuum degree can be controlled at 1×10 -3 Pa, 1×10 -2.5 Pa, 1×10 -2 Pa and so on.

[0236] In some embodiments, the vacuum heat treatment is carried out for at least 24 hours.

[0237] Furthermore, the target blade is placed in a vacuum heat treatment furnace for post-treatment. The heat treatment temperature is preferably 300°C to 500°C and the vacuum degree is 1×10 -3 Pa~1×10 -2 Pa, and the holding time is 24 hours. This process improves the bonding strength between the coating and the substrate through thermal diffusion, further improves the density and corrosion resistance of the coating, and optimizes its hardness performance.

[0238] After treatment, the thickness uniformity of the coating on the blade surface of the target blade is controlled at (maximum value - minimum value) / maximum value ≤ 15%, and the coating hardness reaches 700HV ~ 900HV, which significantly enhances the service performance of the aircraft engine blade in high temperature and high pressure working environment and extends its service life.

[0239] In conclusion, the process provided in this embodiment can be widely used in the surface protection treatment of high-performance complex-surface parts such as aircraft engines and gas turbines.

[0240] An electroplating tooling device is provided in an embodiment of the present application, comprising:

[0241] A tool body, a columnar nickel anode and a shielding mechanism; wherein the tool body is provided with a power interface to facilitate supplying power to the columnar nickel anode;

[0242] The tooling body is provided with a mounting surface; the mounting surface is provided with a target mounting area for mounting a target blade, and an electroplating functional area is provided around the target mounting area with the target mounting area as the center;

[0243] The columnar nickel anode and the shielding mechanism are both detachably connected to the mounting surface and can be mounted in the electroplating functional area of ​​the mounting surface.

[0244] In some embodiments, the electroplating functional area is further provided with a plurality of annular installation grooves which are arranged with the target installation area as the center and away from the center and whose circumferences are arranged in order from small to large; the columnar nickel anode and the shielding mechanism can be detachably installed at any position of the annular installation groove;

[0245] In some embodiments, the spacing between the center lines of adjacent annular mounting grooves is 6 mm to 12 mm.

[0246] In some embodiments, the number of the multiple circles of annular mounting grooves provided on the mounting surface is 5 to 8 circles.

[0247] In some embodiments, the annular installation groove on the installation surface that is closest to the target installation area is 3 mm to 6 mm away from the target blade installed in the target installation area.

[0248] In some embodiments, the height of the columnar nickel anode is not less than the height of the blade body of the target blade installed in the target installation area.

[0249] In some embodiments, the cross-section of the columnar nickel anode has a diameter of 2 mm to 6 mm.

[0250] In some embodiments, the total surface area of ​​the columnar nickel anode is not less than 0.6 times the electroplating area of ​​the blade body of the target blade.

[0251] In some embodiments, the columnar nickel anode corresponding to the leading edge portion of the target blade is installed in the annular installation groove of the fourth circle around the periphery of the target installation area.

[0252] In some embodiments, the number of the columnar nickel anodes installed corresponding to the leading edge portion of the target blade is 2 to 3.

[0253] In some embodiments, the columnar nickel anode corresponding to the trailing edge portion of the target blade is installed in the annular installation groove of the fifth circle around the periphery of the target installation area;

[0254] In some embodiments, the number of the columnar nickel anodes installed corresponding to the trailing edge portion of the target blade is 1 to 2.

[0255] In some embodiments, the columnar nickel anode corresponding to the convex area of ​​the target blade is installed in the annular installation groove of the third circle around the periphery of the target installation area.

[0256] In some embodiments, the number of columnar nickel anodes installed corresponding to the convex area of ​​the target blade is 3 to 4.

[0257] In some embodiments, the curved surface area of ​​the target blade corresponds to the columnar nickel anode, which is installed in the annular installation groove of the first circle around the periphery of the target installation area;

[0258] In some embodiments, the number of columnar nickel anodes installed corresponding to the curved surface area of ​​the target blade is 1 to 2.

[0259] In some embodiments, the columnar nickel anodes corresponding to the two side plane areas of the trailing edge portion of the target blade are installed in the annular installation grooves of the second circle around the periphery of the target installation area;

[0260] In some embodiments, the number of columnar nickel anodes installed corresponding to the planar regions on both sides of the trailing edge portion of the target blade is 3 to 6.

[0261] refer to Figure 6 The columnar nickel anode is a columnar structure; the columnar nickel anode includes a column body, and a mounting platform arranged at the bottom end of the column body and matching the annular mounting groove; a conductive terminal is arranged in the annular mounting groove; the mounting platform is provided with contacts corresponding to the conductive terminals; the contacts of the columnar nickel anode can form an electrical connection with the conductive terminals in the annular mounting groove after installation.

[0262] Furthermore, the mounting platform is a T-shaped boss that matches the cross section of the annular mounting groove.

[0263] In this embodiment, the columnar nickel anode may be a columnar structure, specifically a cylindrical structure, or other cross-sectional shapes. The columnar nickel anode may include a column body and a mounting platform.

[0264] The column body is the main part of the columnar nickel anode, which is used to release nickel ions (Ni 2+ ), participate in the electrochemical reaction to achieve the deposition of nickel-cobalt alloy.

[0265] The mounting platform is located at the bottom of the column body and matches the annular mounting groove, and is used to plug and unplug the columnar nickel anode on the fixture. The design of the mounting platform (such as the T-shaped boss) enables it to be stably embedded in the annular mounting groove to ensure that the anode is fixed in position during the electroplating process.

[0266] In this embodiment, the material of the columnar nickel anode can be pure nickel; pure nickel has good conductivity and chemical stability, can effectively release nickel ions, and reduce the impact of impurities on the electroplating process. For example, the material can be high-purity nickel, wherein Ni≥99.9%.

[0267] The diameter of the columnar nickel anode can be 2mm to 6mm, for example, 2mm, 3mm, 4mm, 5mm, 6mm, etc. This size range allows the columnar nickel anode to be flexibly arranged in a limited space while ensuring sufficient surface area to meet electroplating requirements. Its height can be 50mm to 300mm, for example, 50mm, 80mm, 100mm, 150mm, 200mm, 250mm, 300mm, etc. The height design can adapt to target blades of different lengths, ensuring that the anode can cover the entire blade height of the blade, making the electroplating process more uniform.

[0268] In addition, the surface of the column body may have surface defects. For example, in this embodiment, the surface is designed to be a porous structure, or a mesh structure, or a surface that is a combination of a porous structure and a mesh structure.

[0269] This structure can increase the total surface area of ​​the anode, thereby improving the release efficiency of nickel ions, further optimizing the ion mass transfer efficiency during the electroplating process, reducing the problem of excessive or low local ion concentration, and helping to improve the uniformity and quality of the coating.

[0270] Regarding the structure of the annular mounting groove, the groove depth can be 3 mm to 5 mm, for example, 3 mm, 4 mm, 5 mm, etc. The groove width is 1.2 to 1.5 times the diameter of the columnar nickel anode, for example, 1.2 times, 1.3 times, 1.4 times, 1.5 times, etc.

[0271] This size design ensures that the cylindrical nickel anode can be installed stably while allowing a certain installation error, making it easy to operate and adjust.

[0272] The design of the annular mounting groove allows the cylindrical nickel anode to be flexibly installed in different positions according to the complex surface of the target blade and the electric field distribution requirements, thereby achieving precise control of the electric field distribution.

[0273] In a preferred embodiment, the depth of the annular mounting groove is 3 mm to 5 mm, and the width of the groove is 1.2 to 1.5 times the diameter of the columnar nickel anode.

[0274] By flexibly adjusting the position and number of columnar nickel anodes and combining them with the design of the shielding mechanism, the electric field distribution can be significantly optimized, making the current density in various parts of the target blade more uniform and reducing local excessive deposition or coating defects.

[0275] The structural design and installation method of the columnar nickel anode, combined with the dynamic regulation during the electroplating process (such as the control of current density, stirring speed and circulation flow), can significantly improve the uniformity of the coating, and the coating thickness uniformity can be controlled within (maximum value - minimum value) / maximum value ≤ 15%.

[0276] Optimized electric field distribution and fluid dynamics design, combined with subsequent vacuum heat treatment, can significantly improve the density and hardness of the coating. The final coating hardness can reach 700HV~900HV, which significantly enhances the service performance of the blade in high temperature and high pressure working environment and extends its service life.

[0277] In summary, this embodiment provides important technical support for achieving uniform electroplating of blades with complex profiles by optimizing the structural design and installation method of the columnar nickel anode.

[0278] refer to Figure 7 In an embodiment of the present application, an electroplating system is provided, comprising an electroplating tooling device, an electroplating tank, a stirring device and a circulation device as described in any of the aforementioned embodiments.

[0279] The present invention is further described below by means of specific examples, but it should be understood that these examples are only used for more detailed description and should not be construed as limiting the present invention in any form.

[0280] Table 1. Electroplating parameters in the examples

[0281]

[0282] Table 2. Installation quantity and installation position of columnar nickel anodes in the embodiment

[0283]

[0284] In Table 2, "quantity" represents the number of columnar nickel anodes installed; "position" represents the position of the annular installation groove where the columnar nickel anode is installed on the periphery of the target installation area (the specific number of circles is from the first circle to the fifth circle from the center to the outside).

[0285] In the electroplating system, some specifications of the electroplating tooling device are:

[0286] (1) The spacing between the center lines of adjacent annular mounting grooves is 8 mm;

[0287] (2) The number of multi-circle annular mounting grooves provided on the mounting surface is 5;

[0288] (3) the annular mounting groove closest to the target mounting area on the mounting surface is 4 mm away from the target blade mounted on the target mounting area;

[0289] (4) The material of the columnar nickel anode is pure nickel (Ni ≥ 99.9%)

[0290] (5) The diameter of the columnar nickel anode is 3 mm and the height is 80 mm;

[0291] (6) The depth of the annular mounting groove is 3 mm, and the width of the groove is 1.5 times the diameter of the columnar nickel anode.

[0292] (7) The convex area corresponds to a circulation port diameter of 6 mm.

[0293] (9) The diameter of the circulation port corresponding to the curved surface area is 8 mm.

[0294] (10) The diameter of the circulation port corresponding to the shielded area and the trailing edge is 6 mm.

[0295] Example 1

[0296] In this embodiment, an electroplating system is used to perform a coating deposition process on a target blade.

[0297] Experimental methods:

[0298] (1) Fixing the target blade on the target mounting area of ​​the mounting surface of the electroplating tooling device so that the blade body of the target blade can contact the electroplating liquid in the aqueduct; specifically comprising: using the outer surface of the target blade as a cathode, and installing a columnar nickel anode on the mounting surface according to the curvature of the outer contour shape of the target blade; and determining the shielding area of ​​the target blade, and installing the shielding mechanism based on the shielding area.

[0299] (2) In the electroplating functional area outside the target installation area of ​​the installation surface, a columnar nickel anode and a shielding mechanism are installed around the outer contour shape of the target blade; the installation area and installation position of the columnar nickel anode refer to Table 2.

[0300] (3) According to the outer contour shape of the target blade, the current density of the electroplating in the aqueduct, the stirring speed of the electroplating solution and the circulation flow rate are controlled to perform coating deposition treatment on the surface of the target blade; for specific parameters, refer to the parameters in Table 1.

[0301] (4) The target blade after the coating deposition treatment is taken out from the aqueduct, and post-deposition treatment is performed to complete the deposition of the nickel-cobalt coating. The post-deposition treatment includes: taking out the target blade after the coating deposition treatment from the aqueduct, washing with water and drying; performing vacuum heat treatment on the dried target blade to obtain the target blade after the coating deposition; the specific parameters refer to the parameters in Table 1.

[0302] Example 2

[0303] In this embodiment, an electroplating system is used to perform a coating deposition process on a target blade.

[0304] Experimental methods:

[0305] The coating deposition method used in this embodiment is basically the same as that in Embodiment 1, and the specific parameters are shown in Table 1 and Table 2.

[0306] Example 3

[0307] In this embodiment, an electroplating system is used to perform a coating deposition process on a target blade.

[0308] Experimental methods:

[0309] The coating deposition method used in this embodiment is basically the same as that in Embodiment 1, and the specific parameters are shown in Table 1 and Table 2.

[0310] Comparative Example 1

[0311] In this comparative example, a conventional electroplating system is used to perform coating deposition processing on the target blade.

[0312] Conventional electroplating system:

[0313] The difference from Example 1 is that the electroplating tooling device of the electroplating system in Example 1 is not used, but a traditional fully contoured titanium mesh + nickel plate anode combination and a fixed flow circulation device are used.

[0314] Electroplating solution: Same as in Example 1.

[0315] Experimental methods:

[0316] (1) Fix the target blade to the tooling.

[0317] (2) The installed tooling is immersed in an electroplating solution at the same temperature as in Example 1. Under the action of chemical reaction, the metal ions in the electroplating solution are reduced and deposited on the surface of the workpiece to form a coating.

[0318] Deposition time depends on the desired coating thickness and is typically from 10 minutes to several hours.

[0319] (3) Cleaning and vacuum heat treatment.

[0320] Comparative test experiment:

[0321] 1. Testing equipment:

[0322] Hitachi High-Tech Thermal Field Emission Scanning Electron Microscope SU5000.

[0323] 2. Test method:

[0324] Five blade profile sections were cut along the blade height of the target blade. Three points were randomly selected from each area of ​​the convex surface, curved surface, leading edge, trailing edge, flat surface, etc., and their thicknesses were recorded and their average values ​​were taken.

[0325] 3. Test results:

[0326] Table 3. Detection results of blade surface coating thickness in different embodiments and comparative examples

[0327] Sampling point area Example 1 Example 2 Example 3 Comparative Example 1 Convex area 90.2 89.9 90.7 95.6 Surface area 91.5 90.6 92.4 105.7 Leading edge 91.5 90.6 92.4 105.7 Trailing edge 100.1 99.5 100.5 120.5 Plane area (left) 88.3 88.2 87.4 84.4 Plane area (right) 88.5 88.5 87.4 86.1

[0328] In the above table, the left and right sampling points of the plane area are reference Figure 2 The unit of sampling thickness of each area in the table is μm.

[0329] (1) Extreme value ratio analysis: Calculate the extreme value ratio, referring to the data in Table 4.

[0330] The calculation method is:

[0331]

[0332] Among them, EVR stands for extreme value ratio, Min is the minimum value among all sampling points; Max is the maximum value among all sampling points.

[0333] Table 4. Calculation results of the ratio of different regions to thickness extremes in different embodiments and comparative examples

[0334] Sampling point area Example 1 Example 2 Example 3 Comparative Example 1 Extreme value ratio 0.882 0.878 0.870 0.700

[0335] The closer the extreme value ratio is to 1, the better the uniformity of the data, that is, the smaller the difference between the maximum and minimum values. The smaller the extreme value ratio is, the worse the uniformity of the data, that is, the larger the difference between the maximum and minimum values.

[0336] From the above calculation results, we can see that:

[0337] The extreme value ratios of Examples 1, 2 and 3 are all close to 0.88, indicating that the uniformity of the coating thickness is good.

[0338] The extreme value ratio of Comparative Example 1 is 0.70, which is significantly lower than that of Examples 1, 2 and 3, indicating that the uniformity of the coating thickness is poor.

[0339] In short, the extreme value ratio is a simple and intuitive evaluation method that can quickly reflect the uniformity of the coating thickness. By calculating the extreme value ratio, the uniformity differences between different embodiments and comparative examples can be clearly compared, thereby verifying the advantages of this technology in improving the uniformity of the coating.

[0340] (2) Variance analysis: Calculate the overall variance, referring to the data in Table 5.

[0341] Table 5. Calculation results of thickness variance in different regions in different embodiments and comparative examples

[0342] Sampling point area Example 1 Example 2 Example 3 Comparative Example 1 variance 15.78 14.60 19.39 156.75

[0343] Variance is a statistical indicator that measures the volatility or dispersion of data. The smaller the variance, the smaller the volatility of the data and the better the uniformity.

[0344] The variance of Example 1 is 15.78, the variance of Example 2 is 14.60, and the variance of Example 3 is 19.39. The variances of these three examples are all between 14.60 and 19.39, and the values ​​are relatively small, indicating that the volatility of the data is small and the uniformity of the coating thickness is good.

[0345] The variance of Comparative Example 1 is 156.75, which is much higher than the variances of Examples 1, 2 and 3. This indicates that the data of Comparative Example 1 has a large fluctuation and the uniformity of the coating thickness is poor.

[0346] The variances of Examples 1, 2 and 3 are all between 15 and 20, while the variance of Comparative Example 1 is as high as 156.75. This shows that the electroplating tooling device and the coating deposition method (embodiment) of the present invention can significantly improve the uniformity of the coating thickness, while the traditional method (Comparative Example 1) cannot achieve such uniformity.

[0347] According to the variance data in Table 5, the following conclusions can be drawn: the electroplating tooling device and the coating deposition method (Examples 1, 2 and 3) of the present invention can significantly improve the uniformity of the coating thickness, and the variance value is much lower than that of the traditional method (Comparative Example 1). The coating uniformity of Example 2 is the best, indicating that its electroplating parameters and anode arrangement method may be more suitable for the electroplating requirements of complex-shaped blades.

[0348] The variance value of comparative example 1 is very high, indicating that the traditional method has obvious uniformity problems when processing blades with complex profiles, and cannot effectively solve the problem of large fluctuations in coating thickness. These analysis results further verify the advantages of the present invention in improving coating uniformity, especially its effectiveness and reliability when processing blades with complex profiles.

[0349] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein by equivalents. However, these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A coating deposition method for a target blade with a complex surface, characterized in that: include: Fixing the target blade on a target mounting area of ​​a mounting surface of an electroplating fixture so that a blade body of the target blade can contact the electroplating solution in the aqueduct; In the electroplating functional area outside the target mounting area of ​​the mounting surface, a columnar nickel anode and a shielding mechanism are installed around the outer contour shape of the target blade; According to the outer contour shape of the target blade, the current density of the electroplating in the aqueduct, the stirring speed of the electroplating solution and the circulation flow rate are controlled to perform coating deposition treatment on the surface of the target blade; The target blade after the coating deposition treatment is taken out from the aqueduct and subjected to post-deposition treatment to complete the nickel-cobalt coating deposition.

2. The coating deposition method according to claim 1, characterized in that: The electroplating solution is Ni 2+ and Co 2+ Nickel-cobalt electroplating solution; Preferably, the Ni in the nickel-cobalt electroplating solution 2+ The concentration is 75g / L~85g / L; Preferably, the nickel-cobalt electroplating solution contains Co 2+ The concentration is 45g / L~60g / L; Preferably, the working temperature of the nickel-cobalt electroplating solution in the aqueduct is 50°C to 55°C.

3. The coating deposition method according to claim 1, characterized in that: The step of installing a columnar nickel anode and a shielding mechanism around the outer contour of the target blade in the electroplating functional area outside the target mounting area of ​​the mounting surface includes: Using the outer surface of the target blade as a cathode, the columnar nickel anode is installed on the installation surface according to the curvature of the outer contour of the target blade; and determining the shielding area of ​​the target blade, and installing the shielding mechanism based on the shielding area; Preferably, in the target blade, the density of the columnar nickel anodes installed in the region with a large curvature is smaller than that in the region with a relatively small curvature.

4. The coating deposition method according to claim 3, characterized in that: On the installation surface of the electroplating tooling device, a plurality of annular installation grooves are provided in the electroplating functional area, which are arranged with the target installation area as the center and away from the center, and the circumferences are arranged in order from small to large; the columnar nickel anode and the shielding mechanism can be detachably installed at any position of the annular installation groove; Preferably, the spacing between the center lines of adjacent annular mounting grooves is 6 mm to 12 mm; Preferably, the number of the multiple circles of annular mounting grooves arranged on the mounting surface is 5 to 8 circles; Preferably, the annular mounting groove closest to the target mounting area on the mounting surface is 3 mm to 6 mm away from the target blade mounted on the target mounting area; Preferably, the height of the columnar nickel anode is not less than the blade height of the target blade installed in the target installation area; Preferably, the cross-section diameter of the columnar nickel anode is 2 mm to 6 mm; Preferably, the total surface area of ​​the columnar nickel anode is not less than 0.6 times the electroplating area of ​​the blade body of the target blade; Preferably, the columnar nickel anode corresponding to the leading edge portion of the target blade is installed in the annular installation groove of the fourth circle on the periphery of the target installation area; Preferably, the number of columnar nickel anodes installed corresponding to the leading edge portion of the target blade is 2 to 3; Preferably, the columnar nickel anode corresponding to the trailing edge portion of the target blade is installed in the annular installation groove of the fifth circle around the periphery of the target installation area; Preferably, the number of columnar nickel anodes installed corresponding to the trailing edge of the target blade is 1 to 2; Preferably, the columnar nickel anode corresponding to the convex area of ​​the target blade is installed in the annular installation groove of the third circle around the periphery of the target installation area; Preferably, the number of columnar nickel anodes installed corresponding to the convex area of ​​the target blade is 3 to 4; Preferably, the curved surface area of ​​the target blade corresponds to the columnar nickel anode, which is installed in the annular installation groove of the first circle around the periphery of the target installation area; Preferably, the number of columnar nickel anodes installed corresponding to the curved surface area of ​​the target blade is 1 to 2; Preferably, the columnar nickel anodes corresponding to the two side plane areas of the trailing edge portion of the target blade are installed in the annular installation grooves of the second circle on the periphery of the target installation area; Preferably, the number of columnar nickel anodes installed corresponding to the planar areas on both sides of the trailing edge portion of the target blade is 3 to 6.

5. The coating deposition method according to claim 4, characterized in that: The shielding mechanism comprises at least one insulating component; the insulating component comprises an insulating column that can be installed in the annular installation groove, and an insulating tape connected between the insulating columns; Preferably, the vertical height of the insulating component relative to the mounting surface is not less than the height of the columnar nickel anode.

6. The coating deposition method according to claim 1, characterized in that: The method of controlling the current density of electroplating in the aqueduct, the stirring speed of the electroplating solution and the circulation flow rate according to the outer contour shape of the target blade comprises: A pulse current mode is adopted to adjust the current density according to the thickness of the electroplating coating; and a stirring device and a circulation device are used to control the stirring speed and the circulation flow rate of the electroplating solution in the aqueduct respectively.

7. The coating deposition method according to claim 6, characterized in that: In the electroplating process, according to the thickness of the electroplated coating, the electroplating process is divided into the initial stage and the coating thickening stage; Wherein, the thickness of the electroplated coating in the coating thickening stage is greater than that in the initial stage; Preferably, in the pulse current mode, the duty cycle is 1:3; Preferably, the current density in the initial stage is controlled to be 1A / dm 2 ~2A / dm 2 ; Preferably, the current density in the coating thickening stage is controlled at 2A / dm 2 ~3A / dm 2 .

8. The coating deposition method according to claim 6, characterized in that: Based on the control of the stirring speed by the stirring device, at least one of the following control conditions should be met: A. controlling the stirring speed of the electroplating solution corresponding to the convex area of ​​the target blade to be 250 rpm to 300 rpm; B. Control the stirring speed of the electroplating solution corresponding to the trailing edge of the target blade and the shielding area constructed by the shielding mechanism to be 400 rpm to 450 rpm.

9. The coating deposition method according to claim 6, characterized in that: Based on the stirring device and the circulation device, the circulation flow rate of the electroplating solution in the aqueduct should be controlled with at least one of the following control conditions: A. Control the circulating flow rate of the electroplating solution corresponding to the convex area of ​​the target blade to account for 20% to 30% of the total flow rate; B. The cross-sectional diameter of the circulation port of the circulation device corresponding to the convex area of ​​the target blade is 6 mm to 8 mm; C. Control the circulation flow of the electroplating solution corresponding to the curved surface area of ​​the target blade to account for 30% to 40% of the total flow; D. The cross-sectional diameter of the circulation port of the circulation device corresponding to the curved surface area of ​​the target blade is 8 mm to 10 mm; E. Control the circulation flow of the plating solution corresponding to the plane area on both sides of the target blade to account for 25% to 35% of the total flow; F. The cross-sectional diameter of the circulation port of the circulation device corresponding to the plane area on both sides of the target blade is 10 mm to 12 mm; G. Control the circulating flow of the plating solution corresponding to the trailing edge of the target blade and the shielding area constructed by the shielding mechanism to account for 15% to 20% of the total flow; H. The cross-sectional diameter of the circulation port of the circulation device corresponding to the shielding area and the trailing edge of the target blade is 4 mm to 6 mm.

10. The coating deposition method according to claim 1, characterized in that: The post-deposition treatment comprises: The target blade after the coating deposition treatment is taken out from the aqueduct, washed with water and dried; The dried target blade is subjected to vacuum heat treatment to obtain the target blade after coating deposition; Preferably, the temperature of the vacuum heat treatment is 300°C to 500°C; Preferably, the vacuum degree of the vacuum heat treatment is controlled at 1×10 -3 Pa~1×10 -2 Pa; Preferably, the holding time of the vacuum heat treatment is at least 24 hours.

11. An electroplating tooling device, characterized in that: include: A tool body, a columnar nickel anode and a shielding mechanism; wherein the tool body is provided with a power interface to facilitate supplying power to the columnar nickel anode; The tooling body is provided with a mounting surface; the mounting surface is provided with a target mounting area for mounting a target blade, and an electroplating functional area is provided around the target mounting area with the target mounting area as the center; The columnar nickel anode and the shielding mechanism are both detachably connected to the mounting surface and can be mounted in the electroplating functional area of ​​the mounting surface.

12. The electroplating tooling device according to claim 11, characterized in that: The electroplating functional area is also provided with a plurality of annular installation grooves which are arranged with the target installation area as the center and away from the center and whose circumferences are arranged in order from small to large; the columnar nickel anode and the shielding mechanism can be detachably installed at any position of the annular installation groove; Preferably, the spacing between the center lines of adjacent annular mounting grooves is 6 mm to 12 mm; Preferably, the number of the multiple circles of annular mounting grooves arranged on the mounting surface is 5 to 8 circles; Preferably, the annular mounting groove closest to the target mounting area on the mounting surface is 3 mm to 6 mm away from the target blade mounted on the target mounting area; Preferably, the height of the columnar nickel anode is not less than the blade height of the target blade installed in the target installation area; Preferably, the cross-section diameter of the columnar nickel anode is 2 mm to 6 mm; Preferably, the total surface area of ​​the columnar nickel anode is not less than 0.6 times the electroplating area of ​​the blade body of the target blade; Preferably, the columnar nickel anode corresponding to the leading edge portion of the target blade is installed in the annular installation groove of the fourth circle on the periphery of the target installation area; Preferably, the number of columnar nickel anodes installed corresponding to the leading edge portion of the target blade is 2 to 3; Preferably, the columnar nickel anode corresponding to the trailing edge portion of the target blade is installed in the annular installation groove of the fifth circle around the periphery of the target installation area; Preferably, the number of columnar nickel anodes installed corresponding to the trailing edge of the target blade is 1 to 2; Preferably, the columnar nickel anode corresponding to the convex area of ​​the target blade is installed in the annular installation groove of the third circle around the periphery of the target installation area; Preferably, the number of columnar nickel anodes installed corresponding to the convex area of ​​the target blade is 3 to 4; Preferably, the curved surface area of ​​the target blade corresponds to the columnar nickel anode, which is installed in the annular installation groove of the first circle around the periphery of the target installation area; Preferably, the number of columnar nickel anodes installed corresponding to the curved surface area of ​​the target blade is 1 to 2; Preferably, the columnar nickel anodes corresponding to the two side plane areas of the trailing edge portion of the target blade are installed in the annular installation grooves of the second circle on the periphery of the target installation area; Preferably, the number of columnar nickel anodes installed corresponding to the planar areas on both sides of the trailing edge portion of the target blade is 3 to 6.

13. The electroplating tooling device according to claim 11, characterized in that: The columnar nickel anode is a columnar structure; the columnar nickel anode comprises a column body and a mounting platform arranged at the bottom end of the column body and matching the annular mounting groove; The annular mounting groove is provided with a conductive terminal; the mounting platform is provided with a contact corresponding to the conductive terminal; the contact of the columnar nickel anode can form an electrical connection with the conductive terminal in the annular mounting groove after installation; Preferably, the mounting platform is a T-shaped boss that matches the cross section of the annular mounting groove; Preferably, the material of the columnar nickel anode is pure nickel; Preferably, the diameter of the columnar nickel anode is 2 mm to 6 mm, and the height is 50 mm to 300 mm; Preferably, the column body is a column body with a porous structure distributed on the surface; Preferably, the column body is a column body with a mesh structure on the surface; Preferably, the depth of the annular mounting groove is 3 mm to 5 mm, and the width of the groove is 1.2 to 1.5 times the diameter of the columnar nickel anode.

14. An electroplating system, characterized in that: It comprises the electroplating tooling device, electroplating tank, stirring device and circulation device as described in any one of claims 11-12.

Images